JPH11232023A - Resistant film type input device and position detecting method therefor - Google Patents
Resistant film type input device and position detecting method thereforInfo
- Publication number
- JPH11232023A JPH11232023A JP3179598A JP3179598A JPH11232023A JP H11232023 A JPH11232023 A JP H11232023A JP 3179598 A JP3179598 A JP 3179598A JP 3179598 A JP3179598 A JP 3179598A JP H11232023 A JPH11232023 A JP H11232023A
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- JP
- Japan
- Prior art keywords
- resistance
- films
- pair
- electrodes
- full
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、ペンや指などによ
り押し下げられた位置を検出する抵抗膜式入力装置及び
その位置検出方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resistive input device for detecting a position depressed by a pen, a finger or the like, and a position detecting method therefor.
【0002】[0002]
【従来の技術】この種の抵抗膜式入力装置としては図5
に示すような所謂アナログ式のものがあった。この抵抗
膜式入力装置では、略矩形状の一対の絶縁シートがその
4辺を合わせて対向し、各絶縁シートの対向面全面にわ
たって抵抗が形成され、全面抵抗膜10,20が形成さ
れていた。全面抵抗膜10,20は図示しないスペーサ
を介して対向しており、通常は全面抵抗膜10,20が
互いに接触しないように支持されている。全面抵抗膜1
0の対向する2辺にはそれぞれ電極Xa,Xbが形成さ
れており、電極Xa,Xbが形成された全面抵抗膜10
の2辺と略直交する全面抵抗膜20の対向する2辺には
それぞれ電極Ya,Ybが形成されている。2. Description of the Related Art FIG.
There was a so-called analog type as shown in FIG. In this resistive film type input device, a pair of substantially rectangular insulating sheets face each other with their four sides aligned, and a resistance is formed over the entire opposing surface of each insulating sheet, so that the entire resistive films 10 and 20 are formed. . The entire surface resistance films 10 and 20 are opposed to each other via a spacer (not shown), and are usually supported so that the entire surface resistance films 10 and 20 do not contact each other. Full resistance film 1
The electrodes Xa and Xb are formed on two opposing sides of 0, respectively, and the entire resistive film 10 on which the electrodes Xa and Xb are formed is formed.
Electrodes Ya and Yb are formed on two opposing sides of the overall resistance film 20 which are substantially orthogonal to the two sides.
【0003】図6に示すように、電極Xa,Yaはスイ
ッチ手段S1 を介して電圧V1 が印加されており、スイ
ッチ手段S1 の切り替えによって電極Xa,Yaのいず
れか一方が電圧V1 が印加される。また、電極Xb,Y
bはそれぞれスイッチ手段S 2 ,S3 に接続されてお
り、スイッチ手段S2 ,S3 の切り替えによって電極X
b,Ybの内の一方がグランドに接続されるとともに、
電極Xb,Ybの内の他方が電圧検出手段30に接続さ
れる。なお、スイッチ手段S1 〜S3 は連動して切り替
えられる。As shown in FIG. 6, electrodes Xa and Ya are
Switch means S1Through the voltage V1Is applied and the switch
Switch means S1Switching between electrodes Xa and Ya
One of them is voltage V1Is applied. Further, the electrodes Xb, Y
b is a switch means S Two, SThreeConnected to
Switch means STwo, SThreeElectrode X by switching
One of b and Yb is connected to the ground,
The other of the electrodes Xb and Yb is connected to the voltage detecting means 30.
It is. The switch means S1~ SThreeSwitches in conjunction
available.
【0004】ここで、ペン40や指などにより全面抵抗
膜10の点Pが押し下げられると、全面抵抗膜10,2
0は押し下げられた部位(点P)で互いに導通する。ス
イッチ手段S1 が電極Ya側に、スイッチ手段S2 が電
極Yb側に、スイッチ手段S 3 が電極Xb側にそれぞれ
切り替えられている場合、全面抵抗膜20の電極Ya,
Yb間に電圧V1 が印加され、電極Ya〜点P間の抵抗
Ry1 と電極Yb〜点P間の抵抗Ry2 とによって分圧
された電圧が、電極Xb〜点P間の抵抗Rx2を介して
電圧検出手段30に入力される。一方、スイッチ手段S
1 が電極Xa側に、スイッチ手段S2 が電極Xb側に、
スイッチ手段S3 が電極Yb側にそれぞれ切り替えられ
ると、全面抵抗膜10の電極Xa,Xb間に電圧V1 が
印加され、電極Xa〜点P間の抵抗Rx1 と電極Xb〜
点P間の抵抗Rx2 とによって分圧された電圧が抵抗R
y2 を介して電圧検出手段30に入力される。したがっ
て、電圧検出手段30の検出した電圧から全面抵抗膜1
0,20の押圧部位(点P)のX座標、Y座標をそれぞ
れ検出することができ、点Pに対応するスイッチ手段の
操作を行わせることができる(特開平7−334289
号公報参照)。Here, the whole surface resistance is applied by a pen 40 or a finger.
When the point P of the film 10 is depressed, the entire surface resistance films 10 and 2
0 conducts each other at the depressed portion (point P). S
Switch means S1Is on the electrode Ya side, and the switch means STwoIs
On the pole Yb side, switch means S ThreeOn the electrode Xb side
When switching is performed, the electrodes Ya,
Voltage V between Yb1Is applied, and the resistance between the electrode Ya and the point P is
Ry1And the resistance Ry between the electrode Yb and the point PTwoAnd by partial pressure
The applied voltage is the resistance Rx between the electrode Xb and the point P.TwoThrough
It is input to the voltage detecting means 30. On the other hand, switch means S
1Is on the electrode Xa side, and the switch means STwoIs on the electrode Xb side,
Switch means SThreeAre switched to the electrode Yb side, respectively.
Then, the voltage V is applied between the electrodes Xa and Xb of the overall resistance film 10.1But
Applied, and a resistance Rx between the electrode Xa and the point P.1And electrode Xb ~
Resistance Rx between points PTwoAnd the voltage divided by the resistor R
yTwoIs input to the voltage detecting means 30 via the. Accordingly
From the voltage detected by the voltage detecting means 30,
The X and Y coordinates of the 0, 20 pressed parts (point P)
Of the switch means corresponding to the point P.
Operation can be performed (Japanese Unexamined Patent Application Publication No. 7-334289).
Reference).
【0005】また、抵抗膜式入力装置としては、一対の
対向配置された絶縁シートの対向面に、それぞれ、互い
に直交する2方向(X方向、Y方向)に短冊状の抵抗膜
を配置して形成された所謂マトリクス式のものもあっ
た。この抵抗膜式入力装置では、例えば一方の絶縁シー
トに形成されたX方向の抵抗膜の一端を抵抗を介してプ
ルアップし、この抵抗膜の他端の電圧を検出するととも
に、他方の絶縁シートに形成されたY方向の絶縁膜を順
次グランドに接地している。通常、対向配置されたシー
トは互いに接触しないように支持されており、対向配置
されたシートをペンや指などで押圧すると、押し下げら
れた部位に対応するX方向の抵抗膜とY方向の抵抗膜と
が導通する。ここで、グランドに接地されたY方向の抵
抗膜とX方向の抵抗膜とが導通していなければ、X方向
の抵抗膜の他端の電圧はハイになり、グランドに接地さ
れたY方向の抵抗膜とX方向の抵抗膜とが導通していれ
ば、X方向の抵抗膜の他端の電位はローになるので、X
方向の抵抗膜の他端の電位から、押し下げられた部位の
位置を検出することができる。[0005] In a resistive film type input device, strip-like resistive films are arranged on two opposing surfaces of a pair of opposing insulating sheets in two directions (X direction and Y direction) orthogonal to each other. There was also a so-called matrix type formed. In this resistive film type input device, for example, one end of an X-direction resistive film formed on one of the insulating sheets is pulled up via a resistor, the voltage at the other end of the resistive film is detected, and the other insulating sheet is detected. Are successively grounded to the ground. Normally, the opposed sheets are supported so as not to contact each other, and when the opposed sheet is pressed with a pen or a finger or the like, the X-direction resistive film and the Y-direction resistive film corresponding to the pressed-down portions are pressed. Are conducted. Here, if the Y-direction resistance film grounded to the ground and the X-direction resistance film are not conducting, the voltage at the other end of the X-direction resistance film becomes high, and the Y-direction resistance grounded to the ground. If the resistance film and the resistance film in the X direction are conductive, the potential at the other end of the resistance film in the X direction becomes low.
The position of the depressed part can be detected from the potential of the other end of the resistive film in the direction.
【0006】[0006]
【発明が解決しようとする課題】上述した抵抗膜式入力
装置の内、アナログ式の抵抗膜式入力装置では、図7及
び図8に示すように、ペン40や指などにより全面抵抗
膜10の2点P1 ,P2が押し下げられた場合、全面抵
抗膜10,20は押し下げられた2点P1 ,P2で互い
に導通する。ここで、スイッチ手段S1 が電極Xa側
に、スイッチ手段S 2 が電極Xb側に、スイッチ手段S
3 が電極Yb側にそれぞれ切り替えられている場合、全
面抵抗膜10の電極Xa,Xb間に電圧V1 が印加さ
れ、電極Xa〜点P1 間の抵抗Rx1 及び2点P1 ,P
2 間の全面抵抗膜10,20の抵抗Rx 2 ,Ry2 の合
成抵抗の和と、点P2 〜電極Xb間の抵抗Rx3 とによ
って分圧された電圧が、点P2 〜電極Yb間の抵抗Ry
3 を介して電圧検出手段30に入力される。一方、スイ
ッチ手段S1 が電極Ya側に、スイッチ手段S2 が電極
Yb側に、スイッチ手段S3 が電極Xb側にそれぞれ切
り替えられている場合、全面抵抗膜20の電極Ya,Y
b間に電圧V1 が印加され、電極Ya〜点P1 間の抵抗
Ry1 及び2点P1 ,P2 間の抵抗Rx2 ,Ry2 の合
成抵抗の和と、点P 2 〜電極Yb間の抵抗Ry3 とによ
って分圧された電圧が、抵抗Rx3 を介して電圧検出手
段30に入力される。すなわち、2点P1 ,P2 の平均
値に相当する点の座標に比例した電位が検出されるの
で、使用者が意図した部位の操作を行うことができない
という問題があった。特にFA分野においては、スイッ
チ操作の確実性や安全性を高めるために、重要な機能を
有するスイッチは2点を同時に押圧した時にスイッチの
機能を有効にするのが望ましいが、アナログ式の抵抗膜
式入力装置では2点押しを検出できないため、2点を同
時に押圧した時にスイッチの機能を有効にするというこ
とはできなかった。The above-mentioned resistive film type input
Among the devices, the analog type resistive film type input device
As shown in FIG.
