JPH0827161A - Phthalonitrile compound, diiminoisoindoline compound, near infrared absorbing material of phthalocyanine and their production - Google Patents
Phthalonitrile compound, diiminoisoindoline compound, near infrared absorbing material of phthalocyanine and their productionInfo
- Publication number
- JPH0827161A JPH0827161A JP6214249A JP21424994A JPH0827161A JP H0827161 A JPH0827161 A JP H0827161A JP 6214249 A JP6214249 A JP 6214249A JP 21424994 A JP21424994 A JP 21424994A JP H0827161 A JPH0827161 A JP H0827161A
- Authority
- JP
- Japan
- Prior art keywords
- group
- carbon atoms
- atom
- formula
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 title claims abstract description 35
- 239000011358 absorbing material Substances 0.000 title claims abstract description 18
- -1 Phthalonitrile compound Chemical class 0.000 title claims description 51
- 229920006391 phthalonitrile polymer Polymers 0.000 title claims description 39
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 150000001875 compounds Chemical class 0.000 claims abstract description 28
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims abstract description 22
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 20
- 239000003960 organic solvent Substances 0.000 claims abstract description 19
- XDXPTWCKKOEWIN-UHFFFAOYSA-N 3-hydroxybenzene-1,2-dicarbonitrile Chemical compound OC1=CC=CC(C#N)=C1C#N XDXPTWCKKOEWIN-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910000027 potassium carbonate Inorganic materials 0.000 claims abstract description 11
- FTVOPKROFUTOKY-UHFFFAOYSA-N 4-hydroxybenzene-1,2-dicarbonitrile Chemical compound OC1=CC=C(C#N)C(C#N)=C1 FTVOPKROFUTOKY-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 5
- 239000003513 alkali Substances 0.000 claims abstract description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 74
- 229910052751 metal Inorganic materials 0.000 claims description 51
- 239000002184 metal Substances 0.000 claims description 51
- 239000000203 mixture Substances 0.000 claims description 46
- 239000000126 substance Substances 0.000 claims description 46
- 125000000217 alkyl group Chemical group 0.000 claims description 40
- 125000004429 atom Chemical group 0.000 claims description 36
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 33
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 24
- 125000003545 alkoxy group Chemical group 0.000 claims description 19
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 18
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 18
- 125000005843 halogen group Chemical group 0.000 claims description 17
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 claims description 10
- UZJZIZFCQFZDHP-UHFFFAOYSA-N 3-nitrobenzene-1,2-dicarbonitrile Chemical compound [O-][N+](=O)C1=CC=CC(C#N)=C1C#N UZJZIZFCQFZDHP-UHFFFAOYSA-N 0.000 claims description 9
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 claims description 8
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 8
- 150000002739 metals Chemical class 0.000 claims description 6
- NTZMSBAAHBICLE-UHFFFAOYSA-N 4-nitrobenzene-1,2-dicarbonitrile Chemical compound [O-][N+](=O)C1=CC=C(C#N)C(C#N)=C1 NTZMSBAAHBICLE-UHFFFAOYSA-N 0.000 claims description 5
- 235000010288 sodium nitrite Nutrition 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 238000006467 substitution reaction Methods 0.000 claims description 3
- 229910052727 yttrium Inorganic materials 0.000 claims description 3
- 239000002904 solvent Substances 0.000 abstract description 13
- 238000000576 coating method Methods 0.000 abstract description 8
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 abstract description 5
- OOCUOKHIVGWCTJ-UHFFFAOYSA-N chloromethyl(trimethyl)silane Chemical compound C[Si](C)(C)CCl OOCUOKHIVGWCTJ-UHFFFAOYSA-N 0.000 abstract description 4
- 239000011248 coating agent Substances 0.000 abstract description 4
- 150000002367 halogens Chemical class 0.000 abstract description 4
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 51
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 24
- 238000006243 chemical reaction Methods 0.000 description 19
- XQZYPMVTSDWCCE-UHFFFAOYSA-N phthalonitrile Chemical compound N#CC1=CC=CC=C1C#N XQZYPMVTSDWCCE-UHFFFAOYSA-N 0.000 description 19
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 14
- 239000000975 dye Substances 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 12
- 238000010438 heat treatment Methods 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 12
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 11
- 239000000741 silica gel Substances 0.000 description 11
- 229910002027 silica gel Inorganic materials 0.000 description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 239000012044 organic layer Substances 0.000 description 8
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 7
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 7
- 235000019341 magnesium sulphate Nutrition 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 229910052708 sodium Inorganic materials 0.000 description 7
- 239000011734 sodium Substances 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 239000007795 chemical reaction product Substances 0.000 description 6
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 5
- 239000012300 argon atmosphere Substances 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- 239000000706 filtrate Substances 0.000 description 5
- 229910000104 sodium hydride Inorganic materials 0.000 description 5
- WADSJYLPJPTMLN-UHFFFAOYSA-N 3-(cycloundecen-1-yl)-1,2-diazacycloundec-2-ene Chemical compound C1CCCCCCCCC=C1C1=NNCCCCCCCC1 WADSJYLPJPTMLN-UHFFFAOYSA-N 0.000 description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 4
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 4
- 229910052794 bromium Inorganic materials 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 239000012046 mixed solvent Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- RZVCEPSDYHAHLX-UHFFFAOYSA-N 3-iminoisoindol-1-amine Chemical compound C1=CC=C2C(N)=NC(=N)C2=C1 RZVCEPSDYHAHLX-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 238000002329 infrared spectrum Methods 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 3
- 239000012312 sodium hydride Substances 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 3
- 150000005671 trienes Chemical class 0.000 description 3
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- BBMCTIGTTCKYKF-UHFFFAOYSA-N 1-heptanol Chemical compound CCCCCCCO BBMCTIGTTCKYKF-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 2
- CETWDUZRCINIHU-UHFFFAOYSA-N 2-heptanol Chemical compound CCCCCC(C)O CETWDUZRCINIHU-UHFFFAOYSA-N 0.000 description 2
- PFNHSEQQEPMLNI-UHFFFAOYSA-N 2-methyl-1-pentanol Chemical compound CCCC(C)CO PFNHSEQQEPMLNI-UHFFFAOYSA-N 0.000 description 2
- QDFXRVAOBHEBGJ-UHFFFAOYSA-N 3-(cyclononen-1-yl)-4,5,6,7,8,9-hexahydro-1h-diazonine Chemical compound C1CCCCCCC=C1C1=NNCCCCCC1 QDFXRVAOBHEBGJ-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 229930192627 Naphthoquinone Natural products 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229910052793 cadmium Inorganic materials 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 230000002140 halogenating effect Effects 0.000 description 2
- 238000005658 halogenation reaction Methods 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 229910052745 lead Inorganic materials 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 150000002791 naphthoquinones Chemical class 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000001007 phthalocyanine dye Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical compound C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 125000006274 (C1-C3)alkoxy group Chemical group 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- UWJVDEZZIPJQRF-UHFFFAOYSA-N 1-chloroethyl(trimethyl)silane Chemical compound CC(Cl)[Si](C)(C)C UWJVDEZZIPJQRF-UHFFFAOYSA-N 0.000 description 1
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 1
- QXDDDCNYAAJLBT-UHFFFAOYSA-N 3-chloropropyl(trimethyl)silane Chemical compound C[Si](C)(C)CCCCl QXDDDCNYAAJLBT-UHFFFAOYSA-N 0.000 description 1
- LBGYNJWABFQQIN-UHFFFAOYSA-N 3-methoxybenzene-1,2-dicarbonitrile Chemical compound COC1=CC=CC(C#N)=C1C#N LBGYNJWABFQQIN-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 239000004721 Polyphenylene oxide Chemical group 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 230000026030 halogenation Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 125000003387 indolinyl group Chemical class N1(CCC2=CC=CC=C12)* 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 150000002527 isonitriles Chemical class 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000005580 one pot reaction Methods 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 230000008635 plant growth Effects 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000570 polyether Chemical group 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 125000005415 substituted alkoxy group Chemical group 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
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- 238000005406 washing Methods 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Nitrogen Condensed Heterocyclic Rings (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、光記録材料、光電変換
材料、赤外線カットフィルター等に利用可能な新規なフ
タロシアニン近赤外吸収材料、その中間体である新規な
フタロニトリル化合物及びジイミノイソインドリン化合
物、並びにそれらの製造方法に関する。FIELD OF THE INVENTION The present invention relates to a novel phthalocyanine near-infrared absorbing material which can be used as an optical recording material, a photoelectric conversion material, an infrared cut filter, etc., and a novel phthalonitrile compound and diiminoiso as an intermediate thereof. The present invention relates to indoline compounds and methods for producing them.
【0002】[0002]
【従来の技術】近赤外吸収材料は各種の用途に用いられ
ている。このような用途例としては、例えば次のような
ものが挙げられる。 赤外線感光性感光材料用セーフライトフィルター 植物の生育の制御を目的とした赤外カットフィルター 太陽光の熱線の遮断材料 人間の目の組織に有害な赤外線カットフィルター 半導体受光素子の赤外線カットフィルター等。 更に大きな用途として、光情報記録媒体における記録材
料としての用途を挙げることができる。2. Description of the Related Art Near infrared absorbing materials are used for various purposes. Examples of such applications include the following. Infrared-sensitive safelight filter for photosensitive materials Infrared cut filter for controlling plant growth Infrared cut filter that blocks heat rays from the sun Infrared cut filter harmful to human eye tissue Infrared cut filter for semiconductor light receiving element, etc. An even greater use is as a recording material in an optical information recording medium.
【0003】これまで赤外線吸収性物質としては、シア
ニン色素、フェナンスレン系色素、ナフトキノン系色
素、ピリリウム系色素、スクアリリウム系色素等が知ら
れており、これらの色素を記録材料として用いた情報記
録媒体も知られている(例えば、特開昭55−9703
3号、特開昭58−83344号、特開昭58−224
793号、特開昭58−214162号、特開昭59−
24692号各公報等)。Up to now, cyanine dyes, phenanthrene dyes, naphthoquinone dyes, pyrylium dyes, squarylium dyes, and the like have been known as infrared absorbing substances, and information recording media using these dyes as recording materials are also available. Known (for example, JP-A-55-9703)
3, JP-A-58-83344, JP-A-58-224.
793, JP-A-58-214162, JP-A-59-
No. 24692, etc.).
【0004】ただ、上記のような色素は、記録材料とし
た場合、種々の問題点をかかえている。例えば、フェナ
ンスレン系色素、ナフトキノン系色素及びスクアリリウ
ム系色素は、蒸着しやすいという利点を有する反面、反
射率が低いという問題点を有している。反射率が低い
と、レーザー光により記録された部分と未記録部分との
反射率に関するコントラストが低くなり、記録された情
報の再生が困難になる。また、ピリリウム系色素やシア
ニン色素は、塗布によるコーティングができるなどの利
点を有する反面、耐光性に劣り、再生光(自然光)によ
り劣化しやすいという問題がある。これらに対しフタロ
シアニン系色素は、安定性(熱、光に対し)が極めて高
いという特徴を有している一方、有機溶剤への溶解性が
乏しく、ごく一部のフタロシアニン系色素が蒸着法で薄
膜化できるのみで、製品応用への用途としては乏しいも
のであった。However, the above dyes have various problems when used as a recording material. For example, phenanthrene-based dyes, naphthoquinone-based dyes, and squarylium-based dyes have the advantage of easy vapor deposition, but have the problem of low reflectance. When the reflectance is low, the contrast of the reflectance between the portion recorded by laser light and the unrecorded portion is low, and it becomes difficult to reproduce the recorded information. Further, the pyrylium-based dye and the cyanine dye have the advantage that they can be coated by coating, but on the other hand, they have poor light resistance and are prone to deterioration by reproduction light (natural light). On the other hand, phthalocyanine dyes are characterized by extremely high stability (with respect to heat and light), but have poor solubility in organic solvents, and only a small portion of phthalocyanine dyes can be formed into thin films by vapor deposition. However, it was poor as a product application.
【0005】上記の問題を解決するために、最近フタロ
シアニンに置換基を導入して有機溶媒に溶解し得るフタ
ロシアニン化合物となした後、これを塗布することが行
なわれている。特開平1−180865号、特開平2−
265788号、特開平3−215466号各公報等に
開示されているフタロシアニン化合物は、フタロシアニ
ンのベンゼン環に長鎖のアルキル基又はアルコキシ基を
導入して炭化水素系有機溶剤に対する溶解性を得たもの
である。これら以外にも、エステル基、ポリエーテル
基、チオエーテル基等の官能基を介して長鎖のアルキル
基を導入することが数多く行なわれている。In order to solve the above problems, it has been recently practiced to introduce a substituent into phthalocyanine to form a phthalocyanine compound which can be dissolved in an organic solvent, and then apply this. JP-A-1-180865 and JP-A-2-18086
The phthalocyanine compounds disclosed in JP-A No. 265788 and JP-A-3-215466 are those obtained by introducing a long-chain alkyl group or alkoxy group into the benzene ring of phthalocyanine to obtain solubility in a hydrocarbon organic solvent. Is. In addition to these, many introduction of long-chain alkyl groups via functional groups such as ester groups, polyether groups, and thioether groups has been carried out.
