JPH10144217A - Exposure device and exposure method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve productivity of an image tube. SOLUTION: When an image is projected on an image tube 6, the size of an virtual image in one direction (horizontal or vertical direction) to deflect an electron beam is necessarily larger than that of the virtual image in the other direction. In this case, an optical integrator 130, whose length in the aforesaid one direction is larger than that in the aforesaid other direction, is provided, and a diaphragm lens group 107a, whose curvature reaches zero in the aforesaid one direction, is also provided. Therefore, an exposed surface of the image tube 6 is exposed to an outgoing luminous flux from the optical integrator 130 through the diaphragm lens group 107a. For this reason, the illuminance of the exposed surface in the aforesaid one direction can be increased sufficiently to shorten exposure time and to improve productivity of the image tube 6.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention, as typified by a CRT, scans an infinite number of phosphor dots per pixel arranged on the inner surface of a display wall by irradiating vertically and horizontally deflected electron beams. In addition, the present invention relates to an exposure apparatus and an exposure method applied to manufacture of a picture tube that displays a picture on a display wall by sequentially emitting light according to a picture signal.

[0002]

2. Description of the Related Art The above-described phosphor dots of a picture tube are hardened by exposing a photo-curable resin material applied to the inner surface of a display wall in a predetermined pattern to cure the exposed portion of the resin material. Then, the image is fixed on the inner surface of the display wall, and thereafter, the inner surface of the display wall is washed and the unexposed portion of the resin material is washed away to develop and form. The phosphor dots of the color picture tube are provided for each pixel in three colors of G, B, and R. In recent years, all phosphor dots of G, B, and R for each pixel are partitioned by a black matrix so-called BM formed in a predetermined pattern so as to clarify a display image. For each of the BM and each of the G, B, and R phosphor dots, a method of applying a corresponding photocurable resin, exposing the photocurable resin, and developing it by washing is applied.

Conventionally, an exposure apparatus as shown in FIGS. 23 and 24 has been used to perform the above-described exposure. This exposure apparatus uses a mercury lamp 201 as a light source,
Utilizing this as an elongated luminous body, a photo-curable resin formed on the inner surface of the display wall 204 of the picture tube 203 through the slit 202 extending along the circumferential direction of the mercury lamp 201 is applied through the mask 205. Exposure at once. Thereby, the exposure state as shown in FIG. 23 corresponding to the case where the electron beam is deflected in the horizontal direction by the picture tube 203,
FIG. 2 corresponding to the case where the electron beam is deflected in the vertical direction
4 is obtained. The exposure state shown in FIG.
Are shown in such a direction as to have a cross-section along a direction perpendicular to the longitudinal direction of the head. In such an orientation, light emitted from one point of the mercury lamp 201
In the extension range of the slit 202 around the center position O ₁ of
Each light emitted from the center position O ₁ is in a swayed state and extends over the entire display wall of the picture tube 203. On the other hand, FIG.
The exposure state shown in FIG. 4 is illustrated in such a manner that the slit 202 has a cross section along the longitudinal direction of the mercury lamp 201. In this orientation, the light reaching each part of the display wall of the picture tube 203 via the slit 202 is transmitted at different positions (a1 to a1) in the longitudinal direction of the mercury lamp 201.
Are those emanating from 3), in a state of being swung around a position O ₂ of the slit 202. here,
The actual vertical deflection and horizontal deflection of the electron beam in the picture tube 203 are performed at different positions in front and rear by, for example, a vertical deflection coil and a horizontal deflection coil arranged in front and rear,
The center of the electron beam oscillated by the vertical deflection and the center oscillated by the horizontal deflection are displaced back and forth corresponding to the positions of the vertical and horizontal deflection coils.

The positions of the positions O ₁ and O _{2 in} the exposure through the slit 202 are the positions and intervals corresponding to the positions of the centers where the electron beam is actually shaken by the vertical deflection and the horizontal deflection in the picture tube 203. s, so that the picture tube 20
Each part can be exposed by light traveling from the same direction as the electron beam that reaches each part when an actual screen is displayed in 3. Therefore, when the BM, G, B, and R phosphor dots are scanned by deflecting the electron beam in the actual screen display, the image signal for each pixel and the scanning position for each pixel are correctly set. Can be synchronized. Various correction optical systems 206 are provided between the slit 202 and the mask 205 as necessary, as shown in FIG. In FIG. 24, the illustration of the correction optical system 206 is omitted.

[0005]

However, in the conventional exposure apparatus described above, as shown in the exposure state shown in FIG. 23, each pixel portion of the display wall of the picture tube 203 is provided with a longitudinal direction of the elongated mercury lamp 201. Light only reaches from one point. For this reason, vignetting occurs in much of the light emitted from the mercury lamp 201 during the above-mentioned exposure, and only a very small part of the total light emission capacity of the mercury lamp 201, for example, about 1/10 can be effectively used. For this reason, the required exposure time for the light emission capacity of the mercury lamp 201 becomes longer, and thus the conventional exposure apparatus described above has a problem that the productivity of the picture tube 203 is poor. The present invention has been made to solve such a problem, and the illuminance of the surface to be exposed is sufficiently large, the exposure time can be reduced, and thus the exposure that can improve the productivity of the picture tube can be improved. It is an object to provide an apparatus and an exposure method.

