JPH08313748A - Producing device for oxide glass film - Google Patents

Abstract

PURPOSE: To prevent generation of cracks in a later of glass fine particles by disposing an electrostatic chuck with a heater under a substrate and depositing glass particles from a flame burner on the substrate on a table while the burner is relatively moved to the substrate. CONSTITUTION: A substrate 2 made of Si, etc., is mounted on a turntable 1 made of quartz or the like and flames from an oxyhydrogen burner 3 to which the source material gas essentially comprising SiCl4 . and the like is mixed are sprayed to the substrate 2 to deposit glass fine particles. During deposition, the oxyhydrogen flame burner 3 is reciprocally moved by a burner moving shaft 4 and excess glass particles which do not deposit on the substrate 2 are discharged through a gas discharging pipe 5 to the outside. In this method, an electrostatic chuck 6 with a heater having the same size as that of the substrate 2 is mounted on the turntable 1, and the substrate 2 is fixed to the specified position so that only the substrate 2 is heated to specified temp. Therefore, the turntable part in the outside of the substrate 2 is not heated to high temp. and therefore, the glass particles deposit only on the substrate 2 to form a film 7 of glass fine particles.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for producing an oxide glass film, and more particularly, to prevent the deposition of glass particles on the outside of a substrate and the adhesion of extra glass particles to the deposition surface of the substrate, thereby forming a glass particle layer The present invention relates to an oxide glass film production apparatus which prevents the occurrence of cracks in the oxide glass film.

[0002]

2. Description of the Related Art Regarding an oxide glass film manufacturing apparatus, Masao Kawauchi et al., Optical and Quantum Electronics 22 391
~ 416 (1990), as shown in Fig. 3, a raw material gas such as SiCl ₄ + TiCl ₄ or SiCl ₄ + GeCl ₄ was supplied to the oxyhydrogen flame burner 13 and the turntable 11 rotating the glass particles generated from this gas was rotated. It is deposited on the substrate 12 made of Si or quartz placed on the substrate, and the burner 13 is reciprocated in the radial direction of the table so that the glass particles are uniformly deposited on the entire surface of the substrate 12. 1,200 ~ in the furnace
A method is known in which transparent glass is produced by heating to 1,400 ° C.

And, regarding this flame thrusting apparatus,
As shown in FIG. 4, the author of this paper, Masao Kawauchi, arranged a turntable 11 and a substrate 12 on a substrate holder 14 and provided a substrate heater 15 in the substrate holder 14 to energize them. To raise the substrate temperature and
We have proposed to rotate 14 (JP-A-58-58).
105111), in this case, as shown in FIG. 5, a high temperature gas flow containing glass particles flowing on the surface of the substrate 12.
It is said that excess glass particles not adhered to the substrate from 16 are guided to the exhaust pipe 17.

[0004]

However, in this apparatus, the substrate 12 is heated by the substrate heater 15 provided in the substrate holder 14. By this heating, not only the substrate 12 but also the substrate outer peripheral portion is heated. Since the turntable 11 of is also heated, if glass particles are piled up in this state,
As shown in FIG. 6, the glass particles 18 are deposited not only on the surface of the substrate 12 but also on the turntable 11, and when the substrate 12 is taken out from this, the glass deposited on the turntable 11 from the end portion of the substrate 12 is deposited. The layer of the fine particle film 18 is cracked,
The cracks also extend to the surface of the substrate 12, and when the substrate is taken out, problems such as the lump of the glass fine particle film 18 laminated on the turntable peeling from the end of the substrate and adhering to the substrate surface occur. When such a substrate is heated and vitrified, it becomes a defect such as a crack or a microcrystal, which causes a propagation loss when light is guided. Also, at this time, the board is not always placed on the same position just by placing it on the turntable, so it is necessary to change parameters such as the stroke width of the burner and the rotation speed of the turntable each time. It cannot be said that there is.

[0005]

SUMMARY OF THE INVENTION The present invention relates to an oxide glass film manufacturing apparatus which solves the above disadvantages and drawbacks, in which oxide glass fine particles are relative to a substrate on a table from an oxyhydrogen flame burner. In the apparatus for producing an oxide glass film, in which a glass fine particle layer is formed by stacking while moving to a substrate, and then heated to make it transparent, a means for fixing the substrate to the table under the substrate and a means for heating the substrate are provided. It is characterized in that it is provided, and the means for fixing the substrate to the table and the means for heating the substrate are electrostatic chucks with a heater.

