JPH0819950B2 - Non-lubricating sliding member - Google Patents

Description

TECHNICAL FIELD The present invention relates to a non-lubricated sliding member used in a situation where it is difficult or impossible to supply lubricating oil or the like.

[Prior Art] A sliding member generally includes a first sliding body having a first sliding portion and a second sliding body having a second sliding portion that is in sliding contact with the first sliding portion.

In such a sliding member, in order to prevent wear and the like, the first
Attempts have been made to form the sliding portion and the second sliding portion with ceramics. However, since ceramics have poor toughness, the first sliding portion and the second sliding portion formed of ceramics are easily damaged by the surface during sliding. As a result, abrasive wear progresses, and it tends to become unusable as a sliding member.

Here, it is known that the surface damage generated in the ceramic sliding member is caused by a tensile stress called Tensile spike generated near the sliding surface.

The tensile stress called Tensile spike depends on the coefficient of friction of the sliding surface and decreases when the coefficient of friction is reduced.

To reduce the friction coefficient, lubricating oil or solid lubricant may be interposed on the sliding surface. However, there is a problem that the lubricating oil easily deteriorates, especially when it is used in a place where it receives radiation or at a high temperature.

In addition, as a solid lubricant intervening, it is composed of a mixed powder of ceramic powder and molybdenum disulfide, which is obtained by impregnating a porous ceramics sintered body with molybdenum disulfide and a fluororesin. There are JP-A-57-188474 and JP-A-57-114028 in which a molded body is sintered. However, even if a solid lubricant is interposed, the friction coefficient is about 0.13, which is not necessarily a sufficiently small value.

In addition, as an example of not using a lubricating oil or a solid lubricant, Ti, Ni or Co is vapor-deposited on a zirconia or silicon nitride substrate,
Further, it has been reported about the friction coefficient between the first sliding portion irradiated with Ar ⁺ ions and the second sliding portion formed of a TiC-Ni-Mo pin. J. Matter, Sei.22, 2069-2087 (1987). In the above example, a thin film of Co is formed on the surface of partially stabilized zirconia, and a first sliding portion where a thin film of Ti and Ni is formed on the surface of partially stabilized zirconia, titanium carbide and nickel,
The coefficient of friction of the molybdenum sintered body with the second sliding part is shown. The coefficient of friction is 0.06 to 0.09 under the condition of 800 ° C in the exhaust atmosphere of the diesel engine, but the coefficient of friction at room temperature is shown. Is as large as 0.2 or more.

[Problems to be Solved by the Invention] The object of the present invention was made in view of the above circumstances.
An object of the present invention is to provide an unlubricated sliding member that can further reduce the friction coefficient of a sliding surface on which ceramics intervene, without using a lubricating oil or a solid lubricant.

Another object of the present invention is to provide a non-lubricating sliding member which can have a longer life.

[Means for Solving Problems] As a result of earnest research on sliding of ceramics, the present inventor has found that when a ceramic surface is coated with a metal such as Nb or an oxide thereof, the coefficient of friction with diamond is increased. 0.
It was discovered that it was significantly reduced to less than 01. Furthermore, the ceramic surface coated with the above metal or its oxide,
It was discovered that the wear resistance of ceramics was significantly improved by ion irradiation. The unlubricated sliding member according to the present invention has been completed based on the above findings.

That is, the non-lubricating sliding member according to the present invention is a non-lubricating sliding member including a first sliding body having a first sliding portion and a second sliding body having a second sliding portion in sliding contact with the first sliding portion. In the moving member, the first sliding portion has a ceramic base portion and niobium (Nb), chromium (Cr), titanium (Ti), zirconium (Zr), hafnium (Hf) integrally formed on the surface of the ceramic base portion. , Yttrium (Y), silicon (Si), or a thin film of one or more of oxides of the metal, and the second sliding portion is a diamond-containing surface portion. It is what

Further, another non-lubricating sliding member according to the present invention is characterized in that the thin film is integrally formed on the surface of the sliding member, and the ceramic base of the first sliding portion is irradiated with ions. To do.

