JPH10255681A - Slit type shadow mask and its manufacture - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a slit type shadow mask which can be provided only by the manufacture of the shadow mask and the fixation to a frame, and never specially requires a step of providing a damper. SOLUTION: This shadow mask is formed of a slit type shadow mask 100 for color selection of color cathode-ray tube (CRT) in which a damper 150 crossing a grill 110 is integrally connected to the grill 110. The peripheral part 120 which is not the slit 115 opening area of the shadow mask 110 or the peripheral part 120 which is not the slit 115 opening area of the shadow mask 110 and the circumferential part of the slit 115 opening area are set to the thickness of the shadow mask material, the grill 110 of the slit 115 opening area other than it is set thinner than the shadow mask material, and the sum of the thickness of the damper 150 part and the thickness of the grill 110 is set to the thickness of the shadow mask material.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] 1. Field of the Invention [0002] The present invention relates to a slit type shadow mask used for color selection of a color cathode ray tube (CRT) and a method of manufacturing the same.

[0002]

2. Description of the Related Art Sidows masks used for color selection of color cathode ray tubes (CRTs) initially responded to the demand for high resolution by high-precision processing of shadow masks themselves. It was recognized that the color shift due to thermal expansion due to the electron beam cannot be ignored when using the mask in a cathode ray tube (CRT) for color selection, and a low expansion invar material was used as a shadow mask material.
When fixing the shadow mask to the frame, a slit type that uses tension on the shadow mask has been used. The slit type shadow mask usually has a shape as shown in FIG. 5 and is manufactured by etching. FIG.
5A is an overall schematic diagram, FIG. 5B is an enlarged view of a dotted circle C0 in FIG. 5A, and FIG.
It is the figure which showed the cross section in C1-C2 of FIG.5 (b), respectively. FIG. 6 shows such a shadow mask.
As shown in (a), a shadow mask 660 is fixed to a frame 670 and incorporated in a color cathode ray tube (CRT) 600. Color cathode ray tube (CRT) 600
The electron beam 615 from the electron gun 610, which is scanned while being controlled in deflection by the deflection yoke 620, passes through the slit portion of the shadow mask 660 and is emitted to the fluorescent screen 650 to emit light. The person in front of panel 640 sees the light emission.

[0003] This slit type shadow mask,
As a fixing method using a frame for incorporation into a color cathode ray tube (CRT), a method using thermal expansion,
A method using frame pressurization is known. One using thermal expansion is Zenith FTM (Flat Tensi).
On mask), it is assembled at a high temperature by utilizing the thermal expansion difference between a metal slit type shadow mask having a thickness of about 25 μm and a ceramic frame, and at room temperature, as the metal shrinks. The tension is applied. The method using the frame press uses a slit type shadow mask (also referred to as an aperture grill) having a thickness of about 100 μm, and is fitted to a frame having an R surface called “Otaiko” via the mask. A frame to be clamped (chucked) on the R surface, tension is applied to the R surface, and after the R is formed by frame positioning, the frame is pressed and the mask is welded and fixed to the pressed frame. It is.

In these slit-type shadow masks, tension is applied in the direction of the grill, and FIG.
However, when the shadow mask is simply fixed to the frame 670, the grill element vibrates due to an external impact, which causes mislanding (color shift) of the electron beam. Therefore, FIG.
As shown in (b), in order to prevent the vibration of the grill 661, a method of fixing a shadow mask 660 to a frame 670 and then providing a damper 690 to suppress the grill 661 has been generally adopted. Further, JP-A-5-26
The length of the adjacent grill 661 is changed to prevent the vibration of the grill 661 as shown in FIG.
5) and the method of suppressing the grill 661 by the damper 690 is also employed. The reason shown in FIG. 6C is to make the natural frequencies resonating in the adjacent grills 661 different and to cancel out the vibrations of the grille body caused by the external impact by the damper 690.

[0005]

As described above, in the slit type shadow mask, the frame is fixed,
When incorporated in a color cathode ray tube (CRT), it is necessary to prevent the vibration of the grid part, as shown in FIGS.
A method of providing a damper as shown in (c) is employed, and various measures are taken. However, the method shown in FIGS. 6B and 6C requires a step of separately providing a damper after the shadow mask is manufactured and fixed to the frame. In the method shown in FIG. However, it is necessary to enlarge the etching area of the shadow mask in accordance with the waveform shape at both ends of the grill, which has been a problem. Under such circumstances, the present invention aims to provide a slit type shadow mask which does not require a separate step of providing a damper only by manufacturing the shadow mask and fixing it to the frame. Another object of the present invention is to provide a slit-type shadow mask in which it is not always necessary to enlarge the etching area of the shadow mask in accordance with the waveforms at both ends of the grill, as in the method shown in FIG. At the same time, it is intended to provide a method for manufacturing these slit shadow masks.

