JPH08220734A - Thin film for pellicle - Google Patents
Thin film for pellicleInfo
- Publication number
- JPH08220734A JPH08220734A JP2312495A JP2312495A JPH08220734A JP H08220734 A JPH08220734 A JP H08220734A JP 2312495 A JP2312495 A JP 2312495A JP 2312495 A JP2312495 A JP 2312495A JP H08220734 A JPH08220734 A JP H08220734A
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- thin film
- film
- pellicle
- obtd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は非晶質含フッ素重合体を
延伸することにより弾性率を高めたペリクル用薄膜に関
するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pellicle thin film having an elastic modulus increased by stretching an amorphous fluoropolymer.
【0002】[0002]
【従来の技術】半導体製造分野における微細化の進展に
伴い、マイクロリソグラフィに用いられる光の波長が短
波長へとシフトしてきている。従来、g線およびi線を
光源とするマイクロリソグラフィにおいてニトロセルロ
ース系の材料が製膜性の良さおよび薄膜強度の点からフ
ォトマスク防塵カバー(ペリクル)用薄膜として用いら
れてきた。しかし、近年、さらに短波長のエキシマレー
ザへと移行しつつあるため、このエキシマレーザにより
破壊してしまうニトロセルロース系の材料では使用不可
能である。2. Description of the Related Art With the progress of miniaturization in the field of semiconductor manufacturing, the wavelength of light used for microlithography has shifted to a short wavelength. Conventionally, in microlithography using g-line and i-line as a light source, a nitrocellulose-based material has been used as a thin film for a photomask dustproof cover (pellicle) in terms of good film-forming property and thin film strength. However, in recent years, since the excimer laser having a shorter wavelength is being used, it is impossible to use a nitrocellulose-based material that is destroyed by the excimer laser.
【0003】そこで特開平3−67262には可視光線
のみならず紫外光においても透過率の高い主鎖に環構造
を有する含フッ素重合体が有用であることが記載されて
いる。しかし、通常、ペリクル用薄膜は1μ以下の薄膜
であり、また、この非晶質含フッ素重合体はニトロセル
ロースに比べて柔らかいために、付着した異物を除去す
るためのエアブローにより局所的に膜が伸びて点状の跡
が残る場合がある。このような跡は異物の付着と同様に
光が散乱する原因となり好ましくない。Therefore, JP-A-3-67262 describes that a fluoropolymer having a ring structure in the main chain, which has a high transmittance not only for visible light but also for ultraviolet light, is useful. However, the pellicle thin film is usually a thin film having a thickness of 1 μm or less, and since this amorphous fluoropolymer is softer than nitrocellulose, the film is locally blown by an air blow to remove adhering foreign matters. It may stretch and leave a dot-like mark. Such traces are not preferable because they cause light scattering as well as the adhesion of foreign matter.
【0004】[0004]
【発明が解決しようとする課題】本発明は、前述のよう
な非晶質含フッ素重合体の弾性率を高め、エアブローに
対する耐性を有するペリクル用薄膜を新規に提供するこ
とを目的とする。SUMMARY OF THE INVENTION It is an object of the present invention to newly provide a thin film for a pellicle which has an elastic modulus of the above-mentioned amorphous fluoropolymer and has resistance to air blow.
【0005】[0005]
【課題を解決するための手段】本発明者は、上記問題点
の認識に基づいて鋭意検討を重ねた結果、非晶質含フッ
素重合体を延伸することにより光線透過率を損なわずに
弾性率を上げ、エアブローに対する耐久性を有するペリ
クル用薄膜が得られることを見いだした。本発明は、延
伸された非晶質含フッ素重合体からなることを特徴とす
るペリクル用薄膜である。Means for Solving the Problems The inventors of the present invention have conducted extensive studies based on the recognition of the above problems, and as a result, stretched the amorphous fluoropolymer to obtain elastic modulus without impairing light transmittance. It was found that a pellicle thin film having durability against air blow was obtained. The present invention is a pellicle thin film comprising a stretched amorphous fluorine-containing polymer.
