JPH08323492A - Beam shaping device for excimer laser - Google Patents

Beam shaping device for excimer laser

Info

Publication number
JPH08323492A
JPH08323492A JP7135270A JP13527095A JPH08323492A JP H08323492 A JPH08323492 A JP H08323492A JP 7135270 A JP7135270 A JP 7135270A JP 13527095 A JP13527095 A JP 13527095A JP H08323492 A JPH08323492 A JP H08323492A
Authority
JP
Japan
Prior art keywords
laser beam
laser
lens
mask
laser light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP7135270A
Other languages
Japanese (ja)
Inventor
Haruo Shirata
春雄 白田
Takashi Ishide
孝 石出
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP7135270A priority Critical patent/JPH08323492A/en
Publication of JPH08323492A publication Critical patent/JPH08323492A/en
Withdrawn legal-status Critical Current

Links

Landscapes

  • Laser Beam Processing (AREA)

Abstract

PURPOSE: To uniformize the intensity distribution of an excimer laser beam, to secure precision of surface machining and to improve dimensional precision. CONSTITUTION: In a high output excimer laser beam machine used in the machining that requires precision in the surface and the dimension of the bottom or side surfaces to be machined, the machine is provided with a cylindrical lens 2, which has a concave for magnifying and shaping a laser beam 1 transmitted from a laser generator, and with a grid-shaped waveguide 3 on which the laser beam 1 from the cylindrical lens 2 is made incident and by which the intensity distribution of the laser beam 1 is uniformized. In addition, the machine is provided with a collimator lens 4, on which the laser beam 1 from the grid- shaped waveguide 3 is made incident and by which the flare-prone laser beam 1 is made parallel, mask 5 on which the laser beam 1 from the collimator lens 4 is made incident and by which the laser beam 1 equivalent to a machining shape is formed, and an image-forming lens 8 on which the laser beam 1 from the mask 5 is made incident to form an image on an object 28 to be machined.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、金属製品の微細成形加
工に利用できる高出力エキシマレーザ用ビーム整形装置
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a beam shaping device for a high power excimer laser which can be used for fine forming of metal products.

【0002】[0002]

【従来の技術】従来における、高出力エキシマレーザを
用いた成形加工は、図7(A)、(B)、(C)、
(D)に示すようにマスク5を用いた次の3種類の加工
法が用いられている。 (1)図7(A)は、マスク5を通過したレーザ光1を
結像レンズ8で、縮小結像の後、その結像点において加
工物28に加工を施す方法で、一般にマスクイメージン
グ法と呼んでいる。 (2)図7(B)は、加工物28に直接マスク5を置い
て、マスク5の開口部を通過したレーザ光1が、加工物
28表面に到達した点で、結像レンズ8透過前の形状に
て結像する位置に結像レンズ8を配した方法で行う加工
で、コンフォーマルマスク法と呼ばれている方法であ
る。 (3)図7(C)は、レーザ光1を結像レンズ8で透過
前の形状で結像した点にマスク5を配して、その通過光
で加工を行う手法で、コンタクトマスク法と呼ばれる方
法である。
2. Description of the Related Art A conventional molding process using a high-power excimer laser is shown in FIGS. 7 (A), (B), (C),
As shown in (D), the following three types of processing methods using the mask 5 are used. (1) FIG. 7A shows a method in which the laser light 1 that has passed through the mask 5 is imaged by the imaging lens 8 after reduction imaging, and the workpiece 28 is processed at the imaging point, which is generally a mask imaging method. I am calling. (2) In FIG. 7B, the mask 5 is placed directly on the workpiece 28, and the laser light 1 that has passed through the opening of the mask 5 reaches the surface of the workpiece 28, before passing through the imaging lens 8. This processing is performed by a method in which the image forming lens 8 is arranged at a position where an image is formed in the shape of, and is a method called a conformal mask method. (3) In FIG. 7C, a mask 5 is arranged at a point where the laser beam 1 is imaged by the imaging lens 8 in a shape before transmission, and processing is performed by the passing light. Is the method called.

【0003】[0003]

【発明が解決しようとする課題】従来のエキシマレーザ
加工は、枠及び貫通形状で、枠及び貫通状態の精度が要
求される加工に採用されているが、高出力のエキシマレ
ーザ発振器が開発されるに従って、加工用途の広域化が
みられ、造形加工の領域にも及びつつある。
The conventional excimer laser processing has been adopted for processing in which a frame and a penetrating shape are required and the accuracy of the frame and the penetrating state is required, but a high output excimer laser oscillator is developed. As a result, the range of processing applications has been widened, and it is reaching the area of modeling processing.