[0006]

A shadow mask according to the present invention is a slit type shadow mask used for color selection of a color cathode ray tube (CRT), wherein a damper crossing the grill is integrally connected to the grill. It is characterized by having been provided. In the above, the peripheral portion of the shadow mask that is not the slit opening region, or the peripheral portion of the shadow mask that is not the slit opening region and the outer peripheral portion of the slit opening region are the thickness of the shadow mask material. Is provided thinner than the material of the shadow mask, and the sum of the thickness of the damper portion and the thickness of the grill is the thickness of the material of the shadow mask.

A method of manufacturing a shadow mask according to the present invention is a slit type shadow mask used for color selection of a color cathode ray tube (CRT), wherein a damper crossing the grill is integrally connected to the grill. The thickness of the shadow mask material is used for the periphery of the slit opening area, or the periphery of the shadow mask, which is not the slit opening area, and the outer circumference of the slit opening area. A method of manufacturing a slit-type shadow mask in which the thickness of the grille is thinner and the sum of the thickness of the damper portion and the thickness of the grill is the thickness of the material of the shadow mask. External processing by etching, combined with half-etching, which makes the thickness smaller than the thickness of the shadow mask material And it is characterized in Rukoto.

[0008]

With the shadow mask of the present invention configured as described above, it is possible to provide a slit-type shadow mask which does not require a separate step of providing a damper only by manufacturing the shadow mask and fixing it to the frame. Is what you do. At the same time, as in the method shown in FIG. 6C, it is possible to provide a slit-type shadow mask which does not always need to enlarge the etching area of the shadow mask in accordance with the waveforms at both ends of the grill.
More specifically, a slit-type shadow mask used for color selection of a color cathode ray tube (CRT) achieves this by providing a damper that crosses the grille integrally with the grille. More specifically, the peripheral portion of the slit opening region of the shadow mask, or the peripheral portion of the slit opening region of the shadow mask and the outer peripheral portion of the slit opening region is the thickness of the shadow mask material,
The slit in the slit opening area is thinner than the shadow mask material, and the sum of the thickness of the damper and the thickness of the grill is the thickness of the shadow mask material. In addition to the manufacturing of the shadow mask and the fixing to the frame, no special damper process is required, and the etching area of the shadow mask is formed into a waveform at both ends of the grill as shown in FIG. An object of the present invention is to provide a slit type shadow mask which does not always need to be enlarged in accordance with the shape.

In the method of manufacturing a shadow mask according to the present invention, as described above, when the outer shape of the shadow mask is formed from the shadow mask material by etching, the damper portion is simultaneously connected to the grill and provided integrally. ,
Unlike the method shown in FIGS. 6B and 6C, a special step of providing a damper is not required, so that the step of manufacturing a color cathode ray tube (CRT) can be shortened. Further, shortening the process makes it possible to improve productivity and increase the overall yield.

[0010]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A shadow mask according to the present invention will be described with reference to FIG. FIG. 1A is a perspective view showing the entire first example of the shadow mask of the present invention.
1B is an enlarged perspective view of a dotted circle A0 in FIG. 1A, and FIGS. 1C and 1B are enlarged plan views of a dotted circle A1 in FIG. FIG. 1B and FIG.
FIG. 1B is a sectional view taken along line A2-A3 of FIG.
(C) and (b) are cross-sectional views taken along line A8-A9 in FIGS. FIG. 2 is an overall perspective view of a second example of the shadow mask of the present invention, and FIG. 3 is an overall perspective view of a third example of the shadow mask of the present invention. Figure 1,
2 and 3, 100, 101 and 102 are shadow masks, 110 is a grill, 115 is a slit, 120 is a peripheral portion, 125 is a notch, 130 is an opening area, and 150 is a damper portion. In the shadow mask of the present invention, a damper crossing the grill is provided integrally with the grill. In the shadow mask shown in FIG. 1, the peripheral portion 120 other than the slit opening region 130, or the peripheral portion 120 other than the slit opening region 130 of the shadow mask and the outer peripheral portion of the slit opening region 130 have the thickness of the shadow mask material. The thickness of the grill 110 in the slit opening region is thinner than the material of the shadow mask, and the sum of the thickness of the damper portion 150 and the thickness of the grill 110 is the thickness of the material of the shadow mask.