【0006】[0006]
【発明が解決しようとする課題】ところが、これらのフ
タロシアニン化合物は、無極性の溶剤には溶けるが、充
分満足される溶解度を有するまでには至っておらず、ま
たシアニン色素に比べて反射率が不充分であるなどとい
う難点があった。However, although these phthalocyanine compounds are soluble in nonpolar solvents, they are not yet sufficiently soluble, and their reflectance is lower than that of cyanine dyes. There was a problem that it was enough.
【0007】従って、本発明の目的は、フタロシアニン
化合物が本来もっている安定性を損なうことなく、溶解
性を高め、生産性が高く、しかも近赤外線に高い吸収を
もつ、新規なフタロシアニン近赤外線吸収剤とその中間
体及びそれらの製造方法を提供することにある。Therefore, an object of the present invention is to provide a novel phthalocyanine near-infrared absorbing agent which enhances solubility without sacrificing the inherent stability of phthalocyanine compounds, has high productivity, and has a high absorption in the near infrared. And an intermediate thereof and a method for producing them.
【0008】[0008]
【課題を解決するための手段】本発明によれば、下記一
般式(I)で示されるフタロニトリル化合物が提供され
る。According to the present invention, there is provided a phthalonitrile compound represented by the following general formula (I).
【化1】 (式中、R1〜R4はそれぞれ以下のものを表わす。 R1: 炭素数1〜8の直鎖又は分岐アルキレン基で、基
中に−C−O−C−のいわゆるエーテル結合を含んでい
てもよいし、シリル基で置換されていてもよい、 R2〜R4:それぞれ独立に水素原子、炭素数1〜12の
アルキル基、炭素数1〜3のアルコキシ基、ビニル基、
又は−OSi(R5)3基若しくは−CH2Si(R5)3基、 R5:炭素数1〜3のアルキル基。)Embedded image (In the formula, each of R 1 to R 4 represents the following. R 1 : a linear or branched alkylene group having 1 to 8 carbon atoms, which contains a so-called ether bond of —C—O—C—. R 2 to R 4 , which may be substituted or unsubstituted with a silyl group, are each independently a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a vinyl group,
Or -OSi (R 5) 3 group or a -CH 2 Si (R 5) 3 group, R 5: an alkyl group having 1 to 3 carbon atoms. )
【0009】また、本発明によれば、下記の一般式(I
I)で示されるジイミノイソインドリン化合物が提供さ
れる。According to the present invention, the following general formula (I
A diiminoisoindoline compound represented by I) is provided.
【化2】 (式中、R1〜R4はそれぞれ以下のものを表わす。 R1:炭素数1〜8の直鎖又は分岐アルキレン基で、基
中に−C−O−C−のいわゆるエーテル結合を含んでい
てもよいし、シリル基で置換されていてもよい、 R2〜R4:それぞれ独立に水素原子、炭素数1〜12の
アルキル基、炭素数1〜3のアルコキシ基、ビニル基、
又は−OSi(R5)3基若しくは−CH2Si(R5)3基、 R5:炭素数1〜3のアルキル基。)Embedded image (In the formula, each of R 1 to R 4 represents the following. R 1 : a linear or branched alkylene group having 1 to 8 carbon atoms, which contains a so-called ether bond of —C—O—C—. R 2 to R 4 , which may be substituted or unsubstituted with a silyl group, are each independently a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a vinyl group,
Or -OSi (R 5) 3 group or a -CH 2 Si (R 5) 3 group, R 5: an alkyl group having 1 to 3 carbon atoms. )
【0010】更に、本発明によれば、下記の一般式(II
I a)〜(III d)で示される4種のうち、1種又は2種以
上の混合物からなるフタロシアニン近赤外吸収材料が提
供される。Furthermore, according to the present invention, the following general formula (II
There is provided a phthalocyanine near-infrared absorbing material composed of one kind or a mixture of two or more kinds among four kinds represented by Ia) to (IIId).
【化3】 Embedded image
【化4】 [Chemical 4]
【化5】 Embedded image
【化6】 (式中、M及びX1〜X16はそれぞれ以下のものを表わ
す。 M:2個の水素原子、2価の金属原子、1置換の3価金
属原子、2置換の4価金属原子又はオキシ金属原子、 X1〜X16:それぞれ独立に−OR1SiR2R3R4基、 R1:炭素数1〜8の直鎖又は分岐アルキレン基で、基
中に−C−O−C−のいわゆるエーテル結合を含んでい
てもよいし、シリル基で置換されていてもよい、 R2〜R4:それぞれ独立に水素原子、炭素数1〜12の
アルキル基、炭素数1〜3のアルコキシ基、ビニル基、
又は−OSi(R5)3基若しくは−CH2Si(R5)3基、 R5:炭素数1〜3のアルキル基、ベンゼン環について
いるX1〜X16以外の原子:水素原子又はハロゲン原
子。)[Chemical 6] (In the formula, M and X 1 to X 16 each represent the following. M: 2 hydrogen atoms, divalent metal atom, monosubstituted trivalent metal atom, disubstituted tetravalent metal atom or oxy. metal atom, X 1 to X 16: each independently -OR 1 SiR 2 R 3 R 4 group, R 1: linear or branched alkylene group having 1 to 8 carbon atoms, in the radical -C-O-C- Which may contain a so-called ether bond or which may be substituted with a silyl group, R 2 to R 4 : each independently a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, and an alkoxy group having 1 to 3 carbon atoms. Group, vinyl group,
Or —OSi (R 5 ) 3 group or —CH 2 Si (R 5 ) 3 group, R 5 : an alkyl group having 1 to 3 carbon atoms, an atom other than X 1 to X 16 attached to the benzene ring: a hydrogen atom or a halogen atom. )
【0011】また、本発明によれば、下記の一般式(IV
a)〜(IV d)で示される4種のうち、1種又は2種以
上の混合物からなるフタロシアニン近赤外吸収材料が提
供される。According to the present invention, the following general formula (IV
Provided is a phthalocyanine near-infrared absorbing material composed of one kind or a mixture of two or more kinds among four kinds represented by a) to (IV d).
【化7】 [Chemical 7]
【化8】 Embedded image
【化9】 [Chemical 9]
【化10】 (式中、M及びX1〜X16はそれぞれ以下のものを表わ
す。 M:2個の水素原子、2価の金属原子、1置換の3価金
属原子、2置換の4価金属原子又はオキシ金属原子、 X1〜X16:それぞれ独立に−OR1SiR2R3R4基、 R1:炭素数1〜8の直鎖又は分岐アルキレン基で、基
中に−C−O−C−のいわゆるエーテル結合を含んでい
てもよいし、シリル基で置換されていてもよい、 R2〜R4:それぞれ独立に水素原子、炭素数1〜12の
アルキル基、炭素数1〜3のアルコキシ基、ビニル基、
又は−OSi(R5)3基若しくは−CH2Si(R5)3基、 R5:炭素数1〜3のアルキル基、ベンゼン環について
いるX1〜X16以外の原子:水素原子又はハロゲン原
子。)[Chemical 10] (In the formula, M and X 1 to X 16 each represent the following. M: 2 hydrogen atoms, divalent metal atom, monosubstituted trivalent metal atom, disubstituted tetravalent metal atom or oxy. metal atom, X 1 to X 16: each independently -OR 1 SiR 2 R 3 R 4 group, R 1: linear or branched alkylene group having 1 to 8 carbon atoms, in the radical -C-O-C- Which may contain a so-called ether bond or which may be substituted with a silyl group, R 2 to R 4 : each independently a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, and an alkoxy group having 1 to 3 carbon atoms. Group, vinyl group,
Or —OSi (R 5 ) 3 group or —CH 2 Si (R 5 ) 3 group, R 5 : an alkyl group having 1 to 3 carbon atoms, an atom other than X 1 to X 16 attached to the benzene ring: a hydrogen atom or a halogen atom. )
【0012】更に、本発明によれば、下記の一般式(V
a)〜(Vd)で示される4種のうち、1種又は2種以上
の混合物からなるフタロシアニン近赤外吸収材料が提供
される。Further, according to the present invention, the following general formula (V
Provided is a phthalocyanine near-infrared absorbing material composed of one kind or a mixture of two or more kinds out of four kinds represented by a) to (Vd).
【化11】 [Chemical 11]
【化12】 [Chemical 12]
【化13】 [Chemical 13]
【化14】 (式中、M、X1〜X16、Y及びn1〜n4はそれぞれ
以下のものを表わす。 M:2個の水素原子、2価の金属原子、1置換の3価金
属原子、2置換の4価金属原子又はオキシ金属原子、 X1〜X16:それぞれ独立に−OR1SiR2R3R4基、 R1:炭素数1〜8の直鎖又は分岐アルキレン基で、基
中に−C−O−C−のいわゆるエーテル結合を含んでい
てもよいし、シリル基で置換されていてもよい、 R2〜R4:それぞれ独立に水素原子、炭素数1〜12の
アルキル基、炭素数1〜3のアルコキシ基、ビニル基、
又は−OSi(R5)3基若しくは−CH2Si(R5)3基、 R5:炭素数1〜3のアルキル基、ベンゼン環について
いるX1〜X16以外の原子:水素原子又はハロゲン原
子、 Y:ハロゲン原子、 n1〜n4:それぞれ独立にハロゲン置換数を表わし、
1〜4の整数。)Embedded image (In the formula, M, X 1 to X 16 , Y and n 1 to n 4 respectively represent the following: M: two hydrogen atoms, divalent metal atom, monosubstituted trivalent metal atom, disubstituted Tetravalent metal atom or oxymetal atom, X 1 to X 16 : each independently —OR 1 SiR 2 R 3 R 4 group, R 1 : a linear or branched alkylene group having 1 to 8 carbon atoms, and It may contain a so-called ether bond of C—O—C— and may be substituted with a silyl group. R 2 to R 4 are each independently a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or a carbon atom. Number 1 to 3 alkoxy group, vinyl group,
Or —OSi (R 5 ) 3 group or —CH 2 Si (R 5 ) 3 group, R 5 : an alkyl group having 1 to 3 carbon atoms, an atom other than X 1 to X 16 attached to the benzene ring: a hydrogen atom or a halogen Atom, Y: halogen atom, n1 to n4: each independently represent the number of halogen substitutions,
An integer from 1 to 4. )
【0013】また、本発明によれば、3−又は4−ヒド
ロキシフタロニトリルを、有機溶媒中でアルカリの存在
下、下記一般式(VI) ZR1SiR2R3R4 (VI) (式中、R1〜R4及びZはそれぞれ以下のものを表わ
す。 R1:炭素数1〜8の直鎖又は分岐アルキレン基で、基
中に−C−O−C−のいわゆるエーテル結合を含んでい
てもよいし、シリル基で置換されていてもよい、 R2〜R4:それぞれ独立に水素原子、炭素数1〜12の
アルキル基、炭素数1〜3のアルコキシ基、ビニル基、
又は−OSi(R5)3基若しくは−CH2Si(R5)3基、 R5:炭素数1〜3のアルキル基、 Z :ハロゲン原子。)で示される少なくとも1種の化
合物と反応させることを特徴とする前記一般式(I)で
示されるフタロニトリル化合物の製造方法が提供され
る。According to the present invention, 3- or 4-hydroxyphthalonitrile is added to an organic solvent in the presence of an alkali represented by the following general formula (VI) ZR 1 SiR 2 R 3 R 4 (VI) (wherein , R 1 to R 4 and Z each represent the following: R 1 : a linear or branched alkylene group having 1 to 8 carbon atoms, which contains a so-called —C—O—C— ether bond. it can have, may be substituted with a silyl group, R 2 to R 4: each independently a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a vinyl group,
Or -OSi (R 5) 3 group or a -CH 2 Si (R 5) 3 group, R 5: an alkyl group having 1 to 3 carbon atoms, Z: halogen atoms. The present invention provides a method for producing a phthalonitrile compound represented by the general formula (I), which comprises reacting with at least one compound represented by the formula (1).
【0014】更に、本発明によれば、3−又は4−ニト
ロフタロニトリルを、有機溶媒中で亜硝酸ナトリウム及
び炭酸カリウム又はナトリウム金属化合物と反応させた
後、更に前記一般式(VI) ZR1SiR2R3R4 (VI) (式中、R1〜R4及びZはそれぞれ以下のものを表わ
す。 R1:炭素数1〜8の直鎖又は分岐アルキレン基で、基
中に−C−O−C−のいわゆるエーテル結合を含んでい
てもよいし、シリル基で置換されていてもよい、 R2〜R4:それぞれ独立に水素原子、炭素数1〜12の
アルキル基、炭素数1〜3のアルコキシ基、ビニル基、
又は−OSi(R5)3基若しくは−CH2Si(R5)3基、 R5:炭素数1〜3のアルキル基、 Z :ハロゲン原子。)で示される少なくとも1種の化
合物を反応させることを特徴とする前記一般式(I)で
示されるフタロニトリル化合物の製造方法が提供され
る。Furthermore, according to the present invention, 3- or 4-nitrophthalonitrile is reacted with sodium nitrite and potassium carbonate or sodium metal compound in an organic solvent, and then the above-mentioned general formula (VI) ZR 1 SiR 2 R 3 R 4 (VI) (In the formula, R 1 to R 4 and Z each represent the following. R 1 : a linear or branched alkylene group having 1 to 8 carbon atoms, in which -C is present. It may contain a so-called ether bond of —O—C— and may be substituted with a silyl group, R 2 to R 4 : each independently a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, and a carbon number. 1-3 alkoxy group, vinyl group,
Or -OSi (R 5) 3 group or a -CH 2 Si (R 5) 3 group, R 5: an alkyl group having 1 to 3 carbon atoms, Z: halogen atoms. ) At least one compound represented by the formula (1) is reacted to provide a method for producing a phthalonitrile compound represented by the general formula (I).
