JPH08223355A - Original reader, method and device for adjusting position of image forming lens - Google Patents

Abstract

PURPOSE: To provide an original reader capable of enhancing the image forming performance of valid luminous flux made incident onto an image forming lens and obtaining higher image quality by adjusting the position of the image forming lens before and after its mount with a simpler method and high accuracy and to provide the method and device for adjusting position of the image forming lens. CONSTITUTION: A luminous flux from a waving light illuminating means 12a emitted along an adjustment vertical field angle line Ja of a valid luminous flux of an image forming lens 8 in a tangential face T is led to very small apertures 14a0 , 14a, 162 , 163 of at least two luminous flux regulating members 13, 16 to generate diffraction patterns and the shapes of the diffraction patterns are simply made coincident. Thus, the position of an image forming lens 8 is adjusted far simply with high accuracy, and field angle lines Ha, Hb of the lens 8 in the tangential face T are made coincident with adjustment virtual field angle lines Ja, Jb, that is, field angle lines of the luminous flux emitted from the lighting means to enhance the image forming performance furthermore.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a document reading device, a method for adjusting the position of an imaging lens, and the device therefor.

[0002]

2. Description of the Related Art As a conventional document reading device, a transmissive document reading device using a CCD line sensor will be described as an example. FIG. 11 shows an example of the configuration of the reading optical system of the document reading device. A light source 2 as an illuminating unit is provided in the upper part of the main body 1 of the reading optical system, and light emitted from the light source 2 is reflected downward by a cold mirror 3 to illuminate a document 4. This manuscript 4
Is sandwiched between the contact glass 5 and the pressing glass 6 without any gap. Then, the light flux A transmitted through the original 4 is
The light is reflected by the mirror 7 and is incident on the imaging lens 8, which is focused and focused on a CCD line sensor 9 (hereinafter, referred to as CCD) as a light receiving means to read an original image. The projection distance between the imaging lens 8 and the CCD 9 is L. The bottom of the device body 1 is
It is said to be base 10.

As an actual reading operation, the scanning in the sub-scanning direction Z at a speed corresponding to the reading resolution by the carriage 11 which is constructed by integrating the contact glass 5 and the pressing glass 6 and the main scanning by the CCD 9 are performed. Actual reading is performed by simultaneously performing two-dimensional reading scanning by scanning in the direction X (sensor array direction orthogonal to the sub-scanning direction Z). In this case, if all the assembled and adjusted optical members are arranged at the design position (ideal position), the optical axis B of the light flux A and the lens optical axis C of the imaging lens 8 are completely coincident, and the light flux Since A is incident on the image forming lens 8 vertically, high-quality image reading can be performed.

[0004]

In a digital document reading device using the CCD 9, as a means for improving image quality, the reading line on the surface of the document 4 and the reading line of the CCD 9 are adjusted to match each other. Is essential. Especially in recent years, in order to obtain high resolution, CCD
There is also an apparatus in which a plurality of reading pixels are arranged by arranging a plurality of 9 in the reading line direction (main scanning direction X). CCD9 like this
In a document reading device in which a plurality of documents are arranged, in order to match the reading line on the surface of the document 4 with the reading line of the CCD 9, not only the connection adjustment of the reading lines in the sub-scanning direction but also the main scanning direction X is performed. It is also necessary to adjust the connection of the reading line.

As a typical example of the publicly known examples relating to such connection adjustment of reading lines, Japanese Patent Publication No. 55-180.
There is a technique described in Japanese Patent Laid-Open No. 96-122171. In this case, in the example of Japanese Patent Publication No. Sho 55-18096, the relative position between each CCD and the imaging lens is
The read line connection adjustment is performed by finely adjusting in the main scanning direction and the sub scanning direction using a screw and a spring. Further, in the example of JP-A-59-122171,
The CCD and the imaging lens are made into a module, and the adjustment amount of the module is made equal to the deviation amount of the reading line on the document surface to adjust the connection of the reading lines.

In the conventional document reading apparatus as described above, a certain point on the document surface and the CCD within the range of lens performance.
If and are relatively misaligned with each other, the reading is performed even if they are obliquely incident on the imaging lens and deviated from the lens optical axis. However, it is ideal that the chief ray that connects a certain point on the document surface to the CCD is incident perpendicularly to the imaging lens and coincides with the lens optical axis, and if it deviates from the lens optical axis. , The variation of the aberration of each imaging lens becomes large,
The imaging performance is deteriorated. Such a reduction in image forming performance causes a reduction in image quality, which is a serious problem in the fields of printing and plate making that require high-quality image reading. Further, as in the above-mentioned known example, one CCD is attached to one imaging lens.
In the case of using a plurality of sets corresponding to, when the reading line on the original surface is divided and read, even if lenses having the same performance are used, the imaging performance varies depending on the position of each light flux passing through each lens, A difference in image quality occurs for each divided reading width.

In the case where a right-angle mirror is inserted between the image forming lens and the CCD and two CCDs are associated with one image forming lens so that the reading line on the original surface is divided into two and read ( According to Japanese Patent Laid-Open No. 57-87277), if the illuminance peak position of the light source on the document surface, the reading position, the lens optical axis, the vertex of the right-angled mirror, etc. are not all the same or substantially the same, the light is incident on each CCD. The light flux causes not only the imaging performance but also the absolute light amount, the light amount distribution, the reading width, and the like, which considerably deteriorates the image quality.

There is a patent application filed by the present applicant in Japanese Patent Application No. 6-272076 as "a method of adjusting the optical axis of a document reading device and an imaging lens". This is the virtual optical axis (design position) for adjusting the lens optical axis of the imaging lens of the device body.
To improve the quality of the read image.

[0009]

According to a first aspect of the present invention, an effective virtual light beam adjustment virtual image on the tangential plane of an optical system including an imaging lens and on either side of the entrance and exit of the imaging lens. An undulating light illuminating means for emitting undulating light is arranged on the angular line, and the effective light flux of the imaginary lens is adjusted in the tangential plane opposite to the undulating light illuminating means by sandwiching the imaging lens. A wave light illuminating device having a first light flux restricting member having a minute opening for restricting the wave light emitted from the wave light illuminating device and arranged on either side of the entrance and exit of the imaging lens. Is an adjustment of the effective luminous flux on the opposite side. At least one second luminous flux regulating member having a minute opening for regulating the undulating light is arranged on the virtual line of view angle and generated by the first and second luminous flux regulating members. Pattern table for receiving and displaying diffraction patterns Means provided, provided an imaging lens adjusting means for adjusting the position of the imaging lens to the incident light beam.

According to the second aspect of the present invention, the wave light is radiated on the virtual line of view for adjusting the effective luminous flux in the radial plane of the optical system including the imaging lens and on either side of the entrance and exit of the imaging lens. Emitting wave light illuminating means is arranged, and the wave light illuminating means is arranged in the radial plane opposite to the wave light illuminating means across the imaging lens and on the virtual angle of view adjustment of the effective light flux of the image forming lens. A first light flux regulating member having a minute opening for regulating the generated wave light is provided, and the effective light flux on the side opposite to the wave light illuminating means arranged on either side of the entrance and exit of the imaging lens is adjusted. At least one second light flux regulating member having a minute opening for regulating wave light is arranged on the virtual angle line, and the diffraction patterns generated by the first and second light flux regulating members are received and displayed. Providing pattern display means to prevent incident light flux It provided an imaging lens adjusting means for adjusting the position of the imaging lens.

According to the third aspect of the present invention, an effective virtual light beam adjustment virtual image in each of the tangential surface and the radial surface of the optical system including the imaging lens and on either side of the entrance and exit of the imaging lens. Wave light illuminating means for emitting wave light is arranged on the angular line, respectively, and the illuminating means is sandwiched between the tangential surface and the radial surface on the side opposite to the wave light illuminating means. Adjustment of effective luminous flux First luminous flux regulating members each having a minute opening for regulating the undulating light emitted from the undulating light illuminating means are arranged on the virtual angle line, and either one of the entrance and exit of the imaging lens is arranged. At least one second light flux restricting member having a minute opening for restricting the wave light is arranged on the virtual angle line of adjustment of the effective light beam on the side opposite to the wave light illuminating means arranged on the first side, and Diffraction pattern generated by the second light flux regulating member It provided a pattern display means for displaying by receiving over emissions, provided an imaging lens adjusting means for adjusting the position of the imaging lens to the incident light beam.

According to a fourth aspect of the present invention, in the first, second or third aspect of the present invention, there is provided a wave light illumination means for emitting wave light on the adjusted virtual optical axis on either side of the entrance and exit of the imaging lens. Adjustment of the imaging lens on the side opposite to the wave light illumination means across the imaging lens, and a light flux regulating member having a minute opening on the virtual optical axis for regulating the wave light emitted from the wave light illumination means. Was arranged.

According to the invention of claim 5, claims 1, 2,
In the invention described in 3 or 4, the light flux restricting member is disposed on the adjustment virtual field angle line of the effective light flux on the same side as the wave light illuminating means disposed on either side of the entrance and exit of the imaging lens.

According to the invention of claim 6, claims 1, 2,
In the invention described in claim 3, 4 or 5, at least one light flux regulating member is arranged at a position substantially equal to the image plane position of the imaging lens or the image plane distance thereof.

According to the invention described in claim 7, claims 1, 2,
In the invention described in 3, 4, 5 or 6, the line connecting the centers of the minute apertures formed by at least two light flux regulating members and the adjusted virtual angle of view line of the effective light flux of the imaging lens are matched or substantially matched. The positioning means for making it attached was attached to the main body of the apparatus.

According to the invention described in claim 8, claims 1, 2,
In the invention described in 3, 4, 5 or 6, a minute opening for restricting the light flux from the wave light illuminating means is formed in the apparatus main body at a position intersecting the adjusted virtual angle of view line of the effective light flux of the imaging lens.

According to the invention of claim 9, claims 1, 2 and
In the invention described in 3, 4, 5 or 6, at least one light flux restricting member is disposed on a position outside the main body of the apparatus on the virtual line of view for adjusting the effective light flux of the imaging lens.

According to the invention of claim 10, claim 1
In the invention described in 2, 3, 4, 5, 6, 7, 8 or 9, the adjustment virtual field angle line of the effective light flux of the imaging lens, and the optical axis of the light flux of the wave light illumination means passing through the minute opening portion. The wave light optical axis adjusting means for adjusting the optical axis of the light flux of the wave light illuminating means is provided so that the light beams match or substantially match.