[0006]

An exposure apparatus according to a first aspect of the present invention is an exposure apparatus for forming phosphor dots on a surface to be exposed of the picture tube at the time of manufacturing the picture tube. A converging / reflecting member that collects light, an illuminating unit having an optical integrator that receives light passing through the converging / reflecting member at one end, integrates the light, and emits the light from the other end; A projection lens system for projecting the entire surface of the surface to be exposed, a stop lens for narrowing the light beam to a size and a shape for irradiating the light beam emitted by the optical integrator with a spot on the surface to be exposed, and the stop lens And a photographic lens for projecting a light beam emitted from the projection lens onto the surface to be exposed, and vertically deflects the electron beam in the virtual image area of the projection lens system during actual image projection after the completion of the picture tube. A pseudo refraction characteristic point (V) corresponding to the direct deflection characteristic and a pseudo refraction characteristic point (H) corresponding to the horizontal deflection characteristic for horizontally deflecting the electron beam correspond to actual vertical deflection points and horizontal deflection points. A projection lens system having an astigmatism as provided at the front-rear interval (S), wherein a light beam irradiated on the surface to be exposed is supplied to a rectangular opening of a mask provided in the picture tube. The shape is similar to the shape of the above.

[0007] An exposure method according to a second aspect of the present invention is an exposure apparatus for forming phosphor dots on a surface to be exposed of a picture tube at the time of manufacturing the picture tube, wherein the light is collected and reflected by a light source. A lighting unit having a member, an optical integrator that receives the light having passed through the condensing and reflecting member at one end, integrates the light, and emits the light from the other end; and an illumination light flux emitted by the illumination means. A projection lens system for projecting the light beam emitted from the optical integrator into a spot and irradiating the light beam emitted from the optical integrator to the surface to be exposed. A photographing lens for projecting the electron beam on the surface to be exposed, and in a virtual image area of the projection lens system, a vertical deflection characteristic for vertically deflecting the electron beam during actual image projection after completion of the picture tube. The pseudo-refractive characteristic point (V) and the pseudo-refractive characteristic point (H) corresponding to the horizontal deflection characteristic for horizontally deflecting the electron beam are separated by an interval (S) corresponding to the actual vertical and horizontal deflection points. In the case where the optical integrator makes the size of the virtual image in one direction in the horizontal and vertical directions larger than the size in the other direction, A shape in which the length of the one direction is longer than the other direction,
The exposure method using an exposure apparatus, wherein the aperture lens has a lens that does not have a curvature with respect to the one direction when the size of the virtual image in one direction in the horizontal and vertical directions is larger than the size in the other direction. The light beam emitted from the optical integrator, by the aperture lens, so that the size of the virtual image in one direction in the horizontal and vertical directions is larger than the size in the other direction,
It is characterized in that the surface to be exposed of the picture tube is exposed through the taking lens.

[0008]

DESCRIPTION OF THE PREFERRED EMBODIMENTS An exposure apparatus and an exposure method according to one embodiment of the present invention will be described below with reference to the drawings.
The above-mentioned exposure method is executed by the above-mentioned exposure apparatus. In each of the drawings, components that perform the same or similar functions are denoted by the same reference numerals.

First Embodiment An exposure apparatus 501 according to the first embodiment has the following configuration and operates. That is, the exposure apparatus 501 includes the illumination unit 4 and the lens system 7, as shown in FIG. The illuminating means 4 uses the ultra-high pressure mercury lamp 1 as a light source.
Is emitted by an elliptical mirror 2 as a light condensing member, and the collected light is incident on a rod-shaped optical integrator 3 as an optical integrating member and integrated so that a spot irradiation with a predetermined size can be performed. The lens system 7 projects the light beam 10 emitted from the illuminating means 4 onto the entire area of the exposed surface 6 a of the picture tube 6. More specifically, the light from the mercury lamp 1 collected by the elliptical mirror 2 is received by one end of the rod-shaped optical integrator 3 and emitted from the other end of the optical integrator 3. At this time, since the optical integrator 3 has the rod shape as described above, the optical integrator 3 integrates the light received from the one end while repeating various reflections inside the side circumference until the light is emitted from the other end.
With such an integration function, the optical integrator 3
A light beam having a uniform light intensity distribution C as shown in FIG. 15 is emitted from the entire area of the emission surface 3a. Therefore, with only one small and simple optical member such as the rod-shaped optical integrator 3, it is possible to obtain the emitted light beam 10 suitable for uniformly irradiating a spot with a predetermined size.
Therefore, the emitted light beam 10 is transmitted to the exposed surface 6 by the lens system 7.
A predetermined local illumination for projecting over the entire area a to expose the exposed surface 6a collectively is achieved with high accuracy.

The optical integrating member can be replaced by a combination of a conventionally known fly-eye lens and an aspherical mirror. In this case, the fly-eye lens and the aspherical mirror are both complicated. It is expensive and requires high-precision processing, and the path length of the optical integration member is relatively long, which is likely to increase the size of the apparatus. On the other hand, by using one small and simple rod-shaped optical integrator 3 as described above, the device can be made small and inexpensive without deteriorating its performance.

