JPH0987853A - Formation of protective film and device therefor - Google Patents

Formation of protective film and device therefor

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Publication number
JPH0987853A
JPH0987853A JP24719295A JP24719295A JPH0987853A JP H0987853 A JPH0987853 A JP H0987853A JP 24719295 A JP24719295 A JP 24719295A JP 24719295 A JP24719295 A JP 24719295A JP H0987853 A JPH0987853 A JP H0987853A
Authority
JP
Japan
Prior art keywords
magnetic field
protective film
reaction tube
plasma
strength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24719295A
Other languages
Japanese (ja)
Inventor
Katsumi Endo
克巳 遠藤
Noriyuki Kitaori
典之 北折
Osamu Yoshida
修 吉田
Katsumi Sasaki
克己 佐々木
Junko Ishikawa
准子 石川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kao Corp
Original Assignee
Kao Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kao Corp filed Critical Kao Corp
Priority to JP24719295A priority Critical patent/JPH0987853A/en
Publication of JPH0987853A publication Critical patent/JPH0987853A/en
Pending legal-status Critical Current

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  • Chemical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PROBLEM TO BE SOLVED: To form a protective film having uniform strength by increasing the strength of the magnetic field from a supporting body toward the microwave entering port of a plasma reaction tube and, in the middle of increasing the magnetic field, forming the crest of magnetic field strength smaller than the magnetic field strength in which electron cyclotron resonance occurs. SOLUTION: A protective film is formed on a supporting body opposite to a plasma reaction tube by an ECR plasma CVD method. A reaction gas is introduced into the plasma reaction tube, and plasma is excited by microwaves. The strength of the magnetic field is increased as advancing from the supporting body toward the microwave entering port of the plasma reaction tube. In the middle of the increase, the magnetic field having a magnetic field distribution having the crest of magnetic field strength smaller than the magnetic field strength in which electron cyclotron resonance occurs is generated. Again, the magnetic field having a magnetic field distribution in which the strength of the magnetic field increases to the magnetic field strength in which electron cyclotron resonance occurs is generated. Since the energy and flow rate of plasma to the supporting body are controlled, the protective film is made uniform.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、ECRプラズマC
VD法により保護膜を形成する技術に関する。
TECHNICAL FIELD The present invention relates to an ECR plasma C
The present invention relates to a technique for forming a protective film by the VD method.

【0002】[0002]

【発明が解決しようとする課題】磁気テープ等の磁気記
録媒体においては、高密度記録化の要請から、支持体上
に設けられる磁性層として、バインダ樹脂を用いた塗布
型のものではなく、バインダ樹脂を用いない金属薄膜型
のものが提案されている。すなわち、無電解メッキ等の
湿式メッキ手段、真空蒸着、スパッタリングあるいはイ
オンプレーティング等の乾式メッキ手段により磁性層を
形成した磁気記録媒体が提案されている。そして、この
種の磁気記録媒体は磁性体の充填密度が高く、高密度記
録に適したものである。
In a magnetic recording medium such as a magnetic tape, a magnetic layer provided on a support is not a coating type using a binder resin, but a binder. A metal thin film type using no resin has been proposed. That is, there has been proposed a magnetic recording medium having a magnetic layer formed by a wet plating means such as electroless plating or a dry plating means such as vacuum deposition, sputtering or ion plating. This type of magnetic recording medium has a high filling density of a magnetic material and is suitable for high-density recording.

【0003】この種の磁気記録媒体における金属磁性膜
を保護する為に、各種の保護膜を表面に設けることが提
案されている。この保護膜を表面に設ける手段としては
各種のものが有る。例えば、熱フィラメントCVD装
置、光CVD装置、RFプラズマCVD装置、マイクロ
波プラズマCVD装置、ECRマイクロ波プラズマCV
D装置などのCVD(ケミカルベーパーデポジション)
装置等である。
In order to protect the metal magnetic film in this type of magnetic recording medium, it has been proposed to provide various protective films on the surface. There are various means for providing the protective film on the surface. For example, hot filament CVD apparatus, photo CVD apparatus, RF plasma CVD apparatus, microwave plasma CVD apparatus, ECR microwave plasma CV
CVD (Chemical Vapor Deposition) such as D equipment
Device, etc.

