JPH08311130A - Photocurable resin composition - Google Patents

Photocurable resin composition

Info

Publication number
JPH08311130A
JPH08311130A JP14672695A JP14672695A JPH08311130A JP H08311130 A JPH08311130 A JP H08311130A JP 14672695 A JP14672695 A JP 14672695A JP 14672695 A JP14672695 A JP 14672695A JP H08311130 A JPH08311130 A JP H08311130A
Authority
JP
Japan
Prior art keywords
formula
resin composition
photocurable resin
pts
diacrylate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14672695A
Other languages
Japanese (ja)
Inventor
Shinji Tsuchiya
慎二 土屋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Chemical Corp
Original Assignee
Toshiba Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Chemical Corp filed Critical Toshiba Chemical Corp
Priority to JP14672695A priority Critical patent/JPH08311130A/en
Publication of JPH08311130A publication Critical patent/JPH08311130A/en
Pending legal-status Critical Current

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  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

PURPOSE: To obtain the subject composition containing a specific resin, a specific diacrylate and a specific photopolymerization initiator as essential components, excellent in flexibility, heat resistance and alkali resistance, and useful in an electronic material field. CONSTITUTION: A photocurable resin composition contains (A) a vinylester resin of formula I (R<1> is H, methyl; R<2> is a divalent organic group; n is 0, 1) (e.g. a resin of formula II), (B) a tricyclodecanedimethylol diacrylate of formula III (R<3> is H, methyl) (e.g. a compound of formula IV), and (C) a photopolymrization initiator (e.g. biacetylacetophenone) as essential components. The components A, B and C are preferably used in amounts of 95-5 pts.wt., 5-95 pts.wt., and 3-15 pts.wt. (based on 100 pts.wt. of the total amount of the components A and B), respectively.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、可とう性、耐水性、耐
アルカリ性に優れた光硬化性樹脂組成物に関する。
FIELD OF THE INVENTION The present invention relates to a photocurable resin composition having excellent flexibility, water resistance and alkali resistance.

【0002】[0002]

【従来の技術】近年、省エネルギーや高生産性と無公害
等の要求が増加し、光によって樹脂を硬化させるプロセ
スが注目されてきている。一方、光硬化性樹脂組成物を
利用した用途も旧来からのプラスチック、紙、木、無機
質素材等における塗料、インキ、接着剤としてのみなら
ず、半導体、液晶に代表される電子材料分野や光ファイ
バー、光学レンズ等に代表されるオプトエレクトロニク
分野、さらには医療分野等にさらに拡大してきている。
2. Description of the Related Art In recent years, demands for energy saving, high productivity, and no pollution have increased, and attention has been paid to a process of curing a resin by light. On the other hand, applications using the photocurable resin composition are not only used as paints, inks, and adhesives for conventional plastics, paper, wood, inorganic materials, etc., but also semiconductors, electronic material fields represented by liquid crystals, and optical fibers, It has been further expanded to the field of optoelectronics represented by optical lenses and the like, as well as the medical field.

【0003】[0003]

【発明が解決しようとする課題】しかし、光硬化性樹脂
組成物は、一般にその架橋密度が高いため、可とう性に
乏しく、また、塗膜の性質上基材に塗らなければなら
ず、極性のある官能基等を含有しているため、耐水性や
耐アルカリ性に劣っていた。これを改良するため、長鎖
不飽和化合物系の光重合性成分を使用したりして可とう
性を付与する試みがなされていたが、近年の用途拡大等
による耐水性や耐アルカリ性の要求には満足できるもの
ではなかった。
However, since the photocurable resin composition generally has a high crosslink density, it is poor in flexibility, and because of the nature of the coating film, it has to be applied to a substrate, Since it contains a certain functional group, it was inferior in water resistance and alkali resistance. In order to improve this, attempts have been made to impart flexibility by using a photopolymerizable component of a long-chain unsaturated compound system, but in recent years due to expansion of applications, etc., there is a demand for water resistance and alkali resistance. Was not happy.

