JPH1111664A - Work holding mechanism - Google Patents

Work holding mechanism

Info

Publication number
JPH1111664A
JPH1111664A JP17145597A JP17145597A JPH1111664A JP H1111664 A JPH1111664 A JP H1111664A JP 17145597 A JP17145597 A JP 17145597A JP 17145597 A JP17145597 A JP 17145597A JP H1111664 A JPH1111664 A JP H1111664A
Authority
JP
Japan
Prior art keywords
piston
substrate
holding
leak hole
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17145597A
Other languages
Japanese (ja)
Inventor
Seiichiro Kobayashi
誠一郎 小林
Hajime Noda
肇 野田
Hayamizu Toba
速水 鳥羽
Takashi Iwata
孝 岩田
Takeshi Tajima
武 但馬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Renesas Eastern Japan Semiconductor Inc
Original Assignee
Hitachi Tokyo Electronics Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Tokyo Electronics Co Ltd, Hitachi Ltd filed Critical Hitachi Tokyo Electronics Co Ltd
Priority to JP17145597A priority Critical patent/JPH1111664A/en
Publication of JPH1111664A publication Critical patent/JPH1111664A/en
Pending legal-status Critical Current

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  • Jigs For Machine Tools (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PROBLEM TO BE SOLVED: To detect the holding of a substrate via only the detection of pressure by fixing a valve at the prescribed position of a drive rod, and changing the opening quantity of the atmospheric pressure chamber side inlet of a leak hole according to the relative movement between the drive rod and a piston via a spring. SOLUTION: When the force of a holding component 7 for gripping a substrate 1 is applied, a stopper 19 applied with the force from a drive rod 22 shrinks a small spring 21, and a leak hole inlet 16 between a piston 13 and a valve 20 starts to be opened. When the leak hole inlet 16 is opened, the gas flowing in the leak hole 17 is increased, and the value of a pressure sensor 5 becomes further approximate to the atmospheric pressure from the state when the piston 13 is located at the left end. When the piston 13 proceeds to the right side, a substrate hold section 7 is stopped with the substrate 1 kept pressed. When the substrate 1 cannot be held, the leak hole inlet 16 is not changed even if the piston 13 is operated. The value of the pressure sensor 5 shows different values according to the holding state, and the substrate 1 can be detected.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体結晶基板ま
たはガラス基板等、異物付着を防止する必要のある薄板
形状の基板のようなワークを保持する機構に関するもの
である。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mechanism for holding a work such as a thin plate-shaped substrate, such as a semiconductor crystal substrate or a glass substrate, which needs to prevent foreign matter from adhering.

【0002】[0002]

【従来の技術】従来、半導体結晶基板等を直接掴んで搬
送する場合、図3に示すように、基板1の裏または表の
面を吸着板2で真空吸着することにより基板1の保持を
行い、制御弁3で真空源6との間を開閉し操作される保
持状態の確認は基板1の吸着口4が塞がれることによ
る、圧力センサ5の圧力変化を検出している。この方法
の長所は保持のための機構が単純で、保持検出も容易な
事であり、短所は基板1の面に接触するために基板1に
異物が付着しやすいことにある。
2. Description of the Related Art Conventionally, when a semiconductor crystal substrate or the like is directly gripped and transported, as shown in FIG. 3, the back or front surface of the substrate 1 is vacuum-adsorbed by an adsorption plate 2 to hold the substrate 1. The check of the holding state operated by opening and closing the vacuum source 6 with the control valve 3 detects a pressure change of the pressure sensor 5 due to the blocking of the suction port 4 of the substrate 1. The advantages of this method are that the mechanism for holding is simple and the detection of holding is easy, and the disadvantage is that foreign matter easily adheres to the substrate 1 because it comes into contact with the surface of the substrate 1.

