JPH0892376A - New fluorosilicone resin and its production - Google Patents

New fluorosilicone resin and its production

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Publication number
JPH0892376A
JPH0892376A JP6979095A JP6979095A JPH0892376A JP H0892376 A JPH0892376 A JP H0892376A JP 6979095 A JP6979095 A JP 6979095A JP 6979095 A JP6979095 A JP 6979095A JP H0892376 A JPH0892376 A JP H0892376A
Authority
JP
Japan
Prior art keywords
group
silicone resin
formula
general formula
fluorinated silicone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6979095A
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Japanese (ja)
Other versions
JP3364355B2 (en
Inventor
Koichi Iyanagi
宏一 井柳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pola Chemical Industries Inc
Original Assignee
Pola Chemical Industries Inc
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Filing date
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Application filed by Pola Chemical Industries Inc filed Critical Pola Chemical Industries Inc
Priority to JP06979095A priority Critical patent/JP3364355B2/en
Publication of JPH0892376A publication Critical patent/JPH0892376A/en
Application granted granted Critical
Publication of JP3364355B2 publication Critical patent/JP3364355B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE: To obtain a new fluorosilicone resin capable of uniformly forming a flexible, firm and thin water-repellent film on a base such as a plastic, metal or the skin. CONSTITUTION: A silicon compound of formula Q<n> [Si(X)3 ]n (Q<n> is a n-valent organic group; (n) is an integer of 2-6; X is a hydrolyzable group) is subjected to hydrolyzing polycondensation followed by reaction of silicon compound(s) of formula (R<1> )3 SiX (R<1> is a hydrocarbon group or another hydrocarbon group with fluorine atom(s) substituted for part or the whole of the hydrogen atoms, and at least one R is the latter hydrocarbon group) and/or formula (R<1> )3 SiOSi(R<1> )3 as terminal blocking agent, thus affording the objective silicone resin consisting mainly of at least one kind of constituent unit of formula Q<n> (SiO3/2 )n with the terminal blocked with unit of formula (R<1> )3 SiO1/2 .

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、プラスチック、金属、
皮膚等の各種基体の表面に柔軟で強固で、しかも薄く均
一な撥水撥油性保護膜を与える被膜剤、特に化粧料用被
膜剤として有用な新規なフッ素化シリコーン樹脂及びそ
の製造方法に関する。
The present invention relates to plastics, metals,
TECHNICAL FIELD The present invention relates to a coating agent which provides a thin and uniform water-repellent and oil-repellent protective film on the surface of various substrates such as the skin, particularly a novel fluorinated silicone resin useful as a coating agent for cosmetics, and a method for producing the same.

【0002】[0002]

【従来の技術】シリコーンは従来から撥水性の被膜を与
える被膜剤とし広範囲に利用されている。このシリコー
ンにフッ素置換基を導入することにより、さらに撥油性
を付与しようとする試みもなされている。このような例
として、ユニット(R)2SiO(但し、Rは有機基を
表す。以下同様)及びRSiO3/2ユニットからなる高
分子シリコーンやこれにユニット(R)3SiO1/2及び
/又はユニットSiO2を添加したシリコーン樹脂の側
鎖又は末端にフッ素置換基を導入したものが挙げられる
(特開昭64−83086号、特開平5−78491
号、特開平61−358185号)。
2. Description of the Related Art Silicone has been widely used as a coating agent for providing a water-repellent coating. Attempts have been made to further impart oil repellency by introducing a fluorine substituent into this silicone. As such an example, a polymer silicone composed of a unit (R) 2 SiO (where R represents an organic group; the same applies hereinafter) and a RSiO 3/2 unit and a unit (R) 3 SiO 1/2 and / or Alternatively, a silicone resin to which a unit SiO 2 is added and a fluorine substituent is introduced into the side chain or terminal thereof can be used (Japanese Patent Laid-Open No. 64-83086 and Japanese Patent Laid-Open No. 5-78491).
No. 61-358185).

【0003】[0003]

【発明が解決しようとする課題】しかし、従来のフッ素
置換シリコーンの多くは二次元型(直鎖状)であり、三
次元シリコーンであってもネットワーク構造が有機基R
によって切断され、分子の連続性が低下するため、得ら
れる撥水撥油性被膜は柔軟性はあるものの被膜強度が不
十分で、被膜の耐久性に問題があった。ある程度の被膜
強度を得るためには、SiO2ユニットの割合を増加さ
せれば良いが、この方法でも限界がある上、あまりこの
ユニットの割合を増加させると、分子の可撓性が不足
し、ひいては被膜の柔軟性が著しく低下するという欠点
があった。また、厚く塗布してもある程度の被膜強度は
得られるが、薄く均一に塗布した方が望ましいことは勿
論である。
However, most of the conventional fluorine-substituted silicones are two-dimensional type (straight chain type), and even if they are three-dimensional silicones, the network structure has an organic group R.
Since the resulting water-repellent and oil-repellent coating is flexible, the strength of the coating is insufficient and the durability of the coating is problematic because it is cut by the above-mentioned process and the continuity of the molecule is reduced. In order to obtain a certain degree of film strength, it is sufficient to increase the proportion of SiO 2 units, but this method also has a limit, and if the proportion of this unit is increased too much, the flexibility of the molecule becomes insufficient, As a result, there is a drawback that the flexibility of the coating is significantly reduced. Further, although a certain degree of coating strength can be obtained even if it is applied thickly, it is of course desirable to apply it thinly and uniformly.

【0004】なお、従来の代表的な三次元シリコーン樹
脂のネットワーク構造を下式に示す。
A conventional typical three-dimensional silicone resin network structure is shown in the following formula.

【0005】[0005]

【化1】 [Chemical 1]

【0006】(但し、Rは互いに独立した有機基、また
Yは末端封鎖基を表す。)従って本発明の課題は、各種
基体上に柔軟で強固な撥水撥油性被膜を薄く均一に形成
できる新規なフッ素化シリコーン樹脂及びその製造方法
を提供することである。
(However, R represents an organic group independent from each other, and Y represents an end-capping group.) Therefore, the object of the present invention is to form a flexible and strong water- and oil-repellent coating thinly and uniformly on various substrates. It is to provide a novel fluorinated silicone resin and a method for producing the same.

【0007】[0007]

【課題を解決するための手段】本発明者らは従来技術に
おける以上のような事情に鑑み、鋭意研究を重ねた結
果、珪素原子−珪素原子間が有機鎖によって結合された
ユニットと末端封鎖ユニットを主構成ユニットとするフ
ッ素化シリコーン樹脂を被膜剤として用いれば、各種基
体上に柔軟で強固な撥水撥油性被膜を薄く均一に形成で
きることを見出し、本発明を完成するに至った。
DISCLOSURE OF THE INVENTION The inventors of the present invention have made extensive studies in view of the above-mentioned circumstances in the prior art, and as a result, a unit in which a silicon atom-a silicon atom are bonded by an organic chain and a terminal blocking unit are obtained. It was found that a flexible and strong water- and oil-repellent coating can be thinly and uniformly formed on various substrates by using a fluorinated silicone resin containing as a main constituent unit as a coating agent, and completed the present invention.

【0008】すなわち本発明のフッ素化シリコーン樹脂
は、一般式(I): Qn(SiO3/2n (但し、Qnはn価の有機基を表し、またnは2〜6の
整数のいずれか1つを表す。)で示されるユニットの少
なくとも1種を主構成ユニットとし、末端が一般式(I
I): (R13SiO1/2 (但し、R1は互いに同一であっても異なっていてもよ
く、炭化水素基、又は水素原子の少なくとも一部がフッ
素原子で置換された炭化水素基を表し、且つ三つのR1
の内、少なくとも一つは前記フッ素置換炭化水素基でな
ければならない。)で示されるユニットで封鎖されたも
のである。
That is, the fluorinated silicone resin of the present invention has the general formula (I): Q n (SiO 3/2 ) n (where Q n represents an n-valent organic group, and n is an integer of 2 to 6). At least one of the units represented by the formula (I)
I): (R 1 ) 3 SiO 1/2 (provided that R 1 s may be the same as or different from each other, and are a hydrocarbon group or a hydrocarbon in which at least a part of hydrogen atoms is substituted with a fluorine atom. Represents a group and has three R 1
At least one of them must be the above-mentioned fluorine-substituted hydrocarbon group. ) Is closed by the unit shown.

【0009】また本発明の前記フッ素化シリコーン樹脂
の製造方法は、一般式(III): Qn[Si(X)3n (但し、Qnはn価の有機基を表し、またnは2〜6の
整数のいずれか1つを表す。Xは互いに同一でも異なっ
ていてもよく、加水分解性の基を表す。)で示される加
水分解性珪素化合物を加水分解重縮合させた後、これに
一般式(IV): (R13SiX (但し、R1は互いに同一であっても異なっていてもよ
く、炭化水素基、又は水素原子の少なくとも一部がフッ
素原子で置換された炭化水素基を表し、且つ三つのR1
の内、少なくとも一つは前記フッ素置換炭化水素基でな
ければならない。またXは加水分解性の基を表す。)で
示される珪素化合物を末端封鎖剤として反応させて前記
重縮合物の末端を封鎖することを特徴とするものであ
る。
The method for producing a fluorinated silicone resin according to the present invention has the general formula (III): Q n [Si (X) 3 ] n (wherein Q n represents an n-valent organic group, and n is Represents any one of the integers of 2 to 6. X may be the same or different from each other and represents a hydrolyzable group.) After hydrolytic polycondensation of the hydrolyzable silicon compound represented by General formula (IV): (R 1 ) 3 SiX (provided that R 1 s may be the same or different from each other, and a hydrocarbon group or at least a part of hydrogen atoms is substituted with a fluorine atom). Represents a hydrocarbon group and has three R 1
At least one of them must be the above-mentioned fluorine-substituted hydrocarbon group. X represents a hydrolyzable group. ) Is used to react the silicon compound represented by the formula (1) as an end-capping agent to cap the ends of the polycondensate.

【0010】以下に本発明を更に詳しく説明する。 <フッ素化シリコーン樹脂>本発明のフッ素化シリコー
ン樹脂は、基本的には前記一般式(I)のQn(SiO
3/2nユニットの少なくとも1種を主構成ユニットと
し、末端を前記一般式(II)の(R13SiO1/2ユニ
ットで封鎖したものであるが、更にこの構成分子中にS
iO2ユニットを含有させることができる。この場合、
SiO2ユニットの含有量はSiO2/Qn(SiO3/2
nモル比で(3/2)以下、特に(1/2)以下が好ま
しい。(R13SiO1/2ユニットのQn(SiO3/2n
ユニット及びSiO2ユニットに対するモル比は特に制
限されない。
The present invention will be described in more detail below. <Fluorinated Silicone Resin> The fluorinated silicone resin of the present invention is basically the same as Qn (SiO 2) of the general formula (I).
3/2 ) n units are at least one main constituent unit, and the end is blocked with the (R 1 ) 3 SiO 1/2 unit of the general formula (II).
An iO 2 unit can be included. in this case,
The content of the SiO 2 unit is SiO 2 / Q n (SiO 3/2 )
The n molar ratio is preferably (3/2) or less, particularly preferably (1/2) or less. Q n (SiO 3/2 ) n of (R 1 ) 3 SiO 1/2 unit
The molar ratio to the unit and the SiO 2 unit is not particularly limited.

【0011】一般式(I)のQn(SiO3/2nユニット
において、nは2、3又は4のいずれかであることが好
ましい。一般式(I)のQn(SiO3/2nユニットにお
いて、Qnの具体例としては、 1)アルキレン基;2)ポリメチレン基;3)フェニレ
ン基;4)アリーレン基;5)前記1)〜4)の基の水
素原子が更にアルキル基、フェニル基、アリール基、ア
ルキレン基、ポリメチレン基、フェニレン基及びアリー
レン基よりなる群の少なくとも1種で置換された基;
6)前記1)〜4)の基の構造中にエーテル、チオエー
テル、エステル、ケトン、アミド、イミド、アミン及び
イミンよりなる群の少なくとも1種の官能基を含んだ
基;及び7)前記1)〜6)の基の水素原子が塩素原子
又は臭素原子で置換された基等の少なくとも1種が例示
できる。
In the Q n (SiO 3/2 ) n unit of the general formula (I), n is preferably 2, 3 or 4. In the Q n (SiO 3/2 ) n unit of the general formula (I), specific examples of Q n are: 1) alkylene group; 2) polymethylene group; 3) phenylene group; 4) arylene group; ) To 4), wherein the hydrogen atom of the group is further substituted with at least one selected from the group consisting of an alkyl group, a phenyl group, an aryl group, an alkylene group, a polymethylene group, a phenylene group and an arylene group;
6) A group containing at least one functional group of the group consisting of ether, thioether, ester, ketone, amide, imide, amine and imine in the structure of the groups 1) to 4); and 7) 1) above. At least one of the groups in which the hydrogen atom of the groups (1) to (6) is substituted with a chlorine atom or a bromine atom can be exemplified.

【0012】更に具体的なQnは、下記の通り例示され
る。なお、以下の式中、a、b、c、d、e、fは各々
1以上の整数を表す。 Q2(2価の有機基):
More specific Q n is exemplified as follows. In the formulas below, a, b, c, d, e and f each represent an integer of 1 or more. Q 2 (divalent organic group):

【0013】[0013]

【化2】−(CH2)a− …(1)、 −CH(CH3)−(CH
2)a− …(2)、−(CH2)a−C(C25)(CH3)− …
(3)、 −C64− …(4)、−(CH2)a−C64−(CH
2Cl)− …(5)、−CH(CH3)-C64-(CH2)a- …
(6)、−(CH2)a−S−(CH2)b- …(7)、 −(CH2)a
-S-C64- …(8)、−CH(CH3)−S−(CH2)a- …
(9)
[Image 2] - (CH 2) a - ... (1), -CH (CH 3) - (CH
2) a - ... (2) , - (CH 2) a -C (C 2 H 5) (CH 3) - ...
(3), -C 6 H 4 - ... (4), - (CH 2) a -C 6 H 4 - (CH
2 Cl) - ... (5) , - CH (CH 3) -C 6 H 4 - (CH 2) a - ...
(6), - (CH 2 ) a -S- (CH 2) b - ... (7), - (CH 2) a
-S-C 6 H 4 - ... (8), - CH (CH 3) -S- (CH 2) a - ...
(9)

【0014】[0014]

【化3】 [Chemical 3]

【0015】Q3(3価の有機基):Q 3 (trivalent organic group):

【0016】[0016]

【化4】 [Chemical 4]

【0017】Q4(4価の有機基):Q 4 (tetravalent organic group):

【0018】[0018]

【化5】 [Chemical 5]

【0019】本発明のフッ素化シリコーン樹脂の主構成
ユニットは、この様な上記一般式(I)のユニットの少
なくとも1種で構成されるが、本発明において、好まし
くは、主構成ユニットは、一般式(I)にQnとしてジカ
ルボン酸のジアミドを含む2価の有機基を導入したユニ
ット及び一般式(I)にQnとしてジカルボン酸のジアミ
ドを含む2価の有機基以外の2価の有機基を導入したユ
ニットで構成される。
The main constituent unit of the fluorinated silicone resin of the present invention is composed of at least one kind of the unit of the above general formula (I), but in the present invention, the main constituent unit is preferably a general constituent unit. A unit obtained by introducing a divalent organic group containing a dicarboxylic acid diamide as Q n into the formula (I) and a divalent organic group other than the divalent organic group containing a dicarboxylic acid diamide as Q n in the general formula (I) It is composed of a unit in which a group is introduced.

【0020】次に一般式(II)の(R13SiO1/2
ニットであるが、このユニットのR1は、互いに同一で
あっても異なっていてもよく、炭化水素基、又は水素原
子の少なくとも一部がフッ素原子で置換された炭化水素
基を表し、且つ三つのR1の内、少なくとも一つは前記
フッ素置換炭化水素基でなければならないが、好ましく
は、アルキル基、フェニル基、アリール基及びこれらの
基の水素原子の少なくとも一部がフッ素原子で置換され
た基より選ばれる基であり、具体例としては、メチル
基、エチル基、n−プロピル基、イソプロピル基、n−
ブチル基、sec−ブチル基、tert−ブチル基等のアルキ
ル基;フェニル基;アリール基;又は、これらの基の水
素原子の少なくとも一部がフッ素原子で置換された基等
が挙げられる。
[0020] Then the general formula (II) (R 1) is a 3 SiO 1/2 units, R 1 of the unit, which may be the being the same or different, a hydrocarbon group, or hydrogen At least a part of the atoms represents a hydrocarbon group substituted with a fluorine atom, and at least one of the three R 1 should be the fluorine-substituted hydrocarbon group, preferably an alkyl group or a phenyl group. , An aryl group and a group in which at least a part of hydrogen atoms of these groups are substituted with a fluorine atom, and specific examples thereof include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, and an n- group.
Examples thereof include an alkyl group such as a butyl group, a sec-butyl group, and a tert-butyl group; a phenyl group; an aryl group; or a group in which at least a part of hydrogen atoms of these groups are substituted with a fluorine atom.

