JPH10154456A - Micro-relay, manufacture and control method therefor - Google Patents

Micro-relay, manufacture and control method therefor

Info

Publication number
JPH10154456A
JPH10154456A JP31344496A JP31344496A JPH10154456A JP H10154456 A JPH10154456 A JP H10154456A JP 31344496 A JP31344496 A JP 31344496A JP 31344496 A JP31344496 A JP 31344496A JP H10154456 A JPH10154456 A JP H10154456A
Authority
JP
Japan
Prior art keywords
movable contact
contact piece
base
micro relay
face
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP31344496A
Other languages
Japanese (ja)
Inventor
Hiroshi Goto
博史 後藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Omron Corp
Original Assignee
Omron Corp
Omron Tateisi Electronics Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Omron Corp, Omron Tateisi Electronics Co filed Critical Omron Corp
Priority to JP31344496A priority Critical patent/JPH10154456A/en
Publication of JPH10154456A publication Critical patent/JPH10154456A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H59/00Electrostatic relays; Electro-adhesion relays
    • H01H59/0009Electrostatic relays; Electro-adhesion relays making use of micromechanics
    • H01H2059/0081Electrostatic relays; Electro-adhesion relays making use of micromechanics with a tapered air-gap between fixed and movable electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H59/00Electrostatic relays; Electro-adhesion relays
    • H01H59/0009Electrostatic relays; Electro-adhesion relays making use of micromechanics

Landscapes

  • Micromachines (AREA)

Abstract

PROBLEM TO BE SOLVED: To decrease the driving voltage and increase the withstand pressure by forming the upper face of a base cantilever, supporting a moving contact piece contacted to or separated from driving electrodes into a slant face, so that the facing distance is increased from the base section of the moving contact piece toward the free end. SOLUTION: Drive electrodes 19, 20 are provided in parallel outside printed wires 15, 16 connected to fixed contact points 13, 14, provided below an insulating film-covered slant face 12 formed on one side on a base 10 such as a single- crystal silicon substrate. A springy moving contact piece 30, cantilever-supported on the base 10 is preferably made of a single-crystal silicon material having a nearly U-shaped plane, and a moving contact point 31 made of a thin metal film is formed at the center of the lower face via an insulating film. The slant face 12 is preferably formed into a curved face or a taper face, and the contact separation is set to 30-50μm. The moving contact piece 30 is deformed by the applied voltage between the electrodes 19, 20, conduction is finally attained by the contact between the fixed contact points 13, 14 and the moving contact point 31, and since a base section is initially abutted against the slant face 12 having a short distance, low voltage is sufficient for the operation.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はマイクロリレー、特
に、静電引力を利用する可動接触片の駆動機構に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a microrelay, and more particularly to a drive mechanism for a movable contact piece utilizing electrostatic attraction.

【0002】[0002]

【従来の技術】従来、マイクロリレーとしては、電磁力
を駆動源とする電磁型、熱膨張を利用するサーマル型、
および、静電引力を駆動源とする静電型などが提案され
ている。電磁型は磁性材部品,コイルの小型化が困難で
あるだけでなく、小型化するにつれて磁気力が著しく低
下するため、効率の良いものが得られなかった。また、
サーマル型では可動接触片を急速に冷却することが容易
でないので、開閉動作の高速化が困難である。さらに、
熱膨張,収縮を繰り返すため、可動接触片が疲労しやす
く、信頼性が低い。これに対し、静電型は消費電力が少
ないだけでなく、構造が簡単であり、応答性にも優れて
いるので、リレーの小型化に有利な駆動方式である。
2. Description of the Related Art Conventionally, as a micro relay, an electromagnetic type using electromagnetic force as a driving source, a thermal type using thermal expansion,
An electrostatic type using electrostatic attraction as a driving source has been proposed. In the electromagnetic type, not only is it difficult to reduce the size of the magnetic material parts and coils, but also the magnetic force is significantly reduced as the size is reduced, so that an efficient type cannot be obtained. Also,
Since it is not easy to rapidly cool the movable contact piece in the thermal type, it is difficult to speed up the opening and closing operation. further,
Since the thermal expansion and contraction are repeated, the movable contact piece is easily fatigued and has low reliability. On the other hand, the electrostatic type is not only low in power consumption but also simple in structure and excellent in responsiveness.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、静電引
力を駆動源とする従来の方式では、所望の接点圧を得よ
うとすると、数百ボルトという高い駆動電圧を必要とす
る。一方、駆動電圧を低くしようとすると、可動接触片
を駆動電極に近づけなければならない。このため、所望
の接点間距離を確保できず、耐圧が低い。この結果、所
望の接点圧および耐圧を同時に確保できないという問題
点がある。
However, in the conventional method using electrostatic attraction as a driving source, a high driving voltage of several hundred volts is required to obtain a desired contact pressure. On the other hand, to lower the drive voltage, the movable contact piece must be brought closer to the drive electrode. For this reason, a desired inter-contact distance cannot be secured, and the withstand voltage is low. As a result, there is a problem that desired contact pressure and withstand voltage cannot be simultaneously secured.

