JPH0990605A - Reticle - Google Patents
ReticleInfo
- Publication number
- JPH0990605A JPH0990605A JP24951695A JP24951695A JPH0990605A JP H0990605 A JPH0990605 A JP H0990605A JP 24951695 A JP24951695 A JP 24951695A JP 24951695 A JP24951695 A JP 24951695A JP H0990605 A JPH0990605 A JP H0990605A
- Authority
- JP
- Japan
- Prior art keywords
- reticle
- light
- peripheral portion
- outer peripheral
- shielding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
【発明の属する技術分野】本発明は、半導体集積回路の
製造において、フォトリソグラフィー工程のなかで露光
する際、使用するレチクルに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reticle used for exposure during a photolithography process in manufacturing a semiconductor integrated circuit.
【従来の技術】半導体集積回路の製造方法は、半導体集
積回路の集積度の向上にともないパターンの微細化のた
めに露光方式は一括露光方式からステッパー方式とな
り、マスクはレチクルとなってきている。更にレチクル
に対して塵やゴミ等の付着防止としてペリクルが、同時
にレチクルに組み合わせて使用されている。ペリクル
は、概略的にはペリクル膜とペリクルフレームとで構成
され、ペリクル膜の膜材質は、有機物質のポリマー樹脂
が一般的で、そのペリクル膜は、一般にアルミ等のフレ
ーム（ペリクルフレーム）で支持される構造になってい
る。レチクルは、一般にガラス等の透明基板上の１面に
機能上有効な回路パターン部分と回路パターンの外周部
分の遮光部分とよりなっている。回路パターン部分と遮
光部分の材質は、一般にクロム等の金属で同じである。2. Description of the Related Art In a method of manufacturing a semiconductor integrated circuit, an exposure method is changed from a collective exposure method to a stepper method and a mask is used as a reticle in order to miniaturize a pattern as the integration degree of the semiconductor integrated circuit is improved. Further, a pellicle is used in combination with the reticle at the same time to prevent dust and dirt from adhering to the reticle. The pellicle is roughly composed of a pellicle film and a pellicle frame. The pellicle film is generally made of an organic polymer resin, and the pellicle film is generally supported by a frame such as aluminum (pellicle frame). The structure is such that The reticle generally includes a circuit pattern portion which is functionally effective on one surface of a transparent substrate such as glass and a light shielding portion on the outer peripheral portion of the circuit pattern. The material of the circuit pattern portion and the light shielding portion is generally the same metal such as chrome.
【発明が解決しょうとする課題】従来は、レチクルとペ
リクルを組み合わせて使用する際に、レチクルの回路パ
ターンの周辺の一部が静電破壊し、回路パターンの回路
は機能不良または信頼性が著しく低下し、レチクルとし
て信頼性上問題があった。本発明は、上述の課題を解決
する新たなレチクルを提供することを目的とするもので
ある。Conventionally, when a reticle and a pellicle are used in combination, a part of the periphery of the reticle circuit pattern is electrostatically destroyed, and the circuit of the circuit pattern has a malfunction or a remarkable reliability. However, there was a problem in reliability as a reticle. An object of the present invention is to provide a new reticle that solves the above problems.
【課題を解決するための手段】本発明者は、前記課題を
解決するためにレチクルの回路パターンの周辺の一部の
破壊の原因について調べた結果、レチクルと組み合わせ
て使用するペリクルのペリクル膜からの電荷が原因と分
かった。つまり、ペリクル膜はポリマー樹脂等の絶縁物
で環境的に帯電し易く、ペリクル膜を支持しているペリ
クルフレームは金属で直接レチクルに接する組み合わせ
として使用されている為に、ペリクル膜に帯電した電荷
が金属フレームからレチクルへ流れ、レチクルの金属の
回路パターンに電荷が放電することによってレチクルの
回路パターンの一部が静電破壊されるという事を見いだ
し本発明をなすに至った。すなわち、本発明のレチクル
は、透明基板の１面に回路パターンと、該回路パターン
の周囲に遮光部分を有するレチクルにおいて、前記遮光
部分が内周部分と外周部分とに分離され、前記外周部分
はペリクルフレームの金属枠に接する領域に形成されて
いるものである。さらに、本発明のレチクルは、前記遮
光外周部分にペリクルフレームが接しているペリクル付
きのものである。さらに、本発明のレチクルは、前記遮
光外周部分と回路パターンとで電荷の放電が発生しない
ものである。In order to solve the above problems, the present inventor has investigated the cause of the destruction of a part of the periphery of the reticle circuit pattern, and as a result, from the pellicle film of the pellicle used in combination with the reticle. It turned out to be due to the electric charge of. In other words, the pellicle film is easily charged environmentally with an insulator such as a polymer resin, and the pellicle frame supporting the pellicle film is used as a combination in which the pellicle film directly contacts the reticle with metal. It was found that a part of the circuit pattern of the reticle is electrostatically destroyed due to the electric charge flowing from the metal frame to the reticle, and the electric charge is discharged to the metal circuit pattern of the reticle, and the present invention has been completed. That is, the reticle of the present invention is a reticle having a circuit pattern on one surface of a transparent substrate and a light-shielding portion around the circuit pattern, wherein the light-shielding portion is divided into an inner peripheral portion and an outer peripheral portion, and the outer peripheral portion is It is formed in a region in contact with the metal frame of the pellicle frame. Further, the reticle of the present invention has a pellicle in which a pellicle frame is in contact with the light-shielding outer peripheral portion. Further, in the reticle of the present invention, no electric charge is discharged between the light-shielding outer peripheral portion and the circuit pattern.
