JPH08269799A - Surface treatment of aluminum material and surface treatment device therefor - Google Patents

Surface treatment of aluminum material and surface treatment device therefor

Info

Publication number
JPH08269799A
JPH08269799A JP6784095A JP6784095A JPH08269799A JP H08269799 A JPH08269799 A JP H08269799A JP 6784095 A JP6784095 A JP 6784095A JP 6784095 A JP6784095 A JP 6784095A JP H08269799 A JPH08269799 A JP H08269799A
Authority
JP
Japan
Prior art keywords
aluminum material
power source
protective film
surface treatment
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6784095A
Other languages
Japanese (ja)
Inventor
Takashi Toto
隆 遠渡
Fumiyasu Tatematsu
郁康 立松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SAKURA KEIKINZOKU KOGYO KK
Original Assignee
SAKURA KEIKINZOKU KOGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SAKURA KEIKINZOKU KOGYO KK filed Critical SAKURA KEIKINZOKU KOGYO KK
Priority to JP6784095A priority Critical patent/JPH08269799A/en
Publication of JPH08269799A publication Critical patent/JPH08269799A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To form hard oxidized protective films having good surface roughness at the time of subjecting a work made of aluminum to an anodic oxidation treatment. CONSTITUTION: A three-phase AC power source 1 is converted to a DC power source by current rectification and thereafter, this DC power source is smoothed and is supplied to the work 4. Then, the stable DC power source free from distortion is supplied to the work 4 and, therefore, the current densities in the respective parts of the work 4 are uniformized. The oxygen generation rates in the respective parts of the work 4 are consequently uniformized and eventually, the surface roughness of the hard oxidized protective films is improved.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、アルミニウム材の表面
に保護膜を形成するための表面処理方法および表面処理
装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface treatment method and a surface treatment apparatus for forming a protective film on the surface of an aluminum material.

【0002】[0002]

【従来の技術】アルミニウム材の表面に形成される保護
膜の一例に、硬質酸化保護膜(Al2O3 )がある。こ
の硬質酸化保護膜は、電解溶液中に浸漬されたアルミニ
ウム材の表面で酸素を発生させることに伴って得られる
ものであり、この処理方法は陽極酸化処理と称されてい
る。
2. Description of the Related Art An example of a protective film formed on the surface of an aluminum material is a hard oxide protective film (Al2O3). This hard oxidation protection film is obtained by generating oxygen on the surface of the aluminum material immersed in the electrolytic solution, and this treatment method is called anodization treatment.

【0003】従来より、硫酸水溶液中でアルミニウム材
の陽極酸化処理を行うにあたっては、サイリスタ制御方
式の整流回路を用いて三相200V交流電源を直流電源
に変換し、この直流電源をアルミニウム材に供給してい
る。この場合、アルミニウム材の大きさ(抵抗値)に合
わせて整流回路の導通角を調整し、アノード(アルミニ
ウム材)およびカソード間に流れる電流を所定値に保持
することが行われている。従って、アルミニウム材の大
きさによっては、整流回路の定格容量を下回る状態で処
理が行われることもある。
Conventionally, when anodizing an aluminum material in a sulfuric acid aqueous solution, a three-phase 200V AC power source is converted to a DC power source by using a thyristor-controlled rectifier circuit, and this DC power source is supplied to the aluminum material. are doing. In this case, the conduction angle of the rectifier circuit is adjusted according to the size (resistance value) of the aluminum material to maintain the current flowing between the anode (aluminum material) and the cathode at a predetermined value. Therefore, depending on the size of the aluminum material, the treatment may be performed in a state where the rated capacity of the rectifier circuit is less than the rated capacity.

【0004】図4の(a)および(b)は整流回路から
出力される電圧波形を示すものであり、(a)は整流回
路の定格容量時における電圧波形、(b)は定格容量を
下回ったときの電圧波形を示している。同図に示すよう
に、定格容量時においては変動量が比較的少ない電圧波
形が得られ、定格容量を下回ったときには電圧波形の変
動が大きくなる。尚、図4の(a´)は、(a)の電圧
波形に対する電流波形、(b´)は、(b)の電圧波形
に対する電流波形である。
FIGS. 4A and 4B show voltage waveforms output from the rectifier circuit. FIG. 4A shows a voltage waveform when the rectifier circuit has a rated capacity, and FIG. 4B shows a voltage waveform below the rated capacity. The voltage waveform when the voltage is applied is shown. As shown in the figure, a voltage waveform with a relatively small amount of fluctuation is obtained at the rated capacity, and when the voltage is below the rated capacity, the fluctuation of the voltage waveform becomes large. Note that (a ′) of FIG. 4 is a current waveform with respect to the voltage waveform of (a), and (b ′) is a current waveform with respect to the voltage waveform of (b).