Nb, which forms the thin film of the first sliding portion,
Metals of Cr, Ti, Zr, Hf, Y and Si, or one or two or less of oxides of these metals can be used. When two or less kinds of metals are used in the form of oxide, a mixture of metal oxides or a composite oxide may be used.

The thin film can be formed by electron beam evaporation, sputtering, ion plating, cluster ion beam evaporation. Although the thickness of the thin film can be changed as necessary, it is generally preferably about 100 angstrom to 1 μm. This is because if the thickness of the thin film is less than 100 angstroms, the effect of reducing the frictional coefficient will vary, and if it exceeds 1 μm, the coefficient of friction will increase due to excavation with diamond.

Further, as the ions for irradiating the surface of the ceramic base portion on which the thin film is formed in the first sliding portion, hydrogen ions (H ⁺ ), helium ions (He ⁺ ), nitrogen ions (N ⁺ ), oxygen ions (O ⁺ ), Argon ion (Ar ⁺ ),
Crypto ions (Kr ⁺ ), xenon ions (Xe ⁺ ), and silicon ions (Si ⁺ ) are typical ones, and other ions can also be used.

The irradiation energy is preferably such that the range of irradiation ions is deeper than the thickness of the thin film. This is because the adhesive strength between the thin film and the ceramic base is effectively improved. The ion irradiation dose is 5 × 10 ¹⁴ ions / cm ² ~
5 × 10 ¹⁷ ions / cm ² is preferable. Ion irradiation dose is 5 × 10 ¹⁴
If it is less than ions / cm ² , the adhesion strength between the thin film and the ceramic base may not be improved and the thin film may peel off.
Further, even when the ion irradiation dose exceeds 5 × 10 ¹⁷ ions / cm ² , the effect of significantly lowering friction and wear does not appear, and the ion irradiation time is extremely long, which is not effective.

As the ceramic forming the ceramic base of the first sliding portion, commonly used oxide-based, nitride-based, and carbide-based ceramics can be used, and alumina, mullite, zirconia, silicon nitride, and silicon carbide are typical. It is a target.
In this case, the ceramic base can be a ceramic sintered body, a ceramic single crystal, or a ceramic coating layer.

The first sliding portion can be composed of a ceramic base portion forming a rail and a thin film formed on the outer peripheral surface of the rail, and the second sliding portion reciprocates along the rail and contains diamond. It can be a slider having a surface portion. Furthermore, the surface of the base portion on which the thin film of the first sliding portion is formed may be irradiated with ions.

The second sliding portion has a diamond-containing surface portion. The diamond contained in the diamond-containing surface may be naturally produced or artificially produced.

Here, the first sliding portion can be composed of a ceramic base portion serving as a bearing portion having a shaft hole, and a thin film formed on the inner peripheral surface of the bearing portion forming the shaft hole. In this case, the second sliding part may be a shaft part having a diamond-containing surface part that is inserted into the shaft hole of the bearing part so as to be rotatable or linearly reciprocally movable.

The second sliding portion may be a bearing portion having a shaft hole and a diamond-containing surface portion on the inner peripheral portion forming the shaft hole. In this case, the first sliding portion is composed of a ceramic base portion that is a shaft portion that is rotatably or linearly reciprocally inserted into the shaft hole, and a thin film formed on the outer peripheral portion of the shaft portion. be able to.

The first sliding portion is composed of a ceramic base portion forming a rail and a thin film formed on the outer peripheral surface of the rail, and the second sliding portion reciprocates along the rail to form a diamond. A slider having a containing surface portion may be used.

In the above example of the bearing or the combination of the rail and the slider, the surface of the ceramic base portion on which the thin film of the first sliding portion is formed may be irradiated with ions.

EFFECTS OF THE INVENTION According to the non-lubricated sliding member of the present invention, the friction coefficient when the first sliding portion and the second sliding portion slide can be obtained without using a lubricating oil or a solid lubricant. It can be reduced. Therefore, the life of the sliding member can be kept long.

Further, in the non-lubricated sliding member in which the ceramic base portion integrally formed with the thin film of the first sliding portion is irradiated with ions, the amount of wear can be significantly reduced.

