JPH10325A - Device for removing volatile organic compound in air by using discharge plasma - Google Patents
Device for removing volatile organic compound in air by using discharge plasmaInfo
- Publication number
- JPH10325A JPH10325A JP8157778A JP15777896A JPH10325A JP H10325 A JPH10325 A JP H10325A JP 8157778 A JP8157778 A JP 8157778A JP 15777896 A JP15777896 A JP 15777896A JP H10325 A JPH10325 A JP H10325A
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- air
- volatile organic
- removing volatile
- needle electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
- Y02A50/20—Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters
Landscapes
- Treating Waste Gases (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、空気中に含まれる
揮発性有機化合物を除去するための放電プラズマを用い
た空気中揮発性有機化合物除去装置に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for removing volatile organic compounds in air using discharge plasma for removing volatile organic compounds contained in air.
【０００２】[0002]
【従来の技術】空気中に含まれる、トルエン，トリクロ
ロエチレン，トリクロロエタン等揮発性有機化合物（以
下ＶＯＣ (Volatile organic compound)という）の処
理、例えば新改築後の居住前の室内で建材から揮発する
ＶＯＣ、クリーンルーム循環空気内に含まれる極微量Ｖ
ＯＣ等の処理は、処理対象ガスをプラズマ空間に通して
分解して排気するようにしている。2. Description of the Related Art Treatment of volatile organic compounds (hereinafter referred to as VOCs) such as toluene, trichloroethylene, and trichloroethane contained in air, for example, VOCs volatilized from building materials in a room before living after new remodeling, Trace V contained in circulating air in clean room
In the treatment of OC and the like, the gas to be treated is decomposed and exhausted through a plasma space.
【０００３】例えば、高温プラズマによるフロン分解で
は、プラズマトーチなどを用いて高電流、高温場のプラ
ズマを作りフロンガスを分解するようにしている。また
低圧プラズマによるプロセスガス処理では、半導体製造
プロセスのＣＶＤで用いたプロセスガスを真空ライン中
で浄化するようにしている。大気圧低温プラズマによる
排気処理では、パルス及び直流コロナまたは交流バリア
放電を用いて排気ガス中のＶＯＣを分解するようにして
いる。For example, in the decomposition of chlorofluorocarbon using high-temperature plasma, a high-current, high-temperature field plasma is generated by using a plasma torch or the like to decompose chlorofluorocarbon gas. In the process gas treatment using low-pressure plasma, a process gas used in CVD in a semiconductor manufacturing process is purified in a vacuum line. In the exhaust treatment using the atmospheric pressure low-temperature plasma, VOC in the exhaust gas is decomposed by using a pulse and a DC corona or an AC barrier discharge.
【０００４】[0004]
【発明が解決しようとする課題】しかしながら、これら
の処理方法は、高濃度ガス処理、あるいは高温での処
理、真空での処理であり、大気圧、常温下での処理は行
われていない。また大気圧、常温下で処理を行うと十分
なプラズマが得られない問題がある。また、プラズマに
よる放電生成物には、オゾン、窒素酸化物、一酸化炭
素、ホスゲン等有害なものが微量発生するので、その処
理が問題となっている。However, these processing methods are high-concentration gas processing, high-temperature processing, and vacuum processing, and are not performed under atmospheric pressure and normal temperature. Further, there is a problem that if the treatment is carried out at atmospheric pressure and normal temperature, sufficient plasma cannot be obtained. In addition, a small amount of harmful substances such as ozone, nitrogen oxides, carbon monoxide, and phosgene are generated in plasma discharge products, so that their treatment is a problem.
【０００５】そこで、本発明の目的は、上記課題を解決
し、大気圧、常温下で、放電を用いてプラズマを発生さ
せ、かつ処理ガスとプラズマを有効に接触させて処理ガ
スを分解すると同時に、活性炭やシフトコンバータを用
いて、放電二次生成物を無害化できる空気中揮発性有機
化合物除去装置を提供することにある。Therefore, an object of the present invention is to solve the above-mentioned problems, to generate plasma using discharge at atmospheric pressure and normal temperature, and to make the processing gas and plasma effectively contact to decompose the processing gas. Another object of the present invention is to provide an apparatus for removing volatile organic compounds in air, which can make secondary products of discharge harmless using activated carbon or a shift converter.