【0005】[0005]

【発明が解決しようとする課題】しかしながら、上記従
来の装置は、整流回路が変換した直流電源をアルミニウ
ム材に直接印加する構成であるため、図4の(b)に示
すように、特に定格容量を下回ったときに電圧変動が大
きくなり、硫酸水溶液中を流れる電流の変動も大きくな
っていた。
However, since the above-mentioned conventional device has a structure in which the DC power source converted by the rectifier circuit is directly applied to the aluminum material, as shown in FIG. When it was below the range, the voltage fluctuation was large and the fluctuation of the current flowing in the sulfuric acid aqueous solution was also large.

【0006】一般にアルミニウム材は不純物を含んでい
るため、各部の導電率に若干のばらつきがある。従っ
て、硫酸水溶液中を流れる電流の変動が大きくなると、
アルミニウム材の各部における電流密度に大きなばらつ
きが生じてしまう。すると、アルミニウム材の各部にお
ける酸素発生率にばらつきが生じ、硬質酸化保護膜の面
粗度が悪化するので、硫酸水溶液中にNi等を添加して
電流を流れ易くしたり、硬質酸化保護膜を切削加工して
面粗度の向上を図る余分な作業が必要になる。
Since aluminum materials generally contain impurities, there is some variation in the conductivity of each part. Therefore, when the fluctuation of the current flowing through the sulfuric acid aqueous solution becomes large,
Large variations occur in the current density in each part of the aluminum material. Then, the oxygen generation rate in each part of the aluminum material varies, and the surface roughness of the hard oxidation protection film deteriorates. Therefore, Ni or the like is added to the sulfuric acid aqueous solution to facilitate the flow of current, or the hard oxidation protection film is formed. Extra work is required to improve the surface roughness by cutting.

【0007】本発明は上記事情に鑑みてなされたもので
あり、その目的は、Niの添加や酸化被膜の切削といっ
た余分な作業を行うことなく、面粗度の良好な硬質酸化
保護膜を形成できるアルミニウム材の表面処理方法およ
び表面処理装置を提供することである。
The present invention has been made in view of the above circumstances, and an object thereof is to form a hard oxide protective film having a good surface roughness without extra work such as adding Ni and cutting an oxide film. An object of the present invention is to provide a surface treatment method and surface treatment apparatus for an aluminum material that can be used.

【0008】[0008]

【課題を解決するための手段】請求項1記載のアルミニ
ウム材の表面処理方法は、アルミニウム材の表面に保護
膜を形成するためのものにおいて、前記アルミニウム材
の表面に硬質酸化保護膜を形成する陽極酸化処理工程を
備え、この陽極酸化処理工程が、多相交流電源を整流す
ることにより得られる直流電源を平滑して前記アルミニ
ウム材に供給することに基づいて行われるところに特徴
を有する。請求項2記載のアルミニウム材の表面処理方
法は、硬質酸化保護膜の表面にフッ素系樹脂系製の軟質
保護膜を形成する軟質保護膜形成工程を備えたところに
特徴を有する。
A method for surface treatment of an aluminum material according to claim 1, wherein a protective film is formed on the surface of the aluminum material, wherein a hard oxide protective film is formed on the surface of the aluminum material. It is characterized in that it comprises an anodizing process, and this anodizing process is performed based on smoothing a DC power source obtained by rectifying a multi-phase AC power source and supplying it to the aluminum material. The surface treatment method for an aluminum material according to a second aspect is characterized by including a soft protective film forming step of forming a soft protective film made of a fluororesin on the surface of the hard oxidation protective film.

【0009】請求項3記載のアルミニウム材の表面処理
装置は、アルミニウム材の表面に保護膜を形成するため
のものにおいて、前記アルミニウム材の表面に硬質酸化
保護膜を形成する陽極酸化処理部を備え、この陽極酸化
処理部が、多相交流電源を整流して直流電源に変換する
整流手段と、この整流手段により変換された直流電源を
平滑して前記アルミニウム材に供給する平滑手段とを有
しているところに特徴を有する。
According to a third aspect of the present invention, there is provided a surface treatment apparatus for an aluminum material, which is for forming a protective film on the surface of the aluminum material, and is provided with an anodizing section for forming a hard oxidation protective film on the surface of the aluminum material. The anodizing unit has rectifying means for rectifying the multi-phase AC power source and converting it to a DC power source, and smoothing means for smoothing the DC power source converted by the rectifying means and supplying the smoothed aluminum material. There is a feature in that.

