JPH08286013A - Formation of optical waveguide type diffraction grating - Google Patents

Abstract

PURPOSE: To provide a forming method of a fiber type diffraction grating for increasing the reflectance of an optical component of a specific wavelength and a fiber for forming diffraction grating. CONSTITUTION: A usual quartz-system optical waveguide 10 with a core part containing germanium oxide (GeO2 ) is mounted in a reaction chamber and gaseous hydrogen (H2 ) is made to flow in the reaction chamber and the inside of the chamber is made to a high temp. high pressure state. Then, the diffraction grating is formed by increasing oxygen deficient type defect in the quartz-system optical waveguide 10 with the irradiation of interference light of ultraviolet ray produced by an interference mechanism 40 while heating the hydrogen reduced optical fiber 10 by a heater 110 to generate the large change of refractive index.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing an optical waveguide type diffraction grating in which the refractive index of the core portion of the optical waveguide is periodically changed along the optical axis to form a diffraction grating.

[0002]

2. Description of the Related Art In recent years, with the progress of optical fiber communication technology, the complexity of networks and the multiplexing of signal wavelengths have progressed, and the system configuration is becoming more sophisticated. In such optical communication systems, the importance of optical circuit elements is increasing.

As one of the general constitutions of optical circuit elements, the fiber type element is small in size and has a small insertion loss.
It has advantages such as easy connection with an optical fiber. A fiber type filter is known as such a fiber type element.

Recently, it is well known that the refractive index of the core part of the silica-based optical fiber whose core part is doped with germanium oxide is changed by the irradiation of ultraviolet light.
An optical fiber type diffraction grating has been researched and developed as a fiber type filter utilizing such light-induced refractive index change.

This optical fiber type diffraction grating reflects a light component of a specific wavelength in the light traveling in the optical fiber. Generally, when the ultraviolet light is radiated, the refractive index of the core portion of the optical fiber is the optical axis. It is produced by forming a periodically changing region along the. This manufacturing method includes
There is an advantage that a highly reliable optical fiber type diffraction grating can be manufactured with high productivity.

In such an optical fiber type diffraction grating, the reflectance R is an important characteristic, and the reflectance R is the grating length (in the region where the refractive index of the core portion changes periodically along the optical axis). Length) and the amount of light-induced change in the refractive index. This relationship is expressed by the following equation.

R = tanh ² (LπΔn / λ _R ) where R is the reflectance, L is the grating length, Δn is the amount of change in the refractive index due to light induction, and λ _R is the reflection wavelength.

[0008]

It is known that the change in the refractive index due to the irradiation of ultraviolet light is caused by a glass defect related to germanium existing in the glass of the core part. However, since the number of glass defects is small in the conventional glass optical fiber in which the core portion is doped with germanium oxide, the refractive index change amount Δn is small even when irradiated with ultraviolet light,
Therefore, as is clear from the above equation, the reflectance is low. Specifically, the change in the refractive index of the core portion due to the irradiation of ultraviolet light is about 10 ⁻⁵ , and the reflectance is a few percent, which is too small.

In order to increase the reflectance, there is a method of increasing the grating length L as shown in the above equation, but when irradiating the ultraviolet laser beam, the laser beam is required to have high uniformity, which is why In addition, there is a problem that the optical system for irradiating ultraviolet light becomes complicated. Also,
Since there are few glass defects, there is a problem that the rate of change of the refractive index due to the irradiation of ultraviolet light is slow, and if an attempt is made to increase the reflectance, the irradiation time becomes long and the productivity decreases.

The above-mentioned problems also exist in the case of forming an optical waveguide type element by forming a diffraction grating region in an optical waveguide such as a thin film waveguide as well as an optical fiber.

The present invention has been made in view of the above problems existing in optical waveguides such as optical fibers and thin film waveguides, and an optical waveguide type diffraction grating having a high reflectance can be easily manufactured with high productivity. The purpose is to provide a method of doing.

[0012]

In order to achieve the above-mentioned object, a method of manufacturing an optical waveguide type diffraction grating according to the present invention comprises:
The first step of adding hydrogen to the core part of the optical waveguide, and irradiating the core part of the predetermined region of the optical waveguide with ultraviolet light while heating the predetermined region of the optical waveguide to 50 ° C. to 500 ° C. And a second step of changing the refractive index of the core part.

