JPH09311436A - Protective member for mask - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent deposition of dust on a reticle even by deterioration or vibration of an adhesive and to obtain a high-quality protective material for a mask by forming a recessed part in the inside of the pellicle frame coated with an adhesive. SOLUTION: Pellicle frames 13 are adhered with an adhesive 17 to both surfaces of a reticle 16 on which a pattern 14 is formed, and a pellicle film 11 is adhered with an adhesive 12 to the pellicle frame 13. A recessed part 18 is formed in the inside of the pellicle frame, and the inside of the recessed part 18 is also coated with the adhesive 12. Therefore, dust 15 in the pellicle frame 13 is trapped by the adhesive 12 in the recessed part 18 on the inside of the pellicle frame 13. Thereby, the dust 15 trapped in the recessed part inside of the pellicle frame 13 remains in the recessed 18 even when the adhesive 12 deteriorates or the frame is vibrated, and the dust is prevented from dropping on the reticle 16 where the pattern is formed.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mask protection member (pellicle) used for protecting a photomask used for manufacturing ICs, LSIs, etc. from dust.

[0002]

2. Description of the Related Art Conventionally, techniques in such a field include:
For example, JP-A-63-15250 and JP-A-4-1-1.
There was one disclosed in Japanese Patent No. 74846. Generally, as disclosed in the above publication, a pellicle is used as a mask protection member for preventing dust from adhering to the photomask, and the dust in the pellicle adheres to the photomask. In order to prevent this, it has been proposed to capture dust by providing an adhesive as shown below.

FIG. 3 is a sectional view of such a conventional pellicle. In this figure, 1 is a pellicle film, 2 is an adhesive for adhering the pellicle film 1 to the pellicle frame 3, 4 is a chrome pattern formed on the reticle 6, and dust 5 is attached on the adhesive 2. There is. FIG. 4 is a sectional view of another conventional pellicle.

In this example, the pellicle film 1 is attached to both surfaces of the reticle 6 on which the chrome pattern 4 is formed by the adhesive 2. Since the adhesive 2 is applied to the entire inner surface of the pellicle film 1 as described above, the dust 5 adheres to the inner surface of the pellicle film 1.

[0005]

However, in the conventional pellicle described above, although the dust 5 can be captured, the captured dust 5 may drop due to deterioration of the adhesive 2, vibration, or the like. The quality of the mask could not be maintained semi-permanently and was not satisfactory. The present invention
It is an object of the present invention to eliminate the above problems and to provide a high-quality mask protection member in which dust does not drop on the reticle even when the adhesive is deteriorated or vibration is generated.

[0006]

In order to achieve the above object, the present invention provides [1] a mask protection member for protecting a photomask from dust, in which a recess is formed inside a pellicle frame coated with an adhesive. It is something that is done. In this way, by forming an indented portion inside the pellicle frame and applying an adhesive to the indented portion, dust can be captured by the adhesive in the indented portion, and the dust is a deterioration of the adhesive, or It is possible to provide a high quality mask because it does not drop on the reticle due to vibration or the like.

Furthermore, by coating the adhesive so that it does not stick out from the inside of the pellicle frame, it is possible to prevent the adhesive from deteriorating due to ultraviolet irradiation, etc., and to easily separate the pellicle frame and the reticle. [2] In the mask protection member according to the above [1], the recessed portion is a recessed recessed portion.

In particular, the concave recess has a simple shape and is easy to form. [3] In the mask protecting member according to the above [1], the recess is a hook-shaped recess. In particular, since the dust is captured in the deep groove deep inside, it is possible to reliably prevent the dust from coming out inside the pellicle frame.

[0009]

Embodiments of the present invention will be described below in detail with reference to the drawings. FIG. 1 is a sectional view of a pellicle showing a first embodiment of the present invention. As shown in this figure, on both sides of the reticle 16 on which the pattern 14 is formed,
The pellicle frame 13 is adhered with an adhesive 17, and the pellicle film 11 is attached to the pellicle frame 13 with the adhesive 12.