Two points P on the membrane 101, PTwoIs pushed down,
The anti-membrane 10, 20 is pushed down two points P1, PTwoIn each other
Is conducted. Here, the switch means S1Is the electrode Xa side
And switch means S TwoIs on the electrode Xb side, and the switch means S
ThreeAre switched to the electrode Yb side,
Voltage V between electrodes Xa and Xb of sheet resistance film 101Is applied
Electrode Xa to point P1Resistance Rx between1And two points P1, P
TwoThe resistance Rx of the entire resistive films 10 and 20 between Two, RyTwoIf
The sum of the formation resistance and the point PTwo-Resistance Rx between electrodes XbThreeAnd by
Is divided by the point PTwo-Resistance Ry between electrodes Yb
ThreeIs input to the voltage detecting means 30 via the. On the other hand, Sui
Switch means S1Is on the electrode Ya side, and the switch means STwoIs an electrode
On the Yb side, switch means SThreeCut to the electrode Xb side
When the electrodes Ya and Y of the overall resistance film 20 have been replaced,
Voltage V between b1Is applied, and the electrodes Ya to P1Resistance between
Ry1And two points P1, PTwoResistance Rx betweenTwo, RyTwoIf
The sum of the formation resistance and the point P Two-Resistance Ry between electrodes YbThreeAnd by
Is divided by the resistor RxThreeThrough the voltage detection hand
Input to stage 30. That is, two points P1, PTwoThe average of
A potential proportional to the coordinates of the point corresponding to the value is detected
Cannot operate the part intended by the user
There was a problem. Especially in the FA field,
Important functions to increase the reliability and safety of
The switch that has
It is desirable to enable the function, but analog type resistive film
Since two-point pressing cannot be detected with the
Enabling the function of the switch when pressed
And could not.
【0007】一方、マトリクス式の抵抗膜式入力装置で
は、X方向、Y方向の抵抗膜を順次スキャンすることに
より押し下げられている部位を検出しているので、複数
の点が同時に押し下げられた場合でも各点の位置を検出
することは可能であるが、操作面積が大きく、且つ、分
解能を高める必要がある場合、X方向、Y方向の抵抗膜
それぞれに外部の検出回路と接続するためのパターンを
設ける必要があり、操作面の周辺に設けるパターンが増
加していた。そのため、操作面周辺の枠にあたる面積が
増加し、製品の外形が大きくなるという問題があった。
また、押圧点を検出するためにX方向、Y方向の抵抗膜
を全てスキャンする必要があるので、マトリクスの数が
増えると、信号処理の時間が増加するという問題もあっ
た。On the other hand, in the matrix type resistive film type input device, since the pressed portion is detected by sequentially scanning the resistive films in the X and Y directions, when a plurality of points are simultaneously pressed down. However, it is possible to detect the position of each point, but if the operation area is large and it is necessary to increase the resolution, a pattern for connecting an external detection circuit to each of the resistive films in the X and Y directions is required. And the number of patterns provided around the operation surface has increased. Therefore, there is a problem that the area corresponding to the frame around the operation surface increases, and the outer shape of the product increases.
Further, since it is necessary to scan all the resistive films in the X and Y directions in order to detect the pressing point, there is a problem that the time of signal processing increases as the number of matrices increases.
【0008】本発明は上記問題点に鑑みて為されたもの
であり、その目的とするところは、2点押しを検出可能
な小型で信号の処理速度が速い抵抗膜式入力装置を提供
することにある。The present invention has been made in view of the above problems, and an object of the present invention is to provide a small-sized resistive film input device capable of detecting two-point pressing and having a high signal processing speed. It is in.
【0009】[0009]
【課題を解決するための手段】上記目的を達成するため
に、請求項1の発明では、対向配置されるとともに、押
し下げられた部位で互いに導通する一対の全面抵抗膜
と、一対の全面抵抗膜の両端部にそれぞれ接続されるス
イッチ手段と、スイッチ手段を介して前記一対の全面抵
抗膜のいずれかの端部に接続され、該端部間の抵抗値を
測定する抵抗測定手段とを備え、スイッチ手段は、一対
の全面抵抗膜の一方の端部をそれぞれ開放するとともに
他方の端部間に抵抗測定手段を接続する状態と、一対の
全面抵抗膜の一方の端部間に抵抗測定手段を接続すると
ともに他方の端部をそれぞれ開放する状態とを交互に切
り替えており、全面抵抗膜の2点が同時に押し下げられ
た場合でも、抵抗測定手段が接続された全面抵抗膜の端
部に近い側の点の位置に比例した抵抗値を検出すること
ができ、この抵抗値から押し下げられた点の位置を求め
ることができるので、抵抗測定手段を接続する端部を交
互に切り換えることによって、同時に押し下げられた2
点の位置を検出することができる。In order to achieve the above object, according to the first aspect of the present invention, there is provided a pair of full resistance films which are opposed to each other and are electrically connected to each other at a depressed portion. Switch means respectively connected to both ends of the pair of the entire surface resistive film via the switch means, resistance measuring means for measuring the resistance value between the ends, The switch means opens one end of each of the pair of full resistance films and connects the resistance measurement means between the other ends, and the resistance measurement means between one ends of the pair of full resistance films. The connection and the state of opening the other end are alternately switched, and even when two points of the entire resistance film are simultaneously pushed down, the side close to the end of the entire resistance film to which the resistance measuring means is connected is connected. Dot position of It is possible to detect the resistance value proportional to, it is possible to determine the position of a point that has been pushed down from the resistance value, by switching alternately the ends for connecting the resistance measuring means, depressed simultaneously 2
The position of a point can be detected.
【0010】請求項2の発明では、請求項1の発明にお
いて、全面抵抗膜は略矩形状に形成され、各辺を合わせ
て対向配置された一対の全面抵抗膜を二組設け、一方の
組の全面抵抗膜の対向する2辺に、スイッチ手段がそれ
ぞれ接続される電極をそれぞれ形成するとともに、上記
2辺と略直交する他方の組の全面抵抗膜の対向する2辺
に、スイッチ手段がそれぞれ接続される電極をそれぞれ
形成しているので、請求項1の発明と同様に、抵抗測定
手段を接続する電極を交互に切り換えることによって、
同時に押し下げられた2点の位置を検出することができ
る。According to a second aspect of the present invention, in the first aspect of the present invention, the whole surface resistance film is formed in a substantially rectangular shape, and two pairs of the whole surface resistance film are provided so as to oppose each other with their sides aligned. The electrodes to which the switch means are respectively connected are formed on two opposing sides of the entire surface resistive film, and the switch means is respectively provided on two opposing sides of the other set of the entire resistive film substantially orthogonal to the two sides. Since the electrodes to be connected are respectively formed, the electrodes for connecting the resistance measuring means are alternately switched as in the first aspect of the invention.
It is possible to detect the positions of the two points pressed down at the same time.
【0011】請求項3の発明では、各辺を合わせて対向
配置されるとともに、押し下げられた部位で互いに導通
する略矩形状の一対の全面抵抗膜と、一対の全面抵抗膜
の四方の端部にそれぞれ接続されるスイッチ手段と、一
対の全面抵抗膜の一方の端部間にスイッチ手段を介して
接続され、該端部間の抵抗値を測定する抵抗測定手段と
を備え、上記スイッチ手段は、一対の全面抵抗膜の対向
する端部の一方をそれぞれ開放するとともに他方の端部
間に抵抗測定手段を接続する状態と、一対の全面抵抗膜
の対向する端部の一方の端部間に抵抗測定手段を接続す
るとともに他方の端部をそれぞれ開放する状態とを交互
に切り替えており、全面抵抗膜の2点が同時に押し下げ
られた場合でも、抵抗測定手段が接続された端部に近い
側の点の位置に比例した抵抗値を検出することができ、
この抵抗値から押し下げられた点の位置を求めることが
できるので、抵抗測定手段を接続する端部を切り換える
ことによって同時に押し下げられた2点の位置を検出す
ることができる。According to the third aspect of the present invention, a pair of substantially rectangular full-length resistance films which are arranged to face each other with their sides aligned and which are electrically connected to each other at a depressed portion, and four end portions of the pair of full-length resistance films are provided. And a resistance measuring means connected between the one ends of the pair of full-surface resistance films via the switching means, and measuring a resistance value between the ends, wherein the switching means is A state in which one of the opposite ends of the pair of full-surface resistance films is opened and the resistance measuring means is connected between the other ends, and a state in which one of the opposite ends of the pair of full-surface resistance films is connected. The state where the resistance measuring means is connected and the state where the other end is opened are alternately switched. Even when two points of the entire resistance film are simultaneously pushed down, the side close to the end to which the resistance measuring means is connected is connected. To the position of the point Can be detected resistance value,
Since the position of the depressed point can be obtained from this resistance value, the position of the two points depressed simultaneously can be detected by switching the end to which the resistance measuring means is connected.
【0012】請求項4の発明では、請求項3の発明にお
いて、全面抵抗膜の4辺にスイッチ手段がそれぞれ接続
される電極を形成し、上記スイッチ手段は、一対の全面
抵抗膜の対向する2辺の内の一方の辺に形成された電極
をそれぞれ開放するとともに他方の辺に形成された電極
間に抵抗測定手段を接続する状態と、一対の全面抵抗膜
の対向する2辺の内の一方の辺に形成された電極間に抵
抗測定手段を接続するとともに他方の辺に形成された電
極をそれぞれ開放する状態とを交互に切り換えており、
請求項3の発明と同様に、抵抗測定手段を接続する電極
を切り換えることによって同時に押し下げられた2点の
位置を検出することができる。According to a fourth aspect of the present invention, in the third aspect of the present invention, electrodes to which switch means are respectively connected are formed on four sides of the entire surface resistive film, and the switch means comprises a pair of opposed full surface resistive films. A state in which the electrodes formed on one side of the sides are opened and the resistance measuring means is connected between the electrodes formed on the other side, and one of two opposite sides of the pair of full-surface resistance films The resistance measurement means is connected between the electrodes formed on the other side and the state in which the electrodes formed on the other side are respectively opened is alternately switched,
Similarly to the third aspect of the present invention, by switching the electrodes connected to the resistance measuring means, it is possible to detect the positions of the two points which are simultaneously depressed.
