JPH09303289A - Surface treatment method for molecular pump - Google Patents

Surface treatment method for molecular pump

Info

Publication number
JPH09303289A
JPH09303289A JP14374796A JP14374796A JPH09303289A JP H09303289 A JPH09303289 A JP H09303289A JP 14374796 A JP14374796 A JP 14374796A JP 14374796 A JP14374796 A JP 14374796A JP H09303289 A JPH09303289 A JP H09303289A
Authority
JP
Japan
Prior art keywords
film
nickel
molecular pump
surface treatment
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14374796A
Other languages
Japanese (ja)
Inventor
Masashi Iguchi
昌司 井口
Masatomo Okamoto
正智 岡本
Takanori Kodama
孝徳 児玉
Hiroyasu Taguchi
裕康 田口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OSAKA SHINKU KIKI SEISAKUSHO KK
Resonac Holdings Corp
Original Assignee
OSAKA SHINKU KIKI SEISAKUSHO KK
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OSAKA SHINKU KIKI SEISAKUSHO KK, Showa Denko KK filed Critical OSAKA SHINKU KIKI SEISAKUSHO KK
Priority to JP14374796A priority Critical patent/JPH09303289A/en
Publication of JPH09303289A publication Critical patent/JPH09303289A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To prevent the coagulation and accumulation of a process gas on an area around a rotor, and improve corrosion resistance by applying the constitution that a film made of a nickel-tin alloy film with tetrafluoroethylene resin coagulated like fine powder is formed on the process gas contact surface of a molecular pump. SOLUTION: Regarding a compound molecular pump to draw process gases through an intake port 12, and discharge the gases from an exhaust port 13, surface treatment is applied to the inner surface of the intake port 12 and the gas contact surface parts of each member of a rotor 1, a stationary blade 7, a distance piece 8, a stator 9 and a lower housing 11, all having process gas contact surfaces. In other words, the surface treatment is applied to the outer surface of each member in such a way as forming a nickel film, a nickel- phosphorous film. and a nickel-tin alloy film with ethylene tetrafluoride resin fine power coagulated. In this case, the nickel film is formed to have thickness between 0.1 and 2μm, and the nickel-phosphorus film to thickness between 1 and 20μm, using the electroless plating method.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は薄膜工業分野等にお
ける工業用真空装置などに広く使用されている分子ポン
プに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a molecular pump widely used in industrial vacuum devices in the field of thin film industry.

【0002】[0002]

【従来の技術】分子ポンプには、ターボ分子ポンプ、ね
じ溝分子ポンプ、及びこれらが複合した複合分子ポンプ
がある。
2. Description of the Related Art Molecular pumps include turbo molecular pumps, thread groove molecular pumps, and composite molecular pumps in which these are combined.

【0003】図8に複合分子ポンプの縦断面図の1例を
示す。
FIG. 8 shows an example of a vertical sectional view of a composite molecular pump.

【0004】即ち、吸気口aと排気口bとを有する筐体
c内にターボ分子ポンプ部dとねじ溝分子ポンプ部eと
が順次配列されており、該吸気口aよりプロセスガスを
吸入して排気口bより排出する。
That is, a turbo molecular pump part d and a thread groove molecular pump part e are sequentially arranged in a housing c having an intake port a and an exhaust port b, and a process gas is sucked from the intake port a. Exhaust from the exhaust port b.

【0005】尚、fは回転軸、gは該回転軸fに固定し
たロータ、hは該回転軸fを駆動するモータ、i及びj
はそれぞれジャーナル磁気軸受及びスラスト磁気軸受、
又、kはタッチダウン軸受を示す。
In addition, f is a rotating shaft, g is a rotor fixed to the rotating shaft f, h is a motor for driving the rotating shaft f, and i and j
Respectively journal magnetic bearing and thrust magnetic bearing,
Further, k indicates a touchdown bearing.

