JPH08234190A - Color liquid crystal display device and color filter substrate and its production - Google Patents

Abstract

PURPOSE: To provide a color liquid crystal display device which is uniform in the thickness of a liquid crystal layer, allows the orientation treatment of liquid crystals by rubbing and has excellent display quality and a process for producing the color filter substrate used for this color liquid crystal display device. CONSTITUTION: This color filter substrate 2 has a black matrix and colored layers 16 consisting of plural colors in prescribed patterns on the substrate and has light shieldable projecting parts 14 within black matrix forming regions so as to correspond to the TFT elements 22 on a TFT array substrate 3. This color liquid crystal display device is produced by disposing the projecting parts 14 opposite to the TFT elements 22 on the TFT array substrate 3 when the color filter substrate 2 and the TFT array substrate 3 are stuck to each other, regulating the spacing between the color filter substrate 2 and the TFT array substrate 3 by the total of the height of the projecting parts 14 and the TFT elements 22 and hermetically sealing the liquid crystal layer 5 into this spacing part.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color liquid crystal display device and a method of manufacturing a color filter substrate, and more particularly to a color liquid crystal display device having excellent display quality and a method of manufacturing a color filter substrate used therein.

[0002]

2. Description of the Related Art In recent years, a color liquid crystal display device has been attracting attention as a flat display. Generally, a color liquid crystal display device includes a color filter substrate including a black matrix and a colored layer of a plurality of colors (usually, three primary colors of red (R), green (G), and blue (B)), and a thin film transistor (TFT). A TFT array substrate provided with elements is faced to each other and bonded with a predetermined gap, and a liquid crystal material is injected into this gap. Therefore, the gap portion is the thickness of the liquid crystal layer itself, and is an important factor that affects the display quality of the color liquid crystal display device. If the thickness of the liquid crystal layer in the color liquid crystal display device is uneven,
Since unevenness in brightness and unevenness in color occur in the color liquid crystal display device and display quality is significantly impaired, it is desirable that the thickness of the liquid crystal layer be as uniform as possible.

Currently, as a method of determining the thickness of a liquid crystal layer in a color liquid crystal display device, a color filter substrate and a T
Glass beads and plastic beads (Micropearl: trade name) are used as spacers when they are attached to the FT array substrate. That is, before the color filter substrate and the TFT array substrate are bonded together, glass beads or plastic beads having a predetermined diameter and a uniform particle size are scattered as spacers on one substrate, and then the two substrates are bonded together. The size of the gap between the substrates, that is, the thickness of the liquid crystal layer is determined by the diameter of the glass beads or the plastic beads.

[0004]

However, the method of forming the gap between the color filter substrate and the TFT array substrate as described above causes the following problems in the operation of the color liquid crystal display device.

First, when glass beads or plastic beads are used as spacers, if the density dispersed on the substrate surface is appropriate and the beads are not evenly dispersed on the substrate surface, the entire surface of the color liquid crystal display device is covered. A gap having a uniform size is not formed. Generally, when the scattered amount (density) of the spacers is increased, the variation deviation of the thickness of the gap portion is reduced, but when the scattered amount (density) is increased, the number of spacers existing on the display pixel portion is also increased.
The area of the display region is reduced. That is, the portion where the spacer is present becomes ineffective as the display area, and the aperture ratio is lowered.

Further, the glass beads and the plastic beads are likely to be aggregated and have a poor degree of dispersion when dispersed, so that they are unevenly distributed, and the unevenly distributed portions located in the pixel region also hinder the alignment of liquid crystal molecules. Further, since glass beads and plastic beads existing in the pixel region transmit light when black display is performed, there is also a problem that these spacers serve as bright spots to significantly reduce the contrast ratio.

In order to solve such a problem, there has been proposed a method in which a convex portion for determining the gap (thickness of the liquid crystal layer) is formed in advance on one side of both substrates sandwiching the liquid crystal layer (Japanese Patent Laid-Open No. HEI-1). -94320, JP-A-2-66519, etc.). According to this method, an insulating layer of about 7 μm is formed on the non-display area of two stripe-shaped substrates intersecting at right angles, or on the source electrode when one of the substrates is a TFT array substrate having a TFT. It is formed by an electrodeposition method, and the two substrates are bonded together by using this insulator layer as a spacer.