【0013】請求項5の発明では、一対の全面抵抗膜を
押し下げられた部位で互いに導通するように対向配置
し、一対の全面抵抗膜の一方の端部をスイッチ手段を介
してそれぞれ開放するとともに、前記一対の全面抵抗膜
の他方の端部間にスイッチ手段を介して抵抗測定手段を
接続し、前記一対の全面抵抗膜の他方の端部間の抵抗値
を測定した後、前記一対の全面抵抗膜の一方の端部間に
スイッチ手段を介して抵抗測定手段を接続するととも
に、前記一対の全面抵抗膜の他方の端部をスイッチ手段
を介してそれぞれ開放し、前記一対の全面抵抗膜の他方
の端部間の抵抗値を測定して、前記2個の抵抗値から押
し下げられた2点の位置を検出しており、全面抵抗膜の
2点が同時に押し下げられた場合でも、抵抗測定手段が
接続された全面抵抗膜の端部に近い側の点の位置に比例
した抵抗値を検出することができ、この抵抗値から押し
下げられた点の位置を求めることができるので、抵抗測
定手段を接続する全面抵抗膜の端部を交互に切り換える
ことによって、同時に押し下げられた2点の位置を検出
することができる。According to the fifth aspect of the present invention, a pair of full-surface resistance films are disposed so as to be electrically connected to each other at a depressed portion, and one end of each of the pair of full-resistance films is opened via a switch means. Connecting a resistance measuring unit between the other ends of the pair of full-surface resistance films via a switch unit and measuring a resistance value between the other ends of the pair of full-surface resistance films, A resistance measuring means is connected between one ends of the resistive films via a switch means, and the other ends of the pair of full-surface resistive films are respectively opened via a switch means, and the pair of the full-surface resistive films are connected to each other. The resistance value between the other ends is measured to detect the positions of the two points depressed from the two resistance values. Even when two points of the entire resistive film are depressed simultaneously, the resistance measuring means Is connected to the entire resistive film The resistance value proportional to the position of the point closer to the end can be detected, and the position of the point depressed can be determined from this resistance value. Can be detected alternately to detect the positions of two points that have been simultaneously depressed.
【0014】請求項6の発明では、略矩形状の一対の全
面抵抗膜を押し下げられた部位で互いに導通するように
各辺を合わせて対向配置し、一対の全面抵抗膜の4辺に
それぞれ電極を形成し、一対の全面抵抗膜の対向する2
辺の内の一方の辺に形成された電極をスイッチ手段を介
してそれぞれ開放するとともに、他方の辺に形成された
電極間にスイッチ手段を介して抵抗測定手段を接続して
電極間の抵抗値を測定した後、一対の全面抵抗膜の対向
する2辺の内の一方の辺に形成された電極間にスイッチ
手段を介して抵抗測定手段を接続するとともに、他方の
辺に形成された電極をスイッチ手段を介してそれぞれ開
放して、電極間の抵抗値を測定して、前記2個の抵抗値
から押し下げられた2点の位置を検出しており、全面抵
抗膜の2点が同時に押し下げられた場合でも、抵抗測定
手段が接続された電極に近い側の点の位置に比例した抵
抗値を検出することができ、この抵抗値から押し下げら
れた点の位置を求めることができるので、抵抗測定手段
を接続する電極を交互に切り換えることによって、同時
に押し下げられた2点の位置を検出することができる。According to the sixth aspect of the present invention, a pair of substantially rectangular resistive films are disposed so as to face each other so as to be electrically connected to each other at the depressed portion, and electrodes are respectively disposed on four sides of the pair of resistive films. Is formed, and a pair of opposed resistive films 2
The electrodes formed on one side of the sides are opened via switch means, respectively, and the resistance measurement means is connected between the electrodes formed on the other side via switch means to obtain a resistance value between the electrodes. After the measurement, the resistance measuring means is connected via the switch means between the electrodes formed on one of the two opposing sides of the pair of full-surface resistance films, and the electrode formed on the other side is connected to the other side. Each is opened via the switch means, the resistance between the electrodes is measured, and the positions of the two points depressed from the two resistances are detected, and the two points of the entire resistive film are depressed simultaneously. In this case, the resistance measuring means can detect the resistance value in proportion to the position of the point closer to the connected electrode, and the position of the point depressed can be obtained from this resistance value. Electrode connecting means By switching each other, it is possible to detect the position of the two points which are depressed at the same time.
【0015】[0015]
【発明の実施の形態】本発明の実施の形態を図面を参照
して説明する。 (実施形態1)本実施形態の抵抗膜式入力装置はプログ
ラマブル表示器などに用いられるものであり、図1に示
すように、各辺を合わせて対向配置された略矩形状の一
対の絶縁シートを2組有しており、図1中上側の組の絶
縁シートの対向面に全面にわたって抵抗を設けて全面抵
抗膜10,11を形成するとともに、図1中下側の組の
絶縁シートの対向面に全面にわたって抵抗を設けて全面
抵抗膜20,21を形成する。ここで、全面抵抗膜1
0,11間、及び、全面抵抗膜20,21間にはそれぞ
れ図示しないスペーサが介装されており、通常はスペー
サによって全面抵抗膜10,11、全面抵抗膜20,2
1がそれぞれ互いに接触しないように支持されている。
そして、ペン40や指などで全面抵抗膜10を押し下げ
ることにより、全面抵抗膜10,11及び全面抵抗膜2
0,21が互いに導通する。Embodiments of the present invention will be described with reference to the drawings. (Embodiment 1) The resistive film type input device of the present embodiment is used for a programmable display or the like, and as shown in FIG. 1, a pair of substantially rectangular insulating sheets arranged so as to face each other with their sides aligned. 1 are provided on the entire surface facing the insulating sheet of the upper set in FIG. 1 to form the entire surface resistance films 10 and 11, and the opposing surfaces of the insulating sheet of the lower set in FIG. Resistors are provided over the entire surface to form the entire resistive films 20 and 21. Here, the entire surface resistive film 1
Spacers (not shown) are interposed between 0 and 11 and between the entire resistance films 20 and 21, respectively. Normally, the entire resistance films 10 and 11 and the entire resistance films 20 and 2 are provided by the spacers.
1 are supported so as not to contact each other.
Then, the full-resistance films 10 and 11 and the full-resistance films 2 are depressed by pressing down the full-resistance films 10 with a pen 40 or a finger.
0 and 21 conduct with each other.
【0016】全面抵抗膜10の対向する2辺にはそれぞ
れ電極Xa1 ,Xb1 が形成されており、電極Xa1 ,
Xb1 に対応する全面抵抗膜11の2辺にはそれぞれ電
極Xa2 ,Xb2 が形成されている。一方、電極X
a1 ,Xb1 が形成された全面抵抗膜10の2辺と略直
交する全面抵抗膜20の2辺にはそれぞれ電極Ya1 ,
Yb1 が形成されており、電極Ya1 ,Yb1 に対応す
る全面抵抗膜11の2辺にはそれぞれ電極Ya2 ,Yb
2 が形成されている。[0016] are respectively electrodes Xa 1 facing the two sides of the entire resistive layer 10, Xb 1 is formed, electrodes Xa 1,
Electrodes Xa 2 and Xb 2 are formed on two sides of the overall resistance film 11 corresponding to Xb 1 , respectively. On the other hand, electrode X
Electrodes Ya 1 and Ya 2 are provided on two sides of the entire surface resistance film 20 substantially orthogonal to the two sides of the entire surface resistance film 10 on which a 1 and Xb 1 are formed, respectively.
Yb 1 is formed, the electrode Ya 1, each of the two sides electrodes Ya 2 the entire surface of resistive film 11 corresponding to Yb 1, Yb
2 are formed.
【0017】図2に示すように、電極Xa1 ,Xb1 に
はスイッチ手段S1 が接続され、電極Xa2 ,Xb2 に
はスイッチ手段S2 が接続されている。スイッチ手段S
1 ,S2 は図示しないCPUによって切り換えられてお
り、スイッチ手段S1 ,S2の切り換えによって、電極
Xa1 ,Xa2 間、又は、電極Xb1 ,Xb2 間のいず
れか一方に定電流源1と例えばA/Dコンバータからな
る電圧検出手段30とが接続され、他方が開放される。
ここに、定電流源1及び電圧検出手段30から抵抗測定
手段が構成される。As shown in FIG. 2, the switch means S 1 is connected to the electrode Xa 1, Xb 1, the electrode Xa 2, Xb 2 are connected to the switching means S 2. Switch means S
1, S 2 are switched by a not-shown CPU, by switching the switching means S 1, S 2, between the electrodes Xa 1, Xa 2, or a constant current source to either one of between the electrodes Xb 1, Xb 2 1 is connected to the voltage detecting means 30 composed of, for example, an A / D converter, and the other is opened.
Here, the constant current source 1 and the voltage detecting means 30 constitute a resistance measuring means.
【0018】例えば、スイッチ手段S1 ,S2 の切り替
えによって、全面抵抗膜10,11の一方の電極X
a1 ,Xa2 間に定電流源1及び電圧検出手段30を接
続するとともに、全面抵抗膜10,11の他方の電極X
b1 ,Xb2 をそれぞれ開放すると、電圧検出手段30
によって電極Xa1 ,Xa2 間に発生する電圧が検出さ
れる。ここで、全面抵抗膜10の2点P1 ,P2 が押し
下げられた場合、全面抵抗膜10,11は2点P1 ,P
2 で互いに導通する。2点P1 ,P2 の内で点P2より
も点P1 の方が電極Xa1 ,Xa2 に近いので、電極X
a1 ,Xa2 間の抵抗値は、電極Xa1 〜点P1 間の全
面抵抗膜10の抵抗Rx1 と、電極Xa2 〜点P2 間の
全面抵抗膜11の抵抗Rx1'(=Rx1 )との和(=2
Rx1 )になる。したがって、電極Xa1 ,Xa2 間に
は抵抗2Rx1 に比例した電圧が発生し、電圧検出手段
30の測定値から電極Xa1 〜点P1 間の全面抵抗膜1
0の抵抗Rx1 を求めることができる。電極Xa1 〜X
b1 間、電極Xa2 〜Xb2 間の抵抗は既知であり、そ
れぞれRx0 であるので、(Rx1 /Rx0 )の演算を
行うことによって押し下げられた点P1 のX座標を求め
ることができる。For example, by switching the switch means S 1 , S 2 , one electrode X of the entire surface resistive films 10, 11 is formed.
a 1, between Xa 2 to thereby connect the constant current source 1 and the voltage detecting means 30, the other electrode X of the entire resistive films 10 and 11
When b 1 and Xb 2 are respectively opened, the voltage detecting means 30
As a result, a voltage generated between the electrodes Xa 1 and Xa 2 is detected. Here, when the two points P 1 and P 2 of the overall resistance film 10 are pushed down, the overall resistance films 10 and 11 become two points P 1 and P 2.
