JPH0945265A - Color display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a low-cost color display device which enhances contrast without lowering brightness and is easy to manufacture. SOLUTION: This color display device has a transparent panel 12 and red, green, and blue phosphors, 15R, 15G, 15B, provided on the inside surface of the transparent panel 12 and made to emit red, green, and blue light by application of energy beams. A red filter 4R, composed of Fe2 O3 as main component and having a film thickness (d) of not less than 1μm and not more than 3.0μm, is mounted between the red phosphor 15R and the transparent panel 12. Desirably, the red phosphor is represented by the following general formula: A:B wherein A is Y2 O2 S, Y2 O3 , or a mixture of them and B is Eu or a mixture of Eu and Sm, the concentration [Eu] of Eu in the phosphor being not less than 0.1mol% and not more than 6.0mol%.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improvement in a color display device such as a color cathode ray tube (CRT) and a color flat panel display device, and more particularly to a color display device capable of improving brightness and contrast. Regarding

[0002]

2. Description of the Related Art Conventionally, as a high-contrast color CRT, for example, a panel C having a phosphor layer on its inner surface is made of dark glass having a light transmittance of about 40 to 45%, or a color CRT having phosphor particles. Color C in which a fluorescent surface is formed on the inner surface of the panel by using a so-called pigmented phosphor in which a pigment of the same color as the emission color of the phosphor is attached to the surface
There is known an RT or a color CRT in which a color filter suitable for each emission color is provided between a red (R), green (G), blue (B) phosphor and a panel glass.

[0003]

By the way, in the color CRT in which the panel glass is made of dark glass,
Since the dark glass absorbs external light, it is possible to improve the contrast, but at the same time, the light emitted from the fluorescent surface is also absorbed by the dark glass panel glass, so that the brightness is lowered.

Further, in a color CRT having a phosphor screen formed of a pigmented phosphor, the pigment absorbs external light, so that the contrast is improved. However, in this case,
Since several layers (for example, 3 to 4 layers) of phosphor particles are stacked to form a phosphor screen, a part of light emitted from the phosphor particles is absorbed by the pigment, and the brightness is reduced by about 10 to 15%. To do.

That is, there has been a demand for a means for improving the contrast without lowering the brightness. The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a color display device that improves contrast without lowering brightness, is easy to manufacture, and is low cost.

[0006]

In order to achieve the above object, a color display device according to the present invention is provided with a transparent panel and an inner surface of the transparent panel, and by irradiating with an energy beam, respectively. A color display device having a red phosphor, a green phosphor, and a blue phosphor that emits red, green, and blue light, wherein Fe ₂ O ₃ is a main component between the red phosphor and the transparent panel. It is characterized by having a red filter attached.

In the color display device according to the present invention, the red phosphor is preferably represented by the following general formula. A: B (wherein A is Y ₂ O ₂ S, Y ₂ O ₃ or a mixture thereof, B is Eu or a mixture of Eu and Sm, and the Eu concentration [Eu] in the phosphor is 0. 1 mol% ≦ [E
u] ≦ 6.0 mol%) The color cathode ray tube according to the present invention includes a panel glass, a funnel glass connected to the panel glass, an electron gun mounted in a neck portion of the funnel glass, and the panel. A color cathode ray tube which is provided on the inner surface side of glass and has a red phosphor, a green phosphor, and a blue phosphor that emit red, green, and blue light when irradiated with an electron beam from an electron gun. Further, a red filter containing Fe ₂ O ₃ as a main component is mounted between the red phosphor and the panel glass.

The color flat panel display device according to the present invention is transparent.
A panel and an inner surface of the transparent panel,
By irradiating the gee beam, red and green respectively
Red and green phosphors that emit color and blue light and
A color flat display device having a blue phosphor and
Between the red phosphor and the transparent panel, Fe₂ O _Three 
Is equipped with a red filter whose main component is
Sign. The energy beam is, for example, on the substrate.
Field emission type microcassaws arranged in a matrix
It is an electron beam that is emitted by scanning from the scanner. Or
The energy beam is built in a flat cathode ray tube.
It may be an electron beam emitted from an electron gun.

In the present invention, the film thickness d of the red filter is preferably in the range of 0.1 μm ≦ d ≦ 3.0 μm, more preferably in the range of 0.5 μm ≦ d ≦ 2.0 μm.