However, in the method of forming an insulating layer as such a spacer, a polyimide layer, which has become the mainstream of the recent alignment technology of liquid crystal layers, is formed by a flexographic printing method or the like and then baked at a high temperature. There is a problem that it is difficult to use a method of performing rubbing treatment later. That is, when the insulator layers (spacers) having a height of 7 μm are regularly arranged in a bank shape or a dot shape, it is found that the above rubbing treatment is difficult in the direction of the shadow of the height of the insulator layer. ing.

The present invention has been made in view of the above circumstances, and a color liquid crystal display device having a uniform liquid crystal layer thickness and capable of aligning liquid crystals by rubbing and having excellent display quality. An object of the present invention is to provide a method for manufacturing a color filter substrate used in this color liquid crystal display device.

[0010]

In order to achieve such an object, a color liquid crystal display device of the present invention comprises a black matrix formed in a predetermined pattern on a substrate and a colored layer composed of a plurality of colors. In a color liquid crystal display device in which a color filter substrate and a TFT array substrate having a plurality of TFT elements on the substrate are bonded to each other and a liquid crystal layer is provided in a gap between the two substrates, the color filter substrate is in the black matrix forming region. Has a light-shielding convex portion, and the convex portion has the TF on the TFT array substrate.
The color filter substrate and the TFT array substrate were laminated so as to face the T element.

The color filter substrate of the present invention comprises a substrate,
A black matrix formed in a predetermined pattern on the substrate and a colored layer composed of a plurality of colors are provided, and a light-shielding convex portion is provided in the black matrix forming region.

The first invention of the method for manufacturing a color filter substrate is a step of forming a conductive layer on at least a predetermined region of the substrate and forming a photosensitive coating film on the conductive layer forming surface side of the substrate. 1 and step 2 of exposing and developing the photosensitive coating film in a predetermined pattern to form light-shielding convex portions and a black matrix on the exposed conductive layer by electrodeposition
And again forming a photosensitive coating film on the substrate, exposing the photosensitive coating film in a predetermined pattern and developing, and forming a colored layer of a plurality of colors on the exposed conductive layer by electrodeposition. It was configured so as to include Step 3.

A second invention of the method for manufacturing a color filter substrate is a step 1 in which a conductive layer is formed on at least a predetermined region of the substrate, and a photosensitive coating film is formed on the surface of the substrate on which the conductive layer is formed. A step 2 of exposing the photosensitive coating film in a predetermined pattern and developing it to form a colored layer of a plurality of colors on the exposed conductive layer by electrodeposition, and again forming the photosensitive coating film on the substrate. Step 3 of forming and exposing the photosensitive coating film in a predetermined pattern to develop, and forming a light-shielding convex portion and a black matrix on the exposed conductive layer by electrodeposition.
And is configured to have.

Further, a third invention of the method for manufacturing a color filter substrate is a step of forming a conductive layer on at least a predetermined region of the substrate and forming a photosensitive coating film on the conductive layer forming surface side of the substrate. 1 and the step of exposing the photosensitive coating film in a predetermined pattern and developing it, and forming a colored layer consisting of a light-shielding convex portion, a black matrix and a plurality of colors on the exposed conductive layer by electrodeposition And is configured to have.

[0015]

The color filter substrate constituting the color liquid crystal display device is provided with the light-shielding convex portion in the black matrix forming region corresponding to the TFT element on the TFT array substrate, and the color filter substrate and the TFT array substrate are provided. When bonded, the convex portion faces the TFT element on the TFT array substrate, and the total of the height of the convex portion and the height of the TFT element regulates the gap between the color filter substrate and the TFT array substrate. Accuracy of the liquid crystal layer is high, and the height of the convex portion formed on the color filter substrate is the thickness of the liquid crystal layer required for the color liquid crystal display device (gap between the two substrates).
It is smaller than the size and does not hinder the rubbing process.

[0016]

Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 is a partial sectional view showing an embodiment of the color liquid crystal display device of the present invention. In FIG. 1, a color liquid crystal display device 1 of the present invention comprises a color filter substrate 2 and a TF.
The T array substrate 3 is attached, and the peripheral portion is provided with the seal member 4.
And a liquid crystal layer 5 having a thickness of about 5.0 to 7.0 μm is formed between both substrates. Polarizing plates 6 are provided outside the color filter substrate 2 and the TFT array substrate 3, respectively.

