JPH08207331A - Thermal head - Google Patents

Thermal head

Info

Publication number
JPH08207331A
JPH08207331A JP1480795A JP1480795A JPH08207331A JP H08207331 A JPH08207331 A JP H08207331A JP 1480795 A JP1480795 A JP 1480795A JP 1480795 A JP1480795 A JP 1480795A JP H08207331 A JPH08207331 A JP H08207331A
Authority
JP
Japan
Prior art keywords
thin film
film layer
heat
layer
heating resistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1480795A
Other languages
Japanese (ja)
Other versions
JP3476945B2 (en
Inventor
Tetsuharu Hyodo
徹治 兵頭
Tsuyoshi Yasutomi
強 安富
Kazuhiro Watanabe
和宏 渡邉
Katsumasa Kutsuzawa
功昌 沓澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP1480795A priority Critical patent/JP3476945B2/en
Publication of JPH08207331A publication Critical patent/JPH08207331A/en
Application granted granted Critical
Publication of JP3476945B2 publication Critical patent/JP3476945B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE: To provide a thermal head with excellent resistances to corrosion which can effectively prevent a resistance change of a heat-generating resistance body and form a predetermined image for a long time. CONSTITUTION: A heat-generating resistance body 2 is set on an electrically insulating substrate 1, and an Si3 N4 thin film layer 4, an SiO2 thin film layer 5, and a baked glass layer 6 are sequentially layered on the heat-generating resistance body 2. Although the oxygen in the baked glass layer 6 would come into touch with the heat-generating resistance body 2 when the baked glass layer 6 is formed, this is effectively prevented by the Si3 N4 thin film layer 4 and SiO2 thin film layer 5. Moreover, since the Si3 N4 thin film layer 4 itself does not include oxygen, a value of the electric resistance of the heat-generating resistance body 2 hardly changes even when the thermal head is used for a long time. Accordingly, printing images can be always formed good to heat- sensitive recording papers.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、ワードプロセッサやフ
ァクシミリ等のプリンタ機構として組み込まれるサーマ
ルヘッドの改良に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improvement of a thermal head incorporated as a printer mechanism for a word processor, a facsimile or the like.

【0002】[0002]

【従来の技術】従来、ワードプロセッサ等のプリンタ機
構として組み込まれるサーマルヘッドは、図2に示す如
く、アルミナセラミックス等からなる電気絶縁性基板1
1上に、窒化タンタル等からなる発熱抵抗体12と、ア
ルミニウム等からなる一対の導電層13と、焼成ガラス
からなる保護層14とを順次、積層した構造を有してお
り、前記一対の導電層13間に印字信号に基づいて所定
の電力を印加し、発熱抵抗体12を選択的にジュール発
熱させるとともに、該発熱した熱をプラテンローラ等に
よって押圧される感熱記録紙に伝導させ、感熱記録紙に
所定の印字画像を形成することによってサーマルヘッド
として機能する。
2. Description of the Related Art Conventionally, as shown in FIG. 2, a thermal head incorporated as a printer mechanism such as a word processor has an electrically insulating substrate 1 made of alumina ceramics or the like.
1 has a structure in which a heating resistor 12 made of tantalum nitride or the like, a pair of conductive layers 13 made of aluminum or the like, and a protective layer 14 made of baked glass are sequentially laminated. A predetermined electric power is applied between the layers 13 based on a print signal to selectively cause the heating resistor 12 to generate Joule heat, and the generated heat is conducted to the thermosensitive recording paper pressed by a platen roller or the like to generate thermosensitive recording. It functions as a thermal head by forming a predetermined print image on paper.