【0021】以上のようなユニットで構成される本発明
のフッ素化シリコーン樹脂のネットワーク構造例を、Q
nのnが2、すなわち2価の有機基の場合を例にして、
下記に示す。
An example of the network structure of the fluorinated silicone resin of the present invention composed of the above units is
For example, when n of n is 2, that is, a divalent organic group,
Shown below.

【0022】[0022]

【化6】 [Chemical 6]

【0023】(但し、化6中Q2は2価の有機基を表
す。また、R1は互いに同一であっても異なっていても
よく、炭化水素基、又は水素原子の少なくとも一部がフ
ッ素原子で置換された炭化水素基を表し、且つ三つのR
1の内、少なくとも一つは前記フッ素置換炭化水素基で
なければならない。)
(In the formula 6, Q 2 represents a divalent organic group. R 1 s may be the same or different, and a hydrocarbon group or at least a part of hydrogen atoms is fluorine. Represents a hydrocarbon group substituted with atoms and has three R
At least one of 1 must be the above-mentioned fluorine-substituted hydrocarbon group. )

【0024】また本発明フッ素化シリコーン樹脂の具体
例は次の通りである。 イ)[{CF3(CF223SiO1/2]のユニット及
び[O3/2SiQ2SiO3 /2](但し、Q2は−(C
23−で示される2価の有機基を表す。)のユニット
からなるフッ素化シリコーン樹脂。
Specific examples of the fluorinated silicone resin of the present invention are as follows. B) [{CF 3 (CF 2 ) 2} 3 SiO 1/2] units and [O 3/2 SiQ 2 SiO 3/ 2] ( where, Q 2 is - (C
H 2 ) represents a divalent organic group represented by 3- . ) Fluorinated silicone resin consisting of a unit.

【0025】ロ)[(CF3CH23SiO1/2]のユニ
ット、[O3/2SiQ2SiO3/2](但し、Q2は下記式
(1a)で示される2価の有機基を表す。)のユニット
及び[O3/2SiQ'2SiO3/2](但し、Q'2は−(C
22S(CH23−で示される2価の有機基を表
す。)のユニットからなるフッ素化シリコーン樹脂。
(B) A unit of [(CF 3 CH 2 ) 3 SiO 1/2 ], [O 3/2 SiQ 2 SiO 3/2 ] (wherein Q 2 is a divalent group represented by the following formula (1a)) And an unit of [O 3/2 SiQ ′ 2 SiO 3/2 ] (provided that Q ′ 2 is — (C
It represents a divalent organic group represented by - H 2) 2 S (CH 2) 3. ) Fluorinated silicone resin consisting of a unit.

【0026】[0026]

【化7】 [Chemical 7]

【0027】ハ)[{CF3(CF25}(CH32
iO1/2]のユニット、[SiO2]のユニット及び[O
3/2SiQ2SiO3/2](但し、Q2は下記式(2a)で
示される2価の有機基を表す。)のユニットからなるフ
ッ素化シリコーン樹脂。
C) [{CF 3 (CF 2 ) 5 } (CH 3 ) 2 S
iO 1/2 ] unit, [SiO 2 ] unit and [O
3/2 SiQ 2 SiO 3/2 ] (wherein Q 2 represents a divalent organic group represented by the following formula (2a)).

【0028】[0028]

【化8】 Embedded image

【0029】ニ)[{CF3(CF232(C25)S
iO1/2]のユニット及び[(O3/2Si)33](但
し、Q3は式(3a)で示される3価の有機基を表
す。)のユニットからなるフッ素化シリコーン樹脂。
D) [{CF 3 (CF 2 ) 3 } 2 (C 2 H 5 ) S
fluorinated silicone resin composed of a unit of [iO 1/2 ] and a unit of [(O 3/2 Si) 3 Q 3 ] (wherein Q 3 represents a trivalent organic group represented by the formula (3a)). .

【0030】[0030]

【化9】 [Chemical 9]

【0031】ホ)[{CF3(CF25}(CH32
iO1/2]のユニット、[SiO2]のユニット及び
[(O3/2Si)33](但し、Q3は式(4a)で示さ
れる3価の有機基を表す。)のユニットからなるフッ素
化シリコーン樹脂。
E) [{CF 3 (CF 2 ) 5 } (CH 3 ) 2 S
iO 1/2 ] unit, [SiO 2 ] unit and [(O 3/2 Si) 3 Q 3 ] (wherein Q 3 represents a trivalent organic group represented by the formula (4a)). Fluorinated silicone resin composed of units.

【0032】[0032]

【化10】 [Chemical 10]

【0033】ヘ)[{CF3(CF23(CH22
2(C25)SiO1/2]のユニット及び[(O32
i)33](但し、Q3は式(5a)で示される3価の
有機基を表す。)のユニットからなるフッ素化シリコー
ン樹脂。
F) [{CF 3 (CF 2 ) 3 (CH 2 ) 2 }
2 (C 2 H 5) units of SiO 1/2] and [(O 3/2 S
i) 3 Q 3 ] (wherein Q 3 represents a trivalent organic group represented by the formula (5a)).

【0034】[0034]

【化11】 [Chemical 11]

【0035】ト)[(CF3CH23SiO1/2]のユニ
ット、[SiO2]のユニット、[O3 /2SiQ2SiO
3/2](但し、Q2は−(CH22S(CH23−で示さ
れる2価の有機基を表す。)のユニット及び[(O3/2
Si)44](但し、Q4は式(6a)で示される4価
の有機基を表す。)のユニットからなるフッ素化シリコ
ーン樹脂。
[0035] g) Unit [(CF 3 CH 2) 3 SiO 1/2], units of [SiO 2], [O 3 /2 SiQ 2 SiO
3/2 ] (however, Q 2 represents a divalent organic group represented by — (CH 2 ) 2 S (CH 2 ) 3 —) and [(O 3/2
Si) 4 Q 4 ] (wherein Q 4 represents a tetravalent organic group represented by the formula (6a)).

【0036】[0036]

【化12】 [Chemical 12]

【0037】チ)[{CF3(CF223SiO1/2
のユニット、[(O3/2Si)44](但し、Q4は式
(7a)で示される4価の有機基を表す。)のユニット
及び[SiO2]のユニットからなるフッ素化シリコー
ン樹脂。
H) [{CF 3 (CF 2 ) 2 } 3 SiO 1/2 ]
Fluorination of a unit of [(O 3/2 Si) 4 Q 4 ] (where Q 4 represents a tetravalent organic group represented by the formula (7a)) and a unit of [SiO 2 ] Silicone resin.

【0038】[0038]

【化13】 [Chemical 13]

【0039】リ)[{CF3(CF23(CH22
2(C25)SiO1/2]のユニット及び[(O3/2
i)44](但し、Q4は式(8a)で示される4価の
有機基を表す。)のユニットからなるフッ素化シリコー
ン樹脂。
I) [{CF 3 (CF 2 ) 3 (CH 2 ) 2 }
2 (C 2 H 5 ) SiO 1/2 ] unit and [(O 3/2 S
i) 4 Q 4 ] (wherein Q 4 represents a tetravalent organic group represented by the formula (8a)).

【0040】[0040]

【化14】 Embedded image

【0041】ヌ)[{CF3(CF23(CH22
2{C25}SiO1/2]のユニット、[O3/2SiQ2
iO3/2](但し、Q2は−(CH23−を表す。)のユ
ニット及び[O3/2SiQ2'SiO3/2](但し、Q2'は
式(9a)で示される2価の有機基を表す。)のユニッ
トからなるフッ素化シリコーン樹脂。
N) [{CF 3 (CF 2 ) 3 (CH 2 ) 2 }
2 {C 2 H 5 } SiO 1/2 ] unit, [O 3/2 SiQ 2 S
iO 3/2] (where, Q 2 is - (CH 2) 3 - represents a.) the unit and [O 3/2 SiQ 2 'SiO 3/2 ] ( where, Q 2' has the formula (9a) Represents a divalent organic group as shown).

【0042】[0042]

【化15】 [Chemical 15]

【0043】ル)[{CF3(CF27(CH22
{C252SiO1/2]のユニット、[O3/2SiQ2
iO3/2](但し、Q2は−(CH22S(CH23−を
表す。)のユニット及び[O3/2SiQ2'SiO3/2
(但しQ2'は、前記式(9a)で示される2価の有機基
を表す。)のユニットからなるフッ素化シリコーン樹
脂。
Le) [{CF 3 (CF 2 ) 7 (CH 2 ) 2 }
{C 2 H 5 } 2 SiO 1/2 ] unit, [O 3/2 SiQ 2 S
iO 3/2 ] (however, Q 2 represents — (CH 2 ) 2 S (CH 2 ) 3 —) and [O 3/2 SiQ 2 'SiO 3/2 ].
(However, Q 2 'represents a divalent organic group represented by the above formula (9a).) A fluorinated silicone resin comprising a unit.

【0044】ヲ)[{CF3(CF25}{CH32
iO1/2]のユニット、[O3/2SiQ2SiO3/2](但
しQ2は、前記式(1a)で示される2価の有機基を表
す。)のユニット、[O3/2SiQ2'SiO3/2](但し
2'は、前記式(9a)で示される2価の有機基を表
す。)のユニット及び[SiO2]のユニットからなる
フッ素化シリコーン樹脂。
W) [{CF 3 (CF 2 ) 5 } {CH 3 } 2 S
iO 1/2 ] unit, [O 3/2 SiQ 2 SiO 3/2 ] (wherein Q 2 represents a divalent organic group represented by the formula (1a)), [O 3 / 2 SiQ 2 'SiO 3/2 ] (wherein Q 2 ' represents a divalent organic group represented by the formula (9a)) and a unit of [SiO 2 ].

【0045】<フッ素化シリコーン樹脂の製造方法>次
に本発明のフッ素化シリコーン樹脂の製造方法について
説明する。本発明方法では、まず一般式(III)の加水
分解性珪素化合物Qn[Si(X) 3nに水を添加し、
加水分解重縮合を行う。この場合、必要に応じて珪素化
合物Si(X)4 を混合し、前記珪素化合物(III)と
の共加水分解重縮合を行ってもよい。水の添加量は、反
応の進行を制御するため、用いた珪素化合物の加水分解
性の基Xを加水分解させるのに必要な理論量以下の量が
好ましい。
<Method for producing fluorinated silicone resin>
Regarding the method for producing the fluorinated silicone resin of the present invention
explain. In the method of the present invention, first, the water of the general formula (III) is added.
Degradable silicon compound Qn[Si (X) 3]nAdd water to
Perform hydrolysis polycondensation. In this case, if necessary, siliconization
Compound Si (X)Four Are mixed with the silicon compound (III)
You may perform the cohydrolysis polycondensation of. The amount of water added is
Hydrolysis of the silicon compound used to control the reaction progress
The amount below the theoretical amount required to hydrolyze the volatile group X is
preferable.

【0046】この時、反応を均一に進行させるため有機
溶媒を用いることが好ましい。有機溶媒は反応に用いる
珪素化合物を溶解できるものであればよく、特に限定さ
れない。反応温度は0〜80℃が好ましい。低すぎると
溶媒の凝固が起こったり、高すぎると溶媒の極端な蒸発
が起こったりして反応の進行が不均一になる。
At this time, it is preferable to use an organic solvent in order to allow the reaction to proceed uniformly. The organic solvent is not particularly limited as long as it can dissolve the silicon compound used in the reaction. The reaction temperature is preferably 0 to 80 ° C. If it is too low, coagulation of the solvent occurs, and if it is too high, extreme evaporation of the solvent occurs and the reaction progresses unevenly.

【0047】また、反応の進行を促進するため、塩基及
び/又は酸を触媒として用いることが好ましい。塩基及
び/又は酸触媒の添加量は反応に用いる珪素化合物の5
モル%以下が好ましい。
Further, in order to accelerate the progress of the reaction, it is preferable to use a base and / or an acid as a catalyst. The amount of base and / or acid catalyst added is 5 for the silicon compound used in the reaction.
It is preferably not more than mol%.

【0048】この加水分解重縮合の反応式の一例を化1
6に、また得られる重縮合体のネットワーク構造の一例
を化17に示す。
An example of the reaction formula of this hydrolysis polycondensation is shown below.
6 and an example of the network structure of the polycondensate obtained is shown in Chemical formula 17.

【0049】[0049]

【化16】 [Chemical 16]

【0050】(但し、化16中Q2は2価の有機基を表
す。)
(However, Q 2 in Chemical formula 16 represents a divalent organic group.)

【0051】[0051]

【化17】 [Chemical 17]

【0052】(但し、化17中Q2は2価の有機基を表
す。)
(However, Q 2 in Chemical Formula 17 represents a divalent organic group.)

【0053】以上の加水分解重縮合工程で使用される材
料の詳細は次の通りである。 一般式(III)の加水分解性珪素化合物Qn[Si(X)
3n:公知の珪素化合物の公知の有機反応によって合成
される。例えばアミノ基を有するアルコキシシラン、ク
ロロシラン[NH236Si(OR)3、NH236
3]等と酸クロライド、無水酸等の酸誘導体との反
応;不飽和結合を有する化合物へのハイドロジェンシラ
ン又はメルカプトシランの付加反応;アルコキシシラン
化合物又はクロロシラン化合物とグリニャール試薬又は
有機リチウム化合物との反応などにより合成される。こ
の一般式(III)の加水分解性珪素化合物Qn[Si
(X)3n中におけるQnについては、前述の一般式
(I)でのQnと同様である。また、一般式(III)中に
おいてXは、加水分解性の基であれば特に制限されず、
互いに同一であっても異なっていてもよい。
Details of the materials used in the above-mentioned hydrolysis polycondensation step are as follows. The hydrolyzable silicon compound of the general formula (III) Q n [Si (X)
3 ] n : Synthesized by a known organic reaction of a known silicon compound. For example, alkoxysilane having an amino group, chlorosilane [NH 2 C 3 H 6 Si (OR) 3 , NH 2 C 3 H 6 C
[ 3 ] etc. with an acid derivative such as acid chloride or anhydride; addition reaction of hydrogensilane or mercaptosilane to a compound having an unsaturated bond; alkoxysilane compound or chlorosilane compound and Grignard reagent or organolithium compound It is synthesized by the reaction of. This hydrolyzable silicon compound of the general formula (III) Q n [Si
For Q n in the (X) 3] n, it is the same as Q n in the above general formula (I). In general formula (III), X is not particularly limited as long as it is a hydrolyzable group,
They may be the same or different from each other.

【0054】本発明の製造方法では、この加水分解性珪
素化合物の少なくとも1種を原料として用いるが、好ま
しくは、加水分解性珪素化合物として、一般式(III)
にQnとしてジカルボン酸のジアミドを含む2価の有機
基を導入した加水分解性珪素化合物及び一般式(III)
にQnとしてジカルボン酸のジアミドを含む2価の有機
基以外の2価の有機基を導入した加水分解性珪素化合物
を組み合わせて用いる。
In the production method of the present invention, at least one of the hydrolyzable silicon compounds is used as a raw material, and preferably the hydrolyzable silicon compound is represented by the general formula (III)
A hydrolyzable silicon compound in which a divalent organic group containing a diamide of a dicarboxylic acid is introduced as Q n , and a general formula (III)
Is used in combination with a hydrolyzable silicon compound in which a divalent organic group other than the divalent organic group containing a diamide of dicarboxylic acid is introduced as Q n .

【0055】珪素化合物Si(X)4:樹脂の固さを調
節するために添加する。添加量が多ければ樹脂は固くな
り、少なければ柔らかくなる。上記一般式中のXは、加
水分解性の基であれば特に制限されず、互いに同一であ
っても異なっていてもよい。この様な珪素化合物の具体
例としては四塩化珪素、テトラメトキシシラン、テトラ
エトキシシラン、テトラn−プロポキシシラン、テトラ
イソプロポキシシラン等、好ましくは四塩化珪素、テト
ラメトキシシラン、テトラエトキシシランが挙げられ
る。
Silicon compound Si (X) 4 : added to adjust the hardness of the resin. The resin will be harder if the added amount is larger, and softer if the added amount is smaller. Xs in the general formula are not particularly limited as long as they are hydrolyzable groups, and they may be the same or different. Specific examples of such a silicon compound include silicon tetrachloride, tetramethoxysilane, tetraethoxysilane, tetra-n-propoxysilane, tetraisopropoxysilane and the like, preferably silicon tetrachloride, tetramethoxysilane and tetraethoxysilane. .