In the color filter substrate 2 constituting the color liquid crystal display device 1 of the present invention, the black matrix 15 and the coloring layer 16 are formed in a predetermined pattern on the transparent substrate 11 with the transparent conductive film 12 interposed therebetween. The convex portion 14 is provided in the formation region of the matrix 15. This convex portion 14 is a TFT on the TFT array substrate 3 described later.
It is arranged so as to correspond to the element. Furthermore, these convex portions 14, the black matrix 15 and the colored layer 1
A transparent electrode 17 for driving a liquid crystal and an alignment layer 18 are formed on the substrate 6.

The height of the convex portion 14, that is, the height protruding from the black matrix 15 and the coloring layer 16 as shown by H ₁ in FIG. 1 is 2.0 to 6.0 μm.
m, preferably about 3.0 to 5.0 μm, and the height H ₁ of the convex portion 14 can be appropriately set depending on the height of the TFT element described later and the thickness required for the liquid crystal layer 5. it can. Further, the formation density of the convex portions 14 can be appropriately set in consideration of the thickness unevenness of the liquid crystal layer, the aperture ratio, and the like.
For example, a necessary and sufficient spacer function is exhibited at about 30 / mm ² .

The colored layer 16 is a red pattern 16R,
The green pattern 16G and the blue pattern 16B are arranged in a desired form such as a mosaic type, a stripe type, a triangle type, and a four-pixel arrangement type, and the black matrix 15 is provided between the colored patterns and outside the region where the colored layer 16 is formed. It is provided.

On the other hand, the TFT array substrate 3 constituting the color liquid crystal display device 1 of the present invention comprises a plurality of thin film transistor (TFT) elements 22 and pixel electrodes 29 on a transparent substrate 21. Each TFT element 22 has a gate electrode 23 formed in a predetermined pattern on the transparent substrate 21, an insulating layer 24 formed on the transparent substrate 21 so as to cover the gate electrode 23, and a predetermined pattern on the insulating layer 24. And an amorphous silicon layer 26 provided so as to cover the gate electrode 23 with the insulating layer 24 interposed therebetween, a source electrode 27 and a drain electrode 28. The pixel electrode 29 is formed on the insulating layer 24. Formed on the TFT element 2
2 is connected to the drain electrode. A protective layer 30 made of SiN _x or the like is provided on the TFT element 22, and an alignment layer 31 is formed so as to cover the protective layer 30 and the pixel electrode 29. The height difference between the TFT element 22 and the orientation layer 31 on the TFT element 22 (protective layer 30) and the pixel electrode 29 as shown by H ₂ in FIG. , Usually 1.0 to 2.0 μm
It is a degree.

The color liquid crystal display device 1 of the present invention includes the convex portion 14 of the color filter substrate 2 and the TFT array substrate 3 described above.
The TFT element 22 is attached so as to face each other, and the convex portion 14 and the TFT element 22 are normally in contact with each other. The gap between the color filter substrate 2 and the TFT array substrate 3 (thickness of the liquid crystal layer 5) is determined by the height of the convex portion 14 and the height of the TFT element 22. That is, as in the illustrated example, the height H ₁ of the convex portion 14 and the TFT element 22
The sum of the heights H ₂ (H ₁ + H ₂ ) is the gap between the two substrates.
For this reason, the gap precision between the two substrates is extremely high as compared with the conventional case where glass beads or plastic beads are used as spacers. Further, since the convex portion 14 does not exist in the pixel portion, the aperture ratio does not decrease due to the reduction in the area of the display region, and the convex portion 14 has a light shielding property, so that the contrast ratio does not decrease. Further, at least one kind of organic compounds of polyimide type, polyamide type, polyurethane type and polyurea type is applied by a known application method such as a printing method, baked and then subjected to an alignment treatment (rubbing) to form an alignment layer. When forming 18, the convex portion 14
The height of the liquid crystal layer 5 required for the color liquid crystal display device 1 is
Thickness (gap between both substrates) less than 2.0-6.0μ
Since it is about m, it does not hinder the rubbing process.