【0006】半導体製造等における薄膜工業分野では、
薄膜堆積工程やエッチング工程などの真空中でのドライ
プロセスのために分子ポンプが広く使われるが、分子ポ
ンプに吸引されるプロセスガスあるいは反応生成物は、
分子ポンプ内部、特にその下流側において生成あるいは
凝着・堆積を起こし易く、これらが分子ポンプ部の部材
に強固に付着してロータをロックさせたりする原因とな
る。
In the field of thin film industry such as semiconductor manufacturing,
Molecular pumps are widely used for dry processes in vacuum such as thin film deposition process and etching process, but the process gas or reaction product sucked by the molecular pump is
Generation or adhesion / deposition is likely to occur inside the molecular pump, especially on the downstream side thereof, and these adhere firmly to the members of the molecular pump unit and cause the rotor to lock.

【0007】このため従来は、分子ポンプ内部でこれら
の生成物が堆積しないように、分子ポンプにヒータを付
設して加熱する等の対策が行なわれている。
Therefore, in order to prevent these products from accumulating inside the molecular pump, measures have conventionally been taken such as heating by attaching a heater to the molecular pump.

【0008】又、これ等分子ポンプの構成部品の素材と
して、各所にアルミニウム合金及びステンレス鋼が使用
されている。
Aluminum alloys and stainless steels are used in various places as materials for the components of these molecular pumps.

【0009】特にロータは、その軽量化と加工性および
比強度の優位性の見地から、アルミニウム合金製とする
ことが多い。
In particular, the rotor is often made of an aluminum alloy from the viewpoint of its lightness, workability and superiority in specific strength.

【0010】しかし、プロセスガスが腐蝕性を有する場
合には、アルミニウム合金は腐蝕され易く、寿命が短く
なる。
However, when the process gas is corrosive, the aluminum alloy is easily corroded and the life thereof is shortened.

【0011】このため、アルミニウム合金の表面にアル
マイト処理やニッケルめっき又はニッケル・りん膜によ
る表面処理を施工したり、或いはアルミニウム合金の表
面をアルマイト処理した後、該表面に生じた多孔質の穴
に四ふっ化エチレン樹脂を埋め込んだテフロンコーティ
ングによる表面処理を施工して、腐蝕性を有するプロセ
スガスに対する耐久性の向上を図った例がある。
For this reason, the surface of the aluminum alloy is subjected to alumite treatment, surface treatment with nickel plating or nickel-phosphorus film, or after the surface of the aluminum alloy is subjected to alumite treatment, the porous holes formed on the surface are formed. There is an example in which the surface treatment by Teflon coating in which a tetrafluoroethylene resin is embedded is applied to improve the durability against a corrosive process gas.

【0012】[0012]

【発明が解決しようとする課題】プロセスガスの凝着・
堆積を避けるために分子ポンプをヒータ等で加熱をする
場合には、該ヒータの他に温度検出器や温度制御装置が
必要となり、装置がコストアップとなる問題があった。
[Problems to be solved by the invention] Adhesion of process gas
When the molecular pump is heated by a heater or the like in order to avoid deposition, a temperature detector and a temperature control device are required in addition to the heater, which causes a problem of increasing the cost of the device.

【0013】更に、この加熱により磁気軸受部が作動不
良を起こしたり、絶縁材やロータの材料の耐久性が劣化
し短寿命となったり、又はタッチダウン軸受の耐久性が
劣化したりする問題があった。
Further, due to this heating, there is a problem that the magnetic bearing part may malfunction, the durability of the insulating material and the material of the rotor may be deteriorated to shorten the service life, or the durability of the touchdown bearing may be deteriorated. there were.

【0014】又、前記テフロンコーティングを施した例
も、表面が多孔質である事から、そこからの放出ガスが
多く、分子ポンプの表面処理法としては適していなかっ
た。
Also, in the case where the above-mentioned Teflon coating is applied, since the surface is porous, a large amount of gas is released from it, which is not suitable as a surface treatment method for a molecular pump.

【0015】本発明はこれらの問題点を解消し、加熱と
いう手段を用いずにプロセスガスがロータ周辺で凝着・
堆積するのを防止すると共に、腐蝕性プロセスガスにも
充分耐えられる分子ポンプの表面処理方法を提供するこ
とを目的とする。
The present invention solves these problems, and the process gas does not adhere to the periphery of the rotor without heating.
It is an object of the present invention to provide a surface treatment method for a molecular pump which can prevent deposition and can sufficiently withstand a corrosive process gas.

