JPH1018035A - Vacuum film forming process device and masking member in common use as transporting carrier for this device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To make the device maintenance-free or nearly maintenance-free by setting substrate on masking plates in order to form prescribed films on these substrates and continuously transporting the substrates in an approximately erected state in a process chamber. SOLUTION: The masking plates 11 set with the substrates are continuously supplied into a reduced pressure charging chamber 150 from the inside of the atm. and after the masking plates 11 are transferred to a transporting section 2 communicating with this reduced pressure chamber, the masking plates are continuously transported in the process chamber 5 where the prescribed films are formed on the surfaces of the substrates. The masking plates are then taken outside from the reduced pressure chamber 4 communicating the transporting section.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum film forming process apparatus and a transfer carrier / masking member for the apparatus, and more particularly to a transfer apparatus in a vacuum processing apparatus for performing a surface treatment in a vacuum chamber. Also, the present invention relates to a technique suitably used for a vacuum processing apparatus, which is a vacuum chamber hand, and particularly to a vacuum processing apparatus for performing a surface treatment in a vacuum chamber.
The present invention also relates to a substrate transfer apparatus and a transfer method for transferring a substrate in a substantially horizontal direction, and more particularly to a substrate transfer apparatus and a transfer method used in a vacuum processing apparatus for performing a surface treatment on a substrate in a vacuum chamber. The present invention relates to a substrate transfer device for transferring a substrate in a substantially horizontal direction, and more particularly to a substrate transfer device used in a vacuum processing device for performing a surface treatment on a substrate in a vacuum chamber.

[0002]

2. Description of the Related Art Conventionally, a vacuum processing apparatus has been used in which a substrate is continuously transferred to a CVD apparatus to perform a process for forming a film on a substrate. Referring to the accompanying drawings, FIGS. 39 to 42 show examples of the configuration of a conventional vacuum processing apparatus.

In FIGS. 40 and 42, an inner peripheral masking plate 9 is set on a substrate 10, and is conveyed while being held by a masking plate 1011 that masks the outer periphery. The masking plate 1011 is provided with pins 1010a and 1010b that engage with the holding bar and the transport bar 1033.

The substrate transfer means 1500 includes a mask member 10
11 are provided for holding fingers 1154 and 1053, and the substrate is clamped and held vertically.

The mask plate 1011 stored in the supply stocker section is clamped by the substrate transfer means 1500,
The mask plate 1011 is unclamped by turning to the inclination angle of the transfer bar and placed on the transfer bar 1033. The mask plate 1011 placed on the transport bar is transported by the transport pitch. Next, the mask plate 1011 housed in the supply stocker unit is again clamped by the substrate transfer means 1500, and the mask plate 1011 is sequentially placed on the transport bar 1033.

Next, FIG. 43 shows a configuration example of a charging chamber of a conventional vacuum processing apparatus.

In FIG. 43, a holding means 2006 for holding a masking plate 11 holding a substrate 10 to be subjected to a surface treatment in advance and a holding means 6 are shown in a chamber 2010 which is a vacuum chamber. As described above, two transport means 2007 are provided at symmetrical positions.

[0008] The above-mentioned holding means 2 with respect to the openings 2011 and 2012 provided in the chamber 2010.
A linear driving means 2003 for moving the sheet 006 so as to make it abut is attached to the transport means 2007.

The linear driving means 2003 is provided with a holding means 2006.
And the linear drive unit 2008 is connected to the chamber 20
10 is covered with a seal member 2009 for isolating the atmosphere from the inside.

In the above configuration, the holding space 2006 is moved so as to abut the opening 2011 as shown in the figure, and the sealed space which is in the isolated state is the opening 201.
1 is configured to be pulled by a vacuum pump (not shown) until a predetermined vacuum pressure is reached through a pump connection port 2002 provided in the apparatus.

FIG. 44 is a cross-sectional view of a main part showing another example of the conventional structure of the conveying means.

In FIG. 44, the drive source 2008 of the linear drive means 2003 is provided outside the chamber 2010, but the guide for linear drive is provided so as to be concentric with the center of rotation.

Further, as disclosed in, for example, JP-A-6-264241, when the article holding mechanism is positioned at a predetermined position in the region of the opening of the chamber, it can be opened and closed mechanically. It is configured.

FIG. 45 is a front view showing a state in which a substrate is transported in a substantially horizontal direction in a conventional vacuum film forming apparatus.

In FIG. 45, a substrate 3101 has an inner peripheral mask 3103 set on the inner peripheral portion thereof, and is further transported in the direction of the arrow while being held by a masking plate 3102 for masking the outer periphery. It is configured so that edges of plates adjacent to each other abut.

FIG. 46 is a plan view of the masking plate 3102 conveyed in a substantially horizontal direction as viewed from the vertical direction.

In FIG. 46, the outer shape of the masking plate 3102 in the vertical direction is generally formed at right angles to the substrate surface or at a draft angle Θ required during molding. When passing through a space for film formation, the adjacent masking plates are used so as to be transported in close contact with each other.

Further, when such a masking plate 3102 is cut, an aluminum plate or a stainless plate having a predetermined thickness is cut and manufactured.

On the other hand, conventionally, the transfer of a substrate in a vacuum film forming apparatus or the like has been performed by a method as shown in FIG.

In FIG. 47, a substrate 4510 is conveyed in the direction of the front and back of the paper in a state where an inner peripheral mask 4503 is set on an inner peripheral portion thereof and further held by a masking plate 4502 for masking the outer periphery of the substrate. Guide member 4504
Is for guiding the masking plate 4502 so as not to fall. The masking plate 4502 is placed on a transport roller chain 4505. When the roller chain 4505 is driven by a driving device (not shown), the masking plate 4502 is transported in the traveling direction of the roller chain 4505 while being guided by the guide member 4504. It is configured to:

The masking plate 4502 is usually manufactured by cutting a plate material made of aluminum or stainless steel.

[0022]

However, FIG.
In the conventional example shown in FIG. 42 to FIG. 42, since the substrate transfer means directly mounts the mask member on the transport bar, there are the following problems.

The substrate transfer means clamps the mask member,
When unclamping after placing the mask member on the transport bar,
In order to avoid interference with the previously mounted mask member, claws for clamping to the mask member cannot be mounted in the left-right direction, but are mounted in the up-down direction. for that reason,
There is a problem that dust generated between the mask member and the claws disposed upward when the mask member is clamped or unclamped easily falls on the substrate surface.

On the other hand, according to the conventional configuration shown in FIG.
Since the linear driving mechanism 2008 is provided in the transfer unit disposed in the chamber 2010, the weight of the entire transfer unit increases. For this reason, there is a disadvantage that a driving source for turning drive becomes large.

Further, since a drive source for linear drive is provided in the chamber 2010, the drive source itself and a mechanism for sealing a drive force such as electricity or air become very complicated. There were drawbacks.

Since the opening 2011 is provided with a connection port to a vacuum pump, the opening 2011
However, there is a disadvantage that the diameter of the orifice leading to the pump must be reduced, and as a result, the conductance is deteriorated and the pump capacity to be used must be increased. Further, according to the conventional configuration example, in order to hold or open the substrate, which is an article, the workpiece accommodating portion holding the substrate is linearly brought into contact with the opening of the chamber. In addition to the moving transfer mechanism, another mechanism for performing a mechanical gripping operation is required.

As a result, in addition to requiring a separate drive source,
When the driving source is provided outside the chamber, a sealing mechanism is further required, and there is a disadvantage that the apparatus becomes complicated.

Further, when the diameter of the orifice is increased in order to improve the conductance, the volume of the closed space at the opening increases, and there is a disadvantage that it takes time to achieve a predetermined vacuum pressure.

When the guide member of the linear drive 2008 is provided concentrically with the center of rotation, the two openings 201 are formed.
When there is a difference between the pressures in the first and the second 2012, there is a problem that the balance is deteriorated and the arm is deformed due to the effect of the unbalanced load on the turning arm 2004.

Further, according to the conventional configuration example shown in FIG. 45, adjacent mask plates do not adhere to each other due to warpage or irregularity of the flatness when manufacturing the mask plates, so that a gap Sa is generated. Therefore, there is a problem that a gap Sb is generated.

As a result, in the film forming space, the components of the transfer section are exposed from the created gaps, so that the film adheres, and the film is peeled off, which may cause a foreign matter defect. Therefore, it has been necessary to periodically stop the apparatus and perform maintenance for removing the adhered film.

Further, since the mask member is manufactured by shaving metal, it is costly, and it is difficult to form a complicated shape.

In addition, a large amount of metal masks are required in the production process, which increases the production cost. In addition, since the film adhering to the mask is peeled off and causes a foreign matter defect, honing and cleaning of the mask are required, and the running cost is increased.

According to the conventional configuration shown in FIG. 47, when the clearance between the guide member 4504 and the masking plate 4502 is set large, the masking plate 45
02 was not stable. On the other hand, if the clearance is set small, the masking plate 4502
Comes in contact with the guide member 4504 and is easily caught, so that there is a problem that stable conveyance cannot be performed.

Further, in the film forming space of the process chamber, since the components of the transfer section are directly exposed, a film adheres to these components, the film is formed to be thick, and eventually the film is peeled off. There was a cause.

