JPH11297265A - Charged particle plotter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To display an image, and accumulate particulates or to work the part of a sample by electrifying, accelerating and focusing the particulates, and detecting an absorbing or radiating signal when irradiating the desired part of the sample. SOLUTION: Charged particle beams emitted by a particle gun l are converged by a focusing lens 3 to be irradiated on an impact detector 8. In this case, the charged particle beams are two-dimensionally scanned on the impact detector 8 by a deflector 4, secondary electrons are emitted in response to these, and an image signal is outputted through a secondary electron detector 10 to display a secondary electron image. At the same time, a light image and a long wave length electromagnetic wave image of charged particles are displayed by detecting the emitting light and a long wave length electromagnetic wave of the impact detector 8 in synchronism with an absorbing electric current image of the charged particles absorbed by the impact detector 8 and a scanning signal supplied to the deflector 4. Instead of the impact detector 8, a sample 7 is arranged, and the charged particles are accumulated by irradiation of the charged particle beams to the prescribed part, or the part is worked by irradiation of the charged particle beams.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a charged particle drawing apparatus for depositing or processing a charged particle beam supplied with charged particles.

[0002]

2. Description of the Related Art Conventionally, an ion microscope ionizes atoms such as gallium and accelerates the electric field. For example, the tip of the chip is heated by impregnating it with gallium, and a high electric field is applied. Two-dimensional scanning is performed in a state where a desired portion on the sample is finely focused and irradiated, and secondary ions and secondary electrons generated at that time are detected, and an image of the desired portion is displayed.

The ion implantation apparatus discharges and ionizes in an atmosphere containing desired atoms and applies an electric field to accelerate the ions to implant desired ions into a surface layer such as a wafer.

[0004]

However, in the above-mentioned conventional technique, atoms are ionized, electric field acceleration and focusing are performed, a desired portion is scanned, and secondary ions and secondary electrons generated are detected and imaged. Because it was designed to generate or discharge and ionize what was ionized and accelerated it into the surface layer of the wafer by applying an electric field, a high electric field was applied in a heated state to extract ions, or to discharge and ionize Therefore, there is a problem that the method cannot be applied to substances and particles that cannot be converted into ions, for example, fine particles of carbone (C) and fine particles of metal (such as solder).

[0005] The present invention solves these problems,
The microparticles are charged, accelerated and focused to irradiate a desired part of the sample, and the signal absorbed or emitted at that time is detected to display an image, and the fine particles are deposited on the part of the sample or the part of the sample is sampled. It is intended to process.

[0006]

Means for solving the problem will be described with reference to FIG. In FIG. 1, a particle gun 1
Supplies particles, charges the supplied particles, and emits the charged particles as a charged particle beam.

The deflector 4 deflects the position where the lens 3 irradiates a beam narrowly focused on the sample.
The lens 3 focuses a beam of charged particles emitted from the particle gun 1 and irradiates the beam as a narrow beam on a sample.

Next, the operation will be described. A particle gun 1 supplies particles and emits a beam of charged charged particles, and a lens 3
Focuses the beam of the charged particles emitted from the particle gun 1 and irradiates the beam as a narrow beam on the sample, and the deflector 4 deflects the irradiation position of the beam narrowed on the sample by the lens 3. I have.

At this time, there is provided a detector for detecting a signal absorbed by the sample or a signal emitted from the sample when a beam narrowly focused on the sample is scanned by using the deflector 4.
An image is displayed on a display device based on the signal detected by the detector.

Further, a beam narrowly focused on the sample using the deflector 4 is positioned at a predetermined position, and charged particles are deposited on the sample, or the sample is processed by the charged particles.

Therefore, the microparticles are charged, accelerated and focused, and irradiate a desired portion of the sample. At that time, a signal absorbed or emitted is detected, an image is displayed, and the microparticles are displayed on the sample portion. It becomes possible to process the deposition or the site of the sample.

[0012]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, an embodiment and operation of the present invention will be sequentially described in detail with reference to FIGS.