【0056】有機溶媒:上記二種の珪素化合物、水、触
媒などを溶解するものであれば特に限定されず、メチル
アルコール、エチルアルコール、イソプロピルアルコー
ル等のアルコール類;アセトン、メチルエチルケトン等
のケトン類;メチルセロソルブ、エチルセロソルブ等の
セロソルブ類;テトラヒドロキシフラン;ジメチルスル
フォキシド等が挙げられる。
Organic solvent: not particularly limited as long as it can dissolve the above-mentioned two kinds of silicon compounds, water, catalysts and the like, alcohols such as methyl alcohol, ethyl alcohol and isopropyl alcohol; ketones such as acetone and methyl ethyl ketone; Cellosolves such as methyl cellosolve and ethyl cellosolve; tetrahydroxyfuran; dimethylsulfoxide and the like.

【0057】塩基及び/又は酸触媒:塩酸、硝酸等の無
機酸;酢酸、クエン酸等の有機酸;水酸化ナトリウム、
アンモニア水等の無機塩基;アミン、モルフォリン等の
有機塩基;3−アミノアルコキシシランのような塩基性
基含有シラン等、好ましくはアミノ置換基、4,5−ジ
ヒドロイミダゾール置換基等の塩基性基含有シラン、例
えば3−アミノプロピルトリメトキシシラン、3−アミ
ノプロピルトリエトキシシラン、3−(4,5−ジヒド
ロイミダゾール)プロピルトリエトキシシラン、N−β
−(アミノエチル)−γ−アミノプロピルトリメトキシ
シラン等が挙げられる。
Base and / or acid catalyst: inorganic acids such as hydrochloric acid and nitric acid; organic acids such as acetic acid and citric acid; sodium hydroxide,
Inorganic bases such as aqueous ammonia; organic bases such as amines and morpholines; basic group-containing silanes such as 3-aminoalkoxysilanes; preferably basic groups such as amino substituents and 4,5-dihydroimidazole substituents Containing silanes, such as 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3- (4,5-dihydroimidazole) propyltriethoxysilane, N-β
Examples thereof include-(aminoethyl) -γ-aminopropyltrimethoxysilane.

【0058】次に、一定時間重縮合反応を行った後、得
られた重縮合体の反応末端を封鎖して重縮合体を安定に
取り出すため、末端封鎖剤として一般式(IV)の珪素化
合物(R13SiXを添加し反応させる。この時、末端
封鎖剤の加水分解を促進して末端封鎖反応を進行しやす
くするため、水及び酸触媒も合わせて添加する。水の添
加量は特に限定されないが、添加した末端封鎖剤を加水
分解するのに必要な理論量以上の量を添加することが望
ましい。また酸触媒の添加量は一般式(IV)の末端封鎖
剤の2モル%以上が好ましい。
Next, after carrying out a polycondensation reaction for a certain period of time, in order to stably take out the polycondensate by blocking the reaction end of the obtained polycondensate, a silicon compound of the general formula (IV) is used as an end-capping agent. (R 1 ) 3 SiX is added and reacted. At this time, water and an acid catalyst are also added together in order to accelerate the hydrolysis of the terminal blocking agent and facilitate the progress of the terminal blocking reaction. The amount of water added is not particularly limited, but it is desirable to add water in an amount not less than the theoretical amount necessary for hydrolyzing the added end-blocking agent. Further, the addition amount of the acid catalyst is preferably 2 mol% or more of the end capping agent of the general formula (IV).

【0059】またこの末端封鎖工程は、反応を均一に進
行させるため攪拌条件下で行う。反応時間は4〜20時
間が好ましい。反応終了後は重縮合体が相分離する場合
はデカンテーションで、また相分離しない場合は溶媒留
去、凍結乾燥などの方法によって目的物を取り出す。
The end-blocking step is carried out under stirring conditions in order to allow the reaction to proceed uniformly. The reaction time is preferably 4 to 20 hours. After completion of the reaction, if the polycondensate undergoes phase separation, decantation is carried out. If the phase separation is not carried out, the intended product is taken out by a method such as solvent removal or freeze drying.

【0060】上記重縮合体と末端封鎖剤との反応で得ら
れるフッ素化シリコーン樹脂のネットワーク構造におけ
る末端封鎖状況の一例を下記に示す。
An example of the terminal blocking state in the network structure of the fluorinated silicone resin obtained by the reaction of the above polycondensate and the terminal blocking agent is shown below.

【0061】[0061]

【化18】 [Chemical 18]

【0062】(但し、化18中Q2は2価の有機基を表
す。また、R1は互いに同一であっても異なっていても
よく、炭化水素基、又は水素原子の少なくとも一部がフ
ッ素原子で置換された炭化水素基を表し、且つ三つのR
1の内、少なくとも一つは前記フッ素置換炭化水素基で
なければならない。)
(However, Q 2 in the chemical formula 18 represents a divalent organic group. R 1 s may be the same or different from each other, and a hydrocarbon group or at least a part of hydrogen atoms is fluorine. Represents a hydrocarbon group substituted with atoms and has three R
At least one of 1 must be the above-mentioned fluorine-substituted hydrocarbon group. )

【0063】以上の末端封鎖工程で使用される材料の詳
細は次の通りである。 一般式(IV)の(R13SiX :上記一般式(IV)
中、R1は互いに同一であっても異なっていてもよく、
炭化水素基、又は水素原子の少なくとも一部がフッ素原
子で置換された炭化水素基を表し、且つ三つのR1
内、少なくとも一つは前記フッ素置換炭化水素基でなけ
ればならないが、好ましくは、アルキル基、フェニル
基、アリール基及びこれらの基の水素原子の少なくとも
一部がフッ素原子で置換された基より選ばれる基であ
り、例えば、メチル基、エチル基、n−プロピル基、イ
ソプロピル基、n−ブチル基、sec−ブチル基、tert−
ブチル基等のアルキル基;フェニル基;アリール基;又
は、これらの基の水素原子の少なくとも一部がフッ素原
子で置換された基等が挙げられる。また、上記一般式
(IV)中、Xは加水分解性の基であれば特に制限されな
いが、アルコキシ基、ハロゲン原子又はアルコキシアル
コキシ基等を好ましく挙げることができる。
Details of the materials used in the above end-capping step are as follows. (R 1 ) 3 SiX of the general formula (IV): the above general formula (IV)
R 1 may be the same or different from each other,
A hydrocarbon group, or a hydrocarbon group in which at least a part of hydrogen atoms are substituted with fluorine atoms, and at least one of three R 1 's must be the above-mentioned fluorine-substituted hydrocarbon group, preferably , An alkyl group, a phenyl group, an aryl group and a group in which at least a part of hydrogen atoms of these groups are substituted with a fluorine atom, and examples thereof include a methyl group, an ethyl group, an n-propyl group and an isopropyl group. , N-butyl group, sec-butyl group, tert-
Examples thereof include an alkyl group such as a butyl group; a phenyl group; an aryl group; or a group in which at least a part of hydrogen atoms of these groups are substituted with a fluorine atom. Further, in the general formula (IV), X is not particularly limited as long as it is a hydrolyzable group, and an alkoxy group, a halogen atom, an alkoxyalkoxy group or the like can be preferably mentioned.

【0064】この様な化合物として具体的には、(CF3
CH2)3Si(OCH3)、[CF3(CF2)2]2(CH3)Si
Cl、[CF3(CF2)5](CH3)2Si(OC25)、[CF
3(CF2)3(CH2)2]2(C25)SiCl等が挙げられ、
該当するフルオロアルキル基を有するグリニャール試薬
又はリチウム塩と公知の珪素化合物との反応によって容
易に合成できる。すなわち
Specific examples of such a compound include (CF 3
CH 2) 3 Si (OCH 3 ), [CF 3 (CF 2) 2] 2 (CH 3) Si
Cl, [CF 3 (CF 2 ) 5] (CH 3) 2 Si (OC 2 H 5), [CF
3 (CF 2) 3 (CH 2) 2] 2 (C 2 H 5) SiCl and the like,
It can be easily synthesized by reacting a Grignard reagent or lithium salt having a corresponding fluoroalkyl group with a known silicon compound. Ie

【0065】[0065]

【化19】 (R)nSi(OR)4-n+mRfMgZ →(Rf)mSi(OR)4-n-m+mMg(OR)Z (R)nSiCl4-n+mRfMgZ →(Rf)mSiCl4-n-m+mMgClZ RnSiCl4-n+mRfLi→(Rf)mSiCl4-n-m+mLiCl (但し、Rfはフルオロアルキル基、Rは炭化水素基、
ZはBr又はI、nは0〜2のいずれか、mは1〜3の
いずれかを表す。)
Embedded image (R) n Si (OR) 4-n + mR f MgZ → (R f ) m Si (OR) 4-nm + m Mg (OR) Z (R) n SiCl 4-n + mR f MgZ → (R f ) m SiCl 4-nm + mMgClZ R n SiCl 4-n + mR f Li → (R f ) m SiCl 4-nm + mLiCl (wherein R f is a fluoroalkyl group, R is a hydrocarbon group,
Z represents Br or I, n represents 0 to 2 and m represents 1 to 3. )

【0066】酸触媒:具体的には塩酸、硝酸等の無機
酸;酢酸、クエン酸等の有機酸;好ましくは塩酸、硝
酸、酢酸等の揮発性の酸が挙げられる。
Acid catalysts: Specifically, inorganic acids such as hydrochloric acid and nitric acid; organic acids such as acetic acid and citric acid; preferably volatile acids such as hydrochloric acid, nitric acid and acetic acid.

【0067】[0067]

【作用】従来の三次元シリコーン樹脂は化1に示すよう
に、R基によってネットワーク構造が寸断され、分子の
連続性が低いのに対し、本発明の三次元フッ素化シリコ
ーン樹脂は例えば化18に示すように、Qnで示される
有機基が樹脂のネットワーク構造の一部となっているの
で、分子の連続性が向上し、これにより柔軟で強固で均
一な薄い被膜が得られる。
In the conventional three-dimensional silicone resin, as shown in Chemical formula 1, the network structure is broken by the R group and the continuity of the molecule is low, whereas the three-dimensional fluorinated silicone resin of the present invention is represented by Chemical formula 18, for example. As shown, since the organic group represented by Q n is a part of the network structure of the resin, the continuity of molecules is improved, whereby a flexible, strong and uniform thin film can be obtained.

【0068】[0068]

【実施例】以下に本発明を一般式(III)の珪素化合物
n[Si(X)3nの製造例及び一般式(IV)のフッ
素置換型末端封鎖珪素化合物(R13SiXの製造例と
共にフッ素化シリコーン樹脂の製造実施例によって説明
する。 <Qn[Si(X)3nの製造例>
EXAMPLES The present invention will be described below with reference to production examples of a silicon compound Q n [Si (X) 3 ] n of the general formula (III) and a fluorine-substituted end-capped silicon compound (R 1 ) 3 SiX of the general formula (IV). The production example of the fluorinated silicone resin will be described together with the production example of. <Production Example of Qn [Si (X) 3 ] n >

【0069】[0069]

【製造例1】耐圧ビン型の反応容器にアリルトリクロロ
シラン70.2g、モノハイドロジェントリクロロシラ
ン54.2gを採り混合した。次に塩化白金酸H2Pt
Cl6・6H2Oをテトラヒドロフラン中で加熱し、白金
0.2ミリモルに相当するこの溶液を前述の混合溶液に
添加した後、反応容器を80℃で4時間加熱した。ろ
過、分留を行ってテトラヒドロフラン、塩化白金酸を除
去して透明液体を得た。IR、1H−NMR、13C−N
MR、29Si−NMR測定を行ったところ、この液体が
式(1b)で表される化合物であることが確認された。
[Production Example 1] 70.2 g of allyltrichlorosilane and 54.2 g of monohydrogentrichlorosilane were placed in a pressure-resistant bottle type reaction vessel and mixed. Next, chloroplatinic acid H 2 Pt
After Cl 6 .6H 2 O was heated in tetrahydrofuran and this solution corresponding to 0.2 mmol of platinum was added to the above mixed solution, the reaction vessel was heated at 80 ° C. for 4 hours. Filtration and fractional distillation were performed to remove tetrahydrofuran and chloroplatinic acid to obtain a transparent liquid. IR, 1 H-NMR, 13 C-N
When MR and 29 Si-NMR measurements were performed, it was confirmed that this liquid was a compound represented by the formula (1b).

【0070】[0070]

【化20】 Cl3Si(CH23SiCl3 ・・・(1b)Embedded image Cl 3 Si (CH 2 ) 3 SiCl 3 ... (1b)

【0071】[0071]

【製造例2】還流冷却器、攪拌装置及びガス導入管付き
三つ口フラスコにテレフタル酸ジアリル49.3g、3
−メルカプトトリメトキシシラン78.6g、ベンゼン
450mlを採り、攪拌混合した。さらに、この溶液
に、アゾビスイソブチロニトリル0.5gをベンゼン5
0mlに溶解した溶液を添加し、攪拌混合した。攪拌を
続けながら、室温で乾燥窒素ガスによるバブリングを1
時間行った後、加熱してベンゼンの沸点で24時間還流
を行って反応を完結させた。ロータリーエバポレーター
でベンゼンを除去して粘性液体を得た。IR、1H−N
MR、13C−NMR、29Si−NMR測定を行ったとこ
ろ、この液体が式(2b)で表される化合物であること
が確認された。
[Production Example 2] 49.3 g of diallyl terephthalate was placed in a three-necked flask equipped with a reflux condenser, a stirrer and a gas inlet tube.
-Mercaptotrimethoxysilane 78.6 g and benzene 450 ml were taken and mixed with stirring. Furthermore, to this solution, 0.5 g of azobisisobutyronitrile was added to 5 parts of benzene.
A solution dissolved in 0 ml was added and mixed with stirring. While continuing to stir, bubbling dry nitrogen gas at room temperature 1
After the reaction was carried out for a period of time, it was heated and refluxed at the boiling point of benzene for 24 hours to complete the reaction. Benzene was removed by a rotary evaporator to obtain a viscous liquid. IR, 1 H-N
When MR, 13 C-NMR, and 29 Si-NMR measurements were performed, it was confirmed that this liquid was a compound represented by the formula (2b).

【0072】[0072]

【化21】 [Chemical 21]

【0073】[0073]

【製造例3】還流冷却器、攪拌装置及びガス導入管付き
三つ口フラスコにビニルトリメトキシシラン44.5
g、3−メルカプトトリメトキシシラン58.9g、ベ
ンゼン400mlを採り攪拌混合した。さらにこの溶液
に、アゾビスイソブチロニトリル0.5gをベンゼン5
0mlに溶解した溶液を添加し、攪拌混合した。攪拌を
続けながら、室温で乾燥窒素ガスによるバブリングを1
時間行った後、加熱してベンゼンの沸点で24時間還流
を行って反応を完結させた。ロータリーエバポレーター
でベンゼンを除去して粘性液体を得た。IR、1H−N
MR、13C−NMR、29Si−NMR測定を行ったとこ
ろ、この液体が式(3b)で表される化合物であること
が確認された。
[Production Example 3] Vinyltrimethoxysilane 44.5 was placed in a three-necked flask equipped with a reflux condenser, a stirrer and a gas inlet tube.
g, 58.9 g of 3-mercaptotrimethoxysilane and 400 ml of benzene were taken and mixed with stirring. Furthermore, 0.5 g of azobisisobutyronitrile was added to benzene 5 in this solution.
A solution dissolved in 0 ml was added and mixed with stirring. While continuing to stir, bubbling dry nitrogen gas at room temperature 1
After the reaction was carried out for a period of time, it was heated and refluxed at the boiling point of benzene for 24 hours to complete the reaction. Benzene was removed by a rotary evaporator to obtain a viscous liquid. IR, 1 H-N
When MR, 13 C-NMR, and 29 Si-NMR measurements were performed, it was confirmed that this liquid was a compound represented by the formula (3b).