In this embodiment, the optical integrator 3 has a square cross section. However, the optical integrator 3 is not limited to this, and may have various cross sections such as a triangle and a circle. Further, a light source other than the mercury lamp 1 can be used according to the exposure conditions. In this embodiment, the light collected by the elliptical mirror 2 is
5 and the optical fiber 16, the optical integrator 3
The cold mirror 15 and the optical fiber 16 can be omitted, or can be replaced with other parts. However, the cold mirror 15 and the optical fiber 16 can avoid interference with others in the optical path, and it is convenient to appropriately select and use necessary members to collectively arrange required members in a specific range.

Next, the projection lens system 7 comprises an optical path VP in the vertical deflection direction and an optical path HP in the horizontal deflection direction as shown in FIG.
In the virtual image area of the lens system 7, a pseudo-refractive characteristic point V corresponding to a vertical deflection characteristic for vertically deflecting the electron beam when an actual image is projected by the picture tube 6, Astigmatism is given such that a pseudo refraction characteristic point H corresponding to a horizontal deflection characteristic to be deflected is provided at a front-rear interval S corresponding to an actual vertical deflection point and a horizontal deflection point. In the exposure apparatus, a stop lens group 7a for stopping the parallel light beam from the illuminating means 4 into a size and a shape convenient for exposing the exposure surface 6a, and a light stopped by the stop lens group 7a 6a and a photographing lens group 7b for projecting the entire surface of the lens 6a. In the exposure apparatus, each of the aperture lens group 7a and the photographing lens group 7b has a plurality of lenses. However, in other embodiments, each of them may be composed of a single lens. The pseudo refraction characteristic for obtaining the pseudo refraction characteristic point V corresponding to the vertical deflection is realized by, for example, a combination of two anamorphic lenses 11 and 12 provided in the imaging lens group 7b, and the pseudo refraction characteristic point H corresponding to the horizontal deflection is obtained. The refraction characteristics are, for example, two anamorphic lenses 1 provided in the aperture lens group 7a
3 and 14. In the exposure apparatus 501 of the present embodiment, the anamorphic lenses 11 and 1 are used.
Reference numerals 2, 13, and 14 are ordinary lenses each having a circular planar shape.

The lens system 7 vertically deflects the electron beam vertically when an actual image is projected on the picture tube 6 by astigmatism given so as to have the pseudo refraction characteristic points V and H in its own virtual image area. The pseudo refraction characteristic corresponding to the deflection characteristic and the pseudo refraction characteristic corresponding to the horizontal deflection characteristic for horizontally deflecting the electron beam are obtained at two points having a front-back distance corresponding to the actual vertical deflection point and the horizontal deflection point. The vertical deflection point and the horizontal deflection point are located in the virtual image area so as not to affect the projection on the surface to be exposed.

The aperture lens group 7a employs a telecentric optical system. As shown in FIG. 17, outgoing light within a certain angle from each point of the outgoing surface 3a of the optical integrator 3 is converted into a substantially parallel light beam. Emit it. FIG.
FIG. 8 shows intensity distributions G, F, and H on the exposed surface 6a due to light emitted from the coaxial G point on the emission surface 3a of the optical integrator 3 and the F and H points near the G point. . Further, the intensity distribution J on the exposed surface 6a including the above G, F, and H and integrating the emitted light from each point on the emission surface 3a of the optical integrator 3 is shown on the right end of FIG.
Note that FIG. 17 is a diagram for explaining a light beam emitted from the optical integrator 3, and FIG. 18 is a diagram for explaining an intensity distribution on the exposed surface 6a. The shape and arrangement of each lens shown in FIG.
6 does not match the shape and arrangement of each lens.
As described above, according to the exposure apparatus 501 of the present embodiment, FIG.
As is clear from FIG. 8, in the entire area of the exposed surface 6a,
An exposure optical system having a smooth distribution without local unevenness in light intensity is achieved. Various correction optical means 20 are provided between the lens system 7 and the exposed surface 6a. These are provided conventionally, and in this embodiment, as shown in FIG.
A lens 22, an X-axis filter 23, a ΔS lens 24, an S correction filter 25, a men filter 26, and the like.

Second Embodiment: In the exposure apparatus 501 according to the first embodiment, the projection lens system 7 includes:
A spherical lens is used except that an anamorphic lens is used to provide the pseudo-refractive characteristic points V and H. With respect to a virtual image of a light source viewed from an emission portion of the projection lens group 7, an actual image is formed by a picture tube 6. The size in the horizontal direction at the time of projection does not greatly differ from the size in the vertical direction. Therefore, as in the case of an exposure device in a TV picture tube, the virtual image of the light source viewed from the emission part of the projection lens system 7 has a horizontal size and a vertical size at the time of actual image projection using the video tube 6. When it is necessary to greatly change the width of the optical integrator 3 in the horizontal and vertical directions according to the horizontal and vertical sizes, or the projection lens A method may be considered in which an aperture is installed inside or in the vicinity of the light source to block the light beam so that the size of the corresponding light source virtual image in the horizontal and vertical directions is increased.

