JPH09247945A - Discharge plasma generating ac high voltage power supply apparatus - Google Patents
Discharge plasma generating ac high voltage power supply apparatusInfo
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- JPH09247945A JPH09247945A JP8054315A JP5431596A JPH09247945A JP H09247945 A JPH09247945 A JP H09247945A JP 8054315 A JP8054315 A JP 8054315A JP 5431596 A JP5431596 A JP 5431596A JP H09247945 A JPH09247945 A JP H09247945A
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- voltage
- reactor
- power supply
- discharge plasma
- supply device
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は放電プラズマ発生用
交流高圧電源装置に係り、特に放電によりプラズマを発
生し、このプラズマで有害ガスを分解する処理装置の交
流高圧電源装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an alternating-current high-voltage power supply device for generating discharge plasma, and more particularly to an alternating-current high-voltage power supply device for a processing apparatus that generates plasma by discharge and decomposes harmful gas with this plasma.
【０００２】[0002]
【従来の技術】最近、電子ビーム照射や放電により発生
させたプラズマによる化学反応を用いて、ガス状の汚染
物質の浄化方法が検討されている。電子ビームをガス状
の汚染物質の浄化に用いる方法はすでに実用化されてい
るが、プラズマ発生設備が高価であり、より低コストで
実現可能性がある放電プラズマによるガス浄化法が有望
視されている。これはリアクタの内部に放電によりプラ
ズマを生成し、ここでガス状汚染物質を通して分解した
り、更に分解してできるラジカルに外部から添加物を注
入してエアロゾル状の反応生成物に転換し、その後、電
気集塵装置などのセパレータで除去する方法である。2. Description of the Related Art Recently, a method for purifying gaseous pollutants has been investigated by using a chemical reaction by plasma generated by electron beam irradiation or electric discharge. Although the method of using an electron beam to purify gaseous pollutants has already been put to practical use, the plasma generation equipment is expensive, and a gas purification method using discharge plasma, which is feasible at a lower cost, is regarded as promising. There is. This produces plasma by discharge inside the reactor, where it is decomposed through gaseous pollutants, and radicals generated by further decomposition are injected with additives from the outside to be converted into aerosol reaction products, This is a method of removing with a separator such as an electrostatic precipitator.
【０００３】放電プラズマの発生法にはリアクタに設け
た電極に交流高電圧を印加する方法がある。図４はリア
クタに設けた電極に交流高電圧を印加する電源装置の従
来例を示した構成図である。同図に示すように、交流高
電圧の発生方法は、商用の交流電源１０を整流器４１と
平滑コンデンサ４２によって整流・平滑して直流電圧を
作り、次に高周波インバータ４３で昇圧して目的の周波
数の交流電圧に変換し（数ｋＨｚから数十ｋＨｚ）、更
に、変圧器４４で昇圧して交流高電圧を作りリアクタ３
０に印加している。As a method of generating discharge plasma, there is a method of applying an AC high voltage to electrodes provided in a reactor. FIG. 4 is a configuration diagram showing a conventional example of a power supply device for applying an AC high voltage to electrodes provided in a reactor. As shown in the figure, in the method of generating an AC high voltage, a commercial AC power supply 10 is rectified and smoothed by a rectifier 41 and a smoothing capacitor 42 to generate a DC voltage, and then a high frequency inverter 43 boosts the voltage to a target frequency. AC voltage (several kHz to several tens of kHz) and further boosted by the transformer 44 to generate an AC high voltage, and the reactor 3
0 is applied.
【０００４】[0004]
【発明が解決しようとする課題】しかしながら、リアク
タに交流高電圧を印加する方法は次のような欠点をもっ
ている。即ち、電圧を印加するリアクタの電極間には静
電容量が存在するため、交流電圧を印加すると放電に関
与しない無効電力が発生する。この無効電力は用いる周
波数に比例し、放電電力の数十倍から百倍以上になる。However, the method of applying a high AC voltage to the reactor has the following drawbacks. That is, since electrostatic capacitance exists between the electrodes of the reactor to which a voltage is applied, when AC voltage is applied, reactive power that does not participate in discharge is generated. This reactive power is proportional to the frequency used and is several tens to 100 times or more the discharge power.