【0004】つまり、現在までは、加工壁の面精度や表
裏の寸法精度の確保のみが要求されていたが、造形加工
の領域では、さらに底面の面精度や寸法精度も要求され
る。そのため、従来の加工手法ではその対応に困難をき
たしている。
In other words, until now, it was required only to secure the surface accuracy of the machined wall and the dimensional accuracy of the front and back surfaces, but in the area of modeling processing, the surface accuracy and dimensional accuracy of the bottom surface are also required. Therefore, it is difficult for the conventional processing method to deal with the problem.

【0005】これらの問題点は、発振されてくるレーザ
光の品質によるものがほとんどである。一例として図8
に示すように、現在のエキシマレーザのビームモードは
不安定型発振形態図8(B)のみならず、安定型発振形
態図8(A)においてもその面強度には均一性が欠けて
いる。
Most of these problems are due to the quality of the oscillated laser light. As an example, FIG.
As shown in FIG. 8, the beam mode of the current excimer laser lacks uniformity in its surface strength not only in the unstable oscillation mode of FIG. 8B but also in the stable oscillation mode of FIG. 8A.

【0006】この面強度のバラツキをそのまま縮小結像
にて用いるため、面精度やその加工精度を確保すること
が困難である。本発明は、これらの問題を解決すること
ができるエキシマレーザ用ビーム整形装置を提供するこ
とを目的とする。
Since this variation in surface strength is used as it is in reduction imaging, it is difficult to secure surface accuracy and processing accuracy. An object of the present invention is to provide a beam shaping device for an excimer laser that can solve these problems.

【0007】[0007]

【課題を解決するための手段】本発明に係るエキシマレ
ーザ用ビーム整形装置は、加工面の底面や、側面の面精
度及び寸法精度を要求される加工に用いる高出力のエキ
シマレーザ用ビーム装置において、(A)レーザ発振器
から伝送されてきたレーザ光を拡大および整形する凹面
を有したシリンドリカルレンズと、(B)前記シリンド
リカルレンズからのレーザ光を入射し、レーザ光の強度
分布を均一にする格子状の導波路と、(C)前記格子状
の導波路からのレーザ光を入射し、拡がり傾向にあるレ
ーザ光を平行にするコリメートレンズと、(D)前記コ
リメートレンズからのレーザ光を入射し、加工形状に相
当するレーザ光を形成するマスクと、(E)前記マスク
からのレーザ光を入射し、加工物にマスクからのレーザ
光を結像する結像レンズを具備することを特徴とする。
A beam shaping device for an excimer laser according to the present invention is a beam device for an excimer laser having a high output to be used for processing requiring surface accuracy and dimensional accuracy of a bottom surface and a side surface of a processed surface. , (A) a cylindrical lens having a concave surface for enlarging and shaping the laser light transmitted from the laser oscillator, and (B) a grating which makes the laser light from the cylindrical lens incident and makes the intensity distribution of the laser light uniform. -Shaped waveguide, (C) laser light from the grating-shaped waveguide is made incident, and the laser light having a tendency to spread is made parallel, and (D) laser light from the collimated lens is made incident. A mask for forming a laser beam corresponding to a processed shape, and (E) an image forming process for forming an image of the laser beam from the mask on a workpiece by injecting the laser beam from the mask. Characterized in that it comprises a lens.

【0008】[0008]

【作用】まずレーザ光を凹面を有したシリンドリカルレ
ンズで整形拡大する。次に格子状の導波路でビーム(レ
ーザ光)全体の面強度を均一化する。すなわち、ビーム
の強度分布を均一にする。
Function: First, the laser light is shaped and enlarged by a cylindrical lens having a concave surface. Next, the surface intensity of the entire beam (laser light) is made uniform by a lattice-shaped waveguide. That is, the intensity distribution of the beam is made uniform.

【0009】次に広がり傾向にあるビームをコリメート
レンズを用いて平行化を行い、結像もしくは集光又は、
そのままの状態によって加工を行うことで、面精度の確
保及び寸法精度の向上を図ることができる。
Next, the beam that tends to spread is collimated by using a collimator lens, and an image is formed or condensed, or
By performing the processing in the state as it is, it is possible to secure the surface accuracy and improve the dimensional accuracy.