Conducting with each other at 2 . 2 points P 1, since the direction of the point P 1 than the point P 2 among P 2 is closer to the electrode Xa 1, Xa 2, electrode X
resistance between a 1, Xa 2 is a resistor Rx 1 of the entire resistive layer 10 between electrodes Xa 1 ~ point P 1, the resistance Rx 1 of the entire resistive layer 11 between electrodes Xa 2 ~ point P 2 '(= Rx 1 ) (= 2
Rx 1 ). Thus, electrodes Xa 1, Xa is between 2 voltage proportional to the resistance 2Rx 1 is generated, the entire surface resistance film 1 between the electrodes Xa 1 ~ point P 1 from the measured value of the voltage detecting means 30
Resistance Rx 1 0 can be obtained. Electrodes Xa 1 to X
b between 1, the resistance between the electrodes Xa 2 ~Xb 2 are known, since each is Rx 0, to determine the X-coordinate of the point P 1 is pushed down by performing the calculation of (Rx 1 / Rx 0) Can be.
【0019】次に、スイッチ手段S1 ,S2 を切り替え
て、全面抵抗膜10,11の一方の電極Xa1 ,Xa2
をそれぞれ開放し、全面抵抗膜10,11の他方の電極
Xb 1 ,Xb2 間に定流源1及び電圧検出手段30を接
続すると、電圧検出手段30によって電極Xb1 ,Xb
2 間に発生する電圧が検出される。ここで、全面抵抗膜
10の2点P1 ,P2 が押し下げられ、全面抵抗膜1
0,11が2点P1 ,P 2 で互いに導通している場合、
2点P1 ,P2 の内で点P1 よりも点P2 の方が電極X
b1 ,Xb2 に近いので、電極Xb1 ,Xb2 間の抵抗
値は、電極Xb1〜点P2 間の全面抵抗膜10の抵抗R
x3 と、電極Xb2 〜点P2 間の全面抵抗膜11の抵抗
値Rx3'(=Rx3 )との和(=2Rx3 )になる。し
たがって、電極Xb1 ,Xb2 間には抵抗2Rx3 に比
例した電圧が発生し、電圧検出手段30の測定値から電
極Xb1 〜点P2 間の全面抵抗膜10の抵抗Rx3 を求
めることができ、{(Rx0 −Rx3 )/Rx0 }の演
算を行うことにより押し下げられた点P2 のX座標を求
めることができる。Next, the switch means S1, STwoSwitch
And one electrode Xa of the entire resistive films 10 and 111, XaTwo
Are respectively opened, and the other electrodes of the entire surface resistive films 10 and 11 are opened.
Xb 1, XbTwoBetween the constant current source 1 and the voltage detecting means 30.
Then, the electrode Xb is detected by the voltage detecting means 30.1, Xb
TwoAn intervening voltage is detected. Where the resistive film
2 points P of 101, PTwoIs pushed down, and the entire surface resistive film 1
0 and 11 are 2 points P1, P TwoWhen conducting with each other,
2 points P1, PTwoWithin the point P1Point P thanTwoIs the electrode X
b1, XbTwoThe electrode Xb1, XbTwoResistance between
The value is the electrode Xb1~ Point PTwoThe resistance R of the entire surface resistive film 10 between
xThree And the electrode XbTwo~ Point PTwoResistance of the entire surface resistive film 11 between
Value RxThree'(= RxThree) And (= 2RxThree)become. I
Therefore, the electrode Xb1, XbTwoResistance 2Rx betweenThreeCompared to
The example voltage is generated, and the voltage is
Pole Xb1~ Point PTwoThe resistance Rx of the entire surface resistance film 10 betweenThree Seeking
{(Rx0-RxThree) / Rx0演 performance
The point P depressed by performing the calculationTwoFind the X coordinate of
Can be
【0020】また、スイッチ手段の切り替えにより、全
面抵抗膜20,21の電極Ya1 ,Ya2 間に定電流源
1及び電圧検出手段30を接続するとともに、電極Yb
1 ,Yb2 をそれぞれ開放し、電圧検出手段30によっ
て電極Ya1 ,Ya2 間に発生する電圧を検出する。そ
して、電圧検出手段30の測定値から、電極Ya1 ,Y
a2 に近い側の点P2 と電極Ya1 (Ya2 )との間の
抵抗Ry1 を求め、電極Ya1 ,Yb1 間の抵抗Ry0
と抵抗Ry1 との演算(Ry1 /Ry0 )を行うことに
よって点P2 のY座標を求める。次に、スイッチ手段を
切り替えて、全面抵抗膜20,21の電極Ya1 ,Ya
2 をそれぞれ開放するとともに、電極Yb1 ,Yb2 間
に定電流源1及び電圧検出手段30を接続して、電圧検
出手段30により電極Yb1 ,Yb2 間に発生する電圧
を検出する。そして、電圧検出手段30の測定値から、
電極Yb1 ,Yb2 に近い側の点P1 と電極Yb1 (Y
b 2 )との間の抵抗Ry3 を求め、抵抗Ry0 と抵抗R
y3 との演算{(Ry0 −Ry3 )/Ry0 }を行うこ
とにより点P1 のY座標を求める。Further, by switching the switch means,
Electrode Ya of sheet resistance films 20 and 211, YaTwoConstant current source
1 and the voltage detecting means 30 and the electrode Yb
1, YbTwoAre respectively opened, and the voltage detection means 30
Electrode Ya1, YaTwoDetect the voltage generated between them. So
Then, from the measured value of the voltage detecting means 30, the electrode Ya1, Y
aTwoPoint P on the side closer toTwoAnd the electrode Ya1(YaTwo) Between
Resistance Ry1And the electrode Ya1, Yb1Resistance Ry between0
And resistance Ry1Operation (Ry1/ Ry0To do)
Therefore point PTwoIs determined. Next, switch means
By switching, the electrodes Ya of the entire resistive films 20 and 21 are switched.1, Ya
TwoRespectively, and the electrodes Yb1, YbTwowhile
The constant current source 1 and the voltage detecting means 30 are connected to
The output means 301, YbTwoVoltage generated between
Is detected. Then, from the measured value of the voltage detecting means 30,
Electrode Yb1, YbTwoPoint P on the side closer to1And the electrode Yb1(Y
b Two)ThreeAnd the resistance Ry0And resistance R
yThreeThe operation {(Ry0-RyThree) / Ry0} Do
And the point P1Is determined.
【0021】上述のように、スイッチ手段S1 ,S
2 が、全面抵抗膜10,11の一方の端部(即ち電極X
a1 ,Xa2 )を開放するとともに他方の端部(即ち電
極Xb1,Xb2 )に抵抗値測定手段を接続する状態
と、一方の端部(即ち電極Xa1 ,Xa2 )に抵抗値測
定手段を接続するとともに他方の端部(即ち電極X
b1 ,Xb2 )を開放する状態とを交互に切り換えるこ
とによって、全面抵抗膜10,11の2点が同時に押さ
れた場合でも、全面抵抗膜10,11のいずれかの端部
に近い側の点のX座標をそれぞれ求めることができる。
また、Y座標についてもX座標と同様に、スイッチ手段
が全面抵抗膜20,21の一方の端部(即ち電極Y
a1 ,Ya2 )を開放するとともに他方の端部(即ち電
極Yb1 ,Yb2 )に抵抗値測定手段を接続する状態
と、一方の端部(即ち電極Ya1 ,Ya2 )に抵抗値測
定手段を接続するとともに他方の端部(即ち電極Y
b1 ,Yb2 )を開放する状態とを交互に切り換えるこ
とによって、全面抵抗膜20,21の2点が同時に押さ
れた場合でも、全面抵抗膜20,21のいずれかの端部
に近い側の点のY座標をそれぞれ求めることができる。
したがって、アナログ式の全面抵抗膜10,11,2
0,21を用いて同時に押し下げられた2点の位置を検
出することができ、デジタル式の場合に比べて、操作面
積、即ち、全面抵抗膜10〜21の面積が大きくなって
も外部の検出回路と接続するための回路パターンが大き
くなることはなく、また押し下げ位置の検出に要する処
理時間が長くなり、処理速度が低下することもない。As described above, the switch means S 1 , S
2 is one end of the entire surface resistive films 10 and 11 (that is, the electrode X
a 1 , Xa 2 ) are opened and the resistance measuring means is connected to the other end (ie, electrodes Xb 1 , Xb 2 ), and the resistance is connected to one end (ie, electrodes Xa 1 , Xa 2 ). Connect the measuring means and the other end (ie, electrode X
b 1 , Xb 2 ) is alternately switched between the open state and the open state, so that even if two points of the full-surface resistance films 10 and 11 are simultaneously pressed, the side close to any one end of the full-resistance films 10 and 11 Can be obtained respectively.
As for the Y coordinate, similarly to the X coordinate, the switch means is connected to one end of the entire surface resistive films 20 and 21 (that is, the electrode Y).
a 1 , Ya 2 ) are opened and the resistance measuring means is connected to the other end (that is, the electrodes Yb 1 , Yb 2 ), and the resistance value is connected to one end (ie, the electrodes Ya 1 , Ya 2 ). The measuring means is connected and the other end (that is, the electrode Y
b 1 , Yb 2 ) are alternately switched between open and closed states, so that even when two points of the full-surface resistance films 20 and 21 are pressed simultaneously, the side closer to one of the ends of the full-resistance films 20 and 21 Can be obtained respectively.
Therefore, the analog type full-surface resistance films 10, 11, 12
It is possible to detect the positions of two points that are simultaneously depressed by using 0 and 21. Even if the operation area, that is, the area of the entire resistive films 10 to 21 becomes larger than that of the digital type, external detection is performed. The circuit pattern for connecting to the circuit does not become large, and the processing time required for detecting the depressed position does not increase, and the processing speed does not decrease.
【0022】尚、本実施形態では、電極Xa1 〜Xb1
間、Xa2 〜Xb2 間の抵抗Rx0,Rx0'を既知とし
て演算を行っているが、全面抵抗膜10,11のばらつ
きや定電流源1のばらつきなどによる誤差をなくすため
に、電源立ち上げ時などの初期状態において、例えば電
極Xb1 ,Xb2 間を短絡し、電極Xa1 ,Xa2 間に
定電流源1及び電圧検出手段30を接続して、電極Xa
1 〜Xb1 間及び電極Xa2 〜Xb2 間のトータルの抵
抗値を測定し、この測定値を基に上述の演算を行うよう
にしても良い。またY方向についても同様に、初期状態
において、例えば電極Yb1 ,Yb2 間を短絡し、電極
Ya1 ,Ya2 間に定電流源1及び電圧検出手段30を
接続して、電極Ya1 〜Yb1 間及び電極Ya2 〜Yb
2 間のトータルの抵抗値を測定し、この測定値を基に上
述の演算を行うようにしても良い。In this embodiment, the electrodes Xa 1 to Xb 1
The calculation is performed with the resistances Rx 0 , Rx 0 ′ between Xa 2 and Xb 2 known, but in order to eliminate errors due to variations in the entire resistance films 10 and 11 and variations in the constant current source 1, In an initial state such as startup, for example, the electrodes Xb 1 and Xb 2 are short-circuited, the constant current source 1 and the voltage detecting means 30 are connected between the electrodes Xa 1 and Xa 2 ,
1 ~Xb 1 and between the electrodes Xa 2 ~Xb measuring the resistance value of the total of between 2, based on this measurement may be performed the above calculation. Also similarly the Y direction, in the initial state, for example, the electrodes Yb 1, Yb 2 between short-circuited, by connecting a constant current source 1 and the voltage detecting means 30 between the electrodes Ya 1, Ya 2, electrodes Ya 1 ~ Between Yb 1 and electrodes Ya 2 to Yb
A total resistance value between the two may be measured, and the above-described calculation may be performed based on the measured value.
