JPH0886848A - Magnetism detector - Google Patents
Magnetism detectorInfo
- Publication number
- JPH0886848A JPH0886848A JP6221309A JP22130994A JPH0886848A JP H0886848 A JPH0886848 A JP H0886848A JP 6221309 A JP6221309 A JP 6221309A JP 22130994 A JP22130994 A JP 22130994A JP H0886848 A JPH0886848 A JP H0886848A
- Authority
- JP
- Japan
- Prior art keywords
- magnetoresistive element
- element chip
- film
- lead
- insulating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005389 magnetism Effects 0.000 title abstract description 4
- 230000001681 protective effect Effects 0.000 claims abstract description 19
- 230000005291 magnetic effect Effects 0.000 claims description 28
- 238000001514 detection method Methods 0.000 claims description 9
- 238000009795 derivation Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 18
- 239000000853 adhesive Substances 0.000 description 7
- 230000001070 adhesive effect Effects 0.000 description 7
- 238000000605 extraction Methods 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 125000006850 spacer group Chemical group 0.000 description 5
- 238000005476 soldering Methods 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 3
- 239000012790 adhesive layer Substances 0.000 description 3
- 238000010276 construction Methods 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229910003271 Ni-Fe Inorganic materials 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910017061 Fe Co Inorganic materials 0.000 description 1
- 229910017112 Fe—C Inorganic materials 0.000 description 1
- 229910000673 Indium arsenide Inorganic materials 0.000 description 1
- 229910017709 Ni Co Inorganic materials 0.000 description 1
- 229910003267 Ni-Co Inorganic materials 0.000 description 1
- 229910003262 Ni‐Co Inorganic materials 0.000 description 1
- 229910018106 Ni—C Inorganic materials 0.000 description 1
- 239000004840 adhesive resin Substances 0.000 description 1
- 229920006223 adhesive resin Polymers 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Measuring Magnetic Variables (AREA)
- Hall/Mr Elements (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、磁気を感じて電気抵抗
値を変化させる磁気抵抗素子を利用した磁気検出器に関
するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic detector using a magnetoresistive element which senses magnetism and changes its electric resistance value.
【0002】[0002]
【従来の技術】InSb,InSb−NiSb,InA
s等のキャリヤ移動度が高い半導体、またはNi−C
o,Ni−Fe,Ni−Fe−Co等の強磁性体は、磁
界を作用させたとき抵抗値が変化するという性質を有し
ており、上記のような磁気抵抗素子の性質を利用したも
のが、磁気検出器である。2. Description of the Related Art InSb, InSb-NiSb, InA
Semiconductors with high carrier mobility such as s or Ni-C
Ferromagnetic materials such as o, Ni-Fe, and Ni-Fe-Co have the property that the resistance value changes when a magnetic field is applied, and utilize the properties of the magnetoresistive element as described above. Is a magnetic detector.
【0003】一般的な磁気検出器の構造は、図5の概略
断面図に示すように構成されている。図中31は、磁気
抵抗素子チップでその表面(図面上の35の矢印の直
下)に磁気感知部がある。32は、磁気抵抗素子チップ
31の電気信号の取り出し部(リード取り出し)であ
る。33は、永久磁石のバイアス磁石、34は、電磁シ
ールドを兼ねた金属製の保護ケースである。The structure of a general magnetic detector is configured as shown in the schematic sectional view of FIG. Reference numeral 31 in the drawing denotes a magnetoresistive element chip, and a magnetic sensing portion is provided on the surface thereof (immediately below the arrow 35 in the drawing). Reference numeral 32 denotes an electric signal extraction portion (lead extraction) of the magnetoresistive element chip 31. Reference numeral 33 is a bias magnet which is a permanent magnet, and 34 is a metal protective case which also serves as an electromagnetic shield.