The gap between the color filter substrate 2 and the TFT array substrate 3 is basically determined by the height H ₁ of the convex portion 14 and the height H ₂ of the TFT element 22. As a result, the heights of the individual convex portions 14 and the TFT elements 22 are different from each other, and there is no problem even if a very small amount of liquid crystal exists between the convex portions 14 and the TFT elements 22 facing each other. That is, in the present invention, the facing of the convex portion 14 and the TFT element 22 means the case where the convex portion 14 and the TFT element 22 are in contact with each other and the case where there is a very small amount of liquid crystal between them as described above.

The transparent substrate 1 which constitutes the color filter substrate 2 and the TFT array substrate 3 of the color liquid crystal display device 1 described above.
1, 21 are quartz glass, Pyrex glass,
A rigid material having no flexibility such as a synthetic quartz plate, or a flexible material having flexibility such as a transparent resin film and an optical resin plate can be used. Among them, Corning 7059 glass is a material having a small coefficient of thermal expansion and is excellent in dimensional stability and workability in high temperature heat treatment,
In addition, since it is an alkali-free glass that does not contain an alkali component in the glass, L
Suitable for color liquid crystal display device for CD.

The transparent conductive film 12, the transparent electrode 17, and the pixel electrode 29 which compose the color liquid crystal display device 1 are made of indium tin oxide (ITO), zinc oxide (ZnO), tin oxide (SnO), or the alloy thereof. It can be formed by a general film forming method such as a sputtering method, a vacuum vapor deposition method, or a CVD method. Such a transparent conductive film 1
2, the thickness of the transparent electrode 17 and the pixel electrode 29 is 0.01 to 1
μm, preferably about 0.03 to 0.5 μm.

In the color liquid crystal display device shown in FIG. 1, the transparent conductive film 12 is formed over the entire area of the transparent substrate 11, and the end portion of the transparent conductive film 12 is provided on the outer periphery of the color liquid crystal display device 1. 12a is exposed. In the color liquid crystal display device of the present invention, the transparent conductive film 12 located in the end portion 12a of the transparent conductive film and the black matrix forming region is formed.
And may be electrically insulated. As a result, even if the color liquid crystal display device 1 is in a high-temperature and high-humidity atmosphere or an atmosphere that causes dew condensation and an electrical detour is formed between the end portion 12a of the transparent conductive film and the connection line, the transparent portion is transparent. End 12a of conductive film and black matrix 1
5 and the region of the transparent conductive film on which the colored layer 16 is formed are electrically isolated from each other, so that the lead wire and the connecting wire of the TFT array substrate 3 are prevented from being electrolyzed and broken. It will be extremely effective. As a method of performing insulation as described above, a method of removing a predetermined portion of the transparent conductive film 12 existing outside the black matrix forming region by etching before forming a colored layer or a black matrix to form a cutout portion, Alternatively, there is a method of forming a notch by performing laser processing on a predetermined portion of the transparent conductive film 12 existing outside the black matrix forming region after forming the colored layer and the black matrix.

Further, the alignment layers 18 and 31 constituting the color liquid crystal display device 1 are layers containing at least one of the polyimide-based, polyamide-based, polyurethane-based and polyurea-based organic compounds as described above. The thickness can be 0.01 to 1 μm, and preferably about 0.03 to 0.5 μm. Such alignment layers 18, 31
Is coated by a known coating method such as various printing methods, and then baked and then subjected to orientation treatment (rubbing).

In the above-described embodiment, the TFT is used as the driving system.
Although the active matrix system is used, the color liquid crystal display device of the present invention is not limited to this.
For example, methods such as simple matrix and segment, MI
Needless to say, an active matrix method using a two-terminal element such as M (metal / insulator / metal) may be used.

Next, a method of manufacturing the color filter substrate of the present invention will be described with reference to FIGS.

FIG. 2 is a plan view showing a part of an example of a color filter substrate manufactured by the method for manufacturing a color filter substrate of the present invention. This color filter substrate is used in the color liquid crystal display device of the present invention described above. It is possible.
In FIG. 2, the color filter substrate 41 includes a black matrix 43 (a hatched area in FIG. 2) and a coloring layer 44 on a transparent substrate, and the coloring layer 44 has a red pattern 44R with an aspect ratio of 3: 1. The green pattern 44G and the blue pattern 44B are arranged in a stripe pattern. The notch 45 is formed at one corner of each colored layer 44 (the upper left corner of each colored layer in the illustrated example).
The cutout portion 45 is provided with a light-shielding convex portion 46. As described above regarding the color liquid crystal display device of the present invention, the convex portion 46 is provided at a position corresponding to the TFT element on the TFT array substrate which constitutes the color liquid crystal display device.