【0023】(実施形態2)本実施形態の抵抗膜式入力
装置の概略構成図を図3に示す。実施形態1の抵抗膜式
入力装置では1対の全面抵抗膜を2組設けているが、本
実施形態では、一対の略矩形状の絶縁シートを各辺を合
わせて対向配置し、各絶縁シートの対向面に全面にわた
って抵抗を設け、全面抵抗膜10,20を形成してい
る。(Embodiment 2) FIG. 3 is a schematic configuration diagram of a resistive film type input device according to this embodiment. In the resistive film type input device according to the first embodiment, two pairs of the entire resistive films are provided. In the present embodiment, a pair of substantially rectangular insulating sheets are arranged to face each other so as to face each other. A resistor is provided on the entire opposing surface to form resistive films 10 and 20 on the entire surface.
【0024】全面抵抗膜10の4辺の内、対向する2辺
には電極Xa1 ,Xb1 が設けられ、他の2辺には電極
Ya1 ,Yb1 が設けられている。また、電極Xa1 ,
Xb 1 が設けられた全面抵抗膜10の2辺に対応する全
面抵抗膜20の2辺にはそれぞれ電極Xa2 ,Xb2 が
設けられ、電極Ya1 ,Yb1 が設けられた全面抵抗膜
10の2辺に対応する全面抵抗膜20の2辺にはそれぞ
れ電極Ya2 ,Yb2が設けられている。Two opposing sides of the four sides of the entire surface resistive film 10
Has electrode Xa1, Xb1Are provided, and electrodes are provided on the other two sides.
Ya1, Yb1Is provided. The electrode Xa1,
Xb 1Are provided on all sides corresponding to the two sides of the overall resistance film 10 provided with
Electrodes Xa are provided on two sides of the sheet resistance film 20, respectively.Two, XbTwoBut
Provided, the electrode Ya1, Yb1The whole surface resistive film provided with
Each of the two sides of the overall resistance film 20 corresponding to the two sides of
Electrode YaTwo, YbTwoIs provided.
【0025】図4に示すように、電極Xa1 ,Xb1 に
はスイッチ手段S1 が接続され、電極Xa2 ,Xb2 に
はスイッチ手段S2 が接続されている。スイッチ手段S
1 ,S2 は図示しないCPUによって切り換えられてお
り、スイッチ手段S1 ,S2の切り換えによって、電極
Xa1 ,Xa2 間、又は、電極Xb1 ,Xb2 間のいず
れか一方に定電流源1及び電圧検出手段30が接続され
るとともに、他方が開放される。As shown in FIG. 4, the switch means S 1 is connected to the electrode Xa 1, Xb 1, the electrode Xa 2, Xb 2 are connected to the switching means S 2. Switch means S
1, S 2 are switched by a not-shown CPU, by switching the switching means S 1, S 2, between the electrodes Xa 1, Xa 2, or a constant current source to either one of between the electrodes Xb 1, Xb 2 1 and the voltage detecting means 30 are connected, and the other is opened.
【0026】例えば、スイッチ手段S1 ,S2 の切り替
えによって、全面抵抗膜10,20の一辺に形成された
電極Xa1 ,Xa2 間に定電流源1及び電圧検出手段3
0を接続するとともに、電極Xa1 ,Xa2 が形成され
た辺と対向する辺にそれぞれ形成された電極Xb1 ,X
b2 を開放し、電圧検出手段30により電極Xa1 ,X
a2 間に発生する電圧を検出する。ここで、全面抵抗膜
10の2点P1 ,P2が押し下げられ、全面抵抗膜1
0,20が2点P1 ,P2 で互いに導通する場合、点P
2 よりも点P1 の方が電極Xa1 ,Xa2 に近いので、
電極Xa1 ,Xa 2 間の抵抗値は、電極Xa1 〜点P1
間の抵抗Rx1 と電極Xa2 〜点P1 間の抵抗Rx1'
(=Rx1 )との和(=2Rx1 )になり、抵抗2Rx
1 に比例した電圧が電極Xa1 ,Xa2 間に発生する。
電極Xa1 〜Xb1 間、電極Xa2 〜Xb2 間の抵抗は
既知であり、それぞれRx0 であるので、電圧検出手段
30の測定値から抵抗Rx1 を求め、(Rx1 /R
x0 )の演算を行うことにより、押し下げられた点P1
のX座標を検出することができる。For example, switch means S1, STwoSwitching
Thus, the entire surface of the resistive films 10 and 20 are formed on one side
Electrode Xa1, XaTwoA constant current source 1 and a voltage detecting means 3
0 and the electrode Xa1, XaTwoIs formed
Xb formed on the side opposite to the side1, X
bTwoAnd the electrode Xa is detected by the voltage detecting means 30.1, X
aTwoDetect the voltage generated between them. Where the resistive film
2 points P of 101, PTwoIs pushed down, and the entire surface resistive film 1
0 and 20 are 2 points P1, PTwoAt the point P
TwoPoint P than1Is the electrode Xa1, XaTwoSo close to
Electrode Xa1, Xa TwoThe resistance value between the electrodes Xa1~ Point P1
Resistance Rx between1And electrode XaTwo~ Point P1Resistance Rx between1'
(= Rx1) And (= 2Rx1) And the resistance 2Rx
1Is proportional to the electrode Xa1, XaTwoOccur in between.
Electrode Xa1~ Xb1Electrode XaTwo~ XbTwoThe resistance between
Known and each Rx0Therefore, the voltage detecting means
From the 30 measurements, the resistance Rx1And (Rx1/ R
x0), The depressed point P1
Can be detected.
【0027】次に、スイッチ手段S1 ,S2 を切り替え
て、全面抵抗膜10,20の電極Xa1 ,Xa2 を開放
するとともに、全面抵抗膜10,20間に定電流源1及
び電圧検出手段30を接続して、電圧検出手段30によ
り電極Xb1 ,Xb2 間に発生する電圧を検出する。こ
こで、全面抵抗膜10の2点P1 ,P2 が押し下げら
れ、全面抵抗膜10,20が2点P1 ,P2 でそれぞれ
導通する場合、点P1 よりも点P2 の方が電極Xb1 ,
Xb2 に近いので、電極Xb1 ,Xb2 間の抵抗値は、
電極Xb1 〜点P2 間の抵抗Rx3 と電極Xb2 〜点P
2 間の抵抗Rx3'(=Rx3 )との和(=2Rx3 )に
なり、抵抗2Rx3 に比例した電圧が電極Xb1 ,Xb
2 間に発生する。したがって、電圧検出手段30の測定
値から抵抗Rx3 を求め、{(Rx0 −Rx3 )/Rx
0 }の演算を行うことにより、押し下げられた点P2 の
X座標を検出することができる。Next, the switching means S 1 , S 2 are switched to open the electrodes Xa 1 , Xa 2 of the entire resistance films 10, 20, and the constant current source 1 and the voltage detection between the entire resistance films 10, 20. The voltage detecting means 30 detects the voltage generated between the electrodes Xb 1 and Xb 2 . Here, when the two points P 1 and P 2 of the overall resistance film 10 are pushed down and the entire resistance films 10 and 20 conduct at the two points P 1 and P 2 , respectively, the point P 2 is higher than the point P 1. The electrodes Xb 1 ,
Since it is close to Xb 2 , the resistance between the electrodes Xb 1 and Xb 2 becomes
Resistance Rx 3 between the electrodes Xb 1 ~ point P 2 and the electrodes Xb 2 ~ point P
The sum is equal to the resistance Rx 3 ′ (= Rx 3 ) between the two (= 2Rx 3 ), and voltages proportional to the resistance 2Rx 3 are applied to the electrodes Xb 1 and Xb.
Occurs between the two . Therefore, the calculated resistance Rx 3 from the measured value of the voltage detection unit 30, {(Rx 0 -Rx 3 ) / Rx
By performing the calculation of the 0}, it is possible to detect the X-coordinate of a point depressed P 2.
【0028】上述と同様に、CPUがスイッチ手段を切
り替えて、全面抵抗膜10,20の一辺に形成された電
極Ya1 ,Ya2 間に定電流源1及び電圧検出手段30
を接続するとともに、電極Ya1 ,Ya2 が形成された
辺と対向する辺に形成された電極Yb1 ,Yb2 をそれ
ぞれ開放して、電圧検出手段30により電極Ya1 ,Y
a2 間に発生する電圧を検出する。ここで、全面抵抗膜
10の2点P1 ,P2が押し下げられ、全面抵抗膜1
0,20が2点P1 ,P2 で互いに導通する場合、2点
のP1 ,P2 の内で点P1 よりも点P2 の方が電極Ya
1 ,Ya2 に近いので、電極Ya1 ,Ya2 間の抵抗値
は、電極Ya1 〜点P2 間の抵抗Ry1 と電極Ya2 〜
点P2 間の抵抗Ry1'(=Ry1 )との和(=2R
y1 )になり、抵抗2Ry1 に比例した電圧が電極Ya
1 ,Ya2 間に発生する。電極Ya1 〜Yb1 間、電極
Ya2 〜Yb2 間の抵抗は既知であり、それぞれRy0
であるので、電圧検出手段30の測定値から抵抗Ry1
を求め、(Ry1 /Ry0 )の演算を行うことにより、
点P2 のY座標を求めることができる。In the same manner as described above, the CPU switches the switch means so that the constant current source 1 and the voltage detecting means 30 are provided between the electrodes Ya 1 and Ya 2 formed on one side of the entire resistive films 10 and 20.
With connecting and electrodes Ya 1, Ya 2 electrode Yb 1 formed on the formed sides and opposite sides, Yb 2 were opened respectively, electrodes Ya 1 by the voltage detection means 30, Y
detecting a voltage generated between a 2. Here, the two points P 1 and P 2 of the overall resistance film 10 are pushed down, and the overall resistance film 1 is lowered.