[Test Example 1] A non-lubricated sliding member according to this test example includes a first sliding body having a first sliding portion and a second sliding body having a second sliding portion in sliding contact with the first sliding portion. Consists of.

The first sliding part is a mirror-polished alumina sintered body (size
It is composed of a ceramic base made of 10 × 20 × 3 mm) and a metal thin film formed by vacuum-depositing Nb on about half of a predetermined surface (10 × 20 mm) of the ceramic base. Therefore, the metal thin film is formed on one half of the predetermined surface of the ceramic base, and the surface of the alumina sintered body is exposed as it is on the other half. The thickness of the metal thin film is 100 Å.

The second sliding portion has a diamond-containing surface portion having a diamond needle with a tip radius of 0.2 mm.

Then, a load of 50 g was applied to the diamond-containing surface portion and repeatedly slid on the metal thin film at a sliding speed of 10 mm / min at a temperature of 25 ° C. Then, the tangential force (Ft) is measured and the friction coefficient μ =
The friction coefficient was measured as Ft / FN. As a result of the test, the friction coefficient μ was 0.01, and chipping did not occur even after sliding 1000 times or more.

On the other hand, when the surface of the alumina sintered body on which the thin film of the ceramic base was not formed was slid under the same conditions, the friction coefficient μ was 0.1 ± 0.02. If the sliding is repeated, chipping may occur on the alumina surface portion, and the friction coefficient μ may become 0.15 or more. That is, the friction coefficient increased by about one digit.

The coefficient of friction between the metal thin film surface which is the vapor deposition surface and the diamond-containing surface portion when the vapor deposition metal is changed is
Shown in the table. Similarly, the coefficient of friction between the surface portion of the alumina sintered body, which is the non-deposited surface, and the surface portion containing diamond is also the first
Shown in the table. The measurement conditions of the friction coefficient are the same as the above case.

As shown in Table 1, when the metal forming the metal thin film is Cr, the friction coefficient on the metal thin film is as small as 0.03, and the friction coefficient on the non-deposited surface is as large as 0.08. Further, when the metal forming the metal thin film is Ti, the friction coefficient is as large as 0.09 on the non-deposited surface, whereas it is as small as 0.06 on the metal thin film as the deposited surface. When the metal forming the metal thin film is Zr, the friction coefficient on the non-deposited surface is as large as 0.09, whereas it is as small as 0.05 on the deposited surface.

When the metal forming the metal thin film was platinum (Pt) or iron (Fe), the friction coefficient between the metal thin film and the diamond-containing surface portion increased, as is clear from Table 1. In addition, when the metal forming the metal thin film was gold (Au), the friction coefficient was about 0.10.

[Test Example 2] The unlubricated sliding member according to Test Example 2 has substantially the same configuration as in Test Example 1. However, the metal thin film of the unlubricated sliding member according to Test Example 2 was formed by vacuum-depositing Nb, and then 2 MeV helium ions (He ⁺ ) of 1 × 10 ¹⁷ ion was formed on the deposition surface.
It is formed by irradiation with s / cm ² .

The friction coefficient of the non-lubricated sliding member according to Test Example 2 was examined under the same conditions as in Test Example 1. The friction coefficient μ when sliding the metal thin film and the diamond-containing surface is
It was as small as 0.01 ± 0.005.

On the other hand, the friction coefficient μ when the ceramic base made of alumina sintered body and the diamond-containing surface slide
Was as large as 0.09 ± 0.02.

Furthermore, Nb is formed by vacuum vapor deposition to form a thin metal film at 1 MeV.
Even if the argon ion (Ar ⁺ ) is irradiated at 1 × 10 ¹⁷ ions / cm ² and the nitrogen ion (N ⁺ ) at 400 KeV is irradiated at 2 × 10 ¹⁷ ions / cm ² , the coefficient of friction is similarly determined. I measured
The friction coefficient between the metal thin film and the diamond-containing surface was about 0.01.

Test Example 3 The non-lubricated sliding member according to Test Example 3 has substantially the same configuration as in Test Example 1. However, the non-lubricated sliding member according to Test Example 3 was the same as Test Example 1 except that the ceramic base was made of silicon nitride and the metal thin film was made of Si.

