JPH10195699A - Method for managing composition of ferrous plating liquid for electroplating treatment - Google Patents
Method for managing composition of ferrous plating liquid for electroplating treatmentInfo
- Publication number
- JPH10195699A JPH10195699A JP290297A JP290297A JPH10195699A JP H10195699 A JPH10195699 A JP H10195699A JP 290297 A JP290297 A JP 290297A JP 290297 A JP290297 A JP 290297A JP H10195699 A JPH10195699 A JP H10195699A
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- Japan
- Prior art keywords
- plating solution
- iron
- anode
- cathode
- electrolytic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は電気めっき処理用鉄
系めっき液の組成管理方法に関する。The present invention relates to a method for controlling the composition of an iron-based plating solution for electroplating.
【０００２】[0002]
【従来の技術】錫めっき液を電気めっき処理に用いる場
合、不溶性陽極電極を採用することにより、その錫めっ
き液にはめっき品質を損なうアルカリ金属水酸化物が蓄
積されてしまう。このため、従来、特開昭５３−２６２
３７号公報において、電気めっき処理用錫めっき液の組
成管理方法として、錫めっき液中のアルカリ金属イオン
を電気透析により制御する方法が開示されている。2. Description of the Related Art When a tin plating solution is used for an electroplating process, an insoluble anode electrode is used, and alkali metal hydroxides which impair plating quality are accumulated in the tin plating solution. For this reason, conventionally, Japanese Unexamined Patent Application Publication No.
No. 37 discloses a method for controlling the composition of a tin plating solution for electroplating by controlling alkali metal ions in the tin plating solution by electrodialysis.
【０００３】この方法では、イオン交換膜により仕切ら
れ、電解電源の陽極と電気的に接続された陽極電極が設
けられた陽極室と、電解電源の陰極と電気的に接続され
た陰極電極が設けられた陰極室とを有する電解析出装置
を用いている。そして、陰極室に酸又は水からなる電解
質溶液を供給するとともに、ワークに電気めっき処理を
行うめっき槽内の錫めっき液を陽極室に循環し、この状
態で電解電源により通電を行う。この方法によれば、錫
めっき液中においてアルカリ金属水酸化物を構成するア
ルカリ金属イオンが正に帯電しているため、電解析出装
置の陽極室内を循環するその錫めっき液のアルカリ金属
イオンが電場内において陰極室内の陰極電極に引き寄せ
られるため、その際にアルカリ金属イオンがイオン交換
膜を通過することとなり、錫めっき液を透析できること
となる。なお、アルカリ金属イオンはその析出電位の問
題から陰極電極に析出することはない。そして、過剰な
アルカリ金属イオンを除去した錫めっき液は、電気めっ
き処理工程に戻されることとなる。これにより、錫めっ
き液中の過剰なアルカリ金属水酸化物を除去して錫めっ
き品質を高いレベルで維持できるとともに、錫めっき液
の廃液処理等の問題を解決できる。In this method, an anode chamber provided with an anode electrode which is partitioned by an ion exchange membrane and electrically connected to an anode of an electrolytic power source, and a cathode electrode electrically connected to a cathode of the electrolytic power source are provided. And an electrolytic deposition apparatus having a cathode chamber. Then, an electrolyte solution made of acid or water is supplied to the cathode chamber, and a tin plating solution in a plating tank for performing electroplating treatment on the work is circulated to the anode chamber, and in this state, electricity is supplied by an electrolytic power supply. According to this method, since the alkali metal ions constituting the alkali metal hydroxide are positively charged in the tin plating solution, the alkali metal ions of the tin plating solution circulating in the anode chamber of the electrolytic deposition apparatus are Since it is attracted to the cathode electrode in the cathode chamber in the electric field, the alkali metal ions pass through the ion exchange membrane at that time, so that the tin plating solution can be dialyzed. The alkali metal ion does not deposit on the cathode electrode due to the problem of its deposition potential. Then, the tin plating solution from which the excess alkali metal ions have been removed is returned to the electroplating process. Thus, the tin plating quality can be maintained at a high level by removing the excessive alkali metal hydroxide in the tin plating solution, and problems such as disposal of a tin plating solution waste solution can be solved.
