JPH08211197A - Curved total-reflection mirror device - Google Patents

Abstract

PURPOSE: To allow the focus and direction of X rays to be regulated quickly and easily. CONSTITUTION: This is a curved total-reflection mirror device 11 which concentrates X rays outputted from an X-ray source on a focus on an X-ray detecting means with two curved total-reflection mirrors. A first mirror device 16 having a first curved total-reflection mirror 12 and a second mirror device 17 having a second curved total-reflection mirror 13 are held on a single substrate 14 with the positional relation of the optical axis of each of the curved total-reflection mirrors 12 and 13 regulated. Moreover, the substrate 14 is installed on a substrate adjusting mechanism 41, which changes the direction of the substrate 14 to regulate the irradiation direction of X rays.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a curved total reflection mirror device for focusing X-rays emitted from an X-ray source on a focal point on an X-ray detecting means by a curved total reflection mirror.

[0002]

2. Description of the Related Art FIG. 3 is a perspective view showing a schematic structure of a curved total reflection mirror device. This curved total reflection mirror device
The divergent X-rays 1 emitted from the X-ray source F1 are detected by two curved total reflection mirrors, a first mirror 2 arranged in the vertical direction and a second mirror 3 arranged in the horizontal direction. The point F2 on the means 4 is focused. As the X-ray detection means 4, an X-ray film, an imaging plate using a phosphor layer for accumulating X-rays, other position-sensitive X-ray detectors, etc. are used. Reference numeral 5 in the figure is a sample to which the X-ray 1 condensed by each of the mirrors 2 and 3 is irradiated. Three micrometers (not shown) are connected to and supported by the first mirror 2 and the second mirror 3 so that parallel movement and fine adjustment of the tilt angle can be performed.

Between the X-ray source F1 and the first mirror 2 and the second
First and second slits 6 and 7 (see FIGS. 4 and 5) for cutting unnecessary scattered X-rays are arranged between the mirror 3 and the sample 5, respectively. As shown in FIG. 4, the first slit 6 includes a right slit portion 6A and a left slit portion 6B which are arranged so as to be slidable on the left and right sides independently,
As shown in FIG. 5, it is composed of an upper slit portion 6C and a lower slit portion 6D which are arranged so as to be slidable vertically. The second slit 7 is also similar to the first slit 6, and as shown in FIG. 4, a right slit portion 7A and a left slit portion 7B, which are arranged so as to be slidable to the left and right independently of each other, As shown in Fig. 7, the upper slit portion 7C is arranged so that it can slide up and down independently of each other.
And a lower slit portion 7D.

The curved total reflection mirror device having the above-described structure is used for measuring scattering in a small angle region because of its excellent small angle resolution, and it can be used for measuring a supramolecular structure of a living body such as a virus, a biological membrane or a muscle. It is widely used in research and structural studies of fibrous biopolymers and synthetic polymers.

In this curved total reflection mirror device, the focus F2
It is necessary to finely adjust the curved state and installation position of the first and second mirrors 2 and 3 in order to adjust the position. For this reason, conventionally, the mirrors 2 and 3 are mounted independently of each other, and the mirrors 2 and 3 are respectively equipped with a vent mechanism, a mirror rotation mechanism, and a translation mechanism (none of which are shown). In the curved total reflection mirror device, the focus is adjusted by using these mechanisms as shown in FIGS. 4 to 6. 4 is a schematic plan view showing an X-ray adjustment state by the first mirror 2, and FIG. 5 is an X-ray by the second mirror 3.
FIG. 6 is a schematic plan view showing the adjustment state of the X-ray, and FIG. 6 is a schematic view showing the state of the X-ray gradually adjusted by the first and second mirrors 2 and 3.

First, the second mirror 3 is removed. In this state, the right slit portion 6A, the upper slit portion 6C and the lower slit portion 6D of the first slit 6 are fully opened. By adjusting the right slit portion 6A, the direct beam B1 on the X-ray detection means 4 by the divergent X-rays 1 from the X-ray source F1 is made into a square shape with one side of about 10 mm as shown in FIG. 6 (A). To do.

The tilt angle of the first mirror 2 is finely adjusted by a micrometer to find a thin line-shaped reflected beam B2 as shown in FIG. 6 (A). Then, the left slit portion 6B
Is gradually closed, and the direct beam B1 is gradually narrowed as shown in FIG. 6B, and is narrowed so as to have the same intensity as the reflected beam B2 as shown in FIG. 6C. Each beam B at this time
It is suitable that the distance between 1 and B2 is about 5 mm. When the balance of the intensities of the beams B1 and B2 becomes unbalanced, the first mirror 2 and the first slit 6 are finely adjusted by a micrometer or the like each time to correct. At this time, the position of the reflected beam B2 is adjusted according to the position of the sample 5 to be irradiated. In this state, the right slit portion 6A and the reflected beam B2 are closed to a position just before weakening. This completes the adjustment of the first mirror 2.