【0004】磁気抵抗素子チップ31上の保護ケース3
4の表面を、被検出の磁気材(例えば紙幣など)が圧接
移動する。圧接により保護ケース34がたわむこともあ
るので、磁気抵抗素子チップ31と、保護ケース34間
には、エアーギャップ(空隙)35が設けられ、磁気抵
抗素子チップ31の応力歪みによる雑音の発生(今後、
ピエゾノイズと呼ぶ)を防いでいる。またこのエアーギ
ャップは保護ケース34と磁気抵抗素子チップ31の電
気信号の取り出し部32との絶縁をも兼ねている。Protective case 3 on the magnetoresistive element chip 31
A magnetic material to be detected (for example, a bill) moves in pressure contact with the surface of 4. Since the protective case 34 may bend due to the pressure contact, an air gap (gap) 35 is provided between the magnetoresistive element chip 31 and the protective case 34, and noise due to stress strain of the magnetoresistive element chip 31 is generated (in the future). ,
This is called piezo noise). The air gap also serves as insulation between the protective case 34 and the electric signal takeout portion 32 of the magnetoresistive element chip 31.
【0005】従来のエアーギャップ35及び磁気抵抗素
子チップ31の電気信号の取り出し部を、さらに拡大し
た詳細断面図を二例、図6,7に示す。FIGS. 6 and 7 show two examples of detailed sectional views in which the conventional air gap 35 and the electric signal extraction portion of the magnetoresistive element chip 31 are further enlarged.
【0006】図6は、磁気抵抗素子チップ31からの電
気信号の取り出し部にリードフレーム36を用いた構成
である。磁気抵抗素子チップ31を樹脂製のホルダー3
7に接着固定し、金属板性リードフレーム36にはんだ
接合し、金属製の外部端子39への接続をはんだ接合で
行って、磁気抵抗素子チップ31からの電気信号の取り
出しをしている。エアーギャップ35の確保は、ホルダ
ーに突起38を設け保護ケース34に突起38を当てる
ことで行っている。突起38は、磁気抵抗素子チップ3
1の固定領域及びリードフレーム36の占有領域以上の
高さに設定している。FIG. 6 shows a structure in which a lead frame 36 is used as a portion for taking out an electric signal from the magnetoresistive element chip 31. Mount the magnetoresistive element chip 31 on the resin holder 3
7 is bonded and fixed to the metal plate 7, soldered to the metallic plate lead frame 36, and connected to the metal external terminal 39 by soldering to take out an electric signal from the magnetoresistive element chip 31. The air gap 35 is secured by providing a protrusion 38 on the holder and abutting the protrusion 38 on the protective case 34. The protrusion 38 is the magnetoresistive element chip 3.
The height is set to be equal to or higher than the fixed area of 1 and the occupied area of the lead frame 36.
【0007】図7は、磁気抵抗素子チップ31からの電
気信号の取り出し部にワイヤーボンディングのワイヤー
41を用いた構成である。磁気抵抗素子チップ31を固
定配線基板42に接着固定してワイヤー41により、磁
気抵抗素子チップ31からの電気信号の取り出しを固定
配線基板42にボンディング接続し、固定配線基板42
よりスルーホールを通じて金属外部端子39への接続を
半田付け等で行っている。エアーギャップ35の確保
は、固定配線基板42の周辺に絶縁性のスペイサー43
をワイヤー41領域以上に高く設け接着固定し、保護ケ
ース34にスペイサー43を当てることにより行ってい
る。FIG. 7 shows a structure in which a wire 41 for wire bonding is used in a portion for taking out an electric signal from the magnetoresistive element chip 31. The magnetoresistive element chip 31 is adhesively fixed to the fixed wiring board 42, and the electric signal taken out from the magnetoresistive element chip 31 is bonded and connected to the fixed wiring board 42 by the wire 41.
The connection to the metal external terminal 39 is made by soldering or the like through the through hole. The air gap 35 is secured by fixing the insulating spacer 43 around the fixed wiring board 42.
Is provided higher than the area of the wire 41 and is fixed by adhesion, and the spacer 43 is applied to the protective case 34.
【0008】[0008]
【発明が解決しようとする課題】上記のように、エアー
ギャップ35は、磁気抵抗素子チップ31への応力によ
るピエゾノイズを防ぐと共に保護ケース34と磁気抵抗
素子チップ31の電気信号の取り出し部との絶縁対策の
ために必要である。一方、最近の、検出する磁気材の微
量変位や検出感度向上の要求に対処するためには、被検
出体と磁気検知部とを極力近づけて、ギャップ量を小さ
く安定に形成する必要がある。As described above, the air gap 35 prevents piezo noise due to stress on the magnetoresistive element chip 31, and insulates the protective case 34 from the electric signal takeout portion of the magnetoresistive element chip 31. Necessary for countermeasures. On the other hand, in order to cope with the recent demand for a slight displacement of the magnetic material to be detected and an improvement in detection sensitivity, it is necessary to bring the object to be detected and the magnetic detection part as close as possible to form a small gap amount and stably.