In the first example shown in FIG. 1, as shown in FIG. 1A, the damper portion 150 is provided integrally with the grill 110 so as to be oblique to the grill 110. Thus, the length of the grill 110 divided by the damper 150 is different between adjacent grills, so that the grills can be suppressed from vibrating due to external impact. As shown in FIGS. 1B and 2B, the grill portion is formed to have a thickness t1 that is thinner than the thickness of the shadow mask material, and can cope with high-definition processing. FIG.
(B) As shown in (b), the damper 150 is formed integrally with the grill 110, and the sum of the thickness t2 of the damper 150 and the thickness t1 of the grill 110 is equal to the thickness of the shadow mask material. t0.

FIG. 2 shows a second example in which a damper 150 is provided in a zigzag shape.
0 basically works the same as the example shown in FIG. In the case of the second example shown in FIG. 2, as in the first example shown in FIG. 1, the grill portion is formed to be thinner than the thickness of the shadow mask material, and can cope with high-definition processing. The sum of the thickness of the damper 150 and the thickness of the grill 110 is the thickness of the shadow mask material.

The third example shown in FIG. 3 is similar to the method shown in FIG. 6C, except that the length of the grill is changed and the aperture region 130 is provided so as to be corrugated at both ends of the grill. Further, the damper 150 is moved by 1 in the direction orthogonal to the grill.
It is provided integrally with the book and grill. In the case of the third example, similarly to the method shown in FIG. 6 (c), the length of the adjacent grill is changed by providing the opening region 130 so as to be corrugated at both ends of the grill. The natural frequency that resonates is changed little by little, and the vibrations are mutually suppressed via the damper 150. In the case of the third example, similarly to the first example shown in FIG. 1 and the second example shown in FIG. 2, the grill portion is formed to be thinner than the thickness of the shadow mask material, and can cope with high-definition processing. . The sum of the thickness of the damper 150 and the thickness of the grill 110 is the thickness of the shadow mask material. Incidentally, as the material of the shadow mask of the present invention, various materials other than invar material can be used.

Next, a method of manufacturing a shadow mask according to the present invention will be described with reference to FIG. FIG. 4 is a process chart of the method of manufacturing the shadow mask of the present invention, in which the first example of the shadow mask of the present invention shown in FIG. 1 is manufactured.
In addition, for the sake of simplicity, cross-sectional views in the A6-A7 direction of FIG. 1B are shown in FIGS.
4 (a), (b) to FIG. 4 (f) are cross-sectional views corresponding to FIG.
(B). The A4-A5 direction is a direction orthogonal to the grill. 4 and 410, a shadow mask material, 410A is a first surface, 410B is a second surface, 420
Is a resist, 420A is a first resist pattern, 42
0B is a second resist pattern, 421A is a first resist pattern opening, 421B is a second resist pattern opening, 430A is a first recess, 430B is a second recess,
440 is an etching resistance layer, 110 is a grill, and 150 is a damper.

First, the shadow mask material 410 is degreased,
After a cleaning process or the like (FIG. 4 (a)), a resist 420 is applied to both surfaces thereof (FIG. 4 (b)).
20B is formed. (FIG. 4C) On the first surface 410A of the shadow mask material 410, there is no resist in the grill formation region, and the damper formation region
A first resist pattern 420A in which a resist is provided only in a peripheral region of the opening region of the shadow mask is formed.
On the second surface 410B of the shadow mask material 410, a resist pattern 420B conforming to the shape of the grill to be formed is provided.
To form The first resist opening 421A is an opening for reducing the thickness by etching, and the second resist opening 421B is an opening for performing external processing.
The resist patterns 420A and 420B are formed by adding a dichromate to casein or PVA by several percent, applying a water-soluble resist having photosensitivity, drying the resist, and then using a predetermined pattern plate (not shown). Exposure, development and the like can be performed. In addition, after the development processing with warm water or water, chromic acid processing and heat treatment are performed.

Next, from both sides of the shadow mask material 410, the regions exposed from the openings 421 A and 421 B of the resist pattern are subjected to a first etching to a predetermined depth with an etching solution to form a first concave 430 A and a second concave 430 A. Recess 4
Form 30B. (FIG. 4D) The etching depth h of the first concave portion 430A on the first surface 410A side is the thickness of the damper portion and determines the thickness of the grill of the shadow mask. This affects the processing accuracy when making the grill.