According to the invention of claim 11, claim 1
In the invention described in 2, 3, 4, 5, 6, 7, 8 or 9, the adjusted virtual angle of view line of the effective light flux of the imaging lens and the central position of the minute aperture are matched or substantially matched. An opening center position adjusting means for adjusting the center position of the minute opening is provided.

According to the twelfth aspect of the invention, in the tangential plane of the optical system including the imaging lens, the effective virtual beam angle line for adjusting the effective light flux of the imaging lens and each minute amount of the first and second light flux regulating members are adjusted. A first position adjusting step of positioning the first and second light flux regulating members on the apparatus main body so that the centers of the openings coincide or substantially coincide with each other; A second position adjusting step of adjusting and positioning the position of the wave light illuminating means by using a diffraction pattern so that the optical axis of the illuminating means is substantially or substantially the same, and the imaging lens is placed on the adjustment virtual angle of view line. A third position adjusting step in which the diffraction pattern before the interposition of the imaging lens and the diffraction pattern after the interposition are compared, and the imaging lens is positioned so that both diffraction patterns match or substantially match each other. Imaging with and And to adjust the position of the lens.

In the thirteenth aspect of the present invention, the virtual line of view for adjusting the effective light flux of the imaging lens and the minute apertures of the first and second light flux regulating members are set within the radial plane of the optical system including the imaging lens. A first position adjusting step of positioning the first and second light flux regulating members on the apparatus main body so that the centers of the portions coincide or substantially coincide with each other, and a wave light illumination that emits wave light with the center of each minute opening. A second position adjusting step of adjusting and positioning the position of the wave light illuminating means using a diffraction pattern so that the optical axis of the means coincides with or substantially coincides with the means, and the imaging lens is arranged on the adjustment virtual angle-of-view line. A third position adjusting step of comparing the diffraction pattern before the interposition of this imaging lens with the diffraction pattern after the interposition, and positioning the imaging lens so that both diffraction patterns match or substantially match; Imaging lens using And to adjust the position.

In the fourteenth aspect of the present invention, the effective virtual beam line of the effective light flux of the imaging lens and the first and second light flux regulating members are adjusted within the tangential surface and the radial surface of the optical system including the imaging lens. The first position adjusting step of positioning the first and second light flux restricting members on the apparatus main body so that the centers of the respective minute openings coincide with each other, and the center of each minute opening and the wave light are adjusted. A second position adjusting step of adjusting and positioning the position of the wave light illuminating means by using a diffraction pattern so that the optical axis of the wave light illuminating means to be emitted coincides with or substantially coincides with the image forming lens. The diffraction pattern before the interposition of this imaging lens placed on the line and the diffraction pattern after the interposition are compared, and the imaging lens is positioned so that both diffraction patterns match or substantially match. Position adjustment process And to adjust the position of the imaging lens used.

According to the fifteenth aspect of the present invention, it is arranged in the tangential surface of the optical system including the imaging lens and on the virtual line of view for adjusting the effective light flux on either side of the entrance and exit of the imaging lens. The undulating light illuminating means for emitting the undulating wave light and the imaginary lens are arranged in a tandem surface opposite to the undulating light illuminating means and on the virtual angle of view line for adjusting the effective light flux of the imaging lens. Of the first light flux regulating member having a minute opening for regulating the wave light emitted from the wave light illumination means and the wave light illumination means arranged on either side of the entrance and exit of the imaging lens. Adjustment of effective luminous flux A second luminous flux regulating member having at least one fine aperture for regulating wave light disposed on the virtual angle of view line, and a diffraction pattern generated by the first and second luminous flux regulating members are provided. Pattern display to receive and display light And stage constituted the imaging lens position adjustment apparatus by an imaging lens adjusting means for adjusting the position of the imaging lens to the incident light beam.

According to the sixteenth aspect of the present invention, it is arranged in the radial plane of the optical system including the imaging lens and on the virtual line of view for adjusting the effective light flux on either side of the entrance and exit of the imaging lens. And a wave disposed in a radial plane on the opposite side of the wave light illumination means which emits wave light and the image formation lens and on the virtual angle line of the effective light flux of the image formation lens. A first light flux regulating member having a minute opening for regulating the wave light emitted from the light illuminating means, and an effective light flux opposite to the wave light illuminating means arranged on either side of the entrance and exit of the imaging lens. Of the second light flux regulating member having at least one minute aperture for regulating the wave light arranged on the adjusted virtual angle of view line and the diffraction pattern generated by the first and second light flux regulating members. Incident pattern display means It was constructed an imaging lens position adjustment apparatus by an imaging lens adjusting means for adjusting the position of the imaging lens relative to the bundle.

In the seventeenth aspect of the present invention, on the virtual line angle of adjustment of the effective light flux in the tangential surface and the radial surface of the optical system including the imaging lens and on either side of the entrance and exit of the imaging lens. And an imaginary angle of view of the effective luminous flux of the imaging lens in the tangential surface and the radial surface opposite to the undulating light illuminating means that emits the undulating light and the imaging lens. A first light flux regulating member having a minute opening for regulating the wave light emitted from the wave light illuminating means arranged on the line, and the wave light illumination arranged on either side of the entrance and exit of the imaging lens. Adjustment of effective luminous flux on the side opposite to the means, at least one second luminous flux regulating member disposed on the virtual line of view angle for regulating wave light, and first and second luminous flux regulating members The diffraction pattern generated by A pattern display means for displaying by light, was constructed an imaging lens position adjustment apparatus by an imaging lens adjusting means for adjusting the position of the imaging lens to the incident light beam.

[0026]

According to the first aspect of the invention, the wave light such as the laser light emitted from the wave light illuminating means travels on the adjustment virtual field angle line of the effective light flux of the imaging lens in the tangential plane. , A diffraction pattern is generated by being incident on the minute openings of the first and second light flux regulating members arranged on the adjusted virtual angle-of-view line of the imaging lens on the side opposite to the wave light illuminating means. It is displayed on the pattern display means. In this case, by simply observing the displayed diffraction patterns and moving and adjusting each member of the optical system so that the diffraction patterns of both of them coincide with each other, a step before assembling the imaging lens into the apparatus main body is performed. The position adjustment can be performed more easily and highly accurately. After that, even when the image forming lens is assembled at a predetermined position, the position of the image forming lens can be adjusted easily and highly accurately by using the image forming lens adjusting means. This allows
The angle-of-view line of the imaging lens in the tangential plane is completely matched with the adjustment virtual angle-of-view line of the effective light flux, and the angle-of-view line of the reading light flux (incident light flux with respect to the imaging lens) during actual document reading is It is possible to remarkably improve the accuracy of matching the adjusted virtual angle of view line, that is, the angle of view line of the effective light flux of the imaging lens.

According to the second aspect of the present invention, the wave light such as the laser light emitted from the wave light illuminating means travels on the adjustment virtual field angle line of the effective light flux of the imaging lens in the radial plane, The diffraction pattern is generated by being incident on the minute apertures of the first and second light flux regulating members arranged on the adjusted virtual field angle line of the imaging lens on the side opposite to the wave light illumination means. It is displayed on the display means. In this case, by simply observing the displayed diffraction patterns and moving and adjusting each member of the optical system so that the diffraction patterns of both of them coincide with each other, a step before assembling the imaging lens into the apparatus main body is performed. The position adjustment can be performed more easily and highly accurately. After that, even when the image forming lens is assembled at a predetermined position, the position of the image forming lens can be adjusted easily and highly accurately by using the image forming lens adjusting means. This allows
Adjusting the angle of view line of the imaging lens in the radial plane perfectly matches the virtual angle of view line of the effective light flux, and adjusting the angle of view line of the reading light flux (incident light flux to the imaging lens) during actual document reading It is possible to remarkably improve the accuracy of matching with the virtual angle of view line, that is, the angle of view line of the effective light flux of the imaging lens.

According to the third aspect of the invention, the wave light such as the laser light emitted from the wave light illuminating means is on the imaginary angle line of view for adjusting the effective light flux of the imaging lens in the tangential surface and the radial surface. Then, the diffraction pattern is generated by being incident on the minute openings of the first and second light flux regulating members arranged on the adjusted virtual angle-of-view line of the imaging lens on the side opposite to the wave light illumination means. The diffraction pattern is displayed on the pattern display means. In this case, by simply observing the displayed diffraction patterns and moving and adjusting each member of the optical system so that the diffraction patterns of both of them coincide with each other, a step before assembling the imaging lens into the apparatus main body is performed. The position adjustment can be performed more easily and highly accurately. After that, even when the image forming lens is assembled at a predetermined position, the position of the image forming lens can be adjusted easily and highly accurately by using the image forming lens adjusting means.
As a result, the angle-of-view line of the imaging lens in the tangential surface and the radial plane is completely matched with the adjusted virtual angle-of-view line of the effective light flux, and the reading light flux (incident light flux with respect to the imaging lens) during actual document reading. Angle of view line of
It is possible to remarkably improve the accuracy of matching the adjusted virtual angle of view line, that is, the angle of view line of the effective light flux of the imaging lens.

According to the invention described in claim 4, the wave light such as the laser light emitted from the wave light illuminating means travels on the adjustment virtual optical axis of the imaging lens, and the adjustment virtual optical axis of the imaging lens. The diffraction pattern incident on the minute aperture of the light flux regulating member disposed above is displayed on the pattern display means, and the lens optical axis of the imaging lens can be perfectly aligned with the adjusted virtual optical axis. . This makes it possible to match the optical axis of the reading light flux (incident light flux with respect to the imaging lens) during the actual document reading with the adjusted virtual optical axis, that is, the lens optical axis of the imaging lens.

In the invention of claim 5, the wave light such as laser light emitted from the wave light illuminating means is on the same side as the wave light illuminating means arranged on either side of the entrance and exit of the imaging lens. After passing through the minute aperture of the light flux regulating member arranged on the adjusted virtual angle of view line, the light flux arranged on the adjusted virtual angle of view line on the side opposite to the incident / exited wave light illumination means of the imaging lens The diffraction pattern obtained by passing through the minute opening of the regulating member is displayed on the pattern display means. At this time, the wave as the reference for adjusting the angle-of-view line of the imaging lens is adjusted by the minute opening of the light flux regulating member arranged on the adjusted virtual angle-of-view line on the same side as the incoming / outgoing wave light illumination means of the imaging lens. The position of the light illumination means is constantly checked.