【0009】図6のホルダー突起によるエアーギャップ
設定の場合は、エアーギャップの寸法は、磁気抵抗素子
チップ31のホルダー接着固定層の厚み、磁気抵抗素子
チップ31自身の厚み、リードフレーム36の厚み、磁
気抵抗素子チップ31とリードフレーム36の接着はん
だ層の厚みをホルダー突起寸法から差し引いた量とな
る。各構成材料の厚みにはバラツキがあり、接着、はん
だ付けの工法上も厚みバラツキが発生し、これらの累積
したバラツキがエアーギャップ寸法の寸法精度となるの
で、寸法精度を良くすることが難しい。In the case of setting the air gap by the holder protrusion of FIG. 6, the size of the air gap depends on the thickness of the holder adhesive fixing layer of the magnetoresistive element chip 31, the thickness of the magnetoresistive element chip 31 itself, the thickness of the lead frame 36, The thickness of the adhesive solder layer between the magnetoresistive element chip 31 and the lead frame 36 is the amount obtained by subtracting the holder projection size. There are variations in the thickness of each constituent material, and variations in thickness also occur due to the method of bonding and soldering, and these accumulated variations become the dimensional accuracy of the air gap dimension, so it is difficult to improve the dimensional accuracy.
【0010】一般に磁気抵抗素子チップ31の厚みは約
0.6mmぐらいで精度の良いものでも±0.05mmの寸
法許容差があり、リードフレームの厚みは0.15mmで
精度の良いものでも±0.03mmの寸法許容差がある。
またホルダーの樹脂は±0.05mmの許容差が必要であ
るし、接着、はんだ付けについても厳しい管理としても
各±0.05mmの許容差が必要であろう。これらを累積
して、±0.23mmのエアーギャップ寸法バラツキが生
じる。またエアーギャップ寸法自体の値としては前記バ
ラツキに加えてリードフレームの厚み分0.15mmが必
要となり、0.38mm以上必要となってしまう。Generally, the thickness of the magnetoresistive element chip 31 is about 0.6 mm, and even if it has high accuracy, there is a dimensional tolerance of ± 0.05 mm, and the thickness of the lead frame is 0.15 mm, even if it has high accuracy, ± 0. There is a dimensional tolerance of 0.03 mm.
Further, the resin of the holder requires a tolerance of ± 0.05 mm, and even if strict control is required for adhesion and soldering, a tolerance of ± 0.05 mm will be required. By accumulating these, an air gap size variation of ± 0.23 mm occurs. In addition to the above-mentioned variation, the value of the air gap dimension itself needs to be 0.15 mm for the thickness of the lead frame and 0.38 mm or more.
【0011】図7のスペイサーによるエアーギャップ設
定の場合も同じように、エアーギャップの寸法は、磁気
抵抗素子チップ31と固定配線基板との接着厚み、磁気
抵抗素子チップ31自身の厚みを、スペイサー厚みから
差し引いた量となり、各構成材料、工法での厚みバラツ
キの累積を小さくすることは難しい。即ち図6で計算し
た先の従来例とあまり変わらない値となってしまう。Similarly in the case of setting the air gap by the spacer as shown in FIG. 7, the size of the air gap depends on the thickness of the adhesive between the magnetoresistive element chip 31 and the fixed wiring substrate, the thickness of the magnetoresistive element chip 31 itself, and the spacer thickness. However, it is difficult to reduce the cumulative thickness variation of each constituent material and construction method. That is, the value is not so different from the previous conventional example calculated in FIG.
【0012】本発明は上記課題を解消し、エアーギャッ
プの寸法精度を高精度とし、しかも、エアーギャップ寸
法自体を小さくすることにより、安定した高感度の磁気
検出器を提供することを目的とする。SUMMARY OF THE INVENTION It is an object of the present invention to solve the above problems and to provide a stable and highly sensitive magnetic detector by making the dimension accuracy of an air gap highly accurate and reducing the dimension of the air gap itself. .