【0004】特に、ECRマイクロ波プラズマCVD装
置は、電子サイクロトロン共鳴(ECR)により発生さ
せた高密度のプラズマを引き出して反応に使用するもの
であり、支持体の損傷が少ないという利点があり、広く
利用されている。しかし、従来のECRマイクロ波プラ
ズマCVD方法では、支持体に対するプラズマのエネル
ギー及び流束をコントロール出来なかった。その為、強
度的に一様な保護膜が得られないと言う欠点があった。
In particular, the ECR microwave plasma CVD apparatus draws high-density plasma generated by electron cyclotron resonance (ECR) and uses it for reaction, and has an advantage that the support is less damaged, and is widely used. It's being used. However, the conventional ECR microwave plasma CVD method cannot control the energy and flux of plasma with respect to the support. Therefore, there is a drawback that a protective film having a uniform strength cannot be obtained.

【0005】従って、本発明の目的は、一様な強度を持
つ保護膜を形成することが出来るECRマイクロ波プラ
ズマCVDの技術を提供することにある。
Therefore, an object of the present invention is to provide an ECR microwave plasma CVD technique capable of forming a protective film having uniform strength.

【0006】[0006]

【課題を解決するための手段】前記本発明の目的は、プ
ラズマ反応管に対向した位置にある支持体上にECRプ
ラズマCVD法により保護膜を形成する方法であって、
前記プラズマ反応管に反応ガスを導入する工程と、前記
プラズマ反応管にマイクロ波を導入し、プラズマを励起
させる工程と、前記支持体から前記プラズマ反応管のマ
イクロ波進入口に向けて磁界の強さが増加し、その増加
途中で電子サイクロトロン共鳴が起きる磁界強度よりも
小さい磁界強度の山を有し、再び前記電子サイクロトロ
ン共鳴が起きる磁界強度まで磁界の強さが増加する磁界
分布を持つ磁場を発生させる工程とを有することを特徴
とする保護膜形成方法によって達成される。
The object of the present invention is to provide a method for forming a protective film on a support at a position facing a plasma reaction tube by an ECR plasma CVD method.
The step of introducing a reaction gas into the plasma reaction tube, the step of introducing microwaves into the plasma reaction tube to excite the plasma, and the strength of the magnetic field from the support toward the microwave entrance of the plasma reaction tube. The magnetic field has a magnetic field distribution in which the magnetic field intensity increases and the magnetic field intensity has a peak smaller than the magnetic field intensity at which electron cyclotron resonance occurs, and the magnetic field intensity increases again until the magnetic field intensity at which the electron cyclotron resonance occurs. And a step of generating the protective film.

【0007】又、上記本発明の目的は、ECRプラズマ
CVD法により保護膜を形成する装置であって、真空槽
と、この真空槽内に配設された支持体に対向した位置に
あるプラズマ反応管と、このプラズマ反応管内に反応ガ
スを供給する反応ガス供給手段と、前記支持体から前記
プラズマ反応管のマイクロ波進入口に向けて磁界の強さ
が増加し、その増加途中で電子サイクロトロン共鳴が起
きる磁界強度よりも小さい磁界強度の山を有し、再び前
記電子サイクロトロン共鳴が起きる磁界強度まで磁界の
強さが増加する磁界分布を持つ磁場を発生させる磁場発
生手段とを有することを特徴とする保護膜形成装置によ
って達成される。
Another object of the present invention is an apparatus for forming a protective film by the ECR plasma CVD method, which is a plasma reaction at a position facing a vacuum chamber and a support disposed in the vacuum chamber. Tube, a reaction gas supply means for supplying a reaction gas into the plasma reaction tube, and the strength of the magnetic field increases from the support toward the microwave entrance of the plasma reaction tube, and electron cyclotron resonance occurs during the increase. And a magnetic field generating means for generating a magnetic field having a magnetic field distribution in which the magnetic field strength increases again up to the magnetic field strength at which the electron cyclotron resonance occurs again. It is achieved by the protective film forming apparatus.

