JPH09150155A - Ionized water producer and electrolytically ionized water production system - Google Patents
Ionized water producer and electrolytically ionized water production systemInfo
- Publication number
- JPH09150155A JPH09150155A JP7310980A JP31098095A JPH09150155A JP H09150155 A JPH09150155 A JP H09150155A JP 7310980 A JP7310980 A JP 7310980A JP 31098095 A JP31098095 A JP 31098095A JP H09150155 A JPH09150155 A JP H09150155A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- water
- ionized water
- ionized
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/36—Hydrogen production from non-carbon containing sources, e.g. by water electrolysis
Landscapes
- Water Treatment By Electricity Or Magnetism (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Abstract
Description
【０００１】[0001]
【発明が属する技術分野】本発明は、イオン水製造装置
並びに電解イオン水製造システムに係り、特に高清浄表
面の洗浄に用いる電解イオン水の製造装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ion water producing apparatus and an electrolytic ion water producing system, and more particularly to an electrolytic ion water producing apparatus used for cleaning a highly clean surface.
【０００２】[0002]
【関連技術】近年、より高清浄な洗浄を目的として、電
解イオン水を用いる洗浄が検討されている。電解イオン
水の製造方法の一例を図３に示す。[Related Art] In recent years, cleaning using electrolytic ionized water has been studied for the purpose of more highly clean cleaning. An example of a method for producing electrolytic ionized water is shown in FIG.
【０００３】電気分解装置３００は、アノード電極３０
１を配したアノード室３０３と、カソード電極３０２を
配したカソード室３０４とを有し、両室はイオン交換膜
３０５により分離されている。この電気分解装置３００
のアノード室３０３，カソード室３０４に原水を導入す
る導入配管系３０６、３０７と、これらから電解処理液
を排出する排出配管系３０８，３０９とを有している。The electrolyzer 300 includes an anode electrode 30.
It has an anode chamber 303 in which 1 is arranged and a cathode chamber 304 in which a cathode electrode 302 is arranged, and both chambers are separated by an ion exchange membrane 305. This electrolyzer 300
Introducing piping systems 306 and 307 for introducing raw water into the anode chamber 303 and the cathode chamber 304, and discharging piping systems 308 and 309 for discharging the electrolytic treatment liquid from these.
【０００４】導入配管３０６、３０７には、電解質溶液
添加装置３１０，３１１が接続され、原水に例えばＨＣ
ｌ、ＮＨ4ＯＨ等の溶液を連続注入し、電極３０１，３
０２に直流電流を通電して連続して電気分解反応を生じ
させ、連続的に所望のｐＨの電解アノード水、電解カソ
ード水を得ることができる。Electrolyte solution addition devices 310 and 311 are connected to the introduction pipes 306 and 307, and the raw water is supplied with, for example, HC.
1, NH 4 OH and other solutions are continuously injected, and the electrodes 301, 3
A direct current is applied to 02 to continuously generate an electrolysis reaction, whereby electrolytic anode water and electrolytic cathode water having a desired pH can be continuously obtained.
【０００５】電解質は電気分解を効率的に行うことやｐ
Ｈコントロール、酸化還元電位コントロールのために添
加させるが、図３のシステムでは、電解質は必要な濃度
になるように希釈して添加する必要があり、手間がかか
るという問題とともにポンプの脈動により注入される電
解質の濃度に変動が生じるという問題がある。また、こ
の方法では、低濃度（１００ｐｐｍ以下）で正確にかつ
再現性よく添加することが困難である。さらに、高濃度
の液だまりが生じたり、パーティクルの発生等の管理に
も問題がある。Electrolytes allow efficient electrolysis and p
Although it is added for H control and redox potential control, in the system of FIG. 3, it is necessary to dilute the electrolyte so that it has a necessary concentration, and the electrolyte is injected due to the pulsation of the pump. There is a problem in that the concentration of the electrolyte that is used varies. Also, with this method, it is difficult to add accurately and reproducibly at a low concentration (100 ppm or less). Further, there is a problem in management such as generation of high-concentration liquid pool and generation of particles.