【０００６】[0006]
【課題を解決するための手段】上記目的を達成するため
に請求項１の発明は、処理ガス入口ヘッダと出口ヘッダ
間に多数のキャピラリー放電管を接続し、その各キャピ
ラリー放電管の出入口に針電極を対向して配置すると共
に、その針電極間に直流、交流またはパルス高圧電源を
接続した放電プラズマを用いた空気中揮発性有機化合物
除去装置である。In order to achieve the above object, according to the first aspect of the present invention, a number of capillary discharge tubes are connected between a processing gas inlet header and an outlet header, and needles are provided at the entrance and exit of each of the capillary discharge tubes. An apparatus for removing volatile organic compounds in air using discharge plasma in which electrodes are arranged to face each other and a direct current, alternating current or pulse high voltage power supply is connected between the needle electrodes.
【０００７】請求項２の発明は、キャピラリー放電管
は、ガラスあるいはセラミックス製の絶縁円筒細管から
なる請求項１記載の放電プラズマを用いた空気中揮発性
有機化合物除去装置である。According to a second aspect of the present invention, there is provided the apparatus for removing volatile organic compounds in air using discharge plasma according to the first aspect, wherein the capillary discharge tube comprises an insulating cylindrical thin tube made of glass or ceramics.
【０００８】請求項３の発明は、出口ヘッダに活性炭フ
ィルタ装置が接続される請求項１又は２記載の放電プラ
ズマを用いた空気中揮発性有機化合物除去装置である。According to a third aspect of the present invention, there is provided the apparatus for removing volatile organic compounds in air using discharge plasma according to the first or second aspect, wherein an activated carbon filter device is connected to the outlet header.
【０００９】請求項４の発明は、活性炭フィルタ装置
に、さらにシフトコンバータが接続される請求項３記載
の放電プラズマを用いた空気中揮発性有機化合物除去装
置である。According to a fourth aspect of the present invention, there is provided the apparatus for removing volatile organic compounds in air using discharge plasma according to the third aspect, wherein a shift converter is further connected to the activated carbon filter device.
【００１０】上記構成によれば、処理ガスを多数のキャ
ピラリー放電管に導入し、そこで針電極間に形成される
プラズマ領域を通すことで、処理ガス中に含まれるＶＯ
Ｃを容易に分解して除去できる。According to the above configuration, the processing gas is introduced into a large number of capillary discharge tubes and passes therethrough through the plasma region formed between the needle electrodes.
C can be easily decomposed and removed.
【００１１】[0011]
【発明の実施の形態】以下、本発明の好適一実施の形態
を添付図面に基づいて詳述する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A preferred embodiment of the present invention will be described below in detail with reference to the accompanying drawings.
【００１２】図１において、１０は、ＶＯＣを含んだ処
理ガスを導入してＶＯＣを分解するプラズマ反応器で、
入口ヘッダ１１と出口ヘッダ１２間に多数のキャピラリ
ー放電管１３が接続されて反応器本体１４が形成され、
そのキャピラリー放電管１３の出入口に針電極１５，１
６が対向して配置されると共に、その針電極１５，１６
間に、ピーク電圧が、−１５〜−５０ｋＶのパルス状の
直流高電圧を印加する直流高圧電源１７が接続される。In FIG. 1, reference numeral 10 denotes a plasma reactor for introducing a processing gas containing VOC to decompose VOC.
A number of capillary discharge tubes 13 are connected between the inlet header 11 and the outlet header 12 to form a reactor body 14,
Needle electrodes 15, 1 are connected to the entrance and exit of the capillary discharge tube 13.
6 are arranged facing each other, and the needle electrodes 15, 16 thereof
A DC high voltage power supply 17 for applying a pulsed DC high voltage having a peak voltage of -15 to -50 kV is connected therebetween.
