JPH11312817A - Solar cell - Google Patents

Solar cell

Info

Publication number
JPH11312817A
JPH11312817A JP10156608A JP15660898A JPH11312817A JP H11312817 A JPH11312817 A JP H11312817A JP 10156608 A JP10156608 A JP 10156608A JP 15660898 A JP15660898 A JP 15660898A JP H11312817 A JPH11312817 A JP H11312817A
Authority
JP
Japan
Prior art keywords
substrate
solar cell
electrode layer
absorbing layer
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10156608A
Other languages
Japanese (ja)
Inventor
Shinsuke Takeuchi
伸介 武内
Yamato Ishikawa
大和 石川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honda Motor Co Ltd
Original Assignee
Honda Motor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honda Motor Co Ltd filed Critical Honda Motor Co Ltd
Priority to JP10156608A priority Critical patent/JPH11312817A/en
Publication of JPH11312817A publication Critical patent/JPH11312817A/en
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/541CuInSe2 material PV cells

Abstract

PROBLEM TO BE SOLVED: To prevent a substrate from warping due to thermal stress when a thin film is formed even if a low melting material such as SLG containing much Na is used in order to improve the crystal growth in a thin light-absorbing layer by evaporation caused by diffusion of Na. SOLUTION: A solar cell wherein a CIS (a compound of element selected from among Cu, In and Se) or CIGS-based (a compound of element selected from among Cu, In, Ca and Se) thin film is formed as a light-absorbing layer 3 on a substrate 1 via a metal electrode layer 2. The substrate 1 is a coupled body of a first substrate 11 containing Na and a second substrate 12 made of a high melting material. The thin light absorbing layer 3 is formed on the first substrate 11 via the electrode layer 2 by evaporation.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、半導体薄膜による太陽
電池に係り、特にその基板構造に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a solar cell using a semiconductor thin film, and more particularly to a substrate structure thereof.

【0002】[0002]

【従来の技術】従来、基板上にモリブデンMoによる電
極層を介して光吸収層としてのCIS系(Cu,In,
Seの化合物)の薄膜を形成するようにした太陽電池に
おいて、その基板にナトリウムNa成分を多く含んだソ
ーダライムガラスSLGを用いることにより、蒸着によ
ってCIS薄膜を形成する際に、基板のNa成分が拡散
して結晶成長を促し、それによりエネルギ変換効率の良
好なCIS蒲膜を形成させるようにしている(特開平1
0−74966号公報参照)。
2. Description of the Related Art Conventionally, a CIS type (Cu, In,
In a solar cell in which a thin film of (Se compound) is formed, by using soda lime glass SLG containing a large amount of sodium Na for the substrate, the Na component of the substrate is reduced when the CIS thin film is formed by vapor deposition. Diffusion promotes crystal growth, thereby forming a CIS film with good energy conversion efficiency.
0-74966).

【0003】[0003]

【発明が解決しようとする課題】解決しようとする問題
点は、SLG基板上にMo電極層を介してCIS薄膜を
蒸着によって形成させるに際して、成膜に必要な高い基
板温度(550℃以上)でSLG基板が軟化してしま
い、SLG基板上に形成したMo電極層との熱膨張係数
の差(Moの方が熱膨張係数が低い)によって、SLG
基板がMo電極層とともに反ってしまうことである。
The problem to be solved is that when a CIS thin film is formed on a SLG substrate via a Mo electrode layer by vapor deposition, a high substrate temperature (550 ° C. or higher) required for film formation is required. The SLG substrate is softened, and the difference in the thermal expansion coefficient between the SLG substrate and the Mo electrode layer formed on the SLG substrate (Mo has a lower thermal expansion coefficient) causes the SLG substrate to be softened.
That is, the substrate warps together with the Mo electrode layer.

【0004】図3は、SLG基板1′上にMoによる電
極層2が形成されたものを示している。
FIG. 3 shows an SLG substrate 1 'on which an electrode layer 2 made of Mo is formed.

