JPH09213252A - Vacuum piping structure for ion implantation device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To make an intermediate connection pipe at the halfway of a vacuum piping hardly fail, enhance operating performance for mounting/demounting the pipe, and also enhance vacuum sealing performance. SOLUTION: In the vacuum piping structure for an ion injection device where an intermediate connection pipe 14 is interposed between a pipeline 12a at the side of a chamber and a pipeline 12b at the side of a vacuum pump at the halfway of the vacuum piping connecting the chamber at the side of an ion source with the vacuum pump, the aforesaid intermediate connection pipe 14 is made of resin material, concurrently metallic ferrules 17 are mounted onto both connection end parts, the aforesaid vacuum pipelines 12a and 12b are mounted over the ferrules, and the aforesaid pipelines 12a and 12b are combined with the intermediate connection pipe 14 so as to be sealed by way of a fastening means 15 over the vacuum pipelines.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ion implantation apparatus used in a semiconductor manufacturing process, and more particularly to a vacuum piping structure for evacuating an ion source chamber.

[0002]

2. Description of the Related Art In a semiconductor manufacturing process, an ion implantation apparatus is used when forming an impurity diffusion layer on each element portion on a wafer by doping. The ion generation source of this ion implantation device is provided in a vacuum chamber and is connected to a vacuum device such as a rotary pump via a vacuum pipe.

The vacuum apparatus of the ion generating source of such an ion implantation apparatus is installed in the lower portion of the ion generating source chamber due to the structure of the apparatus, and is connected to the upper vacuum pipe connected to the chamber side and the rotary pump side. The lower vacuum pipe is connected by a vertically arranged intermediate connection pipe.

FIG. 5 shows a conventional intermediate connecting pipe structure in the vacuum piping of such an ion implanter. (A)
Is an external view, and (B) is an exploded view. Metal vacuum piping 2
An intermediate connection pipe 21 is provided in the middle of 0. This intermediate connection pipe 21 is made of glass. This glass pipe 2
At each end of 1, as shown, an O-ring retainer 24
Is attached, the O-ring 23 is supported thereon, the metal pipe 20 is attached thereto, and the nut 22 is screwed into the screw 25 formed at the end portion of the metal pipe 20. The pipe 21 and the metal vacuum pipe 20 are seal-bonded.

[0005]

However, in the vacuum piping structure in the conventional ion implantation apparatus described above,
Since the intermediate connecting pipe is made of glass, it lacks flexibility and easily breaks, so careful work is required for attachment / detachment work and workability is poor, and it is easily damaged due to impact, causing vacuum problems. . Further, since the O-ring is fixed on the glass pipe, the tightening force cannot be increased so much that sufficient sealing performance cannot be obtained.

The present invention has been made in view of the above-mentioned drawbacks of the prior art, and an ion implantation apparatus capable of improving the workability of attachment / detachment and improving the vacuum sealing property by making the intermediate connection pipe less likely to be damaged. The purpose is to provide a vacuum piping structure of.

[0007]

To achieve the above object, in the present invention, a chamber side pipe and a vacuum pump side pipe are connected in the middle of a vacuum pipe connecting a chamber of an ion source and a vacuum pump. In the vacuum piping structure of the ion implantation apparatus having the intermediate connecting pipe interposed, the intermediate connecting pipe is made of a resin material, and metal ferrules are attached to both connecting ends, and the vacuum pipe is mounted on the ferrule. The vacuum piping structure of the ion implantation apparatus is characterized in that the vacuum piping and the intermediate connecting pipe are seal-coupled from above the vacuum piping via the screw fastening means.

[0008]

DESCRIPTION OF THE PREFERRED EMBODIMENTS In a preferred embodiment,
The resin material is characterized by being made of a polyfluorinated ethylene-based material.

In a further preferred embodiment, the inner surface of the end of the vacuum pipe of the seal connecting portion is expanded into a hollow conical shape and a male screw is formed on the outer periphery of the open end thereof, and the ferrule is provided at the end of the vacuum pipe. It is characterized by comprising a ring-shaped member having a conical inclined surface corresponding to the conical shape of the inner surface of the part.

[0010]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is a block diagram of an ion implantation apparatus equipped with vacuum piping according to the present invention, and FIG. 2 is an external view of an actual apparatus. A desired ion species is selected and taken out by the mass analyzer 2 from the ion gas generated by the ion source 1, accelerated by an accelerator 3, and irradiated by a beam scanner 4 composed of a deflection plate in X and Y directions. The direction is controlled and irradiation is performed on the wafer 6 set in the ion implantation chamber 5. A vacuum device (not shown) is provided below the ion source 1 and is connected to the chamber of the ion source 1 via a vacuum pipe. An intermediate connection pipe 14 is provided in the middle of this vacuum pipe.

