JPH08166395A - Sensor-part device of ultra-high-vacuum microscope, attachment thereof and microscope apparatus - Google Patents

Abstract

PURPOSE: To make it possible to utilize an interatomic force microscope (FAM) even in ultra-high vacuum by performing the repalcement and the optical-axis adjustment of a cantilever at the outside, and performing conveyance in the vacuum. CONSTITUTION: The beam of a laser diode 7 becomes the downward reflected light 37 and hits the rear surface of a cantilever 5. The reflected light 38/39 is cast on a binary splitting photodiode 8. When the lever 5 is deflected, the direction of the reflected light 38/39 is fluctuated, and the hitting position at the diode 8 is moved up and down. The up-and-down movement is detected by the relative ratio of the incident amount for the binary split part. At this time, the beam is adjusted by each rotating stage and XY stages so that the reflected light 39 at the deflection center of the lever 5 is cast into the center of the diode 8. The replacement and the adjustment of the lever 5 are performed at the outside of a vacuum device. After the adjustment, a slider 13 of a sensor part device 12 is held and conveyed in the horizontal direction by a transfer rod and mounted on the measuring position from the opening of the outer-frame mounting part of an apparatus vacuum chamber. Then, the lever 5 is brought close to the sample, and the sample is measured by an FAM.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a structure of a cantilever deflection detecting mechanism which can be used in an ultrahigh vacuum. The cantilever is a sensor part of an atomic force microscope. The cantilever structure of the present invention can of course be used for a single atomic force microscope. Furthermore, scanning tunneling microscope (STM), atomic force microscope (AFM)
It can also be used as a structure of a cantilever of a compound microscope in which a scanning capacitance microscope (SCaM) is combined with

A compound microscope will be described first. A scanning tunneling microscope is a microscope that measures the tunnel current flowing between a probe and a sample to check the surface roughness and electronic state of the sample. The atomic force microscope is a microscope that can observe the unevenness of the sample surface in atomic units. The capacitance microscope is a microscope for measuring minute changes in capacitance of the probe and the sample surface. These are microscopes with different purposes and principles. However, both are extremely effective means for observing the fine structure and composition of the surface of a semiconductor. Therefore, the present inventor intends to combine the functions of these microscopes to develop a composite device.

[0003]

2. Description of the Related Art [Atomic force microscope (AFM)] This is a microscope for obtaining information on the unevenness of a sample surface by detecting an atomic force acting between adjacent atoms. Specifically, an insulating flexible member is brought close to the sample, and the bending of the member due to the atomic force acting between the member atom and the sample atom is detected optically or electrostatically. The amount of bending is proportional to the atomic force. Since the atomic force is a short-range force, it is possible to know the fine irregularities of the sample from the atomic force. A piezoelectric element is used for relative movement between the sample and the sensor member. One end surface of the piezoelectric element is fixed to the device, and the sensor member is fixed to the other end surface. Electrodes are formed on the piezoelectric element in the triaxial directions, and the piezoelectric elements are displaced by applying voltages in the triaxial directions. The sample can be finely displaced and scanned by the applied voltage of the piezoelectric element.

The member for detecting the atomic force may be a leaf spring. It's a hard bead and bends well, so
This member is sometimes called a cantilever. The cantilever must be insulative and flexible. Si ₃ N ₄ , S
A thin film of a material having a low Young's modulus such as iO ₂ or Si is used.
The cantilever is also called a leaf spring or a spring. When the probe is brought close to the sample surface, a force is generated at the tip of the sample atom and the cantilever, and this force is measured. Since no electrical mechanism is used, the cantilever may be insulating.

The deflection of the cantilever is detected by, for example, an optical lever. The light means a light source, a cantilever, and a plurality of light receiving elements. A laser with excellent directivity is often used as the light source. The laser light is applied to the back surface of the cantilever and is reflected, and the displacement of this light is obtained by the relative change of the inputs of a plurality of light receiving elements. The laser diode and the light receiving element are fixed to appropriate portions of the microscope apparatus.