【0010】[0010]

【実施例】本発明の実施例を図1〜図6に示す。 (第1実施例)本発明の第1実施例を図1〜図4に示
す。
EXAMPLE An example of the present invention is shown in FIGS. (First Embodiment) A first embodiment of the present invention is shown in FIGS.

【0011】本発明の装置をマスクイメージング法の加
工ヘッドとして適用した場合を第1実施例として図1に
基づいて説明する。レーザ発振器から、伝送されてきた
レーザ光1を、取付けフランジ9に固定される第1上部
胴15に固定リング10で取付けられた凹球面と、一方
に円筒面を持つシリンドリカルレンズ2で、等辺角形の
ビームに広げる。
A case where the apparatus of the present invention is applied as a processing head for a mask imaging method will be described as a first embodiment with reference to FIG. A laser beam 1 transmitted from a laser oscillator is equilaterally shaped by a concave spherical surface mounted on a first upper body 15 fixed to a mounting flange 9 with a fixing ring 10 and a cylindrical lens 2 having a cylindrical surface on one side. Spread to the beam of.

【0012】レーザ光1は、その拡がり過程において、
支持ねじ12と位置調整ねじ13と傾き調整ねじ14等
で第1上部胴15に取付けられた格子状の導波路3に、
伝送される。
The laser light 1 has a
To the lattice-shaped waveguide 3 attached to the first upper body 15 with the support screw 12, the position adjusting screw 13, the tilt adjusting screw 14, and the like,
Is transmitted.

【0013】そして、各々の矩形導波路を意図した格子
状の導波路3において、入射角を持って多重反射がなさ
れ、通過したビームの全体としての均一性が確保され
る。その格子状の導波路3の軸上において、レンズケー
ス20とレンズ位置調整リング17及び押えリング21
で固定されたコリメートレンズ4により、ビーム(レー
ザ光)を平行化する。
Then, in the lattice-shaped waveguide 3 intended for each rectangular waveguide, multiple reflection is performed with an incident angle, and the uniformity of the passing beam as a whole is secured. On the axis of the lattice-shaped waveguide 3, the lens case 20, the lens position adjusting ring 17, and the pressing ring 21 are provided.
The beam (laser light) is collimated by the collimator lens 4 fixed by.

【0014】そして、自体のねじ加工部をもって第1上
部胴15に取付けられた第1下部胴22に配したマスク
5により、加工形状に相当する良品質部のビーム(レー
ザ光)の通過をなし、その下方の第1下部胴22の先端
部で、他方への反射角を有した位置に、調整機構24を
備えた、第1反射ミラー6を配して、伝送されてきたビ
ーム(レーザ光)を迎角をもって反射せしめる。
The mask 5 arranged on the first lower body 22 attached to the first upper body 15 with its own threaded portion allows the beam (laser light) of a good quality portion corresponding to the processed shape to pass therethrough. , The first reflection mirror 6 provided with the adjusting mechanism 24 is arranged at the tip of the first lower body 22 below the first reflection barrel 6 at a position having a reflection angle to the other side, and the transmitted beam (laser light ) Is reflected at an angle of attack.

【0015】その反射軸上に、さらに調整機構16を備
えた第2反射ミラー7を配して、加工対象方向へ反射さ
せ、第2上部胴23にねじ構造をもって結像倍率調整の
ための距離移動を可能な構成で結像系を備えた第2下部
胴26を介して、加工物28まで伝送せしめて加工を行
う。
A second reflecting mirror 7 provided with an adjusting mechanism 16 is arranged on the reflecting axis to reflect the second reflecting mirror 7 in the direction of the object to be processed, and the second upper barrel 23 has a screw structure for adjusting the image magnification ratio. Processing is performed by transmitting to the workpiece 28 via the second lower body 26 having a movable structure and provided with an image forming system.

【0016】結像系は、第2下部胴26の先端に、結像
レンズ取付ねじ27をもって取り付けて固定した結像レ
ンズ8で構成され、距離設定後、固定ネジ25で固定さ
れている。
The image forming system is composed of an image forming lens 8 fixed to the tip of the second lower body 26 with an image forming lens mounting screw 27, and is fixed by a fixing screw 25 after setting the distance.