Then, the second mirror 3 is adjusted. The adjustment of the second mirror 3 is almost the same as that of the first mirror 2 except for the difference between the horizontal direction and the vertical direction. Specifically, first, the second mirror 3 is attached, and as shown in FIG. 5, the second mirror 3, the upper slit portion 6C and the lower slit portion 6D of the first slit 6, and the upper slit portion 7C of the second slit 7. By adjusting the lower slit portion 7D and the lower slit portion 7D, respectively, the beams B1 and B2 are narrowed from the state of FIG. 6C as shown in FIGS. 6D, 6E, and 6F, and the upper left portions of FIG. It is adjusted so that the sample 5 is irradiated with the beam.

[0009]

By the way, when the measurement is performed by the curved total reflection mirror device, the first mirror 2 and the second mirror 3 which are independent from each other are individually adjusted as described above. It must be adjusted so that the sample 5 is irradiated with the X-ray 1 at the upper left of 6 (F).

However, in the case of adjusting the first mirror 2 and the second mirror 3, after adjusting the first mirror 2 and the second mirror 3, fine adjustment of the first mirror 2 results in the second The optical axis incident on the mirror 3 is displaced, and the second mirror 3 must be readjusted again. In addition, the X-ray 1 adjusted by the mirrors 2 and 3 must strike the sample 5 accurately. For this reason, it takes a lot of time and effort to make adjustments, and there has been a demand for a system that can be easily adjusted in a shorter time.

The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a curved total reflection mirror device capable of easily adjusting X-rays in a short time.

[0012]

A curved total reflection mirror device according to the present invention is a curved total reflection mirror for focusing X-rays emitted from an X-ray source on a focal point on an X-ray detection means by two curved total reflection mirrors. A reflection mirror device, wherein the two curved total reflection mirrors are held on a single substrate in a state in which the positional relationship of their optical axes is adjusted, and the direction of the substrates is changed to change the X-ray irradiation direction. It is characterized by having a substrate adjusting mechanism capable of adjusting.

[0013]

In the curved total reflection mirror device according to the present invention, since two curved total reflection mirrors are held on a single substrate in a pre-adjusted state, only a final fine adjustment is required. After the final fine adjustment, the substrate adjustment mechanism adjusts the direction of the substrate to adjust the X-ray irradiation direction. As a result, each curved total reflection mirror can be easily adjusted in a short time.

[0014]

An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 shows a curved total reflection mirror device according to the present invention.

[Structure] In the curved total reflection mirror device 11 of this embodiment, as described in the prior art, the X-rays emitted from the X-ray source are converted into two curved total reflection mirrors 12 and 13.
This is a device for focusing on the focal point on the X-ray detection means by.

The two curved total reflection mirrors 12 and 13 have a single substrate 14 in a state where the positional relationship of their optical axes is adjusted.
Is held on. That is, the first curved total reflection mirror 12
The vertical direction of the X-rays is narrowed down by the X-rays, and the X-rays narrowed down in the vertical direction are incident on the second curved total reflection mirror 13 and narrowed down in the horizontal direction so as to focus each at a desired focus position in advance. With the positional relationship between the total reflection mirrors 12 and 13 set, the substrate 14
Attached to. The substrate 14 is formed into a shape in which two flat plates of a vertical wall portion 14A and a horizontal wall portion 14B are matched with each other in an L-shaped cross section. The first curved total reflection mirror 12 is provided on the substrate 14.
Including a first mirror device 16 and a second curved total reflection mirror 1
The second mirror device 17 including 3 is attached at an angle of 90 degrees to each other.

The first mirror device 16 is a first curved total reflection mirror 1 mounted on the vertical wall portion 14A of the substrate 14 with both ends supported by two pillow bars 19A and 19B.
2, a vent mechanism section 20 for pressing the central portion of the first curved total reflection mirror 12 to adjust the radius of curvature of the reflection surface 12A of the mirror 12, and a lateral width of X-rays incident from the left side in FIG. And a slit mechanism section 21 for adjusting.