Further, since the masking plate is manufactured by cutting and machining a metal plate, the cost is high and it is difficult to form a complicated shape. Furthermore, since the masking plate manufactured in this way has a large weight, the rigidity of the transfer unit must be increased, and therefore, the transfer device is complicated and costly.

Further, a large amount of metal masking plate is required in the production process, and the production cost is increased. Moreover, since the film adhering to the masking plate is peeled off and causes a foreign matter defect, the honing of the masking plate,
Cleaning was required and running costs increased.

Therefore, the present invention has been made in view of the above-mentioned problems, and an object of the present invention is to prevent a dust generated from a masking plate and a holding means from dropping onto a substrate surface and to provide a desired surface to the substrate. An object of the present invention is to provide a substrate transfer apparatus in a vacuum processing apparatus for depositing a film and obtaining a high-quality film.

It is a further object of the present invention to prevent an excessive film from adhering to the transport section, prevent quality deterioration due to dust, and eliminate maintenance.

Another object of the present invention is to make it possible to manufacture a masking plate at a low cost even if it is made in a complicated shape, to keep the production cost low even if it is manufactured in large quantities, and to make it disposable. Another object of the present invention is to provide a substrate transfer carrier and a masking member which does not require cleaning and keeps running cost low.

Another object of the present invention is to provide a vacuum processing apparatus capable of sending a substrate from outside of the apparatus to a vacuum chamber or a film forming processing chamber without complicating the apparatus, and achieving a predetermined vacuum pressure in a short time. Is to do.

It is another object of the present invention to provide an inexpensive transfer device which stabilizes the transfer posture of a substrate, can perform stable transfer without getting caught, and does not complicate the structure.

Another object of the present invention is to prevent an extra film from adhering to a transport section, prevent quality deterioration due to dust, and eliminate maintenance.

Another object of the present invention is to provide a transfer apparatus capable of simultaneously performing substrate masking and performing stable transfer.

It is another object of the present invention to provide an inexpensive transfer device which can be manufactured at a low cost even if a complicated shape is formed in order to obtain a stable transfer, and the holding member is reduced in weight without increasing rigidity. Is to provide.

It is another object of the present invention to provide a transfer apparatus capable of forming a film having a low manufacturing cost by attaching a vacuum film forming apparatus to an inexpensive and stable transfer section. .

Another object of the present invention is to operate a holding mechanism for holding a substrate only by the operation of a linearly moving transfer mechanism without requiring any special mechanical means, thereby making the apparatus complicated. An object of the present invention is to provide a vacuum chamber hand for transferring a substrate without causing the transfer.

[0048]

According to the present invention, a masking plate on which a substrate is set is continuously supplied from the atmosphere into a reduced-pressure charging chamber to solve the above-mentioned problems. After delivering the masking plate to the transfer unit communicating with the chamber, the masking plate is continuously transferred in a process chamber for forming a predetermined film on the surface of the substrate, and the masking plate is transferred from the reduced pressure discharge chamber connected to the transfer unit. A vacuum film forming process apparatus configured to take out the outside of the masking plate, wherein the first housing is disposed in the reduced pressure charging chamber, temporarily stores a plurality of the masking plates, and moves up and down to the unloading position. Means, and both side portions of the masking plate are gripped by gripping portions from the first storage means and taken out one by one from the first storage means. A first transfer unit for supplying the masking plate to the upstream side of the transfer unit, the transfer unit for transferring the inside of the process chamber while maintaining the masking plate in a substantially upright posture, A second transfer provided in the reduced-pressure discharge chamber to hold both side portions of the masking plate on which the film is formed on a downstream side of a transfer unit by a holding unit and remove the masking plate one by one from the transfer unit. And a second storage means disposed in the reduced pressure discharge chamber and vertically moved to a receiving position for temporarily storing a plurality of the masking plates.

Further, a masking plate on which a substrate is set is continuously supplied from the atmosphere into a reduced-pressure charging chamber, and the masking plate is transferred to a transfer section communicating with the reduced-pressure charging chamber. A vacuum film forming process apparatus configured to continuously transfer the inside of a process chamber for forming a predetermined film and to take out the masking plate from a reduced pressure discharge chamber communicating with the transfer unit to the outside. A first reduced pressure charging chamber having a first reduced pressure charging chamber, the first reduced pressure charging chamber being provided in communication with the first reduced pressure charging chamber via one of the openings, and the inside of the process chamber while maintaining the masking plate in a substantially upright posture. A second reduced-pressure charging chamber provided in communication with the transfer means for transferring, and one opening of the first reduced-pressure charging chamber A first transfer means for supplying the masking plate to the first pressure-reducing chamber; and a first transfer means for supplying the masking plate to the first pressure-reducing chamber. A first transfer means for gripping both side portions of the masking plate supplied to the opening by the gripping portion and moving to the other opening; and a second decompression charging chamber. Is swiveled between the other opening and the upstream side of the transporting unit, and grips both side portions of the masking plate supplied to the other opening by a gripping unit and moves to the upstream side. And a second transfer means for transferring.

Further, the masking plate on which the substrate is set is continuously supplied from the atmosphere into the reduced-pressure charging chamber, and the masking plate is transferred to a transfer section communicating with the reduced-pressure charging chamber. A vacuum film forming process apparatus configured to continuously transfer the inside of a process chamber for forming a predetermined film and to take out the masking plate from a reduced pressure discharge chamber communicating with the transfer unit to the outside. A first reduced pressure charging chamber having a first reduced pressure charging chamber, the first reduced pressure charging chamber being provided in communication with the first reduced pressure charging chamber via one of the openings, and the inside of the process chamber while maintaining the masking plate in a substantially upright posture. A second reduced-pressure charging chamber provided in communication with the transfer means for transferring, and one opening of the first reduced-pressure charging chamber A first transfer means for supplying the masking plate to the first pressure-reducing chamber; and a first transfer means for supplying the masking plate to the first pressure-reducing chamber. A first transfer means for gripping both side portions of the masking plate supplied to the opening by the gripping portion and moving to the other opening; and a second decompression charging chamber. Is swiveled between the other opening and the upstream side of the transporting unit, and grips both side portions of the masking plate supplied to the other opening by a gripping unit and moves to the upstream side. And a second transfer means for transferring, wherein the first transfer means and the second transfer means include a linear drive means, and the linear drive means drives the linear transfer means. Each of the gripping portions is formed in the opening formed in the opening. By abutment against parts, it is characterized by being configured to perform the grasping operation.

Further, the masking plate on which the substrate is set is continuously supplied from the atmosphere into the reduced-pressure charging chamber, and the masking plate is transferred to a transfer section communicating with the reduced-pressure charging chamber. In a transfer carrier and a masking member for a vacuum film forming process apparatus configured to continuously transfer the inside of a process chamber for forming a predetermined film and to take out the masking plate from the reduced pressure discharge chamber communicating with the transfer unit to the outside, A mask that holds the substrate in a vertical position, has an engagement portion that protrudes to the rear surface side of the substrate, and engages with a transport unit that transports a carrier / masking member, and covers an outer peripheral edge of the substrate. Transfer carrier / masking member having a portion, and a vertical direction at a portion in contact with a masking member adjacent to each other. The outer portion of the ridge in contact with the ridge line and the back side in contact with the film forming surface side, the conveying direction, is characterized by the formation to be shifted relatively by a predetermined distance.

Further, the masking plate on which the substrate is set is continuously supplied from the atmosphere into the reduced-pressure charging chamber, and the masking plate is transferred to a transfer section communicating with the reduced-pressure charging chamber. A vacuum film forming process apparatus configured to continuously transfer the inside of a process chamber for forming a predetermined film, and to take out the masking plate from a reduced-pressure discharge chamber communicating with the transfer unit to the outside, wherein the transfer unit includes the transfer unit. In order to hold the masking plate in the vertical position, a substrate main body having an engaging portion protruding from the back surface side of the masking plate and arranged in a pair on the left and right sides, supporting the engaging portion, at least As an endless wire supported by a pair or more rollers, the endless wire is arranged in a pair in a substantially vertical direction so as to be continuously transported. It is characterized in that formed.

[0053]

BEST MODE FOR CARRYING OUT THE INVENTION

[First Embodiment] Preferred embodiments of the present invention will be specifically described below with reference to the accompanying drawings. FIG. 1 is a schematic configuration of a vacuum processing apparatus according to a first embodiment of the present invention. FIG.

In the drawing, a vacuum processing apparatus 1 is provided with a process chamber 5 by a CVD method, which is a film forming processing section, in a central transport section 2. The substrate 10 sequentially transported in the direction of the arrow as a film-forming object is held in advance by a masking plate 11 for masking the outer peripheral region of the substrate 10 as shown in the front view of FIG. An inner peripheral masking plate 9 is fitted in the inner peripheral hole portion, and the film is formed while being transported in the direction of the arrow in this state.

Referring again to FIG. 1, the transfer unit 2 and the process chamber 5 as a film forming unit have a hermetically sealed structure in which a vacuum space is formed at a degree of vacuum necessary for film formation.

A loading chamber 3 for loading a plurality of masking plates 11 with a substrate 10 set therein is attached to an entrance disposed on the left side of the transport section 2. A discharge chamber 4 for discharging the substrate 10 is attached to an outlet on the right side of the transport unit 2.

