JPH09312462A - Method of forming electric circuit - Google Patents

Method of forming electric circuit

Info

Publication number
JPH09312462A
JPH09312462A JP12527496A JP12527496A JPH09312462A JP H09312462 A JPH09312462 A JP H09312462A JP 12527496 A JP12527496 A JP 12527496A JP 12527496 A JP12527496 A JP 12527496A JP H09312462 A JPH09312462 A JP H09312462A
Authority
JP
Japan
Prior art keywords
resin
electric circuit
solvent
forming
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12527496A
Other languages
Japanese (ja)
Inventor
Satoshi Imai
敏 今井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanegafuchi Chemical Industry Co Ltd
Original Assignee
Kanegafuchi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanegafuchi Chemical Industry Co Ltd filed Critical Kanegafuchi Chemical Industry Co Ltd
Priority to JP12527496A priority Critical patent/JPH09312462A/en
Publication of JPH09312462A publication Critical patent/JPH09312462A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To save time for processing a molten metal by forming an electric circuit using a resin soluble in a solvent to be set and becoming conductive by using light, X-ray, an electron beam individually or together with one another. SOLUTION: Resins to be set by light, X-ray, an electron beam becoming insoluble in a solvent and conductive is used for the formation of an electric circuit. These resins are natural rubber soluble in polybutadiene or polyisoprene or polyisobutylene solvent or copolymer of these monomers or a block copolymer thereof or dual coupling of copolymer with monomer copolymerizable with these elements with iodine added thereto. After the formation of a thin film on a glass sheet by coating the glass sheet with the solution of this resin, this thin film is irradiated with light, X-ray or an electron beam. Through these procedures, the thin film is discolored into dark violet color becoming insoluble in a solvent.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は電気回路の形成方法
に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming an electric circuit.

【0002】[0002]

【従来の技術】電気回路の形成方法は従来は絶縁体の板
の上に金属泊を張り合わせ、その金属泊上に感光樹脂を
塗布し、回路形成部分を露光する事により感光樹脂を硬
化させた後、露出された部分を酸等で溶解除去して電気
回路を形成する方法が良く知られている。
2. Description of the Related Art Conventionally, a method for forming an electric circuit is to bond a metal plate on an insulating plate, apply a photosensitive resin on the metal plate, and expose the circuit forming portion to cure the photosensitive resin. After that, a method of forming an electric circuit by dissolving and removing the exposed portion with an acid or the like is well known.

【0003】[0003]

【発明が解決しようとする課題】上記の従来の方法で
は、回路形成に用いる金属より溶解除去させる金属の方
が多かったり、溶解させた金属の処理に手間がかかると
言う問題が見られる。
In the above-mentioned conventional method, there are problems that more metal is dissolved and removed than the metal used for forming the circuit, and that processing of the dissolved metal is troublesome.

【0004】[0004]

【課題を解決するための手段】本発明者は上記の従来法
による電気回路形成法の欠点を克服すべく鋭意検討の結
果、以下の方法により可能となる。 (1)溶媒に可溶であり、光、X線、電子線又はこれら
の併用で硬化し且つ導電性となる樹脂を用いて電気回路
を形成させる。 (2)硬化後に導電性となる樹脂を用いて形成された回
路上に金属メッキを行うことで上記(1)の電気回路を
形成する。 (3)硬化後に導電性となる樹脂が、脂肪族の二重結合
を有する樹脂を沃素化したものであることを特徴とする
上記(1)または(2)の電気回路を形成する。 (4)脂肪族の二重結合を有する樹脂がポリブタジエ
ン、ポリイソブチレン、ポリイソプレン及び溶媒可溶の
天然ゴムであることを特徴とする上記(3)の電気回路
を形成する。 (5)脂肪族の二重結合を有する樹脂がブタジエン、イ
ソブチレン、イソプレンから選ばれる単量体を共重合し
た樹脂、あるいはこれらの単量体と共重合可能な他の単
量体とこれらの単量体から選ばれる単量体を共重合した
樹脂であることを特徴とする上記(3)の電気回路を形
成する。
Means for Solving the Problems As a result of earnest studies to overcome the above-mentioned drawbacks of the electric circuit forming method according to the conventional method, the present invention can be realized by the following method. (1) An electric circuit is formed by using a resin that is soluble in a solvent and that is cured by light, X-rays, electron beams, or a combination of these and becomes conductive. (2) The electric circuit of (1) above is formed by performing metal plating on a circuit formed of a resin that becomes conductive after curing. (3) The electric circuit of the above (1) or (2) is characterized in that the resin which becomes conductive after curing is an iodinated resin having an aliphatic double bond. (4) The resin having an aliphatic double bond is polybutadiene, polyisobutylene, polyisoprene and a solvent-soluble natural rubber to form the electric circuit of (3). (5) The resin having an aliphatic double bond is a resin obtained by copolymerizing a monomer selected from butadiene, isobutylene and isoprene, or another monomer copolymerizable with these monomers and these monomers. An electric circuit of the above (3) is formed, which is a resin obtained by copolymerizing a monomer selected from a monomer.