[Scanning Tunneling Microscope (STM)] A tunneling current flows when a conductive probe attached to a piezoelectric element is brought close to a sample and a voltage is applied between them. When the probe is scanned so that the tunnel current is constant, the irregularities on the sample surface can be seen. The electronic state of the sample surface can also be investigated.

[Scanning capacitance microscope (SCaM)]
A conductive probe is brought close to the sample, the capacitance formed between the probe and the charge on the sample surface is measured, and the capacitance distribution on the sample surface is detected. The sensor part is a short probe made of metal. The sensor part does not need to bend. An AC voltage is applied between the sample and the probe, and the capacitance between the sample and the probe is measured by the capacitance sensor. This makes it possible to investigate the distribution and thickness of the depletion layer of the semiconductor. The probe is naturally conductive.

The inventor of the present invention intends to develop a microscope combining these scanning tunneling microscope (STM), atomic force microscope (AFM) and scanning capacitance microscope (SCaM). An example of a compound microscope will be briefly described with reference to FIG. This is a schematic configuration diagram of a microscope that combines STM, AFM, and SCaM. The sample 1 is fixed on a scanning piezo (piezoelectric element) 2. Electrode pairs are attached to the scanning piezoelectric element 2 in three directions of X direction, Y direction, and Z direction. When a voltage is applied to each electrode, the piezoelectric element can be distorted in a predetermined direction. As a result, the position of the sample 1 can be slightly displaced. In this case, the sample is scanned by the deformation of the piezoelectric element to which the sample is fixed.

The servo circuit 3 applies a suitable voltage to the electrodes of the piezoelectric element 2 to give a desired displacement. Sample 1
A conductive cantilever 5 is provided along the surface of the.
This is supported by a holder-6. Holder-6
Is conductive, and the cantilever is also conductive. This is a device for making STM or SCaM. When simply using the AFM, the cantilever may be an insulating one. The laser 7 irradiates the tip of the cantilever with light from above. The reflected light is detected by the detector 8 provided obliquely above. Since the detector is divided and the relative input of the divided detector changes when the cantilever bends, the amount of deflection can be obtained. Such an optical lever is AF
It is necessary to fulfill the function as M.

The holder 6 is connected to either the capacitance sensor 10 or the current detection circuit 11 via the changeover switch 9. When connected to the current detection circuit, a voltage is applied to measure the tunnel current between the sample and the probe at the tip of the cantilever to function as the STM. The surface state, especially the electronic state is known. When connected to the capacitance sensor 10, an AC voltage is applied between the sample and the probe to measure the capacitance.
At this time, it functions as SCaM, and the electrostatic capacitance distribution on the surface can be obtained. The present invention relates to an atomic force microscope (AF
This is an improvement in the structure of the sensor unit of the M) only or the compound microscope of AFM, STM, and SCaM.

[0011]

Unlike many other measurement methods, atomic force microscopy (AFM) does not require the sample to be in a vacuum. It could even be said to be one of the few measuring means that can measure even under atmospheric pressure. If it can be measured under atmospheric pressure, a large number of objects can be observed as they are, which is extremely effective. AFM by placing the sample in a vacuum
There are few things to observe. For that reason, little improvement has been made so far on the premise that the atomic force microscope is used in an ultrahigh vacuum.

For that reason, various problems occur when measuring the physical properties of a sample by an atomic force alone or as a compound microscope in an ultrahigh vacuum. Here, the mounting structure of the cantilever is a problem. The conventional cantilever is attached to a piezoelectric element to enable three-dimensional fine movement.