【0010】[0010]

【作用】請求項1および3記載の手段によれば、多相交
流電源を整流して直流電源に変換し、この直流電源を平
滑してアルミニウム材に供給する。従って、歪みのない
安定した直流電源がアルミニウム材に供給されるので、
アルミニウム材の各部における電流密度が均一化され
る。このため、アルミニウム材の各部における酸素発生
率が均一化され、その結果、硬質酸化保護膜の面粗度が
向上する。請求項2記載の手段によれば、硬質酸化保護
膜の表面にフッ素系樹脂製の軟質保護膜が形成される。
従って、アルミニウム材の耐摩耗性が向上すると共に摩
擦抵抗が低減される。
According to the means described in claims 1 and 3, the multi-phase AC power supply is rectified and converted into the DC power supply, and the DC power supply is smoothed and supplied to the aluminum material. Therefore, a stable direct current power without distortion is supplied to the aluminum material,
The current density in each part of the aluminum material is made uniform. Therefore, the oxygen generation rate in each part of the aluminum material is made uniform, and as a result, the surface roughness of the hard oxidation protection film is improved. According to the second aspect of the present invention, the soft protective film made of fluororesin is formed on the surface of the hard oxidation protective film.
Therefore, the wear resistance of the aluminum material is improved and the frictional resistance is reduced.

【0011】[0011]

【実施例】以下、本発明の第1実施例を図1および図2
に基づいて説明する。まず、図1において、多相交流電
源に相当する三相200V交流電源1には、整流手段に
相当する整流回路2が接続されている。この整流回路2
は、導通角が調整可能なサイリスタ制御方式のものであ
り、三相200V交流電源1を3相全波整流することに
より直流電源に変換する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will now be described with reference to FIGS.
It will be described based on. First, in FIG. 1, a rectifier circuit 2 corresponding to a rectifying means is connected to a three-phase 200V AC power source 1 corresponding to a multi-phase AC power source. This rectifier circuit 2
Is a thyristor control system whose conduction angle can be adjusted, and converts the three-phase 200V AC power supply 1 into a DC power supply by three-phase full-wave rectification.

【0012】整流回路2の電源線(+)2aおよび電源
線(−)2bには、平滑手段に相当する平滑回路3が接
続されている。この平滑回路3は、電源線(+)2aに
介挿されたチョークコイル3aと、電源線(+)2aお
よび電源線(−)2b間に接続されたコンデンサ3b
と、電源線(+)2aおよび電源線(−)2b間に接続
された抵抗3cとから構成されたものであり、整流回路
2により変換された直流電源を平滑する。
A smoothing circuit 3 corresponding to a smoothing means is connected to the power supply line (+) 2a and the power supply line (-) 2b of the rectifier circuit 2. The smoothing circuit 3 includes a choke coil 3a inserted in a power supply line (+) 2a and a capacitor 3b connected between the power supply line (+) 2a and the power supply line (-) 2b.
And a resistor 3c connected between the power supply line (+) 2a and the power supply line (−) 2b, and smoothes the DC power supply converted by the rectifier circuit 2.

【0013】図2の(a)および(b)は平滑回路3か
ら出力される電圧波形を示すものであり、(a)は整流
回路2の定格容量時における電圧波形、(b)は定格容
量を下回ったときの電圧波形を示す。この場合、整流回
路2の出力電圧が平滑回路3により平滑されるため、定
格容量時および定格容量を下回ったときの双方におい
て、直流電源の変動が少なくなる。尚、図2の(a´)
は、(a)の電圧波形に対する電流波形、(b´)は、
(b)の電圧波形に対する電流波形である。
2A and 2B show voltage waveforms output from the smoothing circuit 3, wherein FIG. 2A is a voltage waveform when the rectifying circuit 2 has a rated capacity, and FIG. 2B is a rated capacity. Shows the voltage waveform when it is below. In this case, since the output voltage of the rectifier circuit 2 is smoothed by the smoothing circuit 3, the fluctuation of the DC power source is small both at the rated capacity and when the rated capacity is less than the rated capacity. In addition, (a ') of FIG.
Is a current waveform with respect to the voltage waveform of (a), and (b ') is
It is a current waveform with respect to the voltage waveform of (b).

