JPH11147743A - Artificial stone - Google Patents

Artificial stone

Info

Publication number
JPH11147743A
JPH11147743A JP31404597A JP31404597A JPH11147743A JP H11147743 A JPH11147743 A JP H11147743A JP 31404597 A JP31404597 A JP 31404597A JP 31404597 A JP31404597 A JP 31404597A JP H11147743 A JPH11147743 A JP H11147743A
Authority
JP
Japan
Prior art keywords
pattern material
pattern
resin
small
artificial stone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP31404597A
Other languages
Japanese (ja)
Other versions
JP3518291B2 (en
Inventor
Hiroshi Sawada
浩 澤田
Mitsuru Kayukawa
満 粥川
Yoshio Shimo
嘉男 下
Kazushige Uchida
一茂 内田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP31404597A priority Critical patent/JP3518291B2/en
Publication of JPH11147743A publication Critical patent/JPH11147743A/en
Application granted granted Critical
Publication of JP3518291B2 publication Critical patent/JP3518291B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide an artificial stone having smooth surface and good appear ance and enabling the development of a large-sized pattern. SOLUTION: This artificial stone develops a pattern by flat pattern-forming material. 2 contained in a resin base material 1. The pattern-forming materials 2 are composed of large-sized materials 3 having particle diameter of 2.5-5 mm and small-sized materials 4 having particle diameter of 0.1-2.5 mm and smaller than that of the large-sized material 3 by >=1 mm. The amounts of the large-sized material 3 and the small-sized material 4 in 100 pts.wt. of the resin in the resin base material 1 are 1-10 pts.wt. and 1-20 pts.wt., respectively. The formation of gaps between the large-sized materials 3 can be suppressed by the intrusion of the small-sized material 4 between adjacent large-sized materials 3 and the sink mark between the large-sized materials 3 is prevented by the presence of the small-sized material 4.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、洗面化粧台やシス
テムキッチンなどの天板、あるいは浴室や浴槽、あるい
建材などとして用いられる人造石に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an artificial stone used as a top plate for a vanity table or a system kitchen, or as a bathroom, a bathtub, or a building material.

【0002】[0002]

【従来の技術】従来より、樹脂基材に扁平状の柄材を含
有させて人造石(人造大理石)を形成することが行われ
ている。この人造石は柄材によって御影石調の模様や大
理石調の模様が表現されるものであって、樹脂に柄材を
混入して樹脂成形材料を調製し、この樹脂成形材料を注
型法で所望の形状に成形して製造されている。そして図
4(a)に示すように、扁平状の柄材2が樹脂基材1の
表面に対して略平行に並んだ状態で含有されて上記のよ
うな模様が表現されるのである。尚、5は樹脂基材1の
表面を保護するゲルコート層である。
2. Description of the Related Art Conventionally, artificial stone (artificial marble) has been formed by incorporating a flat pattern material into a resin base material. In this artificial stone, a granite-like pattern or a marble-like pattern is represented by a pattern material. A resin molding material is prepared by mixing a pattern material with a resin, and the resin molding material is desirably cast by a casting method. It is manufactured by molding into the shape of Then, as shown in FIG. 4A, the flat pattern material 2 is contained in a state of being arranged substantially parallel to the surface of the resin base material 1, and the above-described pattern is expressed. Reference numeral 5 denotes a gel coat layer for protecting the surface of the resin substrate 1.

【0003】[0003]

【発明が解決しようとする課題】しかし上記柄材として
粒径が2.5mm以上の大型のもののみを用いると、図
4(b)のように隣接する柄材の間に大きな隙間が形成
されてしまい、この隙間の部分において成形時の樹脂成
形材料のひけ(樹脂の硬化収縮)により窪み12が生じ
て人造石の表面が凹凸になり、外観が低下するという問
題があった。また柄材として粒径が2.5mm未満の小
型のもののみを用いると、隣接する柄材の間に大きな隙
間が形成されなくなって人造石の表面が凹凸にならない
が、大柄の模様を表現することができないという問題が
あった。
However, if only a large pattern material having a particle size of 2.5 mm or more is used as the above-mentioned pattern material, a large gap is formed between adjacent pattern materials as shown in FIG. In this gap, the sink 12 of the resin molding material at the time of molding (curing shrinkage of the resin) causes dents 12 and the surface of the artificial stone becomes uneven, which causes a problem that the appearance is deteriorated. Also, when only a small material having a particle size of less than 2.5 mm is used as a pattern material, a large gap is not formed between adjacent pattern materials and the surface of the artificial stone does not become uneven, but a large pattern is expressed. There was a problem that it was not possible.

【0004】本発明は上記の点に鑑みてなされたもので
あり、表面が凹凸でなく外観が良好で、しかも大柄の模
様を表現することができる人造石を提供することを目的
とするものである。
[0004] The present invention has been made in view of the above points, and an object of the present invention is to provide an artificial stone capable of expressing a large pattern having a good appearance without unevenness on its surface. is there.