【０００６】[0006]
【発明が解決しようとする課題】かかる現状に鑑み、本
発明は、低濃度の電解質を含むイオン水を再現性よく製
造できるイオン水製造装置を提供することを目的とす
る。さらには、安定した電解イオン水を得ることができ
る電解イオン水製造装置を提供することを目的とする。SUMMARY OF THE INVENTION In view of the present situation, it is an object of the present invention to provide an ion water producing apparatus capable of producing ion water containing a low concentration of electrolyte with good reproducibility. Furthermore, it aims at providing the electrolytic ion water manufacturing apparatus which can obtain stable electrolytic ion water.
【０００７】[0007]
【課題を解決するための手段】本発明のイオン水製造装
置は、原水と水に溶解してイオンを生成する気体とを混
合する気液混合手段を有することを特徴とする。The ion water producing apparatus of the present invention is characterized by having gas-liquid mixing means for mixing raw water and a gas which is dissolved in water to generate ions.
【０００８】本発明の電解イオン水製造システムは、原
水と水に溶解してイオンを生成する気体とを混合する気
液混合手段と、該気液混合手段で得られるイオンを含む
イオン水を電気分解装置に供給する配管と、該イオン水
を電気分解して電解イオン水を製造する電気分解装置と
からなることを特徴とする。The electrolytic ionized water production system of the present invention comprises a gas-liquid mixing means for mixing raw water and a gas which dissolves in water to generate ions, and ionized water containing ions obtained by the gas-liquid mixing means. It is characterized by comprising a pipe for supplying to the decomposing device and an electrolyzing device for electrolyzing the ionized water to produce electrolytic ionized water.
【０００９】前記気液混合手段は、気体のみを透過させ
る気体透過膜を介して前記気体と前記原水とを分離し、
前記気体を原水側に透過させて前記原水に混合させるこ
とを特徴とする。また、前記気体は、ＮＨ3，ＨＣｌ，
Ｃｌ2又はＳＯ2ガスを含むことを特徴とする。The gas-liquid mixing means separates the gas and the raw water through a gas permeable membrane that allows only gas to pass therethrough,
The gas is transmitted to the raw water side and mixed with the raw water. The gas is NH 3 , HCl,
It is characterized by containing Cl 2 or SO 2 gas.
【００１０】また、前記電気分解装置の電解イオン水排
出配管系は、内表面に酸化クロム不動態膜が形成されて
いることを特徴とする。Further, the electrolytic ionized water discharge piping system of the electrolyzer is characterized in that a chromium oxide passivation film is formed on the inner surface.
【００１１】[0011]
【発明の実施の形態】図１を用いて本発明のイオン水製
造装置及び電解イオン水製造システムを説明する。BEST MODE FOR CARRYING OUT THE INVENTION The ion water producing apparatus and electrolytic ion water producing system of the present invention will be described with reference to FIG.
【００１２】図１において、１０１、１０１’は気体と
原水とを混合する気液混合手段である。１０２、１０
２’は気体導入管、１０３、１０３’は気体排出管、１
０４、１０４’は原水導入管、１０５、１０５’は気体
のみ透過させる透過膜、１０６、１０６’はバルブ、１
０７、１０７’はイオン水を電気分解装置を供給する配
管である。In FIG. 1, 101 and 101 'are gas-liquid mixing means for mixing gas and raw water. 102, 10
2'is a gas introduction pipe, 103, 103 'is a gas discharge pipe, 1
Reference numerals 04 and 104 'are raw water inlet pipes, 105 and 105' are permeable membranes that allow only gas to permeate, and 106 and 106 'are valves.
Reference numerals 07 and 107 'are pipes for supplying ionized water to the electrolyzer.
【００１３】１０８は電気分解装置であり、イオン交換
膜１１３により、内部がアノード電極１０９を配したア
ノード室１１１及びカソード電極１１０を配したカソー
ド室１１２に分割されている。イオン製造装置から排出
されたイオン水が、それぞれアノード室１１１とカソー
ド室１１２に導かれ、電極１０９、１１０で直流電圧が
印加されて電気分解される。Reference numeral 108 denotes an electrolyzer, which is divided by an ion exchange membrane 113 into an anode chamber 111 in which an anode electrode 109 is arranged and a cathode chamber 112 in which a cathode electrode 110 is arranged. Ionized water discharged from the ion production apparatus is introduced into the anode chamber 111 and the cathode chamber 112, respectively, and a DC voltage is applied to the electrodes 109 and 110 to be electrolyzed.
