JPH0883834A - Processing equipment by ion beam - Google Patents
Processing equipment by ion beamInfo
- Publication number
- JPH0883834A JPH0883834A JP6243396A JP24339694A JPH0883834A JP H0883834 A JPH0883834 A JP H0883834A JP 6243396 A JP6243396 A JP 6243396A JP 24339694 A JP24339694 A JP 24339694A JP H0883834 A JPH0883834 A JP H0883834A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- sample holder
- holder
- rotation
- cooling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、イオンビームミリング
やイオンビームスパッタなどのイオンビーム加工装置に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ion beam processing apparatus such as ion beam milling and ion beam sputtering.
【０００２】[0002]
【従来の技術】従来、この種のイオンビーム加工装置で
は、イオン源口径が大口径の例えばφ４００以上となっ
た場合、試料ホルダ１０は、図５に示すように、イオン
源口径とはほぼ同一径程度でホルダ外周上に配置され
る。ここで、５はシャッタ、６は真空チャンバであり、
点線は試料の冷却水系統の一部を概略的に示す。図５か
ら明らかなように、試料ホルダ１０は、ホルダ外周上に
配置されるため、中央部がぽっかりと空いた部分が生
じ、イオンビームが照射されても試料がないため、この
中央部のイオンビームは無駄となっていた。このため、
イオンビーム加工装置の高スループット化に問題があっ
た。また、従来のイオンビーム加工装置では、試料ホル
ダを複数列全周に配置し、各試料ホルダに自公転機構を
設けたときの構造が複雑になるため、冷却水の通水を試
料ホルダの回転駆動機構まで導入しない間接冷却機構構
造となっており、試料の加工精度（均一性や加工形状）
や冷却性能に問題があった。また、冷却水の通水を試料
ホルダの回転駆動機構まで導入する直接冷却構造として
も、同様に構造が複雑になるため、効率のよい加工精度
や冷却性能を得られなかった。イオンビーム加工装置の
従来技術としては、特願昭６０−１５８２４２号、特願
昭６０−１９１９２９号があり、自公転構造試料ホルダ
のブロック構造としては特願昭６３−３１３８７２号が
知られている。2. Description of the Related Art Conventionally, in this type of ion beam processing apparatus, when the diameter of the ion source is larger than, for example, φ400, the sample holder 10 has a diameter substantially the same as that of the ion source, as shown in FIG. It is arranged on the outer circumference of the holder with a diameter of approximately the same. Here, 5 is a shutter, 6 is a vacuum chamber,
The dotted line schematically shows a part of the cooling water system of the sample. As is clear from FIG. 5, since the sample holder 10 is arranged on the outer circumference of the holder, there is a gap in the central portion, and there is no sample even when the ion beam is irradiated. The beam was wasted. For this reason,
There was a problem in increasing the throughput of the ion beam processing apparatus. Also, in the conventional ion beam processing equipment, the structure becomes complicated when the sample holders are arranged in multiple rows and the rotation mechanism is installed in each sample holder. It has an indirect cooling mechanism structure that does not introduce a drive mechanism, so the sample processing accuracy (uniformity and processing shape)
There was a problem with the cooling performance. Further, even if the direct cooling structure in which the cooling water is introduced to the rotary drive mechanism of the sample holder is also complicated, the processing accuracy and the cooling performance cannot be obtained efficiently. Japanese Patent Application No. 60-158242 and Japanese Patent Application No. 60-191929 are known as conventional techniques of the ion beam processing apparatus, and Japanese Patent Application No. 63-313872 is known as a block structure of a sample holder having a revolving structure. .
【０００３】[0003]
【発明が解決しようとする課題】本発明の目的は、上述
した事情に鑑み、試料の加工精度及び冷却性能の向上と
イオンビーム加工装置の高スループット化に好適なイオ
ンビーム加工装置を提供することにある。SUMMARY OF THE INVENTION In view of the above-mentioned circumstances, an object of the present invention is to provide an ion beam processing apparatus suitable for improving the processing accuracy and cooling performance of a sample and increasing the throughput of the ion beam processing apparatus. It is in.
【０００４】[0004]
【課題を解決するための手段】上記目的は、導入したガ
スをプラズマ化し、イオンを生成させるイオン源と、こ
のイオンを照射する試料を保持する試料ホルダと、試料
ホルダを駆動する駆動機構と、真空チャンバとを備える
イオンビーム加工装置において、試料ホルダをイオン源
の口径と概略同一サイズとし、かつ、その内・外周に複
数列配置することにより、また、内・外周に複数列配置
した試料ホルダに、それぞれ自公転機構及び冷却機構を
設け、自公転機構内に設けた冷却機構を介して各試料ホ
ルダの裏面側まで冷却水を供給し、試料を直接冷却する
ことにより、達成することができる。Means for Solving the Problems The above-mentioned object is to ionize an introduced gas into plasma to generate ions, a sample holder for holding a sample to be irradiated with the ions, and a drive mechanism for driving the sample holder. In an ion beam processing apparatus equipped with a vacuum chamber, the sample holders have substantially the same size as the diameter of the ion source, and are arranged in a plurality of rows inside and outside the sample holder, and also in a plurality of rows inside and outside the sample holder. Can be achieved by directly providing a cooling / revolving mechanism and a cooling mechanism, and supplying cooling water to the back side of each sample holder through the cooling mechanism provided in the rotating / revolution mechanism to directly cool the sample. .