However, the former method has the following disadvantages. That is, the range in which the light emitted from the optical integrator 3 can enter the projection lens system 7 is a certain circular range. When the size of the optical integrator 3 is largely changed between the horizontal and vertical directions within the circular range, the cross-sectional area of the optical integrator 3 is reduced, and the optical integrator 3 passes through a condensing and reflecting member that collects light from an illumination light source. The amount of light incident on one end of the light source decreases. Therefore, the amount of exposure light decreases, and the illuminance required for exposure on the exposed surface 6a cannot be sufficiently obtained. Further, even if the range in which the optical integrator 3 can enter the aperture lens group 7a is expanded by increasing the focal length of the aperture lens group 7a, the horizontal and vertical widths of the optical integrator 3 are significantly larger. In one of the larger directions, the number of times of reflection of the incident light repeated inside the side circumference of the optical integrator 3 until the light incident on one end of the optical integrator 3 is emitted from the other end of the optical integrator 3 is shown in FIG. As shown in FIG. 20, the number of reflections in the other direction shown in FIG. 19 is significantly reduced. Accordingly, the relationship between the position of the exit surface of the optical integrator 3 and the light intensity is such that the light intensity in the direction of the horizontal in the horizontal direction and the vertical direction of the optical integrator 3 which is extremely small is uniform as shown in FIG. The light intensity in the direction in which the width is extremely large is not uniform as shown in FIG. In addition, there is a problem that the light source virtual image is enlarged by an increase in the focal length of the projection lens system 7.

The latter method has the following disadvantages. That is, when an aperture is provided to improve the exposure performance on the exposed surface 6a, the aperture blocks the light beam, and it is necessary to maintain the light source virtual image at an appropriate size. Therefore, a large loss of exposure light occurs, and the illuminance of the exposed surface 6a cannot be sufficiently obtained.

As described above, with respect to the virtual image of the light source as viewed from the emission part of the projection lens system 7 as in the case of the exposure device in the television picture tube, the size in the horizontal direction at the time of actual image projection using the picture tube 6 When it is necessary to greatly change the size in the vertical direction, the exposure apparatus of the first embodiment described above has a long exposure time and poor productivity. Therefore, in the exposure apparatus of the second embodiment, the illuminance of the exposed surface 6a is sufficiently large even when the horizontal and vertical sizes of the light source virtual images are largely different from each other, such as a television picture tube, and the exposure time is reduced. Is adopted. Below, the second
An exposure apparatus according to an embodiment will be described.

FIG. 1 is a configuration diagram of the exposure apparatus 502 of the second embodiment in the horizontal direction, and FIG. 2 is a configuration diagram of the exposure apparatus 502 of the second embodiment in the vertical direction. The configuration of the exposure apparatus 502 differs from the exposure apparatus 501 of the first embodiment in the following two points. The other configuration is the same as the exposure apparatus 501. Further, a lens 21, a diaphragm lens group 107a, and a photographing lens group 107b, which correspond to the projection lens system 7 in the first embodiment, will be described later.
The projection lens system 107 having the same configuration as the projection lens system 7 described above, that is, as shown in FIGS. 1 and 2, the projection lens system 107 has an optical path VP in the vertical deflection direction and a light path VP in the horizontal deflection direction. As shown in the optical path HP, in this virtual image area, a pseudo refraction characteristic point V corresponding to a vertical deflection characteristic for vertically deflecting the electron beam at the time of actual image projection by the picture tube 6, and horizontal deflection of the electron beam An astigmatism is given by the anamorphic lens in the projection lens system such that a pseudo-refractive characteristic point H corresponding to the horizontal deflection characteristic to be caused is provided at a front-rear interval S corresponding to the actual vertical deflection point and the horizontal deflection point. ing.

The first point is that in the projection lens system 107, an aperture lens for narrowing a light beam emitted from the optical integrator 130 corresponding to the optical integrator 3 to a size and shape suitable for exposure of the surface 6a to be exposed. Group 107
a has no curvature in the one direction when the size of the virtual image in one direction in the horizontal and vertical directions of the light source virtual image needs to be larger than the size in the other direction, and has a curvature in the other direction. This is an optical system that is telecentric with respect to the direction having the curvature. The second point is that the optical integrator 130 is not formed from a single member, but the rod-like member 131 having substantially the same size in the horizontal and vertical directions is replaced by the stop lens group 107a as shown in FIG. Is characterized by having a configuration in which they are superposed in a direction having no curvature. These two points will be described in detail below.

