JPH11310463A - Cleaning of sintered aluminum nitride product - Google Patents

Cleaning of sintered aluminum nitride product

Info

Publication number
JPH11310463A
JPH11310463A JP10118890A JP11889098A JPH11310463A JP H11310463 A JPH11310463 A JP H11310463A JP 10118890 A JP10118890 A JP 10118890A JP 11889098 A JP11889098 A JP 11889098A JP H11310463 A JPH11310463 A JP H11310463A
Authority
JP
Japan
Prior art keywords
cleaning
aluminum nitride
phosphate
sintered body
particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10118890A
Other languages
Japanese (ja)
Other versions
JP3801351B2 (en
Inventor
Shigeaki Tanaka
茂明 多中
Tetsuo Wakamatsu
哲夫 若松
Yoshihiko Numata
吉彦 沼田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuyama Corp
Original Assignee
Tokuyama Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuyama Corp filed Critical Tokuyama Corp
Priority to JP11889098A priority Critical patent/JP3801351B2/en
Publication of JPH11310463A publication Critical patent/JPH11310463A/en
Application granted granted Critical
Publication of JP3801351B2 publication Critical patent/JP3801351B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Cleaning By Liquid Or Steam (AREA)
  • Ceramic Products (AREA)

Abstract

PROBLEM TO BE SOLVED: To effectively clean and remove particles such as aluminum nitride refuse or ceramic fragments both adhered on the surface of a sintered body by applying an aqueous solution of a phosphate to the cleaning of sintered aluminum nitride product. SOLUTION: An aqueous solution of a phosphate is applied to remove process refuse particles arisen is finishing aluminum nitride products which are used, e.g. as a substrate for mounting semiconductor elements. Sodium pyrophosphate, sodium tripolyphosphate, diammonium hydrogenphosphate, tribasic sodium phosphate, or the like are used as the phosphate, in its concentration of about 0.01-100 pts.wt. (pref. about 1-20 pts.wt.) based on 100 pts.wt. water. A known surfactant may be added to the phosphate to promote the cleaning. The cleaning is pref. conducted by the method of soaking, ultrasonic cleaning, or the like, and is performed at about 15-40 deg.C for about 1-40 h. (pref. about 5-20 h.).

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、窒化アルミニウム
焼結体の洗浄方法に関する。
The present invention relates to a method for cleaning an aluminum nitride sintered body.

【0002】[0002]

【従来の技術】最近のLSIの集積度の飛躍的な向上に
伴うICチップの発熱量増大により、従来より使用され
ているアルミナでは熱特性が不十分で、放熱が限界に達
しつつある。これに対し、窒化アルミニウムは、高熱伝
導率、高絶縁性を有し、半導体素子搭載用基板をはじ
め、各種放熱部品材料及び絶縁用基板として利用範囲が
広がっている。なかでも、半導体製造装置用部品とし
て、例えば、ウエハークランプ、静電チャック、サセプ
ター、電極材、絶縁材等として、注目されている。
2. Description of the Related Art Due to the recent increase in the degree of integration of LSIs, the amount of heat generated by IC chips has increased, and alumina used conventionally has insufficient thermal characteristics, and heat dissipation is reaching its limit. On the other hand, aluminum nitride has a high thermal conductivity and a high insulating property, and is widely used as a substrate for mounting semiconductor elements, various heat dissipating components, and an insulating substrate. Above all, attention has been paid to parts for semiconductor manufacturing equipment, for example, as wafer clamps, electrostatic chucks, susceptors, electrode materials, insulating materials, and the like.

【0003】この半導体製造プロセスでは、回路パター
ンの微細化が進み、LSIが高密度、高集積、高性能化
するにつれて、半導体製品の歩留りや品質、信頼性の点
から、浮遊微粒子(パーティクル)対策が最重要課題と
なっており、製造プロセスで使用される部品に対し、低
発塵性が要求されている。
In this semiconductor manufacturing process, as circuit patterns become finer and LSIs become higher in density, higher in integration, and higher in performance, measures against floating particles (particles) are taken into consideration in terms of the yield, quality and reliability of semiconductor products. Is the most important issue, and low dust generation is required for components used in the manufacturing process.