【0004】本願発明は、前記問題点に鑑み、駆動電圧
が低く、かつ、耐圧が高い静電型マイクロリレーを提供
することを目的とする。
[0004] In view of the above problems, an object of the present invention is to provide an electrostatic microrelay having a low driving voltage and a high withstand voltage.

【0005】[0005]

【課題を解決するための手段】本発明にかかるマイクロ
リレーは、前記目的を達成するため、ベースの上面に片
持支持した可動接触片の自由端部下面に可動接点を設け
る一方、前記ベースの上面に、前記可動接点に接離可能
に対向する一対の固定接点と、前記可動接触片に接離可
能に対向する駆動電極とを設けたマイクロリレーにおい
て、前記ベースの上面を、前記可動接触片との対向距離
が可動接触片の基部から自由端部にかけて増大する傾斜
面とした構成としてある。
In order to achieve the above object, a micro relay according to the present invention has a movable contact provided on a lower surface of a free end portion of a movable contact piece cantilevered on an upper surface of a base while a movable contact is provided on the lower surface of the base. In a microrelay provided on a top surface with a pair of fixed contacts that are detachably opposed to the movable contact and a drive electrode that is detachably opposed to the movable contact piece, the upper surface of the base is placed on the movable contact piece. The distance between the movable contact piece and the movable contact piece increases from the base to the free end.

【0006】前記ベースの傾斜面は曲面あるいはテーパ
面であってもよい。また、前記可動接触片は平面略U字
形であってもよい。
[0006] The inclined surface of the base may be a curved surface or a tapered surface. Further, the movable contact piece may be substantially U-shaped in plan view.

【0007】前記可動接触片は単結晶シリコン材から形
成してもよい。また、前記可動接触片を減圧した密封空
間内で駆動してもよい。
[0007] The movable contact piece may be formed of a single crystal silicon material. Further, the movable contact piece may be driven in a reduced-pressure sealed space.

【0008】さらに、ベースの傾斜面に固定接点を設け
たマイクロリレーにおいて、単結晶シリコン基板の上面
を複数回のエッチング処理で階段状とした後、等方性エ
ッチングで段差を消失させて前記ベースに滑らかな傾斜
面を形成してもよい。
Further, in the micro relay having a fixed contact provided on the inclined surface of the base, the upper surface of the single-crystal silicon substrate is stepped by a plurality of etching processes, and then the step is eliminated by isotropic etching to remove the step. Alternatively, a smooth inclined surface may be formed.

【0009】そして、可動接触片を静電引力で厚さ方向
に駆動し、接点を開閉するマイクロリレーにおいては、
前記可動接触片の駆動電圧が、可動接触片の固有振動数
以下の周波数であることが好ましい。
In a micro relay that opens and closes a contact by driving a movable contact piece in a thickness direction by electrostatic attraction,
It is preferable that the driving voltage of the movable contact piece has a frequency equal to or lower than the natural frequency of the movable contact piece.

【0010】[0010]

【発明の実施の形態】次に、本発明にかかる実施形態を
図1ないし図5の添付図面に従って説明する。第1実施
形態にかかるマイクロリレーは、図1および図2に示す
ように、ベース10に可動接触片30を片持支持したも
のである。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, an embodiment according to the present invention will be described with reference to the accompanying drawings of FIGS. As shown in FIGS. 1 and 2, the micro relay according to the first embodiment has a movable contact piece 30 supported on a base 10 in a cantilever manner.