The first point will be described. In the vicinity of the exposed surface 6a of the completed picture tube 6, a plurality of elongated openings 152 are arranged in the vicinity of the exposed surface 6a in order to cause the electron beam to collide with a predetermined phosphor, as shown in FIG. A simple shadow mask 151 is installed. 1 and 2 also show the shadow mask 151, and the image tube 6 is exposed when the exposure apparatus 502 exposes the surface 6a to be exposed.
Is provided with a shadow mask 151. In the present embodiment, the opening 152 is a long hole extending along the vertical direction. In the exposure device 502 used for the picture tube 6 provided with such a shadow mask 151, each of the lenses 11 constituting the aperture lens group 107a
As is clear from FIGS. 1 and 2, 3, 114 has a shape having a curvature in the horizontal direction but no curvature in the vertical direction. For example, FIG.
The shape is as shown in FIG. In the present embodiment, not only the aperture lens group 107a but also each of the lenses 110 and 111 constituting the photographing lens group 107b has a curvature in the horizontal direction but has no curvature in the vertical direction. . In the present embodiment, each of the lenses 113, 114, 110, and 1 has no curvature along the vertical direction.
Although 11 is arranged, it is not limited to this. That is, as described above, the light source virtual image has no curvature with respect to the one direction in the horizontal and vertical directions when the size of the virtual image in one direction in the horizontal and vertical directions needs to be larger than the size in the other direction. What is necessary is just to arrange each lens.
Further, as in the present embodiment, it is preferable that the longitudinal direction of the opening 152 in which the opening 152 of the shadow mask 151 extends and the direction having no curvature in each lens are made to coincide with each other, but the present invention is not limited to this. . Further, as in the present embodiment, it is preferable that the shape of the opening 152 of the shadow mask 151 and the shape of each of the lenses 113, 114, 110, 111 are similar, but the present invention is not limited to this. The aperture lens group 107a and the photographing lens group 107
The arrangement position of each lens in b does not differ from the exposure apparatus 501 of the above-described first embodiment.

Next, the second point will be described. As described above, the rod-shaped member 131 made of the material forming the single optical integrator 3 and having a substantially square cross section
As shown in FIGS. 6 and 7, along the one direction when the size of the virtual image in one direction in the horizontal and vertical directions of the light source virtual image needs to be larger than the size in the other direction. Superimposed, optical integrator 130
To form In the present embodiment, the bar members 131 are overlapped in the vertical direction. In such an optical integrator 130, since each rod-shaped member 131 has a square cross section, the number of reflections of the light when the light passes through each rod-shaped member 131 is substantially the same in the horizontal and vertical directions. Becomes Therefore, by providing the plurality of rod-shaped members 131 in a direction in which the size of the light source virtual image needs to be increased, in the present embodiment, in a vertical direction, light incident on one end of the optical integrator 130 is emitted from the other end. The number of times of reflection of light repeated on the inner side surface of the optical integrator 130 during this period can be substantially equal in both the horizontal and vertical directions. Therefore, the exit surface 3a of the optical integrator 130
A light beam having a uniform light intensity distribution is emitted from the entire area of the light beam.

Therefore, the exposure apparatus 502 of the present embodiment
Now, the aperture lens group 107a and the photographing lens group 107b
In contrast, the total light output from each point on the light exit surface 3a of the optical integrator 130 is equal, and the light flux is emitted from the optical integrator 130 with the same distribution of light intensity with respect to the output angle at each point. Therefore, of the horizontal and vertical directions, regarding the direction in which the light source virtual image on the surface to be exposed 6a is small, the exposure apparatus 502 of the present embodiment is used.
In the case of (1), there is no local unevenness in light intensity over the entire area of the exposed surface 6a in the horizontal direction, and a smooth distribution can be obtained.

In the vertical direction, as shown in FIG. 2, since the stop lens group 107a has no curvature, the light beam emitted from the emission surface 3a of the optical integrator 130 is projected onto the entire surface 6a to be exposed. You. In this case, in the vertical direction, since the optical system does not use a telecentric optical system for the stop lens group 107a, each point on the emission surface 3a of the optical integrator 130 by the telecentric optical system as in the horizontal direction is used. Exposure surface 6a, which is obtained by superimposing the respective emitted lights from
The above effect of preventing local unevenness cannot be obtained. Therefore, as shown in FIG. 8, light intensity unevenness similar to the light intensity unevenness due to the emission direction of the light beam emitted from the optical integrator 130 occurs on the exposed surface 6a as shown in FIG. With respect to this phenomenon, the light intensity non-uniformity correction filter 15 having the characteristic shown in FIG.
By using No. 3, light intensity unevenness can be eliminated over the entire exposed surface 6a as shown in FIG. As described above, in the exposure apparatus 502 of the present embodiment, even when the horizontal and vertical sizes of the virtual image of the light source need to be largely different in the horizontal and vertical directions, as in the exposure apparatus for a picture tube for a television, In addition, the illuminance of the exposed surface 6a can be made sufficiently large, so that the exposure time can be shortened, and the productivity of the picture tube 6 can be improved.
Although the optical integrator 130 is used in the exposure apparatus 502 of the present embodiment, the optical integrator 3 having the above-described square cross-sectional shape can be used.

Third Embodiment Next, a third embodiment will be described. FIG. 12 is a configuration diagram of the exposure apparatus 503 of the third embodiment in the horizontal direction, and FIG. 13 is a configuration diagram of the exposure apparatus 503 of the third embodiment in the vertical direction.
The exposure apparatus 503 is the exposure apparatus 501 of the first embodiment.
The configuration different from the following is the following point. The other configuration is the same as the exposure apparatus 501. Further, a lens 21, a second aperture lens group 170a, and a photographing lens group 7b, which correspond to the projection lens system 7 in the first embodiment.
The projection lens system 170 having the same configuration as the projection lens system 7 described above. That is, as shown in FIGS. 12 and 13, the projection lens system 170 has an optical path VP in the vertical deflection direction.
And the optical path HP in the horizontal deflection direction, the pseudo-refractive characteristic point V corresponding to the vertical deflection characteristic for vertically deflecting the electron beam during the actual image projection by the picture tube 6 in this virtual image area. In the projection lens system, astigmatism such that a pseudo-refractive characteristic point H corresponding to a horizontal deflection characteristic for horizontally deflecting the electron beam is provided at an interval S before and after corresponding to an actual vertical deflection point and a horizontal deflection point. Is provided by an anamorphic lens.