Here, the optical waveguide means a circuit or a line for confining and transmitting light in a certain region by utilizing the difference in refractive index between the core and the clad, which includes an optical fiber and a thin film waveguide. Be done.

The first step can be a step of reducing the optical waveguide in a hydrogen atmosphere.

At this time, the reduction treatment of the optical waveguide can be performed by heating the optical waveguide in a hydrogen atmosphere. The heating temperature of the optical waveguide at that time is preferably room temperature to 100 ° C.

The reduction treatment of the optical waveguide can be carried out by pressurizing the optical waveguide in a hydrogen atmosphere. The pressure applied to the optical waveguide at that time is preferably 20 to 300 atm.

The concentration of hydrogen added to the optical waveguide in the first step is preferably 500 ppm or more. At this time, in the first step, the optical waveguide is set to 4.17 in a hydrogen atmosphere.
A step of applying pressure at a pressure of atm or higher is preferable.

Further, it is desirable that the core portion of the optical waveguide is formed by doping quartz glass with germanium oxide.

Irradiation with ultraviolet light in the second step is as follows.
This can be performed by irradiating a predetermined area of the core portion with an interference fringe generated by causing interference of ultraviolet light. The interference fringes of ultraviolet light are
The ultraviolet light is split into two split lights, one of the split lights is applied to a predetermined area at a first angle with respect to the axial direction of the core portion, and the other split light is split into a first axial direction of the core portion. It is formed by irradiating a predetermined area with a second angle which is a complementary angle of the angle.
The interference fringes of ultraviolet light are formed by arranging a phase grating having a grating arranged at a predetermined cycle adjacent to an optical fiber and irradiating the ultraviolet light at a predetermined angle with respect to the plane direction of the phase grating. Anything is fine.

The heating in the second step is practically performed by blowing hot air or irradiating infrared rays.

[0021]

The mechanism of the change in the refractive index of the quartz glass optical waveguide doped with germanium oxide due to the irradiation of ultraviolet light has not been completely clarified. However,
As an important cause, oxygen-deficiency type defects related to germanium are considered, and such defects include Si-
Neutral oxygen mono-pores such as Ge or Ge-Ge are envisioned. Regarding the mechanism of such a change in the refractive index, refer to the literature "1993 IEICE Spring Conference, C-243, p.
p.4-279 ”and the like.

The inventors of the present application will increase the change in the refractive index due to the irradiation of ultraviolet light by increasing the number of oxygen-deficient defects, which are normally present in the germanium oxide-doped silica-based optical waveguide. Presumed to be. Then, it was found that reduction treatment of the optical waveguide in a hydrogen atmosphere is effective for increasing the number of germanium-related oxygen-deficient defects existing in the optical waveguide.
Further, it was found that the rate of increase of oxygen deficiency type defects is increased by heating the ultraviolet light irradiation region during ultraviolet light irradiation.

Hydrogen is added to the optical waveguide by reducing the optical waveguide in a hydrogen atmosphere. According to the findings of the present inventors, when the optical waveguide to which hydrogen is added is irradiated with ultraviolet light, the added hydrogen reacts with germanium, silica, and oxygen in the optical waveguide material to form Ge-H, Ge- OH,
New bonds of Si-H and Si-OH are formed, and these bonds enhance the refractive index change.

According to the method of manufacturing the optical waveguide type diffraction grating of the present invention, hydrogen is added to the core portion of the optical waveguide in the first step. At this time, quartz (SiO ₂ ) forming the optical waveguide and germanium oxide (GeO ₂ ) doped therein are easily reduced as a whole, and oxygen bonded to Ge and Si is partially removed. It is estimated that a phenomenon will occur. If Ge and Si from which the bound oxygen is partially removed are bound to each other, a neutral oxygen mono-vacancy such as Si-Ge or Ge-Ge, that is, an oxygen deficiency type defect is newly generated. As a result, oxygen-deficient defects in the core portion of the optical waveguide increase, and the change in refractive index due to irradiation with ultraviolet light increases.