【0015】また、本発明によれば、前記一般式(I)
で示される少なくとも1種のフタロニトリル化合物又は
前記一般式(II)で示される少なくとも1種のジイミノ
イソインドリン化合物と、2価の金属、1置換の3価金
属、2置換の4価金属若しくはオキシ金属から選ばれた
金属又はこれらの金属の誘導体とを反応させることを特
徴とする前記一般式(III a)〜(III d)及び(IV a)〜(IV
d)で示される少なくとも1種のフタロシアニン化合物の
製造方法が提供される。According to the present invention, the general formula (I)
At least one phthalonitrile compound represented by or at least one diiminoisoindoline compound represented by the general formula (II), a divalent metal, a monosubstituted trivalent metal, a disubstituted tetravalent metal, or A metal selected from oxymetals or a derivative of these metals is reacted with the above general formulas (IIIa) to (IIId) and (IVa) to (IV
A method for producing at least one phthalocyanine compound represented by d) is provided.
【0016】以下、本発明を詳しく説明する。本発明の
新規なフタロニトリル化合物は、本発明のフロシアニン
近赤外吸収材料の中間体として有用なものであり、下記
の一般式(I)で示される。The present invention will be described in detail below. The novel phthalonitrile compound of the present invention is useful as an intermediate of the furocyanine near-infrared absorbing material of the present invention, and is represented by the following general formula (I).
【化1】 (式中、R1〜R4はそれぞれ以下のものを表わす。 R1:炭素数1〜8の直鎖又は分岐アルキレン基で、基
中に−C−O−C−のいわゆるエーテル結合を含んでい
てもよいし、シリル基で置換されていてもよい。 R2〜R4:それぞれ独立に水素原子、炭素数1〜12の
アルキル基、炭素数1〜3のアルコキシ基、ビニル基、
又は−OSi(R5)3基若しくは−CH2Si(R5)3基、 R5:炭素数1〜3のアルキル基。)Embedded image (In the formula, each of R 1 to R 4 represents the following. R 1 : a linear or branched alkylene group having 1 to 8 carbon atoms, which contains a so-called ether bond of —C—O—C—. R 2 to R 4 are each independently a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a vinyl group, or a silyl group.
Or -OSi (R 5) 3 group or a -CH 2 Si (R 5) 3 group, R 5: an alkyl group having 1 to 3 carbon atoms. )
【0017】上記定義中、炭素数1〜8の直鎖又は分岐
アルキレン基としては、メチレン基、エチレン基、トリ
メチレン基、プロピレン基、テトラメチレン基、1,2
−ブチレン基、1,3−ブチレン基、2,3−ブチレン
基、ヘプタメチレン基、オクタメチレン基などが例示さ
れる。炭素数1〜12のアルキル基としては、メチル
基、エチル基、プロピル基、イソプロピル基、ブチル
基、イソブチル基、sec−ブチル基、t−ブチル基、
アミル基、オクチル基、デシル基、ドデシル基などが例
示され、炭素数1〜3のアルキル基としては、上記中炭
素数1〜3のものが示される。また、炭素数1〜3のア
ルコキシ基としては、メトキシ基、エトキシ基、プロポ
キシ基などが例示される。In the above definition, the straight-chain or branched alkylene group having 1 to 8 carbon atoms is methylene group, ethylene group, trimethylene group, propylene group, tetramethylene group, 1,2.
Examples include -butylene group, 1,3-butylene group, 2,3-butylene group, heptamethylene group and octamethylene group. Examples of the alkyl group having 1 to 12 carbon atoms include methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, sec-butyl group, t-butyl group,
Examples thereof include an amyl group, an octyl group, a decyl group, and a dodecyl group, and examples of the alkyl group having 1 to 3 carbon atoms include those having 1 to 3 carbon atoms in the above. Moreover, a methoxy group, an ethoxy group, a propoxy group etc. are illustrated as a C1-C3 alkoxy group.
【0018】本発明の前記一般式(I)で示される3−
又は4−シリル基置換アルコキシフタロニトリルは、3
−又は4−ヒドロキシフタロニトリルを、有機溶媒中で
アルカリの存在下、下記一般式(VI) ZR1SiR2R3R4 (VI) (式中、R1〜R4及びZはそれぞれ以下のものを表わ
す。 R1:炭素数1〜8の直鎖又は分岐アルキレン基で、基
中に−C−O−C−のいわゆるエーテル結合を含んでい
てもよいし、シリル基で置換されていてもよい、 R2〜R4:それぞれ独立に水素原子、炭素数1〜12の
アルキル基、炭素数1〜3のアルコキシ基、ビニル基、
又は−OSi(R5)3基若しくは−CH2Si(R5)3基、 R5:炭素数1〜3のアルキル基、 Z:ハロゲン原子。)で示される少なくとも1種の化合
物と反応させることによって製造することができる。即
ち、3−又は4−ヒドロキシフタロニトリルと炭酸カリ
ウム又は水酸化ナトリウムを有機溶媒中で溶解し、これ
にZR1SiR2R3R4を作用させることによって、目的
とするシリル基置換アルコキシフタロニトリルが得られ
る。3-of the present invention represented by the general formula (I)
Or, 4-silyl group-substituted alkoxyphthalonitrile has 3
-Or 4-hydroxyphthalonitrile in the presence of an alkali in an organic solvent, the following general formula (VI) ZR 1 SiR 2 R 3 R 4 (VI) (wherein R 1 to R 4 and Z are respectively the following R 1 is a linear or branched alkylene group having 1 to 8 carbon atoms, which may contain a so-called ether bond of —C—O—C—, or is substituted with a silyl group. R 2 to R 4 are each independently a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a vinyl group,
Or -OSi (R 5) 3 group or a -CH 2 Si (R 5) 3 group, R 5: an alkyl group having 1 to 3 carbon atoms, Z: halogen atoms. ) It can manufacture by reacting with at least 1 sort (s) of compound shown by these. That is, 3- or 4-hydroxyphthalonitrile and potassium carbonate or sodium hydroxide are dissolved in an organic solvent, and ZR 1 SiR 2 R 3 R 4 is allowed to act on the solution to give the desired silyl group-substituted alkoxyphthalonitrile. Is obtained.
【0019】ここで用いる有機溶媒としては、N,N−
ジメチルホルムアミド、N,N−ジメチルアセトアミ
ド、1−メチル−2−ピロリドン、ジメチルスルホキシ
ドなどが挙げられるが、特にN,N−ジメチルホルムア
ミド、N,N−ジメチルアセトアミド、あるいはこれら
2種のうちの1種とその他3種のうちの少なくとも1種
との混合溶媒であることが好ましい。ZR1SiR2R3
R4は通常上記ヒドロキシフタロニトリルに対して等モ
ル添加するが、1.5〜3倍モルと理論反応量よりも多
く添加した方が収率が向上するので好ましい。また、こ
のときの反応温度は20〜200℃、好ましくは40〜
180℃である。The organic solvent used here is N, N-
Examples thereof include dimethylformamide, N, N-dimethylacetamide, 1-methyl-2-pyrrolidone, and dimethylsulfoxide, but particularly N, N-dimethylformamide, N, N-dimethylacetamide, or one of these two. And a mixed solvent of at least one of the other three. ZR 1 SiR 2 R 3
R 4 is usually added in an equimolar amount to the hydroxyphthalonitrile, but it is preferable to add R 4 in an amount of 1.5 to 3 times the molar amount, which is higher than the theoretical reaction amount, because the yield is improved. The reaction temperature at this time is 20 to 200 ° C., preferably 40 to 200 ° C.
It is 180 ° C.
【0020】ZR1SiR2R3R4の具体例としては、次
のものが挙げられる。ClCH2SiMe3,ClC2H4
SiMe3,ClC3H6SiMe3,ClCH(Et)S
iMe3,ClCH(Pr)SiMe3,ClCH(iP
r)SiMe3,ClCH(SiMe3)SiMe3,C
lCH(Me)SiMe3,ClCH2OCH2SiM
e3,ClCH2Si(Me)2OEt,ClCH2Si
(Me)2H,ClCH2Si(Me)2CH=CH2,C
lCH2Si(Me)2C12H25,ClCH2Si(OE
t)3,ClCH2Si(OEt)2Me,ClCH2Si
(OiPr)2Me、ClCH2Si(Me)2CH2Si
Me3,ClCH2Si(Me)2OSiMe3,ClC3
H6Si(Me)2OMe,ClC3H6SiMe(OM
e)2,ClC3H6Si(OEt)3,ClC3H6Si
(OMe)3,ClC3H6Si(OSiMe)3,ClC
H2Si(Me)2OMe,ClCH2Si(OMe)3,
ClC2H4OSiMe3,ClCH2CH(OSiM
e3)Me,ClC3H6OSiMe3,ClCH2Si
(Me)2C4H9,ClC3H6Si(Me)(OSiM
e3)2,ClC3H6Si(Me)〔(CH2)3C
H3〕2,ClCH2Si(Me)2H,ClCH(Bu)
SiMe3等。(ここでMeはメチル基、Etはエチル
基、Prはプロピル基、iPrはイソプロピル基及びB
uはブチル基である。)Specific examples of ZR 1 SiR 2 R 3 R 4 include the following. ClCH 2 SiMe 3 , ClC 2 H 4
SiMe 3 , ClC 3 H 6 SiMe 3 , ClCH (Et) S
iMe 3 , ClCH (Pr) SiMe 3 , ClCH (iP
r) SiMe 3 , ClCH (SiMe 3 ) SiMe 3 , C
lCH (Me) SiMe 3 , ClCH 2 OCH 2 SiM
e 3 , ClCH 2 Si (Me) 2 OEt, ClCH 2 Si
(Me) 2 H, ClCH 2 Si (Me) 2 CH = CH 2 , C
lCH 2 Si (Me) 2 C 12 H 25 , ClCH 2 Si (OE
t) 3 , ClCH 2 Si (OEt) 2 Me, ClCH 2 Si
(OiPr) 2 Me, ClCH 2 Si (Me) 2 CH 2 Si
Me 3 , ClCH 2 Si (Me) 2 OSiMe 3 , ClC 3
H 6 Si (Me) 2 OMe, ClC 3 H 6 SiMe (OM
e) 2 , ClC 3 H 6 Si (OEt) 3 , ClC 3 H 6 Si
(OMe) 3 , ClC 3 H 6 Si (OSiMe) 3 , ClC
H 2 Si (Me) 2 OMe, ClCH 2 Si (OMe) 3 ,
ClC 2 H 4 OSiMe 3 , ClCH 2 CH (OSiM
e 3 ) Me, ClC 3 H 6 OSiMe 3 , ClCH 2 Si
(Me) 2 C 4 H 9 , ClC 3 H 6 Si (Me) (OSiM
e 3 ) 2 , ClC 3 H 6 Si (Me) [(CH 2 ) 3 C
H 3 ] 2 , ClCH 2 Si (Me) 2 H, ClCH (Bu)
SiMe 3 etc. (Here, Me is a methyl group, Et is an ethyl group, Pr is a propyl group, iPr is an isopropyl group and B.
u is a butyl group. )
【0021】また、前記一般式(I)で示される3−又
は4−シリル基置換アルコキシフタロニトリルは、3−
又は4−ニトロフタロニトリルを、有機溶媒中で亜硝酸
ナトリウム及び炭酸カリウム又はナトリウム金属化合物
と反応させた後、更に前記一般式(VI) ZR1SiR2R3R4 (VI) で示される少なくとも1種の化合物を反応させるこによ
って製造することができる。即ち、この方法は、3−又
は4−ニトロフタロニトリルのニトロ基を、カリウムオ
キシ基若しくはナトリウムオキシ基に変え、次いで前記
一般式(VI)で示される珪素化合物を添加することによ
り、目的とするシリル基置換アルコキシフタロニトリル
を1ポット(1容器)で直接合成するものである。具体
的に言うと、3−又は4−ニトロフタロニトリルを有機
溶媒に溶解し、次いで亜硝酸ナトリウムを加え、加熱し
て100〜200℃とし、更に炭酸カリウム又は金属ナ
トリウム、水素化ナトリウム、CH3ONa等のナトリ
ウム金属化合物を加え加熱し、原料のニトロ基をカリウ
ムオキシ基又はナトリウムオキシ基に変化させた後、Z
R1SiR2R3R4を加え、20〜200℃で反応させる
ことによって、目的とするシリル基置換アルコキシフタ
ロニトリルが得られる。なお、本反応(1ポット反応)
に使用する溶媒は、前述のヒドロキシフタロニトリルか
らのシリル基置換アルコキシフタロニトリルの製造方法
で用いた溶媒と同様のものが使用できる。The 3- or 4-silyl group-substituted alkoxyphthalonitrile represented by the general formula (I) is 3-
Alternatively, 4-nitrophthalonitrile is reacted with sodium nitrite and a potassium carbonate or sodium metal compound in an organic solvent, and then at least represented by the general formula (VI) ZR 1 SiR 2 R 3 R 4 (VI). It can be produced by reacting one compound. That is, this method aims at changing the nitro group of 3- or 4-nitrophthalonitrile to a potassium oxy group or a sodium oxy group, and then adding the silicon compound represented by the general formula (VI). A silyl group-substituted alkoxyphthalonitrile is directly synthesized in one pot (one container). Specifically, 3- or 4-nitrophthalonitrile is dissolved in an organic solvent, then sodium nitrite is added and heated to 100 to 200 ° C., and further potassium carbonate or sodium metal, sodium hydride, CH 3 is added. After adding a sodium metal compound such as ONa and heating to change the nitro group of the raw material into a potassium oxy group or a sodium oxy group, Z
The desired silyl group-substituted alkoxyphthalonitrile is obtained by adding R 1 SiR 2 R 3 R 4 and reacting at 20 to 200 ° C. This reaction (1 pot reaction)
The solvent used in the above can be the same as the solvent used in the above-mentioned method for producing a silyl group-substituted alkoxyphthalonitrile from hydroxyphthalonitrile.