[0010]

In the color display device according to the present invention, a red filter is mounted between the red phosphor and the transparent panel. Therefore, the contrast is improved as compared with the conventional color display device in which no filter is attached. Moreover, since the red filter has a film thickness d containing Fe ₂ O ₃ as a main component in a predetermined range of 0.1 μm ≦ d ≦ 3.0 μm, the red filter has excellent transmittance with respect to red, and the brightness and chromaticity are excellent. Change is small.

Further, according to the present invention, the load applied to the energy beam irradiation means such as the red cathode is small,
The load applied to each energy beam irradiation means such as the R, G, and B cathodes is well balanced, and as a result, the durability is improved.

[0012]

BEST MODE FOR CARRYING OUT THE INVENTION A color display device according to the present invention will be described below in detail based on an embodiment shown in the drawings. In the embodiment shown in FIG. 1, the present invention is applied to a color CRT as a color display device.

As shown in FIG. 1, the color C according to the present embodiment.
RT10 is a panel glass 1 having a fluorescent surface formed on the inner surface thereof.
2 and a funnel glass 14 bonded to this panel glass and accommodating the electron gun 16 in the neck portion.
The electron beam emitted from the electron gun 16 is deflected by the deflection yoke, passes through the aperture grill 20 as a color selection electrode mounted on the inner surface side of the panel glass 12,
It emits light by hitting the fluorescent screen.

As shown in FIG. 2, the panel glass 12 is
It is made of glass having a high light transmittance (for example, a light transmittance of 90% or more), and a fluorescent screen is formed on the inner surface thereof. As the panel glass having a high light transmittance, a panel glass in which a safety panel having a high transmittance is attached to the surface of a glass panel having a high transmittance is used. Specific examples of the high transmittance panel glass include a tint panel (EIAJ code JP520AG11) manufactured by Nippon Electric Sheet Glass Co., Ltd., and a clear safety panel (EIAJ code JS520AA01).
Can be used.

As shown in FIG. 2, in this embodiment, black stripes (carbon stripes) 2 are formed on the inner surface of the panel glass 12 at predetermined intervals, and red (R) fluorescent light is placed between these stripes 2. The body 15R, the green (G) phosphor 15G, and the blue phosphor 15B are alternately arranged in this order. These phosphors 15R, 15G, 15B
Are covered with an aluminum film 22.

In this embodiment, the red filter 4R is mounted only between the red phosphor 15R and the panel glass 12. No color filter is mounted between the other phosphors 15B and 15G and the panel glass 12. However, these other phosphors 15B, 15G
An appropriate color filter may be attached between the panel glass 12 and the panel glass 12.

The red filter 4R of this embodiment is made of Fe.
2O3 is the main component, especially the average particle size is 0.3μ
m or less, more preferably 0.1 μm or less ultrafine Fe
It is desirable that the main component is ₂ O ₃ . Average particle size is 0.3
This is because if it exceeds μm, there is a possibility that a problem such as a decrease in light transmittance may occur.
The lower limit of the average particle size is not particularly limited and is preferably as small as possible, but substantially 0.02 μm is a practically possible limit. Specific examples of this raw material include the DEFIC-R series manufactured by Dowa Mining Co., Ltd., the transparent valve pattern (TOR) series manufactured by Dainippon Seiko Co., Ltd., and the like.

In the red filter, the content ratio of the above-mentioned pigment (pigment solid content) is as follows.
About 2.0 to 20.0% by weight is suitable. The film thickness d of this red filter is 0.1 μm ≦ d ≦ 3.0.
μm, and more preferably 0.5 μm ≦ d ≦ 2.0 μm. When the film thickness d is less than 0.1 μm, the effect of improving the contrast due to the provision of the filter cannot be expected, and it becomes difficult to form a filter having a uniform film thickness on the other hand. This is because when it exceeds 0 μm, the brightness is greatly reduced, and both are not desirable. FIG. 3 and FIG. 4 show the spectral transmittance curve and the spectral reflectance curve in the case where such a red filter having a predetermined film thickness d is provided. High transmittance or reflectance.

