JPH10319406A - Active matrix type liquid crystal display device - Google Patents

Active matrix type liquid crystal display device

Info

Publication number
JPH10319406A
JPH10319406A JP12670897A JP12670897A JPH10319406A JP H10319406 A JPH10319406 A JP H10319406A JP 12670897 A JP12670897 A JP 12670897A JP 12670897 A JP12670897 A JP 12670897A JP H10319406 A JPH10319406 A JP H10319406A
Authority
JP
Japan
Prior art keywords
liquid crystal
substrates
crystal layer
crystal display
pair
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12670897A
Other languages
Japanese (ja)
Other versions
JP3780063B2 (en
Inventor
Yasushi Tomioka
冨岡  安
Takao Miwa
崇夫 三輪
Katsumi Kondo
克己 近藤
Hisao Yokokura
久男 横倉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12670897A priority Critical patent/JP3780063B2/en
Priority to TW087104980A priority patent/TW523630B/en
Priority to US09/071,879 priority patent/US6682783B1/en
Priority to KR1019980017494A priority patent/KR100530906B1/en
Publication of JPH10319406A publication Critical patent/JPH10319406A/en
Priority to US10/732,279 priority patent/US7189439B2/en
Application granted granted Critical
Publication of JP3780063B2 publication Critical patent/JP3780063B2/en
Priority to US11/708,462 priority patent/US7790248B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a liquid crystal display device having a high picture quality and a high productivity, by which unevenness of display caused by burnt afterimage is reduced in a device using a lateral electric field mode by setting a glass transition temperature of an oriented film placed between a liquid crystal layer and at least one of substrates to more than a specific value. SOLUTION: A glass transition temp. Tg of an oriented film placed between a liquid crystal layer and at least one of a pair of substrates holding the liquid crystal layer is set to >=300 deg.C. For a method of varying an optical characteristic according to molecule orientation condition of the liquid crystal layer, a pair of polarizing plates are used of which polarization axes are perpendicular to each other. Further, when a refractive index anisotropy of liquid crystal composition is expressed by Δn and a thickness of the liquid crystal layer is expressed by (d), it is desirable that a parameter Δn.d satisfies 0.2 μm<Δn.d<0.5 μm. Moreover, it is desirable that at least one of the oriented films on the substrates is an organic high molecular compound such as polyamic acid imide series, polyimide series, etc., of which a weight-average molecular weight is 10000-300000.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、アクティブマトリ
クス型液晶表示装置に係り、特に基板平面にほぼ平行な
方向に電界を印加して液晶を駆動する横電界方式のアク
ティブマトリクス型液晶表示装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an active matrix type liquid crystal display device, and more particularly to an in-plane switching type active matrix type liquid crystal display device in which an electric field is applied in a direction substantially parallel to a substrate plane to drive liquid crystal.

【0002】[0002]

【従来の技術】液晶表示装置の表示は、基板間に挟まれ
た液晶層の液晶分子に電界を加えることにより液晶分子
の配向方向を変化させ、それにより生じる液晶層の光学
特性の変化により行われる。
2. Description of the Related Art Display of a liquid crystal display device is performed by changing the alignment direction of liquid crystal molecules by applying an electric field to the liquid crystal molecules of a liquid crystal layer sandwiched between substrates, and thereby changing the optical characteristics of the liquid crystal layer. Will be

【0003】従来のアクティブマトリクス型液晶表示装
置は、液晶に印加する電界の方向が基板界面にほぼ垂直
な方向に設定され、液晶の光旋光性を利用した表示を行
うツイステッドネマチック(TN)表示方式に代表され
る。一方、櫛歯電極を用いて液晶に印加する電界の方向
を基板界面にほぼ平行とし、液晶の複屈折性を用いて表
示を行う方式(横電界方式)が、例えば特公昭63−2190
7号,特開平5−505247号により提案されている。この横
電界方式は従来のTN方式に比べて広視野角,低負荷容
量などの利点があり、アクティブマトリクス型液晶表示
装置として有望な技術である。
A conventional active matrix type liquid crystal display device has a twisted nematic (TN) display system in which a direction of an electric field applied to the liquid crystal is set to a direction substantially perpendicular to a substrate interface, and a display utilizing the optical rotation of the liquid crystal is performed. Is represented by On the other hand, a method of making the direction of the electric field applied to the liquid crystal using a comb electrode substantially parallel to the substrate interface and performing display using the birefringence of the liquid crystal (transverse electric field method) is disclosed in, for example, Japanese Patent Publication No. 63-2190.
No. 7 and Japanese Patent Application Laid-Open No. 5-505247. The horizontal electric field method has advantages such as a wide viewing angle and a low load capacity as compared with the conventional TN method, and is a promising technology as an active matrix type liquid crystal display device.

【0004】近年の液晶表示装置の高速応答化に伴い、
液晶表示素子の残像と呼ばれる画像の焼き付け現象が顕
在化し、表示不良の一因として歩留まりの低下を招いて
いる。この画像の焼き付け現象、すなわち残像問題は、
通常約50ミリ秒程度の液晶応答速度に比べ著しく応答
の遅い領域が発生する場合に生じる。
With the recent increase in response speed of liquid crystal display devices,
An image burn-in phenomenon called an afterimage of the liquid crystal display element has become evident, leading to a reduction in yield as one cause of display failure. This phenomenon of image burning, that is, the afterimage problem,
Usually, this occurs when a region where the response is extremely slow compared to the liquid crystal response speed of about 50 milliseconds occurs.

【0005】従来のTN型液晶表示装置におけるこれら
の発生原因は完全には解明されていないが、薄膜トラン
ジスタ(TFT)から発生する直流電荷が画素に蓄積し
て起こるという説が有力視されている。すなわち、画素
電極上の配向膜、又は液晶配向膜の界面において電圧印
加時の電位が応答時間内に解消されずに保持されること
により、液晶層に実効的な電圧が掛かった状態になるこ
とにより発生すると言われている。このような残像現象
と残留直流電圧成分との相関関係が検討され、現在は残
留直流電圧が低減されるほど残像現象が改良されること
が分かりはじめている。そのため、従来のTN方式の配
向膜には直流電荷が蓄積し難い性質が要求されている。
Although the causes of these occurrences in the conventional TN type liquid crystal display device have not been completely elucidated, it is presumed that DC charges generated from a thin film transistor (TFT) accumulate in a pixel and occur. That is, an effective voltage is applied to the liquid crystal layer by maintaining the potential at the time of voltage application without being canceled within the response time at the interface between the alignment film on the pixel electrode and the liquid crystal alignment film. It is said to be caused by The correlation between such an afterimage phenomenon and a residual DC voltage component has been examined, and it is now beginning to be understood that the residual image voltage is improved as the residual DC voltage is reduced. For this reason, a conventional TN type alignment film is required to have a property that DC charges are hardly accumulated.

【0006】[0006]

【発明が解決しようとする課題】一方、前記の横電界方
式においても画像の焼き付け(残像)現象が発生し、黒
レベルの低下,コントラスト低下を引き起こし画質や歩
留まりの低下で量産性が低下するという問題がある。そ
こで従来TN方式において残像現象と相関があった画素
電極に残留する直流電圧をこの横電界方式についても測
定したところ、(1)残像の発生する液晶表示素子と発
生しないものとの残留直流電圧値に有意な差がほとんど
ないこと、また(2)この横電界方式では画像の焼き付
きが半永久的に持続しコントラストの著しい低下を引き
起こすものがあることが分かった。以上の点から、この
横電界方式の残像,焼き付き現象は従来のTN方式とは
全く異なった横電界方式特有のメカニズムに基づいてい
ると考えられ、横電界特有の画像の焼き付け,残像問題
の解決が求められている。
On the other hand, even in the above-mentioned in-plane switching method, a phenomenon of image sticking (afterimage) occurs, which causes a decrease in black level and contrast, resulting in a decrease in image quality and a yield, resulting in a decrease in mass productivity. There's a problem. Therefore, when the DC voltage remaining on the pixel electrode, which was correlated with the afterimage phenomenon in the conventional TN mode, was also measured in the lateral electric field mode, (1) the residual DC voltage value between the liquid crystal display element in which the afterimage occurs and the liquid crystal display element not generating (2) It was found that in this horizontal electric field method, image sticking persisted semi-permanently and caused a significant decrease in contrast. From the above points, it is considered that the afterimage and burn-in phenomenon of the in-plane switching method is based on a mechanism peculiar to the in-plane switching method, which is completely different from the conventional TN mode, and the problem of image sticking and afterimage peculiar to the in-plane switching method is solved. Is required.

【0007】したがって、本発明の目的は、横電界方式
を用いたアクティブマトリクス型液晶表示装置におい
て、上記の課題を解決し、画像の焼き付き残像現象によ
る表示むらが少なく、高画質で量産性に優れたアクティ
ブマトリクス型液晶表示装置を提供することにある。
Accordingly, an object of the present invention is to solve the above-mentioned problems in an active matrix type liquid crystal display device using a horizontal electric field method, to reduce display unevenness due to image sticking afterimage, to achieve high image quality and excellent mass productivity. To provide an active matrix type liquid crystal display device.

【0008】[0008]

【課題を解決するための手段】本発明のアクティブマト
リクス型液晶表示装置によれば、液晶層とこの液晶層を
挟持する一対の基板の少なくとも一方の基板との間に配
置される配向膜のガラス転移温度Tgを300℃以上に
設定する。
According to an active matrix type liquid crystal display device of the present invention, an alignment film glass is disposed between a liquid crystal layer and at least one of a pair of substrates sandwiching the liquid crystal layer. The transition temperature Tg is set to 300 ° C. or higher.

【0009】液晶層の分子配向状態に応じて光学特性を
変える方法としては、その偏光軸を互いにほぼ直交させ
た一対の偏光板を用いる。更に、液晶組成物の屈折率異
方性をΔn、液晶層の厚さをdとしたときのパラメータ
Δn・dが0.2μm<Δn・d<0.5μmを満たすよ
うにすると良い。
As a method of changing the optical characteristics according to the molecular orientation state of the liquid crystal layer, a pair of polarizing plates whose polarization axes are substantially orthogonal to each other is used. Furthermore, when the refractive index anisotropy of the liquid crystal composition is Δn and the thickness of the liquid crystal layer is d, it is preferable that the parameter Δn · d satisfies 0.2 μm <Δnd <0.5 μm.

【0010】またそれぞれの基板上に形成された配向膜
の少なくとも一方が、重量平均分子量が10,000 以
上〜300,000 以下である有機高分子化合物、詳し
くは、ポリアミック酸イミド系,ポリイミド系,ポリイ
ミドシロキサン系,ポリアミドイミド系の有機高分子で
あることが好ましい。
At least one of the alignment films formed on each of the substrates is made of an organic polymer compound having a weight average molecular weight of 10,000 or more and 300,000 or less, more specifically, a polyamic imide type, a polyimide type, It is preferable to use a polyimidesiloxane-based or polyamideimide-based organic polymer.