【0004】窒化アルミニウム焼結体を得る方法として
は、窒化アルミニウム粉末を顆粒に造粒した後、乾式プ
レスにより成形してプレス成形体を得、焼成する方法や
窒化アルミニウム粉末を湿式成形してグリーンシートを
得、これを焼成する方法等がある。このときに生じる収
縮は、成形体の密度、形状、厚み等の成形条件や焼成条
件によって変化するため、要求される寸法精度や表面粗
さ等を確保することが困難で、焼結後に研削や研磨によ
る仕上げ加工が行われる。その際に、発生する加工屑パ
ーティクルや有機物の汚れに対し、フッ硝酸や塩酸等の
酸やメチレンクロライド等の有機溶剤で洗浄する方法が
一般的に採用されている。
[0004] As a method of obtaining an aluminum nitride sintered body, aluminum nitride powder is granulated into granules, and then formed by dry pressing to obtain a press-formed body, followed by firing or wet molding of the aluminum nitride powder to form green. There is a method of obtaining a sheet and firing the sheet. The shrinkage that occurs at this time varies depending on the molding conditions such as the density, shape, and thickness of the molded body and the firing conditions, and thus it is difficult to ensure required dimensional accuracy and surface roughness. Finishing by polishing is performed. At that time, a method is generally adopted in which generated processing dust particles and stains of organic substances are washed with an acid such as hydrofluoric nitric acid or hydrochloric acid or an organic solvent such as methylene chloride.

【0005】また、特開平3−265586号には、E
DTA(エチレンジアミン四酢酸)、NH4OH、H2
2及びH2Oを含有する溶液を用いた表面エッチング処理
により機械的な傷やパーティクルを除去する方法が開示
されている。
Japanese Patent Application Laid-Open No. 3-265586 discloses an E
DTA (ethylenediaminetetraacetic acid), NH 4 OH, H 2 O
A method for removing mechanical scratches and particles by surface etching using a solution containing 2 and H 2 O is disclosed.

【0006】[0006]

【発明が解決しようとする課題】しかしながら、上記の
フッ硝酸や塩酸等の酸やメチレンクロライド等の有機溶
剤による洗浄方法では、窒化アルミニウム焼結体表面の
パーティクル除去能力に乏しく、更に、フッ酸は毒物で
あることから取り扱いにかなりの注意が必要である。ま
た、H22溶液を用いる表面エッチング処理では、H2
2は、該溶液中で分解するため、溶液管理が難しい等
の問題があった。
However, in the above-mentioned cleaning method using an acid such as hydrofluoric nitric acid or hydrochloric acid or an organic solvent such as methylene chloride, the ability of the aluminum nitride sintered body to remove particles is poor. Because it is a poison, it requires considerable care in handling. In the surface etching using an H 2 O 2 solution, H 2 O 2
O 2 in order to decompose the solution in, there is a problem of difficult solution management.

【0007】[0007]

【課題を解決するための手段】本発明者らは、上記問題
を解決すべく鋭意研究を重ねてきた。その結果、パーテ
ィクル源である窒化アルミニウムに対しエッチング効果
があり、しかも、分散作用やケン化作用、金属イオン封
鎖作用等の機能を有するリン酸塩水溶液が、パーティク
ル除去能力に優れ、窒化アルミニウム焼結体の洗浄に有
効であることを見い出し、本発明を提案するに至った。
即ち、本発明は、リン酸塩の水溶液を用いることを特徴
とする窒化アルミニウム焼結体の洗浄方法である。
Means for Solving the Problems The present inventors have intensively studied to solve the above problems. As a result, a phosphate aqueous solution having an etching effect on aluminum nitride as a particle source and having functions such as a dispersing action, a saponification action, and a sequestering action has an excellent particle removing ability, and has an aluminum nitride sintering property. The present inventors have found that the present invention is effective for body washing, and have proposed the present invention.
That is, the present invention is a method for cleaning an aluminum nitride sintered body, which comprises using an aqueous solution of a phosphate.