That is, the inventors of the present invention have conducted various studies to develop an oxide glass film manufacturing apparatus that solves the above disadvantages. As a result, the substrate is fixed on a turntable and only this substrate is heated. In order to do so, it is sufficient to provide a means for fixing the substrate to the turntable and a means for heating only this substrate, and the electrostatic chuck with a heater is used as a means for fixing this substrate and heating this substrate. Assuming that this electrostatic chuck with heater is the same size as the substrate, fix it on the turntable, and place the substrate on this, the substrate will be fixed. Only the substrate is heated if heated, and the temperature of the turntable around this becomes lower than that of the substrate, so it was found that the deposition of glass particles was only on the substrate, According to this, there is no crack on the surface of the substrate at the time of taking out the substrate and peeling of the glass fine particle layer is eliminated, so that the vitrified material does not have cracks or defects such as microcrystals, and the light is guided. The present invention has been completed by confirming that the propagation loss at that time also disappears.

[0007]

The function of the oxide glass film production apparatus of the present invention is shown in FIGS.
It is assumed that FIG. 1 is a perspective view of an oxide glass film manufacturing apparatus of the present invention, and FIG. 2 is a vertical sectional view showing the installation of a substrate fixing means and a heater-equipped electrostatic chuck as substrate heating means in this apparatus. That is, as shown in FIG. 1, this oxide glass film manufacturing apparatus is similar to the known oxide glass film manufacturing apparatus shown in FIG. 3, and Si, quartz, etc. are placed on the turntable 1 made of quartz, etc. A substrate 2 made of is placed, and a flame from an oxyhydrogen flame burner 3 mixed with a raw material gas is blown onto this substrate 2 to deposit glass fine particles there. During this time, the oxyhydrogen flame burner is operated by the burner moving shaft 4 It is preferable to reciprocate in the above manner, and the surplus glass particles not deposited on the substrate 2 are discharged to the outside through the exhaust pipe 5.

However, in the oxide glass film manufacturing apparatus of the present invention, in order to fix the substrate 2 at a predetermined position of the turntable 1 and to heat only this substrate to a predetermined temperature, the substrate fixing device is provided here. A substrate heating device is provided. For example, as shown in FIG. 2, the fixing means and the electrostatic chuck 6 with a heater as the heating means are provided on the turntable 1.
The electrostatic chuck 6 with a heater is placed on the
Is the same size as the substrate 2. However, since the substrate is placed on the electrostatic chuck 6 with a heater, the substrate 2 is provided with a predetermined size of the turntable 1. It is fixed in position and this size is substrate 2
Since the size of the substrate 2 is the same as that of the substrate 2, only the substrate 2 is heated to a predetermined temperature by heating with this heater.
Since the temperature of the turntable outside the table does not reach a very high temperature, the glass particles are deposited only on the substrate and the glass particle film 7 is formed here.

Therefore, according to this, since the substrate is fixed to the turntable by the electrostatic chuck, the substrate does not move even while the turntable rotates, and the substrate is heated by the electrostatic chuck with a heater. Therefore, only the substrate is heated, the temperature of the turntable becomes lower than the temperature of the substrate, and the glass particles are deposited only on the substrate, making it easy to take out the substrate and cracking the substrate at the time of taking out. Since the glass fine particle layer will not be peeled off, the oxide glass film obtained by vitrifying this will be free from defects such as crack generation and microcrystals, which will cause propagation loss when light is guided. The advantage is also given.

The electrostatic chuck with a heater used here may be a known one, for example, the one shown in FIG. According to FIG. 7, in this electrostatic chuck with a heater, an electrostatic chuck electrode 22 made of a conductive material such as tungsten is formed on one surface of a substrate 21 made of ceramics such as alumina. Is connected, and a heating electrode 23 made of a conductive material is formed on the other surface, and a power circuit 25 is connected to this, and this substrate 21 and both electrodes 22, 23 are insulating layers. The structure is covered by 24. When the power supply circuits 25 and 26 are energized, the electrostatic chuck with a heater attracts and heats the substrate 2.

Further, in this case, the raw material gas used here is mainly composed of SiCl ₄ , but when it forms the core layer, SiO ₂ + GeO ₂ is mixed as SiCl ₄ + GeCl ₄ mixed gas, SiO ₂ + as mixed gas of SiCl + TiCl ₄
TiO ₂ as a mixed gas of SiCl ₄ + GeCl ₄ + BBr ₃ + POCl ₃
SiO ₂ ＋ GeO ₂ ＋ B ₂ O ₃ ＋ P ₂ O ₅ and also SiCl ₄ ＋ TiCl ₄ ＋ BBr ₃
SiO ₂ + TiO ₂ + B ₂ O ₃ + P ₂ O ₅ may be generated as a + POCl ₃ mixed gas, or when this forms a cladding layer, SiO ₂ , SiO ₂ + P ₂ O ₅ + B ₂ O ₃ A halide or alkoxide of each element may be used so as to form

The turntable is preferably made of a non-metallic material having a high melting point, so that it is preferably made of quartz, carbon, alumina or the like. Quartz is desirable because it has a low medium reactivity. In addition, the electrostatic chuck with a heater used here may be installed here by providing a recess in the turntable in order to incorporate the electrostatic chuck in the turntable. The electrode and the heating electrode may be formed to operate by external power supply, but if the heating electrode is made of pyrolytic lead-free, the temperature can be raised to 1,000 ° C.