FIG. 2 is a sectional view taken on line XX of FIG. In this figure, a supply stocker chamber 7 is attached below the charging chamber section 3, and has a structure that is closed by a gate valve device 12 and a door 6. With the gate valve device 12 closed, the door 6 is opened,
The substrate 10 is loaded into the stocker chamber 5 by an operator or a loading unit (not shown). When the door 6 is closed,
The pressure is reduced to a predetermined pressure. The gate valve device 12 has an O-ring 14 attached to a flange portion 13f, and the O-ring 14 is attached to the upper surface 3 of the supply stocker chamber.
When it comes into contact with a-1, the space between the charging chamber section 3 and the supply stocker chamber section 7 is shut off.

For this purpose, a valve shaft 13 is attached to the flange portion 13f, and an end of the valve shaft 13 is attached to a cylinder 18 fixed to a base (not shown) via a joint 17. In the above configuration,
When the cylinder 18 is driven up and down, the gate valve device 12 opens and closes. In addition, a linear motion seal 16 is attached in order to always keep the hermetically sealed state between the valve shaft 13 projecting into the atmosphere and the charging chamber section 3 which is hermetically closed so as to be in a vacuum state. The linear motion seal 16 is preferably a commonly used bellows seal or Wilson seal.

When the pressure is reduced to a predetermined pressure by a vacuum device (not shown), the gate valve device 12 is activated and moves to the state shown in the drawing, while the masking plate 11 placed on the table 28 is moved up and down. The state shifts to a state where it rises to the position shown in the figure by the operation of the drive mechanism 20.

The table 28 includes a table shaft 2
1 is attached to the slide plate 24 to which is attached. The table up-down drive mechanism 20 includes a servomotor 29 and a ball screw 26. In the above configuration, when the servomotor 29 is energized, the ball screw 26
Is rotated, the ball screw nut 25 moves up and down, so that the slide plate 24 to which the nut 25 is attached moves up and down, so that the masking plate 11 is raised.

In order to maintain a sealed state between the table shaft 21 protruding into the atmosphere and the supply stocker chamber section 5 sealed in a vacuum, a linear motion seal 23 is provided.
Is attached. The linear seal 23 may be a bellows seal or a Wilson seal, which is generally used.

The masking plate 11 raised by the table vertical drive mechanism 20 is taken out of the
Are taken out one by one and supplied to the delivery unit 8. The delivery unit 8 turns and places the received masking plate 11 on the transport bar 33.

In this way, the masking plates 11 containing the substrates 10 are transferred one by one to the transport unit 2 and
Are sequentially intermittently fed. Then, a desired film is deposited when passing through the process chamber 5 attached to the center of the transfer section 2. After passing through the process chamber 5, the substrate 10 is transferred from the transport unit 2 to the discharge chamber 4 by the discharge side transfer unit 8. The discharge chamber section 4 has substantially the same structure as the input chamber section 3, and a discharge hand (not shown) receives the substrate 101 from the discharge side transfer unit 8, turns, and then masks the table on the storage stocker chamber section 5. The plates 11 are stacked.

FIG. 3 is a cutaway front view of the transport section 2 of the apparatus configuration shown in FIG.
FIG. 4 is a diagram showing a state in which a mark is provided.

In this figure, the chamber 31 of the transfer section 2
Inside, a holding bar 32 and a transport bar 33 are supported so as to be movable in the directions of the arrows in the figure. Guide shafts 35a and 35b are attached to both ends of the transport bar 33. The guide shafts 35a and 35b are supported by the linear guides 34a and 34b so as to be linearly movable with respect to the chamber 31.

Guide shaft 35 projecting into the atmosphere
a, 35b and the transfer unit chamber 11 sealed in a vacuum
Linear seals 33a and 33b are attached to maintain a tight seal therebetween. As the direct acting seals 33a and 33b, bellows seals and Wilson seals, which are generally used, are preferably used.

A connecting bar 38 is rotatably supported on one side of the guide shaft 14a of the pair of guide shafts. At the other end of the connecting bar 38,
The crank lever 37 is rotatably mounted. The crank lever 37 is fixed to the transport lever drive motor 36 with a key (not shown) and a clamp bolt, and the rotational driving force of the motor 36 is applied to the crank lever 3.
7 is transmitted.

In the above configuration, when the transport bar drive motor 36 rotates, the transport bar 33 reciprocates by this link mechanism. Although the link mechanism has been described as an example here, any mechanism that performs a linear motion, such as a ball screw or a rack and pinion, may be used.

Subsequently, while the transport bar 33 is supported so as to be able to reciprocate in the lateral direction as described above,
The holding bar 32 is supported so as to be movable up and down. For this purpose, guide shafts 41a and 41b are attached to both ends of the holding bar 32. Each of the guide shafts 41a and 41b is
a and 40b support the chamber 31 so that it can move linearly.

In order to maintain the hermetic seal between the guide shafts 41a and 41b projecting into the atmosphere and the transfer section chamber 31 sealed in a vacuum, the linear motion seals 39a and 39b are provided.
b is attached. The linear seal is preferably a bellows seal or a Wilson seal, which is generally used.

The cam followers 42a and 42b are rotatably supported at the tips of the guide shafts 41a and 41b. Guide shafts 41a, 41b
Is urged downward by springs 42a and 42b. The cam followers 4 are formed by the springs 42a and 42b.
The reference numerals 2a and 42b abut on the holding bar driving cams 45a and 45b. This holding bar drive cam 45
The holding bar drive motor 47 is operated by the key 47a-1.
a, 47b, so that the rotational force of the holding bar drive motor is transmitted to the holding bar drive cams 45a, 45b. Therefore, the holding bar drive motor 47
When the holding bar 32 is rotated by energizing the a and 47b, the holding bar 32 moves up and down.

In FIG. 3, a pair of guide shafts 41 is shown.
a, 41b, respectively, the holding bar drive motor 4
7a and 47b are attached, but a pair of guide shafts 41a and 41b are connected by a connecting bar or the like, and a cam follower is provided at the center thereof so that the cam is driven up and down by one cam and a motor. Is also possible.

FIG. 4 is a sectional view taken along the line AA of FIG.
The components already described are denoted by the same reference numerals, the description thereof will be omitted, and the description will be limited to different configurations. The direct acting seal is a bellows seal.

To this end, the linear guide 40a is mounted inside the bellows seal, but may be outside the bellows seal. The holding bar 32 is connected to the guide shaft 41a by a shaft connection block 51. The holding bar 32 is attached to the guide shaft 41a at a certain inclination angle Θ. The holding bar 32 has a substantially U-shape as shown in the figure, and a transport bar 33 is arranged between the holding bars 32. Also, the transport bar 3
3 is also attached with the same inclination angle Θ. It is desirable that the inclination angle Θ be an angle that can stably transport the masking plate 11 and that does not affect the film formation.

Next, FIG. 5 shows the substrate 10 and the masking plate 11.
It is a top view which shows the structure of. FIG. 6 is a cross-sectional view of FIG.
It is X sectional view taken on the arrow. In both figures, a circular substrate 10
Is fixed in a state of covering the peripheral area of the outer periphery and being attached to a masking plate 11 for holding the substrate 10 during transport.

Further, an inner peripheral masking plate 9 covering the inner peripheral area of the substrate 10 is attached at the center. On the masking plate 11, pins 11a engaging with the holding bar 32 and pins 11b engaging with the transport bar 33 are provided at vertically symmetric positions. Thereby, the masking plate 1
1 can be used upside down.

Next, FIG. 7 is a plan view of the charging chamber section 3, and FIG. 8 is a sectional view taken along the line AA of FIG. In both figures, the above-described discharge chamber section 4 is also configured in substantially the same manner, so that the description will be omitted and the input chamber section 3 will be representatively described. In both figures, the delivery unit 8
It comprises a delivery block 78a, a turning block 84a, and a drive unit. For this purpose, a turning block 84a is attached below the transfer block 84a for transferring the masking plate 11. This turning block 8
A turning shaft 79a is fixed to 4a, and when the shaft is rotated in the direction of the arrow, the fixed delivery block 78a turns.

In FIG. 7, the revolving shaft 79a is fixed to a magnetic seal unit 80a, and the magnetic seal unit 80a is configured so that the sealing degree of the charging chamber 3 is maintained. On the other hand, one end of the magnetic seal unit 80a is connected to a servomotor 82a via a coupling 81a.

Next, FIG. 9 is a plan view showing details of the take-out hand mechanism. In this figure, a frame-shaped base 5
The pivot shaft 57 is fixed to 6 and is fixed to the first shaft of the double magnetic seal unit 70 shown in FIG. A cam shaft 58 is fixed to the second shaft of the double magnetic seal unit 70. The magnetic seal unit 70 configured as described above is configured to maintain the sealing degree of the charging chamber portion.

The camshaft 58 is rotatably supported by the base 56 by bearings 59 and 60 shown by broken lines, and a bell cam 61 is fixed at a substantially central portion of the camshaft 58.

The fingers 53 and 54 are formed by a pair of rotating shafts 62 implanted in the base 56 and a pair of bearings 63 embedded in the fingers 53 and 54.
6 is rotatably supported. At the ends of the fingers 53 and 54, cam followers 69, which are partially illustrated by broken lines, are provided so as to be rotatable around shafts 68, respectively.