【0003】また前記保護層14は、発熱抵抗体12や
一対の導電層13を、感熱記録紙の摺接による摩耗や大
気中に含まれる水分等の接触による酸化腐食から保護す
るためのものであり、PbO(酸化鉛)、SiO2 (酸
化珪素)、B2 3 (酸化硼素)、BaO(酸化バリウ
ム)、CaO(酸化カルシウム)等を含む低軟化点ガラ
スをスクリーン印刷等の厚膜手法によって塗布及び焼成
(約500℃)することにより形成されていた。尚、前
記保護層14を形成するのに低軟化点ガラスを用いるの
は、ガラスの焼成温度が高すぎると、発熱抵抗体12等
が熱によって変形する危険性があるからであり、また前
記保護層14を厚膜手法によって形成するのは、発熱抵
抗体12上に被着される保護層14の表面を平坦にな
し、印字に際して感熱記録紙が保護層14に対して良好
に密着されるようになすためである。
The protective layer 14 protects the heating resistor 12 and the pair of conductive layers 13 from abrasion due to sliding contact of the thermal recording paper and oxidative corrosion due to contact with moisture contained in the atmosphere. Yes, thick film methods such as screen printing low softening point glass containing PbO (lead oxide), SiO 2 (silicon oxide), B 2 O 3 (boron oxide), BaO (barium oxide), CaO (calcium oxide), etc. It was formed by coating and baking (about 500 ° C.). The reason why the low softening point glass is used for forming the protective layer 14 is that there is a risk that the heating resistor 12 or the like is deformed by heat if the glass is burned at an excessively high temperature. The layer 14 is formed by a thick film technique so that the surface of the protective layer 14 deposited on the heat-generating resistor 12 is made flat so that the thermal recording paper can be well adhered to the protective layer 14 during printing. This is because

【0004】[0004]

【発明が解決しようとする課題】しかしながら、この従
来のサーマルヘッドにおいては、保護層14がガラスを
スクリーン印刷等の厚膜手法によって塗布及び焼成する
ことにより形成されていることから、保護層14を形成
する際、発熱抵抗体12上に塗布されたガラスに熱を印
加すると、発熱抵抗体12と保護層14との界面で保護
層14中に含まれている酸素が発熱抵抗体12側に拡散
し、発熱抵抗体12が大きく酸化腐食される。この結
果、発熱抵抗体12の電気抵抗値が大幅に変動し、感熱
記録紙に所定の印字画像を形成することが不可となる欠
点を有している。
However, in this conventional thermal head, the protective layer 14 is formed by coating and baking glass by a thick film technique such as screen printing. When heat is applied to the glass coated on the heating resistor 12 during formation, oxygen contained in the protective layer 14 diffuses to the heating resistor 12 side at the interface between the heating resistor 12 and the protective layer 14. However, the heating resistor 12 is largely oxidized and corroded. As a result, the electric resistance value of the heating resistor 12 fluctuates significantly, and it is impossible to form a predetermined print image on the thermal recording paper.

【0005】そこで上記欠点を解消するために、発熱抵
抗体12と保護層14との間に、熱が印加されても化学
的安定性を有した無機物材料、例えば、SiO2 (酸化
珪素)を介在させ、このSiO2 によって保護層14中
の酸素が発熱抵抗体12中に拡散するのを遮断すること
が考えられる。
In order to solve the above-mentioned drawbacks, therefore, an inorganic material, such as SiO 2 (silicon oxide), which is chemically stable even when heat is applied, is provided between the heating resistor 12 and the protective layer 14. It is conceivable to intervene and prevent the oxygen in the protective layer 14 from diffusing into the heating resistor 12 by this SiO 2 .

【0006】しかしながら、発熱抵抗体12と保護層1
4との間にSiO2 を介在させただけでは、発熱抵抗体
12の酸化腐食を完全に防止するには至らなかった。
However, the heating resistor 12 and the protective layer 1
The interposition of SiO 2 between the above and 4 did not completely prevent oxidative corrosion of the heating resistor 12.

【0007】即ち、発熱抵抗体12と保護層14との間
にSiO2 を介在させた場合、保護層14中の酸素が発
熱抵抗体12中に拡散することは防止されるようになる
ものの、SiO2 を構成する酸素が発熱抵抗体12との
界面付近で少しづつ拡散し、サーマルヘッドの使用が長
期にわたると、発熱抵抗体12の一部が前記界面付近で
の酸素の拡散によって酸化腐食されてしまい、その結
果、発熱抵抗体12の電気抵抗値が変化し、感熱記録紙
に印字画像の濃淡むら等が形成される欠点を有してい
た。
That is, when SiO 2 is interposed between the heating resistor 12 and the protective layer 14, oxygen in the protective layer 14 can be prevented from diffusing into the heating resistor 12. Oxygen forming SiO 2 diffuses little by little near the interface with the heating resistor 12, and if the thermal head is used for a long time, a part of the heating resistor 12 is oxidized and corroded by the diffusion of oxygen near the interface. As a result, the electric resistance value of the heating resistor 12 changes, and there is a drawback that unevenness in the printed image is formed on the thermosensitive recording paper.

