JPH0824802B2 - Centrifugal thin film dryer cleaning method - Google Patents
Centrifugal thin film dryer cleaning methodInfo
- Publication number
- JPH0824802B2 JPH0824802B2 JP18368187A JP18368187A JPH0824802B2 JP H0824802 B2 JPH0824802 B2 JP H0824802B2 JP 18368187 A JP18368187 A JP 18368187A JP 18368187 A JP18368187 A JP 18368187A JP H0824802 B2 JPH0824802 B2 JP H0824802B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film dryer
- centrifugal thin
- cleaning
- blade
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Description
【発明の詳細な説明】 〔発明の目的〕 （産業上の利用分野） この発明は、遠心薄膜乾燥機の洗浄方法に係り、特に
洗浄時間を短縮するとともに、洗浄廃液を抑制するに好
適な遠心薄膜乾燥機の洗浄方法に関する。The present invention relates to a method for cleaning a centrifugal thin film dryer, and particularly to a centrifugal method suitable for shortening the cleaning time and suppressing cleaning waste liquid. This invention relates to a cleaning method for a thin film dryer.
（従来の技術） 第４図は、従来の遠心薄膜乾燥機を用いた廃液処理系
を示す系統図である。(Prior Art) FIG. 4 is a system diagram showing a waste liquid treatment system using a conventional centrifugal thin film dryer.
遠心薄膜乾燥機１の伝熱面３は円筒形状であり、外部
から供給される蒸気等の熱媒によって加熱される。この
伝熱面３の内部にモータ５によって回転する主軸７が配
設され、この主軸７にブレード９が取り付けられる。The heat transfer surface 3 of the centrifugal thin film dryer 1 has a cylindrical shape and is heated by a heat medium such as steam supplied from the outside. A main shaft 7 rotated by a motor 5 is arranged inside the heat transfer surface 3, and a blade 9 is attached to the main shaft 7.
このような遠心薄膜乾燥機１の運転には、処理液中の
不純物等を粉体化処理して除去する処理運転と、遠心薄
膜乾燥機１内に付着したスケールを除去する洗浄運転と
がある。The operation of the centrifugal thin film dryer 1 includes a processing operation of pulverizing and removing impurities and the like in the processing liquid, and a cleaning operation of removing scale adhering to the centrifugal thin film dryer 1. .
まず、処理運転について説明する。 First, the processing operation will be described.
処理液は、廃液供給タンク11からヘッドタンク13およ
び廃液供給管15を順次経て遠心薄膜乾燥機１内へ供給さ
れる。遠心薄膜乾燥機１へ供給された処理液は、ディス
トリビュータ17によって周方向にほぼ均一に分散され、
伝熱面３の内側に沿って流下する。処理液は伝熱面３の
内側を流下し、ブレード９によって攪拌される間に加熱
され、濃縮され、やがて液中の不純物が粉体となって粉
体排出口19から排出される。また、伝熱面３の内側を流
下する間に蒸発した処理液の一部は、蒸気となって蒸気
排出口21から排出され、凝縮器23へ導かれる。The treatment liquid is supplied from the waste liquid supply tank 11 into the centrifugal thin film dryer 1 through the head tank 13 and the waste liquid supply pipe 15 sequentially. The processing liquid supplied to the centrifugal thin film dryer 1 is substantially uniformly dispersed in the circumferential direction by the distributor 17.
It flows down along the inside of the heat transfer surface 3. The treatment liquid flows down inside the heat transfer surface 3 and is heated and agitated by the blade 9 while being agitated. Then, impurities in the treatment liquid become powder and are discharged from the powder discharge port 19. Further, a part of the processing liquid evaporated while flowing down inside the heat transfer surface 3 becomes vapor and is discharged from the vapor discharge port 21 and guided to the condenser 23.
次に洗浄運転を説明する。 Next, the cleaning operation will be described.