【0014】整流回路2の電源線(+)2aには、図1
に示すように、アルミニウム材からなる被処理物4が接
続され、電源線(−)2bには陰極板5,5が接続され
ている(カソード)。この被処理物4は、例えば圧縮機
の固定スクロールや旋回スクロールからなるものであ
り、後述するようにアノードとして機能する。また、電
解槽6内には硫酸水溶液が貯溜されており、被処理物4
は硫酸水溶液中に浸漬されている。
The power supply line (+) 2a of the rectifying circuit 2 has a structure shown in FIG.
As shown in FIG. 3, the object to be processed 4 made of an aluminum material is connected, and the power source line (−) 2b is connected to the cathode plates 5 and 5 (cathode). The object to be processed 4 is composed of, for example, a fixed scroll or an orbiting scroll of a compressor, and functions as an anode as described later. Further, the sulfuric acid aqueous solution is stored in the electrolytic bath 6,
Is immersed in an aqueous sulfuric acid solution.

【0015】そして、平滑回路3により平滑された直流
電源が被処理物4と陰極板5,5との間に印加され、硫
酸水溶液に電流が流れ始めると、被処理物4の表面で
(1)式の電極反応が起こり、電子が水分子から被処理
物4側へ引抜かれる。 2H2 O→O2 +4H+ +4e- (陰極板5へ) ……(1) これにより、被処理物4の表面で酸素が発生し、発生し
た酸素により被処理物4の表面に多孔性の硬質酸化保護
膜(Al2 O3 )が形成される。尚、下記(2)式は陰
極板5の表面における電極反応を示している。 4H+ +4e- (陰極板5より)→2H2 ……(2)
Then, a DC power source smoothed by the smoothing circuit 3 is applied between the object to be processed 4 and the cathode plates 5 and 5, and when a current starts to flow in the sulfuric acid aqueous solution, (1 The electrode reaction of the formula) occurs, and electrons are extracted from the water molecules to the object 4 side. 2H2 O → O2 + 4H + + 4e- (to cathode plate 5) (1) As a result, oxygen is generated on the surface of the object 4 to be processed, and the generated oxygen causes porous hard oxidation on the surface of the object 4 to be processed. A protective film (Al2 O3) is formed. The following equation (2) shows the electrode reaction on the surface of the cathode plate 5. 4H + + 4e- (from cathode plate 5) → 2H2 (2)

【0016】整流回路2の電源線(−)2bには電流検
出器7が介挿されている。この電流検出器7は、可動コ
イル形電流計7aおよび分流器7bから構成されたもの
であり、可動コイル形電流計7aには装置を流れる電流
値が表示される。従って、電流検出器7の表示を見なが
ら被処理物4の大きさ(抵抗値)に合わせて整流回路2
の導通角を調整し、被処理物4と陰極板5との間に流れ
る電流量を所定値に保持する。尚、符号8は、整流回路
2と平滑回路3と電解槽6と電流検出器7とから構成さ
れる陽極酸化処理部を示す。
A current detector 7 is inserted in the power supply line (-) 2b of the rectifier circuit 2. The current detector 7 is composed of a moving coil type ammeter 7a and a shunt 7b, and the moving coil type ammeter 7a displays a current value flowing through the device. Therefore, the rectifier circuit 2 is adjusted according to the size (resistance value) of the workpiece 4 while observing the display of the current detector 7.
Is adjusted to maintain the amount of current flowing between the object to be processed 4 and the cathode plate 5 at a predetermined value. Incidentally, reference numeral 8 indicates an anodizing unit composed of a rectifying circuit 2, a smoothing circuit 3, an electrolytic bath 6 and a current detector 7.

【0017】電解槽6の側方には封孔処理槽9が設けら
れている。この封孔処理槽9内には酢酸ニッケル溶液が
貯溜されており、酸化膜の形成が終了した被処理物4
は、水洗いされた後、酢酸ニッケル溶液中に浸漬され
る。そして、酢酸ニッケル溶液を60〜80°C程度に
加温したまま1〜5分間放置すると水和反応が起こり
(Al2 O3 ・H2 Oの形成)、硬質酸化保護膜の孔が
半ば封じられる。
A sealing treatment tank 9 is provided on the side of the electrolytic cell 6. A nickel acetate solution is stored in the sealing treatment tank 9, and the object to be treated 4 for which the formation of the oxide film is completed.
Is washed with water and then immersed in a nickel acetate solution. Then, when the nickel acetate solution is allowed to stand for 1 to 5 minutes while being heated to about 60 to 80 ° C., a hydration reaction occurs (formation of Al2 O3 .H2 O), and the holes of the hard oxidation protection film are partially sealed.