In the atomic force microscope, an optical lever is used to detect the deflection of the cantilever. A laser diode is used for the light source of the optical lever. This is because the laser emits a strong convergent light, so that high brightness can be obtained on the light receiving element surface. This is, for example, a GaAlAs laser. 6
It emits light with a wavelength of about 70 nm. This is sufficient when using at atmospheric pressure. However, there are problems when used in ultra-high vacuum. To draw the chamber to an ultra-high vacuum, it is not enough to simply suck and remove the gas with a vacuum exhaust device. Gas is adsorbed on the wall of the chamber, the equipment, and the surface of the device, but it is difficult to remove these just by sucking them. Therefore, the entire chamber is heated to release the adsorbed gas. Heating is called baking. This is indispensable when drawing the inside of the container to an ultrahigh vacuum. However, this laser diode cannot shine due to the high heat of baking.
The laser breaks when exposed to high temperatures.

If baking is essential, ultra high vacuum A
The FM would not be able to illuminate the laser diode and be used as this light source. It is conceivable that the light lever is installed outside the device and the light is guided inside the device by an optical fiber. This may be possible, of course, but the shaking of light due to the vibration of the optical fiber will be a problem. If possible, we would like to install a light source inside the device to detect the optical lever. This seems to be a difficult problem to solve.

A piezoelectric element is used to scan the sample or the cantilever. For example, a cantilever is fixed to the piezoelectric element, the voltage of the piezoelectric element is changed, and the piezoelectric element is moved three-dimensionally. The piezoelectric element is made of ceramics such as barium titanate, lead zirconate titanate, and lead titanate, but they are all vulnerable to heat. It deteriorates when heated. If baking is done, these piezoelectric elements must be kept out of heat. For example, it is necessary to keep it below 150 degrees. But this is difficult. What has been said to have nothing to do with cantilever directly.

When the cantilever is used for a long time, the tip is worn. When worn, the resolution is reduced. Therefore, the cantilever needs to be replaced at any time. The cantilever is a small part. It is necessary to make a mechanism for exchanging this in the vacuum chamber. In order to replace the cantilever, it is necessary for an operator to insert his / her hand into the chamber and perform fine manual work.

Also, the cantilever must be adjusted after replacement. It is set so that the laser light strikes a predetermined portion of the tip of the cantilever and is reflected to hit the center of the detector. These settings cannot be done by one's hands on the device. After evacuating, you have to adjust from the outside of the device. A very complicated mechanism must be provided in the vacuum chamber for remote control. The equipment is extremely complicated and expensive. Not only that, but when it becomes complicated, the rigidity decreases. Therefore, it is easily affected by vibration and the like. Furthermore, there is also a problem that noise due to temperature drift increases as the device becomes larger. It is desirable that the microscope device be small.

It is an object of the present invention to solve the above-mentioned problems and to provide a function of detecting deflection of a cantilever so that an AFM microscope and a compound microscope can be used even in an ultrahigh vacuum. That is, it is a first object of the present invention to provide a cantilever deflection detection mechanism capable of performing baking for obtaining an ultrahigh vacuum without deteriorating a piezoelectric element and a laser diode. . Further, it is a second object of the present invention to provide a cantilever deflection detecting mechanism which facilitates replacement of the cantilever. A third object of the present invention is to provide a cantilever detecting mechanism which facilitates adjustment after replacement of the cantilever.

[0019]

According to the present invention, a light source, a light receiving element, a cantilever, and a piezoelectric element are housed in one unit to form a sensor unit. The sensor unit is configured so that it can be transported in a vacuum between a mounting position and a standby position by a transport device. The standby position is set in another sensor unit unit introduction chamber (vacuum chamber) from which the sensor unit unit can be taken out. A gate valve is provided between the analysis chamber and the introduction chamber to shut off both.

The transfer device can be moved back and forth between the cantilever introduction chamber and the analysis chamber over the gate valve. The carrier device can also carry the sensor unit unit to the standby position and place the sensor unit unit on the standby stand. The carrier device can also carry the sensor unit to the test position and fix it to the wearing part.