【０００５】[0005]
【作用】本発明は、試料ホルダの設置する径を大口径イ
オン源と概略同一径とし、かつ、その内周、外周のイオ
ンビーム照射面全面に試料ホルダを複数列そして全周に
配置することにより、引き出されたイオンビームを目一
杯活用し、また、試料ホルダ裏面にまで冷却水を通水し
て、試料を直接冷却することにより、試料の冷却特性を
改善し、加工精度（均一性や加工形状）を向上させ、高
スループット化を達成する。According to the present invention, the diameter of the sample holder to be installed is substantially the same as that of the large-diameter ion source, and the sample holders are arranged in a plurality of rows and all around the ion beam irradiation surface on the inner and outer circumferences thereof. By making full use of the extracted ion beam, cooling water is passed to the back surface of the sample holder to directly cool the sample, improving the cooling characteristics of the sample and improving the processing accuracy (uniformity and The processed shape) is improved and high throughput is achieved.
【０００６】[0006]
【実施例】以下、本発明の実施例を図面を用いて説明す
る。図４は、本発明を適用するイオンビーム加工装置の
構成図である。図４において、イオンビーム加工装置
は、イオン源アーク室１内でプラズマを発生させるため
の熱電子放出型イオン源（バケット型イオン源）を備え
ており、プラズマを発生させるため、まず、フィラメン
ト電極３からフィラメント４に電力を供給し、フィラメ
ント４を点灯させ、熱電子を放出させる。イオン源アー
ク室１の壁とフィラメント４との間に電圧を印加する
と、その間でアーク放電が生じ、放出された熱電子は、
イオン源アーク室１の外周上に配置された磁石の磁界
（図示せず）により螺旋運動を行う。このような状態の
イオン源アーク室１にガスを導入すると、ガス分子は熱
電子と衝突し、プラズマ化される。このプラズマ中イオ
ンは、イオン源アーク室１の真空チャンバ６側に設置さ
れた２枚のイオン源電極２間に印加される電圧により、
真空チャンバ６内に引き出される。引き出されたイオン
は、試料ホルダ１０の前面に配置されたシャッタ５によ
り電気的に調整、設定される。このシャッタ５を開口し
た時、イオンビームは、試料ホルダ１０に保持された試
料上に照射され、加工を開始する。試料ホルダ１０は、
イオンビームによる試料の加工均一性を保ち、効率を向
上させるため、自公転機構や傾斜機構（図示せず）を備
えており、これらの機構は、収納容器１２で密閉され
る。傾斜機構を駆動する傾斜駆動機構１３は、真空チャ
ンバ６内の圧力とは隔離して大気圧下に設けられ、試料
の取出口となる真空チャンバ扉７を介して真空チャンバ
６の外部に設けられる。この傾斜駆動機構１３に連接し
て設ける自公転機構を駆動する試料ホルダ１０の駆動用
モータ１１を含む回転駆動機構（図示せず）は、収納容
器１２内に収納され、真空チャンバ６内部に設置され
る。この回転駆動機構に対する電源の供給及び試料ホル
ダ１０に対する冷却水あるいはガスの供給は、傾斜駆動
機構１３を介して行われる。８は主ゲート弁、９は真空
ポンプである。Embodiments of the present invention will be described below with reference to the drawings. FIG. 4 is a configuration diagram of an ion beam processing apparatus to which the present invention is applied. In FIG. 4, the ion beam processing apparatus includes a thermionic emission type ion source (bucket type ion source) for generating plasma in the ion source arc chamber 1. In order to generate plasma, first, the filament electrode is used. Power is supplied from 3 to the filament 4 to light the filament 4 and emit thermoelectrons. When a voltage is applied between the wall of the ion source arc chamber 1 and the filament 4, an arc discharge occurs between them and the emitted thermoelectrons are
A spiral motion is performed by a magnetic field (not shown) of a magnet arranged on the outer circumference of the ion source arc chamber 1. When gas is introduced into the ion source arc chamber 1 in such a state, gas molecules collide with thermoelectrons and are converted into plasma. The ions in the plasma are generated by the voltage applied between the two ion source electrodes 2 installed on the vacuum chamber 6 side of the ion source arc chamber 1.