【0005】[0005]

【発明の実施の形態】本発明ではフィルムあるいは板状
の電気絶縁体上に、溶媒に可溶であり、光、X線、電子
線又はこれらの併用で硬化し且つ導電性となる樹脂を塗
布し、回路形成部分のみに光、X線、電子線又はこれら
を併用した線種で露光させ樹脂を硬化させた後、未露光
の部分に塗布された樹脂を除去することで電気回路の形
成することが可能であり、従来法に比べてその操作は非
常に簡単なものとなる。
BEST MODE FOR CARRYING OUT THE INVENTION In the present invention, a resin which is soluble in a solvent and which is cured by light, X-rays, electron beams or a combination thereof and becomes conductive is coated on a film or plate-shaped electric insulator. Then, only the circuit formation portion is exposed to light, X-rays, electron beams or a line type in which these are used together to cure the resin, and then the resin applied to the unexposed portion is removed to form an electric circuit. It is possible, and the operation becomes very simple compared with the conventional method.

【0006】また、導電性樹脂の導電度が不足する場合
は、通常のメッキ法等を用いて導電性を有する目的の回
路上に十分な導電性のある物質を形成させて電気回路を
形成させることが可能である。この場合、要する金属の
量は回路の部分のみであるから金属使用量が少なくてす
み、かつ廃液の処理も従来法と比べてはるかに少ないも
のである。
In addition, when the conductivity of the conductive resin is insufficient, an electric circuit is formed by forming a sufficiently conductive substance on the target circuit having conductivity by using an ordinary plating method or the like. It is possible. In this case, since the amount of metal required is only in the circuit portion, the amount of metal used can be small, and the waste liquid can be treated far less than in the conventional method.

【0007】本発明の用いる樹脂は、光、X線、電子線
により硬化して溶媒不溶となりかつ導電性となるもので
ある。これらの樹脂はポリブタジエンあるいはポリイソ
プレンあるいはポリイソブチレン溶媒可溶な天然ゴム、
あるいはこれら単量体の共重合体、あるいはこれらのブ
ロック共重合体、あるいはこれらと共重合可能な単量体
との共重合体の2重結合に沃素を付加させたものであ
る。この樹脂の溶液を塗布、キャスト等によりガラス板
上に薄膜を形成させた後この薄膜に光、X線、電子線等
を照射することにより膜は黒あるいは黒紫色に変色し、
溶媒不溶となる。この膜は溶媒に浸積しても色は脱色さ
れずかつ導電性の変化もほとんど認められない。
The resin used in the present invention is cured by light, X-rays and electron beams to be insoluble in solvent and conductive. These resins are polybutadiene or polyisoprene or polyisobutylene solvent soluble natural rubber,
Alternatively, iodine is added to a double bond of a copolymer of these monomers, a block copolymer of these monomers, or a copolymer of a monomer copolymerizable therewith. By applying a solution of this resin, forming a thin film on a glass plate by casting, etc., and then irradiating the thin film with light, X-rays, electron beams, etc., the film turns black or black purple,
It becomes insoluble in solvent. Even when the film is immersed in a solvent, the color is not decolorized and the conductivity is hardly changed.

