JPH10123312A - Color filter, color liquid crystal display device, and production of those - Google Patents

Color filter, color liquid crystal display device, and production of those

Info

Publication number
JPH10123312A
JPH10123312A JP27780496A JP27780496A JPH10123312A JP H10123312 A JPH10123312 A JP H10123312A JP 27780496 A JP27780496 A JP 27780496A JP 27780496 A JP27780496 A JP 27780496A JP H10123312 A JPH10123312 A JP H10123312A
Authority
JP
Japan
Prior art keywords
transparent
light transmittance
colored
color
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP27780496A
Other languages
Japanese (ja)
Other versions
JP3883238B2 (en
Inventor
Akira Matsumura
晃 松村
Hideyuki Inaba
英行 稲葉
Toshihiko Ueda
敏彦 植田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Priority to JP27780496A priority Critical patent/JP3883238B2/en
Publication of JPH10123312A publication Critical patent/JPH10123312A/en
Application granted granted Critical
Publication of JP3883238B2 publication Critical patent/JP3883238B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To improve both of brightness and color purity of a color filter by forming a transparent colorless part in a size which can not be visually recognized in each transparent color pixel patterned into plural colors on a transparent substrate. SOLUTION: A positive photosensitive resin layer 3 is formed on a conductive layer 2 (B). Then a mask 4 having a specified pattern is mounted thereon (C) to obtain a patterned substrate (D). The conductive layer 2 is energized to form black pixels 8 by electrodeposition in an electrodeposition bath (E). A positive mask having a light transmitting part corresponding to a color image while a light-shielding part 10 corresponding to a transparent colorless part remains is mounted on the black pixels and the positive photosensitive resin layer on the substrate 1 to obtain a patterned substrate (G). Further, first color pixels red(R) are formed by electrodeposition (H). These processes (F) to (H) are repeated (I) to (K) to form second color pixels green(G) 6. At least, a transparent colorless part 9 is formed (P), (Q).

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はカラーフィルターに
関し、更に詳しくはカラー液晶表示装置、カラーファク
シミリ、三管式および単管式カラービデオカメラ、固体
カラービデオカメラなどに装着されるカラーフィルタ
ー、ならびにこのカラーフィルターを用いた液晶表示装
着およびそれらの製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter, and more particularly, to a color filter mounted on a color liquid crystal display, a color facsimile, a three-tube and single-tube color video camera, a solid color video camera, and the like. The present invention relates to mounting of a liquid crystal display using a color filter and a method of manufacturing the same.

【0002】[0002]

【従来の技術】カラー液晶表示装置は、一般にガラス等
の基板上にカラーフィルターを形成してその上に電極を
形成してカラー画像を表示する。このようにカラー液晶
表示装置等で用いられるカラーフィルターは、色相の異
なる3種以上の色相に着色された極めて微細な領域を基
板上に設けることによって形成される。
2. Description of the Related Art In general, a color liquid crystal display device displays a color image by forming a color filter on a substrate such as glass and forming electrodes thereon. As described above, a color filter used in a color liquid crystal display device or the like is formed by providing extremely fine regions colored with three or more hues having different hues on a substrate.

【0003】この各色相の微細な領域からなるパターン
としては、縞状のいわゆるストライプ状パターンや相異
なる色相の領域が互いに隣り合うモザイク状パターンが
知られているが、ある条件下では、モザイク状パターン
の方が視覚上優れた効果が得られることが知られてい
る。またこれらのパターンにおいては、着色画素が直接
隣接している場合は色のコントラストが出にくいため、
色画素と色画素の間には黒色画素が形成されることが好
ましい。
As a pattern composed of fine regions of each hue, a so-called striped stripe pattern or a mosaic pattern in which regions of different hues are adjacent to each other are known. It is known that a pattern provides a visually superior effect. In these patterns, when colored pixels are directly adjacent to each other, it is difficult to obtain color contrast.
It is preferable that a black pixel is formed between the color pixels.

【0004】このようなカラーフィルターは、顔料分散
法、電着法、印刷法等の方法により形成されている。し
かしこれまではいずれの方法で得られたカラーフィルタ
ーも画像の明るさと色純度とをともに満足するに至って
いない。即ち色純度を高めようとすれば明るさが不十分
になり、明るさを優先すれば色純度がある程度犠牲にな
らざるを得なかった。
[0004] Such a color filter is formed by a method such as a pigment dispersion method, an electrodeposition method, and a printing method. However, the color filters obtained by any of the methods have not yet satisfied both the brightness and the color purity of the image. That is, if the color purity is to be increased, the brightness becomes insufficient, and if the brightness is prioritized, the color purity has to be sacrificed to some extent.

【0005】一方、液晶表示装置には、光源がバックラ
イトとして液晶セルの背面に置かれた透過型と、外部光
源を利用し、その液晶セルからの反射光を観察する反射
型とがあり、透過型ではある程度までは画像が明るく、
且つ高い色純度を出すことができる。しかし透過型の場
合、光源のための電源および光源ランプを内蔵する必要
があり、小型化、薄型化および軽量化は困難で、したが
って携帯用としては適さない。そのため反射型は、最近
では携帯用に適する方式として、また薄型化できる方法
として注目されてきている。
On the other hand, liquid crystal display devices include a transmission type in which a light source is provided as a backlight on the back of a liquid crystal cell and a reflection type in which an external light source is used to observe reflected light from the liquid crystal cell. In the transmission type, the image is bright to some extent,
In addition, high color purity can be obtained. However, in the case of the transmission type, it is necessary to incorporate a power source and a light source lamp for a light source, and it is difficult to reduce the size, thickness, and weight, and thus it is not suitable for portable use. For this reason, the reflection type has recently attracted attention as a method suitable for portable use and as a method capable of reducing the thickness.

【0006】しかし反射型液晶表示装置は光源を内蔵し
ていないため、室内等の暗い所では画面が暗く、見にく
いという欠点がある。黒色画素の幅が広い場合には一層
この問題は顕著である。画像の色純度を薄くすることに
より画面を明るくすることができるが、そうすることに
より当然色純度は悪くなる。
However, since the reflection type liquid crystal display device does not have a built-in light source, it has a drawback that the screen is dark and difficult to see in a dark place such as a room. This problem is even more pronounced when the width of the black pixel is wide. The screen can be made brighter by reducing the color purity of the image, but this naturally lowers the color purity.