【0074】[0074]

【化22】 (CH3O)3Si(CH22S(CH23Si(OCH33 ・・・(3b)Embedded image (CH 3 O) 3 Si (CH 2 ) 2 S (CH 2 ) 3 Si (OCH 3 ) 3 ... (3b)

【0075】[0075]

【製造例4】還流冷却器、攪拌装置及びガス導入管付き
三つ口フラスコに3−アミノプロピルトリエトキシシラ
ン110.7g、ジエチルエーテル400ml、トリエ
チルアミン100mlを採り氷冷しつつ攪拌混合した。
さらに、氷冷攪拌を続けながらこの溶液に、3−ブテノ
イルクロライド45.3gをジエチルエーテル100m
lに溶解した溶液を滴下した。滴下後さらに1時間攪拌
を続けた。生成した白色沈殿をろ別した後、ロータリー
エバポレーターでジエチルエーテル、トリエチルアミン
を除去して粘性液体を得た。
[Production Example 4] 110.7 g of 3-aminopropyltriethoxysilane, 400 ml of diethyl ether, and 100 ml of triethylamine were placed in a three-necked flask equipped with a reflux condenser, a stirrer, and a gas introduction tube, and mixed with stirring while cooling with ice.
Further, 45.3 g of 3-butenoyl chloride was added to 100 ml of diethyl ether while stirring with ice cooling.
The solution dissolved in 1 was added dropwise. After the dropping, stirring was continued for another hour. The white precipitate formed was filtered off, and then diethyl ether and triethylamine were removed by a rotary evaporator to obtain a viscous liquid.

【0076】耐圧ビン型の反応容器に上記の液体82.
7g、モノハイドロジェントリエトキシシラン49.3
gを採り混合した。次に塩化白金酸H2PtCl6・6H
2Oをテトラヒドロフラン中で加熱し、白金0.2ミリ
モルに相当するこの溶液を前述の混合溶液に添加した
後、反応容器を80℃で4時間加熱した。ろ過、分留を
行ってテトラヒドロフラン、塩化白金酸を除去して透明
液体を得た。IR、1H−NMR、13C−NMR、29
i−NMR測定を行ったところ、この液体が式(4b)
で表される化合物であることが確認された。
The above liquid 82.
7 g, monohydrogentriethoxysilane 49.3
g and mixed. Next, chloroplatinic acid H 2 PtCl 6・ 6H
2 O was heated in tetrahydrofuran and this solution corresponding to 0.2 mmol platinum was added to the above mixed solution and then the reaction vessel was heated at 80 ° C. for 4 hours. Filtration and fractional distillation were performed to remove tetrahydrofuran and chloroplatinic acid to obtain a transparent liquid. IR, 1 H-NMR, 13 C-NMR, 29 S
As a result of i-NMR measurement, this liquid was found to have the formula (4b).
It was confirmed that the compound was represented by

【0077】[0077]

【化23】 [Chemical formula 23]

【0078】[0078]

【製造例5】耐圧ビン型の反応容器にグリセリントリ1
0−ウンデセノエート177.3g、モノハイドロジェ
ントリメトキシシラン110.0gを採り混合した。次
に塩化白金酸H2PtCl6・6H2Oをテトラヒドロフ
ラン中で加熱し、白金0.2ミリモルに相当するこの溶
液を前述の混合溶液に添加した後、反応容器を80℃で
4時間加熱した。ろ過、分留を行ってテトラヒドロフラ
ン、塩化白金酸を除去して透明液体を得た。IR、1
−NMR、13C−NMR、29Si−NMR測定を行った
ところ、この液体が式(5b)で表される化合物である
ことが確認された。
[Production Example 5] Glycerin tri-1 was placed in a pressure-resistant bottle type reaction vessel.
177.3 g of 0-undecenoate and 110.0 g of monohydrogentrimethoxysilane were taken and mixed. Then, chloroplatinic acid H 2 PtCl 6 .6H 2 O was heated in tetrahydrofuran, and this solution corresponding to 0.2 mmol of platinum was added to the above mixed solution, and then the reaction vessel was heated at 80 ° C. for 4 hours. . Filtration and fractional distillation were performed to remove tetrahydrofuran and chloroplatinic acid to obtain a transparent liquid. IR, 1 H
By -NMR, 13 C-NMR, and 29 Si-NMR measurements, it was confirmed that this liquid was a compound represented by the formula (5b).

【0079】[0079]

【化24】 [Chemical formula 24]

【0080】[0080]

【製造例6】還流冷却器、攪拌装置及びガス導入管付き
三つ口フラスコに1,2,4−トリビニルシクロヘキサ
ン48.7g、3−メルカプトトリス(β−メトキシメ
トキシ)シラン257.8g、ベンゼン800mlを採
り攪拌混合した。さらにこの溶液に、アゾビスイソブチ
ロニトリル0.8gをベンゼン100mlに溶解した溶
液を添加し、攪拌混合した。攪拌を続けながら、室温で
乾燥窒素ガスによるバブリングを1時間行った後、加熱
してベンゼンの沸点で24時間還流を行って反応を完結
させた。ロータリーエバポレーターでベンゼンを除去し
て粘性液体を得た。IR、1H−NMR、13C−NM
R、29Si−NMR測定を行ったところ、この液体が式
(6b)で表される化合物であることが確認された。
[Production Example 6] 1,3,4-trivinylcyclohexane 48.7 g, 3-mercaptotris (β-methoxymethoxy) silane 257.8 g, and benzene were placed in a three-necked flask equipped with a reflux condenser, a stirrer, and a gas inlet tube. 800 ml was taken and mixed by stirring. Further, a solution prepared by dissolving 0.8 g of azobisisobutyronitrile in 100 ml of benzene was added to this solution, and the mixture was stirred and mixed. After bubbling with dry nitrogen gas at room temperature for 1 hour while continuing stirring, the mixture was heated to reflux at the boiling point of benzene for 24 hours to complete the reaction. Benzene was removed by a rotary evaporator to obtain a viscous liquid. IR, 1 H-NMR, 13 C-NM
When R, 29 Si-NMR measurement was performed, it was confirmed that this liquid was a compound represented by the formula (6b).

【0081】[0081]

【化25】 [Chemical 25]

【0082】[0082]

【製造例7】還流冷却器、攪拌装置及びガス導入管付き
三つ口フラスコに3−アミノプロピルトリクロロシラン
57.9g、ジエチルエーテル320ml、トリエチル
アミン80mlを採り氷冷しつつ攪拌混合した。さら
に、氷冷攪拌を続けながらこの溶液にトリメゾイルクロ
ライド26.8gをジエチルエーテル100mlに溶解
した溶液を滴下した。滴下後さらに1時間を攪拌を続け
た。生成した白色沈殿をろ別した後、ロータリーエバポ
レーターでジエチルエーテル、トリエチルアミンを除去
して白色固体を得た。IR、1H−NMR、13C−NM
R、29Si−NMR測定を行ったところ、この固体が式
(7b)で表される化合物であることが確認された。
[Production Example 7] 57.9 g of 3-aminopropyltrichlorosilane, 320 ml of diethyl ether and 80 ml of triethylamine were placed in a three-necked flask equipped with a reflux condenser, a stirrer and a gas inlet tube, and the mixture was stirred and mixed while cooling with ice. Further, a solution prepared by dissolving 26.8 g of trimesoyl chloride in 100 ml of diethyl ether was added dropwise to this solution while continuing stirring with ice cooling. After the dropping, stirring was continued for another hour. After the generated white precipitate was filtered off, diethyl ether and triethylamine were removed by a rotary evaporator to obtain a white solid. IR, 1 H-NMR, 13 C-NM
When R, 29 Si-NMR measurement was performed, it was confirmed that this solid was a compound represented by the formula (7b).

【0083】[0083]

【化26】 [Chemical formula 26]

【0084】[0084]

【製造例8】還流冷却器、攪拌装置及びガス導入管付き
三つ口フラスコに3,3’−ジアミノベンジジン64.
3g、テトラヒドロフラン900ml、トリエチルアミ
ン200mlを採り、氷冷しつつ攪拌混合した。さら
に、氷冷攪拌を続けながらこの溶液に、アクリロイルク
ロライド108.6gをテトラヒドロフランmlに溶解
した溶液を滴下した。滴下後さらに1時間攪拌を続け
た。生成した白色沈殿をろ別した後、ロータリーエバポ
レーターで、テトラヒドロフラントリエチルアミンを除
去して白色固体を得た。
[Production Example 8] 3,3′-diaminobenzidine 64. was added to a three-necked flask equipped with a reflux condenser, a stirrer and a gas inlet tube.
3 g, 900 ml of tetrahydrofuran and 200 ml of triethylamine were taken and mixed with stirring while cooling with ice. Further, a solution prepared by dissolving 108.6 g of acryloyl chloride in tetrahydrofuran ml was added dropwise to this solution while continuing stirring with ice cooling. After the dropping, stirring was continued for another hour. The white precipitate thus formed was filtered off, and then tetrahydrofuran triethylamine was removed by a rotary evaporator to obtain a white solid.

【0085】耐圧ビン型の反応容器に上記の固体86.
1g、モノハイドロジェントリメトキシシラン97.8
gを採り混合した。次に塩化白金酸H2PtCl6・6H
2Oをテトラヒドロフラン中で加熱し、白金0.2ミリ
モルに相当するこの溶液を前述の混合溶液に添加した
後、反応容器を80℃で4時間加熱した。ろ過、分留を
行ってテトラヒドロフラン、塩化白金酸を除去して白色
固体を得た。IR、1H−NMR、13C−NMR、29
i−NMR測定を行ったところ、この固体が式(8b)
で表される化合物であることが確認された。
The solid 86.
1 g, monohydrogentrimethoxysilane 97.8
g and mixed. Next, chloroplatinic acid H 2 PtCl 6・ 6H
2 O was heated in tetrahydrofuran and this solution corresponding to 0.2 mmol platinum was added to the above mixed solution and then the reaction vessel was heated at 80 ° C. for 4 hours. Filtration and fractional distillation were performed to remove tetrahydrofuran and chloroplatinic acid to obtain a white solid. IR, 1 H-NMR, 13 C-NMR, 29 S
As a result of i-NMR measurement, this solid was found to have the formula (8b).
It was confirmed that the compound was represented by

【0086】[0086]

【化27】 [Chemical 27]

【0087】[0087]

【製造例9】還流冷却器、攪拌装置及びガス導入管付き
三つ口フラスコにペンタエリトリトールテトラメタクリ
レート81.7g、3−メルカプトトリエトキシシラン
190.7g、ベンゼン800mlを採り、攪拌混合し
た。さらにこの溶液に、アゾビスイソブチロニトリル
0.5gをベンゼン100mlに溶解した溶液を添加
し、攪拌混合した。攪拌を続けながら、室温で乾燥窒素
ガスによるバブリングを1時間行った後、加熱してベン
ゼンの沸点で24時間還流を行って反応を完結させた。
ロータリーエバポレーターでベンゼンを除去して粘性液
体を得た。IR、1H−NMR、13C−NMR、29Si
−NMR測定を行ったところ、この液体が式(9b)で
表される化合物であることが確認された。
[Production Example 9] Pentaerythritol tetramethacrylate (81.7 g), 3-mercaptotriethoxysilane (190.7 g) and benzene (800 ml) were placed in a three-necked flask equipped with a reflux condenser, a stirrer and a gas inlet tube, and mixed with stirring. Further, to this solution, a solution prepared by dissolving 0.5 g of azobisisobutyronitrile in 100 ml of benzene was added and mixed with stirring. After bubbling with dry nitrogen gas at room temperature for 1 hour while continuing stirring, the mixture was heated to reflux at the boiling point of benzene for 24 hours to complete the reaction.
Benzene was removed by a rotary evaporator to obtain a viscous liquid. IR, 1 H-NMR, 13 C-NMR, 29 Si
-By NMR measurement, it was confirmed that this liquid was a compound represented by the formula (9b).

【0088】[0088]

【化28】 [Chemical 28]

【0089】[0089]

【製造例10】還流冷却器、攪拌装置及びガス導入管付
き三つ口フラスコにグリセロール−1,3−ジアリルエ
ーテル27.6g、テトラヒドロフラン200ml、ト
リエチルアミン50mlを採り、氷冷しつつ攪拌混合し
た。さらに、氷冷攪拌を続けながらこの溶液に、アジポ
イルクロライド14.6gをテトラヒドロフラン100
mlに溶解した溶液を滴下した。滴下後さらに1時間攪
拌を続けた。生成した白色沈殿をろ別した後、ロータリ
ーエバポレーターでジエチルエーテル、トリエチルアミ
ンを除去して粘性液体を得た。
[Production Example 10] 27.6 g of glycerol-1,3-diallyl ether, 200 ml of tetrahydrofuran and 50 ml of triethylamine were placed in a three-necked flask equipped with a reflux condenser, a stirrer and a gas introduction tube, and the mixture was stirred and mixed while cooling with ice. Further, 14.6 g of adipoyl chloride was added to 100 parts of tetrahydrofuran while stirring with ice cooling.
The solution dissolved in ml was added dropwise. After the dropping, stirring was continued for another hour. The white precipitate formed was filtered off, and then diethyl ether and triethylamine were removed by a rotary evaporator to obtain a viscous liquid.

【0090】耐圧ビン型の反応容器に上記の液体28.
2g、モノハイドロジェントリクロロシシラン54.2
gを採り混合した。次に、塩化白金酸H2PtCl6・6
2Oをテトラヒドロフラン中で加熱し、白金0.2ミ
リモルに相当するこの溶液を前述の混合溶液に添加した
後、反応容器を80℃で4時間加熱した。分留を行って
テトラヒドロフラン、塩化白金酸を除去して透明液体を
得た。IR、1H−NMR、13C−NMR、29Si−N
MR測定を行ったところ、この液体が式(10b)で表
される化合物であることが確認された。
The above liquid 28.
2 g, monohydrogentrichlorocysilane 54.2
g and mixed. Next, chloroplatinic acid H 2 PtCl 6・ 6
H 2 O was heated in tetrahydrofuran and this solution corresponding to 0.2 mmol platinum was added to the above mixed solution and then the reaction vessel was heated at 80 ° C. for 4 hours. Fractional distillation was performed to remove tetrahydrofuran and chloroplatinic acid to obtain a transparent liquid. IR, 1 H-NMR, 13 C-NMR, 29 Si-N
When MR measurement was performed, it was confirmed that this liquid was a compound represented by the formula (10b).

【0091】[0091]

【化29】 [Chemical 29]

【0092】[0092]

【製造例11】還流冷却器、攪拌装置およびガス導入管
付き三つ口フラスコに3−アミノプロピルトリメトキシ
シラン107.6g、テトラヒドロフラン600ml、
トリエチルアミン200mlを採り氷冷しつつ攪拌混合
した。さらに、氷冷攪拌を続けながらこの溶液に、テレ
フタル酸クロリド60.9gをテトラヒドロフラン20
0mlに溶解した溶液を滴下した。滴下後さらに1時間
攪拌を続けた。生成した白色沈殿をろ別した後、ロータ
リーポレーターでテトラヒドロフラン、トリエチルアミ
ンを除去して白色固体を得た。IR、1 H−NMR、13
C−NMR、29Si−NMR測定を行ったところ、この
固体が式(11b)で表される化合物であることが確認
された。
[Production Example 11] 107.6 g of 3-aminopropyltrimethoxysilane, 600 ml of tetrahydrofuran in a three-necked flask equipped with a reflux condenser, a stirrer and a gas introduction tube,
200 ml of triethylamine was taken and mixed with stirring while cooling with ice. Further, while continuing stirring with ice cooling, 60.9 g of terephthaloyl chloride was added to 20 ml of tetrahydrofuran in this solution.
A solution dissolved in 0 ml was added dropwise. After the dropping, stirring was continued for another hour. The white precipitate formed was filtered off, and then tetrahydrofuran and triethylamine were removed by a rotary evaporator to obtain a white solid. IR, 1 H-NMR, 13
When C-NMR and 29 Si-NMR measurements were performed, it was confirmed that this solid was a compound represented by the formula (11b).

【0093】[0093]

【化30】 [Chemical 30]

【0094】[0094]

【製造例12】還流冷却器、攪拌装置およびガス導入管
付き三つ口フラスコに3−アミノプロピルトリクロロシ
シラン96.5g、ジエチルエーテル500ml、トリ
エチルアミン150mlを採り氷冷しつつ攪拌混合し
た。さらに、氷冷攪拌を続けながらこの溶液に、イソフ
タル酸クロリド50.8gをジエチルエーテル150m
lに溶解した溶液を滴下した。滴下後さらに1時間攪拌
を続けた。生成した白色沈殿をろ別した後、ロータリー
ポレーターでジエチルエーテル、トリエチルアミンを除
去して白色固体を得た。IR、1 H−NMR、13C−N
MR、29Si−NMR測定を行ったところ、この固体が
(12b)で表される化合物であることが確認された。
[Production Example 12] 96.5 g of 3-aminopropyltrichlorocysilane, 500 ml of diethyl ether and 150 ml of triethylamine were placed in a three-necked flask equipped with a reflux condenser, a stirrer and a gas inlet tube, and the mixture was stirred and mixed while cooling with ice. Further, while continuing ice-cooling stirring, 50.8 g of isophthalic acid chloride was added to 150 ml of diethyl ether in this solution.
The solution dissolved in 1 was added dropwise. After the dropping, stirring was continued for another hour. After the generated white precipitate was filtered off, diethyl ether and triethylamine were removed by a rotary evaporator to obtain a white solid. IR, 1 H-NMR, 13 C-N
When MR and 29 Si-NMR measurements were performed, it was confirmed that this solid was a compound represented by (12b).

