JPH10130880A - Composite plating device - Google Patents

Composite plating device

Info

Publication number
JPH10130880A
JPH10130880A JP28263996A JP28263996A JPH10130880A JP H10130880 A JPH10130880 A JP H10130880A JP 28263996 A JP28263996 A JP 28263996A JP 28263996 A JP28263996 A JP 28263996A JP H10130880 A JPH10130880 A JP H10130880A
Authority
JP
Japan
Prior art keywords
composite plating
cylindrical electrode
plating solution
holes
hollow portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP28263996A
Other languages
Japanese (ja)
Other versions
JP3516287B2 (en
Inventor
Osamu Ishigami
修 石上
Yoshimitsu Ogawa
義光 小川
Makoto Ishikawa
誠 石川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honda Motor Co Ltd
Original Assignee
Honda Motor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honda Motor Co Ltd filed Critical Honda Motor Co Ltd
Priority to JP28263996A priority Critical patent/JP3516287B2/en
Priority to US08/953,131 priority patent/US6086731A/en
Priority to CA002218784A priority patent/CA2218784C/en
Priority to DE19746703A priority patent/DE19746703B4/en
Priority to GB9722557A priority patent/GB2318588B/en
Priority to FR9713340A priority patent/FR2755153B1/en
Publication of JPH10130880A publication Critical patent/JPH10130880A/en
Application granted granted Critical
Publication of JP3516287B2 publication Critical patent/JP3516287B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To uniformly enhance wear resistance of a composite plating film by uniformly precipitating ceramic particles into a metallic matrix of this composite plating film. SOLUTION: A cylindrical electrode 4 is arranged in a hollow part 3 by opening a clearance and the peripheral wall of this cylindrical electrode 4 is provided with through-holes 26.... Then, a composite plating liquid 5 is injected from the through-holes 26... to the outer side of the cylindrical electrode 4, by which the injected composite plating liquid 5 may be brought into collision against the inside surface of the hollow part 3. Consequently, the composite plating liquid 5 attains a turbulent state and the SiC particles 32... are uniformly dispersed into the composite plating liquid 5 and, therefore, the SiC particles 32... are uniformly precipitated in the metallic matrix of the composite plating film 34.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はワークの中空部内面
に複合メッキ皮膜を施す複合メッキ装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a composite plating apparatus for forming a composite plating film on the inner surface of a hollow portion of a work.

【0002】[0002]

【従来の技術】内燃機関用のシリンダブロックには、ピ
ストンの摺動面となるシリンダ内面をシリンダブロック
と一体にダイカスト成形し、このシリンダ内面にNi/
SiC複合メッキ皮膜を施したものがある。Ni/Si
C複合メッキ皮膜は、金属相であるNiマトリクス中に
炭化ケイ素(SiC)粒子を共析したもので、シリンダ
内面の耐摩耗性を高めたものである。
2. Description of the Related Art In a cylinder block for an internal combustion engine, an inner surface of a cylinder serving as a sliding surface of a piston is die-cast integrally with the cylinder block.
Some are provided with a SiC composite plating film. Ni / Si
The C composite plating film is obtained by eutecting silicon carbide (SiC) particles in a Ni matrix, which is a metal phase, and has improved abrasion resistance on the inner surface of the cylinder.

【0003】一方、特開平7−118891号公報「表
面処理装置」に高速メッキ処理方法が開示されている。
この高速メッキ処理方法によれば、シリンダ内面に沿っ
て複合メッキ液を強制的に流動させて、シリンダ内面に
高速に複合メッキ皮膜を施すことができる。次図に同公
報の装置によるNi/SiC複合メッキ皮膜処理を示
す。
On the other hand, a high-speed plating method is disclosed in Japanese Unexamined Patent Publication No. Hei 7-118891, "Surface treatment apparatus".
According to this high-speed plating method, the composite plating solution can be forcibly flowed along the inner surface of the cylinder, and the composite plating film can be applied to the inner surface of the cylinder at high speed. The following figure shows the Ni / SiC composite plating film treatment by the apparatus of the publication.

【0004】図11は従来のNi/SiC複合メッキ処
理の説明図である。シリンダブロック100の開孔10
1内に隙間Sを開けて筒形の電極102を配置すること
により、開孔101と電極102との間に環状通路10
4を形成する。この環状通路104に複合メッキ液を矢
印方向に流し、次に電極102の頂部を廻って電極1
02の内側へ折り返した流れとする。
FIG. 11 is an explanatory view of a conventional Ni / SiC composite plating process. Opening 10 of cylinder block 100
1 and the cylindrical electrode 102 is arranged with a gap S therebetween, so that the annular passage 10 is formed between the opening 101 and the electrode 102.
4 is formed. The composite plating solution is caused to flow through the annular passage 104 in the direction of the arrow.
02 is turned back inside.

【0005】この複合メッキ液の、の流れを継続し
ながら、電極102とシリンダブロック100とに通電
して、複合メッキ皮膜107のNiマトリクス105中
にSiC粒子106…(…は複数(個)を示す。以下同
様。)を共析させる。
While the flow of the composite plating solution is continued, an electric current is applied to the electrode 102 and the cylinder block 100 so that a plurality of SiC particles 106 are formed in the Ni matrix 105 of the composite plating film 107. The same shall apply hereinafter.).