【0011】ベース10は、単結晶シリコン基板11か
らなるものであり、その上面片側に傾斜面12が形成さ
れている。この傾斜面12の下方縁部近傍に一対の固定
接点13,14が並設され、これらはプリント配線1
5,16を介して入出力用外部接続端子17,18にそ
れぞれ接続されている。さらに、前記プリント配線1
5,16の外側に並設した一対の駆動電極19,20が
プリント配線21を介して駆動用外部接続端子22に同
電位となるように接続されている。なお、ベース10の
傾斜面12は必ずしも曲面である必要はなく、単なるテ
ーパ面であってもよい。また、傾斜面12の段差は、例
えば、耐圧を考慮すれば、接点間距離が30ないし50
ミクロンとなるようにしておくことが好ましい。
The base 10 is made of a single-crystal silicon substrate 11, and has an inclined surface 12 formed on one side of the upper surface. Near the lower edge of the inclined surface 12, a pair of fixed contacts 13 and 14 are arranged side by side.
They are connected to input / output external connection terminals 17 and 18 through 5 and 16, respectively. Further, the printed wiring 1
A pair of drive electrodes 19, 20 arranged side by side outside 5, 16 are connected to a drive external connection terminal 22 via a printed wiring 21 so as to have the same potential. In addition, the inclined surface 12 of the base 10 does not necessarily need to be a curved surface, and may be a simple taper surface. In addition, the step between the inclined surfaces 12 is, for example, 30 to 50 in consideration of the withstand voltage.
It is preferable that the diameter be set to microns.

【0012】前記ベース10を製造する方法としては、
例えば、図2(a)ないし図2(e)に示すように、単
結晶シリコン基板11の上面にエッチングマスク23を
適宜形成し、エッチング処理を複数回繰り返して階段状
表面を形成する多段エッチングを施した後、この階段状
表面の段差をフッ素等の溶液で消失させ、滑らかにする
シリコン等方性エッチングを施して傾斜面12を形成す
る方法がある。そして、この傾斜面12を絶縁膜で被覆
した後、この絶縁膜の表面に固定接点13,14、駆動
電極19,20等のパターニングを行うことにより、ベ
ース10が完成する。なお、ベース10がガラス材であ
る場合、前述の絶縁膜は不要である。
The method of manufacturing the base 10 is as follows.
For example, as shown in FIGS. 2A to 2E, an etching mask 23 is appropriately formed on the upper surface of the single-crystal silicon substrate 11, and the etching process is repeated a plurality of times to form a multi-step etching. After the application, there is a method of forming the inclined surface 12 by performing a silicon isotropic etching to eliminate the step on the stepped surface with a solution such as fluorine and smooth the silicon. After covering the inclined surface 12 with an insulating film, the base 10 is completed by patterning the fixed contacts 13 and 14 and the drive electrodes 19 and 20 on the surface of the insulating film. In addition, when the base 10 is a glass material, the above-mentioned insulating film is unnecessary.

【0013】可動接触片30は平面略U字形を有してお
り、その下面中央部には絶縁膜を介して金,アルミ等の
金属薄膜からなる可動接点31が形成されている。さら
に、可動接触片30は、その両端部が断面略台形の固定
台32の下面に接合一体化されている。前記可動接触片
30は、加工後に変形,反り等を生じないようにするた
め、均質な素材が好ましく、例えば、単結晶シリコン基
板あるいはポリシリコン基板が好適である。そして、前
記ベース10の上面に可動台32を固定することによ
り、可動接点31が固定接点13,14に接離可能に対
向するとともに、可動接触片30が駆動用外部接続端子
24に接続される。
The movable contact piece 30 has a substantially U-shaped plane, and a movable contact 31 made of a thin metal film such as gold or aluminum is formed at the center of the lower surface of the movable contact piece 30 via an insulating film. Further, the movable contact piece 30 has both ends joined and integrated with the lower surface of a fixed base 32 having a substantially trapezoidal cross section. The movable contact piece 30 is preferably made of a homogeneous material in order to prevent deformation, warping, and the like after processing. For example, a single crystal silicon substrate or a polysilicon substrate is suitable. By fixing the movable base 32 on the upper surface of the base 10, the movable contact 31 is opposed to the fixed contacts 13 and 14 so as to be able to contact and separate, and the movable contact piece 30 is connected to the driving external connection terminal 24. .