【0016】[0016]

【課題を解決するための手段】本発明は上記の目標を達
成するべく、分子ポンプにおけるプロセスガスとの接触
面に、四ふっ化エチレン樹脂を微粉状に共析させたニッ
ケル・すず合金膜からなる膜を形成したことを特徴とす
る。
In order to achieve the above-mentioned object, the present invention uses a nickel-tin alloy film obtained by co-depositing tetrafluoroethylene resin in the form of fine powder on the contact surface with a process gas in a molecular pump. Is formed.

【0017】[0017]

【発明の実施の形態】本発明の実施の形態を図1乃至図
7により説明する。
BEST MODE FOR CARRYING OUT THE INVENTION An embodiment of the present invention will be described with reference to FIGS.

【0018】図1は複合分子ポンプの構造を示し、1は
ロータ、7はターボ分子ポンプ部の静翼、8はディスタ
ンスピース、9はねじ溝分子ポンプ部のステータ、10
は上部ハウジング、11は下部ハウジング、12は吸気
口で13は排気口を示す。これらの部材にはアルミニウ
ム合金系や鉄系及びステンレス鋼系の材料が使用されて
いる。
FIG. 1 shows the structure of a composite molecular pump, 1 is a rotor, 7 is a vane of a turbo molecular pump section, 8 is a distance piece, 9 is a stator of a thread groove molecular pump section, 10
Is an upper housing, 11 is a lower housing, 12 is an intake port, and 13 is an exhaust port. Aluminum alloy-based, iron-based, and stainless steel-based materials are used for these members.

【0019】プロセスガスは吸気口12より吸入され排
気口13より排出されるので、上記の吸気口12の内
面、ロータ1、静翼7、ディスタンスピース8、ステー
タ9及び下部ハウジング11の各部材はプロセスガスと
の接ガス面を持っており、これらの接ガス表面部に対し
て本発明による表面処理方法を施工した。
Since the process gas is taken in through the intake port 12 and exhausted through the exhaust port 13, the inner surface of the intake port 12, the rotor 1, the vanes 7, the distance piece 8, the stator 9 and the lower housing 11 are It has a gas contact surface with the process gas, and the surface treatment method according to the present invention was applied to these gas contact surface portions.

【0020】図2に本発明の表面処理を行なった分子ポ
ンプのロータ1の一部截断面図を示す。
FIG. 2 shows a partial cross-sectional view of the rotor 1 of the molecular pump which has been subjected to the surface treatment of the present invention.

【0021】ロータ1はアルミニウム合金製で、そのプ
ロセスガスと接触する外周面には亜鉛皮膜2、ニッケル
・りん膜4、及び四ふっ化エチレン樹脂微粉(以下PT
FE微粉と略称する)6を共析させたニッケル・すず合
金膜5からなる表面処理が施工されている。
The rotor 1 is made of an aluminum alloy and has a zinc film 2, a nickel-phosphorus film 4, and a tetrafluoroethylene resin fine powder (hereinafter referred to as PT) on its outer peripheral surface which comes into contact with the process gas.
A surface treatment of a nickel-tin alloy film 5 in which a FE fine powder) 6 is co-deposited is applied.

【0022】以下、この表面処理方法について説明す
る。
The surface treatment method will be described below.

【0023】ロータ1の如くアルミニウム合金部材の場
合には、表面を脱脂、活性化のあと、亜鉛置換法により
表面を亜鉛皮膜2に改質する。
In the case of an aluminum alloy member such as the rotor 1, after degreasing and activating the surface, the surface is modified into a zinc film 2 by a zinc substitution method.

【0024】次にニッケル・りん膜4は無電解めっき法
により形成する。該ニッケル・りん膜4は耐蝕性に優
れ、その硬度もマイクロヴィッカース硬度(以下Hmv
略称する)が600乃至700と硬く、耐摩耗性にも優
れている。
Next, the nickel / phosphorus film 4 is formed by electroless plating. The nickel / phosphorus film 4 is excellent in corrosion resistance, has a micro Vickers hardness (hereinafter abbreviated as H mv ) of 600 to 700, and has excellent wear resistance.

【0025】尚、このニッケル・りん膜4の組成は、り
んの含有割合を1乃至13%の範囲とし、特に8乃至1
0%の範囲が好ましい。
The composition of the nickel-phosphorus film 4 is such that the phosphorus content is in the range of 1 to 13%, and particularly 8 to 1
A range of 0% is preferred.