【0013】[0013]
【課題を解決するための手段】上記課題を解決するた
め、本発明の磁気検出器は、表面に取り出しリードを形
成した絶縁フィルムを、リード形成面を前記磁気抵抗素
子チップ側に、絶縁面を前記保護ケース側にし、前記磁
気抵抗素子チップ表面上の前記絶縁フィルムを除去した
構成で、前記絶縁フィルムの取り出しリードを前記磁気
抵抗素子チップの表面に接続したものである。In order to solve the above-mentioned problems, the magnetic detector of the present invention has an insulating film having a lead formed on the surface, a lead forming surface on the magnetoresistive element chip side, and an insulating surface The structure is such that the insulating film on the surface of the magnetoresistive element chip is removed on the side of the protective case, and the lead out of the insulating film is connected to the surface of the magnetoresistive element chip.
【0014】[0014]
【作用】上記構成によると、エアーギャップ寸法は絶縁
フィルム厚みと取り出しリード厚となる。両者とも従来
より非常に薄いものである。According to the above structure, the air gap size is the thickness of the insulating film and the thickness of the lead taken out. Both are much thinner than before.
【0015】そこで、従来のような磁気抵抗素子チップ
自身の厚み、接着厚み、ホルダー又はスペイサーの厚み
等の部品厚みバラツキ、加工厚みバラツキの発生が非常
に小さくなり、また、工法も簡単になり、エアーギャッ
プを安定にしかも薄く規制できるので、安定した高感度
の磁気検出器を提供することが出来る。Therefore, the variation in the component thickness such as the thickness of the magnetoresistive element chip itself, the adhesive thickness, the thickness of the holder or the spacer, and the variation in the processing thickness as in the prior art are extremely reduced, and the construction method is simplified. Since the air gap can be regulated stably and thinly, a stable and highly sensitive magnetic detector can be provided.
【0016】[0016]
(実施例1)以下、本発明の一実施例について図1に基
づき説明する。図1は本発明の一実施例の磁気検出器の
断面図である。図中の1は、その表面に、InSb,I
nSb−NiSb,InAs等のキャリヤ移動度が高い
半導体またはNi−Co,Ni−Fe,Ni−Fe−C
o等の強磁性体磁気抵抗部11と厚み約1〜2μmの金
で出来たリード取り出し電極部を形成した0.6mm厚み
のガラスチップである。この構成は、従来例の説明での
磁気抵抗素子チップ31と同様である。(Embodiment 1) An embodiment of the present invention will be described below with reference to FIG. FIG. 1 is a sectional view of a magnetic detector according to an embodiment of the present invention. In the figure, 1 indicates InSb, I on the surface.
Semiconductors with high carrier mobility such as nSb-NiSb and InAs, or Ni-Co, Ni-Fe, Ni-Fe-C
A glass chip having a thickness of 0.6 mm formed with a ferromagnetic magnetic resistance portion 11 such as o and a lead extraction electrode portion made of gold having a thickness of about 1 to 2 μm. This structure is the same as that of the magnetoresistive element chip 31 in the description of the conventional example.
【0017】2は、取り出しリード13をポリイミド等
の絶縁層8の表面に形成したフィルムである。磁気抵抗
素子チップ1上のポリイミド等の絶縁層は除去されてい
る。18は、上記の除去された絶縁層領域でありデバイ
スホールと呼び、このデバイスホールがエアーギャップ
空間となる。磁気抵抗素子チップ1の電極と電極取り出
しリードとの接続は、このデバイスホール内にてチップ
の電極とリードを重ね合わせ、高温に保ったヒーター棒
の先端を当てて加熱する工程にて形成される。10は、
電極取り出しリードのアウト端子部であり、金属棒状の
外部端子4にはんだ付けされている。Reference numeral 2 is a film in which the lead-out lead 13 is formed on the surface of the insulating layer 8 such as polyimide. The insulating layer such as polyimide on the magnetoresistive element chip 1 is removed. Reference numeral 18 denotes the removed insulating layer region, which is called a device hole, and this device hole serves as an air gap space. The connection between the electrode of the magnetoresistive element chip 1 and the electrode lead-out lead is formed by a step of superposing the electrode and lead of the chip in the device hole and applying a tip of a heater rod kept at high temperature to heat. . 10 is
It is an out terminal portion of the electrode lead-out lead and is soldered to the metal rod-shaped external terminal 4.