It is drawn out into the vacuum chamber 6. The extracted ions are electrically adjusted and set by the shutter 5 arranged on the front surface of the sample holder 10. When the shutter 5 is opened, the sample held by the sample holder 10 is irradiated with the ion beam to start processing. The sample holder 10 is
In order to maintain the processing uniformity of the sample by the ion beam and to improve the efficiency, a revolving mechanism and a tilting mechanism (not shown) are provided, and these mechanisms are sealed by the storage container 12. The tilt drive mechanism 13 for driving the tilt mechanism is provided under the atmospheric pressure so as to be isolated from the pressure in the vacuum chamber 6, and is provided outside the vacuum chamber 6 via the vacuum chamber door 7 serving as a sample outlet. . A rotation drive mechanism (not shown) including a drive motor 11 for driving the sample holder 10 connected to the tilt drive mechanism 13 is housed in the storage container 12 and installed in the vacuum chamber 6. To be done. The power supply to the rotation drive mechanism and the supply of cooling water or gas to the sample holder 10 are performed via the tilt drive mechanism 13. Reference numeral 8 is a main gate valve, and 9 is a vacuum pump.
【０００７】次に、本発明の一実施例を図１〜図３によ
り説明する。図１は、本発明の一実施例を示すイオンビ
ーム加工装置の試料ホルダの縦断面図である。図１にお
いて、５はシャッタ、６は真空チャンバ、７は真空チャ
ンバ扉、１０は外周側に設置した試料ホルダ、１１は駆
動用モータ、２０は内周側に設置した試料ホルダ、２５
は公転軸、２６は支持ベース、２８は自転ホルダ内周側
固定歯車、３４は歯車、３５は歯車、３６はモータカバ
ー、３８は軸受、４１はＸリング、４２は支持台、４３
は冷却水出入口継手、４５は傾斜機構軸、４６は傾斜機
構軸受を示す。試料ホルダ１０，２０は、図４の傾斜駆
動機構１３を操作すると、傾斜機構軸受４６を軸受とし
て傾斜機構軸４５が回転し、イオンビームに対して直角
または所定の角度に傾斜する。駆動用モータ１１が駆動
されると、その駆動トルクは、歯車３４，３５を介して
ホルダ中央の公転軸２５へ伝えられ、試料ホルダ１０，
２０を公転させると共に、自転ホルダ内周側固定歯車２
８及び外周側固定歯車３０（図３に示す）を介して試料
ホルダ１０，２０を自転させる（詳細を後述する）。こ
こで、公転軸２５に対向した軸受３８は支持ベース２６
に固定され、公転軸２５と軸受３８間はＸリング４１で
真空、水シールされる。同様に自転ホルダ内周側固定歯
車２８及び外周側固定歯車も支持ベース２６に固定され
る。また、支持ベース２６は支持台４２に固定される。
一方、試料ホルダ１０，２０に供給する冷却水は、冷却
水出入口継手４３から矢印の方向に供給され、試料ホル
ダ１０，２０の試料２１（図３に示す）を冷却後矢印の
方向に流れ、冷却水出入口継手４３から排水される（詳
細を後述する）。Next, an embodiment of the present invention will be described with reference to FIGS. FIG. 1 is a vertical sectional view of a sample holder of an ion beam processing apparatus showing an embodiment of the present invention. 1, 5 is a shutter, 6 is a vacuum chamber, 7 is a vacuum chamber door, 10 is a sample holder installed on the outer peripheral side, 11 is a drive motor, 20 is a sample holder installed on the inner peripheral side, 25
Is a revolving shaft, 26 is a support base, 28 is a rotation holder inner peripheral side fixed gear, 34 is a gear, 35 is a gear, 36 is a motor cover, 38 is a bearing, 41 is an X ring, 42 is a support base, 43
Is a cooling water inlet / outlet joint, 45 is a tilt mechanism shaft, and 46 is a tilt mechanism bearing. When the tilt drive mechanism 13 of FIG. 4 is operated, the sample holders 10 and 20 rotate the tilt mechanism shaft 45 with the tilt mechanism bearing 46 as a bearing, and tilt the tilt angle to a right angle or a predetermined angle with respect to the ion beam. When the drive motor 11 is driven, its drive torque is transmitted to the revolution shaft 25 at the center of the holder via the gears 34, 35, and the sample holder 10,
20 and revolves around the inner circumference of the rotation holder fixed gear 2
8 and the outer peripheral side fixed gear 30 (shown in FIG. 3) to rotate the sample holders 10 and 20 (details will be described later). Here, the bearing 38 facing the revolution shaft 25 is the support base 26.