【００１４】電気分解処理された電解イオン水は、電解
アノードイオン水排出管１１４、電解カソードイオン水
排出管１１５を介して各ユースポイントに送られ、それ
ぞれ基体の洗浄に用いられる。なお、電解イオン水の排
出管は、内表面に酸化クロム不動態膜が形成されたステ
ンレス製配管を用いてある。The electrolyzed electrolytic ion water is sent to each use point through the electrolytic anode ion water discharge pipe 114 and the electrolytic cathode ion water discharge pipe 115, and is used for cleaning the substrate. The discharge pipe for the electrolytic ion water is a stainless pipe having a chromium oxide passivation film formed on the inner surface.
【００１５】図１の装置を用いて、イオン水及び電解イ
オン水の製造方法を説明する。A method for producing ionic water and electrolytic ionic water will be described using the apparatus shown in FIG.
【００１６】気液混合手段１０１に、気体導入管１０２
から、ＨＣｌガス（又はＡｒ等の不活性ガス、Ｎ2又は
Ｈ2等で希釈したガス）を送り、また原水供給管１０４
を介して脱気した純水を供給すると、ＨＣｌガスは気体
透過膜１０５を透過して純水中に入り溶解、解離してイ
オンを発生する。イオン水は配管１０７を介してアノー
ド室１１１に送られる。The gas-liquid mixing means 101 is provided with a gas introduction pipe 102.
From the HCl gas (or an inert gas such as Ar, or a gas diluted with N 2 or H 2 etc.), and the raw water supply pipe 104
When degassed pure water is supplied via, the HCl gas permeates the gas permeable membrane 105, enters the pure water, dissolves and dissociates, and generates ions. The ionized water is sent to the anode chamber 111 via the pipe 107.
【００１７】一方、カソード室１１２に送られるイオン
水も同様にして処理される。即ち、気液混合手段１０
１’に、気体導入管１０２’から、ＮＨ3ガス（又はＡ
ｒ等の不活性ガス、Ｎ2又はＨ2等で希釈したガス）を送
り、また原水供給管１０４’を介して脱気した純水を供
給すると、ＮＨ3ガスは気体透過膜１０５’を透過して
純水中に入り溶解、解離してイオンを発生する。イオン
水は配管１０７’を介してカソード室１１２に送られ
る。On the other hand, the ionized water sent to the cathode chamber 112 is treated in the same manner. That is, the gas-liquid mixing means 10
1'to the NH 3 gas (or A
When an inert gas such as r or a gas diluted with N 2 or H 2 is sent, and deaerated pure water is supplied through the raw water supply pipe 104 ′, the NH 3 gas permeates the gas permeable membrane 105 ′. Then, it enters into pure water, dissolves and dissociates to generate ions. The ionized water is sent to the cathode chamber 112 via the pipe 107 '.
【００１８】かかる方法で作製したイオン水中のイオン
濃度は、気液混合手段に導入する気体の圧力により制御
できるため、低いイオン濃度のイオン水を正確にかつ安
定して得ることができる。Since the ion concentration in the ionized water produced by such a method can be controlled by the pressure of the gas introduced into the gas-liquid mixing means, it is possible to accurately and stably obtain the ionized water having a low ion concentration.
【００１９】アノード室１１１、カソード室１１２に導
入されたイオン水は、所定の電圧を電極間に印加し（電
極間距離２０ｍｍの場合で５〜１０Ｖ程度）することに
より電気分解し、所望のｐＨの電解アノード水、電解カ
ソード水が製造できる。The ionized water introduced into the anode chamber 111 and the cathode chamber 112 is electrolyzed by applying a predetermined voltage between the electrodes (about 5 to 10 V when the distance between the electrodes is 20 mm) to obtain a desired pH. The electrolytic anode water and electrolytic cathode water can be produced.
【００２０】以上のようにして製造した電解イオン水の
ｐＨ、比抵抗、酸化還元電位等の特性は、供給されるイ
オン水のイオン濃度が正確に制御されるため、極めて安
定したものとなる。The characteristics such as pH, specific resistance and redox potential of the electrolyzed ionic water produced as described above are extremely stable because the ionic concentration of the ionic water supplied is accurately controlled.
【００２１】図１の例では、アノード室１１１に供給す
るイオン水の製造プロセスにおいて、気液混合手段１０
１にＨＣｌを導入したが、この他にＣｌ2，ＳＯ2等を用
いることも可能である。In the example of FIG. 1, the gas-liquid mixing means 10 is used in the manufacturing process of the ion water supplied to the anode chamber 111.