【0008】尚、上記の磁界強度の山の意味は、電子サ
イクロトロン共鳴が起きる磁界強度よりも小さい磁界強
度の頂点を持ち、その頂点から一旦磁界が弱くなるもの
である。本発明においては、特に、上記の山が、支持体
と前記マイクロ波進入口との真ん中位置よりも前記支持
体側に近い位置に生じるように磁場を発生させることが
好ましく、更に好ましくは前記支持体付近に山が生じる
ように発生させることである。
The above-mentioned peak of magnetic field strength means that the magnetic field strength has a peak which is smaller than the magnetic field strength at which electron cyclotron resonance occurs, and the magnetic field is once weakened from the peak. In the present invention, in particular, it is preferable to generate a magnetic field so that the above-mentioned mountain is generated at a position closer to the support side than the center position between the support and the microwave entrance, and more preferably the support. It is to generate so that there are mountains in the vicinity.

【0009】本発明は、保護膜が設けられる分野のいず
れにも適用できるが、例えば、磁気記録媒体の磁性膜、
特に金属薄膜型の磁性膜を保護する保護膜の形成に用い
られる。
The present invention can be applied to any field in which a protective film is provided. For example, a magnetic film of a magnetic recording medium,
Particularly, it is used for forming a protective film for protecting a metal thin film type magnetic film.

【0010】[0010]

【発明の実施の形態】図1は、本発明の保護膜形成装置
(ECRマイクロ波プラズマCVD装置)全体の概略図
である。図1中、1は金属磁性膜が支持体表面に設けら
れた磁気記録媒体の原反、2は真空槽、3aは原反1の
供給側ロール、3bは原反1の巻取側ロール、4は冷却
キャンロールであり、原反1は供給側ロール3aから冷
却キャンロール4を経て巻取側ロール3bに走行し、巻
き取られて行くように構成されている。
1 is a schematic view of the entire protective film forming apparatus (ECR microwave plasma CVD apparatus) of the present invention. In FIG. 1, 1 is a roll of a magnetic recording medium provided with a metal magnetic film on the surface of a support, 2 is a vacuum tank, 3a is a roll on the roll of feed 1, 3b is a roll on the roll of roll 1, Reference numeral 4 is a cooling can roll, and the original fabric 1 is configured to travel from the supply-side roll 3a through the cooling can roll 4 to the winding-side roll 3b and be wound up.

【0011】5は冷却キャンロール4に対向して設けら
れたプラズマ反応管、6は反応ガス(例えば、メタン、
エチレン、ベンゼン等の炭化水素系のガス)供給用のパ
イプ、7はマイクロ波の導波管である。尚、反応ガス供
給用のパイプ6の口は、プラズマ反応管5内であって、
冷却キャンロール4近傍の位置に有る。8はECR用コ
イルである。このECR用コイル8は、マイクロ波の進
行方向と同方向に磁場を発生させ、サイクロトロン共鳴
を起こさせるものである。そして、その磁界分布は、図
2示される如く、冷却キャンロール4を原点として水晶
窓9方向に距離を取った場合、距離が増加するにつれ、
一定の割合で磁界の強さが増加し、その増加途中で電子
サイクロトロン共鳴が起きる磁界強度(ECR点)より
も小さい磁界強度の山を持たせ、再び一定の割合で電子
サイクロトロン共鳴が起きる磁界強度(ECR点)まで
磁界の強さが増加するような磁界分布を持つ磁場を発生
させる。特に、ECR用コイル8は、前述した山が冷却
キャンロール4側に生じるよう、すなわち冷却キャンロ
ール4を原点として水晶窓9までの距離をLとした場合
にL/2よりも小さい位置に山が生じるように磁場を発
生させる。尚、この山の位置は、ECR用コイル8を適
時調整することにより変更できる。
Reference numeral 5 is a plasma reaction tube provided so as to face the cooling can roll 4, and reference numeral 6 is a reaction gas (for example, methane,
A pipe for supplying hydrocarbon gas such as ethylene and benzene), and 7 is a microwave waveguide. The mouth of the reaction gas supply pipe 6 is inside the plasma reaction tube 5,
It is located near the cooling can roll 4. Reference numeral 8 is an ECR coil. The ECR coil 8 generates a magnetic field in the same direction as the traveling direction of microwaves to cause cyclotron resonance. Then, as shown in FIG. 2, when the distance is increased in the crystal window 9 direction with the cooling can roll 4 as the origin, the magnetic field distribution increases as the distance increases.
The magnetic field strength increases at a constant rate, and the magnetic field strength at which electron cyclotron resonance occurs again at a constant rate is given a peak of magnetic field strength smaller than the magnetic field strength (ECR point) at which electron cyclotron resonance occurs during the increase. A magnetic field having a magnetic field distribution such that the strength of the magnetic field increases up to the (ECR point) is generated. In particular, the ECR coil 8 is arranged such that the above-mentioned peaks are formed on the cooling can roll 4 side, that is, when the distance from the cooling can roll 4 to the crystal window 9 is L, the peaks are located at positions smaller than L / 2. Generate a magnetic field so that The position of this peak can be changed by appropriately adjusting the ECR coil 8.