【0006】[0006]

【発明が解決しようとする課題】しかし、図11に示し
た複合メッキ皮膜107には次図に示す不具合がある。
図12は図11の12部拡大図である。複合メッキ液が
環状通路104に沿って矢印方向に流れるので、下流側
のNiマトリクス105中に多量のSiC粒子106…
が共析する。従って、複合メッキ液が上方向(下流側)
に流れるに従って複合メッキ液中のSiC粒子106…
が減少してしまい、SiC粒子106…の共析量は下流
側に向って徐々に減少する。このため、複合メッキ皮膜
の耐摩耗性が下流側で低くなるという問題がある。
However, the composite plating film 107 shown in FIG. 11 has a problem shown in the following figure.
FIG. 12 is an enlarged view of a part 12 of FIG. Since the composite plating solution flows in the direction of the arrow along the annular passage 104, a large amount of SiC particles 106 are contained in the Ni matrix 105 on the downstream side.
Is eutectoid. Therefore, the composite plating solution moves upward (downstream).
SiC particles 106 in the composite plating solution as they flow
Decrease, and the eutectoid amount of the SiC particles 106 gradually decreases toward the downstream side. For this reason, there is a problem that the wear resistance of the composite plating film decreases on the downstream side.

【0007】そこで、本発明の目的は、複合メッキ皮膜
にSiC粒子等のセラミックス粒子を均一に共析させて
複合メッキ皮膜の耐摩耗性を均一に高める技術を提供す
ることにある。
Accordingly, an object of the present invention is to provide a technique for uniformly eutectifying ceramic particles such as SiC particles into a composite plating film to uniformly increase the wear resistance of the composite plating film.

【0008】[0008]

【課題を解決するための手段】上記課題を解決するため
に本発明の請求項1は、中空部を有するワークの中空部
内に隙間を開けて配置し、有底又は蓋付きで且つ前記中
空部の内面と対向する周壁に複数の貫通孔を有する筒形
電極と、この筒形電極の内側にメッキ液にセラミックス
粒子を混合した複合メッキ液を供給し、前記周壁の貫通
孔を通じて噴射させ、筒形電極の外側から回収するメッ
キ液循環機構と、前記ワークと筒形電極とに通電する通
電機構とから複合メッキ装置を構成する。
In order to solve the above-mentioned problems, a first aspect of the present invention is to dispose a gap in a hollow portion of a work having a hollow portion, and provide a work having a bottom or a lid and having the hollow portion. A cylindrical electrode having a plurality of through holes in a peripheral wall opposed to the inner surface of the cylindrical electrode, a composite plating solution in which ceramic particles are mixed with a plating solution is supplied to the inside of the cylindrical electrode, and the composite plating solution is jetted through the through holes in the peripheral wall. A composite plating apparatus is constituted by a plating solution circulating mechanism for recovering from the outside of the shaped electrode and an energizing mechanism for energizing the work and the cylindrical electrode.

【0009】複合メッキ液を複数の貫通孔から筒形電極
の外側に噴射し、噴射した複合メッキ液を中空部の内面
に衝突させる。従って、複合メッキ液が乱流状態とな
り、複合メッキ液中のセラミックス粒子が均一に分散す
る。この結果、セラミックス粒子が複合メッキ皮膜の金
属マトリックス中に均一に共析する。
[0009] The composite plating solution is jetted from the plurality of through holes to the outside of the cylindrical electrode, and the jetted composite plating solution collides with the inner surface of the hollow portion. Therefore, the composite plating solution is in a turbulent state, and the ceramic particles in the composite plating solution are uniformly dispersed. As a result, the ceramic particles are uniformly eutectoid in the metal matrix of the composite plating film.

【0010】請求項2は、複数の貫通孔を、筒形電極の
内側の流れに沿って上流側で大径とし下流側に向って漸
次小径としたことを特徴とする。
The second aspect is characterized in that the plurality of through holes have a large diameter on the upstream side along the flow inside the cylindrical electrode and have a gradually decreasing diameter toward the downstream side.

【0011】有底又は蓋付きの筒形電極に複合メッキ液
を供給するので、底部又は蓋部で複合メッキ液の流れを
遮る。従って、底部又は蓋部側の複合メッキ液圧が高く
なるので、下流側の小径の貫通孔で複合メッキ液圧が高
くなり、上流側の大径の貫通孔で複合メッキ液圧が低く
なる。このため、全ての貫通孔から一定量の複合メッキ
液を噴射することができる。従って、セラミックス粒子
をワークの中空部に均一に当てることができるので、セ
ラミック粒子を金属相に均一に共析することができる。
Since the composite plating solution is supplied to the bottomed or covered cylindrical electrode, the flow of the composite plating solution is blocked at the bottom or the lid. Accordingly, the composite plating solution pressure on the bottom or the lid side increases, so that the composite plating solution pressure increases on the downstream small-diameter through-hole, and the composite plating solution pressure decreases on the upstream large-diameter through-hole. Therefore, a fixed amount of the composite plating solution can be sprayed from all the through holes. Therefore, since the ceramic particles can be uniformly applied to the hollow portion of the work, the ceramic particles can be co-deposited uniformly with the metal phase.

【0012】請求項3は、複数の貫通孔は、筒形電極の
周壁に碁盤目に配置したことを特徴とする。
According to a third aspect of the present invention, the plurality of through holes are arranged in a grid on the peripheral wall of the cylindrical electrode.