【0017】また、第1胴と第2胴は、胴支持金具18
と胴取付ねじ19をもって連結固定されている。なお、
図中、11はレンズ保護ガスを送入するガス入口を示
す。
The first and second cylinders are provided with a cylinder support fitting 18
And a body mounting screw 19 are connected and fixed. In addition,
In the figure, 11 indicates a gas inlet for feeding the lens protective gas.

【0018】本発明のエキシマレーザ用ビーム整形装置
により、図2に示すように、後方(図2では上方)から
伝送されてきたレーザ光1が、対面が凹面であるシリン
ドリカルレンズ2を透過するようにし、より大きな等辺
角形の操作性の良い形状に整形すると共に、エネルギ密
度を下げてレーザ光1の加工性を向上させる。
With the beam shaping device for excimer laser of the present invention, as shown in FIG. 2, the laser beam 1 transmitted from the rear side (upper side in FIG. 2) is transmitted through the cylindrical lens 2 having a concave facing surface. In addition to shaping into a larger equilateral polygonal shape with good operability, the energy density is lowered to improve the workability of the laser beam 1.

【0019】次に、多数の矩形導波路を意図した格子状
の導波路3を配して、そのビームを分散した後、各部分
において多重反射を形成させて強度を均一化する。格子
状の導波路3を通過したビームは、それぞれのビームが
均一なビームの集団となる。
Next, a lattice-shaped waveguide 3 intended for a large number of rectangular waveguides is arranged to disperse the beam, and then multiple reflections are formed in each portion to make the intensity uniform. The beams that have passed through the lattice-shaped waveguide 3 form a group of uniform beams.

【0020】その後方で、コリメートレンズ4により平
行化を施し、加工形状に応じたマスク5に至り、その状
態で加工に用いたり、再度結像レンズ8を用いて縮小結
像の後、加工を行う。
After that, the collimator lens 4 collimates and reaches the mask 5 corresponding to the processed shape, and the mask 5 is used for processing in that state, or again after the reduced image is formed by using the image forming lens 8, processing is performed. To do.

【0021】本発明の装置により、従来のレンズ等の光
学系を固定し、加工物を移動して行ってきた加工法にか
わり、図3に示すように、(1)加工機29に取り付け
る加工物固定の場合、(2)加工物移動の場合、(3)
上記(1)と(2)の組み合わせの場合、などの選択が
できる。
With the apparatus of the present invention, instead of the conventional method of fixing the optical system such as a lens and moving the workpiece, as shown in FIG. If the object is fixed, (2) If the workpiece is moved, (3)
In the case of the combination of the above (1) and (2), etc. can be selected.

【0022】そのため、多種類の加工形状に対応するこ
とができる。そして、図4に示すように、ビーム強度の
均一化から、加工面精度及び寸法精度の向上等を含め現
状のエキシマレーザ加工の対象域を極めて広くすること
ができる。
Therefore, it is possible to cope with various kinds of processed shapes. Then, as shown in FIG. 4, it is possible to make the current target area of excimer laser processing extremely wide, including the improvement of the processing surface accuracy and the dimensional accuracy due to the uniformization of the beam intensity.

【0023】図3中、30は加工機側反射ミラー、31
はレンズガス送給ホース、32は加工物の移動のみの加
工や加工機29との両者を用いる加工用の精密テーブル
を示す。 (第2実施例)本発明は図5に示す第2実施例のよう
に、結像レンズ8とマスク5の組合せによって、従来手
法のコンフォーマルマスク法による各種加工法にも適用
可能であり、作業効率と加工精度の両面からの向上をみ
ることができる。 (第3実施例)本発明は図6に示す第3実施例のよう
に、結像レンズ8とマスク5の組合せによって、従来手
法のコンタクトマスク法による各種加工法にも適用可能
であり、作業効率と加工精度の両面からの向上をみるこ
とができる。
In FIG. 3, reference numeral 30 is a processing machine side reflection mirror, and 31 is a reflection mirror.
Is a lens gas feeding hose, and 32 is a precision table for machining only the movement of the workpiece or machining using both the machining machine 29. (Second Embodiment) The present invention can be applied to various processing methods by the conventional conformal mask method by combining the imaging lens 8 and the mask 5 as in the second embodiment shown in FIG. We can see improvements in both work efficiency and processing accuracy. (Third Embodiment) The present invention can be applied to various processing methods by the conventional contact mask method by combining the imaging lens 8 and the mask 5, as in the third embodiment shown in FIG. We can see improvements in both efficiency and processing accuracy.