【0008】[0008]

【発明の実施の形態】本発明における洗浄とは、窒化ア
ルミニウム焼結体の表面に付着した窒化アルミニウム屑
やセラミック片、金属粉等のパーティクルを除去するこ
とをいう。
BEST MODE FOR CARRYING OUT THE INVENTION Cleaning in the present invention means removing particles such as aluminum nitride dust, ceramic pieces, metal powder and the like adhering to the surface of an aluminum nitride sintered body.

【0009】本発明に使用する窒化アルミニウム焼結体
は、特に制限されるものではなく、公知の窒化アルミニ
ウム焼結体に対して適用することができる。
The aluminum nitride sintered body used in the present invention is not particularly limited, and can be applied to known aluminum nitride sintered bodies.

【0010】上記窒化アルミニウム焼結体は、一般に、
窒化アルミニウム単独又は窒化アルミニウムと焼結助剤
0.1〜10重量%から構成されるが、更にアルミナ等
が共存していてもよい。焼結助剤としては、アルカリ土
類化合物や希土類化合物等の公知の焼結助剤より一種以
上を選択して用いられる。
The above aluminum nitride sintered body is generally
It is composed of aluminum nitride alone or aluminum nitride and a sintering additive in an amount of 0.1 to 10% by weight. As the sintering aid, one or more selected from known sintering aids such as alkaline earth compounds and rare earth compounds are used.

【0011】本発明において使用されるリン酸塩は、リ
ン酸の可溶性塩であればよいが、好適に使用しうるリン
酸塩を具体的に例示すると、リン酸二水素ナトリウム、
リン酸二水素カリウム、リン酸二水素アンモニウム、リ
ン酸水素二ナトリウム、リン酸水素二カリウム、リン酸
水素二アンモニウム、リン酸三ナトリウム、リン酸三ア
ンモニウム、リン酸三カリウム等のオルトリン酸塩、ピ
ロリン酸ナトリウム、ピロリン酸アンモニウム等のピロ
リン酸塩、トリポリリン酸ナトリウム等のポリリン酸
塩、トリメタリン酸ナトリウム、トリメタリン酸アンモ
ニウム、トリメタリン酸カリウム等のメタリン酸塩、亜
リン酸ナトリウム、亜リン酸アンモニウム、亜リン酸カ
リウム等の亜リン酸塩、ピロ亜リン酸アンモニウム、ピ
ロ亜リン酸カリウム等のピロ亜リン酸塩等が挙げられ、
単独または二種以上を混合して使用される。前記リン酸
塩のなかでも、陽イオン成分としては、アルカリ金属イ
オン又はアンモニウムイオンが好ましく、特に、ピロリ
ン酸ナトリウム、トリポリリン酸ナトリウム、リン酸三
ナトリウム、リン酸水素二ナトリウム、リン酸三アンモ
ニウム、リン酸水素二アンモニウムがパーティクル除去
能力に優れるため、好適に採用される。
The phosphate used in the present invention may be any soluble salt of phosphoric acid. Specific examples of the phosphate that can be preferably used include sodium dihydrogen phosphate,
Orthophosphates such as potassium dihydrogen phosphate, ammonium dihydrogen phosphate, disodium hydrogen phosphate, dipotassium hydrogen phosphate, diammonium hydrogen phosphate, trisodium phosphate, triammonium phosphate, and tripotassium phosphate; Pyrophosphates such as sodium pyrophosphate and ammonium pyrophosphate; polyphosphates such as sodium tripolyphosphate; metaphosphates such as sodium trimetaphosphate, ammonium trimetaphosphate and potassium trimetaphosphate; sodium phosphite; ammonium phosphite; Phosphites such as potassium phosphate, ammonium pyrophosphite, pyrophosphites such as potassium pyrophosphite, and the like;
Used alone or in combination of two or more. Among the phosphates, the cation component is preferably an alkali metal ion or an ammonium ion. Particularly, sodium pyrophosphate, sodium tripolyphosphate, trisodium phosphate, disodium hydrogenphosphate, triammonium phosphate, and phosphorus Diammonium oxyhydrogen is preferably used because of its excellent particle removal ability.