【0013】複合メッキ液を周壁から等間隔に噴射する
ことができるので、セラミックス粒子をワークの中空部
に均一に当てることができる。従って、セラミック粒子
を金属相に均一に共析することができる。
[0013] Since the composite plating solution can be sprayed at equal intervals from the peripheral wall, the ceramic particles can be uniformly applied to the hollow portion of the work. Therefore, the ceramic particles can be uniformly eutectoid with the metal phase.

【0014】請求項4は、複数の貫通孔を筒形電極の周
壁に千鳥に配置したことを特徴とする。
According to a fourth aspect of the present invention, the plurality of through holes are arranged in a zigzag pattern on the peripheral wall of the cylindrical electrode.

【0015】複数の貫通孔を碁盤目に配置した場合と比
較して、貫通孔を円周方向に密に配置することができ
る。従って、セラミック粒子をワークの中空部に密の状
態で当てることができるので、セラミック粒子を金属相
に密の状態で共析することができる。
[0015] Compared to the case where a plurality of through holes are arranged in a grid, the through holes can be densely arranged in the circumferential direction. Therefore, since the ceramic particles can be applied to the hollow portion of the work in a dense state, the ceramic particles can be eutectoid to the metal phase in a dense state.

【0016】請求項5は、複数の貫通孔が筒形電極の内
側を小径とし且つ外側を大径としたテーパ孔であること
を特徴とする。
According to a fifth aspect of the present invention, the plurality of through holes are tapered holes having a small diameter inside the cylindrical electrode and a large diameter outside.

【0017】複合メッキ液を複数の貫通孔から外側に向
って拡散しながら噴射することができるので、ワークの
中空部に広く当てることができる。従って、複数の貫通
孔から噴射した複合メッキ液中のセラミックス粒子を効
率よく均一に分散し、分散した状態のセラミック粒子を
金属相に共析することができる。
Since the composite plating solution can be sprayed while diffusing outward from the plurality of through holes, it can be widely applied to the hollow portion of the work. Therefore, the ceramic particles in the composite plating solution sprayed from the plurality of through holes can be efficiently and uniformly dispersed, and the dispersed ceramic particles can be co-deposited with the metal phase.

【0018】[0018]

【発明の実施の形態】本発明の実施の形態を添付図に基
づいて以下に説明する。なお、図面は符号の向きに見る
ものとする。図1は本発明に係る複合メッキ装置(第1
実施例)を示す全体図である。複合メッキ装置1は、ワ
ークとしての内燃機関用のシリンダブロック2の中空部
3内に隙間S1を開けて配置した筒形電極4と、筒形電
極4の内側流路に後述する複合メッキ液5を供給するメ
ッキ液循環機構6と、シリンダブロック2と筒形電極4
とに通電する通電機構7とからなる。なお、筒形電極4
については図2で説明する。
Embodiments of the present invention will be described below with reference to the accompanying drawings. The drawings should be viewed in the direction of reference numerals. FIG. 1 shows a composite plating apparatus (first embodiment) according to the present invention.
FIG. Composite plating apparatus 1 has a cylindrical electrode 4 arranged with a gap S 1 in the hollow portion 3 of the cylinder block 2 for an internal combustion engine as a work, a composite plating solution which will be described later in the inner channel of the cylindrical electrode 4 5, a plating solution circulating mechanism 6, a cylinder block 2, and a cylindrical electrode 4.
And an energizing mechanism 7 for energizing the components. The cylindrical electrode 4
Will be described with reference to FIG.

【0019】8は中空部3と筒形電極4とで形成した環
状通路、9は冷却水の通路となるウォータジャケット、
10はシリンダ内面、11はクランク室、12は遮蔽板
である。遮蔽板12は、中空部3との隙間がS2となる
ように形成した中空部3より小径な弾性部材である。
Reference numeral 8 denotes an annular passage formed by the hollow portion 3 and the cylindrical electrode 4, 9 denotes a water jacket serving as a cooling water passage,
Reference numeral 10 denotes an inner surface of the cylinder, 11 denotes a crank chamber, and 12 denotes a shielding plate. The shielding plate 12, the gap between the hollow portion 3 is small elastic member from the hollow portion 3 formed so as to be S 2.

【0020】メッキ液循環機構6は、複合メッキ液を蓄
えるタンク13と、タンク13に吸込口を連通するポン
プ14と、ポンプ14の吐出口を筒形電極4の入口に連
結する供給管15と、シリンダブロック2を載せるとと
もに環状通路8に連通する回収通路16を備えた基台1
7と、基台17の回収通路16をタンク13に連通する
戻し管18とからなる。
The plating solution circulating mechanism 6 includes a tank 13 for storing the composite plating solution, a pump 14 communicating the suction port with the tank 13, and a supply pipe 15 connecting the discharge port of the pump 14 to the inlet of the cylindrical electrode 4. 1 on which a cylinder block 2 is placed and a recovery passage 16 communicating with the annular passage 8 is provided.
7 and a return pipe 18 that communicates the collection passage 16 of the base 17 with the tank 13.

【0021】19はリリーフ回路、20はリリーフ弁で
あり、供給管15の内圧が一定値を越えたときに、リリ
ーフ弁20が開いて圧力を戻し管18へ逃がすことによ
り筒形電極4の内圧が過大になることを防止する。前記
複合メッキ液5は、水1リットル当たりに硫酸ニッケル
(NiSO4)400g、ホウ酸35g、サッカリンナ
トリウム2.5gを加えて硬度調整したPH=4のもの
を用い、炭化ケイ素(SiC)粒子60gを懸濁させた
ものである。
Reference numeral 19 denotes a relief circuit, and reference numeral 20 denotes a relief valve. When the internal pressure of the supply pipe 15 exceeds a predetermined value, the relief valve 20 opens to release the pressure to the return pipe 18 so that the internal pressure of the cylindrical electrode 4 is reduced. Is prevented from becoming excessive. The composite plating solution 5 was prepared by adding 400 g of nickel sulfate (NiSO 4 ), 35 g of boric acid, and 2.5 g of sodium saccharin per liter of water to adjust the hardness to PH = 4. It is a suspension.