Subsequently, in the second step, when ultraviolet light is applied to a predetermined region in the core portion, the added hydrogen reacts with germanium, silica and oxygen in the core portion, and Ge-
Bonds of H, Ge-OH, Si-H, and Si-OH are formed, and these bonds enhance the photoinduced refractive index change. Therefore, the effect due to the increase of oxygen deficiency type defects and the effect due to the new bond (Ge-H, etc.) generated by the reaction of the added hydrogen are mixed, and a large change in the refractive index occurs in the ultraviolet light irradiation region. The rate of change in the refractive index increases when the ultraviolet light irradiation region is heated during ultraviolet light irradiation. This speed increasing effect starts at about 50 ° C. with respect to room temperature and increases to 500
When the temperature exceeds 500C, the effect of increasing the speed at 500C is hardly seen.

As a result, a grating (grating) in which regions having a locally increased refractive index are arranged along the optical axis is formed in the core portion, and the optical waveguide type diffraction grating is completed. When the light propagating through the core portion of the optical waveguide type diffraction grating reaches the grating region, the light component of the specific wavelength corresponding to the cycle of the change in the refractive index is reflected with sufficient reflectance. The diffraction grating functions as an optical waveguide type filter.

In adding hydrogen in the first step, a method of reducing the optical waveguide in a hydrogen atmosphere can be adopted. In this case, quartz (Si
O ₂ ) and germanium oxide (GeO ₂ ) doped therein are easily reduced, and a phenomenon occurs in which oxygen bound to Ge and Si is partially removed. If Ge or Si from which the bound oxygen is partly removed are bonded to each other, an oxygen deficiency type defect is newly generated, and the oxygen deficiency type defect in the core portion of the optical waveguide increases, so that the refraction due to the irradiation of ultraviolet light is performed. The rate change increases.

In addition to this, when ultraviolet light is applied to a predetermined region of the core portion, Ge and Si from which oxygen is removed are removed.
And hydrogen added to the optical waveguide react with each other to form Ge-H,
Ge-OH, Si-H, and Si-OH bonds are formed, which enhance the refractive index change. Therefore, the effect due to the increase of oxygen deficiency type defects and the effect due to the new bond (Ge-H, etc.) generated by the reaction of the added hydrogen are mixed, and a large change in the refractive index occurs in the ultraviolet light irradiation region.

The reduction treatment of the optical waveguide in the first step is effective by heating the optical waveguide in a hydrogen atmosphere. The heating temperature of the optical waveguide is room temperature to 10
It is preferably contained in the range of 0 ° C. When the heating temperature exceeds 100 ° C., the reaction between the glass forming the optical waveguide and hydrogen occurs in the entire fiber, which is a negative material for the large change in the refractive index.

Further, it is effective to perform the reduction treatment of the optical waveguide in the first step by pressurizing the optical waveguide in a hydrogen atmosphere. The pressure applied to the optical waveguide is preferably in the range of 20 to 300 atm.
If this pressure is less than 20 atm, the reaction between the glass forming the optical fiber and hydrogen is slow, and the productivity is not improved. If the pressure exceeds 300 atm, the manufacturing equipment is required to have high pressure resistance, so that the equipment cost rises and it becomes impractical.

According to the knowledge of the present inventors, when the concentration of hydrogen added is 500 ppm or more, an optical waveguide type diffraction grating having a sufficient reflectance can be obtained by irradiation with ultraviolet light. In order to obtain the added hydrogen concentration of 500 ppm or more, it is preferable to pressurize the optical waveguide in a hydrogen atmosphere of 4.17 atm or more.

It is easy to irradiate the ultraviolet light in the second step by irradiating the predetermined region of the core portion with the interference fringes generated by the interference of the ultraviolet light. The interference fringes of the ultraviolet light are obtained by irradiating one of the branched ultraviolet light at a first angle with respect to the axial direction of the core portion and the other at a second angle which is a complementary angle of the first angle to a predetermined region. It is suitable to be formed by. According to this holographic method, the change in the refractive index of the core portion occurs at a cycle corresponding to the incident angles of these two branched lights. Further, it is appropriate that the interference fringes of the ultraviolet light are formed by irradiating a phase grating having a grating arranged in a predetermined cycle with the ultraviolet light at a predetermined angle with respect to the plane direction of the phase grating. According to this phase grating method, the change in the refractive index of the core is
It occurs at a period corresponding to the grating arrangement of the phase grating.