According to the sixth aspect of the present invention, the diffraction pattern obtained by passing through the light flux regulating member disposed at the substantially image plane position of the imaging lens or at a position substantially equal to the image plane distance is used. By adjusting the angle-of-view line of the image lens, it is possible to perform adjustment suitable for a device that allows a slight angle-of-view deviation of the imaging lens.

According to the seventh aspect of the present invention, at least two light flux regulating members are positioned by using the positioning means attached to the apparatus main body, so that each minute opening formed by the positioned light flux regulating members. The line connecting the centers of the two can be matched or substantially matched with the adjustment virtual angle-of-view line of the imaging lens, which allows the adjustment virtual angle-of-view line, which is the reference for adjusting the angle-of-view line of the imaging lens, to be easily and highly adjusted. It can be set to accuracy and can be made visible.

In the invention described in claim 8, the light flux from the wave light illuminating means enters into the inside of the main body through a minute opening formed in the main body of the apparatus, and advances along the adjusted virtual angle of view line of the imaging lens. Then, the light is emitted to the outside of the main body from a minute opening formed in another apparatus main body, and the diffraction pattern generated thereby is displayed on the pattern display means. By forming the minute opening in the main body of the apparatus as described above, the angle-of-view line adjustment of the imaging lens can be easily performed at any time without installing the light flux regulating member inside the main body.

According to the ninth aspect of the present invention, the light flux regulating member is arranged at a position outside the main body of the apparatus to adjust the angle of view line of the imaging lens, thereby moving the light flux regulating member onto the adjusted virtual angle of view line. Assembling workability is easy.

In the tenth aspect of the present invention, the optical axis of the light beam emitted from the wave light illuminating means is made to match or substantially match the adjusted virtual angle of view line of the imaging lens by using the wave light optical axis adjusting means. It is possible to quickly and highly accurately cope with the optical axis shift in the initial stage of the emission of the light flux of the wave light illuminating means and the optical axis shift caused by the change over time.

In the eleventh aspect of the present invention, the angle-of-view line adjustment is performed by using the opening-center-position adjusting means to match or substantially match the center position of the minute opening with the adjusted virtual angle-of-view line of the imaging lens. Is much easier, and highly accurate positioning can be performed easily.

According to the twelfth aspect of the present invention, in the first position adjusting step, the first light flux regulating member is positioned inside the apparatus main body, and the imaging lens in the tangential surface of the optical system including the imaging lens. Adjustment virtual field angle line and the center of the minute aperture of the first light flux regulating member are matched or substantially matched, and the center of the minute aperture of the first light flux regulating member and the wave light illumination are adjusted in the second position adjusting step. The optical axis of the light flux of the means is matched or substantially matched, and the second light flux regulating member is adjusted in the third position adjusting step to adjust the virtual angle of view of the imaging lens inside the apparatus main body or within the tangential surface outside the apparatus main body. It is arranged on the line, and the center of the minute aperture of the second light flux regulating member and the optical axis of the light flux of the wave light illuminating means are made to coincide or substantially coincide with each other, and the imaging lens is tandem in the fourth position adjusting step. Adjustment of the imaging lens in the plane On the virtual angle of view line By matching or substantially matching the diffraction pattern of both by comparing the diffraction pattern before and after that Zaisa, it can be efficiently performed to and smoothly the position adjustment of the imaging lens in Tandensharu plane.

In the thirteenth aspect of the present invention, the first light flux regulating member is positioned inside the main body of the apparatus in the first position adjusting step, and the image forming lens in the radial plane of the optical system including the image forming lens is formed. The adjusted virtual angle-of-view line and the center of the minute aperture of the first light flux regulating member are made to coincide or substantially coincide with each other, and the center of the minute aperture of the first light flux regulating member and the wave light illuminating means in the second position adjusting step. The optical axis of the luminous flux of
In the third position adjusting step, the second light flux regulating member is disposed on the adjustment virtual angle line of the imaging lens inside the apparatus main body or in the radial plane outside the apparatus main body, The center of the opening and the optical axis of the light flux of the wave light illuminating means are made to coincide or substantially coincide with each other, and the image forming lens is interposed on the adjustment virtual view angle line of the image forming lens in the radial plane in the fourth position adjusting step. By comparing the diffraction patterns before and after and matching both diffraction patterns substantially or substantially, it is possible to smoothly and efficiently adjust the position of the imaging lens in the radial plane.

In the fourteenth aspect of the present invention, the first light flux regulating member is positioned inside the main body of the apparatus in the first position adjusting step, and the first light flux regulating member is positioned within the tangential surface and the radial surface of the optical system including the imaging lens. The adjustment virtual angle-of-view line of the imaging lens and the center of the minute aperture of the first light flux regulating member are made to coincide or substantially coincide with each other, and in the second position adjustment step, the center of the minute aperture of the first light flux regulating member is made The optical axis of the light flux of the wave light illuminating means is matched or substantially matched, and in the third position adjusting step, the second light flux regulating member is imaged on the tandem surface and the radial surface inside or outside the apparatus main body. The lens is arranged on the virtual line of view angle, and the center of the minute opening of the second light flux regulating member and the optical axis of the light flux of the wave light illumination means are matched or substantially matched, and in the fourth position adjusting step. The imaging lens is tangential and radial. Adjustment of the imaging lens in the inside By comparing the diffraction patterns before and after interposing on the virtual angle of view line and matching or substantially matching the diffraction patterns of both, the imaging lens in the tangential plane is adjusted. Position adjustment work can be performed smoothly and efficiently.

In the fifteenth aspect of the invention, similarly to the first aspect of the invention, by moving and adjusting each member of the optical system including at least two light flux regulating members, the tangential plane can be adjusted. The angle-of-view line of the imaging lens can be made to completely match the adjusted virtual angle-of-view line of the effective light beam, whereby the angle-of-view line of the read light beam at the time of actual document reading can be adjusted to the adjusted virtual angle-of-view line, that is, image formation. It is possible to remarkably improve the accuracy of matching the angle of view line of the effective light flux of the lens.

In the sixteenth aspect of the invention, similarly to the second aspect of the invention, by moving and adjusting each member of the optical system including at least two light flux regulating members, the connection in the radial plane is achieved. The angle-of-view line of the image lens can be made to completely coincide with the adjusted virtual angle-of-view line of the effective light beam, whereby the angle-of-view line of the read light beam at the time of actually reading the original is adjusted virtual-angle-of-view line, that is, the imaging lens. It is possible to remarkably improve the accuracy of matching with the angle of view line of the effective light flux.

In the seventeenth aspect of the invention, similarly to the third aspect of the invention, the tangential surface and the radial surface are adjusted by moving and adjusting each member of the optical system including at least two light flux regulating members. The angle-of-view line of the imaging lens in the inside can be made to completely coincide with the adjustment virtual angle-of-view line of the effective light flux. That is, it is possible to remarkably improve the accuracy of matching the angle of view line of the effective light flux of the imaging lens.

[0043]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will be described with reference to FIGS. 1 to 3 (claims 1, 2, 3, 4, 12, 13, 1).
It corresponds to the invention described in 4, 15, 16, and 17). In this embodiment, a transmissive original reading device (see FIG. 11) using the CCD 9 as described in the related art will be described as an example. It should be noted that description of the same portion in the apparatus main body 1 that constitutes the reading optical system is omitted.

1A and 1B show the structure of an optical system for adjusting the position of the imaging lens 8. FIG. 1 (a)
Is a view of the optical system viewed from the radial surface (hereinafter referred to as R surface) side, and FIG. 1B is a view of the optical system viewed from the tangential surface (T surface) side. It is a figure. In the T-plane of the optical system on the incident side of the imaging lens 8, there are two laser light sources 12a as wave light illuminating means.
Individually arranged. Laser light source 12 arranged in the T plane
Between a, a laser light source 12a ₀ as a wave light illuminating means.
Is arranged. In this case, each laser optical axis Da of the laser light emitted from the laser light source 12a is located on the adjusted virtual incident view angle line Ja (design position) as the adjusted virtual view angle line. Further, the laser beam axis Da ₀ of the laser light source 12a ₀ is located on the adjusting virtual adjusted virtual incident optical axis Ja ₀ as the optical axis (design position).

Further, the T of the optical system on the exit side of the imaging lens 8 is
A first light flux regulating member 13 (hereinafter referred to as pinhole 13) is fixed to the base 10 within the surface. This pinhole 13 has one small hole 14a as a minute opening.
A total of three holes, ₀ and two small holes 14a, are formed in the T-plane. Behind the pinhole 13, a second light flux regulating member 16 (hereinafter referred to as the pinhole 16) is provided on the base 10.
It is located outside of. This pinhole 16
In this case, a total of five small holes 16 ₁ as small openings, _two small holes 16 ₂ and two small holes 16 ₃ are formed in the T-plane. In this case, the center of the small hole 14a ₀ of the pinhole 13 and the center of the small hole 16 ₁ of the pinhole 16 are located on the extension line of the adjusted virtual incident optical axis Ja ₀ as the adjusted virtual optical axis. . Two adjusted virtual incident field angle lines Ja
The center of the small hole 14a ₀ of the pinhole 13 and the center of the small hole 16 ₂ of the pinhole 16 are located on the extension line of. On the extension line of the two adjusted virtual emission angle lines Jb (design position), the center of the small hole 14a of the pinhole 13 and
The center of the small hole 16 ₃ of the pinhole 16 is located.

Behind the pinhole 16, an observation plate 15 as a pattern display means for receiving and displaying the generated diffraction pattern K is arranged. Further, the imaging lens 8
Are movably supported by an imaging lens adjusting means (not shown) such as a spacer or a micro head. By this image forming lens adjusting means, the position of the image forming lens 8 with respect to the incident light beam is moved and adjusted so as to match the adjusted virtual angle of view line.

It should be noted that the adjusted virtual angle-of-view line here is not actually visible, but is a fictitious one used for convenience in design and adjustment. Corresponds to the angle of view line of the light flux A from the light source 2. The adjusted virtual optical axis here is not actually visible, but is a fictitious one that is used for the convenience of design and adjustment. Corresponds to the optical axis B of the luminous flux A of.