FIG. 3 is a block diagram of the vacuum piping of the ion implantation apparatus. The chamber 10 of the ion source and the vacuum rotary pump 11 are connected via a vacuum pipe 30. The vacuum pipe 30 includes an upper pipe 12a connected to the ion source chamber 10 side, a lower pipe 12b connected to the rotary pump 11 side, and an intermediate connection pipe 14 provided between these pipes 12a and 12b. It is composed of
Each of the pipes 12a and 12b is made of a brass-based metal material, and an opening / closing valve 13 is provided on each pipe.

FIG. 4 shows an intermediate connecting pipe 1 of the above vacuum pipe.
4 is a detailed view of FIG. 4, (A) is an external view, and (B) is an exploded view. The intermediate connecting pipe 14 is made of a polyfluoroethylene resin material having excellent durability (for example, Teflon (trade name: manufactured by DuPont)). Ferrules 17 made of, for example, stainless steel are attached to the upper and lower ends of the resin intermediate connection pipe 14. Metal pipe 12
The ends of a and 12b are formed so as to spread in a conical shape, and a male screw 16 is formed on the outer circumference of the opening end. Ferrule 17
The outer shape is a ring shape having a conical taper surface that matches the conical shape of the inner surface of the end of each metal pipe 12a, 12b.

The enlarged diameter ends of the metal pipes 12a and 12b are mounted on the ferrule 17 and the nut 15 is screwed to the male screw 16 and tightened. As a result, the ferrule 17 is pressed against the resin intermediate connection pipe 14 and bites into the resin, and the ferrule 17 and the intermediate connection pipe 14 and the inner surfaces of the metal pipes 12a and 12b are completely sealed, and the tapered surface of the ferrule 17 is formed. Is pressed against the conical inner surfaces of the metal pipes 12a and 12b,
The sealability between the metal pipes 12a and 12b and the intermediate connection pipe 14 is further enhanced.

[0014]

As described above, in the present invention, since the intermediate connecting pipe provided in the middle of the vacuum pipe connecting the ion source chamber and the vacuum pump is made of a resin material, the durability is improved. Also, it is less likely to be damaged by impact, and damage during attachment / detachment work is prevented, improving workability. At the same time, the occurrence of vacuum leak trouble due to breakage is reduced, and the processing work and cost loss due to breakage can be prevented. Furthermore, since there is no risk of damage, it is possible to tighten the ferrule, which is the sealing member of the connection part, with a strong force, which improves the sealing performance.
The reliability of the vacuum piping can be improved.

[Brief description of drawings]

FIG. 1 is a basic configuration diagram of an ion implantation apparatus to which the present invention is applied.

2 is an external view of the ion implantation apparatus of FIG.

FIG. 3 is a configuration diagram of a vacuum piping portion of an ion source.

FIG. 4 is a structural diagram of an intermediate connection pipe portion of vacuum piping according to the present invention.

FIG. 5 is a configuration diagram of an intermediate connection pipe portion of conventional vacuum piping.

[Explanation of symbols]

 12a, 12b: Metal vacuum pipe 14: Resin intermediate connection pipe 15: Nut 17: Ferrule

Front Page Continuation (72) Inventor Shoji Fukuoka No. 5 Noguchi Kita, Kokubun City, Kagoshima Prefecture Sony Kokubun Co., Ltd.

Claims (3)

[Claims] 1. A vacuum piping structure for an ion implantation apparatus, wherein an intermediate connection pipe connecting a chamber side pipe and a vacuum pump side pipe is interposed in the middle of a vacuum pipe connecting an ion source chamber and a vacuum pump. In, while the intermediate connection pipe is made of a resin material, metal ferrules are attached to both connection ends, the vacuum pipe is attached on the ferrule, and a screw tightening means is provided on the vacuum pipe. A vacuum piping structure for an ion implantation apparatus, wherein the vacuum piping and an intermediate connection pipe are seal-bonded to each other. 2. The vacuum piping structure for an ion implantation apparatus according to claim 1, wherein the resin material is a polyfluorinated ethylene-based material. 3. The inner surface of the end portion of the vacuum pipe of the seal coupling portion is expanded into a hollow conical shape and a male screw is formed on the outer periphery of the opening end thereof, and the ferrule has a conical shape of the inner surface of the end portion of the vacuum pipe. The vacuum piping structure for an ion implantation apparatus according to claim 1, wherein the vacuum piping structure comprises a ring-shaped member having a corresponding conical inclined surface.