【0018】3は、磁気抵抗素子チップ1、フィルム
2、外部端子4等を固定するホルダーであり、チップ全
体が挿入される穴部を持っている。13はフィルム2と
の接着固定部であり、接着剤で固定されている。16は
磁気抵抗素子チップ1との接着固定部であり接着樹脂で
固定されている。5は、磁気抵抗素子にバイアス磁界を
かけるためのフェライト焼結体のバイアス磁石であり、
磁気抵抗素子チップ1の固定と反対面のホルダーに接着
固定されている。6は、ステンレス製の保護ケースであ
り、フィルム2のフィルム面とぴったり接触している。
7は、保護ケース内の密閉封止材であり、外部端子4や
ホルダー3等の固定もかねている。Reference numeral 3 is a holder for fixing the magnetoresistive element chip 1, the film 2, the external terminals 4, etc., and has a hole into which the entire chip is inserted. Reference numeral 13 denotes an adhesive fixing portion with the film 2, which is fixed with an adhesive. Reference numeral 16 denotes an adhesive fixing portion with the magnetoresistive element chip 1, which is fixed with an adhesive resin. Reference numeral 5 is a bias magnet of a ferrite sintered body for applying a bias magnetic field to the magnetoresistive element,
The magnetoresistive element chip 1 is bonded and fixed to a holder on the opposite surface. 6 is a protective case made of stainless steel, which is in close contact with the film surface of the film 2.
Reference numeral 7 denotes a hermetically sealing material in the protective case, which also serves to fix the external terminal 4, the holder 3, and the like.
【0019】本実施例の磁気抵抗素子チップとフィルム
2の拡大断面図を図2(a)に、平面図を図2(b)に
示す。図中の一点鎖線で示すところが磁気抵抗素子チッ
プ1であり、その磁気検知部は11の部分である。磁気
検知部11の上のデバイスホール18の一部には、磁気
抵抗素子チップ1と接続するため取り出しリードの一部
が12のように突出している。またフィルムの構成は、 絶縁層8:25μm(または50μm)のポリイミド、 接着層9:10μmの接着剤、 取り出しリード10:30μmの銅箔、 であり総厚み65μm±10μm(または90μm±1
0μm)である。An enlarged sectional view of the magnetoresistive element chip and the film 2 of this embodiment is shown in FIG. 2 (a), and a plan view thereof is shown in FIG. 2 (b). The portion indicated by the alternate long and short dash line in the figure is the magnetoresistive element chip 1, and the magnetic detection portion thereof is the portion 11. A part of the lead-out lead protrudes like a part 12 in a part of the device hole 18 above the magnetic detection part 11 for connecting to the magnetoresistive element chip 1. The film is composed of an insulating layer of 8:25 μm (or 50 μm) polyimide, an adhesive layer of 9:10 μm, an extraction lead of 10:30 μm copper foil, and a total thickness of 65 μm ± 10 μm (or 90 μm ± 1).
0 μm).
【0020】この構造にすると、エアーギャップはこの
フィルム2の総厚みと等しいことになる。即ちエアーギ
ャップも65μm(0.065mm)となり従来より非常
に小さく、またそのバラツキも±10μm(0.01m
m)と、非常に精度の良いものになる。With this structure, the air gap is equal to the total thickness of the film 2. That is, the air gap is 65 μm (0.065 mm), which is much smaller than before and the variation is ± 10 μm (0.01 m).
m), which is very accurate.
【0021】実際にこの構造で磁気検出器の作成を行っ
たところ、試料数N=100での実装厚は、絶縁層が2
5μmのもので、エアーギャップは58〜84μmの範
囲、絶縁層が50μmのもので、エアーギャップは82
〜108μmの範囲であった。以上より、実際にエアー
ギャップ量を安定に且つ小さく形成することが出来たと
いえる。又、保護ケースとのショート発生も無く、検出
物の圧接移動検出特性試験でのピエゾノイズ発生もみら
れなかった。When a magnetic detector was actually manufactured with this structure, the mounting thickness when the number of samples N = 100 was 2 for the insulating layer.
5 μm, the air gap is in the range of 58 to 84 μm, the insulating layer is 50 μm, the air gap is 82
The range was ˜108 μm. From the above, it can be said that the air gap amount could actually be formed stably and small. Further, no short circuit with the protective case occurred, and no piezo noise occurred in the pressure contact movement detection characteristic test of the detected object.