The unlubricated sliding member according to Test Example 3 also has a load of 300 g.
The friction coefficient was examined under the same conditions as in Test Example 1 except that As a result of the test, the friction coefficient μ was 0.01 or less, and chipping did not occur even after sliding 1000 times or more.

On the other hand, when the surface of the silicon nitride sintered body on which the thin film of the ceramic base was not formed was slid under the same conditions, the friction coefficient μ was 0.07 ± 0.005. If the sliding is repeated, chipping may occur on the silicon nitride surface portion, and the friction coefficient μ may become 0.15 or more. That is, the friction coefficient increased by about one digit.

Table 2 shows the friction coefficient between the Si thin film surface portion and the diamond-containing surface portion when the ceramic substrate on which Si is deposited is changed. Similarly, Table 2 also shows the friction coefficient between the ceramic substrate on which Si is not deposited and the diamond-containing surface portion. The measurement conditions of the friction coefficient are the same as those described above.

As shown in Table 2, when the substrate ceramics are silicon nitride and zirconia, when Si is deposited, the friction coefficient is 0.01.
Decrease to. Even when the substrate is silicon carbide, the coefficient of friction of the Si-deposited surface is 0.03, which is much smaller than the coefficient of friction of the undeposited surface of 0.08.

Test Example 4 The non-lubricated sliding member according to Test Example 4 has substantially the same configuration as that of the first embodiment. However, the metal thin film of the unlubricated sliding member according to Test Example 4 was formed by vacuum-depositing Si and then irradiating the vapor-deposited surface with 2 MeV He ⁺ at 1 × 10 ¹⁷ ions / cm ^2. There is.

The friction coefficient of the unlubricated sliding member according to Test Example 4 was examined under the same conditions as in Test Example 1. The friction coefficient μ when sliding the metal thin film and the diamond-containing surface is
It was as small as 0.01 ± 0.005.

On the other hand, the friction coefficient μ when the ceramic base made of a silicon nitride sintered body and the diamond-containing surface are slid
Was as large as 0.09 ± 0.02.

Furthermore, 1MeV was applied to the metal thin film formed by vacuum evaporation of Si.
Of Ar ⁺ of 1 × 10 ¹⁷ ions / cm ² and 400 KeV of N ⁺ of 2 × 10 ¹⁷ ions / cm ² were also used to measure the friction coefficient. The friction coefficient with the diamond-containing surface was about 0.01.

Test Example 5 The non-lubricated sliding member according to Test Example 5 has substantially the same configuration as in Test Example 1. However, the ceramic base of the non-lubricating sliding member according to Test Example 5 was a silicon carbide sintered body, and the metal thin film was formed by vacuum vapor deposition of Nb, and then on the vapor deposition surface.
It was formed by irradiating 280 KeV Ar ⁺ at 2 × 10 ¹⁶ ions / cm ^2, and was the same as Test Example 1 except that the tip radius of the diamond needle of the second sliding portion was 3 mm.

Then, on the diamond-containing surface of the second sliding portion, 50
A load of 0 g was applied and the sample was rotated on the metal thin film at a sliding speed of 2 m / min. Then, the tangential force (FT) is measured and the friction coefficient μ = Ft / FN
The coefficient of friction was measured as The test result shows that the friction coefficient μ is
It was 0.05, and chipping did not occur even when it was rotated and slid 2 × 10 times or more.

On the other hand, when sliding on the surface of the silicon carbide sintered body of the ceramic base under the same conditions, the friction coefficient μ is 0.1
It was ± 0.02. When the sliding was repeated, chipping occurred on the surface of the silicon carbide, and the coefficient of friction μ was sometimes 0.15 or more. That is, the friction coefficient increased by about 3 times.
FIG. 5 shows a graph of the vertical load dependency of the normalized wear amount. The horizontal axis shows the vertical load, and the vertical axis shows the relative amount of wear when the amount of wear of the base portion on which the thin film of niobium is formed on silicon carbide is 1 when the vertical load is 200 gf. In the figure, the curve marked with Δ is for silicon carbide only, the mark with ○ is for forming a thin film of niobium on silicon carbide, and the symbol for □ is after forming a thin film of niobium on silicon carbide.
The number of sliding times in the case of irradiation with Ar ⁺ of ⁰ KeV at 2 × 10 ¹⁶ ions / cm ² is 2 × 10 ⁵ .