【0022】図2は本発明に係る筒形電極(第1実施
例)の断面図である。筒形電極4は、例えばCu系合金
電極やTiコーティング金属電極で、図1に示す中空部
3の内面に対向する大径の周壁25と、周壁25にピッ
チPの碁盤目に配置した複数の貫通孔26…と、周壁2
5の上端部に備えるとともに図1に示す遮蔽板11を載
せるための蓋部27と、周壁25の下端部から下方に延
びた小径のネック部28とからなる。
FIG. 2 is a sectional view of a cylindrical electrode (first embodiment) according to the present invention. The cylindrical electrode 4 is, for example, a Cu-based alloy electrode or a Ti-coated metal electrode, and has a large-diameter peripheral wall 25 facing the inner surface of the hollow portion 3 shown in FIG. The through-hole 26 and the peripheral wall 2
The cover 27 is provided at the upper end of the peripheral wall 5 and has a small diameter neck 28 extending downward from the lower end of the peripheral wall 25.

【0023】図3は本発明に係る複合メッキ装置(第1
実施例)の第1作用説明図である。筒形電極4にシリン
ダブロック2を上方から被せて基台17にセットし、基
台17の回収通路16と環状通路8とを連通する。この
とき、遮蔽板12と中空部3との間の隙間をS2とした
ので、前記セットの際に中空部3が遮蔽板12に干渉す
る心配はない。
FIG. 3 shows a composite plating apparatus (first embodiment) according to the present invention.
FIG. 9 is a first operation explanatory diagram of the embodiment). The cylinder block 2 is placed on the cylindrical electrode 4 from above and set on the base 17, and the collection passage 16 of the base 17 and the annular passage 8 communicate with each other. At this time, since the gap between the shielding plate 12 and the hollow portion 3 has a S 2, the hollow portion 3 is not interfere worry shield 12 during the set.

【0024】この状態で、図1に示すポンプ14を駆動
し、タンク13内の複合メッキ液5を供給管15を介し
て筒形電極4の内側に供給する。従って、複合メッキ液
5は矢印方向に流れる。ここで、筒形電極4は下流側
に蓋部27を備えているので、蓋部27で複合メッキ液
5は矢印方向の流れが遮られて貫通孔26…に向って
矢印方向に流れる。次に、複合メッキ液5は貫通孔2
6…から環状通路8内(すなわち、矢印方向)に噴射
して中空部3の内面に衝突する。中空部3に衝突した複
合メッキ液5は環状通路8に沿って下方向(矢印方
向)に流れ、回収通路16→図1に示す戻し管18→タ
ンク13の順に流れる。なお、遮蔽板12は複合メッキ
液5がクランク室11内への侵入することをも防止する
作用をなす。
In this state, the pump 14 shown in FIG. 1 is driven to supply the composite plating solution 5 in the tank 13 to the inside of the cylindrical electrode 4 via the supply pipe 15. Therefore, the composite plating solution 5 flows in the direction of the arrow. Here, since the cylindrical electrode 4 is provided with the lid 27 on the downstream side, the flow of the composite plating solution 5 in the arrow direction is blocked by the lid 27 and flows in the direction of the arrow toward the through holes 26. Next, the composite plating solution 5 is applied to the through holes 2.
6, are injected into the annular passage 8 (that is, in the direction of the arrow) and collide with the inner surface of the hollow portion 3. The composite plating solution 5 that has collided with the hollow portion 3 flows downward (in the direction of the arrow) along the annular passage 8, and flows in the order of the recovery passage 16 → the return pipe 18 shown in FIG. 1 → the tank 13. The shielding plate 12 also functions to prevent the composite plating solution 5 from entering the crank chamber 11.

【0025】図4は本発明に係る複合メッキ装置(第1
実施例)の第2作用説明図である。貫通孔26…から環
状通路8内に向けて矢印の如く噴射した複合メッキ液
5は、中空部3の内面に衝突するので、環状通路8を流
れる複合メッキ液5が、ループ状の矢印で示すように乱
流となる。従って、環状通路8の複合メッキ液5中に均
一にセラミックス粒子であるSiC粒子32…が分散す
る。
FIG. 4 shows a composite plating apparatus (first embodiment) according to the present invention.
FIG. 10 is a second operation explanatory diagram of the embodiment). Since the composite plating solution 5 sprayed from the through holes 26 into the annular passage 8 as shown by arrows collides with the inner surface of the hollow portion 3, the composite plating solution 5 flowing through the annular passage 8 is indicated by loop arrows. Turbulence. Accordingly, the SiC particles 32, which are ceramic particles, are uniformly dispersed in the composite plating solution 5 in the annular passage 8.