【発明の実施の形態】以下、具体的に本発明を説明す
る。図１は、本発明によるレチクル１と、ペリクル８と
の組み合わせて使用している状態の断面図で、レチクル
１とペリクル膜２、ペリクルフレーム３の位置関係を示
している。レチクル１、ペリクル膜２、ペリクルフレー
ム３の各々の材料は、従来と同様で夫々、一般的なクロ
ム、ポリマー樹脂、アルミである。本発明のレチクル１
の特徴的な点は、レチクル１は、透明基板４、回路パタ
ーン５、遮光内周部分６、遮光外周部分７よりなりたっ
ており、更に、遮光外周部分７と回路パターン５との間
は電荷の放電が発生しない構成になっている。つまり、
遮光外周部分７と、遮光内周部分６とが放電が発生しな
い程十分離れているか、または、遮光内周部分６と、回
路パターン５とが放電が発生しない程十分離れている
か、または、遮光外周部分７、遮光内周部分６、回路パ
ターン５が夫々十分離れている。更に、遮光外周部分７
は、ペリクルフレーム３がレチクルに接する部分に形成
されている。図２は、図１のレチクル１の平面図であ
る。図２は、レチクル１が、回路パターン５の外側に遮
光内周部分６があり、遮光内周部分６の外側に遮光外周
部分７があり、遮光内周部分６と、遮光外周部分７と、
回路パターン５は、電荷の放電が発生しない距離ほど離
れている様子を示している。本発明の図２のレチクル１
が、図１の様にペリクル膜２、ペリクルフレーム３との
位置関係にある時、ペリクル膜２が帯電しても、帯電し
た電荷は、ペリクルフレーム３を流れ、レチクル１に達
する。しかし、レチクル１に達した電荷は、レチクル１
の遮光外周部分７からは遮光内周部分６へは電荷が放電
出来ないほど離れているのでレチクル１の内部への静電
破壊は生じない。よって、レチクルの機能上有効な回路
パターンには影響はない。BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be specifically described below. FIG. 1 is a cross-sectional view of a state in which a reticle 1 according to the present invention and a pellicle 8 are used in combination, and shows the positional relationship among the reticle 1, the pellicle film 2, and the pellicle frame 3. The materials of the reticle 1, pellicle film 2, and pellicle frame 3 are the same as conventional ones, and are common chromium, polymer resin, and aluminum, respectively. Reticle 1 of the present invention
Is characterized in that the reticle 1 is composed of a transparent substrate 4, a circuit pattern 5, a light-shielding inner peripheral portion 6, and a light-shielding outer peripheral portion 7. Furthermore, between the light-shielding outer peripheral portion 7 and the circuit pattern 5, there is no charge. It is configured so that no discharge occurs. That is,
The light-shielding outer peripheral portion 7 and the light-shielding inner peripheral portion 6 are sufficiently separated from each other so that discharge is not generated, or the light-shielding inner peripheral portion 6 and the circuit pattern 5 are sufficiently separated from each other so that no discharge is generated, or The outer peripheral portion 7, the light-shielding inner peripheral portion 6, and the circuit pattern 5 are sufficiently separated from each other. Further, the light-shielding outer peripheral portion 7
Is formed in a portion where the pellicle frame 3 is in contact with the reticle. FIG. 2 is a plan view of the reticle 1 of FIG. 2, the reticle 1 has a light-shielding inner peripheral portion 6 outside the circuit pattern 5, a light-shielding outer peripheral portion 7 outside the light-shielding inner peripheral portion 6, a light-shielding inner peripheral portion 6, a light-shielding outer peripheral portion 7,
The circuit pattern 5 shows a state in which the circuit patterns 5 are separated from each other by a distance at which electric charge is not discharged. Reticle 1 of FIG. 2 of the present invention
However, when the pellicle film 2 and the pellicle frame 3 are in the positional relationship as shown in FIG. 1, even if the pellicle film 2 is charged, the charged charges flow through the pellicle frame 3 and reach the reticle 1. However, the charge reaching the reticle 1 is
Since the light-shielding outer peripheral portion 7 is distant from the light-shielding outer peripheral portion 7 to the light-shielding inner peripheral portion 6 so that no electric charge can be discharged, no electrostatic breakdown occurs inside the reticle 1. Therefore, there is no influence on the circuit pattern effective in the function of the reticle.