If 0,20 conducts each other at two points P 1, P 2, two points P 1, it is the electrode Ya of the point P 2 than the point P 1 among the P 2
1 and Ya 2 , the resistance between the electrodes Ya 1 and Ya 2 becomes the resistance Ry 1 between the electrode Ya 1 and the point P 2 and the resistance between the electrodes Ya 2 and Ya 2 .
The sum with the resistance Ry 1 ′ (= Ry 1 ) between the points P 2 (= 2R
y 1 ), and a voltage proportional to the resistance 2Ry 1 is applied to the electrode Ya.
1, generated between Ya 2. Between the electrodes Ya 1 ~Yb 1, the resistance between the electrodes Ya 2 ~Yb 2 are known, respectively Ry 0
Therefore, the resistance Ry 1 is obtained from the measured value of the voltage detecting means 30.
Is calculated, and (Ry 1 / Ry 0 ) is calculated, whereby
It can be determined Y coordinate of the point P 2.
【0029】次に、スイッチ手段を切り替えて、全面抵
抗膜10,20の電極Ya1 ,Ya 2 を開放するととも
に、電極Yb1 ,Yb2 間に定電流源1及び電圧検出手
段30を接続して、電圧検出手段30により電極Y
b1 ,Yb2 間に発生する電圧を検出する。ここで、2
点P1 ,P2 の内で点P2 よりも点P1 の方が電極Yb
1,Yb2 に近いので、電極Yb1 ,Yb2 間の抵抗値
は、電極Yb1 〜点P1 間の抵抗Ry3 と電極Yb2 〜
点P1 間の抵抗Ry3'(=Ry3 )との和(=2R
y3 )になり、抵抗2Ry3 に比例した電圧が電極Yb
1 ,Yb2 間に発生する。したがって、電圧検出手段3
0の測定値から抵抗Ry3 を求め、{(Ry0 −R
y3 )/Ry0 }の演算を行うことにより、点P1 のY
座標を求めることができる。Next, by switching the switch means, the entire surface resistance is changed.
Electrodes Ya of the anti-films 10 and 201, Ya TwoTo release
And the electrode Yb1, YbTwoConstant current source 1 and voltage detection
The stage 30 is connected, and the electrode Y is detected by the voltage detecting means 30.
b1, YbTwoDetect the voltage generated between them. Where 2
Point P1, PTwoWithin the point PTwoPoint P than1Is the electrode Yb
1, YbTwo, The electrode Yb1, YbTwoResistance value between
Is the electrode Yb1~ Point P1Resistance Ry betweenThreeAnd the electrode YbTwo~
Point P1Resistance Ry betweenThree'(= RyThree) And (= 2R
yThree) And the resistance 2RyThreeIs proportional to the electrode Yb
1, YbTwoOccur in between. Therefore, the voltage detecting means 3
From the measured value of 0, the resistance RyThreeAnd {(Ry0-R
yThree) / Ry0By performing the calculation of}, the point P1Of Y
The coordinates can be determined.
【0030】このように、スイッチ手段S1 ,S2 が、
全面抵抗膜10,20の一辺に夫々形成された電極Xa
1 ,Xa2 間に定電流源1及び電圧検出手段30を接続
するとともに電極Xa1 ,Xa2 が形成された辺と対向
する全面抵抗膜10,20の辺に夫々形成された電極X
b1 ,Xb2 を夫々開放する状態と、全面抵抗膜10,
20の電極Xa1 ,Xa2 を夫々開放するとともに電極
Xb1 ,Xb2 間に定電流源1及び電圧検出手段30を
接続する状態とを交互に切り換えることによって、全面
抵抗膜10,20の2点が同時に押し下げられた場合で
も、電極Xa1,Xa2 、又は、電極Xb1 ,Xb2 の
いずれかに近い側の点のX座標をそれぞれ求めることが
できる。また、Y座標についてもX座標と同様に、スイ
ッチ手段が、全面抵抗膜10,20の一辺に夫々形成さ
れた電極Ya1 ,Ya2 間に定電流源1及び電圧検出手
段30を接続するとともに電極Ya1 ,Ya2 が形成さ
れた辺と対向する全面抵抗膜10,20の辺に夫々形成
された電極Yb1 ,Yb2を夫々開放する状態と、全面
抵抗膜10,20の電極Ya1 ,Ya2 を夫々開放する
とともに電極Yb1 ,Yb2 間に定電流源1及び電圧検
出手段30を接続する状態とを交互に切り換えることに
よって、全面抵抗膜10,20の2点が同時に押し下げ
られた場合でも、電極Ya1 ,Ya2 、又は、電極Yb
1 ,Yb2 のいずれかに近い側の点のY座標をそれぞれ
求めることができる。したがって、アナログ式の全面抵
抗膜10,20を用いて同時に押し下げられた2点の位
置を検出することができ、デジタル式の場合に比べて、
操作面積が大きくなっても外部の検出回路と接続するた
めの回路パターンが大きくなることはなく、また処理速
度が低下することもない。また、実施形態1に比べて、
2枚の全面抵抗膜10,20で抵抗膜式入力装置を実現
でき、全面抵抗膜の枚数を減らして、コストダウンを図
ることができる。Thus, the switch means S 1 , S 2
Electrodes Xa formed on one side of the entire surface resistive films 10 and 20, respectively.
1, the electrode with connecting a constant current source 1 and the voltage detecting means 30 between Xa 2 Xa 1, the sides respectively formed electrodes X of Xa 2 is a side opposed formed entirely resistive film 10, 20
b 1 , Xb 2 are opened, and the entire resistive film 10, Xb 2 is opened.
By opening the 20 electrodes Xa 1 and Xa 2 respectively and alternately switching the state where the constant current source 1 and the voltage detecting means 30 are connected between the electrodes Xb 1 and Xb 2 , the entire resistive films 10 and 20 are switched. Even when the points are depressed at the same time, the X coordinate of the point closer to one of the electrodes Xa 1 , Xa 2 or the electrodes Xb 1 , Xb 2 can be obtained. As for the Y coordinate, similarly to the X coordinate, the switching means connects the constant current source 1 and the voltage detecting means 30 between the electrodes Ya 1 and Ya 2 formed on one side of the entire resistive films 10 and 20, respectively. A state in which the electrodes Yb 1 and Yb 2 formed on the sides of the entire resistive films 10 and 20 facing the sides on which the electrodes Ya 1 and Ya 2 are formed, respectively, is opened, and the electrodes Ya 1 of the full resistive films 10 and 20 are opened. , Ya 2 , respectively, and alternately switching the state in which the constant current source 1 and the voltage detecting means 30 are connected between the electrodes Yb 1 , Yb 2 , thereby simultaneously pressing down the two points of the entire resistive films 10, 20. The electrodes Ya 1 and Ya 2 or the electrodes Yb
The Y coordinate of a point closer to either 1 or Yb 2 can be obtained. Therefore, it is possible to detect the positions of two points that are simultaneously depressed using the analog type full-surface resistive films 10 and 20, and the digital type can be compared with the digital type.
Even if the operation area increases, the circuit pattern for connecting to an external detection circuit does not increase, and the processing speed does not decrease. Also, compared to the first embodiment,
The resistance film type input device can be realized by the two full-surface resistance films 10 and 20, and the number of the whole-surface resistance films can be reduced, and the cost can be reduced.
【0031】尚、本実施形態では、電極Xa1 〜Xb1
間、Xa2 〜Xb2 間の抵抗Rx0,Rx0'を既知とし
て演算を行っているが、全面抵抗膜10,20のばらつ
きや定電流源1のばらつきなどによる誤差をなくすため
に、電源立ち上げ時などの初期状態において、例えば電
極Xb1 ,Xb2 間を短絡し、電極Xa1 ,Xa2 間に
定電流源1及び電圧検出手段30を検出し、電極Xa1
〜Xb1 間及び電極Xa2 〜Xb2 間のトータルの抵抗
値を測定し、この測定値を基に上述の演算を行うように
しても良い。またY方向についても同様に、初期状態に
おいて、例えば電極Yb1 ,Yb2 間を短絡し、電極Y
a1 ,Ya2 間に定電流源1及び電圧検出手段30を検
出し、電極Ya1 〜Yb1 間及び電極Ya2 〜Yb2 間
のトータルの抵抗値を測定し、この測定値を基に上述の
演算を行うようにしても良い。In this embodiment, the electrodes Xa 1 to Xb 1
The calculation is performed with the resistances Rx 0 and Rx 0 ′ between Xa 2 and Xb 2 being known, but in order to eliminate errors due to variations in the entire resistance films 10 and 20 and variations in the constant current source 1, in the initial state, such as during start-up, for example, electrodes Xb 1, Xb 2 between short-circuited to detect the constant current source 1 and the voltage detecting means 30 between the electrodes Xa 1, Xa 2, electrodes Xa 1
The total resistance between the electrodes Xa 1 and Xa 2 and the electrodes Xa 2 and Xb 2 may be measured, and the above-described calculation may be performed based on the measured values. Similarly, in the Y direction, in the initial state, for example, the electrodes Yb 1 and Yb 2 are short-circuited and the electrodes Yb 1 and Yb 2 are short-circuited.
a 1, Ya detects a constant current source 1 and the voltage detecting means 30 between 2 and between the electrodes Ya 1 ~Yb 1 and electrode Ya 2 ~Yb resistance value of the total of between 2 were measured, based on this measurement value The above calculation may be performed.
【0032】[0032]
【発明の効果】上述のように、請求項1の発明は、対向
配置されるとともに、押し下げられた部位で互いに導通
する一対の全面抵抗膜と、一対の全面抵抗膜の両端部に
それぞれ接続されるスイッチ手段と、スイッチ手段を介
して前記一対の全面抵抗膜のいずれかの端部に接続さ
れ、該端部間の抵抗値を測定する抵抗測定手段とを備
え、スイッチ手段は、一対の全面抵抗膜の一方の端部を
それぞれ開放するとともに他方の端部間に抵抗測定手段
を接続する状態と、一対の全面抵抗膜の一方の端部間に
抵抗測定手段を接続するとともに他方の端部をそれぞれ
開放する状態とを交互に切り替えており、全面抵抗膜の
2点が同時に押し下げられた場合でも、抵抗測定手段が
接続された全面抵抗膜の端部に近い側の点の位置に比例
した抵抗値を検出することができ、この抵抗値から押し
下げられた点の位置を求めることができるので、抵抗測
定手段を接続する端部を交互に切り換えることによっ
て、アナログ式の抵抗膜式入力装置により同時に押し下
げられた2点の位置を検出できるという効果がある。し
かも、全面抵抗膜の面積が大きくなっても、デジタル式
のように全面抵抗膜と外部の検出回路とを接続するパタ
ーンが大きくなったり、処理速度が遅くなったりするこ
とがなく、小型で処理速度の速い抵抗膜式入力装置を実
現できるという効果がある。As described above, according to the first aspect of the present invention, a pair of full resistance films which are disposed opposite to each other and are electrically connected to each other at a depressed portion, and which are respectively connected to both ends of the pair of full resistance films. Switch means, and resistance measuring means connected to one end of the pair of full-surface resistance films via the switch means and measuring a resistance value between the ends. A state in which one end of the resistive film is opened and the resistance measuring means is connected between the other ends, and a state in which the resistance measuring means is connected between one end of the pair of entire resistive films and the other end is connected. Are alternately switched to open states, and even when two points on the entire resistance film are simultaneously pushed down, the resistance measurement means is proportional to the position of the point on the side closer to the end of the resistance film connected thereto. Detecting resistance value Since the position of the point depressed can be obtained from the resistance value, by alternately switching the end to which the resistance measuring means is connected, the two points simultaneously depressed by the analog type resistive film type input device can be obtained. There is an effect that the position of a point can be detected. Moreover, even if the area of the entire resistive film increases, the pattern for connecting the resistive film to an external detection circuit does not increase or the processing speed does not decrease as in the digital type. There is an effect that a high-speed resistive film type input device can be realized.
