JPH1112212A - Fluorine-containing compound, and magnetic recording medium using the same - Google Patents
Fluorine-containing compound, and magnetic recording medium using the sameInfo
- Publication number
- JPH1112212A JPH1112212A JP9171467A JP17146797A JPH1112212A JP H1112212 A JPH1112212 A JP H1112212A JP 9171467 A JP9171467 A JP 9171467A JP 17146797 A JP17146797 A JP 17146797A JP H1112212 A JPH1112212 A JP H1112212A
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- Japan
- Prior art keywords
- compound
- weight
- parts
- fluorine
- chain
- Prior art date
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- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Lubricants (AREA)
- Polyethers (AREA)
- Magnetic Record Carriers (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は分子内にオキシエチ
レン部位を有する含フッ素化合物、及びこれを表面改質
剤として用いた磁気記録媒体に関し、特に磁気記録媒体
の摺動耐久性の向上を目的とした低飛散性の表面改質剤
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a fluorine-containing compound having an oxyethylene moiety in a molecule and a magnetic recording medium using the same as a surface modifier, and more particularly to an improvement in sliding durability of the magnetic recording medium. And a low-scattering surface modifier.
【0002】[0002]
【従来の技術】磁気ディスク装置の記録密度の増加を図
るため、ヘッドとディスクの距離は小さくなる傾向にあ
る。また高速で読み取りや書き込みを行うためにディス
クの回転数は大きくなってきている。そのためヘッドと
ディスクの接触の機会が増え、しかもより高速で接触す
るためディスクの摺動条件は従来に比べて更に厳しくな
ることが予想される。この摺動に対し、磁性層の摩耗を
防ぐため磁気ディスクの最外層に用いられる潤滑剤は改
良が加えられてきた。2. Description of the Related Art In order to increase the recording density of a magnetic disk drive, the distance between a head and a disk tends to be reduced. In addition, the number of rotations of a disk has been increasing in order to perform reading and writing at high speed. For this reason, the chances of contact between the head and the disk are increased, and the sliding condition of the disk is expected to be more severe than in the past because the contact is performed at a higher speed. In order to prevent abrasion of the magnetic layer, the lubricant used for the outermost layer of the magnetic disk has been improved.
【0003】このような潤滑剤としては、例えばパーフ
ルオロオキシアルキレン鎖の両末端にピペロニル基を有
する化合物(特開昭61−4727号)等の含フッ素化合物が
知られている。これらを磁気ディスク表面に塗布するこ
とによってその表面は潤滑性が向上し、磁性層の摩耗は
かなり抑さえることができる。[0003] As such a lubricant, for example, a fluorine-containing compound such as a compound having a piperonyl group at both ends of a perfluorooxyalkylene chain (JP-A-61-4727) is known. By applying these to the surface of the magnetic disk, the lubricity of the surface is improved and the wear of the magnetic layer can be considerably suppressed.
【0004】ところでこれら潤滑剤はヘッドとの摺動に
よって徐々に飛散していく。これは摺動によって物理的
にかきとられたり、摺動により発生する熱エネルギーに
よって揮発したりするためと考えられる。そのためその
ディスクを長時間使用するとディスク表面から潤滑剤が
少なくなったり、場合によっては潤滑剤の無くなってし
まう部分がでてきたりする。そのため潤滑剤としては飛
散性の低いものが望まれてきた。[0004] These lubricants are gradually scattered by sliding with the head. This is considered to be due to physical scraping by sliding or volatilization by thermal energy generated by sliding. Therefore, when the disk is used for a long time, the amount of the lubricant decreases from the surface of the disk, or in some cases, the lubricant disappears. Therefore, a lubricant having low scattering properties has been desired.
【0005】そのような潤滑剤として、特開平8−36741
号公報、及び特開平8−36742号公報にはアルキル鎖,パ
ーフルオロオキシアルキル鎖等とクラウンエーテルとが
アミン結合で結合されたフッ素含有クラウンエーテル化
合物が開示されている。しかしながら、このようなアミ
ン結合を有する化合物は吸湿しやすく、それによって潤
滑特性の変化が起こりやすいという問題がある。As such a lubricant, Japanese Patent Application Laid-Open No. 8-36741
And JP-A-8-36742 disclose a fluorine-containing crown ether compound in which an alkyl chain, a perfluorooxyalkyl chain, etc., and a crown ether are bonded by an amine bond. However, there is a problem that such a compound having an amine bond is liable to absorb moisture, thereby easily causing a change in lubrication characteristics.
【0006】またクラウンエーテル環は非環状のオキシ
エチレン鎖(例えばテトラエチレングリコール,ポリエ
チレングリコール等)に比べて熱分解しやすい。これは
環状になることでオキシエチレン鎖に歪がかかっている
ためと推定される。The crown ether ring is more easily thermally decomposed than a non-cyclic oxyethylene chain (eg, tetraethylene glycol, polyethylene glycol, etc.). This is presumed to be due to the fact that the oxyethylene chain is distorted due to being cyclic.
【0007】[0007]
【発明が解決しようとする課題】本発明の目的は飛散性
が低く熱安定性が高い含フッ素化合物、及びこれを用い
た磁気記録媒体を提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to provide a fluorine-containing compound having low scattering property and high thermal stability, and a magnetic recording medium using the same.
【0008】[0008]
【課題を解決するための手段】発明者らはパーフルオロ
オキシアルキレン鎖、或いはパーフルオロオキシアルキ
ル鎖を有する種々の含フッ素化合物を検討した結果、分
子内にオキシエチレン部位を有する所定の含フッ素化合
物が低飛散性であり、熱安定性も高く、潤滑特性の変化
が少なく、磁気記録媒体等の表面改質剤として好適であ
ることを見出し本発明を完成した。The present inventors have studied various fluorine-containing compounds having a perfluorooxyalkylene chain or a perfluorooxyalkyl chain, and as a result, have found that a given fluorine-containing compound having an oxyethylene moiety in the molecule can be obtained. Has low scattering properties, high thermal stability, little change in lubricating properties, and is suitable as a surface modifier for magnetic recording media and the like, and completed the present invention.
【0009】即ち、本発明は、下記一般式(1):That is, the present invention provides the following general formula (1):
【0010】[0010]
【化4】 Embedded image
【0011】(式中−Xは非環状のオキシエチレン鎖を
含む基であり、且つ前記−Xはアミノ基を含まない。m
は1又は2。Rfは平均分子量800以上のパーフルオ
ロポリオキシアルキル鎖、又はパーフルオロポリオキシ
アルキレン鎖。)で表されるオキシエチレン部位を有す
る含フッ素化合物、下記一般式(2):(Wherein -X is a group containing an acyclic oxyethylene chain, and -X does not contain an amino group.
Is 1 or 2. Rf is a perfluoropolyoxyalkyl chain or a perfluoropolyoxyalkylene chain having an average molecular weight of 800 or more. ) A fluorine-containing compound having an oxyethylene moiety represented by the following general formula (2):
【0012】[0012]
【化5】 Embedded image
【0013】−Zは炭素数1から16の直鎖、或いは分
岐のアルキル基、或いはCOR(Rは直鎖又は分岐のア
ルキル基を表す。)。nは0から7の整数。mは1又は
2。Rfは平均分子量800以上のパーフルオロポリオ
キシアルキル鎖、又はパーフルオロポリオキシアルキレ
ン鎖。)で表されるオキシエチレン部位を有する含フッ
素化合物、下記一般式(3):-Z is a linear or branched alkyl group having 1 to 16 carbon atoms, or COR (R represents a linear or branched alkyl group). n is an integer from 0 to 7. m is 1 or 2. Rf is a perfluoropolyoxyalkyl chain or a perfluoropolyoxyalkylene chain having an average molecular weight of 800 or more. ) A fluorine-containing compound having an oxyethylene moiety represented by the following general formula (3):
【0014】[0014]
【化6】 Embedded image
【0015】(式中−Zは炭素数1から16の直鎖、或
いは分岐のアルキル基、或いはCOR(Rは直鎖又は分
岐のアルキル基を表す。)。nは0から7の整数。mは
1又は2。Rfは平均分子量800以上のパーフルオロ
ポリオキシアルキル鎖、又はパーフルオロポリオキシア
ルキレン鎖。)で表されるオキシエチレン部位を有する
含フッ素化合物である。(Wherein -Z is a linear or branched alkyl group having 1 to 16 carbon atoms or COR (R represents a linear or branched alkyl group). N is an integer of 0 to 7. m. Is 1 or 2. Rf is a fluorine-containing compound having an oxyethylene moiety represented by a perfluoropolyoxyalkyl chain or a perfluoropolyoxyalkylene chain having an average molecular weight of 800 or more.
【0016】また、本発明は、非磁性支持体上に少なく
とも1層以上の磁性体層を備えた磁気記録媒体におい
て、該磁性層、或いは該磁性体層の外側に備えた保護層
表面に、上記含フッ素化合物を含有する膜を最外層とし
て有することを特徴とする磁気記録媒体である。The present invention also relates to a magnetic recording medium having at least one magnetic layer on a non-magnetic support, wherein the magnetic layer or a protective layer provided outside the magnetic layer is provided on the surface of the magnetic layer. A magnetic recording medium having a film containing the above-mentioned fluorine-containing compound as an outermost layer.
【0017】更に、本発明は上記非磁性支持体がナトリ
ウムイオン、或いはカリウムイオンを含有し、該ナトリ
ウムイオンと該カリウムイオンの含有量の和が少なくと
も5wt%であるソーダライム系ガラスからなることを
特徴とする磁気記録媒体である。Further, the present invention provides that the nonmagnetic support comprises a soda lime glass containing sodium ions or potassium ions, wherein the total content of the sodium ions and the potassium ions is at least 5 wt%. It is a magnetic recording medium characterized by the following.
【0018】本発明の含フッ素化合物はオキシエチレン
部位を有する含フッ素化合物である。このような部位を
有することによって揮発性が低下し、長期にわたって摺
動が確保されるものと考えられる。The fluorine-containing compound of the present invention is a fluorine-containing compound having an oxyethylene moiety. It is considered that the presence of such a portion reduces the volatility and ensures sliding for a long period of time.
【0019】磁気記録媒体の場合、これら含フッ素化合
物を含有する膜は媒体とヘッドとの潤滑性を高めるため
の潤滑層として設けられる。そのため膜厚としては30
nm以下が望ましい。これは膜が厚すぎると媒体とヘッ
ドとの静摩擦係数が大きくなる恐れがあるからである。
このような薄膜を形成するためには含フッ素化合物を種
々の溶剤に溶解し、その溶液を塗布する方法が膜の厚さ
を制御しやすい点で好ましい。また塗布後は用いた溶剤
の沸点や蒸発熱により後処理の方法は異なるが常温、或
いは若干加熱したり、また常圧、或いは減圧下で乾燥す
ることで用いた溶剤を除去する操作が必要になる。この
時蒸発熱の大きな溶剤を用いると空気中の水分を膜中に
取り込みやすくなる恐れがある。また塗布後はなるべく
常温,常圧で敏速に揮発する方が作業性、及び乾燥の際
に空気中の水分等を膜中になるべく取り込ませないよう
にするために望ましい。ただしあまり沸点が低すぎると
溶剤が揮発しやすくなり含フッ素化合物の濃度の管理が
しにくくなる恐れがある。そのため用いる溶剤は蒸発熱
が小さく(50cal/g以下)、沸点も50〜110℃程
度のものが好適である。In the case of a magnetic recording medium, the film containing these fluorine-containing compounds is provided as a lubricating layer for improving the lubricity between the medium and the head. Therefore, a film thickness of 30
nm or less is desirable. This is because if the film is too thick, the coefficient of static friction between the medium and the head may increase.