【0012】そして、上記の装置を用い、ECRプラズ
マCVDを行わせることによって、金属磁性膜上に保護
膜を形成する。
Then, a protective film is formed on the metal magnetic film by performing ECR plasma CVD using the above apparatus.

【0013】[0013]

【実施例1】本実施例では、上述した装置において、冷
却キャンロール4から水晶窓9までの距離Lを40cm
とし、ECR点を875G(ECRパワー600w)と
した。又、図3に示されるように約450Gの山が冷却
キャンロール4からの距離が約12cmの位置に生じる
ように設定した。
[Embodiment 1] In this embodiment, in the above-mentioned apparatus, the distance L from the cooling can roll 4 to the crystal window 9 is 40 cm.
And the ECR point was set to 875 G (ECR power 600 w). Further, as shown in FIG. 3, a peak of about 450 G was set so that a distance from the cooling can roll 4 was about 12 cm.

【0014】そして、反応ガスをメタンとしパイプ6か
らプラズマ反応管5内に供給し、かつ、導波管7によっ
てプラズマ反応管5内に2.45GHzのマイクロ波を
導入し、プラズマを励起し、マイクロ波の進行方向と同
方向にECR用コイル8で磁場を発生させてサイクロト
ロン共鳴を起こさせ、支持体上に設けられた厚さ0.2
μmのCo金属磁性膜上に保護膜(ダイヤモンドライク
カーボン膜)を形成した。尚、テープの巻取り速度は1
m/minとした。
Then, using methane as a reaction gas, the gas is supplied from the pipe 6 into the plasma reaction tube 5, and a microwave of 2.45 GHz is introduced into the plasma reaction tube 5 by the waveguide 7 to excite plasma. A magnetic field is generated by the ECR coil 8 in the same direction as the microwave traveling direction to cause cyclotron resonance, and a thickness of 0.2 is provided on the support.
A protective film (diamond-like carbon film) was formed on the Co metal magnetic film having a thickness of μm. The tape winding speed is 1
m / min.

【0015】[0015]

【比較例1】実施例1において、図3の磁界分布の代わ
りに図4の磁界分布(冷却キャンロール4からの距離が
約12cmの位置で磁界の強さ(約400G)がフラッ
ト(山(谷)なし)になる磁界分布)を持つものを用い
た以外は実施例1に準じて行った。
COMPARATIVE EXAMPLE 1 In Example 1, instead of the magnetic field distribution shown in FIG. 3, the magnetic field distribution shown in FIG. 4 (at a position where the distance from the cooling can roll 4 is about 12 cm, the magnetic field strength (about 400 G) is flat (mountain (peak)). The procedure was carried out in accordance with Example 1 except that a magnetic field distribution) that "(valley) none" was used.

【0016】[0016]

【比較例2】実施例1において、図3の磁界分布の代わ
りに図5の磁界分布(冷却キャンロール4から水晶窓9
に向けて、磁界の強さが一様に増加する磁界分布)を持
つものを用いた以外は実施例1に準じて行った。
COMPARATIVE EXAMPLE 2 In Example 1, instead of the magnetic field distribution of FIG. 3, the magnetic field distribution of FIG. 5 (from the cooling can roll 4 to the crystal window 9) is used.
Example 1 was performed according to Example 1 except that a magnetic field distribution in which the strength of the magnetic field uniformly increases) was used.