【0011】またそれらの有機高分子の分子量分布は重
量平均分子量/数平均分子量の比で表される分散係数が
2以下のものが好適である。
The molecular weight distribution of these organic polymers is preferably those having a dispersion coefficient expressed by the ratio of weight average molecular weight / number average molecular weight of 2 or less.

【0012】さらに、本発明の実施態様によれば、配向
膜が、化学式H2N−R−NH2で示すジアミン化合物
と、化学式
Further, according to an embodiment of the present invention, the alignment film comprises a diamine compound represented by the chemical formula H 2 NR—NH 2 and a diamine compound represented by the chemical formula:

【0013】[0013]

【化1】 Embedded image

【0014】で示すテトラカルボン酸二無水物からなる
ポリアミック酸の脱水閉環した有機高分子であり、その
繰り返し構造の中のR及びXに、高分子の分子軸の回転
を可能にする結合基,−O−,−S−,−CH2−,−
C(CH3)2−,−C(CF3)2−,−SO2−,メタ結合,
オルト結合が合わせて3個以下である。
A dehydration-closed organic polymer of a polyamic acid composed of tetracarboxylic dianhydride represented by the following formula, wherein R and X in the repeating structure are provided with a bonding group capable of rotating the molecular axis of the polymer, -O -, - S -, - CH 2 -, -
C (CH 3) 2 -, - C (CF 3) 2 -, - SO 2 -, meta bonds,
The number of ortho bonds is 3 or less in total.

【0015】[0015]

【発明の実施の形態】まず、本発明の前提となる横電界
方式の動作原理を図1を例に用いて説明する。図1
(a),(b)は横電界方式の液晶素子1画素内での液晶
の動作を示す側断面を、図1(c),(d)はその正面図
を表す。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS First, the principle of operation of a lateral electric field system as a premise of the present invention will be described with reference to FIG. FIG.
1A and 1B are side sectional views showing the operation of liquid crystal within one pixel of a liquid crystal element of a horizontal electric field method, and FIGS. 1C and 1D are front views thereof.

【0016】電圧無印加時のセル側断面を図1(a)
に、その時の正面図を図1(c)に示す。一方の基板の
内側に線状電極1,4が形成され、基板表面は対となる
基板の双方とも配向膜5となっており、基板間には液晶
組成物が挟持されている(この例ではその誘電異方性は
正と仮定しているが、負の液晶組成物では液晶分子の長
軸と短軸の方向を入れ換えるだけで横電界方式は同様に
実現可能である)。
FIG. 1A is a cross-sectional view of the cell side when no voltage is applied.
FIG. 1C shows a front view at that time. Linear electrodes 1 and 4 are formed inside one of the substrates, and the substrate surface is an alignment film 5 on both of the paired substrates, and a liquid crystal composition is sandwiched between the substrates (in this example, in this example). The dielectric anisotropy is assumed to be positive, but in a negative liquid crystal composition, the transverse electric field method can be similarly realized only by changing the directions of the long axis and the short axis of the liquid crystal molecules.)

【0017】棒状の液晶分子6は、配向膜5との結合に
より両基板界面において共に電極1,4長手方向(図1
(c)正面図)に若干の角度を持つ方向10の向きに配
向制御されており、電界無印加時には液晶層内ではほぼ
一様にこの方向を向いた状態となっている。ここで、画
素電極4と共通電極1のそれぞれに異なる電位を与え、
それらの間の電位差により液晶組成物層に電界9を印加
すると、液晶組成物が持つ誘電異方性と電界との相互作
用により図1(b),(d)に示したように液晶分子は電
界方向にその向きを変える。このとき液晶組成物層の屈
折異方性と偏光板8の作用により本液晶素子の光学特性
が変化し、この変化により表示を行う。図2は、横電界
方式の液晶表示装置の電極間の印加電圧とその表示輝度
との関係を模式的に示したグラフである。図2(a)の
実線は初期の基本特性を示しており、(b)の点線は典
型的な残像を示す場合の電圧・輝度特性曲線を示してい
る。このように残像,画像の焼き付け現象は、中間調領
域で顕著な輝度変動を示している。
The rod-like liquid crystal molecules 6 are bonded to the alignment film 5 at the interface between the two substrates at the longitudinal direction of the electrodes 1 and 4 (FIG. 1).
(C) Front view), the orientation is controlled in the direction 10 having a slight angle, and when no electric field is applied, the liquid crystal layer is oriented almost uniformly in this direction. Here, different potentials are applied to the pixel electrode 4 and the common electrode 1, respectively.
When an electric field 9 is applied to the liquid crystal composition layer due to the potential difference between them, the interaction between the dielectric anisotropy of the liquid crystal composition and the electric field causes the liquid crystal molecules to change as shown in FIGS. 1 (b) and (d). Change its direction to the direction of the electric field. At this time, the optical characteristics of the present liquid crystal element change due to the refractive anisotropy of the liquid crystal composition layer and the action of the polarizing plate 8, and display is performed by the change. FIG. 2 is a graph schematically showing a relationship between an applied voltage between electrodes of a liquid crystal display device of a horizontal electric field type and a display luminance thereof. The solid line in FIG. 2A shows the initial basic characteristics, and the dotted line in FIG. 2B shows the voltage / luminance characteristic curve when a typical afterimage is shown. As described above, the afterimage and the image printing phenomenon show remarkable luminance fluctuation in the halftone area.

【0018】ここで、残像現象のメカニズムについて考
察する。
Here, the mechanism of the afterimage phenomenon will be considered.

【0019】前記の配向膜と液晶分子の結合による配向
規制力(結合力)は、配向膜材料やそのラビング処理条
件等によって大きく異なることが知られているが、配向
膜表面での液晶分子の配向変化の方向によっても異な
る。表面にほぼ水平に配向した正の誘電率異方性を持つ
液晶材料を考えると、電界印加により生じる基板表面の
液晶分子の配向変化方向は、基板界面に対して電界がほ
ぼ垂直に印加されるTN方式では基板表面から立ち上が
る方向(図3に示す極角方向)に、また基板界面に対し
て電界がほぼ平行に印加される横電界方式では基板面内
方向(図3に示す面内の捻れ回転方向)となる。したが
って、従来のTN方式では液晶分子の極角方向の配向変
化の戻り難さが画像の焼き付き,残像に対応し、またそ
れは上下の対電極付近に残留する直流電位に起因すると
考えられている。
It is known that the alignment regulating force (coupling force) due to the bonding between the alignment film and the liquid crystal molecules varies greatly depending on the alignment film material and the rubbing treatment conditions. It also depends on the direction of the orientation change. Considering a liquid crystal material having a positive dielectric anisotropy that is oriented almost horizontally on the surface, the direction of change in the orientation of liquid crystal molecules on the substrate surface caused by the application of an electric field is such that an electric field is applied almost perpendicular to the substrate interface. In the TN mode, the substrate rises from the substrate surface (in the polar angle direction shown in FIG. 3), and in the lateral electric field mode in which the electric field is applied almost parallel to the substrate interface, the in-plane direction of the substrate (in-plane twist shown in FIG. 3) Rotation direction). Therefore, in the conventional TN mode, it is considered that the difficulty in returning the alignment change of the liquid crystal molecules in the polar angle direction corresponds to image burn-in and an afterimage, which is caused by the DC potential remaining near the upper and lower counter electrodes.

【0020】一方、横電界方式では、画像の焼き付き,
残像は基板面内方向の液晶分子のねじれ変形の戻り難さ
に相当する。また先に述べたように残像と画素電極近傍
に残留する直流電位との相関が認められないことから、
これは電気的な要因というよりはむしろ液晶/配向膜界
面の相互作用に基づくと考えられる。
On the other hand, in the horizontal electric field method, image burning,
The afterimage corresponds to the difficulty of returning the twist deformation of the liquid crystal molecules in the in-plane direction of the substrate. Also, as described above, since there is no correlation between the afterimage and the DC potential remaining near the pixel electrode,
This is considered to be based not on the electrical factor but on the interaction of the liquid crystal / alignment film interface.

【0021】そこで本発明者らが鋭意検討した結果、横
電界方式の画像の焼き付き,残像現象の発生は、液晶分
子の面内捻れ変形に基づき発生する回転トルクにより液
晶分子の配向を規制している配向膜表面が弾性変形し、
その変形・クリープが高分子特有の(遅延弾性変形後
の)弾性余効、すなわち残留した歪みとしてある有限の
遅延時間とともに回復していく残像として、または永久
変形としての画像の焼き付き現象として現れると解釈さ
れた。
The inventors of the present invention have conducted intensive studies, and as a result, the occurrence of image sticking and afterimage in the lateral electric field method is controlled by controlling the orientation of the liquid crystal molecules by the rotational torque generated based on the in-plane torsional deformation of the liquid crystal molecules. The surface of the alignment film is elastically deformed,
If the deformation / creep appears as a polymer-specific elastic aftereffect (after delayed elastic deformation), that is, as an afterimage that recovers with a finite delay time as a residual strain, or as an image burn-in phenomenon as a permanent deformation Was interpreted.

【0022】したがって、このような残像現象の発生を
低減する対策として、配向膜の硬さ(弾性率)を増大さ
せ、液晶分子の駆動による回転トルクの影響を受け難い
高弾性高分子表面を形成すること、又は液晶層の回転ト
ルクが配向膜層に伝搬し難いように界面の捻れ結合の弱
い状態を形成することが有効であると考えられる。
Therefore, as a countermeasure to reduce the occurrence of such an afterimage phenomenon, the hardness (elastic modulus) of the alignment film is increased to form a highly elastic polymer surface which is hardly affected by the rotation torque caused by driving the liquid crystal molecules. It is considered to be effective to perform the operation or to form a state in which the torsional coupling at the interface is weak so that the rotation torque of the liquid crystal layer is not easily transmitted to the alignment film layer.