An example of the method of manufacturing the color filter substrate of the present invention will be described with reference to FIGS. 3 and 4 by taking the manufacturing of the color filter substrate 41 as an example. FIG. 3 and FIG. 4 correspond to FIG. 2 in each step of the manufacturing method.
FIG. 6 is a diagram sequentially showing the states of the section taken along line XX in FIG.

First, in step 1, a transparent conductive film 47 as a conductive layer is formed on the entire surface of a transparent substrate 42 having multiple surfaces by a transparent conductive material such as indium tin oxide (ITO). Then, a photosensitive resist is applied to form a photosensitive coating film 48 (FIG. 3A). The transparent conductive film 47 can be formed by an electron beam evaporation method, a sputtering method, or the like, and the thickness of the transparent conductive film 47 is in the range of 400 to 3000 Å, for example, about 1500 Å (electrical resistance of about 20 Ω / □). Can be set to Further, the photosensitive resist used for forming the photosensitive coating film 48 is not particularly limited, but when performing gradation exposure as described later, a positive resist having gradation characteristics (for example, Nippon Petrochemical ( Co., Ltd. N-4) can be used.

Next, as step 2, the convex portion 4 in FIG.
The area where 6 is formed is 100% transmittance, the area where the black matrix 43 is formed is 20% transmittance, and the area where the colored layer 44 is formed is 0% transmittance.
To expose. Then, by developing under a weak developing condition such that an exposed portion with 100% transmittance can be developed, an opening 48 'corresponding to the notch 45 is formed in the photosensitive coating 48 (FIG. 3 (B)). ).

Next, the substrate 42 is dipped in an electrodeposition liquid prepared by mixing red pigment, green pigment and blue pigment so as to give a black color, and an electric current is passed through the transparent conductive film 47 to make the polymer resin and the red color red. A black electrodeposition film (projection) 46 is formed by depositing a pigment, a green pigment and a blue pigment (FIG. 3).
(C)). In the formation of the black electrodeposition film (convex portion) 46, carbon black usually used for forming a black matrix is used unless the density becomes too high and conductivity is exhibited and the TFT element is not affected. May be used. The thickness of the black electrodeposition film (convex portion) 46 can be appropriately set based on the height of the TFT element of the TFT array substrate and the thickness (height) required for the liquid crystal layer of the color liquid crystal display device as described above. Can be set to, for example, 6 μm. The control of the thickness of the black electrodeposition film (convex portion) 46 by the electrodeposition method is performed by previously determining the setting conditions of voltage, current and time by condition setting. When the electrodeposition film is formed, the resistance component of the electrodeposition film increases and a self-uniformizing function of restricting the electrodeposition film is developed. Therefore, the black electrodeposition film (the convex portion) on the transparent substrate 42 is formed. ) 46 has an extremely uniform thickness (height) distribution.

The black electrodeposition film (convex portion) 46 formed as described above preferably has an optical density in the range of 2.5 to 5.0, for example, an optical density of about 4.5. The black electrodeposition film (convex portion) 46 can completely block light and also fulfills the function as a black matrix. The area of the black electrodeposition film (convex portion) 46 (area of the cutout portion 45) can be set to about 4 to 16 times the area of the corresponding TFT element on the TFT array substrate.

Next, the transparent substrate 42 on which the black electrodeposition film (convex portion) 46 is formed is washed with water (pure water), centrifugally dehydrated, and then 10
After heat treatment at 0 to 120 ° C. (temporary curing treatment of the black electrodeposition film (convex portion) 46), development is carried out under strengthened development conditions capable of developing an exposed portion having 20% transmittance, Opening 4 corresponding to the black matrix formation area
8 ″ is formed (FIG. 3D). Then, the transparent substrate 42 is formed.
Is immersed in an electrodeposition liquid for a black matrix and an electric current is passed through the transparent conductive film 47 to deposit a polymer resin and carbon black fine particles in the openings 48 ″ to form a black matrix 43 (FIG. 3 (E)). As described above, the black matrix 43 is formed of the polymer resin and the carbon black fine particles because the black electrodeposition film (the convex portion) is formed.
This is because it is possible to achieve an optical density of 2.5 or more required for the black matrix with a film thickness smaller than 46. When the black matrix 43 is formed as a black matrix having an optical density of 3.0 and a thickness of 2 μm, the height of the black electrodeposition film (convex portion) 46 (height H ₁ in FIG. ₁ ) is 4.0 μm. Becomes