The orbiting shaft 25 and the bearing 38 are vacuum and water sealed with an X ring 41. Similarly, the inner peripheral side fixed gear 28 and the outer peripheral side fixed gear of the rotation holder are also fixed to the support base 26. The support base 26 is fixed to the support base 42.
On the other hand, the cooling water supplied to the sample holders 10 and 20 is supplied from the cooling water inlet / outlet joint 43 in the direction of the arrow, and flows in the direction of the arrow after cooling the sample 21 (shown in FIG. 3) of the sample holders 10 and 20, It is discharged from the cooling water inlet / outlet joint 43 (details will be described later).
【０００８】図２は、図１に示すイオンビーム加工装置
の試料ホルダの一部を示す横断面図である。図２におい
て、５はシャッタ、６は真空チャンバ、１０は外周側に
設置した試料ホルダ、２０は内周側に設置した試料ホル
ダ、４３は冷却水出入口継手、４４は冷却水配管、４６
は傾斜機構軸受を示す。本実施例では、外周側に設置し
た試料ホルダ１０の内周に試料ホルダ２０を設置し、イ
オンビーム照射による試料２１（図３に示す）を冷却す
るために、それぞれの試料ホルダ１０，２０に冷却水出
入口継手４３から矢印の方向に冷却配管４４を介して冷
却水を供給する。なお、外周側に設置した試料ホルダ１
０に冷却水を供給する冷却配管は点線４４’のように簡
略化して示した。また、右回転方向の矢印Ａは公転軸２
５による試料ホルダ１０，２０の回転方向、そして、左
回転方向の矢印Ｂは自転ホルダ内周側固定歯車２８及び
外周側固定歯車３０（図３に示す）による試料ホルダ１
０，２０の回転方向をそれぞれ示す。FIG. 2 is a transverse sectional view showing a part of the sample holder of the ion beam processing apparatus shown in FIG. 2, 5 is a shutter, 6 is a vacuum chamber, 10 is a sample holder installed on the outer peripheral side, 20 is a sample holder installed on the inner peripheral side, 43 is a cooling water inlet / outlet joint, 44 is a cooling water pipe, 46
Indicates a tilt mechanism bearing. In the present embodiment, the sample holder 20 is installed on the inner circumference of the sample holder 10 installed on the outer circumference side, and in order to cool the sample 21 (shown in FIG. 3) due to ion beam irradiation, the sample holders 10 and 20 are respectively provided. Cooling water is supplied from the cooling water inlet / outlet joint 43 through the cooling pipe 44 in the direction of the arrow. The sample holder 1 installed on the outer circumference side
The cooling pipe for supplying the cooling water to 0 is simplified and shown as a dotted line 44 '. Further, the arrow A in the right rotation direction is the revolution shaft 2
5, the arrow B in the rotation direction of the sample holders 10 and 20 and the left rotation direction indicates the sample holder 1 formed by the rotation holder inner peripheral side fixed gear 28 and the outer peripheral side fixed gear 30 (shown in FIG. 3).
The rotation directions of 0 and 20 are shown respectively.
【０００９】図３は、図１に示すイオンビーム加工装置
の試料ホルダの回転駆動機構と冷却水供給系統の詳細な
縦断面図である。図３において、１０は外周側に設置し
た試料ホルダ、１１は駆動用モータ、２０は内周側に設
置した試料ホルダ、２１は試料、２４は自転軸、２５は
公転軸、２６は支持ベース、２７は自転用歯車、２８は
自転ホルダ内周側固定歯車、２９は自転用歯車、３０は
自転ホルダ外周側固定歯車、３４は歯車、３５は歯車、
３６はモータカバー、３７ａ，３７ｂは自転ホルダの軸
受、３８は軸受、４０はＯリング、４１はＸリング、４
２は支持台、４３ａは冷却水入口継手、４３ｂは冷却水
出口継手、４４は冷却水配管を示す。FIG. 3 is a detailed vertical sectional view of the rotation drive mechanism of the sample holder and the cooling water supply system of the ion beam processing apparatus shown in FIG. In FIG. 3, 10 is a sample holder installed on the outer peripheral side, 11 is a drive motor, 20 is a sample holder installed on the inner peripheral side, 21 is a sample, 24 is a rotating shaft, 25 is a revolving shaft, 26 is a support base, 27 is a rotation gear, 28 is a rotation holder inner peripheral side fixed gear, 29 is a rotation gear, 30 is a rotation holder outer peripheral side fixed gear, 34 is a gear, 35 is a gear,
36 is a motor cover, 37a and 37b are bearings of a rotation holder, 38 is a bearing, 40 is an O ring, 41 is an X ring, 4
2 is a support stand, 43a is a cooling water inlet joint, 43b is a cooling water outlet joint, and 44 is a cooling water pipe.