【0017】[0017]

【特性】上記のようにして得られた磁気記録媒体の保護
膜(ダイヤモンドライクカーボン膜)の強度を調べる為
にスクラッチテストによる強度測定を行った。スクラッ
チテストの方法は、テープをスライドグラスに張り付
け、薄膜評価用島津走査型スクラッチテスタ(島津製S
ST−101)を用いて、一定荷重(200mN)にお
ける出力変動を測定し、保護膜の強度分布を測定した。
その結果を図6〜図8に示す。
[Characteristics] In order to examine the strength of the protective film (diamond-like carbon film) of the magnetic recording medium obtained as described above, the strength was measured by a scratch test. For the scratch test method, tape was attached to a slide glass, and a Shimadzu scanning scratch tester for thin film evaluation (Shimadzu S
Using ST-101), the output fluctuation under a constant load (200 mN) was measured to measure the strength distribution of the protective film.
The results are shown in FIGS.

【0018】図6〜図8から観て判るとおり、本実施例
(図6)のものは一定の特性を持つことが判る。これに
対して、比較例(図7、図8)のものはバラツキが有る
ことが判る。次に、耐久性を調べる為にスチル耐久性試
験を行った。スチル耐久性試験は、得られた磁気記録媒
体(8mmVTR用磁気テープ)を20℃、50%RH
の条件下でスチル再生し、出力が3dBまで低下するま
での時間を測定した。その結果を表−1に示す。
As can be seen from FIGS. 6 to 8, it can be seen that the present embodiment (FIG. 6) has a certain characteristic. On the other hand, it can be seen that the comparative examples (FIGS. 7 and 8) have variations. Next, a still durability test was conducted to examine the durability. In the still durability test, the obtained magnetic recording medium (8 mm VTR magnetic tape) was heated at 20 ° C. and 50% RH.
Still reproduction was performed under the conditions of, and the time until the output dropped to 3 dB was measured. The results are shown in Table-1.

【0019】 表−1 実施例1 比較例1 比較例2 スチル耐久性 4.5hr 2.2hr 2.0hr これより、本実施例の保護膜は優れた機能を有している
ことが判る。
Table 1 Example 1 Comparative Example 1 Comparative Example 2 Still Durability 4.5 hr 2.2 hr 2.0 hr From this, it can be seen that the protective film of this Example has an excellent function.

【0020】[0020]

【発明の効果】本発明によれば、均質で、優れた強度を
持つ保護膜が得られる。
According to the present invention, a protective film which is homogeneous and has excellent strength can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の保護膜形成装置全体の概略図FIG. 1 is a schematic view of the entire protective film forming apparatus of the present invention.

【図2】本発明の保護膜形成装置の磁界分布図FIG. 2 is a magnetic field distribution diagram of the protective film forming apparatus of the present invention.

【図3】実施例1の磁界分布図FIG. 3 is a magnetic field distribution diagram of Example 1.

【図4】比較例1の磁界分布図FIG. 4 is a magnetic field distribution chart of Comparative Example 1.

【図5】比較例2の磁界分布図FIG. 5 is a magnetic field distribution chart of Comparative Example 2.

【図6】実施例1の保護膜に対するスクラッチテストに
よる強度測定の結果を示す図
FIG. 6 is a diagram showing a result of strength measurement by a scratch test on the protective film of Example 1.

【図7】比較例1の保護膜に対するスクラッチテストに
よる強度測定の結果を示す図
FIG. 7 is a diagram showing the result of strength measurement by a scratch test on the protective film of Comparative Example 1.

【図8】比較例2の保護膜に対するスクラッチテストに
よる強度測定の結果を示す図
FIG. 8 is a view showing a result of strength measurement by a scratch test on a protective film of Comparative Example 2.

【符号の説明】[Explanation of symbols]

1 磁気記録媒体の原反 2 真空槽 4 冷却キャンロール 5 プラズマ反応管 6 反応ガス供給用のパイプ 7 マイクロ波導波管 8 ECR用コイル 9 水晶窓 1 Fabrication of magnetic recording medium 2 Vacuum tank 4 Cooling can roll 5 Plasma reaction tube 6 Pipe for supplying reaction gas 7 Microwave waveguide 8 ECR coil 9 Crystal window