【０００５】また、周波数が高いことから、フェライト
等の高い周波数でも損失の少ない高価な材料をコアに使
う必要があった。しかし、この材料は飽和磁束密度が低
く、高電圧で用いるには、磁気飽和現象を避けるため、
コアを大きくする必要があり、装置の大型化とコスト高
になる欠点があった。本発明はこのような事情に鑑みて
なされたもので、リアクタに周波数の高い交流電圧を印
加することにより発生する大きな無効電力を削減し、電
源装置の規模縮小を図る放電プラズマ発生用交流高圧電
源装置を提供することを目的とする。Further, since the frequency is high, it is necessary to use an expensive material such as ferrite, which has a small loss even at a high frequency, for the core. However, this material has a low saturation magnetic flux density, and in order to avoid the magnetic saturation phenomenon when used at high voltage,
Since the core needs to be large, there is a drawback that the device becomes large and the cost becomes high. The present invention has been made in view of the above circumstances, and a large reactive power generated by applying a high-frequency AC voltage to a reactor is reduced to reduce the scale of a power supply device. The purpose is to provide a device.
【０００６】[0006]
【課題を解決するための手段】本発明は前記目的を達成
するために、リアクタの電極間に交流電圧を印加して、
前記リアクタ内に放電プラズマを発生させる放電プラズ
マ発生用交流高電圧電源装置において、前記リアクタに
誘導性のリアクタンス成分を有する回路素子を接続し、
前記リアクタの容量性のリアクタンス成分を前記回路素
子の誘導性のリアクタンス成分によって相殺するように
したことを特徴としている。In order to achieve the above-mentioned object, the present invention applies an AC voltage between electrodes of a reactor,
In a discharge plasma generating AC high voltage power supply device for generating discharge plasma in the reactor, a circuit element having an inductive reactance component is connected to the reactor,
It is characterized in that the capacitive reactance component of the reactor is canceled by the inductive reactance component of the circuit element.
【０００７】本発明によれば、リアクタの容量性のリア
クタンス成分をリアクタに接続した回路素子の誘導性の
リアクタンスで相殺し、電源装置から無効電力が供給さ
れないようにする。これにより、電源装置の規模縮小が
図れる。According to the present invention, the capacitive reactance component of the reactor is canceled by the inductive reactance of the circuit element connected to the reactor so that reactive power is not supplied from the power supply device. As a result, the scale of the power supply device can be reduced.
【０００８】[0008]
【発明の実施の形態】以下添付図面に従って本発明に係
る放電プラズマ発生用交流高圧電源装置の好ましい実施
の形態を詳説する。図１は本発明に係る放電プラズマ発
生用交流高圧電源装置の第１の実施の形態を示した構成
図である。BEST MODE FOR CARRYING OUT THE INVENTION Preferred embodiments of an AC high voltage power supply device for generating discharge plasma according to the present invention will be described in detail below with reference to the accompanying drawings. FIG. 1 is a configuration diagram showing a first embodiment of an AC high voltage power supply device for generating discharge plasma according to the present invention.
【０００９】同図に示すように放電プラズマ発生用交流
高圧電源装置は商用の交流電源１０から整流器１１と平
滑用コンデンサ１２により直流電圧を生成し、高周波イ
ンバータ１３により所望の周波数の交流電圧に変換する
回路と、負荷のリアクタ３０とコイルからなるインダク
タンス２０が直列に接続された回路とからなる。リアク
タ３０とインダクタンス２０の共振周波数とリアクタ３
０の電極に印加する電圧は、実験により得られた有害ガ
スの分解効率のデータに基づいて最適値に合うように設
定するが、この共振周波数はインダクタンス２０のコイ
ルの巻数や大きさを適当に選ぶことにより設定する。又
は、同図の破線で示したようにリアクタ３０に並列にコ
ンデンサ３１を接続して設定することもできる。As shown in the figure, the AC high-voltage power supply device for generating discharge plasma generates a DC voltage from a commercial AC power supply 10 by a rectifier 11 and a smoothing capacitor 12, and converts it into an AC voltage of a desired frequency by a high frequency inverter 13. Circuit and a circuit in which a load reactor 30 and an inductance 20 including a coil are connected in series. Resonance frequency of reactor 30 and inductance 20 and reactor 3
The voltage applied to the electrode of 0 is set so as to match the optimum value based on the data of the decomposition efficiency of the harmful gas obtained by the experiment, and the resonance frequency is set appropriately by the number of turns and the size of the coil of the inductance 20. Set by selecting. Alternatively, as shown by the broken line in the figure, a capacitor 31 can be connected in parallel to the reactor 30 for setting.