【０００４】他方、鉄系めっき液を電気めっき処理に用
いる場合、可溶性陽極電極を採用することにより、鉄系
めっき液中にＦｅ2+が増加することが知られている。こ
のＦｅ2+は、陰極電極におけるめっき反応に与える主成
分であり、めっき品質確保のために一定範囲に管理する
必要がある。このため、一般的には、鉄系めっき液の組
成管理方法として、Ｆｅ2+濃度が管理値を超えた段階で
鉄系めっき液を更新したり、鉄系めっき液を希釈したり
する方法が採用されている。[0004] On the other hand, when an iron-based plating solution is used for electroplating, it is known that Fe 2+ increases in the iron-based plating solution by employing a soluble anode electrode. This Fe 2+ is a main component that gives a plating reaction at the cathode electrode, and needs to be controlled within a certain range to ensure plating quality. For this reason, generally, as a method of controlling the composition of the iron-based plating solution, a method of updating the iron-based plating solution or diluting the iron-based plating solution when the Fe 2+ concentration exceeds the control value is used. Has been adopted.
【０００５】[0005]
【発明が解決しようとする課題】しかし、鉄系めっき液
について上記公報記載の電気透析による組成管理方法を
採用すると、通電を行った際、陽極室に導入した鉄系め
っき液に Ｆｅ2+→Ｆｅ3+＋ｅ- なる陽極反応を生じ、これにより鉄系めっき液中にめっ
き層に有害なＦｅ3+が生じることとなる。このため、鉄
系めっき液については、上記公報記載の電気透析による
組成管理方法をそのまま採用することができない。However, if the composition control method by electrodialysis described in the above-mentioned publication is adopted for the iron-based plating solution, the Fe-based plating solution introduced into the anode chamber when Fe 2+ → An anodic reaction of Fe 3+ + e − occurs, which causes harmful Fe 3+ to the plating layer in the iron-based plating solution. For this reason, the composition control method by electrodialysis described in the above-mentioned publication cannot be directly used for the iron-based plating solution.
【０００６】また、鉄系めっき液の更新等を行うにして
も、それに伴うＦｅ2+濃度の変化が大きく、めっき品質
のばらつき、多量な廃液の発生等の問題がある。本発明
は、上記従来の実状に鑑みてなされたものであって、め
っき層に有害なＦｅ3+を生じさせることなく、鉄系めっ
き品質を高いレベルで維持できるとともに、鉄系めっき
液の廃液処理等の問題を解決可能な方法を提供すること
を解決課題とする。[0006] Further, even if the iron-based plating solution is renewed, the Fe 2+ concentration changes greatly with the renewal, and there are problems such as variations in plating quality and generation of a large amount of waste liquid. The present invention has been made in view of the above-mentioned conventional situation, and can maintain iron-based plating quality at a high level without generating harmful Fe 3+ in a plating layer, and can reduce wastewater of an iron-based plating solution. It is an object to provide a method capable of solving a problem such as processing.
【０００７】[0007]
（１）請求項１の電気めっき処理用鉄系めっき液の組成
管理方法は、イオン交換膜により仕切られ、電解電源の
陽極と電気的に接続された陽極電極が設けられた陽極室
と、該電解電源の陰極と電気的に接続された陰極電極が
設けられた陰極室とを有する電解析出装置を用い、該陽
極室に電解質溶液を導入するとともに、ワークに電気め
っき処理を行うめっき槽内の鉄系めっき液を該陰極室に
導入し、この状態で該電解電源により通電を行うことを
特徴とする。(1) A method for controlling the composition of an iron-based plating solution for electroplating according to claim 1, wherein the anode chamber is provided with an anode electrode partitioned by an ion-exchange membrane and electrically connected to an anode of an electrolytic power supply. Using an electrolytic deposition apparatus having a cathode chamber provided with a cathode electrode electrically connected to a cathode of an electrolytic power supply, introducing an electrolyte solution into the anode chamber, and performing an electroplating process on a work in a plating tank. Is introduced into the cathode chamber, and in this state, electricity is supplied by the electrolytic power supply.