【0008】本発明で用いる樹脂の導電性を高めるには
樹脂内に2重結合を多く有する樹脂が好ましい。また、
2重結合に沃素を付加させるに際して、ピリジンのよう
な触媒を添加することが好ましい。例えばポリブタジエ
ンのクロロホルム溶液に単に沃素を加えただけではポリ
ブタジエンの2重結合に沃素を付加させることは困難で
あるが、これに少量のピリジンを加えるだけで室温にお
いて沃素の付加は化学量論的に進行する。
In order to improve the conductivity of the resin used in the present invention, a resin having many double bonds in the resin is preferable. Also,
When adding iodine to the double bond, it is preferable to add a catalyst such as pyridine. For example, it is difficult to add iodine to the double bond of polybutadiene by simply adding iodine to a solution of polybutadiene in chloroform. However, addition of a small amount of pyridine to this makes addition of iodine stoichiometrically at room temperature. proceed.

【0009】沃素化に用いる溶媒は樹脂が溶解でき、沃
素と反応しないものであれば特に限定はないが、クロロ
ホルム、塩化メチレン、トリクレン、等のハロゲン化炭
化水素や、ヘキサン、シクロヘキサン、ベンゼン等のよ
うな炭化水素が挙げられる。本発明に用いる2重結合を
有する樹脂としては、主鎖及び又は側鎖にベンゼン環に
由来する2重結合を除く2重結合を有するものであれば
良く、ポリブタジエン、ポリイソプレン、ポリイソブチ
レン、天然ゴム、又はブタジエン、イソプレン、イソブ
チレンと他のモノマーの共重合体が挙げられる。共重合
可能な他のモノマーとしては、特に限定はないが、一例
を挙げれば、メチル(メタ)アクリレート、エチル(メ
タ)アクリレート、n−ブチル(メタ)アクリレート、
イソブチル(メタ)アクリレート、2ーエチルヘキシル
(メタ)アクリレート、ステアリル(メタ)アクリレー
ト、ベンジル(メタ)アクリレート、シクロヘキシル
(メタ)アクリレート、グリシジル(メタ)アクリレー
ト、ジエチルアミノエチル(メタ)アクリレート、(メ
タ)アクリルアミド、N−メチル(メタ)アクリルアミ
ド、(メタ)アクリル酸、アリル(メタ)アクリレート
等の(メタ)アクリル酸及びその誘導体。スチレン、α
ーメチルスチレン、スチレンスルホン酸、ビニルトルエ
ン、等の芳香族炭化水素系ビニル化合物。マレイン酸、
イタコン酸、フマル酸等の不飽和カルボン酸、無水マレ
イン酸等の不飽和カルボン酸の酸無水物、これらと炭素
数1〜20の直鎖状又は分岐を有するアルコールとのジ
エステルまたはハーフエステル等の不飽和カルボン酸の
エステル。酢酸ビニル、プロピオン酸ビニル、ジアリル
フタレート、等のビニルエステルやアリル化合物。ビニ
ルピリジン、アミノエチルビニルエーテル等のアミノ基
含有ビニル化合物。イタコン酸アミド、クロトンアミ
ド、マレイン酸ジアミド、フマル酸ジアミド、N−ビニ
ルピロリドン等のアミド基含有ビニル化合物。メチルビ
ニルエーテル、シクロヘキシルビニルエーテル、塩化ビ
ニル、塩化ビニリデン、クロロプレン、ビニルスルホン
酸等のビニル化合物などがあげられる。
The solvent used for iodination is not particularly limited as long as it can dissolve the resin and does not react with iodine, but halogenated hydrocarbons such as chloroform, methylene chloride, trichlene, hexane, cyclohexane, benzene, etc. Such hydrocarbons may be mentioned. The resin having a double bond used in the present invention may be any resin having a double bond other than the double bond derived from the benzene ring in the main chain and / or the side chain, such as polybutadiene, polyisoprene, polyisobutylene, natural Examples thereof include rubber or copolymers of butadiene, isoprene, and isobutylene with other monomers. Other copolymerizable monomers are not particularly limited, but as one example, methyl (meth) acrylate, ethyl (meth) acrylate, n-butyl (meth) acrylate,
Isobutyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, stearyl (meth) acrylate, benzyl (meth) acrylate, cyclohexyl (meth) acrylate, glycidyl (meth) acrylate, diethylaminoethyl (meth) acrylate, (meth) acrylamide, (Meth) acrylic acid such as N-methyl (meth) acrylamide, (meth) acrylic acid, allyl (meth) acrylate and derivatives thereof. Styrene, α
-Aromatic hydrocarbon vinyl compounds such as methylstyrene, styrenesulfonic acid, vinyltoluene and the like. Maleic acid,
Unsaturated carboxylic acids such as itaconic acid and fumaric acid, acid anhydrides of unsaturated carboxylic acids such as maleic anhydride, and diesters or half esters of these with linear or branched alcohols having 1 to 20 carbon atoms Esters of unsaturated carboxylic acids. Vinyl esters such as vinyl acetate, vinyl propionate, diallyl phthalate, and allyl compounds. Amino group-containing vinyl compounds such as vinyl pyridine and aminoethyl vinyl ether. Amide group-containing vinyl compounds such as itaconic acid amide, crotonamide, maleic acid diamide, fumaric acid diamide, and N-vinylpyrrolidone. Examples thereof include vinyl compounds such as methyl vinyl ether, cyclohexyl vinyl ether, vinyl chloride, vinylidene chloride, chloroprene and vinyl sulfonic acid.