【0026】この状態で、図1に示す通電機構7を操作
して筒形電極4とシリンダブロック2とに通電する。複
合メッキ液5中のNiイオンを中空部3の内面に析出す
るとともに、SiC粒子32…をNiマトリクス33中
に共析する。このとき、SiC粒子32…が複合メッキ
液5中に均一に分散しているので、SiC粒子32…は
Niマトリクス33中に均一に共析する。
In this state, the energizing mechanism 7 shown in FIG. 1 is operated to energize the cylindrical electrode 4 and the cylinder block 2. Ni ions in the composite plating solution 5 are precipitated on the inner surface of the hollow portion 3, and SiC particles 32 are co-deposited in the Ni matrix 33. At this time, since the SiC particles 32 are uniformly dispersed in the composite plating solution 5, the SiC particles 32 are uniformly eutectoid in the Ni matrix 33.

【0027】図5は本発明に係る複合メッキ装置(第1
実施例)と従来の複合メッキ装置とを対比したグラスで
ある。横軸は中空部3のシリンダヘッド側端部P1〜ク
ランク室側端部P2間のメッキ処理位置を示し、縦軸は
Ni/SiC複合メッキ皮膜34中のSiC粒子32…
(図4参照)の共析量を示す。太い実線は本発明に係る
の複合メッキ装置1(図1に示す)でNi/SiC複合
メッキ皮膜34を施した第1実施例のグラフで、細い実
線は図11に示す従来の装置でNi/SiC複合メッキ
皮膜を施した比較例のグラフである。
FIG. 5 shows a composite plating apparatus (first embodiment) according to the present invention.
7 is a glass in which Example) is compared with a conventional composite plating apparatus. The horizontal axis indicates the plating position between the cylinder head side end P 1 and the crankcase side end P 2 of the hollow portion 3, and the vertical axis indicates the SiC particles 32 in the Ni / SiC composite plating film 34.
(See FIG. 4). The bold solid line is a graph of the first embodiment in which the Ni / SiC composite plating film 34 is applied by the composite plating apparatus 1 (shown in FIG. 1) according to the present invention, and the thin solid line is Ni / SiC in the conventional apparatus shown in FIG. It is a graph of the comparative example which provided the SiC composite plating film.

【0028】第1実施例の場合、中空部3のシリンダヘ
ッド側端部P1からクランク室側端部P2まで、SiC粒
子32…の共析量が一定に保たれていることがわかる。
一方、比較例の場合、中空部3のシリンダヘッド側端部
1からクランク室側端部P2に近づくに従って、SiC
粒子32…の共析量が漸次減少することがわかる。従っ
て、第1実施例によれば、Ni/SiC複合メッキ皮膜
34にSiC粒子32…を均一に共析することができる
ので、中空部3の耐摩耗性を均一に高めることができ
る。
[0028] In the first embodiment, it is understood that the cylinder head side end portion P 1 of the hollow portion 3 to the crank chamber-side end portion P 2, SiC particles 32 ... of eutectoid amount is kept constant.
On the other hand, in the case of the comparative example, the closer from the cylinder head side end portion P 1 of the hollow portion 3 in the crank chamber side end portion P 2, SiC
It can be seen that the eutectoid amount of the particles 32 gradually decreases. Therefore, according to the first embodiment, since the SiC particles 32 can be co-deposited uniformly on the Ni / SiC composite plating film 34, the wear resistance of the hollow portion 3 can be uniformly increased.

【0029】図6は本発明に係る筒形電極(第2実施
例)を示す断面図である。筒形電極40は、貫通孔41
…を筒形電極40の内側の流れに沿って、上流側を大径
とし下流側に向って漸次小径としたことを特徴とする。
FIG. 6 is a sectional view showing a cylindrical electrode (second embodiment) according to the present invention. The cylindrical electrode 40 has a through hole 41
Are characterized in that, along the flow inside the cylindrical electrode 40, the upstream side has a large diameter and the downstream side has a gradually decreasing diameter.

【0030】図7は本発明に係る筒形電極(第2実施
例)の作用説明図である。筒形電極40に供給した内側
の複合メッキ液5は、下流側(矢印方向)に流れて筒
形電極40の蓋部42に当たり流れが遮られて、蓋部4
2側の液圧が高圧になる。従って、蓋部42側(液圧が
高い側)の貫通孔41…を小径とし、上流側(液圧が低
い側)に向って漸次大径とすることにより、全ての貫通
孔41…から一定量の複合メッキ液5を噴射できる。
FIG. 7 is an explanatory view of the operation of the cylindrical electrode (second embodiment) according to the present invention. The inner composite plating solution 5 supplied to the cylindrical electrode 40 flows downstream (in the direction of the arrow) and hits the lid 42 of the cylindrical electrode 40, and the flow is interrupted.
The hydraulic pressure on the second side becomes high. Therefore, the through-holes 41 on the side of the lid portion 42 (the side where the hydraulic pressure is high) are made smaller in diameter, and gradually increased in diameter toward the upstream side (the side where the hydraulic pressure is lower), so that all the through-holes 41 are constant. The amount of the composite plating solution 5 can be sprayed.

【0031】図8は本発明に係る筒形電極(第3実施
例)を示す断面図である。筒形電極45は、周壁46に
貫通孔47…を碁盤目配置と同一ピッチPで千鳥に配置
したことを特徴とする。碁盤目配置と比較して貫通孔4
7と貫通孔47との間隔S3が小さくなるので、貫通孔
47…を円周方向に密に配置することができる。従っ
て、SiC粒子32…をシリンダブロック2の中空部3
に密の状態で当てることができるので、SiC粒子32
…をNiマトリクス33に密の状態で共析することがで
きる。
FIG. 8 is a sectional view showing a cylindrical electrode (third embodiment) according to the present invention. The cylindrical electrode 45 is characterized in that the through-holes 47 are arranged in the peripheral wall 46 in a staggered manner at the same pitch P as the grid arrangement. Through hole 4 compared to grid layout
7 and since the distance S 3 between the through-hole 47 is reduced, it is possible to densely arranged through holes 47 ... and the circumferential direction. Therefore, the SiC particles 32.
The SiC particles 32
.. Can be eutectoid in the Ni matrix 33 in a dense state.