【0007】[0007]

【発明が解決しようとする課題】本発明は十分な明るさ
と色純度とを兼ね備えたカラー画像を表示することので
きるカラーフィルターを提供しようとするものである。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a color filter capable of displaying a color image having sufficient brightness and color purity.

【0008】[0008]

【課題を解決するための手段】本発明は透明基板上に設
けられた複数色パターン化されている各透明着色画素中
に、実質上肉視しえない大きさの透明無着色部を設ける
ことによりカラーフィルターの明るさと色純度とを同時
に向上させる方法に関する。より詳しくは、本発明は、
透明基板上に、複数色パターン化されて設けられている
着色画素が、透明着色画素と黒色画素からなり、透明着
色画素は、可視領域に光透過率が50%以上である光透
過領域を有し且つ光吸収領域の光透過率が20%以下で
ある分光特性曲線を有する透明着色部と可視領域全域に
わたって光透過率が40%以上である透明無着色部とか
らなり、黒色画素は可視領域全域にわたって光透過率が
5%以下であることを特徴とするカラーフィルター。
SUMMARY OF THE INVENTION According to the present invention, there is provided a transparent non-colored portion having a size substantially invisible to the naked eye, in each of the transparent colored pixels formed on a transparent substrate and patterned in a plurality of colors. To improve the brightness and color purity of a color filter at the same time. More specifically, the present invention
Colored pixels provided on the transparent substrate in a pattern of a plurality of colors are composed of a transparent colored pixel and a black pixel, and the transparent colored pixel has a light transmission region having a light transmittance of 50% or more in a visible region. A transparent colored portion having a spectral characteristic curve having a light transmittance of 20% or less in a light absorbing region and a transparent uncolored portion having a light transmittance of 40% or more over the entire visible region. A color filter having a light transmittance of 5% or less over the entire region.

【0009】また、本発明は、透明基板上に設けられた
透明導電層表面に感光性被膜を形成し、該感光性被膜に
可視領域に光透過率が50%以上である光透過領域を有
し且つ光吸収領域の光透過率が20%以下である分光特
性曲線を有する透明着色部と可視領域全域にわたって光
透過率が40%以上である透明無着色部とを形成するよ
うにパターン化されたマスクを載置したのちこれを露光
・現像して透明導電層の一部を露出させ、次いで電着塗
装法により透明着色部を形成し、必要回数のフォトリソ
グラフィ法と電着塗装法とを繰り返し、最後に感光性被
膜の残部を露光して露出し電着塗装して透明無着色部を
形成することを特徴とする上記カラーフィルターの製造
方法に関する。
The present invention also provides a photosensitive film formed on a surface of a transparent conductive layer provided on a transparent substrate, wherein the photosensitive film has a light transmitting region having a light transmittance of 50% or more in a visible region. And a transparent colored portion having a spectral characteristic curve having a light transmittance of 20% or less in a light absorbing region and a transparent uncolored portion having a light transmittance of 40% or more over the entire visible region. After placing the mask, it is exposed and developed to expose a part of the transparent conductive layer, and then a transparent colored portion is formed by an electrodeposition coating method, and a required number of photolithography and electrodeposition coating methods are performed. The present invention relates to a method for producing the above color filter, which comprises repeatedly exposing and finally exposing the remaining portion of the photosensitive film and performing electrodeposition coating to form a transparent and non-colored portion.

【0010】更に本発明は、少なくとも一対の電極基板
の間に液晶を封入してなるカラー液晶表示装置であっ
て、少なくとも一方の電極基板が透明基板上に複数の色
相の異なる透明着色部と透明無着色部からなる透明着色
画素と可視領域全域にわたって光透過率が5%以下であ
る黒色画素とから形成されたカラーフィルターを有し、
前記透明着色画素の少なくとも一つが、可視領域に光透
過率が50%以上である光透過領域を有し且つ光吸収領
域の光透過率が20%以下である分光特性曲線を有する
透明着色部と可視領域全域にわたって光透過率が40%
以上である透明無着色部とからなることを特徴とするカ
ラー液晶表示装置に関する。
Further, the present invention is a color liquid crystal display device in which liquid crystal is sealed between at least a pair of electrode substrates, wherein at least one of the electrode substrates has a plurality of transparent colored portions having different hues on a transparent substrate. A color filter formed of a transparent colored pixel comprising an uncolored portion and a black pixel having a light transmittance of 5% or less over the entire visible region;
At least one of the transparent colored pixels includes a transparent colored portion having a light transmission region having a light transmittance of 50% or more in a visible region and a spectral characteristic curve having a light transmittance of 20% or less in a light absorption region; 40% light transmittance over the entire visible region
The present invention relates to a color liquid crystal display device comprising the transparent and non-colored portions described above.

【0011】更にまた、本発明は、少なくとも一対の電
極基板の間に液晶を封入してなるカラー液晶表示装置で
あって、少なくとも一方の電極基板が、透明基板上に複
数の色相の異なる透明着色部と透明無着色部からなる透
明着色画素と黒色画素とから形成されたカラーフィルタ
ーを有するカラー液晶表示装置の製造において、可視領
域全域にわたって光透過率が5%以下である黒色画素を
形成し、次いで可視領域に光透過率が50%以上である
光透過領域を有し且つ光吸収領域の光透過率が20%以
下である分光特性曲線を有する透明着色部と、可視領域
全域にわたって光透過率が40%以上である透明無着色
部とからなる第1の色相の透明着色画素を第1のパター
ンにしたがって形成し、次いで第1の色相と異なる第2
の色相および第3の色相を同様に繰り返して第2、第3
の透明着色画素をパターン状に形成した後、黒色画素お
よび第1ないし第3のパターン状画素の上に透明導電膜
を形成することを特徴とする、カラー液晶表示装置の製
造方法に関する。
Further, the present invention is a color liquid crystal display device in which liquid crystal is sealed between at least a pair of electrode substrates, wherein at least one of the electrode substrates has a plurality of transparent colored layers having different hues on a transparent substrate. In the manufacture of a color liquid crystal display device having a color filter formed of a transparent colored pixel comprising a portion and a transparent uncolored portion and a black pixel, a black pixel having a light transmittance of 5% or less over the entire visible region is formed. Next, a transparent colored portion having a light transmission region having a light transmittance of 50% or more in a visible region and a spectral characteristic curve having a light transmittance of 20% or less in a light absorption region, and a light transmittance over the entire visible region. Is formed in accordance with the first pattern, and the second color is different from the first hue.
And the third hue are similarly repeated to obtain the second and third hues.
Forming a transparent colored pixel in a pattern, and then forming a transparent conductive film on the black pixel and the first to third patterned pixels.