FIG. 1 is a block diagram showing an embodiment of the present invention.
In FIG. 1, a particle gun 1 supplies particles (for example, particles of about several μm to several tens μmφ of carbon or solder) little by little, charges them, and discharges them as charged particles.

The deflector 4 deflects the irradiation position of the beam narrowly focused on the sample by the lens 31, and is an electrostatic deflector. The lens 31 focuses the charged particles emitted from the particle gun 1 and irradiates it as a finely focused beam on the sample. The lens 31 is an electrostatic lens and is called a focusing lens or an objective lens. .

The shock detector 8 detects a kinetic energy when a charged particle collides with the sample (or the shock detector placed instead of the sample) by placing the sample instead of or on the sample. This makes it possible to detect whether or not the charged particles have reached the sample. Further, the detection unit of the shock detector is subdivided to detect each pixel and generate image data. Based on the generated image data, the kinetic energy of the two-dimensional charged particles when they collide is displayed on the screen.

The scintillator 31 converts secondary electrons emitted by the collision of the charged particles with the sample (or the shock detector 8 shown) into light. The light guide 32 is
The light generated by the scintillator 31 is efficiently guided to the photomultiplier tube 33.

The photomultiplier tube 33 doubles photoelectrons generated by light incident from the light guide 32 and outputs an amplified signal as an image signal. The shield cylinder 34 is for preventing fluctuation of secondary electrons due to external magnetism (for example, a commercial frequency generated by a power transformer or various oscillators or a magnetic field of a predetermined frequency).

Next, charged particles are sampled under the configuration of FIG. 1 (or the illustrated shock detector 8 arranged in place of the sample).
Next, the operation of irradiating and displaying an image, depositing charged particles, and processing a sample with charged particles will be described in detail.

(1) Fine carborne particles (for example, 10 μmφ) are supplied from the particle gun 1 to discharge charged charged particles. (2) The charged particles emitted in (1) are irradiated by the lens 3 onto a shock detector 8 as a sample as a narrow beam (charged particle beam).

(3) At this time, the deflector 4 deflects the charged particle beam and puts it on the shock detector 8 arranged in place of the sample.
Two-dimensional scanning is performed in the X direction and the Y direction. (4) In response to the two-dimensional scanning of the charged particle beam on the impact detector 8 in (3), secondary electrons are emitted,
This is detected by a secondary electron detector consisting of 31 to 34 and amplified to output an image signal.

(5) In synchronization with the X-direction and Y-direction scanning signals supplied to the deflector 4, the brightness is modulated by the image signal output in (4) on an image display device (not shown), and the secondary electrons are emitted. Display an image.

(6) At the same time, the image signal detected by each pixel of the shock detector 8 is displayed on an image display device (not shown) as a two-dimensional image of the degree of shock of each pixel, or the image signal is deflected. In synchronization with the scanning signals in the X and Y directions supplied to the detector 4, the brightness is modulated by the sum signal of the image signals from the respective pixels of the shock detector 8 on an image display device (not shown) so For example, an image (a two-dimensional impact image in which a strong portion is bright and a weak portion is dark) is displayed. Similarly, an impact detector 8 placed in place of a sample on an image display device (not shown) in synchronization with the X-direction and Y-direction scanning signals supplied to the deflector 4.
The brightness is modulated by the current absorbed by the device to display a so-called absorbed current image of the charged particles.
In the image display device (not shown) in synchronization with the scanning signals in the Y-direction and the Y-direction, a light image of a so-called charged particle whose luminance is modulated by detecting light emitted from the shock detector 8 or a long-wavelength electromagnetic wave as a sample, For example, displaying a long-wavelength electromagnetic wave image.

(7) Instead of the shock detector 8, a sample is placed, and a predetermined portion is irradiated with a beam of charged particles to deposit the charged particles (for example, deposit carbon or solder), or The site is irradiated with a beam of charged particles to process the predetermined site.