【0032】図9は本発明に係る筒形電極(第4実施
例)を示す断面図である。筒形電極50は、周壁51の
貫通孔52…を筒形電極50の内側で小径とし且つ外側
で大径としたテーパ孔であることを特徴とする。
FIG. 9 is a sectional view showing a cylindrical electrode (fourth embodiment) according to the present invention. The cylindrical electrode 50 is characterized in that the through holes 52 of the peripheral wall 51 are tapered holes having a small diameter inside the cylindrical electrode 50 and a large diameter outside.

【0033】図10は本発明に係る筒形電極(第4実施
例)の作用説明図である。貫通孔52…を筒形電極50
の内側で小径とし外側で大径としたので、複合メッキ液
5は貫通孔52…から矢印方向に拡散しながら環状通
路4に噴射する。従って、貫通孔52…から噴射噴射し
た複合メッキ液5をシリンダブロック2の中空部3に広
く当てることができるので、複合メッキ液中のセラミッ
クス粒子を効率よく均一に分散した状態でNiマトリク
ス33に共析することができる。
FIG. 10 is a diagram for explaining the operation of the cylindrical electrode (fourth embodiment) according to the present invention. The through-holes 52...
The composite plating solution 5 is sprayed into the annular passage 4 while diffusing in the direction of the arrow from the through holes 52. Therefore, the composite plating solution 5 sprayed from the through-holes 52 can be widely applied to the hollow portion 3 of the cylinder block 2, and thus the ceramic particles in the composite plating solution are efficiently and uniformly dispersed on the Ni matrix 33. It can be eutectoid.

【0034】前記第1実施例では筒形電極4の上端部に
中空部3の内径より小径の遮蔽板12を取付けた場合を
説明したが、遮蔽板12を中空部3の内径より大径とし
てもよい。遮蔽板12を大径とすることにより、遮蔽板
12で環状通路8の上端を完全に閉じることも可能であ
る。また、筒形電極4の上端部に遮蔽板12を配置しな
くてもよい。
In the first embodiment, the case where the shielding plate 12 having a diameter smaller than the inner diameter of the hollow portion 3 is attached to the upper end portion of the cylindrical electrode 4 has been described. Is also good. By increasing the diameter of the shielding plate 12, the upper end of the annular passage 8 can be completely closed by the shielding plate 12. Further, the shielding plate 12 need not be disposed at the upper end of the cylindrical electrode 4.

【0035】前記第1実施例〜第4実施例ではワークと
して内燃機関用のシリンダブロック2に複合メッキ皮膜
34を施す場合を説明したが、本発明に係る複合メッキ
装置1を、シリンダブロック2以外の中空部を有するワ
ークに適用しても同様の効果を得ることができる。ま
た、前記第1実施例〜第4実施例ではセラミックス粒子
としてSiC粒子32…を含んだNi/SiC複合メッ
キ5を使用した場合を説明したが、SiC粒子32…以
外のセラミックス粒子を含んだ複合メッキ液を使用して
もよい。前記第1実施例〜第4実施例では筒形電極を蓋
部で塞いだ場合を説明したが、有底の筒形電極として筒
形電極の底部を塞いでもよい。このとき、複合メッキ液
を底部と反対側から供給する。
In the first to fourth embodiments, the case where the composite plating film 34 is applied to the cylinder block 2 for an internal combustion engine as a work has been described. The same effect can be obtained by applying to a work having a hollow part. In the first to fourth embodiments, the Ni / SiC composite plating 5 including the SiC particles 32 is used as the ceramic particles. However, the composite including ceramic particles other than the SiC particles 32 is used. A plating solution may be used. In the first to fourth embodiments, the case where the cylindrical electrode is closed with the lid is described, but the bottom of the cylindrical electrode may be closed as a bottomed cylindrical electrode. At this time, the composite plating solution is supplied from the side opposite to the bottom.

【0036】[0036]

【発明の効果】本発明は上記構成により次の効果を発揮
する。請求項1は、ワークの中空部内に隙間を開けて筒
形電極を配置し、この筒形電極の周壁に複数の貫通孔を
備えた。従って、複合メッキ液を複数の貫通孔から筒形
電極の外側に噴射し、噴射した複合メッキ液を中空部の
内面に衝突させることができる。この結果、複合メッキ
液が乱流状態となり、複合メッキ液中のセラミックス粒
子が均一に分散するので、セラミックス粒子が複合メッ
キ皮膜の金属マトリックス中に均一に共析する。従っ
て、複合メッキ皮膜の耐摩耗性を均一に高めることがで
きる。
According to the present invention, the following effects are exhibited by the above configuration. According to a first aspect of the present invention, a cylindrical electrode is arranged in the hollow portion of the work with a gap therebetween, and a plurality of through holes are provided in a peripheral wall of the cylindrical electrode. Therefore, the composite plating solution can be injected from the plurality of through holes to the outside of the cylindrical electrode, and the injected composite plating solution can collide with the inner surface of the hollow portion. As a result, the composite plating solution is in a turbulent state, and the ceramic particles in the composite plating solution are uniformly dispersed, so that the ceramic particles are uniformly eutectoid in the metal matrix of the composite plating film. Therefore, the wear resistance of the composite plating film can be uniformly increased.