【0005】[0005]

【課題を解決するための手段】本発明の請求項1に記載
の人造石は、樹脂基材1に含有される扁平状の柄材2に
より模様が表現される人造石であって、柄材2として粒
径が2.5〜5mmの大型柄材3と、大型柄材3の粒径
よりも1mm以上小さくて粒径が0.1〜2.5mmの
小型柄材4を用いると共に、樹脂基材1中の樹脂100
重量部に対して大型柄材3を1〜10重量部、小型柄材
4を1〜20重量部それぞれ含有して成ることを特徴と
するものである。
The artificial stone according to claim 1 of the present invention is an artificial stone in which a pattern is represented by a flat pattern material 2 contained in a resin base material 1. As 2, a large pattern material 3 having a particle size of 2.5 to 5 mm and a small pattern material 4 having a particle size of 0.1 to 2.5 mm smaller by at least 1 mm than the particle size of the large pattern material 3 are used. Resin 100 in base material 1
1 to 10 parts by weight of the large pattern material 3 and 1 to 20 parts by weight of the small pattern material 4 with respect to the weight part.

【0006】また本発明の請求項2に記載の人造石は、
請求項1の構成に加えて、粒径が1.5〜2.5mmの
小型柄材4を0.6〜8重量部、0.5〜1.5mmの
小型柄材4を0.3〜7重量部、0.1〜0.5mmの
小型柄材4を0.1〜5重量部それぞれ含有して成るこ
とを特徴とするものである。また本発明の請求項3に記
載の人造石は、請求項1又は2の構成に加えて、樹脂基
材1に成形される樹脂成形材料6と柄材2の比重差を
0.5以下にして成ることを特徴とするものである。
[0006] The artificial stone according to claim 2 of the present invention is:
In addition to the configuration of claim 1, the small pattern material 4 having a particle size of 1.5 to 2.5 mm is 0.6 to 8 parts by weight, and the small pattern material 4 having a particle size of 0.5 to 1.5 mm is 0.3 to 0.3 part. It is characterized by comprising 7 parts by weight and 0.1 to 5 parts by weight of a small pattern material 4 of 0.1 to 0.5 mm. Further, in the artificial stone according to claim 3 of the present invention, in addition to the constitution of claim 1 or 2, the difference in specific gravity between the resin molding material 6 and the pattern material 2 molded into the resin base material 1 is set to 0.5 or less. It is characterized by comprising.

【0007】また本発明の請求項4に記載の人造石は、
請求項1乃至3のいずれかの構成に加えて、樹脂基材1
の表面にゲルコート層5を設けて成ることを特徴とする
ものである。また本発明の請求項5に記載の人造石は、
請求項1乃至4のいずれかの構成に加えて、アスペクト
比が10〜100の柄材2を用いて成ることを特徴とす
るものである。
[0007] The artificial stone according to claim 4 of the present invention is:
The resin substrate 1 according to any one of claims 1 to 3,
Is provided with a gel coat layer 5 on the surface thereof. The artificial stone according to claim 5 of the present invention is:
In addition to the structure of any one of claims 1 to 4, a pattern material 2 having an aspect ratio of 10 to 100 is used.

【0008】また本発明の請求項6に記載の人造石は、
請求項1乃至5のいずれかの構成に加えて、柄材2とし
て薄肉樹脂成形品及び雲母から選ばれる少なくとも一つ
を用いて成ることを特徴とするものである。
[0008] The artificial stone according to claim 6 of the present invention is:
In addition to the configuration of any one of claims 1 to 5, the pattern material 2 is formed by using at least one selected from a thin resin molded product and mica.

【0009】[0009]

【発明の実施の形態】以下、本発明の実施の形態を説明
する。樹脂基材1を構成する樹脂としては、不飽和ポリ
エステル樹脂やエポキシ樹脂やビニルエステル樹脂など
の熱硬化性樹脂を用いることができる。柄材2としては
熱硬化性樹脂などで形成される雲母のような形状を有す
る厚みの薄い薄肉樹脂成形品や天然の雲母などを用いる
ことができるが、その形状は扁平状に形成されている。
粒状(ほぼ球状)の柄材2を用いた場合は、成形の際に
用いる成形型7やゲルコート層5に柄材2がほぼ点接触
となって柄材2が見えにくくなり模様を表現しにくい
が、扁平状の柄材2では成形型7やゲルコート層5にほ
ぼ面接触となって柄材2が見え易くなるために模様が表
現し易くなるのである。
Embodiments of the present invention will be described below. As a resin constituting the resin substrate 1, a thermosetting resin such as an unsaturated polyester resin, an epoxy resin, or a vinyl ester resin can be used. As the pattern material 2, a thin resin molded product having a shape like mica formed of a thermosetting resin or the like and having a small thickness or a natural mica can be used, but the shape is formed flat. .
When the granular (substantially spherical) pattern material 2 is used, the pattern material 2 is almost in point contact with the mold 7 or the gel coat layer 5 used in molding, so that the pattern material 2 is hardly seen and the pattern is difficult to express. However, in the case of the flat pattern material 2, the pattern material 2 is easily seen because the pattern material 2 is almost in surface contact with the mold 7 and the gel coat layer 5, so that the pattern can be easily expressed.