【0018】封孔処理槽9の側方には、ステンレス製の
潤滑処理槽10が設けられている。この潤滑処理槽10
内には、ポリテトラフルオロエチレン(PTFE)粒子
が分散された潤滑処理溶液が貯溜されており、封孔処理
が終了した被処理物4は、水洗いされた後、潤滑処理溶
液中に浸漬される。そして、潤滑処理溶液を30〜40
°C程度に加温したまま5分以上放置すると、硬質酸化
保護膜の表面に潤滑処理溶液中のPTFE粒子が吸着さ
れる。
A lubrication treatment tank 10 made of stainless steel is provided on the side of the sealing treatment tank 9. This lubrication tank 10
A lubrication treatment solution in which polytetrafluoroethylene (PTFE) particles are dispersed is stored therein, and the object 4 to be treated after the sealing treatment is washed with water and then immersed in the lubrication treatment solution. . Then, the lubricating treatment solution is added to 30-40
When left for 5 minutes or more while being heated to about ° C, the PTFE particles in the lubricating treatment solution are adsorbed on the surface of the hard oxidation protection film.

【0019】PTFE粒子の吸着が終了したら、被処理
物4を乾燥させることにより、被処理物4の表面処理が
終了する。この後、被処理物4が相手側と接触しながら
摺動すると、PTFE粒子が変形し、硬質保護膜の表面
に薄膜状のフッ素系樹脂製の軟質保護膜が形成され、硬
質酸化保護膜が十分に封孔される。
After the adsorption of the PTFE particles is completed, the object 4 to be processed is dried to complete the surface treatment of the object 4 to be processed. After that, when the object to be treated 4 slides while coming into contact with the other side, the PTFE particles are deformed, and a thin soft protective film made of a fluororesin is formed on the surface of the hard protective film. Well sealed.

【0020】尚、上述の封孔処理工程で硬質酸化保護膜
を半封孔状態としたのは、潤滑処理工程でPTFE粒子
を硬質酸化保護膜に容易に吸着させるためである。ま
た、潤滑処理槽10の内面には塩化ビニル製の絶縁シー
ト(図示せず)が貼付されており、潤滑処理槽10と潤
滑処理溶液との間は、絶縁シートにより電気的に絶縁さ
れている。従って、潤滑処理槽10に周囲の機器から迷
走電流が与えられても、潤滑処理溶液が分解されること
が防止される。
The reason why the hard oxidation protective film is semi-sealed in the above-mentioned sealing treatment step is that the PTFE particles are easily adsorbed to the hard oxidation protective film in the lubrication treatment step. An insulating sheet (not shown) made of vinyl chloride is attached to the inner surface of the lubricating treatment tank 10, and the lubricating treatment tank 10 and the lubricating treatment solution are electrically insulated by the insulating sheet. . Therefore, even if a stray current is applied to the lubrication treatment tank 10 from surrounding equipment, the lubrication treatment solution is prevented from being decomposed.

【0021】また、各処理槽6,9,10の上方には、
水平方向および上下方向へ移動可能なキャリア(図示せ
ず)が設けられており、キャリアには複数のハンガー
(図示せず)が吊下げられている。そして、各ハンガー
には被処理物4が吊下げられており、各被処理物4は、
キャリアを水平方向および下方向へ移動させることに基
づき各処理槽6,9,10に供給される。
Above the processing tanks 6, 9 and 10,
A carrier (not shown) movable in the horizontal direction and the vertical direction is provided, and a plurality of hangers (not shown) are suspended on the carrier. Then, the processing object 4 is hung on each hanger, and each processing object 4 is
The carrier is supplied to each of the processing tanks 6, 9 and 10 by moving the carrier in the horizontal direction and the downward direction.