【００１０】まず、試料ホルダの自公転の回転駆動機構
について説明する。試料ホルダの回転駆動系として、駆
動用モータ１１が駆動されると、その駆動トルクは、歯
車３４，３５を介してホルダ中央の公転軸２５に伝えら
れ、公転軸２５が回転して、外周側に設置した試料ホル
ダ１０と内周側に設置した試料ホルダ２０を公転させ
る。この公転軸２５に対向した軸受３８は支持ベース２
６に固定され、公転軸２５と軸受３８間は、Ｘリング４
１で真空、水シールされる。同様に自転ホルダ内周側固
定歯車２８及び外周側固定歯車３０も支持ベース２６に
固定される。これに対して公転軸２５側には外周側に設
置された、ワンタッチでブロックをさし込み固定可能な
自転ホルダの軸受３７ａと、その内周側に島状に配置さ
れた自転ホルダの軸受３７ｂが固定される。その軸受３
７ａ，３７ｂに対し、自転軸２４が挿入され、各々各部
をＯリング４０で真空、水シールする。試料ホルダ１
０，２０の各自転軸２４には下部側に内周側自転用歯車
２７及び外周側自転用歯車２９が取り付いている。この
ため公転軸２５は、駆動モータ１１より駆動トルクを伝
達されると、歯車３４と歯車３５のギヤ比で決る公転数
で回転し、自転ホルダの軸受３７ａ，３７ｂも同様に回
転する。しかし、試料ホルダ１０，２０の各自転軸２４
は、内周側自転用歯車２７及び外周側自転用歯車２９が
取付けられているため、試料ホルダ支持ベース２６に固
定された自転ホルダ内周側固定歯車２８及び外周側固定
歯車３０と噛み合い、試料ホルダ１０，２０の各自転軸
２４は、その内周側自転用歯車２７及び外周側自転用歯
車２９と自転ホルダ内周側固定歯車２８及び自転ホルダ
外周側固定歯車３０のギヤ比に比例した自転数で回転す
る。First, a rotation drive mechanism for rotation of the sample holder will be described. When the drive motor 11 is driven as a rotary drive system of the sample holder, the drive torque is transmitted to the revolution shaft 25 at the center of the holder via the gears 34 and 35, and the revolution shaft 25 rotates to the outer peripheral side. The sample holder 10 installed on the inner side and the sample holder 20 installed on the inner peripheral side are revolved. The bearing 38 facing the revolution shaft 25 is the support base 2
6 is fixed, and the X-ring 4 is provided between the revolution shaft 25 and the bearing 38.
1 is vacuum and water sealed. Similarly, the inner peripheral side fixed gear 28 and the outer peripheral side fixed gear 30 of the rotation holder are also fixed to the support base 26. On the other hand, on the revolving shaft 25 side, the bearing 37a of the rotation holder, which is installed on the outer peripheral side and is capable of inserting and fixing the block with one touch, and the bearing 37b of the rotation holder, which is arranged in an island shape on the inner peripheral side thereof. Is fixed. The bearing 3
The rotation shaft 24 is inserted into 7a and 37b, and each portion is vacuum-sealed and water-sealed with an O-ring 40. Sample holder 1
An inner circumference side rotation gear 27 and an outer circumference side rotation gear 29 are attached to the lower side of each of the 0 and 20 rotation shafts 24. For this reason, when the drive torque is transmitted from the drive motor 11, the revolution shaft 25 rotates at a revolution number determined by the gear ratio between the gear 34 and the gear 35, and the bearings 37a and 37b of the rotation holder also rotate. However, each rotation shaft 24 of the sample holders 10 and 20
Since the inner circumference side rotation gear 27 and the outer circumference side rotation gear 29 are attached, the gear meshes with the rotation holder inner circumference side fixed gear 28 and the outer circumference side fixed gear 30 fixed to the sample holder support base 26, Each of the rotation shafts 24 of the holders 10 and 20 rotates in proportion to the gear ratio of the inner circumference side rotation gear 27 and the outer circumference side rotation gear 29, the rotation holder inner circumference side fixed gear 28, and the rotation holder outer circumference side fixed gear 30. Rotate by number.