【0012】即ち、本発明のカラーフィルターは複数色
パターン化された透明着色画素中に微細な透明無着色
部、即ち可視領域全域にわたって光透過率が40%以上
である透明領域、を分散または分割して有するように形
成されたものであり、この透明無着色部により透明着色
画素の明るさを増すことが可能となった。しかも透明着
色部の色濃度を増すことによって色純度を大きくするこ
とができる。かくして十分な明るさと色純度を兼備した
カラーフィルターが得られるに至った。
That is, the color filter of the present invention disperses or divides a fine transparent uncolored portion, that is, a transparent region having a light transmittance of 40% or more over the entire visible region, in a transparent colored pixel having a plurality of color patterns. This transparent non-colored portion makes it possible to increase the brightness of the transparent colored pixel. Moreover, the color purity can be increased by increasing the color density of the transparent colored portion. Thus, a color filter having both sufficient brightness and color purity was obtained.

【0013】[0013]

【発明の実施の態様】本発明のカラーフィルターは、複
数色パターン化されて設けられている透明着色画素と黒
色画素からなり、各透明着色画素中に、実質上肉視しえ
ない大きさの透明無着色部を設けたことを特徴とする。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The color filter of the present invention is composed of transparent colored pixels and black pixels provided in a pattern of a plurality of colors, and each transparent colored pixel has a substantially invisible size. A transparent non-colored portion is provided.

【0014】本発明において透明無着色部とは、可視領
域全域にわたって光透過率が40%以上である透明度の
高い領域をいう。即ち、本発明のカラーフィルターの透
明着色画素は、可視領域に光透過率が50%以上である
光透過領域を有し且つ光吸収領域の光透過率が20%以
下である分光特性曲線を有する透明着色部と可視領域全
域にわたって光透過率が40%以上である透明無着色部
とからなる。
In the present invention, the transparent non-colored portion refers to a highly transparent region having a light transmittance of 40% or more over the entire visible region. That is, the transparent colored pixel of the color filter of the present invention has a light transmission region with a light transmittance of 50% or more in the visible region and a spectral characteristic curve with a light transmittance of 20% or less in the light absorption region. It comprises a transparent colored portion and a transparent uncolored portion having a light transmittance of 40% or more over the entire visible region.

【0015】透明無着色部は、複数色パターン化された
透明着色画素中に微細な分散状態または分割状態で設け
られ、透明着色画素全体としての光透過率を高くするよ
うに働く。ひとつの透明着色画素内に於ける透明無着色
部の占める面積比率は30%以下、好ましくは25%以
下、より好ましくは20%以下である。分散して存在す
る個々の透明無着色部の大きさは最大部分で20μm以
下である。
The transparent non-colored portion is provided in a finely dispersed or divided state in the transparent colored pixels patterned into a plurality of colors, and functions to increase the light transmittance of the entire transparent colored pixel. The area ratio of the transparent uncolored portion in one transparent colored pixel is 30% or less, preferably 25% or less, more preferably 20% or less. The size of each transparent uncolored portion dispersed and present is 20 μm or less at the maximum.

【0016】透明無着色部は露出された電極基板上に電
着により透明膜を形成するのが好ましいが、例えば透明
粒子を透明着色画素を形成する透明着色膜中に分散させ
る等の他の手段により導入してもよい。
The transparent non-colored portion is preferably formed by forming a transparent film by electrodeposition on the exposed electrode substrate. Other means such as dispersing transparent particles in the transparent colored film forming the transparent colored pixels is preferable. May be introduced.

【0017】複数色パターン化された透明着色画素は、
ガラス等の基板上に形成された透明導電層上に感光性樹
脂層を形成し、これに色ごとにパターン化されたマスク
を載置して、露光・現像してパターンに相当した形状に
透明導電層を露出させ、露出した透明導電層上に電着塗
装により着色画素を形成することができる。透明着色画
素の色数は特に制限がないが、青、緑、赤の3原色を用
いるのが好ましい。
The transparent colored pixels patterned into a plurality of colors are:
A photosensitive resin layer is formed on a transparent conductive layer formed on a substrate such as glass, and a mask patterned for each color is placed on this layer. The conductive layer is exposed, and a colored pixel can be formed on the exposed transparent conductive layer by electrodeposition coating. Although the number of colors of the transparent colored pixels is not particularly limited, it is preferable to use three primary colors of blue, green, and red.

【0018】黒色画素は必ずしも必要とはしないが、こ
れを他の色画素どうしの境界に設けることにより、色の
コントラストを向上させることができ、本発明にとって
は黒色画素を設けるのが好ましい。黒色画素は可視領域
全域にわたって光透過率が5%以下とする。
Although a black pixel is not always necessary, by providing it at a boundary between pixels of other colors, color contrast can be improved. For the present invention, it is preferable to provide a black pixel. The black pixel has a light transmittance of 5% or less over the entire visible region.

【0019】黒以外のひとつの着色画素の大きさは50
〜300μm、好ましくは60〜150μm、より好ま
しくは70〜90μmであり、黒色画素の幅は5〜70
μm、好ましくは10〜50μm、より好ましくは15
〜30μmである。
The size of one colored pixel other than black is 50
To 300 μm, preferably 60 to 150 μm, more preferably 70 to 90 μm, and the width of the black pixel is 5 to 70 μm.
μm, preferably 10 to 50 μm, more preferably 15 μm
3030 μm.