【0022】なお、ニトロフタロニトリルからアルコキ
シフタロニトリルを得る方法としては、ニトロフタロニ
トリルを有機溶媒(例えばジメチルホルムアミド)中
で、水素化ナトリウムの存在下、アルコールと反応させ
る下記の反応式(I)に従う方法が提案されている(特
開平3−215466号公報)。As a method for obtaining alkoxyphthalonitrile from nitrophthalonitrile, the following reaction formula (I) is used, in which nitrophthalonitrile is reacted with alcohol in the presence of sodium hydride in an organic solvent (eg dimethylformamide). A method according to Japanese Patent Laid-Open No. 3-215466 has been proposed.
【化15】 ところが、本発明におけるシリル基置換のアルコキシフ
タロニトリルを得る場合には、上記の方法を適用する
(即ち、ニトロフタロニトリルを有機溶媒中、NaHの
存在下HOR1SiR2R3R4と反応させる)と、C−S
i結合が切断され、目的とするシリル基置換アルコキシ
フタロニトリルは殆ど生成せず、−OR2、−OR3、ー
OR4等の置換基を有するフタロニトリルが生成する。[Chemical 15] However, in order to obtain a silyl group-substituted alkoxyphthalonitrile according to the present invention, the above method is applied (ie, nitrophthalonitrile is reacted with HOR 1 SiR 2 R 3 R 4 in the presence of NaH in an organic solvent). ) And C-S
i bond is cleaved, a silyl group substituted alkoxy phthalonitrile of interest without generating hardly, -OR 2, -OR 3, phthalonitrile is generated having a substituent such as chromatography OR 4.
【0023】本発明の新規なジイミノイソインドリン化
合物は、本発明のフタロシアニン近赤外吸収材料の中間
体として有用なものであり、下記の一般式(II)で示
される。The novel diiminoisoindoline compound of the present invention is useful as an intermediate of the phthalocyanine near-infrared absorbing material of the present invention, and is represented by the following general formula (II).
【化2】 (式中、R1〜R4はそれぞれ以下のものを表わす。 R1:炭素数1〜8の直鎖又は分岐アルキレン基で、基
中に−C−O−C−のいわゆるエーテル結合を含んでい
てもよいし、シリル基で置換されていてもよい、 R2〜R4:それぞれ独立に水素原子、炭素数1〜12の
アルキル基、炭素数1〜3のアルコキシ基、ビニル基、
又は−OSi(R5)3基若しくは−CH2Si(R5)3基、 R5:炭素数1〜3のアルキル基。) なお、上式のR1〜R5の具体例としては、前記一般式
(I)の場合と同一のものが挙げられる。Embedded image (In the formula, each of R 1 to R 4 represents the following. R 1 : a linear or branched alkylene group having 1 to 8 carbon atoms, which contains a so-called ether bond of —C—O—C—. R 2 to R 4 , which may be substituted or unsubstituted with a silyl group, are each independently a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a vinyl group,
Or -OSi (R 5) 3 group or a -CH 2 Si (R 5) 3 group, R 5: an alkyl group having 1 to 3 carbon atoms. As specific examples of R 1 to R 5 in the above formula, the same ones as in the case of the general formula (I) can be mentioned.
【0024】本発明の前記一般式(II)で示されるジ
イミノイソインドリン化合物は、前記一般式(I)で示
される少なくとも一種のフタロニトリル化合物を、アル
コール溶媒中、ナトリウム(金属ナトリウム又はナトリ
ウムアルコキシド)の存在下に、アンモニアガスと反応
させることによって、下記の反応式(II)に従って得ら
れる。The diiminoisoindoline compound represented by the general formula (II) of the present invention is obtained by adding at least one phthalonitrile compound represented by the general formula (I) to sodium (metal sodium or sodium alkoxide) in an alcohol solvent. In the presence of), it is obtained according to the following reaction formula (II) by reacting with ammonia gas.
【化16】 なお、この場合の代表的なルコールとしては、メタノー
ルが一般的である。Embedded image In addition, methanol is generally used as a typical rucol in this case.
【0025】本発明の新規なフタロシアニン近赤外吸収
材料は、下記一般式(IIIa)〜(IIId)で示される4種
のうち、1種又は2種以上の混合物からなるか、下記一
般式(IVa)〜(IVd)で示される4種のうち、1種又は
2種以上の混合物からなるか、あるいは一般式(Va)
〜(Vd)で示される4種のうち、1種又は2種以上の
混合物からなるものである。The novel phthalocyanine near-infrared absorbing material of the present invention comprises one kind or a mixture of two or more kinds among the four kinds represented by the following general formulas (IIIa) to (IIId), or Among the four kinds represented by IVa) to (IVd), one kind or a mixture of two or more kinds, or the general formula (Va)
To (Vd), one kind or a mixture of two or more kinds.
【0026】[0026]
【化3】 Embedded image
【化4】 [Chemical 4]
【化5】 Embedded image
【化6】 [Chemical 6]
【0027】[0027]
【化7】 [Chemical 7]
【化8】 Embedded image
【化9】 [Chemical 9]
【化10】 [Chemical 10]
【0028】[0028]
【化11】 [Chemical 11]
【化12】 [Chemical 12]
【化13】 [Chemical 13]
【化14】 Embedded image
【0029】(式中、M、X1〜X16、Y及びn1〜n
4はそれぞれ以下のものを表わす。 M:2個の水素原子、2価の金属原子、1置換の3価金
属原子、2置換の4価金属原子又はオキシ金属原子、 X1〜X16:それぞれ独立に−OR1SiR2R3R4基、 R1:炭素数1〜8の直鎖又は分岐アルキレン基で、基
中に−C−O−C−のいわゆるエーテル結合を含んでい
てもよいし、シリル基で置換されていてもよい、 R2〜R4:それぞれ独立に水素原子、炭素数1〜12の
アルキル基、炭素数1〜3のアルコキシ基、ビニル基、
又は−OSi(R5)3基若しくは−CH2Si(R5)3基、 R5:炭素数1〜3のアルキル基、 ベンゼン環についているX1〜X16以外の原子:水素原
子又はハロゲン原子、 Y:ハロゲン原子、 n1〜n4:それぞれ独立にハロゲン置換数を表わし、
1〜4の整数。)(Wherein M, X 1 to X 16 , Y and n 1 to n
4 represents the following, respectively. M: 2 hydrogen atoms, divalent metal atom, monosubstituted trivalent metal atom, disubstituted tetravalent metal atom or oxymetal atom, X 1 to X 16 : each independently —OR 1 SiR 2 R 3 R 4 group, R 1 : a linear or branched alkylene group having 1 to 8 carbon atoms, which may contain a so-called ether bond of —C—O—C— or which is substituted with a silyl group. R 2 to R 4 are each independently a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a vinyl group,
Or —OSi (R 5 ) 3 group or —CH 2 Si (R 5 ) 3 group, R 5 : an alkyl group having 1 to 3 carbon atoms, an atom other than X 1 to X 16 attached to the benzene ring: a hydrogen atom or a halogen Atom, Y: halogen atom, n1 to n4: each independently represent the number of halogen substitutions,
An integer from 1 to 4. )
【0030】上記一般式(III a)〜(III d)、(IV
a)〜(IV d)及び(V a)〜(V d)において、Mで
表される金属原子としては、Al,Si,Ca,Cd,
Ti,V,Mn,Fe,Co,Ni,Cu,Zn,G
e,Mo,Ru,Rh,Pd,In,Sn,Pt,Pb
等が挙げられる。また、R1〜R5については、一般式
(I)におけると全く同義である。なお、Yはハロゲン
原子であり、臭素、塩素、弗素、沃素等が挙げられる
が、吸収最大波長の長波長化効果の点で特に臭素が好ま
しい。The above general formulas (IIIa) to (IIId), (IV
In a) to (IV d) and (V a) to (V d), the metal atom represented by M is Al, Si, Ca, Cd,
Ti, V, Mn, Fe, Co, Ni, Cu, Zn, G
e, Mo, Ru, Rh, Pd, In, Sn, Pt, Pb
Etc. In addition, R 1 to R 5 have the same meaning as in formula (I). It should be noted that Y is a halogen atom, and examples thereof include bromine, chlorine, fluorine, iodine, and the like, with bromine being particularly preferable in terms of the effect of increasing the wavelength of the maximum absorption wavelength.
【0031】この一般式(III a)〜(III d)、(IV
a)〜(IV d)及び(V a)〜(V d)で示されるフタ
ロシアニン近赤外吸収材料は、フタロシアニン化合物が
本来もっている安定性を損なうことなしに、有機溶剤へ
の高い溶解性を有し、もちろん近赤外線に対し高い吸収
力を有する。即ち、溶解性が向上したため、溶剤塗工法
により薄膜化が可能で、生産性に優れ、安定性の良いし
かも吸収能の高い膜が得られ、各種電子材料への応用が
可能となる。The general formulas (IIIa) to (IIId), (IV
The phthalocyanine near-infrared absorbing materials represented by a) to (IV d) and (V a) to (V d) have high solubility in organic solvents without impairing the stability originally possessed by phthalocyanine compounds. It has, of course, a high absorption power for near infrared rays. That is, since the solubility is improved, a thin film can be formed by a solvent coating method, a film having excellent productivity, stability, and high absorptivity can be obtained, which can be applied to various electronic materials.
【0032】本発明の前記一般式(III a)〜(III d)
及び(IV a)〜(IV d)で示されるフタロシアニン近赤
外吸収材料は、前記一般式(I)で示される少なくとも
1種のフタロニトリル化合物又は前記一般式(II)で
示される少なくとも1種のジイミノイソインドリン化合
物と、2価の金属、1置換の3価金属、2置換の4価金
属若しくはオキシ金属から選ばれた金属又はこれらの金
属の誘導体を反応させることによって製造することがで
きる。The above general formulas (IIIa) to (IIId) of the present invention
And the phthalocyanine near infrared absorbing material represented by (IVa) to (IVd) is at least one phthalonitrile compound represented by the general formula (I) or at least one phthalonitrile compound represented by the general formula (II). Can be produced by reacting the diiminoisoindoline compound (1) with a metal selected from divalent metals, monosubstituted trivalent metals, disubstituted tetravalent metals or oxymetals, or derivatives of these metals. .
【0033】この場合のフタロシアニン環合成は、有機
溶媒中で実施するのが好ましい。即ち、原料のフタロニ
トリル又はジイミノイソインドリン化合物の少なくとも
1種(1〜4種)を、金属又は金属誘導体と溶媒中、9
0℃〜240℃で加熱反応させる。ここで反応温度が9
0℃より低いと、反応進行が遅い又は進行しない等の不
具合が生じるし、240℃を越えると、分解物が多く生
成し、収率が落ちるという不具合が生じる。溶媒の使用
量としては、フタロニトリル又はジイミノイソインドリ
ン化合物の1〜100重量倍、好ましくは3〜25重量
倍であり、溶媒としては、沸点が90℃以上あれば良
い。使用する溶媒としては、アルコールが好ましく、そ
の具体例としては、n−ブチルアルコール、n−アミル
アルコール、n−ヘキサノール、シクロヘキサノール、
2−メチル−1−ペンタノール、1−ヘプタノール、2
−ヘプタノール、1−オクタノール、2−エチルヘキサ
ノール、ベンジルアルコール、エチレングリコール、プ
ロピレングリコール、エトキシエタノール、プロポキシ
エタノール、ブトキンエタノール等が挙げられる。ま
た、反応に用いる金属又は金属誘導体としては、Al,
Si,Ca,Cd,Ti,V,Mn,Fe,Co,N
i,Cu,Zn,Ge,Mo,Ru,Rh,Pd,I
n,Sn,Pt,Pb及びそれらのハロゲン化物、カル
ボン酸誘導体、硫酸塩、硝酸塩、カルボニル化合物、酸
化物、錯体等が挙げられる。The phthalocyanine ring synthesis in this case is preferably carried out in an organic solvent. That is, at least one kind (1 to 4 kinds) of phthalonitrile or diiminoisoindoline compound as a raw material is mixed with a metal or a metal derivative in a solvent,
Heat reaction is performed at 0 ° C to 240 ° C. Here, the reaction temperature is 9
If the temperature is lower than 0 ° C, the reaction progresses slowly or does not proceed, and if the temperature exceeds 240 ° C, a large amount of decomposition products are produced and the yield decreases. The amount of the solvent used is 1 to 100 times by weight, preferably 3 to 25 times by weight that of the phthalonitrile or diiminoisoindoline compound, and the solvent may have a boiling point of 90 ° C. or higher. The solvent used is preferably alcohol, and specific examples thereof include n-butyl alcohol, n-amyl alcohol, n-hexanol, cyclohexanol,
2-methyl-1-pentanol, 1-heptanol, 2
-Heptanol, 1-octanol, 2-ethylhexanol, benzyl alcohol, ethylene glycol, propylene glycol, ethoxy ethanol, propoxy ethanol, butkin ethanol and the like. As the metal or metal derivative used in the reaction, Al,
Si, Ca, Cd, Ti, V, Mn, Fe, Co, N
i, Cu, Zn, Ge, Mo, Ru, Rh, Pd, I
Examples thereof include n, Sn, Pt, Pb and their halides, carboxylic acid derivatives, sulfates, nitrates, carbonyl compounds, oxides and complexes.