In order to form such a thin film, a method of dissolving a fluorine-containing compound in various solvents and applying the solution is preferable in that the thickness of the film is easily controlled. After coating, the method of post-treatment differs depending on the boiling point and heat of evaporation of the solvent used, but it is necessary to remove the used solvent by drying at normal temperature or slightly under normal temperature or under reduced pressure. Become. At this time, if a solvent having a large heat of evaporation is used, moisture in the air may be easily taken into the film. Further, it is desirable to volatilize as quickly as possible at normal temperature and normal pressure after application, in order to improve workability and to prevent moisture and the like in the air from being taken into the film as much as possible during drying. However, if the boiling point is too low, the solvent is likely to evaporate, which may make it difficult to control the concentration of the fluorine-containing compound. Therefore, it is preferable that the solvent used has a small heat of evaporation (50 cal / g or less) and a boiling point of about 50 to 110 ° C.
【0020】Rfは平均分子量800以上のパーフルオ
ロポリオキシアルキル鎖、又はパーフルオロポリオキシ
アルキレン鎖を表わしている。またRf′はパーフルオ
ロポリオキシアルキル鎖を表わしている。パーフルオロ
ポリオキシアルキル鎖、又はパーフルオロポリオキシア
ルキレン鎖の分子量が低すぎると(800未満の場合)パ
ーフルオロアルカン構造を有する溶剤への溶解性が低下
する傾向がある。そのため分子量としては800以上が
望ましい。また更に上記溶剤に対する溶解性を向上させ
るにはRf,Rf′の分子量をなるべく大きくすること
が望ましい。そのため、できれば2000以上のものが
望ましい。パーフルオロポリオキシアルキル鎖、又はパ
ーフルオロポリオキシアルキレン鎖を導入する際用いる
試薬としてはデュポン社製のクライトックス[繰り返し
単位は−(CF(CF3)CF2O)α−]、アウジモント社
製のフォンブリン[繰り返し単位は−(CF(CF3)CF
2O)α−(CF2O)β−、または
−(CF2CF2O)α−(CF2O)β−] 、ダイキン工業
社製のデムナム[繰り返し単位は−(CF2CF2CF
2O)α−]等が挙げられる(α,βは分子内の繰り返し
単位の数を表わす。)。これら材料のうち末端にカルボ
キシル基のあるものとはアミド結合やエステル結合等を
形成させることによって、また末端に水酸基のあるもの
とはエーテル結合やエステル結合等を形成させることに
よって目的の本発明の含フッ素化合物を得ることが可能
となる。Rf represents a perfluoropolyoxyalkyl chain or a perfluoropolyoxyalkylene chain having an average molecular weight of 800 or more. Rf 'represents a perfluoropolyoxyalkyl chain. If the molecular weight of the perfluoropolyoxyalkyl chain or perfluoropolyoxyalkylene chain is too low (less than 800), the solubility in a solvent having a perfluoroalkane structure tends to decrease. Therefore, the molecular weight is desirably 800 or more. In order to further improve the solubility in the above-mentioned solvent, it is desirable to increase the molecular weight of Rf and Rf 'as much as possible. Therefore, if possible, it is desirable that the number is 2000 or more. As a reagent used for introducing a perfluoropolyoxyalkyl chain or a perfluoropolyoxyalkylene chain, Krytox manufactured by DuPont [repeating unit is-(CF (CF 3 ) CF 2 O) α- ], manufactured by Ausimont Fomblin [The repeating unit is-(CF (CF 3 ) CF
2 O) α- (CF 2 O) β- , or
- (CF 2 CF 2 O) α - (CF 2 O) β -], manufactured by Daikin Industries, Ltd. of DEMNUM [recurring units - (CF 2 CF 2 CF
2 O) α- ] (α and β represent the number of repeating units in the molecule). Of these materials, those having a carboxyl group at the terminal are formed by forming an amide bond or an ester bond, and those having a hydroxyl group at the terminal are formed by forming an ether bond, an ester bond, or the like. It becomes possible to obtain a fluorine-containing compound.
【0021】mは本発明の含フッ素化合物の分子内のパ
ーフルオロポリオキシアルキル鎖、又はパーフルオロポ
リオキシアルキレン鎖に結合している部分の数を表わ
す。パーフルオロポリオキシアルキル鎖の場合は1、パ
ーフルオロポリオキシアルキレン鎖の場合は1又は2で
ある。M represents the number of moieties bonded to the perfluoropolyoxyalkyl chain or the perfluoropolyoxyalkylene chain in the molecule of the fluorine-containing compound of the present invention. It is 1 for a perfluoropolyoxyalkyl chain, and 1 or 2 for a perfluoropolyoxyalkylene chain.
【0022】(1)式の−Xはオキシエチレン鎖を含む
基である。−Xの具体例は(2)式、及び(3)式に示
されるようなものが挙げられる。(2)式、及び(3)
式の具体例は以下に示す。In the formula (1), -X is a group containing an oxyethylene chain. Specific examples of -X include those shown in the formulas (2) and (3). Equation (2) and (3)
Specific examples of the formula are shown below.
【0023】−Y−はパーフルオロポリオキシアルキル
鎖、又はパーフルオロポリオキシアルキレン鎖とオキシ
エチレン鎖を有する残基との結合部位を表わす。この結
合としてはアミド結合((2)式の場合は−Y−は−C
ONHCH2CH2−、(3)式の場合は−CON<)、
エーテル結合(−Y−は−CH2−),エステル結合
(−Y−は−CO−)等が挙げられる。-Y- represents a perfluoropolyoxyalkyl chain or a binding site between a perfluoropolyoxyalkylene chain and a residue having an oxyethylene chain. As this bond, an amide bond (in the case of formula (2), -Y- is -C
ONHCH 2 CH 2 -, (3 ) in the case of formula -CON <),
Ether bond (-Y- is -CH 2 -), ester bonds (-Y- is -CO-), and the like.
【0024】nはエチレンオキシ部位の数を表わしてい
る。本発明の含フッ素化合物を金属表面や磁気記録媒体
の表面に塗布する際はエチレンオキシ部位の数が多いほ
ど吸着性が高くなる傾向がある。ただ多すぎるとパーフ
ルオロアルカン構造を有する溶剤への溶解性が低下する
傾向がある。また分子内のエチレンオキシ部位の数が多
いほど溶解性が低下する傾向がある。そのためRfの分
子量が同じ場合は(2)式の構造より(3)式の構造の方
が溶解性が低下する傾向がある。Rfが平均分子量80
0,mが2、(3)式の構造で後述するZが炭素数16
の直鎖のアルキル鎖である場合、nが8以上になるとパ
ーフルオロアルカン構造を有する溶剤に対して完全には
溶解しなくなり、部分的に不溶分がみられる(Rfの分
子量が大きいほど、mが小さいほど、そしてZの炭素数
が小さいほどパーフルオロアルカン構造を有する溶剤へ
の溶解性が向上する。)。N represents the number of ethyleneoxy moieties. When the fluorine-containing compound of the present invention is applied to a metal surface or a magnetic recording medium surface, the adsorptivity tends to increase as the number of ethyleneoxy sites increases. However, if the amount is too large, the solubility in a solvent having a perfluoroalkane structure tends to decrease. The solubility tends to decrease as the number of ethyleneoxy moieties in the molecule increases. Therefore, when the molecular weights of Rf are the same, the structure of formula (3) tends to have lower solubility than the structure of formula (2). Rf is an average molecular weight of 80
0 and m are 2, the structure of the formula (3) and Z described later has 16 carbon atoms.
When n is 8 or more, the compound is not completely dissolved in a solvent having a perfluoroalkane structure, and partially insoluble components are observed (the higher the molecular weight of Rf, the more m Is smaller, and the smaller the carbon number of Z, the higher the solubility in a solvent having a perfluoroalkane structure.)
【0025】−Zは非環状ポリエーテル末端の残基を表
わしている。末端の残基とエチレンオキシ部位との結合
はアミドやエステルのようなカルボニル部位を有する結
合のものよりはエーテルのような結合の方が金属や磁気
記録媒体等への吸着性が高い傾向がある。−Zは水素だ
とパーフルオロアルカン構造を有する溶剤への溶解性が
低い。また塩化メチレン等の有機溶剤への溶解性も低
い。これら溶剤への溶解性を向上させるにはメチル基や
エチル基のように直鎖、或いは分岐のアルキル基、或い
はCOR(Rは直鎖、或いは分岐のアルキル基)にする
ことが望ましい。直鎖、或いは分岐のアルキル基の炭素
数は1から16が望ましい。Rfの平均分子量800,
mが2,nが7、そして(3)式の構造の場合、炭素数
が17以上だと磁気記録媒体表面に塗布した場合その面
に細かな凹凸が生じるものが出てくる(但しRfの平均
分子量が大きくなると−Zの炭素数が大きくなっても細
かな凹凸が生じにくくなる。具体的にはRfの平均分子
量が4000の場合は−Zの炭素数が20でも細かな凹
凸はほとんど見られない。)。そのため−Zは1から1
6の炭素数が望ましい。また−ZがCORの場合も−Z
が上記の直鎖、或いは分岐のアルキル基と同様の理由で
炭素数は1から16が望ましい。しかし−Zが大きい場
合は上記に記述したようにRfの平均分子量を大きくす
ると細かな凹凸の発生を回避できる。-Z represents a residue at the terminal of the acyclic polyether. For the bond between the terminal residue and the ethyleneoxy moiety, a bond such as an ether tends to have a higher adsorptivity to a metal or a magnetic recording medium than a bond having a carbonyl moiety such as an amide or an ester. . When -Z is hydrogen, the solubility in a solvent having a perfluoroalkane structure is low. Further, the solubility in organic solvents such as methylene chloride is low. In order to improve the solubility in these solvents, it is desirable to use a linear or branched alkyl group such as a methyl group or an ethyl group, or COR (R is a linear or branched alkyl group). The linear or branched alkyl group preferably has 1 to 16 carbon atoms. Average molecular weight of Rf 800,
In the case of m = 2, n = 7 and the structure of the formula (3), if the carbon number is 17 or more, fine irregularities may appear on the surface of the magnetic recording medium when applied to the surface (where Rf When the average molecular weight is increased, fine irregularities are less likely to occur even when the number of carbon atoms in -Z is increased.Specifically, when the average molecular weight of Rf is 4000, even when the number of carbon atoms in -Z is 20, fine irregularities are hardly observed. I can't.) Therefore -Z is 1 to 1
A carbon number of 6 is desirable. Also, when -Z is COR, -Z
Has preferably 1 to 16 carbon atoms for the same reason as the above-mentioned linear or branched alkyl group. However, when -Z is large, the occurrence of fine irregularities can be avoided by increasing the average molecular weight of Rf as described above.