Further, in the present embodiment, as the red (R) phosphor 15R, the one represented by the following general formula is used and combined with the above filter in order to obtain better chromaticity and brightness. desirable. A: B (wherein A is Y ₂ O ₂ S, Y ₂ O ₃ or a mixture thereof, B is Eu or a mixture of Eu and Sm, and the Eu concentration [Eu] in the phosphor is 0. 1 mol% ≦ [E
u] ≦ 6.0 mol%) Specifically, those containing yttrium oxysulfide as a host crystal and europium as an additive, and yttrium oxide as a host crystal and euroview as an additive , Yttrium oxysulfide as a host crystal, and europium and samarium as an additive.

Most preferably, the red phosphor 15R is a phosphor represented by the above general formula, and the Eu concentration [Eu] is 2.8 mol% ≦ [Eu] ≦ 4.7 mol%.
And the film thickness d of the red filter is set to 0.5 μm ≦ d ≦ 2.0 μm.

Next, in this embodiment, an example of a method for forming a fluorescent screen on the inner surface of the panel glass will be described. First, the black stripe 2 shown in FIG. 2, which is made of carbon black or the like as a non-emissive light absorbing substance, is formed. To form the black stripe 2, first, the panel glass is washed, and a photoresist made of a water-soluble polymer such as a photosensitizer and polyvinyl alcohol (PVA) is applied to the inner surface of the panel glass 12 and dried to form a resist film. To do. Next, a predetermined portion of the resist film is exposed and cured using a mask.

Next, the non-exposed portion of the resist film is removed by development and dried to form a stripe of the resist film. Then, a carbon black suspension is applied to the entire surface of the panel glass, dried and then an inversion solution is applied. Then, it is developed and dried to form a black stripe 2 made of carbon black (see FIG. 5A).

Then, a blue filter 4R is formed at a position between the black stripes 2 and 2 on which the red phosphor 15B is mounted. Therefore, first, as shown in FIG. 5B, a photosensitive film 3 of PVA-ADC system or the like is formed on the entire surface. Next, as shown in FIG. 5 (C), using the aperture grille as an optical mask, the photosensitive film 3 at the positions B and G is exposed to ultraviolet rays and developed with warm water. The masking resist film 3A is left at the positions B and G in FIG.

Next, a second photosensitive liquid such as PVA-S is used.
Fe as described above in the BQ type photosensitive solution ₂ O_Three Is the main component
A suspension of finely divided inorganic red pigment (slurry
-) Is applied over the entire surface, and as shown in FIG.
A coating film 4 for Luther is formed. Next, as shown in FIG.
The inner surface of the panel glass 12
Coating film 4 in the red (R) position using the lens 20 as an optical mask.
Ultraviolet exposure is performed on the inner surface (inner surface exposure 6). Furthermore, the figure
As shown in FIG. 6 (F), the black stripe 2 is used as a mask,
Is it the outer surface of the panel glass 12 with respect to the coating film 4 in the red position?
UV exposure (external surface exposure 7). Perform this external exposure 7
By doing so, the adhesiveness between the coating film 4 and the panel glass 12 is improved.
improves.

Next, the unexposed portion is rinsed with warm water.
Next, the unexposed PVA-ADC-based resist film 3A is decomposed using hydrogen peroxide water (H ₂ O ₂ 10% by weight) and the like, and then the inversion phenomenon is performed with hot water to obtain the pattern shown in FIG. As shown, a red filter stripe 4R is formed. Then, as shown in FIG. 7G, for example, a red filter stripe 4 is formed by using a 0.1% by weight tannic acid solution.
Hardening treatment 8 is performed on R, and thereafter, a neutralization treatment is performed after the hardening treatment with, for example, an aqueous ammonia solution (1.0% by weight of ammonia), and then rinsed with warm water.

After that, the phosphors 15R, 15G and 15B and the aluminum film 22 shown in FIG. 2 are formed by a normal slurry method. Specifically, first, a green phosphor,
A green phosphor slurry composed of a photosensitizer and a water-soluble polymer is applied to the entire surface of the panel glass and dried to form a green phosphor resist film. Next, a predetermined portion of the resist film is exposed and cured by using a mask, the unexposed portion of the green phosphor resist film is removed by development, and dried to form a green phosphor stripe.