Although HCl was introduced into 1, it is also possible to use Cl 2 , SO 2 or the like.
【００２２】また、図１の気液混合手段の気体透過膜の
形状としては、平板型、中空糸型等、いずれの形状でも
よい。また、透過膜を用いる方法以外に、例えば気体を
バブリングにより気体を溶解させる方法や又はエジェク
ターによる方法を用いてもよいが、イオン濃度の制御性
や取扱い性の観点から、気体透過膜を用いる方が好まし
い。The shape of the gas permeable membrane of the gas-liquid mixing means of FIG. 1 may be any of flat plate type, hollow fiber type and the like. In addition to the method using a permeable membrane, for example, a method of dissolving the gas by bubbling the gas or a method using an ejector may be used. However, from the viewpoint of controllability and handleability of the ion concentration, the method using the gas permeable membrane is preferable. Is preferred.
【００２３】電気分解装置に供給するイオン水のイオン
濃度としては、カソード側で１〜４００ｐｐｍ、アノー
ド側で１〜４０ｐｐｍ程度とするのが好ましい。この範
囲で、得られる電解アノード水又は電解カソード水を用
いて半導体素子等の部材表面を洗浄すると部材表面の汚
染に対する除去性、金属除去性、パーティクル除去性、
有機物除去性が一層優れたものとなる。The ion concentration of ionized water supplied to the electrolyzer is preferably about 1 to 400 ppm on the cathode side and about 1 to 40 ppm on the anode side. In this range, when the surface of a member such as a semiconductor element is washed with the obtained electrolytic anode water or electrolytic cathode water, the removability for contamination of the member surface, the metal removability, the particle removability,
The organic matter removability is further improved.
【００２４】本発明の電解イオン水の排出配管は、前述
したように、内表面を酸化クロム不動態膜を形成したも
のを用いるのが好ましい。この酸化クロム不動態膜は、
極めて耐食性が高く、しかも不純物の溶出も極めて少な
いものであり、電解イオン水を汚染することがなく、超
高清浄な洗浄に好適に用いられる。As described above, it is preferable to use the electrolytic ionized water discharge pipe of the present invention having a chromium oxide passivation film formed on the inner surface thereof. This chromium oxide passivation film is
It has extremely high corrosion resistance and very little impurities elute, does not contaminate electrolytic ion water, and is suitable for ultra-high cleanliness cleaning.
【００２５】また、本発明においては、電解イオン水の
排出管に限らず、気液混合手段、気体導入管及びその他
の配管系の内表面も酸化クロム不導体膜を形成するのが
より好ましい。Further, in the present invention, it is more preferable to form the chromium oxide non-conductive film not only on the discharge pipe of the electrolyzed ionized water but also on the inner surfaces of the gas-liquid mixing means, the gas introduction pipe and other piping systems.
【００２６】酸化クロム不動態膜は、例えば次のように
して形成できる。The chromium oxide passivation film can be formed, for example, as follows.
【００２７】ステンレス材（ＳＵＳ３１６Ｌ）の表面を
電解複合研磨法で研磨処理した後、不活性ガス中でベー
キングを行い水分を除去し、次いで、Ｎ2やＡｒ等の不
活性ガスと５００ｐｐｂ〜２％のＨ2Ｏガスとの混合ガ
ス中で、４５０〜６００℃の温度で熱処理することによ
り酸化クロムの不動態膜が形成される。After polishing the surface of the stainless steel material (SUS316L) by the electrolytic composite polishing method, baking is performed in an inert gas to remove water, and then an inert gas such as N 2 or Ar and 500 ppb to 2%. In a mixed gas of the H 2 O gas and the heat treatment at a temperature of 450 to 600 ° C., a passivation film of chromium oxide is formed.
【００２８】[0028]
【実施例】以下に実施例をあげて本発明をより詳細に説
明する。The present invention will be described in more detail with reference to the following examples.
【００２９】図１の装置を用いて、種々の条件でイオン
水を製造し電気分解し、イオン濃度とＨＣｌ，ＮＨ3ガ
スの分圧との関係及び電解イオン水の特性との関係を調
べた。結果を図２及び表１に示す。Using the apparatus shown in FIG. 1, ionic water was produced under various conditions and electrolyzed, and the relationship between the ion concentration and the partial pressures of HCl and NH 3 gas and the relationship with the characteristics of electrolyzed ionic water were investigated. . The results are shown in FIG.