In such a structure, first, the basic concept of the angle of view line in the imaging lens 8 will be described with reference to FIG.
A description will be given based on (a) and (b). 2A is a view of the imaging lens 8 from the T surface, and FIG. 2B is a view of the imaging lens 8 from the R surface. In FIG. 2A, in the ideal arrangement of the optical system, the optical axis B of the incident light flux A, the incident field angle line Ga, and the exit field angle line Gb are the same as those of the imaging lens 8
The lens optical axis C and the incident field angle line Ha and the exit field angle line Hb respectively coincide with each other. In FIG. 2 (b),
In an ideal arrangement (design position) of the optical system, the optical axis B of the incident light beam A, the incident field angle line Gc, and the exit field angle line Gc
d coincides with the lens optical axis C of the imaging lens 8, the incident field angle line Hc, and the exit field angle line Hd. Therefore, generally, by matching the angle of view line and the optical axis of the imaging lens 8 with the angle line and the optical axis of the light flux A incident on the imaging lens 8 as much as possible, a higher-quality device is obtained. You will be able to make it.

Therefore, in the present embodiment, hereinafter, the angle of view lines Ha and Hb of the image forming lens 8 in the T plane are set to the angle of view lines Ga and Gb of the light flux A, and the lens light of the image forming lens 8 in the T plane is described below. A method of adjusting the position of the imaging lens 8 for making the axis C coincide with the optical axis B of the light flux A will be described. (First to fourth position adjusting steps). In order to perform such adjustment of the imaging lens 8, here, the adjusted virtual incident view angle line Ja, the adjusted virtual exit view angle line Jb, the adjusted virtual incident optical axis Ja ₀ , the adjusted virtual exit optical axis Jb ₀ (design Position).

First, adjustment is performed before installing the imaging lens 8 in the apparatus main body 1. That is, in FIG. 1B, first, the pinhole 13 is positioned and fixed at a designated position (a hole (not shown) or the like) of the base 10. By the positioning of the pinhole 13, the center of the small hole 14a ₀ coincides with the adjusted virtual incident optical axis Ja ₀ and the adjusted virtual incident angle of view line Ja, and the center of the small hole 14a adjusts the adjusted virtual exit angle of view line Jb.
(First optical axis adjusting step).

Next, the laser light source 12a is placed at the front and rear positions away from the base 10 to which the pinhole 13 is fixed.
₀ , 12a and the observation plate 15 are arranged. In this state, laser light from the laser light sources 12a ₀ , 12a is emitted toward the small hole 14a ₀ of the pinhole 13, and the diffraction pattern K generated thereby is projected on the observation plate 15. Then, it is checked whether or not the projected diffraction pattern K is a clean diffraction pattern K (see FIG. 3A) having a concentric uniform light amount distribution. If the diffraction pattern K is a clean concentric circle, no position adjustment is necessary. If not, the laser optical axes Da ₀ and Da of the laser light are adjusted. This adjustment is performed by observing the diffraction pattern K on the observation plate 15 and moving the laser light sources 12a ₀ , 12a in the directions of shift (in the X and Y directions) and inclination (in the T plane in the Xθ and Yθ directions). . By adjusting the position in this way, the small hole 1
The adjusted virtual incident optical axis Ja ₀ passing through the center of 4a ₀ and the laser optical axes Da ₀ and D of the laser light on the adjusted virtual incident field angle line Ja.
a can be matched. (Second position adjusting step).

Next, the pinhole 16 is arranged at a predetermined position between the observation hole 15 and the pinhole 13 outside the apparatus main body 1. In general, when installing and adjusting the pinholes both inside and outside the apparatus body 1, it is always necessary to provide a reference light and one or more reference pinholes. Therefore, here, the pinhole 13 is installed as it is. Then, with the pinhole 16 thus arranged, the laser light from the laser light sources 12a ₀ , 12a is directed toward the pinholes 13, 16 and
The diffraction pattern K is projected on the observation plate 15. It is judged whether or not the projected diffraction pattern K coincides with the beautiful concentric circular diffraction pattern K, and if they do not coincide, the adjustment is performed. This adjustment is performed by moving the pinhole 16 in the shift (X, Y) direction while observing the diffraction pattern K to adjust the positions of the centers of the small holes 16 ₁ and 16 ₂ and then fixing the position. To do. As a result, the center of the small hole 16 ₁ of the pinhole 16 is adjusted to the virtual incident optical axis J.
a _0, that is, the optical axis Da _{0 of the} laser beam, and the center of the small hole 16 ₂ of the pinhole 16 is the adjusted virtual incident field angle line J.
Matches a (third position adjusting step). In this way, the initial setting is completed.

Next, adjustment is performed with the imaging lens 8 installed in the apparatus main body 1. That is, the imaging lens 8 is attached to a predetermined position on the base 10, and the position adjustment work of the lens optical axis C and the incident field angle line Ha and the exit field angle line Hb is performed using the diffraction pattern K on the observation plate 15. In this position adjusting work, as in the second and third position adjusting steps described above, the laser light from the laser light sources 12a ₀ and 12a is irradiated toward the pinholes 13 and 16, and the observation plate 15 is irradiated. While observing the diffraction pattern K by projecting the diffraction pattern K, shift (X, Y direction), inclination (T in the Yθ direction)
Move in the direction of (in-plane). Upon completion of such position adjustment, the adjustment work of the incident field angle line Ha and the exit field angle line Hb in the lens optical axes C and T planes of the imaging lens 8 is completed (fourth position adjusting step). By performing the position adjustment work of the imaging lens 8 in this way, the T
The angle-of-view lines Ha and Hb of the imaging lens 8 in the plane coincide with the angle-of-view lines Ga and Gb of the light beam A, and the lens optical axis C of the imaging lens 8 in the T-plane matches the optical axis B of the light beam A. be able to.

At the time of actual image reading, the optical axis B of the light flux A
Moves on the adjusted virtual incident optical axis Ja ₀ , and its optical axis B
Coincides with the lens optical axis C of the imaging lens 8, and the luminous flux A
The incident angle-of-view line Ga of is advanced on the adjusted virtual incident angle-of-view line Ja, and the incident angle-of-view line Ga is moved to the imaging lens 8.
The incident angle of view line Ha of In this way, by adjusting both the optical axis of the imaging lens 8 in the T-plane and the angle of view line of the effective light beam, it is possible to further prevent deterioration of the read image and obtain a high-quality image.

Generally, the amount of deviation of the pinhole 13 from the reference position (design position) is determined by observing the amount of deviation of the diffraction pattern K from the reference position on the observing plate 15 which is generated in the reference pinhole 13. It can be judged, but it cannot be said that the accuracy is sufficient. Therefore, the above-described position adjustment work (first to fourth position adjustment steps) is performed, and the pinhole in which the laser light passing through the imaging lens 8 matches the adjusted virtual optical axis and the adjusted virtual angle of view line. 13 small holes 14a
₀ , 14a, small holes 16 ₁ , 16 ₂ , 1 of the pinhole 16
The position of the imaging lens 8 is moved and adjusted so as to pass 6 ₃ . In this case, the diffraction pattern K does not occur unless the laser light passes through the two pinholes 16, so it is not necessary to strictly measure the amount of deviation from the reference position on the observation plate 15, and only the pattern shape can be determined. While observing, to finally obtain the diffraction pattern K as shown in FIG.
Lens optical axis C of imaging lens 8 and angle-of-view lines Ha, Hb
Move and adjust. As a result, the position adjustment accuracy of the imaging lens 8 can be further improved as compared with the case where only one pinhole 13 is arranged. Note that the number of pinholes arranged on the exit side of the imaging lens 8 is not limited to two, and by arranging three or more pinholes further away from the position of the observation plate 15, more accurate light can be obtained. The axis can be adjusted. However, in this case, it is necessary to set the output power of the laser light source 12 high.

As described above, the base 10 of the apparatus body 1
Not only the pinhole 13 is installed only on the top, but the pinhole 16 is installed outside the base 10 and the position of the imaging lens 8 is adjusted according to the procedure of the first to fourth optical axis adjusting steps. It is possible to obtain a high-quality image and perform highly accurate position adjustment work smoothly and efficiently.

Although the position adjustment of the lens optical axis C of the imaging lens 8 and the angle-of-view lines Ha and Hb in the T-plane has been described in this embodiment, the present invention is not limited to this, and FIG. The position adjustment of the lens optical axis C of the imaging lens 8 and the angle-of-view lines Hc and Hd within the R plane as shown in FIG.
By adjusting the positions of the lens optical axis C and the angle-of-view lines Ha, Hb, Hc, and Hd of the imaging lens 8 in both the surface and the R surface, a higher quality image can be obtained. Further, when adjusting the angle-of-view line, when the imaging lens 8 is shifted, the light emitted from the lens is tilted, and when the angle is tilted, the light is shifted. The work efficiency can be improved because the direction to be adjusted and the adjustment amount can be easily grasped. After the adjustment is completed, the imaging lens 8 is fixed so that it does not move except in the optical axis direction. The position of the observation plate 15 is not particularly limited, but it is set at a position where the projected diffraction pattern K can be recognized well and the difference in pattern state can be seen. In addition, the deviation between the adjusted virtual exit field angle line Jb (design position) and the exit field angle line Hb of the imaging lens 8 is due to the adjusted virtual entrance field angle line Ja (design position) and the incident field angle line of the imaging lens 8. If Ha is matched, it is automatically matched and no adjustment is necessary. Further, the pattern display means is not limited to one that merely receives and displays the diffraction pattern, but may also include one that stores the received diffraction pattern as data and displays it on a display or the like.

Next, a second embodiment of the present invention will be described with reference to FIGS. 4 and 5 (corresponding to the invention of claim 5). The description of the same parts as those in the first embodiment described above will be omitted, and the same reference numerals will be used for the same parts.

On the base 10 between the laser light sources 12a ₀ , 12a and the incident side of the imaging lens 8, a pinhole 17 as a light flux regulating member is arranged. The pinhole 17 has a small hole 17 ₁ and two small holes 17 ₂ formed in the T-plane. In this case, the center position of the small hole 17 ₂ coincides with the adjusted virtual incident view angle line Ja as the adjusted virtual view angle line. The center position of the small hole 17 ₁ coincides with the adjusted virtual incident optical axis Ja ₀ as the adjusted virtual optical axis. A pinhole 13 and an observation plate 15 are sequentially arranged behind the imaging lens 8.