A spring 65 is stretched on the fingers 53 and 54 by a spring hook 64 so that each of the cam followers 69 is driven to contact the contact surface of the bell cam 61. I have. With the configuration described above, the fingers 53 and 54 are configured to open and close as shown in FIG. 9 by the cam lift of the contact surface 61b accompanying the rotation of the bell cam 61.

On the other hand, referring to FIG.
At the distal ends of the bearings 3 and 54, a total of four flanged bearings 67 are provided rotatably around the shaft 66 of the bearings 67, and the flanged bearings 67 allow the edges of the masking plate 11 to move on both sides. It is configured to be clamped from. That is, while the chamfered portion of the masking plate 11 is gripped by the two flanged bearings 67 attached to one finger 53, the masking plate is gripped by the two flanged bearings 67 attached to the finger 54. It is configured to be held from both sides so as to be in contact with the side surface portion 11. By the above operation, the masking plate 11 is
It is configured to be automatically positioned up, down, left, and right by the gripping action of 54.

FIG. 8 is a view showing a state in which the masking plate 11 has been moved to the delivery unit portion of the take-out hand 8.
54 has a Z-shaped cross-sectional shape as shown,
The shape is convenient for moving between the stocker section and the delivery unit.

On the other hand, the delivery block 78a has a substantially U-shape, and in order to be able to turn in the direction of the arrow beyond the inclination angle of the transport bar 33 which is reciprocally driven in the lateral direction as described above. It has a U shape that is deeper than the holding bar 32. The masking plate 11 gripped by the removal hand 8 as described above has a slight gap between the lower surface of the holding bar engaging pin 11b attached to the masking plate 11 and the upper surface of the transfer block 78a. It is held in a positional relationship as possible.

In the above configuration, when the finger portion of the take-out hand 8 is unclamped and the masking plate 11 is released, the holding bar engaging pin 11b falls on the upper surface of the transfer block 78a by its own weight. The delivery of the masking plate 11 is performed.

FIG. 11 is a view showing a state in which the delivery block 78 a is turned to the same angle as the inclination angle of the transport bar 33 and the masking plate 11 is moved to the position of the transport bar 33. FIG. 12 is an external perspective view of the delivery unit and the transport unit.

In both figures, the masking plate 11 is held by the transfer block 78a by gravity. At this time, a slight gap exists between the transfer bar engaging pin 11a of the masking plate 11 and the upper surface of the transfer bar 33. It is held in a positional relationship as possible. Also, the delivery block 78
When “a” is turned to be equal to or larger than the inclination angle of the transport bar 33, the masking plate 11 is delivered to the upper surface of the transport bar 33 as falling.

[Second Embodiment] FIG. 13 is a plan view showing a schematic configuration of a vacuum processing apparatus according to a second embodiment of the present invention. In this figure, the same components as those already described are denoted by the same reference numerals, description thereof will be omitted, and only different components will be described.

First, the first transfer means 90 is for receiving the masking plate 11 holding the substrate 10 from the substrate stocker (not shown) and sending it into the process chamber 5 of the vacuum processing apparatus. Arranged on the right side.

After the second transfer means 100 receives the masking plate 11 holding the substrate 10 from the first transfer means 90 through the opening 151 provided in the chamber 150, the second transfer means 100 turns, For transferring the masking plate 11 to the transfer means 155.

The third transfer means 155 is provided in the chamber 1
The masking plate 11 is received from the second transfer means 100 through the opening 152 provided in the masking means 50, and is turned to the transfer means 2 for transferring the masking plate 1 to the film formation processing chamber 5.
It is configured to pass 1.

The masking plate 11 is successively sent downstream in the direction of the arrow by the transfer action of the transfer unit 2 in the transfer chamber, and after a predetermined film is deposited and generated when passing through the process chamber 5 in FIG. Is configured to be discharged to the outside of the apparatus from the discharge-side conveying means 160, 162, 161, 163 disposed on the left side of the printer.

The two openings 151 of the chamber 150
Reference numeral 152 denotes a sealed space for generating a pressure gradient so as to eliminate the difference between the atmospheric pressure and the pressure required for film formation (the pressure in the transfer chamber), that is, for performing so-called differential exhaust.

This closed space is, for example, a chamber 150
In one of the openings 151, the holding means for holding the masking plate 11 of the first transfer means 90 and the holding means for holding the masking plate 11 of the second transfer means 100 are in contact with the openings 151, respectively. It is composed of

With the above-described configuration, a higher vacuum can be obtained in the same cycle time by increasing the number of conveying means according to the pressure difference, for example, when a higher vacuum is required. become.

Next, FIG. 14 is a sectional view of a main part showing in detail the structure of the second transport means 100 in FIG. In both figures, two holding means 1 are provided in a chamber 150.
01a and 101b are provided, each of which is supported by a swing arm 116. These holding means 10
Reference numerals 1a and 101b each include a finger 104 for holding the masking plate 11 and a flange for fixing the finger. The masking plate 11 is clamped by claws 105 provided on the fingers 104. The flange 102 is held so as to be able to move straight in the direction of the arrow with respect to the swing arm 116, and is guided by a bush 106 attached to the swing arm 116 side.

The flange 102 is connected to the coil spring 10
7 is urged toward the retreating side (moving upward in the drawing). An annular seal 103 is provided on the flange 102 side at a portion where the flange 102 contacts the inner surface of the chamber 150.

On the rear side of the flange 102, a linear drive device 120 is provided with an opening 1 which is the center of the flange 102.
It is attached so as to match the center of 51.

The rear surface of the flange 102 is in contact with the pressing flange 109 via a seal 110 provided on the pressing flange 109 of the linear driving device 120. This pressing flange 109 is the chamber 1
The portion protruding from 50 into the atmosphere is kept hermetically sealed by a linear motion seal 111 as shown. The linear seal 111 is preferably a bellows seal or a Wilson seal, which is generally used.

Further, a connecting flange 112 is provided on the rear surface of the pressing flange 109, and a cylinder 115 fixed to the outside of the chamber 150 by a mounting plate (not shown) is mounted via a joint 114. By driving the cylinder 115 back and forth by supplying a predetermined pressure to the cylinder 115, the pressing flange 109 moves back and forth in the direction of the arrow.

On the other hand, referring to the external perspective view of FIG. 15, a pair of hooking blocks 108 are attached to the rear end of the flange 102 at symmetrical positions. This is because, for example, there is a large pressure difference between the internal pressure of the chamber 150 and the pressure outside the chamber, and when the internal pressure of the chamber 150 is higher, the flange 102 returns only with the restoring force of the spring 107 which is in a compressed state. This is provided in case there is no such information.

For this reason, before the pressing flange 109 is retracted by the action of the cylinder 115, when these hooking blocks 108 are turned in the direction of the arrow, as shown in FIG. By doing so, the flange 102 can be forcibly retracted.

A pump connection port 113 shown by a broken line is attached to the flange 112, and is connected to a vacuum pump via a valve (not shown). Further, a hole that can be sucked by a vacuum pump is provided inside the connection flange 112 as shown by a broken line.

On the other hand, the pressing flange 109 and the flange 102 also have a hollow structure. Finger 10
Similarly, a hole indicated by a broken line penetrates the center portion of No. 4.

In the above configuration, the linear drive mechanism 120
And the pressing flange 109 is moved to the flange 10
2 and the flange 102 is brought into contact with the chamber 150, and then, by opening a valve (not shown), the space in the opening 151 can be pulled by a vacuum pump, and the pressure is reduced to a predetermined pressure. Will be able to do it.

The two holding means 101a, 101b
Is supported by a swing arm 116 so as to be movable in the direction of the arrow. Further, the turning arm 116 is rotatably supported by the turning support member 117 with respect to the chamber 150. A rotary seal 118 is attached to the outside of the chamber 150 to keep the inside of the chamber 150 airtight. Further, a motor 119 is attached to the rotating seal 118,
By turning on the motor 119, the turning arm 116 is turned on.
Is configured to turn.

FIG. 16 is a sectional view of a main part showing a state in which the flange is retracted by the action of the linear driving means 120. In the figure, the same reference numerals are given to the components already described and the description is omitted, and the operation will be described. The flange 102 urged backward by the spring 107 is in contact with the swing arm 116. , And the position on the retreat side is determined. Further, since the stroke of the cylinder 115 is set at a position slightly lower than the stop position, a gap having a dimension δ is formed between the cylinder 115 and the contact surface with the hook block 108. By providing the gap in this way, even if the turning arm 116 turns as described above, it does not interfere with the flange 109f of the pressing flange 109 to collide.

As described above, the holding means for holding the masking plate 11 is provided, and is supported so as to rotate in parallel with one or more openings provided in the chamber for feeding the masking plate 11, Linear drive means movable in the direction perpendicular to the swivel plane to bring the holding means into contact with the opening is provided at the position of the opening, so that even if there is a pressure difference between the two openings, smooth and well-balanced Can be moved.

Further, since the drive source of the linear drive means is provided outside the chamber, the weight of the transfer means can be reduced, and the driving force required for turning can be reduced.

Further, a seal mechanism is not required for the drive source itself, and the seal structure of the drive force transmitting portion can be simplified.

Further, a seal mechanism is provided at a portion where the linear driving means contacts the holding means so that the holding means can seal the opening by the linear driving means, and a sealing mechanism is provided at a portion where the holding means contacts the opening. Since it is equipped, a closed space can be easily created.