【0026】本発明の含フッ素化合物の用途としては、
種々の媒体の表面を改質する表面改質剤としての使用が
挙げられる。改質としては具体的には潤滑性,撥水性,
防水性の向上,ゴミや埃の付着防止等が挙げられる。用
途としては磁気ディスク表面,ベアリング,各種ギア等
の潤滑剤として、或いは空調機の放熱用フィン,テレビ
のVHF・UHF用アンテナやパラボラアンテナ等の種
々の室内、及び室外アンテナ,送電線や電話線等の種々
のケーブル,スキー,スノーボードの滑走面,潜水服や
スキーウェア等の表面,航空機や船舶の外側,建造物の
外壁等の撥水剤,防水剤として、或いは図表,絵画,写
真,ポスター等の表面等のゴミや埃の付着防止剤等が挙
げられる。The use of the fluorine-containing compound of the present invention includes:
Use as a surface modifier for modifying the surface of various media is mentioned. Specifically, lubrication, water repellency,
Improvement of waterproofness, prevention of adhesion of dust and dust, and the like can be mentioned. Applications include lubricants on the surface of magnetic disks, bearings, various gears, or radiating fins for air conditioners, various indoor and outdoor antennas such as VHF / UHF antennas and parabolic antennas for televisions, power transmission lines and telephone wires. Various cables, such as skis, snowboards, diving suits, skiwear, etc., the outside of aircrafts and ships, the outer walls of buildings, etc., as a water repellent, waterproofing agent, or charts, pictures, photographs, posters And the like, and an agent for preventing adhesion of dust and dirt on the surface of the like.
【0027】本発明の含フッ素化合物の使用方法として
は種々の溶剤に溶解、或いは懸濁させて、その液を媒体
に塗布する方法が挙げられる。用いた溶剤が蒸発するこ
とによってその含フッ素化合物層が形成される。この場
合用いる溶媒によっては媒体表面を溶解するものもある
ので注意を要する。As a method of using the fluorine-containing compound of the present invention, a method of dissolving or suspending the compound in various solvents and applying the liquid to a medium can be mentioned. By evaporating the used solvent, the fluorine-containing compound layer is formed. In this case, care must be taken because some solvents may dissolve the medium surface.
【0028】次に本発明の磁気記録媒体について記述す
る。本発明の磁気記録媒体は電子計算機,ワードプロセ
ッサ等の外部メモリーとして用いられるものであり、ハ
ードディスク装置やフロッピーディスク等が挙げられ
る。ディスクの大きさとしては1インチ〜14インチ程
度のものが挙げられる。ハードディスク装置の場合は1
枚から数枚のディスクが重ねられ、大きな記録容量を確
保している。ディスクの構成は支持体である基板(Al
等の金属の合金,ガラス等のセラミックス、或いはポリ
カーボネート,ポリスチレン等の有機高分子化合物),
磁性体層(Fe,Co,Ni等を中心とした合金、或い
は酸化物),保護層(カーボン,SiC,SiO
2 等)、そして本発明の含フッ素化合物を1種類以上含
有した膜から成り立っている。必要に応じて基板と磁性
体層の間、或いは磁性体層と保護層の間にこれらの密着
性等を改善する目的で新たな層(例えばNi,Cr、及
びZn系の錯体,酸化物,リン系の金属錯体等)を設け
ることは特に制限を受けない。Next, the magnetic recording medium of the present invention will be described. The magnetic recording medium of the present invention is used as an external memory of a computer, a word processor, and the like, and includes a hard disk device, a floppy disk, and the like. The size of the disc is, for example, about 1 inch to 14 inches. 1 for hard disk drive
One to several discs are stacked to ensure a large recording capacity. The structure of the disk is a substrate (Al
Metal alloys, ceramics such as glass, or organic polymer compounds such as polycarbonate and polystyrene),
Magnetic layer (alloy or oxide mainly composed of Fe, Co, Ni, etc.), protective layer (carbon, SiC, SiO
2 ) and a film containing at least one fluorine-containing compound of the present invention. If necessary, a new layer (for example, a complex of Ni, Cr, and Zn, an oxide, and the like) may be used to improve the adhesion between the substrate and the magnetic layer or between the magnetic layer and the protective layer. The provision of a phosphorus-based metal complex or the like is not particularly limited.
【0029】本発明の磁気記録媒体の保護層の上に形成
される膜は膜厚としては30nm以下のものが望まし
い。これは膜が厚すぎるとヘッドとディスクの間に働く
静摩擦係数が大きくなる恐れがあるからである。このよ
うな薄膜を形成するため膜の形成材料はなんらかの溶剤
に溶解し、その溶液を保護層の上に塗布することにより
形成する方法が、膜の厚さを制御しやすい点で好まし
い。また塗布後は用いた溶剤の沸点や気化熱により後処
理の方法は異なるが常温、或いは若干加温したり、また
常圧、或いは減圧下で乾燥し、用いた溶剤を除去する操
作が必要となる。この時気化熱の大きな溶剤を用いると
空気中の水分を膜中に取り込みやすくなる恐れがある。
そのため用いる溶剤は気化熱の小さな溶剤が望ましい。The film formed on the protective layer of the magnetic recording medium of the present invention preferably has a thickness of 30 nm or less. This is because if the film is too thick, the coefficient of static friction acting between the head and the disk may increase. In order to form such a thin film, a method of dissolving a material for forming the film in some solvent and applying the solution on the protective layer is preferable in that the thickness of the film is easily controlled. After coating, the method of post-treatment varies depending on the boiling point and heat of vaporization of the solvent used, but it is necessary to remove the used solvent by drying at room temperature, or slightly heating, or under normal pressure or reduced pressure. Become. At this time, if a solvent having a large heat of vaporization is used, moisture in the air may be easily taken into the film.
Therefore, the solvent used is preferably a solvent having a small heat of vaporization.
【0030】本発明の磁気記録媒体の支持体である基板
がソーダライム系ガラス(力学的強度を向上させるため
等のため通常のガラスに比べてナトリウムやカリウム含
有量が5〜20wt%と大きい。5wt%未満では磁気
記録媒体として実用的に十分な硬度が得られない。また
20wt%を超えると靱性が低下し小さな衝撃で破損し
やすくなる。)の場合、これらアルカリ金属(イオン)
が磁性層や保護層を通って含フッ素化合物を含有した膜
に達する可能性も予想される。通常アルカリ金属は酸化
物の形でガラスに添加されるため、含フッ素化合物を含
有した膜に達する際は大部分が水酸化物(NaOHやK
OH)の形になっていると思われる。これらは強塩基で
あるため塩基性に弱い含フッ素化合物は分解する可能性
がある。仮に上記のようなアルカリ金属(イオン)の移
動が起きる場合でも本発明の化合物のエチレンオキシ部
位はエーテル結合なので塩基性条件下で分解を起こしに
くく、また−Y−をアミド、或いはエーテル結合とする
ことで水酸化ナトリウムによる分解を起こしにくくする
ことができる。The substrate serving as the support of the magnetic recording medium of the present invention is a soda-lime glass (sodium or potassium content is as large as 5 to 20 wt% as compared with ordinary glass for improving the mechanical strength, etc.). If it is less than 5 wt%, practically sufficient hardness as a magnetic recording medium cannot be obtained, and if it exceeds 20 wt%, toughness is reduced and it is easy to be damaged by a small impact.)
May reach the film containing the fluorine-containing compound through the magnetic layer and the protective layer. Alkali metals are usually added to glass in the form of oxides, so most of the hydroxides (NaOH and K) are used to reach the film containing the fluorine-containing compound.
OH). Since these are strong bases, fluorinated compounds that are weak in basicity may be decomposed. Even if the transfer of alkali metal (ion) occurs as described above, the ethyleneoxy moiety of the compound of the present invention is hardly decomposed under basic conditions since it is an ether bond, and -Y- is an amide or ether bond. This makes it difficult to cause decomposition by sodium hydroxide.
【0031】[0031]
【発明の実施の形態】本発明を実施例により詳細に説明
する。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described in detail with reference to embodiments.
【0032】(実施例1)化学構造が(2)式で表さ
れ、Rfがパーフルオロオキシアルキレン鎖で、−Y−
が−CH2 −,−Zが−CH3 ,nが0,mが2の含フ
ッ素化合物(化合物1)の合成方法を記述する。(Example 1) The chemical structure is represented by the formula (2), Rf is a perfluorooxyalkylene chain, and -Y-
There -CH 2 -, - Z is describing synthesis of -CH 3, n is 0, m is 2 of the fluorine-containing compound (Compound 1).
【0033】[0033]
【化7】 Embedded image
【0034】アウジモント社製フォンブリンZ−DOL
(平均分子量4000)(20重量部)を3M社製HF
E−7100(200重量部)に溶解する。これに2−
クロロエチルエーテル(4重量部)を塩化メチレン(5
0重量部)に溶解したものを加え、12時間還流後、室
温まで冷却する。反応液をエバポレーターで揮発させた
後、残渣に3M社製FC−72(200重量部)、塩化
メチレン(50重量部)、及び水(50重量部)を加え激
しく撹拌後48時間静置すると3層に分かれる。下層の
FC−72層を採り、これを濾紙で濾過した後、FC−
72をエバポレーターで揮発させることで目的の化合物
1(20重量部)を得る。Ausimont Fomblin Z-DOL
(Average molecular weight 4000) (20 parts by weight)
Dissolve in E-7100 (200 parts by weight). To this 2-
Chloroethyl ether (4 parts by weight) was converted to methylene chloride (5 parts).
(0 parts by weight), refluxed for 12 hours, and then cooled to room temperature. After evaporating the reaction solution with an evaporator, 3M FC-72 (200 parts by weight), methylene chloride (50 parts by weight), and water (50 parts by weight) were added to the residue, and the mixture was stirred vigorously and allowed to stand for 48 hours. Divide into layers. Take the lower FC-72 layer and filter it with filter paper.
By evaporating 72 with an evaporator, the target compound 1 (20 parts by weight) is obtained.
【0035】19F−NMR測定においてフォンブリンZ
−DOLは水酸基の隣のCF2 由来のシグナルの位置が
−83ppm と−85ppm であった。一方、化合物1はオ
キシエチレン部位が導入されることで上記シグナルが−
79ppm と−81ppm にそれぞれシフトした。In 19 F-NMR measurement, Fomblin Z
In -DOL, the positions of signals derived from CF 2 next to the hydroxyl group were -83 ppm and -85 ppm. On the other hand, in the case of compound 1, the above signal was-
It shifted to 79 ppm and -81 ppm, respectively.