Hereinafter, the reason why the above-described constituent requirements are set will be described. Now, if the laser light from the laser light sources 12a ₀ and 12a does not pass through the pinhole 17 before entering the lens and the pinhole 13 after exiting the lens, the observation plate 1
The diffraction pattern K is not projected onto the surface 5. This is
In other words, the lens optical axis C of the imaging lens 8 is adjusted to the adjusted virtual incident optical axis Ja ₀ , and the incident field angle line Ha of the imaging lens 8 is set.
The laser light sources 12a ₀ , 12a are slightly tilted due to an unexpected external force or stress, for example, while the position adjustment is performed so as to match with the virtual incident view angle line Ja.
This means that this inclination appears as a difference in the diffraction pattern shape.

Therefore, in view of this, with the imaging lens 8 removed, the laser light from the laser light sources 12a ₀ , 12a is passed through the two pinholes 17, 13 and the diffraction pattern K is observed. This makes it possible to always confirm whether or not the laser optical axes Da ₀ and Da of the laser light sources 12a ₀ and 12a match the adjusted virtual incident optical axis Ja ₀ and the adjusted virtual incident field angle line Ja, respectively. As a result, the subsequent position adjustment of the imaging lens 8 can be performed more highly accurately and stably without variation. Further, the wider the distance between the pinhole 17 and the pinhole 13 is, the more the laser light sources 12a ₀ , 1 are.
The accuracy of the inclination adjustment of 2a can be set to be much higher.

Further, the number of pinholes arranged on the adjusted virtual incident optical axis Ja ₀ and the adjusted virtual incident field angle line Ja is not particularly limited. For example, FIG. 5 which is a combination of FIG. 1 and FIG. 3 pinholes 13, 16 as shown,
The number of pinholes in the configuration in which the position of the imaging lens 8 is adjusted while adjusting the inclination of the laser light source 12 by adopting the configuration using 17 (one on the incident side and two on the emitting side). The ratio of the decrease in the light amount of the laser light can be minimized, and the position of the imaging lens 8 can be adjusted with higher accuracy.

Next, a third embodiment of the present invention will be described with reference to FIG. 4 (corresponding to the invention of claim 6). It should be noted that description of the same parts as those in each of the above-described embodiments is omitted,
The same reference numerals are used for the same portions.

The small holes 14a ₀ , 14 of the pinhole 13 are located at positions substantially equal to the image plane distance L of the imaging lens 8 (that is, at positions equal to or substantially equal to the light receiving position of the CCD 9).
It is arranged so that a is located.

The reason why the above-mentioned structural requirements are adopted will be described below. Even if the position of the imaging lens 8 is displaced and the optical axis B of the light flux A from the light source 2 is incident on the CCD 9 at an angle (see FIG. 11), the CCD is at the design position.
In some cases, it is only necessary to form an image on the light receiving section of 9.
In such a case, unless consideration is given to the requirement, adjustment will be performed more than necessary, resulting in over-specification and high work cost.

Therefore, the pinhole 13 is arranged at a position substantially equal to the image plane distance (focal length) L, and here, the positional deviation of the diffraction pattern K does not matter, and only the shape thereof is observed, as shown in FIG. The adjustment is made so that the diffraction pattern K as shown in FIG. In addition, here, the pinhole 13 is CC
Although it is arranged at the same position as D9, if the relationship of the image plane distance L is established, it may be arranged at a position different from the position of the CCD 9, for example, at a position folded by a mirror or the like.

Next, a fourth embodiment of the present invention will be described with reference to FIG. 6 (corresponding to the invention of claim 7). It should be noted that description of the same parts as those in each of the above-described embodiments is omitted,
The same reference numerals are used for the same portions.

At both ends on the base 10 of the apparatus main body 1,
Pins 18 ₁ and 18 ₂ are provided as positioning means. The line connecting the center of the pin 18 _{1 and} the center of the pin 18 ₂ is located on the adjusted virtual incident angle-of-view line Ja.
₁ and the center of the pin 18 ₁ of a line connecting the center is located on the adjusting virtual incident optical axis Ja _0. And these pins 1
8 ₁ and 18 ₂ are fitted into holes 19 formed in the pinholes 13 and 17, respectively.
Is fixed so that it can be removed. Therefore, in the fitted state in this way, the small hole 1 of the pinhole 13
A line connecting the center of 4a _{0 and} the center of the small hole 17 ₁ of the pinhole 17 coincides with the adjusted virtual incident optical axis Ja ₀ .
The line connecting the center of the small hole 14a ₀ of the pinhole 13 and the center of the small hole 17 ₂ of the pinhole 17 coincides with the adjusted virtual incident optical axis Ja.

Two pins 20 are provided on the line connecting the pins 18 ₁ near the center of the base 10. These pins 20 are adapted to fit into holes 21a formed in a lens block 21 serving as a lens holding member for holding the image forming lens 8, whereby the X direction and the Yθ direction of the image forming lens 8 are formed. It is possible to regulate the movement.

Hereinafter, the reason why the above-mentioned constituent requirements are set will be described. Now, the pinholes 13 and 17 are the first adjustment reference points in the position adjustment work of the imaging lens 8, and the pinhole 1 is located on the adjusted virtual incident optical axis Ja _0.
The centers of the small holes 14a ₀ and 17 ₁ of the pinholes 13 and 17 are arranged on the adjusted virtual incident field angle line Ja.
It is necessary to position the centers of a ₀ and 17 ₂ respectively. The adjusted virtual incident optical axis Ja ₀ and the adjusted virtual incident angle-of-view line Ja as described above are fictitious in design and adjustment, and are invisible to the eyes, but the position is adjusted unless the reference position is known at the time of adjustment. Cannot be done.

[0071] Therefore, treats a line connecting the centers of the pin 18 ₁ of the pin 18 ₁ as adjusted virtual incident optical axis Ja _0,
By treating the line connecting the center of the pin 18 _{1 and} the center of the pin 18 ₂ as the adjusted virtual incident field angle line Ja, the adjusted virtual incident optical axis Ja ₀ and the adjusted virtual incident field angle line Ja are made visible. . Therefore, by setting such a visible state, the reference optical axis for adjustment can be easily set with high accuracy. This makes it possible to improve the accuracy of the position adjustment of the imaging lens 8 and further improve the efficiency of the adjustment work.

Next, a fifth embodiment of the present invention will be described with reference to FIG. 7 (corresponding to the invention of claim 8). It should be noted that description of the same parts as those in each of the above-described embodiments is omitted,
The same reference numerals are used for the same portions.

Adjustment of Imaging Lens 8 Virtual Incident Field Angle J
On the side plates 22 and 23 of the apparatus main body 1 at positions intersecting with a,
Small holes 22 ₂ and 23 ₂ are formed as minute openings that regulate the laser light from the laser light source 12a. Also,
Small holes 23 ₃ are formed in the side plates 22 and 23 of the apparatus main body 1 at positions intersecting with the adjusted virtual emission field angle line Jb of the imaging lens 8 as minute openings for restricting laser light. Further, in the side plates 22 and 23 of the apparatus main body 1 at the position intersecting with the adjusted virtual incident optical axis Ja _{0 of} the imaging lens 8, a small hole 22 ₁ as a minute opening for restricting the laser light from the laser light source 12a _0. , 23 ₁ are formed.

Hereinafter, the reason why the above-mentioned constituent requirements are set will be described. When the two pinholes 17 and 13 are used as in the above-described embodiment, the laser light source 12a ₀ ,
The laser light from 12a passes through the small holes 17 ₁ and 17 ₂ and the adjusted virtual incident optical axis Ja ₀ and the adjusted virtual incident field angle line Ja
Along the small hole 14 through the imaging lens 8.
The diffraction pattern K is projected onto the observation plate 15 by passing through a ₀ and 14 a and proceeding along the adjusted virtual emission optical axis Jb ₀ and the adjusted virtual emission angle of view line Jb. When these pinholes 17 and 13 are used only for adjustment, they are generally removed after the apparatus body 1 is assembled, and such attachment and detachment work is troublesome.

Therefore, the small holes 22 ₁ , 2 are formed in the side plates 22, 23.
By forming 2 ₂ , 23 ₁ , 23 ₂ , and 23 ₃ , respectively, it becomes unnecessary to dispose the pinholes 13 and 17 on the optical path, and the position of the imaging lens 8 can be adjusted at any time. . As a result, the workability of assembling and dismounting can be further improved. The small hole 22
The constituent members of the device body 1 on which ₁ , 22, ₂ , 23 ₁ , 23 ₂ , 23 ₃ are formed are not limited to the side plates 22 and 23, but a device that intersects the adjusted virtual optical axis and the adjusted virtual angle of view line. Any constituent member of the main body 1 may be used.

Next, a sixth embodiment of the present invention will be described with reference to FIG. 8 (corresponding to the invention of claim 9). It should be noted that description of the same parts as those in each of the above-described embodiments is omitted,
The same reference numerals are used for the same portions.

Device body 1 on the exit side of the imaging lens 8
A pinhole 24 as a light flux restricting member is arranged outside the. Small holes 24 ₁ , 24 ₂ , 24 ₃ as minute openings are formed in the pinhole 24 in the T-plane. The center of the small hole 24 ₃ is the adjusted virtual emission angle line J
b, the center of the small hole 24 ₂ is adjusted virtual incident angle of view line J
On a, the center of the small hole 24 ₁ is aligned with the adjusted virtual emission optical axis Jb ₀ . The small holes 17 ₁ and 17 are provided on the base 10 on the incident side of the imaging lens 8 in the apparatus body 1.
A pinhole 17 having ₂ is arranged.

Hereinafter, the reason why the above-mentioned constituent requirements are set will be described. Generally, if a position-adjusting pinhole is to be installed inside the apparatus body 1, it takes time to install and remove it, and depending on the structure of the apparatus, it cannot be placed inside, or even if it can be installed, other adjustments can be made. In some cases, the necessary components may not be attached or the imaging lens 8 may be displaced when it is removed after position adjustment.

Therefore, in such a case, the pinhole 24
By arranging at least one of them on the outside of the device body 1, the pinhole interval can be widened. This makes it possible to perform highly accurate adjustments and deal with various problems during work. Further, by arranging all the pinholes outside the apparatus main body 1 and installing pinholes (not shown) in place of the pinholes 17 outside the apparatus main body 1, more highly accurate position adjustment can be performed. You can In addition, this allows the device body 1 to be adjusted during position adjustment.
Since there is no need to insert a hand into the inside of the body or to attach or remove the pinhole, work efficiency can be improved.