【0012】上記リン酸塩水溶液の濃度は、リン酸塩の
種類によって適宜選択すれば良いが、一般的に、水10
0重量部に対して0.01〜100重量部、好ましく
は、0.05〜50重量部、更に好ましくは1〜20重
量部の範囲が好ましい。即ち、かかる濃度は、窒化アル
ミニウム焼結体にダメージを与えること無く、効果的に
パーティクルを除去できるため好適に採用される。
The concentration of the aqueous phosphate solution may be appropriately selected depending on the type of the phosphate.
The range is preferably 0.01 to 100 parts by weight, preferably 0.05 to 50 parts by weight, and more preferably 1 to 20 parts by weight with respect to 0 parts by weight. That is, such a concentration is suitably adopted because particles can be effectively removed without damaging the aluminum nitride sintered body.

【0013】本発明において、リン酸塩水溶液に公知の
界面活性剤を添加すると、該水溶液の表面張力が低下し
て、洗浄を促進するため、更に効果的である。かかる用
途に用いられる界面活性剤としては、非イオン性界面活
性剤、または、アニオン性界面活性剤が好ましく、具体
的には、ポリオキシエチレンソルビタンモノステアレー
ト等のポリオキシエチレンソルビタン脂肪酸エステル
類、ポリオキシエチレンステアリルアミン等のポリオキ
シエチレンアルキルアミン類、ポリオキシエチレンオレ
イン酸アミド等のポリオキシエチレンアルキルアミド
類、ポリオキシエチレンラウリルエーテル等のポリオキ
シエチレンアルキルエーテル類、ポリオキシエチレンオ
クチルフェニルエーテル等のポリオキシエチレンアルキ
ルフェニルエーテル類、ポリエチレングリコールモノラ
ウレート等のポリエチレングリコール脂肪酸エステル
類、デカグリセリンラウレート等のポリグリセリン脂肪
酸エステル類等の非イオン性界面活性剤、または、ラウ
リル硫酸ナトリウム等のアルキル硫酸塩、2−エチルヘ
キシルスルホコハク酸ナトリウム等のアルキルスルホコ
ハク酸塩、ポリオキシエチレンラウリルエーテル硫酸ナ
トリウム等のポリオキシエチレンアルキルエーテル硫酸
塩、ポリオキシエチレンノニルフェニルエーテル硫酸ナ
トリウム等のポリオキシエチレンアルキルフェニルエー
テル硫酸塩、α−オレフィンスルホン酸ナトリウム等の
アルキルスルホン酸塩、ドデシルベンゼンスルホン酸ナ
トリウム等のアルキルベンゼンスルホン酸塩、ラウリル
リン酸ナトリウム等のアルキルリン酸塩等のアニオン性
界面活性剤である。
In the present invention, when a known surfactant is added to the aqueous solution of phosphate, the surface tension of the aqueous solution is reduced, and cleaning is promoted, which is more effective. As the surfactant used in such applications, a nonionic surfactant or an anionic surfactant is preferable, and specifically, polyoxyethylene sorbitan fatty acid esters such as polyoxyethylene sorbitan monostearate, Polyoxyethylene alkylamines such as polyoxyethylene stearylamine, polyoxyethylene alkylamides such as polyoxyethylene oleamide, polyoxyethylene alkyl ethers such as polyoxyethylene lauryl ether, polyoxyethylene octyl phenyl ether, etc. Polyoxyethylene alkyl phenyl ethers, polyethylene glycol fatty acid esters such as polyethylene glycol monolaurate, and polyglycerin fatty acid esters such as decaglycerin laurate Nonionic surfactants or alkyl sulfates such as sodium lauryl sulfate, alkyl sulfosuccinates such as sodium 2-ethylhexylsulfosuccinate, polyoxyethylene alkyl ether sulfates such as sodium polyoxyethylene lauryl ether sulfate, polyoxy Polyoxyethylene alkyl phenyl ether sulfates such as sodium ethylene nonyl phenyl ether sulfate; alkyl sulfonates such as sodium α-olefin sulfonate; alkyl benzene sulfonates such as sodium dodecyl benzene sulfonate; alkyl phosphorus such as sodium lauryl phosphate Anionic surfactants such as acid salts.