【0005】図4は、電極層2上に蒸着によって光吸収
層3を形成したときに全体に反りを生じた状態を示して
いる。
FIG. 4 shows a state in which the entire light-absorbing layer 3 is warped when it is formed on the electrode layer 2 by vapor deposition.

【0006】その基板の反りは、CISの結晶成長に歪
を生じさせるなどの悪影響を与えるだけでなく、モジュ
ール化しにくいものになってしまう。この傾向は、基板
サイズが大きくなるほど顕著に現われるようになり、今
後の大面積化に支障をきたすものとなっている。
The warpage of the substrate not only has an adverse effect such as causing distortion in the crystal growth of CIS, but also makes it difficult to form a module. This tendency becomes more conspicuous as the size of the substrate increases, which hinders a future increase in area.

【0007】[0007]

【課題を解決するための手段】本発明は、基板上に金属
の電極層を介して光吸収層としてのCIS系(Cu,I
n,Seから選択される元素の化合物)またはCIGS
系(Cu,In,Ga,Seから選択される元素の化合
物)の薄膜を形成するようにした太陽電池において、そ
の基板にNa成分を多く含んだソーダライムガラスSL
Gなどの低融点材料によるものを用いても、CISまた
はCIGS薄膜の形成時に高温に耐えて基板が反ること
がないように、その基板をNa含有の第1の基板と高融
点材料からなる第2の基板との結合体として、その第1
の基板上に電極層を介して光吸収層を形成するようにし
ている。
According to the present invention, a CIS (Cu, I) as a light absorbing layer is provided on a substrate via a metal electrode layer.
compound of an element selected from n, Se) or CIGS
In a solar cell in which a thin film of a system (a compound of an element selected from Cu, In, Ga, and Se) is formed, a soda-lime glass SL whose substrate contains a large amount of Na component is provided.
Even if a substrate made of a low melting point material such as G is used, the substrate is made of a Na-containing first substrate and a high melting point material so that the substrate does not warp and withstand high temperatures when forming a CIS or CIGS thin film. As a combination with the second substrate, the first substrate
The light absorbing layer is formed on the substrate through the electrode layer.

【0008】[0008]

【実施例】本発明は、図1に示すように、太陽電池の基
板1を、Na含有の第1の基板11と、高融点材料から
なる第2の基板12との結合体としている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS In the present invention, as shown in FIG. 1, a substrate 1 of a solar cell is a combined body of a first substrate 11 containing Na and a second substrate 12 made of a high melting point material.

【0009】第1の基板11としては、Na含有率の高
いSiO2系のガラス、例えばソーダライムガラスSL
Gを用いる。また、第2の基板12としては、ノンアル
カリガラス、低アルカリガラス、石英ガラス、パイレッ
クスガラスなどのガラス材料を用いるほか、金属、セラ
ミックまたは高分子材料などを用いることも可能であ
る。
The first substrate 11 is made of a SiO 2 glass having a high Na content, for example, soda lime glass SL.
G is used. Further, as the second substrate 12, a glass material such as non-alkali glass, low alkali glass, quartz glass, and Pyrex glass can be used, and a metal, ceramic, or polymer material can be used.

【0010】第1の基板11と第2の基板12からなる
基板1の製造としては、例えば、第1の基板11と第2
の基板12とを接着させたり、または、第2の基板12
上に、SLGのディップコーティング、蒸着、イオンコ
ーティングや、Na含有率の高いSiO2系のガラス材
料のCVDやスピンオングラスによって第1の基板11
を形成させることが考えられる。
The production of the substrate 1 composed of the first substrate 11 and the second substrate 12 includes, for example, the first substrate 11 and the second substrate 12.
Or the second substrate 12
The first substrate 11 is formed thereon by dip coating, vapor deposition, ion coating of SLG, CVD of a SiO 2 glass material having a high Na content, or spin-on glass.
Can be formed.