FIG. 2 is a block diagram showing a specific example of the present invention. In FIG. 2, the particle gun 1 includes a vibration generator 11, a particle valve 12, an actuator 13, a charging electrode 14, and a focusing electrode 1.
5 and an anode 16.

The vibration generator / actuator 11 applies vibration to the particles and supplies the fine particles from above to below. Here, the vibration generator / actuator 11 generates both the vertical and horizontal vibrations. For example, electrodes are provided at both ends of barium titanate, and a voltage having a predetermined waveform (for example, a rectangular wave or a sine wave) is applied between the electrodes to generate vibration.

The particle valve 12 is a valve for controlling the amount of particles supplied when the actuator 13 is vibrated in the vertical and horizontal directions by the vibration generator 11. The actuator 13 emits fine particles from the top to the bottom in the figure by the vibration from the vibration generator 11.

The charging electrode 14 has a hole at the center for applying a predetermined voltage for applying and extracting a charge when particles are supplied in the downward direction in the figure by the vibration generator 11, the particle valve 12 and the actuator 13. Is an electrode with no space.

The focusing electrode 15 is an electrode having a hole at the center, to which a predetermined voltage is applied to focus the charged particles extracted by being charged by the charging electrode 14.

The anode 16 is an electrode having a hole at the center for applying a predetermined voltage to accelerate the charged particles focused by the focusing electrode 15. By the particle gun 1 composed of 11 to 16 described above, the fine particles are gradually released, charged, accelerated and focused, and the charged particle beam is emitted downward from the anode 16.

The blacking device 2 blacks charged particles and aligns the axis of the particle gun 1 with the axis of the imaging system. The blacking device 2 includes a blanker 21, a gun alignment 22, and the like. Things.

The blanker 21 blacks (passes or blocks) charged particles emitted from the particle gun 1 at a high speed. Gun alignment 22
This is an alignment for aligning the axis of the particle gun 1 with the axis of the imaging system.

The focusing lens 3 is an electrostatic lens that focuses the charged particles emitted from the particle gun 1. Deflector 4
Is for deflecting the charged particles focused by the focusing lens 3, and irradiates the beam of the charged particles which is narrowly focused on the sample 7 in the X direction and the Y direction on the sample 7.
This is a two-dimensional deflector (electrostatic deflector) having eight poles (X direction and Y direction).

The objective lens 5 is used for narrowly irradiating (imaging) the beam of the charged particles focused by the focusing lens 3 on the sample 7 and is an electrostatic lens.

The sample chamber 6 is a container capable of evacuating the sample 7, the shock detector 8, the sample stage 9, the secondary electron detector 10, and the like. The sample 7 is a sample to be irradiated with a beam of charged particles.

The impact detector 8 is for detecting the kinetic energy of the charged particle beam when the sample 7 is irradiated with the charged particle beam. The kinetic energy is detected by the two-dimensionally arranged elements. It outputs a particle position signal as shown.

The sample stage 9 is a table on which the impact detector 8 and the sample 7 are mounted and is moved so that a beam of charged particles is irradiated to an arbitrary position. The sample stage 9 moves in the X, Y, and Z directions. A platform that can be easily moved.

The secondary electron detector 10 is composed of the scintillator 31, the light guide 32, the photomultiplier tube 33, the shield tube 34, and the like described with reference to FIG. And amplifies it.

Next, an image is displayed by irradiating the charged particle on the sample 7 placed on the impact detector 8 in the configuration of FIG.
The operation of depositing charged particles and processing a sample with charged particles will be described in detail.

(1) Vibration is generated by the vibration generator 11, the actuator 13 is vibrated, and the particle valve 1
2 discharges particles at a very small flow rate determined by
4 and is charged. The charged particles are focused by the focusing electrode 15 and the anode 16
, And emits a beam of charged particles downward from the center hole of the anode 16.