【0034】金属又は金属誘導体とフタロニトリル又は
ジイミノイソインドリン化合物の使用量は、モル比で
1:3〜6モルが好ましい。なお、環形成反応の触媒と
して、有機塩基、例えば、ジアザビシクロウンデセン、
ジアザビシクロノネンなどの強塩基の補助剤を添加して
も良く、その添加量は、フタロニトリル又はジイミノイ
ソインドリン化合物1モルに対して0.1〜10モル、
好ましくは0.5〜2モルである。The metal or metal derivative and the phthalonitrile or diiminoisoindoline compound are preferably used in a molar ratio of 1: 3 to 6 mol. As a catalyst for the ring formation reaction, an organic base such as diazabicycloundecene,
A strong base auxiliary agent such as diazabicyclononene may be added in an amount of 0.1 to 10 mol per 1 mol of a phthalonitrile or diiminoisoindoline compound,
It is preferably 0.5 to 2 mol.
【0035】更に、前記一般式(III a)〜(III d)及
び(IV a)〜(IV d)において、Mが2個の水素原子で
ある、いわゆるメタルフリーフタロシアニンの場合に
は、前記一般式(I)で示される少なくとも一種のフタ
ロニトリル化合物又は前記一般式(II)で示される少
なくとも一種のジイミノイソインドリン化合物に、リチ
ウム又はナトリウムを作用させることによって製造する
ことができる。Further, in the general formulas (IIIa) to (IIId) and (IVa) to (IVd), in the case of a so-called metal-free phthalocyanine in which M is two hydrogen atoms, It can be produced by reacting at least one phthalonitrile compound represented by the formula (I) or at least one diiminoisoindoline compound represented by the general formula (II) with lithium or sodium.
【0036】この反応の場合も、有機溶媒(特にアルコ
ール系)中で実施するのが好ましい。即ち、フタロニト
リル又はジイミノイソインドリン化合物と、Na,L
i,CH3ONa,NaH又はブチルリチウム等の存在
下、アルコール中で70〜150℃で反応させる。ここ
で金属Li又はNaの添加量は、フタロニトリル又はジ
イミノイソインドリン化合物に対し、0.5〜4倍モル
がよい。使用するアルコールの具体例やアルコール量な
どは、前述の金属フタロシアニン製造の際と全く同様で
あるが、反応温度は150℃以下である。150℃を越
えると分解物の生成が多くなる。Also in the case of this reaction, it is preferable to carry out in an organic solvent (especially alcohol system). That is, phthalonitrile or diiminoisoindoline compound, Na, L
i, CH 3 ONa, the presence of such NaH or butyllithium are reacted in 70 to 150 ° C. in an alcohol. Here, the addition amount of the metal Li or Na is preferably 0.5 to 4 times the mol of the phthalonitrile or the diiminoisoindoline compound. The specific example of the alcohol used and the amount of alcohol are exactly the same as in the production of the above-mentioned metal phthalocyanine, but the reaction temperature is 150 ° C. or lower. If it exceeds 150 ° C, the amount of decomposition products is increased.
【0037】また、本発明の前記一般式(V a)〜(V
d)で示されるフタロシアニン近赤外吸収材料は、前記
一般式(III a)〜(III d)あるいは(IV a)〜(IV
d)で示されるフタロシアニン化合物をハロゲン化する
ことによって得ることができる。この場合のハロゲン化
反応は、特開平3−62878号、同3−215466
号、同4−348168号、同4−226390号、同
4−15263号、同4−15264号、同4−152
65号、同4−15266号、同5−17477号、同
5−86301号、同5−25177号、同5−251
79号、同5−17700号、同5−1272号各公報
等の記載例をそのまま利用できる。即ち、ハロゲン系溶
剤、炭化水素又は水の1種又は2種以上の混合物中で、
臭素などのハロゲン化剤を作用させることにより得られ
る。Further, the above general formulas (V a) to (V a of the present invention are
The phthalocyanine near-infrared absorbing material represented by d) is represented by the general formula (IIIa) to (IIId) or (IVa) to (IV
It can be obtained by halogenating the phthalocyanine compound represented by d). The halogenation reaction in this case is described in JP-A-3-62878 and 3-215466.
No. 4, No. 4-348168, No. 4-226390, No. 4-15263, No. 4-15264, No. 4-152.
No. 65, No. 4-15266, No. 5-17477, No. 5-86301, No. 5-25177, No. 5-251.
No. 79, No. 5-17700, No. 5-1272, etc. can be used as they are. That is, in one or a mixture of two or more of a halogen-based solvent, hydrocarbon or water,
It is obtained by reacting a halogenating agent such as bromine.
【0038】[0038]
【実施例】以下実施例について本発明を説明するが、本
発明これらに限定されるものではない。The present invention will be described below with reference to examples, but the present invention is not limited thereto.
【0039】実施例1 (フタロニトリルの合成)3−ヒドロキシフタロニトリ
ル20gと炭酸カリウム10.55gをN,N−ジメチ
ルホルムアミド180mlに加熱溶解し、アルゴン雰囲
気下クロロメチルトリメチルシラン18gを40℃で滴
下し、滴下終了後反応温度を80〜90℃に保ち、30
時間攪拌した。反応槽が室温になるまで冷却した後、希
塩酸250mlを注入し、トルエン1.2lで分液し、
有機層を充分に水洗いした後、硫酸マグネシウムで余分
な水を除去し、その後にトルエンを留去し、トリエン/
シリカゲルカラムにて精製し、下記式(VII)で示さ
れる化合物を23.3g(収率73.0%)得た。この
化合物は白色結晶であり、その融点は112.5℃であ
る。そのIRスペクトルを図1に示す。Example 1 (Synthesis of phthalonitrile) 20 g of 3-hydroxyphthalonitrile and 10.55 g of potassium carbonate were dissolved in 180 ml of N, N-dimethylformamide by heating, and 18 g of chloromethyltrimethylsilane was added dropwise at 40 ° C. under an argon atmosphere. After completion of the dropping, the reaction temperature is kept at 80 to 90 ° C. for 30
Stir for hours. After cooling the reaction tank to room temperature, 250 ml of dilute hydrochloric acid was injected, and the liquid was separated with 1.2 l of toluene.
After washing the organic layer thoroughly with water, excess water was removed with magnesium sulfate, and then toluene was distilled off to remove triene /
It was purified by a silica gel column to obtain 23.3 g (yield 73.0%) of a compound represented by the following formula (VII). This compound is a white crystal and its melting point is 112.5 ° C. The IR spectrum is shown in FIG.
【0040】[0040]
【化17】 [Chemical 17]
【0041】実施例2 (フタロニトリルの合成)3−ニトロフタロニトリル3
0gをN,N−ジメチルアセトアミド/1−メチル−2
−ピロリドン=1/1(容量比)混合溶媒180mlに
溶解し、亜硝酸ナトリウム11.97gを加え、温度1
65℃にて40分攪拌し、温度を室温まで下げ、炭酸カ
リウム16.8gを加え、温度150℃で40分攪拌し
た。温度を40℃まで下げクロロメチルトリメチルシラ
ン25gを滴下し、滴下終了後反応温度を80〜90℃
に保ち、28時間攪拌した。反応槽が室温になるまで冷
却した後、希塩酸350mlを注入し、トルエン1.5
lで分液し、有機層を充分に水洗いした後、硫酸マグネ
シウムにて余分な水を除去し、その後にトルエンを留去
し、トリエン/シリカゲルカラムにて精製し、下記式
(VII)で示される化合物を29.8g(収率74.
7%)得た。Example 2 (Synthesis of phthalonitrile) 3-nitrophthalonitrile 3
0 g of N, N-dimethylacetamide / 1-methyl-2
-Pyrrolidone = 1/1 (volume ratio) dissolved in 180 ml of mixed solvent, 11.97 g of sodium nitrite was added, and the temperature was adjusted to 1
The mixture was stirred at 65 ° C for 40 minutes, the temperature was lowered to room temperature, 16.8 g of potassium carbonate was added, and the mixture was stirred at a temperature of 150 ° C for 40 minutes. The temperature is lowered to 40 ° C., 25 g of chloromethyltrimethylsilane is added dropwise, and the reaction temperature is 80 to 90 ° C. after completion of the addition.
And kept for 28 hours. After cooling the reaction tank to room temperature, 350 ml of dilute hydrochloric acid was injected, and toluene 1.5 was added.
After separating with l, the organic layer was thoroughly washed with water, excess water was removed with magnesium sulfate, and then toluene was distilled off, followed by purification with a triene / silica gel column, which was represented by the following formula (VII). 29.8 g (yield 74.
7%) was obtained.
【0042】実施例3 (ジイミノイソインドリンの合成)前記式(VII)で
示されるフタロニトリル20gとナトリウムメトキシド
14gをメタノール180mlに送入し、アンモニアガ
スを吹き込みながら、室温で1時間攪拌し、その後加熱
環流しながらアンモニアガスを吹き込み、3時間攪拌
し、室温まで冷却した。反応物を可能な限り濃縮し、ク
ロロホルム700mlに溶解し、水及び温水で充分に洗
浄し、硫酸マグネシウムで有機層の余剰な水を除去した
後、クロロホルムを留去し、更にヘキサンで再結晶し、
下記式(VIII)で示される化合物を19.7g(収
率91.7%)得た。Example 3 (Synthesis of diiminoisoindoline) 20 g of phthalonitrile represented by the above formula (VII) and 14 g of sodium methoxide were introduced into 180 ml of methanol and stirred at room temperature for 1 hour while blowing ammonia gas. Then, ammonia gas was blown in while heating under reflux, and the mixture was stirred for 3 hours and cooled to room temperature. The reaction product was concentrated as much as possible, dissolved in 700 ml of chloroform, thoroughly washed with water and warm water, excess water in the organic layer was removed with magnesium sulfate, chloroform was distilled off, and recrystallized with hexane. ,
19.7 g (yield 91.7%) of the compound represented by the following formula (VIII) was obtained.
【0043】[0043]
【化18】 Embedded image
【0044】実施例4 (フタロニトリルの合成)4−ヒドロキシフタロニトリ
ル20gと炭酸カリウム10.55gをN,N−ジメチ
ルホルムアミド200mlに加熱溶解し、アルゴン雰囲
気下クロロメチルトリメチルシラン20gを40℃で滴
下し、滴下終了後反応温度を85〜105℃に保ち、1
8時間攪拌した。反応物が室温になるまで冷却した後、
希塩酸250mlを注入し、トルエン1.2lで分液
し、有機層を充分に水洗いし、硫酸マグネシウムで余分
な水の除去をした後、トルエンを留去し、トリエン/シ
リカゲルカラムにて精製し、下記式(IX)で示される
化合物を24.6g(収率77.0%)得た。Example 4 (Synthesis of phthalonitrile) 20 g of 4-hydroxyphthalonitrile and 10.55 g of potassium carbonate were dissolved in 200 ml of N, N-dimethylformamide by heating, and 20 g of chloromethyltrimethylsilane was added dropwise at 40 ° C. under an argon atmosphere. After the dropping, the reaction temperature is kept at 85 to 105 ° C. and 1
Stir for 8 hours. After cooling the reaction to room temperature,
250 ml of diluted hydrochloric acid was injected, 1.2 l of toluene was used for liquid separation, the organic layer was thoroughly washed with water, excess water was removed with magnesium sulfate, and then toluene was distilled off, followed by purification with a triene / silica gel column. 24.6 g (yield 77.0%) of the compound represented by the following formula (IX) was obtained.
【0045】[0045]
【化19】 [Chemical 19]
【0046】実施例5 (フタロニトリルの合成)3−ヒドロキシフタロニトリ
ル20gと炭酸カリウム10.55gをN,N−ジメチ
ルホルムアミド200mlに加熱溶解し、アルゴン雰囲
気下1−クロロエチルトリメチルシラン20gを30℃
で滴下し、滴下終了と同時に温度を85〜100℃に保
ち、36時間攪拌した。反応物が室温になるまで冷却し
た後、希塩酸200mlを注入し、トルエン1lで分液
し、有機層を充分に水洗いし、硫酸マグネシウムで余分
な水を除去した後、トルエン/シリカゲルカラムにて精
製し、下記式(X)で示される化合物を16.9g(収
率49.9%)得た。この化合物は白色結晶であり、そ
の融点は67.5℃であった。そのIRスペクトルを図
2に示す。Example 5 (Synthesis of phthalonitrile) 20 g of 3-hydroxyphthalonitrile and 10.55 g of potassium carbonate were dissolved in 200 ml of N, N-dimethylformamide by heating, and 20 g of 1-chloroethyltrimethylsilane was added at 30 ° C. under an argon atmosphere.