この洗浄運転は、粉体となった処理液中の不純物が全
て粉体排出口19から排出されず、スケールとなって伝熱
面３やブレード９に付着するので、これを除去して遠心
薄膜乾燥機１の処理能力を向上させるためになされるも
のである。第５図に示すように、処理運転では主軸７が
高速回転され、遠心薄膜乾燥機１内に150/hrの処理液
が注入されている。これに対し、洗浄運転は、まず主軸
７を高速回転させつつ、切換弁25（第４図）を切り換え
て処理液の供給を止め、その後主軸７の回転数を落した
後切換弁25を切り換えて遠心薄膜乾燥機１内に洗浄液を
供給する。この洗浄液によって、伝熱面３やブレード９
に付着したスケールが溶解され除去される。次に、三方
弁27を切り換えて、溶解された不純物を含む洗浄廃液を
タンク29内へ捨てる。この洗浄廃液は、再び遠心薄膜乾
燥機１によって処理される。In this cleaning operation, all the impurities in the processing liquid which have become powder are not discharged from the powder discharge port 19 but become scales and adhere to the heat transfer surface 3 and the blade 9. This is done to improve the processing capacity of the dryer 1. As shown in FIG. 5, in the processing operation, the main shaft 7 is rotated at a high speed, and the processing liquid of 150 / hr is injected into the centrifugal thin film dryer 1. On the other hand, in the cleaning operation, first, the main spindle 7 is rotated at a high speed, the switching valve 25 (Fig. 4) is switched to stop the supply of the processing liquid, and then the rotational speed of the main spindle 7 is reduced and then the switching valve 25 is switched. The cleaning liquid is supplied into the centrifugal thin film dryer 1. With this cleaning liquid, the heat transfer surface 3 and the blade 9
The scale adhering to is dissolved and removed. Next, the three-way valve 27 is switched to discard the cleaning waste liquid containing the dissolved impurities into the tank 29. This cleaning waste liquid is processed again by the centrifugal thin film dryer 1.
（発明が解決しようとする問題点） ところで、遠心薄膜乾燥機１内へ供給される洗浄液
は、400〜1000/hrであり、遠心薄膜乾燥機１において
蒸発する水量が300/hrであることを考慮すると、非常
に多量である。そのため、遠心薄膜乾燥機１内から洗浄
廃液が多量に排出されることになる。また、洗浄時間も
長時間を要する。(Problems to be Solved by the Invention) By the way, the cleaning liquid supplied into the centrifugal thin film dryer 1 is 400 to 1000 / hr, and the amount of water evaporated in the centrifugal thin film dryer 1 is 300 / hr. Considering that, it is a very large amount. Therefore, a large amount of cleaning waste liquid is discharged from the centrifugal thin film dryer 1. Also, a long cleaning time is required.
この発明は、上記事実を考慮してなされたものであ
り、洗浄廃液の排出を抑制するとともに、洗浄時間の短
縮を図ることができる遠心薄膜乾燥機の洗浄方法を提供
することを目的とする。The present invention has been made in consideration of the above facts, and an object of the present invention is to provide a cleaning method for a centrifugal thin film dryer, which is capable of suppressing discharge of cleaning waste liquid and shortening cleaning time.
（問題点を解決するための手段） この発明は、処理液の処理後洗浄液を供給して遠心薄
膜乾燥機内を洗浄する遠心薄膜乾燥機の洗浄方法におい
て、上記処理液の供給を停止した後所定時間上記遠心薄
膜乾燥機内を攪拌するブレードの回転を継続し、その後
上記遠心薄膜乾燥機の限界蒸発流量以下の流量の洗浄液
を上記遠心薄膜乾燥機内へ供給し、上記ブレードの回転
負荷が無負荷状態を示す値になったときに上記ブレード
の回転および上記洗浄液の供給を停止するようにしたも
のである。(Means for Solving Problems) The present invention relates to a method for cleaning a centrifugal thin film dryer, which comprises supplying a cleaning liquid after processing a processing liquid to clean the inside of the centrifugal thin film dryer. The rotation of the blade that stirs in the centrifugal thin film dryer is continued, and then a cleaning liquid having a flow rate equal to or lower than the limiting evaporation flow rate of the centrifugal thin film dryer is supplied into the centrifugal thin film dryer, and the rotational load of the blade is unloaded. The rotation of the blade and the supply of the cleaning liquid are stopped when the value reaches.