【０００８】請求項１の方法では、過剰なＦｅ2+を含む
鉄系めっき液が電解析出装置の陰極室内において（１）
式の反応を生じる。 Ｆｅ2+＋２ｅ-→Ｆｅ …（１）式 つまり、陰極室では、陰極電極にＦｅが析出し、鉄系め
っき液中の過剰なＦｅ 2+が減少する。そして、この際、
鉄系めっき液は、陽極電極には接触しないため、めっき
層に有害なＦｅ3+を生じることもない。In the method of claim 1, the excess Fe2+including
Iron-based plating solution in the cathode chamber of electrolytic deposition equipment (1)
The reaction of the formula occurs. Fe2++ 2e-→ Fe (1) That is, in the cathode chamber, Fe precipitates on the cathode electrode, and iron
Excess Fe in the plating solution 2+Decrease. And at this time,
Since the iron-based plating solution does not contact the anode electrode,
Fe harmful to layer3+Does not occur.
【０００９】他方、電解析出装置の陽極室では（２）式
の反応を生じる。 ２Ｈ2Ｏ→Ｏ2＋４Ｈ+＋４ｅ- …（２）式 つまり、陽極室では水が消費され、水素イオンが生成す
る。この水素イオンは、陰極室におけるＦｅの析出反応
に伴う鉄系めっき液中の陽イオンの減少を補うため、イ
オン交換膜を通過し、陰極室に移動する。このため、陽
極室では水の消費により液量が減少するので、水を陽極
室に補給すれば足りることとなる。On the other hand, the reaction of the formula (2) occurs in the anode chamber of the electrolytic deposition apparatus. 2H 2 O → O 2 + 4H + + 4e − (2) That is, water is consumed in the anode chamber, and hydrogen ions are generated. The hydrogen ions pass through the ion exchange membrane and move to the cathode chamber in order to compensate for the decrease in cations in the iron-based plating solution accompanying the precipitation reaction of Fe in the cathode chamber. For this reason, since the amount of liquid in the anode chamber decreases due to consumption of water, it is sufficient to supply water to the anode chamber.
【００１０】電解析出装置における電解は定電流電解と
し、出力電流値を（３）式により決定し得る。ここで、
Ｉは電解析出装置における電解電源の出力電流値、ＩP
はめっき電流値、ηaは陽極溶解効率、ηkは陰極析出効
率である。 Ｉ=ＩP（ηa−ηk） …（３）式 したがって、請求項１の方法によれば、めっき層に有害
なＦｅ3+を生じさせることなく、鉄系めっき品質を高い
レベルで維持できるとともに、鉄系めっき液の廃液処理
等の問題を解決できる。The electrolysis in the electrolytic deposition apparatus is a constant current electrolysis, and the output current value can be determined by equation (3). here,
I is the output current value of the electrolytic power supply in the electrolytic deposition apparatus, I P
Is the plating current value, η a is the anode dissolution efficiency, and η k is the cathode deposition efficiency. I = I P (η a −η k ) (3) Therefore, according to the method of claim 1, the iron-based plating quality is maintained at a high level without generating harmful Fe 3+ in the plating layer. In addition to the above, it is possible to solve problems such as waste liquid treatment of an iron-based plating solution.
【００１１】（２）請求項２の電気めっき処理用鉄系め
っき液の組成管理方法は、請求項１記載の電気めっき処
理用鉄系めっき液の組成管理方法において、めっき槽内
における鉄系めっき液中のＦｅ2+濃度を測定し、その測
定値に基づいて電解電源の出力電流値を制御することを
特徴とする。鉄系めっき液を電気めっき処理に用いる場
合、可溶性陽極電極を採用することにより、一般に付与
しためっき電流値ＩPに対して、 陽極溶解効率ηa＞陰極析出効率ηk となるので、ＭFeをＦｅの原子量、Ｆをファラデー定数
とすれば、 ＩPＭFe（ηa−ηk）／２Ｆ （ｇ／秒） の速度で、鉄系めっき液中にＦｅ2+が増加する。このた
め、請求項２の方法のように、めっき槽内における鉄系
めっき液中のこのＦｅ2+濃度を測定し、その測定値に基
づいて電解電源の出力電流値を制御すれば、きめ細かい
組成管理が可能になる。(2) The method for controlling the composition of an iron-based plating solution for electroplating according to claim 2 is a method for controlling the composition of an iron-based plating solution for electroplating according to claim 1, It is characterized in that the Fe 2+ concentration in the solution is measured, and the output current value of the electrolytic power supply is controlled based on the measured value. When using the iron-based plating solution electroplating process, by employing a soluble anode for generally applying the plating current value I P, since the anode dissolution efficiency eta a> cathode deposition efficiency eta k, M Fe the atomic weight of Fe, if the F Faraday constant, at a rate of I P M Fe (η a -η k) / 2F (g / sec), Fe 2+ increases in the iron-based plating solution. Therefore, if the Fe 2+ concentration in the iron-based plating solution in the plating tank is measured and the output current value of the electrolytic power supply is controlled based on the measured value as in the method of claim 2, a fine composition can be obtained. Management becomes possible.