【0010】柄材2の扁平の度合いを示すアスペクト比
(粒径/厚み)は10〜100であることが好ましい。
アスペクト比が10未満であれば、柄材2が粒状の場合
と同様の性格を有するようになり、成形の際にかかるモ
ーメントで柄材2が樹脂成形材料6の流れ方向と略平行
になりにくくなる。従って、柄材2が樹脂基材1の表面
やゲルコート層5の表面に略平行とならなくなって柄材
2が見えにくくなり模様が表現しにくくなる恐れがあ
る。一方、アスペクト比が100を超えると、薄くなり
過ぎて強度が低下し、樹脂成形材料6の調製時の攪拌混
合で破壊されたり樹脂基材1の補強効果を発揮させるこ
とができなくなる恐れがある。また柄材2は黒などの所
望の色に着色されていてもよいし、着色されていなくて
もよい。
The aspect ratio (particle size / thickness) indicating the degree of flatness of the pattern material 2 is preferably 10 to 100.
When the aspect ratio is less than 10, the pattern material 2 has the same characteristics as the case where the pattern material 2 is granular, and it is difficult for the pattern material 2 to be substantially parallel to the flow direction of the resin molding material 6 due to the moment applied during molding. Become. Therefore, there is a possibility that the pattern material 2 is not substantially parallel to the surface of the resin base material 1 or the surface of the gel coat layer 5 and the pattern material 2 becomes difficult to see and the pattern is difficult to express. On the other hand, when the aspect ratio exceeds 100, the resin becomes too thin and the strength is reduced, and the resin molding material 6 may be broken by stirring and mixing at the time of preparation or may not be able to exert the reinforcing effect of the resin base material 1. . The pattern material 2 may be colored in a desired color such as black, or may not be colored.

【0011】さらに柄材2としては粒径が2.5〜5m
mの大型柄材3と、粒径が0.1〜2.5mmの小型柄
材4を用いる。大型柄材3と小型柄材4の粒径は図2に
示すように、平面視で最も長い部分の長さ(図2に矢印
で示す)で表されるものであって、大型柄材3の粒径と
小型柄材4の粒径の差は少なくとも1mm以上となるよ
うに大型柄材3と小型柄材4を選択して使用する。大型
柄材3と小型柄材4の粒径の差が1mm未満であれば、
大型柄材3と小型柄材4の外観上及び機能上の差が少な
くなって本発明の作用効果を奏することができなくなる
恐れがある。尚、大型柄材3と小型柄材4の粒径の差の
上限は大型柄材3と小型柄材4の粒径の範囲から4.9
mmとなる。また小型柄材4としては、粒径が0.1〜
0.05mmのものと、粒径が0.5〜1.5mmのも
のと、粒径が1.5〜2.5mmのものの三種類を併用
するのが好ましく、より小さい粒径の小型柄材4を用い
ることによって、樹脂基材1中で隣接する大型柄材3の
間に小型柄材4を介在させ易くすることができる。
The pattern material 2 has a particle size of 2.5 to 5 m.
A large pattern material 3 having a particle size of 0.1 to 2.5 mm is used. As shown in FIG. 2, the particle size of the large pattern material 3 and the small pattern material 4 is represented by the length of the longest part in plan view (indicated by an arrow in FIG. 2). The large pattern material 3 and the small pattern material 4 are selected and used so that the difference between the particle size of the small pattern material 4 and the particle size of the small pattern material 4 is at least 1 mm or more. If the difference between the particle sizes of the large pattern material 3 and the small pattern material 4 is less than 1 mm,
The difference in appearance and function between the large pattern material 3 and the small pattern material 4 is reduced, and there is a possibility that the effects of the present invention may not be achieved. The upper limit of the difference in particle size between the large pattern material 3 and the small pattern material 4 is 4.9 from the range of the particle size of the large pattern material 3 and the small pattern material 4.
mm. In addition, the small pattern material 4 has a particle size of 0.1 to
It is preferable to use three types, that is, 0.05 mm, those having a particle size of 0.5 to 1.5 mm, and those having a particle size of 1.5 to 2.5 mm. By using the small pattern material 4, the small pattern material 4 can be easily interposed between the adjacent large pattern materials 3 in the resin substrate 1.

【0012】そして人造石を製造するにあたっては、ま
ず、樹脂と大型柄材3と小型柄材4及び必要に応じて充
填材、硬化剤、硬化促進剤、離型剤、繊維補強材、着色
剤、安定剤、増粘剤など従来から樹脂成形に用いられる
材料を攪拌混合して樹脂成形材料6を調製する。この
時、樹脂成形材料6の比重と柄材2(大型柄材3と小型
柄材4)の比重の差が0.5以下になるように、樹脂の
種類や柄材2の材料や各材料の配合量などを調製する。
樹脂成形材料6の比重と柄材2の比重の差が0.5を超
えると、樹脂成形材料6中で柄材2が浮上したり沈降し
たりして均一に分散混合することができず、また成形時
においても樹脂がゲル硬化するまでの間(ゲルタイム)
に樹脂成形材料6中で柄材2が浮上したり沈降したりし
て偏り、人造石の特に垂直面(成形時に鉛直方向と平行
な面)の外観や強度が低下する恐れがある。尚、樹脂成
形材料6の比重と柄材2の比重の差は小さい程好ましい
ので、下限は0である。
In producing the artificial stone, first, a resin, a large pattern material 3 and a small pattern material 4, and if necessary, a filler, a curing agent, a curing accelerator, a release agent, a fiber reinforcing material, a coloring agent A resin molding material 6 is prepared by stirring and mixing materials conventionally used for resin molding, such as a stabilizer, a thickener, and the like. At this time, the type of the resin, the material of the pattern material 2 and each material are set so that the difference between the specific gravity of the resin molding material 6 and the specific gravity of the pattern material 2 (the large pattern material 3 and the small pattern material 4) is 0.5 or less. Is prepared.
When the difference between the specific gravity of the resin molding material 6 and the specific gravity of the pattern material 2 exceeds 0.5, the pattern material 2 floats or sinks in the resin molding material 6 and cannot be uniformly dispersed and mixed. Also during molding until the resin hardens to gel (gel time)
In addition, the pattern material 2 rises or sinks in the resin molding material 6 to be biased, and the appearance and strength of the artificial stone, particularly on a vertical surface (a surface parallel to the vertical direction at the time of molding) may be reduced. The lower limit is 0 because the difference between the specific gravity of the resin molding material 6 and the specific gravity of the pattern material 2 is preferably as small as possible.