【0004】本発明は、上記の事情、欠点に鑑みてなさ
れたもので、可とう性、耐水性、耐アルカリ性に優れた
光硬化性樹脂組成物を提供しようとするものである。
The present invention has been made in view of the above circumstances and drawbacks, and an object thereof is to provide a photocurable resin composition excellent in flexibility, water resistance and alkali resistance.

【0005】[0005]

【課題を解決するための手段】本発明者は、上記の目的
を達成しようと鋭意研究を重ねた結果、後述する樹脂組
成物が、上記の目的を達成できることを見いだし、本発
明を完成したものである。
Means for Solving the Problems As a result of intensive studies to achieve the above object, the present inventor has found that the resin composition described below can achieve the above object and completed the present invention. Is.

【0006】即ち、本発明は、 (A)次の一般式で示されるビニルエステル樹脂、That is, the present invention provides (A) a vinyl ester resin represented by the following general formula,

【0007】[0007]

【化3】 (但し、式中R1 は水素原子又はメチル基を、R2 は 2
価の有機基を、n は 0又は 1の整数をそれぞれ表す) (B)次の一般式で示されるトリシクロデカンジメチロ
ールジアクリレートおよび
Embedded image (However, in the formula, R 1 is a hydrogen atom or a methyl group, and R 2 is 2
A valent organic group, n is an integer of 0 or 1 respectively) (B) tricyclodecane dimethylol diacrylate represented by the following general formula and

【0008】[0008]

【化4】 [Chemical 4]

【0009】(但し、式中R3 は水素原子又はメチル基
を表す。) (C)光重合開始剤 を必須成分としてなることを特徴とする光硬化性樹脂組
成物である。
(In the formula, R 3 represents a hydrogen atom or a methyl group.) (C) A photocurable resin composition comprising a photopolymerization initiator as an essential component.

【0010】以下、本発明を詳細に説明する。Hereinafter, the present invention will be described in detail.

【0011】本発明に用いる(A)ビニルエステル樹脂
としては、上記の一般式化3で示したものが使用でき
る。このビニルエステル樹脂のR2 は炭素数 1〜18、好
ましくは 2〜12である。ビニルエステル樹脂の具体的な
ものとして、例えば、
As the vinyl ester resin (A) used in the present invention, those represented by the above general formula 3 can be used. R 2 of this vinyl ester resin has 1 to 18 carbon atoms, preferably 2 to 12 carbon atoms. Specific examples of the vinyl ester resin include, for example,

【0012】[0012]

【化5】 Embedded image

【0013】[0013]

【化6】 [Chemical 6]

【0014】[0014]

【化7】 等が挙げられ、これらは単独又は混合して使用すること
ができる。
[Chemical 7] Etc., and these can be used alone or in combination.

【0015】本発明に用いる(B)トリシクロデカンジ
メチロールジアクリレートとしては、前記の化4で示さ
れるものを使用することができる。このトリシクロデカ
ンジメチロールジアクリレートの具体的なものとして、
例えば、
As the (B) tricyclodecane dimethylol diacrylate used in the present invention, the one represented by the above chemical formula 4 can be used. As a specific example of this tricyclodecane dimethylol diacrylate,
For example,

【0016】[0016]

【化8】 Embedded image

【0017】[0017]