[0021]

With the sensor unit separated from the unit mounting portion of the chamber, the chamber is baked and pulled to an ultrahigh vacuum. The piezoelectric element and laser diode are not heated and therefore do not deteriorate. After sufficient baking is performed and the vacuum is drawn, mount the sensor unit on the mounting part. The replacement of the cantilever is performed with the sensor unit unit removed to the outside. It is extremely easy to remove and install the screws. That is not all. After the replacement of the cantilever, the adjustment of reflecting the laser light so that the reflected light strikes the center of the light receiving element becomes very easy.

[0022]

DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 2 is a longitudinal sectional view of a part of a sensor unit according to an embodiment of the present invention. This is Cantilever-5,
The laser diode 7, the two-divided photodiode 8 and the piezoelectric element 18 are integrated. Instead of directly fixing these elements to the chamber, they are collectively mounted on the sensor unit 12 and the sensor unit is moved between a predetermined measurement position and a standby position.

At the top of the sensor unit 12, there is a slider 13 made of metal, ceramic or the like. This is a parallel upper surface 14, a lower surface 15 and a parallel front end surface 16,
It has a rectangular parallelepiped shape having a rear end surface 17, side surfaces and the like. The top portion 19 of the tube type piezo (piezoelectric element) 18 has a slider 13
Is fixed to the lower surface 15 of the. The piezoelectric element 18 is cylindrical and has a top portion 19 and a bottom portion 20. On the wall, electrodes 21, 2
2, 23, 24, etc. are provided. These are X direction, Y
The piezoelectric element can be distorted in that direction by applying an electric field in the Z direction. Displacement in the Z direction can change the contact state between the cantilever and the sample. The cantilever can be scanned by slightly displacing the piezoelectric element in the X and Y directions.

A rectangular parallelepiped housing 25 is fixed to the bottom portion 20 of the piezoelectric element 18. The housing 25 has an upper wall 26,
It has side walls 27, 28, a bottom wall 29, and the like. The bottom wall 29 has an opening 30 at its center. A laser diode 7, which is a light source, is fixed to one side wall 27. Ray
In front of the laser, there is a focus lens 31, which collects the laser light and collimates it. A mirror 32 is attached to the upper wall 26 by a rotating stage 33 in front of the laser.

In front of the mirror 32, a second mirror 34 is attached to the upper wall 26 by a rotary stage 35. A two-divided photodiode 8 is fixed to the side wall 28 via an XY stage 40 at a position facing the laser diode 7. A screw hole 56 is bored in the slider 13 in the axial direction.

The beam emitted from the laser 7 is the lens 3
1 produces horizontal parallel light 36, which is reflected by the mirror 32 to form downward light 37. This hits the back surface of the lower cantilever 5. The light 38 reflected on the back surface of the cantilever 5 is further reflected by the second mirror 34. The reflected light 39 enters the two-divided photodiode 8. The cantilever 5 is fixed to the lower surface of the bottom wall 29 by an XY stage 41. The cantilever 5 is made of a flexible material. When this bends, the directions of the reflected lights 38 and 39 change. The position where the light beam 39 hits the photodiode 8 moves up and down. Since the photodiode is vertically divided into two, the upper and lower sides of the reflected light can be detected by the relative ratio of the incident amounts of the two divided portions of the photodiode.

It is desirable to set the reflected light 39 so as to enter the center of the two-divided photodiode at the center of bending of the cantilever 5. For this, Mira-32,
Beam adjustment is carried out by the rotary stages 33 and 35 of 34, the XY stage 41 of the cantilever, and the XY stage 40 of the two-divided photodiode 8.

Since such adjustment can be performed outside the vacuum apparatus, it is extremely convenient. Even when the cantilever is worn, the cantilever can be replaced outside the vacuum device. After replacement, these mechanisms will need to be readjusted. Further, baking can also be performed with the housing retracted to the outside in this way. In order to
The diode and photo diode are not damaged by heat.

