JPH09316694A - Plating device - Google Patents
Plating deviceInfo
- Publication number
- JPH09316694A JPH09316694A JP8138695A JP13869596A JPH09316694A JP H09316694 A JPH09316694 A JP H09316694A JP 8138695 A JP8138695 A JP 8138695A JP 13869596 A JP13869596 A JP 13869596A JP H09316694 A JPH09316694 A JP H09316694A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- plating solution
- tank
- flow rate
- plated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、めっき装置に係
り、特に、ICリードフレーム、TABテープ等の長尺
物の連続めっき装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plating apparatus, and more particularly to a continuous plating apparatus for long products such as IC lead frames and TAB tapes.
【0002】[0002]
【従来の技術】従来のめっき装置の概略図を図3に示
す。2. Description of the Related Art A schematic view of a conventional plating apparatus is shown in FIG.
【0003】図3に示すように、従来のめっき装置21
は、被めっき物10をめっきするためのめっき槽8と、
めっき槽8からオーバーフローするめっき液3を溜める
めっき液タンク2と、めっき液タンク2からめっき槽8
にめっき液3を循環移送するめっき液移送系4とを備え
たものである。As shown in FIG. 3, a conventional plating apparatus 21
Is a plating tank 8 for plating the object 10 to be plated,
The plating solution tank 2 for storing the plating solution 3 overflowing from the plating tank 8 and the plating solution tank 2 to the plating tank 8
And a plating solution transfer system 4 for circulating and transferring the plating solution 3.
【0004】めっき液移送系4は、めっき液3を移送す
るポンプ5と、ポンプ5を駆動する駆動モータ16と、
めっき液3の流量を調整するバルブ22と、めっき液3
中の不純物を除去するフィルタ6と、およびめっき液3
の流量を計測する流量計7とで構成される。The plating solution transfer system 4 includes a pump 5 for transferring the plating solution 3 and a drive motor 16 for driving the pump 5.
A valve 22 for adjusting the flow rate of the plating solution 3 and the plating solution 3
Filter 6 for removing impurities inside and plating solution 3
And a flow meter 7 for measuring the flow rate of
【0005】めっき液移送系4によって循環移送された
めっき液3を、めっき液移送系4に接続されたノズル9
の先端から、被めっき物10をめっきするためのめっき
槽8中に供給する。The plating solution 3 circulated and transferred by the plating solution transfer system 4 is connected to the nozzle 9 which is connected to the plating solution transfer system 4.
Is supplied into the plating tank 8 for plating the object 10 to be plated.
【0006】めっき液3は、めっき槽8とめっき液タン
ク2との間を循環移送させて繰返し使用するが、めっき
装置21を長時間に亘って使用していると、めっき液3
中に、めっき液から析出したデンドライトまたは外部か
らの埃・ゴミなどが混入し、めっきの状態が変動する。
これを防ぐために、ポンプ5とめっき槽8との間に、め
っき液3から不純物を取り除くフィルタ6を設けてい
る。すなわち、フィルタ6で不純物を濾過しためっき液
3を用いることによって、常に安定した品質でめっき作
業が行える。The plating solution 3 is repeatedly circulated between the plating tank 8 and the plating solution tank 2 and used repeatedly. However, if the plating apparatus 21 is used for a long time, the plating solution 3
The dendrite precipitated from the plating solution or dust / dust from the outside is mixed in, and the plating state changes.
In order to prevent this, a filter 6 for removing impurities from the plating solution 3 is provided between the pump 5 and the plating tank 8. That is, by using the plating solution 3 in which impurities are filtered by the filter 6, it is possible to always perform plating work with stable quality.
【0007】また、不純物がフィルタ6に付着すると、
フィルタ6を通過するめっき液3の流量が減少する。こ
れを防ぐために、フィルタ6の上流側のめっき液移送系
4にバルブ22を、フィルタ6の下流側のめっき液移送
系4に流量計7を設けている。すなわち、作業者が流量
計7を監視しながら、めっき液3の流量が常に一定とな
るようにバルブ22を操作している。Further, when impurities adhere to the filter 6,
The flow rate of the plating solution 3 passing through the filter 6 is reduced. In order to prevent this, a valve 22 is provided in the plating solution transfer system 4 on the upstream side of the filter 6, and a flow meter 7 is provided in the plating solution transfer system 4 on the downstream side of the filter 6. That is, the operator operates the valve 22 so that the flow rate of the plating solution 3 is always constant while monitoring the flow meter 7.