【0022】エアーギャップの値がフィルム総厚みより
やや大きい値となっているのは、磁気抵抗素子チップ1
と接続するため取り出しリードの一部12との接続箇所
での全電極の厚みや、その表面の一部に形成されたパッ
シベーション膜等の影響が出ていると思われる。The value of the air gap is slightly larger than the total thickness of the film because of the magnetoresistive element chip 1.
It is considered that the influence of the thickness of all the electrodes at the connection point with the part 12 of the extraction lead, the passivation film formed on a part of the surface, and the like are exerted in order to connect with.
【0023】尚、本実施例では、小片のフレキ基板をフ
ィルムとして用いたが、多数取りの出来るTABフィル
ムを用いても、同等の効果が得られると共に生産性が向
上する。In this embodiment, the small flexible substrate is used as the film, but the same effect can be obtained and the productivity is improved even if the TAB film capable of producing a large number is used.
【0024】しかも、取り出しリードの接合部付近にフ
ィルム2の絶縁層8が無く、接合部が完全に露出してい
るので、接合部の洗浄、検査、修理等が簡単に信頼性良
くできる長所がある。Moreover, since the insulating layer 8 of the film 2 is not present in the vicinity of the joining portion of the take-out lead and the joining portion is completely exposed, there is an advantage that cleaning, inspection, repair, etc. of the joining portion can be easily and reliably performed. is there.
【0025】また、接着層9なしのフィルム基板2を使
用しても同様の効果が得られることは言うまでもない。Needless to say, the same effect can be obtained by using the film substrate 2 without the adhesive layer 9.
【0026】(実施例2)本発明の第2の実施例の磁気
抵抗素子チップとフィルム2の拡大断面図を図3(a)
に、平面図を図3(b)に示す。本実施例は、第1の実
施例とほぼ同じ構成であるが、図3(b)の一点鎖線で
示されるごとく、フィルム2のデバイスホールサイズよ
りも磁気抵抗素子チップ1のサイズが大きい構成のもの
である。(Embodiment 2) An enlarged sectional view of a magnetoresistive element chip and a film 2 according to a second embodiment of the present invention is shown in FIG.
3B shows a plan view. This example has almost the same configuration as the first example, but as shown by the one-dot chain line in FIG. 3B, the size of the magnetoresistive element chip 1 is larger than the device hole size of the film 2. It is a thing.
【0027】このように構成し、磁気抵抗素子チップ1
を裏側から押して金属のケース6にフィルムが圧接する
ように組み込むと、エアーギャップは図3(b)中の8
aの箇所のフィルムの厚みと全く同じ値となる。磁気抵
抗素子チップはガラス製でほぼ剛体であり、実施例1で
言及したリードの一部12との接合箇所での膨らみは、
押されたことでわずかに変形し、磁気抵抗素子チップが
8a部分に当たった状態で寸法が安定するためである。
即ち、接合箇所での歪み等によるバラツキを排除できる
メリットがある。With this structure, the magnetoresistive element chip 1
By pressing from the back side so that the film is pressed against the metal case 6, the air gap becomes 8 in FIG. 3 (b).
The value is exactly the same as the thickness of the film at a. The magnetoresistive element chip is made of glass and is substantially rigid, and the bulge at the joint with the part 12 of the lead mentioned in Example 1 is
This is because the shape is slightly deformed by being pressed, and the size is stabilized in the state where the magnetoresistive element chip hits the portion 8a.
That is, there is a merit that variations due to distortion or the like at the joints can be eliminated.
【0028】実際にこの構造で磁気検出器の作成を行っ
たところ、試料数N=100での実装厚は、絶縁層が2
5μmのもので、エアーギャップは63〜78μmの範
囲、絶縁層が50μmのもので、エアーギャップは87
〜102μmの範囲であり、第1の実施例よりさらにエ
アーギャップ量を安定に尚小さく形成することが出来
た。これは、磁気抵抗素子チップ1がフィルム2に直接
接触するためである。又、保護ケースとのショート発生
も無かった。検出物の圧接移動検出特性については若干
のピエゾノイズ発生が見られたが検出性への影響にはい
たっていない。When a magnetic detector was actually manufactured with this structure, the mounting thickness when the number of samples N = 100 was 2 for the insulating layer.