The temperature was kept at 85 to 100 ° C. at the same time when the dropping was completed, and the mixture was stirred for 36 hours. After cooling the reaction mixture to room temperature, 200 ml of dilute hydrochloric acid was injected, the mixture was separated with 1 l of toluene, the organic layer was thoroughly washed with water, and excess water was removed with magnesium sulfate, followed by purification with a toluene / silica gel column. Then, 16.9 g (yield 49.9%) of a compound represented by the following formula (X) was obtained. The compound was white crystals and had a melting point of 67.5 ° C. The IR spectrum is shown in FIG.
【0047】[0047]
【化20】 Embedded image
【0048】実施例6 (フタロニトリルの合成)3−ヒドロキシフタロニトリ
ル20gと炭酸カリウム10.55gをN,N−ジメチ
ルアセトアミド/ジメチルスルホキシド=5/1(容量
比)混合溶媒150mlに加熱溶解し、アルゴン雰囲気
下3−クロロプロピルトリメチルシラン31.4gを4
5℃で滴下し、滴下終了と同時に温度を90〜110℃
に保ち、24時間攪拌した。反応物が室温になるまで冷
却した後、希塩酸180mlを注入し、トルエン1.2
lで分液し、有機層を充分に水洗いし、硫酸マグネシウ
ムにて余分な水を除去した後、トルエン/シリカゲルカ
ラムにて精製し、下記式(XI)で示される化合物を2
5.5g(収率71.2%)を得た。この化合物は白色
結晶であり、その融点は145℃であった。そのIRス
ペクトルを図3に示す。Example 6 (Synthesis of phthalonitrile) 20 g of 3-hydroxyphthalonitrile and 10.55 g of potassium carbonate were dissolved by heating in 150 ml of a mixed solvent of N, N-dimethylacetamide / dimethyl sulfoxide = 5/1 (volume ratio), Under an argon atmosphere, 31.4 g of 3-chloropropyltrimethylsilane was added to 4
Drip at 5 ° C, and at the same time the temperature is 90 to 110 ° C at the end of the dropping.
And stirred for 24 hours. After cooling the reaction product to room temperature, 180 ml of dilute hydrochloric acid was injected, and toluene 1.2 was added.
The organic layer was thoroughly washed with water, excess water was removed with magnesium sulfate, and the mixture was purified with a toluene / silica gel column to give the compound represented by the following formula (XI) to 2
5.5 g (yield 71.2%) was obtained. The compound was white crystals and had a melting point of 145 ° C. The IR spectrum is shown in FIG.
【0049】[0049]
【化21】 [Chemical 21]
【0050】比較例 トリメチルシリルメタノール20gをN,N−ジメチル
ホルムアミド60mlに溶解し、水浴にて温度を5℃と
し、アルゴン雰囲気下水素化ナトリウム4.6gを加
え、1時間5℃にて攪拌する。次いで、160mlの
N,N−ジメチルホルムアミドに溶解した3−ニトロフ
タロニトリル33.3gを徐々に滴下し、滴下終了後氷
浴をはずし、室温にて24時間攪拌した。反応物に希塩
酸200mlを送入し、トルエン1lにて分液し、有機
層を充分に水洗いした後、硫酸マグネシウムにて余分な
水を除去した後、トルエン/シリカゲルカラムにて精製
を試みたが、目的の前記式(VII)で示される化合物
は殆ど得られず、収率としては1%程度であり、副生物
として3−メトキシフタロニトリルが前記式(VII)
で示される化合物の数倍の重量で生成してしまった。Comparative Example 20 g of trimethylsilylmethanol was dissolved in 60 ml of N, N-dimethylformamide, the temperature was adjusted to 5 ° C. in a water bath, 4.6 g of sodium hydride was added under an argon atmosphere, and the mixture was stirred at 5 ° C. for 1 hour. Then, 33.3 g of 3-nitrophthalonitrile dissolved in 160 ml of N, N-dimethylformamide was gradually added dropwise. After completion of the addition, the ice bath was removed and the mixture was stirred at room temperature for 24 hours. 200 ml of dilute hydrochloric acid was fed to the reaction product, liquid separation was carried out with 1 l of toluene, the organic layer was thoroughly washed with water, and then excess water was removed with magnesium sulfate, and then purification was carried out with a toluene / silica gel column. The target compound of the formula (VII) is hardly obtained, the yield is about 1%, and 3-methoxyphthalonitrile is a by-product of the formula (VII).
It was produced in several times as much weight as the compound represented by.
【0051】実施例7 (フタロシアニンの合成)前記式(VII)で示される
フタロニトリル10gを、32gのヘキサノールに加熱
溶解し、次いでジアザビシクロノネン4gを加え、更に
塩化ニッケル1.8gを加え、Ar雰囲気下120〜1
30℃で24時間攪拌した。反応物が室温になるまで冷
却し、不溶解分を濾取し、濾液のヘキサノールを可能な
限り乾燥し、トルエン/シリカゲルカラムにて、下記式
(1A)(1B)(1C)及び(1D)で示される(1
A)/(1B)/(1C)/(1D)=30/48/2
2/0の混合物5.6g(収率52.6%)を得た。な
お、この混合物のクロロホルム中のλmaxは、700
nmであった。Example 7 (Synthesis of phthalocyanine) 10 g of phthalonitrile represented by the above formula (VII) was dissolved in 32 g of hexanol by heating, 4 g of diazabicyclononene was added, and further 1.8 g of nickel chloride was added. 120 to 1 under Ar atmosphere
The mixture was stirred at 30 ° C for 24 hours. The reaction product was cooled to room temperature, the insoluble matter was filtered off, the hexanol of the filtrate was dried as much as possible, and the following formulas (1A) (1B) (1C) and (1D) were applied to a toluene / silica gel column. Indicated by (1
A) / (1B) / (1C) / (1D) = 30/48/2
5.6 g of a 2/0 mixture (yield 52.6%) was obtained. The λmax of this mixture in chloroform was 700.
was nm.
【0052】[0052]
【化22】 [Chemical formula 22]
【化23】 [Chemical formula 23]
【化24】 [Chemical formula 24]
【化25】 [Chemical 25]
【0053】実施例8 (フタロシアニンの合成)前記式(IX)で示されるフ
タロニトリル10gを、30gのブタノールに加熱溶解
し、次いでジアザビシクロウンデセン4.1gを加え、
更に塩化銅1.7gを加え、Ar雰囲気下36時間加熱
環流した。反応物が室温になるまで冷却し、不溶分を濾
取し、濾液のブタノールを留去し、トルエン/シリカゲ
ルカラムにて、下記式(2A)(2B)(2C)及び
(2D)で示される(2A)/(2B)/(2C)/
(2D)=38/42/15/5の混合物6.8g(収
率63.6%)を得た。なお、この混合物のクロロホル
ム中のλmaxは、682nmであった。Example 8 (Synthesis of phthalocyanine) 10 g of phthalonitrile represented by the above formula (IX) was dissolved in 30 g of butanol by heating, and then 4.1 g of diazabicycloundecene was added,
Furthermore, 1.7 g of copper chloride was added, and the mixture was heated under reflux for 36 hours in an Ar atmosphere. The reaction product is cooled to room temperature, the insoluble matter is filtered off, the butanol in the filtrate is distilled off, and the product is represented by the following formulas (2A) (2B) (2C) and (2D) on a toluene / silica gel column. (2A) / (2B) / (2C) /
6.8 g (yield 63.6%) of a mixture of (2D) = 38/42/15/5 was obtained. The λmax in chloroform of this mixture was 682 nm.
【0054】[0054]
【化26】 [Chemical formula 26]
【化27】 [Chemical 27]
【化28】 [Chemical 28]
【化29】 [Chemical 29]
【0055】実施例9 (フタロシアニンの合成)前記式(VIII)で示され
るジイミノイソインドリン10gを、30gのn−アミ
ルアルコールに加熱溶解し、塩化パラジウム2gを加
え、Ar雰囲気下加熱環流し、28時間攪拌した。反応
物が室温になるまで冷却し、不溶分を濾取し、濾液のア
ミルアルコールを乾燥し、トルエン/シリカゲルカラム
にて、下記式(3A)(3B)(3C)及び(3D)で
示される(3A)/(3B)/(3C)/(3D)=4
0/40/20/0の混合物6.2g(収率59.7
%)を得た。なお、この混合物のクロロホルム中のλm
axは、693nmであった。Example 9 (Synthesis of phthalocyanine) 10 g of the diiminoisoindoline represented by the formula (VIII) was dissolved in 30 g of n-amyl alcohol by heating, 2 g of palladium chloride was added, and the mixture was refluxed under heating in an Ar atmosphere. It was stirred for 28 hours. The reaction product is cooled to room temperature, the insoluble matter is filtered off, the amyl alcohol in the filtrate is dried, and the product is represented by the following formulas (3A) (3B) (3C) and (3D) on a toluene / silica gel column. (3A) / (3B) / (3C) / (3D) = 4
6.2 g of a mixture of 0/40/20/0 (yield 59.7)
%) Was obtained. Λm of this mixture in chloroform
The ax was 693 nm.
【0056】[0056]
【化30】 Embedded image
【化31】 [Chemical 31]
【化32】 Embedded image
【化33】 [Chemical 33]
【0057】実施例10 (フタロシアニンの合成)前記式(X)で示されるフタ
ロニトリル10gを、25gのn−アミルアルコールに
加熱溶解し、ジアザビシクロウンデセン4.5gを加
え、次いで塩化パラジウム2.3gを加え、Ar雰囲気
下120〜125℃で32時間攪拌し、反応物が室温に
なるまで冷却し、不溶分を濾取し、濾液のアミルアルコ
ールを乾燥し、トルエン/シリカゲルカラムにて、下記
式(4A)(4B)(4C)及び(4D)で示される
(4A)/(4B)/(4C)/(4D)=10/80
/10/0の混合物を4.8g(収率43.3%)得
た。なお、この混合物のクロロホルム中のλmaxは、
699nmであった。Example 10 (Synthesis of phthalocyanine) 10 g of the phthalonitrile represented by the formula (X) was dissolved in 25 g of n-amyl alcohol by heating, 4.5 g of diazabicycloundecene was added, and then palladium chloride 2 was added. 0.3 g was added, and the mixture was stirred under Ar atmosphere at 120 to 125 ° C. for 32 hours, cooled to room temperature, the insoluble matter was filtered off, the amyl alcohol in the filtrate was dried, and the mixture was dried with a toluene / silica gel column. (4A) / (4B) / (4C) / (4D) = 10/80 represented by the following formulas (4A), (4B), (4C) and (4D)
4.8 g of a mixture of / 10/10 was obtained (yield 43.3%). The λmax in chloroform of this mixture is
It was 699 nm.
【0058】[0058]
【化34】 Embedded image
【化35】 Embedded image
【化36】 Embedded image
【化37】 Embedded image
【0059】実施例11 (フタロシアニンの合成)前記式(XI)で示されるフ
タロニトリル10gを、40gのn−アミルアルコール
に加熱溶解し、ジアザビシクロウンデセン4gを加え、
次いで塩化パラジウム2gを加え、Ar雰囲気下115
〜130℃で27時間攪拌し、反応物が室温になるまで
冷却し、不溶分を濾取し、濾液のアミルアルコールを乾
燥し、トルエン/クロロホルム=1/1(容量比)/シ
リカゲルカラムにて、下記式(5A)(5B)(5C)
及び(5D)で示される(5A)/(5B)/(5C)
/(5D)=20/80/0/0の混合物を5.8g
(収率52.6%)得た。なお、この混合物のクロロホ
ルム中のλmaxは、691nmであった。Example 11 (Synthesis of phthalocyanine) 10 g of the phthalonitrile represented by the formula (XI) was dissolved in 40 g of n-amyl alcohol under heating, and 4 g of diazabicycloundecene was added,
Then, 2 g of palladium chloride was added and 115
Stir at ~ 130 ° C for 27 hours, cool the reaction mixture to room temperature, collect the insolubles by filtration, dry the amyl alcohol in the filtrate, and dry with toluene / chloroform = 1/1 (volume ratio) / silica gel column. , The following formulas (5A) (5B) (5C)
And (5A) / (5B) / (5C) indicated by (5D)
5.8 g of a mixture of / (5D) = 20/80/0/0
(Yield 52.6%) was obtained. The λmax of this mixture in chloroform was 691 nm.
【0060】[0060]
【化38】 [Chemical 38]
【化39】 [Chemical Formula 39]
【化40】 [Chemical 40]
【化41】 Embedded image
【0061】実施例12 (フタロシアニンのハロゲン化)実施例9で得られたフ
タロシアニン混合物を、ジクロロメタンと水の混合溶媒
に溶解し、臭素を加え、40〜60℃に加熱し、冷却後
有機層を濃縮することにより、下記式(6A)(6B)
(6C)及び(6D)で示される(6A)/(6B)/
(6C)/(6D)=40/40/20/0の混合物を
得た。そのクロロホルム中のλmaxは、707nmと
長波長化した。なお、実施例7、8、10及び11で得
られたフタロシアニン混合物もハロゲン化が可能であ
る。Example 12 (Halogenation of phthalocyanine) The phthalocyanine mixture obtained in Example 9 was dissolved in a mixed solvent of dichloromethane and water, bromine was added, the mixture was heated to 40 to 60 ° C., and the organic layer was cooled. By concentrating, the following formulas (6A) (6B)
(6A) / (6B) / shown by (6C) and (6D)
A mixture of (6C) / (6D) = 40/40/20/0 was obtained. The λmax in chloroform was 707 nm, which was a long wavelength. The phthalocyanine mixture obtained in Examples 7, 8, 10 and 11 can also be halogenated.