Further, when irradiated with Ar ⁺ , the wear resistance was remarkably improved, and almost no wear was observed. When it was desired to irradiate Ar ⁺ , a small amount of wear was observed as the load increased.

On the other hand, the surface wear amount of the silicon carbide sintered body of the ceramic base increased as the load increased.

Test Example 6 The non-lubricated sliding member according to Test Example 6 has substantially the same configuration as in Test Example 1. However, except that the thin film of the non-lubricated sliding member according to Test Example 6 was formed of an oxide of Nb, Test Example 1
Is the same as

The friction coefficient of the unlubricated sliding member according to Test Example 6 was also examined under the same conditions as in Test Example 1.

The test results showed that the friction coefficient μ was 0.01 and that chipping did not occur even after sliding 1000 times or more.

On the other hand, when sliding on the surface of the alumina sintered body of the ceramic base under the same conditions, the friction coefficient μ is 0.1
± 0.02. If the sliding is repeated, chipping may occur on the alumina surface, and the friction coefficient μ may become 0.15 or more. That is, the friction coefficient increased by about one digit.

Table 3 shows the friction coefficient between the surface portion of the carbide thin film and the surface portion containing diamond, which is the vapor deposition surface when the vapor deposition oxide is changed. Similarly, Table 3 also shows the coefficient of friction between the surface of the alumina sintered body and the surface of the diamond-containing surface, which are undeposited surfaces. The conditions for measuring the friction coefficient are the same as those described above.

As shown in Table 3, the oxide forming the oxide thin film is Cr
If it is an oxide, the coefficient of friction of the oxide thin film is 0.03.
And the coefficient of friction on the undeposited surface is 0.08, which is quite large. When the oxide forming the oxide thin film is Ti, the friction coefficient on the non-deposited surface is as large as 0.09, whereas it is as small as 0.06 on the oxide thin film on the deposited surface. When the oxide forming the oxide thin film is Zr, the friction coefficient on the non-deposited surface is as large as 0.09, whereas it is as small as 0.05 on the deposited surface.

When the oxide forming the oxide thin film was an iron (Fe) oxide, the friction coefficient between the metal and the diamond-containing surface portion increased as is clear from Table 3.

Test Example 7 The non-lubricated sliding member according to Test Example 7 has substantially the same configuration as that of Test Example 6. However, the metal thin film of the unlubricated sliding member according to Test Example 7 was formed by vacuum vapor deposition using Nb as an oxide, and then 2 MeV He ⁺ was added to the vapor deposition surface at 1 × 10 ¹⁷ ions / cm ^2.
It is formed by irradiation.

The friction coefficient of the unlubricated sliding member according to Test Example 7 was examined under the same conditions as in Test Example 1. Friction coefficient when sliding oxide thin film and diamond-containing surface
Was as small as 0.01 ± 0.005.

On the other hand, the friction coefficient μ when the ceramic base made of alumina sintered body and the diamond-containing surface slide
Was as large as 0.09 ± 0.02.

Furthermore, even when an oxide thin film formed by vacuum deposition of Nb oxide is irradiated with 1 MeV Ar ⁺ at 1 × 10 ¹⁷ ions / cm ² , it is 400 Ke
The friction coefficient was similarly measured in the case of irradiating V ⁺ N ⁺ at 2 × 10 ¹⁷ ions / cm ² , and the friction coefficient between the oxide thin film and the diamond-containing surface was about 0.01.

[Test Example 8] A sapphire plate 1 having a thickness of 1 mm shown in FIG. 1 was formed with conical recesses 2 and 3 having a radius of 0.3 mm to obtain a mirror finish. Then, heat treatment was carried out at 1500 ° C. for about 5 hours in atmospheric pressure to remove work strain. Then, Nb was vacuum-deposited in one depression 3 to a thickness of 100 Å to form a metal thin film 4. The other one depression 2 remains sapphire.