Next, an etching resistance layer 440 is applied so as to fill the first concave portion 430A and cover the first resist pattern 420A. (FIG. 4E) As shown in FIG. 4E and FIG. 4A, the damper 470 forming portion is coated with the etching resistance layer 440, and is protected from being etched in the second etching described later. You.

Thereafter, a second etching is performed from the side of the second concave portion 430B to penetrate to form a grill 460. (FIG. 4 (f))

After the second etching, the etching resistance layer 4
The resist 40 and the resist patterns 420A and 420B are stripped with an alkaline solution, washed and dried to obtain a desired shadow mask 400. (FIG. 4 (g))

As described above, after the first etching is performed on the material from one or both sides thereof so as not to penetrate the material, the etching resistance layer is embedded in the concave portion formed by the etching, and the second etching is performed. Etching from the side where the etching resistance layer is not embedded, and
The step etching method is generally called a two-step etching method, and is used for manufacturing a highly accurate shadow mask or the like. In addition, half etching generally refers to etching for reducing the thickness of a material (plate material) to be processed, and in FIG. 4, refers to etching from the first surface side of the grill formation region.

In FIG. 4, the case of manufacturing the first example of the shadow mask of the present invention shown in FIG. 1 has been described, but the second example shown in FIG. 2 and the third example shown in FIG. The same applies to the case of manufacturing the example shadow mask.

[0022]

According to the present invention, as described above, in particular, in a high precision thinned slit type shadow mask, only by manufacturing the shadow mask and fixing it to the frame,
It is possible to provide a slit-type shadow mask that does not require a separate step of providing a damper. Also, as shown in FIG. 6C, the etching area of the shadow mask is made large according to the waveform shape at both ends of the grill. This makes it possible to provide a slit type shadow mask which is not necessarily required. As a result, the whole process of incorporating the shadow mask into the color cathode ray tube (CRT) is simplified, and the productivity is improved.

[Brief description of the drawings]

FIG. 1 is a schematic view showing a first example of a shadow mask of the present invention.

FIG. 2 is a schematic view showing a second example of the shadow mask of the present invention.

FIG. 3 is a schematic view showing a third example of the shadow mask of the present invention.

FIG. 4 is a process sectional view showing a manufacturing method of the shadow mask of the present invention.

FIG. 5 is a schematic view of a conventional shadow mask.

FIG. 6A is a schematic diagram of a color cathode ray tube (CRT), and FIGS. 6B and 6C are diagrams showing a state where a damper is provided.

[Explanation of symbols]

REFERENCE SIGNS LIST 100 shadow mask 110 grill 115 slit 120 peripheral portion 122 notch 130 opening area 150 damper 400A shadow mask 410 shadow mask material 410A first surface 410B second surface 420 resist 420A first resist pattern 420B second resist pattern 421A First resist pattern opening 421B Second resist pattern opening 430A First concave portion 430B Second concave portion 440 Etching resistance layer 500 Shadow mask 510 Grill 515 Slit 520 Peripheral portion 522 Notch 530 Opening area 600 Color cathode ray tube (CRT) 610 electron gun 615 electron beam 620 deflection yoke 630 funnel 640 panel 650 phosphor screen 660 shadow mask 661 grill 665 waveform 670 Frame 690 damper

Claims (3)

[Claims] 1. A slit-type shadow mask used for selecting colors of a color cathode ray tube, wherein a damper crossing the grill is provided integrally with the grill. 2. The shadow mask material according to claim 1, wherein the peripheral portion of the shadow mask that is not the slit opening region, or the peripheral portion of the shadow mask that is not the slit opening region and the outer peripheral portion of the slit opening region are the thickness of the shadow mask material. Wherein the grill in the slit opening area is thinner than the material of the shadow mask, and the sum of the thickness of the damper and the thickness of the grill is the thickness of the material of the shadow mask. mask. 3. A shadow mask of a slit type used for color selection of a color cathode ray tube, wherein a damper crossing the grill is integrally connected to the grill, and a peripheral portion other than a slit opening area of the shadow mask or a shadow. The peripheral portion of the mask that is not the slit opening region and the outer peripheral portion of the slit opening region have the thickness of the shadow mask material, and the grilles of the other slit opening regions are thinner than the shadow mask material, and the damper portion has This is a method of manufacturing a slit-type shadow mask in which the sum of the thickness and the thickness of the grill is the thickness of the material of the shadow mask. A slit-type shadow mask characterized by processing the outer shape by etching in combination with half-etching to make it thinner. The method of manufacturing disks.