Further, since the linear drive means is provided with the pump connection port, the conductance is not deteriorated and the pump capacity can be reduced. Further, the predetermined pressure can be reached in a short time.

[Third Embodiment] The configuration of the vacuum chamber hand according to the present invention will be specifically described below with reference to the accompanying drawings.

FIG. 17 is a plan view of a hand which is a holding means showing a schematic device configuration of the vacuum processing apparatus according to the first embodiment of the present invention.

In this figure, two openings 151 and 152 of the chamber 150 are used for so-called differential exhaust for generating a pressure gradient so as to eliminate the difference between the atmospheric pressure and the pressure necessary for film formation. It becomes a closed space.

For this purpose, the closed space of the chamber 150 has, for example, a holding means for holding the masking plate of the first transfer means and a holding means for holding the masking plate as the second transfer means at one opening 151. Are respectively
It is configured to abut on the opening 151.

Therefore, if a higher vacuum is required according to the pressure difference, for example, if the number of transport means is increased, a higher vacuum can be achieved in the same cycle time.

FIG. 18 is a plan view of the hand.
FIG. 19 is a cross-sectional view taken along line AA of FIG. 18 and shows an unclamped state.

In both figures, the flange 202 is provided with a seal 203 for maintaining the hermeticity when the flange 202 comes into contact with the outer peripheral edges of the openings 151 and 152 of the chamber 150. Further, a finger block 206 that is rotatably supported by a pair of left and right support shafts 207 is attached to the block 204.

These finger blocks 206 include:
Jaws 205a and 205b are attached. A spring 210 is stretched between the two finger blocks by a pair of spring hooks 209, and is configured to bias the jaws 205a and 205b in a direction to close each other.

FIG. 20 is a sectional view taken along the line CC of FIG. FIG. 21 is a sectional view taken along the line BB of FIG.

In both figures, a block 204 is provided with a linear guide bearing 214, and a flange 202 is provided with a guide shaft 213. The block 204 is configured to be movable with respect to the flange 202. .

A spring 215 is attached to the flange 202, and urges the block 204 in the pushing direction. Further, a lid 216 is attached to a portion where the linear guide bearing 214 is attached, thereby preventing dust generated from the guide portion from leaking to the outside.

FIG. 22 shows that two hands are
FIG. 3 is a central cross-sectional view showing a state in which the flange 202 is in contact with each other, and a state in which a flange 202 is in contact with a chamber 150, with a center line interposed therebetween.

In this figure, until the block 204 comes into contact with the contact portion 151 a provided in the opening 151, the jaw 205 is in a clamped state in which the jaw 205 is closed by the spring 210.

On the other hand, when the contact portion 151a and the block 204 come into contact with each other and the hand is further advanced by a distance d, the surface 202a of the flange 202 pushes up the bearing 208 attached to the finger block. That is, the fin fur block 206 is configured to rotate around the support shaft 207, open the jaws 205, and enter an unclamped state.

FIG. 23 is a central sectional view showing a state in which two hands are opposed to the chamber 150 and are in contact with each other.

In this drawing, the two flanges 202 are in contact with each other so as to completely close the opening 151, and the two hands are in the state of unclamping the masking plate 11, respectively. I have.

However, since the masking plate 11 can be supported by the pins 11a and 11b planted on the masking plate 11, it does not fall. Further, since the masking plate 11 is supported from the respective hand sides by the backup pins 217 shown in FIG. 21, it can be prevented from dropping.

Further, from this state, as shown in FIG. 22, when one of the hands starts to retreat, the hand starts clamping, and when it retreats by the distance d, the masking plate 11 is completely clamped. Become. However, at this time, only the flange 202 is retracted, so that the masking plate 11 is held in the opening 151 as before. From this state, when further retreating and retreating more than the distance d, one hand retreats while the masking plate 11 remains clamped, and one hand receives the masking plate 11 held by the other hand, Delivery is completed. [Fourth Embodiment] The substrate transfer carrier and masking member according to the present invention will be specifically described below with reference to the accompanying drawings.

FIG. 24A is a front view showing a schematic structure of a substrate carrying carrier and a masking member. FIG.
4B is a cross-sectional view taken along the line AA in FIG.

In this figure, the circular substrate 10 covers the peripheral area of the outer periphery, and the substrate 10
Is fixed to the masking plate 11 for holding the head by immobilizing, for example, by snapping.

Further, the substrate 10 has an inner peripheral masking plate 9 covering the inner peripheral region, attached at the center by, for example, snap fit.

The masking plate 11 configured as described above
Are provided with pins 11a and 11b that engage with the transport unit. As shown in FIG. 24 (b), when the pair of right and left is supported by the transport unit,
The projections 11a-1 and 11b-1 are partially cut out so as not to fall off. Also, the masking plate 11 and the engaging pins 11a, 11b
Are integrally formed of a polymer material.

Next, FIG. 25 shows a state in which the substrate 10
FIG. 3 is a front view showing a state in which the sheet is conveyed in a substantially horizontal direction while maintaining the posture in a vertical direction so as to be substantially perpendicular to a floor surface. FIG. 26 shows an operation flowchart of the holding bar 32 and the transport bar 33 in the state shown in FIG.

In both figures, the engaging pin 11a is engaged with and held by the holding bar 32 which moves up and down in the direction of the arrow in the figure. The engagement pins 11b are transported so as to engage with the transport bar 33.

In order to convey the sheet, the engaging pins 11
a is engaged with the holding bar 32, and from the held state,
When the holding bar 32 is lowered in step S1, the engaging pin 11b is engaged with the transport bar 33, and the masking plate 11 is placed on the transport bar 33.

Subsequently, the process proceeds to step S2, where the transport bar 33 is advanced by a predetermined stroke, and the masking plate 1 is moved.
1 is conveyed by the stroke. This stroke is set to be the same as the outer dimensions of the masking plate 11. In this way, when the transport bar 33 reaches the forward end, the transport bar 33 stops, and the holding bar 32 moves up in step S3. When the holding bar 32 reaches the rising end in this way, the masking plate 11 is separated from the transport bar 33, and the transport bar 33 returns to the retracted end in step S4 to transport the next masking plate 11. It is determined in step S5 whether or not the above operation has been completed. Thereafter, this operation is repeatedly performed, and the masking plates 11 are sequentially conveyed one by one.

Next, FIG. 27 is a diagram showing an example of the shape of the positioning groove 250 formed on the holding bar 32 by processing. The positioning groove 250a shown in FIG.
It has a V-shape. One of the positioning grooves 250b shown in FIG. 27B is formed by a vertical wall surface, and the other is formed by an obliquely cut slope. And FIG.
The positioning groove 250c shown in FIG. 7 (c) has a symmetrical shape with respect to the positioning groove 250b.

Here, the position of the masking plate 11 conveyed by the conveyance bar 33 and the masking plate 11
Of course, there is some deviation between the positions where the positioning is performed, but by using the positioning groove 250 having the above-described shape, the deviation can be absorbed. Further, the shape of the groove is not limited to the above-mentioned shape, and may be any shape as long as the pin 11a can be held immovably at least in the valley.

FIG. 28 is a front view showing the positional relationship between the stop position of the masking plate 11 transported by the transport bar 33 and the positioning groove 250 provided on the holding bar 32. In the figure, the positioning groove 250 will be described with a V-shape.

The stop position of the masking plate 11 mounted on the transport bar 33 is determined by the positioning center position 250k of the positioning groove 250 provided on the holding bar 32.
Is set to a position shifted to the left by a distance δ. Therefore, when the masking plate 11 transported by the transport bar 33 stops at this position, and then the holding bar 32 rises and the masking plate 11 is lifted up, the masking plate 11 slides on the slope of the positioning groove 250. ,
The vehicle stops at a position shifted to the right by the distance δ.

FIG. 29 is a diagram showing a positional relationship between the masking plate 11A immediately after being put in and the masking plate 11B after being conveyed.

First, FIG. 29A shows a state immediately after the masking plate 11A is put into the transport section by the transport means. FIG. 29B shows a state in which the masking plate 11A (shown by a two-dot chain line) is transferred by the transfer bar 33 at a pitch P of the outer dimensions of the masking plate.
The masking plate 11B shown by the solid line indicates the position of the masking plate after the transfer. At this time, the center position of the engaging pin 11a is shifted by a distance δ from the center position 250k of the positioning groove 250 provided on the holding bar 32. When the holding bar 32 rises from this state, the masking plate 11B slides down the slope of the positioning groove 250 and is positioned at the center position shifted by the distance δ.

FIG. 29C shows the state of the masking plate 11C thus positioned. By the above-described series of operations, the masking plate 11C is placed between the masking plate 11A and the masking plate 11A input to the left.
Will have a gap δ.

Therefore, the next masking plate 11A to be fed into the transport section is the masking plate 1A located next to it.
Since it can be inserted without interfering with 1C, collision can be prevented.

The above operation is substantially the same when the masking plate is discharged downstream of the transport section. That is, assuming that the masking plate 11A is a masking plate sent from the upstream side and the masking plate 11C is located at a position where the masking plate 11C is discharged, the masking plate 11C is at a distance δ from the masking plate 11A on the upstream side as described above. Since it is positioned only at the shifted position, it is possible to discharge without interfering with the masking plate 11A located on the upstream side.

FIG. 30 is a diagram showing the positional relationship between the masking plate and the positioning groove of the holding bar on the upstream side of the transport section.