【0014】次に、前述の構成からなる接点機構の動作
について説明する。まず、駆動電極19,20と可動接
触片30との間に電圧を印加すると、両者の間に静電引
力が生じ、可動接触片30がベース10側に引き寄せら
れる。このとき、静電引力は距離の2乗に反比例するの
で、両者の距離が近いほど、その静電引力が著しく増大
する。このため、可動接触片30と傾斜面12との距離
が最も小さい可動接触片30の基部において最も大きい
静電引力が作用する。この結果、初期段階においては可
動接触片30の基部が傾斜面12に最初に当接する(図
1(c))。その後、可動接触片30は傾斜面12との
距離を順次狭めるように変形し、最後に、可動接点31
が固定接点13,14に接触し、固定接点13,14が
導通する。
Next, the operation of the contact mechanism having the above configuration will be described. First, when a voltage is applied between the drive electrodes 19 and 20 and the movable contact piece 30, an electrostatic attraction is generated between the two, and the movable contact piece 30 is drawn to the base 10 side. At this time, since the electrostatic attractive force is inversely proportional to the square of the distance, the closer the distance between the two, the more the electrostatic attractive force increases. Therefore, the largest electrostatic attraction acts on the base of the movable contact piece 30 where the distance between the movable contact piece 30 and the inclined surface 12 is the smallest. As a result, in the initial stage, the base of the movable contact piece 30 first contacts the inclined surface 12 (FIG. 1C). Thereafter, the movable contact piece 30 is deformed so as to gradually reduce the distance between the movable contact piece 30 and the inclined surface 12.
Contact the fixed contacts 13 and 14, and the fixed contacts 13 and 14 conduct.

【0015】そして、可動接触片30と駆動電極19,
20との間の印加電圧を解除すると、可動接触片30自
身のばね力により、可動接触片30が元の状態に復帰
し、可動接点31が固定接点13,14から開離する。
The movable contact piece 30 and the drive electrode 19,
When the voltage applied to the movable contact piece 20 is released, the movable contact piece 30 returns to the original state by the spring force of the movable contact piece 30 itself, and the movable contact 31 is separated from the fixed contacts 13 and 14.

【0016】第2実施形態は、第3図に示すように、傾
斜面12に一対の固定接点13,14を並設してある。
そして、これらは所定の間隔で並設したプリント配線1
5,16を介して入出力用外部接続端子17,18に接
続されている。さらに、前記プリント配線15,16の
間に駆動電極19が設けられ、駆動用外部接続端子22
に接続されている。一方、可動接触片30は、真直な帯
形状をしており、その一端部が固定台32を介してベー
ス10の上面に片持支持されている。さらに、可動接触
片30の自由端部下面に設けた可動接点31が前記固定
接点13,14に接離可能に対向している。
In the second embodiment, as shown in FIG. 3, a pair of fixed contacts 13 and 14 are arranged on the inclined surface 12 side by side.
These are printed wiring lines 1 arranged side by side at predetermined intervals.
They are connected to input / output external connection terminals 17 and 18 via the terminals 5 and 16. Further, a driving electrode 19 is provided between the printed wirings 15 and 16, and a driving external connection terminal 22 is provided.
It is connected to the. On the other hand, the movable contact piece 30 has a straight band shape, and one end of the movable contact piece 30 is cantilevered on the upper surface of the base 10 via the fixed base 32. Further, a movable contact 31 provided on the lower surface of the free end of the movable contact piece 30 is opposed to the fixed contacts 13 and 14 so as to be able to contact and separate therefrom.

【0017】そして、駆動電極19と可動接触片30と
の間に電圧を印加すると、両者の間に静電引力が生じ、
可動接触片30がベース10側に引き寄せられる。この
とき、前述の第1実施形態と同様、可動接触片30は、
その基部から傾斜面12に吸着する。その後、可動接触
片30は傾斜面12との距離を狭めるように順次変形
し、最後に、可動接点31が固定接点13,14に接触
し、固定接点13,14が導通する。
When a voltage is applied between the drive electrode 19 and the movable contact piece 30, an electrostatic attraction is generated between them and
The movable contact piece 30 is drawn to the base 10 side. At this time, similarly to the first embodiment, the movable contact piece 30 is
It is adsorbed on the inclined surface 12 from its base. Thereafter, the movable contact piece 30 is sequentially deformed so as to reduce the distance from the inclined surface 12, and finally, the movable contact 31 comes into contact with the fixed contacts 13 and 14, and the fixed contacts 13 and 14 become conductive.