A concave portion 18 having a concave shape is formed inside the pellicle frame 13, and the adhesive 12 is also applied to the inside of the concave portion 18 having a concave shape. Therefore, the dust 15 in the pellicle frame 13 will be captured by the adhesive 12 in the concave recess 18 inside the pellicle frame 13. With this configuration, the dust 15 captured in the concave recess 18 inside the pellicle frame 13 remains in the concave recess 18 due to deterioration of the adhesive 12, vibration, or the like. It does not fall on the reticle 16 on which the pattern 14 is formed.

The adhesive 12 is applied so as not to protrude from the inside of the pellicle frame 13 to prevent the adhesive from deteriorating due to irradiation of ultraviolet rays and the pellicle frame 1
3 and the reticle 16 can be easily separated. Furthermore, the concave recess 18 has a simple shape and can be easily formed. Next, a second embodiment of the present invention will be described.

FIG. 2 is a sectional view of a pellicle showing a second embodiment of the present invention. The same parts as those in the first embodiment are designated by the same reference numerals and the description thereof will be omitted. In this embodiment, inside the pellicle frame 21, a hook-shaped recess 2 is formed.
2, that is, a recess having a wider groove 22b is formed in a portion deeper than the opening 22a, and the adhesive 12 is applied to the surface of the striped recess 22.

Therefore, the dust 15 in the pellicle frame 21 is attached to the adhesive 1 of the hook-shaped recess 22 inside the pellicle frame 21.
2 will be captured. With this configuration,
The dust 15 captured by the adhesive 12 in the hook-shaped recess 22 inside the pellicle frame 21 remains in the hook-shaped recess 22 due to deterioration of the adhesive 12, vibration, or the like.
It does not fall on the reticle 16 on which the pattern 14 is formed.

Particularly, since the dust 15 is captured by the wide groove 22b deeper than the opening 22a, it is possible to reliably prevent the dust 15 from jumping out to the inside of the pellicle frame 21. In addition,
In the above-mentioned embodiment, as the recessed portion, the recessed portion having the concave shape and the recessed portion having the hook shape are described, but the recessed portions having various shapes other than the above may be used as long as the dust can be prevented from falling from the pellicle frame. Can be formed.

The present invention is not limited to the above-described embodiment, and various modifications are possible based on the spirit of the present invention, and these are not excluded from the scope of the present invention.

[0016]

As described in detail above, according to the present invention, the following effects can be achieved. (1) According to the invention described in claim 1, by forming a recessed portion inside the pellicle frame and applying an adhesive thereto, dust is captured by the adhesive in the recessed portion, and the dust adheres. It is possible to provide a high-quality mask because the agent does not drop on the reticle even when the agent deteriorates or is vibrated.

By applying the pressure-sensitive adhesive so that it does not stick out from the inner side of the pellicle frame, it is possible to prevent the pressure-sensitive adhesive from deteriorating due to irradiation with ultraviolet rays, and to easily separate the pellicle frame and the reticle. (2) According to the second aspect of the invention, in particular, the concave recess has a simple shape and is easy to form.

(3) According to the third aspect of the invention, in particular, since the dust is captured in the deep groove deep inside, it is possible to reliably prevent the dust from jumping out to the inside of the pellicle frame.

[Brief description of drawings]

FIG. 1 is a cross-sectional view of a pellicle showing a first embodiment of the present invention.

FIG. 2 is a sectional view of a pellicle showing a second embodiment of the present invention.

FIG. 3 is a cross-sectional view of a conventional pellicle.

FIG. 4 is a cross-sectional view of another conventional pellicle.

[Explanation of symbols]

 11 Pellicle Membrane 12, 17 Adhesive 13,21 Pellicle Frame 14 Pattern 15 Dust 16 Reticle 18 Recessed Recess 22 Keyed Recess 22a Open 22b Wide Groove

Claims (3)

[Claims] 1. A mask protection member for protecting a photomask from dust, wherein a depression is formed inside a pellicle frame coated with an adhesive. 2. The mask protecting member according to claim 1, wherein the recess is a recess having a concave shape. 3. The mask protection member according to claim 1, wherein the recessed portion is a hook-shaped recessed portion.