(2) The beam of the charged particles emitted in (1) is passed or cut off by the blanker 21.
At this time, the anode 16 is
The axis of the beam of the charged particles emitted from the center hole is aligned with the axis of the focusing lens 3 (specifically, the charged particles emitted from the center hole of the anode 16 by the gun alignment 22). About the axis of the beam
The particle gun 1 is adjusted in the X and Y horizontal directions and the X and Y tilt directions, and is adjusted in advance so as to coincide with the axis of the focusing lens 3.
Is adjusted so that the beam of charged particles emitted from the lens is incident on the axis of the focusing lens 3).

(3) The beam of charged particles incident on the axis of the focusing lens 3 in (2) is focused by the focusing lens 3 and enters the deflector 4. (4) The charged particle beam incident on the deflector 4 is deflected in the X and Y directions by an 8-pole two-stage deflector, and charged two-dimensionally on the sample 7 in the X and Y directions. The beam of particles is scanned.

(5) The objective lens 5 scans in the X direction and the Y direction in (4) and narrows the incident beam of the charged particles to form an image on the sample 7 by narrowing the beam finely. And two-dimensional scanning in the Y direction.

(6) When the charged particle beam is scanned two-dimensionally in the X and Y directions on the sample 7,
The impact detector 8 on which the information is loaded detects the impact kinetic energy of the charged particles, outputs the detected particle as a particle position signal, and associates each element of the impact detector 8 on an image display device (not shown) on a two-dimensional screen. The luminance modulation is performed on the basis of the particle position signal to display which element is irradiated with the charged particle beam. Further, a sum signal of these particle position signals is generated on the image display device, and the X signal when deflected by the 8-pole two-stage deflector is generated.
The sum signal may be luminance-modulated in synchronization with the direction and Y-direction deflection signals to display an image of the kinetic energy at the position where the charged particle beam is irradiated. A secondary electron emitted from the sample 7 is detected by a secondary electron detector 10 shown in the figure, and the secondary electrons are synchronized with deflection signals in the X and Y directions when deflected by an 8-pole two-stage deflector. The brightness of the electronic signal may be modulated to display an image of the secondary electrons at the position irradiated with the beam of the charged particles. Similarly,
The light or X-ray emitted from the sample may be detected, and an image of the light or X-ray may be displayed.

(7) In addition, a predetermined portion of the sample 7 is irradiated with a beam of charged particles to deposit the charged particles (eg, deposit carbon or solder), or a predetermined portion is irradiated with a beam of charged particles. To process the predetermined portion.

FIG. 3 is a diagram illustrating an experiment of the present invention. FIG.
(A) shows the charged electrode 14, the focusing electrode 15, and the
An example of the anode 16 is shown. In this experimental example, a so-called Butler lens 41 was used by applying a voltage as shown. The uppermost part is the vibration generator 11 and the particle valve 1 shown in FIG.
2 and a portion composed of the actuator 13. Here, as shown in the figure, a positive high voltage of 15 Kv is applied. In the present invention, in order to charge the particles, either positive or negative is applied. Can be easily given. The reason is that when ionizing conventional atoms, the ionization rate differs between positive and negative ions,
Normally, positive ions having a good ionization rate are used. However, this is completely different from the present invention. In the present invention, any positive or negative charge can be freely charged in relation to charging particles.

The objective lens 5 has a three-pole structure as shown, and a voltage as shown is applied. The sample 7 is a sample to be irradiated with a beam of charged particles.

FIG. 3B shows an example of a piezoelectric particle landing monitor. The piezoelectric particle landing monitor 71 has a sample 7 placed on the impact detector 8 shown in FIGS. 1 and 2 as described above. As shown in the drawing, the sample 7, the insulating material 72, the electrode 7
3 and a piezoelectric element 74.

The sample 7 is a sample to be irradiated with a beam of charged particles, and here is mounted on an insulating material 72 (fixed with insulating paraffin or the like). The insulating material 72 is for insulating the electrodes 73 provided on both sides of the piezoelectric element 74.