【0020】各透明着色画素は、その透明着色画像部分
が可視領域の分光特性曲線に於けるその色に相当する光
透過領域の光透過率が50%以上であり、光吸収領域の
光透過率が20%以下になるように形成される。例えば
図2は緑色の画素の分光特性曲線を示したものである
が、光透過領域は540μmをピークとし、その長波長
側および短波長側に光透過率が20%以下の光吸収領域
が存在する。その厚さは必要とする色純度と明るさとの
兼合いによって決めればよく、通常0.2〜5.0μm、
好ましくは0.5〜3.0μm、より好ましくは1.7〜
2.0μmである。
In each transparent colored pixel, the transparent colored image portion has a light transmittance of 50% or more in a light transmitting region corresponding to the color in a spectral characteristic curve of a visible region, and a light transmittance of a light absorbing region. Is formed to be 20% or less. For example, FIG. 2 shows a spectral characteristic curve of a green pixel. The light transmission region has a peak at 540 μm, and a light absorption region having a light transmittance of 20% or less exists on the long wavelength side and the short wavelength side. I do. The thickness may be determined depending on the balance between the required color purity and brightness, and is usually 0.2 to 5.0 μm,
Preferably from 0.5 to 3.0 μm, more preferably from 1.7 to 3.0 μm.
2.0 μm.

【0021】透明着色画素中に透明無着色部が設けられ
た本発明のカラーフィルターは、従来からの顔料分散
法、電着法、印刷法等のいずれの製造法によって製造さ
れたものであってもよい。しかし、基板上に形成された
透明導電層上にポジ型感光性樹脂層を形成して行うレジ
スト電着法によって製造するのが好ましい。レジスト電
着法を用いる場合は電着時の印加電圧と印加時間だけを
制御することによりカラーフィルターの厚さを高精度に
制御することができる。したがってまた複数色の画素か
らなる場合もカラーフィルターの表面平坦性は良好であ
る。更に画素の寸法精度が高いため色のコントラストも
良好となる。
The color filter of the present invention in which a transparent uncolored portion is provided in a transparent colored pixel is manufactured by any of the conventional manufacturing methods such as a pigment dispersion method, an electrodeposition method, and a printing method. Is also good. However, it is preferable to manufacture the positive photosensitive resin layer by forming the positive photosensitive resin layer on the transparent conductive layer formed on the substrate by a resist electrodeposition method. When the resist electrodeposition method is used, the thickness of the color filter can be controlled with high accuracy by controlling only the applied voltage and the applied time during the electrodeposition. Therefore, the surface flatness of the color filter is also good even when it is composed of pixels of a plurality of colors. Further, since the dimensional accuracy of the pixels is high, the color contrast is also good.

【0022】以下に本発明のカラーフィルターおよびカ
ラー液晶表示装置の製造方法を、レジスト電着法を例に
とって、図1を用いて詳細に説明する。まず、図1(A)
に示すように基板1上に透明導電層を形成する。基板1
は通常多色表示装置に用いられるいかなる基板を用いて
もよく、ガラス基板あるいはプラスチック基板等が挙げ
られる。透明導電層にはたとえば酸化スズ,酸化インジ
ウム,または酸化アンチモン等を主成分とするものが好
適に用いられる。この透明導電層は蒸着もしくはスパッ
タリング等の方法により形成される。
Hereinafter, a method for manufacturing a color filter and a color liquid crystal display device of the present invention will be described in detail with reference to FIG. First, FIG.
A transparent conductive layer is formed on a substrate 1 as shown in FIG. Substrate 1
May be any substrate usually used in a multicolor display device, such as a glass substrate or a plastic substrate. For the transparent conductive layer, for example, a material containing tin oxide, indium oxide, antimony oxide, or the like as a main component is preferably used. This transparent conductive layer is formed by a method such as evaporation or sputtering.

【0023】次に図1(B)に示すように、該導電層2上
にポジ型感光性樹脂層3を形成する。このポジ型感光性
樹脂は一回塗布された感光性樹脂層で複数回露光、現像
できるものであり、例えばカルボン酸のtert−ブチルエ
ステルまたはフェノールのtert−ブチルカルボナートよ
りなる酸に対して不安定な枝分れした基を有する重合体
と露光時に酸を生じる光重合開始剤とを含むポジ型感光
性樹脂組成物(例えば、特公平2−27660号公報お
よび特開平2−309358号公報に開示されている)
が好ましい。
Next, as shown in FIG. 1B, a positive photosensitive resin layer 3 is formed on the conductive layer 2. This positive photosensitive resin can be exposed and developed a plurality of times with the photosensitive resin layer applied once, and is not resistant to an acid composed of tert-butyl ester of carboxylic acid or tert-butyl carbonate of phenol. Positive photosensitive resin compositions containing a polymer having a stable branched group and a photopolymerization initiator which generates an acid upon exposure (for example, see JP-B-2-27660 and JP-A-2-309358). Disclosed)
Is preferred.

【0024】このポジ型感光性樹脂組成物3上に所定の
パターンを有するマスク4を載置し(図1(C))、露光
することにより露光部分の感光性樹脂組成物層を溶出可
能にし、次いで所定の溶出液により溶出することにより
パターン化された基板を得る(図1(D))。マスクおよ
び溶出技術は公知である。この基板は、図1(D)に示す
ように着色必要箇所に導電層2が露出している形となっ
ている。図1(E)に示されるように導電層2に通電して
電着浴中で電着により黒色画素8が形成される。
A mask 4 having a predetermined pattern is placed on the positive photosensitive resin composition 3 (FIG. 1C), and the photosensitive resin composition layer at the exposed portion can be eluted by exposure. Then, a patterned substrate is obtained by elution with a predetermined eluent (FIG. 1 (D)). Mask and elution techniques are known. As shown in FIG. 1 (D), the substrate has a shape in which the conductive layer 2 is exposed at a portion requiring coloring. As shown in FIG. 1E, the conductive layer 2 is energized, and a black pixel 8 is formed by electrodeposition in an electrodeposition bath.