As the green phosphor, for example, one whose base crystal is zinc sulfide and which contains copper, aluminum or the like as an additive is used. Then, a blue phosphor stripe containing a blue phosphor, a red phosphor stripe,
Similar to the formation of the green phosphor stripe, the green phosphor stripe is formed in another hole portion adjacent to the hole portion in which the green phosphor stripe is formed.

As the red phosphor, the above-mentioned one is used, and as the blue phosphor, for example, one in which the base crystal is zinc sulfide and silver or the like is contained as an additive is used. In this way, after the red, green, and blue phosphor stripes are formed, the intermediate film is formed thereon. The intermediate film is composed of an organic film and flattens the phosphor screen to facilitate the deposition of an aluminum thin film layer as a metal thin film layer in a later step. After the pre-baking in the subsequent process and the baking process at the time of frit sealing, the interlayer film is PV.
With A and the like, it is blown through the aluminum film.

Then, an aluminum thin film layer as a metal thin film layer is deposited on the intermediate film. By forming the aluminum thin film layer, the brightness of the display screen can be improved and ionization can be prevented. After that, pre-baking is performed, the aperture grill is attached to the inner surface of the panel glass, and then the seal edge surface of the panel glass and the seal edge surface of the funnel glass are frit-sealed. Pre-baking may be done after installing the aperture grill.
By the baking treatment (heat treatment) during the pre-baking and the frit sealing, the components of the intermediate film and the organic components contained in the phosphor stripes are removed from the phosphor screen through the aluminum film, and the film of the phosphor screen is fixed.

Next, an embodiment in which the present invention is applied to a color flat display device using a field emission type microcathode as a color display device will be described. As shown in FIG. 8, in the color flat panel display device 60 of this embodiment, an electron beam emitted by scanning from a plurality of field emission type micro-cathodes 50 arranged in a matrix on a semiconductor substrate 30 emits a glass. It is a display device that displays an image by irradiating a fluorescent surface formed on the inner surface of the transparent panel 32 such as a substrate to emit light. A high vacuum is maintained between the semiconductor substrate 30 and the transparent substrate 32. The fluorescent screen formed on the inner surface of the transparent panel 32 is the same fluorescent screen as in the embodiment shown in FIG. 2, and the red filter 4R is mounted only between the red fluorescent body 15R and the transparent panel 32.

The microcathode 5 is formed on the semiconductor substrate 30.
An example of a method for manufacturing 0 will be described below. In this embodiment, first, the insulating layer 31 and the gate electrode 35 are sequentially formed on the semiconductor substrate 30. As the semiconductor substrate 30, for example, a single crystal silicon substrate is used.

In this embodiment, the insulating layer 31 is composed of a main insulating layer 32 and a hydrogen containing layer 33. Main insulating layer 32
Is made of, for example, silicon oxide formed by a CVD method, and the hydrogen-containing layer 33 is made of hydrogen-containing silicon oxide formed by plasma CVD performed subsequent to the CVD for forming the main insulating layer 32. Composed. The main insulating layer 32 formed of a silicon oxide film is formed by CVD under the following conditions, for example. SiH ₄ and O ₂ are used as the CVD source gas, the flow rate ratio of SiH ₄ / O ₂ is, for example, 300/300 SCCM, the atmospheric pressure is, for example, 300 Pa, the substrate temperature is, for example, 400 ° C., the film formation time is, for example, 4 It is a condition of minutes. The layer thickness of the main insulating layer 32 is, for example, 0.8 μm.

A hydrogen-containing layer 33 composed of a hydrogen-containing silicon oxide film subsequently formed by plasma CVD.
Is formed by plasma CVD under the following conditions, for example. SiH ₄ and O ₂ are used as the plasma CVD source gas, and the flow rate ratio of SiH ₄ / O ₂ is, for example, 400 /
The conditions are 300 SCCM, atmospheric pressure of 300 Pa, substrate temperature of 350 ° C., and film forming time of 1 minute, for example. The layer thickness of the hydrogen-containing layer 33 is, for example, 0.
2 μm.

The gate electrode 35 is not particularly limited,
In this embodiment, a polycide film, which is a laminated film of a polysilicon film 34 of n ⁺ conductivity type and a tungsten silicide (WSix) film 36, is used. This gate electrode 35
Function as a grid of microcathodes, for example. The step of forming the emitter electrode formed on the surface of the semiconductor substrate 30 is omitted.