【0022】上記実施例によれば、三相交流電源1から
変換された直流電源を平滑して被処理物4に供給する構
成とした。このため、整流回路2の定格容量を下回った
ときでも、図2の(b)および(b´)に示すように、
歪みの少ない安定した直流電源が被処理物4に供給され
る。
According to the above embodiment, the DC power source converted from the three-phase AC power source 1 is smoothed and supplied to the object to be processed 4. Therefore, even when the rated capacity of the rectifier circuit 2 is reduced, as shown in (b) and (b ') of FIG.
A stable DC power source with little distortion is supplied to the object to be processed 4.

【0023】このため、被処理物4の各部における酸素
発生率が均一化され、その結果、定格容量で処理を行っ
ているときと同レベルまで硬質酸化保護膜の面粗度が向
上する。従って、硫酸水溶液中にNi等を添加したり、
硬質酸化保護膜を切削加工する余分な作業が廃止され
る。尚、AC8C材を用い、膜厚が20μmで硬度がH
V450の硬質酸化保護膜を形成した結果、従来の面粗
度RZ9.5に対して本実施例の面粗度はRZ4.2ま
で向上した。
Therefore, the oxygen generation rate in each part of the object to be processed 4 is made uniform, and as a result, the surface roughness of the hard oxidation protective film is improved to the same level as when the processing is performed at the rated capacity. Therefore, adding Ni etc. to the sulfuric acid aqueous solution,
The extra work of cutting the hard oxidation protection film is eliminated. In addition, using AC8C material, the film thickness is 20 μm and the hardness is H
As a result of forming the hard oxidation protection film of V450, the surface roughness of this example was improved to RZ4.2 in comparison with the conventional surface roughness RZ9.5.

【0024】また、封孔処理工程および潤滑処理工程か
らなる軟質保護膜形成工程を行うことにより、硬質酸化
保護膜の表面に軟質保護膜を形成したので、被処理物4
の耐摩耗性が向上すると共に摩擦抵抗が低減される。従
って、スクロールのような摺動部品に本実施例の表面処
理を施すと、初期摺動特性の改善やなじみ時間の短縮の
点で有利になる。
Further, since the soft protective film is formed on the surface of the hard oxidation protective film by performing the soft protective film forming step including the sealing treatment step and the lubricating treatment step, the object to be treated 4
Wear resistance is improved and frictional resistance is reduced. Therefore, it is advantageous to apply the surface treatment of this embodiment to a sliding component such as a scroll in terms of improving the initial sliding characteristics and shortening the familiar time.

【0025】ところで、陽極酸化処理は、定格容量以下
の比較的低電圧で行われるため、整流出力の変動が大き
くなり、硬質酸化保護膜の面粗度が悪化し易い傾向にあ
る。従って、硬質酸化保護膜は面粗度が悪いという通念
があり、高い摺動特性が要求される部品に適用されるこ
とが少なかった。このため、従来では電解溶液にNiを
添加する,硬質酸化保護膜を切削加工するといった表面
的な対策で高い摺動特性という要求に対応していたのが
実情である。
By the way, since the anodic oxidation treatment is carried out at a relatively low voltage below the rated capacity, the fluctuation of the rectified output becomes large, and the surface roughness of the hard oxidation protection film tends to deteriorate. Therefore, it is generally believed that the hard oxidation protection film has a poor surface roughness, and it has rarely been applied to parts that require high sliding characteristics. For this reason, in the past, the fact is that the requirement for high sliding characteristics has been met by surface measures such as adding Ni to the electrolytic solution and cutting the hard oxidation protection film.

【0026】本実施例は、電源変動が大きくなると、被
処理物の各部における電流密度即ち酸素発生率にばらつ
きが生じ、硬質酸化保護膜の面粗度が悪化するという点
に着目し、面粗度の悪化原因を根本的に対策することを
念頭になされたものであり、硬質酸化保護膜は面粗度が
悪いという通念を打破することができる。
In the present embodiment, attention is paid to the fact that when the fluctuation of the power source becomes large, the current density in each part of the object to be processed, that is, the oxygen generation rate varies, and the surface roughness of the hard oxidation protection film deteriorates. It was devised to take fundamental measures against the cause of the deterioration of the degree of deterioration, and it is possible to break the convention that the hard oxide protective film has poor surface roughness.