[0033]

EXAMPLES Examples of the present invention will be described below with reference to FIGS.
This will be described with reference to FIG. In the description of the drawings, the same elements will be denoted by the same reference symbols, without redundant description. Further, the dimensional ratios in the drawings do not always match those described.

In the method of manufacturing an optical waveguide type diffraction grating of this embodiment, first, an optical fiber is prepared as an optical waveguide, and the optical fiber is heated in a hydrogen atmosphere for reduction treatment.

Specifically, as shown in FIG. 1, the core tube 2
The optical fiber 10 is installed in the chamber 0, and hydrogen (H ₂ ) gas is passed as a stream from the valve 21 side toward the valve 22, while the heater (not shown) heats the core tube 20 to a high temperature. At this time, the flow rate of hydrogen gas is adjusted by opening and closing the valves 21 and 22.

The optical fiber 10 is an ordinary silica-based optical fiber containing germanium oxide (GeO ₂ ) in its core portion, and in this embodiment, it is a bare optical fiber which is not covered. The bare optical fiber is used to prevent the coating from being damaged or deteriorated by heating. The hydrogen pressure in the core tube 20 is about 200 atm. In order to suppress the hydrogen reaction at this stage, the heating temperature of the optical fiber 10 is preferably 100 ° C. or lower. In this embodiment, a heating temperature of about 50 ° C. is adopted.

The heating temperature is the temperature of the hydrogen atmosphere in the core tube 20, which is measured by a thermocouple arranged in the core tube 20, and the above-mentioned pressure is the pressure inside the core tube 20. Yes, this is measured by the pressure gauge attached to the core tube 20.

According to the hydrogen reduction step as in this embodiment,
Due to the hydrogen added to the optical fiber 10, the optical fiber 10
The germanium oxide doped in the core part of the is easily reduced, and a phenomenon occurs in which oxygen bound to Ge or Si is partially removed. If Ge and Si from which the bound oxygen is partially removed are bonded to each other, oxygen deficiency type defects are newly generated, and the number of oxygen deficiency type defects, which are usually few in the core portion of the optical waveguide, increases.

Next, two ultraviolet rays are radiated while interfering with the core portion in the optical fiber to form a region where the refractive index changes in a predetermined cycle.

FIG. 2 is an explanatory diagram of ultraviolet light irradiation by the holographic method in this embodiment. As shown in FIG. 2, the ultraviolet light emitted from the light source 30 is interfered and the optical fiber 10 is installed in the interference space 50 so as to generate the interference space 50 using the interference mechanism 40. Then, while heating the irradiation area of the interference light to about 200 ° C. by the heater 110, the ultraviolet interference light is irradiated for 1 minute for 1 minute. Examples of heating methods include blowing hot air with a dryer and infrared irradiation with an infrared generator. In this embodiment, a dryer is used as the heater 110, and heating is performed by blowing hot air.

The light source 30 is an SHG (harmonic generator) argon laser, a KrF excimer laser, or the like, and emits coherent ultraviolet light having a predetermined wavelength. Interference mechanism 4
Reference numeral 0 is composed of a beam splitter 41 and mirrors 42 and 43. The beam splitter 41 splits the ultraviolet light from the light source 30 into two split lights. The mirrors 42 and 43 respectively reflect the branched lights from the beam splitter 41, and make a predetermined angle θ with respect to the axial direction of the optical fiber 10.
_They are incident at ₁ and θ ₂ , respectively, and interfere with each other as coplanar beams. The optical fiber 10 is composed of a clad portion 11 and a core portion 12 made of silica glass. The core portion 12 is doped with germanium oxide as described above, and has a higher refractive index than the cladding portion 11.
The incident angles θ ₁ and θ ₂ of the two branched lights are complementary angles to each other, and the sum (θ ₁ + θ ₂ ) of them becomes 180 °.

According to such a process, the optical fiber 10
Since it is irradiated with ultraviolet light of a predetermined wavelength, the refractive index of the exposed region in the core portion 12 doped with germanium oxide changes. At present, the mechanism of such a change in the refractive index by irradiation with ultraviolet light has not been completely clarified. However, the Kramers-Kronig mechanism, the dipole model, the compression model, and the like have been generally proposed to explain this. Here, description will be given based on the Kramers-Kronig mechanism.