（作用） この発明に係る遠心薄膜乾燥機の洗浄方法によれば、
遠心薄膜乾燥機の限界蒸発流量以下の洗浄液を遠心薄膜
乾燥機内へ供給し、この洗浄液によって定格処理運転時
に最も粉体付着量の多い遠心薄膜乾燥機の軸方向ほぼ中
央部分を好適に洗浄でき、その結果、洗浄時間を短縮す
ることができる。また、洗浄液が薄膜乾燥機内で蒸発し
得る最大流量すなわち限界蒸発流量以下と少ないことか
ら、洗浄廃液を著しく抑制できる。(Operation) According to the cleaning method of the centrifugal thin film dryer of the present invention,
The cleaning liquid of the centrifugal evaporation rate of the centrifugal thin film dryer or less is supplied into the centrifugal thin film dryer, and this cleaning liquid can suitably clean the axial central portion of the centrifugal thin film dryer with the largest amount of powder adhered during the rated operation. As a result, the cleaning time can be shortened. Further, since the cleaning liquid is as small as the maximum flow rate that can be evaporated in the thin film dryer, that is, less than the limit evaporation flow rate, the cleaning waste liquid can be significantly suppressed.
（実施例） 以下、この発明の実施例を図面に基づいて説明する。Embodiment An embodiment of the present invention will be described below with reference to the drawings.
第１図はこの発明に係る遠心薄膜乾燥機の洗浄方法の
第１実施例を示す運転モード図であり、第２図はこの第
１実施例が適用された遠心薄膜乾燥機を含む廃液処理系
を示す系統図である。この第１実施例において従来と同
様な部分は同一の符号を付すことにより説明を省略する
が、説明が不足している機器等について追加して説明す
る。FIG. 1 is an operation mode diagram showing a first embodiment of a cleaning method for a centrifugal thin film dryer according to the present invention, and FIG. 2 is a waste liquid treatment system including a centrifugal thin film dryer to which the first embodiment is applied. FIG. In the first embodiment, the same parts as those in the prior art are designated by the same reference numerals and the description thereof will be omitted. However, devices and the like whose description is insufficient will be additionally described.
第２図に示すように、BWR原子力発電所におけるイオ
ン交換樹脂の再生によって発生したNa2SO4水溶液（処理
液）は、濃縮器によって20wt％まで濃縮され、その後廃
液供給タンク11へ輸送される。処理液は、この廃液供給
タンク11内で攪拌されて均一濃度にされた後、ポンプ31
によってヘッドタンク13へ送られ、その後、廃液供給管
15を介して遠心薄膜乾燥機１へ導かれる。処理液の遠心
薄膜乾燥機への供給は、流量計33を見ながら供給流量が
一定となるように流量調整弁35によって調整される。洗
浄液供給バルブ37は、遠心薄膜乾燥機１の洗浄運転時に
のみ開とされ、処理運転時には閉に設定される。As shown in FIG. 2, the Na 2 SO 4 aqueous solution (treatment liquid) generated by the regeneration of the ion exchange resin in the BWR nuclear power plant is concentrated to 20 wt% by the concentrator and then transported to the waste liquid supply tank 11. . The treatment liquid is stirred in the waste liquid supply tank 11 to a uniform concentration, and then the pump 31
Sent to the head tank 13 and then the waste liquid supply pipe
It is guided to the centrifugal thin film dryer 1 via 15. The supply of the treatment liquid to the centrifugal thin film dryer is adjusted by the flow rate adjusting valve 35 so that the supply flow rate becomes constant while observing the flow meter 33. The cleaning liquid supply valve 37 is opened only during the cleaning operation of the centrifugal thin film dryer 1, and is closed during the processing operation.