【0008】[0008]
【発明が解決しようとする課題】しかしながら、現状に
おいては、作業者が流量計7を監視し、めっき液3の流
量が常に一定となるようにバルブ22を操作しなければ
ならないため、作業性があまり良好ではない。また、バ
ルブ22の操作が、作業者による手動操作であるため、
めっき液3の流量が低下してからバルブ22を開くまで
の間に必然的にタイムラグが生じ、瞬間的なめっき液3
の流量低下を招く。さらに、めっき液3の流量の調整を
バルブ22の開閉によって行うためには、作業者の勘に
頼る部分が大きく、熟練した作業者を必要とする。However, in the present situation, the operator must monitor the flow meter 7 and operate the valve 22 so that the flow rate of the plating solution 3 is always constant, which results in poor workability. Not very good. Further, since the operation of the valve 22 is a manual operation by the operator,
A time lag inevitably occurs between the time when the flow rate of the plating solution 3 decreases and the time when the valve 22 is opened.
Will cause a decrease in the flow rate. Further, in order to adjust the flow rate of the plating solution 3 by opening and closing the valve 22, the operator's intuition is large and a skilled operator is required.
【0009】被めっき物10に対するめっき液3の流量
は、めっきの品質を左右する重要な因子の一つであるた
め、めっき品質の安定化という面からすると、めっき液
3は常に一定の流量であることが望ましい。Since the flow rate of the plating solution 3 with respect to the object to be plated 10 is one of the important factors that affect the quality of plating, the plating solution 3 is always kept at a constant flow rate in terms of stabilizing the plating quality. Is desirable.
【0010】そこで本発明は、上記課題を解決し、めっ
き液の流量調整作業を自動で行うと共に、被めっき物の
めっき品質が安定なめっき装置を提供することにある。SUMMARY OF THE INVENTION It is, therefore, an object of the present invention to solve the above problems, and to provide a plating apparatus that automatically adjusts the flow rate of a plating solution and that has stable plating quality of an object to be plated.
【0011】[0011]
【課題を解決するための手段】上記課題を解決するため
に請求項1の発明は、被めっき物をめっきするためのめ
っき槽と、該めっき槽からオーバーフローするめっき液
を溜めるめっき液タンクと、該めっき液タンクから上記
めっき槽にめっき液を循環移送するめっき液移送系と、
該めっき液移送系に接続されると共に該めっき液中の不
純物を除去するフィルタとを備えためっき装置におい
て、上記めっき液移送系に、能力可変型電動ポンプを設
けると共に上記めっき槽へと循環移送されるめっき液の
流量を検出して電気信号として出力する流量計を設け、
且つ、上記めっき槽へと循環移送されるめっき液の流量
を一定とするべく上記能力可変型電動ポンプの駆動モー
ターの回転数を上記流量計からの出力信号により自動制
御する制御手段を設けたものである。In order to solve the above problems, the invention of claim 1 is a plating tank for plating an object to be plated, and a plating solution tank for storing a plating solution overflowing from the plating tank. A plating solution transfer system for circulating and transferring the plating solution from the plating solution tank to the plating tank;
In a plating apparatus equipped with a filter for removing impurities in the plating solution, which is connected to the plating solution transfer system, a variable capacity electric pump is provided in the plating solution transfer system, and the plating solution is circulated and transferred to the plating tank. Is equipped with a flow meter that detects the flow rate of the plating solution and outputs it as an electrical signal.
In addition, a control means is provided for automatically controlling the rotational speed of the drive motor of the variable capacity electric pump in accordance with the output signal from the flow meter so as to keep the flow rate of the plating solution circulated and transferred to the plating tank constant. Is.
【0012】請求項2の発明は、上記能力可変型電動ポ
ンプが、上記駆動モーターの回転数、あるいは上記制御
手段の制御電流を検知すると共に、所定値以上になった
時に警告するための検知手段を備えた請求項1記載のめ
っき装置である。According to a second aspect of the present invention, the variable capacity electric pump detects the number of revolutions of the drive motor or the control current of the control means, and a detection means for issuing a warning when the value exceeds a predetermined value. The plating apparatus according to claim 1, further comprising:
【0013】以上の構成によれば、めっき液タンクから
めっき槽にめっき液を循環移送するめっき液移送系に、
能力可変型電動ポンプを設けると共にめっき槽へと循環
移送されるめっき液の流量を検出して電気信号として出
力する流量計を設け、且つ、めっき槽へと循環移送され
るめっき液の流量を一定とするべく能力可変型電動ポン
プの駆動モーターの回転数を流量計からの出力信号によ
り自動制御する制御手段を設けたため、めっき液の流量
調整作業を自動で行うと共に、被めっき物のめっき品質
が安定なめっき装置を得ることができる。According to the above construction, the plating solution transfer system for circulating and transferring the plating solution from the plating solution tank to the plating tank,
Provided with a variable capacity electric pump, equipped with a flow meter that detects the flow rate of the plating solution circulated and transferred to the plating tank and outputs it as an electrical signal, and keeps the flow rate of the plating solution circulated and transferred to the plating tank constant. In order to achieve this, the control means for automatically controlling the rotation speed of the drive motor of the variable capacity electric pump by the output signal from the flow meter is provided, so that the plating solution flow rate adjustment work can be performed automatically and the plating quality of the plated object can be improved. A stable plating apparatus can be obtained.