The differences will be described. First, as for the optical integrator, the size of the virtual image in one direction in the horizontal and vertical directions of the light source virtual image needs to be larger than the size in the other direction, similarly to the configuration of the exposure apparatus 502 of the above-described second embodiment. The rod-shaped member 13 in the one direction when there is
1 is used. That is, in the present embodiment, the width W of the optical integrator is
It has a configuration in which an optical integrator whose (FIG. 5) is made particularly small is used. The optical integrator 130
Is described above, and the description thereof is omitted here. In the present embodiment, the optical integrator 130 is used.
But a single optical integrator 3 as described above
May be used. When the width W of the optical integrator is 1/10 or more with respect to the length L of the optical integrator, it is preferable to form the optical integrator 130 in which a plurality of rod-shaped members 131 are overlapped. For example,
When the length L of the optical integrator is 150 mm and the width W of the optical integrator is 15 mm or more, it is preferable to form the optical integrator 130. Next, a magnifying lens group 170b including magnifying lenses 171 and 172 is further disposed between the stop lens group 7a described in the exposure apparatus 501 of the first embodiment and the emission surface 3a of the optical integrator 130. The aperture lens group 7a and the photographing lens group 7b are the same as those in the first embodiment. Also, the second stop lens 17a is combined with the stop lens group 7a and the magnifying lens group 170b.
0a. In the present embodiment, the magnifying lens group 170b
Consists of two lenses, but the number of lenses is not limited to this. Hereinafter, the magnifying lens group 170b will be described.

The magnifying lens group 170b is used to increase the size of the virtual image in one direction in the horizontal and vertical directions of the virtual image of the light source in the other direction when the size of the virtual image in the other direction needs to be larger than that in the other direction. Both ends have telecentric lenses 171 and 172 in the direction in which the size needs to be reduced, in this embodiment, in the horizontal direction.
In addition, the lenses 171 and 17 whose both ends are telecentric
2 is efficient, but in other embodiments one end may be telecentric. Further, the lens 17
1, 172, like the aperture lens group 107a in the above-described second embodiment, needs to make the size of the virtual image in one direction in the horizontal and vertical directions of the light source virtual image larger than the size in the other direction. The shape has no curvature in the above one direction, in this embodiment, in the vertical direction. By using such a magnifying lens group 170b, the rod-like member 131 in the optical integrator 130 is used.
Can be expanded in the direction in which are not overlapped, that is, in the direction in which the width is narrow as the optical integrator, in the present embodiment, in the horizontal direction.

The operation of the exposure apparatus 503 according to the third embodiment configured as described above will be described focusing on the function of the magnifying lens group 170b. The functions of other parts, for example, the aperture lens group 7a, the photographing lens group 7b, and the like are the same as those of the exposure apparatus 501 in the above-described first embodiment, and a description thereof will be omitted. When the light beam is expanded in the direction in which the width of the optical integrator is small, in this embodiment, by the magnifying lens group 170b which is a telecentric optical system at both ends, the light spread N in the horizontal direction.
A is reduced in inverse proportion to the exposure light beam magnification. That is,
N in the direction in which the size of the light source virtual image needs to be reduced
A is smaller than NA in the direction in which the size of the light source virtual image needs to be increased. For example, before entering the magnifying lens group 170b, the N
A was 0.21 but the magnifying lens group 170
When the exposure light beam in the horizontal direction is magnified 6 times by b, the NA in the horizontal direction is 0.035.

Exposure light emitted from the lens 172 enters a stop lens group 7a, which is a spherical telecentric optical system, and is converged to a size and shape suitable for exposing the exposed surface 6a. This focused light is called a secondary light source. The size of the secondary light source is proportional to the focal length of the aperture lens group 7a and the NA of the light beam before entering the aperture lens group 7a. Therefore, the direction in which the NA after emission from the magnifying lens group 170b is reduced, that is,
In the horizontal and vertical directions of the light source virtual image, in which direction the size needs to be reduced, in the present embodiment, in the horizontal direction, the size of the secondary light source is the size of the horizontal and vertical directions of the light source virtual image. Is smaller than the size of the secondary light source in the direction in which the secondary light source needs to be increased, in this embodiment, in the vertical direction. Thus, the magnifying lens group 17
By appropriately setting the magnification of 0b, the horizontal and vertical sizes of the secondary light source are set to an appropriate ratio, and the horizontal and vertical sizes of the obtained light source virtual image are set to a desired ratio. be able to. For example, a case where the ratio of the horizontal size and the vertical size of the virtual image of the light source needs to be set to a: b is illustrated. In this case, the lens 1 of the projection lens system
Due to the optical characteristics of 1 and 12, 2 corresponding to the above a: b
Then, the ratio a ′: b ′ of the size of the next light source in the horizontal and vertical directions is obtained. Then, the magnification of the magnifying lens group 170b is set to a '/
By setting b ′, the ratio of the horizontal size and the vertical size of the virtual image of the light source can be set to a: b. Further, by appropriately setting the focal length of the aperture lens group 7a, the horizontal and vertical sizes of the light source virtual image are set to desired dimensions.