【0018】そして、前述の印加電圧を解除すると、可
動接触片30自身のバネ力により、可動接触片30が元
の状態に復帰し、可動接点31が固定接点13,14か
ら開離する。
When the applied voltage is released, the movable contact piece 30 returns to its original state by the spring force of the movable contact piece 30 itself, and the movable contact 31 is separated from the fixed contacts 13 and 14.

【0019】なお、前記可動接触片30は、可動台32
と別体であるものに限らず、例えば、図4(a)ないし
図4(c)に示すように、シリコン基板33の上面縁部
にエッチングマスク34を形成し、異方性エッチングを
施すことにより、固定台35と一体に形成したものであ
ってもよい。
The movable contact piece 30 includes a movable base 32
The etching mask 34 is formed on the edge of the upper surface of the silicon substrate 33 and is subjected to anisotropic etching as shown in FIGS. 4 (a) to 4 (c). Thus, the base may be formed integrally with the fixed base 35.

【0020】前述の実施形態では、常圧の場合について
説明したが、空気抵抗を減少させるため、減圧した密封
容器内において可動接触片を駆動してもよい。ただし、
密封容器内を所定の気圧まで減圧すると、逆に空気抵抗
を利用して可動接触片の振動を効果的に減衰できる場合
がある。このため、高速応答が可能で、かつ、より広い
周波数域に適用できるマイクロリレーが得られるという
利点がある。
In the above-described embodiment, the case of normal pressure has been described. However, in order to reduce air resistance, the movable contact piece may be driven in a reduced-pressure sealed container. However,
When the pressure in the sealed container is reduced to a predetermined pressure, the vibration of the movable contact piece can be effectively attenuated by utilizing air resistance. For this reason, there is an advantage that a microrelay that can respond at high speed and can be applied to a wider frequency range can be obtained.

【0021】また、可動接触片を駆動する駆動電圧の周
波数は可動接触片の固有振動数以下の周波数成分をもつ
駆動電圧であることが好ましい。可動接触片の共振によ
るチャタリングを防止でき、俊敏な動作特性が得られる
からである。
The frequency of the drive voltage for driving the movable contact piece is preferably a drive voltage having a frequency component equal to or lower than the natural frequency of the movable contact piece. This is because chattering due to resonance of the movable contact piece can be prevented, and agile operation characteristics can be obtained.

【0022】さらに、前述の実施形態では、可動接触片
が真直な場合について説明したが、必ずしもこれに限ら
ず、可動接触片が上方に湾曲する一方、これに対向する
ベースの上面が平滑な水平面であってもよい。
Further, in the above-described embodiment, the case where the movable contact piece is straight is described. However, the present invention is not limited to this. The movable contact piece is curved upward, while the upper surface of the base opposed thereto is smooth in a horizontal plane. It may be.

【0023】そして、前述のマイクロリレーは単体で使
用することは勿論、1枚の基板上に複数個のマイクロリ
レーを配置して使用してもよい。
The microrelays described above may be used alone, or a plurality of microrelays may be arranged on one substrate.

【0024】[0024]