遠心薄膜乾燥機１は伝熱面３の内側を流下する処理液
を加熱し、処理液中の不純物を粉体化し、三方弁27を介
して図示しない粉体収納ボックス内へ落下させる。ま
た、伝熱面３によって蒸発された処理液中の一部は、蒸
気となって凝縮器23へ導かれ、その後他の廃液処理系に
より処理される。この遠心薄膜乾燥機１の仕様は伝熱面
積が3m2であり、８気圧、175℃の飽和蒸気で加熱すると
150/hrの処理液を処理できる。また、粉体の生成量は
40Kg/hrである。さらに、遠心薄膜乾燥機１内で水が蒸
発する最大の量（遠心薄膜乾燥機１の限界蒸発流量）は
300/hrである。この遠心薄膜乾燥機１にはモータ５に
電力計39が設置され、測定されたモータ電力値によりブ
レード９の負荷が検出される。The centrifugal thin film dryer 1 heats the processing liquid flowing down inside the heat transfer surface 3 to convert the impurities in the processing liquid into powder and drop it through a three-way valve 27 into a powder storage box (not shown). Further, a part of the treatment liquid evaporated by the heat transfer surface 3 becomes vapor and is guided to the condenser 23, and then treated by another waste liquid treatment system. The specification of this centrifugal thin film dryer 1 is that the heat transfer area is 3 m 2 , and when heated with saturated steam at 8 atm and 175 ° C.
It can process 150 / hr processing solution. The amount of powder produced is
It is 40 Kg / hr. Further, the maximum amount of water evaporated in the centrifugal thin film dryer 1 (the limit evaporation flow rate of the centrifugal thin film dryer 1) is
It is 300 / hr. In this centrifugal thin film dryer 1, a power meter 39 is installed on the motor 5, and the load on the blade 9 is detected by the measured motor power value.
次に、遠心薄膜乾燥機の洗浄方法を説明する。 Next, a method of cleaning the centrifugal thin film dryer will be described.
処理運転時には、第１図に示すように、主軸７が回転
され、150/hrの処理液が遠心薄膜乾燥機１内へ供給さ
れて、処理液が粉体化処理される。During the processing operation, as shown in FIG. 1, the main shaft 7 is rotated and a processing liquid of 150 / hr is supplied into the centrifugal thin film dryer 1 to powderize the processing liquid.
洗浄運転は、処理液の供給を停止することから開始す
る。処理液の供給停止後モータ５の回転数をそのまま維
持し、ブレード９を処理運転時と同じ回転数で回転させ
続ける。処理液の供給停止後所定時間、例えば約２分経
過した後に洗浄液を供給させる。洗浄液供給までに所定
時間を設定するのは、この間に、そのとき迄遠心薄膜乾
燥機１内へ供給されていた処理液を粉体化し、かつこの
粉体を粉体排出口19から排出させるためである。The cleaning operation is started by stopping the supply of the processing liquid. After the supply of the processing liquid is stopped, the rotation speed of the motor 5 is maintained as it is, and the blade 9 is continuously rotated at the same rotation speed as during the processing operation. The cleaning liquid is supplied after a lapse of a predetermined time, for example, about 2 minutes after the supply of the processing liquid is stopped. The predetermined time is set until the cleaning liquid is supplied in order to pulverize the processing liquid that has been supplied into the centrifugal thin film dryer 1 at that time and to discharge the powder from the powder discharge port 19. Is.