【００１３】キャピラリー放電管１３は、外径約１０ｍ
ｍ，内径が２〜３ｍｍφ、長さ約１００ｍｍの石英ガラ
スやセラミックス等の絶縁管からなり、管１本当たりコ
ンマ数Ｌ／ｍｉｎ〜数十Ｌ／ｍｉｎの流量の処理ガスが
流れるように、処理する処理ガス量に応じてその本数を
設定する。The capillary discharge tube 13 has an outer diameter of about 10 m.
m, an insulating tube made of quartz glass or ceramics having an inner diameter of 2 to 3 mm and a length of about 100 mm, and a processing gas having a flow rate of several L / min to several tens L / min per one tube. The number is set according to the processing gas amount to be processed.
【００１４】針電極１５，１６は、キャピラリー放電管
１３の軸心に位置するように、かつ電極ギャップが数十
ｍｍ、好ましくは約２０ｍｍとなるように対向配置し、
その入口側の針電極１５が接地１８され、出口側の針電
極１６が安定抵抗１９を介して一方が接地２０された直
流高圧電源１７に接続される。The needle electrodes 15 and 16 are opposed to each other so as to be located at the axis of the capillary discharge tube 13 and to have an electrode gap of several tens mm, preferably about 20 mm.
The needle electrode 15 on the inlet side is grounded 18, and the needle electrode 16 on the outlet side is connected to a DC high voltage power supply 17, one of which is grounded 20, via a stabilizing resistor 19.
【００１５】このプラズマ反応器１０の出口ヘッダ１２
には活性炭フィルタ装置２１が接続され、活性炭フィル
タ装置２１に適宜ＣＯをＣＯ2 に転換するシフトコンバ
ータ２２が接続され、さらにエアフィルタ２３が接続さ
れる。The outlet header 12 of the plasma reactor 10
Is connected to a shift converter 22 for appropriately converting CO into CO 2 , and an air filter 23 is connected to the activated carbon filter device 21.
【００１６】以上において、ＶＯＣを含む処理ガスがプ
ラズマ反応器１０の入口ヘッダ１１に供給され、各キャ
ピラリー放電管１３を通ると、針電極１５，１６間に印
加されるパルス状の直流高電圧で電離されてプラズマ化
され、そこでＶＯＣは、イオンや発生したオゾンにより
分解されて出口ヘッダ１２に流れて活性炭フィルタ装置
２１で除去される。また、プラズマ反応器１０で生じた
プラズマ二次反応生成物中のＮＯX も除去される。In the above, the processing gas containing the VOC is supplied to the inlet header 11 of the plasma reactor 10 and passes through each of the capillary discharge tubes 13 so as to generate a pulsed DC high voltage applied between the needle electrodes 15 and 16. It is ionized and turned into plasma, where the VOC is decomposed by ions and generated ozone, flows to the outlet header 12 and is removed by the activated carbon filter device 21. Further, NO x in the plasma secondary reaction product generated in the plasma reactor 10 is also removed.
【００１７】プラズマ分解により生成した一酸化炭素が
多い場合は、シフトコンバータ２２にてＣＯをＣＯ2 に
転換し、またダスト等の微粒子の濃度が高い場合には、
最終段に設けたエアフィルタ２３にて除去する。When the amount of carbon monoxide generated by the plasma decomposition is large, CO is converted into CO 2 by the shift converter 22. When the concentration of fine particles such as dust is high,
It is removed by the air filter 23 provided at the last stage.
【００１８】このキャピラリー放電管１３内で発生する
プラズマは、キャピラリー放電管１３の内径が小さいた
め、プラズマ密度が高く、かつキャピラリー放電管１３
を通る処理ガスは確実にプラズマと接すると共に滞留時
間も長いため、ＶＯＣの分解反応率が高くできる。The plasma generated in the capillary discharge tube 13 has a high plasma density and a small diameter because the inside diameter of the capillary discharge tube 13 is small.
Since the processing gas passing through the gas surely comes into contact with the plasma and has a long residence time, the decomposition reaction rate of VOC can be increased.