【発明の効果】以上の説明から明らかなように、本願発
明の請求項1にかかるマイクロリレーによれば、可動接
触片の基部からベースの傾斜面に吸着し始める。このた
め、可動接触片と駆動電極との対向距離が均等である場
合よりも、低い駆動電圧で駆動できる。さらに、ベース
の上面に形成した固定接点と、可動接触片の自由端部下
面に設けた可動接点との接点間距離が、両者の対向距離
において最大であるので、所望の接点間距離を確保しや
すく、耐圧が向上する。請求項2,3によれば、可動接
触片が真直に形成できるので、可動接触片の製造が容易
になる。請求項4によれば、可動接触片が平面略U字形
状であるので、捩れが生じにくくなり、可動接点が固定
接点に片当たりしないマイクロリレーが得られる。請求
項5によれば、可動接触片が単結晶シリコン基板から形
成されるので、加工後に変形や反りが生じず、動作特性
が均一なマイクロリレーが得られる。請求項6によれ
ば、減圧された密封空間内で可動接触片が駆動するの
で、空気抵抗が小さくなる。このため、高い周波数の駆
動電圧で駆動でき、開閉動作が俊敏になる。請求項7の
製造方法によれば、所望の傾斜面を半導体製造工程の技
術で製造できる。このため、微小かつ複雑な傾斜面を有
するベースを一度に多数個製造でき、生産性の高いマイ
クロリレーが得られる。請求項8の制御方法によれば、
可動接触片を駆動する駆動電圧の周波数が、可動接触片
の固有振動数と一致しない。このため、可動接触片が共
振せず、チャタリングが生じないので、俊敏な開閉特性
を有するマイクロリレーが得られる。
As is apparent from the above description, according to the micro relay according to the first aspect of the present invention, the movable contact piece starts to be attracted to the inclined surface of the base from the base. For this reason, it can drive with a lower drive voltage than the case where the opposing distance of a movable contact piece and a drive electrode is equal. Furthermore, since the distance between the fixed contact formed on the upper surface of the base and the movable contact provided on the lower surface of the free end of the movable contact piece is the largest in the distance between them, a desired distance between the contacts is secured. It is easy and the pressure resistance is improved. According to the second and third aspects, since the movable contact piece can be formed straight, the manufacture of the movable contact piece becomes easy. According to the fourth aspect, since the movable contact piece has a substantially U-shaped planar shape, it is difficult to twist, and a micro relay in which the movable contact does not hit the fixed contact is obtained. According to the fifth aspect, since the movable contact piece is formed from the single crystal silicon substrate, a micro relay having uniform operating characteristics without deformation or warpage after processing can be obtained. According to the sixth aspect, since the movable contact piece is driven in the reduced-pressure sealed space, the air resistance is reduced. For this reason, it is possible to drive with a high frequency drive voltage, and the opening and closing operation becomes quick. According to the manufacturing method of the seventh aspect, a desired inclined surface can be manufactured by the technique of the semiconductor manufacturing process. For this reason, many bases having minute and complicated inclined surfaces can be manufactured at a time, and a microrelay with high productivity can be obtained. According to the control method of claim 8,
The frequency of the drive voltage for driving the movable contact piece does not match the natural frequency of the movable contact piece. Therefore, the movable contact piece does not resonate and chattering does not occur, so that a micro relay having agile opening and closing characteristics can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本願発明にかかるマイクロリレーの第1実施
形態を示し、図(a)は平面図、図(b)ないし図
(d)は動作状態を示す断面図である。
FIG. 1 shows a first embodiment of a microrelay according to the present invention, wherein FIG. 1 (a) is a plan view and FIGS. 2 (b) to 2 (d) are cross-sectional views showing operating states.

【図2】 図1のベースの製造方法を示す工程図であ
る。
FIG. 2 is a process chart showing a method for manufacturing the base of FIG. 1;

【図3】 本願発明にかかるマイクロリレーの第2実施
形態を示し、図(a)は平面図、図(b)は断面図であ
る。
3A and 3B show a second embodiment of a micro relay according to the present invention, wherein FIG. 3A is a plan view and FIG. 3B is a cross-sectional view.

【図4】 可動接触片の製造方法を示す工程図である。FIG. 4 is a process chart showing a method for manufacturing a movable contact piece.

【符号の説明】[Explanation of symbols]

10…ベース、11…単結晶シリコン基板、12…傾斜
面、13,14…固定接点、15,16…プリント配
線、17,18…入出力用外部接続端子、19,20…
駆動電極、21…プリント配線、22,24…駆動用外
部接続端子、30…可動接触片、31…可動接点、32
…固定台、33…単結晶シリコン基板。
DESCRIPTION OF SYMBOLS 10 ... Base, 11 ... Single crystal silicon substrate, 12 ... Inclined surface, 13, 14 ... Fixed contact, 15, 16 ... Printed wiring, 17, 18 ... Input / output external connection terminal, 19, 20 ...
Drive electrode, 21: printed wiring, 22, 24: external connection terminal for driving, 30: movable contact piece, 31: movable contact, 32
... Fixing base, 33 ... Single-crystal silicon substrate.