【0033】請求項2の発明は、全面抵抗膜は略矩形状
に形成され、各辺を合わせて対向配置された一対の全面
抵抗膜を二組設け、一方の組の全面抵抗膜の対向する2
辺に、スイッチ手段がそれぞれ接続される電極をそれぞ
れ形成するとともに、上記2辺と略直交する他方の組の
全面抵抗膜の対向する2辺に、スイッチ手段がそれぞれ
接続される電極をそれぞれ形成しているので、請求項1
の発明と同様に、抵抗測定手段を接続する電極を交互に
切り換えることによって、同時に押し下げられた2点の
位置を検出できるという効果がある。According to a second aspect of the present invention, the entire surface resistive film is formed in a substantially rectangular shape, and two sets of a pair of full surface resistive films arranged so as to face each other are provided. 2
An electrode to which the switch means is connected is formed on each side, and an electrode to which the switch means is connected is formed on two opposite sides of the other set of the entire surface resistive film substantially orthogonal to the two sides. Claim 1
Similarly to the invention of the third aspect, by alternately switching the electrodes connected to the resistance measuring means, there is an effect that the positions of two points which are simultaneously depressed can be detected.
【0034】請求項3の発明は、各辺を合わせて対向配
置されるとともに、押し下げられた部位で互いに導通す
る略矩形状の一対の全面抵抗膜と、一対の全面抵抗膜の
四方の端部にそれぞれ接続されるスイッチ手段と、一対
の全面抵抗膜の一方の端部間にスイッチ手段を介して接
続され、該端部間の抵抗値を測定する抵抗測定手段とを
備え、上記スイッチ手段は、一対の全面抵抗膜の対向す
る端部の一方をそれぞれ開放するとともに他方の端部間
に抵抗測定手段を接続する状態と、一対の全面抵抗膜の
対向する端部の一方の端部間に抵抗測定手段を接続する
とともに他方の端部をそれぞれ開放する状態とを交互に
切り替えており、全面抵抗膜の2点が同時に押し下げら
れた場合でも、抵抗測定手段が接続された端部に近い側
の点の位置に比例した抵抗値を検出することができ、こ
の抵抗値から押し下げられた点の位置を求めることがで
きるので、抵抗測定手段を接続する端部を交互に切り換
えることによって、アナログ式の抵抗膜式入力装置によ
り同時に押し下げられた2点の位置を検出できるという
効果がある。しかも、全面抵抗膜の面積が大きくなって
も、デジタル式のように全面抵抗膜と外部の検出回路と
を接続するパターンが大きくなったり、処理速度が遅く
なったりすることがなく、小型で処理速度の速い抵抗膜
式入力装置を実現できるという効果がある。According to a third aspect of the present invention, there is provided a pair of substantially rectangular full-surface resistance films which are opposed to each other with their sides aligned and which are electrically connected to each other at a depressed portion, and four end portions of the pair of full-surface resistance films. And a resistance measuring means connected between the one ends of the pair of full-surface resistance films via the switching means, and measuring a resistance value between the ends, wherein the switching means is A state in which one of the opposite ends of the pair of full-surface resistance films is opened and the resistance measuring means is connected between the other ends, and a state in which one of the opposite ends of the pair of full-surface resistance films is connected. The state where the resistance measuring means is connected and the state where the other end is opened are alternately switched. Even when two points of the entire resistance film are simultaneously pushed down, the side close to the end to which the resistance measuring means is connected is connected. Proportional to the position of the point The resistance value can be detected, and the position of the depressed point can be obtained from the resistance value. Therefore, by alternately switching the end to which the resistance measuring means is connected, the analog resistance film type input device can be obtained. Thus, there is an effect that the positions of the two points pressed down at the same time can be detected. Moreover, even if the area of the entire resistive film increases, the pattern for connecting the resistive film to an external detection circuit does not increase or the processing speed does not decrease as in the digital type. There is an effect that a high-speed resistive film type input device can be realized.
【0035】請求項4の発明は、全面抵抗膜の4辺にス
イッチ手段がそれぞれ接続される電極を形成し、上記ス
イッチ手段は、一対の全面抵抗膜の対向する2辺の内の
一方の辺に形成された電極をそれぞれ開放するとともに
他方の辺に形成された電極間に抵抗測定手段を接続する
状態と、一対の全面抵抗膜の対向する2辺の内の一方の
辺に形成された電極間に抵抗測定手段を接続するととも
に他方の辺に形成された電極をそれぞれ開放する状態と
を交互に切り換えており、請求項3の発明と同様に、抵
抗測定手段を接続する電極を切り換えることによって同
時に押し下げられた2点の位置を検出できるという効果
がある。According to a fourth aspect of the present invention, electrodes to which switch means are respectively connected are formed on four sides of the entire surface resistive film, and the switch means is provided on one side of two opposing sides of the pair of overall resistive films. The electrodes formed on the other side are opened and the resistance measuring means is connected between the electrodes formed on the other side, and the electrodes formed on one side of two opposite sides of the pair of full-surface resistance films. A state in which the resistance measuring means is connected therebetween and the state in which the electrodes formed on the other side are respectively opened are alternately switched. Similarly to the invention of claim 3, by switching the electrode connecting the resistance measuring means. There is an effect that the positions of two points that are simultaneously pushed down can be detected.
【0036】請求項5の発明は、一対の全面抵抗膜を押
し下げられた部位で互いに導通するように対向配置し、
一対の全面抵抗膜の一方の端部をスイッチ手段を介して
それぞれ開放するとともに、前記一対の全面抵抗膜の他
方の端部間にスイッチ手段を介して抵抗測定手段を接続
し、前記一対の全面抵抗膜の他方の端部間の抵抗値を測
定した後、前記一対の全面抵抗膜の一方の端部間にスイ
ッチ手段を介して抵抗測定手段を接続するとともに、前
記一対の全面抵抗膜の他方の端部をスイッチ手段を介し
てそれぞれ開放し、前記一対の全面抵抗膜の他方の端部
間の抵抗値を測定して、前記2個の抵抗値から押し下げ
られた2点の位置を検出しており、全面抵抗膜の2点が
同時に押し下げられた場合でも、抵抗測定手段が接続さ
れた全面抵抗膜の端部に近い側の点の位置に比例した抵
抗値を検出することができ、この抵抗値から押し下げら
れた点の位置を求めることができるので、抵抗測定手段
を接続する全面抵抗膜の端部を交互に切り換えることに
よって、アナログ式の抵抗膜式入力装置で同時に押し下
げられた2点の位置を検出できるという効果がある。According to a fifth aspect of the present invention, a pair of full-surface resistive films are disposed opposite to each other so as to be electrically connected to each other at a portion where the resistive film is depressed.
One end of each of the pair of full-surface resistance films is opened via switching means, and resistance measurement means is connected between the other ends of the pair of full-surface resistance films via switching means, and the pair of full-surface resistance films is connected. After measuring the resistance value between the other ends of the resistive film, a resistance measuring means is connected between one ends of the pair of overall resistive films via a switch means, and the other of the pair of overall resistive films is connected. Are opened through switch means, and the resistance between the other ends of the pair of overall resistance films is measured to detect the positions of two points depressed from the two resistances. Therefore, even when two points on the entire surface resistive film are simultaneously pressed down, the resistance measuring means can detect a resistance value proportional to the position of a point closer to the end of the connected entire surface resistive film. Find the position of the point depressed from the resistance value Since it is Rukoto, by switching the end of the entire resistive film connected to resistance measuring means alternately, there is an effect that can detect the position of the two points that are simultaneously depressed by the resistance film type input device of analog.
【0037】請求項6の発明は、略矩形状の一対の全面
抵抗膜を押し下げられた部位で互いに導通するように各
辺を合わせて対向配置し、一対の全面抵抗膜の4辺にそ
れぞれ電極を形成し、一対の全面抵抗膜の対向する2辺
の内の一方の辺に形成された電極をスイッチ手段を介し
てそれぞれ開放するとともに、他方の辺に形成された電
極間にスイッチ手段を介して抵抗測定手段を接続して電
極間の抵抗値を測定した後、一対の全面抵抗膜の対向す
る2辺の内の一方の辺に形成された電極間にスイッチ手
段を介して抵抗測定手段を接続するとともに、他方の辺
に形成された電極をスイッチ手段を介してそれぞれ開放
して、電極間の抵抗値を測定して、前記2個の抵抗値か
ら押し下げられた2点の位置を検出しており、全面抵抗
膜の2点が同時に押し下げられた場合でも、抵抗測定手
段が接続された電極に近い側の点の位置に比例した抵抗
値を検出することができ、この抵抗値から押し下げられ
た点の位置を求めることができるので、抵抗測定手段を
接続する電極を交互に切り換えることによって、アナロ
グ式の抵抗膜式入力装置で同時に押し下げられた2点の
位置を検出できるという効果がある。According to a sixth aspect of the present invention, a pair of substantially rectangular full-surface resistive films are disposed so as to be opposed to each other so as to be electrically connected to each other at a depressed portion, and electrodes are respectively provided on four sides of the pair of general-purpose resistive films. Are formed, and the electrodes formed on one of the two opposite sides of the pair of full-surface resistive films are opened via the switch means, and the switch means is provided between the electrodes formed on the other side via the switch means. After measuring the resistance value between the electrodes by connecting the resistance measuring means, the resistance measuring means is connected via a switching means between the electrodes formed on one of two opposing sides of the pair of overall resistive films. At the same time, the electrodes formed on the other side are opened via switch means, and the resistance between the electrodes is measured to detect the positions of the two points depressed from the two resistances. And the two points of the overall resistive film are Even when the resistance is lowered, the resistance measuring means can detect a resistance value proportional to the position of the point closer to the connected electrode, and the position of the depressed point can be obtained from the resistance value. By alternately switching the electrodes connected to the resistance measuring means, there is an effect that the positions of two points simultaneously depressed by the analog resistive film type input device can be detected.