In this figure, W is the pitch distance between the holding bar engaging pins 11a provided on the masking plate 11 and the valleys of the pair of positioning grooves 250 provided on the holding bar 32. P is a transport pitch having the same dimension as the outer dimension of the masking plate.

First, a pair of positioning grooves 250a for positioning the masking plate 11A and the masking plate 1
The distance between the pair of positioning grooves 250b for positioning 1B is separated by P + α. Thereby, the holding bar 32
The masking plate 11A and the masking plate 11B positioned by the above are separated by a distance α.

Similarly, a pair of positioning grooves 250b for positioning the masking plate 11B and the masking plate 1
The distance between the pair of grooves 250c for positioning 1C is P + β. As a result, the space between the masking plate 11B and the masking plate 11C positioned by the holding bar 32 is separated by the distance β.

On the other hand, the distance between the pair of positioning grooves 250c for positioning the masking plate 11C and the pair of positioning grooves 250d for positioning the masking plate 11D is closer by P-Δ. This distance Δ is set to a dimension tolerance of the outer dimension P ± Δ of the masking plate 11. With this setting, the masking plate 11
Is smaller than P- [Delta], so that no gap is formed between the masking plate 11C and the masking plate 11D even when a smaller one is supplied. On the other hand, when a masking plate 11 having a large outer dimension of P + Δ is inserted, the engaging pin 11a of one of the masking plates is located on the slope of the positioning groove 250, but the masking plate 11C A gap can be prevented from occurring between the masking plate 11D and the masking plate 11D.

Similarly, a gap can be prevented from being formed between the masking plate 11D and the masking plate 11E.

The gap α is a dimension that does not interfere with the adjacent masking plate 11B when the masking plate 11A is inserted, and the engaging pin 11a of the masking plate 11 when the masking plate 11A is transported at the transport pitch P. Any value may be used as long as it is within the groove width of the positioning groove 250. The gap β is the masking plate 11C
Even when all of the outer dimension tolerances of to 102E are the maximum dimension tolerances, any value may be used as long as the masking plate 11C on the left side does not interfere with the adjacent masking plate 11B.

FIG. 31 is a front view showing the positional relationship between the masking plates 11A to 11J over the entire length of the transport section.
In FIG. 30, the upstream side of the transport unit has been described.
The downstream side to discharge the masking plate is the same as the upstream side,
By changing the pitch of a pair of positioning grooves that engage with the masking plate, gaps α and β are created, and the masking plate 1
It is configured not to interfere with the adjacent masking plate 11I when discharging 1J.

The masking plates 11D to 11G being transported at the center are in a state of facing the process chamber, and a film is deposited on the masking plates 11D to 11G. 11G
, The film can be prevented from being deposited on the transport bar 33 and the holding bar 32 located on the rear surface, so that the cleaning work that is frequently performed as in the related art can be eliminated. Become like

FIG. 32 is a plan view of adjacent masking plates 11. FIG. 33 shows the masking plates 11 adjacent to each other.
It is an enlarged view of the contact part of FIG. In both figures, the outer part perpendicular to the direction in which the masking plate 11 is conveyed is a parallelogram inclined by an angle A with respect to the substrate surface F.

In the outer portion of the masking plate 11, burrs 1
If there is a deformation due to 1k or sink during molding, the adjacent masking plates 11 have a gap S without being in close contact. The opening H1 formed on the film deposition surface F due to such a gap S and the opening H2 formed on the back side are shifted by a distance L1. That is, even if the opening H1 is formed on the film forming surface F side, the film component attached from the opening H1 is optically shadowed on the transport unit side on the back side, so that an unnecessary film hardly adheres to the transport member. .

As described above, in the film forming space, the outer shapes in the vertical direction of the adjacent masking plates 11 overlap each other, and the maximum value L2 of the overlapping amount is as shown in FIG.
It is set to a value smaller than α shown by 1.
By setting as described above, it is possible to perform input and output without interfering with the adjacent masking plate 11 in the input section 3 and the output section 4 of the masking plate 11. FIG. 34 is a front view showing another embodiment.

In this drawing, adjacent masking plates 11
Is formed in a stepped shape as shown in the figure, and is formed such that adjacent masking plates 11 are nested with each other. Also in this case, the film formation surface F
The opening H1 formed on the side and the opening H2 formed on the back side are shifted by a distance L1. In other words, even if the opening H1 is formed on the film forming surface F side, the film component adhering therefrom becomes optically shadowed on the back side of the conveying unit, so that an unnecessary film hardly adheres to the conveying member. Can be.

The protrusion amount L2 for forming the step is shown in FIG.
It is set to a value smaller than α shown by 1.
Thus, the input and output portions of the masking plate 11 can be input and output without interfering with the adjacent masking plates. Fifth Embodiment FIG. 35 is a plan view showing a schematic configuration of a vacuum processing apparatus. FIG. 36 is a sectional view taken along a line AA in FIG.
FIG. 2 is a front view as viewed in the direction of an arrow, in which main parts are cut away to show the configuration of a transport unit.

In both figures, the same components as those already described are denoted by the same reference numerals, and description thereof will be omitted. The following describes the different components. 5 is attached. Substrate 10
Is held and conveyed by a masking plate 11 that masks an outer peripheral region of the substrate 10.

The transfer section 2 and the process chamber 5 as a film forming section have a hermetically sealed structure so as to form a vacuum space at a degree of vacuum necessary for film formation.

At the entrance of the transfer section 2, a charging chamber 3 for charging the masking plate 11 is attached. A gate valve 305 is provided before and after the charging chamber 3.
a, 305b are attached. The atmosphere side gate valve 305 a is opened, the masking plate 11 is loaded into the charging chamber 3 by charging means (not shown), and is held by the hand 308.

When the atmosphere-side gate valve 305a is closed, the charging chamber 3 is evacuated by a vacuum pump (not shown) until it reaches the same vacuum level as the transfer section 2. When the degree of vacuum is reached, the transfer side gate valve 305b is opened, and the masking plate 11 is transferred to the transfer section 2 by the input arm 306.

The transport section 2 includes a pair of drive pulleys 322
a, 322b and the endless wires 321a, 321b hung between the driven pulleys 323a, 323b, and the drive side idle pulleys 324a, 324b, 325.
a, 325b and driven idle pulleys 326a, 326b
26b, 327a and 327b.

The masking plate 11 holding the substrate 10
The endless wire 32 has an engaging portion protruding on the rear surface side of the substrate and is held by the input arm 306 and the hand 308.
Multiplied by one.

When the masking plates 11 are transferred one by one to the transport section 2, they are sequentially intermittently fed by the transport section 2. Process chamber 5 attached to the center of transfer unit 2
When passing through, a desired film is formed on the masking plate 11.

The masking plate 11 that has passed through the process chamber 5 is transported to the outlet, and the outlet of the transport unit 2 is provided with a discharge chamber 4 for discharging the masking plate 11.

When the transfer side gate valve 305b is opened, the discharge arm 307 moves forward, and the masking plate 11 on the endless belt is held by the hand 308 attached to the end of the discharge arm 307, and the discharge arm 307 moves backward. The masking plate 11 is transferred from the transfer section 2 to the discharge chamber 4.

Next, the transfer side gate valve 305b is closed, and the inside of the discharge chamber 4 is returned to the atmospheric pressure. When the inside of the discharge chamber 4 is returned to the atmospheric pressure, the atmosphere-side gate valve 305a is opened and transferred by a transfer means (not shown).

As described above, the substrates 10 held by the masking plate 11 are loaded one by one and sequentially intermittently fed, and after passing through the process chamber 5, a desired film is formed. It is configured to be discharged one by one.

The transport section 2 has a closed structure by the chamber 11. The drive pulley 322 has a shaft end protruding from the chamber 311 into the atmosphere in order to transmit a driving force of a motor or the like as a driving source. A shaft end protruding into the atmosphere and a transfer unit chamber 31 sealed in vacuum
A rotating seal 328 is attached to maintain the seal between the two. The rotary seal 328 may be a magnetic seal or a Wilson seal that is generally used. Further, a motor 330 is connected to a shaft end of the rotary seal via a coupling 329. The masking plate 11 hung on the endless wire 321 is sequentially conveyed, passes through the process chamber 5, and a desired film is formed.

A pair of endless wires 321a, 321
1b is arranged at a distance d in the vertical direction. The wire 321a located above is the masking plate 1
It functions as a wire for transporting the masking plate 11 by engaging with one of the engagement pins 11a. Further, the wire 321b located below supports the lower portion of the masking plate 11 to prevent the masking plate 11 from rotating during conveyance.

The endless wire 321a is guided downward by the idle pulley 324a, and further guided to the driven side by the idle pulley 325a. The wire 321a returned to the driven side is guided upward by the idle pulley 325a, and further guided to the driven pulley 323a by the idle pulley 327a.

Similarly, the endless wire 321b is guided downward by the idle pulley 324b. However, in order to avoid interference with the endless wire 321a, the distance L
It is guided to the driven side two spaces apart.

As described above, when the masking plate 11 passes through the process chamber 5, the masking plate 11 is viewed from both sides of the film formation, and the endless wires 321a, 32
1b is shadowed by the masking plate 11, so that it can be prevented from being present outside the masking plate 11. The endless wires 321a and 321b pass through the lower part of the process chamber 5 when returning to the driven side after the masking plate 11 is conveyed.