洗浄液の供給は、洗浄液供給バルブ37を開くことによ
り行なわれる。洗浄液の供給流量は、遠心薄膜乾燥機１
の限界蒸発流量（300/hr）の約70〜90％、例えば250
/hrであるため、遠心薄膜乾燥機１の下方は常に乾燥
状態になる。また、遠心薄膜乾燥機１内へ供給された洗
浄液は、上記所定時間のブレード９の回転にも拘らず伝
熱面３等に未だ残留して付着している粉体（スケール）
を再溶解して下方へ流下し、遠心薄膜乾燥機１の下部で
再び粉体化処理される。この粉体は、三方弁27を介して
粉体収納ボックスに収納される。また、再溶解した粉体
を再び粉体化する間に蒸発された蒸気は、凝縮器23で凝
縮される。このような洗浄では、洗浄液供給時に遠心薄
膜乾燥機１の下方は乾燥状態となり、洗浄廃液が抑制さ
れるので、三方弁27は処理運転時と同じ位置のままでよ
い。また、上述のような洗浄は、特に、定格処理運転時
に処理液を粉体化するに最も寄与する部分、つまり遠心
薄膜乾燥機１の軸方向ほぼ中央位置における伝熱面３お
よびブレード９に付着した粉体を再溶解して除去するも
のである。The cleaning liquid is supplied by opening the cleaning liquid supply valve 37. The supply flow rate of the cleaning liquid is 1
Approximately 70-90% of the limit evaporation flow rate (300 / hr), for example 250
Since it is / hr, the lower part of the centrifugal thin film dryer 1 is always in a dry state. Further, the cleaning liquid supplied into the centrifugal thin film dryer 1 is a powder (scale) still remaining and adhering to the heat transfer surface 3 and the like despite the rotation of the blade 9 for the predetermined time.
Is re-dissolved, flows downward, and is pulverized again in the lower part of the centrifugal thin film dryer 1. This powder is stored in the powder storage box via the three-way valve 27. Further, the vapor evaporated while the re-dissolved powder is pulverized again is condensed in the condenser 23. In such cleaning, the lower part of the centrifugal thin film dryer 1 is in a dry state when the cleaning liquid is supplied, and the cleaning waste liquid is suppressed, so that the three-way valve 27 may remain at the same position as in the processing operation. In addition, the cleaning as described above is adhered to the heat transfer surface 3 and the blade 9 at a portion that most contributes to the pulverization of the processing liquid during the rated processing operation, that is, at the substantially central position in the axial direction of the centrifugal thin film dryer 1. The powder thus obtained is redissolved and removed.
次に上述の洗浄が完了した際に、洗浄液供給バルブ37
を閉じて洗浄液の供給を停止し、モータ５を止めてブレ
ード９の回転を停止させる。電力計39により検出される
ブレード９の回転負荷が無負荷状態を示すモータ電力値
（洗浄完了レベル）になったときに、洗浄が完了したも
のと判断される。Next, when the above-mentioned cleaning is completed, the cleaning liquid supply valve 37
Is closed to stop the supply of the cleaning liquid, the motor 5 is stopped, and the rotation of the blade 9 is stopped. When the rotational load of the blade 9 detected by the power meter 39 reaches the motor power value (cleaning completion level) indicating a no-load state, it is determined that cleaning is completed.
ここで、溶液の濃度とモータ電力との関係を第１図に
基づいて考察する。処理運転時には硫化ナトリウム（Na
2SO4）の濃度が高く、したがって、粘度が大きいのでモ
ータ電力も大きくなる。処理液の供給停止後、洗浄液の
供給開始前の運転時には、硫化ナトリウムが粉体となり
粘度が小さくなるので、モータ電力が低下する。次に、
洗浄液の供給を開始すると、粉体の硫化ナトリウムが再
溶解されるため溶液の濃度が高くなり粘性が大きくなっ
てモータ電力が再び上昇する。やがて、遠心薄膜乾燥機
１内の洗浄液中の硫化ナトリウムが粉体化されるに従い
洗浄液の濃度が下がり、モータ電力が低下する。洗浄液
中の硫化ナトリウムが殆ど粉体化された段階では、ブレ
ード９の回転負荷がなくなるので、電力計９によって検
出されるモータ電力値は洗浄完了レベルを呈する。Here, the relationship between the concentration of the solution and the motor power will be considered based on FIG. Sodium sulfide (Na
The concentration of 2 SO 4 ) is high, and therefore the viscosity is high, so the motor power is also high. During the operation after the supply of the treatment liquid is stopped and before the supply of the cleaning liquid is started, sodium sulfide becomes powder and the viscosity is reduced, so that the motor power is reduced. next,
When the supply of the cleaning liquid is started, the powdery sodium sulfide is redissolved, so that the concentration of the solution becomes high, the viscosity becomes large, and the motor power again rises. Eventually, as the sodium sulfide in the cleaning liquid in the centrifugal thin film dryer 1 is pulverized, the concentration of the cleaning liquid will decrease and the motor power will decrease. At the stage where the sodium sulfide in the cleaning liquid is almost pulverized, the rotational load on the blade 9 disappears, so that the motor power value detected by the power meter 9 indicates the cleaning completion level.