As described above, in the exposure apparatus 503 of this embodiment, the following effects can be obtained by providing the magnifying lens group 170b and making the light emitted from the magnifying lens group 170b incident on the stop lens group 7a. That is, as described above,
In particular, by using the optical integrator 3 or the optical integrator 130 having the narrow width W, the total light quantity emitted from each point of the light exit surface 3a of these optical integrators is equal, and the relation of the light intensity with respect to the light exit angle is the light exit surface 3a. A similar distribution can be at each of the above points. Further, the emission surface 3a of the optical integrator 3 or 130
The light emitted from each point in all angles is magnified by the magnifying lens group 170b, turned into substantially parallel light fluxes, and these light fluxes are integrated. Accordingly, an exposure optical system is achieved in which the light intensity does not have local unevenness and has a smooth distribution over the entire area of the exposed surface 6a. Therefore, even when it is necessary to greatly change the horizontal and vertical sizes of the light source virtual image in the horizontal and vertical directions, such as an exposure apparatus for a television picture tube, according to the exposure apparatus of the present embodiment, The illuminance of the exposed surface 6a can be made sufficiently large, so that the exposure time can be shortened.

Incidentally, the exposure apparatus 50 of the second embodiment described above.
Aperture lens group 107a and photographing lens group 10 in 2
7b and the magnifying lens group 170b in the exposure apparatus 503 of the third embodiment described above.

[0032]

As described above in detail, according to the exposure apparatus of the first aspect of the present invention, the aperture lens group is provided in the horizontal and vertical directions in which the electron beam is deflected during the actual image projection after the picture tube is completed. In the above-mentioned one direction when the size of the virtual image of the light source in one direction needs to be larger than the size in the other direction, the aperture lens group is a lens having no curvature. like,
Even when the horizontal and vertical sizes of the virtual image of the light source need to be largely changed in the horizontal and vertical directions, the illuminance of the surface to be exposed can be sufficiently increased, and thus the exposure time can be reduced, Pipe productivity can be improved.

According to the exposure method of the second aspect of the present invention, the size of the virtual image of the light source in one of the horizontal and vertical directions in which the electron beam is deflected at the time of actual image projection after completion of the picture tube is determined. If it is necessary to be larger than the size of the direction, the light flux emitted from the optical integrator with the length of the one direction longer than the other direction, through a diaphragm lens group having no curvature in the one direction, Since the exposed surface of the picture tube is exposed, even when the horizontal and vertical sizes of the virtual image of the light source need to be largely changed in the horizontal and vertical directions as in an exposure device for a picture tube for television, The illuminance on the exposed surface can be made sufficiently large, so that the exposure time can be shortened and the productivity of the picture tube can be improved.

[Brief description of the drawings]

FIG. 1 is a horizontal plan view of an exposure apparatus according to a second embodiment of the present invention.

FIG. 2 is a side view of the exposure apparatus shown in FIG.

FIG. 3 is a plan view of a shadow mask used for a picture tube.

FIG. 4 is a perspective view of one lens constituting the diaphragm lens group shown in FIGS. 1 and 2;

FIG. 5 is a plan view of the optical integrator shown in FIGS. 1 and 2;

FIG. 6 is a front view of the optical integrator shown in FIG.

FIG. 7 is a side view of the optical integrator shown in FIG.

FIG. 8 is a graph showing a relationship between an output angle from the optical integrator shown in FIGS. 1 and 2 and light intensity.

FIG. 9 is a graph showing a relationship between a position on an emission surface of the optical integrator shown in FIGS. 1 and 2 and light intensity.

FIG. 10 is a graph showing characteristics of a filter used in the exposure apparatus shown in FIGS. 1 and 2;

11 is a graph showing a relationship between a position on a surface to be exposed and light intensity when the filter shown in FIG. 10 is used.

FIG. 12 is a horizontal plan view of an exposure apparatus according to a third embodiment of the present invention.

13 is a side view of the exposure apparatus shown in FIG.

FIG. 14 is a plan view showing the entire exposure apparatus according to the first embodiment of the present invention.

15 is a diagram showing a relationship between a cross-sectional view of a parallel light beam obtained by the exposure apparatus shown in FIG. 14 and a light intensity distribution.

16 is a configuration diagram of a main part of the exposure apparatus shown in FIG.

FIG. 17 is a diagram showing a light beam emitted from the optical integrator.

FIG. 18 is a diagram showing a light intensity distribution on a surface to be exposed obtained by integrating light emitted from each point on the light emitting surface of the optical integrator.

FIG. 19 is a diagram for explaining that light passing through the optical integrator is reflected in the horizontal direction.

FIG. 20 is a diagram for explaining that light passing through the optical integrator is reflected in the vertical direction.

FIG. 21 is a graph showing the relationship between the position on the emission surface of the optical integrator and the light intensity.

FIG. 22 is a graph showing a relationship between a position on an emission surface of an optical integrator and light intensity.