【0011】第1の基板11上には、図2に示すよう
に、モリブデンMoなどの金属材料を用いてスパッタリ
ングなどによって電極層2が形成される。
As shown in FIG. 2, an electrode layer 2 is formed on the first substrate 11 by sputtering using a metal material such as molybdenum (Mo).

【0012】そして、その電極層2上には、光吸収層3
としてのCIS系またはCIGS系の薄膜が蒸着によっ
て形成される。
A light absorbing layer 3 is provided on the electrode layer 2.
A CIS-based or CIGS-based thin film is formed by vapor deposition.

【0013】その際、成膜に必要な高い基板温度(55
0℃以上)になって、低融点材料である第1の基板11
が軟化しても、第2の基板12が高融点材料からなって
いるので、熱的なストレスによって基板1が反るような
ことがなくなる。
At this time, the high substrate temperature (55
0 ° C. or higher), and the first substrate 11 which is a low melting point material
Is softened, the second substrate 12 is made of a high melting point material, so that the substrate 1 does not warp due to thermal stress.

【0014】また、蒸着によって光吸収層の蒲膜を形成
する際に、第1の基板11のNa成分が拡散して結晶成
長を促し、それによりエネルギ変換効率の良好な光吸収
膜3を形成させることができるようになる。
Further, when the film of the light absorbing layer is formed by vapor deposition, the Na component of the first substrate 11 diffuses to promote crystal growth, thereby forming the light absorbing film 3 having good energy conversion efficiency. Will be able to do that.

【0015】第2の基板12がCISまたはCIGSと
熱膨張係数が異なる材料であっても、その間にCISま
たはCIGSと熱膨張係数が比較的近いSLGなどの低
融点材料としての第1の基板11が介在しているので、
成膜される時に光吸収層3に与える熱膨張の差によるス
トレスを有効に吸収することができるようになる。
Even if the second substrate 12 is made of a material having a different thermal expansion coefficient from that of CIS or CIGS, the first substrate 11 as a low melting point material such as SLG having a thermal expansion coefficient relatively close to that of CIS or CIGS therebetween. Is interposed,
It is possible to effectively absorb the stress due to the difference in thermal expansion applied to the light absorbing layer 3 when forming the film.

【0016】[0016]

【発明の効果】以上、本発明によれば、基板上に金属の
電極層を介して光吸収層としてのCIS系またはCIG
S系の薄膜を形成するようにした太陽電池にあって、そ
の基板をNa含有の第1の基板と高融点材料からなる第
2の基板との結合体として、その第1の基板上に電極層
を介して光吸収層の薄膜を蒸着によって形成させるよう
にしているので、Na成分の拡散によって光吸収層の結
晶成長を促すように基板にNa含有量の多いソーダライ
ムガラスSLGなどの低融点材料によるものを用いて
も、その薄膜形成時に基板が反るようなことを防止でき
るようになる。
As described above, according to the present invention, a CIS or CIG as a light absorbing layer is formed on a substrate via a metal electrode layer.
In a solar cell in which an S-based thin film is formed, an electrode is formed on a first substrate containing Na and a second substrate made of a material having a high melting point. Since the thin film of the light absorbing layer is formed by vapor deposition through the layer, the substrate has a low melting point such as soda lime glass SLG having a high Na content so as to promote the crystal growth of the light absorbing layer by diffusion of the Na component. Even if a material is used, the substrate can be prevented from warping during the formation of the thin film.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例による太陽電池の基板を示す
正断面図である。
FIG. 1 is a front sectional view illustrating a substrate of a solar cell according to an embodiment of the present invention.

【図2】同実施例における基板上に電極層を介して光吸
収層が形成された状態を示す正断面図である。
FIG. 2 is a front sectional view showing a state in which a light absorbing layer is formed on a substrate via an electrode layer in the same example.

【図3】従来の太陽電池におけるSLG基板上に電極層
が形成された状態を示す正断面図である。
FIG. 3 is a front sectional view showing a state where an electrode layer is formed on an SLG substrate in a conventional solar cell.