【００１２】[0012]
【発明の実施の形態】以下、請求項１、２の発明を具体
化した実施形態１、２を図面を参照しつつ説明する。 （実施形態１）まず、図１に示す電解析出装置を用意す
る。この電解析出装置では、容器１の内部がイオン交換
膜２により陽極室１ａと陰極室１ｂとに仕切られてい
る。陽極室１ａには電解電源３の陽極と電気的に接続さ
れた陽極電極３ａが設けられ、陰極室１ｂには電解電源
３の陰極と電気的に接続された陰極電極３ｂが設けられ
ている。陽極電極、陰極電極の材質としてはステンレ
ス、白金等の不活性な金属等が採用され得る。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments 1 and 2 of the present invention will be described below with reference to the drawings. (Embodiment 1) First, an electrolytic deposition apparatus shown in FIG. 1 is prepared. In this electrolytic deposition apparatus, the inside of a container 1 is partitioned by an ion exchange membrane 2 into an anode chamber 1a and a cathode chamber 1b. The anode chamber 1a is provided with an anode electrode 3a electrically connected to the anode of the electrolytic power supply 3, and the cathode chamber 1b is provided with a cathode electrode 3b electrically connected to the cathode of the electrolytic power supply 3. As a material of the anode electrode and the cathode electrode, an inert metal such as stainless steel or platinum can be adopted.
【００１３】電解析出装置の側方には、図示しない可溶
性陽極電極を採用し、図示しないワークに電気めっき処
理を行うめっき槽４が設けられており、このめっき槽４
内には硫酸第一鉄系水溶液からなる鉄系めっき液６が一
定水位で貯留されている。陰極室１ｂにはこの鉄系めっ
き液６が配管によりポンプ５を介して循環されており、
陽極室１ａには鉄系めっき液６が硫酸系であることから
硫酸７が満たされている。A plating tank 4 which employs a soluble anode electrode (not shown) and performs an electroplating process on a work (not shown) is provided beside the electrolytic deposition apparatus.
Inside, an iron-based plating solution 6 composed of a ferrous sulfate-based aqueous solution is stored at a constant water level. The iron-based plating solution 6 is circulated through the pump 5 through the pipe in the cathode chamber 1b.
The anode chamber 1a is filled with sulfuric acid 7 since the iron-based plating solution 6 is sulfuric acid-based.
【００１４】めっき槽４においてワークに電気めっき処
理を行うと、結果として鉄系めっき液６中のＦｅ2+が増
加する。このＦｅ2+が過剰となった鉄系めっき液６をポ
ンプ５を用いて電解析出装置の陰極室１ｂに導入し、上
記（３）式により求められる出力電流値Ｉにより定電流
電解を行うべく、電解析出装置において電解電源３によ
り通電を行う。When the electroplating process is performed on the work in the plating tank 4, as a result, Fe 2+ in the iron-based plating solution 6 increases. The iron-based plating solution 6 having excess Fe 2+ is introduced into the cathode chamber 1b of the electrolytic deposition apparatus by using the pump 5, and constant current electrolysis is performed based on the output current value I obtained by the above equation (3). To this end, energization is performed by the electrolytic power source 3 in the electrolytic deposition apparatus.
【００１５】これにより、陰極室１ｂでは、上記（１）
式の反応により、陰極電極３ｂにＦｅが析出し、鉄系め
っき液６中の過剰なＦｅ2+が減少する。この際、鉄系め
っき液６は、陽極電極３ａには接触しないため、めっき
層に有害なＦｅ3+を生じることもない。こうして、過剰
なＦｅ2+を電解析出により除去した鉄系めっき液６は、
めっき槽４に循環され、電気めっき処理工程に戻される
こととなる。Thus, in the cathode chamber 1b, the above (1)
By the reaction of the formula, Fe precipitates on the cathode electrode 3b, and excess Fe 2+ in the iron-based plating solution 6 decreases. At this time, since the iron-based plating solution 6 does not contact the anode electrode 3a, harmful Fe 3+ does not occur in the plating layer. Thus, the iron-based plating solution 6 from which excess Fe 2+ has been removed by electrolytic deposition,
It is circulated to the plating tank 4 and returned to the electroplating process.
