JPH1047914A - 移動鏡支持機構 - Google Patents
移動鏡支持機構Info
- Publication number
- JPH1047914A JPH1047914A JP8221753A JP22175396A JPH1047914A JP H1047914 A JPH1047914 A JP H1047914A JP 8221753 A JP8221753 A JP 8221753A JP 22175396 A JP22175396 A JP 22175396A JP H1047914 A JPH1047914 A JP H1047914A
- Authority
- JP
- Japan
- Prior art keywords
- movable mirror
- mirror
- bolt
- moving
- support mechanism
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8221753A JPH1047914A (ja) | 1996-08-05 | 1996-08-05 | 移動鏡支持機構 |
| US08/826,381 US6012697A (en) | 1996-04-12 | 1997-04-09 | Stage and supporting mechanism for supporting movable mirror on stage |
| KR1019970013309A KR100467262B1 (ko) | 1996-04-12 | 1997-04-10 | 스테이지및스테이지로의이동경지지기구 |
| US09/428,540 US6264165B1 (en) | 1996-04-12 | 1999-10-28 | Stage and supporting mechanism for supporting movable mirror on stage |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8221753A JPH1047914A (ja) | 1996-08-05 | 1996-08-05 | 移動鏡支持機構 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH1047914A true JPH1047914A (ja) | 1998-02-20 |
| JPH1047914A5 JPH1047914A5 (enExample) | 2004-08-19 |
Family
ID=16771676
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8221753A Pending JPH1047914A (ja) | 1996-04-12 | 1996-08-05 | 移動鏡支持機構 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH1047914A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010206066A (ja) * | 2009-03-05 | 2010-09-16 | Taiheiyo Cement Corp | Xyステージのスライダ |
-
1996
- 1996-08-05 JP JP8221753A patent/JPH1047914A/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010206066A (ja) * | 2009-03-05 | 2010-09-16 | Taiheiyo Cement Corp | Xyステージのスライダ |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7113263B2 (en) | Supporting structure of optical element, exposure apparatus having the same, and manufacturing method of semiconductor device | |
| US7354168B2 (en) | Facet mirror having a number of mirror facets | |
| US6043863A (en) | Holder for reflecting member and exposure apparatus having the same | |
| US6859337B2 (en) | Optical-element mountings exhibiting reduced deformation of optical elements held thereby | |
| TWI534552B (zh) | 低表面外形變形的光學元件 | |
| US20080225255A1 (en) | Conforming seats for clamps used in mounting an optical element, and optical systems comprising same | |
| KR100467262B1 (ko) | 스테이지및스테이지로의이동경지지기구 | |
| WO2002019007A1 (fr) | Ensemble miroir reflechissant | |
| JPH10253872A (ja) | 反射光学部材の保持装置及び露光装置 | |
| US20040214483A1 (en) | Driving apparatus, optical system, exposure apparatus and device fabrication method | |
| US7184227B2 (en) | Optical unit, exposure unit and optical devices | |
| US7755742B2 (en) | Lithographic apparatus with mounted sensor | |
| JP4956680B2 (ja) | 光学要素の支持構造、それを用いた露光装置及び半導体デバイスの製造方法 | |
| JP5414204B2 (ja) | 光学素子保持装置、露光装置およびデバイス製造方法 | |
| US7581305B2 (en) | Method of manufacturing an optical component | |
| TW201221796A (en) | Leaf spring, stage system, and lithographic apparatus | |
| JPH1047914A (ja) | 移動鏡支持機構 | |
| CN104871057B (zh) | 低波前畸变光学安装座 | |
| US4376580A (en) | Projection aligner with bending mirror | |
| CN112147855B (zh) | 保持装置、曝光装置、物品制造方法 | |
| JP3427428B2 (ja) | 光学素子の位置調整装置及び投影露光装置 | |
| JP2002184339A (ja) | 制動機構および電子顕微鏡用試料ステージ | |
| US8456612B2 (en) | Exposure apparatus and method of manufacturing device | |
| JP4327125B2 (ja) | リトグラフ装置およびブラケット | |
| JP2008275468A (ja) | 測定方法及び測定冶具 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20050916 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20060310 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20060628 |