【0026】このニッケル・りん膜4の厚さは1乃至2
0μmの範囲とし、特に10乃至20μmの範囲が好ま
しい。これは、該ニッケル・りん膜4の膜厚が薄いと、
表面処理層の表面硬度をHmv500以上に維持する助け
にはならないからである。
The nickel-phosphorus film 4 has a thickness of 1 to 2
The range is 0 μm, and the range of 10 to 20 μm is particularly preferable. This is because if the nickel / phosphorus film 4 is thin,
This is because it does not help to maintain the surface hardness of the surface treatment layer at H mv 500 or higher.

【0027】次に最上面には、PTFE微粉6を共析さ
せたニッケル・すず合金膜5を電気めっき法により形成
して複合膜に形成している。
Next, on the uppermost surface, a nickel-tin alloy film 5 in which PTFE fine powder 6 is co-deposited is formed by electroplating to form a composite film.

【0028】該PTFE微粉6は粒径分布が3乃至8μ
mの範囲で、粒径の揃ったものが好ましい。これは、該
PTFE微粉6の粒径が0.3乃至0.8μmと更に細
かい場合に、PTFEを共析したニッケル・すず合金の
膜5の離型性能が低下する欠点があるからである。
The PTFE fine powder 6 has a particle size distribution of 3 to 8 μm.
Those having a uniform particle size in the range of m are preferable. This is because, when the particle size of the PTFE fine powder 6 is as fine as 0.3 to 0.8 μm, the mold release performance of the nickel-tin alloy film 5 co-depositing PTFE is deteriorated.

【0029】該ニッケル・すず合金膜5の厚さは1乃至
50μmとするのがよく、特に5乃至20μmの範囲が
好ましい。
The thickness of the nickel-tin alloy film 5 is preferably 1 to 50 μm, and particularly preferably 5 to 20 μm.

【0030】又、ニッケル・すず合金膜5は、ニッケル
とすずの組成比を5:95乃至95:5の範囲とし、特
に20:80乃至60:40の範囲が好ましい。
The composition ratio of nickel and tin of the nickel-tin alloy film 5 is in the range of 5:95 to 95: 5, and preferably in the range of 20:80 to 60:40.

【0031】一般にニッケル・すず合金膜5は、成膜後
に100乃至500℃の温度で1乃至2時間の熱処理を
施すことにより、該膜の硬度が上がると共に離型性能も
向上することが知られている。
It is generally known that the nickel-tin alloy film 5 is subjected to a heat treatment at a temperature of 100 to 500 ° C. for 1 to 2 hours after the film formation, so that the hardness of the film is increased and the releasing performance is also improved. ing.

【0032】しかし、共析したPTFE微粉6の融点が
300乃至330℃にあり、この融点を超えた温度での
熱処理は、逆に離型性能を低下させる。
However, the melting point of the eutectoid PTFE fine powder 6 is 300 to 330 ° C., and the heat treatment at a temperature exceeding this melting point, on the contrary, lowers the releasing performance.

【0033】更に、アルミニウム合金の時効処理温度が
150乃至180℃程度なので、アルミニウム合金製の
分子ポンプ部材に本発明を実施する場合には、成膜後1
00乃至150℃の温度で熱処理を行うのが好ましい。
Furthermore, since the aging treatment temperature of the aluminum alloy is about 150 to 180 ° C., when the present invention is applied to a molecular pump member made of aluminum alloy, it is possible to perform 1 after film formation.
The heat treatment is preferably performed at a temperature of 00 to 150 ° C.

【0034】鉄又はステンレス鋼製の分子ポンプ部材に
対しては、成膜後250乃至300℃の温度で熱処理を
行うのが好ましい。
The iron or stainless steel molecular pump member is preferably subjected to heat treatment at a temperature of 250 to 300 ° C. after the film formation.

【0035】尚、鉄又はステンレス鋼製の分子ポンプ部
材に対する表面処理では、前述の亜鉛皮膜2を必要とし
ない。
The surface treatment of the molecular pump member made of iron or stainless steel does not require the zinc coating 2 described above.