【0095】[0095]

【化31】 [Chemical 31]

【0096】<(R13SiXの製造例><Production Example of (R 1 ) 3 SiX>

【0097】[0097]

【製造例13】十分に乾燥を行った還流冷却器、攪拌装
置及びガス導入管付き三つ口フラスコに金属マグシウム
8.7gを採り、乾燥窒素ガスで十分置換を行う。さら
に、この反応容器に金属ナトリウムによる還流と蒸留と
によって脱水精製したテトラヒドロフラン150mlを
採り、攪拌混合した。攪拌を続けながら、この溶液に、
前述のテトラヒドロフラン200mlに2、2、2−ト
リフルオロエチルヨーダイド63.0gを溶解した溶液
を滴下した。さらに攪拌を続けながら、氷冷下で、前述
のテトラヒドロフラン150mlにテトラメトキシシラ
ン15.2gを溶解した溶液を滴下した。滴下終了後、
テトラヒドロフランの沸点で還流を24時間行って反応
を完結させた。生成した沈殿をろ別後、分留を行って目
的化合物を単離した。なお、全ての操作は乾燥窒素ガス
気流下で行った。IR、1H−NMR、13C−NMR、
29Si−NMR測定を行ったところ、式(13b)で表
される目的化合物が単離されていることを確認した。
MANUFACTURING EXAMPLE 13 8.7 g of metal magnesium was placed in a three-necked flask equipped with a reflux condenser, a stirrer and a gas inlet tube, which had been sufficiently dried, and was sufficiently replaced with dry nitrogen gas. Further, 150 ml of tetrahydrofuran dehydrated and refined by refluxing with sodium metal and distillation was placed in this reaction vessel and mixed with stirring. While continuing to stir, add to this solution,
A solution prepared by dissolving 63.0 g of 2,2,2-trifluoroethyl iodide in 200 ml of the above-mentioned tetrahydrofuran was added dropwise. While continuing stirring, a solution prepared by dissolving 15.2 g of tetramethoxysilane in 150 ml of the above-mentioned tetrahydrofuran was added dropwise under ice cooling. After the dropping is completed,
Refluxing was carried out for 24 hours at the boiling point of tetrahydrofuran to complete the reaction. After filtering the formed precipitate, fractional distillation was performed to isolate the target compound. All operations were performed under a dry nitrogen gas stream. IR, 1 H-NMR, 13 C-NMR,
When 29 Si-NMR measurement was performed, it was confirmed that the target compound represented by the formula (13b) was isolated.

【0098】[0098]

【化32】 (CF3CH23Si(OCH3) ・・・(13b)Embedded image (CF 3 CH 2 ) 3 Si (OCH 3 ) (13b)

【0099】[0099]

【製造例14】十分に乾燥を行った還流冷却器、攪拌装
置及びガス導入管付き三つ口フラスコに金属マグシウム
3.0gを採り、乾燥窒素ガスで十分置換を行う。さら
に、この反応容器に金属ナトリウムによる還流と蒸留と
によって脱水精製したテトラヒドロフラン100mlを
採り、攪拌混合した。攪拌を続けながら、この溶液に、
前述のテトラヒドロフラン300mlにパーフルオロヘ
キシルヨーダイド44.6gを溶解した溶液を滴下し
た。さらに攪拌を続けながら、氷冷下で、前述のテトラ
ヒドロフラン200mlにジメチルジエトキシシラン1
4.8gを溶解した溶液を滴下した。滴下終了後、テト
ラヒドロフランの沸点で還流を24時間行って反応を完
結させた。生成した沈殿をろ別後、分留を行って目的化
合物を単離した。なお、全ての操作は乾燥窒素ガス気流
下で行った。IR、1H−NMR、13C−NMR、29
i−NMR測定を行って式(14b)で表される目的化
合物が単離されていることを確認した。
[Production Example 14] 3.0 g of metal magnesium was placed in a three-necked flask equipped with a reflux condenser, a stirrer, and a gas introduction tube, which had been sufficiently dried, and was sufficiently replaced with dry nitrogen gas. Further, 100 ml of tetrahydrofuran dehydrated and refined by refluxing with sodium metal and distillation was placed in this reaction vessel and mixed with stirring. While continuing to stir, add to this solution,
A solution of 44.6 g of perfluorohexyl iodide in 300 ml of the above-mentioned tetrahydrofuran was added dropwise. While continuing stirring, dimethyldiethoxysilane 1 was added to 200 ml of the above-mentioned tetrahydrofuran under ice cooling.
A solution in which 4.8 g was dissolved was added dropwise. After completion of the dropwise addition, reflux was carried out at the boiling point of tetrahydrofuran for 24 hours to complete the reaction. After filtering the formed precipitate, fractional distillation was performed to isolate the target compound. All operations were performed under a dry nitrogen gas stream. IR, 1 H-NMR, 13 C-NMR, 29 S
It was confirmed that the target compound represented by the formula (14b) was isolated by performing i-NMR measurement.

【0100】[0100]

【化33】 [CF3(CF25](CH32Si(OC25) ・・・(14b)Embedded image [CF 3 (CF 2 ) 5 ] (CH 3 ) 2 Si (OC 2 H 5 ) (14b)

【0101】[0101]

【製造例15】十分に乾燥を行った還流冷却器、攪拌装
置及びガス導入管付き三つ口フラスコに金属マグシウム
5.3g及びよう素0.05gを採り、乾燥窒素ガスで
十分置換を行う。さらに、この反応容器に金属ナトリウ
ムによる還流と蒸留とによって脱水精製したジエチルエ
ーテル500mlにパーフルオロブチルヨーダイド6
9.2g及びエチルトリメトキシラン15.0gを溶解
した溶液を滴下した。滴下終了後、攪拌を続けながら室
温で2時間放置し反応を完結させた。生成した沈殿をろ
別後、分留を行って目的化合物を単離した。尚、全ての
操作は乾燥窒素ガス気流下で行った。IR、1H−NM
R、13C−NMR、29Si−NMR測定を行ったとこ
ろ、式(15b)で表される目的化合物が単離されてい
ることを確認した。
[Production Example 15] 5.3 g of metal magnesium and 0.05 g of iodine were placed in a three-necked flask equipped with a reflux condenser, a stirrer, and a gas introduction tube, which had been sufficiently dried, and the nitrogen gas was sufficiently replaced with dry nitrogen gas. Furthermore, perfluorobutyl iodide 6 was added to 500 ml of diethyl ether dehydrated and purified by refluxing with sodium metal and distillation in this reaction vessel.
A solution in which 9.2 g and 15.0 g of ethyltrimethoxylane were dissolved was added dropwise. After completion of the dropping, the reaction was completed by leaving it for 2 hours at room temperature while continuing stirring. After filtering the formed precipitate, fractional distillation was performed to isolate the target compound. All the operations were performed under a dry nitrogen gas stream. IR, 1 H-NM
When R, 13 C-NMR and 29 Si-NMR measurements were performed, it was confirmed that the target compound represented by the formula (15b) was isolated.

【0102】[0102]

【化34】 [CF3(CF232(C25)Si(OCH3) ・・・(15b)Embedded image [CF 3 (CF 2 ) 3 ] 2 (C 2 H 5 ) Si (OCH 3 ) (15b)

【0103】[0103]

【製造例16】十分に乾燥を行った還流冷却器、攪拌装
置及びガス導入管付き三つ口フラスコに金属マグシウム
5.6gを採り、乾燥窒素ガスで十分置換を行う。さら
に、この反応容器に金属ナトリウムによる還流と蒸留と
によって脱水精製したテトラヒドロフラン100mlを
採り、攪拌混合した。攪拌を続けながら、この溶液に、
前述のテトラヒドロフラン300mlにパーフルオロプ
ロピルブロミド52.3gを溶解した溶液を滴下した。
さらに攪拌を続けながら、氷冷下で、前述のテトラヒド
ロフラン100mlにテトラクロロシラン11.9gを
溶解した溶液を滴下した。滴下終了後、テトラヒドロフ
ランの沸点で還流を24時間行って反応を完結させた。
生成した沈殿をろ別後、分留を行って目的化合物を単離
した。なお、全ての操作は乾燥窒素ガス気流下で行っ
た。IR、1H−NMR、13C−NMR、29Si−NM
R測定を行ったところ、式(16b)で表される目的化
合物が単離されていることを確認した。
[Production Example 16] 5.6 g of metal magnesium was placed in a three-necked flask equipped with a reflux condenser, a stirrer, and a gas introduction tube, which had been sufficiently dried, and was sufficiently replaced with dry nitrogen gas. Further, 100 ml of tetrahydrofuran dehydrated and refined by refluxing with sodium metal and distillation was placed in this reaction vessel and mixed with stirring. While continuing to stir, add to this solution,
A solution prepared by dissolving 52.3 g of perfluoropropyl bromide in 300 ml of the above-mentioned tetrahydrofuran was added dropwise.
While continuing stirring, a solution prepared by dissolving 11.9 g of tetrachlorosilane in 100 ml of the above-mentioned tetrahydrofuran was added dropwise under ice cooling. After completion of the dropwise addition, reflux was carried out at the boiling point of tetrahydrofuran for 24 hours to complete the reaction.
After filtering the formed precipitate, fractional distillation was performed to isolate the target compound. All operations were performed under a dry nitrogen gas stream. IR, 1 H-NMR, 13 C-NMR, 29 Si-NM
When R measurement was performed, it was confirmed that the target compound represented by the formula (16b) was isolated.

【0104】[0104]

【化35】 [CF3(CF223SiCl ・・・(16b)Embedded image [CF 3 (CF 2 ) 2 ] 3 SiCl ... (16b)

【0105】[0105]

【製造例17】乾燥窒素ガスで十分置換を行った還流冷
却器、攪拌装置及びガス導入管付き三つ口フラスコに1
H,1H,2H,2H−ノナフルオロヘキシルリチウム
50.8gを及び金属ナトリウムによる還流と蒸留とに
よって脱水精製したジエチルエーテル400ml採り攪
拌混合した。攪拌を続けながら、この溶液に、前述のジ
エチルエーテル100mlにエチルトリクロロシラン1
6.4gを溶解した溶液を滴下した。滴下終了後、さら
に2時間攪拌を続けた後、還流を8時間行って反応を完
結させた。生成した沈殿をろ別後、分留を行って目的化
合物を単離した。なお、全ての操作は乾燥窒素ガス気流
下で行った。IR、1H−NMR、13C−NMR、29
i−NMR測定を行ったところ、式(17b)で表され
る目的化合物が単離されていることを確認した。
[Production Example 17] 1 in a three-necked flask equipped with a reflux condenser, a stirrer and a gas introduction tube, which was sufficiently replaced with dry nitrogen gas.
50.8 g of H, 1H, 2H, 2H-nonafluorohexyl lithium and 400 ml of diethyl ether dehydrated and purified by refluxing with sodium metal and distillation were taken and mixed with stirring. While continuing to stir, add 100 ml of the above diethyl ether to 1 ml of ethyltrichlorosilane in the solution.
A solution in which 6.4 g was dissolved was added dropwise. After the dropwise addition was completed, stirring was continued for another 2 hours, and then reflux was performed for 8 hours to complete the reaction. After filtering the formed precipitate, fractional distillation was performed to isolate the target compound. All operations were performed under a dry nitrogen gas stream. IR, 1 H-NMR, 13 C-NMR, 29 S
When i-NMR measurement was performed, it was confirmed that the target compound represented by the formula (17b) was isolated.

【0106】[0106]

【化36】 [CF3(CF23(CH222(C25)SiCl ・・・(17b)Embedded image [CF 3 (CF 2 ) 3 (CH 2 ) 2 ] 2 (C 2 H 5 ) SiCl ... (17b)

【0107】[0107]

【製造例18】充分に乾燥を行った還流冷却器、攪拌装
置およびガス導入管付き三つ口フラスコに金属マグネシ
ウム5.8gを採り、乾燥窒素ガスで充分置換を行っ
た。さらに、この反応容器に金属ナトリウムによる還流
と蒸留とによって脱水生成したジエチルエーテル200
mlを採り攪拌混合した。攪拌を続けながら、この溶液
に前述のジエチルエーテル300mlに1H,1H,2
H,2Hヘプタデカフルオロデキシルヨーダイド11
4.8gを溶解した溶液を滴下した。さらに、攪拌を続
けながら、氷零下で、前述のジエチルエーテル200m
lにジエチルジメトキシシラン29.7gを溶解した溶
液を滴下した。滴下終了後ジエチルエーテルの沸点で還
流を24時間行って反応を完結させた。生成した沈殿を
ろ別後、分留を行って、目的の化合物を単離した。なお
全ての操作は乾燥窒素ガス気流下で行った。IR、1
−NMR、13C−NMR、29Si−NMR測定を行った
ところ、式(18b)で表される目的化合物が単離され
ていることを確認した。
MANUFACTURING EXAMPLE 18 5.8 g of metallic magnesium was placed in a three-necked flask equipped with a reflux condenser, a stirrer and a gas inlet tube, which had been sufficiently dried, and was sufficiently replaced with dry nitrogen gas. Furthermore, diethyl ether 200 was produced by dehydration in this reaction vessel by refluxing with sodium metal and distillation.
ml was taken and mixed by stirring. While continuing to stir, add 1H, 1H, 2 to 300 ml of the above diethyl ether.
H, 2H heptadecafluorodexyl iodide 11
A solution in which 4.8 g was dissolved was added dropwise. Further, while continuing stirring, the above-mentioned diethyl ether 200 m
A solution of 29.7 g of diethyldimethoxysilane dissolved in 1 was added dropwise. After completion of the dropping, reflux was carried out at the boiling point of diethyl ether for 24 hours to complete the reaction. After separating the formed precipitate by filtration, fractional distillation was performed to isolate the target compound. All the operations were performed under a stream of dry nitrogen gas. IR, 1 H
By -NMR, 13 C-NMR, and 29 Si-NMR measurements, it was confirmed that the target compound represented by the formula (18b) was isolated.

【0108】[0108]

【化37】 [CF3(CF27(CH22][C252Si(OCH3) ・・・(18b) <フッ素化シリコーン樹脂の製造実施例>Embedded image [CF 3 (CF 2 ) 7 (CH 2 ) 2 ] [C 2 H 5 ] 2 Si (OCH 3 ) (18b) <Production Example of Fluorinated Silicone Resin>

【0109】[0109]

【実施例1】冷却器、攪拌装置付き三つ口フラスコに製
造例1の珪素化合物64.0g、メチルエチルケトン1
50mlを採り、混合溶解した。攪拌を続けながらこの
溶液に、水9.0gをメチルエチルケトン50mlに溶
解した溶液を添加した。添加終了後、攪拌を続けながら
40℃で30分間放置した。この混合溶液に、製造例1
6の珪素化合物285.2g、水40.5g、メチルエ
チルケトン100ml、濃塩酸1.3mlからなる溶液
を添加し、攪拌をさらに続けながら40℃で4時間放置
した。反応終了後、系は二相に分離したので、デカンテ
ーションにより溶媒相を除去し、さらに5%炭酸水素ナ
トリウム溶液及び水で洗浄後、再びデカンテーションに
より水を除去し、80℃で一昼夜乾燥して重縮合物を単
離した。IR、13C−NMR、1H−NMR、29Si−
NMR測定を行ったところ、この重縮合体は[{CF3
(CF223SiO1/2]のユニット及び[O3/2Si
2SiO3/2](但し、Q2は−(CH23−で示され
る2価の有機基を表す。)のユニットからなるフッ素化
シリコーン樹脂であることが確認された。
Example 1 In a three-necked flask equipped with a condenser and a stirrer, 64.0 g of the silicon compound of Production Example 1 and 1 of methyl ethyl ketone
50 ml was taken and mixed and dissolved. A solution of 9.0 g of water in 50 ml of methyl ethyl ketone was added to this solution while continuing stirring. After the addition was completed, the mixture was left at 40 ° C. for 30 minutes while continuing stirring. In this mixed solution, Production Example 1
A solution consisting of 285.2 g of the silicon compound of No. 6, 40.5 g of water, 100 ml of methyl ethyl ketone, and 1.3 ml of concentrated hydrochloric acid was added, and the mixture was allowed to stand at 40 ° C. for 4 hours while continuing stirring. After the reaction was completed, the system separated into two phases, so the solvent phase was removed by decantation, further washed with a 5% sodium hydrogen carbonate solution and water, the water was removed again by decantation, and dried at 80 ° C for one day. The polycondensate was isolated. IR, 13 C-NMR, 1 H-NMR, 29 Si-
When NMR measurement was performed, this polycondensate was found to have [{CF 3
(CF 2 ) 2 } 3 SiO 1/2 ] unit and [O 3/2 Si
Q 2 SiO 3/2 ] (wherein Q 2 represents a divalent organic group represented by — (CH 2 ) 3 —) was confirmed to be a fluorinated silicone resin.