【0036】IR測定においてフォンブリンZ−DOL
は3600〜3100カイザー付近に水酸基の吸収が観
測されたが、化合物1はオキシエチレン部位が導入され
ることで、水酸基の吸収が小さくなり、3000〜28
00カイザー付近に新たに末端のメチル基のCH伸縮由
来の吸収が出現した。In IR measurement, Fomblin Z-DOL
Although absorption of a hydroxyl group was observed near 3600 to 3100 Kaiser, the absorption of the hydroxyl group in Compound 1 was reduced by the introduction of an oxyethylene moiety,
Near the 00 Kaiser, a new absorption due to the CH stretching of the terminal methyl group appeared.
【0037】(実施例2)化学構造が(2)式で表され、
Rfがパーフルオロオキシアルキル鎖で、−Y−が−C
H2−,−Zが−(CH2)3CH3,nが1,mが1の含フ
ッ素化合物(化合物2)の合成方法を記述する。(Example 2) The chemical structure is represented by the formula (2),
Rf is a perfluorooxyalkyl chain, -Y- is -C
A method for synthesizing a fluorine-containing compound (compound 2) in which H 2 -and -Z are-(CH 2 ) 3 CH 3 , n is 1 and m is 1 is described.
【0038】[0038]
【化8】 Embedded image
【0039】最初にジエチレングリコールモノ−n−ブ
チルエーテルの水酸基がクロル化された化合物(化合物
2′)の合成方法を記述する。First, a method for synthesizing a compound in which the hydroxyl group of diethylene glycol mono-n-butyl ether is chlorinated (compound 2 ') will be described.
【0040】ジエチレングリコールモノ−n−ブチルエ
ーテル(6重量部)をトルエン(50重量部)とピリジン
(50重量部)の混合溶液に溶解し、この溶液を撹拌し
ながら80℃に加温する。この溶液に塩化チオニル(1
0重量部)を2時間かけて滴下する。その後3時間加温
と撹拌を続ける。反応液を室温まで冷却後、細かく砕い
た氷(1000重量部)に注ぐ。5wt%塩酸で酸性に
した後、トルエンで抽出する。抽出液を硫酸ナトリウム
で乾燥後、エバポレーターでトルエンを揮発させる。こ
うしてジエチレングリコールモノ−n−ブチルエーテル
の水酸基がクロル化された化合物(化合物2′)(6重
量部)を得る。Diethylene glycol mono-n-butyl ether (6 parts by weight) is dissolved in a mixed solution of toluene (50 parts by weight) and pyridine (50 parts by weight), and the solution is heated to 80 ° C. with stirring. Add thionyl chloride (1
0 parts by weight) is added dropwise over 2 hours. Thereafter, heating and stirring are continued for 3 hours. After cooling the reaction solution to room temperature, it is poured into finely crushed ice (1000 parts by weight). After acidification with 5 wt% hydrochloric acid, extraction with toluene is performed. After the extract is dried over sodium sulfate, toluene is evaporated by an evaporator. Thus, a compound (compound 2 ') (6 parts by weight) in which the hydroxyl group of diethylene glycol mono-n-butyl ether is chlorinated is obtained.
【0041】次にダイキン工業製デムナムSA(平均分
子量3500)(35重量部)を3M社製HFE−710
0(200重量部)に溶解する。これに上記の方法で得
られた化合物2′の全量(6重量部)を塩化メチレン
(50重量部)に溶解したものを加え、12時間還流
後、室温まで冷却する。反応液をエバポレーターで揮発
させた後、残渣に3M社製FC−72(200重量
部),塩化メチレン(50重量部)、及び水(50重量
部)を加え激しく撹拌後48時間静置すると3層に分か
れる。下層のFC−72層を採り、これを濾紙で濾過し
た後、FC−72をエバポレーターで揮発させることで
目的の化合物2(35重量部)を得る。Next, Demnum SA (average molecular weight: 3500) (35 parts by weight) manufactured by Daikin Industries, Ltd. was added to HFE-710 manufactured by 3M.
0 (200 parts by weight). A solution prepared by dissolving the total amount of the compound 2 '(6 parts by weight) obtained in the above method in methylene chloride (50 parts by weight) is added thereto, and the mixture is refluxed for 12 hours and then cooled to room temperature. After evaporating the reaction solution with an evaporator, 3M FC-72 (200 parts by weight), methylene chloride (50 parts by weight), and water (50 parts by weight) were added to the residue, and the mixture was stirred vigorously and allowed to stand for 48 hours. Divide into layers. The lower FC-72 layer is taken, filtered through filter paper, and then FC-72 is volatilized by an evaporator to obtain the desired compound 2 (35 parts by weight).
【0042】19F−NMR測定においてデムナムSAは
水酸基の隣のCF2 由来のシグナルの位置が−128.
5ppmであった。一方、化合物2はオキシエチレン部位
が導入されることで上記シグナルが−125ppm にそれ
ぞれシフトした。In the 19 F-NMR measurement, the position of the signal derived from CF 2 next to the hydroxyl group was −128.
It was 5 ppm. On the other hand, the signal of compound 2 was shifted to -125 ppm by the introduction of the oxyethylene moiety.
【0043】IR測定においてフォンブリンZ−DOL
は3600〜3100カイザー付近に水酸基の吸収が観
測されたが、化合物2はオキシエチレン部位が導入され
ることで、水酸基の吸収が小さくなり、3000〜28
00カイザー付近に新たに末端のブチル基のCH伸縮由
来の吸収が出現した。In IR measurement, Fomblin Z-DOL
Although the absorption of a hydroxyl group was observed near 3600 to 3100 Kaiser, the absorption of the hydroxyl group in Compound 2 was reduced by the introduction of an oxyethylene moiety,
Near the 00 Kaiser, a new absorption due to the CH stretching of the terminal butyl group appeared.
【0044】(実施例3)化学構造が(2)式で表され、
Rfがパーフルオロオキシアルキル鎖で、−Y−が−C
O−,−Zが−(CH2)11CH3,nが2,mが1の含フ
ッ素化合物(化合物3)の合成方法を記述する。Example 3 The chemical structure is represented by the formula (2):
Rf is a perfluorooxyalkyl chain, -Y- is -C
O -, - Z is - (CH 2) 11 CH 3 , n is describes a method for the synthesis of 2, m is 1 of the fluorine-containing compound (Compound 3).
【0045】最初に末端がCOClのパーフルオロオキ
シアルキル鎖の化合物(化合物3′)の合成方法を記述す
る。First, a method for synthesizing a compound having a perfluorooxyalkyl chain having a COCl terminal (compound 3 ') will be described.
【0046】[0046]
【化9】 Embedded image
【0047】デュポン社製クライトックス157FSL
(平均分子量2400)(25重量部)をデュポン社製
バートレルXF(100重量部)に溶解する。これに塩
化チオニル(4重量部)を加え、8時間還流する。反応
液を室温まで冷却後、エバポレーターでバートレルXF
と塩化チオニルを揮発させ化合物3′(25重量部)を
得る。Dupont Krytox 157FSL
(Average molecular weight 2400) (25 parts by weight) is dissolved in Vertrel XF (100 parts by weight) manufactured by DuPont. Thionyl chloride (4 parts by weight) is added thereto, and the mixture is refluxed for 8 hours. After the reaction solution was cooled to room temperature, Vertrel XF was evaporated with an evaporator.
And thionyl chloride are volatilized to obtain compound 3 '(25 parts by weight).
【0048】次に上記の方法で得られた化合物3′の全
量(25重量部)を3M社製HFE−7100(200
重量部)に溶解する。これにトリエチレングリコールモ
ノ−n−ドデシルエーテル(12重量部)を塩化メチレ
ン(50重量部)に溶解したものを加え、12時間還流
後、室温まで冷却する。反応液をエバポレーターで揮発
させた後、残渣に3M社製FC−72(200重量部)
と塩化メチレン(50重量部)を加え激しく撹拌後12
時間静置すると2層に分かれる。下層のFC−72層を
採り、これを濾紙で濾過した後、FC−72をエバポレ
ーターで揮発させることで目的の化合物3(25重量
部)を得る。Next, the entire amount (25 parts by weight) of the compound 3 'obtained by the above method was added to 3M HFE-7100 (200 parts by weight).
Parts by weight). A solution prepared by dissolving triethylene glycol mono-n-dodecyl ether (12 parts by weight) in methylene chloride (50 parts by weight) is added thereto, and after refluxing for 12 hours, the mixture is cooled to room temperature. After evaporating the reaction solution with an evaporator, the residue was FC-72 (200 parts by weight) manufactured by 3M.
And methylene chloride (50 parts by weight).
When left for a while, it separates into two layers. The lower FC-72 layer is taken, filtered through filter paper, and then FC-72 is evaporated by an evaporator to obtain the desired compound 3 (25 parts by weight).
【0049】19F−NMR測定においてクライトックス
157FSLはカルボキシル基の隣のCF由来のシグナ
ルの位置が−134ppm であった。一方、化合物3はオ
キシエチレン部位が導入されることで上記シグナルが約
0.3ppm低磁場にシフトした。In 19 F-NMR measurement, the position of the signal derived from CF adjacent to the carboxyl group was −134 ppm in Krytox 157 FSL. On the other hand, in the case of compound 3, the above signal was shifted to a low magnetic field of about 0.3 ppm due to the introduction of the oxyethylene moiety.
【0050】IR測定においてクライトックス157F
SLは1780カイザー付近を極大値とするカルボキシ
ル基のCO伸縮由来の吸収が観測されたが、化合物3は
オキシエチレン部位が導入されることで、カルボキシル
基がエステル結合に変換されるためCO伸縮由来の吸収
の極大値が1805カイザー付近にシフトした。また3
600〜3100カイザー付近にカルボキシル基のOH
伸縮由来の吸収が観測されたが、化合物3はオキシエチ
レン部位が導入されることで、この吸収が小さくなり、
3000〜2800カイザー付近に新たに末端のドデシ
ル基のCH伸縮由来の吸収が出現した。In the IR measurement, Krytox 157F
In SL, absorption due to CO stretching of the carboxyl group having a maximum value near 1780 Kaiser was observed, but compound 3 is converted to an ester bond by the introduction of the oxyethylene site, so that the compound 3 is derived from CO stretching. The absorption maximum shifted to around 1805 Kaiser. 3
OH of carboxyl group around 600-3100 Kaiser
Although absorption due to stretching was observed, the absorption of compound 3 was reduced by the introduction of the oxyethylene moiety,
A new absorption due to the CH stretching of the terminal dodecyl group appeared around 3000-2800 Kaiser.
【0051】(実施例4)化学構造が(2)式で表さ
れ、Rfがパーフルオロオキシアルキレン鎖で、−Y−
が−CH2−,−Zが−(CH2)11CH3 ,nが2,mが
2の含フッ素化合物(化合物4)の合成方法を記述す
る。Example 4 The chemical structure is represented by the formula (2), Rf is a perfluorooxyalkylene chain, and -Y-
There -CH 2 -, - Z is - (CH 2) 11 CH 3 , n is 2, m is described a method for the synthesis of fluorine-containing compound 2 (Compound 4).