【0037】請求項2は、有底又は蓋付きの筒形電極に
複合メッキ液を供給するので、底部又は蓋部で複合メッ
キ液の流れを遮る。従って、底部又は蓋部側の複合メッ
キ液圧が高くなるので、下流側の小径の貫通孔で複合メ
ッキ液圧が高くなり、上流側の大径の貫通孔で複合メッ
キ液圧が低くなる。このため、全ての貫通孔から一定量
の複合メッキ液を噴射することができる。従って、セラ
ミックス粒子をワークの中空部に均一に当てることがで
きるので、セラミック粒子を金属相に均一に共析するこ
とができる。
According to the second aspect of the present invention, since the composite plating solution is supplied to the bottomed or covered cylindrical electrode, the flow of the composite plating solution is blocked at the bottom or the lid. Accordingly, the composite plating solution pressure on the bottom or the lid side increases, so that the composite plating solution pressure increases on the downstream small-diameter through-hole, and the composite plating solution pressure decreases on the upstream large-diameter through-hole. Therefore, a fixed amount of the composite plating solution can be sprayed from all the through holes. Therefore, since the ceramic particles can be uniformly applied to the hollow portion of the work, the ceramic particles can be co-deposited uniformly with the metal phase.

【0038】請求項3は、複合メッキ液を周壁から等間
隔に噴射することができるので、セラミックス粒子をワ
ークの中空部に均一に当てることができる。従って、セ
ラミック粒子を金属相に均一に共析することができる。
According to the third aspect, since the composite plating solution can be jetted from the peripheral wall at equal intervals, the ceramic particles can be uniformly applied to the hollow portion of the work. Therefore, the ceramic particles can be uniformly eutectoid with the metal phase.

【0039】請求項4は、複数の貫通孔を碁盤目に配置
した場合と比較して、貫通孔を円周方向に密に配置する
ことができる。従って、セラミック粒子をワークの中空
部に密の状態で当てることができるので、セラミック粒
子を金属相に密の状態で共析することができる。
According to the fourth aspect, the through holes can be densely arranged in the circumferential direction as compared with the case where a plurality of through holes are arranged in a grid. Therefore, since the ceramic particles can be applied to the hollow portion of the work in a dense state, the ceramic particles can be eutectoid to the metal phase in a dense state.

【0040】請求項5は、複合メッキ液を複数の貫通孔
から外側に向って拡散しながら噴射することができるの
で、ワークの中空部に広く当てることができる。従っ
て、複数の貫通孔から噴射した複合メッキ液中のセラミ
ックス粒子を効率よく均一に分散し、分散した状態のセ
ラミック粒子を金属相に共析することができる。
According to the fifth aspect, since the composite plating solution can be sprayed outward while diffusing from the plurality of through holes, the composite plating solution can be widely applied to the hollow portion of the work. Therefore, the ceramic particles in the composite plating solution sprayed from the plurality of through holes can be efficiently and uniformly dispersed, and the dispersed ceramic particles can be co-deposited with the metal phase.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る複合メッキ装置(第1実施例)を
示す全体図
FIG. 1 is an overall view showing a composite plating apparatus (first embodiment) according to the present invention.

【図2】本発明に係る筒形電極(第1実施例)の断面図FIG. 2 is a sectional view of a cylindrical electrode (first embodiment) according to the present invention.

【図3】本発明に係る複合メッキ装置(第1実施例)の
第1作用説明図
FIG. 3 is a diagram illustrating a first operation of the composite plating apparatus (first embodiment) according to the present invention.

【図4】本発明に係る複合メッキ装置(第1実施例)の
第1作用説明図
FIG. 4 is a diagram illustrating a first operation of the composite plating apparatus (first embodiment) according to the present invention.

【図5】本発明に係る複合メッキ装置(第1実施例)の
データと比較例のデータを示したグラス
FIG. 5 is a glass showing data of a composite plating apparatus according to the present invention (first embodiment) and data of a comparative example.

【図6】本発明に係る筒形電極(第2実施例)を示す断
面図
FIG. 6 is a cross-sectional view showing a cylindrical electrode (second embodiment) according to the present invention.

【図7】本発明に係る筒形電極(第2実施例)の作用説
明図
FIG. 7 is a diagram illustrating the operation of a cylindrical electrode (second embodiment) according to the present invention.

【図8】本発明に係る筒形電極(第3実施例)を示す断
面図
FIG. 8 is a sectional view showing a cylindrical electrode (third embodiment) according to the present invention.

【図9】本発明に係る筒形電極(第4実施例)を示す断
面図
FIG. 9 is a sectional view showing a cylindrical electrode (fourth embodiment) according to the present invention.

【図10】本発明に係る筒形電極(第4実施例)の作用
説明図
FIG. 10 is a diagram illustrating the operation of a cylindrical electrode according to the present invention (fourth embodiment).

【図11】従来のNi/SiC複合メッキ処理の説明図FIG. 11 is an explanatory view of a conventional Ni / SiC composite plating process.

【図12】図11の12部拡大図FIG. 12 is an enlarged view of part 12 of FIG.