───────────────────────────────────────────────────── フロントページの続き (72)発明者 佐々木 克己 栃木県芳賀郡市貝町大字赤羽2606 花王株 式会社情報科学研究所内 (72)発明者 石川 准子 栃木県芳賀郡市貝町大字赤羽2606 花王株 式会社情報科学研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Katsumi Sasaki 2606, Akabane, Kai, Haga-gun, Tochigi Prefecture Kao Co., Ltd.Institute of Information Science Research Institute (72) Junko Ishikawa 2606, Akabane, Kai-cho, Haga-gun, Tochigi Kao Shikisha Institute of Information Science

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 プラズマ反応管に対向した位置にある支
持体上にECRプラズマCVD法により保護膜を形成す
る方法であって、 前記プラズマ反応管に反応ガスを導入する工程と、 前記プラズマ反応管にマイクロ波を導入し、プラズマを
励起させる工程と、 前記支持体から前記プラズマ反応管のマイクロ波進入口
に向けて磁界の強さが増加し、その増加途中で電子サイ
クロトロン共鳴が起きる磁界強度よりも小さい磁界強度
の山を有し、再び前記電子サイクロトロン共鳴が起きる
磁界強度まで磁界の強さが増加する磁界分布を持つ磁場
を発生させる工程とを有することを特徴とする保護膜形
成方法。
1. A method of forming a protective film by ECR plasma CVD on a support located at a position facing a plasma reaction tube, the step of introducing a reaction gas into the plasma reaction tube, and the plasma reaction tube. A step of exciting a plasma by introducing microwaves into the plasma reaction tube, the strength of the magnetic field increases from the support toward the microwave entrance of the plasma reaction tube, and the magnetic field strength at which electron cyclotron resonance occurs during the increase And a magnetic field having a magnetic field distribution in which the magnetic field strength increases again until the electron cyclotron resonance occurs again.
【請求項2】 前記山が、前記支持体と前記マイクロ波
進入口との真ん中位置よりも前記支持体側に近い位置に
生じるように磁場を発生させることを特徴とする請求項
1の保護膜形成方法。
2. The protective film formation according to claim 1, wherein the magnetic field is generated so that the peak is generated at a position closer to the support side than a center position between the support and the microwave entrance. Method.
【請求項3】 前記支持体上の磁性膜上に保護膜を形成
することを特徴とする請求項1又は請求項2の保護膜形
成方法。
3. The method for forming a protective film according to claim 1 or 2, wherein a protective film is formed on the magnetic film on the support.
【請求項4】 ECRプラズマCVD法により保護膜を
形成する装置であって、 真空槽と、 この真空槽内に配設された支持体に対向した位置にある
プラズマ反応管と、 このプラズマ反応管内に反応ガスを供給する反応ガス供
給手段と、 前記支持体から前記プラズマ反応管のマイクロ波進入口
に向けて磁界の強さが増加し、その増加途中で電子サイ
クロトロン共鳴が起きる磁界強度よりも小さい磁界強度
の山を有し、再び前記電子サイクロトロン共鳴が起きる
磁界強度まで磁界の強さが増加する磁界分布を持つ磁場
を発生させる磁場発生手段とを有することを特徴とする
保護膜形成装置。
4. An apparatus for forming a protective film by an ECR plasma CVD method, comprising: a vacuum chamber, a plasma reaction tube facing a support disposed in the vacuum chamber, and a plasma reaction tube in the plasma reaction tube. And a reaction gas supply means for supplying a reaction gas to the substrate, and the magnetic field strength increases from the support toward the microwave entrance of the plasma reaction tube, and the magnetic field strength is smaller than the magnetic field strength at which electron cyclotron resonance occurs in the course of the increase. An apparatus for forming a protective film, comprising: a magnetic field generating means having a magnetic field strength peak and generating a magnetic field having a magnetic field distribution in which the magnetic field strength increases again until the electron cyclotron resonance occurs.
JP24719295A 1995-09-26 1995-09-26 Formation of protective film and device therefor Pending JPH0987853A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24719295A JPH0987853A (en) 1995-09-26 1995-09-26 Formation of protective film and device therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24719295A JPH0987853A (en) 1995-09-26 1995-09-26 Formation of protective film and device therefor

Publications (1)

Publication Number Publication Date
JPH0987853A true JPH0987853A (en) 1997-03-31

Family

ID=17159819

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24719295A Pending JPH0987853A (en) 1995-09-26 1995-09-26 Formation of protective film and device therefor

Country Status (1)

Country Link
JP (1) JPH0987853A (en)

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