【００１０】そして、高周波インバータ１３の出力の周
波数は、リアクタ３０とインダクタンス２０の共振周波
数に合致させる。リアクタ３０の電極に印加する電圧
は、平滑用コンデンサ１２の充電電圧を調整して所望の
値に設定する。次に、上記放電プラズマ発生用交流高圧
電源装置の作用について説明する。The frequency of the output of the high frequency inverter 13 is matched with the resonance frequency of the reactor 30 and the inductance 20. The voltage applied to the electrodes of the reactor 30 is set to a desired value by adjusting the charging voltage of the smoothing capacitor 12. Next, the operation of the AC high voltage power supply device for generating discharge plasma will be described.
【００１１】前述したようにリアクタ３０に交流電圧を
印加した場合、放電で流れる有効電力の他に、静電容量
を通して流れる電流によって生じる大きな無効電力が発
生する。このことは、リアクタ３０が、放電電力（有効
電力）を生じる抵抗Ｒと無効電力を生じるコンデンサＣ
の並列回路で等価的に表され、コンデンサのリアクタン
スＸC ＝１／（２πｆＣ）と抵抗Ｒの比Ｑ＝Ｒ／Ｘ
C （Ｑ値）が数十から百以上の大きな値となることに起
因する。When an AC voltage is applied to the reactor 30 as described above, in addition to active power flowing by discharge, large reactive power generated by current flowing through the electrostatic capacitance is generated. This means that the reactor 30 has a resistor R that produces discharge power (active power) and a capacitor C that produces reactive power.
Is equivalently represented by a parallel circuit of, and the ratio of the reactance X C of the capacitor X C = 1 / (2πfC) to the resistance R Q = R / X
This is due to the large value of C (Q value) of several tens to 100 or more.
【００１２】従って、このリアクタ３０に直列にインダ
クタンス２０を接続して直列共振回路を構成し、この直
列共振回路を共振させるようにしたことにより、直列共
振回路のリアクタンス成分が相殺され、純抵抗Ｒ／（Ｑ
2 ＋１）が高周波インバータ１３に接続されたのと等価
になり、無効電力が零となる。また、リアクタ３０に直
列にインダクタンス２０を接続して直列共振回路を構成
しているため、この直列共振回路を励振する交流電圧に
対してリアクタ３０にはＱ倍の高電圧が発生する。Therefore, by connecting the inductor 20 in series to the reactor 30 to form a series resonance circuit and causing the series resonance circuit to resonate, the reactance component of the series resonance circuit is canceled and the pure resistance R / (Q
2 + 1) is equivalent to being connected to the high frequency inverter 13, and the reactive power becomes zero. Further, since the inductor 20 is connected in series to the reactor 30 to form a series resonance circuit, a high voltage Q times is generated in the reactor 30 with respect to the AC voltage that excites the series resonance circuit.
【００１３】例えば、高周波インバータ１３の出力電圧
を２００Ｖとすると、リアクタ３０には放電に十分な約
１０ｋＶの電圧が印加されることになる。図２は、上記
放電プラズマ発生用交流高圧電源装置の第２の実施の形
態を示した構成図である。尚、図１の部材と同一部材に
は同一番号を記す。同図に示すように上記第１の実施の
形態において、高周波インバータ１３の後に昇圧用の変
圧器３４を介してリアクタ３０とインダクタンス２０と
の直列共振回路を駆動する。直列共振による電圧の倍率
は上述したように数十から百程度であり、更に高電圧が
必要な場合に同電源装置を使用する。For example, if the output voltage of the high frequency inverter 13 is 200 V, a voltage of about 10 kV, which is sufficient for discharging, is applied to the reactor 30. FIG. 2 is a configuration diagram showing a second embodiment of the above-mentioned AC high voltage power supply device for generating discharge plasma. The same members as those of FIG. 1 are designated by the same reference numerals. As shown in the figure, in the first embodiment, the series resonance circuit of the reactor 30 and the inductance 20 is driven after the high frequency inverter 13 via the boosting transformer 34. The voltage multiplication factor due to series resonance is about several tens to one hundred as described above, and the same power supply device is used when a higher voltage is required.