上記実施例によれば、洗浄液を遠心薄膜乾燥機１の限
界蒸発流量以下の流量としていることから、洗浄廃液の
排出を抑制することができる。According to the above-described embodiment, since the cleaning liquid has a flow rate equal to or lower than the limit evaporation flow rate of the centrifugal thin film dryer 1, discharge of the cleaning waste liquid can be suppressed.
また、この洗浄は、定格処理運転時処理液を粉体化す
るに最も寄与する部分に付着した粉体を好適に除去し、
さらに、処理液供給停止後洗浄液供給開始前に所定時間
ブレード９を回転させて、遠心薄膜乾燥機１内の処理液
を粉体化し、粉体排出口19から除去することから、従来
に比べ洗浄時間を短縮することができる。In addition, this cleaning preferably removes the powder adhering to the part that most contributes to pulverizing the treatment liquid during the rated treatment operation,
Further, after the processing liquid supply is stopped and before the cleaning liquid supply is started, the blade 9 is rotated for a predetermined time to pulverize the processing liquid in the centrifugal thin film dryer 1 and remove it from the powder discharge port 19. The time can be shortened.
次に、第２実施例を第３図に基づいて説明する。 Next, a second embodiment will be described with reference to FIG.
この第２実施例が前述の第１実施例と異なるのは、洗
浄液供給後一定時間経過後に洗浄液の供給およびブレー
ド９の回転を一旦止め、次に再び洗浄液を供給しかつブ
レード９を回転させ、その後ブレード９の回転負荷が無
負荷状態を示す値になったとき洗浄液の供給およびブレ
ード９の回転を止める点である。The second embodiment differs from the first embodiment described above in that the supply of the cleaning liquid and the rotation of the blade 9 are temporarily stopped after a certain time has elapsed after the cleaning liquid was supplied, and then the cleaning liquid is supplied again and the blade 9 is rotated. After that, the supply of the cleaning liquid and the rotation of the blade 9 are stopped when the rotational load of the blade 9 reaches a value indicating a non-loaded state.
この第２実施例は、特に処理液の性状、例えば溶解性
または非溶解性不純物質の種類によってはモータ電力の
降下率が低く、洗浄時間が長くなる場合があるので、こ
のような場合に適用される。したがって、上記一定時間
は、第１実施例において洗浄液を供給してからその供給
を停止するまでの時間のほぼ1/3〜1/2程度の時間に設定
される。The second embodiment is particularly applicable to such a case because the motor power drop rate may be low and the cleaning time may be long depending on the nature of the processing liquid, for example, the type of soluble or insoluble impurities. To be done. Therefore, the fixed time is set to about 1/3 to 1/2 of the time from the supply of the cleaning liquid to the stop of the supply in the first embodiment.
また、この一定時間後処理液の供給を停止し、かつブ
レード９の回転を止めるのは、この間に遠心薄膜乾燥機
１内の粉体を粉体排出口19から積極的に落下させるため
である。したがって、この落下後洗浄液を供給すると、
遠心薄膜乾燥機１内の洗浄液濃度は洗浄液供給停止前の
濃度に比べ低くなる。その結果、洗浄液の供給を停止し
ない場合に比べ、より一層短時間で洗浄を完了すること
ができる。The reason why the supply of the post-treatment liquid is stopped and the rotation of the blade 9 is stopped for the fixed time is that the powder in the centrifugal thin film dryer 1 is positively dropped from the powder discharge port 19 during this period. . Therefore, if you supply the cleaning liquid after this drop,
The concentration of the cleaning liquid in the centrifugal thin film dryer 1 becomes lower than the concentration before the supply of the cleaning liquid was stopped. As a result, the cleaning can be completed in a shorter time than in the case where the supply of the cleaning liquid is not stopped.