【0014】本発明におけるリン酸塩水溶液による窒化
アルミニウム焼結体の洗浄方法に、特に制限はないが、
浸け置き、超音波洗浄、撹拌洗浄等の一般的な湿式洗浄
法が好適に採用される。リン酸塩水溶液の温度や洗浄時
間は、洗浄方法によって任意に調整すればよいが、一般
的に、15〜40℃の温度で1〜40時間、好ましく
は、5〜20時間の洗浄時間が好適に採用される。ま
た、リン酸塩水溶液で洗浄した後、窒化アルミニウム焼
結体の使用目的に合わせて、塩酸や硫酸などの無機酸や
酢酸などの有機酸を用いた酸洗及び水洗等の後洗浄を適
宜組み合わせて実施する事もできる。また後洗浄におい
て、超音波洗浄を使用することは、パーティクル除去を
完全にするために好ましい。
The method for cleaning the aluminum nitride sintered body with the aqueous phosphate solution in the present invention is not particularly limited.
A common wet cleaning method such as immersion, ultrasonic cleaning, and stirring cleaning is suitably employed. The temperature and the washing time of the phosphate aqueous solution may be arbitrarily adjusted depending on the washing method. Generally, the washing time is preferably 1 to 40 hours at a temperature of 15 to 40 ° C., and more preferably 5 to 20 hours. Adopted to. Also, after washing with a phosphate aqueous solution, post-washing such as pickling with an inorganic acid such as hydrochloric acid or sulfuric acid or an organic acid such as acetic acid and washing with water are appropriately combined according to the intended use of the aluminum nitride sintered body. Can also be implemented. In the post-cleaning, it is preferable to use ultrasonic cleaning in order to completely remove particles.

【0015】[0015]

【発明の作用】本発明におけるリン酸塩水溶液は、アル
カリ性から弱酸性で、パーティクル源である窒化アルミ
ニウムに対し、エッチング剤としてはたらき、窒化アル
ミニウムパーティクルを選択的に溶解する。更に、リン
酸塩は、金属イオンと結合して可溶性の錯塩を形成する
ので金属イオン封鎖作用や該水溶液中に分散したパーテ
ィクルの再付着を防止する効果もあるため、パーティク
ル除去能力に優れているものと考えられる。
The aqueous phosphate solution of the present invention is alkaline to weakly acidic, and acts as an etching agent for aluminum nitride as a particle source to selectively dissolve aluminum nitride particles. Furthermore, phosphates combine with metal ions to form a soluble complex salt, and therefore have an effect of sequestering metal ions and an effect of preventing reattachment of particles dispersed in the aqueous solution, and thus have an excellent particle removing ability. It is considered something.

【0016】また、該リン酸塩水溶液による窒化アルミ
ニウムのエッチング作用により、窒化アルミニウム焼結
体の加工時に生じた表面近傍の残留応力が除去されるこ
とで、使用環境下での新たなパーティクルの発生を抑制
できると考えられる。
Further, the residual stress near the surface generated during the processing of the aluminum nitride sintered body is removed by the etching action of the aluminum nitride by the aqueous phosphate solution, so that new particles are generated in the use environment. It is thought that can be suppressed.

【0017】[0017]

【発明の効果】本発明の窒化アルミニウム焼結体の洗浄
に用いるリン酸塩水溶液は、溶液管理が簡便で、安全
面、装置材質の選定の点で優れ、また、該リン酸塩水溶
液は、ケン化作用により油汚れに対し洗浄効果があり、
有機溶剤による洗浄を簡略化できるため、工業的に非常
に有利である。本発明により、窒化アルミニウム焼結体
の低パーティクル化が可能となり、クリーン技術が要求
される半導体製造装置用部品等の半導体関連素材として
利用できる。また、窒化アルミニウム焼結体表面へのア
ルミナ被膜やシリカ被膜等の各種表面被膜の形成やファ
インパターン形成等の各種メタライズ、或いは、金属や
他素材との接合及び接着に対し、密着強度が向上するた
め信頼性を高めることができる。本発明により、窒化ア
ルミニウム焼結体の工業材料としての用途をますます広
げるものである。
The aqueous phosphate solution used for cleaning the aluminum nitride sintered body of the present invention is easy to manage, is excellent in safety, and is excellent in selecting equipment materials. Has a cleaning effect on oil stains due to saponification,
Since cleaning with an organic solvent can be simplified, it is industrially very advantageous. INDUSTRIAL APPLICABILITY According to the present invention, it is possible to reduce particles of an aluminum nitride sintered body, and it can be used as a semiconductor-related material such as a part for a semiconductor manufacturing apparatus requiring a clean technology. In addition, the adhesion strength is improved with respect to the formation of various surface coatings such as an alumina coating and a silica coating on the surface of an aluminum nitride sintered body, various metallizations such as formation of a fine pattern, or bonding and bonding with metals and other materials. Therefore, reliability can be improved. According to the present invention, the use of an aluminum nitride sintered body as an industrial material is further expanded.