The vent mechanism 20 includes a contact piece 23 that contacts the reflecting surface 12A of the first curved total reflection mirror 12 and the substrate 1.
Abutting piece 23 in a state of being fixedly supported on the lateral wall portion 14B side of No. 4
And a micrometer 24 that abuts against the reflecting surface 12A of the first curved total reflection mirror 12 and presses it to change the curvature of the reflecting surface 12A to adjust the focus. A cutout portion 23A is provided in the center of the contact surface of the contact piece 23 with respect to the reflection surface 12A.
Through the second curved total reflection mirror 13.

The slit mechanism portion 21 is disposed on the X-ray source side of the contact piece 23 and is closely spaced from the reflecting surface 12A to adjust the optical path width of the X-ray, and the lateral wall portion of the substrate 14. The shutter 26 is fixedly supported on the 14B side and is supported by the micrometer 27 that moves the shutter 26 close to and away from the reflecting surface 12A.

The second mirror device 17 is a second curved total reflection mirror 1 mounted on the lateral wall portion 14B of the substrate 14 with both ends supported by two pillow bars 31A and 31B.
3, a vent mechanism 32 that presses the central portion of the second curved total reflection mirror 13 to adjust the radius of curvature of the reflecting surface 13A of the second curved total reflection mirror 13, and is incident from the first mirror device 16 side. Slit mechanism unit 33 for adjusting the vertical width of X-rays
It consists of and.

The vent mechanism 32 includes a contact piece 34 that contacts the reflecting surface 13A of the second curved total reflection mirror 13 and the substrate 1.
4 in the state of being fixedly supported on the vertical wall portion 14A side
Of the second curved total reflection mirror 13 and abutting it against the reflecting surface 13A of the second curved total reflection mirror 13 to change the curvature of the reflecting surface 13A and adjust the focus. In the contact surface of the contact piece 34 with respect to the reflection surface 13A, the cutout portion 2 of the contact piece 23 on the side of the first mirror device 16 is formed in the center thereof.
A cutout 34A similar to 3A is provided.

The slit mechanism section 33 is provided on the side of the first mirror device 16 of the contact piece 34 and is closely spaced from the reflecting surface 13A to adjust the optical path width of the X-ray, and a shutter 38.
It is composed of a micrometer 39 that supports the shutter 38 while being fixedly supported on the vertical wall portion 14A side of the substrate 14 and moves the shutter 38 close to and away from the reflecting surface 13A.

First mirror device 1 configured as described above
Substrate 14 to which 6 and the second mirror device 17 are attached
Is attached to a substrate adjusting mechanism 41 that adjusts the direction of the substrate 14 to adjust the X-ray irradiation direction. The substrate adjusting mechanism 41 includes a horizontal moving mechanism unit 42 for moving the substrate 14 in the horizontal direction, and a vertical moving mechanism unit for vertically moving the substrate 14 by vertically moving the horizontal moving mechanism unit 42. 43 and a rotation mechanism portion 44 that rotates the substrate 14 as a result by rotating the vertical movement mechanism portion 43.

The horizontal movement mechanism section 42 is arranged in parallel on the upper surface of the base plate section 46 and the base plate section 46 which is horizontally arranged with the board 14 placed thereon, and is capable of sliding the board 14. Two rail portions 47A and 47B that are supported on the base plate portion 46 side, and a retractable rod portion 48A that is fixed to the base plate portion 46 side is supported on the substrate 14 side.
And a micrometer 48 that moves in the B direction.

The vertical movement mechanism 43 includes a vertical plate portion 51 vertically arranged with the base plate portion 46 on which the substrate 14 is placed supported, and one side surface of the vertical plate portion 51 (in FIG. 1). Two rail portions 52A and 52B which are arranged in parallel on the right side surface of the base plate 46 and slidably support the base plate portion 46 in the vertical direction,
A retractable rod portion 53A fixed to the vertical plate portion 51 side is composed of a micrometer 53 for moving the base plate portion 46 in the rail portions 52A, 52B direction.

The rotation mechanism section 44 includes a support column 61 for rotatably supporting the vertical plate section 51 of the vertical movement mechanism section 43, and a drive section fixed to the support column section 61 for rotationally driving the vertical plate section 51. (Not shown). The lower end of the support column 61 is supported by the support plate 62.

The first mirror device 16 and the second mirror device 17 are sealed in a container (not shown) and filled with helium.

[Operation] In the curved total reflection mirror device 11 configured as described above, for the X-ray from the X-ray light source,
Curved total reflection mirrors 12, 13 of each mirror device 16, 17
Follow the procedure below to adjust.