Next, the transparent substrate 42 is washed with water (pure water), centrifugally dehydrated, and then heat-treated at 100 to 120 ° C. (temporary curing treatment of the black matrix 43), and then the transparent substrate 42.
After the entire surface of is exposed, the photosensitive coating film 48 is removed by a peeling liquid. Furthermore, after washing with water (pure water) and centrifugal dehydration, heat treatment is performed at a predetermined temperature (130 to 180 ° C.) to complete the step 2 of forming the convex portions 46 and the black matrix 43 on the transparent substrate 42.

Next, in step 3, a photosensitive resist is applied on the transparent substrate 42 on which the convex portions 46 and the black matrix 43 are formed to form a photosensitive coating film 49 (FIG. 4 (A)). . The photosensitive resist used for forming the photosensitive coating film 49 is not particularly limited, but in the case of performing gradation exposure described later, a positive resist having gradation characteristics (for example, manufactured by Nippon Petrochemical Co., Ltd.) is used. N-4) can be used.

Next, in FIG. 2, the formation area of the blue coloring layer 44B is 100% transmittance, the formation area of the green coloring layer 44G is 20% transmittance, and the formation area of the red coloring layer 44R is 5%.
The photosensitive coating film 49 is exposed using a gradation mask having a transmittance of 0% for the rest of the light.

Next, after development is performed under such a weak developing condition that an exposed portion having 100% transmittance (formation region of the blue coloring layer 44B) can be developed, the substrate 42 is dipped in an electrodeposition solution for the blue coloring layer. Then, an electric current is passed through the transparent conductive film 47 to deposit the polymer resin and the blue pigment to form the blue colored layer 44B (FIG. 4B).

Next, the transparent substrate 42 is washed with water (pure water), centrifugally dehydrated, and then heat-treated at 100 to 120 ° C. (temporary curing treatment of the blue coloring layer 44B), and then the exposed portion having 20% transmittance is developed. By performing the development under such a development condition, the transparent conductive film 47 in the portion corresponding to the formation region of the green colored layer 44G is exposed. After that, the substrate 42 is dipped in an electrodeposition liquid for the green colored layer, and an electric current is passed through the transparent conductive film 47 to precipitate the polymer resin and the green pigment to deposit the green colored layer 4
4G is formed (FIG. 4C).

Further, the transparent substrate 42 is washed with water (pure water), centrifugally dehydrated, and then heat treated at 100 to 120 ° C. (temporary curing treatment of the green coloring layer 44G), and then the exposed portion having 5% transmittance is developed. The transparent conductive film 47 is exposed at a location corresponding to the formation region of the red coloring layer 44R by performing development under a further enhanced predetermined development condition. After that, the substrate 42 is immersed in the electrodeposition liquid for the red colored layer and an electric current is passed through the transparent conductive film 47 to deposit the polymer resin and the red pigment to form the red colored layer 44R (FIG. 4).
(D)).

Next, the transparent substrate 42 is washed with water (pure water), centrifugally dehydrated, and then heat-treated at 100 to 120 ° C. (red coloring layer 4
After the 4R temporary curing treatment), the entire surface of the transparent substrate 42 is exposed, and then the photosensitive coating film 49 is removed by a peeling liquid. Further, after washing with water (pure water) and centrifugal dehydration, heat treatment is performed at a predetermined temperature (130 to 230 ° C.) to obtain the transparent substrate 4
Step 3 of forming the colored layer 44 on the second layer 2 is completed (FIG.
(E)).

The transparent substrate 4 is formed by the above steps 1 to 3.
The color filter substrate 41 on which the black matrix 43, the colored layer 44 and the convex portions 46 are formed on the transparent substrate 42 is then formed on the entire surface of the transparent substrate 42 or in a predetermined area to drive the liquid crystal layer (the transparent electrode of FIG. 1). (Corresponding to No. 17), and further, the alignment layer is formed and the alignment treatment by rubbing is performed as described above, and then the resultant is incorporated into a color liquid crystal display device.