Referring to FIGS. 3 to 6, the sensor unit 1
The conveyance and the attachment / detachment of No. 2 will be described. Sensor unit 1
A mounting part outer frame 42 to which 2 is to be fixed is fixed to a wall 43 of a vacuum chamber of an apparatus for inspecting and analyzing a sample. The mounting portion outer frame 42 is a housing including an upper wall 44, a side wall 45, a bottom wall 46, an end wall 47, and the like. The opening 48 is formed in one direction.
The slider 13 of the sensor unit 12 can be inserted and removed through the opening 48. A slide rail 55 is formed on the bottom wall 46 of the mounting portion 42. A groove 59 is cut on the lower surface of the slider 13. Since the groove 59 fits in the rail 55, the slider 13 can be slid smoothly on the bottom wall.

A connector 49 is provided at the front end of the slider-13. A connector 50 with a pin is fixed to the end wall 47 of the mounting portion outer frame 42. A through hole 51 is formed in the end wall 47.
The terminal of the connector 50 is inserted there. The terminal is connected to the external lead 52. These are for supplying a current to an internal electronic circuit and extracting a signal current.

The transfer of the slider 13 is performed by the transfer rod 53. This is a horizontally long rod that can hold the slider 13 and can be transported in the horizontal direction. A male screw 5 is attached to the tip of the transfer rod 53.
4 are formed. The transfer rod 53 and the slider 13 can be connected by screwing the male screw 54 into the screw hole 56 of the slider 13. A leaf spring 57 is provided on the inner surface of the upper wall 44 of the mounting portion outer frame 42 to press the upper surface of the slider-13.

With the male screw 54 of the transfer rod 53 screwed into the screw hole 56, the slider can be carried in the axial direction. When the slider is inserted into the mounting portion 42 and pushed, the connector 49 fits into the connector 50. Since the leaf spring 57 presses the slider from above, it does not rattle. With this, the sensor unit 12 is mounted in the fixed position. Turn the transfer rod, remove the screw, and retract the rod. After that, cantilever the sample.
To measure the physical properties of the sample as an atomic force microscope or a compound microscope.

The transfer rod 53 is shown in the perspective view of FIG.
And the slider 13 are separated. In practice, the transfer rod is always in vacuum, and the sensor unit 12 is only transported in vacuum by the transfer rod. Cantilever replacement
The sensor unit unit can be taken out for the king. For that purpose, there is another vacuum chamber for introducing the sensor unit unit into a vacuum or taking it out of the vacuum. This will be described with reference to FIG.

The analysis chamber 61 is a vacuum chamber having a sample table 62 in the center of the space 63. An evacuation device (not shown) for drawing an ultrahigh vacuum is provided. Again
A heating mechanism (not shown) for the king is also provided.
The analysis chamber 61 has a communication part 64 which is open to one side. A sensor unit unit introduction chamber 65 is provided to take out the sensor unit unit 12 from the atmosphere into a vacuum or from the vacuum into the atmosphere. This is also a vacuum chamber and has a door for entering and exiting the sensor unit. This chamber also has its own vacuum exhaust system.

The connecting portion 64 of the analysis chamber 61 is the connecting pipe 6
7, a gate valve 68, and a connecting pipe 69 connect to the sensor unit introduction chamber 65. A transfer rod outer tube 66 is attached to the side of the chamber 65. The inside of this is also a vacuum, and the transfer rod described above moves in parallel there. The magnet 70 or the like moves the internal rod in a non-contact manner.

The sample 1 is placed in the analysis chamber. With the sensor unit taken out of the introduction chamber,
Vacuum the interior of the analysis chamber. At this time, the gate valve 68 is closed. The door of the chamber 65 is also closed. After the baking is completed and the inside of the analysis chamber is sufficiently evacuated, the sensor unit unit introduction chamber 65 is opened and the sensor unit unit is inserted therein. Close the door and evacuate the inside of the sensor unit unit introduction chamber. The tip of the transfer rod 53 is screwed into the screw hole 56 of the slider.