【0025】この方法に用いる電着浴の造膜成分として
使用される合成高分子樹脂はカチオン性、アニオン性ま
たは両性のいずれであってもよく、従来公知の種々のも
の、例えばアクリル樹脂、エポキシ樹脂、ウレタン樹
脂、ポリブタジエン樹脂、ポリアミド樹脂、カルボキシ
ル基導入ポリブタジエン、カルボキシル基導入アルキド
樹脂等が挙げられる。尚、合成高分子樹脂のイオン性に
よっては導電層2を侵すものもあり、この点を考慮して
造膜成分を選択する必要がある。電着浴その他の詳しい
内容は特開昭59−114592号および本発明者等に
よる特願昭62−46321号等(特開昭63−210
901号公報)に詳細に記載されている。この電着塗料
は光硬化性または熱硬化性のいずれであってもよい。
The synthetic polymer resin used as a film-forming component of the electrodeposition bath used in this method may be cationic, anionic or amphoteric, and various conventionally known ones such as acrylic resin and epoxy resin Resin, urethane resin, polybutadiene resin, polyamide resin, carboxyl group-introduced polybutadiene, carboxyl group-introduced alkyd resin, and the like. It should be noted that, depending on the ionicity of the synthetic polymer resin, some may affect the conductive layer 2, and it is necessary to select a film-forming component in consideration of this point. The details of the electrodeposition bath and others are described in JP-A-59-114592 and Japanese Patent Application No. 62-46321 by the present inventors (JP-A-63-210).
No. 901). This electrodeposition paint may be either photocurable or thermosetting.

【0026】次に図1(F)に示すように基板1上に形成
された黒色画素とポジ型感光性樹脂層に、透明無着色部
に相当する光遮蔽部(10)を残した着色画像に相当す
る光透過部を有するポジマスク4′を載置し(図1
(F))、露光することにより前記と同様に露光部分の感
光性樹脂組成物層を溶出しパターン化された基板を得る
(図1(G))。
Next, as shown in FIG. 1F, a colored image in which a light shielding portion (10) corresponding to a transparent non-colored portion is left in the black pixel and the positive photosensitive resin layer formed on the substrate 1. A positive mask 4 'having a light transmitting portion corresponding to the above is placed (see FIG. 1).
(F)) Exposure exposes the photosensitive resin composition layer at the exposed portion in the same manner as described above to obtain a patterned substrate (FIG. 1 (G)).

【0027】更に図1(H)に示されるように導電層2に
通電して電着浴中で電着により第1の着色画像(例え
ば、赤(R))5が形成される。次に図1(F)〜(H)のく
り返しにより2色目の着色画素(例えば、緑(G))6が
形成される(図1(I)〜(K))。
Further, as shown in FIG. 1H, a first colored image (for example, red (R)) 5 is formed by applying electricity to the conductive layer 2 and performing electrodeposition in an electrodeposition bath. Next, a second colored pixel (for example, green (G)) 6 is formed by repeating FIGS. 1 (F) to 1 (H) (FIGS. 1 (I) to 1 (K)).

【0028】同様にして第3色目の着色画素(例えば青
(B))7が形成される(図1(L)〜(N))。
Similarly, a third colored pixel (for example, blue
(B)) 7 is formed (FIGS. 1 (L) to 1 (N)).

【0029】最後にポジ型感光性樹脂層の残った基板に
全面露光し、更に溶出することにより導電層2を露出さ
せ(図1(P))て、図1(Q)に示されるように導電層2に
通電して透明造膜成分からなる電着浴中で電着により透
明無着色部9を形成する。
Finally, the entire surface of the substrate on which the positive photosensitive resin layer is left is exposed, and the substrate is further eluted to expose the conductive layer 2 (FIG. 1 (P)), as shown in FIG. 1 (Q). Electric current is applied to the conductive layer 2 to form a transparent uncolored portion 9 by electrodeposition in an electrodeposition bath composed of a transparent film-forming component.

【0030】[0030]

【実施例】以下に本発明を実施例に基づいて説明する
が、本発明は以下の実施例に限定されるものではない。実施例 1 ガラス基板上に、従来技術と同様にして透明導電膜IT
O(酸化インジウム錫)化合物を形成した。この透明導
電膜上にポジ型感光性樹脂組成物「エクセリードPR-
146」(日本ペイント社製)をスピナーにて3.0μ
mの厚さに塗布し、乾燥して、透明導電膜上にポジ型感
光性樹脂組成物層を形成した。次に25μmの格子状の
ブラックマトリックス用フォトマスクを介して高圧水銀
ランプで露光し、更に100℃で3分間加熱し、これを
アルカリ水溶液で現像すると、露光部は塩を形成して溶
出し、透明導電層の表面が露出した。次に黒色のアニオ
ン型電着樹脂組成物の電着浴中に透明導電層が露出され
た基板を浸漬し、透明導電膜を正電極として30ボルト
の直流電圧を10秒間印加した。その後、基板を引き上
げ十分に水洗した。この際、透明導電膜の上にあるポジ
型感光性樹脂組成物の上には電着樹脂組成物は付着せ
ず、水洗により洗い流されるが、電圧を印加した電極上
に付着した高分子は水に不溶性となっているため、水洗
で洗い流されない。水洗後、乾燥させると、透明電極上
に遮光性の良好な黒色高分子膜が形成された。
EXAMPLES The present invention will be described below based on examples, but the present invention is not limited to the following examples. Example 1 A transparent conductive film IT was formed on a glass substrate in the same manner as in the prior art.
An O (indium tin oxide) compound was formed. On this transparent conductive film, a positive-type photosensitive resin composition “EXERID PR-
146 "(manufactured by Nippon Paint Co., Ltd.) with a spinner at 3.0μ
m, and dried to form a positive photosensitive resin composition layer on the transparent conductive film. Next, exposure was performed with a high-pressure mercury lamp through a 25 μm lattice-like photomask for a black matrix, and further heating was performed at 100 ° C. for 3 minutes, and when this was developed with an alkaline aqueous solution, the exposed portions formed salts and eluted, The surface of the transparent conductive layer was exposed. Next, the substrate with the transparent conductive layer exposed was immersed in an electrodeposition bath of a black anionic electrodeposition resin composition, and a DC voltage of 30 volts was applied for 10 seconds using the transparent conductive film as a positive electrode. Thereafter, the substrate was pulled up and sufficiently washed with water. At this time, the electrodeposited resin composition does not adhere to the positive photosensitive resin composition on the transparent conductive film and is washed away with water, but the polymer adhered to the electrode to which the voltage is applied is water. It is insoluble in water, so it is not washed off with water. After washing with water and drying, a black polymer film having good light-shielding properties was formed on the transparent electrode.