【0003】他の方法は、図4に示すように、基板1の
両面に触らないように基板1の端面を保持部品7、8で
掴み保持を行っている。この方式は基板1の端面にしか
接触しないので、基板1の板面に異物付着させにくい長
所を有するが、短所として、2つの対応項目を要する。
In another method, as shown in FIG. 4, an end surface of the substrate 1 is gripped and held by holding components 7 and 8 so as not to touch both surfaces of the substrate 1. This method has an advantage that foreign matter does not easily adhere to the plate surface of the substrate 1 because it contacts only the end face of the substrate 1, but two disadvantages are required as disadvantages.

【0004】第1点は、保持動作のための駆動源9を新
たに必要とし、この駆動動作に関する異物発生防止を行
う必要が生じ、異物の遮蔽構造または異物の吸引構造を
設ける必要がある。
The first point is that a new driving source 9 is required for the holding operation, and it is necessary to prevent the generation of foreign matter in the driving operation. Therefore, it is necessary to provide a foreign matter shielding structure or a foreign matter suction structure.

【0005】第2点は、基板1の保持状態検出のための
新たなセンサ10等を必要とし、駆動源9の電源または
配管引回し、およびセンサ10の配線などの引回し11
を追加する必要がある。
The second point is that a new sensor 10 and the like for detecting the holding state of the substrate 1 are required, and a power source or a pipe for the driving source 9 and a wiring 11 for the sensor 10 are connected.
Need to be added.

【0006】通常は基板の保持機構は、ロボットハンド
等のように、常に移動を行う部分に装着される必要があ
り、上記の第1点、第2点の対応を行うための配線、配
管などの設置による制約を受け、曲げの繰返しが多く、
信頼性を高めるのが困難である。
Normally, the substrate holding mechanism must be mounted on a portion that constantly moves, such as a robot hand, and wiring, piping, etc. for handling the above first and second points. Due to the installation of
It is difficult to increase reliability.

【0007】[0007]

【発明が解決しようとする課題】本発明は、基板保持に
関する上記の端面保持方式の欠点を克服し、信頼性が高
く、かつ簡単な構造で、機構の駆動による異物発生が無
く、基板の保持検出を圧力検出のみで実施出来る、真空
駆動シリンダを有する基板の保持機構を提供する事を課
題とする。
SUMMARY OF THE INVENTION The present invention overcomes the drawbacks of the above-described end face holding method for holding a substrate, has a high reliability and has a simple structure, has no foreign matter generated by driving a mechanism, and holds the substrate. An object of the present invention is to provide a substrate holding mechanism having a vacuum drive cylinder that can perform detection only by pressure detection.

【0008】[0008]

【課題を解決するための手段】基板の保持動作による異
物発生を防止するために、駆動源に真空シリンダを用
い、この動作中は常に機構から少量の流体を真空源が吸
込み続ける為のリーク経路を設けた。
In order to prevent the generation of foreign matter due to the holding operation of the substrate, a vacuum cylinder is used as a drive source, and a leak path for the vacuum source to constantly suck a small amount of fluid from the mechanism during this operation. Was provided.

【0009】また、このシリンダの保持動作による負荷
状態がシリンダの駆動を制御している制御弁の近くで圧
力変動として検出できるように、シリンダ負荷の力によ
りリーク経路がさらに開かれるようなリーク穴の配置を
行った。この圧力変動検出は、制御弁の動作開始後の時
間経過と圧力の変動経過を検出することにより、保持状
態判定が出来る。
In order to detect the load state due to the holding operation of the cylinder as a pressure fluctuation near the control valve for controlling the operation of the cylinder, a leak hole in which a leak path is further opened by the force of the cylinder load is provided. Was placed. In this pressure fluctuation detection, the holding state can be determined by detecting the lapse of time after the start of the operation of the control valve and the lapse of pressure.

【0010】シリンダの駆動と、異物の排気と、シリン
ダの動作状態検出を、最低限の配管、配線で済ませるた
め、1本の真空経路の接続で共通化した。
The driving of the cylinder, the exhaust of foreign substances, and the detection of the operating state of the cylinder are performed by a single vacuum path in order to minimize the number of piping and wiring.