The gate valve is opened to bring the slider into the analysis chamber. This is inserted into the wearing outer frame 42. The leaf spring 57 presses the upper surface of the slider. The front connector 49 fits snugly into the connector 50 on the end wall 47. As a result, the sensor unit is correctly fixed at the measurement position. Pull back the transfer rod 53. Gee
The valve 68 is closed. Further, the analysis chamber 61 is pulled to an ultrahigh vacuum. After that, a predetermined measurement is performed.

When the tip of the cantilever is worn, the entire sensor unit is taken out. Externally replace the cantilever with a new one. The positions of the mirror 32, the mirror 34, the cantilever 5 and the photo diode are adjusted so that the light emitted from the laser light is reflected by the mirror and the cantilever and correctly enters the light receiving element. This adjustment can be performed under atmospheric pressure, which is extremely easy.

[0039]

According to the present invention, the cantilever, the laser diode, the piezoelectric element, the photo diode, etc. are not directly attached to the vacuum device but are integrated in the sensor unit. The sensor unit is independent and can be removed from the vacuum device or attached to a predetermined position of the vacuum device. The sensor unit is taken out to the outside, and the analysis chamber is baked and evacuated.
The piezoelectric element and the photodiode are not damaged. Baking is absolutely necessary to make an ultra-high vacuum,
It can be said for the first time that an ultrahigh vacuum atomic force microscope can be realized by the present invention.

Furthermore, the probe (tip) of the cantilever is worn out, and it is necessary to replace it occasionally. If the cantilever is directly attached to the vacuum chamber, it is necessary to put a hand into the cantilever attachment portion at one corner of the apparatus having a complicated structure and screw it. However, in the present invention, the cantilever is attached to the sensor unit unit taken out.
It's very easy to exchange. Furthermore, after the replacement, it is necessary to adjust the mirror and the photodiode, which is also very easy.

[Brief description of drawings]

FIG. 1 is a schematic configuration principle diagram of a compound microscope in which an atomic force microscope (AFM), a capacitance microscope (SCaM), and a scanning tunnel microscope (STM) are integrated.

FIG. 2 is a vertical sectional view of a sensor unit used in the present invention.

FIG. 3 is a vertical cross-sectional view of a state in which the sensor unit is attached to a mounting portion in a vacuum device and is axially cut.

FIG. 4 is a vertical cross-sectional view of a state in which the sensor unit is attached to a mounting portion in a vacuum device and is cut in a direction perpendicular to an axis.

FIG. 5 is a perspective view of a sensor unit and a transfer rod for transporting the sensor unit in a separated state.

FIG. 6 is a schematic cross-sectional view of an analysis chamber, a sensor unit introduction chamber, a transfer rod, etc. for explaining how the sensor unit unit is introduced into a vacuum device and attached to a mounting portion.

[Explanation of symbols]

 1 Sample 2 Scanning Piezoelectric Element (Piezo) 3 Servo Circuit 4 Bias Power Supply 5 Conductive Cantilever 6 Holder 7 Laser Diode 8 2-Division Photodiode 9 Changeover Switch 10 Capacitance Sensor 11 Current Detection Circuit 12 Sensor unit 13 Slider 14 Upper surface 15 Lower surface 16 Front end surface 17 Rear end surface 18 Tube type piezoelectric element 25 Housing (detection mechanism) 31 Focus lens 32 Miller 33 Rotation stage 34 Miller 35 Rotation stage 40 XY stage 41 XY stage 42 Mounting part outer frame 43 Chamber wall 48 Opening 49 Connector 50 Connector 53 Transfer rod 54 Male screw 55 Sliding rail 56 Screw hole 57 Leaf spring 61 Analysis chamber 62 Sample stand 63 Space 64 Contact part 65 Sensor unit introduction chamber 66 Transfer rod outer tube 67 Communication tube 68 Gate valve 69 Communication tube

Claims (3)