FIG. 23 is a horizontal plan view of a conventional exposure apparatus.

24 is a side view in the vertical direction of the exposure apparatus shown in FIG.

[Explanation of symbols]

3 optical integrator, 3a emission surface, 6 image tube,
6a: exposure surface, 7: projection lens system, 7a: aperture lens group, 7b: photographing lens group, 107: projection lens system, 10
7a: aperture lens group, 107b: photographing lens group, 11
Reference numerals 0, 111, 113, 114: lens, 130: optical integrator, 131: rod-shaped member, 170: projection lens system, 170a: aperture lens group, 170b: photographing lens group, 502, 503: exposure device.

 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Osamu Adachi 1006 Kazuma Kadoma, Kadoma, Osaka Matsushita Electric Industrial

Claims (9)

[Claims] An exposure apparatus for forming phosphor dots on an exposed surface (6a) of a picture tube (6) at the time of manufacturing the picture tube (6), wherein the light is reflected by a light source (1). Member (2);
An illuminator having an optical integrator (3) that receives the light having passed through the converging / reflecting member at one end, integrates the light, and emits the light from the other end; A projection lens system (7) for projecting the light beam emitted from the optical integrator onto the surface to be exposed, and a stop lens (7a) for narrowing the light beam to a size and a shape; A photographing lens (7b) for receiving a light beam emitted from the projector and projecting it on the surface to be exposed, and vertically deflects the electron beam in the virtual image area of the projection lens system during actual image projection after the completion of the picture tube. A pseudo refraction characteristic point (V) corresponding to the vertical deflection characteristic to be deflected and a pseudo refraction characteristic point (H) corresponding to the horizontal deflection characteristic for horizontally deflected the electron beam are converted into actual vertical deflection points and horizontal deflection points. A projection lens system having astigmatism having a corresponding front-to-back distance (S); and a mask (151) provided on the picture tube, wherein the light beam irradiated on the surface to be exposed is provided. An exposure apparatus having a shape similar to the shape of the rectangular opening (152). 2. The longitudinal direction of the rectangular opening corresponds to the one direction when the size of the virtual image in one direction in the horizontal and vertical directions is larger than the size in the other direction, and the aperture lens. 2. The exposure apparatus according to claim 1, wherein the exposure apparatus includes a lens having no curvature in the one direction. 3. The exposure apparatus according to claim 1, wherein the stop lens is an optical system that is telecentric in a direction having a curvature. 4. A correction filter (153) provided between the projection lens system and the surface to be exposed, for uniformly irradiating a light beam emitted from the projection lens system to the surface to be exposed. 4. The exposure apparatus according to any one of claims 1 to 3. 5. The iris lens further comprises magnifying lenses (171, 172) arranged on the exit surface (3a) side of the optical integrator for enlarging a light beam emitted by the optical integrator. 2. The exposure apparatus according to 1. 6. The magnifying lens is a lens that has no curvature in the one direction that makes the size of the virtual image in one direction in the horizontal and vertical directions larger than the size in the other direction, and that has no curvature in the other direction. 6. The exposure apparatus according to claim 5, wherein both ends of the lens are telecentric lenses. 7. The optical integrator, when making the size of the virtual image in one direction in the horizontal and vertical directions larger than the size in the other direction, increases the length of the one direction with respect to the other direction. The exposure apparatus according to claim 2, wherein the exposure apparatus has a shape. 8. The optical integrator includes a rod-shaped member (13) having substantially the same size in the horizontal and vertical directions.
8. The method according to claim 7, wherein 1) is formed by overlapping in one direction.
Exposure apparatus according to the above. 9. An exposure apparatus for forming phosphor dots on a surface to be exposed (6a) of a picture tube (6) during manufacture of the picture tube (6), wherein the light is reflected by a light source (1). Member (2);
An illuminator having an optical integrator (3) that receives the light having passed through the converging / reflecting member at one end, integrates the light, and emits the light from the other end; A projection lens system (7) for projecting the light beam emitted from the optical integrator onto the surface to be exposed, and a stop lens (7a) for narrowing the light beam to a size and a shape; A photographing lens (7b) for receiving a light beam emitted from the projector and projecting it on the surface to be exposed, and vertically deflects the electron beam in the virtual image area of the projection lens system during actual image projection after the completion of the picture tube. A pseudo refraction characteristic point (V) corresponding to the vertical deflection characteristic to be deflected and a pseudo refraction characteristic point (H) corresponding to the horizontal deflection characteristic for horizontally deflected the electron beam are converted into actual vertical deflection points and horizontal deflection points. A projection lens system giving astigmatism such as to have a corresponding front-back distance (S), wherein the optical integrator changes the size of the virtual image in one direction in the horizontal and vertical directions in the other direction. In the case where the size is larger than the size, the size of the virtual image in the one direction in the horizontal and vertical directions is larger than that in the other direction. An exposure method using an exposure apparatus, comprising a lens having no curvature with respect to the one direction when making it larger than the first direction, wherein the light beam emitted from the optical integrator is subjected to one direction in the horizontal and vertical directions by the aperture lens. The size of the virtual image is larger than the size in the other direction, and the exposed surface of the picture tube is exposed through the taking lens. Method.