【0010】沃素付加の際の温度は特に限定はないが、
副反応を少なくする点から50度以下で行うことが好ま
しい。また沃素の反応速度の点から0度以上で行うこと
が好ましい。また沃素化された樹脂は熱に対しても不安
定であるので反応及び保存させる場合の温度は0〜30
度がより好ましい。樹脂の2重結合が多数存在する間
は、未反応の沃素による色はそれらの添加後直ちに消え
るが、2重結合の減少とともに色がの消えるまでに時間
がかかるようになる。着色が数分〜数十分間継続した時
点で沃素の添加を終了し、反応の終了とする。着色が消
えるまでの時間は、用いる樹脂や得られる生成物の目的
により異なるので一概には言えないが、あえていえば1
0分〜30分が好ましい。樹脂の2重結合が計算あるい
は分析により得られる場合は2重結合の量に見合う量の
沃素を加えて反応させることが出来る。2重結合の量が
不明の場合は、上記のように沃素の逐次添加により反応
を行うことが好ましい。
The temperature for adding iodine is not particularly limited,
From the viewpoint of reducing side reactions, it is preferably performed at 50 ° C. or less. Further, it is preferably performed at 0 ° C. or higher from the viewpoint of the reaction rate of iodine. Further, since the iodinated resin is unstable to heat, the temperature for reaction and storage is 0 to 30.
The degree is more preferable. While many double bonds of the resin are present, the color due to unreacted iodine disappears immediately after their addition, but it takes time until the color disappears as the double bonds decrease. When the coloring is continued for several minutes to several tens of minutes, the addition of iodine is completed and the reaction is completed. The time until the color disappears cannot be generally stated because it depends on the purpose of the resin used and the product to be obtained, but if possible, it is 1
0 minutes to 30 minutes is preferable. When the double bond of the resin can be obtained by calculation or analysis, iodine can be added in an amount corresponding to the amount of the double bond and the reaction can be carried out. When the amount of double bonds is unknown, it is preferable to carry out the reaction by sequentially adding iodine as described above.