【0110】[0110]

【実施例2】冷却器、攪拌装置付き三つ口フラスコに製
造例2の珪素化合物89.6g、製造例3の珪素化合物
48.2g、3−アミノプロピルトリメトキシシラン
0.8gおよびエチルアルコール/テトラヒドロフラン
混合溶媒(重量比で7/3)300mlを採り、混合溶
解した。攪拌を続けながらこの溶液に、水9.1gを前
述の混合溶媒100mlに溶解した溶液を添加した。添
加終了後、攪拌を続けながら25℃で4時間放置した。
この混合溶液に製造例13の珪素化合物159.3g、
水100.8g、前述の混合溶媒200ml、濃塩酸
2.8mlからなる溶液を添加し、攪拌をさらに続けな
がら25℃で10時間放置した。反応終了後、系は二相
に分離したので、デカンテーションにより溶媒相を除去
し、さらに5%炭酸水素ナトリウム溶液及び水で洗浄
後、再びデカンテーションにより水を除去し、80℃で
一昼夜乾燥して重縮合物を単離した。IR、13C−NM
R、1H−NMR、29Si−NMR測定を行ったとこ
ろ、この重縮合体が[(CF3CH23SiO1/2]のユ
ニット、[O3/2SiQ2SiO3/2](但し、Q2は前記
式(1a)で示される2価の有機基を表す。)のユニッ
ト及び[O3/2SiQ'2SiO3/2](但し、Q'2は−
(CH22S(CH23−で示される2価の有機基を表
す。)のユニットからなるフッ素化シリコーン樹脂であ
ることが確認された。
Example 2 In a three-necked flask equipped with a condenser and a stirrer, 89.6 g of the silicon compound of Production Example 2, 48.2 g of the silicon compound of Production Example 3, 0.8 g of 3-aminopropyltrimethoxysilane and ethyl alcohol / 300 ml of tetrahydrofuran mixed solvent (7/3 by weight ratio) was taken and mixed and dissolved. A solution in which 9.1 g of water was dissolved in 100 ml of the above-mentioned mixed solvent was added to this solution while continuing stirring. After the addition was completed, the mixture was left at 25 ° C. for 4 hours while continuing stirring.
To this mixed solution, 159.3 g of the silicon compound of Production Example 13,
A solution consisting of 100.8 g of water, 200 ml of the mixed solvent described above, and 2.8 ml of concentrated hydrochloric acid was added, and the mixture was allowed to stand at 25 ° C. for 10 hours while continuing stirring. After the reaction was completed, the system separated into two phases, so the solvent phase was removed by decantation, further washed with a 5% sodium hydrogen carbonate solution and water, the water was removed again by decantation, and dried at 80 ° C for one day. The polycondensate was isolated. IR, 13 C-NM
When R, 1 H-NMR and 29 Si-NMR measurements were performed, the polycondensate was a unit of [(CF 3 CH 2 ) 3 SiO 1/2 ], [O 3/2 SiQ 2 SiO 3/2 ]. (However, Q 2 represents a divalent organic group represented by the above formula (1a)) and [O 3/2 SiQ ′ 2 SiO 3/2 ] (where Q ′ 2 is −
It represents a divalent organic group represented by - (CH 2) 2 S ( CH 2) 3. It was confirmed to be a fluorinated silicone resin composed of the unit (1).

【0111】[0111]

【実施例3】冷却器、攪拌装置付き三つ口フラスコに製
造例4の珪素化合物44.0g、テトラメトキシシラン
22.8g、3−(4,5−ジヒドロイミダゾール)プ
ロピルトリエトキシシラン2.1gおよびイソプロピル
アルコール400mlを採り、混合溶解した。攪拌を続
けながらこの溶液に、水10.1gをイソプロピルアル
コール100mlに溶解した溶液を添加した。添加終了
後、攪拌を続けながら60℃で2時間放置した。この混
合溶液に製造例14の珪素化合物506.8g、水5
4.0g、イソプロピルアルコール200ml、濃硝酸
3.0mlからなる溶液を添加し、攪拌をさらに続けな
がら60℃で16時間放置した。反応終了後、系は二相
に分離したので、デカンテーションにより溶媒相を除去
し、さらに5%炭酸水素ナトリウム溶液及び水で洗浄
後、凍結乾燥により水を除去して重縮合物を単離した。
IR、13C−NMR、1H−NMR、29Si−NMR測
定を行ったところ、この重縮合体が[{CF3(CF2
5}(CH32SiO1/2]のユニット、[SiO2]の
ユニット、及び[O3/2SiQ2SiO3/2](但し、Q2
は前記式(2a)で示される2価の有機基を表す。)の
ユニットからなるフッ素化シリコーン樹脂であることが
確認された。
Example 3 In a three-necked flask equipped with a condenser and a stirrer, 44.0 g of the silicon compound of Production Example 4, 22.8 g of tetramethoxysilane and 2.1 g of 3- (4,5-dihydroimidazole) propyltriethoxysilane. And 400 ml of isopropyl alcohol were taken and mixed and dissolved. A solution of 10.1 g of water dissolved in 100 ml of isopropyl alcohol was added to this solution while continuing stirring. After the addition was completed, the mixture was left at 60 ° C. for 2 hours while continuing stirring. 506.8 g of the silicon compound of Production Example 14 and 5 parts of water were added to this mixed solution.
A solution consisting of 4.0 g, 200 ml of isopropyl alcohol, and 3.0 ml of concentrated nitric acid was added, and the mixture was left standing at 60 ° C. for 16 hours while continuing stirring. After completion of the reaction, the system was separated into two phases, so the solvent phase was removed by decantation, further washed with 5% sodium hydrogen carbonate solution and water, and then water was removed by freeze-drying to isolate a polycondensate. .
When IR, 13 C-NMR, 1 H-NMR and 29 Si-NMR measurements were performed, this polycondensate was [{CF 3 (CF 2 )
5 } (CH 3 ) 2 SiO 1/2 ] unit, [SiO 2 ] unit, and [O 3/2 SiQ 2 SiO 3/2 ] (however, Q 2
Represents a divalent organic group represented by the above formula (2a). It was confirmed to be a fluorinated silicone resin composed of the unit (1).

【0112】[0112]

【実施例4】冷却器、攪拌装置付き三つ口フラスコに製
造例5の珪素化合物76.6g、トリエチルアミン0.
45gおよびエチルセロソルブ300mlを採り、混合
溶解した。攪拌を続けながらこの溶液に、水3.9gを
エチルセロソルブ100mlに溶解した溶液を添加し
た。添加終了後、攪拌を続けながら5℃で2時間放置し
た。この混合溶液に、製造例15の珪素化合物252.
6g、水43.2g、エチルセロソルブ150ml、濃
硝酸3.0mlからなる溶液を添加し、攪拌をさらに続
けながら20℃で8時間放置した。反応終了後、系は二
相に分離したので、デカンテーションにより溶媒相を除
去し、さらに5%炭酸水素ナトリウム溶液、水で洗浄後
再びデカンテーションにより水を除去し、80℃で一昼
夜乾燥して重縮合物を単離した。IR、13C−NMR、
1H−NMR、29Si−NMR測定を行ったところ、こ
の重縮合体が[{CF3(CF232(C25)SiO
1/2]のユニット及び[(O3/2Si)33](但し、Q
3は前記式(3a)で示される3価の有機基を表す。)
のユニットからなるフッ素化シリコーン樹脂であること
が確認された。
Example 4 In a three-necked flask equipped with a condenser and a stirrer, 76.6 g of the silicon compound of Production Example 5 and triethylamine (0.1%) were added.
45 g and 300 ml of ethyl cellosolve were taken and mixed and dissolved. A solution of 3.9 g of water dissolved in 100 ml of ethyl cellosolve was added to this solution while continuing stirring. After the addition was completed, the mixture was left for 2 hours at 5 ° C. while continuing stirring. To this mixed solution, the silicon compound 252.
A solution consisting of 6 g, 43.2 g of water, 150 ml of ethyl cellosolve and 3.0 ml of concentrated nitric acid was added, and the mixture was allowed to stand at 20 ° C. for 8 hours while continuing stirring. After the reaction was completed, the system was separated into two phases, so the solvent phase was removed by decantation, further washed with a 5% sodium hydrogen carbonate solution and water, and then water was removed by decantation again, followed by drying at 80 ° C. for one day. The polycondensate was isolated. IR, 13 C-NMR,
When 1 H-NMR and 29 Si-NMR measurements were performed, this polycondensate was found to be [{CF 3 (CF 2 ) 3 } 2 (C 2 H 5 ) SiO 2.
1/2 ] unit and [(O 3/2 Si) 3 Q 3 ] (however, Q
3 represents a trivalent organic group represented by the above formula (3a). )
It was confirmed to be a fluorinated silicone resin composed of a unit of.

【0113】[0113]

【実施例5】冷却器、攪拌装置付き三つ口フラスコに製
造例6の珪素化合物32.2g、テトラエトキシシラン
2.8g、酢酸0.18gおよびジメチルスルフォキシ
ド250mlを採り、混合溶解した。攪拌を続けながら
この溶液に、水5.5gをジメチルスルフォキシド50
mlに溶解した溶液を添加した。添加終了後、攪拌を続
けながら60℃で6時間放置した。この混合溶液に、製
造例14の珪素化合物114.0g、水13.4g、ジ
メチルスルフォキシド150ml、クエン酸4.0gか
らなる溶液を添加し、攪拌をさらに続けながら60℃で
18時間放置した。反応終了後、系は二相に分離したの
で、デカンテーションにより溶媒相を除去し、さらに5
%炭酸水素ナトリウム溶液及び水で洗浄後、凍結乾燥に
より水を除去して重縮合物を単離した。IR、13C−N
MR、1H−NMR、29Si−NMR測定を行ったとこ
ろ、この重縮合体が[{CF3(CF25}(CH32
SiO1/2]のユニット、[SiO2]のユニット及び
[(O3/2Si)33](但し、Q3は前記式(4a)で
示される3価の有機基を表す。)のユニットからなるフ
ッ素化シリコーン樹脂であることが確認された。
Example 5 32.2 g of the silicon compound of Production Example 6, 2.8 g of tetraethoxysilane, 0.18 g of acetic acid and 250 ml of dimethyl sulfoxide were placed in a three-necked flask equipped with a condenser and a stirrer and mixed and dissolved. While continuing stirring, 5.5 g of water was added to 50 ml of dimethyl sulfoxide.
A solution dissolved in ml was added. After the addition was completed, the mixture was left at 60 ° C. for 6 hours while continuing stirring. To this mixed solution was added a solution of 114.0 g of the silicon compound of Production Example 14, 13.4 g of water, 150 ml of dimethyl sulfoxide, and 4.0 g of citric acid, and the mixture was allowed to stand at 60 ° C. for 18 hours while continuing stirring. . After the reaction was completed, the system separated into two phases, so the solvent phase was removed by decantation, and the
After washing with a% sodium hydrogen carbonate solution and water, the polycondensate was isolated by removing water by freeze-drying. IR, 13 C-N
When MR, 1 H-NMR and 29 Si-NMR measurements were performed, this polycondensate was found to be [{CF 3 (CF 2 ) 5 } (CH 3 ) 2
SiO 1/2 ] unit, [SiO 2 ] unit and [(O 3/2 Si) 3 Q 3 ] (wherein Q 3 represents a trivalent organic group represented by the formula (4a)). It was confirmed to be a fluorinated silicone resin composed of a unit of.

【0114】[0114]

【実施例6】冷却器、攪拌装置付き三つ口フラスコに製
造例7の珪素化合物88.5g、テトラヒドロフラン5
00mlを採り混合溶解した。攪拌を続けながらこの溶
液に、水15.6g及び濃アンモニア水1.5mlをテ
トラヒドロフラン100mlに溶解した溶液を添加し
た。添加終了後、攪拌を続けながら10℃で1時間放置
した。この混合溶液に製造例17の珪素化合物366.
1g、水45.Og、テトラヒドロフラン300ml、
酢酸5.0gからなる溶液を添加し、攪拌をさらに続け
ながら10℃で4時間放置した。反応終了後、系は二相
に分離したので、デカンテーションにより溶媒相を除去
し、さらに5%炭酸水素ナトリウム溶液及び水で洗浄
後、再びデカンテーションにより水を除去し、80℃で
一昼夜乾燥して重縮合物を単離した。IR、13C−NM
R、1H−NMR、29Si−NMR測定を行ったとこ
ろ、この重縮合体が[{CF3(CF23(CH222
(C25)SiO1/2]のユニット及び[(O32
i)33](但し、Q3は前記式(5a)で示される3
価の有機基を表す。)のユニットからなるフッ素化シリ
コーン樹脂であることが確認された。
Example 6 In a three-necked flask equipped with a condenser and a stirrer, 88.5 g of the silicon compound of Production Example 7 and 5 tetrahydrofuran
00 ml was taken and mixed and dissolved. A solution of 15.6 g of water and 1.5 ml of concentrated aqueous ammonia in 100 ml of tetrahydrofuran was added to this solution while continuing stirring. After the addition was completed, the mixture was left standing at 10 ° C. for 1 hour while continuing stirring. To this mixed solution, the silicon compound 366.
1 g, water 45. Og, 300 ml of tetrahydrofuran,
A solution consisting of 5.0 g of acetic acid was added and left to stand at 10 ° C. for 4 hours with further stirring. After the reaction was completed, the system separated into two phases, so the solvent phase was removed by decantation, further washed with a 5% sodium hydrogen carbonate solution and water, the water was removed again by decantation, and dried at 80 ° C for one day. The polycondensate was isolated. IR, 13 C-NM
When R, 1 H-NMR and 29 Si-NMR measurements were performed, this polycondensate was found to be [{CF 3 (CF 2 ) 3 (CH 2 ) 2 } 2
(C 2 H 5) units of SiO 1/2] and [(O 3/2 S
i) 3 Q 3 ] (wherein Q 3 is 3 represented by the above formula (5a))
Represents a valent organic group. It was confirmed to be a fluorinated silicone resin composed of the unit (1).

【0115】[0115]

【実施例7】冷却器、攪拌装置付き三つ口フラスコに製
造例8の珪素化合物18.1g、製造例3の珪素化合物
4.1g、テトラメトキシシラン0.9g、テトラヒド
ロフラン300ml及び3−アミノプロピルメトキシシ
ラン0.6gを採り、混合溶解した。攪拌を続けながら
この溶液に、水6.0gをテトラヒドロフラン100m
lに溶解した溶液を添加した。添加終了後、攪拌を続け
ながら20℃で3時間放置した。この混合溶液に製造例
13の珪素化合物85.3g、水59.4g、テトラヒ
ドロフラン250ml、濃塩酸3.0mlからなる溶液
を添加し、攪拌をさらに続けながら20℃で12時間放
置した。反応終了後、系は二相に分離したので、デカン
テーションにより溶媒相を除去し、さらに5%炭酸水素
ナトリウム溶液及び水で洗浄後、再びデカンテーション
により水を除去し、80℃で一昼夜乾燥して重縮合物を
単離した。IR、13C−NMR、1H−NMR、29Si
−NMR測定を行ったところ、この重縮合体が[(CF
3CH23SiO1/2]のユニット、[SiO2]のユニ
ット、[O3/2SiQ2SiO3/2](但し、Q2は−(C
22S(CH23−で示される2価の有機基を表
す。)のユニット及び[(O3/2Si)44](但し、
4は前記式(6a)で示される4価の有機基を表
す。)のユニットからなるフッ素化シリコーン樹脂であ
ることが確認された。
Example 7 In a three-necked flask equipped with a condenser and a stirrer, 18.1 g of the silicon compound of Production Example 8, 4.1 g of the silicon compound of Production Example 3, 0.9 g of tetramethoxysilane, 300 ml of tetrahydrofuran and 3-aminopropyl were added. 0.6 g of methoxysilane was taken and mixed and dissolved. While continuing stirring, 6.0 g of water was added to 100 m of tetrahydrofuran in this solution.
The solution dissolved in 1 was added. After the addition was completed, the mixture was left standing at 20 ° C. for 3 hours while continuing stirring. To this mixed solution was added a solution of 85.3 g of the silicon compound of Production Example 13, 59.4 g of water, 250 ml of tetrahydrofuran, and 3.0 ml of concentrated hydrochloric acid, and the mixture was allowed to stand at 20 ° C. for 12 hours while continuing stirring. After the reaction was completed, the system separated into two phases, so the solvent phase was removed by decantation, further washed with a 5% sodium hydrogen carbonate solution and water, the water was removed again by decantation, and dried at 80 ° C for one day. The polycondensate was isolated. IR, 13 C-NMR, 1 H-NMR, 29 Si
As a result of NMR measurement, it was confirmed that this polycondensate had [(CF
3 CH 2) 3 units of SiO 1/2], [Unit SiO 2], [O 3/2 SiQ 2 SiO 3/2] ( where, Q 2 is - (C
It represents a divalent organic group represented by - H 2) 2 S (CH 2) 3. ) Unit and [(O 3/2 Si) 4 Q 4 ] (however,
Q 4 represents a tetravalent organic group represented by the above formula (6a). It was confirmed to be a fluorinated silicone resin composed of the unit (1).