The core portion 12 in the optical fiber 10 has a Ge
There are usually a few oxygen-deficient defects associated with. Here, when the defect is represented by Ge-Si neutral oxygen mono-vacancy, the defect is converted by Ge irradiation by Ge-Si → Ge · + Si ⁺ + e ⁻ (1). The electrons emitted by this reaction are trapped in Ge located around the converted defects, so that the light absorption characteristics of the core portion 12 change. According to the absorption spectrum of such a defect, it is confirmed that a peak appears around a wavelength of 240 to 250 nm before irradiation with ultraviolet light, but the peak transits around a wavelength of 210 nm and around 280 nm after irradiation with ultraviolet light. It is believed that this transition changes the refractive index of the core. In addition,
Based on the well-known Kramers-Kronig relational expression, the value of the change in the refractive index in the core portion 12 estimated from the change in the absorption spectrum of the defect is in good agreement with the value of the change in the refractive index calculated from the measured value of the reflectance.

In the core portion 12 of the optical fiber 10 which has been subjected to the reduction treatment as described above, oxygen deficiency type defects, which are usually present only slightly, are increased as described above, so that the refractive index change in the ultraviolet light exposure region is large. Become. In addition to this,
When the core was exposed to UV light, oxygen was removed. G
A bond such as e, Si, or ordinary Ge—O—Si reacts with hydrogen added to the optical waveguide to form Ge—
Bonds of H, Ge-OH, Si-H, and Si-OH are formed. The inventors of the present application speculate that these bonds form a new light absorption band, thereby increasing the change in refractive index due to irradiation with ultraviolet light. Therefore, according to the method of the present invention, the effect due to the increase of oxygen deficiency type defects and the effect due to the new bond (Ge-H, etc.) generated by the reaction of the added hydrogen are mixed with each other, and the effect in the exposure region of ultraviolet light is increased. The change in refractive index increases to about 10 ⁻⁴ to 10 ⁻³ .

In the present embodiment, two coherent ultraviolet rays are emitted at angles θ ₁ and θ with respect to the axial direction of the optical fiber 10.
It is incident at ₂ (= 180 ° −θ ₁ ) and causes interference. Therefore, the coherent incident angle θ (= 90 ° −θ ₁ ) of ultraviolet light with respect to the radial direction of the optical fiber 10 and the wavelength λ of the ultraviolet light are used, and the interval Λ of the interference fringes in the interference space 50 is used.
Is Λ = λ / (2sin θ) (2) Therefore, in the exposed region of the core portion 12, regions having different refractive indexes are arranged in the axial direction of the optical fiber 10 with the interval Λ of the interference fringes as a period, so that the grating 13 is formed.

Using the refractive index n of the core portion 12 and the period Λ of the grating 13 based on the well-known Bragg diffraction condition, the reflection wavelength λ _R of this fiber type diffraction grating is λ _R = 2nΛ = λn / sin θ ( 3) Further, using the length L of the grating 13 and the refractive index difference Δn, the reflectance R of this fiber type diffraction grating is R = tanh ² (LπΔn / λ _R ) (4). Therefore, in the core portion 12 of the optical fiber 10, since the grating 13 is formed with a large change in the refractive index of about 10 ⁻⁴ to 10 ⁻³ , the reflectance of the reflection wavelength λ _R is 100.
Reaches a value close to%.

In such a holographic method, a laser having good coherence is required as the light source 30. In addition, highly accurate position adjustment and stability are required.

Instead of the above holographic method, a phase grating method of irradiating ultraviolet light through a phase grating can also be used. FIG. 3 is an explanatory diagram of ultraviolet light irradiation by the phase grating method.

As shown in FIG. 3, the optical fiber 10 is installed adjacent to the phase grating 60, and the ultraviolet light emitted from the light source 30 is directed at a predetermined angle θ with respect to the normal to the surface of the phase grating 60.
To make it incident. Then, the irradiation area of the interference light is heated to about 200 ° C. by the heater 110. As the heating method, as in the case of the holographic method shown in FIG. 2, hot air is blown by a dryer or infrared irradiation is performed by an infrared generator.