【0008】また発熱抵抗体12と保護層14との間
に、酸素を含まない無機物材料、例えば、Si3 4
介在させることも考えられるが、この場合、保護層14
の形成時に熱が印加されると、Si3 4 自体が保護層
14中に含まれている酸素の拡散によって酸化され、そ
の緻密性が低下する。この結果、保護層14からの酸素
の拡散をSi3 4 によって遮断することができなくな
り、上述した従来のサーマルヘッドと同様、感熱記録紙
に所定の印字画像を形成することが不可となっていた。
It is also possible to interpose an oxygen-free inorganic material such as Si 3 N 4 between the heating resistor 12 and the protective layer 14. In this case, the protective layer 14 is used.
When heat is applied during the formation of Si, the Si 3 N 4 itself is oxidized by the diffusion of oxygen contained in the protective layer 14, and the denseness thereof is lowered. As a result, the diffusion of oxygen from the protective layer 14 cannot be blocked by Si 3 N 4 , and it is impossible to form a predetermined print image on the thermal recording paper as in the conventional thermal head described above. It was

【0009】更にこの場合、保護層14の形成時に熱が
印加されると、保護層14を形成するガラス中のPbO
とSi3 4 とが一部、化学反応を起こすことによって
窒素の気泡が発生し、この気泡が保護層14中に残って
しまうと、保護層14表面に気泡の形状に応じた凸部が
形成され、保護層14の表面平坦性が大きく損なわれる
こととなる。この結果、感熱記録紙をサーマルヘッドに
良好に密着させることができなくなり、印字画像の濃淡
むら等が形成される欠点が誘発されていた。
Further, in this case, when heat is applied during formation of the protective layer 14, PbO in the glass forming the protective layer 14 is formed.
And Si 3 N 4 partially react with each other to generate a bubble of nitrogen, and when the bubble remains in the protective layer 14, a convex portion corresponding to the shape of the bubble is formed on the surface of the protective layer 14. As a result, the surface flatness of the protective layer 14 is greatly impaired. As a result, the thermal recording paper cannot be brought into close contact with the thermal head in a good manner, which causes a defect that unevenness in the printed image is formed.

【0010】[0010]

【発明の目的】本発明は、上記欠点に鑑み案出されたも
ので、その目的は、長期間にわたり所定の印字画像を形
成することが可能な耐腐食性に優れたサーマルヘッドを
提供することにある。
SUMMARY OF THE INVENTION The present invention has been devised in view of the above-mentioned drawbacks, and an object thereof is to provide a thermal head having excellent corrosion resistance capable of forming a predetermined printed image for a long period of time. It is in.

【0011】[0011]

【課題を解決するための手段】本発明のサーマルヘッド
は、電気絶縁性基板上に発熱抵抗体を設けるとともに、
該発熱抵抗体上に、Si3 4 薄膜層、SiO2 薄膜
層、焼成ガラス層を順次、積層して成ることを特徴とす
る。
A thermal head according to the present invention comprises a heating resistor provided on an electrically insulating substrate and
It is characterized in that a Si 3 N 4 thin film layer, a SiO 2 thin film layer, and a baked glass layer are sequentially laminated on the heating resistor.

【0012】[0012]

【実施例】以下、本発明の実施例を、添付図面に基づい
て詳細に説明する。
Embodiments of the present invention will now be described in detail with reference to the accompanying drawings.

【0013】図1は本発明のサーマルヘッドの一実施例
を示す断面図であり、1は電気絶縁性基板、1aはグレ
ーズ層、2は発熱抵抗体、3は一対の導電層、4はSi
3 4 薄膜層、5はSiO2 薄膜層、6は焼成ガラス層
である。
FIG. 1 is a sectional view showing an embodiment of a thermal head of the present invention. 1 is an electrically insulating substrate, 1a is a glaze layer, 2 is a heating resistor, 3 is a pair of conductive layers, and 4 is Si.
3 N 4 thin film layer, 5 is a SiO 2 thin film layer, and 6 is a baked glass layer.