【0014】[0014]
【発明の実施の形態】以下、本発明の実施の形態を説明
する。Embodiments of the present invention will be described below.
【0015】本発明のめっき装置の概略を図1に示す。
尚、図3における部材と同じ部材には同じ符号を付して
いる。An outline of the plating apparatus of the present invention is shown in FIG.
The same members as those in FIG. 3 are designated by the same reference numerals.
【0016】図1に示すように、本発明のめっき装置1
は、被めっき物10をめっきするめっき槽8と、めっき
槽8からオーバーフローするめっき液3を溜めるめっき
液タンク2と、めっき液タンク2からめっき槽8にめっ
き液3を循環移送するめっき液移送系4とを備えたもの
である。As shown in FIG. 1, the plating apparatus 1 of the present invention
Is a plating tank 8 for plating the object 10 to be plated, a plating solution tank 2 for storing a plating solution 3 overflowing from the plating tank 8, and a plating solution transfer for circulating and transferring the plating solution 3 from the plating solution tank 2 to the plating tank 8. And system 4.
【0017】めっき液移送系4は、めっき液3を移送す
る能力可変型電動ポンプ17と、めっき液の不純物を濾
過するフィルタ6と、めっき液3の流量を計測する流量
計7とで構成され、めっき液移送系4の先端にはノズル
9が設けられる。The plating solution transfer system 4 comprises a variable capacity electric pump 17 for transferring the plating solution 3, a filter 6 for filtering impurities in the plating solution 3, and a flow meter 7 for measuring the flow rate of the plating solution 3. A nozzle 9 is provided at the tip of the plating solution transfer system 4.
【0018】能力可変型電動ポンプ17は、めっき液3
を移送するポンプ5と、ポンプ5を駆動する駆動モータ
ー16とで構成され、駆動モーター16には、その回転
数を制御するインバーター(制御手段)12が接続され
る。The variable capacity electric pump 17 is used for the plating solution 3
And a drive motor 16 for driving the pump 5. An inverter (control means) 12 for controlling the rotation speed of the drive motor 16 is connected to the drive motor 16.
【0019】また、ポンプ5の回転数、あるいはインバ
ータ12の電流値を検知する検知手段(図示せず)が、
能力可変型電動ポンプ17に接続して設けられる。Further, a detection means (not shown) for detecting the rotation speed of the pump 5 or the current value of the inverter 12 is
It is provided so as to be connected to the variable capacity electric pump 17.
【0020】図1におけるめっき槽8の部分の拡大図を
図2に示す。尚、図3における部材と同じ部材には同じ
符号を付している。An enlarged view of the portion of the plating tank 8 in FIG. 1 is shown in FIG. The same members as those in FIG. 3 are designated by the same reference numerals.
【0021】図2に示すように、めっき液3が満たされ
ためっき槽8の下部には、新たなめっき液を供給すべく
ノズル9が設けられる。また、被めっき物10は、その
一部がめっき槽8内のめっき液3に浸るべく、走行して
設けられる。As shown in FIG. 2, a nozzle 9 is provided below the plating tank 8 filled with the plating solution 3 to supply a new plating solution. Further, the object to be plated 10 is provided by running so that a part thereof is immersed in the plating solution 3 in the plating tank 8.
【0022】電源に接続された陰極15,15は、被め
っき物10と接して設けられ、電源13に接続された陽
極14は、めっき槽8内における被めっき物10とノズ
ル9との間に設けられる。The cathodes 15 and 15 connected to the power source are provided in contact with the object 10 to be plated, and the anode 14 connected to the power source 13 is between the object 10 to be plated and the nozzle 9 in the plating tank 8. It is provided.