The light source 30 is an SHG argon laser or Kr.
F excimer lasers and the like emit coherent ultraviolet light having a predetermined wavelength. The phase grating 60 is formed by arranging gratings at a predetermined cycle. Optical fiber 1
0 is composed of a clad portion 11 and a core portion 12 made of silica glass. The core portion 12 is doped with germanium oxide as described above, and the cladding portion 11
It has a high refractive index compared to.

According to this process, as in the holographic method, the optical fiber 10 is irradiated with ultraviolet light of a predetermined wavelength, so that the refractive index of the exposed region of the core portion 12 doped with germanium oxide changes.

Further, ultraviolet light is emitted at an angle θ with respect to the normal line direction of the surface of the phase grating 60 in which the gratings are arranged at a predetermined interval Λ ', and they interfere with each other. Therefore, the interval Λ of the interference fringes in the exposure area of the core portion 12 is Λ = Λ ′ (5). Therefore, in the exposed region of the core portion 12, regions having different refractive indexes are arranged in the axial direction of the optical fiber 10 with the interval Λ of the interference fringes as a period, so that the grating 13 is formed.

Using the refractive index n of the core 12 and the period Λ of the grating 13 based on the well-known Bragg diffraction condition, the reflection wavelength λ _R of this fiber type diffraction grating is λ _R = 2nΛ = 2nΛ '(6 ). Further, using the length L of the grating 13 and the refractive index difference Δn, the reflectance R of this fiber type diffraction grating is as shown in the above-mentioned formula (4). Therefore, the optical fiber 10
In the core portion 12, the grating 13 is formed with a large change in the refractive index of about 10 ⁻⁴ to 10 ^−3, so that the reflectance of the reflection wavelength λ _R reaches a value close to 100%.

According to such a phase grating method, the conditions for position adjustment and stability required for the above holographic method are alleviated. Moreover, since the lattice period can be freely selected by the ordinary lithography technique or chemical etching, a complicated shape can be realized.

The reflectance of the fiber type diffraction grating thus obtained was measured. FIG. 4 is a system configuration diagram of the reflectance measurement. As shown in FIG. 4, this system includes a light source 70,
The optical fiber 10 and the optical spectrum analyzer 90 are optically coupled by an optical coupler 80. Optical fiber 10
Is a fiber type diffraction grating having a grating (grating) 13 formed in the first or second embodiment and the third or fourth embodiment. The light source 70 is an ordinary light emitting diode or the like, and emits light including a light component having a reflection wavelength λ _R in the optical fiber 10. The optical coupler 80 is a normal melt-stretch fiber coupler, which outputs the incident light from the light source 70 to the optical fiber 10 and outputs the reflected light from the optical fiber 10 to the optical spectrum analyzer 90.
The optical spectrum analyzer 90 detects the relationship between the wavelength and the light intensity of the reflected light from the optical fiber 10. The open end of the optical fiber 10 is connected to the matching oil 10
It is immersed in 0. This matching oil 100 is
It is a normal refractive index matching liquid and removes unnecessary reflected light components.

According to this structure, the light emitted from the light source 70 enters the optical fiber 10 via the optical coupler 80. In the optical fiber 10, the grating 13 formed on the core portion 12 reflects a light component having a specific wavelength. The light emitted from the optical fiber 10 is received by the optical spectrum analyzer 90 via the optical coupler 80. The optical spectrum analyzer 90 detects the reflection spectrum of the optical fiber 10, which is composed of wavelength and light intensity.

As a result of measurement by the system of FIG. 4, the reflectance of the optical waveguide type diffraction grating manufactured by the holographic method or the phase grating method was about 99%.

The inventors of the present invention manufactured a fiber type diffraction grating by adopting the step of not heating at the time of irradiation of ultraviolet light in the above-mentioned embodiment. As a result, in order to obtain the reflectance of 99%, the ultraviolet light irradiation time was required to be 20 minutes or longer.

As a result, it can be confirmed that heating during irradiation with ultraviolet light increases the rate of change in the refractive index.

Next, the inventors of the present application focused on the concentration of hydrogen added in the optical waveguide. That is, when the optical waveguide to which hydrogen is added is irradiated with ultraviolet light, the added hydrogen reacts with germanium, silica, and oxygen in the optical waveguide material to form Ge-H, Ge-OH, Si-H, Si-. Form a new bond called OH. Here, the inventors of the present application, due to the fact that these bonds form a new light absorption band, by adding hydrogen to the core portion of the optical waveguide, the refractive index change due to ultraviolet light irradiation I found it rising.