【００１９】次に、図２〜図５により実験例を説明す
る。Next, an experimental example will be described with reference to FIGS.
【００２０】図２は、処理ガス流量（０．５，１，４，
１０Ｌ／ｍｉｎ）に対して、プラズマを安定して生成で
きる平均電流−電圧の関係を示したもので、図３は、電
流を１ｍＡとし、処理ガス中のＶＯＣ濃度（サンプル；
トルエン，濃度５８０〜１２００ｐｐｍ）での処理ガス
流量を変えたときの滞留時間と分解効率の関係を示した
ものである。FIG. 2 shows the processing gas flow rates (0.5, 1, 4,
FIG. 3 shows the relationship between the average current and the voltage that can stably generate plasma with respect to 10 L / min. FIG. 3 shows that the current is 1 mA and the VOC concentration in the processing gas (sample;
It shows the relationship between the residence time and the decomposition efficiency when the flow rate of the processing gas at toluene (concentration: 580 to 1200 ppm) is changed.
【００２１】図により、滞留時間が長ければ分解効率も
比例して上がり、滞留時間２３ｍｓｅｃ、初期濃度１２
００ｐｐｍの処理ガスでは、分解効率を８６％にでき
た。また、後段の活性炭通過後には、ほぼ１００％の除
去率が得られた。As shown in the figure, if the residence time is long, the decomposition efficiency is increased in proportion to the residence time, the residence time is 23 msec, and the initial concentration is 12
With a treatment gas of 00 ppm, the decomposition efficiency could be made 86%. After passing the activated carbon in the latter stage, a removal rate of almost 100% was obtained.
【００２２】図４，図５，図６は、処理ガスのプラズマ
処理の前後及び活性炭フィルタ後の赤外線吸光スペクト
ルを示したもので、図４は処理前、図５は処理後、図６
は活性炭フィルタ後のスペクトルを示している。FIGS. 4, 5 and 6 show the infrared absorption spectra before and after the plasma treatment of the processing gas and after the activated carbon filter. FIG.
Shows the spectrum after the activated carbon filter.
【００２３】図４に示すように、処理ガス中には、ＶＯ
Ｃとしてのトルエンの吸光スペクトルが、３０００，７
００ｃｍ-1にあるが、図５に示すようにその透過率が上
がっており、分解されている。また、図６に示すよう
に、プラズマにより発生したＮＯx や未反応のトルエン
は後段の活性炭フィルタにより除去できている。さら
に、後工程のシフトコンバータでＣＯを除去する。As shown in FIG. 4, VO is contained in the processing gas.
The absorption spectrum of toluene as C is 3000,7
Although it is at 00 cm -1 , its transmittance is increased as shown in FIG. 5 and it has been decomposed. Further, as shown in FIG. 6, NO x and unreacted toluene generated by the plasma can be removed by the activated carbon filter at the subsequent stage. Further, CO is removed by a shift converter in a subsequent process.
【００２４】[0024]
【発明の効果】以上要するに本発明によれば、処理ガス
を多数のキャピラリー放電管に導入し、そこで針電極間
に形成されるプラズマ領域を通すことで、処理ガス中に
含まれるＶＯＣを容易に分解して除去できる。In summary, according to the present invention, the processing gas is introduced into a large number of capillary discharge tubes, where it passes through the plasma region formed between the needle electrodes, so that the VOC contained in the processing gas can be easily reduced. Can be disassembled and removed.
【図１】本発明の一実施の形態を説明する図である。FIG. 1 is a diagram illustrating an embodiment of the present invention.
【図２】本発明において、処理ガスの流量に対する平均
電流−電圧の関係を示す図である。FIG. 2 is a diagram showing a relationship between an average current and a voltage with respect to a flow rate of a processing gas in the present invention.
【図３】本発明において、処理ガスの濃度に対する流量
と分解効率の関係を示す図である。FIG. 3 is a diagram showing a relationship between a flow rate and a decomposition efficiency with respect to a concentration of a processing gas in the present invention.