【化9】 等が挙げられ、これらは単独又は混合して使用すること
ができる。この配合割合は、(A)のビニルエステル樹
脂95〜5 重量部に対して5 〜95重量部配合することが望
ましい。この配合が5 重量部未満では光硬化性組成物の
粘度が高く、塗膜性に劣り、また、95重量部を超えると
(A)成分を使用したことによる耐水性改善の効果が小
さく好ましくない。このトリシクロデカンジメチロール
ジアクリレートの他に、他の光重合性単量体、例えば、
イソボニルアクリレート、2-エチルヘキシルアクリレー
ト、2-ヒドロキシエチルアクリレート、2-ヒドロキシエ
チルメタクリレート、ジエチレングリコールジアクリレ
ート、1,6-ヘキサンジオールジアクリレート、ネオペン
チルグリコールジアクリレート、ポリエチレングリコー
ルジアクリレート、トリメチロールプロパントリアクリ
レート、トリメチロールプロパントリメタクリレート、
トリメチロールエタントリメタクリレート、テトラメチ
ロールメタンテトラアクリレート等を適宜5 〜95重量部
の範囲内で配合することができる。
[Chemical 9] Etc., and these can be used alone or in combination. The mixing ratio is preferably 5 to 95 parts by weight with respect to 95 to 5 parts by weight of the vinyl ester resin (A). If the content is less than 5 parts by weight, the viscosity of the photocurable composition is high and the coating property is poor, and if it exceeds 95 parts by weight, the effect of improving the water resistance due to the use of the component (A) is small and not preferable. . In addition to this tricyclodecane dimethylol diacrylate, other photopolymerizable monomers, for example,
Isobornyl acrylate, 2-ethylhexyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, diethylene glycol diacrylate, 1,6-hexanediol diacrylate, neopentyl glycol diacrylate, polyethylene glycol diacrylate, trimethylolpropane triacrylate , Trimethylolpropane trimethacrylate,
Trimethylol ethane trimethacrylate, tetramethylol methane tetraacrylate, etc. may be appropriately added within the range of 5 to 95 parts by weight.

【0018】本発明に用いる(C)光重合開始剤として
は、例えば、ビアセチルアセトフェノン、ベンゾフェノ
ン、ベンジル、ベンゾイルイソブチルエーテル、ベンジ
ルジメチルケタール、(1-ヒドロキシシクロヘキシル)
フェニルケトン、(1-ヒドロキシ−1-メチルエチル)フ
ェニルケトン、p-イソプロピル−α−ヒドロキシイソプ
ロピルフェノン、ジエチルチオキサントン、エチルアン
スラキノン、ビス(ジエチルアミノ)ベンゾフェノン等
が挙げられ、これらは単独又は混合して使用することが
できる。この光重合開始剤の配合割合は樹脂成分
[(A)+(B)] 100重量部に対して 1〜20重量部好
ましくは、 3〜15重量部配合する。その配合が1重量部
未満では光硬化性向上に効果なく、また、20重量部を超
えると接着性に劣り耐湿性にとって好ましくない。光重
合開始剤の他に適宜光増感剤を併用することができる。
この場合は光重合開始剤 1〜20重量部に対して光増感剤
1〜5 重量部使用することが望ましい。
Examples of the (C) photopolymerization initiator used in the present invention include biacetylacetophenone, benzophenone, benzyl, benzoyl isobutyl ether, benzyl dimethyl ketal, (1-hydroxycyclohexyl).
Phenyl ketone, (1-hydroxy-1-methylethyl) phenyl ketone, p-isopropyl-α-hydroxyisopropylphenone, diethylthioxanthone, ethylanthraquinone, bis (diethylamino) benzophenone, and the like, which may be used alone or in combination. Can be used. The mixing ratio of this photopolymerization initiator is 1 to 20 parts by weight, preferably 3 to 15 parts by weight, based on 100 parts by weight of the resin component [(A) + (B)]. If the amount is less than 1 part by weight, the photocurability is not improved, and if it exceeds 20 parts by weight, the adhesion is poor and the moisture resistance is not preferable. In addition to the photopolymerization initiator, a photosensitizer can be appropriately used in combination.
In this case, 1 to 20 parts by weight of the photopolymerization initiator for each
It is desirable to use 1 to 5 parts by weight.