【0013】また大型柄材3の配合量は樹脂100重量
部に対して1〜10重量部に設定する。大型柄材3の配
合量が1重量部未満であれば、大柄(大粒)の模様を表
現することができなくなって、人造石が御影石調の外観
や大理石調の外観を呈さない恐れがあり、大型柄材3の
配合量が10重量部を超えると、樹脂基材1の表面付近
で大型柄材3の重なり合いが生じやすくなるために、こ
の部分で樹脂成形材料6のひけが生じやすくなり、人造
石の表面が凹凸になる恐れがある。
The amount of the large pattern material 3 is set to 1 to 10 parts by weight based on 100 parts by weight of the resin. If the compounding amount of the large pattern material 3 is less than 1 part by weight, it is impossible to express a large pattern (large grain) pattern, and the artificial stone may not have a granite appearance or a marble appearance. If the compounding amount of the large pattern material 3 exceeds 10 parts by weight, the large pattern material 3 is likely to overlap near the surface of the resin substrate 1, so that the resin molding material 6 tends to sink in this portion, The surface of the artificial stone may be uneven.

【0014】また小型柄材4の配合量は樹脂100重量
部に対して1〜20重量部に設定する。小型柄材4の配
合量が1重量部未満であれば、隣接する大型柄材3の間
に充分な量の小型柄材4を介在させることができず、隣
接する大型柄材3の間において成形時の樹脂成形材料6
のひけ(樹脂の硬化収縮)により窪みが生じて人造石の
表面が凹凸になる恐れがあり、小型柄材4の配合量が2
0重量部を超えると、樹脂基材1の表面付近で大型柄材
3の表面側に小型柄材4が存在しやすくなり、この大型
柄材3と小型柄材4の重なり部分で樹脂成形材料6のひ
けが生じて人造石の表面が凹凸になる恐れがある。
The amount of the small pattern material 4 is set to 1 to 20 parts by weight based on 100 parts by weight of the resin. If the compounding amount of the small pattern material 4 is less than 1 part by weight, a sufficient amount of the small pattern material 4 cannot be interposed between the adjacent large pattern materials 3, and between the adjacent large pattern materials 3. Resin molding material 6 during molding
There is a possibility that the surface of the artificial stone may become uneven due to sinking (curing shrinkage of the resin), and the amount of the small pattern material 4 is 2
When the amount exceeds 0 parts by weight, the small pattern material 4 is likely to be present on the surface side of the large pattern material 3 near the surface of the resin base material 1, and the resin molding material is formed at the overlapping portion of the large pattern material 3 and the small pattern material 4. The sink of No. 6 may occur and the surface of the artificial stone may become uneven.

【0015】また小型柄材4として粒径が0.1〜0.
05mmのものと、粒径が0.5〜1.5mmのもの
と、粒径が1.5〜2.5mmのものの三種類を併用す
る場合は、粒径が0.1〜0.05mmの小型柄材4の
配合量は樹脂100重量部に対して0.1〜5重量部、
粒径が0.5〜1.5mmの小型柄材4の配合量は樹脂
100重量部に対して0.3〜7重量部、粒径が1.5
〜2.5mmの小型柄材4の配合量は樹脂100重量部
に対して0.6〜8重量部にそれぞれ設定することが好
ましく、このことで樹脂基材1中で隣接する大型柄材3
の間に小型柄材4を介在させ易くなって、樹脂成形材料
6のひけをより生じにくくして人造石の表面が凹凸にな
らないようにすることができる。
The small pattern material 4 has a particle size of 0.1 to 0.1.
In the case of using three types, one having a particle size of 0.5 mm, one having a particle size of 0.5 to 1.5 mm, and one having a particle size of 1.5 to 2.5 mm, the particle size having a particle size of 0.1 to 0.05 mm is used. The amount of the small pattern material 4 is 0.1 to 5 parts by weight with respect to 100 parts by weight of the resin.
The compounding amount of the small pattern material 4 having a particle size of 0.5 to 1.5 mm is 0.3 to 7 parts by weight with respect to 100 parts by weight of the resin, and the particle size is 1.5.
It is preferable that the compounding amount of the small pattern material 4 to 2.5 mm is set to 0.6 to 8 parts by weight with respect to 100 parts by weight of the resin.
It becomes easy to interpose the small pattern material 4 therebetween, so that sink of the resin molding material 6 is less likely to occur and the surface of the artificial stone can be prevented from becoming uneven.