【００３０】図２が示すように、ＨＣｌ及びＮＨ3ガス
を溶解して得られるＣｌ-、ＮＨ4 +等のイオンの濃度は
分圧に比例して得ることができる。但し、水とガスの接
触時間は一定としておく。As shown in FIG. 2, the concentration of ions such as Cl − and NH 4 + obtained by dissolving HCl and NH 3 gas can be obtained in proportion to the partial pressure. However, the contact time between water and gas is kept constant.
【００３１】また、図２及び表１の結果は、３回繰り返
し行っても、イオン濃度は±１０％の範囲に収まり、ま
た電解イオン水のｐＨ及び酸化還元電位も再現性の高い
ことが分かった。Further, the results shown in FIG. 2 and Table 1 show that the ion concentration is within ± 10% and the pH and the oxidation-reduction potential of the electrolyzed ion water are highly reproducible even after repeating three times. It was
【００３２】[0032]
【表１】 ─────────────────────────────────── アノード室流量 １Ｌ／分 カソード室流量 １Ｌ／分 アノード室Ｃｌ-濃度 ４０ｍｇ／Ｌ カソード室ＮＨ4 +濃度 ２ｍｇ／Ｌ 電流密度 ６Ａ／ｄｍ2 電解アノード水の特性 酸化還元電位＝１４００ｍＶ（vsＮＨＥ） ｐＨ＝３．１ 電解カソード水の特性 酸化還元電位＝−４１０ｍＶ（vsＮＨＥ） ｐＨ＝８．２ ─────────────────────────────────── Ｌ：リットル[Table 1] ─────────────────────────────────── Anode chamber flow rate 1 L / min Cathode chamber flow rate 1 L / Minute Anode chamber Cl - concentration 40 mg / L Cathode chamber NH 4 + concentration 2 mg / L Current density 6 A / dm 2 Electrolytic anode water characteristics Redox potential = 1400 mV (vsNHE) pH = 3.1 Electrolytic cathode water characteristics Redox potential = -410 mV (vsNHE) pH = 8.2 ──────────────────────────────────── L: liter
【００３３】[0033]
【発明の効果】本発明のイオン水製造装置及び製造方法
は、気体の分圧によりイオン濃度をでき、低濃度であっ
てもイオン濃度を正確に制御でき、かつ高い再現性をも
って容易にイオン水を製造することが可能となる。INDUSTRIAL APPLICABILITY The apparatus and method for producing ionized water according to the present invention enables the ion concentration to be controlled by the partial pressure of gas, the ion concentration can be accurately controlled even at a low concentration, and the ionized water can be easily produced with high reproducibility. Can be manufactured.
【００３４】従って、該イオン製造装置を電気分解装置
と組み合わせることにより、安定した特性の電解イオン
水が得ることができる。Therefore, by combining the ion production apparatus with an electrolyzer, electrolytic ionized water having stable characteristics can be obtained.
【図１】本発明の電解イオン水製造システムの一例を示
す概念図である。FIG. 1 is a conceptual diagram showing an example of an electrolytic ion water production system of the present invention.
【図２】ガス分圧とイオン濃度との関係を示すグラフで
ある。FIG. 2 is a graph showing the relationship between gas partial pressure and ion concentration.
【図３】従来の電解イオン水製造システムを示す概念図
である。FIG. 3 is a conceptual diagram showing a conventional electrolytic ion water production system.
１０１、１０１’ 気液混合手段、 １０２、１０２’ 気体導入管、 １０３、１０３’ 気体排出管、 １０４、１０４’ 原水導入管、 １０５、１０５’ 気体透過膜、 １０６、１０６’ バルブ、 １０７、１０７’ 配管、 １０８ 電気分解装置、 １０９ アノード電極 １１０ カソード電極 １１１ アノード室 １１２ カソード室、 １１３ イオン交換膜、 １１４ アノードイオン水排出管、 １１５ カソードイオン水排出管、 ３００ 電気分解装置、 ３０１ アノード電極、 ３０２ カソード電極、 ３０３ アノード室、 ３０４ カソード室、 ３０５ イオン交換膜、 ３０６、３０７ 原水導入配管、 ３０８、３０９ 電解処理液排出配管、 ３１０、３１１ 電解質溶液添加装置。 101, 101 'gas-liquid mixing means, 102, 102' gas introduction pipe, 103, 103 'gas discharge pipe, 104, 104' raw water introduction pipe, 105, 105 'gas permeable membrane, 106, 106' valve, 107, 107 ′ Piping, 108 Electrolyzer, 109 Anode Electrode 110 Cathode Electrode 111 Anode Chamber 112 Cathode Chamber, 113 Ion Exchange Membrane, 114 Anode Ion Water Discharge Pipe, 115 Cathode Ion Water Discharge Pipe, 300 Electrolyzer, 301 Anode Electrode, 302 Cathode electrode, 303 anode chamber, 304 cathode chamber, 305 ion exchange membrane, 306, 307 raw water introduction pipe, 308, 309 electrolytic treatment liquid discharge pipe, 310, 311 electrolyte solution addition device.