【0019】本発明の光硬化性樹脂組成物は(A)ビニ
ルエステル樹脂、(B)トリシクロデカンジメチロール
ジアクリレートおよび(C)光重合開始剤を必須成分と
するが、本発明の目的に反しない範囲において、また、
必要に応じて熱重合禁止剤、界面活性剤、粘着剤、チキ
ソトロープ剤、充填剤および顔料等を添加配合すること
ができる。
The photocurable resin composition of the present invention comprises (A) a vinyl ester resin, (B) tricyclodecane dimethylol diacrylate and (C) a photopolymerization initiator as essential components, but for the purpose of the present invention. In the range that does not conflict,
If necessary, a thermal polymerization inhibitor, a surfactant, an adhesive, a thixotropic agent, a filler, a pigment and the like can be added and blended.

【0020】本発明の光硬化性樹脂組成物は、(A)ビ
ニルエステル樹脂、(B)トリシクロデカンジメタノー
ルジアクリレートおよび(C)光重合開始剤その他の配
合物を混合、溶解して製造することができる。こうして
製造した光硬化性樹脂組成物は、各種の用途に使用する
ことができる。
The photocurable resin composition of the present invention is produced by mixing (A) vinyl ester resin, (B) tricyclodecane dimethanol diacrylate, (C) photopolymerization initiator and other compounds and dissolving them. can do. The photocurable resin composition thus produced can be used for various purposes.

【0021】[0021]

【作用】本発明の光硬化性樹脂組成物は、特定のビニル
エステル樹脂、特定のトリシクロデカンジメチロールジ
アクリレートを用いることによって、可とう性、耐水
性、耐アルカリ性に優れた塗膜を付与することができ
た。
The photocurable resin composition of the present invention provides a coating film excellent in flexibility, water resistance and alkali resistance by using a specific vinyl ester resin and a specific tricyclodecane dimethylol diacrylate. We were able to.

【0022】[0022]

【実施例】次に本発明を実施例によって具体的に説明す
るが、本発明はこれらの実施例によって限定されるもの
ではない。以下の実施例及び比較例において「部」とは
「重量部」を意味する。
EXAMPLES The present invention will now be specifically described with reference to examples, but the present invention is not limited to these examples. In the following Examples and Comparative Examples, "part" means "part by weight".

【0023】実施例1〜2 表1に示した組成配合比にもとづいて、ビニルエステル
樹脂、トリシクロデカンジメチロールジアクリレート、
光重合開始剤その他を混合、溶解して光硬化性樹脂組成
物を製造した。
Examples 1 to 2 Based on the composition ratios shown in Table 1, vinyl ester resin, tricyclodecane dimethylol diacrylate,
A photopolymerization initiator and others were mixed and dissolved to produce a photocurable resin composition.

【0024】比較例1〜3 表1に示した組成配合比にもとづいて配合し、混合、溶
解して光硬化性樹脂組成物を製造した。
Comparative Examples 1 to 3 Compounds were prepared based on the compositional composition ratios shown in Table 1, mixed and dissolved to prepare photocurable resin compositions.

【0025】実施例1〜2及び比較例1〜3で製造した
光硬化性樹脂組成物を#400サンドペーパーで処理し
た鉄基板に、30〜35μm の膜厚に塗装して 2 kW(80W
/cm2 )高圧水銀灯にて照射距離15cmで15秒間照射して
塗膜を得た。この塗膜について、可とう性、耐水性、耐
アルカリ性の試験を行ったのでその結果を表1に示し
た。本発明の光硬化性樹脂組成物は諸特性に優れてお
り、本発明の効果を確認することができた。
The photocurable resin compositions prepared in Examples 1 and 2 and Comparative Examples 1 to 3 were coated on an iron substrate treated with # 400 sandpaper to a film thickness of 30 to 35 μm and 2 kW (80 W).
/ Cm 2 ) A high pressure mercury lamp was used for irradiation for 15 seconds at an irradiation distance of 15 cm to obtain a coating film. The coating film was tested for flexibility, water resistance and alkali resistance, and the results are shown in Table 1. The photocurable resin composition of the present invention was excellent in various properties, and the effects of the present invention could be confirmed.