Next, a seventh embodiment of the present invention will be described with reference to FIG. 9 (corresponding to the invention of claim 10). It should be noted that description of the same parts as those in each of the above-described embodiments is omitted,
The same reference numerals are used for the same portions.

Position adjusting mechanisms 25 ₁ and 25 ₂ as wave light optical axis adjusting means are attached to the laser light sources 12 a ₀ and 12 a. In this case, the position adjusting mechanism 25 _2, so that the laser beam axis Da of the laser light source 12a matches the adjusted virtual incident angle line Ja of the imaging lens 8, slightly moving the laser light source 12a. In addition, this position adjusting mechanism 25
_1, as the laser beam axis Da ₀ of the laser light source 12a ₀ is equal to the adjusted virtual incident optical axis Ja ₀ of the imaging lens 8,
The laser light source 12a ₀ is slightly moved.

Hereinafter, the reason why the above-mentioned constituent requirements are set will be described. Now, it is very important whether or not the laser light sources 12a ₀ , 12a are always at the predetermined positions, and if the laser light sources 12a ₀ , 12a are misaligned for some reason, it is necessary to quickly return them to the normal positions.

Therefore, for example, even when the laser optical axis Da deviates from the adjusted virtual incident field angle line Ja, the position adjusting mechanism 25 ₂ is used to finely move the laser light source 12a so that the laser light source 12a can be quickly adjusted. Here, the laser light source 12a
₀ , 12a shift (X, Y direction) and inclination (Xθ, Y
(θ direction) can be adjusted. Specifically, when the position shift occurs, only the imaging lens 8 is removed, and the laser optical axis Da is adjusted by using the position adjusting mechanisms 25 ₁ and 25 ₂ so that the position and shape of the diffraction pattern K return to the original state. Adjust ₀ and Da.

Incidentally, such position adjusting mechanisms 25 ₁ , 2
5 ₂ not only correction when was shifted, the initial adjustment stage of assembling the imaging lens 8, adjust the virtual incident optical axis Ja ₀ with respect to the pinhole 13 and 17, adjusting the virtual incident angle line Ja It can also be used in the case where the laser optical axes Da ₀ and Da coincide with each other. In addition, even in such adjustment of the laser optical axes Da ₀ , Da, the pinhole 1
By making the intervals of 3 and 17 as wide as possible, the optical axis can be adjusted with higher accuracy. In addition, since no adjustment was necessary here, the Z-axis direction (optical axis direction)
Although the adjusting mechanism is not attached to the above, it may be added if necessary for improving workability.

Next, an eighth embodiment of the present invention will be described with reference to FIG. 10 (corresponding to the invention of claim 11).
It should be noted that the description of the same parts as those in the above-mentioned respective embodiments is omitted, and the same reference numerals are used for the same parts.

A pinhole 24 is arranged outside the apparatus main body 1 on the exit side of the imaging lens 8, and a position adjusting mechanism 26 as an opening center position adjusting means is attached to the pinhole 24. . In this case, the position adjustment mechanism 26
Is located at the center of the small hole 24 ₂ of the pinhole 24.
The pinhole 24 is finely moved so as to coincide with the adjusted virtual incident view angle line Ja of, and the center of the small hole 24 ₃ of the pinhole 24 coincides with the adjusted virtual exit view angle line Jb of the imaging lens 8. , The pinhole 24 is finely moved.
Further, the position adjusting mechanism 26 finely moves the pinhole 24 so that the center of the small hole 24 ₁ of the pinhole 24 coincides with the emission optical axis Jb ₀ of the imaging lens 8.

The reason why the above-mentioned constituent requirements are set will be described below. Now, the pinholes 13 and 17 provided inside the apparatus body 1 are, for example, the pins 18 as described above.
_The positioning adjustment can be easily performed by using ₁ , 18 ₂ (see FIG. 6). However, the device body 1
It is difficult to position the pinhole 24 arranged outside the device without adjustment, and there is a problem in accuracy.

Therefore, the position of the pinhole 24 can be adjusted by using the position adjusting mechanism 26. Here, the pinhole 24 can be adjusted only in the shift (X and Y directions). By finely adjusting the pinhole 24, it is possible to match the reference diffraction pattern K generated when only the pinholes 13 and 17 are arranged with the diffraction pattern K when the pinhole 24 is additionally arranged. Therefore, by adjusting the pinhole 24 using the position adjusting mechanism 26 in this manner, the adjustment work is facilitated, and highly accurate positioning can be performed easily.
Further, although the position adjusting mechanism 26 is adjusted only by shifting,
The inclination (Xθ, Yθ) may be adjusted if necessary. Further, the position adjusting mechanism 26 may adjust not only the outside of the apparatus main body 1 but also the pinholes 13 and 17 installed inside the apparatus main body 1.

In all the embodiments described so far, the light flux regulating member (pinholes 13, 16, 17, 2).
2, 23, 24) are circular (small holes 14a ₀ ,
14a, 16 ₁ , 16 ₂ , 16 ₃ , 17 ₁ , 17 ₂ , 2
2 ₁ , 22 ₂ , 23 ₁ , 23 ₂ , 23 ₃ , 24 ₁ , 24 ₂ ,
Was 24 ₃₎ is not limited to this shape, for example, it may be of portrait or landscape slit or a rectangular shape. Further, the small openings, for example, the pinholes 24, are provided with small holes at a total of 5 locations, but they may be divided into groups of small holes as needed, or the pinholes 24 may be formed for each small hole. It may be divided into five parts. Further, as a method of adjusting the position of the imaging lens 8, the lens optical axis C of the imaging lens 8, the incident field angle lines Ha and Hc, the exit field angle line Hb,
Hd is adjusted virtual incident optical axis Ja ₀ , adjusted virtual incident optical axis J
b ₀ , the adjusted virtual incident angle of view line Ja, and the adjusted virtual outgoing angle of view line Jb are all strictly matched. Yes, there is no need to set it strictly. Also, the same adjustment can be performed by disposing the position adjusting optical member at a position opposite to that of each embodiment (a position opposite to the position on the entrance side and the exit side of the imaging lens 8). It can be performed. Furthermore, the diffraction pattern K
The method of adjusting the position of the imaging lens 8 using is not limited to the document reading device, but can be applied to a high-quality and highly accurate device including the imaging lens 8.

[0090]

According to the first aspect of the present invention, the effective light flux of the imaging lens in the tangential plane is adjusted by the wave light illuminating means and the first light flux regulating member having a minute aperture for regulating the light flux. The at least one second light flux regulating member having a minute opening is arranged on the angle-of-view line, and is arranged on the adjustment virtual angle-of-view line of the effective light flux of the imaging lens in the tangential plane. The diffraction pattern generated by the light flux regulating member is displayed on the pattern display means, and the assembling adjustment is performed so that the displayed diffraction patterns match each other. The movement adjustment of each member can be performed more easily and highly accurately. Also, when the imaging lens is installed at a predetermined position of the apparatus main body and adjustment is performed using the imaging lens adjusting means,
By simply matching the diffraction patterns, the position adjustment can be performed more easily and with higher accuracy. As a result, the accuracy of matching the angle of view line of the effective light flux of the imaging lens in the tangential plane with the adjusted virtual angle of view line, that is, the design position can be significantly improved, and the image of the read light flux during actual document reading can be improved. The angle line does not deviate from the angle-of-view line of the imaging lens, the imaging performance is further enhanced, and a document reading apparatus with higher image quality can be provided.

According to a second aspect of the present invention, the undulating light illuminating means and the first light flux restricting member having a minute aperture for restricting the light flux are used to adjust the effective light flux of the imaging lens in the radial plane. At least one second light flux restricting member having a minute opening is disposed on the adjustment virtual angle of view line of the effective light flux of the imaging lens in the radial plane, and these at least two light flux restricting members are provided. The generated diffraction pattern is displayed on the pattern display means, and the assembly adjustment is performed so that the displayed diffraction patterns match each other. Movement adjustment can be performed more easily and with high accuracy. Further, even when the imaging lens is installed at a predetermined position of the apparatus main body and is adjusted using the imaging lens adjusting means, the position adjustment can be performed more simply and with high accuracy by simply matching the diffraction patterns. You can As a result, it is possible to significantly improve the accuracy of matching the effective angle of view line of the imaging lens in the radial plane with the adjusted virtual angle of view line, that is, the design position. It is possible to provide a document reading device with higher image quality by further preventing the line from deviating from the line of view of the image forming lens and further improving the image forming performance.

According to a third aspect of the present invention, the effective light flux of the imaging lens is adjusted in the tangential surface and the radial surface by the wave light illuminating means and the first light flux regulating member having the minute aperture for regulating the light flux. While arranging on the virtual view angle line, at least one second light flux regulating member having a minute opening is arranged on the virtual view angle line for adjusting the effective light flux of the imaging lens in the tangential surface and the radial surface. The diffraction patterns generated by these at least two light flux regulating members are displayed on the pattern display means, and the assembling adjustment is performed so that the displayed diffraction patterns match each other. The movement adjustment of each member in the stage before attachment can be performed more easily and highly accurately. Further, even when the imaging lens is installed at a predetermined position of the apparatus main body and is adjusted using the imaging lens adjusting means, the position adjustment can be performed more simply and with high accuracy by simply matching the diffraction patterns. You can As a result, it is possible to remarkably improve the accuracy of matching the angle-of-view line of the effective light flux of the imaging lens in the tangential surface and the radial surface with the adjusted virtual angle-of-view line, that is, the design position, and reading during actual reading It is possible to provide a document reading apparatus with higher image quality, because the angle of view line of the light flux does not deviate from the angle of view line of the imaging lens, the imaging performance is further improved.

According to a fourth aspect of the present invention, the wave light illuminating means and the light flux regulating member having a minute opening for regulating the light flux are provided,
Adjustment of the imaging lens It is arranged on the virtual optical axis, the diffraction pattern generated thereby is displayed on the pattern display means, and the position of the imaging lens is adjusted by using the imaging lens adjustment means based on the displayed diffraction pattern. Is adjusted so that the diffraction pattern when the imaging lens is interposed on the adjusted virtual angle-of-view line and the adjusted virtual optical axis is made to coincide with the diffraction pattern when not interposed. The optical axis of the lens can be made to coincide with the adjusted virtual optical axis, that is, the designed position, so that the optical axis of the reading light flux at the time of actually reading the original does not deviate from the lens optical axis of the imaging lens. The imaging performance can be further improved.