【0006】本発明における非晶質含フッ素重合体とし
ては、主鎖に環構造を有する含フッ素重合体が好まし
い。主鎖に環構造を有する含フッ素重合体としては、含
フッ素環構造を有するモノマーを重合して得られるもの
や、少なくとも2つの重合性二重結合を有する含フッ素
モノマーを環化重合して得られる主鎖に環構造を有する
重合体が公知あるい周知のものを含めて広範囲にわたっ
て例示される。The amorphous fluoropolymer in the present invention is preferably a fluoropolymer having a ring structure in its main chain. The fluorine-containing polymer having a ring structure in the main chain is obtained by polymerizing a monomer having a fluorine-containing ring structure, or obtained by cyclopolymerizing a fluorine-containing monomer having at least two polymerizable double bonds. The polymer having a ring structure in the main chain is exemplified in a wide range including known and well-known polymers.
【0007】少なくとも2つの重合性二重結合を有する
含フッ素モノマーを環化重合して得られる主鎖に環構造
を有する重合体は、特開昭63−238111や特開昭
63−238115等により知られている。すなわち、
パーフルオロ(アリルビニルエーテル)やパーフルオロ
(ブテニルビニルエーテル)等のモノマーの単独重合、
またはテトラフルオロエチレンなどのラジカル重合性モ
ノマーと共重合することにより得られる。Polymers having a ring structure in the main chain obtained by cyclopolymerization of a fluorine-containing monomer having at least two polymerizable double bonds are disclosed in JP-A-63-238111 and 63-238115. Are known. That is,
Homopolymerization of monomers such as perfluoro (allyl vinyl ether) and perfluoro (butenyl vinyl ether),
Alternatively, it can be obtained by copolymerizing with a radically polymerizable monomer such as tetrafluoroethylene.
【0008】また、含フッ素環構造を有するモノマーを
重合して得られる主鎖に環構造を有する重合体は、特公
昭63−18964等により知られている。すなわち、
パーフルオロ(2,2−ジメチル−1,3−ジオキソー
ル)などの含フッ素環構造を有するモノマーを単独重合
ないし、テトラフルオロエチレンなどのラジカル重合性
モノマーと共重合することにより得られる。A polymer having a ring structure in its main chain, which is obtained by polymerizing a monomer having a fluorine-containing ring structure, is known from Japanese Examined Patent Publication No. 63-18964. That is,
It can be obtained by homopolymerizing a monomer having a fluorine-containing ring structure such as perfluoro (2,2-dimethyl-1,3-dioxole) or by copolymerizing with a radical polymerizable monomer such as tetrafluoroethylene.
【0009】また、パーフルオロ(2,2−ジメチル−
1,3−ジオキソール)等の含フッ素環構造を有するモ
ノマーとパーフルオロ(アリルビニルエーテル)やパー
フルオロ(ブテニルビニルエーテル)等の少なくとも2
つの重合性二重結合を有する含フッ素モノマーを共重合
して得られる重合体でもよい。Further, perfluoro (2,2-dimethyl-
A monomer having a fluorine-containing ring structure such as 1,3-dioxole) and at least 2 such as perfluoro (allyl vinyl ether) or perfluoro (butenyl vinyl ether)
It may be a polymer obtained by copolymerizing a fluorine-containing monomer having one polymerizable double bond.
【0010】延伸によりペリクル用薄膜の強度が増大す
る理由は明白でないが、おそらく膜厚方向にあり、膜の
強度に寄与しない分子鎖が延伸により膜厚方向に対し垂
直方向に配列することにより、膜の強度に寄与する分子
鎖の割合が増加するためと考えられる。ペリクル用薄膜
はこの薄膜とアルミなどの金属製支持枠からなるペリク
ルとして用いられる。The reason why the strength of the thin film for pellicle increases by stretching is not clear, but it is probably in the film thickness direction, and molecular chains that do not contribute to the strength of the film are arranged in the direction perpendicular to the film thickness direction by stretching, It is considered that this is because the proportion of molecular chains that contribute to the strength of the membrane increases. The pellicle thin film is used as a pellicle composed of this thin film and a metal support frame such as aluminum.