【0024】[0024]

【発明の効果】本発明は前述のように構成されているの
で、以下に記載するような効果を奏する。 (1)高出力のエキシマレーザ発振器から伝送されるレ
ーザ光に対しても、ビームの面強度を均一にすることが
できる。そのため、加工面精度及び寸法精度の向上をは
かることができる。 (2)本発明装置により、 加工物を加工機に取り付ける加工物固定の場合、 加工物移動の場合、 上記の組合せの場合、 などの選択ができる。そのため多種類の加工形状に対応
することができる。
Since the present invention is constructed as described above, it has the following effects. (1) The surface intensity of the beam can be made uniform even for laser light transmitted from a high-output excimer laser oscillator. Therefore, it is possible to improve the machining surface accuracy and the dimensional accuracy. (2) With the device of the present invention, it is possible to select whether to fix the workpiece to be mounted on the processing machine, move the workpiece, or combine the above. Therefore, it is possible to deal with various kinds of processed shapes.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1実施例に係るビーム整形装置の側
面図。
FIG. 1 is a side view of a beam shaping device according to a first embodiment of the present invention.

【図2】本発明の第1実施例に係るビーム整形装置の概
念図。
FIG. 2 is a conceptual diagram of a beam shaping device according to a first embodiment of the present invention.

【図3】本発明の第1実施例に係るビーム整形装置の使
用状況図。
FIG. 3 is a view showing the use state of the beam shaping device according to the first embodiment of the present invention.

【図4】本発明の第1実施例に係る発振モードを示す説
明図。
FIG. 4 is an explanatory diagram showing an oscillation mode according to the first embodiment of the present invention.

【図5】本発明の第2実施例に係るビーム整形装置の側
面図。
FIG. 5 is a side view of a beam shaping device according to a second embodiment of the present invention.

【図6】本発明の第3実施例に係るビーム整形装置の側
面図。
FIG. 6 is a side view of a beam shaping device according to a third embodiment of the present invention.

【図7】従来のビーム整形装置の概念図。FIG. 7 is a conceptual diagram of a conventional beam shaping device.

【図8】従来のエキシマレーザの発振モードを示す説明
図。
FIG. 8 is an explanatory diagram showing an oscillation mode of a conventional excimer laser.

【符号の説明】 1…レーザ光、 2…シリンドリカルレンズ、 3…格子状の導波路、 4…コリメートレンズ、 5…マスク、 6…第1反射ミラー、 7…第2反射ミラー、 8…結像レンズ、 9…フランジ、 10…固定リング、 11…ガス入口、 12…支持ねじ、 13…位置調整ねじ、 14…傾き調整ねじ、 15…第1上部胴、 16…調整機構、 17…レンズ位置調整リング、 18…胴支持金具、 19…胴取付ねじ、 20…レンズケース、 21…押えリング、 22…第1下部胴、 23…第2上部胴、 24…調整機構、 25…固定ネジ、 26…第2下部胴、 27…結像レンズ取付ねじ、 28…加工物、 29…加工機、 30…加工機側反射ミラー、 31…レンズガス送給ホース、 32…精密加工テーブル。[Explanation of Codes] 1 ... Laser light, 2 ... Cylindrical lens, 3 ... Lattice-shaped waveguide, 4 ... Collimating lens, 5 ... Mask, 6 ... First reflection mirror, 7 ... Second reflection mirror, 8 ... Imaging Lens, 9 ... Flange, 10 ... Fixing ring, 11 ... Gas inlet, 12 ... Support screw, 13 ... Position adjusting screw, 14 ... Tilt adjusting screw, 15 ... First upper body, 16 ... Adjusting mechanism, 17 ... Lens position adjusting Ring, 18 ... Trunk support metal fitting, 19 ... Trunk mounting screw, 20 ... Lens case, 21 ... Holding ring, 22 ... First lower trunk, 23 ... Second upper trunk, 24 ... Adjustment mechanism, 25 ... Fixing screw, 26 ... Second lower body, 27 ... Image forming lens mounting screw, 28 ... Workpiece, 29 ... Processing machine, 30 ... Processing machine side reflection mirror, 31 ... Lens gas feeding hose, 32 ... Precision processing table.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 加工面の底面や、側面の面精度及び寸法
精度を要求される加工に用いる高出力のエキシマレーザ
用ビーム装置において、(A)レーザ発振器から伝送さ
れてきたレーザ光(1)を拡大および整形する凹面を有
したシリンドリカルレンズ(2)と、(B)前記シリン
ドリカルレンズ(2)からのレーザ光(1)を入射し、
レーザ光(1)の強度分布を均一にする格子状の導波路
(3)と、(C)前記格子状の導波路(3)からのレー
ザ光(1)を入射し、拡がり傾向にあるレーザ光(1)
を平行にするコリメートレンズ(4)と、(D)前記コ
リメートレンズ(4)からのレーザ光(1)を入射し、
加工形状に相当するレーザ光(1)を形成するマスク
(5)と、(E)前記マスク(5)からのレーザ光
(1)を入射し、加工物(28)にマスク(5)からの
レーザ光(1)を結像する結像レンズ(8)を具備する
ことを特徴とするエキシマレーザ用ビーム整形装置。
1. A laser beam (1) transmitted from a laser oscillator (A) in a beam device for a high-power excimer laser used for machining, which requires surface accuracy and dimensional accuracy of a bottom surface and a side surface of a processed surface. A cylindrical lens (2) having a concave surface for enlarging and shaping, and (B) entering the laser light (1) from the cylindrical lens (2),
A grating-like waveguide (3) for making the intensity distribution of the laser light (1) uniform, and (C) a laser which has the laser light (1) from the grating-like waveguide (3) incident thereon and tends to spread. Light (1)
Collimating lens (4) for making parallel to each other, and (D) entering the laser light (1) from the collimating lens (4),
A mask (5) for forming a laser beam (1) corresponding to a processed shape and (E) the laser beam (1) from the mask (5) are incident on the workpiece (28) from the mask (5). A beam shaping device for an excimer laser, comprising an imaging lens (8) for imaging a laser beam (1).
JP7135270A 1995-06-01 1995-06-01 Beam shaping device for excimer laser Withdrawn JPH08323492A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7135270A JPH08323492A (en) 1995-06-01 1995-06-01 Beam shaping device for excimer laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7135270A JPH08323492A (en) 1995-06-01 1995-06-01 Beam shaping device for excimer laser