【００１１】つぎに、試料ホルダの冷却水供給機構（系
統）について説明する。真空チャンバ６の外部側に設置
された試料ホルダ傾斜機構は、図１で説明したように、
傾斜機構軸４５と傾斜機構軸受４６より構成され、この
傾斜機構軸受４６にイオンビーム照射による試料２１を
冷却するための冷却水を通す導水路（図示せず）が埋設
されている。冷却水（点印で示す）は、矢印のように、
傾斜機構軸受４６に埋設した導水路を通じ、冷却配管４
４を介して、冷却水入口継手４３ａに供給される。冷却
水入口継手４３ａに供給された冷却水は、公転軸受３８
に導入され（図面左向きの矢印）、回転継手を介して公
転軸２５に導かれ（図面上向きの矢印）、公転軸２５の
上面のプール状に広がった導水路に導かれる（図面左向
きの矢印）。このプール状に広がった導水路は、外周側
のワンタッチでブロックをさし込み固定可能な軸受３７
ａと、内周側の島状に配置された軸受３７ｂのそれぞれ
の導水路に、公転軸２５と同様に、回転継手を介して連
結され、また、それぞれの軸受３７ａ，３７ｂの導水路
は、試料ホルダ１０，２０の各自転軸２４のそれぞれの
導水路に、公転軸２５と同様に、回転継手を介して連結
される。公転軸２５の上面のプール状に広がった導水路
に導かれた冷却水は、それぞれの軸受３７ａ，３７ｂの
導水路に導かれ（図面上向きの矢印）、試料ホルダ１
０，２０の各自転軸２４の上面側に供給される（図面左
と右向きの矢印）。かくして試料ホルダ２２の下面側ま
で冷却水が通水され、試料２１を直接冷却する。試料２
１を冷却した冷却水は、前述した導水路とは別の導水路
に導かれ、図示の矢印のように、試料ホルダ１０，２０
の各自転軸２４の導水路から、それぞれの軸受３７ａ，
３７ｂの導水路、公転軸２５の上面のプール状に広がっ
た導水路、公転軸２５の図示の下向きの矢印の導水路に
導かれ、公転軸受３８の導水路より冷却水出口継手４３
ｂに導かれ、矢印のように、冷却配管４４を介して、傾
斜機構軸受４６に埋設した導水路（図示せず）を通じて
排給される。ここで、本実施例のイオンビーム加工装置
の試料ホルダは、外周側に設置した複数の試料ホルダ１
０と内周側に設置した複数の試料ホルダ２０から構成さ
れ、それぞれ自公転機構を有するため、各試料ホルダへ
の冷却水は、内・外周に配置した試料ホルダ１０，２０
の各自転軸２４が全数並列回路となるよう、公転軸２５
のプール部を設け、このプール部から内・外周側に設置
した各試料ホルダに均等給水する。Next, the cooling water supply mechanism (system) of the sample holder will be described. The sample holder tilting mechanism installed on the outside of the vacuum chamber 6 is, as described in FIG.
A tilt mechanism shaft 45 and a tilt mechanism bearing 46 are provided, and a water guiding channel (not shown) is buried in the tilt mechanism bearing 46 for passing cooling water for cooling the sample 21 by ion beam irradiation. Cooling water (indicated by dots) is
Through the water conduit embedded in the tilt mechanism bearing 46, the cooling pipe 4
4 is supplied to the cooling water inlet joint 43a. The cooling water supplied to the cooling water inlet joint 43a is supplied to the revolution bearing 38
Is introduced (arrow pointing left in the drawing), guided to the revolving shaft 25 via a rotary joint (arrow pointing up in the drawing), and guided to a pool-shaped water conduit on the upper surface of the revolving shaft 25 (arrow pointing left in the drawing). . This pool-shaped water guideway is a bearing 37 that allows the block to be inserted and fixed with one touch on the outer peripheral side.
a and the respective water conduits of the bearings 37b arranged in an island shape on the inner peripheral side are connected via a rotary joint similarly to the revolution shaft 25, and the water conduits of the respective bearings 37a and 37b are Similar to the revolution shaft 25, it is connected to the respective water conduits of the respective rotation shafts 24 of the sample holders 10 and 20 via rotary joints. The cooling water guided to the water conduit that spreads in a pool shape on the upper surface of the revolution shaft 25 is guided to the water conduits of the bearings 37a and 37b (arrows pointing upward in the drawing), and the sample holder 1
It is supplied to the upper surface side of each of the rotation shafts 0 and 20 (arrows pointing left and right in the drawing). Thus, the cooling water is passed to the lower surface side of the sample holder 22, and the sample 21 is directly cooled. Sample 2
The cooling water that has cooled 1 is introduced into a water conduit different from the above-mentioned water conduit, and sample holders 10, 20 are drawn as indicated by arrows.
From the water conduit of each of the rotating shafts 24 of the respective bearings 37a,
37 b, the water guide that spreads in a pool shape on the upper surface of the revolution shaft 25, and the water guide pipe of the downward arrow of the revolution shaft 25 that guides the cooling water outlet joint 43 from the water guide passage of the revolution bearing 38.
b, and is discharged through a water conduit (not shown) embedded in the tilt mechanism bearing 46 via the cooling pipe 44 as indicated by the arrow. Here, the sample holder of the ion beam processing apparatus of the present embodiment includes a plurality of sample holders 1 installed on the outer peripheral side.
0 and a plurality of sample holders 20 installed on the inner circumference side, each having a rotation / revolution mechanism, so that the cooling water to each of the sample holders 10 and 20 arranged on the inner and outer circumferences is cooled.