【0014】前記電気絶縁性基板1はアルミナセラミッ
クス等の電気絶縁性材料から成り、その上面で発熱抵抗
体2等を支持する作用を為す。
The electrically insulative substrate 1 is made of an electrically insulative material such as alumina ceramics, and has an upper surface for supporting the heating resistor 2 and the like.

【0015】前記電気絶縁性基板1は、アルミナ、シリ
カ、マグネシア等のセラミックス原料粉末に適当な有機
溶剤、溶媒を添加混合して泥漿状と成すとともにこれを
従来周知のドクターブレード法やカレンダーロール法等
を採用することによってセラミックグリーンシートを形
成し、しかる後、前記セラミックグリーンシートを所定
形状に打ち抜き加工するとともに高温で焼成することに
よって製作される。
The electrically insulative substrate 1 is formed into a sludge form by adding and mixing an appropriate organic solvent and a solvent to ceramic raw material powder such as alumina, silica, magnesia, etc., and is formed by a well-known doctor blade method or calender roll method. Etc. are employed to form a ceramic green sheet, which is then punched into a predetermined shape and fired at a high temperature.

【0016】また前記電気絶縁性基板1の上面には、ガ
ラス等から成るグレーズ層1aが15μm〜60μmの
厚みに被着形成されており、該グレーズ層1aは発熱抵
抗体2の発する熱を適当な温度となるように蓄積し、サ
ーマルヘッドの熱応答特性を良好に保つ作用を為す。
A glaze layer 1a made of glass or the like is deposited on the upper surface of the electrically insulating substrate 1 to a thickness of 15 μm to 60 μm. The glaze layer 1a appropriately generates heat generated by the heating resistor 2. It accumulates so that it will reach a certain temperature and keeps the thermal response characteristics of the thermal head in good condition.

【0017】前記グレーズ層1aは、例えば、高軟化点
ガラスの粉末に適当な有機溶剤、有機樹脂を添加混合し
て得たガラスペーストを電気絶縁性基板1の上面にスク
リーン印刷等によって印刷塗布し、しかる後、これを約
1000℃〜1200℃の高温で焼成することによって
電気絶縁性基板1の上面に被着形成される。
For the glaze layer 1a, for example, a glass paste obtained by adding and mixing a suitable softening point glass powder with an appropriate organic solvent or organic resin is applied by printing on the upper surface of the electrically insulating substrate 1 by screen printing or the like. After that, this is baked at a high temperature of about 1000 ° C. to 1200 ° C. to be deposited on the upper surface of the electrically insulating substrate 1.

【0018】また前記グレーズ層1aの上面には、窒化
タンタル等から成る複数個の発熱抵抗体2が被着配列さ
れており、該各発熱抵抗体2の両端には一対の導電層3
が接続されている。
A plurality of heating resistors 2 made of tantalum nitride or the like are deposited and arranged on the upper surface of the glaze layer 1a, and a pair of conductive layers 3 are provided at both ends of each heating resistor 2.
Is connected.

【0019】前記発熱抵抗体2は例えば窒化タンタル等
から成っており、それ自体が所定の電気抵抗率を有して
いるため、一対の導電層3を介して電力が印加されると
ジュール発熱を起こし、感熱記録紙に印字画像を形成す
るのに必要な所定温度、例えば200℃乃至350℃の
温度に発熱する。
The heat generating resistor 2 is made of, for example, tantalum nitride or the like, and has a predetermined electric resistivity, so that Joule heat is generated when electric power is applied through the pair of conductive layers 3. When it is raised, heat is generated at a predetermined temperature necessary for forming a printed image on the thermosensitive recording paper, for example, a temperature of 200 ° C to 350 ° C.

【0020】また前記発熱抵抗体2の両端に接続される
一対の導電層3はアルミニウム等の金属材料から成って
おり、該一対の導電層3は発熱抵抗体2にジュール発熱
を起こさせるために必要な所定の電力を印加する作用を
為す。
The pair of conductive layers 3 connected to both ends of the heating resistor 2 are made of a metal material such as aluminum, and the pair of conductive layers 3 cause Joule heat generation in the heating resistor 2. It has the function of applying the required predetermined electric power.