【００１６】なお、陽極室１ａでは、上記（２）式の反
応により、水が消費され、水素イオンが生成する。この
ため、随時、陽極室１ａに水を補給する。したがって、
実施形態１の方法によれば、めっき層に有害なＦｅ3+を
生じさせることなく、鉄系めっき品質を高いレベルで維
持できるとともに、鉄系めっき液６の廃液処理等の問題
を解決できる。 （実施形態２）まず、図２に示す電解析出装置を用意す
る。この電解析出装置では、めっき槽４内に鉄系めっき
液６中のＦｅ2+濃度を測定するセンサ８が取り付けられ
ており、センサ８の出力が制御装置９に入力されるよう
になっている。制御装置９はセンサ８からの鉄系めっき
液６中のＦｅ2+濃度の測定値を基に（４）式の演算を行
い、最適な電解電流値を決定し、その結果に基づき電解
電源３の出力電流値Ｉを制御する。In the anode chamber 1a, water is consumed and hydrogen ions are generated by the reaction of the above formula (2). For this reason, water is supplied to the anode chamber 1a at any time. Therefore,
According to the method of the first embodiment, it is possible to maintain the iron-based plating quality at a high level without generating harmful Fe 3+ in the plating layer, and to solve problems such as waste liquid treatment of the iron-based plating solution 6. (Embodiment 2) First, an electrolytic deposition apparatus shown in FIG. 2 is prepared. In this electrolytic deposition apparatus, a sensor 8 for measuring the Fe 2+ concentration in the iron-based plating solution 6 is mounted in the plating tank 4, and the output of the sensor 8 is input to the control device 9. I have. The controller 9 calculates the equation (4) based on the measured value of the Fe 2+ concentration in the iron-based plating solution 6 from the sensor 8 to determine an optimal electrolytic current value, and based on the result, the electrolytic power source 3 Is controlled.
【００１７】 Ｉ=ＩP（ηa−ηk） ＋（２ＦＶ／ＭFe）・（ｄ［Ｆｅ2+］／ｄｔ） …（４）式 ここで、Ｉは電解析出装置における出力電流値、ＩPは
めっき電流値、ηaは陽極溶解効率、ηkは陰極析出効
率、Ｆはファラデー定数、Ｖは鉄系めっき液６の体積、
ＭFeはＦｅの原子量、［Ｆｅ2+］は鉄系めっき液６中の
Ｆｅ2+濃度、ｔは時間、ｄ［Ｆｅ2+］／ｄｔはＦｅ2+濃
度の変化速度である。I = I P (η a −η k ) + (2FV / M Fe ) · (d [Fe 2+ ] / dt) (4) where I is an output current value in the electrolytic deposition apparatus. , I P is the plating current value, η a is the anode dissolution efficiency, η k is the cathode deposition efficiency, F is the Faraday constant, V is the volume of the iron-based plating solution 6,
M Fe is the atomic weight of Fe, [Fe 2+ ] is the Fe 2+ concentration in the iron-based plating solution 6, t is time, and d [Fe 2+ ] / dt is the rate of change of the Fe 2+ concentration.
【００１８】他の構成は実施形態１と同一であるため、
同一の構成については同一符号を付し、詳説を省略す
る。陽極溶解効率ηa及び陰極析出効率ηkはめっき槽４
における電気めっき処理工程の条件のばらつきなどに影
響されて変動する。しかしながら、この実施形態２で
は、上記（４）式により求められる出力電流値Ｉにより
定電流電解を行うべく、電解析出装置において電解電源
３により通電を行うため、実施形態１よりもきめ細かい
組成管理が可能である。Since the other structure is the same as that of the first embodiment,
The same reference numerals are given to the same components, and the detailed description will be omitted. Anode dissolution efficiency eta a and cathode deposition efficiency eta k is the plating tank 4
Fluctuated due to variations in the conditions of the electroplating process in the process. However, in the second embodiment, since the energization is performed by the electrolytic power source 3 in the electrolytic deposition apparatus in order to perform the constant current electrolysis based on the output current value I obtained by the above equation (4), the composition management is finer than in the first embodiment. Is possible.