Claims (7)
体とを混合する気液混合手段を有することを特徴とする
イオン水製造装置。1. An ion water production apparatus comprising a gas-liquid mixing means for mixing raw water and a gas which dissolves in water to generate ions.
せる気体透過膜を介して前記気体と前記原水とを分離
し、前記気体を原水側に透過させて前記原水に混合させ
ることを特徴とする請求項１に記載のイオン水製造装
置。2. The gas-liquid mixing means separates the gas and the raw water through a gas permeable membrane that allows only gas to permeate, and allows the gas to permeate to the raw water side to be mixed with the raw water. The ionized water production apparatus according to claim 1.
ＳＯ2ガスを含むことを特徴とする請求項１又は２に記
載のイオン水製造装置。3. The ionized water production apparatus according to claim 1, wherein the gas contains NH 3 , HCl, Cl 2 or SO 2 gas.
体とを混合する気液混合手段と、該気液混合手段で得ら
れるイオンを含むイオン水を電気分解装置に供給する配
管と、該イオン水を電気分解して電解イオン水を製造す
る電気分解装置とからなることを特徴とする電解イオン
水製造システム。4. A gas-liquid mixing means for mixing raw water and a gas that dissolves in water to generate ions, and a pipe for supplying ionized water containing ions obtained by the gas-liquid mixing means to an electrolyzer. An electrolyzed water production system comprising an electrolyzer for electrolyzing the ionized water to produce electrolyzed ionized water.
せる気体透過膜を介して前記気体と前記原水とを分離
し、前記気体を原水側に透過させて前記原水に混合させ
ることを特徴とする請求項４に記載の電解イオン水製造
システム。5. The gas-liquid mixing means separates the gas and the raw water through a gas permeable membrane that allows only gas to permeate, and allows the gas to permeate to the raw water side to be mixed with the raw water. The electrolytic ionized water production system according to claim 4.
ＳＯ2ガスであることを特徴とする請求項４又は５に記
載の電解イオン水製造システム。6. The electrolytic ion water production system according to claim 4 or 5, wherein the gas is NH 3 , HCl, Cl 2 or SO 2 gas.
管系は、内表面に酸化クロム不動態膜が形成されている
ことを特徴とする請求項４〜６のいずれか１項に記載の
電解イオン水製造システム。7. The electrolyzed ionized water discharge piping system of the electrolyzer has a chromium oxide passivation film formed on the inner surface thereof. Ion water production system.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7310980A JPH09150155A (en) | 1995-11-29 | 1995-11-29 | Ionized water producer and electrolytically ionized water production system |
| KR1019960058842A KR0173368B1 (en) | 1995-11-29 | 1996-11-28 | Apparatus and method for producing ionic water and system and method for producing electrolytic ionic water |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7310980A JPH09150155A (en) | 1995-11-29 | 1995-11-29 | Ionized water producer and electrolytically ionized water production system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09150155A true JPH09150155A (en) | 1997-06-10 |
Family
ID=18011710
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7310980A Pending JPH09150155A (en) | 1995-11-29 | 1995-11-29 | Ionized water producer and electrolytically ionized water production system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH09150155A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20010070621A (en) * | 2001-05-28 | 2001-07-27 | 류근걸 | Semiconductor Si-wafer cleaning using electrolyzed water |
-
1995
- 1995-11-29 JP JP7310980A patent/JPH09150155A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20010070621A (en) * | 2001-05-28 | 2001-07-27 | 류근걸 | Semiconductor Si-wafer cleaning using electrolyzed water |
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