【0023】配向膜の高弾性率化を図るための具体策と
しては、配向膜を構成するポリマーの分子構造が剛直で
直線性に富んだ構造であることが望ましく、また分子量
をなるべく大きくするのが好ましい。さらには単分散系
にするのが良い。また配向膜塗布・焼成硬化・ラビング
配向処理後の光架橋反応により高次のネットワークを構
築し力学的に強度を高めるのも良い。分子量を10,0
00 以上に大きくすることによって、ポリマー鎖間の
凝集力を増加させ弾性率の増加を図ることができる。し
かし、一方で分子量が300,000 以上に大きくなる
と、配向膜ワニスの融液状態でポリマー鎖の絡み合いが
発生し、ポリマー鎖の密度の高いパッキングが妨げられ
ることがある。またポリマー配向膜の弾性率は周囲の環
境条件、特に温度により大きな影響を受けることが知ら
れている。
As a specific measure for increasing the elastic modulus of the alignment film, it is desirable that the polymer constituting the alignment film has a rigid and highly linear molecular structure, and that the molecular weight be as large as possible. Is preferred. Further, it is preferable to use a monodispersed system. It is also possible to construct a higher-order network by photocrosslinking reaction after the application of an alignment film, baking hardening, and rubbing alignment treatment to mechanically increase the strength. Molecular weight 10,000
By making it larger than 00, the cohesive force between the polymer chains can be increased and the elastic modulus can be increased. However, on the other hand, when the molecular weight is 300,000 or more, entanglement of polymer chains may occur in the melt state of the alignment film varnish, and packing with high polymer chain density may be prevented. It is also known that the elastic modulus of the polymer alignment film is greatly affected by surrounding environmental conditions, particularly temperature.

【0024】この観点から上記のような高弾性率配向膜
の選定の指標として弾性率以外に配向膜高分子のガラス
転移点Tgがある。このTgが高ければ高いほど配向膜
の高い弾性率が保証されることになる。このTgの大き
さと本発明の課題である横電界方式の残像の大きさの相
関をとると配向膜のTgが300℃を越えるものが表示
性能の許容値を満足する程度までに残像を低減できるこ
とがわかった。従って、配向膜のTgが300℃以上の
ポリマーが望ましい。このTgは配向膜ポリマーのバル
クの値であり、実際に液晶配向膜界面に係わる配向膜表
面のTgは大きく見積もっても約100℃の低下が予想
される。従って、実際に動作が保証されている−30℃
から70℃の範囲では配向膜表面の弾性率の低下はほと
んどないと考えられる。
From this viewpoint, the glass transition point Tg of the polymer of the alignment film other than the elastic modulus is an index for selecting the high elastic modulus alignment film as described above. The higher the Tg, the higher the elastic modulus of the alignment film is guaranteed. The correlation between the magnitude of this Tg and the magnitude of the afterimage of the in-plane switching method, which is an object of the present invention, shows that an alignment film having a Tg of more than 300 ° C. can reduce the afterimage to an extent that the allowable value of the display performance is satisfied. I understood. Therefore, a polymer having a Tg of the alignment film of 300 ° C. or more is desirable. This Tg is a bulk value of the polymer of the alignment film, and the Tg of the surface of the alignment film related to the interface of the liquid crystal alignment film is expected to decrease by about 100 ° C. even if it is largely estimated. Therefore, the operation is actually guaranteed at -30 ° C.
It is considered that the elastic modulus of the surface of the alignment film hardly decreases in the temperature range from 70 to 70 ° C.

【0025】また、高分子の分子軸の回転を可能にする
結合基、−O−,−S−,−CH2−,−C(CH3)2−,
−SO2− ,メタ結合,オルト結合が合わせて3個以下
であることが望ましい。なぜならば、ポリマー主鎖間の
拡散はほとんど起こらないが、上記のような結合基が多
数存在すると分子軸回りの回転が容易となり局所的な熱
運動が可能となるため、配向膜高分子の弾性率の低下を
引き起こす結果となる。このような現象は弾性率の温度
特性に現れる側鎖の副分散といて知られている。
Further, a bonding group capable of rotating the molecular axis of the polymer, —O—, —S—, —CH 2 —, —C (CH 3 ) 2 —,
It is desirable that the total number of —SO 2 −, meta bond and ortho bond is 3 or less. This is because diffusion between polymer main chains hardly occurs, but the presence of a large number of the above-described bonding groups facilitates rotation around the molecular axis and enables local thermal motion, and thus the elasticity of the alignment film polymer is increased. This results in a lower rate. Such a phenomenon is known as side chain sub-dispersion appearing in the temperature characteristics of the elastic modulus.

【0026】また、従来のTN方式に用いられる配向膜
ではチルト角を制御するために側鎖に直鎖アルキル基等
を導入する方法が用いられるているが、横電界方式では
視野角の広さを保持するためにも、また上記の観点から
もチルト角を発生する直鎖アルキル基などの長鎖の枝分
かれした側鎖官能基の少ないもの、またはかさ高い側鎖
置換基を全く持たないポリマーが好適である。
In the alignment film used in the conventional TN method, a method of introducing a linear alkyl group or the like into a side chain is used to control a tilt angle. In order to maintain the above, also from the above point of view, a polymer having no long-chain branched side-chain functional groups such as a linear alkyl group that generates a tilt angle, or a polymer having no bulky side-chain substituents. It is suitable.

【0027】以上のような観点から、本発明に用いる配
向膜の合成材料であるアミン成分の化合物およびその他
共重合可能な化合物は、例えば、芳香族ジアミンとして
は、p−フェニレンジアミン,m−フェニレンジアミ
ン、2,4−ジアミノトルエン、2,5−ジアミノトル
エン、2,6−ジアミノトルエン,ジアミノデュレン,
ベンジジン,O−トリジン、3,3′−ジメトキシベン
ジジン、4,4″−ジアミノターフェニル、1,5−ジ
アミノナフタレン、2,7−ジアミノフルオレン、4,
4′−ジアミノジフェニルエーテル、4,4′−ジアミ
ノジフェニルスルフィド、4,4′−ジアミノジフェニ
ルメタン、3,3′−ジメチル−4,4′−ジアミノジ
フェニルメタン、2,5−ジアミノピリジン、4,4′
−ビス(p−アミノフェノキシ)ビフェニル、2,2−
ビス{4−(p−アミノフェノキシ)フェニル}プロパ
ン、2,2−ビス{4−(p−アミノフェノキシ)フェ
ニル}ヘキサフルオロプロパン、4,4′−ビス(m−
アミノフェノキシ)ジフェニルスルフォンなどが挙げら
れるが、これらに限定されるものではない。
From the above viewpoints, the compounds of the amine component and other copolymerizable compounds which are synthetic materials for the alignment film used in the present invention include, for example, p-phenylenediamine and m-phenylene as aromatic diamines. Diamine, 2,4-diaminotoluene, 2,5-diaminotoluene, 2,6-diaminotoluene, diaminodulene,
Benzidine, O-tolidine, 3,3'-dimethoxybenzidine, 4,4 "-diaminoterphenyl, 1,5-diaminonaphthalene, 2,7-diaminofluorene, 4,
4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfide, 4,4'-diaminodiphenylmethane, 3,3'-dimethyl-4,4'-diaminodiphenylmethane, 2,5-diaminopyridine, 4,4 '
-Bis (p-aminophenoxy) biphenyl, 2,2-
Bis {4- (p-aminophenoxy) phenyl} propane, 2,2-bis {4- (p-aminophenoxy) phenyl} hexafluoropropane, 4,4′-bis (m-
Aminophenoxy) diphenylsulfone and the like, but are not limited thereto.

【0028】一方、酸成分の化合物およびその他共重合
可能な化合物は例えば、芳香族テトラカルボン酸二無水
物としては、ピロメリット酸二無水物、メチルーピロメ
リット酸二無水物、ジメチレントリメリテート酸二無水
物、3,3′、4,4′−ベンゾフェノンテトラカルボ
ン酸二無水物、3,3′、4,4′−ビフェニルテトラ
カルボン酸二無水物,ジメチレントリメリテート酸二無
水物、2,3,6,7−ナフタレンテトラカルボン酸二
無水物、3,3′、4,4′−ビフェニルスルホンテト
ラカルボン酸二無水物、3,3′、4,4′−ジフェニ
ルエーテルテトラカルボン酸二無水物、3,3′、4,
4′−ジフェニルメタンテトラカルボン酸二無水物,脂
環式テトラカルボン酸二無水物としては、1,2,3,
4−ブタンテトラカルボン酸二無水物、1,2,3,4
−ビスシクロブタンテトラカルボン酸二無水物、1,
2,3,4−シクロペンタンテトラカルボン酸二無水物
などが挙げられるが、これらに限定されるものではな
い。
On the other hand, the acid component compound and other copolymerizable compounds include, for example, aromatic tetracarboxylic dianhydride such as pyromellitic dianhydride, methyl-pyromellitic dianhydride and dimethylene trimellitate. Tetate dianhydride, 3,3 ', 4,4'-benzophenonetetracarboxylic dianhydride, 3,3', 4,4'-biphenyltetracarboxylic dianhydride, dimethylene trimellitate dianhydride 2,3,6,7-naphthalenetetracarboxylic dianhydride, 3,3 ', 4,4'-biphenylsulfonetetracarboxylic dianhydride, 3,3', 4,4'-diphenylethertetracarboxylic Acid dianhydride, 3,3 ', 4
Examples of 4'-diphenylmethanetetracarboxylic dianhydride and alicyclic tetracarboxylic dianhydride include 1,2,3,
4-butanetetracarboxylic dianhydride, 1,2,3,4
-Biscyclobutanetetracarboxylic dianhydride, 1,
Examples include, but are not limited to, 2,3,4-cyclopentanetetracarboxylic dianhydride.

【0029】また、溶剤については例えば極性を有する
N−メチル−2−ピロリドン,ジメチルホルムアミド,
ジメチルアセトアミド,ジメチルスルホキサイド,スル
フォラン,ブチルラクトン,クレゾール,フェノール,
シクロヘキサノン,ジメチルイミダゾリジノン,ジオキ
サン,テトラヒドロフラン,ブチルセルソルブ,ブチル
セルソルブアセテート,アセトフェノンなどを用いるこ
とができる。
As the solvent, for example, polar N-methyl-2-pyrrolidone, dimethylformamide,
Dimethylacetamide, dimethylsulfoxide, sulfolane, butyllactone, cresol, phenol,
Cyclohexanone, dimethylimidazolidinone, dioxane, tetrahydrofuran, butylcellosolve, butylcellosolve acetate, acetophenone, and the like can be used.

【0030】更に、有機高分子中に例えばγ−アミノプ
ロピルトリエトキシシラン,δ−アミノプロピルメチル
ジエトキシシラン,N−β(アミノエチル)γ−アミノ
プロピルトリメトキシシランなどのアミノ系シランカッ
プリング剤,エポキシ系シランカップリング剤,チタネ
−トカップリング剤,アルミニウムアルコレート,アル
ミニウムキレート,ジルコニウムキレートなどの表面処
理剤を混合もしくは反応することもできる。配向膜の形
成は一般的なスピンコ−ト,印刷,刷毛塗り,スプレー
法などによって行うことができる。
Further, amino-based silane coupling agents such as γ-aminopropyltriethoxysilane, δ-aminopropylmethyldiethoxysilane, N-β (aminoethyl) γ-aminopropyltrimethoxysilane, etc. , An epoxy silane coupling agent, a titanate coupling agent, a surface treatment agent such as aluminum alcoholate, aluminum chelate and zirconium chelate can be mixed or reacted. The formation of the alignment film can be performed by general spin coating, printing, brush coating, spraying, or the like.