【0062】[0062]
【化42】 Embedded image
【化43】 [Chemical 43]
【化44】 [Chemical 44]
【化45】 Embedded image
【0063】実施例1〜6で得られた化合物以外のフタ
ロニトリル及びジイミノイソインドリンの例を表1に示
す。Table 1 shows examples of phthalonitrile and diiminoisoindoline other than the compounds obtained in Examples 1 to 6.
【0064】[0064]
【表1】 [Table 1]
【0065】実施例7〜11で得られた化合物以外のフ
タロシアニンの例を表2に示す。なお、前述したような
異性体を、別々には列挙しない(もちろん異性体は存在
する。)Table 2 shows examples of phthalocyanines other than the compounds obtained in Examples 7 to 11. The isomers as described above are not listed separately (of course, isomers exist).
【0067】[0067]
【表2−(1)】 [Table 2- (1)]
【0068】[0068]
【表2−(2)】 [Table 2- (2)]
【0069】(評価)実施例7〜11で得られたフタロ
シアニン化合物は種々の溶媒に可溶であり、溶剤塗工法
による塗膜が容易に得られ、しかも近赤外領域に優れた
吸収能を有する。(Evaluation) The phthalocyanine compounds obtained in Examples 7 to 11 are soluble in various solvents, a coating film obtained by a solvent coating method can be easily obtained, and excellent absorption ability in the near infrared region is obtained. Have.
【0070】応用例1 厚さ1.2mmのポリメチルメタアクリレート板上にフ
ォトポリマーにて、深さ1000Å、半値幅0.4μ
m、トラックピッチ1.4μmの案内溝を形成した基板
上に、前記式(6A)〜(6D)の混合物の1,2−ジ
クロロエタン溶液をスピナー塗布し、厚さ1000Åの
記録層を設けて追記型の記録媒体とした。Application Example 1 On a polymethylmethacrylate plate having a thickness of 1.2 mm, using a photopolymer, a depth of 1000Å and a half value width of 0.4 μ
m, track pitch of 1.4 μm, a 1,2-dichloroethane solution of the mixture of the formulas (6A) to (6D) was spinner coated on a substrate having a guide groove formed thereon, and a recording layer having a thickness of 1000 Å was provided for additional writing. Type recording medium.
【0071】応用例2〜5 実施例1において、式(6A)〜(6D)の混合物の代
わりに、それぞれ前記表2の化合物No.22、No.
25、No.26、No.33を用いた以外は、同様に
して応用例2〜5の記録媒体を得た。Application Examples 2 to 5 In Example 1, instead of the mixture of the formulas (6A) to (6D), the compound Nos. 22, No.
25, no. 26, No. Recording media of Application Examples 2 to 5 were obtained in the same manner except that 33 was used.
【0072】応用比較例1 応用例1において、前記式(6A)〜(6D)の混合物
の代わりに下記式(XII)で示されるフタロシアニン化
合物を用いた以外は、同様にして応用比較例の記録媒体
を得た。Application Comparative Example 1 Recording of the application comparative example was performed in the same manner as in Application Example 1 except that the phthalocyanine compound represented by the following formula (XII) was used in place of the mixture of the formulas (6A) to (6D). The medium was obtained.
【化46】 Embedded image
【0073】前記の応用例1〜5及び応用比較例1の記
録媒体を用い、下記の記録条件で基板を介して記録し、
その後記録位置を連続レーザー光で再生し、下記の条件
でC/Nを測定した。また反射率も測定した。その結果
を表3に示す。 記録条件: 線速 2.1m/sec 記録周波数 1.25MHz レーザー発振波長 680nm ピックアップレンズ N.A.0.5 再生条件: スキャニングフィルター 30KHz バンド幅 再生パワー 0.25〜0.3mWUsing the recording media of Application Examples 1 to 5 and Application Comparative Example 1 described above, recording was performed through the substrate under the following recording conditions,
Then, the recording position was reproduced with a continuous laser beam, and the C / N was measured under the following conditions. The reflectance was also measured. Table 3 shows the results. Recording conditions: linear velocity 2.1 m / sec recording frequency 1.25 MHz laser oscillation wavelength 680 nm pickup lens N.P. A. 0.5 Playback condition: Scanning filter 30KHz Bandwidth Playback power 0.25-0.3mW
【0074】[0074]
【表3】 ┛[Table 3] ┛
【0075】応用例6 厚さ1.2mm、溝深さ1000Å、半値幅0.45μ
m、トラックピッチ1.6μmの案内溝を有する厚さ
1.2mmの射出成形ポリカーボネート基板上に、前記
式(6A)〜(6D)の混合物をエチルセルソルブ/T
HFの混合溶液に溶解し、それをスピナー塗布し、厚さ
1800Åの記録層を設け、更にその上にAuを110
0Åの厚みで真空蒸着して反射層とし、更にその上にア
クリレート系フォトポリマーをスピンナー塗布して厚さ
約6μmの保護層を形成し、CD−R型の記録媒体とし
た。Application Example 6 Thickness 1.2 mm, groove depth 1000 Å, half width 0.45 μ
m and a 1.2 mm thick injection-molded polycarbonate substrate having guide grooves with a track pitch of 1.6 μm, the mixture of the above formulas (6A) to (6D) was mixed with ethyl cellosolve / T.
Dissolve it in a mixed solution of HF, apply it with a spinner, provide a recording layer with a thickness of 1800 Å, and further add 110 Au on it.
A reflective layer was vacuum-deposited to a thickness of 0Å, and an acrylate-based photopolymer was applied onto the reflective layer by spinner to form a protective layer having a thickness of about 6 μm.
【0076】応用例7〜10 応用例6において、式(6A)〜(6D)の混合物の代
わりにそれぞれ前記表2の化合物No.22、No.2
3、No.33、No.35を用いた以外は、同様にし
て応用例7〜10の記録媒体を得た。Application Examples 7 to 10 In Application Example 6, instead of the mixture of formulas (6A) to (6D), compound Nos. 22, No. Two
3, No. 33, No. Recording media of Application Examples 7 to 10 were obtained in the same manner except that No. 35 was used.
【0077】応用比較例2 応用例6において、式(6A)〜(6D)の混合物の代
わりに下記式(XIIIa)、(XIIIb)に示される臭素化ア
ルコキシフタロシアニン異性体2/8の混合物を用いた
以外は、同様にして応用比較例2の記録媒体を得た。Application Comparative Example 2 In Application Example 6, a mixture of brominated alkoxyphthalocyanine isomers 2/8 represented by the following formulas (XIIIa) and (XIIIb) is used instead of the mixture of formulas (6A) to (6D). A recording medium of Application Comparative Example 2 was obtained in the same manner except that it was omitted.
【化47】 [Chemical 47]
【化48】 Embedded image
【0078】応用比較例3 応用例6において、式(6A)〜(6D)の混合物の代
わりに下記式(XIIIc)、(XIIId)に示される臭素化ア
ルコキシフタロシアニン異性体2/8の混合物を用いた
以外は、同様にして応用比較例3の記録媒体を得た。Application Comparative Example 3 In Application Example 6, a mixture of brominated alkoxyphthalocyanine isomers 2/8 represented by the following formulas (XIIIc) and (XIIId) is used instead of the mixture of formulas (6A) to (6D). A recording medium of Application Comparative Example 3 was obtained in the same manner except that it was omitted.
【化49】 [Chemical 49]
【化50】 Embedded image
【0079】応用例6〜10及び応用比較例2〜3の記
録媒体を用い、レーザー発振波長790nm、線速1.
4m/secの記録条件でEFM信号を記録し、最適記
録パワーPoと最適記録パワー×0.82でのC1エラ
ーを測定し、更にPoでの7万5千Lux光、700時
間後のC1エラー数を測定した。その結果を表4に示
す。Using the recording media of Application Examples 6 to 10 and Application Comparative Examples 2 to 3, a laser oscillation wavelength of 790 nm and a linear velocity of 1.
The EFM signal was recorded under the recording condition of 4 m / sec, the C 1 error at the optimum recording power Po and the optimum recording power × 0.82 was measured, and further 75,000 Lux light at Po and the C after 700 hours were measured. The number of errors was measured. The results are shown in Table 4.
【0080】[0080]
【表4】 [Table 4]
【0081】(評価)本発明のフタロシアニン化合物
は、安定性が高く、770〜830nmに高い屈折率を
有するので、光記録用材料に優れた特性を与えることが
できる。(Evaluation) Since the phthalocyanine compound of the present invention is highly stable and has a high refractive index in the range of 770 to 830 nm, it is possible to give excellent properties to an optical recording material.
【0082】[0082]
【発明の効果】請求項3〜5のフタロシアニン近赤外吸
収材料は、前記一般式(III a)〜(III d)、(IV a)
〜(IV d)、(V a)〜(V d)で示される構造を有する
ことから、フタロシアニン化合物が本来有している熱、
光等に対する安定性を保持したまま、種々の有機溶媒に
可溶なものとなり、しかも高い近赤外線吸収能を持って
いる。その結果、溶剤塗工法による塗膜形成が可能とな
り、利用形態が非常に拡大され、また光記録媒体用とし
て有用である。The phthalocyanine near-infrared absorbing materials according to claims 3 to 5 have the general formulas (IIIa) to (IIId) and (IVa).
To (IV d) and (V a) to (V d) have a structure represented by
It is soluble in various organic solvents while maintaining stability to light and has a high near-infrared absorption ability. As a result, it becomes possible to form a coating film by a solvent coating method, the application form is greatly expanded, and it is useful as an optical recording medium.
【0083】請求項1のフタロニトリル化合物及び請求
項2のジイミノイソインドリン化合物は、それぞれ前記
一般式(I)及び一般式(II)で示される構造を有する
ことから、請求項3〜5のフタロシアニン近赤外吸収材
料の中間体として有用なものとなる。The phthalonitrile compound of claim 1 and the diiminoisoindoline compound of claim 2 have the structures represented by the general formula (I) and the general formula (II), respectively. It becomes useful as an intermediate for phthalocyanine near-infrared absorbing materials.
【0084】請求項6〜7の前記一般式(I)で示され
るフタロニトリル化合物の製造方法並びに請求項8の前
記一般式(III a)〜(III d)及び(IV a)〜(IV d)
で示される金属フタロシアニン化合物の製造方法は、い
ずれも温和な条件で容易に目的物を得ることができるの
で、いずれも工業的に極めて有利な製造方法ということ
ができる。A method for producing the phthalonitrile compound represented by the general formula (I) in claims 6 to 7 and the general formulas (IIIa) to (IIId) and (IVa) to (IVd in claim 8 )
In any of the methods for producing a metal phthalocyanine compound represented by, it is possible to easily obtain the target product under mild conditions, and thus all are industrially extremely advantageous production methods.
【図1】実施例1で得られたフタロニトリル化合物のI
Rスペクトル図である。1 is the I of the phthalonitrile compound obtained in Example 1. FIG.
It is an R spectrum figure.
【図2】実施例5で得られたフタロニトリル化合物のI
Rスペクトル図である。FIG. 2 I of the phthalonitrile compound obtained in Example 5
It is an R spectrum figure.