【0031】次にこの基板に横70μm、縦210μm
の着色画素のうち、透過画像の総面積と着色画素の面積
との比が30/70の割合で穴があくように径が5μm
の多数の透明無着色部を設けて設計されたフォトマスク
を載置し、前述と同様に高圧水銀ランプで露光し、更に
100℃で3分間加熱し、更にアルカリ水溶液で現像す
ると、同様に透明導電膜の表面が露出した。次に緑色の
アニオン型電着樹脂組成物の電着浴中に透明導電膜が露
出された黒色層が形成された基板を浸漬し、透明導電膜
を正電極として35ボルトの直流電圧を15秒間印加し
て、その後基板を引き上げて十分に水洗した。水洗後、
乾燥させると透明性の良好なる色純度の高い緑色高分子
膜が形成された。
Next, a width of 70 μm and a length of 210 μm
Among the colored pixels, the ratio of the total area of the transmission image to the area of the colored pixels is 30/70 and the diameter is 5 μm so that holes are formed.
A photomask designed with a large number of transparent uncolored parts is placed, exposed with a high-pressure mercury lamp in the same manner as described above, further heated at 100 ° C. for 3 minutes, and further developed with an alkaline aqueous solution. The surface of the conductive film was exposed. Next, the substrate on which the black layer with the transparent conductive film exposed was formed was immersed in an electrodeposition bath of a green anion-type electrodeposition resin composition, and a DC voltage of 35 V was applied for 15 seconds using the transparent conductive film as a positive electrode. After the application, the substrate was pulled up and washed sufficiently with water. After washing with water
When dried, a green polymer film with high color purity and good transparency was formed.

【0032】更に同様にして、赤色、青色に関して同様
なる工程を繰り返し行うことで、赤色、青色高分子膜が
同様に形成された。最後に残りのポジ型感光性樹脂組成
物と黒、緑、赤、青の着色層の形成された基板を全面に
高圧水銀ランプで露光し、アルカリ水溶液で現像する
と、着色層を残したポジ型感光性樹脂組成物を溶出して
透明導電膜の表面が露出した。次いで透明膜を同様にし
て電着塗布した。それぞれの着色膜および透明無着色膜
の膜厚はいずれも3μmであった。
By repeating the same steps for red and blue in the same manner, red and blue polymer films were similarly formed. Finally, the entire surface of the substrate on which the remaining positive-type photosensitive resin composition and the black, green, red, and blue coloring layers are formed is exposed to a high-pressure mercury lamp and developed with an alkaline aqueous solution to leave the positive-type coloring layer. The surface of the transparent conductive film was exposed by eluting the photosensitive resin composition. Next, the transparent film was electrodeposited in the same manner. The thickness of each of the colored film and the transparent uncolored film was 3 μm.

【0033】このカラーフィルターの緑部分の画素は、
図2の曲線aに示すように、500〜600nmの光透
過率が80%以上であった。またこのときのY値は58
となった。これらの測定値は色純度および明るさともに
従来法によるカラーフィルターの特性値より大きく改良
されていた。ここでY値とは、「色をはかる」(平井敏
夫著、日本規格協会編)に定義された色の明るさ(ある
いは輝度率)を定める値をいう。
The pixel of the green part of this color filter is
As shown by the curve a in FIG. 2, the light transmittance at 500 to 600 nm was 80% or more. The Y value at this time is 58
It became. These measured values were greatly improved in both color purity and brightness than characteristic values of the conventional color filter. Here, the Y value is a value that determines the brightness (or luminance ratio) of a color defined in "Measure Color" (by Toshio Hirai, edited by the Japan Standards Association).

【0034】実施例 2 実施例1と同様の方法で得られたカラーフィルター上に
透明導電膜を低温スパッタ法により90nmの膜厚で設
け、次いでポリイミドをこの上に100nmの膜厚で塗
布形成した後、ラビング処理を行い、対向電極となる薄
膜トランジスタと組み合わせた。次いで電極間に液晶を
注入して液晶セルの組み立てを行い、上記画像を有する
カラーフィルターを液晶セル内部に具備するカラー液晶
表示装置が得られた。
Example 2 On a color filter obtained in the same manner as in Example 1, a transparent conductive film was provided in a thickness of 90 nm by a low-temperature sputtering method, and then polyimide was applied thereon to form a film in a thickness of 100 nm. Thereafter, a rubbing treatment was performed, and the resultant was combined with a thin film transistor serving as a counter electrode. Next, liquid crystal was injected between the electrodes to assemble the liquid crystal cell, and a color liquid crystal display device including a color filter having the above-described image inside the liquid crystal cell was obtained.

【0035】比較例 1 カラーフィルターの透明なクリアー膜のない従来法のカ
ラーフィルターの構造をもつ以外は実施例1と同様にし
てカラーフィルターを形成した後、光透過率を測定し、
図の曲線bに示した。またこのときのY値は40であっ
た。図の曲線bとY値から透明なクリアー膜を着色画素
内に設けなければ、色純度と明るさの両立が困難で、十
分な性能を有する着色画素が得られないことがわかる。
Comparative Example 1 A color filter was formed in the same manner as in Example 1 except that the structure of a conventional color filter without a transparent clear film of the color filter was used, and the light transmittance was measured.
This is shown by curve b in the figure. The Y value at this time was 40. It can be seen from the curve b and the Y value in the figure that unless a transparent clear film is provided in the colored pixel, it is difficult to achieve both color purity and brightness, and a colored pixel having sufficient performance cannot be obtained.

【0036】[0036]

【発明の効果】本発明のカラーフィルターは色純度およ
び明るさともに従来のものより改良された特性を有す
る。またカラーフィルターの厚さは均一で表面平坦性に
優れており、上記特性とともに反射型カラー液晶表示装
置用のカラーフィルターとしての適性を備えていた。
The color filter of the present invention has improved characteristics in both color purity and brightness as compared with the conventional one. Further, the thickness of the color filter was uniform and excellent in surface flatness, and together with the above characteristics, the color filter was suitable as a color filter for a reflective color liquid crystal display device.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の製造方法を示す工程図であり、断面
図を表す。
FIG. 1 is a process drawing showing a manufacturing method of the present invention, and shows a cross-sectional view.