【0011】反応終了後反応系にアルコール等の非溶媒
を添加して析出させて、得られた生成物を回収する。得
られた生成物は洗浄、再沈殿等の操作により精製を行う
ことが好ましい。精製が終わった生成物は室温以下の温
度で真空乾燥により乾燥され、冷暗所に保存することが
好ましい。本生成物は光により硬化、変色、導電性とな
るので臭素あるいは沃素との反応以後はなるべく光を遮
断して行うことが好ましい。
After completion of the reaction, a non-solvent such as alcohol is added to the reaction system for precipitation, and the obtained product is recovered. The obtained product is preferably purified by operations such as washing and reprecipitation. It is preferable that the purified product is dried by vacuum drying at a temperature of room temperature or lower and stored in a cool and dark place. Since this product is cured, discolored, and conductive by light, it is preferably shielded from light after the reaction with bromine or iodine.

【0012】以下本発明を実施例を用いて説明するが、
本発明がこれらの例に限られるものでないことは言うま
でもない。
The present invention will be described below with reference to examples.
It goes without saying that the invention is not limited to these examples.

【0013】[0013]

【実施例】【Example】

実施例1ホ゜リフ゛タシ゛エン 10gを100ccのクロロホルムに溶解した溶液に、3cc
のヒ゜リシ゛ンを加え、反応液とした。ホ゜リフ゛タシ゛エン10gに含ま
れる2重結合に相当する化学当量の沃素を10ccのクロロホルム
に溶解させた溶液を、滴下ロートより反応液に添加するこ
とによりホ゜リフ゛タシ゛エンの二重結合に沃素を付加させた。こ
の際反応温度を室温に保つ目的で系を水にて冷却した。
沃素の付加は極めて速やかに起こり、反応は一時間以内
に完結した。反応系にメタノールを加え、高分子を回収した
後、メタノールで十分に洗浄して高分子の生成を行った。室
温にて真空乾燥し、暗所にて保存した。 実施例2フ゛タシ゛エン とスチレンのフ゛ロックコホ゜リマー10gを実施例1と同じ方法
で沃素化を行った。沃素化した樹脂を実施例1と同じ方
法で回収した後、再度クロロホルムに溶解、沈殿を3回繰り返
して実施例1と同様の方法で沃素化樹脂の精製、保存を
行った。 実施例3 実施例1で得られた沃素化樹脂の5%クロロホルム溶液
を厚さ1mmのナイロン板上に塗布して当該高分子薄膜
を形成させた。当該薄膜上に光によりパターンを形成し
て当該部分を導電性とした後、未硬化部分をクロロホル
ムにて溶出を行いナイロン板上に電気回路を形成させ
た。 実施例4 実施例3で得られた電気回路を硫酸銅により導電性とな
った部分に銅をメッキし、銅を用いた電気回路が完成し
た。
Example 1 To a solution of 10 g of polydibutadiene in 100 cc of chloroform was added 3 cc.
Was added to prepare a reaction solution. Iodine was added to the double bond of polybutadiene by adding to the reaction solution a solution prepared by dissolving a chemical equivalent of iodine corresponding to the double bond contained in 10 g of polydibutadiene in 10 cc of chloroform through a dropping funnel. At this time, the system was cooled with water in order to keep the reaction temperature at room temperature.
Addition of iodine took place very quickly and the reaction was complete within 1 hour. After adding methanol to the reaction system and collecting the polymer, the polymer was thoroughly washed with methanol to generate the polymer. It was vacuum dried at room temperature and stored in the dark. Example 2 10 g of a block copolymer of vinylene and styrene was iodinated in the same manner as in Example 1. The iodinated resin was recovered in the same manner as in Example 1, dissolved in chloroform again, and precipitated again 3 times to purify and store the iodinated resin in the same manner as in Example 1. Example 3 A 5% chloroform solution of the iodinated resin obtained in Example 1 was applied on a nylon plate having a thickness of 1 mm to form the polymer thin film. After a pattern was formed on the thin film by light to make the portion conductive, the uncured portion was eluted with chloroform to form an electric circuit on the nylon plate. Example 4 The electric circuit obtained in Example 3 was plated with copper on a portion made conductive by copper sulfate, and an electric circuit using copper was completed.