【0011】シリンダの戻り動作(真空経路の制御弁
閉)のとき、シリンダの体積の変化分が機構側に吹き出
し異物を出さないように、流体の吸込みが継続するよう
に、シリンダと制御弁の間の配管に、真空維持のための
十分な体積を有する配管を設置した。
When the cylinder is returned (the control valve in the vacuum path is closed), the cylinder and the control valve are controlled so that the fluid continues to be sucked so that the change in the volume of the cylinder does not blow out to the mechanism side and emit foreign matter. A pipe having a sufficient volume for maintaining a vacuum was installed in the pipe between them.

【0012】基板の端面を保持するため、駆動源の真空
シリンダを真空駆動すると、ピストンが移動し始める。
この時、大気側から真空側へリーク経路を通じて少量の
空気が流れ込むため、真空側の圧力は少し弱い(大気圧
に近づいた)状態になる。
When the vacuum cylinder of the drive source is driven in vacuum to hold the end face of the substrate, the piston starts to move.
At this time, since a small amount of air flows from the atmosphere side to the vacuum side through the leak path, the pressure on the vacuum side becomes slightly weak (approaching the atmospheric pressure).

【0013】この時、機構が動作する事により発生する
異物は、空気と一緒にリーク経路へ流れ込み、真空側へ
吸込まれるので機構側へ吹出す事が無い。
At this time, foreign matter generated by the operation of the mechanism flows into the leak path together with the air and is sucked into the vacuum side, so that it does not blow out to the mechanism side.

【0014】ピストンがさらに移動し、基板を保持する
ことによる力が加わると、小バネ21が縮み、リーク経
路がさらに開かれ、真空側の圧力は弱くなる。これによ
り、シリンダの保持動作による負荷状態を圧力の変化で
検出することが可能になる。
When the piston moves further and the force generated by holding the substrate is applied, the small spring 21 contracts, the leak path is further opened, and the pressure on the vacuum side weakens. This makes it possible to detect the load state due to the cylinder holding operation by the change in pressure.

【0015】ここでリーク量の調整は、絞り23の前後
の圧力損失を与えることで、駆動力、圧力検出、異物の
吸込みの最適状態の設定を調整可能とする。
The leak amount is adjusted by giving a pressure loss before and after the throttle 23 so that the optimal setting of the driving force, the pressure detection, and the suction of the foreign matter can be adjusted.

【0016】シリンダの駆動と、異物の排気と、シリン
ダの動作状態検出を一本の真空経路で共通化することに
より、移動部との連結を単純な接続で可能とし、断線等
に対する信頼性を高める事が出来る。
By using a single vacuum path for driving the cylinder, exhausting foreign matter, and detecting the operating state of the cylinder, a single connection to the moving part is possible, and reliability against disconnection and the like is improved. Can be enhanced.

【0017】ピストンの戻り動作(真空経路の制御弁
閉)の時、シリンダと制御弁の間に十分な体積があるた
め、ピストンが押戻す空気の体積以上のリーク経路の吸
込み量を維持する事により、機構の戻り動作による異物
発生を防止する事が出来る。
At the time of the return operation of the piston (the control valve of the vacuum path is closed), since there is a sufficient volume between the cylinder and the control valve, it is necessary to maintain the suction amount of the leak path larger than the volume of the air pushed back by the piston. Accordingly, it is possible to prevent the generation of foreign matter due to the return operation of the mechanism.

【0018】[0018]

【発明の実施の形態】実施例1を図1に示す。FIG. 1 shows a first embodiment of the present invention.