【0031】用いる液晶としては、例えば4−置換フェ
ニル−4′−置換シクロヘキサン,4−置換シクロヘキ
シル−4′−置換シクロヘキサン,4−置換フェニル−
4′−置換ジシクロヘキサン,4−置換ジシクロヘキシ
ル−4′−置換ジフェニル,4−置換−4″−置換ター
フェニル,4−置換ビフェニル−4′−置換シクロヘキ
サン,2−(4−置換フェニル)−5−ピリミジン,2
−(4−置換ジオキサン)−5−フェニル,4−置換安
息香酸−4′−フェニルエステル,4−置換シクロヘキ
サンカルボン酸−4′−置換フェニルエステル,4−置
換シクロヘキサンカルボン酸−4′−置換ビフェニルエ
ステル,4−(4−置換シクロヘキサンカルボニルオキ
シ)安息香酸−4′−置換フェニルエステル,4−(4
−置換シクロヘキシル)安息香酸−4′−置換フェニル
エステル,4−(4−置換シクロヘキシル)安息香酸−
4′−置換シクロヘキシルエステル、4−置換−4′−
置換ビフェニル等を挙げることができ、これらの化合物
の中でも、少なくても分子の一方の末端にアルキル基,
アルコキシ基,アルコキシメチレン基,シアノ基,フッ
素基,ジフッ素基,トリフッ素基を有する多成分系の混
合液晶組成物が用いられる。
As the liquid crystal used, for example, 4-substituted phenyl-4'-substituted cyclohexane, 4-substituted cyclohexyl-4'-substituted cyclohexane, 4-substituted phenyl-
4'-substituted dicyclohexane, 4-substituted dicyclohexyl-4'-substituted diphenyl, 4-substituted-4 "-substituted terphenyl, 4-substituted biphenyl-4'-substituted cyclohexane, 2- (4-substituted phenyl) -5 -Pyrimidine, 2
-(4-substituted dioxane) -5-phenyl, 4-substituted benzoic acid-4'-phenyl ester, 4-substituted cyclohexanecarboxylic acid-4'-substituted phenyl ester, 4-substituted cyclohexanecarboxylic acid-4'-substituted biphenyl Ester, 4- (4-substituted cyclohexanecarbonyloxy) benzoic acid-4'-substituted phenyl ester, 4- (4
-Substituted cyclohexyl) benzoic acid-4'-substituted phenyl ester, 4- (4-substituted cyclohexyl) benzoic acid-
4'-substituted cyclohexyl ester, 4-substituted-4'-
Substituted biphenyls and the like can be mentioned. Among these compounds, an alkyl group,
A multi-component mixed liquid crystal composition having an alkoxy group, an alkoxymethylene group, a cyano group, a fluorine group, a difluorine group, and a trifluorine group is used.

【0032】本発明の実施例を具体的に説明する。An embodiment of the present invention will be described specifically.

【0033】(実施例1)基板として、厚みが1.1mm
で表面を研磨した透明なガラス基板を2枚用い、これら
の基板のうち一方の基板の上に横電界が印加できる薄膜
トランジスタおよび配線電極を形成し、更にその上の最
表面に窒化シリコンからなる絶縁保護膜を形成した。
(Example 1) As a substrate, a thickness of 1.1 mm was used.
Using two transparent glass substrates whose surfaces have been polished, a thin film transistor and a wiring electrode to which a lateral electric field can be applied are formed on one of these substrates, and an insulating layer made of silicon nitride is formed on the uppermost surface thereof. A protective film was formed.

【0034】薄膜トランジスタおよび各種電極の構造を
図4に、基板面に垂直な方向から見た正面図と、正面図
のA−A′,B−B′における側断面図として示す。
FIG. 4 shows the structure of the thin film transistor and various electrodes as a front view as viewed from a direction perpendicular to the substrate surface and side sectional views along AA 'and BB' in the front view.

【0035】薄膜トランジスタ素子14は画素電極(ソ
−ス電極)4,信号電極(ドレイン電極)3,走査電極
(ゲート電極)12およびアモルファスシリコン13か
ら構成される。
The thin film transistor element 14 comprises a pixel electrode (source electrode) 4, a signal electrode (drain electrode) 3, a scanning electrode (gate electrode) 12, and amorphous silicon 13.

【0036】共通電極1と走査電極12、および信号電
極3と画素電極4とはそれぞれ同一の金属層をパターン
化して構成した。
The common electrode 1 and the scanning electrode 12, and the signal electrode 3 and the pixel electrode 4 were formed by patterning the same metal layer.

【0037】画素電極4は正面図において、3本の共通
電極1の間に配置されている。
The pixel electrodes 4 are arranged between the three common electrodes 1 in the front view.

【0038】画素ピッチは横方向(すなわち信号電極3
間)は100μm、縦方向(すなわち走査電極12間)
は300μmである。
The pixel pitch is in the horizontal direction (that is, the signal electrode 3).
Is 100 μm, in the vertical direction (that is, between the scanning electrodes 12).
Is 300 μm.

【0039】電極幅は、複数画素間にまたがる配線電極
である走査電極,信号電極,共通電極配線部(走査配線
電極に並行に延びた部分)を広めにし、線欠陥を回避し
た。幅はそれぞれ10μm,8μm,8μmである。
As for the electrode width, a scanning electrode, a signal electrode, and a common electrode wiring portion (a portion extending in parallel with the scanning wiring electrode), which are wiring electrodes extending over a plurality of pixels, are widened to avoid line defects. The widths are 10 μm, 8 μm, and 8 μm, respectively.

【0040】一方、開口率向上のために1画素単位で独
立に形成した画素電極、および共通電極の信号配線電極
の長手方向に延びた部分の幅は若干狭くし、それぞれ5
μm,6μmとした。これらの電極の幅を狭くしたこと
で異物などの混入により断線する可能性が高まるが、こ
の場合1画素の部分的欠落ですみ、線欠陥には至らな
い。
On the other hand, the widths of the pixel electrodes independently formed for each pixel in order to improve the aperture ratio and the portions of the signal wiring electrodes of the common electrodes extending in the longitudinal direction are slightly narrowed, and each is 5
μm and 6 μm. By reducing the width of these electrodes, the possibility of disconnection due to the incorporation of foreign matter and the like increases, but in this case, only one pixel is partially missing and no line defect occurs.

【0041】信号電極3と共通電極1は絶縁膜を介して
2μmの間隔を設けた。
The signal electrode 3 and the common electrode 1 were spaced apart by 2 μm via an insulating film.

【0042】画素数は、640×3(R,G,B)本の
信号配線電極と、480本の配線電極とにより640×
3×480個とした。
The number of pixels is 640 × 3 (R, G, B) signal wiring electrodes and 480 wiring electrodes.
It was set to 3 × 480.

【0043】用いた配向膜は、p−フェニレンジアミン
1.0 モル%をN−メチル−2−ピロリドン中に溶解さ
せ、これにピロメリット酸二無水物1モル%を加えて2
0℃で12時間反応させて、標準ポリスチレン換算重量
平均分子量が約250,000 、重量平均分子量/数平均分子
量(Mv/Mn)が約1.8 のポリアミック酸ワニスを
得た。このワニスを6%濃度に希釈してγ−アミノプロ
ピルトリエトキシシランを固形分で0.3 重量%添加
後、印刷形成して220℃/30分の熱処理を行い、約
800Åの緻密なポリイミド配向膜を形成した。
The alignment film used was prepared by dissolving 1.0 mol% of p-phenylenediamine in N-methyl-2-pyrrolidone and adding 1 mol% of pyromellitic dianhydride thereto.
The mixture was reacted at 0 ° C. for 12 hours to obtain a polyamic acid varnish having a weight average molecular weight in terms of standard polystyrene of about 250,000 and a weight average molecular weight / number average molecular weight (Mv / Mn) of about 1.8. After diluting the varnish to a concentration of 6%, adding 0.3% by weight of γ-aminopropyltriethoxysilane in solid content, forming a print, and performing a heat treatment at 220 ° C. for 30 minutes to obtain a dense polyimide alignment of about 800 °. A film was formed.

【0044】また、上記と同様な製法で得たポリイミド
配向膜のガラス転移温度Tgを測定したところ、約38
0℃を示した。
When the glass transition temperature Tg of the polyimide alignment film obtained by the same manufacturing method as above was measured, it was found to be about 38
0 ° C. was indicated.

【0045】次に、ラビングローラに取り付けたバフ布
で配向膜表面をラビング処理し、液晶配向膜を付与し
た。
Next, the surface of the alignment film was rubbed with a buff cloth attached to a rubbing roller to give a liquid crystal alignment film.

【0046】もう一方の基板には、遮光層付きカラーフ
ィルタを形成し、上記と同様に最表面にポリイミド配向
膜を形成しラビング処理により液晶配向能を付与した。
On the other substrate, a color filter with a light-shielding layer was formed, a polyimide alignment film was formed on the outermost surface in the same manner as described above, and a liquid crystal alignment ability was imparted by a rubbing treatment.

【0047】本実施例では配向能を付与する方法として
ラビング法を用いたが、それ以外の例えば紫外線硬化型
樹脂溶液を塗布して配向膜とし、それに偏光紫外線光を
照射して光化学反応を生じさせることにより液晶配向能
を付与する方法や、水面上に展開した有機分子膜を基板
上に引き上げて形成した配向性の良い多層膜を配向膜と
して用いる方法なども利用できる。
In this embodiment, the rubbing method is used as a method for imparting alignment ability. However, other than that, for example, an ultraviolet-curable resin solution is applied to form an alignment film, which is irradiated with polarized ultraviolet light to cause a photochemical reaction. Then, a method of imparting liquid crystal alignment ability by applying the method and a method of using a multilayer film having good alignment property formed by pulling up an organic molecular film spread on a water surface onto a substrate can be used.

【0048】特に後者の二つの方法は、従来十分大きな
界面チルト角を付与することが困難とされてきた配向制
御方法であるが、横電界方式においては従来のTN方式
に代表される縦電界方式と異なり界面チルト角が原理的
に必要ないため、横電界方式との組合せにより量産性な
どの実用性を向上させることができる。
In particular, the latter two methods are alignment control methods in which it has conventionally been difficult to provide a sufficiently large interface tilt angle, but in the lateral electric field method, a vertical electric field method represented by a conventional TN method is used. Unlike in principle, an interface tilt angle is not required in principle, so that practicality such as mass productivity can be improved by combination with the horizontal electric field method.