【0023】次に、本発明の作用を説明する。Next, the operation of the present invention will be described.
【0024】めっき液タンク2内のめっき液3を、めっ
き液移送系4における能力可変型電動ポンプ17によっ
て、フィルタ6および流量計7を経て、めっき液移送系
4の先端のノズル9からめっき槽8に循環位相する。The plating solution 3 in the plating solution tank 2 is passed from the nozzle 9 at the tip of the plating solution transfer system 4 through the filter 6 and the flow meter 7 by the variable capacity electric pump 17 in the plating solution transfer system 4 to the plating tank. Circulate phase to 8.
【0025】次に、図2に示した陽極14と陰極15に
接して設けられた被めっき物10との間に通電すること
によって、被めっき物10にめっきを行う。めっき層8
内におけるめっき液3のオーバーフローは、回収した後
に再処理を施して、めっき液タンク2に戻される。Next, the object to be plated 10 is plated by applying an electric current between the object to be plated 10 provided in contact with the anode 14 and the cathode 15 shown in FIG. Plating layer 8
The overflow of the plating solution 3 in the inside is recovered, reprocessed, and returned to the plating solution tank 2.
【0026】長時間に亘るめっき液3の循環移送によっ
てめっき液3に混入した不純物は、フィルタ6によって
濾過する。さらに、長時間に亘るめっき液3の循環移送
によって、フィルタ6の目詰まりによるめっき液3の流
量の変化が起きる。The impurities mixed in the plating solution 3 due to the circulation transfer of the plating solution 3 for a long time are filtered by the filter 6. Further, the circulation transfer of the plating solution 3 for a long time causes a change in the flow rate of the plating solution 3 due to clogging of the filter 6.
【0027】流量の変化は、流量計7によって計測さ
れ、めっき液3の流量を電気信号として制御手段である
インバーター12に入力し、これを能力可変型電動ポン
プ17にフィードバックする。この電気信号によってイ
ンバーター12は、駆動モーター16の駆動周波数を変
化させ、駆動モーター16の回転数を上げる。駆動モー
ター16の回転数の上昇によって、ポンプ5の吐出量が
上昇し、めっき液3の流量が増加する。The change in the flow rate is measured by the flow meter 7, the flow rate of the plating solution 3 is input as an electric signal to the inverter 12 which is the control means, and this is fed back to the variable capacity electric pump 17. The inverter 12 changes the drive frequency of the drive motor 16 by this electric signal and increases the rotation speed of the drive motor 16. As the rotation speed of the drive motor 16 increases, the discharge amount of the pump 5 increases and the flow rate of the plating solution 3 increases.
【0028】すなわち、めっき液移送系4を循環位相す
るめっき液3の流量の制御を自動で行うため、バルブを
操作すると共にめっき液移送系4を循環位相するめっき
液3の流量の制御を手動で行っていた時と比較すると、
タイムラグがほとんどなくなり、めっき液移送系4を循
環移送するめっき液3の流量を常に一定に保つことがで
きる。これによって、被めっき物10のめっき品質が安
定したものとなる。That is, since the flow rate of the plating solution 3 circulating through the plating solution transfer system 4 is automatically controlled, the valve is operated and the flow rate of the plating solution 3 circulating through the plating solution transfer system 4 is manually controlled. Compared to when I was in
The time lag is almost eliminated, and the flow rate of the plating solution 3 circulated and transferred through the plating solution transfer system 4 can be always kept constant. As a result, the plating quality of the object to be plated 10 becomes stable.
【0029】また、ポンプ5の回転数がある回転数以上
になったり、あるいはインバータ12の電流値が所定値
以上になったら警報を出力する検知手段が、能力可変型
電動ポンプ17に取り付けてあるため、フィルタ6の交
換時期の目安とすることができる。Further, a detecting means for outputting an alarm when the rotational speed of the pump 5 exceeds a certain rotational speed or the current value of the inverter 12 exceeds a predetermined value is attached to the variable capacity electric pump 17. Therefore, it can be used as a guide for the replacement time of the filter 6.
【0030】[0030]
【発明の効果】以上要するに本発明によれば、めっき液
の流量を常に一定にすることができるという優れた効果
を発揮する。In summary, according to the present invention, the excellent effect that the flow rate of the plating solution can be kept constant is exhibited.
【図1】本発明のめっき装置の概略図である。FIG. 1 is a schematic view of a plating apparatus of the present invention.
【図2】図1における要部拡大図である。FIG. 2 is an enlarged view of a main part in FIG.