【図2】 透明着色画素の分光特性曲線。FIG. 2 is a spectral characteristic curve of a transparent colored pixel.

【符号の説明】[Explanation of symbols]

1:ガラス基板、 2:透明導電膜、 3:ポ
ジ型感光性樹脂層、4:フォトマスク、 5:透明着
色画素の着色部(赤)、 6:透明着色画素の着色部(緑)、7:透明着色画素の着
色部(青)、8:黒色画素、 9:透明無着色部、
10:透明無着色部に相当するフォトマスクの遮蔽部 a:透明着色画像と透明無着色部とを有する画素の分光
特性曲線、b:透明無着色部を有しない着色画素の分光
特性曲線。
1: glass substrate, 2: transparent conductive film, 3: positive photosensitive resin layer, 4: photomask, 5: colored portion of transparent colored pixel (red), 6: colored portion of transparent colored pixel (green), 7 : Colored portion (blue) of transparent colored pixel, 8: black pixel, 9: transparent uncolored portion,
10: Shielding part of photomask corresponding to transparent uncolored part a: Spectral characteristic curve of pixel having transparent colored image and transparent uncolored part, b: Spectral characteristic curve of colored pixel not having transparent uncolored part.

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 透明基板上に設けられた複数色パターン
化されている各透明着色画素中に、実質上肉視しえない
大きさの透明無着色部を設けることによりカラーフィル
ターの明るさと色純度とを同時に向上させる方法。
1. The brightness and color of a color filter is provided by providing a transparent non-colored portion having a size substantially invisible to each other in each of the transparent colored pixels which are patterned into a plurality of colors provided on a transparent substrate. A method that simultaneously improves purity.
【請求項2】 透明基板上に、複数色パターン化されて
設けられている着色画素が、透明着色画素と黒色画素か
らなり、透明着色画素は、可視領域に光透過率が50%
以上である光透過領域を有し且つ光吸収領域の光透過率
が20%以下である分光特性曲線を有する透明着色部と
可視領域全域にわたって光透過率が40%以上である透
明無着色部とからなり、黒色画素は可視領域全域にわた
って光透過率が5%以下であることを特徴とするカラー
フィルター。
2. A colored pixel provided on a transparent substrate in a pattern of a plurality of colors includes a transparent colored pixel and a black pixel, and the transparent colored pixel has a light transmittance of 50% in a visible region.
A transparent colored portion having a light transmission region as described above and having a spectral characteristic curve in which the light transmittance of the light absorbing region is 20% or less, and a transparent uncolored portion having a light transmittance of 40% or more over the entire visible region. Wherein the black pixel has a light transmittance of 5% or less over the entire visible region.
【請求項3】 ひとつの透明着色画素内における透明無
着色部と透明着色部との合計画像面積に占める透明無着
色部の面積比率が30%以下で、個々の透明無着色部の
大きさが最大部分で20μm以下である請求項2記載の
カラーフィルター。
3. The area ratio of the transparent non-colored portion to the total image area of the transparent non-colored portion and the transparent colored portion in one transparent colored pixel is 30% or less, and the size of each transparent non-colored portion is less than 30%. 3. The color filter according to claim 2, wherein the maximum size is 20 μm or less.
【請求項4】 透明基板上に設けられた透明導電層表面
に感光性被膜を形成し、該感光性被膜に可視領域に光透
過率が50%以上である光透過領域を有し且つ光吸収領
域の光透過率が20%以下である分光特性曲線を有する
透明着色部と可視領域全域にわたって光透過率が40%
以上である透明無着色部とを形成するようにパターン化
されたマスクを載置したのちこれを露光・現像して透明
導電層の一部を露出させ、次いで電着塗装法により透明
着色部を形成し、必要回数のフォトリソグラフィ法と電
着塗装法とを繰り返し、最後に感光性被膜の残部を露光
して露出し電着塗装して透明無着色部を形成することを
特徴とする請求項1〜3のいずれかに記載のカラーフィ
ルターの製造方法。
4. A photosensitive film is formed on the surface of a transparent conductive layer provided on a transparent substrate, and the photosensitive film has a light transmitting region having a light transmittance of 50% or more in a visible region and absorbs light. A transparent colored portion having a spectral characteristic curve in which the light transmittance of the region is 20% or less, and a light transmittance of 40% over the entire visible region.
After placing a mask patterned so as to form a transparent uncolored portion as described above, this is exposed and developed to expose a part of the transparent conductive layer, and then the transparent colored portion is formed by an electrodeposition coating method. Forming, repeating the required number of photolithography method and electrodeposition coating method, finally exposing and exposing the remaining of the photosensitive film and electrodeposition coating to form a transparent non-colored portion, Claims: The method for producing a color filter according to any one of claims 1 to 3.
【請求項5】 透明基板上に設けられた透明導電層表面
に感光性被膜を形成し、該感光性被膜に可視領域全域に
わたって光透過率が5%以下である黒色画素をパターン
化したマスクを載置したのちこれを露光・現像して透明
導電層の一部を露出させ、次いで電着塗装法により黒色
画素を形成し、続いて該感光性被膜に可視領域に光透過
率が50%以上である光透過領域を有し且つ光吸収領域
の光透過率が20%以下である分光特性曲線を有する透
明着色部と可視領域全域にわたって光透過率が40%以
上である透明無着色部とを形成するようにパターン化さ
れたマスクを載置したのちこれを露光・現像して透明導
電層の一部を露出させ、次いで電着塗装法により透明着
色部を形成し、必要回数のフォトリソグラフィ法と電着
塗装法とを繰り返し、最後に感光性被膜の残部を露光し
て露出し電着塗装して透明無着色部を形成することを特
徴とする請求項1〜3のいずれかに記載のカラーフィル
ターの製造方法。
5. A mask in which a photosensitive film is formed on a surface of a transparent conductive layer provided on a transparent substrate, and a black pixel having a light transmittance of 5% or less over the entire visible region is patterned on the photosensitive film. After mounting, this is exposed and developed to expose a part of the transparent conductive layer, and then a black pixel is formed by an electrodeposition coating method. Subsequently, the light transmittance of the photosensitive film in the visible region is 50% or more. A transparent colored portion having a light transmission region having a light transmittance of 20% or less and a light transmission region having a spectral characteristic curve of 20% or less, and a transparent uncolored portion having a light transmittance of 40% or more over the entire visible region. After placing a patterned mask to be formed, it is exposed and developed to expose a part of the transparent conductive layer, and then a transparent colored portion is formed by an electrodeposition coating method, and a required number of photolithography processes are performed. And electrodeposition coating method 4. The method for producing a color filter according to any one of claims 1 to 3, wherein the remaining portion of the photosensitive film is exposed and exposed and electrodeposited to form a transparent uncolored portion.
【請求項6】 少なくとも一対の電極基板の間に液晶を
封入してなるカラー液晶表示装置であって、少なくとも
一方の電極基板が透明基板上に複数の色相の異なる透明
着色部と透明無着色部からなる透明着色画素と可視領域
全域にわたって光透過率が5%以下である黒色画素とか
ら形成されたカラーフィルターを有し、前記透明着色画
素の少なくとも一つが、可視領域に光透過率が50%以
上である光透過領域を有し且つ光吸収領域の光透過率が
20%以下である分光特性曲線を有する透明着色部と可
視領域全域にわたって光透過率が40%以上である透明
無着色部とからなることを特徴とするカラー液晶表示装
置。
6. A color liquid crystal display device in which liquid crystal is sealed between at least a pair of electrode substrates, wherein at least one of the electrode substrates has a plurality of transparent colored portions having different hues and a transparent uncolored portion on a transparent substrate. And a color filter formed of black pixels having a light transmittance of 5% or less over the entire visible region, wherein at least one of the transparent colored pixels has a light transmittance of 50% in the visible region. A transparent colored portion having a light transmission region as described above and having a spectral characteristic curve in which the light transmittance of the light absorbing region is 20% or less, and a transparent uncolored portion having a light transmittance of 40% or more over the entire visible region. A color liquid crystal display device comprising:
【請求項7】 少なくとも一対の電極基板の間に液晶を
封入してなるカラー液晶表示装置であって、少なくとも
一方の電極基板が、透明基板上に複数の色相の異なる透
明着色部と透明無着色部からなる透明着色画素と黒色画
素とから形成されたカラーフィルターを有するカラー液
晶表示装置の製造において、可視領域全域にわたって光
透過率が5%以下である黒色画素を形成し、次いで可視
領域に光透過率が50%以上である光透過領域を有し且
つ光吸収領域の光透過率が20%以下である分光特性曲
線を有する透明着色部と、可視領域全域にわたって光透
過率が40%以上である透明無着色部とからなる第1の
色相の透明着色画素を第1のパターンにしたがって形成
し、次いで第1の色相と異なる第2の色相および第3の
色相を同様に繰り返して第2、第3の透明着色画素をパ
ターン状に形成した後、黒色画素および第1ないし第3
のパターン状画素の上に透明導電膜を形成することを特
徴とする、カラー液晶表示装置の製造方法。
7. A color liquid crystal display device in which liquid crystal is sealed between at least a pair of electrode substrates, wherein at least one of the electrode substrates has a plurality of transparent colored portions having different hues on a transparent substrate and a transparent non-colored portion. In the manufacture of a color liquid crystal display device having a color filter formed of transparent colored pixels and black pixels, a black pixel having a light transmittance of 5% or less over the entire visible region is formed, and then the light is transmitted to the visible region. A transparent colored portion having a light transmission region having a transmittance of 50% or more and a spectral characteristic curve having a light transmittance of a light absorption region of 20% or less, and having a light transmittance of 40% or more over the entire visible region. A transparent colored pixel of a first hue composed of a certain transparent uncolored portion is formed according to a first pattern, and a second hue and a third hue different from the first hue are similarly repeated. After forming the second and third transparent colored pixels in a pattern, the black pixel and the first to third pixels are formed.
Forming a transparent conductive film on the pattern-shaped pixels.
JP27780496A 1996-10-21 1996-10-21 Color filter, color liquid crystal display device and manufacturing method thereof Expired - Lifetime JP3883238B2 (en)