5 μm, air gap is 63-78 μm, insulating layer is 50 μm, air gap is 87
It was within the range of 102 to 102 μm, and the air gap amount could be formed stably and still smaller than that of the first embodiment. This is because the magnetoresistive element chip 1 directly contacts the film 2. In addition, there was no short circuit with the protective case. Regarding the pressure contact movement detection characteristics of the detection object, some piezo noise was observed, but this did not affect the detectability.
【0029】(実施例3)本発明の第3の実施例の磁気
抵抗素子チップとフィルム2の拡大断面図を図4(a)
に、平面図を図4(b)に示す。本実施例は、第1の実
施例とほぼ同じ構成であるが、図4(b)の一点鎖線で
示されるごとく、磁気抵抗素子チップ1の一部がフィル
ムの絶縁層に8bの位置で接している構成のものであ
る。(Embodiment 3) An enlarged sectional view of a magnetoresistive element chip and a film 2 according to a third embodiment of the present invention is shown in FIG.
4B shows a plan view. This example has almost the same structure as the first example, but as shown by the one-dot chain line in FIG. 4B, a part of the magnetoresistive element chip 1 contacts the insulating layer of the film at the position 8b. It has a structure.
【0030】このように構成し、磁気抵抗素子チップ1
を裏側から押して金属のケース6にフィルムが圧接する
ように組み込むと、エアーギャップは図4(b)中の8
bの箇所のフィルムの厚みと全く同じ値となる。これは
実施例2での寸法の決まるメカニズムとほぼ同様であ
る。実施例2では、寸法が絶縁層8と接着層9と取り出
しリード13との総厚みのバラツキに依存するが、本実
施例では絶縁層8のみの厚みバラツキに依存するため、
さらに精度が上がる。また、勿論エアーギャップ自身も
小さくなる。With this structure, the magnetoresistive element chip 1
4 is pressed from the back side and assembled so that the film is pressed against the metal case 6, the air gap becomes 8 in FIG. 4 (b).
The value is exactly the same as the thickness of the film at point b. This is almost the same as the mechanism of determining the dimensions in the second embodiment. In the second embodiment, the dimension depends on the variation in the total thickness of the insulating layer 8, the adhesive layer 9, and the lead-out lead 13, but in the present embodiment, it depends on the variation in the thickness of only the insulating layer 8.
The accuracy is further increased. Also, of course, the air gap itself becomes smaller.
【0031】[0031]
【発明の効果】以上のように本発明の構成によれば、表
面に取り出しリードを形成した絶縁層のフィルムの、リ
ード形成面を磁気抵抗素子チップ側に、絶縁層を保護ケ
ース側にし、磁気抵抗素子チップ表面の磁気検知部上の
フィルムの絶縁層を除去した構成で、フィルムの取り出
しリードを磁気抵抗素子チップの表面に接続することに
より、エアーギャップを小さく精度良くしかも簡単な工
法で形成することが出来、これにより、磁気信号の微量
変位を感度良く検出できる磁気検出器を提供することが
できるものである。As described above, according to the structure of the present invention, in the film of the insulating layer having the leads formed on the surface, the lead forming surface is on the magnetoresistive element chip side and the insulating layer is on the protective case side. With a structure in which the insulating layer of the film on the magnetic sensing part on the surface of the resistive element chip is removed, connecting the film take-out lead to the surface of the magnetic resistive element chip forms a small air gap with high precision and with a simple construction method. Therefore, it is possible to provide a magnetic detector capable of detecting a slight displacement of a magnetic signal with high sensitivity.
【図1】本発明の第1の実施例の磁気検出器の概略断面
図FIG. 1 is a schematic sectional view of a magnetic detector according to a first embodiment of the present invention.
【図2】本発明の第1の実施例の磁気抵抗素子チップと
フィルムの拡大断面図FIG. 2 is an enlarged sectional view of a magnetoresistive element chip and a film according to the first embodiment of the present invention.
【図3】本発明の第2の実施例の磁気抵抗素子チップと
フィルムの拡大断面図FIG. 3 is an enlarged sectional view of a magnetoresistive element chip and a film according to a second embodiment of the present invention.
【図4】本発明の第3の実施例の磁気抵抗素子チップと
フィルムの拡大断面図FIG. 4 is an enlarged sectional view of a magnetoresistive element chip and a film according to a third embodiment of the present invention.