【0021】前記複数個の発熱抵抗体2及び一対の導電
層3は、従来周知のスパッタリング法及びフォトリソグ
ラフィー技術を採用することによってグレーズ層1aの
上面に所定パターン、所定厚み(発熱抵抗体2は0.0
1μm乃至0.5μmの厚み、一対の導電層3は0.5
μm乃至2.0μmの厚み)に被着される。
The plurality of heating resistors 2 and the pair of conductive layers 3 are formed on the upper surface of the glaze layer 1a with a predetermined pattern and a predetermined thickness (the heating resistors 2 are 0.0
1 μm to 0.5 μm thick, the pair of conductive layers 3 is 0.5
(μm to 2.0 μm thick).

【0022】前記発熱抵抗体2及び一対の導電層3の上
面にはまた、Si3 4 薄膜層4、SiO2 薄膜層5、
焼成ガラス層6が順次、積層されており、これらの層に
よって発熱抵抗体2等を大気と遮断している。
On the upper surfaces of the heating resistor 2 and the pair of conductive layers 3, a Si 3 N 4 thin film layer 4, a SiO 2 thin film layer 5,
The fired glass layers 6 are sequentially laminated, and these layers shield the heating resistor 2 and the like from the atmosphere.

【0023】前記Si3 4 薄膜層4は、極めて緻密な
膜質を有しており、酸素を一切含んでいないため、Si
3 4 薄膜層4中の成分によって発熱抵抗体2が酸化腐
食されることはない。
Since the Si 3 N 4 thin film layer 4 has an extremely dense film quality and contains no oxygen, Si
The heating resistor 2 is not oxidized and corroded by the components in the 3 N 4 thin film layer 4.

【0024】また前記Si3 4 薄膜層4上のSiO2
薄膜層5は、焼成ガラス層6を形成する際に熱が印加さ
れても、化学的に安定な特性を有しているため、Si3
4薄膜層4中にSiO2 薄膜層5中の酸素が拡散する
ことは殆どなく、また焼成ガラス層6を形成する際に熱
が印加されても、Si3 4 薄膜層4が酸化されて緻密
性を大きく低下することもない。尚、サーマルヘッドの
使用が長期にわたると、SiO2 薄膜層5中の酸素がS
3 4 薄膜層4中に少し拡散するが、これらの酸素は
Si3 4 薄膜層4の表面近傍を若干酸化する程度で、
発熱抵抗体2の電気抵抗値には全く影響を及ぼさない。
よって、Si3 4 薄膜層4の酸化防止機能は長期にわ
たり良好に維持されることとなる。
Further, SiO 2 on the Si 3 N 4 thin film layer 4 is
Since the thin film layer 5 has the property of being chemically stable even when heat is applied when forming the fired glass layer 6, Si 3
It is hardly oxygen SiO 2 thin film layer 5 are diffused into N 4 thin film layer 4, also be heat is applied during the formation of the sintered glass layer 6, Si 3 N 4 thin film layer 4 is oxidized It does not significantly reduce the precision. If the thermal head is used for a long period of time, the oxygen in the SiO 2 thin film layer 5 will become S
Although a little diffused in the i 3 N 4 thin film layer 4, these oxygens only slightly oxidize the vicinity of the surface of the Si 3 N 4 thin film layer 4,
It has no effect on the electric resistance value of the heating resistor 2.
Therefore, the antioxidation function of the Si 3 N 4 thin film layer 4 can be favorably maintained for a long period of time.

【0025】前記Si3 4 薄膜層4及びSiO2 薄膜
層5は、スパッタリング法等の薄膜手法を採用すること
によって、発熱抵抗体2等の上面に、それぞれ0.1〜
2.0μmの厚みをもって順次、積層される。
[0025] The Si 3 N 4 thin film layer 4 and the SiO 2 thin-film layer 5, by employing a thin film method such as a sputtering method, on the upper surface of such heat generating resistor 2, 0.1, respectively
The layers are sequentially laminated with a thickness of 2.0 μm.

【0026】また前記SiO2 薄膜層5上の焼成ガラス
層6は、PbO(酸化鉛)、SiO2 (酸化珪素)、B
aO(酸化バリウム)、B2 3 (酸化硼素)、CaO
(酸化カルシウム)等をそれぞれ所定の割合で含む低軟
化点ガラスによって形成されており、その内部には前記
低軟化点ガラスよりも高硬度の無機物粒子、例えば、A
2 3 粒子が所定の割合で含有されている。
The sintered glass layer 6 on the SiO 2 thin film layer 5 is made of PbO (lead oxide), SiO 2 (silicon oxide), B.
aO (barium oxide), B 2 O 3 (boron oxide), CaO
It is formed of a low softening point glass containing (calcium oxide) or the like in a predetermined ratio, and has an inorganic particle having a hardness higher than that of the low softening point glass, for example, A
1 2 O 3 particles are contained in a predetermined ratio.