【0019】ピストン13はシリンダ14の内部にあ
り、バネ15によりバネがのびる方向にバネ力が働いて
いる。真空経路の制御弁3が閉じた状態では、バネ15
の部分の雰囲気は大気圧に平衡し、ピストンは図中の左
端に接し、リーク穴入口16が塞がれた状態になってい
る。制御弁3が開き、バネ15の部分の雰囲気が真空圧
に繋がると圧力が真空に近づく。ピストン13の両側の
圧力差が生じると、ピストン13が右側に移動する。通
気穴24は開いたままで、リーク穴入口16が最低でも
少し(数十ミクロン程度)開いた状態にしてあるので、
リーク穴17の内部を気体が流れ、真空源6に吸込まれ
ていく。この状態では駆動経路雰囲気異物18はシリン
ダ14内に吸込まれ、異物などをシリンダ外にまき散ら
す事を防止する。保持部品7が基板1を掴む力が加わる
ことにより、図2のように駆動ロッド22から力を伝え
たストッパ19が小バネ21を縮ませ、ピストン13と
弁20の間のリーク穴入口16が開き始める。さらにリ
ーク穴入口16が開くと、リーク穴17の中を流れる気
体は増え、圧力センサ5の値はピストン13が左端にあ
った時の状態からさらに大気圧に近づく。さらにピスト
ン13が右側に進むと、基板保持部7が基板1を押した
ままの状態で停止する。
The piston 13 is inside the cylinder 14, and a spring 15 acts on the piston 13 in a direction in which the spring extends. When the control valve 3 in the vacuum path is closed, the spring 15
Is equilibrated to the atmospheric pressure, the piston is in contact with the left end in the figure, and the leak hole inlet 16 is closed. When the control valve 3 is opened and the atmosphere of the spring 15 is connected to the vacuum pressure, the pressure approaches the vacuum. When a pressure difference occurs on both sides of the piston 13, the piston 13 moves to the right. Since the vent hole 24 remains open and the leak hole inlet 16 is at least slightly open (about several tens of microns),
Gas flows inside the leak hole 17 and is sucked into the vacuum source 6. In this state, the driving path atmosphere foreign matter 18 is sucked into the cylinder 14 to prevent the foreign matter and the like from being scattered outside the cylinder. When the holding component 7 applies a force for gripping the substrate 1, the stopper 19 that transmits the force from the drive rod 22 contracts the small spring 21 as shown in FIG. 2, and the leak hole inlet 16 between the piston 13 and the valve 20 closes. Start to open. When the leak hole inlet 16 is further opened, the gas flowing in the leak hole 17 increases, and the value of the pressure sensor 5 approaches the atmospheric pressure from the state when the piston 13 was at the left end. When the piston 13 further moves to the right, the substrate holding unit 7 stops while keeping the substrate 1 pressed.

【0020】もし、基板1を保持できなかった場合は、
ピストン13は動作しても、リーク穴入口16が変化し
ない。これにより、圧力センサ5の値が保持状態により
異なる値を示し、基板1の検出が可能になる。また機構
自体の不具合により左端の状態のまま動けなくなった場
合、一定時間が経過してもリーク状態の圧力値に至らな
いことにより、異常検出を行うことが出来る。
If the substrate 1 cannot be held,
Even if the piston 13 operates, the leak hole inlet 16 does not change. Thereby, the value of the pressure sensor 5 shows a different value depending on the holding state, and the detection of the substrate 1 becomes possible. Further, if the left end of the mechanism cannot be moved due to a failure of the mechanism itself, the pressure value does not reach the leak state even after a certain period of time, so that the abnormality can be detected.

【0021】図5にピストンの位置27と圧力28の関
係での保持動作開始29から保持動作終了30までのセ
ンサ出力25の例を示す。基板無し駆動圧力32と基板
保持駆動圧力31との間に、しきい値26を設定して保
持検出が可能になる。
FIG. 5 shows an example of the sensor output 25 from the holding operation start 29 to the holding operation end 30 in the relationship between the piston position 27 and the pressure 28. The threshold value 26 is set between the substrate-less driving pressure 32 and the substrate holding driving pressure 31 to enable the holding detection.

【0022】リーク量を調整可能とする絞り23を有す
ることにより、駆動のための圧力28、保持台12と駆
動ロッド22の間で発生する異物18の吸込みのための
空気の吸込み流量を調整することが出来る。
By having a throttle 23 capable of adjusting the amount of leak, a pressure 28 for driving and a suction flow rate of air for sucking foreign matter 18 generated between the holding table 12 and the driving rod 22 are adjusted. I can do it.

【0023】実施例2を図6に示す。Embodiment 2 is shown in FIG.