なお、上記第１および第２実施例ではモータ５に電力
計39を設置するものにつき説明したが、電流計を設置し
てモータ電流の変化によりブレード９の回転負荷を検出
してもよい。In the first and second embodiments, the motor 5 is provided with the wattmeter 39, but an ammeter may be provided to detect the rotational load of the blade 9 based on the change in the motor current.
また、電力計39や電流計を設置してモータ電力やモー
タ電流を実測する代りに、遠心薄膜乾燥機１の容量や伝
熱面３およびブレード９の大きさを考慮して、洗浄液の
供給開始後のモータ電力やモータ電流の変化を予測し、
この予測値に基づき洗浄液供給開始後タイマーによって
洗浄液の供給停止を制御してもよい。Further, instead of installing a power meter 39 or an ammeter to measure the motor power or the motor current, the supply of the cleaning liquid is started in consideration of the capacity of the centrifugal thin film dryer 1, the heat transfer surface 3 and the size of the blade 9. Predict later changes in motor power and motor current,
Based on this predicted value, the supply of the cleaning liquid may be controlled by a timer after the supply of the cleaning liquid is started.
以上のように、この発明に係る遠心薄膜乾燥機の洗浄
方法によれば、処理液の供給停止後所定時間遠心薄膜乾
燥機内のブレードの回転を継続し、その後遠心薄膜乾燥
機の限界蒸発流量以下の流量の洗浄液を遠心薄膜乾燥機
内へ供給し、上記ブレードの回転負荷が無負荷状態を示
す値になったときにブレードの回転および洗浄液の供給
を停止するようにしたことから、定格処理運転時に最も
粉体付着の多い遠心薄膜乾燥機の軸方向中央部分を好適
に洗浄でき、その結果、洗浄時間を短縮することができ
るとともに、洗浄廃液を著しく抑制することができると
いう効果を奏する。As described above, according to the cleaning method of the centrifugal thin film dryer according to the present invention, the rotation of the blade in the centrifugal thin film dryer is continued for a predetermined time after the supply of the treatment liquid is stopped, and then the limit evaporation flow rate of the centrifugal thin film dryer or less The cleaning liquid was supplied to the centrifugal thin film dryer at the flow rate of, and the rotation of the blade and the supply of the cleaning liquid were stopped when the rotational load of the blade reached a value indicating an unloaded state. The central portion in the axial direction of the centrifugal thin film dryer, which has the most powder adhesion, can be suitably washed, and as a result, the washing time can be shortened and the waste washing liquid can be significantly suppressed.
第１図はこの発明に係る遠心薄膜乾燥機の洗浄方法の第
１実施例を示す運転モード図、第２図は第１実施例が適
用された遠心薄膜乾燥機を含む廃液処理系を示す系統
図、第３図は第２実施例を示す運転モード図、第４図は
従来の遠心薄膜乾燥機を用いた廃液処理系を示す系統
図、第５図は従来の遠心薄膜乾燥機の洗浄方法を示す運
転モード図である。 １……遠心薄膜乾燥機、３……伝熱面、５……モータ、
７……主軸、９……ブレード、11……廃液供給タンク、
19……粉体排出口、39……電力計。FIG. 1 is an operation mode diagram showing a first embodiment of a cleaning method for a centrifugal thin film dryer according to the present invention, and FIG. 2 is a system showing a waste liquid treatment system including a centrifugal thin film dryer to which the first embodiment is applied. FIG. 3 is an operation mode diagram showing the second embodiment, FIG. 4 is a system diagram showing a waste liquid treatment system using a conventional centrifugal thin film dryer, and FIG. 5 is a cleaning method for a conventional centrifugal thin film dryer. FIG. 3 is an operation mode diagram showing FIG. 1 ... Centrifugal thin film dryer, 3 ... Heat transfer surface, 5 ... Motor,
7 ... spindle, 9 ... blade, 11 ... waste liquid supply tank,
19 ... powder outlet, 39 ... power meter.