【図5】従来の磁気検出器を示す概略断面図FIG. 5 is a schematic sectional view showing a conventional magnetic detector.
【図6】従来の第1のエアーギャップ形成部分の拡大断
面図FIG. 6 is an enlarged cross-sectional view of a conventional first air gap forming portion.
【図7】従来の第2のエアーギャップ形成部分の拡大断
面図FIG. 7 is an enlarged cross-sectional view of a conventional second air gap forming portion.
1 磁気抵抗素子チップ 2 フィルム 6 保護ケース 8 絶縁層 13 取り出しリード 18 デバイスホール 1 Magnetoresistive Element Chip 2 Film 6 Protective Case 8 Insulating Layer 13 Extraction Lead 18 Device Hole
───────────────────────────────────────────────────── フロントページの続き (72)発明者 倉増 敬三郎 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Keizaburo Kuramasu 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd.
Claims (4)
子チップと、保護ケースと、表面に取り出しリードを形
成した絶縁層のフィルムとを備え、リード形成面を前記
磁気抵抗素子チップ側に、絶縁層を前記保護ケース側に
し、前記磁気抵抗素子チップ表面の磁気検知部上の前記
フィルムの絶縁層を除去した構成で、前記フィルムの取
り出しリードを前記磁気抵抗素子チップの表面に接続し
た磁気検出器。1. A magnetoresistive element chip having a magnetic sensing film on a surface thereof, a protective case, and an insulating layer film having a lead formed on the surface, and a lead forming surface facing the magnetoresistive element chip. Magnetic detection with the insulating layer on the side of the protective case and the insulating layer of the film on the magnetic detection part on the surface of the magnetoresistive element chip is removed, and the lead for taking out the film is connected to the surface of the magnetoresistive element chip. vessel.
り出しリードの接続部の上に絶縁層が存在しない請求項
1記載の磁気検出器。2. The magnetic detector according to claim 1, wherein there is no insulating layer on the connection portion of the lead-out lead of the film on the surface of the magnetoresistive element chip.
り出しリードが接し、この接した部分の上に絶縁層が存
在する請求項1記載の磁気検出器。3. The magnetic detector according to claim 1, wherein the lead-out lead of the film is in contact with the surface of the magnetoresistive element chip, and the insulating layer is present on the contacted portion.
接する請求項1記載の磁気検出器。4. The magnetic detector according to claim 1, wherein an insulating layer of a film is in contact with the surface of the magnetoresistive element.
Priority Applications (1)
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JP22130994A JP3314548B2 (en) | 1994-09-16 | 1994-09-16 | Magnetic detector |
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JP22130994A JP3314548B2 (en) | 1994-09-16 | 1994-09-16 | Magnetic detector |
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JP3314548B2 JP3314548B2 (en) | 2002-08-12 |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010175490A (en) * | 2009-02-02 | 2010-08-12 | Murata Mfg Co Ltd | Manufacturing method of magnetic sensor and magnetic sensor |
US9234947B2 (en) | 2010-07-30 | 2016-01-12 | Mitsubishi Electric Corporation | Magnetic sensor device |
US9244135B2 (en) | 2011-05-16 | 2016-01-26 | Mitsubishi Electric Corporation | Magnetic sensor device |
US9279866B2 (en) | 2012-04-09 | 2016-03-08 | Mitsubishi Electric Corporation | Magnetic sensor |
Families Citing this family (1)
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JP5240276B2 (en) * | 2010-10-29 | 2013-07-17 | 株式会社村田製作所 | Magnetic sensor |
-
1994
- 1994-09-16 JP JP22130994A patent/JP3314548B2/en not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010175490A (en) * | 2009-02-02 | 2010-08-12 | Murata Mfg Co Ltd | Manufacturing method of magnetic sensor and magnetic sensor |
US9234947B2 (en) | 2010-07-30 | 2016-01-12 | Mitsubishi Electric Corporation | Magnetic sensor device |
US9244135B2 (en) | 2011-05-16 | 2016-01-26 | Mitsubishi Electric Corporation | Magnetic sensor device |
US9279866B2 (en) | 2012-04-09 | 2016-03-08 | Mitsubishi Electric Corporation | Magnetic sensor |
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