【0027】尚、上記第1実施例においては、平滑回路
3をチョークコイル3aとコンデンサ3bと抵抗3cと
から構成したが、これに限定されるものではなく、本発
明の第2実施例を示す図3のように、平滑手段をチョー
クコイル3aから構成しても良い。また、上記第1およ
び第2実施例においては、サイリスタ制御方式の整流回
路2を用いたが、これに限定されるものではなく、例え
ばトランジスタ制御方式を用いた整流回路を利用しても
良い。
Although the smoothing circuit 3 is composed of the choke coil 3a, the capacitor 3b and the resistor 3c in the first embodiment, the present invention is not limited to this, and the second embodiment of the present invention will be described. As shown in FIG. 3, the smoothing means may be composed of the choke coil 3a. Further, although the thyristor control type rectifier circuit 2 is used in the first and second embodiments, the present invention is not limited to this, and a transistor control type rectifier circuit may be used, for example.

【0028】また、上記第1および第2実施例において
は、被処理物4にPTFE粒子を吸着するために封孔処
理工程を行ったが、これに限定されるものではなく、硬
質酸化保護膜に対して結合し易いフッ素系樹脂を用いる
場合には省略しても良い。また、上記第1および第2実
施例においては、被処理物4としてスクロールを例示し
たが、これに限定されるものではなく、シャフトや歯車
等の機械部品,シリンダやバルブ等の自動車部品のよう
な高い摺動特性が要求される摺動部品に適用しても良
い。
Further, in the above-mentioned first and second embodiments, the sealing treatment step was carried out in order to adsorb the PTFE particles to the article to be treated 4, but the present invention is not limited to this, and the hard oxide protective film is not limited thereto. It may be omitted when a fluorine-based resin that easily bonds to is used. Further, in the above-mentioned first and second embodiments, the scroll is exemplified as the object 4 to be processed, but the present invention is not limited to this, and mechanical parts such as shafts and gears, automobile parts such as cylinders and valves, etc. It may be applied to sliding parts that require high sliding characteristics.

【0029】[0029]

【発明の効果】以上の説明から明らかなように、本発明
のアルミニウム材の表面処理方法および表面処理装置は
以下の効果を奏する。請求項1および3記載の手段によ
れば、歪みのない安定した直流電源をアルミニウム材に
供給できるので、アルミニウム材の各部における酸素発
生率が均一化され、その結果、硬質酸化保護膜の面粗度
が向上する。このため、電解溶液中にNi等を添加した
り、硬質酸化保護膜を切削加工する余分な作業が廃止さ
れる。請求項2記載の手段によれば、硬質酸化保護膜の
表面に軟質保護膜を形成できるので、アルミニウム材の
耐摩耗性が向上すると共に摩擦抵抗が低減される。
As is apparent from the above description, the surface treatment method and the surface treatment apparatus for an aluminum material of the present invention have the following effects. According to the means described in claims 1 and 3, since a stable direct current power source without distortion can be supplied to the aluminum material, the oxygen generation rate in each part of the aluminum material is made uniform, and as a result, the surface roughness of the hard oxide protective film is increased. The degree improves. Therefore, the extra work of adding Ni or the like to the electrolytic solution or cutting the hard oxidation protection film is eliminated. According to the means described in claim 2, since the soft protective film can be formed on the surface of the hard oxidation protective film, the wear resistance of the aluminum material is improved and the frictional resistance is reduced.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1実施例を示す表面処理装置の概略
FIG. 1 is a schematic view of a surface treatment apparatus showing a first embodiment of the present invention.

【図2】直流電源の電圧波形および電流波形を示す図FIG. 2 is a diagram showing a voltage waveform and a current waveform of a DC power supply.

【図3】本発明の第2実施例を示す陽極酸化処理部の概
略図
FIG. 3 is a schematic view of an anodizing unit showing a second embodiment of the present invention.

【図4】従来例を示す図2相当図FIG. 4 is a view corresponding to FIG. 2 showing a conventional example.

【符号の説明】[Explanation of symbols]

1は三相200V交流電源(多相交流電源)、2は整流
回路(整流手段)、3は平滑回路(平滑手段)、3aは
チョークコイル(平滑手段)、4は被処理物(アルミニ
ウム材)、8は陽極酸化処理部を示す。
1 is a three-phase 200V AC power supply (multi-phase AC power supply), 2 is a rectifying circuit (rectifying means), 3 is a smoothing circuit (smoothing means), 3a is a choke coil (smoothing means), and 4 is an object to be processed (aluminum material). , 8 indicates an anodizing portion.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C25D 11/04 101 C25D 11/04 101A 11/18 306 11/18 306A ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical display location C25D 11/04 101 C25D 11/04 101A 11/18 306 11/18 306A