Then, with the diamond pivot shaft 5 having a tip radius of 0.10 mm applied to the depressions 2 and 3, respectively, vertically 20
A load of gf was applied, and the product was rotated and slid at 100 rpm for 1 hour. As a result of such a test, when the bottoms of the depressions 2 and 3 were observed with an optical microscope, cracks (mainly lateral cracks) were found at the bottoms of the depressions 2 which were undeposited portions.

On the other hand, in the metal thin film 4 of the depression 3 which is the deposition portion of Nb, the metal thin film 4 was not peeled off, and no crack was found in the depression 3 by observation from the back side of the depression 3.

It should be noted that the same test as above was performed when the film was formed by using Si, Nb oxide and a metal thin film of Nb instead of Nb, and then irradiating 2 × 10 ¹⁶ ions / cm ² of Ar ⁺ of 280 KeV. I went.
In these cases as well, no cracks were found, as in the above case.

[Test Example 9] The surface of the ceramic base 11 of the round rod-shaped first sliding portion made of an alumina sintered body having a diameter of 10 mm and a length of 100 mm was mirror-finished, and Nb was applied to the half surface portion in the length direction. A metal thin film 12 was formed by electron beam evaporation with a thickness of 100 angstrom. The alumina sintered body remains exposed on the surface of the other half of the first sliding body 10. This was used as a test material.

Then, the test material was set in the testing machine 13 shown in FIGS. 2 to 4 in which the shaft was taken out beforehand, and the test material was repeatedly slid in the vertical direction at a speed of 10 mm / sec.

Here, the second sliding bodies 14 and 15 forming the bearing are the tip portions.
It has diamonds 16 and 17 of 1 mm. And the second sliding part 1
The distance L between 4 and 15 is set to 20 mm so that both the metal thin film 12 which is the vapor deposition part and the alumina sintered body which is the non-vapor deposition part can pass through the two second sliding bodies 14 and 15. Then, the test material was slid up and down by 30 mm.

The test was performed in the air without lubrication. As a result of a continuous sliding test for 20 hours, the presence or absence of sliding streaks was observed with an optical microscope and a scanning electron microscope. In the alumina sintered body which is the non-deposited portion, some streaks were observed. In the metal thin film 12 which is the Nb vapor deposition part, the Nb film was not peeled off and there were almost no scratches. This shows that the metal thin film made of Nb prevented wear of the ceramic base made of the alumina sintered body.

When Nb oxide and a metal thin film were formed instead of Nb, and then Ar ⁺ of 280 KeV was irradiated at 2 × 10 ¹⁶ ions / cm ² , and silicon nitride firing was performed instead of the alumina sintered body. A test similar to the above was performed when a Si was used instead of Nb as a unit. Also in these cases, the results were exactly the same as above.

[Brief description of drawings]

FIG. 1 is a schematic configuration diagram showing a main part according to Test Example 8,
FIG. 2 is a schematic side view of a test apparatus according to Test Example 9,
FIG. 3 is a plan view thereof, and FIG. 4 is a sectional view of a main part thereof. FIG. 5 is a diagram showing the amount of wear in Test Example 5.

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Masaro Kanzaki 41, Yokomichi, Nagakute-cho, Nagakute-cho, Aichi-gun, Aichi Prefecture, Toyota Central Research Institute Co., Ltd. (56) Reference JP-A-56-6920 (JP, A) JP-A-60-71597 (JP, A)

Claims (17)