【図3】従来のめっき装置の概略図である。FIG. 3 is a schematic view of a conventional plating apparatus.
1 めっき装置 2 めっき液タンク 3 めっき液 4 めっき液移送系 5 ポンプ 6 フィルタ 7 流量計 8 めっき槽 9 ノズル 10 被めっき物 12 インバーター(制御手段) 16 駆動モーター 17 能力可変型電動ポンプ DESCRIPTION OF SYMBOLS 1 Plating apparatus 2 Plating solution tank 3 Plating solution 4 Plating solution transfer system 5 Pump 6 Filter 7 Flow meter 8 Plating tank 9 Nozzle 10 Plated object 12 Inverter (control means) 16 Driving motor 17 Variable capacity electric pump
Claims (2)
と、該めっき槽からオーバーフローするめっき液を溜め
るめっき液タンクと、該めっき液タンクから上記めっき
槽にめっき液を循環移送するめっき液移送系と、該めっ
き液移送系に接続されると共に該めっき液中の不純物を
除去するフィルタとを備えためっき装置において、上記
めっき液移送系に、能力可変型電動ポンプを設けると共
に上記めっき槽へと循環移送されるめっき液の流量を検
出して電気信号として出力する流量計を設け、且つ、上
記めっき槽へと循環移送されるめっき液の流量を一定と
するべく上記能力可変型電動ポンプの駆動モーターの回
転数を上記流量計からの出力信号により自動制御する制
御手段を設けたことを特徴とするめっき装置。1. A plating tank for plating an object to be plated, a plating solution tank for storing a plating solution overflowing from the plating tank, and a plating solution transfer for circulating and transferring the plating solution from the plating solution tank to the plating tank. In a plating apparatus equipped with a system and a filter for removing impurities in the plating solution, which is connected to the plating solution transfer system, a variable capacity electric pump is provided in the plating solution transfer system, and to the plating tank. And a flow meter for detecting the flow rate of the plating solution circulated and transferred as an electric signal and outputting the flow rate of the plating solution circulated and transferred to the plating tank. A plating apparatus provided with control means for automatically controlling the number of rotations of a drive motor according to an output signal from the flow meter.
モーターの回転数、あるいは上記制御手段の制御電流を
検知すると共に、所定値以上になった時に警告するため
の検知手段を備えた請求項1記載のめっき装置。2. The variable capacity electric pump is provided with detection means for detecting the number of revolutions of the drive motor or the control current of the control means, and for issuing a warning when the value exceeds a predetermined value. 1. The plating apparatus according to 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8138695A JPH09316694A (en) | 1996-05-31 | 1996-05-31 | Plating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8138695A JPH09316694A (en) | 1996-05-31 | 1996-05-31 | Plating device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH09316694A true JPH09316694A (en) | 1997-12-09 |
Family
ID=15227967
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8138695A Pending JPH09316694A (en) | 1996-05-31 | 1996-05-31 | Plating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH09316694A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102628174A (en) * | 2012-05-07 | 2012-08-08 | 舟山市金秋机械有限公司 | Flow plating apparatus |
CN104213180A (en) * | 2014-09-17 | 2014-12-17 | 丹阳市新光电子有限公司 | Electroplating liquid circulating system of flexible circuit board |
CN112725873A (en) * | 2020-12-29 | 2021-04-30 | 江西超洋科技有限公司 | Accurate circulating filtration jet flow energy-saving system |
KR102366696B1 (en) * | 2021-09-17 | 2022-02-23 | 임지훈 | System for measuring the flow rate for plating equipment |
-
1996
- 1996-05-31 JP JP8138695A patent/JPH09316694A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102628174A (en) * | 2012-05-07 | 2012-08-08 | 舟山市金秋机械有限公司 | Flow plating apparatus |
CN102628174B (en) * | 2012-05-07 | 2014-08-20 | 舟山市金秋机械有限公司 | Flow plating apparatus |
CN104213180A (en) * | 2014-09-17 | 2014-12-17 | 丹阳市新光电子有限公司 | Electroplating liquid circulating system of flexible circuit board |
CN104213180B (en) * | 2014-09-17 | 2016-06-08 | 丹阳市新光电子有限公司 | Flexible PCB electroplate liquid blood circulation |
CN112725873A (en) * | 2020-12-29 | 2021-04-30 | 江西超洋科技有限公司 | Accurate circulating filtration jet flow energy-saving system |
KR102366696B1 (en) * | 2021-09-17 | 2022-02-23 | 임지훈 | System for measuring the flow rate for plating equipment |
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