【0116】[0116]

【実施例8】冷却器、攪拌装置付き三つ口フラスコに製
造例9の珪素化合物98.1g、テトラエトキシシラン
1.7g、イソプロピルアルコール/テトラヒドロフラ
ン混合溶媒(重量比7/3)700ml及びモルフォリ
ン2.1gを採り、混合溶解した。攪拌を続けながらこ
の溶液に、水3.1gを前述の混合溶媒100mlに溶
解した溶液を添加した。添加終了後、攪拌を続けながら
20℃で4時間放置した。この混合溶液に製造例16の
珪素化合物456.4g、水64.8g、前述の混合溶
媒400ml、濃塩酸7.5mlからなる溶液を添加
し、攪拌をさらに続けながら20℃で12時間放置し
た。反応終了後、系は二相に分離したので、デカンテー
ションにより溶媒相を除去し、さらに5%炭酸水素ナト
リウム溶液及び水で洗浄後、再びデカンテーションによ
り水を除去し、80℃で一昼夜乾燥して重縮合物を単離
した。IR、13C−NMR、1H−NMR、29Si−N
MR測定を行ったところ、この重縮合体が[{CF
3(CF223SiO1/2]のユニット、[(O3/2
i)44](但し、Q4は前記式(7a)で示される4
価の有機基を表す。)のユニット及び[SiO2]のユ
ニットからなるフッ素化シリコーン樹脂であることが確
認された。
Example 8 In a three-necked flask equipped with a condenser and a stirrer, 98.1 g of the silicon compound of Production Example 9, 1.7 g of tetraethoxysilane, 700 ml of an isopropyl alcohol / tetrahydrofuran mixed solvent (weight ratio 7/3) and morpholine. 2.1 g was taken and mixed and dissolved. While continuing stirring, a solution prepared by dissolving 3.1 g of water in 100 ml of the above-mentioned mixed solvent was added to this solution. After the addition was completed, the mixture was left standing at 20 ° C. for 4 hours while continuing stirring. A solution consisting of 456.4 g of the silicon compound of Production Example 16, 64.8 g of water, 400 ml of the mixed solvent described above, and 7.5 ml of concentrated hydrochloric acid was added to this mixed solution, and the mixture was allowed to stand at 20 ° C. for 12 hours while continuing stirring. After the reaction was completed, the system separated into two phases, so the solvent phase was removed by decantation, further washed with a 5% sodium hydrogen carbonate solution and water, the water was removed again by decantation, and dried at 80 ° C for one day. The polycondensate was isolated. IR, 13 C-NMR, 1 H-NMR, 29 Si-N
When MR measurement was performed, this polycondensate was [{CF
3 (CF 2 ) 2 } 3 SiO 1/2 ] unit, [(O 3/2 S
i) 4 Q 4 ] (wherein Q 4 is 4 in the formula (7a)).
Represents a valent organic group. It was confirmed to be a fluorinated silicone resin composed of the unit (1) and the unit [SiO 2 ].

【0117】[0117]

【実施例9】冷却器、攪拌装置付き三つ口フラスコに製
造例10の珪素化合物82.4g、アセトン400ml
を採り、混合溶解した。攪拌を続けながらこの溶液に、
水21.6gをアセトン100mlに溶解した溶液を添
加した。添加終了後、攪拌を続けながら20℃で1時間
放置した。この混合溶液に、製造例17の珪素化合物2
34.7g、水36.0g、アセトン200ml、濃塩
酸7.0mlからなる溶液を添加し、攪拌をさらに続け
ながら20℃で4時間放置した。反応終了後、系は二相
に分離したので、デカンテーションにより溶媒相を除去
し、さらに5%炭酸水素ナトリウム溶液及び水で洗浄
後、再びデカンテーションにより水を除去し、80℃で
一昼夜乾燥して重縮合物を単離した。IR、13C−NM
R、1H−NMR、29Si−NMR測定を行ったとこ
ろ、この重縮合体が[{CF3(CF23(CH222
(C25)SiO1/2]のユニット及び[(O3/2Si)
44](但し、Q4は式(8a)で示される4価の有機
基を表す。)のユニットからなるフッ素化シリコーン樹
脂であることが確認された。
Example 9 82.4 g of the silicon compound of Production Example 10 and 400 ml of acetone were placed in a three-necked flask equipped with a condenser and a stirrer.
Were collected and mixed and dissolved. While continuing to stir, add to this solution
A solution of 21.6 g of water dissolved in 100 ml of acetone was added. After the addition was completed, the mixture was left at 20 ° C. for 1 hour while continuing stirring. The silicon compound 2 of Production Example 17 was added to this mixed solution.
A solution consisting of 34.7 g, water 36.0 g, acetone 200 ml, and concentrated hydrochloric acid 7.0 ml was added, and the mixture was left at 20 ° C. for 4 hours while continuing stirring. After the reaction was completed, the system separated into two phases, so the solvent phase was removed by decantation, further washed with a 5% sodium hydrogen carbonate solution and water, the water was removed again by decantation, and dried at 80 ° C for one day. The polycondensate was isolated. IR, 13 C-NM
When R, 1 H-NMR and 29 Si-NMR measurements were performed, this polycondensate was found to be [{CF 3 (CF 2 ) 3 (CH 2 ) 2 } 2
(C 2 H 5 ) SiO 1/2 ] unit and [(O 3/2 Si)
4 Q 4 ] (provided that Q 4 represents a tetravalent organic group represented by the formula (8a)) and is a fluorinated silicone resin.

【0118】[0118]

【実施例10】冷却器、攪拌装置付き三つ口フラスコに
製造例1の化合物24.9g、製造例12の化合物6
1.9g、テトラヒドロフラン250mlを採り混合溶
解した。攪拌を続けながらこの溶液に水16.2gをテ
トラヒドロフラン70mlに溶解した溶液を添加した。
添加終了後攪拌を続けながら20℃で1時間放置した。
この混合溶液に製造例17の珪素化合物469.3g、
水24.3g、テトラヒドロフラン150ml、濃塩酸
3mlからなる溶液を添加し、攪拌をさらに続けながら
20℃で8時間放置した。反応後水を少量加えると系は
二相に分離したので、デカンテーションにより溶媒相を
除去し、ロータリーエバポレーターで残存する揮発成分
を除去して重縮合物を単離した。IR、1H−NMR、
13C−NMR、29Si−NMR測定を行ったところ、こ
の重縮合体が[{CF3(CF23(CH222{C2
5}SiO1/2]のユニット、[O3/2SiQ2SiO
3/2](但し、Q2は−(CH23−を表す。)のユニッ
ト及び[O3/2SiQ2'SiO3/ 2](但しQ2'は、前記
式(9a)で示される2価の有機基を表す。)のユニッ
トからなるフッ素化シリコーン樹脂であることが確認さ
れた。
Example 10 24.9 g of the compound of Production Example 1 and the compound 6 of Production Example 12 were placed in a three-necked flask equipped with a condenser and a stirrer.
1.9 g and 250 ml of tetrahydrofuran were taken and mixed and dissolved. While continuing stirring, a solution prepared by dissolving 16.2 g of water in 70 ml of tetrahydrofuran was added to this solution.
After completion of the addition, the mixture was left standing at 20 ° C. for 1 hour while continuing stirring.
To this mixed solution, 469.3 g of the silicon compound of Production Example 17,
A solution consisting of 24.3 g of water, 150 ml of tetrahydrofuran and 3 ml of concentrated hydrochloric acid was added, and the mixture was left at 20 ° C. for 8 hours while further stirring. When a small amount of water was added after the reaction, the system separated into two phases, so the solvent phase was removed by decantation and the remaining volatile components were removed by a rotary evaporator to isolate the polycondensate. IR, 1 H-NMR,
When 13 C-NMR and 29 Si-NMR measurements were carried out, this polycondensate was found to be [{CF 3 (CF 2 ) 3 (CH 2 ) 2 } 2 {C 2
H 5 } SiO 1/2 ] unit, [O 3/2 SiQ 2 SiO
3/2] (wherein, Q 2 is - (CH 2) 3 -. A representative) units and [O 3/2 SiQ 2 'SiO 3 /2] ( where Q 2' is the above formula (9a) It was confirmed to be a fluorinated silicone resin composed of a unit of the divalent organic group shown below.

【0119】[0119]

【実施例11】冷却器、攪拌装置付き三つ口フラスコに
製造例3の化合物38.8g、製造例11の化合物1
8.3g、3−アミノプロピルトリメトキシシラン1.
1g、エチルアルコール100mlを採り混合溶解し
た。攪拌を続けながらこの溶液に水8.2gをエチルア
ルコール40mlに溶解した溶液を添加した。添加終了
後攪拌を続けながら20℃で2時間放置した。この混合
溶液に製造例18の珪素化合物169.2g、水12.
2g、エチルアルコール60ml、濃塩酸1.5mlか
らなる溶液を添加し、攪拌をさらに続けながら20℃で
16時間放置した。反応後系は二相に分離したので、デ
カンテーションにより溶媒相を除去し、5%炭酸水素ナ
トリウム溶液および水で洗浄後ロータリーエバポレータ
ーで残存する揮発成分を除去して重縮合物を単離した。
IR、1H−NMR、13C−NMR、29Si−NMR測
定を行ったところ、この重縮合体が[{CF3(CF2
7(CH22}{C252SiO1/2]のユニット、
[O3/2SiQ2SiO3/2](但し、Q2は−(CH22
S(CH23−を表す。)のユニット及び[O3/2Si
2'SiO3/2](但しQ2'は、前記式(9a)で示さ
れる2価の有機基を表す。)のユニットからなるフッ素
化シリコーン樹脂であることが確認された。
Example 11 38.8 g of the compound of Production Example 3 and the compound 1 of Production Example 11 were placed in a three-necked flask equipped with a condenser and a stirrer.
8.3 g, 3-aminopropyltrimethoxysilane 1.
1 g and 100 ml of ethyl alcohol were taken and mixed and dissolved. A solution of 8.2 g of water in 40 ml of ethyl alcohol was added to this solution while continuing stirring. After the addition was completed, the mixture was left standing at 20 ° C. for 2 hours while continuing stirring. To this mixed solution, 169.2 g of the silicon compound of Production Example 18 and 12.
A solution consisting of 2 g, 60 ml of ethyl alcohol and 1.5 ml of concentrated hydrochloric acid was added, and the mixture was allowed to stand at 20 ° C. for 16 hours while continuing stirring. After the reaction, the system was separated into two phases, so the solvent phase was removed by decantation, and the polycondensate was isolated by removing the volatile components remaining on the rotary evaporator after washing with a 5% sodium hydrogen carbonate solution and water.
When IR, 1 H-NMR, 13 C-NMR, and 29 Si-NMR measurements were performed, this polycondensate was [{CF 3 (CF 2 )
7 (CH 2 ) 2 } {C 2 H 5 } 2 SiO 1/2 ] unit,
[O 3/2 SiQ 2 SiO 3/2 ] (however, Q 2 is — (CH 2 ) 2
Represents S (CH 2 ) 3 −. ) Unit and [O 3/2 Si
Q 2 'SiO 3/2 ] (wherein Q 2 ' represents a divalent organic group represented by the above formula (9a)) was confirmed to be a fluorinated silicone resin.

【0120】[0120]

【実施例12】冷却器、攪拌装置付き三つ口フラスコに
製造例2の化合物57.5g、製造例11の化合物1
4.7g、テトラメトキシシラン4.6g、3−アミノ
プロピルトリメトキシシラン0.3g、エチルアルコー
ル/テトラヒドロフラン混合溶媒(重量比で7/3)2
00mlを採り混合溶解した。攪拌を続けながらこの溶
液に水15.0gを前記の混合溶媒50mlに溶解した
溶液を添加した。添加終了後攪拌を続けながら20℃で
2時間放置した。この混合溶液に製造例14の珪素化合
物253.4g、水20.0g、20℃の混合溶媒10
0ml、濃硝酸2.5mlからなる溶液を添加し、攪拌
をさらに続けながら室温で12時間放置した。反応後少
量の水の添加により系は二相に分離したので、デカンテ
ーションにより溶媒相を除去し、5%炭酸水素ナトリウ
ム溶液および水で洗浄後ロータリーエバポレーターで残
存する揮発成分を除去して重縮合物を単離した。IR、
1H−NMR、13C−NMR、29Si−NMR測定を行
ったところ、この重縮合体が[{CF3(CF25
{CH32SiO1/2]のユニット、[O3/2SiQ2
iO 3/2](但しQ2は、前記式(1a)で示される2価
の有機基を表す。)のユニット、[O3/2SiQ2'Si
3/2](但しQ2'は、前記式(9a)で示される2価
の有機基を表す。)のユニット及び[SiO2]のユニ
ットからなるフッ素化シリコーン樹脂であることが確認
された。
[Example 12] A three-necked flask equipped with a condenser and a stirrer
57.5 g of the compound of Production Example 2 and the compound 1 of Production Example 11
4.7 g, tetramethoxysilane 4.6 g, 3-amino
Propyltrimethoxysilane 0.3g, ethyl alcohol
Solvent / tetrahydrofuran mixed solvent (weight ratio 7/3) 2
00 ml was taken and mixed and dissolved. While continuing to stir this melt
Water (15.0 g) was dissolved in the mixed solvent (50 ml).
The solution was added. After the addition is complete, continue stirring at 20 ° C.
It was left for 2 hours. A silicon compound of Production Example 14 was added to this mixed solution.
253.4 g, water 20.0 g, mixed solvent 10 at 20 ° C.
Add a solution consisting of 0 ml and 2.5 ml of concentrated nitric acid and stir.
Was continued for 12 hours at room temperature. After reaction
The system was separated into two phases by the addition of an amount of water.
Solution to remove the solvent phase, and add 5% sodium bicarbonate.
Solution and water, then leave on rotary evaporator.
The volatile components present were removed and the polycondensate was isolated. IR,
1H-NMR,13C-NMR,29Si-NMR measurement
When I found that this polycondensate was [{CF3(CF2)Five}
{CH3}2SiO1/2] Unit, [O3/2SiQ2S
iO 3/2] (However, Q2Is a divalent group represented by the above formula (1a).
Represents an organic group. ) Unit, [O3/2SiQ2'Si
O3/2] (However, Q2'Is a divalent group represented by the above formula (9a)
Represents an organic group. ) Unit and [SiO2] Uni
Confirmed to be a fluorinated silicone resin consisting of
Was done.

【0121】[0121]

【比較例1】 <C49(CH22Si(OCH33の製造>製造例1
3において、金属マグネシウム8.7gを2.9gに変
え、且つ2,2,2−トリフルオロエチルヨーダイド6
3.0gの代わりに1H,1H,2H,2H−ノナフル
オロヘキシルヨーダイド37.4gを用いて同様にして
目的化合物を調製した。
Comparative Example 1 <Production of C 4 F 9 (CH 2 ) 2 Si (OCH 3 ) 3 > Production Example 1
3, magnesium 8.7 g was changed to 2.9 g, and 2,2,2-trifluoroethyl iodide 6 was added.
A target compound was prepared in the same manner by using 37.4 g of 1H, 1H, 2H, 2H-nonafluorohexyl iodide instead of 3.0 g.