【0011】延伸方法としては、一軸延伸、二軸延伸な
ど公知の方法が採用される。例えば、一軸延伸の例とし
て、スピンコート法により基板上に非晶質含フッ素重合
体からなる薄膜を製膜した後、基板より剥離し、重合体
の軟化温度(ガラス転移温度)以下の温度で薄膜の両端
を冶具に固定して、10〜200mm/minの速度で
引っ張る。これにより中心部がくびれるいわゆるネッキ
ングが起こり、伸びた部分が両端に拡がって行き最終的
には全体が伸びる。このように冷延伸された非晶質含フ
ッ素重合体の薄膜は弾性率が増加して、エアブローに対
する耐久性が向上する。As the stretching method, known methods such as uniaxial stretching and biaxial stretching are adopted. For example, as an example of uniaxial stretching, a thin film made of an amorphous fluoropolymer is formed on a substrate by a spin coating method, then peeled from the substrate, and the temperature is lower than the softening temperature (glass transition temperature) of the polymer. Both ends of the thin film are fixed to a jig and pulled at a speed of 10 to 200 mm / min. As a result, so-called necking occurs in which the central portion is constricted, and the extended portion spreads to both ends and finally the whole extends. The amorphous fluoropolymer thin film thus cold-drawn has an increased elastic modulus and improved durability against air blow.
【0012】二軸延伸の方法としては、薄膜の四方また
は八方に同時に冷延伸する方法や凸型、凹型に吸引付着
させながら延伸する真空成形法も適用可能である。真空
成形法には、ストレート、ドレープ法、マッチモールド
法、エアースリップ法、プラグアシスト法、プレッシャ
ーバブル・プラグアシスト法、真空・スナップバッグ
法、プレッシャーバブル・スナップバッグ法、熱板接触
圧空法などがある。As the biaxial stretching method, a method of simultaneously cold stretching in four or eight directions of the thin film and a vacuum forming method of stretching while suction-adhering to a convex shape or a concave shape can be applied. Vacuum forming methods include straight, drape method, match mold method, air slip method, plug assist method, pressure bubble plug assist method, vacuum snap bag method, pressure bubble snap bag method, hot plate contact pressure air method, etc. is there.
【0013】[0013]
「合成例」パーフルオロ(ブテニルビニルエーテル)3
0g、イオン交換水の120gおよび重合開始剤として
((CH3 )2 CHOCOO)2 の50mgを、内容積
200mlの耐圧ガラス製オートクレーブに入れた。系
内を3回窒素で置換した後、40℃で22時間懸濁重合
を行った。得られた重合物を100℃で20時間真空乾
燥後、N2 /F2 混合ガス雰囲気中、250℃で5時間
処理した。その結果、重合体を26g得た(以下、この
重合体を重合体Aという)。"Synthesis example" Perfluoro (butenyl vinyl ether) 3
0 g, 120 g of ion-exchanged water and 50 mg of ((CH 3 ) 2 CHOCOO) 2 as a polymerization initiator were placed in a pressure-resistant glass autoclave having an internal volume of 200 ml. After purging the system with nitrogen three times, suspension polymerization was carried out at 40 ° C. for 22 hours. The resulting polymer was vacuum dried at 100 ° C. for 20 hours and then treated at 250 ° C. for 5 hours in a N 2 / F 2 mixed gas atmosphere. As a result, 26 g of a polymer was obtained (hereinafter, this polymer is referred to as polymer A).
【0014】重合体Aの固有粘度[η]は、パーフルオ
ロ(2−ブチルテトラヒドロフラン)中30℃で0. 5
8であった。重合体Aのガラス転移点は108℃であ
り、室温ではタフで透明なガラス状の重合体であった。
光線透過率は波長250〜700nmにおいて95%以
上および200〜250nmにおいて90%以上と高か
った。The intrinsic viscosity [η] of the polymer A is 0.5 at 30 ° C. in perfluoro (2-butyltetrahydrofuran).
It was 8. The glass transition point of the polymer A was 108 ° C., and it was a tough and transparent glassy polymer at room temperature.
The light transmittance was 95% or higher at wavelengths of 250 to 700 nm and 90% or higher at wavelengths of 200 to 250 nm.