The manufacturing method of the color filter substrate of the present invention is not limited to the above-mentioned embodiment. For example, the colored layer may be first formed on the transparent substrate, and then the black matrix and the convex portions may be formed. That is, Step 1 of forming the transparent conductive film and the photosensitive coating film on the transparent substrate 42 is common to the above-described method for manufacturing a color filter substrate, but in Step 2, the photosensitive coating film formed in Step 1 is formed. The colored layer is formed by using the same method as in step 3 of the method for manufacturing a color filter substrate described above. Then, in step 3, a photosensitive coating film is formed on the transparent substrate on which the colored layer is formed, and the photosensitive coating film is used to form a convex in the same manner as in step 2 of the method for manufacturing a color filter substrate described above. And a black matrix.

Further, in the above-mentioned color filter substrate manufacturing method, gradation exposure is performed, and development and electrodeposition are performed in descending order of exposure amount. However, the color filter substrate manufacturing method of the present invention is It is not limited to this. That is, the gradation exposure may not be performed, and the exposure, the development and the electrodeposition may be repeatedly performed for each of the convex portion, the black matrix and the colored pattern of each color. Further, in the above-described method for manufacturing a color filter substrate, after forming the convex portion and the black matrix, the photosensitive coating film is peeled off, the photosensitive coating film is formed again, and then the colored layer is formed. Alternatively, all of the convex portions, the black matrix and the colored layer may be formed using the photosensitive coating film once formed.

The electrodeposition material used in the method for producing a color filter substrate of the present invention is generally made of an organic material (polymer material), and its original form is well known as an electrodeposition coating method. In electrodeposition coating, there are cation electrodeposition and anion electrodeposition due to electrochemical reaction with the main electrode. this is,
It is classified depending on whether the electrodeposition material exists as a cation or behaves as an anion. Examples of the polymer resin used for electrodeposition include various organic polymer resins such as natural fats / oils, synthetic fats / oils, alkyd resins, polyester resins, acrylic resins, and epoxy resins.

In the anionic type, maleated oil and polybutadiene resin have been known for a long time, and the curing of the electrodeposition material is based on the oxidative polymerization reaction. The cation type is mostly an epoxy resin and can be used alone or modified. Other,
So-called polyamino resins such as melamine resins and acrylic resins are often used, and a strong colored layer can be formed by thermosetting, photocuring or the like.

In electrodeposition in the production of a color filter substrate, the finely pulverized pigment or dye is dispersed in an anion or cation type electrodeposition bath and co-deposited with the ionic polymer resin on the conductive part.

[0050]

As described above in detail, according to the present invention, when the color filter substrate and the TFT array substrate are bonded together, the light-shielding convex portion provided in the black matrix forming region of the color filter substrate is formed. Since the gap between the color filter substrate and the TFT array substrate is regulated by the total of the height of the convex portion and the height of the TFT element facing the TFT element on the TFT array substrate, the precision of the gap between the two substrates becomes high, In addition, the height of the convex portion formed on the color filter substrate may be smaller than the thickness of the liquid crystal layer (gap between the two substrates) required for the color liquid crystal display device. It is easy to process and
With a uniform thickness liquid crystal layer, a color liquid crystal display device with high contrast ratio and high brightness without unevenness in brightness or color can be obtained. Also, the process is simplified by manufacturing the color filter substrate by electrodeposition. It is possible to reduce the manufacturing cost.

[Brief description of drawings]

FIG. 1 is a partial cross-sectional view near an end showing an embodiment of a color liquid crystal display device of the present invention.

FIG. 2 is a plan view showing a part of an example of a color filter substrate manufactured by the method for manufacturing a color filter substrate of the present invention.

3A and 3B are views for explaining one embodiment of the method for manufacturing the color filter substrate of the present invention, which is a view sequentially showing the state of the cross section along the line XX in FIG. 2 in each step of the manufacturing method.

FIG. 4 is a diagram for explaining one embodiment of the method of manufacturing the color filter substrate of the present invention, which is a diagram sequentially showing the state of the XX line cross section of FIG. 2 in each step of the manufacturing method.