【0049】次に、これらの2枚の基板をそれぞれの液
晶配向能を有する表面を相対向させて、分散させた球形
のポリマビーズからなるスペーサを介在させて、周辺部
にシール剤を塗布し、セルを組み立てた。2枚の基板の
ラビング方向は互いにほぼ並行で、かつ印加横電界方向
とのなす角度を75゜とした。このセルに誘電異方性Δ
εが正でその値が10.2(1kHz,20℃)であり、
屈折率異方性Δnが0.075(波長590nm,20
℃)のネマチック液晶組成物を真空で注入し、紫外線硬
化型樹脂からなる封止材で封止した。液晶層の厚み(ギ
ャップ)は4.8μmの液晶パネルを製作した。このパネ
ルのリタデーション(Δn・d)は、0.36μmとな
る。このパネルを2枚の偏光板(日東電工社製G1220D
U)で挾み、一方の偏光板の偏光透過軸を上記のラビン
グ方向とほぼ並行とし、他方をそれに直交させた。
Next, a sealing agent is applied to the periphery of the two substrates with the surfaces having the liquid crystal alignment ability facing each other and a spacer made of dispersed spherical polymer beads interposed therebetween. The cell was assembled. The rubbing directions of the two substrates were substantially parallel to each other, and the angle between the rubbing directions and the direction of the applied lateral electric field was 75 °. The dielectric anisotropy Δ
ε is positive and its value is 10.2 (1 kHz, 20 ° C.)
The refractive index anisotropy Δn is 0.075 (wavelength 590 nm, 20
C) was injected in vacuum and sealed with a sealing material made of an ultraviolet-curable resin. A liquid crystal panel having a liquid crystal layer thickness (gap) of 4.8 μm was manufactured. The retardation (Δnd) of this panel is 0.36 μm. This panel is composed of two polarizing plates (G1220D manufactured by Nitto Denko Corporation).
U), the polarization transmission axis of one of the polarizing plates was substantially parallel to the rubbing direction, and the other was perpendicular to it.

【0050】その後、駆動回路,バックライトなどを接
続してモジュール化し、アクティブマトリクス型液晶表
示装置を得た。本実施例では低電圧で暗表示,高電圧で
明表示となるノーマリクローズ特性とした。
Thereafter, a drive circuit, a backlight and the like were connected to form a module, and an active matrix type liquid crystal display device was obtained. In the present embodiment, the normally closed characteristic is used in which dark display is performed at a low voltage and bright display is performed at a high voltage.

【0051】このように作製した液晶表示装置の画像の
焼き付け,残像を定量的に測定するため、ホトダイオー
ドを組合せたオシロスコープを用いて評価した。まず、
画面上に最大輝度でウインドウのパターンを30分間表
示し、その後、残像が最も目立つ中間調表示、ここでは
輝度が最大輝度の10%となるように全面を切り換え、
ウインドウのエッジ部のパターンが消えるまでの時間を
残像時間として評価し、またウインドウの残像部分と周
辺中間調部分の輝度Bの輝度変動分の大きさΔB/B
(10%)を残像強度として評価した。但し、ここで許
容される残像強度は3%以下である。
In order to quantitatively measure the image sticking and the afterimage of the liquid crystal display device manufactured as described above, evaluation was performed using an oscilloscope combined with a photodiode. First,
A window pattern is displayed on the screen at the maximum luminance for 30 minutes, and then the entire screen is switched so that the afterimage is most noticeable, in which the luminance is 10% of the maximum luminance.
The time until the pattern at the edge of the window disappears is evaluated as an afterimage time, and the magnitude ΔB / B of the luminance variation of the luminance B between the afterimage portion of the window and the peripheral halftone portion.
(10%) was evaluated as an afterimage intensity. However, the afterimage intensity allowed here is 3% or less.

【0052】その結果を輝度変動分である残像強度ΔB
/B(10%)は約2%であり、残像が消失するまでの
時間は約50ミリ秒でここで用いた液晶の立ち下がり応
答時間約35ミリ秒とほとんど同じであった。目視によ
る画質残像検査においても、画像の焼き付け,残像によ
る表示むらも一切見られず、高い表示特性が得られた。
このように上記配向膜を使用することにより画像の焼き
付き,残像の表示不良が低減される液晶表示素子を得る
ことができた。
The result is taken as the residual image intensity ΔB, which is the luminance variation.
/ B (10%) was about 2%, and the time until the afterimage disappeared was about 50 ms, which was almost the same as the fall response time of the liquid crystal used here, which was about 35 ms. In the image quality afterimage inspection by visual inspection, no display unevenness due to image burn-in and afterimage was observed, and high display characteristics were obtained.
As described above, by using the alignment film, a liquid crystal display device in which image sticking and image display defects are reduced can be obtained.

【0053】(実施例2)用いた配向膜以外は実施例1
と同様にして、m−フェニレンジアミン1.0 モル%を
N−メチル−2−ピロリドン中に溶解させ、これに3,
3′、4,4′−ジフェニルエーテルテトラカルボン酸
二無水物1.0 モル%を加え40℃で6時間反応させ、
標準ポリスチレン換算重量平均分子量が約21,000
、重量平均分子量/数平均分子量(Mv/Mn)が約
1.5 のポリアミック酸ワニスを得た。このワニスを6
%濃度に希釈してγ−アミノプロピルトリエトキシシラ
ンを固形分で0.3 重量%添加後、印刷形成して210
℃/30分の熱処理を行い、約700Åの緻密なポリイ
ミド配向膜を形成した。
(Example 2) Except for the alignment film used, Example 1 was used.
In the same manner as described above, 1.0 mol% of m-phenylenediamine was dissolved in N-methyl-2-pyrrolidone, and
1.0 mol% of 3 ', 4,4'-diphenylethertetracarboxylic dianhydride was added and reacted at 40 ° C for 6 hours.
Standard polystyrene equivalent weight average molecular weight of about 21,000
A polyamic acid varnish having a weight average molecular weight / number average molecular weight (Mv / Mn) of about 1.5 was obtained. 6 of this varnish
%, And 0.3% by weight of solid content of γ-aminopropyltriethoxysilane was added.
A heat treatment was performed at 30 ° C. for 30 minutes to form a dense polyimide alignment film of about 700 °.

【0054】また、上記と同様な製法で得たポリイミド
配向膜のガラス転移温度Tgを測定したところ、約31
0℃を示した。
When the glass transition temperature Tg of the polyimide alignment film obtained by the same manufacturing method as above was measured, it was found to be about 31.
0 ° C. was indicated.

【0055】実施例1と同様、このように作製した液晶
表示装置の画像の焼き付け,残像を定量的に測定するた
め、ホトダイオードを組合せたオシロスコープを用いて
評価した。まず、画面上に最大輝度でウインドウのパタ
ーンを30分間表示し、その後、残像が最も目立つ中間
調表示、ここでは輝度が最大輝度の10%となるように
全面を切り換え、ウインドウのエッジ部のパターンが消
えるまでの時間を残像時間として評価し、またウインド
ウの残像部分と周辺中間調部分の輝度Bの輝度変動分の
大きさΔB/B(10%)を残像強度として評価した。
但し、ここで許容される残像強度は3%以下である。
As in Example 1, in order to quantitatively measure the image burn-in and the afterimage of the liquid crystal display device manufactured as described above, evaluation was performed using an oscilloscope combined with a photodiode. First, the window pattern is displayed on the screen at the maximum luminance for 30 minutes, and then the entire screen is switched so that the afterimage is most noticeable, in this case, the luminance is 10% of the maximum luminance. The time until disappears was evaluated as an afterimage time, and the magnitude ΔB / B (10%) of the luminance variation of the luminance B between the afterimage portion of the window and the peripheral halftone portion was evaluated as the afterimage intensity.
However, the afterimage intensity allowed here is 3% or less.

【0056】その結果を輝度変動分である残像強度ΔB
/B(10%)は約3%であり、残像が消失するまでの
時間は約56ミリ秒でここで用いた液晶の立ち下がり応
答時間約35ミリ秒とほとんど同じであった。目視によ
る画質残像検査においても、画像の焼き付け,残像によ
る表示むらも一切見られず、高い表示特性が得られた。
このように上記配向膜を使用することにより画像の焼き
付き,残像の表示不良が低減される液晶表示素子を得る
ことができた。
The result is represented by an afterimage intensity ΔB which is a luminance variation.
/ B (10%) was about 3%, and the time until the afterimage disappeared was about 56 milliseconds, which was almost the same as the fall response time of the liquid crystal used here, which was about 35 milliseconds. In the image quality afterimage inspection by visual inspection, no display unevenness due to image burn-in and afterimage was observed, and high display characteristics were obtained.
As described above, by using the alignment film, a liquid crystal display device in which image sticking and image display defects are reduced can be obtained.

【0057】(実施例3)用いた配向膜以外は実施例1
と同様にして、4,4′−ジアミノジフェニルメタン
1.0 モル%をN−メチル−2−ピロリドンとジメチル
アセトアミドの混合溶媒中に溶解させ、これに1,2,
3,4−シクロペンタンテトラカルボン酸二無水物1.
0 モル%を加え30℃で12時間反応させ、標準ポリ
スチレン換算重量平均分子量が約15,000 〜25
0,000 のポリアミック酸ワニスを作製した。その後
このワニスをゲル浸透クロマトグラフィを用いて重量平
均分子量が約200,000 、重量平均分子量/数平均
分子量(Mv/Mn)が1.05 の単分散ポリアミック
酸ワニスに分集した。このワニスを6%濃度に希釈して
γ−アミノプロピルトリエトキシシランを固形分で0.
3 重量%添加後、印刷形成して220℃/30分の熱
処理を行い、、約700Åの緻密なポリイミド配向膜を
形成した。
Example 3 Example 1 except for the alignment film used.
In the same manner as described above, 1.0 mol% of 4,4'-diaminodiphenylmethane was dissolved in a mixed solvent of N-methyl-2-pyrrolidone and dimethylacetamide.
3,4-cyclopentanetetracarboxylic dianhydride 1.
0 mol%, and reacted at 30 ° C. for 12 hours to obtain a standard polystyrene reduced weight average molecular weight of about 15,000 to 25.
A polyamic acid varnish of 000 was prepared. Thereafter, the varnish was fractionated into a monodispersed polyamic acid varnish having a weight average molecular weight of about 200,000 and a weight average molecular weight / number average molecular weight (Mv / Mn) of 1.05 using gel permeation chromatography. The varnish was diluted to a concentration of 6%, and γ-aminopropyltriethoxysilane was added at a solid content of 0.1%.
After the addition of 3% by weight, printing was performed, and a heat treatment was performed at 220 ° C. for 30 minutes to form a dense polyimide alignment film of about 700 °.

【0058】また、上記と同様な製法で得たポリイミド
配向膜のガラス転移温度Tgを測定したところ、約38
0℃を示した。
When the glass transition temperature Tg of the polyimide alignment film obtained by the same manufacturing method as above was measured, it was found to be about 38
0 ° C. was indicated.