The thickness of the polysilicon film 34 is, for example, 1
It is 00-300 nm. Tungsten silicide film 3
The film thickness of 6 is, for example, 150 to 300 nm. Polysilicon film 34 and tungsten silicide film 36
Is formed by, for example, CVD. The polysilicon film 34 is formed under the following conditions, for example. SiH ₄ and PH ₃ are used as the CVD source gas, and SiH ₄ / P is used.
The flow rate ratio of H ₃ is, for example, 500 / 0.3 SCCM, the atmospheric pressure is, for example, 100 Pa, and the substrate temperature is, for example, 500.
The condition is ° C. The tungsten silicide film 36 is
For example, the film is formed under the following conditions. Using WF ₆ , SiH _4, and He as the CVD source gas, WF ₆ / SiH
₄ / He flow rate ratio is 3/300 / 500SCCM,
The atmospheric pressure is, for example, 70 Pa, and the substrate temperature is, for example, 3
The condition is 60 ° C.

Next, this tungsten silicide film 36 is formed.
A resist film is formed thereon, and an opening is formed in the resist film by a photolithography method in a predetermined pattern corresponding to the cathode hole. The inner diameter of this opening is
It corresponds to the inner diameter of the cathode hole and is, for example, about 0.8 μm. The resist film is not particularly limited, but, for example, a novolac-based g-line resist can be used.

Next, the semiconductor substrate 30 on which this resist film is formed is placed in, for example, a general plasma etching apparatus, and etching processing is performed using the resist film 38 as a mask. The plasma etching apparatus is not particularly limited, but examples thereof include a microwave electron cyclotron resonance plasma (ECR) etching apparatus, an induction coil type plasma (ICP) etching apparatus, a helicon wave utilizing plasma etching apparatus, and a transformer coupled plasma (TC).
P) An etching device or the like can be exemplified.

First, the tungsten silicide film 36 and the polysilicon film 34 are continuously etched under the following conditions using, for example, an ECR etching apparatus. As an etching gas, a mixed gas of Cl ₂ and O ₂ is used, and C
The flow rate ratio of l ₂ / O ₂ is, for example, 75/5 SCCM.
The atmospheric pressure is 1.0 Pa, for example. The microwave power is 900 W, for example, and the high frequency (R
F) The power is, for example, 50 W (2 MHz), and the substrate temperature is, for example, 20 ° C.

Subsequently, the insulating layer 31 is etched.
You. For etching, for example, ECR type plasma
An etching device is used. The etching conditions are
Show. CHF is used as an etching gas_Three And CH₂ F₂ 
CHF with a mixed gas of _Three / CH₂ F₂ Flow rate of
Is, for example, 45/5 SCCM. Atmospheric pressure is
For example, it is 0.27 Pa. Also, the microwave power is
For example, it is 1200 W, and the radio frequency (RF) power is
For example, 225W (800kHz), the substrate temperature
Is, for example, 20 ° C.

Conventionally, in continuous etching of such a multi-layer film, the resist film 38 recedes due to excessive over-etching under a high energy condition, the side wall of the opening 40 is also shaved, and the tungsten silicide located under the same. The film 36 is also partially etched to form a taper shape. This is the gate electrode 35 and the insulating layer 3.
It is considered that the time for exposing the resist film to the plasma etching is longer than that of the conventional etching technique for forming the contact hole because the same resist film is used for etching the two. However, in the present embodiment, since the hydrogen-containing layer 33 is included in the insulating layer 31, H generated during the etching of the hydrogen-rich (several tens wt%) hydrogen-containing layer 33 is C / n near the hole 44. By increasing the F ratio and forming a deposition atmosphere, normal Si
Fluorocarbon-based deposits as seen during O ₂ etching serve as a side wall protective film to prevent the photoresist from receding. Therefore, the side wall of the opening of the gate electrode 35 is not over-etched. As a result, the shoulder drop of the tungsten silicide film 36 can be prevented, and the cathode hole 44 having a good anisotropic shape can be formed.

Next, the resist film is removed by resist ashing. The resist ashing is, for example, 500
Using SCCM O ₂ and atmospheric pressure of 3.0P
a, substrate temperature is 200 ° C., high frequency (RF)
The power is, for example, 300 W. The sidewall protective film is also removed at the same time as or after the removal of the resist film.