【0027】前記焼成ガラス層6は、発熱抵抗体2及び
一対の導電層3を感熱記録紙の摺接による摩耗や大気中
の水分等の接触による腐食から保護する作用を為し、ま
た前記焼成ガラス層6中の無機物粒子は、焼成ガラス層
6の高硬度となすことによってサーマルヘッドの耐摩耗
性を向上させる作用を為す。
The baking glass layer 6 has a function of protecting the heat generating resistor 2 and the pair of conductive layers 3 from abrasion due to sliding contact of the thermal recording paper and corrosion due to contact with moisture in the atmosphere, and the above baking. The inorganic particles in the glass layer 6 have the function of improving the wear resistance of the thermal head by making the sintered glass layer 6 have high hardness.

【0028】更に前記無機物粒子の熱伝導率を、焼成ガ
ラス層6の主成分である低融点ガラスと略等しいか、も
しくは、それよりも大きくなしておけば、発熱抵抗体2
から感熱記録紙に伝導しようとする熱が無機物粒子によ
って遮断されることはなく、サーマルヘッドの熱効率を
向上させることができる。従って無機物粒子の熱伝導率
を、焼成ガラス層6の主成分である低融点ガラスと略等
しいか、もしくは、それよりも大きくなしておくことが
好ましい。
Further, if the thermal conductivity of the inorganic particles is substantially equal to or larger than that of the low melting point glass which is the main component of the sintered glass layer 6, the heating resistor 2
The heat that is transmitted from the thermal recording paper to the thermal recording paper is not blocked by the inorganic particles, and the thermal efficiency of the thermal head can be improved. Therefore, it is preferable that the thermal conductivity of the inorganic particles is substantially equal to or higher than that of the low melting point glass which is the main component of the baked glass layer 6.

【0029】尚、前記焼成ガラス層6は、先ず、PbO
を70重量%、SiO2 を15重量%、BaO、B2
3 、CaOを各5重量%ずつ含有する低軟化点ガラス
(軟化点:約450℃)の粉末に適当な有機溶媒、溶剤
を添加混合してガラスペーストを作製するとともに、こ
れに所定量のアルミナ粒子(粒径:約1μm)を添加し
たものを発熱抵抗体2及び一対の導電層3が被着された
電気絶縁性基板1上にスクリーン印刷法等の厚膜手法を
採用し、例えば、約4μmの厚みに塗布するとともに、
これを約500℃の温度で焼成することによって形成さ
れる。
The baked glass layer 6 is made of PbO.
70% by weight, SiO 2 15% by weight, BaO, B 2 O
3 , powder of low softening point glass (softening point: about 450 ° C) containing 5% by weight each of CaO and an appropriate organic solvent and solvent are added and mixed to prepare a glass paste, and a predetermined amount of alumina is added thereto. A thick film method such as a screen printing method is applied to the electrically insulating substrate 1 on which the heating resistor 2 and the pair of conductive layers 3 are adhered by adding particles (particle diameter: about 1 μm). While applying to a thickness of 4 μm,
It is formed by firing it at a temperature of about 500 ° C.

【0030】このとき、焼成ガラス層6中に含まれてい
るPbOとSi3 4 薄膜層4との間にはSiO2 薄膜
層5が介在されており、この両者間で気泡(窒素)の発
生を伴う化学反応が起こることはないため、焼成ガラス
層6の表面平坦性は高く、印字に際して感熱記録紙をサ
ーマルヘッドに良好に密着させることができる。これに
よって感熱記録紙に鮮明な印字画像を形成することが可
能となる。
At this time, the SiO 2 thin film layer 5 is interposed between the PbO contained in the sintered glass layer 6 and the Si 3 N 4 thin film layer 4, and bubbles (nitrogen) are generated between them. Since a chemical reaction that accompanies the occurrence does not occur, the surface flatness of the baked glass layer 6 is high, and the thermal recording paper can be brought into good contact with the thermal head during printing. This makes it possible to form a clear printed image on the thermosensitive recording paper.