【0059】実施例1と同様、このように作製した液晶
表示装置の画像の焼き付け,残像を定量的に測定するた
め、ホトダイオードを組合せたオシロスコープを用いて
評価した。まず、画面上に最大輝度でウインドウのパタ
ーンを30分間表示し、その後、残像が最も目立つ中間
調表示、ここでは輝度が最大輝度の10%となるように
全面を切り換え、ウインドウのエッジ部のパターンが消
えるまでの時間を残像時間として評価し、またウインド
ウの残像部分と周辺中間調部分の輝度Bの輝度変動分の
大きさΔB/B(10%)を残像強度として評価した。
但し、ここで許容される残像強度は3%以下である。
As in Example 1, in order to quantitatively measure the image sticking and the afterimage of the liquid crystal display device thus manufactured, evaluation was performed using an oscilloscope combined with a photodiode. First, the window pattern is displayed on the screen at the maximum luminance for 30 minutes, and then the entire screen is switched so that the afterimage is most noticeable, in this case, the luminance is 10% of the maximum luminance. The time until disappears was evaluated as an afterimage time, and the magnitude ΔB / B (10%) of the luminance variation of the luminance B between the afterimage portion of the window and the peripheral halftone portion was evaluated as the afterimage intensity.
However, the afterimage intensity allowed here is 3% or less.

【0060】その結果を輝度変動分である残像強度ΔB
/B(10%)は約2%であり、残像が消失するまでの
時間は約48ミリ秒でここで用いた液晶の立ち下がり応
答時間約35ミリ秒とほとんど同じであった。目視によ
る画質残像検査においても、画像の焼き付け,残像によ
る表示むらも一切見られず、高い表示特性が得られた。
このように上記配向膜を使用することにより画像の焼き
付き,残像の表示不良が低減される液晶表示素子を得る
ことができた。
The result is taken as the residual image intensity ΔB, which is the luminance variation.
/ B (10%) was about 2%, and the time until the afterimage disappeared was about 48 milliseconds, which was almost the same as the fall response time of the liquid crystal used here, which was about 35 milliseconds. In the image quality afterimage inspection by visual inspection, no display unevenness due to image burn-in and afterimage was observed, and high display characteristics were obtained.
As described above, by using the alignment film, a liquid crystal display device in which image sticking and image display defects are reduced can be obtained.

【0061】(実施例4)用いた配向膜以外は実施例1
と同様にして、4−フルオロ−メタフェニレンジアミン
1.0 モル%をN−メチル−2−ピロリドン中に溶解さ
せ、これに3,3′,4,4′−ビスシクロブタンテト
ラカルボン酸二無水物1.0 モル%を加えて20℃で8
時間および100℃で2時間反応させて、標準ポリスチ
レン換算重量平均分子量が約12,000 、重量平均分
子量/数平均分子量(Mv/Mn)が1.95 のポリアミ
ドイミドを得た。このワニスを6%濃度に希釈してγ−
アミノプロピルトリエトキシシランを固形分で0.3 重
量%添加後、印刷形成して200℃/30分の熱処理を
行い、約600Åの緻密なポリアミドイミド配向膜を形
成し、液晶層の厚みdが4.0μmの液晶表示装置を作
成した。
Example 4 Example 1 except for the alignment film used.
In the same manner as described above, 1.0 mol% of 4-fluoro-metaphenylenediamine was dissolved in N-methyl-2-pyrrolidone, and 3,3 ', 4,4'-biscyclobutanetetracarboxylic dianhydride was added thereto. Add 1.0 mol% and add 8% at 20 ° C.
The reaction was carried out at 100 ° C. for 2 hours to obtain a polyamideimide having a weight average molecular weight in terms of standard polystyrene of about 12,000 and a weight average molecular weight / number average molecular weight (Mv / Mn) of 1.95. This varnish was diluted to a concentration of 6% and γ-
After adding aminopropyltriethoxysilane at a solid content of 0.3% by weight, printing was performed and heat treatment was performed at 200 ° C. for 30 minutes to form a dense polyamideimide alignment film of about 600 °. A 4.0 μm liquid crystal display device was produced.

【0062】また、上記と同様な製法で得たポリイミド
配向膜のガラス転移温度Tgを測定したところ、約31
0℃を示した。
When the glass transition temperature Tg of the polyimide alignment film obtained by the same manufacturing method as above was measured, it was found to be about 31.
0 ° C. was indicated.

【0063】実施例1と同様、このように作製した液晶
表示装置の画像の焼き付け,残像を定量的に測定するた
め、ホトダイオードを組合せたオシロスコープを用いて
評価した。まず、画面上に最大輝度でウインドウのパタ
ーンを30分間表示し、その後、残像が最も目立つ中間
調表示、ここでは輝度が最大輝度の10%となるように
全面を切り換え、ウインドウのエッジ部のパターンが消
えるまでの時間を残像時間として評価し、またウインド
ウの残像部分と周辺中間調部分の輝度Bの輝度変動分の
大きさΔB/B(10%)を残像強度として評価した。
但し、ここで許容される残像強度は3%以下である。
As in Example 1, evaluation was performed using an oscilloscope combined with a photodiode in order to quantitatively measure the image sticking and afterimage of the liquid crystal display device manufactured as described above. First, the window pattern is displayed on the screen at the maximum luminance for 30 minutes, and then the entire screen is switched so that the afterimage is most noticeable, in this case, the luminance is 10% of the maximum luminance. The time until disappears was evaluated as an afterimage time, and the magnitude ΔB / B (10%) of the luminance variation of the luminance B between the afterimage portion of the window and the peripheral halftone portion was evaluated as the afterimage intensity.
However, the afterimage intensity allowed here is 3% or less.

【0064】その結果を輝度変動分である残像強度ΔB
/B(10%)は約3%であり、残像が消失するまでの
時間は約60ミリ秒でここで用いた液晶の立ち下がり応
答時間約35ミリ秒とほとんど同じであった。目視によ
る画質残像検査においても、画像の焼き付け,残像によ
る表示むらも一切見られず、高い表示特性が得られた。
このように上記配向膜を使用することにより画像の焼き
付き,残像の表示不良が低減される液晶表示素子を得る
ことができた。
The result is converted into a residual image intensity ΔB which is a luminance variation.
/ B (10%) was about 3%, and the time until the afterimage disappeared was about 60 milliseconds, which was almost the same as the fall response time of the liquid crystal used here, which was about 35 milliseconds. In the image quality afterimage inspection by visual inspection, no display unevenness due to image burn-in and afterimage was observed, and high display characteristics were obtained.
As described above, by using the alignment film, a liquid crystal display device in which image sticking and image display defects are reduced can be obtained.

【0065】(比較例1)2,2−ビス{4−(p−ア
ミノフェノキシ)フェニル}プロパン1.0 モル%、
3,3′、4,4′−ベンゾフェノンテトラカルボン酸
二無水物1.0 モル%をN−メチル−2−ピロリドン中
で20℃で10時間重合して、標準ポリスチレン換算重
量平均分子量が約200,000 、重量平均分子量/数
平均分子量(Mv/Mn)が約1.9 のポリアミック酸
ワニスを得た。このワニスを6%濃度に希釈してγ−ア
ミノプロピルトリエトキシシランを固形分で0.3 重量
%添加後、印刷形成して220℃/30分の熱処理を行
い、約800Åの緻密なポリイミド配向膜を形成した。
Comparative Example 1 1.0 mol% of 2,2-bis {4- (p-aminophenoxy) phenyl} propane
1.0 mol% of 3,3 ′, 4,4′-benzophenonetetracarboxylic dianhydride was polymerized in N-methyl-2-pyrrolidone at 20 ° C. for 10 hours to obtain a standard polystyrene equivalent weight average molecular weight of about 200. Thus, a polyamic acid varnish having a weight average molecular weight / number average molecular weight (Mv / Mn) of about 1.9 was obtained. After diluting the varnish to a concentration of 6%, adding 0.3% by weight of γ-aminopropyltriethoxysilane in solid content, forming a print, and performing a heat treatment at 220 ° C. for 30 minutes to obtain a dense polyimide alignment of about 800 °. A film was formed.

【0066】また、上記と同様な製法で得たポリイミド
配向膜のガラス転移温度Tgを測定したところ、約24
0℃を示した。
When the glass transition temperature Tg of the polyimide alignment film obtained by the same method as described above was measured,
0 ° C. was indicated.

【0067】次に、この配向膜材料を用いて実施例1と
同様に液晶表示装置を作成し、液晶表示装置の画像の焼
き付け,残像を定量的に測定評価した。まず、画面上に
最大輝度でウインドウのパターンを30分間表示し、そ
の後、残像が最も目立つ中間調表示に全面を切り換え、
ウインドウのエッジ部のパターンが消えるまでの時間を
残像時間、及びウインドウの残像部分と周辺中間調部分
の輝度Bの輝度変動分の大きさΔB/B(10%)を残
像強度として評価した。但し、ここで許容される残像強
度は3%以下である。
Next, a liquid crystal display device was prepared using this alignment film material in the same manner as in Example 1, and the image printing and afterimage of the liquid crystal display device were quantitatively measured and evaluated. First, the window pattern is displayed on the screen at the maximum luminance for 30 minutes, and then the entire screen is switched to the halftone display where the afterimage is most noticeable.
The time until the pattern at the edge of the window disappeared was evaluated as an afterimage time, and the magnitude ΔB / B (10%) of the luminance variation of the luminance B between the afterimage portion and the peripheral halftone portion of the window was evaluated as an afterimage intensity. However, the afterimage intensity allowed here is 3% or less.

【0068】その結果、輝度変動分である残像強度ΔB
/B(10%)は約5%と大きく、残像が消失するまで
の時間も約60分掛かり、目視による画質残像検査にお
いても、明らかな画像の焼き付け,残像による表示むら
として確認された。このように上記配向膜を使用するこ
とにより画像の焼き付き,残像による表示不良が目立っ
た。
As a result, the afterimage intensity ΔB, which is the luminance variation,
/ B (10%) was as large as about 5%, and it took about 60 minutes until the afterimage disappeared. Even in the visual image quality afterimage inspection, it was confirmed as a clear image burn-in and display unevenness due to the afterimage. As described above, by using the alignment film, image sticking and a display defect due to an afterimage were conspicuous.