Next, FIG. 37 (a) is a diagram showing the configuration of the substrate 10 and the masking plate 11, and FIG. 37 (b) is a sectional view taken along the line AA of FIG. 37 (a).

In the figure, the circular masking plate 11
Is fixed to a masking plate 11 for covering the peripheral area of the outer periphery thereof and holding the substrate 10 during transport.

The masking plate 11 is provided with an inner peripheral masking plate 9 at the center, which covers the inner peripheral region. The masking plate 11 is provided with a pin 11a that engages with the endless wire 321.
The pair of left and right engagement pins 11a is
Supported by 1. Also, the engaging pin 11a forms a projection 11a-1 in which a contact surface with the wire is partially cut away so as not to come off the endless wire 321. The masking plate 11 and the engaging pin 11a are integrally formed of a polymer material.

FIG. 38 is a view of the masking plate 11 and the endless wires 321a and 321b as viewed from the transport direction.

In this figure, the engaging pin 11a of the masking plate 11 is engaged with the endless wire 321a. The endless wire 321a is a wire sent in the transport direction. In addition, endless wire 3
21b supports the lower portion of the masking plate 11 to prevent the masking plate 11 from rotating during conveyance.

With the above-described configuration, since the return wire does not exist in the film formation space, it is possible to prevent an extra film from being deposited. Also, masking plate 1
It is possible to eliminate interference when attaching / detaching 1 to / from the endless wire 321.

As described above, according to the present invention,
By providing the transfer means, the substrate can be transferred in the vertical direction, and the substrate transfer means can clamp the masking plate in the left-right direction, so that dust generated from the mask member and the holding means can be removed from the substrate. A desired film can be deposited on a substrate without being dropped on a surface, and a substrate transfer device in a vacuum processing apparatus for obtaining a high-quality film can be obtained.

Further, according to the present invention, there is provided a holding means for holding the substrate, and the linear driving means for bringing the holding means into contact with one or more openings provided in the chamber for feeding the substrate. Since the holding operation is performed, the substrate can be transferred without requiring any special mechanical means and without complicating the apparatus.

Further, since the substrate is held by the mask means for covering the central and peripheral regions, an action for holding the substrate by the holding means can be applied to the mask means. It can be held without damage.

Further, according to the present invention, by using an endless wire, the device is not complicated,
Stable transport can be performed, and since the members of the transport unit are not exposed at the time of film formation, an unnecessary film does not adhere, clean transport can be performed, and maintenance can be eliminated.

Further, since the wire is used, the traveling direction of the wire can be freely changed by the idle pulley. Therefore, by disposing the position of the wire on the return side with the idle pulley below the film forming unit, an extra film does not adhere to the wire, clean transfer can be performed, and maintenance is not required. be able to.

Further, since the holding member also serves as a masking plate for the substrate, the cost of the apparatus can be reduced.

Further, by manufacturing the holding member from a polymer material, the engaging means provided on the holding member can be integrally formed. Unlike machining, it can be manufactured by injection molding or the like. Even a complicated shape can be manufactured at low cost. Also, since the cost of parts is lower than that of a metal-processed masking plate, the cost of the masking plate can be reduced even when disposable. Also,
Since the weight of the holding member can be reduced, even a low-rigidity and inexpensive one such as a wire can be used.
The device can be inexpensive.

By using such a holding member, an inexpensive and high-quality film can be obtained.

Further, according to the present invention, the object to be film-formed can be sequentially sent from the outside of the apparatus to the vacuum chamber and the film formation processing chamber without complicating the apparatus, and the predetermined vacuum pressure can be obtained in a short time. Can be provided.

Further, according to the present invention, the ridge line in contact with the adjacent substrate carrying carrier and masking member in the vertical direction, in which the ridge line in contact with the film-forming surface and the ridge line in contact with the back surface, are aligned with the carrying direction. Therefore, the film is formed so as to be relatively shifted by a certain distance, so that an unnecessary film does not adhere to the conveying member.

As a result, the number of maintenance cycles for removing unnecessary films can be significantly reduced.

Further, by manufacturing the holding member from a polymer material, the engaging means provided on the holding member can be integrally formed. Unlike the mechanical descent, the holding member can be manufactured by injection molding or the like. Even a complicated shape can be manufactured at low cost. In addition, since the cost of parts is lower than that of a metal-processed mask, the cost for the mask can be reduced even when disposable.

By using such a holding member, an inexpensive and high-quality film can be obtained.

[0197]

[Brief description of the drawings]

FIG. 1 is a plan view showing a schematic configuration of a vacuum processing apparatus according to a first embodiment of the present invention.

FIG. 2 is a cross-sectional view taken along the line XX of FIG. 1, and is a front view showing a configuration of a charging chamber unit.

3 is a cross-sectional plan view showing a main part of the transport unit 2 in FIG. 1 in a cutaway manner.

FIG. 4 is a sectional view taken along the line AA of FIG. 3;

FIG. 5 is a plan view showing a configuration of a substrate 10 and a masking plate 11.

FIG. 6 is a sectional view taken along line XX of FIG. 5;

FIG. 7 is a plan view of a main part of the charging chamber section, which is cut away.

8 is a cross-sectional view taken along the line AA of FIG. 7, and is a detailed view of a take-out hand.

FIG. 9 is a plan view of a take-out hand.

FIG. 10 is a cross-sectional view taken along the line XX of FIG.
FIG. 4 is a diagram showing a state where the is turned.

11 is a view showing a state in which the delivery block 78a has turned to the inclination angle of the transport bar 33 and the masking plate 11 has been moved to the position of the transport bar 33. FIG.

FIG. 12 is an external perspective view of a delivery unit and a transport unit.

FIG. 13 is a view showing a schematic apparatus configuration of a vacuum processing apparatus according to a second embodiment of the present invention.

FIG. 14 is a detailed drawing of a second conveying means in FIG.

15 is an external perspective view of a flange 109. FIG.

FIG. 16 is a fragmentary cutaway view showing a state where the flange 109 is retracted by the linear driving means 120.

FIG. 17 is a plan view of a hand which is a holding means showing a schematic device configuration of a vacuum processing hand according to a third embodiment of the present invention.

FIG. 18 is a bottom view of the hand.

FIG. 19 is a sectional view taken along the line AA of FIG. 18;

20 is a sectional view taken along the line CC of FIG.

FIG. 21 is a sectional view taken along the line BB of FIG. 18;

FIG. 22 is a cross-sectional view compositely showing a state in which two hands face and are in contact with the chamber 150, and a state before the flange 202 comes into contact with the chamber 150.

FIG. 23 is a view showing a state in which two hands face the chamber 150 and are in contact with each other.

FIG. 24A is a plan view of a masking plate 11 according to a fourth embodiment. (B) is a sectional view taken along the line AA of (a).

FIG. 25 is a front view showing a state in which the sheet is conveyed in a substantially horizontal direction by a conveyance unit.

FIG. 26 is an operation flowchart of the holding bar 32 and the transport bar 33.

FIG. 27 shows a positioning groove 25 provided on a holding bar 32.
It is a figure which shows the example of a shape of 0.

FIG. 28 is a front view illustrating a positional relationship between a stop position of a masking plate that has been transported and a positioning groove provided on a holding bar.

FIG. 29 is a front view showing the positional relationship between the input masking plate and the masking plate after conveyance.

FIG. 30 is a diagram illustrating a positional relationship between a masking plate and a positioning groove of a holding bar on an upstream side of a transport unit.

FIG. 31 is a diagram illustrating a positional relationship of a masking plate over the entire length of a conveyance unit.

FIG. 32 is a plan view of adjacent masking plates 11;

FIG. 33 is an enlarged view of a contact portion between adjacent masking plates 11;

FIG. 34 is a diagram showing another embodiment.

FIG. 35 is a plan view illustrating a schematic configuration of a vacuum processing apparatus according to a fifth embodiment.

FIG. 36 is a cross-sectional view taken along the line AA of FIG. 35, and is a rear view showing the configuration of the transport unit.

37A is a plan view of the substrate 10 and the masking plate 11, and FIG. 37B is a cross-sectional view taken along line AA of FIG.

FIG. 38 is a front view of the transport unit.

FIG. 39 is a cross-sectional view of a main part showing a conventional configuration example of a charging chamber section.

FIG. 40 is a plan view showing a conventional example of a take-out hand.

FIG. 41 is a side view of a conventional take-out hand.

FIG. 42 is a view showing a partial cross section of a side surface of a take-out hand of a conventional example.

FIG. 43 is a fragmentary sectional view showing a conventional configuration example.

FIG. 44 is a view showing another conventional conveying means.

FIG. 45 is a plan view showing a conventional configuration example.