The electrode 73 is for detecting (extracting) a voltage corresponding to kinetic energy when a beam of charged particles collides with each of the piezoelectric elements 74. Here, a mesh-shaped electrode is provided on both sides (or one side) of the piezoelectric element 74, or an electrode is provided for each separated element by cutting the piezoelectric element into a mesh.

The piezoelectric element 74 is an element for converting kinetic energy at the time of collision of a charged particle beam into an electric signal, and has an electrode 73 provided on the surface as shown in the figure. The electrode 73 is divided into meshes as described above, and the energy of the charged particles that have collided with each piezoelectric element 72 is detected as a signal from each mesh portion.

FIG. 3C shows a state in which the sample 7 shown in FIG. 3B is irradiated with a beam of charged particles. This is because when the sample 7 was irradiated with a beam of charged particles (10 μmφ of carbon) under the conditions of FIG. 3A, the state of carbon deposited was observed with an optical microscope (not shown). It is an image. The black circles in the figure indicate the portions where the charged particles (carbon) are deposited. In this experiment, it is found that the charged particles are scattered as shown in the figure. In the experiment here, for example, the diameter of the carbon particles as particles is 10 μm, the filling amount is 0.5 g, and the supply amount of the charging chamber is 0.5 μm.
03 g, and the charging chamber supply time was 15 minutes.

[0052]

As described above, according to the present invention,
The microparticles are charged, accelerated and focused to irradiate a desired part of the sample, and the signal absorbed or emitted at that time is detected to display an image, and the fine particles are deposited on the part of the sample or the part of the sample is sampled. Can be processed. With these, a beam of arbitrary charged particles is irradiated on an arbitrary portion of the sample to deposit the charged particles to form a desired pattern or a mechanical component, or a beam of arbitrary charged particles is formed on an arbitrary portion of the sample. Irradiation makes it possible to process an arbitrary portion of the sample, and a distribution image of a kinetic energy of the portion of the sample when the sample is irradiated with a beam of arbitrary charged particles (positive or negative). Secondary electrons emitted from the sample,
Various physical properties can be analyzed by displaying a distribution map of light, X-rays, and the like.

[Brief description of the drawings]

FIG. 1 is a configuration diagram of one embodiment of the present invention.

FIG. 2 is a configuration diagram of a specific example of the present invention.

FIG. 3 is a diagram illustrating an experiment of the present invention.

[Explanation of symbols]

 1: Particle gun 11: Vibration generator 12: Particle valve 13: Actuator 14: Charging electrode 15: Focusing electrode 16: Anode 2: Braking device 21: Blanker 22: Gun alignment 3: Focusing lens 4: Deflector 5: Objective Lens 6: Sample chamber 7: Sample 8: Shock detector 9: Sample stage 10: Secondary electron detector 31: Scintillator 32: Light guide 33: Photomultiplier tube 34: Shield cylinder 41: Butler lens 71: Piezoelectric particle landing Monitor 73: insulating material 73: electrode 74: piezoelectric element

Continuation of the front page (51) Int.Cl. ⁶ Identification symbol FI H01L 21/302 D (72) Inventor Shuichi Saito 203, Hirai 2196, Hinodecho, Nishitama-gun, Tokyo

Claims (3)

[Claims] 1. A particle gun for supplying charged particles and emitting charged charged particles to form a beam, and a lens for converging a beam of charged particles emitted from the particle gun and irradiating the beam as a narrow beam on a sample. And a deflector for deflecting a position where a beam narrowly focused on the sample by the lens is irradiated. 2. A detector for detecting a signal absorbed by the sample or a signal emitted from the sample when a beam narrowly focused on the sample is scanned by using the deflector; The charged particle drawing apparatus according to claim 1, further comprising a display device that displays an image based on the detected signal. 3. The method according to claim 1, wherein the beam deflected narrowly on the sample is positioned at a predetermined position using the deflector, and the charged particles are deposited on the sample, or the sample is processed by the charged particles. 3. The charged particle drawing apparatus according to claim 1 or 2.