【図3】実施例6で得られたフタロニトリル化合物のI
Rスペクトル図である。FIG. 3 I of the phthalonitrile compound obtained in Example 6
It is an R spectrum figure.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C09B 47/073 47/18 C09K 3/00 105 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical indication C09B 47/073 47/18 C09K 3/00 105
Claims (8)
リル化合物。 【化1】 (式中、R1〜R4はそれぞれ以下のものを表わす。 R1: 炭素数1〜8の直鎖又は分岐アルキレン基で、基
中に−C−O−C−のいわゆるエーテル結合を含んでい
てもよいし、シリル基で置換されていてもよい、 R2〜R4:それぞれ独立に水素原子、炭素数1〜12の
アルキル基、炭素数1〜3のアルコキシ基、ビニル基、
又は−OSi(R5)3基若しくは−CH2Si(R5)3基、 R5:炭素数1〜3のアルキル基。)1. A phthalonitrile compound represented by the following general formula (I): Embedded image (In the formula, each of R 1 to R 4 represents the following. R 1 : a linear or branched alkylene group having 1 to 8 carbon atoms, which contains a so-called ether bond of —C—O—C—. R 2 to R 4 , which may be substituted or unsubstituted with a silyl group, are each independently a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a vinyl group,
Or -OSi (R 5) 3 group or a -CH 2 Si (R 5) 3 group, R 5: an alkyl group having 1 to 3 carbon atoms. )
イソインドリン化合物。 【化2】 (式中、R1〜R4はそれぞれ以下のものを表わす。 R1:炭素数1〜8の直鎖又は分岐アルキレン基で、基
中に−C−O−C−のいわゆるエーテル結合を含んでい
てもよいし、シリル基で置換されていてもよい、 R2〜R4:それぞれ独立に水素原子、炭素数1〜12の
アルキル基、炭素数1〜3のアルコキシ基、ビニル基、
又は−OSi(R5)3基若しくは−CH2Si(R5)3基、 R5:炭素数1〜3のアルキル基。)2. A diiminoisoindoline compound represented by the following general formula (II). Embedded image (In the formula, each of R 1 to R 4 represents the following. R 1 : a linear or branched alkylene group having 1 to 8 carbon atoms, which contains a so-called ether bond of —C—O—C—. R 2 to R 4 , which may be substituted or unsubstituted with a silyl group, are each independently a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a vinyl group,
Or -OSi (R 5) 3 group or a -CH 2 Si (R 5) 3 group, R 5: an alkyl group having 1 to 3 carbon atoms. )
れる4種のうち、1種又は2種以上の混合物からなるフ
タロシアニン近赤外吸収材料。 【化3】 【化4】 【化5】 【化6】 (式中、M及びX1〜X16はそれぞれ以下のものを表わ
す。 M:2個の水素原子、2価の金属原子、1置換の3価金
属原子、2置換の4価金属原子又はオキシ金属原子、 X1〜X16:それぞれ独立に−OR1SiR2R3R4基、 R1:炭素数1〜8の直鎖又は分岐アルキレン基で、基
中に−C−O−C−のいわゆるエーテル結合を含んでい
てもよいし、シリル基で置換されていてもよい、 R2〜R4:それぞれ独立に水素原子、炭素数1〜12の
アルキル基、炭素数1〜3のアルコキシ基、ビニル基、
又は−OSi(R5)3基若しくは−CH2Si(R5)3基、 R5:炭素数1〜3のアルキル基、 ベンゼン環についているX1〜X16以外の原子:水素原
子又はハロゲン原子。)3. A phthalocyanine near-infrared absorbing material composed of one or a mixture of two or more of four kinds represented by the following general formulas (IIIa) to (IIId). Embedded image [Chemical 4] Embedded image [Chemical 6] (In the formula, M and X 1 to X 16 each represent the following. M: 2 hydrogen atoms, divalent metal atom, monosubstituted trivalent metal atom, disubstituted tetravalent metal atom or oxy. metal atom, X 1 to X 16: each independently -OR 1 SiR 2 R 3 R 4 group, R 1: linear or branched alkylene group having 1 to 8 carbon atoms, in the radical -C-O-C- Which may contain a so-called ether bond or which may be substituted with a silyl group, R 2 to R 4 : each independently a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, and an alkoxy group having 1 to 3 carbon atoms. Group, vinyl group,
Or —OSi (R 5 ) 3 group or —CH 2 Si (R 5 ) 3 group, R 5 : an alkyl group having 1 to 3 carbon atoms, an atom other than X 1 to X 16 attached to the benzene ring: a hydrogen atom or a halogen atom. )
れる4種のうち、1種又は2種以上の混合物からなるフ
タロシアニン近赤外吸収材料。 【化7】 【化8】 【化9】 【化10】 (式中、M及びX1〜X16はそれぞれ以下のものを表わ
す。 M:2個の水素原子、2価の金属原子、1置換の3価金
属原子、2置換の4価金属原子又はオキシ金属原子、 X1〜X16:それぞれ独立に−OR1SiR2R3R4基、 R1:炭素数1〜8の直鎖又は分岐アルキレン基で、基
中に−C−O−C−のいわゆるエーテル結合を含んでい
てもよいし、シリル基で置換されていてもよい、 R2〜R4:それぞれ独立に水素原子、炭素数1〜12の
アルキル基、炭素数1〜3のアルコキシ基、ビニル基、
又は−OSi(R5)3基若しくは−CH2Si(R5)3基、 R5:炭素数1〜3のアルキル基、 ベンゼン環についているX1〜X16以外の原子:水素原
子又はハロゲン原子。)4. A phthalocyanine near-infrared absorbing material comprising one kind or a mixture of two or more kinds out of four kinds represented by the following general formulas (IVa) to (IVd). [Chemical 7] Embedded image [Chemical 9] [Chemical 10] (In the formula, M and X 1 to X 16 each represent the following. M: 2 hydrogen atoms, divalent metal atom, monosubstituted trivalent metal atom, disubstituted tetravalent metal atom or oxy. metal atom, X 1 to X 16: each independently -OR 1 SiR 2 R 3 R 4 group, R 1: linear or branched alkylene group having 1 to 8 carbon atoms, in the radical -C-O-C- Which may contain a so-called ether bond or which may be substituted with a silyl group, R 2 to R 4 : each independently a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, and an alkoxy group having 1 to 3 carbon atoms. Group, vinyl group,
Or —OSi (R 5 ) 3 group or —CH 2 Si (R 5 ) 3 group, R 5 : an alkyl group having 1 to 3 carbon atoms, an atom other than X 1 to X 16 attached to the benzene ring: a hydrogen atom or a halogen atom. )
る4種のうち、1種又は2種以上の混合物からなるフタ
ロシアニン近赤外吸収材料。 【化11】 【化12】 【化13】 【化14】 (式中、M、X1〜X16、Y及びn1〜n4はそれぞれ
以下のものを表わす。 M:2個の水素原子、2価の金属原子、1置換の3価金
属原子、2置換の4価金属原子又はオキシ金属原子、 X1〜X16:それぞれ独立に−OR1SiR2R3R4基、 R1:炭素数1〜8の直鎖又は分岐アルキレン基で、基
中に−C−O−C−のいわゆるエーテル結合を含んでい
てもよいし、シリル基で置換されていてもよい、 R2〜R4:それぞれ独立に水素原子、炭素数1〜12の
アルキル基、炭素数1〜3のアルコキシ基、ビニル基、
又は−OSi(R5)3基若しくは−CH2Si(R5)3基、 R5:炭素数1〜3のアルキル基、 ベンゼン環についているX1〜X16以外の原子:水素原
子又はハロゲン原子、 Y:ハロゲン原子、 n1〜n4:それぞれ独立にハロゲン置換数を表わし、
1〜4の整数。)5. A phthalocyanine near-infrared absorbing material composed of one or a mixture of two or more of four kinds represented by the following general formulas (Va) to (Vd). [Chemical 11] [Chemical 12] [Chemical 13] Embedded image (In the formula, M, X 1 to X 16 , Y and n 1 to n 4 respectively represent the following: M: two hydrogen atoms, divalent metal atom, monosubstituted trivalent metal atom, disubstituted Tetravalent metal atom or oxymetal atom, X 1 to X 16 : each independently —OR 1 SiR 2 R 3 R 4 group, R 1 : a linear or branched alkylene group having 1 to 8 carbon atoms, and It may contain a so-called ether bond of C—O—C— and may be substituted with a silyl group. R 2 to R 4 are each independently a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or a carbon atom. Number 1 to 3 alkoxy group, vinyl group,
Or —OSi (R 5 ) 3 group or —CH 2 Si (R 5 ) 3 group, R 5 : an alkyl group having 1 to 3 carbon atoms, an atom other than X 1 to X 16 attached to the benzene ring: a hydrogen atom or a halogen Atom, Y: halogen atom, n1 to n4: each independently represent the number of halogen substitutions,
An integer from 1 to 4. )
を、有機溶媒中でアルカリの存在下、下記一般式(VI) ZR1SiR2R3R4 (VI) (式中、R1〜R4及びZはそれぞれ以下のものを表わ
す。 R1:炭素数1〜8の直鎖又は分岐アルキレン基で、基
中に−C−O−C−のいわゆるエーテル結合を含んでい
てもよいし、シリル基で置換されていてもよい、 R2〜R4:それぞれ独立に水素原子、炭素数1〜12の
アルキル基、炭素数1〜3のアルコキシ基、ビニル基、
又は−OSi(R5)3基若しくは−CH2Si(R5)3基、 R5:炭素数1〜3のアルキル基、 Z :ハロゲン原子。)で示される少なくとも1種の化
合物と反応させることを特徴とする前記一般式(I)で
示されるフタロニトリル化合物の製造方法。6. A compound of the following general formula (VI) ZR 1 SiR 2 R 3 R 4 (VI) (wherein R 1 to R 4 is prepared by reacting 3- or 4-hydroxyphthalonitrile in the presence of an alkali in an organic solvent. And Z each represent the following: R 1 : a linear or branched alkylene group having 1 to 8 carbon atoms, which may contain a so-called ether bond of —C—O—C— or silyl. R 2 to R 4 , which may be substituted with groups, each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a vinyl group,
Or -OSi (R 5) 3 group or a -CH 2 Si (R 5) 3 group, R 5: an alkyl group having 1 to 3 carbon atoms, Z: halogen atoms. ) A compound for producing a phthalonitrile compound represented by the above general formula (I), which comprises reacting with at least one compound represented by the formula (1).
有機溶媒中で亜硝酸ナトリウム及び炭酸カリウム又はナ
トリウム金属化合物と反応させた後、更に前記一般式
(VI) ZR1SiR2R3R4 (VI) (式中、R1〜R4及びZはそれぞれ以下のものを表わ
す。 R1:炭素数1〜8の直鎖又は分岐アルキレン基で、基
中に−C−O−C−のいわゆるエーテル結合を含んでい
てもよいし、シリル基で置換されていてもよい、 R2〜R4:それぞれ独立に水素原子、炭素数1〜12の
アルキル基、炭素数1〜3のアルコキシ基、ビニル基、
又は−OSi(R5)3基若しくは−CH2Si(R5)3基、 R5:炭素数1〜3のアルキル基、 Z :ハロゲン原子。)で示される少なくとも1種の化
合物を反応させることを特徴とする前記一般式(I)で
示されるフタロニトリル化合物の製造方法。7. 3- or 4-nitrophthalonitrile,
After reacting with sodium nitrite and potassium carbonate or a sodium metal compound in an organic solvent, the above general formula (VI) ZR 1 SiR 2 R 3 R 4 (VI) (wherein R 1 to R 4 and Z are Respectively represent the following: R 1 : a linear or branched alkylene group having 1 to 8 carbon atoms, which may contain a so-called ether bond of —C—O—C— or which is substituted with a silyl group. R 2 to R 4 , which may be each, independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a vinyl group,
Or -OSi (R 5) 3 group or a -CH 2 Si (R 5) 3 group, R 5: an alkyl group having 1 to 3 carbon atoms, Z: halogen atoms. ) A method for producing a phthalonitrile compound represented by the general formula (I), which comprises reacting at least one compound represented by the formula (1).
1種のフタロニトリル化合物又は前記一般式(II)で示
される少なくとも1種のジイミノイソインドリン化合物
と、2価の金属、1置換の3価金属、2置換の4価金属
若しくはオキシ金属から選ばれた金属又はこれらの金属
の誘導体とを反応させることを特徴とする前記一般式(I
II a)〜(III d)及び(IV a)〜(IV d)で示される少なくと
も1種のフタロシアニン化合物の製造方法。8. At least one phthalonitrile compound represented by the general formula (I) or at least one diiminoisoindoline compound represented by the general formula (II), a divalent metal and a mono-substituted compound. Reacting with a metal selected from a trivalent metal, a disubstituted tetravalent metal or an oxymetal, or a derivative of these metals.
A method for producing at least one phthalocyanine compound represented by IIa) to (IIId) and (IVa) to (IVd).
Priority Applications (6)
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JP21424994A JP3839073B2 (en) | 1994-05-11 | 1994-08-16 | Phthalonitrile compound, diiminoisoindoline compound, phthalocyanine near-infrared absorbing material, and production method thereof |
US08/433,454 US5677025A (en) | 1993-09-09 | 1994-09-09 | Optical information recording medium near infrared absorbing material therefor |
ES94926383T ES2126146T3 (en) | 1993-09-09 | 1994-09-09 | OPTICAL RECORDING MEDIA OF INFORMATION AND ABSORBENT MATERIAL IN THE NEXT INFRARED USED THEREIN. |
EP94926383A EP0676299B1 (en) | 1993-09-09 | 1994-09-09 | Optical information recording medium and near-infrared absorbing material used therein |
PCT/JP1994/001500 WO1995007189A1 (en) | 1993-09-09 | 1994-09-09 | Optical information recording medium and near-infrared absorbing material used therein |
DE69415652T DE69415652T2 (en) | 1993-09-09 | 1994-09-09 | OPTICAL INFORMATION RECORDING MEDIUM, AND A CLOSE INFRARED ABSORBENT MATERIAL CONTAINING IT |
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JP6-121778 | 1994-05-11 | ||
JP12177894 | 1994-05-11 | ||
JP21424994A JP3839073B2 (en) | 1994-05-11 | 1994-08-16 | Phthalonitrile compound, diiminoisoindoline compound, phthalocyanine near-infrared absorbing material, and production method thereof |
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JP3839073B2 JP3839073B2 (en) | 2006-11-01 |
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JP2015010084A (en) * | 2013-07-02 | 2015-01-19 | 信越化学工業株式会社 | Phthalocyanine having organosiloxane-containing group and method for producing the same |
US10260853B2 (en) | 2016-04-27 | 2019-04-16 | Mitutoyo Corporation | Linear gage |
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JP2015010084A (en) * | 2013-07-02 | 2015-01-19 | 信越化学工業株式会社 | Phthalocyanine having organosiloxane-containing group and method for producing the same |
US10260853B2 (en) | 2016-04-27 | 2019-04-16 | Mitutoyo Corporation | Linear gage |
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