【0052】[0052]
【化10】 Embedded image
【0053】最初にテトラエチレングリコールモノ−n
−ドデシルエーテルの水酸基がクロル化された化合物
(化合物4′)の合成方法を記述する。First, tetraethylene glycol mono-n
A method for synthesizing a compound in which the hydroxyl group of dodecyl ether is chlorinated (compound 4 ′) will be described.
【0054】化合物4′はジエチレングリコールモノ−
n−ブチルエーテル(6重量部)の代わりにテトラエチ
レングリコールモノ−n−ドデシルエーテル(14重量
部)を用いる以外は化合物2′と同様にして得る。なお
収量は14重量部である。Compound 4 'is diethylene glycol mono-
Obtained in the same manner as for compound 2 ', except that tetraethylene glycol mono-n-dodecyl ether (14 parts by weight) is used instead of n-butyl ether (6 parts by weight). The yield is 14 parts by weight.
【0055】化合物4は2−クロロエチルエーテル(4
重量部)の代わりに上記反応で得られた化合物4′の全
量(14重量部)を用いる以外は化合物1と同様にして
得る。なお収量は20重量部である。Compound 4 is 2-chloroethyl ether (4
Parts by weight) instead of the total amount (14 parts by weight) of the compound 4 'obtained in the above reaction. The yield is 20 parts by weight.
【0056】19F−NMR測定においてフォンブリンZ
−DOLは水酸基の隣のCF2 由来のシグナルの位置が
−83ppm と−85ppm であった。一方、化合物4は化
合物1と同様オキシエチレン部位が導入されることで上
記シグナルが−79ppm と−81ppm にそれぞれシフト
した。In 19 F-NMR measurement, Fomblin Z
In -DOL, the positions of signals derived from CF 2 next to the hydroxyl group were -83 ppm and -85 ppm. On the other hand, in the case of compound 4, the signal was shifted to -79 ppm and -81 ppm, respectively, due to the introduction of the oxyethylene moiety as in the case of compound 1.
【0057】IR測定において、フォンブリンZ−DO
Lは3600〜3100カイザー付近に水酸基の吸収が
観測されたが、化合物4は化合物1と同様オキシエチレ
ン部位が導入されることで、水酸基の吸収が小さくな
り、3000〜2800カイザー付近に新たに末端のド
デシル基のCH伸縮由来の吸収が出現した。In IR measurement, Fomblin Z-DO
As for L, the absorption of a hydroxyl group was observed around 3600 to 3100 Kaiser, but the absorption of the hydroxyl group was reduced in Compound 4 as in Compound 1 by the introduction of an oxyethylene site, and a new terminal was found near 3000 to 2800 Kaiser. Absorption from the CH stretching of the dodecyl group appeared.
【0058】(実施例5)化学構造が(2)式で表さ
れ、Rfがパーフルオロオキシアルキレン鎖で、−Y−
が−CH2−,−Zが−(CH2)15CH3 ,nが7,mが
2の含フッ素化合物(化合物5)の合成方法を記述す
る。(Example 5) The chemical structure is represented by the formula (2), Rf is a perfluorooxyalkylene chain, and -Y-
There -CH 2 -, - Z is - (CH 2) 15 CH 3 , n is 7, m is described a method for the synthesis of fluorine-containing compound 2 (Compound 5).
【0059】[0059]
【化11】 Embedded image
【0060】最初にオクタエチレングリコールモノ−n
−ヘキサデシルエーテル(化合物5′)の合成方法を記
述する。First, octaethylene glycol mono-n
-A method for synthesizing hexadecyl ether (compound 5 ') is described.
【0061】ヘキサエチレングリコール(30重量部)
に水酸化カリウム(12重量部)を加え、100℃に加
温しながら激しく撹拌する。水酸化カリウムが溶解した
ら2−ブロモエタノール(20重量部)を1時間かけて
滴下する。滴下後も3時間100℃に加温しながら撹拌
する。次に反応液中の2−ブロモエタノールをエバポレ
ーターで揮発させる。なお2−ブロモエタノールを揮発
させる際は減圧はアスピレーターではなく真空ポンプを
用いた方が好ましい。アスピレーターを用いた場合は通
常20〜30mmHgの減圧度しか得られないので100
℃以上に加熱しないと2−ブロモエタノールが揮発しな
いが、真空ポンプを用いた場合は5mmHg以下に減圧可
能なので100℃未満でほとんど揮発させることができ
るようになる。2−ブロモエタノールを揮発後、反応液
を水(300重量部)に溶解する。この中から有機物を
塩化メチレン(100重量部)で抽出する。塩化メチレ
ンを硫酸ナトリウムで乾燥後、エバポレーターで揮発さ
せオクタエチレングリコール(37重量部)を得る。Hexaethylene glycol (30 parts by weight)
Potassium hydroxide (12 parts by weight) is added to the mixture, and the mixture is vigorously stirred while heating to 100 ° C. When potassium hydroxide is dissolved, 2-bromoethanol (20 parts by weight) is added dropwise over 1 hour. After the addition, the mixture is stirred for 3 hours while heating to 100 ° C. Next, 2-bromoethanol in the reaction solution is volatilized by an evaporator. When evaporating 2-bromoethanol, it is preferable to use a vacuum pump instead of an aspirator to reduce the pressure. When an aspirator is used, usually only a reduced pressure of 20 to 30 mmHg can be obtained.
The 2-bromoethanol does not volatilize unless heated above ℃, but if a vacuum pump is used, the pressure can be reduced to 5 mmHg or less, so that it can be almost volatilized below 100 ℃. After volatilizing 2-bromoethanol, the reaction solution is dissolved in water (300 parts by weight). Organic matter is extracted from this with methylene chloride (100 parts by weight). After drying methylene chloride with sodium sulfate, it is volatilized by an evaporator to obtain octaethylene glycol (37 parts by weight).
【0062】次に上記操作で得られたオクタエチレング
リコールの全量(37重量部)をテトラヒドロフラン
(THF)(500重量部)に溶解しこれに水素化ナト
リウム(3重量部)を加え10分間撹拌する。撹拌を続
けながら1−ブロモヘキサデカン(35重量部)をTH
F(200重量部)に溶解したものを2時間かけて滴下
する。その後も引き続き3時間撹拌する。反応液を細か
く砕いた氷(2000重量部)に注ぐ。5wt%塩酸で
酸性にした後、塩化メチレンで抽出する。抽出液を硫酸
ナトリウムで乾燥後、エバポレーターで塩化メチレンを
揮発させる。シリカゲルカラムクロマトグラフィ(展開
溶媒は酢酸エチル)で精製しオクタエチレングリコール
の水酸基の一方がヘキサデシルオキシ基に置換された化
合物(化合物5′)(36重量部)を得る。Next, the whole amount (37 parts by weight) of octaethylene glycol obtained by the above operation is dissolved in tetrahydrofuran (THF) (500 parts by weight), and sodium hydride (3 parts by weight) is added thereto and stirred for 10 minutes. . While stirring, 1-bromohexadecane (35 parts by weight) was added to TH.
What was dissolved in F (200 parts by weight) was added dropwise over 2 hours. Thereafter, stirring is continued for 3 hours. Pour the reaction onto crushed ice (2000 parts by weight). After acidification with 5 wt% hydrochloric acid, extraction with methylene chloride is performed. After drying the extract over sodium sulfate, the methylene chloride is volatilized by an evaporator. Purification by silica gel column chromatography (developing solvent: ethyl acetate) gives a compound (compound 5 ') (36 parts by weight) in which one of the hydroxyl groups of octaethylene glycol has been substituted with a hexadecyloxy group.
【0063】次に化合物5′の水酸基がクロル化された
化合物(化合物5″)の合成方法を記述する。ジエチレ
ングリコールモノ−n−ブチルエーテル(6重量部)の
代わりに上記操作で得られた化合物5′の全量(36重
量部)を用いる以外は実施例2の化合物2′の合成方法
と同様にして化合物5′の水酸基がクロル化された化合
物(化合物5″)(36重量部)を得る。Next, a method for synthesizing the compound (compound 5 ″) in which the hydroxyl group of the compound 5 ′ is chlorinated will be described, except that diethylene glycol mono-n-butyl ether (6 parts by weight) was used in place of diethylene glycol mono-n-butyl ether (6 parts by weight). Compound (5 ″) (36 parts by weight) in which the hydroxyl group of compound 5 ′ is chlorinated is obtained in the same manner as in the method for synthesizing compound 2 ′ in Example 2, except that the total amount of compound (′) is used (36 parts by weight).
【0064】次に化合物5の合成方法を記述する。化合
物5は2−クロロエチルエーテル(4重量部)の代わり
に上記反応で得られた化合物5″(25重量部)を用い
る以外は化合物1と同様にして得る。なお収量は21重
量部である。Next, a method for synthesizing Compound 5 will be described. Compound 5 is obtained in the same manner as compound 1 except that compound 5 ″ (25 parts by weight) obtained in the above reaction is used instead of 2-chloroethyl ether (4 parts by weight). The yield is 21 parts by weight. .
【0065】19F−NMR測定においてフォンブリンZ
−DOLは水酸基の隣のCF2 由来のシグナルの位置が
−83ppm と−85ppm であった。一方、化合物5は化
合物1と同様オキシエチレン部位が導入されることで上
記シグナルが−79ppm と−81ppm にそれぞれシフト
した。In 19 F-NMR measurement, Fomblin Z
In -DOL, the positions of signals derived from CF 2 next to the hydroxyl group were -83 ppm and -85 ppm. On the other hand, in the case of compound 5, the signal was shifted to -79 ppm and -81 ppm, respectively, due to the introduction of the oxyethylene moiety as in the case of compound 1.
【0066】IR測定においてフォンブリンZ−DOL
は3600〜3100カイザー付近に水酸基の吸収が観
測されたが、化合物5は化合物1と同様オキシエチレン
部位が導入されることで、水酸基の吸収が小さくなり、
3000〜2800カイザー付近に新たに末端のヘキサ
デシル基のCH伸縮由来の吸収が出現した。In IR measurement, Fomblin Z-DOL
Although the absorption of a hydroxyl group was observed near 3600 to 3100 Kaiser, the absorption of a hydroxyl group in Compound 5 was reduced by the introduction of an oxyethylene moiety as in Compound 1,
A new absorption due to CH stretching of the terminal hexadecyl group appeared around 3000 to 2800 Kaiser.
【0067】(実施例6)化学構造が(2)式で表され、
Rfがパーフルオロオキシアルキル鎖で、−Y−が−C
ONHCH2CH2− ,−Zが−(CH2)11CH3 ,nが
4,mが1の含フッ素化合物(化合物6)の合成方法を
記述する。(Example 6) The chemical structure is represented by the formula (2),
Rf is a perfluorooxyalkyl chain, -Y- is -C
A method for synthesizing a fluorine-containing compound (compound 6) in which ONHCH 2 CH 2 — and -Z are — (CH 2 ) 11 CH 3 , n is 4 and m is 1 is described.