【図4】従来の基板上に電極層を介して光吸収層を形成
したときの反りの発生状態を示す正断面図である。
FIG. 4 is a front sectional view showing a state in which warpage occurs when a light absorbing layer is formed on a conventional substrate via an electrode layer.

【符号の説明】[Explanation of symbols]

1 基板 11 第1の基板 12 第2の基板 2 電極層 3 光吸収層 DESCRIPTION OF SYMBOLS 1 Substrate 11 1st substrate 12 2nd substrate 2 Electrode layer 3 Light absorption layer

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 基板上に電極層を介して光吸収層として
のCISまたはCIGS系の薄膜を形成するようにした
太陽電池において、その基板がナトリウム含有の第1の
基板と高融点材料からなる第2の基板との結合体からな
り、その第1の基板上に電極層を介して光吸収層を形成
するようにしたことを特徴とする太陽電池。
1. A solar cell in which a CIS or CIGS-based thin film as a light absorbing layer is formed on a substrate via an electrode layer, wherein the substrate comprises a sodium-containing first substrate and a high melting point material. A solar cell comprising a combination with a second substrate, wherein a light absorption layer is formed on the first substrate via an electrode layer.
【請求項2】 第1の基板がNa含有率の高いSiO2
系のガラスからなり、第2の基板がノンアルカリガラ
ス、低アルカリガラス、金属、セラミックまたは高分子
材料からなることを特徴とする請求項1の記載による太
陽電池。
2. The method according to claim 1, wherein the first substrate is made of SiO2 having a high Na content.
The solar cell according to claim 1, wherein the second substrate is made of a non-alkali glass, a low alkali glass, a metal, a ceramic, or a polymer material.
JP10156608A 1998-04-28 1998-04-28 Solar cell Pending JPH11312817A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10156608A JPH11312817A (en) 1998-04-28 1998-04-28 Solar cell

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10156608A JPH11312817A (en) 1998-04-28 1998-04-28 Solar cell

Publications (1)

Publication Number Publication Date
JPH11312817A true JPH11312817A (en) 1999-11-09

Family

ID=15631467

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10156608A Pending JPH11312817A (en) 1998-04-28 1998-04-28 Solar cell

Country Status (1)

Country Link
JP (1) JPH11312817A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009041657A1 (en) 2007-09-28 2009-04-02 Fujifilm Corporation Substrate for solar cell and solar cell
WO2009041660A1 (en) 2007-09-28 2009-04-02 Fujifilm Corporation Substrate for solar cell and solar cell
WO2009041659A1 (en) 2007-09-28 2009-04-02 Fujifilm Corporation Solar cell
WO2010114159A1 (en) * 2009-03-30 2010-10-07 Fujifilm Corporation Photoelectric conversion device and manufacturing method thereof, solar cell, and target
JP2011233874A (en) * 2010-04-07 2011-11-17 Fujifilm Corp Metal substrate with isolation layer and photoelectric conversion element
JP5000779B1 (en) * 2011-04-05 2012-08-15 富士フイルム株式会社 Substrate for photoelectric conversion element with molybdenum electrode

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009041657A1 (en) 2007-09-28 2009-04-02 Fujifilm Corporation Substrate for solar cell and solar cell
WO2009041660A1 (en) 2007-09-28 2009-04-02 Fujifilm Corporation Substrate for solar cell and solar cell
WO2009041659A1 (en) 2007-09-28 2009-04-02 Fujifilm Corporation Solar cell
WO2010114159A1 (en) * 2009-03-30 2010-10-07 Fujifilm Corporation Photoelectric conversion device and manufacturing method thereof, solar cell, and target
JP2010258429A (en) * 2009-03-30 2010-11-11 Fujifilm Corp Photoelectric conversion device, and method of manufacturing the same, solar cell, and target
JP2011233874A (en) * 2010-04-07 2011-11-17 Fujifilm Corp Metal substrate with isolation layer and photoelectric conversion element
JP5000779B1 (en) * 2011-04-05 2012-08-15 富士フイルム株式会社 Substrate for photoelectric conversion element with molybdenum electrode

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