【図面の簡単な説明】[Brief description of the drawings]
【図１】実施形態１の電解析出装置の模式断面図であ
る。FIG. 1 is a schematic sectional view of an electrolytic deposition apparatus according to a first embodiment.
【図２】実施形態２の電解析出装置の模式断面図であ
る。FIG. 2 is a schematic sectional view of an electrolytic deposition apparatus according to a second embodiment.
２…イオン交換膜 ３…電解電源 ３ａ…陽極電極 １ａ…陽極室 ３ｂ…陰極電極 １ｂ…陰極室 ７…電解質溶液 ４…めっき槽 ６…鉄系めっき液 ８…センサ ９…制御装置 2 ... Ion exchange membrane 3 ... Electrolytic power supply 3a ... Anode electrode 1a ... Anode chamber 3b ... Cathode electrode 1b ... Cathode chamber 7 ... Electrolyte solution 4 ... Plating tank 6 ... Iron plating solution 8 ... Sensor 9 ... Control device
Claims (2)
陽極と電気的に接続された陽極電極が設けられた陽極室
と、該電解電源の陰極と電気的に接続された陰極電極が
設けられた陰極室とを有する電解析出装置を用い、該陽
極室に電解質溶液を導入するとともに、ワークに電気め
っき処理を行うめっき槽内の鉄系めっき液を該陰極室に
導入し、この状態で該電解電源により通電を行うことを
特徴とする電気めっき処理用鉄系めっき液の組成管理方
法。1. An anode chamber partitioned by an ion exchange membrane and provided with an anode electrode electrically connected to an anode of an electrolytic power supply, and a cathode electrode electrically connected to a cathode of the electrolytic power supply. Using an electrolytic deposition apparatus having a cathode chamber, an electrolyte solution was introduced into the anode chamber, and an iron-based plating solution in a plating tank for performing an electroplating process on a work was introduced into the cathode chamber. A method for controlling the composition of an iron-based plating solution for electroplating, wherein the composition is energized by the electrolytic power supply.
2+濃度を測定し、その測定値に基づいて電解電源の出力
電流値を制御することを特徴とする請求項１記載の電気
めっき処理用鉄系めっき液の組成管理方法。2. The method according to claim 1, wherein the Fe-based plating solution contains Fe in a plating tank.
2. The composition control method for an iron-based plating solution for electroplating according to claim 1, wherein the 2+ concentration is measured, and the output current value of the electrolytic power supply is controlled based on the measured value.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP290297A JPH10195699A (en) | 1997-01-10 | 1997-01-10 | Method for managing composition of ferrous plating liquid for electroplating treatment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP290297A JPH10195699A (en) | 1997-01-10 | 1997-01-10 | Method for managing composition of ferrous plating liquid for electroplating treatment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH10195699A true JPH10195699A (en) | 1998-07-28 |
Family
ID=11542296
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP290297A Pending JPH10195699A (en) | 1997-01-10 | 1997-01-10 | Method for managing composition of ferrous plating liquid for electroplating treatment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10195699A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006000792A (en) * | 2004-06-18 | 2006-01-05 | Ebara Corp | Apparatus and method for electrodeposition treatment |
| WO2013080326A1 (en) * | 2011-11-30 | 2013-06-06 | 不二商事株式会社 | Method of regenerating plating solution |
-
1997
- 1997-01-10 JP JP290297A patent/JPH10195699A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006000792A (en) * | 2004-06-18 | 2006-01-05 | Ebara Corp | Apparatus and method for electrodeposition treatment |
| WO2013080326A1 (en) * | 2011-11-30 | 2013-06-06 | 不二商事株式会社 | Method of regenerating plating solution |
| WO2013080978A1 (en) * | 2011-11-30 | 2013-06-06 | 不二商事株式会社 | Method for regenerating plating liquid, plating method, and plating apparatus |
| CN103917691A (en) * | 2011-11-30 | 2014-07-09 | 不二商事株式会社 | Method for regenerating plating liquid, plating method, and plating apparatus |
| US9702044B2 (en) | 2011-11-30 | 2017-07-11 | Fuji Shoji Co., Ltd. | Method for regenerating plating liquid, plating method, and plating apparatus |
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