【0024】駆動ロッド22に取付けられた弁20はピ
ストン13との間に微少のリークが可能な隙間33があ
り、基板1を保持したときストッパ19に力が働き、小
バネ21を押し縮める事により弁20がピストン13か
ら離れる方向に移動し、隙間33による抵抗は減少して
圧力センサ5で測定した圧力28は大気圧に近づく。こ
の圧力28の変動を検出することにより、保持状態の検
出が可能になる。
The valve 20 attached to the drive rod 22 has a gap 33 between the piston 13 and the piston 13 so that a small leak can occur. As a result, the valve 20 moves in the direction away from the piston 13, the resistance caused by the gap 33 decreases, and the pressure 28 measured by the pressure sensor 5 approaches the atmospheric pressure. By detecting the fluctuation of the pressure 28, the holding state can be detected.

【0025】20および13の接触面はテーパ状にして
圧力をさらに変動させてもよい。
The contact surfaces of 20 and 13 may be tapered to further vary the pressure.

【0026】リーク穴17は駆動ロッド22とピストン
13の間の隙間をあけることで代用してもよい。
The leak hole 17 may be replaced by providing a gap between the drive rod 22 and the piston 13.

【0027】[0027]

【発明の効果】本発明の基板保持機構は、保持する基板
表面を汚染することなく信頼性高く端面で保持するた
め、保持状態を圧力変化で検出する事が出来る。
According to the substrate holding mechanism of the present invention, since the substrate surface to be held is held at the end face with high reliability without being contaminated, the holding state can be detected by a change in pressure.

【0028】また、真空経路だけで駆動、検出が行える
ので、構造が簡単であり、移動の繰返しが多い部分に用
いても、駆動、検出の信頼性が高い。
Further, since the drive and the detection can be performed only by the vacuum path, the structure is simple, and the reliability of the drive and the detection is high even when used in a portion where the movement is frequently repeated.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例1である基板保持装置の概略構
成図(側面図)である。
FIG. 1 is a schematic configuration diagram (side view) of a substrate holding device that is Embodiment 1 of the present invention.

【図2】実施例1で基板保持状態の概略構成図(側面
図)である。
FIG. 2 is a schematic configuration diagram (side view) of a substrate holding state in Example 1.

【図3】従来例1の概略構成図(側面図)である。FIG. 3 is a schematic configuration diagram (side view) of Conventional Example 1.

【図4】従来例2の概略構成図(側面図)である。FIG. 4 is a schematic configuration diagram (side view) of Conventional Example 2.

【図5】本発明の実施例1である基板保持装置の圧力変
化説明図である。
FIG. 5 is an explanatory diagram of a pressure change of the substrate holding device according to the first embodiment of the present invention.

【図6】本発明の実施例2である基板保持装置の概略構
成図(側面図)である。
FIG. 6 is a schematic configuration diagram (side view) of a substrate holding device that is Embodiment 2 of the present invention.

【符号の説明】[Explanation of symbols]