【0015】「実施例」合成例の重合体Aをパーフルオ
ロトリブチルアミンで溶解して6.5%溶液とした。精
密研磨したソーダガラスを基板として用いて500rp
m/10secおよび2500rpm/20secの条
件でスピンコートした。180℃、1時間乾燥すると膜
厚1.58μmの薄膜が得られた。ガラス基板より薄膜
を剥離し、膜の両端を引っ張り、延伸すると厚さが0.
86μmとなった。"Example" The polymer A of the synthesis example was dissolved in perfluorotributylamine to obtain a 6.5% solution. 500 rp using precision polished soda glass as a substrate
Spin coating was performed under the conditions of m / 10 sec and 2500 rpm / 20 sec. When dried at 180 ° C. for 1 hour, a thin film having a film thickness of 1.58 μm was obtained. When the thin film is peeled from the glass substrate, both ends of the film are pulled and stretched, the thickness becomes
It became 86 μm.
【0016】次に、この延伸膜を直径15cmの円形の
アルミ製の支持枠に接着剤で固定した。これにノズル径
が0.65mmで所定の圧力のエアーガンを用いて、膜
面より10mmの距離からエアブローを20sec行っ
たとき、膜にできる点状の跡の有無を調べた。結果を表
1に示す。Next, the stretched film was fixed to a circular aluminum support frame having a diameter of 15 cm with an adhesive. An air gun having a nozzle diameter of 0.65 mm and a predetermined pressure was used for this, and when air blowing was performed for 20 seconds from a distance of 10 mm from the film surface, the presence or absence of dot-like marks on the film was examined. The results are shown in Table 1.
【0017】「比較例」比較例として重合体Aの未延伸
の0.86μの膜について実施例と同様なエアブローテ
ストを行った。結果を表1に示す。"Comparative Example" As a comparative example, an unstretched 0.86 µ film of the polymer A was subjected to the same air blow test as in the example. The results are shown in Table 1.
【0018】[0018]
【表1】 [Table 1]
【0019】[0019]
【発明の効果】本発明の延伸されたペリクル用薄膜はエ
アブローに対する膜強度が高く、かつ紫外光に対する透
明性、耐久性が高いため、g線、i線はもちろんエキシ
マレーザ用のペリクル用薄膜としても有用である。Since the stretched thin film for pellicle of the present invention has high film strength against air blow, and high transparency and durability against ultraviolet light, it can be used as a thin film for pellicle not only for g-line and i-line but also for excimer laser. Is also useful.
Claims (3)
ことを特徴とするペリクル用薄膜。1. A thin film for a pellicle, comprising a stretched amorphous fluorine-containing polymer.
する含フッ素重合体である請求項1のペリクル用薄膜。2. The thin film for a pellicle according to claim 1, wherein the amorphous fluoropolymer is a fluoropolymer having a ring structure in its main chain.
枠からなるペリクル。3. A pellicle comprising a pellicle thin film according to claim 1 and a support frame.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2312495A JPH08220734A (en) | 1995-02-10 | 1995-02-10 | Thin film for pellicle |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2312495A JPH08220734A (en) | 1995-02-10 | 1995-02-10 | Thin film for pellicle |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH08220734A true JPH08220734A (en) | 1996-08-30 |
Family
ID=12101772
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2312495A Pending JPH08220734A (en) | 1995-02-10 | 1995-02-10 | Thin film for pellicle |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH08220734A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG87830A1 (en) * | 1998-09-22 | 2002-04-16 | Mitsui Chemicals Inc | Pellicle, method of preparing the same and exposure method |
JP2004537070A (en) * | 2001-07-26 | 2004-12-09 | マイクロ リソグラフィー, インコーポレイテッド | Photomask coated with fluoropolymer for photoengraving |
-
1995
- 1995-02-10 JP JP2312495A patent/JPH08220734A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG87830A1 (en) * | 1998-09-22 | 2002-04-16 | Mitsui Chemicals Inc | Pellicle, method of preparing the same and exposure method |
JP2004537070A (en) * | 2001-07-26 | 2004-12-09 | マイクロ リソグラフィー, インコーポレイテッド | Photomask coated with fluoropolymer for photoengraving |
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