Claims (4)
乾燥機内を洗浄する遠心薄膜乾燥機の洗浄方法におい
て、上記処理液の供給を停止した後所定時間上記遠心薄
膜乾燥機内を攪拌するブレードの回転を継続し、その後
上記遠心薄膜乾燥機の限界蒸発流量以下の流量の洗浄液
を上記遠心薄膜乾燥機内へ供給し、上記ブレードの回転
負荷が無負荷状態を示す値になったときに上記ブレード
の回転および上記洗浄液の供給を停止することを特徴と
する遠心薄膜乾燥機の洗浄方法。1. In a method for cleaning a centrifugal thin film dryer, which comprises supplying a cleaning liquid after processing a processing liquid to clean the inside of the centrifugal thin film dryer, stirring the inside of the centrifugal thin film dryer for a predetermined time after stopping the supply of the processing liquid. Continuing the rotation of the blade, and then supplying a cleaning liquid having a flow rate equal to or lower than the limiting evaporation flow rate of the centrifugal thin film dryer into the centrifugal thin film dryer, and when the rotational load of the blade reaches a value indicating an unloaded state, A method for cleaning a centrifugal thin film dryer, characterized in that rotation of a blade and supply of the cleaning solution are stopped.
給およびブレードの回転を一旦止め、次に、再び上記洗
浄液を供給しかつ上記ブレードを回転させ、その後、上
記ブレードの回転負荷が無負荷状態を示す値になったと
き上記洗浄液の供給および上記ブレードの回転を止める
特許請求の範囲第１項記載の遠心薄膜乾燥機の洗浄方
法。2. The supply of the cleaning liquid and the rotation of the blade are temporarily stopped after a lapse of a certain time after the cleaning liquid is supplied, then the cleaning liquid is supplied again and the blade is rotated, and thereafter, the rotational load of the blade is in an unloaded state. The method for cleaning a centrifugal thin film dryer according to claim 1, wherein the supply of the cleaning liquid and the rotation of the blade are stopped when the value becomes
の供給およびブレードの回転は、このブレードが取り付
けられた主転のモータ電力またはモータ電流の変化に基
づいて制御される特許請求の範囲第１項または第２項記
載の遠心薄膜乾燥機の洗浄方法。3. The supply of the cleaning liquid and the rotation of the blade after the supply of the cleaning liquid is started are controlled on the basis of a change in the motor power or motor current of the main rotation to which the blade is attached. The method for cleaning a centrifugal thin film dryer according to item 1 or 2.
量は、上記遠心薄膜乾燥機の限界蒸発流量の約70〜90％
である特許請求の範囲第１項ないし第３項にいずれか記
載の遠心薄膜乾燥機の洗浄方法。4. The flow rate of the cleaning liquid supplied into the centrifugal thin film dryer is about 70 to 90% of the limiting evaporation flow rate of the centrifugal thin film dryer.
The method for cleaning a centrifugal thin film dryer according to any one of claims 1 to 3, wherein:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18368187A JPH0824802B2 (en) | 1987-07-24 | 1987-07-24 | Centrifugal thin film dryer cleaning method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18368187A JPH0824802B2 (en) | 1987-07-24 | 1987-07-24 | Centrifugal thin film dryer cleaning method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6430601A JPS6430601A (en) | 1989-02-01 |
| JPH0824802B2 true JPH0824802B2 (en) | 1996-03-13 |
Family
ID=16140063
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18368187A Expired - Fee Related JPH0824802B2 (en) | 1987-07-24 | 1987-07-24 | Centrifugal thin film dryer cleaning method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0824802B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4945502B2 (en) * | 2008-04-08 | 2012-06-06 | 株式会社東芝 | Cleaning method of centrifugal thin film dryer |
-
1987
- 1987-07-24 JP JP18368187A patent/JPH0824802B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6430601A (en) | 1989-02-01 |
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