[Claims] 1. A sensor unit for detecting deflection of a cantilever of an atomic force microscope or a compound microscope combining an atomic force microscope, a capacitance microscope and a scanning tunnel microscope, which is a predetermined unit in an analysis chamber. A slider fitted to the outer frame of the mounting portion provided at a position, a three-dimensionally displaceable piezoelectric element having one end fixed to the slider, a housing fixed to the other surface of the piezoelectric element, and a housing fixed to the housing for detection. For emitting light, a mirror for guiding the light emitted from the light emitting element to the back surface of the cantilever, a mirror for further reflecting the light reflected on the back surface of the cantilever, and a mirror for reflecting the light. A light receiving element divided into a plurality of parts for receiving light and providing an output at a ratio according to the deflection of the cantilever, a rotating stage of the mirror, and a step for adjusting the position of the light receiving element or the light emitting element. -, A stage for adjusting the position of the cantilever, and a mechanism for coupling the transfer device formed on the slider, which can be taken out of the vacuum chamber and the cantilever can be replaced outside. A sensor unit unit of an ultra-high vacuum microscope, characterized in that the optical axis is adjusted and held by a carrying device so that it can be carried in a vacuum. 2. A slider, a three-dimensionally displaceable piezoelectric element whose one end is fixed to the slider, a housing fixed to the other surface of the piezoelectric element, and light emission which is fixed to the housing and generates light for detection. An element, a mirror that guides the light emitted from the light emitting element to the back surface of the cantilever, a mirror that further reflects the light reflected on the back surface of the cantilever, and a cantilever that receives the light reflected by the mirror. A plurality of divided light receiving elements that give an output of a ratio according to the deflection of
The rotation stage of the mirror, the stage for adjusting the position of the light receiving element or the light emitting element, the stage for adjusting the position of the cantilever, and the transfer device formed on the slider. A sensor unit unit including a coupling mechanism for detecting the deflection of the cantilever of an atomic force microscope or a compound microscope, is installed in the analysis chamber of the microscope by a vacuum transfer device, and the sensor unit unit introduction chamber is on standby. When reciprocating between positions, when the sensor unit is in the standby position, the valve between the analysis chamber and the sensor unit introduction chamber is closed, and only the analysis chamber is baked and evacuated to an ultra high vacuum. A special feature is that the sensor unit unit is carried from the sensor unit unit introduction chamber pulled to the above position to the mounting position of the analysis chamber by the transfer device and fixed thereto. The sensor section unit mounting method of an ultra-high vacuum microscope to. 3. A slider, a three-dimensionally displaceable piezoelectric element having one end fixed to the slider, a housing fixed to the other surface of the piezoelectric element, and light emission which is fixed to the housing and generates light for detection. An element, a mirror that guides the light emitted from the light emitting element to the back surface of the cantilever, a mirror that further reflects the light reflected on the back surface of the cantilever, and a cantilever that receives the light reflected by the mirror. A plurality of divided light receiving elements that give an output of a ratio according to the deflection of
The rotation stage of the mirror, the stage for adjusting the position of the light receiving element or the light emitting element, the stage for adjusting the position of the cantilever, and the transfer device formed on the slider. A sensor unit unit including a coupling mechanism, an analysis chamber which is a space for placing a sample and contacting a cantilever to measure physical properties, a heating mechanism for baking the analysis chamber, and drawing a vacuum in the analysis chamber. For evacuation, a sensor unit unit introduction chamber connected to the analysis chamber, a second vacuum evacuation device for evacuating the sensor unit unit introduction chamber, and a connecting pipe connecting the analysis chamber and the sensor unit unit introduction chamber. The gate valve provided on the way and the sensor unit unit introduction chamber and the analysis chamber are reciprocated to convey the sensor unit unit between them. Of the carrier, a sample table provided in the analysis chamber, and an outer frame of a mounting part that is provided above the sample table of the analysis chamber and can hold the slider of the sensor unit, and when baking the analysis chamber, A microscope apparatus characterized in that the sensor unit unit is retracted into the sensor unit unit introduction chamber so that the analysis chamber can be heated.