According to a fifth aspect of the present invention, a light flux regulating member is arranged on the adjusted virtual optical axis on the same side as the wave light illuminating means arranged on either side of the entrance and exit of the imaging lens, and a diffraction pattern is used. Since the optical axis of the imaging lens is adjusted, it is possible to always check the position of the wave light illuminating means, which serves as a reference for the optical axis adjustment. This allows the optical axis of the imaging lens to be adjusted with high accuracy. It can be performed stably without variation.

According to a sixth aspect of the present invention, at least 1 is provided at a position substantially equal to the image plane position of the imaging lens or its image plane distance.
Since two light flux regulating members are arranged to adjust the angle of view line of the imaging lens, it is possible to make adjustments suitable for a device that allows a slight angle of view deviation of the imaging lens. Therefore, it is possible to provide the optimum quality performance for each device at the optimum cost.

According to a seventh aspect of the invention, a line connecting the centers of the respective minute apertures formed by at least two light flux regulating members using the positioning means is matched or substantially matched with the adjusted virtual angle of view line of the imaging lens. Since the adjustment virtual angle-of-view line, which is the reference of the angle-of-view line adjustment, can be set easily and with high accuracy, and can be made visible actually. The precision of line adjustment and the work efficiency of positioning adjustment can be improved.

According to the eighth aspect of the invention, since the minute opening for generating the diffraction pattern is formed in the apparatus main body to adjust the angle of view line of the imaging lens, the light flux regulating member is installed inside the main body. It is possible to easily adjust the angle of view of the imaging lens and check the angle of view after adjustment, at any time without having to worry about it. This makes it possible to improve the work efficiency of adjusting the angle of view and to maintain the device. The reliability and reliability can be improved.

According to the ninth aspect of the present invention, the light flux regulating member is arranged outside the main body of the apparatus to adjust the field angle line of the imaging lens. Therefore, when the light flux regulating member is assembled inside the main body of the apparatus. Compared with this, the working efficiency can be significantly improved, and the installation interval can be widened even when a plurality of light flux regulating members are arranged, so that the field angle line of the imaging lens can be adjusted further. It can be performed with high precision.

According to the tenth aspect of the present invention, the wave light optical axis adjusting means is used so that the light axis of the light beam emitted from the wave light illuminating means coincides or substantially coincides with the adjustment virtual angle of view line of the imaging lens. Since the optical axis of the luminous flux of the wave light illumination means is adjusted, it is possible to quickly and highly accurately respond to the position setting of the wave light illumination means or when the position is displaced from the set position. It is possible to further improve the accuracy of adjusting the angle of view line of the lens and the efficiency of the work.

According to the eleventh aspect of the invention, the center of the minute opening is adjusted by using the opening center position adjusting means so that the center position of the minute opening coincides with or substantially coincides with the adjusted virtual angle of view line of the imaging lens. Since the position is adjusted, the center position can be easily adjusted, and high-precision positioning can be performed easily, which further improves the accuracy of the angle-of-view line adjustment of the imaging lens and the work efficiency. Can be planned.

According to the twelfth aspect of the invention, the first light flux regulating member is arranged inside the apparatus body and the second light flux regulating member is arranged inside the apparatus body in the tangential surface of the optical system including the imaging lens. Since the position of the imaging lens is sequentially adjusted by using the diffraction patterns according to the first to fourth position adjusting steps in the state of being arranged outside, the position adjusting work can be performed smoothly and efficiently. It is possible for anyone to easily achieve the above-mentioned position accuracy, which makes it possible to realize a highly accurate position adjustment method for the imaging lens that is easy to perform.

According to a thirteenth aspect of the present invention, the first light flux regulating member is arranged inside the apparatus body and the second light flux regulating member is arranged inside or outside the apparatus body within the radial plane of the optical system including the imaging lens. Since the position adjustment of the imaging lens using the diffraction patterns is sequentially performed according to the first to fourth position adjustment steps in the state of being arranged in the position, the position adjustment work can be performed smoothly and efficiently, Anyone can easily achieve the required position accuracy, which makes it possible to realize a highly accurate method of adjusting the position of the imaging lens that is easy to perform.

In the fourteenth aspect of the present invention, the first light flux regulating member is arranged inside the main body of the apparatus, and the second light flux regulating member is arranged in the tangential surface and the radial surface of the optical system including the imaging lens. Since the position of the imaging lens is sequentially adjusted using the diffraction patterns according to the first to fourth position adjusting steps in the state of being arranged inside or outside the main body, the position adjusting work can be performed smoothly and efficiently. Anyone can easily achieve the desired position accuracy,
As a result, it is possible to realize a highly accurate method of adjusting the position of the imaging lens, which is simple in work.

According to the fifteenth aspect of the present invention, the image forming lens position adjusting device including the wave light illuminating means, at least two light flux regulating members, the pattern displaying means, and the image forming lens adjusting means is used. Since the position of the imaging lens is adjusted within the dential plane, it is possible to more easily and highly accurately adjust the movement of each member before and after the assembly of the imaging lens into the apparatus body. This makes it possible to significantly improve the accuracy of matching the angle of view line of the effective light flux of the imaging lens in the tangential plane with the adjusted virtual angle of view line, that is, the design position,
It is possible to further improve the imaging performance by eliminating the deviation of the angle of view line of the read light flux during the actual document reading.

According to a sixteenth aspect of the present invention, a radial arrangement is provided by using an image-forming lens position adjusting device including a wave light illuminating means, at least two light flux regulating members, a pattern display means, and an image-forming lens adjusting means. Since the position of the imaging lens is adjusted within the plane, it is possible to more easily and highly accurately adjust the movement of each member before and after assembling the imaging lens into the apparatus body. Thus, the accuracy of matching the angle of view line of the effective light flux of the imaging lens in the radial plane with the adjusted virtual angle of view line, that is, the design position can be significantly improved, and the image of the read light flux during actual document reading can be improved. It is possible to further improve the imaging performance by eliminating the deviation of the angle line.

According to a seventeenth aspect of the present invention, the image forming lens position adjusting device including the wave light illuminating means, at least two light flux regulating members, the pattern displaying means, and the image forming lens adjusting means is used. Since the position of the imaging lens is adjusted in the dential surface and the radial surface,
It is possible to more easily and highly accurately adjust the movement of each member before and after the assembling of the imaging lens into the apparatus main body, which allows the imaging lens in the tangential surface and the radial surface to be adjusted. The angle of view line of the effective light flux is adjusted. The precision of matching the virtual angle of view line, that is, the design position, can be significantly improved. Can be increased.

[Brief description of drawings]

FIG. 1 shows a first embodiment of the present invention,
(A) is a side view seen from the R surface, and (b) is a plan view seen from the T surface.

FIG. 2A is a plan view of the imaging lens viewed from the T surface,
(B) is a side view of the imaging lens as viewed from the R surface.

3A is a schematic diagram showing a normal concentric diffraction pattern, and FIG. 3B is a schematic diagram showing an asymmetric diffraction pattern.

4A and 4B show second and third embodiments of the present invention, in which FIG. 4A is a side view seen from the R plane, and FIG. 4B is a plan view seen from the T plane.

FIG. 5 shows a modified example of the second embodiment of the present invention, (a) is a side view seen from the R plane, and (b) is a plan view seen from the T plane.

FIG. 6 shows a fourth embodiment of the present invention,
(A) is a side view seen from the R surface, and (b) is a plan view seen from the T surface of the base surface.

FIG. 7 shows a fifth embodiment of the present invention,
(A) is a side view seen from the R surface, and (b) is a plan view seen from the T surface.

FIG. 8 shows a sixth embodiment of the present invention,
(A) is a side view seen from the R surface, and (b) is a plan view seen from the T surface.

FIG. 9 shows a seventh embodiment of the present invention,
(A) is a side view seen from the R surface, and (b) is a plan view seen from the T surface.

FIG. 10 shows an eighth embodiment of the present invention,
(A) is a side view seen from the R surface, and (b) is a plan view seen from the T surface.

FIG. 11 is a side view showing a reading optical system of the document reading device.

[Explanation of symbols]

2 Illuminating means 4 Original document 8 Imaging lens 9 Light receiving means 13 First light flux regulating member 14a, 14a ₀ Micro aperture 15 Pattern display means 16 Second light flux regulating members 16 _{1 to} 16 ₃ Micro aperture 17 17 Second light flux Regulation member 17 _{1 to} 17 ₃ Micro opening 18 ₁ and 18 ₂ Positioning means 22 Device body side plate 22 ₁ and 22 ₂ Micro aperture 23 Device body side plate 23 ₁ to 23 ₃ Micro aperture 24 Second light flux regulating member 24 ₁ -24 ₃ Micro apertures 25 ₁ and 25 ₂ Wave optical axis adjusting means 26 Aperture center position adjusting means Ja and Jb Adjusting virtual angle of view lines Ja ₀ and Jb ₀ Adjusting virtual optical axis T Tandem surface R Radial surface

Claims (17)