【0069】(比較例2)2,2−ビス〔4−(p−ア
ミノフェノキシ)フェニル〕オクタン0.5 モル%、
4,4′−ジアミノジフェニルメタン0.5 モル%、
3,3′、4,4′−ビフェニルテトラカルボン酸二無
水物1.0 モル%をN−メチル−2−ピロリドン中で2
0℃で8時間重合して、標準ポリスチレン換算重量平均
分子量が約40,000 、重量平均分子量/数平均分子
量(Mv/Mn)が約1.8 のポリアミック酸ワニスを
得た。このワニスを6%濃度に希釈してγ−アミノプロ
ピルトリエトキシシランを固形分で0.3 重量%添加
後、印刷形成して200℃/30分の熱処理を行い、約
800Åの緻密なポリイミド配向膜を形成した。
Comparative Example 2 0.5 mol% of 2,2-bis [4- (p-aminophenoxy) phenyl] octane
0.5 mol% of 4,4'-diaminodiphenylmethane,
1.0 mol% of 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride is dissolved in N-methyl-2-pyrrolidone in 2 mol%.
Polymerization was carried out at 0 ° C. for 8 hours to obtain a polyamic acid varnish having a standard polystyrene equivalent weight average molecular weight of about 40,000 and a weight average molecular weight / number average molecular weight (Mv / Mn) of about 1.8. After diluting the varnish to a concentration of 6%, adding 0.3% by weight of γ-aminopropyltriethoxysilane in solid content, forming a print, and performing a heat treatment at 200 ° C./30 minutes to obtain a dense polyimide alignment of about 800 °. A film was formed.

【0070】また、上記と同様な製法で得たポリイミド
配向膜のガラス転移温度Tgを測定したところ、約23
0℃を示した。
When the glass transition temperature Tg of the polyimide alignment film obtained by the same manufacturing method as above was measured,
0 ° C. was indicated.

【0071】次に、この配向膜材料を用いて実施例1と
同様に液晶表示装置を作成し、液晶表示装置の画像の焼
き付け,残像を定量的に測定評価した。まず、画面上に
最大輝度でウインドウのパターンを30分間表示し、そ
の後、残像が最も目立つ中間調表示に全面を切り換え、
ウインドウのエッジ部のパターンが消えるまでの時間を
残像時間、及びウインドウの残像部分と周辺中間調部分
の輝度Bの輝度変動分の大きさΔB/B(10%)を残
像強度として評価した。但し、ここで許容される残像強
度は3%以下である。
Next, a liquid crystal display device was prepared using this alignment film material in the same manner as in Example 1, and the image printing and afterimage of the liquid crystal display device were quantitatively measured and evaluated. First, the window pattern is displayed on the screen at the maximum luminance for 30 minutes, and then the entire screen is switched to the halftone display where the afterimage is most noticeable.
The time until the pattern at the edge of the window disappeared was evaluated as an afterimage time, and the magnitude ΔB / B (10%) of the luminance variation of the luminance B between the afterimage portion and the peripheral halftone portion of the window was evaluated as an afterimage intensity. However, the afterimage intensity allowed here is 3% or less.

【0072】その結果、輝度変動分である残像強度ΔB
/B(10%)は約8%と大きく、残像が消失するまで
の時間も約120分掛かり、目視による画質残像検査に
おいても、明らかな画像の焼き付け,残像による表示む
らとして確認された。このように上記配向膜を使用する
ことにより画像の焼き付き,残像による表示不良が目立
った。
As a result, the afterimage intensity ΔB, which is the luminance variation,
/ B (10%) was as large as about 8%, and it took about 120 minutes for the afterimage to disappear. Even in the visual image quality afterimage inspection, it was confirmed as a clear image burn-in and display unevenness due to the afterimage. As described above, by using the alignment film, image sticking and a display defect due to an afterimage were conspicuous.

【0073】(比較例3)2,2−ビス〔4−(p−ア
ミノフェノキシ)フェニル〕ヘキサフルオロプロパン
1.0モル%、4,4′−ジアミノジフェニルエ−テル
1.0モル%をN−メチル−2−ピロリドン中で20℃
で6時間重合して、標準ポリスチレン換算重量平均分子
量が約8000、重量平均分子量/数平均分子量(Mv
/Mn)が約3.5 のポリアミック酸ワニスを得た。こ
のワニスを6%濃度に希釈してγ−アミノプロピルトリ
エトキシシランを固形分で0.3 重量%添加後、印刷形
成して200℃/30分の熱処理を行い、約800Åの
緻密なポリイミド配向膜を形成した。
Comparative Example 3 1.0 mol% of 2,2-bis [4- (p-aminophenoxy) phenyl] hexafluoropropane and 1.0 mol% of 4,4′-diaminodiphenyl ether were added to N 20 ° C. in methyl-2-pyrrolidone
For 6 hours, the standard polystyrene-equivalent weight average molecular weight is about 8000, and the weight average molecular weight / number average molecular weight (Mv
/ Mn) of about 3.5 was obtained. After diluting the varnish to a concentration of 6%, adding 0.3% by weight of γ-aminopropyltriethoxysilane in solid content, forming a print, and performing a heat treatment at 200 ° C./30 minutes to obtain a dense polyimide alignment of about 800 °. A film was formed.

【0074】また、上記と同様な製法で得たポリイミド
配向膜のガラス転移温度Tgを測定したところ、約20
0℃を示した。
When the glass transition temperature Tg of the polyimide alignment film obtained by the same manufacturing method as above was measured,
0 ° C. was indicated.

【0075】次に、この配向膜材料を用いて実施例1と
同様に液晶表示装置を作成し、液晶表示装置の画像の焼
き付け,残像を定量的に測定評価した。まず、画面上に
最大輝度でウインドウのパターンを30分間表示し、そ
の後、残像が最も目立つ中間調表示に全面を切り換え、
ウインドウのエッジ部のパターンが消えるまでの時間を
残像時間、及びウインドウの残像部分と周辺中間調部分
の輝度Bの輝度変動分の大きさΔB/B(10%)を残
像強度として評価した。但し、ここで許容される残像強
度は3%以下である。
Next, a liquid crystal display device was prepared using this alignment film material in the same manner as in Example 1, and the image printing and afterimage of the liquid crystal display device were quantitatively measured and evaluated. First, the window pattern is displayed on the screen at the maximum luminance for 30 minutes, and then the entire screen is switched to the halftone display where the afterimage is most noticeable.
The time until the pattern at the edge of the window disappeared was evaluated as an afterimage time, and the magnitude ΔB / B (10%) of the luminance variation of the luminance B between the afterimage portion and the peripheral halftone portion of the window was evaluated as an afterimage intensity. However, the afterimage intensity allowed here is 3% or less.

【0076】その結果、輝度変動分である残像強度ΔB
/B(10%)は約6%と大きく、残像が消失するまで
の時間も約100分掛かり、目視による画質残像検査に
おいても、明らかな画像の焼き付け,残像による表示む
らとして確認された。このように上記配向膜を使用する
ことにより画像の焼き付き,残像による表示不良が目立
った。
As a result, the afterimage intensity ΔB, which is the luminance variation,
/ B (10%) was as large as about 6%, and it took about 100 minutes for the afterimage to disappear, and it was confirmed by visual inspection of the image quality afterimage that the image was clearly printed and uneven display due to the afterimage was observed. As described above, by using the alignment film, image sticking and a display defect due to an afterimage were conspicuous.

【0077】[0077]

【発明の効果】本発明によれば、液晶/配向膜界面にお
ける液晶分子の面内捻れ回転トルクにより誘発される配
向膜表面の弾性変形による横電界方式特有の画像の焼き
付き,残像現象の低減効果が図れ、画像の焼き付き,残
像現象による表示むらの少ない高画質で量産性に優れた
アクティブマトリクス型液晶表示装置が得られる。
According to the present invention, it is possible to reduce the image sticking and the afterimage phenomenon peculiar to the lateral electric field method due to the elastic deformation of the alignment film surface induced by the in-plane twist rotation torque of the liquid crystal molecules at the liquid crystal / alignment film interface. As a result, an active matrix type liquid crystal display device having high image quality and excellent mass productivity with less display unevenness due to image sticking and afterimage phenomenon can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の液晶表示装置における液晶の動作を示
す図。
FIG. 1 is a diagram showing an operation of a liquid crystal in a liquid crystal display device of the present invention.

【図2】本発明の電気光学特性を説明する図。FIG. 2 is a diagram illustrating electro-optical characteristics of the present invention.

【図3】液晶分子と基板表面との極結合と捻れ結合を示
す図。
FIG. 3 is a diagram showing polar coupling and torsional coupling between liquid crystal molecules and a substrate surface.

【図4】本発明の薄膜トランジスタ,電極,配線の構造
を示す図であり、(a)は正面図、(b)は(c)側断
面図。
4A and 4B are diagrams showing the structure of a thin film transistor, an electrode, and a wiring according to the present invention, wherein FIG. 4A is a front view, and FIG.

【符号の説明】 1…共通電極(コモン電極)、2…ゲート絶縁膜、3…
信号電極(ドレイン電極)、4…画素電極(ソース電
極)、5…配向膜、6…液晶組成物層中の液晶分子、7
…基板、8…偏光板、9…電界方向、10…界面上の分
子長軸配向方向(ラビング方向)、11…偏光板偏光透
過軸方向、12…走査電極(ゲート電極)、13…アモル
ファスシリコン、14…薄膜トランジスタ素子。
[Description of Signs] 1 ... Common electrode (common electrode), 2 ... Gate insulating film, 3 ...
Signal electrode (drain electrode), 4 ... pixel electrode (source electrode), 5 ... alignment film, 6 ... liquid crystal molecules in liquid crystal composition layer, 7
... Substrate, 8 ... Polarizing plate, 9 ... Electric field direction, 10 ... Direction of molecular long axis alignment on interface (rubbing direction), 11 ... Polarizing plate polarized light transmission axis direction, 12 ... Scanning electrode (gate electrode), 13 ... Amorphous silicon , 14 ... Thin film transistor element.

フロントページの続き (72)発明者 横倉 久男 茨城県日立市大みか町七丁目1番1号 株 式会社日立製作所日立研究所内Continuing from the front page (72) Inventor Hisao Yokokura 7-1-1, Omika-cho, Hitachi City, Ibaraki Prefecture Within Hitachi Research Laboratory, Hitachi, Ltd.