【0036】即ち、表面処理を施す鉄又はステンレス鋼
製部材の表面の酸化皮膜を塩酸等の酸洗浄等にて除去
し、その上に図4に示すようににニッケル膜3、ニッケ
ル・りん膜4、及びPTFE微粉6を共析させたニッケ
ル・すず合金膜5の三膜からなる皮膜層を積層形成させ
る。
That is, the oxide film on the surface of the iron or stainless steel member to be surface-treated is removed by acid cleaning with hydrochloric acid or the like, and the nickel film 3 and the nickel-phosphorus film are formed thereon as shown in FIG. 4, and a coating layer composed of three nickel-tin alloy films 5 co-deposited with the PTFE fine powder 6 is laminated.

【0037】このニッケル膜3はニッケルストライク法
により形成する。このニッケル膜3は以後の表面処理に
よって形成される皮膜の母材に対する密着性を維持する
ために必要である。該ニッケル膜3の厚さは0.1乃至
2.0μmの範囲とし、特に0.5乃至1.0μmの範
囲が好ましい。これは該ニッケル膜3が厚くなると不均
一な厚さの膜が形成され易く、この影響で次に積層する
膜に凹凸を生ずる恐れがあるためである。
This nickel film 3 is formed by the nickel strike method. The nickel film 3 is necessary for maintaining the adhesion of the film formed by the subsequent surface treatment to the base material. The nickel film 3 has a thickness of 0.1 to 2.0 μm, preferably 0.5 to 1.0 μm. This is because as the nickel film 3 becomes thicker, a film having a non-uniform thickness is likely to be formed, which may cause unevenness in the film to be laminated next.

【0038】このように凝着性のある吸引物質を含んだ
プロセスガスが分子ポンプのロータ周辺で凝着及び堆積
するのを防止するためには、ロータ1及びその隣接部材
を表面エネルギーの小さい材料で表面処理を施こすこと
が必要と考えて鋭意研究した結果、ニッケル・すず合金
膜5にPTFE微粉6を共析させた複合膜が反応生成物
に対する離型性及び耐蝕性の点できわめて有効であるこ
とを見出し、本発明を達成した。
In order to prevent the process gas containing the cohesive suction substance from adhering and depositing around the rotor of the molecular pump, the rotor 1 and its adjacent members are made of a material having a small surface energy. As a result of diligent research, it was found that the nickel-tin alloy film 5 and PTFE fine powder 6 were co-deposited, and the composite film was extremely effective in terms of releasability and corrosion resistance to reaction products. Therefore, the present invention has been achieved.

【0039】本発明の分子ポンプの表面処理方法によれ
ば、アルミニウム合金系及びステンレス鋼系等の各種材
料に対して強固な複合膜を形成することができると共
に、この複合膜により、前記生成物は部材表面に付着し
にくくなるだけでなく、付着してもその付着強度は著し
く低下する。
According to the method for treating the surface of a molecular pump of the present invention, a strong composite film can be formed for various materials such as aluminum alloy-based and stainless steel-based materials. Not only does not easily adhere to the surface of the member, but even if it adheres, the adhesive strength is significantly reduced.

【0040】該生成物は部材表面上において膜状に成長
するのではなく、粒状に成長していき、その先端が回転
しているロータ1に接触すると容易に部材表面から剥離
して落下し、ロータ部周辺に堆積することがない。
The product does not grow like a film on the surface of the member but grows in a granular form, and when its tip comes into contact with the rotating rotor 1, it easily separates from the surface of the member and falls. It does not accumulate around the rotor part.

【0041】次に本発明の表面処理方法によって形成し
た膜の評価を、以下の3点について行なった。
Next, the film formed by the surface treatment method of the present invention was evaluated for the following three points.

【0042】(1)従来の表面処理によるニッケル・り
ん膜と本発明の表面処理膜について、皮膜特性の比較試
験を行なった。
(1) A comparison test of film characteristics was conducted for the nickel-phosphorus film by the conventional surface treatment and the surface-treated film of the present invention.

【0043】皮膜特性比較試験結果の1例を、図4に示
す。
FIG. 4 shows an example of the results of the film characteristic comparison test.

【0044】同図4によれば、本発明の表面処理膜は、
耐蝕性についてはニッケル・りん膜に稍々劣るが、各種
の物質に対する付着特性が格段に低く、該膜上に付着し
たものが剥れ易いことを示している。
According to FIG. 4, the surface-treated film of the present invention is
The corrosion resistance is slightly inferior to that of the nickel-phosphorus film, but the adhesion property to various substances is remarkably low, which indicates that the material adhered to the film is easily peeled off.