Revolution axis 25 so that each rotation axis 24 of
A pool section is provided, and water is evenly supplied from this pool section to each sample holder installed on the inner and outer circumference sides.
【００１２】本実施例は、以上説明したように、試料ホ
ルダの設置する径を例えばφ４００以上の大口径イオン
源と概略同一径とし、かつ、その内周、外周にそれぞれ
複数列の試料ホルダを配置することにより、引き出され
たイオンビームを目一杯活用し、また、内周、外周に設
置したそれぞれの試料ホルダの裏面にまで冷却水を通水
する直接冷却とすることにより、試料の冷却特性を改善
し、加工精度（均一性や加工形状）を向上させ、高スル
ープット化を達成することができる。In this embodiment, as described above, the diameter of the sample holder to be installed is approximately the same as that of a large-diameter ion source of, for example, φ400 or more, and a plurality of rows of sample holders are provided on the inner circumference and outer circumference, respectively. By arranging it, the extracted ion beam can be fully utilized, and the cooling characteristics of the sample can be reduced by direct cooling water flowing to the back surface of each sample holder installed on the inner and outer circumferences. It is possible to improve processing accuracy (uniformity and processing shape) and achieve high throughput.
【００１３】[0013]
【発明の効果】以上説明したように、本発明によれば、
試料ホルダの設置する径を例えばφ４００以上の大口径
イオン源と概略同一径とし、かつ、その内周、外周のイ
オンビーム照射面全面に試料ホルダを複数列そして全周
に配置することにより、引き出されたイオンビームを目
一杯活用し、また、試料ホルダ裏面にまで冷却水を通水
して、試料を直接冷却することにより、試料の冷却特性
を改善し、加工精度（均一性や加工形状）を向上させ、
高スループット化を達成することができる。As described above, according to the present invention,
The diameter of the sample holder is approximately the same as that of a large-diameter ion source with a diameter of φ400 or more, and the sample holders are arranged in multiple rows and all around the ion beam irradiation surface on the inner and outer circumferences of the ion holder. The cooling characteristics of the sample are improved and the processing accuracy (uniformity and processing shape) is improved by fully utilizing the generated ion beam, and by cooling water through the back side of the sample holder to cool the sample directly. Improve
Higher throughput can be achieved.
【図１】本発明の一実施例を示すイオンビーム加工装置
の試料ホルダの縦断面図FIG. 1 is a vertical sectional view of a sample holder of an ion beam processing apparatus showing an embodiment of the present invention.
【図２】図１に示すイオンビーム加工装置の試料ホルダ
の一部を示す横断面図2 is a cross-sectional view showing a part of a sample holder of the ion beam processing apparatus shown in FIG.
【図３】図１に示すイオンビーム加工装置の試料ホルダ
の回転駆動機構と冷却水供給機構（系統）の詳細な縦断
面図FIG. 3 is a detailed vertical sectional view of a rotation drive mechanism and a cooling water supply mechanism (system) of the sample holder of the ion beam processing apparatus shown in FIG.
【図４】本発明を適用するイオンビーム加工装置の構成
図FIG. 4 is a block diagram of an ion beam processing apparatus to which the present invention is applied.
【図５】従来構造のイオンビーム加工装置の試料ホルダ
の一部を示す横断面図FIG. 5 is a cross-sectional view showing a part of a sample holder of an ion beam processing apparatus having a conventional structure.
１０ 試料ホルダ １１ 駆動用モータ ２０ 試料ホルダ ２１ 試料 ２４ 自転軸 ２５ 公転軸 ２６ 支持ベース ２７ 自転用歯車 ２８ 自転ホルダ内周側固定歯車 ２９ 自転用歯車 ３０ 自転ホルダ外周側固定歯車 ３４ 歯車 ３５ 歯車 ３７ 軸受 ３８ 軸受 ４３ 冷却水出入口継手 ４４ 冷却水配管 ４５ 傾斜機構軸 ４６ 傾斜機構軸受 10 sample holder 11 drive motor 20 sample holder 21 sample 24 rotating shaft 25 revolving shaft 26 support base 27 rotating gear 28 rotating holder inner peripheral side fixed gear 29 rotating gear 30 rotating holder outer peripheral fixed gear 34 gear 35 gear 37 bearing 38 bearing 43 cooling water inlet / outlet joint 44 cooling water pipe 45 tilt mechanism shaft 46 tilt mechanism bearing
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 ＦＩ 技術表示箇所 Ｈ０１Ｌ 21/203 Ｓ 9545−4Ｍ 21/3065 21/31 Ｄ // Ｃ２３Ｃ 14/50 Ｈ 8939−4Ｋ ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical display location H01L 21/203 S 9545-4M 21/3065 21/31 D // C23C 14/50 H 8939-4K
Claims (4)
生成させるイオン源と、このイオンを照射する試料を保
持する試料ホルダと、試料ホルダを駆動する駆動機構
と、真空チャンバとを備えるイオンビーム加工装置にお
いて、試料ホルダをイオン源の口径と概略同一サイズと
し、かつ、その内・外周に複数列配置することを特徴と
するイオンビーム加工装置。1. Ion beam processing comprising an ion source for plasmaizing the introduced gas to generate ions, a sample holder for holding a sample for irradiating the ions, a drive mechanism for driving the sample holder, and a vacuum chamber. In the apparatus, the ion beam processing apparatus is characterized in that the sample holders have substantially the same size as the diameter of the ion source, and a plurality of rows are arranged inside and outside the sample holder.