FIG. 46 is a plan view of the masking plate in FIG. 45;

FIG. 47 is a cutaway view showing a conventional configuration example.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Vacuum processing apparatus 2 Transport part 3 Input chamber 4 Discharge chamber 5 Process chamber 6 Door 7 Lid supply stocker chamber 9 Inner peripheral mask plate 10 Substrate 11 Masking plate 32 Holding bar 33 Transport bar 34a, 34b Linear guide 35a, 35b Transport Bar guide shaft 36 Transport bar drive motor 37 Crank lever 38 Connecting bar 39a, 39b Linear seal 40a, 40b Linear guide 41a, 41b Transport bar guide shaft 42a, 42b Cam follower 45a, 45b Holding bar drive cam 46a, 46b Drive motor mounting Plates 47a, 47b Holding bar drive motors 50a, 50b Seal / guide mounting spacers 51 Shaft connection block 90 Supply-side first transfer means 91a, 91b Holding means 100 Supply-side second transfer Means 101a, 101b Holding means 102 Flange 103 Seal 104 Finger 105 Claw 106 Bush 107 Spring 108 Hook block 109 Pressing flange 110 Seal 111 Linear seal 112 Connection flange 113 Pump connection port 114 Joint 115 Cylinder 116 Swivel arm 117 Swivel support member 118 Rotary seal 119 Motor 120 Linear driving means 150 Chamber 151 Opening 152 Opening 202 Flange 203 Seal 204 Block 205 Claw 206 Finger block 207 Support shaft 208 Bearing 209 Spring hook 210 Spring 211 Pin 212 Pin 213 Guide shaft 214 Linear guide bearing 215 Spring 216 Lid 217 Backup pin 218 Spring 30 a Atmospheric-side gate valve 305b Transfer-side gate valve 306 Input arm 307 Discharge arm 308 Hand 311 Transfer section chamber 321 Endless wire 322 Drive pulley 323 Driven pulley 324 Idle roller 325 Idle roller 326 Idle roller 327 Idle roller 328 Rotary seal 329 Coupling 330 motor

Claims (15)

[Claims] 1. A masking plate on which a substrate has been set is continuously supplied from the atmosphere into a reduced-pressure charging chamber, and the masking plate is transferred to a transfer unit communicating with the reduced-pressure charging chamber, and then is transferred onto the surface of the substrate. A vacuum film forming process apparatus configured to continuously transfer the inside of a process chamber for forming a predetermined film, and to take out the masking plate from a reduced pressure discharge chamber communicating with the transfer unit to the outside, wherein A first storage unit that is provided in the storage unit and temporarily stores a plurality of the masking plates and moves up and down to a take-out position; and grips both side portions of the masking plate from the first storage unit with a holding unit. First transfer means for removing the masking plate one by one from the first storage means and supplying the masking plate upstream of the transport unit A transporting means for transporting the masking plate in the process chamber while keeping the masking plate in a substantially upright posture; and A second transfer means disposed in the reduced-pressure discharge chamber for taking out one by one from the transfer means, and temporarily storing a plurality of the masking plates disposed in the reduced-pressure discharge chamber. And a second storage means that moves up and down to a receiving position to perform the process. 2. The method according to claim 1, wherein the process chamber is a CVD apparatus, the substrate is a substrate for a magneto-optical disk, and an inner peripheral masking plate is further set at a center hole. Vacuum film forming process equipment. 3. The gripping part of the first transfer means receives the masking plate in a substantially horizontal state from the first storage means and tilts the masking plate at a predetermined inclination angle or more with respect to the transport part. 2. The vacuum film forming process apparatus according to claim 1, wherein the apparatus is transferred to the transfer unit after the transfer. 4. The vacuum film forming process apparatus according to claim 1, wherein the masking plate is integrally provided with an engaging portion that engages with the transfer unit. 5. A masking plate on which a substrate has been set is continuously supplied from the atmosphere into a reduced-pressure charging chamber, and the masking plate is transferred to a transfer unit communicating with the reduced-pressure charging chamber. A vacuum film forming process apparatus configured to continuously transfer the inside of a process chamber for forming a predetermined film, and to take out the masking plate from a reduced pressure discharge chamber communicating with the transfer unit to the outside, comprising a pair of openings. A first reduced-pressure charging chamber having the first reduced-pressure charging chamber, the first reduced-pressure charging chamber being provided in communication with the first reduced-pressure charging chamber through one of the openings, and the inside of the process chamber while maintaining the masking plate in a substantially upright posture. A second reduced-pressure charging chamber provided in communication with the transporting means for transporting, and one opening of the first reduced-pressure charging chamber; A first transfer means for supplying the masking plate to the first pressure-reducing chamber, the first transferring means being provided in the first reduced-pressure charging chamber, and the first transferring means is turned between the pair of openings, and A first transfer unit that grips both side portions of the masking plate supplied to the opening by a gripper and moves to the other opening, and is disposed in the second decompression charging chamber; While being pivotally driven between the other opening and the upstream side of the transporting unit, both sides of the masking plate supplied to the other opening are gripped by a gripping unit and moved to the upstream side. A vacuum film forming process apparatus comprising: a second transfer unit for mounting. 6. A first transfer means for supplying the masking plate to one opening of the first decompression / evacuation chamber, wherein: The masking plate supplied to the one opening is gripped by gripping portions and moved to the other opening while being pivotally driven between the pair of openings. A first transfer unit, which is disposed in the second decompression and exhaust chamber and is driven to rotate between the other opening and the upstream side of the transport unit, and the other opening is 6. A vacuum transfer device according to claim 5, further comprising a second transfer means for holding both side portions of the masking plate supplied to the upper side by a holding portion and transferring the same to the upstream side. Membrane process equipment. 7. The first transfer means and the second transfer means, wherein a linear drive means movable in a direction perpendicular to a turning plane for contacting the opening is provided. The vacuum film forming process apparatus according to claim 5, wherein 8. The vacuum film forming process apparatus according to claim 6, wherein a driving source of the linear driving means is provided outside the reduced pressure charging chamber or the reduced pressure discharging chamber. 9. The vacuum film forming process apparatus according to claim 7, further comprising a sealing mechanism for sealing said opening by said linear driving means. 10. The vacuum film forming process apparatus according to claim 7, wherein a connection port to a vacuum pump is provided in said linear driving means. 11. A masking plate on which a substrate is set is continuously supplied from the atmosphere into a reduced-pressure charging chamber, and the masking plate is transferred to a transfer unit communicating with the reduced-pressure charging chamber. A vacuum film forming process apparatus configured to continuously transfer the inside of a process chamber for forming a predetermined film, and to take out the masking plate from a reduced pressure discharge chamber communicating with the transfer unit to the outside, comprising a pair of openings. A first reduced-pressure charging chamber having the first reduced-pressure charging chamber, the first reduced-pressure charging chamber being provided in communication with the first reduced-pressure charging chamber through one of the openings, and the inside of the process chamber while maintaining the masking plate in a substantially upright posture. A second depressurized charging chamber provided in communication with the conveying means for conveying, and one opening of the first depressurized charging chamber A first transfer means for supplying the masking plate to the first pressure-reducing chamber; and a first transfer means for supplying the masking plate to the first pressure-reducing chamber. A first transfer means for gripping both side portions of the masking plate supplied to the opening by the gripping portion and moving the masking plate to the other opening; Is swiveled between the other opening and the upstream side of the transporting unit, and grips both side portions of the masking plate supplied to the other opening by a gripping unit and moves to the upstream side. And a second transfer means for transferring, wherein the first transfer means and the second transfer means comprise a linear drive means, and the linear drive means drives the linear transfer means. Each of the gripping portions is formed in the opening formed in the opening. By abutment against parts, vacuum film forming process apparatus being characterized in that configured to perform the grasping operation. 12. A masking plate on which a substrate is set is continuously supplied from the atmosphere into a reduced-pressure charging chamber, and the masking plate is transferred to a transfer unit communicating with the reduced-pressure charging chamber. In a transfer carrier and a masking member for a vacuum film forming process apparatus configured to continuously transfer the inside of a process chamber for forming a predetermined film and to take out the masking plate from the reduced pressure discharge chamber communicating with the transfer unit to the outside, A mask that holds the substrate in a vertical position, has an engagement portion that protrudes to the rear surface side of the substrate, and engages with a transport unit that transports a carrier / masking member, and covers an outer peripheral edge of the substrate. Transporting and masking member having a portion, in a vertical direction at a portion in contact with adjacent masking members A substrate for a vacuum film forming process apparatus, wherein the ridge line contacting on the film forming surface side and the ridge line contacting on the back side of the outer portion are formed so as to be relatively displaced by a predetermined distance with respect to the transport direction. Carrier carrier and masking member. 13. The substrate carrier according to claim 12, wherein the masking member is formed such that the engaging portion and the main body are integrally formed of a polymer material. Also a masking member. 14. A masking plate on which a substrate is set is continuously supplied from the atmosphere into a reduced-pressure charging chamber, and the masking plate is transferred to a transfer unit communicating with the reduced-pressure charging chamber, and then is transferred onto the surface of the substrate. A vacuum film forming process apparatus configured to continuously transfer the inside of a process chamber for forming a predetermined film, and to take out the masking plate from a reduced pressure discharge chamber communicating with the transfer unit to the outside. In order to hold the masking plate in the vertical position, a substrate main body having an engaging portion protruding from the back surface side of the masking plate and arranged in a pair of left and right sides, supporting the engaging portion, at least An endless wire supported by at least one pair of rollers, and at least one pair of the endless wires are arranged in a substantially vertical direction so as to be continuously conveyed. A vacuum film forming process apparatus characterized by comprising: 15. The vacuum film forming apparatus according to claim 14, wherein the endless wire is arranged such that a wire in a return direction is located below a wire in a feed direction by at least one pair of idle rollers. Process equipment.