Claims (10)

【特許請求の範囲】[Claims] 【請求項1】少なくとも一方が透明な一対の基板と、 前記一対の基板間に配置された液晶層と、 前記一対の基板の一方の基板に形成され、この基板面に
対して支配的に平行な成分を持った電界を前記液晶層に
印加するための電極群、及び、これらの電極群に対応す
る電極に接続された複数のアクティブ素子と、 前記液晶層と前記一対の基板の少なくとも一方の基板と
の間に配置された配向膜と、 前記一対の基板の少なくともどちらか一方の基板に形成
される前記液晶層の分子配向状態に応じて光学特性を変
える光学手段とを有し、 前記配向膜のガラス転移温度Tgが300℃以上である
ことを特徴とするアクティブマトリクス型液晶表示装
置。
1. A pair of substrates, at least one of which is transparent; a liquid crystal layer disposed between the pair of substrates; and a liquid crystal layer formed on one of the pair of substrates, and is predominantly parallel to the substrate surface. Electrode group for applying an electric field having various components to the liquid crystal layer, and a plurality of active elements connected to electrodes corresponding to these electrode groups; and at least one of the liquid crystal layer and the pair of substrates. An alignment film disposed between the substrate and an optical unit that changes optical characteristics according to a molecular alignment state of the liquid crystal layer formed on at least one of the pair of substrates; An active matrix liquid crystal display device, wherein the glass transition temperature Tg of the film is 300 ° C. or higher.
【請求項2】請求項1において、前記光学手段は、前記
液晶層と前記一対の基板のそれぞれの間に設けられ、そ
れらの偏光軸が互いにほぼ直交する一対の偏光板である
ことを特徴とするアクティブマトリクス型液晶表示装
置。
2. The optical device according to claim 1, wherein the optical means is a pair of polarizing plates provided between the liquid crystal layer and the pair of substrates, and their polarization axes are substantially orthogonal to each other. Active matrix type liquid crystal display device.
【請求項3】請求項2において、前記液晶層の屈折異方
性をΔn、厚さをdとしたときのパラメータΔn・d
が、0.2μm<Δn・d<0.5μmを満たすことを特
徴とするアクティブマトリクス型液晶表示装置。
3. The parameter Δn · d when the refractive anisotropy of the liquid crystal layer is Δn and the thickness is d.
Satisfies 0.2 μm <Δnd · 0.5 <0.5 μm.
【請求項4】請求項1において、前記配向膜の少なくと
も一方が、ポリアミック酸イミド系,ポリイミド系,ポ
リイミドシロキサン系,ポリアミドイミド系の有機高分
子であることを特徴とするアクティブマトリクス型液晶
表示装置。
4. An active matrix liquid crystal display device according to claim 1, wherein at least one of said alignment films is made of a polyamic imide-based, polyimide-based, polyimidesiloxane-based, or polyamide-imide-based organic polymer. .
【請求項5】請求項4において、前記有機高分子の重量
平均分子量が10,000 以上〜300,000 以下で
あることを特徴とするアクティブマトリクス型液晶表示
装置。
5. The active matrix type liquid crystal display device according to claim 4, wherein the organic polymer has a weight average molecular weight of 10,000 to 300,000.
【請求項6】請求項1において、前記配向膜の少なくと
も一方が、重量平均分子量/数平均分子量の比で表され
る分散係数が2以下の有機高分子であることを特徴とす
るアクティブマトリクス型液晶表示装置。
6. The active matrix type according to claim 1, wherein at least one of the alignment films is an organic polymer having a dispersion coefficient represented by a ratio of weight average molecular weight / number average molecular weight of 2 or less. Liquid crystal display.
【請求項7】複数の薄膜半導体トランジスタを有するア
クティブマトリクス型液晶表示装置において、 少なくとも一方が透明な一対の基板と、 前記一対の基板間に配置された液晶層と、 前記一対の基板の一方の基板に形成され、この基板面に
対して支配的に平行な成分を持った電界を前記液晶層に
印加するための電極構造と、 前記液晶層と前記一対の基板のそれぞれの間に配置され
た一対の配向膜とを有し、 前記配向膜は、化学式H2N−R−NH2で示すジアミン
化合物と、化学式 【化1】 で示すテトラカルボン酸二無水物とからなるポリアミッ
ク酸の脱水閉環した有機高分子であり、その繰り返し構
造の中のR及びXに、高分子の分子軸の回転を可能にす
る結合基、−O−,−S−,−CH2−,−C(CH3)2
−,−C(CF3)2−,−SO2− ,メタ結合,オルト結
合が合わせて3個以下であることを特徴とするアクティ
ブマトリクス型液晶表示装置。
7. An active matrix liquid crystal display device having a plurality of thin-film semiconductor transistors, wherein at least one of the substrates is a pair of transparent substrates, a liquid crystal layer disposed between the pair of substrates, and one of the pair of substrates. An electrode structure formed on the substrate for applying an electric field having a component predominantly parallel to the substrate surface to the liquid crystal layer; and an electrode structure disposed between the liquid crystal layer and the pair of substrates. A pair of alignment films, wherein the alignment film is formed of a diamine compound represented by the chemical formula H 2 N—R—NH 2 and a chemical formula: Is a dehydration-closed organic polymer of a polyamic acid composed of a tetracarboxylic dianhydride represented by the following formula, wherein R and X in the repeating structure have a bonding group capable of rotating the molecular axis of the polymer, -O -, - S -, - CH 2 -, - C (CH 3) 2
-, - C (CF 3) 2 -, - SO 2 -, meta coupling, an active matrix type liquid crystal display device, wherein the ortho bond is 3 or less in total.
【請求項8】請求項7において、前記配向膜のガラス転
移温度Tgが300℃以上であることを特徴とするアク
ティブマトリクス型液晶表示装置。
8. The active matrix type liquid crystal display device according to claim 7, wherein a glass transition temperature Tg of said alignment film is 300 ° C. or higher.
【請求項9】請求項7において、前記有機高分子の重量
平均分子量が10,000 以上〜300,000 以下で
あることを特徴とするアクティブマトリクス型液晶表示
装置。
9. The active matrix type liquid crystal display device according to claim 7, wherein the organic polymer has a weight average molecular weight of 10,000 or more and 300,000 or less.
【請求項10】請求項7において、前記配向膜の少なく
とも一方が、重量平均分子量/数平均分子量の比で表さ
れる分散係数が2以下の有機高分子であることを特徴と
するアクティブマトリクス型液晶表示装置。
10. The active matrix type according to claim 7, wherein at least one of the alignment films is an organic polymer having a dispersion coefficient represented by a ratio of weight average molecular weight / number average molecular weight of 2 or less. Liquid crystal display.
JP12670897A 1997-05-16 1997-05-16 Active matrix liquid crystal display device Expired - Lifetime JP3780063B2 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP12670897A JP3780063B2 (en) 1997-05-16 1997-05-16 Active matrix liquid crystal display device
TW087104980A TW523630B (en) 1997-05-16 1998-04-02 Active matrix type liquid crystal display device
US09/071,879 US6682783B1 (en) 1997-05-16 1998-05-04 Active matrix type liquid crystal display apparatus
KR1019980017494A KR100530906B1 (en) 1997-05-16 1998-05-15 Active Matrix Liquid Crystal Display
US10/732,279 US7189439B2 (en) 1997-05-16 2003-12-11 Active matrix type liquid crystal display apparatus
US11/708,462 US7790248B2 (en) 1997-05-16 2007-02-21 Active matrix type liquid crystal display apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12670897A JP3780063B2 (en) 1997-05-16 1997-05-16 Active matrix liquid crystal display device

Publications (2)

Publication Number Publication Date
JPH10319406A true JPH10319406A (en) 1998-12-04
JP3780063B2 JP3780063B2 (en) 2006-05-31

Family

ID=14941899

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12670897A Expired - Lifetime JP3780063B2 (en) 1997-05-16 1997-05-16 Active matrix liquid crystal display device

Country Status (1)

Country Link
JP (1) JP3780063B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003040817A1 (en) * 2001-11-09 2003-05-15 Chisso Corporation Composition for liquid crystal aligning layers, alignment layers for liquid crystals and liquid crystal displays
JP2008257078A (en) * 2007-04-09 2008-10-23 National Institute Of Advanced Industrial & Technology Liquid crystal display element and liquid crystal display device
JP2016510140A (en) * 2013-03-12 2016-04-04 京東方科技集團股▲ふん▼有限公司 Method and apparatus for determining the afterimage level of a display
US10678100B2 (en) 2016-02-23 2020-06-09 Sharp Kabushiki Kaisha Liquid crystal display device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003040817A1 (en) * 2001-11-09 2003-05-15 Chisso Corporation Composition for liquid crystal aligning layers, alignment layers for liquid crystals and liquid crystal displays
JP2008257078A (en) * 2007-04-09 2008-10-23 National Institute Of Advanced Industrial & Technology Liquid crystal display element and liquid crystal display device
JP2016510140A (en) * 2013-03-12 2016-04-04 京東方科技集團股▲ふん▼有限公司 Method and apparatus for determining the afterimage level of a display
US10678100B2 (en) 2016-02-23 2020-06-09 Sharp Kabushiki Kaisha Liquid crystal display device

Also Published As

Publication number Publication date
JP3780063B2 (en) 2006-05-31

Similar Documents

Publication Publication Date Title
EP0806698B1 (en) In-plane switching-mode active-matrix liquid crystal display
US6943861B2 (en) Liquid crystal display device with alignment layer having a relative imidization ratio above 60%
US7790248B2 (en) Active matrix type liquid crystal display apparatus
US7742138B2 (en) Liquid crystal display
JP5150409B2 (en) Liquid crystal display device and manufacturing method thereof
EP0400635B1 (en) Liquid crystal device
JP5109371B2 (en) Liquid crystal aligning agent for vertical alignment, liquid crystal alignment film, and liquid crystal display device using the same
JP4007373B2 (en) Active matrix type liquid crystal display device
KR20130050862A (en) Liquid crystal display and method of fabricating the same
JP3740788B2 (en) Active matrix liquid crystal display device
JP3780063B2 (en) Active matrix liquid crystal display device
JPH1138415A (en) Liquid crystal display element
JPH11218765A (en) Method for orienting high molecular thin film and liquid crystal display device
JP3780082B2 (en) Active matrix liquid crystal display device
JP4186994B2 (en) Active matrix liquid crystal display device
US7615260B2 (en) Active-matrix liquid crystal display
JPH11249142A (en) Liquid crystal display device
CN113512194A (en) Liquid crystal aligning agent, liquid crystal alignment film, method for producing liquid crystal alignment film, and liquid crystal element
KR100840669B1 (en) A Method For Fabricating Liquid Crystal Display Device By Using Thermal Crosslinking Polyimide Based Material
JPH10292113A (en) Composition for liquid crystal alignment film
JPH1010535A (en) Flattening and orientation control film for liquid crystal
JPH09160046A (en) Composition for liquid crystal alignment layer
JP2000302866A (en) Liquid crystal oriented film composition, liquid crystal- holding base plate and liquid crystal display device
JPH03214122A (en) Liquid crystal orienting agent

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060203

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20060306

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090310

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100310

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110310

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110310

Year of fee payment: 5

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110310

Year of fee payment: 5

R371 Transfer withdrawn

Free format text: JAPANESE INTERMEDIATE CODE: R371

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110310

Year of fee payment: 5

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313111

S631 Written request for registration of reclamation of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313631

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110310

Year of fee payment: 5

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110310

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120310

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120310

Year of fee payment: 6

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313115

Free format text: JAPANESE INTERMEDIATE CODE: R313121

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120310

Year of fee payment: 6

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120310

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130310

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130310

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140310

Year of fee payment: 8

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term