【0016】次に上記のように調製された樹脂成形材料
6を注型法により成形して人造石を形成する。つまり、
まず成形型7の雌型8のキャビティ9の成形面にゲルコ
ート層5を形成する。ゲルコート層5は樹脂基材1中の
柄材2が透けて見える程度の透明であって、不飽和ポリ
エステルを主成分とするゲルコートをキャビティ9の成
形面にスプレー等で吹きつけて塗布し、これを硬化させ
ることによって形成されるものであって、この厚みは5
0〜1000μmに設定することができる。次に図3
(a)に示すように、キャビティ9内に樹脂成形材料6
を流し込んでゲルコート層5の表面に供給する。次に図
3(b)に示すように、成形型7の雄型10のコア11
をキャビティ9に挿入して雄型10と雌型8を型締めす
る。このようにして樹脂成形材料6を所望の形状に形成
すると共に型締めした状態で常温〜90℃の加熱を施す
ことによって、樹脂成形材料6の樹脂を硬化させて樹脂
基材1を形成すると共に樹脂基材1の表面にゲルコート
層5を一体化させる。この後、脱型してアフターキュア
ー(加熱)を施すことによって、樹脂基材1の表面にゲ
ルコート層5が形成された図1(a)のような人造石を
形成することができる。
Next, the resin molding material 6 prepared as described above is molded by a casting method to form an artificial stone. That is,
First, the gel coat layer 5 is formed on the molding surface of the cavity 9 of the female die 8 of the molding die 7. The gel coat layer 5 is transparent to the extent that the pattern material 2 in the resin base material 1 can be seen through, and a gel coat mainly composed of unsaturated polyester is applied to the molding surface of the cavity 9 by spraying or the like. And is formed by curing
It can be set to 0 to 1000 μm. Next, FIG.
As shown in FIG.
Is supplied to the surface of the gel coat layer 5. Next, as shown in FIG. 3B, the core 11 of the male mold 10 of the mold 7 is formed.
Is inserted into the cavity 9, and the male mold 10 and the female mold 8 are clamped. By forming the resin molding material 6 in a desired shape in this way and applying heating at room temperature to 90 ° C. in a clamped state, the resin of the resin molding material 6 is cured to form the resin base material 1. The gel coat layer 5 is integrated with the surface of the resin substrate 1. Thereafter, by removing the mold and performing after-curing (heating), an artificial stone having the gel coat layer 5 formed on the surface of the resin substrate 1 as shown in FIG. 1A can be formed.

【0017】このようにして製造される人造石では、柄
材2として扁平状のものを用いたので、成形の際に樹脂
成形材料6が成形型7内で流されるときに、柄材2が自
身にかかるモーメントを最小にしようとして流れ方向と
略平行に配向することになり、このために、樹脂基材1
の表面及びゲルコート層5の表面に対して柄材2の表面
が略平行となり、柄材2が見え易くなって大柄の御影調
の模様や大理石の模様を発現させることができるもので
ある。また柄材2として粒径が2.5〜5mmの大型柄
材と、大型柄材の粒径よりも1mm以上小さくて粒径が
0.1〜2.5mmの小型柄材を用い、しかも大型柄材
を1〜10重量部、小型柄材を1〜20重量部それぞれ
含有したので、図1(b)のように、樹脂基材1の表面
付近(ゲルコート層5の近傍)で、小型柄材4が大型柄
材3と直線的に略同じ高さで並ぶように隣接する大型柄
材3の間に介在することになって大型柄材3の間に隙間
が形成されないようにすることができ、小型柄材4で大
型柄材3の間におけるひけを防止して表面が凹凸になら
ないようにすることができる。従って、研磨などの表面
仕上げ処理を行うことなく、表面が平坦で大柄の模様を
有する人造石を形成することができる。
In the artificial stone manufactured as described above, the flat material is used as the pattern material 2. Therefore, when the resin molding material 6 flows in the molding die 7 during molding, the pattern material 2 In order to minimize the moment applied to itself, the material is oriented substantially parallel to the flow direction.
The surface of the pattern material 2 becomes substantially parallel to the surface of the gel coat layer 5 and the surface of the pattern material 2, so that the pattern material 2 becomes easy to see, and a large pattern of a shade pattern or a marble pattern can be expressed. In addition, a large pattern material having a particle size of 2.5 to 5 mm and a small pattern material having a particle size of 0.1 to 2.5 mm smaller than the particle size of the large pattern material by 1 mm or more are used as the pattern material 2. Since the pattern material was contained in an amount of 1 to 10 parts by weight and the small pattern material in an amount of 1 to 20 parts by weight, the small pattern was formed near the surface of the resin substrate 1 (near the gel coat layer 5) as shown in FIG. The material 4 is interposed between the adjacent large pattern materials 3 so as to be linearly arranged at substantially the same height as the large pattern material 3 so that no gap is formed between the large pattern materials 3. It is possible to prevent sinkage between the large pattern materials 3 with the small pattern material 4 and prevent the surface from becoming uneven. Therefore, an artificial stone having a flat surface and a large pattern can be formed without performing a surface finishing treatment such as polishing.