【図1】実施形態1の抵抗膜式入力装置を示す概略構成
図である。FIG. 1 is a schematic configuration diagram illustrating a resistive film type input device according to a first embodiment.
【図2】同上の動作を説明する回路図である。FIG. 2 is a circuit diagram illustrating the operation of the above.
【図3】実施形態2の抵抗膜式入力装置を示す概略構成
図である。FIG. 3 is a schematic configuration diagram illustrating a resistive film type input device according to a second embodiment.
【図4】同上の動作を説明する回路図である。FIG. 4 is a circuit diagram illustrating an operation of the above.
【図5】従来の抵抗膜式入力装置を示す概略構成図であ
る。FIG. 5 is a schematic configuration diagram showing a conventional resistive film type input device.
【図6】同上の動作を説明する回路図である。FIG. 6 is a circuit diagram illustrating the operation of the above.
【図7】同上の2点押し時の動作を説明する説明図であ
る。FIG. 7 is an explanatory diagram illustrating an operation at the time of two-point pressing in the above.
【図8】同上の2点押し時の動作を説明する回路図であ
る。FIG. 8 is a circuit diagram illustrating an operation at the time of two-point pressing in the above.
10,11 全面抵抗膜 P1 ,P2 点 Rx1,Rx3 抵抗 Xa1,Xa2,Xb1,Xb2 電極10,11 entirely resistive film P 1, P 2 points Rx 1, Rx 3 resistance Xa 1, Xa 2, Xb 1 , Xb 2 electrode
フロントページの続き (72)発明者 入部 恭輔 大阪府門真市大字門真1048番地松下電工株 式会社内Continuing on the front page (72) Inventor Kyosuke Iribe 1048 Kazuma Kadoma, Kadoma City, Osaka Inside Matsushita Electric Works, Ltd.
Claims (6)
部位で互いに導通する一対の全面抵抗膜と、一対の全面
抵抗膜の両端部にそれぞれ接続されるスイッチ手段と、
スイッチ手段を介して前記一対の全面抵抗膜のいずれか
の端部に接続され、該端部間の抵抗値を測定する抵抗測
定手段とを備え、スイッチ手段は、一対の全面抵抗膜の
一方の端部をそれぞれ開放するとともに他方の端部間に
抵抗測定手段を接続する状態と、一対の全面抵抗膜の一
方の端部間に抵抗測定手段を接続するとともに他方の端
部をそれぞれ開放する状態とを交互に切り替えることを
特徴とする抵抗膜式入力装置。1. A pair of full-surface resistance films which are arranged opposite to each other and are electrically connected to each other at a depressed portion, and switch means respectively connected to both ends of the pair of full-surface resistance films;
A resistance measuring means connected to one end of the pair of full-surface resistance films via a switch means, and measuring a resistance value between the ends, wherein the switch means comprises one of the pair of full-resistance films. A state in which the ends are opened and the resistance measuring means is connected between the other ends, and a state in which the resistance measuring means is connected between one ends of the pair of full-surface resistance films and the other ends are opened respectively. And a resistance film type input device characterized by alternately switching between (a) and (b).
合わせて対向配置された一対の全面抵抗膜を二組設け、
一方の組の全面抵抗膜の対向する2辺に、スイッチ手段
がそれぞれ接続される電極をそれぞれ形成するととも
に、上記2辺と略直交する他方の組の全面抵抗膜の対向
する2辺に、スイッチ手段がそれぞれ接続される電極を
それぞれ形成したことを特徴とする請求項1記載の抵抗
膜式入力装置。2. The whole-surface resistance film is formed in a substantially rectangular shape, and two sets of a pair of whole-surface resistance films disposed so as to face each other with their sides aligned are provided.
Electrodes to which the switch means are respectively connected are formed on two opposing sides of one set of full-resistance films, and a switch is formed on two opposing sides of the other set of full-resistance films that are substantially orthogonal to the two sides. 2. The resistive film input device according to claim 1, wherein said means is connected to each of said electrodes.
押し下げられた部位で互いに導通する略矩形状の一対の
全面抵抗膜と、一対の全面抵抗膜の四方の端部にそれぞ
れ接続されるスイッチ手段と、一対の全面抵抗膜の一方
の端部間にスイッチ手段を介して接続され、該端部間の
抵抗値を測定する抵抗測定手段とを備え、上記スイッチ
手段は、一対の全面抵抗膜の対向する端部の一方をそれ
ぞれ開放するとともに他方の端部間に抵抗測定手段を接
続する状態と、一対の全面抵抗膜の対向する端部の一方
の端部間に抵抗測定手段を接続するとともに他方の端部
をそれぞれ開放する状態とを交互に切り替えることを特
徴とする抵抗膜式入力装置。3. The display device according to claim 1, wherein said plurality of sides are opposed to each other.
A pair of substantially rectangular full-surface resistance films that are conductive to each other at the depressed portion, switch means respectively connected to four ends of the pair of full-resistance films, and one end of the pair of full-resistance films. A resistance measuring unit connected via switch means for measuring a resistance value between the ends, wherein the switch means opens one of the opposite ends of the pair of full-surface resistance films and opens the other end. The state in which the resistance measuring means is connected between the parts and the state in which the resistance measuring means is connected between one end of the pair of opposed resistive films and the other end is opened are alternately switched. A resistive film type input device.
れ接続される電極を形成し、上記スイッチ手段は、一対
の全面抵抗膜の対向する2辺の内の一方の辺に形成され
た電極をそれぞれ開放するとともに他方の辺に形成され
た電極間に抵抗測定手段を接続する状態と、一対の全面
抵抗膜の対向する2辺の内の一方の辺に形成された電極
間に抵抗測定手段を接続するとともに他方の辺に形成さ
れた電極をそれぞれ開放する状態とを交互に切り換える
ことを特徴とする抵抗膜式入力装置。4. An electrode connected to a switch means on each of four sides of the entire surface resistive film, wherein the switch means comprises an electrode formed on one of two opposite sides of a pair of the entire resistive films. Are opened, and the resistance measuring means is connected between the electrodes formed on the other side, and the resistance measuring means is connected between the electrodes formed on one of the two opposing sides of the pair of overall resistive films. And alternately switching between a state of opening the electrodes formed on the other side and a state of opening the electrodes formed on the other side, respectively.
互いに導通するように対向配置し、一対の全面抵抗膜の
一方の端部をスイッチ手段を介してそれぞれ開放すると
ともに、前記一対の全面抵抗膜の他方の端部間にスイッ
チ手段を介して抵抗測定手段を接続し、前記一対の全面
抵抗膜の他方の端部間の抵抗値を測定した後、前記一対
の全面抵抗膜の一方の端部間にスイッチ手段を介して抵
抗測定手段を接続するとともに、前記一対の全面抵抗膜
の他方の端部をスイッチ手段を介してそれぞれ開放し、
前記一対の全面抵抗膜の他方の端部間の抵抗値を測定し
て、前記2個の抵抗値から押し下げられた2点の位置を
検出することを特徴とする抵抗膜式入力装置の位置検出
方法。5. A pair of full-surface resistive films are opposed to each other so as to be electrically connected to each other at a depressed portion, and one end of each of the pair of full-surface resistive films is opened via a switch means. A resistance measuring means is connected between the other ends of the resistive films via a switch means, and after measuring a resistance value between the other ends of the pair of overall resistive films, one of the pair of overall resistive films is measured. While connecting the resistance measuring means through the switch means between the ends, the other end of the pair of full-surface resistive films are respectively opened through the switch means,
Measuring the resistance value between the other ends of the pair of overall resistance films to detect the positions of two points depressed from the two resistance values; Method.
れた部位で互いに導通するように各辺を合わせて対向配
置し、一対の全面抵抗膜の4辺にそれぞれ電極を形成
し、一対の全面抵抗膜の対向する2辺の内の一方の辺に
形成された電極をスイッチ手段を介してそれぞれ開放す
るとともに、他方の辺に形成された電極間にスイッチ手
段を介して抵抗測定手段を接続して電極間の抵抗値を測
定した後、一対の全面抵抗膜の対向する2辺の内の一方
の辺に形成された電極間にスイッチ手段を介して抵抗測
定手段を接続するとともに、他方の辺に形成された電極
をスイッチ手段を介してそれぞれ開放して、電極間の抵
抗値を測定して、前記2個の抵抗値から押し下げられた
2点の位置を検出することを特徴とする抵抗膜式入力装
置の位置検出方法。6. A pair of substantially rectangular resistive films are arranged so that their sides are opposed to each other so as to be electrically connected to each other at a portion where the pair of substantially rectangular resistive films are pushed down. The electrodes formed on one of the two opposing sides of the entire surface resistive film are opened via switching means, and the resistance measuring means is provided between the electrodes formed on the other side via switching means. After connecting and measuring the resistance value between the electrodes, the resistance measurement means is connected via a switch means between the electrodes formed on one of two opposite sides of the pair of full-surface resistance films, and the other is connected. The electrodes formed on the sides are opened through switch means, the resistance between the electrodes is measured, and the positions of two points depressed from the two resistances are detected. A method for detecting the position of a resistive input device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3179598A JPH11232023A (en) | 1998-02-13 | 1998-02-13 | Resistant film type input device and position detecting method therefor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3179598A JPH11232023A (en) | 1998-02-13 | 1998-02-13 | Resistant film type input device and position detecting method therefor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH11232023A true JPH11232023A (en) | 1999-08-27 |
Family
ID=12341014
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3179598A Withdrawn JPH11232023A (en) | 1998-02-13 | 1998-02-13 | Resistant film type input device and position detecting method therefor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH11232023A (en) |
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US9939967B2 (en) | 2012-01-31 | 2018-04-10 | Fujitsu Component Limited | Position detection method in touch panel and touch panel |
JP2013168032A (en) * | 2012-02-15 | 2013-08-29 | Fujitsu Component Ltd | Touch panel and position detection method |
US9590623B2 (en) | 2012-02-15 | 2017-03-07 | Fujitsu Component Limited | Touch panel and method of detecting position |
US10235003B2 (en) | 2015-09-03 | 2019-03-19 | Fujitsu Component Limited | Touch panel device |
CN111751623A (en) * | 2019-03-29 | 2020-10-09 | 日本电产理德股份有限公司 | Inspection apparatus and inspection method |
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