[Claims] 1. A non-lubricating sliding member comprising a first sliding body having a first sliding portion and a second sliding body having a second sliding portion that is in sliding contact with the first sliding portion. The sliding portion is a ceramic base and Nb, Cr, Ti, Zr, Hf, Y, which are integrally formed on the surface of the ceramic base,
A non-lubricating sliding member comprising a thin film of at least one of Si metal and an oxide of the metal, wherein the second sliding portion is a diamond-containing surface portion. 2. The non-lubricating sliding member according to claim 1, wherein the ceramic base is a ceramic sintered body, a ceramic single crystal, or a ceramic coating layer. 3. The first sliding portion is composed of a ceramic base portion serving as a bearing portion having a shaft hole, and a thin film formed on an inner peripheral surface of the bearing portion forming the shaft hole. The unlubricated sliding member according to claim 1, wherein the two sliding portions are shaft portions having a diamond-containing surface portion that is rotatably or linearly reciprocally inserted into the shaft hole of the bearing portion. 4. The second sliding portion is a bearing portion having a shaft hole and having a diamond-containing surface portion on an inner peripheral portion forming the shaft hole, and the first sliding portion is rotatable in the shaft hole. Alternatively, the non-lubricated sliding member according to claim 1, which is composed of a ceramic base portion that is a shaft portion that is inserted so as to be capable of linearly reciprocating movement, and a thin film that is formed on an outer peripheral portion of the shaft portion. 5. The first sliding portion comprises a ceramic base portion forming a rail and a thin film formed on the outer peripheral surface of the rail, and the second sliding portion reciprocates along the rail. The unlubricated sliding member according to claim 1, which is a slider that moves and has a diamond-containing surface portion. 6. The non-lubricating sliding member according to claim 1, wherein the thin film is formed by vacuum vapor deposition, electron beam vapor deposition, sputtering, ion plating, or cluster ion beam vapor deposition. 7. The thin film has a thickness of 100 Å to 1
The unlubricated sliding member according to claim 1, which has a thickness of μm. 8. A non-lubricating sliding member comprising a first sliding body having a first sliding portion and a second sliding body having a second sliding portion in sliding contact with the first sliding portion, wherein The sliding portion is a ceramic base and Nb, Cr, Ti, Zr, Hf formed integrally on the surface of the ceramic base,
The ceramic base, which is composed of a thin film of a metal of Y or Si or at least one of oxides of the metal, and is coated with the thin film is made to be ion-irradiated, and the second sliding portion is diamond. A non-lubricated sliding member comprising a containing surface portion. 9. The non-lubricating sliding member according to claim 8, wherein the ceramic base is a ceramic sintered body, a ceramic single crystal, or a ceramic coating layer. 10. The first sliding portion is composed of a ceramic base portion serving as a bearing portion having a shaft hole, and a thin film formed on a surface of an inner peripheral portion forming the shaft hole of the bearing portion. The unlubricated sliding member according to claim 8, wherein the sliding portion is a shaft portion having a diamond-containing surface portion that is rotatably or linearly reciprocally inserted into the shaft hole of the bearing portion. 11. The second sliding portion is a bearing portion having a shaft hole and having a diamond-containing surface portion on an inner peripheral portion forming the shaft hole, and the first sliding portion is rotatable in the shaft hole or 9. The non-lubricating sliding member according to claim 8, which is composed of a ceramic base portion that is a shaft portion that is inserted so as to be linearly reciprocally movable, and a thin film that is formed on the outer peripheral portion of the shaft portion. 12. The first sliding portion comprises a ceramic base portion forming a rail and a thin film formed on the outer peripheral surface of the rail, and the second sliding portion reciprocates along the rail. 9. The non-lubricated sliding member according to claim 8, which is a slider having a diamond-containing surface portion. 13. The thin film is formed by vacuum vapor deposition, electron beam vapor deposition, sputtering, ion plating, or cluster ion beam vapor deposition.
An unlubricated sliding member according to the item. 14. The thin film has a thickness of 100 angstroms or more.
The unlubricated sliding member according to claim 8, which has a thickness of 1 μm. 15. Ion irradiation comprises H ⁺ , He ⁺ , N ⁺ , O ⁺ , Ar ⁺ ,
The unlubricated sliding member according to claim 8, which is irradiated with at least one of Kr ⁺ , Xe ⁺ , and Si ⁺ . 16. The unlubricated sliding member according to claim 8, wherein the ion irradiation is performed deeper than the thickness of the coated thin film. 17. Ion irradiation comprises 5 × 10 ^{14 to} 5 × 10 ¹⁷ ions
The unlubricated sliding member according to claim 8, which is irradiated with an amount of / cm ² .