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 ベースの上面に片持支持した可動接触片
の自由端部下面に可動接点を設ける一方、前記ベースの
上面に、前記可動接点に接離可能に対向する一対の固定
接点と、前記可動接触片に接離可能に対向する駆動電極
とを設けたマイクロリレーにおいて、 前記ベースの上面から前記可動接触片までの対向距離
が、可動接触片の基部から自由端部にかけて増大するこ
とを特徴とするマイクロリレー。
A movable contact is provided on a lower surface of a free end of a movable contact piece cantilevered on an upper surface of a base, and a pair of fixed contacts opposed to the movable contact on the upper surface of the base so that the movable contact can be separated from the movable contact. In a microrelay provided with a drive electrode opposing to and detachable from the movable contact piece, an opposing distance from an upper surface of the base to the movable contact piece increases from a base to a free end of the movable contact piece. Characteristic micro relay.
【請求項2】 前記ベースの傾斜面が曲面であることを
特徴とする請求項1に記載のマイクロリレー。
2. The micro relay according to claim 1, wherein the inclined surface of the base is a curved surface.
【請求項3】 前記ベースの傾斜面がテーパ面であるこ
とを特徴とする請求項1または2に記載のマイクロリレ
ー。
3. The micro relay according to claim 1, wherein the inclined surface of the base is a tapered surface.
【請求項4】 前記可動接触片が平面略U字形であるこ
とを特徴とする請求項1ないし3のいずれか1項に記載
のマイクロリレー。
4. The microrelay according to claim 1, wherein the movable contact piece has a substantially U-shaped plane.
【請求項5】 前記可動接触片が単結晶シリコン材から
なることを特徴とする請求項1ないし4のいずれか1項
に記載のマイクロリレー。
5. The micro relay according to claim 1, wherein the movable contact piece is made of a single crystal silicon material.
【請求項6】 前記可動接触片を減圧した密封空間内で
駆動することを特徴とする請求項1ないし5のいずれか
1項に記載のマイクロリレー。
6. The microrelay according to claim 1, wherein the movable contact piece is driven in a reduced-pressure sealed space.
【請求項7】 ベースの傾斜面に固定接点を設けたマイ
クロリレーにおいて、単結晶シリコン基板の上面を複数
回のエッチング処理で階段状とした後、等方性エッチン
グで段差を消失させて前記ベースに滑らかな傾斜面を形
成することを特徴とするマイクロリレーの製造方法。
7. A micro relay having a fixed contact provided on an inclined surface of a base, wherein the upper surface of the single crystal silicon substrate is stepped by a plurality of etching treatments, and then the step is eliminated by isotropic etching. A method for manufacturing a micro relay, wherein a smooth inclined surface is formed.
【請求項8】 可動接触片を静電引力で厚さ方向に駆動
し、接点を開閉するするマイクロリレーにおいて、 前記可動接触片の駆動電圧を、可動接触片の固有振動数
以下の周波数としたことを特徴とするマイクロリレーの
制御方法。
8. A micro relay for driving a movable contact piece in a thickness direction by electrostatic attraction to open and close a contact, wherein a driving voltage of the movable contact piece is set to a frequency equal to or lower than a natural frequency of the movable contact piece. A method for controlling a micro relay.
JP31344496A 1996-11-25 1996-11-25 Micro-relay, manufacture and control method therefor Pending JPH10154456A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31344496A JPH10154456A (en) 1996-11-25 1996-11-25 Micro-relay, manufacture and control method therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31344496A JPH10154456A (en) 1996-11-25 1996-11-25 Micro-relay, manufacture and control method therefor

Publications (1)

Publication Number Publication Date
JPH10154456A true JPH10154456A (en) 1998-06-09

Family

ID=18041383

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31344496A Pending JPH10154456A (en) 1996-11-25 1996-11-25 Micro-relay, manufacture and control method therefor

Country Status (1)