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 アルミニウム材の表面に保護膜を形成す
るための表面処理方法において、 前記アルミニウム材の表面に硬質酸化保護膜を形成する
陽極酸化処理工程を備え、 この陽極酸化処理工程は、 多相交流電源を整流することにより得られる直流電源を
平滑して前記アルミニウム材に供給することに基づいて
行われることを特徴とするアルミニウム材の表面処理方
法。
1. A surface treatment method for forming a protective film on a surface of an aluminum material, comprising: an anodizing treatment step of forming a hard oxidation protective film on the surface of the aluminum material, the anodizing treatment step comprising: A surface treatment method for an aluminum material, which is performed based on smoothing a DC power source obtained by rectifying a phase AC power source and supplying the smoothed DC power to the aluminum material.
【請求項2】 硬質酸化保護膜の表面に、フッ素系樹脂
製の軟質保護膜を形成する軟質保護膜形成工程を備えた
ことを特徴とする請求項1記載の表面処理方法。
2. The surface treatment method according to claim 1, further comprising a soft protective film forming step of forming a soft protective film made of a fluororesin on the surface of the hard oxidation protective film.
【請求項3】 アルミニウム材の表面に保護膜を形成す
るための表面処理装置において、 前記アルミニウム材の表面に硬質酸化保護膜を形成する
陽極酸化処理部を備え、 この陽極酸化処理部は、 多相交流電源を整流して直流電源に変換する整流手段
と、 この整流手段により変換された直流電源を平滑して前記
アルミニウム材に供給する平滑手段とを有していること
を特徴とするアルミニウム材の表面処理装置。
3. A surface treatment apparatus for forming a protective film on the surface of an aluminum material, comprising an anodizing section for forming a hard oxidation protective film on the surface of the aluminum material, wherein the anodizing section is An aluminum material having rectifying means for rectifying a phase alternating current power source and converting it into a direct current power source, and smoothing means for smoothing the direct current power source converted by the rectifying means and supplying the smoothed aluminum material to the aluminum material. Surface treatment equipment.
JP6784095A 1995-03-27 1995-03-27 Surface treatment of aluminum material and surface treatment device therefor Pending JPH08269799A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6784095A JPH08269799A (en) 1995-03-27 1995-03-27 Surface treatment of aluminum material and surface treatment device therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6784095A JPH08269799A (en) 1995-03-27 1995-03-27 Surface treatment of aluminum material and surface treatment device therefor

Publications (1)

Publication Number Publication Date
JPH08269799A true JPH08269799A (en) 1996-10-15

Family

ID=13356558

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6784095A Pending JPH08269799A (en) 1995-03-27 1995-03-27 Surface treatment of aluminum material and surface treatment device therefor

Country Status (1)

Country Link
JP (1) JPH08269799A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003028419A1 (en) * 2001-09-26 2003-04-03 Mitsui Mining & Smelting Co.,Ltd. Laminate for formation of capacitor layer and method for production thereof
JP2007138232A (en) * 2005-11-17 2007-06-07 Tajima Seisakusho:Kk Method for forming lubrication coating

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02253003A (en) * 1989-03-27 1990-10-11 Taiyo Ltd Nonlubricated fluid pressure cylinder
JPH04224695A (en) * 1990-12-26 1992-08-13 Izumi Ind Ltd Method and apparatus for executing anodic oxide coating treatment to piston
JP4087383B2 (en) * 2002-09-09 2008-05-21 アメリカン スーパーコンダクター コーポレイション Low impedance transmission line with power flow control device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02253003A (en) * 1989-03-27 1990-10-11 Taiyo Ltd Nonlubricated fluid pressure cylinder
JPH04224695A (en) * 1990-12-26 1992-08-13 Izumi Ind Ltd Method and apparatus for executing anodic oxide coating treatment to piston
JP4087383B2 (en) * 2002-09-09 2008-05-21 アメリカン スーパーコンダクター コーポレイション Low impedance transmission line with power flow control device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003028419A1 (en) * 2001-09-26 2003-04-03 Mitsui Mining & Smelting Co.,Ltd. Laminate for formation of capacitor layer and method for production thereof
US6839219B2 (en) 2001-09-26 2005-01-04 Mitsui Mining & Smelting Co., Ltd. Laminate for forming capacitor layer and method for manufacturing the same
JP2007138232A (en) * 2005-11-17 2007-06-07 Tajima Seisakusho:Kk Method for forming lubrication coating

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