【0026】[0026]

【表1】 *1 :25℃の水道水中に10日間浸漬後を評価した。○印…良好、×印…不良。 *2 :3 %Na OH水溶液に25℃で12時間浸漬後を評価した。○印…良好、×印 …不良。[Table 1] * 1: Evaluation was made after immersion in tap water at 25 ° C for 10 days. ○ mark: good, × mark: bad * 2: Evaluation was made after immersion in 3% NaOH aqueous solution at 25 ° C for 12 hours. ○ mark: good, × mark: bad.

【0027】[0027]

【発明の効果】以上の説明及び表1から明らかなよう
に、本発明の光硬化性樹脂組成物は、可とう性、耐水
性、耐アルカリ性に優れ、電子材料分野、オプトエレク
トロニクス分野等、高範囲な分野に使用することができ
る。
As is clear from the above description and Table 1, the photocurable resin composition of the present invention is excellent in flexibility, water resistance and alkali resistance, and is excellent in the fields of electronic materials, optoelectronics, etc. It can be used in a wide range of fields.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 (A)次の一般式で示されるビニルエス
テル樹脂、 【化1】 (但し、式中R1 は水素原子又はメチル基を、R2 は 2
価の有機基を、n は 0又は 1の整数をそれぞれ表す) (B)次の一般式で示されるトリシクロデカンジメチロ
ールジアクリレートおよび 【化2】 (但し、式中R3 は水素原子又はメチル基を表す。) (C)光重合開始剤 を必須成分としてなることを特徴とする光硬化性樹脂組
成物。
1. A vinyl ester resin represented by the following general formula: (However, in the formula, R 1 is a hydrogen atom or a methyl group, and R 2 is 2
A valent organic group, n is an integer of 0 or 1 respectively) (B) Tricyclodecane dimethylol diacrylate represented by the following general formula and (However, in the formula, R 3 represents a hydrogen atom or a methyl group.) (C) A photocurable resin composition comprising a photopolymerization initiator as an essential component.
JP14672695A 1995-05-22 1995-05-22 Photocurable resin composition Pending JPH08311130A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14672695A JPH08311130A (en) 1995-05-22 1995-05-22 Photocurable resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14672695A JPH08311130A (en) 1995-05-22 1995-05-22 Photocurable resin composition

Publications (1)

Publication Number Publication Date
JPH08311130A true JPH08311130A (en) 1996-11-26

Family

ID=15414188

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14672695A Pending JPH08311130A (en) 1995-05-22 1995-05-22 Photocurable resin composition

Country Status (1)

Country Link
JP (1) JPH08311130A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1323795A1 (en) * 2001-12-20 2003-07-02 Ucb S.A. Radiation curable compositions for pigmented liquid inks
WO2011027618A1 (en) * 2009-09-03 2011-03-10 日立化成工業株式会社 Tricyclodecane monomethanol monocarboxylic acid and derivatives thereof
WO2011048851A1 (en) 2009-10-22 2011-04-28 日立化成工業株式会社 Method for manufacturing a tricyclodecane mono-methanol monocarboxylic acid derivative

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1323795A1 (en) * 2001-12-20 2003-07-02 Ucb S.A. Radiation curable compositions for pigmented liquid inks
WO2003054091A1 (en) * 2001-12-20 2003-07-03 Ucb, S.A. Radiation curable compositions for pigmented liquid inks
WO2011027618A1 (en) * 2009-09-03 2011-03-10 日立化成工業株式会社 Tricyclodecane monomethanol monocarboxylic acid and derivatives thereof
US8653301B2 (en) 2009-09-03 2014-02-18 Hitachi Chemical Company, Ltd. Tricyclodecane monomethanol monocarboxylic acid and derivatives thereof
JP5536784B2 (en) * 2009-09-03 2014-07-02 日立化成株式会社 Tricyclodecane monomethanol monocarboxylic acid and its derivatives
WO2011048851A1 (en) 2009-10-22 2011-04-28 日立化成工業株式会社 Method for manufacturing a tricyclodecane mono-methanol monocarboxylic acid derivative

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