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Application Number Priority Date Filing Date Title
JP27780496A JP3883238B2 (en) 1996-10-21 1996-10-21 Color filter, color liquid crystal display device and manufacturing method thereof

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JPH10123312A true JPH10123312A (en) 1998-05-15
JP3883238B2 JP3883238B2 (en) 2007-02-21

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6624860B1 (en) 1998-01-26 2003-09-23 Sharp Kabushiki Kaisha Color filter layer providing transmitted light with improved brightness and display device using same
US6824935B2 (en) * 2001-09-25 2004-11-30 Sharp Kabushiki Kaisha Substrate having colored layers and method for producing the same
KR20160038165A (en) * 2014-09-29 2016-04-07 엘지디스플레이 주식회사 Display panel and stereopsis image display device using the same

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6624860B1 (en) 1998-01-26 2003-09-23 Sharp Kabushiki Kaisha Color filter layer providing transmitted light with improved brightness and display device using same
US6906765B2 (en) 1998-01-26 2005-06-14 Sharp Kabushiki Kaisha Color filter layer and display device using the same
US7250998B2 (en) 1998-01-26 2007-07-31 Sharp Kabushiki Kaisha Color filter layer comprising a transmissive non-color filter region and the transflective display device using the same
US7471359B2 (en) 1998-01-26 2008-12-30 Sharp Kabushiki Kaisha Color filter layer having different area ratio between different colors and transflective liquid crystal display device using the same
US7599023B2 (en) 1998-01-26 2009-10-06 Sharp Kabushiki Kaisha Color filter layer and transflective liquid crystal display device using the same
US7916249B2 (en) 1998-01-26 2011-03-29 Sharp Kabushiki Kaisha Color filter layer and display device using the same
US6824935B2 (en) * 2001-09-25 2004-11-30 Sharp Kabushiki Kaisha Substrate having colored layers and method for producing the same
KR20160038165A (en) * 2014-09-29 2016-04-07 엘지디스플레이 주식회사 Display panel and stereopsis image display device using the same

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