【0068】[0068]
【化12】 Embedded image
【0069】初めにテトラエチレングリコールモノ−n
−ドデシルエーテルの水酸基がTsNCH2CH2O基に
置換された化合物(化合物6′)の合成方法を示す。な
おTs基はパラトルエンスルホニル基である。First, tetraethylene glycol mono-n
- The synthesis of compounds in which a hydroxyl group has been substituted with TsNCH 2 CH 2 O groups dodecyl ether (Compound 6 '). The Ts group is a paratoluenesulfonyl group.
【0070】エタノールアミン(4重量部)をピリジン
(50重量部)に溶解する。この溶液にパラトルエンス
ルホニルクロライド(28重量部)を加え、常温で2時
間、引き続き60℃で3時間撹拌する。反応液を常温ま
で冷却後10wt%塩酸(300重量部)に注ぐ。析出
する固体を1wt%塩酸で洗った後、洗液が中性になる
まで水で洗う。1−プロパノールより再結晶し、エタノ
ールアミンにパラトルエンスルホニル基(Ts基)を2
個導入した化合物(20重量部)を得る。次にテトラエ
チレングリコールモノ−n−ドデシルエーテル(14重
量部)をTHF(100重量部)に溶解しこれに水素化
ナトリウム(1重量部)を加え撹拌する。これに上記方
法で合成したエタノールアミンにTs基を2個導入した
化合物の全量(20重量部)をTHF(100重量部)に
溶解したものを2時間かけて滴下する。滴下後も引き続
き3時間撹拌する。反応液を細かく砕いた氷(500重
量部)に注ぐ。5wt%塩酸で酸性にした後、塩化メチ
レンで抽出する。抽出液を硫酸ナトリウムで乾燥後、エ
バポレーターで塩化メチレンを揮発させる。シリカゲル
カラムクロマトグラフィ(展開溶媒は酢酸エチル)で精
製しテトラエチレングリコールモノ−n−ドデシルエー
テルの水酸基がTsNCH2CH2O基に置換された化合
物(化合物6′)(17重量部)を得る。Ethanolamine (4 parts by weight) is dissolved in pyridine (50 parts by weight). To this solution is added paratoluenesulfonyl chloride (28 parts by weight), and the mixture is stirred at room temperature for 2 hours and subsequently at 60 ° C. for 3 hours. After the reaction solution is cooled to room temperature, it is poured into 10 wt% hydrochloric acid (300 parts by weight). After the precipitated solid is washed with 1 wt% hydrochloric acid, it is washed with water until the washing liquid becomes neutral. The crystals were recrystallized from 1-propanol.
The compound (20 parts by weight) introduced therein is obtained. Next, tetraethylene glycol mono-n-dodecyl ether (14 parts by weight) is dissolved in THF (100 parts by weight), and sodium hydride (1 part by weight) is added thereto and stirred. A solution obtained by dissolving the total amount (20 parts by weight) of the compound obtained by introducing two Ts groups into ethanolamine synthesized by the above method in THF (100 parts by weight) is added dropwise over 2 hours. After the addition, the mixture is stirred for 3 hours. The reaction solution is poured on finely crushed ice (500 parts by weight). After acidification with 5 wt% hydrochloric acid, extraction with methylene chloride is performed. After drying the extract over sodium sulfate, the methylene chloride is volatilized by an evaporator. Silica gel column chromatography (developing solvent ethyl acetate) to give a compound in which a hydroxyl group in purified with tetraethylene glycol mono -n- dodecyl ether is substituted with TsNCH 2 CH 2 O groups (Compound 6 ') (17 parts by weight).
【0071】次に化合物6′のTs基を水素に置換した
化合物(化合物6″)の合成方法を示す。上記方法で合
成された化合物6′の全量(17重量部)をTHF(1
00重量部)に溶解しこれに水素化リチウムアルミニウ
ム(5重量部)を加え、48時間還流する。反応液を室
温まで冷却後、細かく砕いた氷(1000重量部)に注
ぐ。5wt%塩酸で酸性にした後、塩化メチレンで抽出
する。抽出液を硫酸ナトリウムで乾燥後、エバポレータ
ーで塩化メチレンを揮発させる。シリカゲルカラムクロ
マトグラフィ(展開溶媒は酢酸エチル)で精製し化合物
6′のTs基を水素に置換した化合物(化合物6″)
(8重量部)を得る。Next, a method for synthesizing the compound (compound 6 ″) in which the Ts group of the compound 6 ′ has been replaced with hydrogen will be described.The total amount (17 parts by weight) of the compound 6 ′ synthesized by the above method is converted into THF (1 part).
00 parts by weight), lithium aluminum hydride (5 parts by weight) is added thereto, and the mixture is refluxed for 48 hours. After cooling the reaction solution to room temperature, it is poured into finely crushed ice (1000 parts by weight). After acidification with 5 wt% hydrochloric acid, extraction with methylene chloride is performed. After drying the extract over sodium sulfate, the methylene chloride is volatilized by an evaporator. Compound (compound 6 ″) that was purified by silica gel column chromatography (developing solvent: ethyl acetate) and the Ts group of compound 6 ′ was replaced with hydrogen.
(8 parts by weight).
【0072】次に、化合物6の合成方法を示す。ダイキ
ン工業製デムナムSH(平均分子量3500)(35重
量部)をデュポン社製バートレルXF(100重量部)
に溶解する。これに塩化チオニル(4重量部)を加え、
8時間還流する。反応液を室温まで冷却後、エバポレー
ターでバートレルXFと塩化チオニルを揮発させデムナ
ムSHの末端のCO2H をCOClに変換した化合物
(35重量部)を得る。この全量(35重量部)を3M
社製HFE−7100(200重量部)に溶解する。こ
れに上記の方法で得られた化合物6″の全量(8重量
部)を塩化メチレン(50重量部)とピリジン(2重量
部)の混合溶媒に溶解したものを加え、12時間還流
後、室温まで冷却する。反応液をエバポレーターで揮発
させた後、残渣に3M社製FC−72(200重量
部),塩化メチレン(100重量部)、及び5wt%塩
酸(100重量部)を加え激しく撹拌後48時間静置す
ると3層に分かれる。下層のFC−72層を採り、これ
を濾紙で濾過した後、FC−72をエバポレーターで揮
発させることで目的の化合物6(35重量部)を得る。Next, a method for synthesizing Compound 6 will be described. Demnum SH (average molecular weight 3500) (35 parts by weight) manufactured by Daikin Industries, Ltd. was converted to Vertrel XF (100 parts by weight) manufactured by DuPont.
Dissolve in To this was added thionyl chloride (4 parts by weight),
Reflux for 8 hours. After the reaction solution was cooled to room temperature, vertrel XF and thionyl chloride were volatilized by an evaporator to obtain a compound (35 parts by weight) in which CO 2 H at the terminal of Demnum SH was converted to COCl. The total amount (35 parts by weight) is 3M
It is dissolved in HFE-7100 (200 parts by weight) manufactured by the company. A solution prepared by dissolving the entire amount (8 parts by weight) of the compound 6 ″ obtained by the above method in a mixed solvent of methylene chloride (50 parts by weight) and pyridine (2 parts by weight) was added, and the mixture was refluxed for 12 hours and then cooled to room temperature. After evaporating the reaction solution with an evaporator, 3M FC-72 (200 parts by weight), methylene chloride (100 parts by weight), and 5 wt% hydrochloric acid (100 parts by weight) were added to the residue, and the mixture was stirred vigorously. After standing for 48 hours, the mixture is divided into three layers, the lower FC-72 layer is taken, filtered through filter paper, and then the FC-72 is volatilized by an evaporator to obtain the desired compound 6 (35 parts by weight).
【0073】19F−NMR測定においてデムナムSHは
カルボキシル基の隣のCF2 由来のシグナルの位置が−
124ppm であった。一方、化合物6はオキシエチレン
部位が導入されたが上記シグナルは−124ppm であっ
た。In the 19 F-NMR measurement, the position of the signal derived from CF 2 next to the carboxyl group was −
It was 124 ppm. On the other hand, Compound 6 had an oxyethylene moiety introduced, but the signal was -124 ppm.
【0074】IR測定においてデムナムSHは1780
カイザー付近を極大値とするカルボキシル基のCO伸縮
由来の吸収が観測されたが、化合物6はこの部分がオキ
シエチレン部位の導入に伴いアミド結合に変化すること
でCO伸縮由来の吸収の極大値が1710カイザー付近
へシフトした。また新たにアミド結合のNH変角由来の
吸収の極大値が1540カイザー付近に出現した。In IR measurement, Demnum SH was 1780
Although absorption due to CO stretching of the carboxyl group having a local maximum value near Kaiser was observed, Compound 6 has a maximum value of absorption derived from CO stretching due to the change to an amide bond with the introduction of an oxyethylene moiety. It shifted to around 1710 Kaiser. In addition, a maximum value of the absorption derived from NH bending of the amide bond newly appeared around 1540 Kaiser.
【0075】(実施例7)化学構造が(3)式で表さ
れ、Rfがパーフルオロオキシアルキル鎖で、−Zが−
(CH2)3CH3 ,nが1,mが1の含フッ素化合物(化
合物7)の合成方法を記述する。(Example 7) The chemical structure is represented by the formula (3), Rf is a perfluorooxyalkyl chain, and -Z is-
A method for synthesizing (CH 2 ) 3 CH 3 , wherein n is 1 and m is 1 is described.
【0076】[0076]
【化13】 Embedded image
【0077】初めにジエタノールアミンの水酸基がO
(CH2)2O(CH2)3CH3 基に置換され、NHがNTs
に変換された化合物(化合物7′)の合成方法を示す。
なおTs基はパラトルエンスルホニル基である。First, when the hydroxyl group of diethanolamine is O
(CH 2 ) 2 O (CH 2 ) 3 CH 3 group, NH is replaced with NTs
The method for synthesizing the compound (Compound 7 ′) converted to is shown below.
The Ts group is a paratoluenesulfonyl group.
【0078】ジエタノールアミン(6重量部)をピリジ
ン(100重量部)に溶解する。この溶液にパラトルエ
ンスルホニルクロライド(35重量部)を加え、常温で
2時間、引き続き60℃で3時間撹拌する。反応液を常
温まで冷却後10wt%塩酸(1000重量部)に注
ぐ。析出する固体を1wt%塩酸で洗った後、洗液が中
性になるまで水で洗う。1−プロパノールより再結晶
し、ジエタノールアミンにパラトルエンスルホニル基
(Ts基)を3個導入した化合物(23重量部)を得
る。Diethanolamine (6 parts by weight) is dissolved in pyridine (100 parts by weight). To this solution is added paratoluenesulfonyl chloride (35 parts by weight), and the mixture is stirred at room temperature for 2 hours and then at 60 ° C. for 3 hours. After the reaction solution is cooled to room temperature, it is poured into 10 wt% hydrochloric acid (1000 parts by weight). After the precipitated solid is washed with 1 wt% hydrochloric acid, it is washed with water until the washing liquid becomes neutral. Recrystallization from 1-propanol gives a compound (23 parts by weight) in which three paratoluenesulfonyl groups (Ts groups) have been introduced into diethanolamine.