Publications (1)

Publication Number Publication Date
JPH08323492A true JPH08323492A (en) 1996-12-10

Family

ID=15147782

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7135270A Withdrawn JPH08323492A (en) 1995-06-01 1995-06-01 Beam shaping device for excimer laser

Country Status (1)

Country Link
JP (1) JPH08323492A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6514507B2 (en) * 1998-09-22 2003-02-04 Societe L'oreal S.A. Hydroxydecenoic acid compounds for promoting desquamation/epidermal renewal of the skin and/or combating skin aging

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6514507B2 (en) * 1998-09-22 2003-02-04 Societe L'oreal S.A. Hydroxydecenoic acid compounds for promoting desquamation/epidermal renewal of the skin and/or combating skin aging

Similar Documents

Publication Publication Date Title
KR100951370B1 (en) Device for beam shaping
EP0813696B1 (en) Laser scanning system with reflective optics
US5005969A (en) Optical projection apparatus with the function of controlling laser coherency
US5572287A (en) Illuminating arrangement for a projection microlithographic exposure apparatus
JP2006065348A (en) Method for shaping irradiance profile using optical element having positive and negative optical power
EP0724498B1 (en) Full field mask illumination enhancement methods and apparatus
US5477384A (en) Laser optical device
JPH1096859A (en) Optical structure
WO1991004829A1 (en) Device for providing a beam of laser radiation having a homogeneous energy distribution
US5828496A (en) Illumination optical system
KR100659438B1 (en) Apparatus and method for laser processing
US5401934A (en) Lens system for scanning laser apparatus
JP3191702B2 (en) Beam homogenizer
JP2662065B2 (en) Optical system for laser marking
JPH08323492A (en) Beam shaping device for excimer laser
JP3644431B2 (en) Laser equipment
JP3402124B2 (en) Beam homogenizer and method for producing semiconductor thin film
JP2003275888A (en) Laser beam machining apparatus and processing method
JPS6332555A (en) Exposing device
JP3479197B2 (en) Laser device
JP3406946B2 (en) Illumination optical system, optical apparatus using the same, and device manufacturing method using the optical apparatus
JP3521506B2 (en) Illumination device and exposure device
CN117103684B (en) Scanning system for reducing inertia of vibrating mirror with long working distance
JP2002025933A (en) Beam homogenizer and semiconductor thin film generating method
JPH07253556A (en) Beam expander and optical system and laser beam machine

Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20020806