【0018】[0018]

【実施例】本発明をさらに具体的に説明するために、以
下に実施例及び比較例を挙げるが、本発明はこれらの実
施例に限定されるものではない。
EXAMPLES The present invention will be described in more detail with reference to Examples and Comparative Examples, but the present invention is not limited to these Examples.

【0019】実施例1 相対密度99%で助剤無添加の窒化アルミニウム焼結体
を、5×5×3mmに切断、平面研削し、試験片を作製
した。試験片表面のパーティクルは、日本電子(株)製
の走査型電子顕微鏡「JSM−5400」を用いて、焼
結体表面の任意の各10点を倍率3500倍で観察し、
計50視野のパーティクルを計数した。試験前の焼結体
表面のパーティクル数は、単位平方ミリメートル当り2
5200個/mm2であった。
Example 1 An aluminum nitride sintered body having a relative density of 99% and containing no auxiliary agent was cut into 5 × 5 × 3 mm and ground to prepare a test piece. Particles on the surface of the test piece were observed using a scanning electron microscope "JSM-5400" manufactured by JEOL Ltd. at any 10 points on the surface of the sintered body at a magnification of 3500 times.
Particles in a total of 50 visual fields were counted. The number of particles on the surface of the sintered body before the test was 2 per square millimeter.
It was 5200 pieces / mm 2 .

【0020】洗浄液として、ピロリン酸ナトリウムの5
重量%水溶液をテフロン製容器に50cc入れ、次い
で、前記窒化アルミニウム焼結体の試験片を5枚浸漬
し、室温で16時間放置した。その後、50ccの超純
水に10分間浸漬した後、エアーブロー乾燥した。洗浄
後の焼結体表面のパーティクルは、単位平方ミリメート
ル当り8個/mm2であった。また、洗浄後の焼結体外
観に変化は認められなかった。
As a washing solution, sodium pyrophosphate 5
A 50% by weight aqueous solution was placed in a Teflon-made container, and then five test pieces of the aluminum nitride sintered body were immersed and left at room temperature for 16 hours. Then, after being immersed in 50 cc of ultrapure water for 10 minutes, it was air blow dried. The number of particles on the surface of the sintered body after washing was 8 particles / mm 2 per square millimeter. No change was observed in the appearance of the sintered body after washing.

【0021】実施例2 相対密度99%で焼結助剤のイットリアを5重量%含有
する窒化アルミニウム焼結体を使用したこと以外は、実
施例1と同様にして実施した。試験前の焼結体表面のパ
ーティクル数は、27800個/mm2であった。洗浄
後の焼結体表面の残留パーティクルは、10個/mm2
で、焼結体外観に変化は認められなかった。
Example 2 Example 2 was carried out in the same manner as in Example 1 except that an aluminum nitride sintered body having a relative density of 99% and containing 5% by weight of yttria as a sintering aid was used. The number of particles on the surface of the sintered body before the test was 27,800 / mm 2 . The residual particles on the surface of the sintered body after the cleaning were 10 particles / mm 2
No change was observed in the appearance of the sintered body.