【0122】<フッ素化シリコーン樹脂の製造>上記珪
素化合物及び下記珪素化合物を用いて実施例2と同様な
操作を行う。すなわち、冷却器、攪拌装置付き三つ口フ
ラスコにC49(CH22Si(OCH33の珪素化合
物77.3g、Si(OCH34の珪素化合物13.7
g、3−アミノプロピルトリメトキシシラン0.8gお
よびエチルアルコール/テトラヒドロフラン混合溶媒
(重量比で7/3)300mlを採り、混合溶解した。
攪拌を続けながらこの溶液に、水8.9gを前述の混合
溶媒100mlに溶解した溶液を添加した。添加終了
後、攪拌を続けながら25℃で4時間放置した。この混
合溶液に(CH33SiOCH3125.0g、水9
7.2g、前述の混合溶媒200ml、濃塩酸3.5m
lからなる溶液を添加し、攪拌をさらに続けながら25
℃で10時間放置した。以下、実施例2と同様に操作し
て[(CH33SiO1/2]のユニット、[C49(C
22SiO3/2]及び[SiO2]のユニットからなる
シリコーン樹脂を調製した。
<Production of Fluorinated Silicone Resin> The same operation as in Example 2 is performed using the above silicon compound and the following silicon compound. That is, in a three-necked flask equipped with a cooler and a stirrer, 77.3 g of a silicon compound of C 4 F 9 (CH 2 ) 2 Si (OCH 3 ) 3 and 13.7 of a silicon compound of Si (OCH 3 ) 4 were used.
g, 0.8 g of 3-aminopropyltrimethoxysilane and 300 ml of an ethyl alcohol / tetrahydrofuran mixed solvent (7/3 by weight) were taken and mixed and dissolved.
A solution in which 8.9 g of water was dissolved in 100 ml of the above-mentioned mixed solvent was added to this solution while continuing stirring. After the addition was completed, the mixture was left at 25 ° C. for 4 hours while continuing stirring. To this mixed solution, 125.0 g of (CH 3 ) 3 SiOCH 3 and water 9
7.2 g, 200 ml of the above-mentioned mixed solvent, 3.5 m of concentrated hydrochloric acid
Add a solution consisting of 1 and add 25
It was left at 0 ° C. for 10 hours. Thereafter, the same operation as in Example 2 was carried out, and the unit of [(CH 3 ) 3 SiO 1/2 ], [C 4 F 9 (C
A silicone resin composed of units of [H 2 ) 2 SiO 3/2 ] and [SiO 2 ] was prepared.

【0123】<被膜の性能試験>以上のようにして得ら
れた実施例及び比較例の各フッ素化シリコーン樹脂をテ
トラヒドロフランに溶解して10重量%濃度の溶液を調
製した。この溶液を市販のスライドグラス上にスプレー
法で塗布し、室温で12時間乾燥後、さらに60℃で1
2時間乾燥して被膜を形成した。
<Film Performance Test> Each fluorinated silicone resin of the examples and comparative examples obtained as described above was dissolved in tetrahydrofuran to prepare a solution having a concentration of 10% by weight. This solution was applied onto a commercially available slide glass by a spray method, dried at room temperature for 12 hours, and then further dried at 60 ° C. for 1 hour.
It was dried for 2 hours to form a film.

【0124】次に、この被膜を流水下、スポンジで一定
の強さで強く擦って被膜の撥水撥油性を観察した。その
結果、実施例1〜12のシリコーン樹脂から得られた被
膜は剥がれ難く、比較例1のシリコーン樹脂から得られ
た被膜に比べて長時間の撥水撥油性を示した。
Next, this coating was strongly rubbed with a sponge under running water at a constant strength to observe the water and oil repellency of the coating. As a result, the coating films obtained from the silicone resins of Examples 1 to 12 were difficult to peel off, and showed longer water and oil repellency than the coating films obtained from the silicone resin of Comparative Example 1.

【0125】以上の試験により、本発明のシリコーン樹
脂が従来型のシリコーン樹脂と比較して強固で柔軟な撥
水撥油性被膜を与えることが証明された。
The above-mentioned tests proved that the silicone resin of the present invention gives a strong and flexible water / oil repellent coating as compared with the conventional silicone resin.

【0126】[0126]

【発明の効果】本発明のフッ素化シリコーン樹脂の製造
方法によれば、ネットワーク中の全ての珪素−珪素原子
間に大部分が有機結合である三次元結合を生じさせ、分
子の連続性及びフレキシビリティを向上させることがで
きるので、このような方法で得られるフッ素化シリコー
ン樹脂を用いれば、プラスチック、金属、皮膚等の各種
基体上に柔軟で強固な耐久性のある撥水撥油性被膜を薄
く均一に形成することができる。
EFFECTS OF THE INVENTION According to the method for producing a fluorinated silicone resin of the present invention, a three-dimensional bond, which is mostly an organic bond, is generated between all silicon-silicon atoms in the network, and the continuity of molecules and the flexibility are improved. Since the fluorinated silicone resin obtained by such a method can be used, a flexible, strong and durable water / oil repellent coating can be thinly formed on various substrates such as plastic, metal and skin. It can be formed uniformly.

Claims (14)

【特許請求の範囲】[Claims] 【請求項1】 一般式(I): Qn(SiO3/2n (但し、Qnはn価の有機基を表し、またnは2〜6の
整数のいずれか1つを表す。)で示されるユニットの少
なくとも1種を主構成ユニットとし、末端が式(II): (R13SiO1/2 (但し、R1は互いに同一であっても異なっていてもよ
く、炭化水素基、又は水素原子の少なくとも一部がフッ
素原子で置換された炭化水素基を表し、且つ三つのR1
の内、少なくとも一つは前記フッ素置換炭化水素基でな
ければならない。)で示されるユニットで封鎖されたフ
ッ素化シリコーン樹脂。
1. General formula (I): Q n (SiO 3/2 ) n (wherein Q n represents an n-valent organic group, and n represents any one of integers of 2 to 6. At least one of the units represented by the formula ( 1 ) is a main constituent unit, and the terminal is represented by the formula (II): (R 1 ) 3 SiO 1/2 (provided that R 1's may be the same or different from each other; A hydrogen group or a hydrocarbon group in which at least a part of hydrogen atoms is replaced by a fluorine atom, and three R 1
At least one of them must be the above-mentioned fluorine-substituted hydrocarbon group. ) A fluorinated silicone resin blocked with a unit represented by
【請求項2】 更にSiO2ユニットがSiO2/Q
n(SiO3/2nモル比で(3/2)以下含まれる請求
項1記載のフッ素化シリコーン樹脂。
2. The SiO 2 unit further comprises SiO 2 / Q.
The fluorinated silicone resin according to claim 1, which is contained in a molar ratio of n (SiO 3/2 ) n of (3/2) or less.
【請求項3】 一般式(I)のnが2、3、4のいずれ
かである請求項1記載のフッ素化シリコーン樹脂。
3. The fluorinated silicone resin according to claim 1, wherein n in the general formula (I) is 2, 3, or 4.
【請求項4】 一般式(I)のQnが、1)アルキレン
基;2)ポリメチレン基;3)フェニレン基;4)アリ
ーレン基;5)前記1)〜4)の基の水素原子が更にア
ルキル基、フェニル基、アリール基、アルキレン基、ポ
リメチレン基、フェニレン基及びアリーレン基よりなる
群の少なくとも1種で置換された基;6)前記1)〜
4)の基の構造中にエーテル、チオエーテル、エステ
ル、ケトン、アミド、イミド、アミン及びイミンよりな
る群の少なくとも1種の官能基を含んだ基;及び7)前
記1)〜6)の基の水素原子が塩素原子又は臭素原子で
置換された基;よりなる群の1種である請求項1記載の
フッ素化シリコーン樹脂。
Q n of 4. A general formula (I), 1) an alkylene group; 2) a polymethylene group; 3) a phenylene group; 4) an arylene group; 5) the 1) group hydrogen atoms to 4) further A group substituted with at least one member selected from the group consisting of an alkyl group, a phenyl group, an aryl group, an alkylene group, a polymethylene group, a phenylene group and an arylene group; 6) 1) to 1) above
A group containing at least one functional group of the group consisting of ether, thioether, ester, ketone, amide, imide, amine and imine in the structure of the group 4); and 7) a group of the above 1) to 6). The fluorinated silicone resin according to claim 1, which is one of the group consisting of a group in which a hydrogen atom is replaced with a chlorine atom or a bromine atom;
【請求項5】 主構成ユニットが、一般式(I)にQn
してジカルボン酸のジアミドを含む2価の有機基を導入
したユニット及び一般式(I)にQnとしてジカルボン酸
のジアミドを含む2価の有機基以外の2価の有機基を導
入したユニットからなる請求項1記載のフッ素化シリコ
ーン樹脂。
5. The main constituent unit contains a divalent organic group containing a dicarboxylic acid diamide as Q n in the general formula (I) and a dicarboxylic acid diamide as Q n in the general formula (I). The fluorinated silicone resin according to claim 1, comprising a unit having a divalent organic group other than the divalent organic group introduced therein.
【請求項6】 一般式(II)のR1がアルキル基、フェ
ニル基、アリール基及びこれらの基の水素原子の少なく
とも一部がフッ素原子で置換された基よりなる群の1種
である請求項1記載のフッ素化シリコーン樹脂。
6. R 1 of the general formula (II) is one of a group consisting of an alkyl group, a phenyl group, an aryl group and a group in which at least a part of hydrogen atoms of these groups are substituted with a fluorine atom. Item 5. A fluorinated silicone resin according to item 1.
【請求項7】 一般式(III): Qn[Si(X)3n (但し、Qnはn価の有機基を表し、またnは2〜6の
整数のいずれか1つを表す。Xは互いに同一でも異なっ
ていてもよく、加水分解性の基を表す。)で示される加
水分解性珪素化合物を加水分解重縮合させた後、これに
一般式(IV): (R13SiX (但し、R1は互いに同一であっても異なっていてもよ
く、炭化水素基、又は水素原子の少なくとも一部がフッ
素原子で置換された炭化水素基を表し、且つ三つのR1
の内、少なくとも一つは前記フッ素置換炭化水素基でな
ければならない。またXは加水分解性の基を表す。)で
示される珪素化合物を末端封鎖剤として反応させて前記
重縮合物の末端を封鎖することを特徴とする請求項1記
載のフッ素化シリコーン樹脂の製造方法。
7. General formula (III): Q n [Si (X) 3 ] n (wherein Q n represents an n-valent organic group, and n represents any one of integers of 2 to 6). X may be the same or different from each other and represent a hydrolyzable group.) After hydrolytic polycondensation of the hydrolyzable silicon compound represented by the formula (IV): (R 1 ) 3 SiX (provided that R 1 s may be the same or different from each other and represent a hydrocarbon group or a hydrocarbon group in which at least a part of hydrogen atoms is substituted with a fluorine atom, and 3 R 3
At least one of them must be the above-mentioned fluorine-substituted hydrocarbon group. X represents a hydrolyzable group. The method for producing a fluorinated silicone resin according to claim 1, wherein the silicon compound represented by the formula (4) is reacted as an end-capping agent to cap the end of the polycondensate.
【請求項8】 重縮合工程で更にSi(X)4(但し、
Xは前記一般式(III)のXに同じ。)が添加される請
求項7記載のフッ素化シリコーン樹脂の製造方法。
8. In the polycondensation step, Si (X) 4 (provided that
X is the same as X in the general formula (III). ) Is added, The manufacturing method of the fluorinated silicone resin of Claim 7.
【請求項9】 一般式(III)のnが2、3、4のいず
れかである請求項7記載のフッ素化シリコーン樹脂の製
造方法。
9. The method for producing a fluorinated silicone resin according to claim 7, wherein n in the general formula (III) is 2, 3, or 4.
【請求項10】 一般式(III)のQnが、1)アルキレ
ン基;2)ポリメチレン基;3)フェニレン基;4)ア
リーレン基;5)前記1)〜4)の基の水素原子が更に
アルキル基、フェニル基、アリール基、アルキレン基、
ポリメチレン基、フェニレン基及びアリーレン基よりな
る群の少なくとも1種で置換された基;6)前記1)〜
4)の基の構造中にエーテル、チオエーテル、エステ
ル、ケトン、アミド、イミド、アミン及びイミンよりな
る群の少なくとも1種の官能基を含んだ基;及び7)前
記1)〜6)の基の水素原子が塩素原子で置換された
基;よりなる群の1種である請求項7記載のフッ素化シ
リコーン樹脂の製造方法。
Q n of 10. Formula (III) is 1) an alkylene group; 2) a polymethylene group; 3) a phenylene group; 4) an arylene group; 5) the 1) group hydrogen atoms to 4) further Alkyl group, phenyl group, aryl group, alkylene group,
Group substituted with at least one member selected from the group consisting of polymethylene group, phenylene group and arylene group; 6) above 1) to
A group containing at least one functional group of the group consisting of ether, thioether, ester, ketone, amide, imide, amine and imine in the structure of the group 4); and 7) a group of the above 1) to 6). The method for producing a fluorinated silicone resin according to claim 7, which is one of the group consisting of a group in which a hydrogen atom is replaced by a chlorine atom.
【請求項11】 加水分解性珪素化合物が、一般式(II
I)にQnとしてジカルボン酸のジアミドを含む2価の有
機基を導入した加水分解性珪素化合物及び一般式(II
I)にQnとしてジカルボン酸のジアミドを含む2価の有
機基以外の2価の有機基を導入した加水分解性珪素化合
物からなる請求項7記載のフッ素化シリコーン樹脂の製
造方法。
11. The hydrolyzable silicon compound has the general formula (II
A hydrolyzable silicon compound in which a divalent organic group containing a diamide of dicarboxylic acid is introduced as Q n into I) and a compound represented by the general formula (II
The method for producing a fluorinated silicone resin according to claim 7, which comprises a hydrolyzable silicon compound in which a divalent organic group other than the divalent organic group containing a dicarboxylic acid diamide as Q n is introduced into I).
【請求項12】 一般式(IV)のR1がアルキル基、フ
ェニル基、アリール基及びこれらの基の水素原子の少な
くとも一部がフッ素原子で置換された基よりなる群の1
種である請求項7記載のフッ素化シリコーン樹脂の製造
方法。
12. R 1 of the general formula (IV) is an alkyl group, a phenyl group, an aryl group or a group in which at least a part of hydrogen atoms of these groups is substituted with a fluorine atom.
The method for producing a fluorinated silicone resin according to claim 7, which is a seed.
【請求項13】 一般式(IV)のXがアルコキシ基、ハ
ロゲン原子及びアルコキシアルコキシ基よりなる群の1
種である請求項7記載のフッ素化シリコーン樹脂の製造
方法。
13. One of the group consisting of an alkoxy group, a halogen atom and an alkoxyalkoxy group as X in the general formula (IV).
The method for producing a fluorinated silicone resin according to claim 7, which is a seed.
【請求項14】 一般式(III)の珪素化合物を、この
化合物の加水分解性の基を完全に加水分解するのに必要
な理論量以下の水と、前記珪素化合物の5モル%以下の
量のアミノ置換基又は4,5−ジヒドロイミダゾール置
換基を有するシランの存在下で加水分解重縮合すること
を特徴とする請求項7記載のフッ素化シリコーン樹脂の
製造方法。
14. An amount of water which is equal to or less than a theoretical amount necessary for completely hydrolyzing a hydrolyzable group of the silicon compound represented by the general formula (III) and an amount of 5 mol% or less of the silicon compound. 8. The method for producing a fluorinated silicone resin according to claim 7, wherein the hydrolytic polycondensation is carried out in the presence of a silane having an amino substituent or a 4,5-dihydroimidazole substituent.
JP06979095A 1994-07-29 1995-03-28 Novel fluorinated silicone resin and method for producing the same Expired - Fee Related JP3364355B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007201109A (en) * 2006-01-25 2007-08-09 Daido Steel Co Ltd Concentrating sunlight power generation unit and its pillar-shaped optical glass member
JP2010514766A (en) * 2006-12-28 2010-05-06 モメンティブ パフォーマンス マテリアルズ インコーポレイテッド Silanized cyclic core polysulfides, their preparation and use in filler-containing elastomer compositions
JP2013230991A (en) * 2012-04-27 2013-11-14 Daiso Co Ltd Novel coupling agent, modification method of inorganic filler using the same, and composite material using the inorganic filler
JP2014070060A (en) * 2012-10-01 2014-04-21 Osaka Municipa Technical Research Institute Novel coupling agent, method for modifying novel coupling agent, modification treatment method of inorganic filler using the same, and composite material using the inorganic filler

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007201109A (en) * 2006-01-25 2007-08-09 Daido Steel Co Ltd Concentrating sunlight power generation unit and its pillar-shaped optical glass member
JP2010514766A (en) * 2006-12-28 2010-05-06 モメンティブ パフォーマンス マテリアルズ インコーポレイテッド Silanized cyclic core polysulfides, their preparation and use in filler-containing elastomer compositions
JP2013230991A (en) * 2012-04-27 2013-11-14 Daiso Co Ltd Novel coupling agent, modification method of inorganic filler using the same, and composite material using the inorganic filler
JP2014070060A (en) * 2012-10-01 2014-04-21 Osaka Municipa Technical Research Institute Novel coupling agent, method for modifying novel coupling agent, modification treatment method of inorganic filler using the same, and composite material using the inorganic filler

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