【符号の説明】[Explanation of symbols]

1…複合メッキ装置、2…ワーク(シリンダブロッ
ク)、3…中空部、4,40,45,50…筒形電極、
5…複合メッキ液、6…メッキ液循環機構、7…通電機
構、8…環状通路、10…シリンダ内面、25,46,
51…周壁、26,41,47,52…貫通孔、27,
42…蓋部、32…セラミックス粒子(SiC粒子)、
1…隙間。
DESCRIPTION OF SYMBOLS 1 ... Composite plating apparatus, 2 ... Work (cylinder block), 3 ... Hollow part, 4, 40, 45, 50 ... Cylindrical electrode,
5: Composite plating solution, 6: Plating solution circulation mechanism, 7: Electric conduction mechanism, 8: Annular passage, 10: Cylinder inner surface, 25, 46,
51 ... peripheral wall, 26, 41, 47, 52 ... through-hole, 27,
42: lid, 32: ceramic particles (SiC particles),
S 1 ... gap.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 中空部を有するワークの中空部内に隙間
を開けて配置し、有底又は蓋付きで且つ前記中空部の内
面と対向する周壁に複数の貫通孔を有する筒形電極と、
この筒形電極の内側にメッキ液にセラミックス粒子を混
合した複合メッキ液を供給し、前記周壁の貫通孔を通じ
て噴射させ、筒形電極の外側から回収するメッキ液循環
機構と、前記ワークと筒形電極とに通電する通電機構と
からなる複合メッキ装置。
A cylindrical electrode having a bottom or a lid and having a plurality of through-holes in a peripheral wall opposed to an inner surface of the hollow portion, the cylindrical electrode being arranged with a gap in the hollow portion of a work having the hollow portion;
A plating solution circulation mechanism for supplying a composite plating solution in which ceramic particles are mixed with a plating solution to the inside of the cylindrical electrode, injecting the composite plating solution through through holes in the peripheral wall, and collecting the plating solution from the outside of the cylindrical electrode; A composite plating apparatus consisting of a current supply mechanism for supplying power to the electrodes.
【請求項2】 前記複数の貫通孔は、筒形電極の内側の
流れに沿って上流側を大径とし下流側に向って漸次小径
としたことを特徴とする請求項1記載の複合メッキ装
置。
2. The composite plating apparatus according to claim 1, wherein the plurality of through holes have a larger diameter on the upstream side and a smaller diameter on the downstream side along the flow inside the cylindrical electrode. .
【請求項3】 前記複数の貫通孔は、筒形電極の周壁に
碁盤目に配置したことを特徴とする請求項1記載の複合
メッキ装置。
3. The composite plating apparatus according to claim 1, wherein the plurality of through holes are arranged in a grid on a peripheral wall of the cylindrical electrode.
【請求項4】 前記複数の貫通孔は、筒形電極の周壁に
千鳥に配置したことを特徴とする請求項1記載の複合メ
ッキ装置。
4. The composite plating apparatus according to claim 1, wherein the plurality of through holes are arranged in a zigzag pattern on a peripheral wall of the cylindrical electrode.
【請求項5】 前記複数の貫通孔は、筒形電極の内側を
小径とし且つ外側を大径としたテーパ孔であることを特
徴とする請求項1記載の複合メッキ装置。
5. The composite plating apparatus according to claim 1, wherein the plurality of through holes are tapered holes having a small diameter inside the cylindrical electrode and a large diameter outside the cylindrical electrode.
JP28263996A 1996-10-24 1996-10-24 Composite plating equipment Expired - Fee Related JP3516287B2 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP28263996A JP3516287B2 (en) 1996-10-24 1996-10-24 Composite plating equipment
US08/953,131 US6086731A (en) 1996-10-24 1997-10-17 Composite plating apparatus
CA002218784A CA2218784C (en) 1996-10-24 1997-10-20 Composite plating apparatus
DE19746703A DE19746703B4 (en) 1996-10-24 1997-10-22 plating
GB9722557A GB2318588B (en) 1996-10-24 1997-10-24 Composite plating apparatus
FR9713340A FR2755153B1 (en) 1996-10-24 1997-10-24 COMPOSITE PLATING APPARATUS FOR THE INTERNAL SURFACE OF A WORKPIECE

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28263996A JP3516287B2 (en) 1996-10-24 1996-10-24 Composite plating equipment

Publications (2)

Publication Number Publication Date
JPH10130880A true JPH10130880A (en) 1998-05-19
JP3516287B2 JP3516287B2 (en) 2004-04-05

Family

ID=17655141

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28263996A Expired - Fee Related JP3516287B2 (en) 1996-10-24 1996-10-24 Composite plating equipment

Country Status (1)

Country Link
JP (1) JP3516287B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003014424A1 (en) * 2001-08-10 2003-02-20 Gramm Gmbh & Co. Kg Device and method for galvanic surface treatment of work pieces
JP2010216006A (en) * 2009-02-19 2010-09-30 Denso Corp Method for jet stream type plating, and device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102454081B1 (en) * 2021-03-26 2022-10-14 새한솔루텍 주식회사 Barrel for plating

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003014424A1 (en) * 2001-08-10 2003-02-20 Gramm Gmbh & Co. Kg Device and method for galvanic surface treatment of work pieces
JP2010216006A (en) * 2009-02-19 2010-09-30 Denso Corp Method for jet stream type plating, and device

Also Published As

Publication number Publication date
JP3516287B2 (en) 2004-04-05

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