置した試料ホルダは、それぞれ自公転機構及び冷却機構
を有し、自公転機構内に設けた冷却機構を介して各試料
ホルダの裏面側まで冷却水を供給し、試料を直接冷却す
ることを特徴とするイオンビーム加工装置。2. The sample holder according to claim 1, wherein the sample holders arranged in a plurality of rows on the inner and outer circumferences respectively have a rotation and revolution mechanism and a cooling mechanism, and the back surface of each sample holder is provided via a cooling mechanism provided in the rotation and revolution mechanism. An ion beam processing device characterized in that cooling water is supplied to the side to directly cool the sample.
用モータの駆動トルクをホルダ中央の公転軸に伝え、公
転軸を回転して、外周側に設置した試料ホルダと内周側
に設置した試料ホルダを公転させると同時に、公転軸の
回転を、内周側自転用歯車及び外周側自転用歯車と自転
ホルダ内周側固定歯車及び外周側固定歯車を介して試料
ホルダの各自転軸２４に伝達し、各自転軸２４を回転し
て、外周側に設置した試料ホルダと内周側に設置した試
料ホルダを自転させることを特徴とするイオンビーム加
工装置。3. The revolving mechanism according to claim 2, wherein the drive torque of the drive motor is transmitted to the revolution shaft in the center of the holder, the revolution shaft is rotated, and the sample holder is installed on the outer peripheral side and the sample holder is installed on the inner peripheral side. The sample holder is revolved, and at the same time, the revolution shaft is rotated by rotating each of the rotation shafts 24 of the sample holder through the inner circumference side rotation gear and the outer circumference side rotation gear, the rotation holder inner circumference side fixed gear and the outer circumference side fixed gear. To rotate each of the rotation shafts 24 to rotate the sample holder installed on the outer peripheral side and the sample holder installed on the inner peripheral side.
を試料ホルダ傾斜機構に埋設した導水路から公転軸受及
び公転軸に設けた導水路を経て公転軸の上面のプール状
に広がった導水路に導き、内・外周に配置したそれぞれ
の自転ホルダの軸受の導水路を経てそれぞれの試料ホル
ダの各自転軸の上面側に供給して、試料を直接冷却する
ことを特徴とするイオンビーム加工装置。4. The cooling mechanism according to claim 2, wherein the cooling water is spread from a water conduit embedded in the sample holder tilting mechanism to a pool shape on the upper surface of the revolution shaft through a water conduit provided in the revolution bearing and the revolution shaft. Ion beam processing characterized by directing the sample to the water channel, supplying it to the upper surface side of each rotation axis of each sample holder via the water guide channel of the bearing of each rotation holder arranged inside and outside, and directly cooling the sample apparatus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6243396A JPH0883834A (en) | 1994-09-12 | 1994-09-12 | Processing equipment by ion beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6243396A JPH0883834A (en) | 1994-09-12 | 1994-09-12 | Processing equipment by ion beam |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0883834A true JPH0883834A (en) | 1996-03-26 |
Family
ID=17103247
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6243396A Pending JPH0883834A (en) | 1994-09-12 | 1994-09-12 | Processing equipment by ion beam |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0883834A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008107226A (en) * | 2006-10-26 | 2008-05-08 | Jeol Ltd | Sample preparing system |
| JP2013507776A (en) * | 2009-10-09 | 2013-03-04 | クリー インコーポレイテッド | Multi-rotation epitaxial growth apparatus and reactor incorporating the same |
-
1994
- 1994-09-12 JP JP6243396A patent/JPH0883834A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008107226A (en) * | 2006-10-26 | 2008-05-08 | Jeol Ltd | Sample preparing system |
| JP2013507776A (en) * | 2009-10-09 | 2013-03-04 | クリー インコーポレイテッド | Multi-rotation epitaxial growth apparatus and reactor incorporating the same |
| US9637822B2 (en) | 2009-10-09 | 2017-05-02 | Cree, Inc. | Multi-rotation epitaxial growth apparatus and reactors incorporating same |
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