【0022】実施例3 洗浄液として、リン酸水素二アンモニウムの5重量%水
溶液を使用したこと以外は、実施例1と同様にして実施
した。洗浄後の焼結体表面の残留パーティクル数は、2
5個/mm2であった。また、洗浄後の焼結体外観に変
化は認められなかった。
Example 3 The same procedure as in Example 1 was carried out except that a 5% by weight aqueous solution of diammonium hydrogen phosphate was used as a washing liquid. The number of remaining particles on the surface of the sintered body after cleaning is 2
It was 5 pieces / mm 2 . No change was observed in the appearance of the sintered body after washing.

【0023】実施例4 洗浄液として、リン酸三アンモニウムの5重量%水溶液
を使用したこと以外は、実施例1と同様にして実施し
た。洗浄後の焼結体表面の残留パーティクル数は、20
個/mm2であった。また、洗浄後の焼結体外観に変化
は認められなかった。
Example 4 The procedure of Example 1 was repeated, except that a 5% by weight aqueous solution of triammonium phosphate was used as a washing solution. The number of residual particles on the surface of the sintered body after cleaning is 20
Pieces / mm 2 . No change was observed in the appearance of the sintered body after washing.

【0024】実施例5 洗浄液として、トリポリリン酸ナトリウムの5重量%水
溶液を使用したこと以外は、実施例1と同様にして実施
した。洗浄後の焼結体表面の残留パーティクル数は、1
0個/mm2であった。また、洗浄後の焼結体外観に変
化は認められなかった。
Example 5 The same procedure as in Example 1 was carried out except that a 5% by weight aqueous solution of sodium tripolyphosphate was used as a washing liquid. The number of remaining particles on the surface of the sintered body after cleaning is 1
It was 0 pieces / mm 2 . No change was observed in the appearance of the sintered body after washing.

【0025】実施例6 洗浄液として、ピロリン酸ナトリウム5重量%、界面活
性剤としてポリオキシエチレンオクチルフェニルエーテ
ル0.5重量%の混合水溶液を使用したこと以外は、実
施例1と同様にして実施した。洗浄後の焼結体表面の残
留パーティクル数は、3個/mm2であった。また、洗
浄後の焼結体外観に変化は認めれなかった。
Example 6 The same procedure as in Example 1 was carried out except that a mixed aqueous solution containing 5% by weight of sodium pyrophosphate and 0.5% by weight of polyoxyethylene octylphenyl ether as a surfactant was used as a washing liquid. . The number of residual particles on the surface of the sintered body after the cleaning was 3 / mm 2 . Also, no change was observed in the appearance of the sintered body after washing.

【0026】実施例7 洗浄液として、ピロリン酸ナトリウム3重量%、トリポ
リリン酸ナトリウム2重量%の混合水溶液を使用したこ
と以外は、実施例1と同様にして実施した。洗浄後の焼
結体表面の残留パーティクル数は、12個/mm2であ
った。また、洗浄後の焼結体外観に変化は認められなか
った。
Example 7 The same procedure as in Example 1 was carried out except that a mixed aqueous solution of 3% by weight of sodium pyrophosphate and 2% by weight of sodium tripolyphosphate was used as a washing liquid. The number of residual particles on the surface of the sintered body after the cleaning was 12 / mm 2 . No change was observed in the appearance of the sintered body after washing.

【0027】実施例8 実施例1において、ピロリン酸ナトリウム水溶液の濃度
を10重量%としたこと以外は、実施例1と同様にして
実施した。洗浄後の焼結体表面の残留パーティクル数
は、7個/mm2であった。洗浄後の焼結体外観に変化
は認められなかった。
Example 8 Example 8 was carried out in the same manner as in Example 1, except that the concentration of the sodium pyrophosphate aqueous solution was changed to 10% by weight. The number of residual particles on the surface of the sintered body after the cleaning was 7 / mm 2 . No change was observed in the appearance of the sintered body after washing.

【0028】実施例9 実施例1において、ピロリン酸ナトリウム水溶液への浸
漬時間を5時間にしたこと以外は、実施例1と同様にし
て実施した。洗浄後の焼結体表面の残留パーティクル数
は、32個/mm2であった。また、洗浄後の焼結体外
観に変化は認められなかった。
Example 9 Example 9 was carried out in the same manner as in Example 1, except that the immersion time in the sodium pyrophosphate aqueous solution was changed to 5 hours. The number of residual particles on the surface of the sintered body after the cleaning was 32 / mm 2 . No change was observed in the appearance of the sintered body after washing.