Since the positional relationship of the optical axes of the curved total reflection mirrors 12 and 13 of each mirror device 16 and 17 is adjusted in advance, the positional relationship between the curved total reflection mirror device 11 and the X-ray source and the curve. The positional relationship between the total reflection mirror device 11 and the X-ray detection means is adjusted. After that, each vent mechanism 2
0, 32 and slit mechanisms 21, 33 are finely adjusted to precisely focus the X-rays by finely adjusting the respective micrometers 24, 27, 35, 39, and the horizontal adjustment mechanism 42 of the substrate adjustment mechanism 41 and the vertical movement mechanism. The direction of the substrate 14 is adjusted by finely adjusting the micrometer 48, 53, etc. of the section 43 and the rotation mechanism section 44, and the direction of the X-ray is adjusted by this to focus on the X-ray detection means.

[Effect] As described above, each mirror device 1
Since the curved total reflection mirrors 12 and 13 of 6 and 17 are integrally attached to the substrate 14 in a state in which the positional relationship of their optical axes is adjusted in advance, the focus and direction of X-rays can be adjusted in a short time and. It will be extremely easy to do.

Further, since the structures of the first mirror device 16 and the second mirror device 17 can be simplified and the entire structure can be made compact, the volume for replacing helium can be reduced.

Further, since the first mirror device 16 and the second mirror device 17 are attached to one substrate 14, the deviation of the optical system due to thermal expansion can be suppressed to the minimum.

[Modification] (1) In the above embodiment, each curved total reflection mirror 12 is used as the vent mechanism section 20, 32 for adjusting the radius of curvature of each curved total reflection mirror 12, 13 of each mirror device 16, 17. ，
Although the contact pieces 23 and 34 and the micrometers 24 and 35 that press the central portion of 13 are used, as shown in FIG. 2, a vent mechanism portion 66 that presses both ends of the curved total reflection mirror 65.
May be used. The vent mechanism portion 66 has a lower end portion that abuts on upper end portions of the curved total reflection mirror 65 supported by the pillow rod portions 68A and 68B on the substrate 67 side.
And the leaf spring 69 laid over the contact piece 67.
And a pressing screw 7 that presses the central portion of the leaf spring 69 and elastically presses the curved total reflection mirror 65 via the contact piece 67.
0.

(2) Further, the vent mechanism parts 20, 32
Is the reflecting surface 12A, 1 of each curved total reflection mirror 12, 13.
Although the radius of curvature of 3A is adjusted, the curved total reflection mirrors 12 and 13 may be rotated as described in the conventional technique.

(3) Further, the slit mechanism parts 21, 3
As described in the above-mentioned conventional technique, 3 may be provided with four shutters vertically and horizontally and left and right.

[0036]

As described above in detail, according to the curved total reflection mirror device of the present invention, the two curved total reflection mirrors are formed on a single substrate with the positional relationship of their optical axes adjusted. Since the substrate adjustment mechanism is provided which is held on the substrate and can adjust the X-ray irradiation direction by changing the direction of the substrate, the focus and direction of the X-ray can be adjusted in a short time and very easily. Like

[Brief description of drawings]

FIG. 1 is a perspective view showing a curved total reflection mirror device of the present invention.

FIG. 2 is an enlarged view of a main part showing a modified example.

FIG. 3 is a perspective view showing a schematic configuration of a curved total reflection mirror device.

FIG. 4 is a schematic diagram showing a beam adjustment state by a first curved total reflection mirror.

FIG. 5 is a schematic diagram showing a beam adjustment state by a second curved total reflection mirror.

FIG. 6 is a schematic diagram showing a state of a beam by the first and second curved total reflection mirrors.

[Description of Reference Signs] 11 ... Curved total reflection mirror device, 12 ... First curved total reflection mirror, 13 ... Second curved total reflection mirror, 14 ... Substrate, 16
... first mirror device, 17 ... second mirror device, 20, 32
... Vent mechanism part 21, 33 ... Slit mechanism part, 41 ...
Substrate adjustment mechanism, 42 ... Horizontal movement mechanism section, 43 ... Vertical movement mechanism section, 44 ... Rotation mechanism section.

Claims (1)

[Claims] 1. A curved total reflection mirror device for converging X-rays emitted from an X-ray source to a focal point on an X-ray detection means by two curved total reflection mirrors, wherein the two curved total reflection mirrors. , Which is held on a single substrate in a state in which the positional relationship of the optical axes thereof is adjusted, and which is provided with a substrate adjusting mechanism capable of adjusting the X-ray irradiation direction by changing the direction of the substrate. Total reflection mirror device.