It is assumed that the change in the refractive index due to the addition of hydrogen increases as the amount of hydrogen added to the core portion of the optical waveguide increases. Therefore, the inventors of the present invention added various concentrations of hydrogen to the core portion of the optical fiber, and then radiated the ultraviolet light to examine the reflectance of the obtained fiber type diffraction grating to determine the concentration of hydrogen added. The relationship with the effect was investigated.

FIG. 5 is a graph showing the survey results. As shown in this graph, the reflectance of the optical fiber without hydrogen (H ₂ ) is 20%, but as the concentration of hydrogen added to the core increases, the reflectance increases to 500%.
30% reflectance at ppm, 50% reflectance at 1000 ppm
%, It was found that the reflectance reaches 99% at 3000 ppm or more. 1 ppm is 1 in 1 mol of SiO ₂ .
0 ^-6 indicating that it contains a mole of hydrogen.

Next, the hydrogen concentration dependence of the irradiation time until the reflectance was saturated by irradiation with ultraviolet light was examined. FIG. 6 is a graph showing this result. As shown in this graph, the required irradiation time decreases with increasing hydrogen concentration,
Reduced to 10 minutes at 20000 ppm. This corresponds to about 1/20 of the time required for the hydrogen-free optical fiber. At a higher concentration, the irradiation time was shortened, and the tendency of shortening the irradiation time was saturated at the time of 1 minute at 48000 ppm.

According to the above results, the effect of increasing the reflectance is remarkable when the hydrogen concentration in the core is 500 ppm or more. Furthermore, in order to obtain a reflectance of 50% or more, the hydrogen concentration should be 1000 ppm or more, and 90% or more.
In order to obtain the above extremely high reflectance, the hydrogen concentration is 2
It is necessary to be 000 ppm or more. To obtain a higher reflectance of 99%, the hydrogen concentration should be 3000 pp.
It must be m or more. On the other hand, hydrogen concentration is 48
At 000 ppm or more, the effect of shortening the ultraviolet light irradiation time is saturated, and the effect of increasing reflectance is already saturated, so
It seems that increasing the hydrogenation concentration beyond this is not significant. Therefore, the concentration of hydrogen contained in the core portion of the optical waveguide is preferably about 500 ppm or more, and particularly preferably in the range of about 500 to about 48,000 ppm.

The above hydrogen concentration is estimated by the following method. The following Table 1 is used for estimating the hydrogen concentration, and shows the solubility of hydrogen in the quartz glass having a rod diameter of 1 mm.

[0066]

[Table 1]

In estimating the hydrogen concentration, first, based on the data in Table 1, the relationship between the temperature and the diffusivity is regarded as a proportional relationship, and the least square method is used to calculate the hydrogen concentration at 20 ° C. (293 ° C.).
The solubility of hydrogen in quartz glass in K) is calculated. When this is converted into ppm unit, the saturated hydrogen concentration at 20 ° C. is found to be about 121 ppm.

It has been found that for a 20 ° C. optical fiber having a germanium-doped core, the absorption loss due to hydrogen molecules of the 1.24 μm wavelength light is about 6 dB / km. From this, in the optical fiber at 20 ° C., the hydrogen concentration per 1 dB / km of absorption loss is 121/6 = about 20 ppm / (dB / km).

Subsequently, the loss spectrum of the optical fiber containing hydrogen (temperature: 20 ° C.) was measured, and the loss value [dB] shown by the absorption peak at the wavelength of 1.24 μm due to hydrogen molecules was measured.
/ Km] is calculated. Absorption loss 1 dB / km
The added hydrogen concentration [ppm] can be obtained by multiplying the hydrogen concentration per unit by 20 ppm / (dB / km). That is, the estimated value of the added hydrogen concentration is obtained by multiplying the loss value of 1.24 μm light by 20 times.