【００１４】この第２の実施の形態によれば、直列共振
だけでは十分昇圧できない分を変圧器３４で補助するも
ので、変圧器の昇圧比は小さく出力は低電圧である。こ
の場合も無効電力は無いので小型の変圧器で実施するこ
とができ、従来のものより小コスト化できる。図３は、
上記放電プラズマ発生用交流高圧電源装置の第３の実施
の形態を示した構成図である。尚、図１の部材と同一部
材には同一番号を記す。According to the second embodiment, the transformer 34 assists the voltage which cannot be sufficiently boosted only by the series resonance, and the boosting ratio of the transformer is small and the output is low voltage. In this case also, since there is no reactive power, it can be implemented with a small transformer, and the cost can be reduced as compared with the conventional one. FIG.
It is the block diagram which showed the 3rd Embodiment of the said alternating current high voltage power supply device for discharge plasma generation. The same members as those of FIG. 1 are designated by the same reference numerals.
【００１５】同図に示す第３の実施の形態では、交流電
圧計測器１４によって直列共振回路に印加する交流電圧
（の位相）を検出するとともに、交流電流計測器１５に
よって直列共振回路に流れる交流電流（の位相）を検出
し、計測器１４、１５によって検出された両者の位相差
を位相差検出器１６によって検出する。そして、この位
相差をインバータ出力周波数制御回路１７に入力し、交
流電流の位相が進んでいればインバータの出力周波数を
上昇させ、逆に、交流電流の位相が遅れていればインバ
ータの出力周波数を下降させるようにしている。In the third embodiment shown in the figure, the AC voltage measuring device 14 detects the AC voltage (phase thereof) applied to the series resonance circuit, and the AC current measuring device 15 detects the AC voltage flowing in the series resonance circuit. The current (phase thereof) is detected, and the phase difference between the two detected by the measuring instruments 14 and 15 is detected by the phase difference detector 16. Then, this phase difference is input to the inverter output frequency control circuit 17 to increase the output frequency of the inverter when the phase of the alternating current is advanced, and conversely, when the phase of the alternating current is delayed, the output frequency of the inverter is changed. I am trying to lower it.
【００１６】この第３の実施の形態によれば、何らかの
原因により直列共振回路の共振周波数が変化した場合で
も自動的に高周波インバータ１３の出力周波数を調整
し、常に共振状態を保つことができるようになる。例え
ば、リアクタ３０内のガス濃度変化、ガスの種類の変
化、又は温度によるリアクタ３０の寸法の変化等で共振
周波数が変化しても、これによって共振点で動作するこ
とが補償される。According to the third embodiment, even if the resonance frequency of the series resonance circuit changes for some reason, the output frequency of the high frequency inverter 13 is automatically adjusted so that the resonance state can always be maintained. become. For example, even if the resonance frequency changes due to a change in the gas concentration in the reactor 30, a change in the type of gas, or a change in the dimensions of the reactor 30 due to temperature, the operation at the resonance point is compensated for.
【００１７】尚、上記第３の実施の形態では直列共振回
路の共振点が外れた場合、電圧と電流に位相差が生じる
ことを検出して、位相差が零になるように制御するよう
にしていたが、共振点が外れた場合、無効電力も発生す
るため、これを検出して零になるように高周波インバー
タ１３の出力周波数を調整するようにしてもよい。ま
た、共振状態では、直列共振回路は純抵抗に見えるた
め、力率は１であるが、共振点を外れると力率は１より
小さくなるため、この力率を検出して高周波インバータ
１３の出力周波数を調整し、力率が１になるように制御
してもよい。In the third embodiment, when the resonance point of the series resonance circuit is deviated, it is detected that a phase difference occurs between the voltage and the current, and the phase difference is controlled to be zero. However, when the resonance point is deviated, reactive power is also generated. Therefore, it is possible to detect this and adjust the output frequency of the high frequency inverter 13 so that it becomes zero. Further, in the resonance state, the series resonance circuit looks like a pure resistance, so the power factor is 1, but when it goes out of the resonance point, the power factor becomes smaller than 1. Therefore, the power factor is detected and the output of the high frequency inverter 13 is detected. The frequency may be adjusted so that the power factor becomes 1.
【００１８】以上説明した実施の形態では、リアクタ３
０に直列にインダクタンス２０を接続していたが、リア
クタ３０に並列にインダクタンス２０を接続しても無効
電力を無くすことが可能である。In the embodiment described above, the reactor 3
Although the inductance 20 is connected in series to 0, the reactive power can be eliminated by connecting the inductance 20 in parallel to the reactor 30.