【0031】また上述のように、発熱抵抗体2上に、S
iO2 薄膜層5、Si3 4 薄膜層4、焼成ガラス層6
を順次、積層した構造になしておけば、Si3 4 薄膜
層4とSiO2 薄膜層5との間には、各層間の物理吸着
力に加え、幾分かの化学吸着力が作用して強固に接合さ
れ、またSiO2 薄膜層5と焼成ガラス層6も、焼成ガ
ラス層6中に含まれているSiO2 によって強固に接合
されることから、発熱抵抗体3上に積層される各層間の
密着性はいずれも極めて高く、これらの各層に熱パルス
が繰り返し印加されても、各層間で容易に剥離が生じる
ことはない。
As described above, S is placed on the heating resistor 2.
iO 2 thin film layer 5, Si 3 N 4 thin film layer 4, baked glass layer 6
If the layers are sequentially laminated, some chemical adsorption force acts between the Si 3 N 4 thin film layer 4 and the SiO 2 thin film layer 5 in addition to the physical adsorption force between the layers. The SiO 2 thin film layer 5 and the calcined glass layer 6 are firmly bonded together by the SiO 2 contained in the calcined glass layer 6, so that the SiO 2 thin film layer 5 and the calcined glass layer 6 are laminated on the heating resistor 3. The adhesion between layers is extremely high, and even if a heat pulse is repeatedly applied to each of these layers, peeling does not easily occur between the layers.

【0032】かくして上述したサーマルヘッドは、一対
の導電層3間に印字信号に基づいて所定の電力を印加
し、発熱抵抗体2を選択的にジュール発熱させるととも
に、該発熱した熱をプラテンローラ等によって押圧され
る感熱記録紙に伝導させ、感熱記録紙に所定の印字画像
を形成することによってサーマルヘッドとして機能す
る。
Thus, the above-described thermal head applies a predetermined electric power between the pair of conductive layers 3 based on the print signal to selectively cause the heating resistor 2 to generate Joule heat, and the generated heat is applied to a platen roller or the like. It conducts to the thermosensitive recording paper pressed by and forms a predetermined print image on the thermosensitive recording paper to function as a thermal head.

【0033】尚、本発明は上記実施例に限定されるもの
ではなく、本発明の要旨を逸脱しない範囲において種々
の変更、改良等が可能であり、例えば上記実施例のサー
マルヘッドにおいて、焼成ガラス層6上にビッカース硬
度が1000kg/mm2 以上の硬質材料、例えば、窒
化珪素、炭化珪素、サイアロン等からなる耐摩耗層を例
えば、3μmの厚みに被着させておいても良く、この場
合、上記実施例と同様の効果を奏するのに加え、サーマ
ルヘッドの耐摩耗性がより一層向上する。
The present invention is not limited to the above embodiments, and various changes and improvements can be made without departing from the gist of the present invention. For example, in the thermal head of the above embodiments, the baked glass is used. A wear resistant layer made of a hard material having a Vickers hardness of 1000 kg / mm 2 or more, for example, silicon nitride, silicon carbide, sialon or the like may be deposited on the layer 6 to have a thickness of, for example, 3 μm. In this case, In addition to the same effects as those of the above embodiment, the wear resistance of the thermal head is further improved.

【0034】[0034]

【発明の効果】本発明によれば、焼成ガラス層を形成す
る際、焼成ガラス層中の酸素が発熱抵抗体に接触しよう
とするのがSiO2 薄膜層及びSi3 4 薄膜層によっ
て有効に遮断され、また前記Si3 4 薄膜層はそれ自
体、酸素を含んでいないので、サーマルヘッドを長期に
わたり使用しても、発熱抵抗体の電気抵抗値が大きく変
化することはなく、感熱記録紙に長期間にわたり濃度む
らの無い良好な印字画像を形成することができる。
According to the present invention, when forming a fired glass layer, it is effective that oxygen in the fired glass layer tries to contact the heating resistor by the SiO 2 thin film layer and the Si 3 N 4 thin film layer. Since the Si 3 N 4 thin film layer itself is shielded and does not contain oxygen itself, the electric resistance value of the heating resistor does not change significantly even if the thermal head is used for a long period of time, and the thermal recording paper It is possible to form a good printed image without density unevenness over a long period of time.