【0045】又、本発明の表面処理膜は耐摩耗性もニッ
ケル・りん膜より稍々劣るが、表面張力試験の結果よ
り、ニッケル・りん膜よりも溌水性において優れている
ことが判る。
Further, although the surface-treated film of the present invention is slightly inferior in wear resistance to the nickel / phosphorus film, it can be seen from the results of the surface tension test that it is superior in water repellent property to the nickel / phosphorus film.

【0046】(2)真空蒸着装置で、タングステンを蒸
着した際の蒸着膜の付着性の比較試験を行なった。
(2) A vacuum vapor deposition apparatus was used to perform a comparative test of the adhesion of vapor deposited films when tungsten was vapor deposited.

【0047】比較を行なったサンプルは、アルミニウム
合金板、SUS304板、ニッケル・りん膜を被覆した
板、及び本発明の表面処理膜被覆板である。
The samples for comparison were an aluminum alloy plate, a SUS304 plate, a plate coated with a nickel / phosphorus film, and the surface-treated film-coated plate of the present invention.

【0048】尚、タングステン蒸着条件は次の通り。 蒸着装置 昭和真空株式会社SGC−16SA 電子ビーム 6v500mA 使用原料 3Nグレイン状のタングステン 蒸着開始時真空度 2.0×10-5Torr 蒸着時真空度 7.0×10-5Torr以下 蒸発原とサンプル間距離 700mm 蒸着時間 100min サンプル温度 約180℃The tungsten deposition conditions are as follows. Deposition equipment Showa Vacuum Co., Ltd. SGC-16SA Electron beam 6v 500mA Raw material 3N grain-shaped tungsten Deposition start vacuum degree 2.0 × 10 -5 Torr Deposition vacuum degree 7.0 × 10 -5 Torr or less Between evaporation source and sample Distance 700mm Deposition time 100min Sample temperature about 180 ℃

【0049】上記の条件にて各サンプル板に蒸着したタ
ングステンに対し、セロハンテープを用いて引き剥がし
試験を行なった。
A peeling test was performed on the tungsten vapor-deposited on each sample plate under the above conditions using a cellophane tape.

【0050】即ち、蒸着したタングステンの上にセロハ
ンテープを貼り、これを引き剥がす試験を数回行なった
処、本発明の表面処理被覆板からはタングステン蒸着膜
は簡単に剥離されたが、他のサンプルのタングステン蒸
着膜はセロハンテープでは剥がれず、強固に付着してい
ることが判った。
That is, a cellophane tape was attached on vapor-deposited tungsten, and a peeling test was conducted several times. As a result, the vapor-deposited tungsten film was easily peeled from the surface-treated coated plate of the present invention. It was found that the tungsten vapor deposition film of the sample did not come off with the cellophane tape, but adhered firmly.

【0051】これは本発明の表面処理膜が、タングステ
ン等の真空蒸発真空装置の真空ポンプ用に適した性質で
あることを示している。
This indicates that the surface-treated film of the present invention has properties suitable for a vacuum pump of a vacuum evaporation vacuum device such as tungsten.

【0053】(3)各種の材料と溌水性の比較試験を行
なった。
(3) Various materials and water repellent comparative tests were conducted.

【0054】比較を行なったサンプルは、アルミニウム
板、アルミニウム合金板、SUS304板、ニッケル・
りん膜被覆板、及び本発明の表面処理膜被覆板である。
The samples for comparison were aluminum plate, aluminum alloy plate, SUS304 plate, nickel.
They are a phosphorous film coated plate and a surface-treated film coated plate of the present invention.

【0055】これらのサンプルに対する純水、TEOS
(Tetraetoxysilane)及びTMOS(Tetrametoxysilan
e )による接触角計測試験結果の各1例を図5乃至図7
に示す。
Pure water, TEOS for these samples
(Tetraetoxysilane) and TMOS (Tetrametoxysilan)
Each example of the contact angle measurement test result by e) is shown in FIGS.
Shown in

【0056】これら接触角の計測結果から、いずれの液
体に対しても本発明の表面処理膜の場合に最も接触角が
大きく、従って本発明の表面処理膜が最も溌水性の高い
ことが判る。
From these contact angle measurement results, it can be seen that the surface treatment film of the present invention has the largest contact angle with respect to any liquid, and thus the surface treatment film of the present invention has the highest water repellency.