[0013]

EXAMPLES Next, examples of the present invention will be given. Example An electrostatic chuck with a heater having an outer diameter of 10 cm shown in FIG. 7 was installed on the surface of a quartz turntable, and an outer diameter of 10 cm was placed on the electrostatic chuck.
A 1.0 mm thick silicon substrate was placed and fixed with an electrostatic chuck. Then, this substrate is
After heating to 00 ℃ and examining the temperature distribution on the substrate surface,
It was 800 ° C ± 10 ° C.

Next, SiC as a raw material gas was applied to this substrate.
The gas flow rate with addition of l ₄ , BBr ₃ , and POCl ₃ is H ₂ 3.0 L /
Min, O ₂ 4.0 L / min, Ar 1.6 L / min, SiCl ₄ 120cc / min, BB
r ₃ 20cc / min, POCl ₃ 50cc / min, stroke length 120
mm moving speed of 1 mm / mm of flame from oxyhydrogen flame burner
When the glass particles were sprayed onto the substrate by spraying while moving at a rotation speed of the turntable of 5 rpm for 2 seconds, the glass particles with a thickness of 0.2 mm were deposited on the substrate after 1 hour. Almost no deposition of glass particles on the table was observed, so only the substrate was taken out from this, and this substrate was heated to 1 L / min + O ₂ 1 L / min using an electric furnace.
A transparent glass film could be obtained by sintering at 1,270 ° C. in a minute atmosphere, and when the glass film was observed with a microscope, neither cracks nor microcrystals were found.

[0015]

Industrial Applicability The present invention relates to an oxide glass film manufacturing apparatus. According to the present invention, an electrostatic chuck fixed on a turntable prevents a substrate from moving during rotation of the turntable. It is fixed and this substrate is heated by the heater attached to this electrostatic chuck,
Since the turntable is not heated so much, the fine glass powder from the oxyhydrogen flame burner onto the substrate is deposited only on the substrate, and therefore the substrate surface may be cracked or the glass fine particle layer may peel off when the substrate is taken out. The glass film obtained by vitrifying this is advantageous in that it is free of cracks and microcrystals.

[Brief description of drawings]

FIG. 1 is a perspective view of an oxide glass film manufacturing apparatus of the present invention.

FIG. 2 is a vertical sectional view showing an arrangement example of a turntable, an electrostatic chuck with a heater, a substrate, and a glass fine powder film in the oxide glass film manufacturing apparatus of the present invention.

FIG. 3 is a perspective view of a known oxide glass film manufacturing apparatus.

FIG. 4 is a vertical cross-sectional view of a heating device arrangement of a known oxide glass film manufacturing apparatus.

FIG. 5 is a vertical cross-sectional view of a surplus glass particulate exhaust device in a conventionally known oxide glass film manufacturing apparatus.

FIG. 6 is a vertical sectional view showing a state in which a glass fine powder film is formed on a substrate in a conventionally known oxide glass film manufacturing apparatus.

FIG. 7 shows an example of a vertical sectional view of a known electrostatic chuck with a heater.

[Explanation of symbols]

 1, 11 ... turntable 2, 12 ... substrate 3, 13 ... oxyhydrogen flame burner 4 ... burner moving shaft 5, 17 ... exhaust pipe 6 ... electrostatic chuck with heater 7, 18 ... glass particle film 14 ... substrate holder 15 ... Substrate heating heater 16 ... High temperature gas flow 21 ... Substrate 22 ... Electrostatic chuck electrode 23 ... Heating electrode 24 ... Insulating layer 25, 26 ... Power supply circuit

Claims (3)

[Claims] 1. A glass fine particle layer is formed by depositing oxide glass fine particles from an oxyhydrogen flame burner on a substrate on a table while relatively moving them, and then heating the glass fine particle layer,
An apparatus for producing an oxide glass film to be transparent, characterized in that means for fixing the substrate to a table and means for heating the substrate are provided below the substrate. 2. The electrostatic chuck with a heater is used as the means for fixing the substrate to the table and the means for heating the substrate.
The oxide glass film manufacturing apparatus described in 1. 3. The oxide glass film production according to claim 1, further comprising means for suppressing the substrate temperature at the time of forming the glass particles by a heat source provided under the substrate or outside, and exhausting the excess glass particles near the substrate. apparatus.