【0029】比較例1 洗浄液として、水酸化ナトリウムの5重量%水溶液を使
用したこと以外は、実施例1と同様にして実施した。洗
浄後の焼結体表面の残留パーティクル数は、75個/m
2であった。また、洗浄後の焼結体外観は、浸食によ
り白っぽく変色していた。
Comparative Example 1 The same procedure as in Example 1 was carried out except that a 5% by weight aqueous solution of sodium hydroxide was used as a washing liquid. The number of residual particles on the surface of the sintered body after cleaning is 75 particles / m.
m 2 . Further, the appearance of the sintered body after washing was discolored whitish due to erosion.

【0030】比較例2 洗浄液として、硫酸ナトリウムの5重量%水溶液を使用
したこと以外は、実施例1と同様にして実施した。洗浄
後の焼結体表面の残留パーティクル数は、13000個
/mm2であった。また、洗浄後の焼結体外観に変化は
認めれなかった。
Comparative Example 2 The same procedure as in Example 1 was carried out except that a 5% by weight aqueous solution of sodium sulfate was used as a washing liquid. The number of residual particles on the surface of the sintered body after the cleaning was 13000 / mm 2 . Also, no change was observed in the appearance of the sintered body after washing.

【0031】比較例3 洗浄液として、5%塩酸を使用したこと以外は、実施例
1と同様にして実施した。洗浄後の焼結体表面の残留パ
ーティクル数は、8100個/mm2であった。また、
洗浄後の焼結体外観に変化は認められなかった。
Comparative Example 3 The same procedure as in Example 1 was carried out except that 5% hydrochloric acid was used as a cleaning solution. The number of residual particles on the surface of the sintered body after the cleaning was 8,100 particles / mm 2 . Also,
No change was observed in the appearance of the sintered body after washing.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】リン酸塩水溶液を用いることを特徴とする
窒化アルミニウム焼結体の洗浄方法
1. A method for cleaning an aluminum nitride sintered body, comprising using a phosphate aqueous solution.
JP11889098A 1998-04-28 1998-04-28 Cleaning method for sintered aluminum nitride Expired - Lifetime JP3801351B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11889098A JP3801351B2 (en) 1998-04-28 1998-04-28 Cleaning method for sintered aluminum nitride

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11889098A JP3801351B2 (en) 1998-04-28 1998-04-28 Cleaning method for sintered aluminum nitride

Publications (2)

Publication Number Publication Date
JPH11310463A true JPH11310463A (en) 1999-11-09
JP3801351B2 JP3801351B2 (en) 2006-07-26

Family

ID=14747690

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3801351B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005276891A (en) * 2004-03-23 2005-10-06 Ngk Insulators Ltd Ceramic susceptor and cleaning method thereof
US7211156B2 (en) 2001-11-01 2007-05-01 Ngk Insulators, Ltd. Method for cleaning a ceramic member for use in a system for producing semiconductors, a cleaning agent and a combination of cleaning agents
JP2011105539A (en) * 2009-11-17 2011-06-02 Showa Denko Kk Method for cleaning aluminum nitride sintered compact
CN113061495A (en) * 2021-03-11 2021-07-02 山东省食品药品检验研究院 Cleaning fluid for liquid chromatogram on-line filter element and one-way valve

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7211156B2 (en) 2001-11-01 2007-05-01 Ngk Insulators, Ltd. Method for cleaning a ceramic member for use in a system for producing semiconductors, a cleaning agent and a combination of cleaning agents
JP2005276891A (en) * 2004-03-23 2005-10-06 Ngk Insulators Ltd Ceramic susceptor and cleaning method thereof
JP4632290B2 (en) * 2004-03-23 2011-02-16 日本碍子株式会社 Cleaning method for aluminum nitride susceptor
JP2011105539A (en) * 2009-11-17 2011-06-02 Showa Denko Kk Method for cleaning aluminum nitride sintered compact
CN113061495A (en) * 2021-03-11 2021-07-02 山东省食品药品检验研究院 Cleaning fluid for liquid chromatogram on-line filter element and one-way valve

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