[Claims] 1. A document is illuminated by an illuminating means, a light flux containing read information of the document is guided to an imaging lens by this illumination, and the light flux imaged by the imaging lens is focused on a light receiving means. In the document reading device for reading the read information of the document by the adjustment virtual field angle line of the effective luminous flux in the tangential plane of the optical system including the imaging lens and on either side of the entrance and exit of the imaging lens. An undulating light illuminating means for emitting undulating light is arranged in the tandem plane opposite to the undulating light illuminating means across the imaging lens, and an effective virtual beam angle of view of the imaging lens is adjusted. The first light flux restricting member having a minute opening for restricting the wave light emitted from the wave light illuminating means is arranged on a line, and the first light flux restricting member is arranged on either side of the entrance and exit of the imaging lens. Wave light lighting hand Adjustment of effective luminous flux on the side opposite to the step At least one second luminous flux regulating member having a minute opening for regulating the undulating light is disposed on the virtual field angle line, and the first and second luminous flux regulation An original reading apparatus comprising: a pattern display unit for receiving and displaying a diffraction pattern generated by a member, and an imaging lens adjusting unit for adjusting a position of the imaging lens with respect to an incident light beam. 2. An original document is illuminated by illumination means, a light flux containing read information of the original document is guided to the imaging lens by this illumination, and the light flux imaged by the imaging lens is imaged on the light receiving means. In the document reading device for reading the read information of the document, the effective light flux adjustment virtual line angle line on the radial plane of the optical system including the imaging lens and on either side of the entrance and exit of the imaging lens. A wave light illuminating means for emitting wave light is disposed, and the effective light flux of the image forming lens is adjusted on the virtual angle line in the radial plane opposite to the wave light illuminating means across the image forming lens. Is provided with a first light flux regulating member having a minute opening for regulating the wave light emitted from the wave light illumination means, and the wave light is arranged on either side of the entrance and exit of the imaging lens. Opposite to lighting means Of at least one second light flux regulating member having a minute opening for regulating the wave light is arranged on the virtual angle of view line, and diffraction generated by the first and second light flux regulating members An original reading apparatus comprising: a pattern display means for receiving and displaying a pattern, and an imaging lens adjusting means for adjusting a position of the imaging lens with respect to an incident light beam. 3. An original document is illuminated by an illuminating means, a light flux containing read information of the original document is guided to the imaging lens by this illumination, and the luminous flux imaged by the imaging lens is imaged on the light receiving means. In the document reading apparatus for reading the read information of the document by means of the effective light flux on each of the tangential surface and the radial surface of the optical system including the imaging lens and on either side of the entrance and exit of the imaging lens. Wave light illuminating means for emitting wave light are respectively arranged on the adjusted virtual angle of view lines, and each of the tangential surface and the radial surface on the side opposite to the wave light illuminating means is sandwiched between the imaging lenses. And a first light flux regulating member each having a minute opening for regulating the undulating light emitted from the undulating light illuminating means on the adjustment virtual field angle line of the effective light flux of the imaging lens, Imaging lens A second light flux regulating member having a minute opening portion for regulating the wave light on the virtual line of view for adjusting the effective light flux on the side opposite to the wave light illuminating means arranged on either side of the entrance and exit of the light. At least one is provided and pattern display means for receiving and displaying the diffraction pattern generated by the first and second light flux regulating members is provided, and the position of the imaging lens with respect to the incident light flux is adjusted. A document reading device, characterized in that a means is provided. 4. A wave light illuminating means for emitting wave light is arranged on an adjusted virtual optical axis on either side of the entrance and exit of the image forming lens, and the wave light illuminating means is placed across the image forming lens. 2. A light flux restricting member having a minute opening for restricting the wave light emitted from the wave light illuminating means is arranged on the adjusted virtual optical axis of the imaging lens on the opposite side. The document reading device described in 2 or 3. 5. A light flux regulating member is disposed on an adjusted virtual angle-of-view line of the effective light flux on the same side as the wave light illumination means disposed on either side of the entrance and exit of the imaging lens. The document reading device according to claim 1, 2, 3, or 4. 6. The at least one light flux regulating member is arranged at a position substantially equal to the image plane position of the imaging lens or the image plane distance thereof, 1, 2, 3, 4 or 5.
The document reading device described. 7. A positioning means for matching or substantially matching a line connecting the centers of the minute apertures formed by at least two light flux regulating members with an adjusted virtual angle of view line of the effective light flux of the imaging lens, the apparatus main body. 7. The document reading device according to claim 1, wherein the document reading device is attached to the document reading device. 8. A micro-aperture for restricting the luminous flux from the wave light illuminating means is formed in the main body of the apparatus at a position intersecting the adjusted virtual angle-of-view line of the effective luminous flux of the imaging lens. , 2, 3, 4, 5 or 6 document reading device. 9. The at least one light flux regulating member is arranged at a position outside the main body of the apparatus on the virtual line of view for adjusting the effective light flux of the imaging lens.
The document reading device described in 2, 3, 4, 5 or 6. 10. An adjusting virtual field angle line of an effective light flux of an imaging lens and a light flux of a light flux of a wave light illumination means passing through a minute opening are aligned or substantially aligned with each other, of the wave light illumination means. 7. A wave light optical axis adjusting means for adjusting the optical axis of a light beam is provided.
The document reading device according to item 7, 8 or 9. 11. An opening center position adjustment for adjusting the center position of the minute opening so that the adjustment virtual angle of view line of the effective light beam of the imaging lens and the center position of the minute opening coincide or substantially coincide with each other. A means is provided, Claim 1 characterized by the above-mentioned.
The document reading device described in 2, 3, 4, 5, 6, 7, 8 or 9. 12. An adjusted virtual angle-of-view line of the effective light flux of the imaging lens and a center of the minute aperture of the first light flux regulating member coincide with or substantially coincide with each other within a tangential plane of an optical system including the imaging lens. As described above, the first position adjusting step of positioning the first light flux regulating member inside the apparatus main body, and the center of the minute opening of the first light flux regulating member and the wave light illuminating means for emitting the wave light. A second position adjusting step of adjusting and positioning the position of the wave light illuminating means using a diffraction pattern so that the optical axis coincides or substantially coincides with the first light flux regulating member. A second light flux regulating member is disposed inside or outside the device body on the adjusted virtual angle of view line different from the position, and the center of the minute opening of the second light flux regulating member and the wave light illumination. The optical axis of the light flux of the means matches or substantially matches As described above, a third position adjusting step of adjusting and positioning the position of the second light flux restricting member, and arranging the imaging lens on the adjusted virtual angle-of-view line and interposing this imaging lens And a fourth position adjusting step of adjusting the position of the imaging lens so that the diffraction patterns of both of them are compared with each other and the diffraction patterns after the interposition are compared with each other. Adjusting the position of the imaging lens. 13. The adjustment virtual field angle line of the effective light flux of the imaging lens and the center of the minute aperture of the first light flux regulating member coincide with or substantially coincide with each other in the radial plane of the optical system including the imaging lens. As described above, the first position adjusting step of positioning the first light flux regulating member inside the apparatus main body, and the light of the wave light illumination means that emits the wave light with the center of the minute opening of the first light flux regulating member. A second position adjusting step of adjusting and positioning the position of the wave light illuminating means by using a diffraction pattern so as to match or substantially match the axis, and a position where the first light flux regulating member is arranged. A second light flux restricting member is disposed inside or outside the device main body on the adjusted virtual angle of view line different from, and the center of the minute opening of the second light flux restricting member and the wave light illumination means. The optical axis of the light flux of As described above, the third position adjusting step of adjusting and positioning the position of the second light flux regulating member, and the step of arranging the imaging lens on the adjusted virtual angle-of-view line and interposing the imaging lens therebetween A fourth position adjusting step of comparing the diffraction pattern with the diffraction pattern after the interposition and adjusting the position of the imaging lens so that both diffraction patterns match or substantially match each other. Position adjustment method of imaging lens. 14. An adjustment virtual field angle line of an effective light flux of the imaging lens and a center of a minute opening of the first light flux regulating member coincide with each other in a tangential surface and a radial surface of an optical system including the imaging lens. Or, a first position adjusting step of positioning the first light flux regulating member inside the apparatus main body so that they substantially coincide with each other, and a wave light that emits a wave light with the center of the minute opening of the first light flux regulating member. A second position adjusting step of adjusting and positioning the position of the wave light illuminating means using a diffraction pattern so that the optical axis of the illuminating means coincides or substantially coincides with the first light flux regulating member. A second light flux regulating member is disposed inside or outside the device body on the adjusted virtual angle-of-view line different from the installed position, and the center of the minute opening of the second light flux regulating member and the above The optical axis of the luminous flux of the wave light illumination means A third position adjusting step of adjusting and positioning the position of the second light flux regulating member so as to match or substantially match, and the imaging lens is arranged on the adjusted virtual angle-of-view line. Comparing the diffraction pattern before interposing and the diffraction pattern after interposing, and adjusting the position of the imaging lens so that both diffraction patterns match or substantially match, a fourth position adjusting step A method for adjusting the position of an imaging lens, wherein 15. A wave light is emitted in a tangential plane of an optical system including an imaging lens and on an adjustment virtual field angle line of an effective light beam on either side of the entrance and exit of the imaging lens. The wave light illuminating means and the imaging lens are disposed in the tandem surface on the opposite side of the wave light illuminating means and on the adjustment virtual field angle line of the effective light flux of the image forming lens. The first light flux restricting member having a minute opening for restricting the wave light emitted from the wave light illuminating means and the wave light illuminating means arranged on either side of the entrance and exit of the imaging lens are opposite. Adjustment of the effective light flux on the side, which is generated by the second light flux regulating member having at least one minute aperture for regulating the undulating light disposed on the virtual angle line of view, and the first and second light flux regulating members Receives and displays the diffraction pattern An image forming lens position adjusting device, comprising: a pattern display unit for adjusting the position of the image forming lens with respect to an incident light beam; 16. A wave which emits a wave light arranged in a radial plane of an optical system including an imaging lens and on an adjustment virtual field angle line of an effective light beam on either side of the entrance and exit of the imaging lens. The wave light disposed in the radial plane on the opposite side of the light illumination means and the wave light illumination means across the imaging lens and on the virtual line of view for adjusting the effective light flux of the imaging lens. A first light flux restricting member having a minute opening for restricting the wave light emitted from the illuminating means, and the wave light illuminating means arranged on either side of the entrance and exit of the imaging lens on the opposite side. Adjustment of effective light flux At least one second light flux regulating member disposed on the virtual angle of view line and having a minute opening for regulating the wave light, and diffraction generated by the first and second light flux regulating members Pattern to receive and display the pattern An image forming lens position adjusting device comprising: a display unit and an image forming lens adjusting unit for adjusting a position of the image forming lens with respect to an incident light beam. 17. A wave arranged in the tangential surface and radial surface of an optical system including an imaging lens and on an imaginary angle-of-view line for adjusting the effective light flux on either side of the entrance and exit of the imaging lens. A wave light illuminating means for emitting light and an imaginary angle line of adjustment of the effective light flux of the image forming lens in the tangential surface and the radial surface opposite to the wave light illuminating means sandwiching the image forming lens. A first light flux restricting member having a minute opening for restricting the wave light emitted from the wave light illuminating means, and the wave arranged on either side of the entrance and exit of the imaging lens. A second light flux regulating member having at least one fine aperture for regulating the undulating light, which is arranged on the virtual line of view for adjusting the effective light flux on the side opposite to the light illuminating means; Generated by the light flux regulating member of An image forming lens position adjusting device comprising: a pattern display unit for receiving and displaying the diffraction pattern and an image forming lens adjusting unit for adjusting the position of the image forming lens with respect to an incident light beam.