【0014】[0014]

【発明の効果】本発明は、2重結合有した特定の樹脂が
沃素で付加することでX線、電子線、レーザー光線によ
り変色、硬化、導電性となる樹脂となる樹脂を用いて電
気回路の形成が可能となった。
INDUSTRIAL APPLICABILITY According to the present invention, a specific resin having a double bond is added with iodine so that the resin becomes a resin that is discolored, cured, and conductive by X-rays, electron beams, and laser beams. It became possible to form.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 溶媒に可溶であり、光、X線、電子線又
はこれらの併用で硬化し且つ導電性となる樹脂を用いて
電気回路を形成させることを特徴とする電気回路の形成
方法。
1. A method for forming an electric circuit, which comprises forming an electric circuit using a resin which is soluble in a solvent and which is cured by light, X-rays, electron beams or a combination thereof and becomes conductive. .
【請求項2】 硬化後に導電性となる樹脂を用いて形成
された回路上に金属メッキを行うことを特徴とする特許
請求の範囲1項記載の電気回路の形成方法。
2. The method for forming an electric circuit according to claim 1, wherein metal plating is performed on the circuit formed by using a resin that becomes conductive after curing.
【請求項3】 硬化後に導電性となる樹脂が、脂肪族の
二重結合を有する樹脂を沃素化したものであることを特
徴とする特許請求の範囲1又は2記載の電気回路の形成
方法。
3. The method for forming an electric circuit according to claim 1, wherein the resin which becomes conductive after curing is an iodinated resin having an aliphatic double bond.
【請求項4】 脂肪族の二重結合を有する樹脂がポリブ
タジエン、ポリイソブチレン、ポリイソプレン及び溶媒
可溶の天然ゴムであることを特徴とする特許請求の範囲
3項記載の電気回路の形成方法。
4. The method for forming an electric circuit according to claim 3, wherein the resin having an aliphatic double bond is polybutadiene, polyisobutylene, polyisoprene and a solvent-soluble natural rubber.
【請求項5】 脂肪族の二重結合を有する樹脂がブタジ
エン、イソブチレン、イソプレンから選ばれる単量体を
共重合した樹脂、あるいはこれらの単量体と共重合可能
な他の単量体とこれらの単量体から選ばれる単量体を共
重合した樹脂であることを特徴とする特許請求の範囲3
項記載の電気回路の形成方法。
5. A resin in which an aliphatic double bond-containing resin is copolymerized with a monomer selected from butadiene, isobutylene, and isoprene, or another monomer copolymerizable with these monomers is used. A resin obtained by copolymerizing a monomer selected from the above-mentioned monomers.
A method of forming an electric circuit according to the item.
JP12527496A 1996-05-21 1996-05-21 Method of forming electric circuit Pending JPH09312462A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12527496A JPH09312462A (en) 1996-05-21 1996-05-21 Method of forming electric circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12527496A JPH09312462A (en) 1996-05-21 1996-05-21 Method of forming electric circuit

Publications (1)

Publication Number Publication Date
JPH09312462A true JPH09312462A (en) 1997-12-02

Family

ID=14906025

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12527496A Pending JPH09312462A (en) 1996-05-21 1996-05-21 Method of forming electric circuit

Country Status (1)

Country Link
JP (1) JPH09312462A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007504661A (en) * 2003-09-02 2007-03-01 ピクスドロ エルティーディー. Thin line forming method and system using inkjet technology
CN100403608C (en) * 2000-07-20 2008-07-16 三星电子株式会社 Multi-wavelength surface launching laser device and its producing method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100403608C (en) * 2000-07-20 2008-07-16 三星电子株式会社 Multi-wavelength surface launching laser device and its producing method
JP2007504661A (en) * 2003-09-02 2007-03-01 ピクスドロ エルティーディー. Thin line forming method and system using inkjet technology
JP4796964B2 (en) * 2003-09-02 2011-10-19 ピクスドロ ビー.ヴイ. Thin line forming method using inkjet technology

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