【図４】図３で、用いた処理ガスのプラズマ処理前の赤
外線吸光スペクトルを示す図である。FIG. 4 is a view showing an infrared absorption spectrum of the processing gas used in FIG. 3 before plasma processing.
【図５】図３で、用いた処理ガスのプラズマ処理後の赤
外線吸光スペクトルを示す図である。FIG. 5 is a view showing an infrared absorption spectrum of the processing gas used in FIG. 3 after the plasma processing.
【図６】図３で、用いた処理ガスのプラズマ処理後のガ
スの活性炭フィルタ通過後の赤外線吸光スペクトルを示
す図である。FIG. 6 is a view showing an infrared absorption spectrum of a gas after a plasma treatment of a used treatment gas after passing through an activated carbon filter in FIG. 3;
１０ プラズマ反応器 １１ 入口ヘッダ １２ 出口ヘッダ １３ キャピラリー放電管 １５，１６ 針電極 １７ 直流高圧電源 DESCRIPTION OF SYMBOLS 10 Plasma reactor 11 Inlet header 12 Outlet header 13 Capillary discharge tube 15, 16 Needle electrode 17 DC high voltage power supply
───────────────────────────────────────────────────── フロントページの続き (72)発明者 ジェン−シー チャング カナダ国 オンタリオ州 ハミルトン メ インストリートウエスト 1280 マックマ スター，ユニバーシティ内 (72)発明者 アレキサンダ エ ベレジン カナダ国 オンタリオ州 ハミルトン メ インストリートウエスト 1280 マックマ スター，ユニバーシティ内 (72)発明者 山本 俊昭 アメリカ合衆国 ノースカロライナ州 チ ャペルヒル ホワイトフィールドロード 3212 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Jen-Chang, 1280 McMastar, University of Hamilton-Main Street West, Ontario, Canada (72) Inventor Alexander e Belezin 1280 Macma, Hamilton Main Street West, Ontario, Canada Star, University (72) Inventor Toshiaki Yamamoto Chapel Hill, North Carolina, USA Whitefield Road 3212
Claims (4)
数のキャピラリー放電管を接続し、その各キャピラリー
放電管の出入口に針電極を対向して配置すると共に、そ
の針電極間に直流、交流またはパルス高圧電源を接続し
たことを特徴とする放電プラズマを用いた空気中揮発性
有機化合物除去装置。1. A large number of capillary discharge tubes are connected between a processing gas inlet header and an outlet header, needle electrodes are arranged at the entrance and exit of each of the capillary discharge tubes, and a direct current, alternating current or An apparatus for removing volatile organic compounds in air using discharge plasma, which is connected to a pulse high-voltage power supply.
セラミックス製の絶縁円筒細管からなる請求項１記載の
放電プラズマを用いた空気中揮発性有機化合物除去装
置。2. The apparatus for removing volatile organic compounds in air using discharge plasma according to claim 1, wherein the capillary discharge tube comprises an insulating cylindrical thin tube made of glass or ceramics.
される請求項１又は２記載の放電プラズマを用いた空気
中揮発性有機化合物除去装置。3. The apparatus for removing volatile organic compounds in air using discharge plasma according to claim 1, wherein an activated carbon filter device is connected to the outlet header.