【0018】[0018]

【実施例】以下、本発明を実施例によって詳述する。 (実施例及び比較例1乃至4)表1に示す配合量(単位
は重量部)で不飽和ポリエステル、充填材(水酸化アル
ミニウム)、柄材2(雲母)、硬化剤を攪拌混合して樹
脂成形材料6を調製した。不飽和ポリエステルとして
は、武田薬品工業(株)製の「ポリマール3502P」
を用いた。充填剤としては、昭和電工(株)製の「ハイ
ジライトH−100」と「ハイジラットH−320」を
用いた。柄材2としては、(株)山口雲母工業社製の雲
母フレーク(アスペクト比が10〜100のもの)を用
い、このうち、粒径が2.5〜5mmのものを大型柄材
3として選別し、粒径が0.1〜2.5mmのものを小
型柄材4として選別してそれぞれ用いた。硬化剤として
は、化薬アクゾ(株)製の「カヤメックA」(メチルエ
チルケトンパーオキサイド)を用いた。
The present invention will be described below in detail with reference to examples. (Examples and Comparative Examples 1 to 4) Unsaturated polyester, filler (aluminum hydroxide), pattern material 2 (mica), and curing agent were mixed under stirring at the compounding amounts (units by weight) shown in Table 1 to obtain a resin. Molding material 6 was prepared. As the unsaturated polyester, "Polymer 3502P" manufactured by Takeda Pharmaceutical Co., Ltd.
Was used. As a filler, "Heidilite H-100" and "Heidirat H-320" manufactured by Showa Denko KK were used. As the pattern material 2, mica flakes (having an aspect ratio of 10 to 100) manufactured by Yamaguchi Mica Industries Co., Ltd. are used. Then, those having a particle size of 0.1 to 2.5 mm were selected and used as small pattern materials 4. As a curing agent, "Kayamec A" (methyl ethyl ketone peroxide) manufactured by Kayaku Akzo Co., Ltd. was used.

【0019】一方、雌型8のキャビティ9の成形面には
ゲルコートをスプレーで吹きつけて塗布し、これを硬化
させて厚み400μmのゲルコート層5を形成した。こ
の後、雌型8のキャビティ9内に上記の樹脂成形材料6
を流し込んでゲルコート層5の表面に供給した。次に雄
型10のコア11をキャビティ9に挿入して雄型10と
雌型8を型締めし、この状態で60℃、1時間の条件で
加熱を施した。この後、脱型して80℃、2時間の条件
でアフターキュアーを施して大理石調の模様を有する人
造石を形成した。
On the other hand, a gel coat was sprayed onto the molding surface of the cavity 9 of the female mold 8 by spraying, and the gel coat was cured to form a gel coat layer 5 having a thickness of 400 μm. Thereafter, the resin molding material 6 is placed in the cavity 9 of the female mold 8.
Was supplied to the surface of the gel coat layer 5. Next, the core 11 of the male mold 10 was inserted into the cavity 9, and the male mold 10 and the female mold 8 were clamped. In this state, heating was performed at 60 ° C. for 1 hour. Thereafter, the mold was removed, and after-curing was performed at 80 ° C. for 2 hours to form an artificial stone having a marble-like pattern.

【0020】このようにして形成された人造石の外観を
目視により評価した。尚、表1中の「表面凹凸」という
項目は、キャビティ9の底面で成形された人造石の表面
部分の凹凸を観察し、略平坦に見えたものを「良好」と
し、凹凸差が明確に見えたものを「不良」とした。た。
また「垂直面柄現出」という項目は、図3(a)(b)
に示すように成形時における雌型8の垂直面13で成形
された人造石の表面部分の柄の現出具合を観察し、柄材
2で模様が明確に現出したものを「良好」とし、模様が
不明確になったものを「不良」とした。また「大柄表
現」という項目は、大型柄材3による大柄模様の現出具
合を観察し、大柄模様が明確に現出したものを「良好」
とし、大柄模様が不明確になったものを「不良」とし
た。結果を表1に示す。
The appearance of the artificial stone thus formed was visually evaluated. The item “surface unevenness” in Table 1 is obtained by observing the unevenness of the surface portion of the artificial stone formed at the bottom surface of the cavity 9, and when the surface looks almost flat, it is regarded as “good”, and the unevenness difference is clearly shown. What was seen was marked as "poor." Was.
Also, the item "Vertical pattern appearance" is shown in FIGS. 3 (a) and 3 (b).
As shown in the figure, the appearance of the pattern on the surface portion of the artificial stone formed on the vertical surface 13 of the female mold 8 at the time of molding was observed, and a pattern in which the pattern clearly appeared on the pattern material 2 was regarded as “good”. , And those whose pattern became unclear were regarded as "defective". The item “Large pattern expression” is used for observing the appearance of the large pattern by the large pattern material 3 and determining that the large pattern is clearly seen is “good”.
When the large pattern became unclear, it was regarded as "poor". Table 1 shows the results.

【0021】[0021]

【表1】 [Table 1]

【0022】表1から明らかなように、全ての項目で品
質が良好となり商品としての基準(総合評価)に合格し
たが、大型柄材3と小型柄材4が所定の配合量でない比
較例1、2では、ひけが発生して表面が凹凸になって不
良となり、また樹脂成形材料6の比重と大型柄材3及び
小型柄材4の比重の差が0.5以上あるために、大型柄
材3及び小型柄材4が沈んで垂直面柄現出が低下して不
良となった。また柄材2として小型柄材4のみを用いた
比較例3では大柄表現が不良となり、柄材2として大型
柄材3のみを用いた比較例4ではひけが生じて表面が凹
凸になり不良となった。従って、比較例1乃至4は商品
としての価値が低くて不合格となった。
As is clear from Table 1, the quality was good in all the items and the product passed the standard (comprehensive evaluation), but the large pattern material 3 and the small pattern material 4 were not in the prescribed mixing amounts. In the case of No. 2, the sink occurs and the surface becomes uneven, resulting in failure. In addition, since the difference between the specific gravity of the resin molding material 6 and the specific gravity of the large pattern material 3 and the small pattern material 4 is 0.5 or more, the large pattern The material 3 and the small pattern material 4 sank and the appearance of the vertical surface pattern decreased, resulting in a failure. In Comparative Example 3 using only the small pattern material 4 as the pattern material 2, the large pattern expression was poor, and in Comparative Example 4 using only the large pattern material 3 as the pattern material 2, the surface was uneven and the surface became uneven, resulting in a defect. became. Therefore, Comparative Examples 1 to 4 were rejected because of low value as a product.