【発明の効果】本発明のレチクルは、回路パターンと遮
光外周部分とが分離されており、さらに遮光外周部分は
ペリクルフレームが接する位置に配されている為にペリ
クル膜からの帯電による放電破壊から回路パターンを防
ぐ事ができる。遮光内周部分と遮光外周部分とが分離さ
れてあってもペリクルフレームが遮光内周部分に接する
位置関係では全く効果がないのは以上の説明で当然であ
る。In the reticle of the present invention, the circuit pattern and the light-shielding outer peripheral portion are separated, and the light-shielding outer peripheral portion is arranged at the position where the pellicle frame is in contact with the reticle. The circuit pattern can be prevented. It should be understood from the above description that even if the light-shielding inner peripheral portion and the light-shielding outer peripheral portion are separated, the positional relationship in which the pellicle frame contacts the light-shielding inner peripheral portion has no effect.
【図１】本発明のレチクルとペリクルの位置関係を示す
図。FIG. 1 is a diagram showing a positional relationship between a reticle and a pellicle of the present invention.
【図２】本発明のレチクルの平面図。FIG. 2 is a plan view of the reticle of the present invention.
１ レチクル ２ ペリクル膜 ３ ペリクルフレーム ４ 透明基板 ５ 回路パターン ６ 遮光内周部分 ７ 遮光外周部分 ８ ペリクル 1 Reticle 2 Pellicle Film 3 Pellicle Frame 4 Transparent Substrate 5 Circuit Pattern 6 Light-Shielding Inner Part 7 Light-Shielding Outer Part 8 Pellicle
Claims (3)
パターンの周囲に遮光部分を有するレチクルにおいて、
前記遮光部分が遮光内周部分と遮光外周部分とに分離さ
れ、前記遮光外周部分はペリクルフレームに接する領域
に形成されていることを特徴とするレチクル。1. A reticle having a circuit pattern on one surface of a transparent substrate and a light-shielding portion around the circuit pattern,
The reticle, wherein the light-shielding portion is divided into a light-shielding inner peripheral portion and a light-shielding outer peripheral portion, and the light-shielding outer peripheral portion is formed in a region in contact with the pellicle frame.
周部分にペリクルフレームが接していることを特徴とす
るペリクル付きレチクル。2. The reticle with a pellicle according to claim 1, wherein a pellicle frame is in contact with the light shielding outer peripheral portion.
て、前記遮光外周部分と前記回路パターンとの間で、電
荷の放電が発生しないことを特徴とするレチクル。3. The reticle according to claim 1 or 2, wherein electric charges are not discharged between the light-shielding outer peripheral portion and the circuit pattern.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24951695A JPH0990605A (en) | 1995-09-27 | 1995-09-27 | Reticle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24951695A JPH0990605A (en) | 1995-09-27 | 1995-09-27 | Reticle |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0990605A true JPH0990605A (en) | 1997-04-04 |
Family
ID=17194143
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24951695A Pending JPH0990605A (en) | 1995-09-27 | 1995-09-27 | Reticle |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0990605A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010261987A (en) * | 2009-04-30 | 2010-11-18 | Shin-Etsu Chemical Co Ltd | Photomask |
| JP2012507750A (en) * | 2008-10-31 | 2012-03-29 | アルテラ コーポレイション | Photolithographic reticle with electrostatic discharge protection structure |
-
1995
- 1995-09-27 JP JP24951695A patent/JPH0990605A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012507750A (en) * | 2008-10-31 | 2012-03-29 | アルテラ コーポレイション | Photolithographic reticle with electrostatic discharge protection structure |
| JP2010261987A (en) * | 2009-04-30 | 2010-11-18 | Shin-Etsu Chemical Co Ltd | Photomask |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20031014 |