【0079】[0079]
【化14】 Embedded image
【0080】次にエチレングリコールモノ−n−ブチル
エーテル(20重量部)をTHF(100重量部)に溶
解しこれに水素化ナトリウム(2重量部)を加え撹拌す
る。これに上記方法で合成したジエタノールアミンにT
s基を3個導入した化合物の全量(23重量部)をTH
F(100重量部)に溶解したものを2時間かけて滴下
する。滴下後も引き続き3時間撹拌する。反応液を細か
く砕いた氷(500重量部)に注ぐ。5wt%塩酸で酸
性にした後、塩化メチレンで抽出する。抽出液を硫酸ナ
トリウムで乾燥後、エバポレーターで塩化メチレンを揮
発させる。シリカゲルカラムクロマトグラフィ(展開溶
媒は酢酸エチル)で精製しジエタノールアミンの水酸基
がO(CH2)2O(CH2)3CH3 基に置換され、NHがN
Tsに変換された化合物(化合物7′)(14重量部)を
得る。Next, ethylene glycol mono-n-butyl ether (20 parts by weight) is dissolved in THF (100 parts by weight), and sodium hydride (2 parts by weight) is added thereto and stirred. The diethanolamine synthesized by the above method was added to T
The total amount (23 parts by weight) of the compound into which three s groups were introduced was TH
What was dissolved in F (100 parts by weight) was added dropwise over 2 hours. After the addition, the mixture is stirred for 3 hours. The reaction solution is poured on finely crushed ice (500 parts by weight). After acidification with 5 wt% hydrochloric acid, extraction with methylene chloride is performed. After drying the extract over sodium sulfate, the methylene chloride is volatilized by an evaporator. Purification by silica gel column chromatography (developing solvent is ethyl acetate), the hydroxyl group of diethanolamine was replaced by O (CH 2 ) 2 O (CH 2 ) 3 CH 3 group, and NH was changed to N
A compound (compound 7 ') (14 parts by weight) converted to Ts is obtained.
【0081】次に化合物7′のTs基を水素に置換した
化合物(化合物7″)の合成方法を示す。上記方法で合
成された化合物7′の全量(14重量部)をTHF(1
00重量部)に溶解しこれに水素化リチウムアルミニウ
ム(5重量部)を加え、48時間還流する。反応液を室
温まで冷却後、細かく砕いた氷(1000重量部)に注
ぐ。5wt%塩酸で酸性にした後、塩化メチレンで抽出
する。抽出液を硫酸ナトリウムで乾燥後、エバポレータ
ーで塩化メチレンを揮発させる。シリカゲルカラムクロ
マトグラフィ(展開溶媒は酢酸エチル)で精製し化合物
7′のTs基を水素に置換した化合物(化合物7″)(6
重量部)を得る。Next, a method for synthesizing a compound (Compound 7 ″) in which the Ts group of Compound 7 ′ has been replaced with hydrogen will be described.
00 parts by weight), lithium aluminum hydride (5 parts by weight) is added thereto, and the mixture is refluxed for 48 hours. After cooling the reaction solution to room temperature, it is poured into finely crushed ice (1000 parts by weight). After acidification with 5 wt% hydrochloric acid, extraction with methylene chloride is performed. After drying the extract over sodium sulfate, the methylene chloride is volatilized by an evaporator. Compound (compound 7 ″) (6) obtained by purifying by silica gel column chromatography (developing solvent: ethyl acetate) and substituting the Ts group of compound 7 ′ with hydrogen.
Parts by weight).
【0082】[0082]
【化15】 Embedded image
【0083】次に、化合物7の合成方法を示す。ダイキ
ン工業製デムナムSH(平均分子量3500)(35重量
部)をデュポン社製バートレルXF(100重量部)に
溶解する。これに塩化チオニル(4重量部)を加え、8
時間還流する。反応液を室温まで冷却後、エバポレータ
ーでバートレルXFと塩化チオニルを揮発させデムナム
SHの末端のCO2H をCOClに変換した化合物(3
5重量部)を得る。この全量(35重量部)を3M社製
HFE−7100(200重量部)に溶解する。これに
上記の方法で得られた化合物7″の全量(6重量部)を
塩化メチレン(50重量部)とピリジン(2重量部)の
混合溶媒に溶解したものを加え、12時間還流後、室温
まで冷却する。反応液をエバポレーターで揮発させた
後、残渣に3M社製FC−72(200重量部),塩化
メチレン(100重量部)、及び5wt%塩酸(100
重量部)を加え激しく撹拌後48時間静置すると3層に
分かれる。下層のFC−72層を採り、これを濾紙で濾
過した後、FC−72をエバポレーターで揮発させるこ
とで目的の化合物7(35重量部)を得る。Next, a method for synthesizing Compound 7 will be described. Dekinnum SH (average molecular weight: 3500) (35 parts by weight) manufactured by Daikin Industries, Ltd. is dissolved in Vertrel XF (100 parts by weight) manufactured by DuPont. To this was added thionyl chloride (4 parts by weight), and 8
Reflux for hours. After the reaction solution was cooled to room temperature, Vertrel XF and thionyl chloride were volatilized with an evaporator to convert the terminal CO 2 H of Demnum SH into COCl (3).
5 parts by weight). The entire amount (35 parts by weight) is dissolved in 3M HFE-7100 (200 parts by weight). A solution prepared by dissolving the total amount (6 parts by weight) of the compound 7 ″ obtained by the above method in a mixed solvent of methylene chloride (50 parts by weight) and pyridine (2 parts by weight) was added, and the mixture was refluxed for 12 hours and then cooled to room temperature. After evaporating the reaction solution with an evaporator, the residue was FC-72 (200 parts by weight), methylene chloride (100 parts by weight), and 5 wt% hydrochloric acid (100 parts by weight).
(Parts by weight) and vigorously stirred, and then allowed to stand for 48 hours to separate into three layers. The lower FC-72 layer is taken, filtered through filter paper, and then FC-72 is evaporated by an evaporator to obtain the desired compound 7 (35 parts by weight).
【0084】19F−NMR測定においてデムナムSHは
カルボキシル基の隣のCF2 由来のシグナルの位置が−
124ppm であった。一方、化合物7はオキシエチレン
部位が導入されたが上記シグナルは−124ppm であっ
た。In the 19 F-NMR measurement, the position of the signal derived from CF 2 adjacent to the carboxyl group was −
It was 124 ppm. On the other hand, Compound 7 had an oxyethylene moiety introduced, but the signal was -124 ppm.
【0085】IR測定においてデムナムSHは1780
カイザー付近を極大値とするカルボキシル基のCO伸縮
由来の吸収が観測されたが、化合物7はこの部分がオキ
シエチレン部位の導入に伴いアミド結合に変化すること
でCO伸縮由来の吸収の極大値が1700カイザー付近
へシフトした。また化合物6には見られたNH変角由来
の吸収は化合物7では見られなかった。In IR measurement, Demnum SH was 1780
Although absorption due to CO stretching of the carboxyl group having a maximum value near Kaiser was observed, compound 7 has a maximum value of absorption derived from CO stretching due to the change of this portion to an amide bond with the introduction of an oxyethylene moiety. It shifted to around 1700 Kaiser. Further, the absorption derived from NH bending angle observed in Compound 6 was not observed in Compound 7.
【0086】(実施例8)本発明の含フッ素化合物の熱
安定性を調べた。比較のためパーフルオロオキシアルキ
レン鎖、或いはパーフルオロオキシアルキル鎖末端がク
ラウンエーテル構造の化合物(それぞれ化合物8,9)
も用いた。評価方法はそれぞれの化合物50mgをNMR
サンプルチューブに入れた後、150℃の油浴に30時
間浸漬した後構造の変化の有無を確認した。その結果化
合物1から7の 1H−NMRには特に変化は見られなか
ったが、化合物8と9のそれは3.5〜3.9ppm のオキ
シエチレン鎖由来のシグナルが3.3〜5.0ppmあたり
まで広がった。また8ppmにクラウンエーテル環の(酸
化)分解で生じる−OCHO由来のシグナルが現れた。(Example 8) The thermal stability of the fluorine-containing compound of the present invention was examined. For comparison, compounds having a perfluorooxyalkylene chain or a crown ether structure at the end of the perfluorooxyalkyl chain (compounds 8, 9 respectively)
Was also used. The evaluation method was as follows.
After being placed in a sample tube, it was immersed in a 150 ° C. oil bath for 30 hours, and then checked for any change in structure. As a result, 1 H-NMR of Compounds 1 to 7 showed no particular change, but those of Compounds 8 and 9 showed that the signal derived from the oxyethylene chain of 3.5 to 3.9 ppm was 3.3 to 5.0 ppm. It spread to around. At 8 ppm, a signal derived from -OCHO generated by (oxidative) decomposition of the crown ether ring appeared.
【0087】なお化合物8は化合物5′(36重量部)
の代わりに2−ハイドロキシメチル15−クラウン−5
(15重量部)を用いる以外は化合物5と同様にして合
成した(収量は20重量部)。また化合物9は化合物
6″(8重量部)の代わりに2−アミノ15−クラウン
−5(4重量部)を用いる以外は化合物6と同様にして
合成した(収量は20重量部)。Compound 8 was compound 5 '(36 parts by weight)
Instead of 2-hydroxymethyl 15-crown-5
(Yield: 20 parts by weight) except that (15 parts by weight) was used. Compound 9 was synthesized in the same manner as compound 6 except that 2-amino 15-crown-5 (4 parts by weight) was used instead of compound 6 ″ (8 parts by weight) (yield: 20 parts by weight).
【0088】(実施例9)本発明の含フッ素化合物の表
面改質剤としての効果を調べた。2.5 インチのシリコ
ンウエハを化合物1から7が0.1 重量%のFC−72
溶液に1分間浸漬し、引上げ速度1mm/sで引上げた
後、室温に2時間放置して溶剤を揮発させ、ウエハ表面
に本発明の化合物1から7の膜を形成した。Example 9 The effect of the fluorine-containing compound of the present invention as a surface modifier was examined. A 2.5 inch silicon wafer was prepared using 0.1% by weight of compound 1 to 7 of FC-72.
After being immersed in the solution for 1 minute and pulled up at a pulling rate of 1 mm / s, the solvent was volatilized by being left at room temperature for 2 hours to form a film of compounds 1 to 7 of the present invention on the wafer surface.
【0089】次にこれらウエハ表面の水との接触角を調
べた結果を表1に記す。なお化合物の膜を形成していな
いウエハ表面の接触角は26°であった。Next, the results of examining the contact angles of these wafer surfaces with water are shown in Table 1. The contact angle on the wafer surface where no compound film was formed was 26 °.