【0023】[0023]

【発明の効果】上記のように本発明の請求項1に記載の
発明は、樹脂基材に含有される扁平状の柄材により模様
が表現される人造石であって、柄材として粒径が2.5
〜5mmの大型柄材と、大型柄材の粒径よりも1mm以
上小さくて粒径が0.1〜2.5mmの小型柄材を用い
ると共に、樹脂基材中の樹脂100重量部に対して大型
柄材を1〜10重量部、小型柄材を1〜20重量部それ
ぞれ含有したので、隣接する大型柄材の間に小型柄材が
介在することになって大型柄材の間に隙間が形成にくく
することができ、小型柄材で大型柄材の間におけるひけ
を防止して表面が凹凸にならないようにすることができ
て外観を良好にすることができるものであり、しかも大
型柄材によって大柄の模様を表現することができるもの
である。
As described above, the invention according to claim 1 of the present invention is an artificial stone in which a pattern is expressed by a flat pattern material contained in a resin substrate, and the pattern material has a particle size of Is 2.5
A large pattern material of up to 5 mm and a small pattern material having a particle size of 0.1 to 2.5 mm smaller than the particle size of the large pattern material by 1 mm or more, and with respect to 100 parts by weight of the resin in the resin base material Since 1 to 10 parts by weight of the large pattern material and 1 to 20 parts by weight of the small pattern material are included, a small pattern material is interposed between adjacent large pattern materials, and a gap is formed between the large pattern materials. It can be made difficult to form, and small patterns can prevent sink marks between large patterns and prevent the surface from becoming uneven, so that the appearance can be improved, and large patterns can be obtained. Can express large patterns.

【0024】また本発明の請求項2に記載の発明は、粒
径が1.5〜2.5mmの小型柄材を0.6〜8重量
部、0.5〜1.5mmの小型柄材を0.3〜7重量
部、0.1〜0.5mmの小型柄材を0.1〜5重量部
それぞれ含有したので、より小さい粒径の小型柄材を用
いることによって、隣接する大型柄材の間に小型柄材が
介在し易くなって大型柄材の間に隙間が形成されないよ
うにすることができ、小型柄材で大型柄材の間における
ひけを防止して表面が凹凸にならないようにすることが
できて外観を良好にすることができるものである。
According to a second aspect of the present invention, a small pattern material having a particle size of 1.5 to 2.5 mm is 0.6 to 8 parts by weight and a small pattern material having a particle size of 0.5 to 1.5 mm. 0.3 to 7 parts by weight and 0.1 to 5 parts by weight of a small pattern material having a size of 0.1 to 0.5 mm. Small pattern material can easily be interposed between the materials, so that no gap is formed between the large pattern materials, the small pattern material prevents sink marks between the large pattern materials and the surface does not become uneven And can improve the appearance.

【0025】また本発明の請求項3に記載の発明は、樹
脂基材に成形される樹脂成形材料と柄材の比重差を0.
5以下にしたので、樹脂成形材料中で柄材を略均一に分
散させることができ、柄材の偏在による外観の低下を防
止することができるものである。また本発明の請求項4
に記載の発明は、樹脂基材の表面にゲルコート層を設け
たので、樹脂基材の表面をゲルコート層で保護すること
ができ、外観の低下を防止することができるものであ
る。
In the invention according to claim 3 of the present invention, the specific gravity difference between the resin molding material and the pattern material to be molded on the resin base material is reduced to 0.
Since the number is set to 5 or less, the pattern material can be substantially uniformly dispersed in the resin molding material, and the appearance can be prevented from being deteriorated due to uneven distribution of the pattern material. Claim 4 of the present invention
In the invention described in (1), since the gel coat layer is provided on the surface of the resin base material, the surface of the resin base material can be protected by the gel coat layer, and the appearance can be prevented from being deteriorated.

【0026】また本発明の請求項5に記載の発明は、ア
スペクト比が10〜100の柄材を用いたので、成形時
に柄材が樹脂基材の表面やゲルコート層の表面に略平行
となって柄材が見え易くなり、模様の表現を確実に行う
ことができるものであり、しかも柄材による樹脂基材の
補強効果を発揮させることができるものである。また本
発明の請求項6に記載の発明は、柄材として薄肉樹脂成
形品及び雲母から選ばれる少なくとも一つを用いたの
で、柄材による樹脂基材の補強効果を発揮させることが
できるものである。
In the invention according to claim 5 of the present invention, since the pattern material having an aspect ratio of 10 to 100 is used, the pattern material becomes substantially parallel to the surface of the resin substrate or the surface of the gel coat layer during molding. Thus, the pattern material can be easily seen and the pattern can be reliably expressed, and the effect of reinforcing the resin base material by the pattern material can be exhibited. The invention according to claim 6 of the present invention uses at least one selected from a thin-walled resin molded article and mica as the pattern material, so that the pattern material can exert a reinforcing effect on the resin base material. is there.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(a)は本発明の実施の形態の一例を示す一部
の断面図、(b)は(a)の一部を拡大した断面図であ
る。
FIG. 1A is a partial cross-sectional view showing an example of an embodiment of the present invention, and FIG. 1B is an enlarged cross-sectional view of a part of FIG.