【0057】尚、本実施の形態では、ニッケル・すず合
金膜にPTFEを微粉状に共析させた複合膜としたが、
これは他のフッ素系樹脂でガラス転移点が260°以上
のものを微粉状に共析させたものでもよく、例えばポリ
テトラフルオロエチレン、ポリクロルトリフルオルエチ
レン、ポリふっ化ビニリデン、ヘキサフルオロプロピレ
ンとテトラフルオロエチレンの共重合体、及びクロロト
リフルオロエチレンとふっ化ビニリデンの共重合体が挙
げられ、その中でも四ふっ化エチレン樹脂(PTFE)
が好ましい。
In this embodiment, the nickel-tin alloy film is a composite film obtained by co-depositing PTFE in the form of fine powder.
This may be another fluororesin having a glass transition point of 260 ° or more co-deposited into a fine powder, for example, polytetrafluoroethylene, polychlorotrifluoroethylene, polyvinylidene fluoride, hexafluoropropylene and the like. Examples thereof include copolymers of tetrafluoroethylene and copolymers of chlorotrifluoroethylene and vinylidene fluoride, and among them, tetrafluoroethylene resin (PTFE)
Is preferred.

【0058】[0058]

【発明の効果】このように本発明によれば、分子ポンプ
をヒータ等で加熱することなくプロセスガスがロータ周
辺で凝着・堆積するのを防止できると共に、腐蝕性を有
するプロセスガスにも耐えられる分子ポンプの表面処理
方法を提供することができる。
As described above, according to the present invention, it is possible to prevent the process gas from adhering and depositing around the rotor without heating the molecular pump with a heater or the like, and to withstand the process gas having corrosive properties. It is possible to provide a method for treating the surface of a molecular pump.

【図面の簡単な説明】[Brief description of drawings]

【図1】複合分子ポンプの構造を示す縦断面図である。FIG. 1 is a vertical cross-sectional view showing the structure of a composite molecular pump.

【図2】同上の一部截断面図である。FIG. 2 is a partial cross-sectional view of the above.

【図3】同上の別部材の一部截断面図である。FIG. 3 is a partial cross-sectional view of another member of the above.

【図4】皮膜特性比較試験結果の一例である。FIG. 4 is an example of the results of a film characteristic comparison test.

【図5】接触角計測試験結果の一例である。FIG. 5 is an example of a contact angle measurement test result.

【図6】同上の他の一例である。FIG. 6 is another example of the same.

【図7】同上の他の一例である。FIG. 7 is another example of the same.

【図8】複合分子ポンプの縦断面図の一例である。FIG. 8 is an example of a vertical cross-sectional view of a composite molecular pump.

【符号の説明】[Explanation of symbols]

2 亜鉛皮膜 3 ニッケル膜 4 ニッケル・りん膜 5 ニッケル・すず合金膜 6 PTFE微粉 2 Zinc film 3 Nickel film 4 Nickel / phosphorus film 5 Nickel / tin alloy film 6 PTFE fine powder

───────────────────────────────────────────────────── フロントページの続き (72)発明者 児玉 孝徳 神奈川県川崎市川崎区扇町5−1 昭和電 工株式会社内 (72)発明者 田口 裕康 神奈川県川崎市川崎区扇町5−1 昭和電 工株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Takanori Kodama 5-1 Ogimachi, Kawasaki-ku, Kawasaki-shi, Kanagawa Showa Denko KK (72) Hiroyasu Taguchi 5-1 Ogimachi, Kawasaki-ku, Kawasaki, Kanagawa Showa Denko Within the corporation