1 … 基板、2 … 吸着板、3 … 制御弁、4 … 吸着
口、5 … 圧力センサ 6 … 真空源、7 … 保持部品、8 … 保持部品、9
… 駆動源、10 … センサ、11 … 引回し、12 …
保持台、13 … ピストン、14 … シリンダ 15 … バネ、16 … リーク穴入口、17 … リーク
穴、18 … 駆動経路異物、19 … ストッパ、20
… 弁、21 … 小バネ、22 … 駆動ロッド、23 …
絞り、24 … 通気穴、25 … センサ出力、26 …
しきい値、27 … 位置、28 … 圧力、29 … 保
持動作開始、30 … 保持動作終了 31 … 基板保持駆動圧力、32 … 基板なし駆動圧
力、33 … 隙間。
DESCRIPTION OF SYMBOLS 1 ... Substrate, 2 ... Suction plate, 3 ... Control valve, 4 ... Suction port, 5 ... Pressure sensor 6 ... Vacuum source, 7 ... Holding component, 8 ... Holding component, 9
… Drive source, 10… sensor, 11… wiring, 12…
Holder, 13: Piston, 14: Cylinder 15: Spring, 16: Inlet of leak hole, 17: Leak hole, 18: Foreign matter in drive path, 19: Stopper, 20
… Valve, 21… Small spring, 22… Drive rod, 23…
Aperture, 24 ... vent hole, 25 ... sensor output, 26 ...
Threshold value, 27 position, 28 pressure, 29 start of holding operation, 30 end of holding operation 31 ... substrate holding driving pressure, 32 ... driving pressure without substrate, 33 ... gap.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 鳥羽 速水 東京都青梅市藤橋3丁目3番地2 日立東 京エレクトロニクス株式会社内 (72)発明者 岩田 孝 東京都青梅市藤橋3丁目3番地2 日立東 京エレクトロニクス株式会社内 (72)発明者 但馬 武 東京都青梅市藤橋3丁目3番地2 日立東 京エレクトロニクス株式会社内 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Toba Hayami 3-3-2 Fujibashi, Ome-shi, Tokyo Within Hitachi Tokyo Electronics Co., Ltd. (72) Inventor Takashi Iwata 3-2-2, Fujibashi, Ome-shi, Tokyo Hitachi East Inside the Tokyo Electronics Co., Ltd. (72) Inventor Takeshi Tajima 3-3-2 Fujibashi, Ome-shi, Tokyo Inside the Hitachi Tokyo Electronics Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】固定保持部品とこの固定保持部品に対して
進退移動自在の可動保持部品とを有し、これらの保持部
品によりワークを保持するワーク保持機構であって、 真空源に連通された真空圧室と大気圧室とを区画するピ
ストンが摺動自在に設けられたシリンダと、 前記可動保持部品と前記ピストンとを連結し、前記ピス
トンの移動を前記可動保持部品に伝達する駆動ロッド
と、 前記シリンダに前記大気圧室に連通して形成され、前記
ワーク近傍の空気を流入させる通気穴と、 前記ピストンに形成され、前記真空圧室と前記大気圧室
とを連通させるリーク穴と、 前記駆動ロッドの所定位置に固定され、前記駆動ロッド
と前記ピストンとのバネを介した相対移動に従って、前
記リーク穴の前記大気圧室側入り口の開口量を変化させ
る弁を備えたことを特徴とするワーク保持機構。
1. A work holding mechanism having a fixed holding part and a movable holding part movable forward and backward with respect to the fixed holding part, the work holding mechanism holding a work by these holding parts, wherein the work holding mechanism is connected to a vacuum source. A cylinder in which a piston that divides a vacuum pressure chamber and an atmospheric pressure chamber is slidably provided; and a drive rod that connects the movable holding component and the piston and transmits movement of the piston to the movable holding component. A vent hole formed in the cylinder in communication with the atmospheric pressure chamber to allow air near the work to flow in; a leak hole formed in the piston to communicate the vacuum pressure chamber with the atmospheric pressure chamber; A valve fixed to a predetermined position of the drive rod, and configured to change an opening amount of the leak hole at the atmospheric pressure chamber side entrance according to a relative movement of the drive rod and the piston via a spring; Workpiece holding mechanism, characterized in that the.
JP17145597A 1997-06-27 1997-06-27 Work holding mechanism Pending JPH1111664A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17145597A JPH1111664A (en) 1997-06-27 1997-06-27 Work holding mechanism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17145597A JPH1111664A (en) 1997-06-27 1997-06-27 Work holding mechanism

Publications (1)

Publication Number Publication Date
JPH1111664A true JPH1111664A (en) 1999-01-19

Family

ID=15923432

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17145597A Pending JPH1111664A (en) 1997-06-27 1997-06-27 Work holding mechanism

Country Status (1)

Country Link
JP (1) JPH1111664A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115042044A (en) * 2022-05-25 2022-09-13 涡阳县高炉创新包装有限责任公司 Glass production is with glass side grinding device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115042044A (en) * 2022-05-25 2022-09-13 涡阳县高炉创新包装有限责任公司 Glass production is with glass side grinding device
CN115042044B (en) * 2022-05-25 2023-11-24 涡阳县高炉创新包装有限责任公司 Glass side grinding device for glass production

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