【図2】同上の柄材を示す平面図である。FIG. 2 is a plan view showing the pattern material according to the first embodiment.

【図3】(a)(b)は同上の製造方法を示す断面図で
ある。
FIGS. 3A and 3B are cross-sectional views showing a manufacturing method of the above.

【図4】(a)は従来例の一例を示す一部の断面図、
(b)は(a)の一部を拡大した断面図である。
FIG. 4A is a partial cross-sectional view showing an example of a conventional example;
(B) is a cross-sectional view in which a part of (a) is enlarged.

【符号の説明】[Explanation of symbols]

1 樹脂基材 2 柄材 3 大型柄材 4 小型柄材 5 ゲルコート層 6 樹脂成形材料 DESCRIPTION OF SYMBOLS 1 Resin base material 2 Pattern material 3 Large pattern material 4 Small pattern material 5 Gel coat layer 6 Resin molding material

───────────────────────────────────────────────────── フロントページの続き (72)発明者 内田 一茂 大阪府門真市大字門真1048番地松下電工株 式会社内 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Kazushige Uchida 1048 Odomo Kadoma, Kadoma City, Osaka Inside Matsushita Electric Works, Ltd.

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 樹脂基材に含有される扁平状の柄材によ
り模様が表現される人造石であって、柄材として粒径が
2.5〜5mmの大型柄材と、大型柄材の粒径よりも1
mm以上小さくて粒径が0.1〜2.5mmの小型柄材
を用いると共に、樹脂基材中の樹脂100重量部に対し
て大型柄材を1〜10重量部、小型柄材を1〜20重量
部それぞれ含有して成ることを特徴とする人造石。
An artificial stone whose pattern is represented by a flat pattern material contained in a resin base material, wherein the pattern material has a large pattern material having a particle size of 2.5 to 5 mm and a large pattern material. 1 than the particle size
In addition to using a small pattern material having a particle diameter of 0.1 to 2.5 mm, which is smaller than 0.1 mm, a large pattern material is 1 to 10 parts by weight and a small pattern material is 1 to 100 parts by weight of the resin in the resin base material. An artificial stone, comprising 20 parts by weight of each.
【請求項2】 粒径が1.5〜2.5mmの小型柄材を
0.6〜8重量部、0.5〜1.5mmの小型柄材を
0.3〜7重量部、0.1〜0.5mmの小型柄材を
0.1〜5重量部それぞれ含有して成ることを特徴とす
る請求項1に記載の人造石。
2. A small pattern material having a particle size of 1.5 to 2.5 mm is 0.6 to 8 parts by weight, a small pattern material having a particle size of 0.5 to 1.5 mm is 0.3 to 7 parts by weight, and 0.1 to 0.5 parts by weight. The artificial stone according to claim 1, comprising 0.1 to 5 parts by weight of a small pattern material of 1 to 0.5 mm.
【請求項3】 樹脂基材に成形される樹脂成形材料と柄
材の比重差を0.5以下にして成ることを特徴とする請
求項1又は2に記載の人造石。
3. The artificial stone according to claim 1, wherein the specific gravity difference between the resin molding material and the pattern material molded into the resin base material is 0.5 or less.
【請求項4】 樹脂基材の表面にゲルコート層を設けて
成ることを特徴とする請求項1乃至3のいずれかに記載
の人造石。
4. The artificial stone according to claim 1, wherein a gel coat layer is provided on a surface of the resin base material.
【請求項5】 アスペクト比が10〜100の柄材を用
いて成ることを特徴とする請求項1乃至4のいずれかに
記載の人造石。
5. The artificial stone according to claim 1, wherein a pattern material having an aspect ratio of 10 to 100 is used.
【請求項6】 柄材として薄肉樹脂成形品及び雲母から
選ばれる少なくとも一つを用いて成ることを特徴とする
請求項1乃至5のいずれかに記載の人造石。
6. The artificial stone according to claim 1, wherein at least one selected from a thin resin molded product and mica is used as the pattern material.
JP31404597A 1997-11-14 1997-11-14 Artificial stone Expired - Fee Related JP3518291B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31404597A JP3518291B2 (en) 1997-11-14 1997-11-14 Artificial stone

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31404597A JP3518291B2 (en) 1997-11-14 1997-11-14 Artificial stone

Publications (2)

Publication Number Publication Date
JPH11147743A true JPH11147743A (en) 1999-06-02
JP3518291B2 JP3518291B2 (en) 2004-04-12

Family

ID=18048559

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31404597A Expired - Fee Related JP3518291B2 (en) 1997-11-14 1997-11-14 Artificial stone

Country Status (1)

Country Link
JP (1) JP3518291B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001158653A (en) * 1999-11-30 2001-06-12 Shin Dick Kako Kk Luminescent artificial marble and method for light generation in the same marble

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001158653A (en) * 1999-11-30 2001-06-12 Shin Dick Kako Kk Luminescent artificial marble and method for light generation in the same marble

Also Published As

Publication number Publication date
JP3518291B2 (en) 2004-04-12

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