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 分子ポンプにおけるプロセスガスとの接
触面に、四ふっ化エチレン樹脂を微粉状に共析させたニ
ッケル・すず合金膜からなる膜を形成したことを特徴と
する分子ポンプの表面処理方法。
1. A surface treatment of a molecular pump, wherein a film made of a nickel-tin alloy film co-deposited with an ethylene tetrafluoride resin in a fine powder form is formed on a contact surface of the molecular pump with a process gas. Method.
【請求項2】 前記接触面を有する分子ポンプ部材がス
テンレス鋼又は鉄系材料からなるときには、一層目には
ニッケル膜を、二層目にはニッケル・りん膜を、三層目
には四ふっ化エチレン樹脂を微粉状に共析させたニッケ
ル・すず合金膜からなる複合膜をそれぞれ形成させ、少
なくともこれら三層からなる皮膜層を積層形成したこと
を特徴とする請求項1に記載の分子ポンプの表面処理方
法。
2. When the molecular pump member having the contact surface is made of stainless steel or an iron-based material, a nickel film is formed on the first layer, a nickel-phosphorus film is formed on the second layer, and a fourth layer is formed on the third layer. 2. The molecular pump according to claim 1, wherein a composite film made of a nickel-tin alloy film obtained by co-depositing a chlorinated ethylene resin in a fine powder form is formed, and a film layer made of at least these three layers is laminated. Surface treatment method.
【請求項3】 前記接触面を有する分子ポンプ部材がア
ルミニウム合金からなるときには、該分子ポンプ部材の
アルミニウム合金表面部を亜鉛皮膜に改質した後に、該
亜鉛皮膜上に前記二層目のニッケル・リン膜及び三層目
の四ふっ化エチレン樹脂を微粉状に共析させたニッケル
・すず合金膜からなる皮膜層を積層形成したことを特徴
とする請求項2に記載の分子ポンプの表面処理方法。
3. When the molecular pump member having the contact surface is made of an aluminum alloy, the aluminum alloy surface portion of the molecular pump member is reformed into a zinc film, and then the second layer of nickel. The surface treatment method for a molecular pump according to claim 2, wherein a film layer made of a nickel-tin alloy film obtained by co-depositing a phosphorus film and a third layer of tetrafluoroethylene resin in the form of fine powder is laminated. .
【請求項4】 前記一層目のニッケル膜はニッケルスト
ライクにより0.1乃至2μmの厚さに形成したことを
特徴とする請求項2に記載の分子ポンプの表面処理方
法。
4. The surface treatment method for a molecular pump according to claim 2, wherein the first-layer nickel film is formed by nickel strike to a thickness of 0.1 to 2 μm.
【請求項5】 前記二層目のニッケル・りん膜は無電解
めっき法により1乃至20μmの厚さに形成したことを
特徴とする請求項2に記載の分子ポンプの表面処理方
法。
5. The surface treatment method for a molecular pump according to claim 2, wherein the second-layer nickel-phosphorus film is formed to a thickness of 1 to 20 μm by an electroless plating method.
【請求項6】 前記三層目の四ふっ化エチレン樹脂を共
析させたニッケル・すず合金膜は、電気めっき法により
1乃至50μmの厚さに形成すると共に、該四ふっ化エ
チレン樹脂の微粉は3乃至8μmの粒径に形成したこと
を特徴とする請求項1又は2に記載の分子ポンプの表面
処理方法。
6. The third layer of the nickel-tin alloy film co-deposited with the tetrafluoroethylene resin is formed by electroplating to a thickness of 1 to 50 μm, and fine powder of the tetrafluoroethylene resin is used. Is formed to have a particle size of 3 to 8 μm. 3. The surface treatment method for a molecular pump according to claim 1, wherein
JP14374796A 1996-05-14 1996-05-14 Surface treatment method for molecular pump Pending JPH09303289A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14374796A JPH09303289A (en) 1996-05-14 1996-05-14 Surface treatment method for molecular pump

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14374796A JPH09303289A (en) 1996-05-14 1996-05-14 Surface treatment method for molecular pump

Publications (1)

Publication Number Publication Date
JPH09303289A true JPH09303289A (en) 1997-11-25

Family

ID=15346082

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14374796A Pending JPH09303289A (en) 1996-05-14 1996-05-14 Surface treatment method for molecular pump

Country Status (1)

Country Link
JP (1) JPH09303289A (en)

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US7572096B2 (en) 2004-05-10 2009-08-11 Boc Edwards Japan Limited Vacuum pump
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JP2011007049A (en) * 2009-06-23 2011-01-13 Osaka Vacuum Ltd Molecular pump
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US9926792B2 (en) 2013-08-30 2018-03-27 Shimadzu Corporation Turbo-molecular pump
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