[Explanation of reference numerals] 1 ... Color liquid crystal display device 2, 41 ... Color filter substrate 3 ... TFT array substrate 4 ... Seal member 5 ... Liquid crystal layer 6 ... Polarizing plate 11, 21, 42 ... Transparent substrate 12, 47 ... Transparent conductive film 14, 46 ... Convex portion 15, 43 ... Black matrix 16 (16R, 16G, 16B), 44 (44R, 44)
G, 44B) ... Colored layer 17 ... Transparent electrode 18, 31 ... Alignment layer 22 ... TFT element

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hiroyoshi Omiga 3-20-17 Shinohara Higashi, Kohoku Ward, Yokohama City, Kanagawa Prefecture

Claims (15)

[Claims] 1. A color filter substrate having a black matrix formed in a predetermined pattern on a substrate and a colored layer having a plurality of colors, and a TFT array substrate having a plurality of TFT elements on the substrate are bonded to each other, and In a color liquid crystal display device having a liquid crystal layer in a gap between both substrates, the color filter substrate has a light-shielding convex portion in the black matrix forming region, and the convex portion is the TFT element on the TFT array substrate. A color liquid crystal display device, characterized in that the color filter substrate and the TFT array substrate are bonded so as to face each other. 2. The color liquid crystal display device according to claim 1, wherein the convex portion is in contact with the TFT element. 3. The height of the protrusion protruding from the colored layer is set to fall within a range of 2.0 to 6.0 μm. The described color liquid crystal display device. 4. The convex portion is a red pigment in a polymer resin,
The color liquid crystal display device according to any one of claims 1 to 3, wherein a green pigment and a blue pigment are dispersed and contained. 5. A substrate, a black matrix formed in a predetermined pattern on the substrate, and a colored layer composed of a plurality of colors, and a light-shielding convex portion in the black matrix forming region. Color filter substrate. 6. The convex portion is 2.0 to 6.
6. The protrusion is in the range of 0 μm.
The color filter substrate described in. 7. A step 1 of forming a conductive layer on at least a predetermined region of a substrate and forming a photosensitive coating on the side of the substrate on which the conductive layer is formed, and exposing the photosensitive coating with a predetermined pattern. And develop to form a light-shielding convex portion and a black matrix on the exposed conductive layer by electrodeposition, and a photosensitive coating film is formed again on the substrate, and the photosensitive coating film is formed. Is exposed to light in a predetermined pattern and developed, and a colored layer having a plurality of colors is formed on the exposed conductive layer by electrodeposition, and a method of manufacturing a color filter substrate. 8. The color filter substrate according to claim 7, wherein in the step 2, the polymer resin and a red pigment, a green pigment and a blue pigment are deposited by electrodeposition to form the protrusions. Manufacturing method. 9. The method for manufacturing a color filter substrate according to claim 7, wherein the exposure in step 2 is gradation exposure in which the exposure amount is different in at least three stages. 10. A step 1 of forming a conductive layer on at least a predetermined region of a substrate and forming a photosensitive coating film on the conductive layer forming surface side of the substrate, and exposing the photosensitive coating film in a predetermined pattern. And developing, and forming a colored layer consisting of a plurality of colors on the exposed conductive layer by electrodeposition, forming a photosensitive coating film again on the substrate, the photosensitive coating film in a predetermined pattern And step 3 of forming a light-shielding convex portion and a black matrix on the exposed conductive layer by electro-deposition, and manufacturing the color filter substrate. 11. The color filter substrate according to claim 10, wherein in the step 3, a polymer resin and a red pigment, a green pigment and a blue pigment are deposited by electrodeposition to form the protrusions. Manufacturing method. 12. The method for manufacturing a color filter substrate according to claim 10, wherein the exposure in the step 3 is gradation exposure in which the exposure amount is different in at least three stages. 13. A step 1 of forming a conductive layer on at least a predetermined region of a substrate and forming a photosensitive coating on the side of the substrate on which the conductive layer is formed, and exposing the photosensitive coating with a predetermined pattern. And developing to form a light-shielding convex portion, a black matrix, and a colored layer composed of a plurality of colors on the exposed conductive layer by electrodeposition, 2. Production method. 14. The color filter substrate according to claim 13, wherein in step 2, a polymer resin and a red pigment, a green pigment, and a blue pigment are deposited by electrodeposition to form the protrusions. Manufacturing method. 15. The method of manufacturing a color filter substrate according to claim 13, wherein the exposure in step 2 is gradation exposure in which the exposure amount is different in at least three stages.