【0090】[0090]
【表1】 [Table 1]
【0091】この結果より本発明の化合物が撥水性を高
める表面改質剤として有効であることがわかった。From the results, it was found that the compound of the present invention was effective as a surface modifier for improving water repellency.
【0092】(実施例10)本発明の含フッ素化合物の
飛散性を調べた。実施例9で作製した化合物1から7の
膜を形成したシリコンウエハを120℃の恒温槽に10
時間放置後のウエハ上の化合物の残量をIR(それぞれ
の化合物のCF伸縮振動由来の吸収の強度変化)で見積
もった。結果を表2に示す。Example 10 The scattering properties of the fluorine-containing compound of the present invention were examined. The silicon wafer on which the films of compounds 1 to 7 formed in Example 9 were formed was placed in a thermostat at 120 ° C. for 10 minutes.
The remaining amount of the compound on the wafer after standing for a time was estimated by IR (a change in absorption intensity of each compound due to CF stretching vibration). Table 2 shows the results.
【0093】[0093]
【表2】 [Table 2]
【0094】残量割合は120℃の恒温槽に10時間放
置した後の1240カイザー近傍の吸収極大を、恒温槽
に入れる前の吸収極大で割った値である。この値が大き
いほど飛散性が低いことを意味する。化合物1から7の
比較例としてフォンブリンAM2001(アウジモント
社製の含フッ素化合物であり、平均分子量は約2000、表
2では化合物10と表示)も評価した。The ratio of the remaining amount is a value obtained by dividing the absorption maximum near 1240 Kaiser after being left in a thermostat at 120 ° C. for 10 hours by the absorption maximum before being put into the thermostat. The larger this value is, the lower the scattering property is. As a comparative example of Compounds 1 to 7, Fomblin AM2001 (a fluorinated compound manufactured by Ausimont Co., Ltd., having an average molecular weight of about 2000 and indicated as Compound 10 in Table 2) was also evaluated.
【0095】この結果より本発明の化合物の飛散性が低
いことがわかった。From the results, it was found that the compounds of the present invention had low scattering properties.
【0096】(実施例11)5.25 インチのAl合金
ディスク表面にNi−P層とその上にCr層を設け、こ
の上にNi−Co系の磁性層を50nmの厚さにスパッ
タ蒸着し、更にカーボンからなる保護層を50nmの厚
さに製膜したディスクを用意する。このディスクを化合
物1から7が0.1wt% のFC−72溶液に1分間浸
漬し、その後引上げ速度1mm/sで引上げた後、室温に
2時間放置して溶剤を揮発させ、化合物1から7の膜を
表面に形成したディスクを作成した。図1にその構成を
示す。これらディスクの摺動特性をCSS法(コンタク
トスタートストップ法:試験機は小野田セメント(株)
製)で評価した。条件は回転数:3600rpm ,1サイ
クル:30秒,最終サイクル数1000サイクル,ヘッ
ド荷重:10gで、最終サイクルのスティクション時の
摩擦力で評価した。これらの比較例として、ステアリン
酸アンモニウム(以後化合物11と記述)も評価した。
結果を表3に示す。(Example 11) A Ni-P layer and a Cr layer were provided on the surface of a 5.25 inch Al alloy disk, and a Ni-Co magnetic layer was sputter-deposited thereon to a thickness of 50 nm. Then, a disk having a protective layer made of carbon and having a thickness of 50 nm is prepared. This disc was immersed in a 0.1 wt% FC-72 solution of Compounds 1 to 7 for 1 minute, then pulled up at a pulling rate of 1 mm / s, left at room temperature for 2 hours to volatilize the solvent, A disc having a film formed on the surface was prepared. FIG. 1 shows the configuration. The sliding characteristics of these disks were measured using the CSS method (contact start / stop method: Onoda Cement Co., Ltd.)
Manufactured). The conditions were: rotation speed: 3600 rpm, 1 cycle: 30 seconds, final cycle number: 1000 cycles, head load: 10 g, and evaluated by frictional force at the time of stiction in the final cycle. As a comparative example, ammonium stearate (hereinafter referred to as compound 11) was also evaluated.
Table 3 shows the results.
【0097】[0097]
【表3】 [Table 3]
【0098】この結果より、本発明の磁気記録媒体の表
面の摺動特性は非常に高いことがわかった。またこのこ
とから本発明の含フッ素化合物を用いると表面の摺動特
性は向上することがわかった。From the results, it was found that the sliding characteristics of the surface of the magnetic recording medium of the present invention were very high. From this, it was found that the use of the fluorine-containing compound of the present invention improved the surface sliding characteristics.
【0099】[0099]
【発明の効果】飛散性が低く熱安定性が高い含フッ素化
合物、及びこれを用いた磁気記録媒体を提供することが
可能になった。As described above, it has become possible to provide a fluorine-containing compound having low scattering property and high thermal stability, and a magnetic recording medium using the same.
【図1】実施例11で用いた磁気記録媒体の構成を示す
模式断面図である。FIG. 1 is a schematic sectional view showing a configuration of a magnetic recording medium used in Example 11.
1…Al合金ディスク、2…Ni−P層、3…Cr層、
4…磁性層、5…保護層、6…本発明の化合物を含む
層。1 ... Al alloy disk, 2 ... Ni-P layer, 3 ... Cr layer,
4 magnetic layer, 5 protective layer, 6 layer containing the compound of the present invention.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI C10M 107/38 C10M 107/38 G11B 5/62 G11B 5/62 5/71 5/71 5/72 5/72 // C10N 40:14 (72)発明者 石田 美奈 茨城県日立市大みか町七丁目1番1号 株 式会社日立製作所日立研究所内 (72)発明者 伊藤 豊 茨城県日立市大みか町七丁目1番1号 株 式会社日立製作所日立研究所内 (72)発明者 松本 浩之 神奈川県小田原市国府津2880番地 株式会 社日立製作所ストレージシステム事業部内──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 6 Identification symbol FI C10M 107/38 C10M 107/38 G11B 5/62 G11B 5/62 5/71 5/71 5/72 5/72 // C10N 40 : 14 (72) Inventor Mina Ishida 7-1-1, Omika-cho, Hitachi City, Ibaraki Prefecture Inside Hitachi Research Laboratory, Hitachi, Ltd. (72) Inventor Yutaka Ito 7-1-1, Omika-cho, Hitachi City, Ibaraki Prefecture (72) Inventor Hiroyuki Matsumoto 2880 Kozu, Odawara-shi, Kanagawa Prefecture Storage Systems Division, Hitachi, Ltd.
Claims (5)
り、且つ前記−Xはアミノ基を含まない。mは1又は
2。Rfは平均分子量800以上のパーフルオロポリオ
キシアルキル鎖、又はパーフルオロポリオキシアルキレ
ン鎖。)で表されるオキシエチレン部位を有する含フッ
素化合物。(1) The following general formula (1): (Wherein -X is a group containing an acyclic oxyethylene chain, and -X does not contain an amino group. M is 1 or 2. Rf is a perfluoropolyoxyalkyl chain having an average molecular weight of 800 or more, or A fluorine-containing compound having an oxyethylene moiety represented by a perfluoropolyoxyalkylene chain.
基、或いはCOR(Rは直鎖又は分岐のアルキル基を表
す。)。nは0から7の整数。mは1又は2。Rfは平
均分子量800以上のパーフルオロポリオキシアルキル
鎖、又はパーフルオロポリオキシアルキレン鎖。)で表
されるオキシエチレン部位を有する含フッ素化合物。2. The following general formula (2): -Z represents a linear or branched alkyl group having 1 to 16 carbon atoms, or COR (R represents a linear or branched alkyl group). n is an integer from 0 to 7. m is 1 or 2. Rf is a perfluoropolyoxyalkyl chain or a perfluoropolyoxyalkylene chain having an average molecular weight of 800 or more. A) a fluorine-containing compound having an oxyethylene moiety;
ルキル基、或いはCOR(Rは直鎖又は分岐のアルキル
基を表す。)。nは0から7の整数。mは1又は2。R
fは平均分子量800以上のパーフルオロポリオキシア
ルキル鎖、又はパーフルオロポリオキシアルキレン
鎖。)で表されるオキシエチレン部位を有する含フッ素
化合物。3. The following general formula (3): (In the formula, -Z is a linear or branched alkyl group having 1 to 16 carbon atoms, or COR (R represents a linear or branched alkyl group.), N is an integer of 0 to 7, and m is 1 or 2. R
f is a perfluoropolyoxyalkyl chain or a perfluoropolyoxyalkylene chain having an average molecular weight of 800 or more. A) a fluorine-containing compound having an oxyethylene moiety;
性体層を備えた磁気記録媒体において、該磁性層、或い
は該磁性体層の外側に備えた保護層表面に、請求項1或
いは2或いは請求項3のいずれか記載の含フッ素化合物
を含有する膜を最外層として有することを特徴とする磁
気記録媒体。4. A magnetic recording medium comprising at least one magnetic layer on a nonmagnetic support, wherein the magnetic layer or a protective layer provided outside the magnetic layer is provided on the surface of the magnetic layer. A magnetic recording medium comprising a film containing the fluorine-containing compound according to claim 2 or 3 as an outermost layer.
いはカリウムイオンを含有し、該ナトリウムイオンと該
カリウムイオンの含有量の和が少なくとも5wt%であ
るソーダライム系ガラスからなることを特徴とする磁気
記録媒体。5. A non-magnetic support comprising a soda lime glass containing sodium ions or potassium ions, wherein the sum of the contents of the sodium ions and the potassium ions is at least 5 wt%. Magnetic recording medium.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9171467A JPH1112212A (en) | 1997-06-27 | 1997-06-27 | Fluorine-containing compound, and magnetic recording medium using the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9171467A JPH1112212A (en) | 1997-06-27 | 1997-06-27 | Fluorine-containing compound, and magnetic recording medium using the same |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH1112212A true JPH1112212A (en) | 1999-01-19 |
Family
ID=15923656
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP9171467A Pending JPH1112212A (en) | 1997-06-27 | 1997-06-27 | Fluorine-containing compound, and magnetic recording medium using the same |
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Country | Link |
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JP (1) | JPH1112212A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008031149A (en) * | 2006-06-29 | 2008-02-14 | Hiroshima Univ | Novel dicarboxylic acid diester compound, chemical modifier and use thereof |
JP2021004281A (en) * | 2019-06-25 | 2021-01-14 | ユニマテック株式会社 | Fluorine-containing oligomer, method for producing the same and surface modifier containing the same as active ingredient |
-
1997
- 1997-06-27 JP JP9171467A patent/JPH1112212A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008031149A (en) * | 2006-06-29 | 2008-02-14 | Hiroshima Univ | Novel dicarboxylic acid diester compound, chemical modifier and use thereof |
JP2021004281A (en) * | 2019-06-25 | 2021-01-14 | ユニマテック株式会社 | Fluorine-containing oligomer, method for producing the same and surface modifier containing the same as active ingredient |
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