ンバータが接続される請求項３記載の放電プラズマを用
いた空気中揮発性有機化合物除去装置。4. The apparatus for removing volatile organic compounds in air using discharge plasma according to claim 3, wherein a shift converter is further connected to the activated carbon filter device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15777896A JP4010580B2 (en) | 1996-06-19 | 1996-06-19 | Device for removing volatile organic compounds in air using discharge plasma |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15777896A JP4010580B2 (en) | 1996-06-19 | 1996-06-19 | Device for removing volatile organic compounds in air using discharge plasma |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10325A true JPH10325A (en) | 1998-01-06 |
| JP4010580B2 JP4010580B2 (en) | 2007-11-21 |
Family
ID=15657097
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15777896A Expired - Lifetime JP4010580B2 (en) | 1996-06-19 | 1996-06-19 | Device for removing volatile organic compounds in air using discharge plasma |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4010580B2 (en) |
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| KR20030001987A (en) * | 2001-06-28 | 2003-01-08 | (주) 티엔케이텍 | Analysis Device For Treating The Food Wastes |
| US6621227B1 (en) | 2000-02-08 | 2003-09-16 | Canon Kabushiki Kaisha | Discharge generating apparatus and discharge generating method |
| US6635996B1 (en) | 1999-03-26 | 2003-10-21 | Canon Kabushiki Kaisha | Plasma generating apparatus, plasma generating method and gas processing method by plasma reaction |
| JP2013255475A (en) * | 2012-06-14 | 2013-12-26 | Pearl Kogyo Co Ltd | Method for transferring selected molecule into target cell and selected molecule transfer device used for the same |
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| CN111974180A (en) * | 2020-06-17 | 2020-11-24 | 金华市中荷环保科技有限公司 | Large-scale reactor of low temperature plasma |
| CN113230841A (en) * | 2021-06-02 | 2021-08-10 | 北京基亚特环保科技有限公司 | Plasma and active carbon adsorption all-in-one machine |
| CN113785119A (en) * | 2019-03-11 | 2021-12-10 | 南加利福尼亚大学 | Systems and methods for plasma-based abatement |
| JP2022508750A (en) * | 2018-10-12 | 2022-01-19 | ヴラドレノヴィッチ ミスラフスキー，ボリス | Methods and equipment for plasma chemical gas / gas mixture conversion |
-
1996
- 1996-06-19 JP JP15777896A patent/JP4010580B2/en not_active Expired - Lifetime
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6635996B1 (en) | 1999-03-26 | 2003-10-21 | Canon Kabushiki Kaisha | Plasma generating apparatus, plasma generating method and gas processing method by plasma reaction |
| JP2001087622A (en) * | 1999-09-24 | 2001-04-03 | Anzai Setsu | Exhaust gas cleaning apparatus |
| JP4559563B2 (en) * | 1999-09-24 | 2010-10-06 | 安斎 節 | Exhaust gas purification device |
| US6621227B1 (en) | 2000-02-08 | 2003-09-16 | Canon Kabushiki Kaisha | Discharge generating apparatus and discharge generating method |
| JP4796733B2 (en) * | 2000-05-29 | 2011-10-19 | 株式会社アドテック プラズマ テクノロジー | Gas decomposition apparatus and plasma equipment using the same |
| WO2001091896A1 (en) * | 2000-05-29 | 2001-12-06 | Three Tec Co., Ltd. | Object processing apparatus and plasma facility comprising the same |
| KR20030001987A (en) * | 2001-06-28 | 2003-01-08 | (주) 티엔케이텍 | Analysis Device For Treating The Food Wastes |
| JP2013255475A (en) * | 2012-06-14 | 2013-12-26 | Pearl Kogyo Co Ltd | Method for transferring selected molecule into target cell and selected molecule transfer device used for the same |
| WO2017183326A1 (en) * | 2016-04-20 | 2017-10-26 | 日産自動車株式会社 | Deodorizing device |
| CN108854488A (en) * | 2018-06-25 | 2018-11-23 | 深圳市前海泓远控股有限公司 | A kind of VOCs gas processing method of plasma combination ozone |
| JP2022508750A (en) * | 2018-10-12 | 2022-01-19 | ヴラドレノヴィッチ ミスラフスキー，ボリス | Methods and equipment for plasma chemical gas / gas mixture conversion |
| CN113785119A (en) * | 2019-03-11 | 2021-12-10 | 南加利福尼亚大学 | Systems and methods for plasma-based abatement |
| CN111974180A (en) * | 2020-06-17 | 2020-11-24 | 金华市中荷环保科技有限公司 | Large-scale reactor of low temperature plasma |
| CN111974180B (en) * | 2020-06-17 | 2022-04-22 | 金华市中荷环保科技有限公司 | Large-scale reactor of low temperature plasma |
| CN113230841A (en) * | 2021-06-02 | 2021-08-10 | 北京基亚特环保科技有限公司 | Plasma and active carbon adsorption all-in-one machine |
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