Next, a peeling layer is formed on the tungsten silicide film 36 by using the electron beam evaporation method or the like. The peeling layer is composed of, for example, an aluminum metal layer. The layer thickness of the release layer is not particularly limited, but is, for example, about 50 nm. The substrate angle during electron beam evaporation is preferably about 20 degrees (oblique incidence evaporation). The atmospheric pressure is 1.0 Pa, for example.

Next, a cathode forming layer is deposited on the release layer by using, for example, an electron beam evaporation method. Molybdenum (Mo) is preferably used for the cathode forming layer, but other refractory metals, other metals, compounds, or the like can also be used. The angle of the substrate during electron beam evaporation is preferably about 90 degrees, for example. By forming the cathode forming layer with a layer thickness of, for example, about 1.0 μm, an acute-angled cone-shaped cathode 50 is formed in a uniform shape and height on the surface of the substrate 30 located at the bottom of the cathode hole 44. It The shape of each cathode 50, in particular the height, depends on the time taken to close each opening of the cathode formation layer. In the present embodiment, the tungsten silicide film 36
Since there is no taper or shoulder drop on the side wall of the opening of, the step coverage of the cathode forming layer 48 becomes constant,
The time until each opening 48a is closed is constant,
The shape, especially the height, of each cathode 50 can be made uniform.

Next, wet etching (for example, for about 30 seconds) is performed with hydrofluoric acid in a ratio of water: hydrofluoric acid of about 5: 1.
The peeling layer made of aluminum or the like is removed by etching, and the cathode forming layer located thereon is lifted off. In the cathode hole 44, a micro cathode 50 having a uniform shape and height remains.

After that, a transparent panel having a phosphor screen is laminated on the substrate 30 in a vacuum state to form the flat display device of this embodiment. Also in this embodiment, as in the case of the above-described embodiment, the brightness and the contrast are improved and the chromaticity is almost the same as that of the conventional specification, as compared with the conventional flat display device without the red filter.

It should be noted that the present invention is not limited to the above-described embodiment, but can be variously modified within the scope of the present invention. For example, the present invention is not limited to the CRT or the flat panel display device according to the above-described embodiment, but can be applied to a color cathode ray tube such as a flat CRT, or another color display device such as a plasma display.

[0047]

EXAMPLES Next, the present invention will be described in more detail based on examples. Example 1 A phosphor screen having the structure shown in the schematic diagram of FIG. 9 was prepared. In FIG. 9, reference numeral 12 is a panel glass, reference numeral 4R is a red filter, reference numeral 15R is a red phosphor, and reference numeral 22 is an aluminum reflective film.

The red filter is an ultrafine particle Fe ₂ O _{3 having} a particle size of 0.05 μm or less (DEFIC-R manufactured by Dowa Mining Co., Ltd.).
Series or a transparent valve pattern (TO
(R) series) dispersed in water, and after drying, the film thickness d is 0.5 μm (R1), 1.0 μm (R
2), 2.0 μm (R3), and 3.0 μm (R4) so as to be applied on the panel glass. For comparison, a filter not having this filter was separately prepared.
Next, as a phosphor, Y ₂ O ₂ S: E was formed on the red filter (or the panel glass not forming the filter).
The Eu concentration [Eu] of u is 6.0, 4.7, 3.8,
2.8, 0.2, 0.1, and 0.05 mol% were applied, and then an aluminum reflective film was formed to prepare a total of 35 samples, and an experiment was conducted. 2 shows the transmittance of each filter, and FIG. 3 shows the spectral reflectance (tube surface diffusion spectral reflectance) after applying the phosphor.

The fluorescent screen having these structures is used as a cathode ray, and the luminance, chromaticity, and tube surface reflectance are measured, and from these data, BC, which is an index of contrast improvement efficiency, is measured.
P (bright contrast performance) was determined.
BCP is defined by the following formula.

[0050]

[Equation 1]

Table 1 shows the BCP of each CRT when Y ₂ O ₂ S: 3.8 mol% Eu and the BCP without a filter (conventional example) was set to 100.