【0035】また本発明によれば、前記SiO2 薄膜層
は、焼成ガラス層を形成する際の高温下でも化学的に安
定な特性を有しているため、SiO2 薄膜層中の酸素が
Si3 4 薄膜層中に拡散することは殆どなく、Si3
4 薄膜層の緻密性は高く保たれ、Si3 4 薄膜層の
酸化防止機能は良好に維持される。
Further, according to the present invention, since the SiO 2 thin film layer has the characteristic of being chemically stable even at a high temperature when forming the fired glass layer, oxygen in the SiO 2 thin film layer becomes Si. It hardly diffuses into the 3 N 4 thin film layer, and Si 3
The denseness of the N 4 thin film layer is kept high, and the oxidation preventing function of the Si 3 N 4 thin film layer is maintained well.

【0036】更に本発明によれば、焼成ガラス層に含ま
れているPbOとSi3 4 薄膜層とはSiO2 薄膜層
によって遮断されており、Si3 4 薄膜層と焼成ガラ
ス層との間で気泡の発生を伴う化学反応が起こることは
ないため、焼成ガラス層の表面平坦性は高く保たれ、印
字に際して感熱記録紙をサーマルヘッドに良好に密着さ
せることができる。
Further, according to the present invention, the PbO contained in the fired glass layer and the Si 3 N 4 thin film layer are shielded by the SiO 2 thin film layer, and the Si 3 N 4 thin film layer and the fired glass layer are separated from each other. Since a chemical reaction involving generation of bubbles does not occur between them, the surface flatness of the baked glass layer is kept high, and the thermal recording paper can be brought into good contact with the thermal head during printing.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のサーマルヘッドの一実施例を示す断面
図である。
FIG. 1 is a sectional view showing an embodiment of a thermal head of the present invention.

【図2】従来のサーマルヘッドの断面図である。FIG. 2 is a sectional view of a conventional thermal head.

【符号の説明】[Explanation of symbols]

1・・・電気絶縁性基板 2・・・発熱抵抗体 3・・・一対の導電層 4・・・Si3 4 薄膜層 5・・・SiO2 薄膜層 6・・・焼成ガラス層1 ... insulating substrate 2 ... heating resistor 3 ... pair of conductive layers 4 ... Si 3 N 4 thin film layer 5 ... SiO 2 thin-film layer 6 ... fired glass layer

───────────────────────────────────────────────────── フロントページの続き (72)発明者 沓澤 功昌 鹿児島県姶良郡隼人町内999番地3 京セ ラ株式会社隼人工場内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Kosho Kusawa 999-3 Hayato-cho, Aira-gun, Kagoshima Prefecture Kyocera Corporation Hayato factory

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】電気絶縁性基板上に発熱抵抗体を設けると
ともに、該発熱抵抗体上に、Si3 4 薄膜層、SiO
2 薄膜層、焼成ガラス層を順次、積層して成るサーマル
ヘッド。
1. A heating resistor is provided on an electrically insulating substrate, and a Si 3 N 4 thin film layer, SiO 2 is formed on the heating resistor.
A thermal head consisting of two thin-film layers and a laminated glass layer, which are laminated in this order.
JP1480795A 1995-01-31 1995-01-31 Thermal head Expired - Fee Related JP3476945B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1480795A JP3476945B2 (en) 1995-01-31 1995-01-31 Thermal head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1480795A JP3476945B2 (en) 1995-01-31 1995-01-31 Thermal head

Publications (2)

Publication Number Publication Date
JPH08207331A true JPH08207331A (en) 1996-08-13
JP3476945B2 JP3476945B2 (en) 2003-12-10

Family

ID=11871322

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1480795A Expired - Fee Related JP3476945B2 (en) 1995-01-31 1995-01-31 Thermal head

Country Status (1)

Country Link
JP (1) JP3476945B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012071592A (en) * 2010-08-30 2012-04-12 Kyocera Corp Thermal head and thermal printer equipped with the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012071592A (en) * 2010-08-30 2012-04-12 Kyocera Corp Thermal head and thermal printer equipped with the same

Also Published As

Publication number Publication date
JP3476945B2 (en) 2003-12-10

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