【００１９】[0019]
【発明の効果】以上説明したように本発明に係る放電プ
ラズマ発生用交流高圧電源装置によれば、リアクタの容
量性のリアクタンス成分をリアクタに接続した回路素子
の誘導性のリアクタンス成分で相殺するようにしたた
め、電源装置からリアクタに無効電力が供給されなくな
り、大形で高価な変圧器を用いることなく、低コストの
部品で交流高電圧を発生させることができる。これによ
り、電源装置の規模縮小が図れる。As described above, according to the AC high-voltage power supply device for generating discharge plasma according to the present invention, the capacitive reactance component of the reactor is canceled by the inductive reactance component of the circuit element connected to the reactor. Therefore, the reactive power is not supplied from the power supply device to the reactor, and the AC high voltage can be generated with low-cost components without using a large and expensive transformer. As a result, the scale of the power supply device can be reduced.
【００２０】また、請求項３、４又は５の発明によれ
ば、リアクタの静電容量に変化があった場合にも、励振
周波数を共振点に維持することができる。According to the third, fourth or fifth aspect of the invention, the excitation frequency can be maintained at the resonance point even when the capacitance of the reactor changes.
【図１】図１は、本発明に係る放電プラズマ発生用交流
高圧電源装置の第１の実施の形態を示した構成図であ
る。FIG. 1 is a configuration diagram showing a first embodiment of an AC high-voltage power supply device for generating discharge plasma according to the present invention.
【図２】図２は、放電プラズマ発生用交流高圧電源装置
の第１の実施の形態の変形例である第２の実施の形態を
示した構成図である。FIG. 2 is a configuration diagram showing a second embodiment which is a modified example of the first embodiment of the AC high voltage power supply device for generating discharge plasma.
【図３】図３は、上記放電プラズマ発生用交流高圧電源
装置の第１の実施の形態の変形例である第３の実施の形
態を示した構成図である。FIG. 3 is a configuration diagram showing a third embodiment which is a modified example of the first embodiment of the AC high voltage power supply device for generating discharge plasma.
【図４】図４は、従来の放電プラズマ発生用交流高圧電
源装置の一例を示した構成図である。FIG. 4 is a configuration diagram showing an example of a conventional AC high-voltage power supply device for generating discharge plasma.
１０…商用電源 １１…整流器 １２…平滑用コンデンサ １３…高周波インバータ １４…電圧計測器 １５…電流計測器 １６…位相差検出器 １７…インバータ出力周波数制御回路 DESCRIPTION OF SYMBOLS 10 ... Commercial power supply 11 ... Rectifier 12 ... Smoothing capacitor 13 ... High frequency inverter 14 ... Voltage measuring instrument 15 ... Current measuring instrument 16 ... Phase difference detector 17 ... Inverter output frequency control circuit
Claims (5)
て、前記リアクタ内に放電プラズマを発生させる放電プ
ラズマ発生用交流高電圧電源装置において、 前記リアクタに誘導性のリアクタンス成分を有する回路
素子を接続し、前記リアクタの容量性のリアクタンス成
分を前記回路素子の誘導性のリアクタンス成分によって
相殺するようにしたことを特徴とする放電プラズマ発生
用交流高圧電源装置。1. An AC high-voltage power supply device for generating discharge plasma in which an AC voltage is applied between electrodes of a reactor to generate discharge plasma in the reactor, wherein a circuit element having an inductive reactance component is provided in the reactor. An AC high-voltage power supply device for generating discharge plasma, which is connected so that the capacitive reactance component of the reactor is canceled by the inductive reactance component of the circuit element.
回路素子を前記リアクタに直列に接続したことを特徴と
する請求項１の放電プラズマ発生用交流高圧電源装置。2. The AC high-voltage power supply device for generating discharge plasma according to claim 1, wherein the circuit element having the inductive reactance component is connected in series to the reactor.
前記誘導性のリアクタンス成分を有する回路素子とから
なる共振回路に供給される無効電力を検出する無効電力
検出手段と、 前記無効電力検出手段によって検出された無効電力が零
となるように前記共振回路に印加する交流電圧の周波数
を調整する周波数調整手段と、 を有することを特徴とする請求項１の放電プラズマ発生
用交流高圧電源装置。3. Reactive power detection means for detecting reactive power supplied to a resonant circuit comprising the reactor and a circuit element having the inductive reactance component connected to the reactor, and the reactive power detection means. The AC high voltage power supply device for generating discharge plasma according to claim 1, further comprising: frequency adjusting means for adjusting the frequency of the AC voltage applied to the resonance circuit so that the detected reactive power becomes zero.