FIG. 8 is a graph showing the relationship between the hydrogen atmosphere pressure, that is, the pressure applied to the optical fiber, and the concentration of added hydrogen. As shown in this graph,
The pressurizing pressure and the concentration of added hydrogen have a substantially proportional relationship. As shown in the graph, about 4.17a to add 500ppm
A pressure of tm is required and a pressure of about 400 atm is required to add 48000 ppm. Therefore,
The pressurizing pressure is preferably about 4.17 atm or more, and particularly preferably in the range of about 4.17 to about 400 atm.

A pressure of about 8.34 atm or more is suitable for obtaining a reflectance of 50% or more, and a pressure of about 16.7 atm or more is suitable for obtaining a reflectance of 90% or more. To obtain the above, a pressure of about 25.0 atm or higher is suitable.

[0072]

As described above in detail, according to the method of manufacturing the optical waveguide type diffraction grating of the present invention, hydrogen is added to the core portion of the optical waveguide in the first step, and then,
In the second step, ultraviolet light is applied to a plurality of predetermined regions in the core while heating, so that oxygen deficiency type defects increase and new bonds due to hydrogen reaction occur. Due to these, an extremely large change in the refractive index occurs in the predetermined region.

As a result, it is possible to form a grating (grating) in the core portion of the optical waveguide by arranging regions in which the refractive index locally changes greatly along the optical axis. Among them, the light component of the specific wavelength corresponding to the cycle of the refractive index change is reflected with extremely high reflectance. Therefore, according to the method of the present invention, an optical waveguide type diffraction grating having an extremely high reflectance can be manufactured.

[Brief description of drawings]

FIG. 1 is a configuration diagram showing a first step in a method for producing a fiber type diffraction grating according to the present invention.

FIG. 2 is a configuration diagram showing a second step in the method for producing a fiber type diffraction grating according to the present invention.

FIG. 3 is a configuration diagram showing a second step in the method for manufacturing a fiber type diffraction grating according to the present invention.

FIG. 4 is a configuration diagram showing a system for measuring reflectance in a fiber type diffraction grating formed by the manufacturing method according to the present invention.

FIG. 5 is a graph showing the relationship between the concentration of hydrogen added to the optical fiber and the reflectance of the obtained fiber type diffraction grating.

FIG. 6 is a graph showing the relationship between the concentration of hydrogen added to the optical fiber and the ultraviolet light irradiation time until the reflectance is saturated.

FIG. 7 is a graph showing the relationship between the pressure of a hydrogen atmosphere and the concentration of hydrogen added to an optical fiber.

[Explanation of symbols]

10 ... Optical fiber, 11 ... Clad part, 12 ... Core part,
13 ... Lattice, 20 ... Core tube, 21, 22 ... Valve, 3
0, 70 ... Light source, 40 ... Interference mechanism, 41 ... Beam splitter, 42, 43 ... Mirror, 50 ... Interference space, 60 ... Phase grating, 80 ... Optical coupler, 90 ... Optical spectrum analyzer, 100 ... Matching oil, 110 ... Heater.

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Kyo Inoue 1 Taya-cho, Sakae-ku, Yokohama-shi, Kanagawa Sumitomo Electric Industries, Ltd. Yokohama Works (72) Inventor Masaichi Mobara 1 Taya-cho, Sakae-ku, Yokohama, Kanagawa Sumitomo Electric Industry Co., Ltd. Yokohama Works

Claims (5)

[Claims] 1. A first method for adding hydrogen to a core portion of an optical waveguide
And heating the predetermined region of the optical waveguide to 50 ° C. to 500 ° C., irradiating the core portion of the predetermined region of the optical waveguide with ultraviolet light to increase the refractive index of the core portion of the predetermined region. And a second step of changing the optical waveguide type diffraction grating. 2. The method of manufacturing an optical waveguide type diffraction grating according to claim 1, wherein the first step is a step of reducing the optical waveguide in a hydrogen atmosphere. 3. The method of manufacturing an optical waveguide type diffraction grating according to claim 2, wherein the reduction treatment of the optical waveguide in the first step is performed by heating the optical waveguide in the hydrogen atmosphere. 4. The method of manufacturing an optical waveguide type diffraction grating according to claim 3, wherein the optical waveguide is set at room temperature to 100 ° C. in the first step. 5. The method of manufacturing an optical waveguide type diffraction grating according to claim 2, wherein the reduction treatment of the optical waveguide in the first step is performed by pressurizing the optical waveguide in the hydrogen atmosphere.