[0052]

[Table 1]

Table 2 is a qualitative summary of the results shown in Table 1. The case where the BCP is 100 or more, that is, the case where the contrast improvement efficiency is superior to the conventional case is the case of the ◯ mark and the ● mark in Table 2. It is considered that the mark ● is more preferable in terms of brightness and chromaticity.

[0054]

[Table 2]

The brightness B was measured by a color analyzer CA-100 manufactured by Minolta Co., Ltd. The measurement conditions are
With the CRT incorporated in the set (GDM 19 inches), the transfer voltage to the red cathode was made constant, and 9300K
The white color was measured and measured. The diffuse reflectance R of the tube surface is C
The ambient light reflection brightness of the RT surface is adjusted to 350 lu of the CRT tube surface.
It was measured at x hour. The chromaticity was measured by a color analyzer CA-100 manufactured by Minolta Co., Ltd. The measurement conditions were an acceleration voltage of 27 kV and a cathode current of 300 μA.

[0056]

As described above, according to the present invention, the contrast is improved as compared with the conventional color display device in which no filter is attached. Moreover, if the proper combination with the red phosphor to be used is made,
Improve contrast without reducing brightness,
Alternatively, it was possible to improve the brightness without changing the contrast.

[Brief description of drawings]

FIG. 1 is a color CRT according to an embodiment of the present invention.
FIG.

2 is a cross-sectional view of a main part of the inner surface of the panel shown in FIG.

FIG. 3 is a diagram showing a spectral transmittance characteristic of a red filter according to an embodiment of the present invention.

FIG. 4 is a diagram showing spectral reflectance characteristics after applying a phosphor of a red filter according to an embodiment of the present invention.

5A to 5C are process diagrams showing a method for forming a phosphor screen.

6 (D) to 6 (F) are process diagrams showing a process following that of FIG. 5 (C).

7 (G) and (H) are process drawings showing a process following that of FIG. 6 (F).

FIG. 8 is a cross-sectional view of an essential part of a color flat panel display according to another embodiment of the present invention.

FIG. 9 is a cross-sectional view of an essential part of a color phosphor screen manufactured according to an embodiment of the present invention.

[Explanation of symbols]

 2 ... Black stripe 4R ... Red filter 12 ... Panel glass 14 ... Funnel glass 15R ... Red phosphor 15G ... Green phosphor 15B ... Blue phosphor 16 ... Electron gun

Claims (7)

[Claims] 1. A transparent panel, and a red phosphor, a green phosphor and a blue phosphor which are provided on the inner surface side of the transparent panel and emit red, green and blue light when irradiated with an energy beam, respectively. A color display device including: Fe ₂ O ₃ between the red phosphor and the transparent panel.
A color display device equipped with a red filter whose main component is. 2. The film thickness d of the red filter is 0.1 μm.
The color display device according to claim 1, wherein m ≦ d ≦ 3.0 μm. 3. The color display device according to claim 1, wherein the red phosphor is represented by the following general formula. A: B (wherein A is Y ₂ O ₂ S, Y ₂ O ₃ or a mixture thereof, B is Eu or a mixture of Eu and Sm, and the Eu concentration [Eu] in the phosphor is 0. 1 mol% ≦ [E
u] ≦ 6.0 mol%) 4. A panel glass, a funnel glass connected to the panel glass, an electron gun mounted in a neck portion of the funnel glass, and an electron beam from the electron gun provided on an inner surface side of the panel glass. Is a color cathode ray tube having a red phosphor that emits red, green and blue light, a green phosphor and a blue phosphor, respectively, between the red phosphor and the panel glass. , Fe ₂ O
_A color cathode ray tube equipped with a red filter whose main component is ₃ . 5. The film thickness d of the red filter is 0.1 μm.
The color cathode ray tube according to claim 4, wherein m ≦ d ≦ 3.0 μm. 6. A transparent panel, and a red phosphor, a green phosphor and a blue phosphor which are provided on the inner surface side of the transparent panel and emit red, green and blue lights when irradiated with an energy beam, respectively. A color flat panel display device comprising: Fe ₂ O ₃ between the red phosphor and the transparent panel.
A flat-panel color display device with a red filter whose main component is. 7. The film thickness d of the red filter is 0.1 μm.
The color flat display device according to claim 6, wherein m ≦ d ≦ 3.0 μm.