前記誘導性のリアクタンス成分を有する回路素子とから
なる共振回路に印加する交流電圧の位相を検出する電圧
位相検出手段と、 前記共振回路に流れる交流電流の位相を検出する電流位
相検出手段と、 前記電圧位相検出手段によって検出された交流電圧の位
相と、前記電流位相検出手段によって検出された交流電
流の位相とが同じになるように前記共振回路に印加する
交流電圧の周波数を調整する周波数調整手段と、 を有することを特徴とする請求項１の放電プラズマ発生
用交流高圧電源装置。4. A voltage phase detecting means for detecting a phase of an AC voltage applied to a resonance circuit composed of the reactor and a circuit element having the inductive reactance component connected to the reactor, and a voltage phase detection means flowing in the resonance circuit. The current phase detecting means for detecting the phase of the alternating current, the phase of the alternating voltage detected by the voltage phase detecting means, and the resonance so that the phase of the alternating current detected by the current phase detecting means is the same. 2. An AC high voltage power supply device for generating discharge plasma according to claim 1, further comprising: frequency adjusting means for adjusting the frequency of the AC voltage applied to the circuit.
前記誘導性のリアクタンス成分を有する回路素子とから
なる共振回路に供給する交流電力の力率を検出する力率
検出手段と、 前記力率検出手段によって検出された力率が零となるよ
うに前記共振回路に印加する交流電圧の周波数を調整す
る周波数調整手段と、 を有することを特徴とする請求項１の放電プラズマ発生
用交流高圧電源装置。5. A power factor detection means for detecting a power factor of AC power supplied to a resonance circuit comprising the reactor and a circuit element having the inductive reactance component connected to the reactor, and the power factor detection. 2. A high-voltage AC power supply device for generating discharge plasma according to claim 1, further comprising: frequency adjusting means for adjusting the frequency of the AC voltage applied to the resonance circuit so that the power factor detected by the means becomes zero. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP05431596A JP3413785B2 (en) | 1996-03-12 | 1996-03-12 | AC high-voltage power supply for discharge plasma generation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP05431596A JP3413785B2 (en) | 1996-03-12 | 1996-03-12 | AC high-voltage power supply for discharge plasma generation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09247945A true JPH09247945A (en) | 1997-09-19 |
| JP3413785B2 JP3413785B2 (en) | 2003-06-09 |
Family
ID=12967161
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP05431596A Expired - Fee Related JP3413785B2 (en) | 1996-03-12 | 1996-03-12 | AC high-voltage power supply for discharge plasma generation |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3413785B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006196453A (en) * | 2004-12-24 | 2006-07-27 | Huettinger Elektronik Gmbh & Co Kg | Plasma excitation device and plasma coating system |
| KR100713194B1 (en) * | 2005-02-24 | 2007-05-02 | 이엔테크놀로지 주식회사 | Apparatus for minimizing ripple of DC output voltage of plasma power supply |
| JP2010114001A (en) * | 2008-11-07 | 2010-05-20 | Shimada Phys & Chem Ind Co Ltd | Power source device for plasma generation |
| JP2011229365A (en) * | 2010-03-30 | 2011-11-10 | Daihen Corp | High frequency power supply device |
| JP2014189455A (en) * | 2013-03-27 | 2014-10-06 | Toshiba Corp | Electric power supply for an ozone generator and ozone generator |
-
1996
- 1996-03-12 JP JP05431596A patent/JP3413785B2/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006196453A (en) * | 2004-12-24 | 2006-07-27 | Huettinger Elektronik Gmbh & Co Kg | Plasma excitation device and plasma coating system |
| JP4587314B2 (en) * | 2004-12-24 | 2010-11-24 | ヒュッティンガー エレクトローニク ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト | Plasma excitation apparatus and plasma coating system |
| KR100713194B1 (en) * | 2005-02-24 | 2007-05-02 | 이엔테크놀로지 주식회사 | Apparatus for minimizing ripple of DC output voltage of plasma power supply |
| JP2010114001A (en) * | 2008-11-07 | 2010-05-20 | Shimada Phys & Chem Ind Co Ltd | Power source device for plasma generation |
| JP2011229365A (en) * | 2010-03-30 | 2011-11-10 | Daihen Corp | High frequency power supply device |
| JP2014189455A (en) * | 2013-03-27 | 2014-10-06 | Toshiba Corp | Electric power supply for an ozone generator and ozone generator |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3413785B2 (en) | 2003-06-09 |
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