Country Link
JP (1) JPH10154456A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2862806A1 (en) * 2003-11-25 2005-05-27 St Microelectronics Sa Variable capacitor for e.g. resonator, has flexible conducting membrane placed above groove portion, where depth of groove portion increases continuously from one of two lateral edges of portion to base of groove portion
AU784864B2 (en) * 2001-03-15 2006-07-13 Micro Relay Holdings Pty Ltd Telecommunication relay array for DSL network configuration
US7082024B2 (en) 2004-11-29 2006-07-25 Stmicroelectronics S.A. Component comprising a variable capacitor
JP2006310052A (en) * 2005-04-27 2006-11-09 Sanyo Electric Co Ltd Micro-machine switch
JP2007525805A (en) * 2004-02-27 2007-09-06 エーアーデーエス・ドイッチュラント・ゲーエムベーハー High frequency MEMS switch with curved switching element and method of manufacturing the switch
JP2008181725A (en) * 2007-01-24 2008-08-07 Fujitsu Ltd Method and device for controlling driving of micro machine device
JP2009524191A (en) * 2006-01-20 2009-06-25 ヨアキム オーバーハンマー, Switch, method and system for switching the state of a signal path

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU784864B2 (en) * 2001-03-15 2006-07-13 Micro Relay Holdings Pty Ltd Telecommunication relay array for DSL network configuration
FR2862806A1 (en) * 2003-11-25 2005-05-27 St Microelectronics Sa Variable capacitor for e.g. resonator, has flexible conducting membrane placed above groove portion, where depth of groove portion increases continuously from one of two lateral edges of portion to base of groove portion
EP1536439A1 (en) * 2003-11-25 2005-06-01 St Microelectronics S.A. Component comprising a variable capacitor
JP2007525805A (en) * 2004-02-27 2007-09-06 エーアーデーエス・ドイッチュラント・ゲーエムベーハー High frequency MEMS switch with curved switching element and method of manufacturing the switch
US7082024B2 (en) 2004-11-29 2006-07-25 Stmicroelectronics S.A. Component comprising a variable capacitor
US7200908B2 (en) 2004-11-29 2007-04-10 Stmicroelectronics S.A. Method of making a variable capacitor component
JP2006310052A (en) * 2005-04-27 2006-11-09 Sanyo Electric Co Ltd Micro-machine switch
JP4573695B2 (en) * 2005-04-27 2010-11-04 三洋電機株式会社 Micromachine switch
JP2009524191A (en) * 2006-01-20 2009-06-25 ヨアキム オーバーハンマー, Switch, method and system for switching the state of a signal path
JP2008181725A (en) * 2007-01-24 2008-08-07 Fujitsu Ltd Method and device for controlling driving of micro machine device

Similar Documents

Publication Publication Date Title
JP3796988B2 (en) Electrostatic micro relay
US6841839B2 (en) Microrelays and microrelay fabrication and operating methods
JP3918559B2 (en) Electrostatic relay and communication equipment using the relay
JP2007535797A (en) Beam for micromachine technology (MEMS) switches
JP5588663B2 (en) Micro electromechanical system switch
WO1999021204A1 (en) Electrostatic micro-relay
JP3493974B2 (en) Electrostatic micro relay
JPH10154456A (en) Micro-relay, manufacture and control method therefor
JP2001176365A (en) Pressure switch
JP4151338B2 (en) Variable capacitance element and method for forming the same
JP2000348593A (en) Micro-relay
US20220324696A1 (en) Mems switch including a cap contact
JP2000164105A (en) Micromachine, microactuator and microrelay
JP3651404B2 (en) Electrostatic micro relay, and radio apparatus and measuring apparatus using the electrostatic micro relay
KR100554468B1 (en) Self-sustaining center-anchor microelectromechanical switch and method of fabricating the same
JP3314631B2 (en) Vibration transducer and manufacturing method thereof
JP3368304B2 (en) Electrostatic micro relay
JP2000021282A (en) Electrostatic micro-relay
JPH10106184A (en) Microactuator
JP2001291463A (en) Switch
JPH11176307A (en) Electrostatic microrelay
JP2000113792A (en) Electrostatic micro relay
JP2001023497A (en) Electrostatic microrelay
JP3879225B2 (en) Electrostatic micro relay
JPH11134998A (en) Electrostatic micro relay

Legal Events

Date Code Title Description
A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20050215

A02 Decision of refusal

Effective date: 20050705

Free format text: JAPANESE INTERMEDIATE CODE: A02