JPH08146095A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH08146095A
JPH08146095A JP6309432A JP30943294A JPH08146095A JP H08146095 A JPH08146095 A JP H08146095A JP 6309432 A JP6309432 A JP 6309432A JP 30943294 A JP30943294 A JP 30943294A JP H08146095 A JPH08146095 A JP H08146095A
Authority
JP
Japan
Prior art keywords
characteristic
measuring
measurement
integrated circuit
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP6309432A
Other languages
Japanese (ja)
Inventor
Kei Kato
圭 加藤
Satoshi Oguchi
聡 小口
Takeshi Ono
健 小野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Microcomputer System Ltd
Hitachi Ltd
Original Assignee
Hitachi Microcomputer System Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Microcomputer System Ltd, Hitachi Ltd filed Critical Hitachi Microcomputer System Ltd
Priority to JP6309432A priority Critical patent/JPH08146095A/en
Publication of JPH08146095A publication Critical patent/JPH08146095A/en
Withdrawn legal-status Critical Current

Links

Landscapes

  • Testing Of Individual Semiconductor Devices (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE: To load a logical LSI device with a large number of measuring elements having characteristics almost the same as those off a substrate element becoming an object of characteristic evaluation by arranging a characteristic measuring part within an effective region of a semiconductor substrate and separately providing the pad of a measuring power supply and to enable a characteristic measuring test after the cutting of a chip to be performed. CONSTITUTION: A characteristic measuring part TEG containing measuring elements subjected to the characteristic evaluation of a fundamental element is arranged, for example, in the effective region containing four corners of a semiconductor substrate. The supply pad for supplying a measuring power supply to the measuring part TEG is provided separately from the pad for supplying an operation power supply to an internal circuit. By this constitution, a large number of the measuring elements having characteristics the same as those of the fundamental element becoming an object of characteristic evaluation can be mounted on a logical LSI device. A characteristic measuring test can be executed over various items without exerting effect on the constitutional elements of the internal circuit and the operation thereof and a characteristic measuring test for analyzing inferiority after the cutting of a chip can be also performed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は半導体装置に関し、例
えば、複数のモジュールを備える大規模論理集積回路装
置ならびにその特性評価に利用して特に有効な技術に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device, for example, a large-scale logic integrated circuit device including a plurality of modules and a technique particularly effective for use in evaluating the characteristics thereof.

【0002】[0002]

【従来の技術】MOSFET(金属酸化物半導体型電界
効果トランジスタ。この明細書では、MOSFETをし
て絶縁ゲート型電界効果トランジスタの総称とする)を
基本素子とし、中央処理装置やランダムアクセスメモリ
等の複数のモジュールを備える大規模論理集積回路装置
がある。これらの大規模論理集積回路装置等では、開発
及び量産に際して基本素子の特性評価が行われ、その結
果をもとに製品の性能確認や特性改善ならびに不良解析
等が実現される。従来の大規模論理集積回路装置等にお
いて、特性評価のための測定用素子を含む特性測定部T
EGは、大規模論理集積回路装置等が形成される半導体
基板(チップ)の有効領域内ではなく、例えば図4に示
されるように、ウエハWAFの切断(ダイシング)領域
つまりチップCHP間の空き領域に配置され、チップ切
断後は使用されない。
2. Description of the Related Art A MOSFET (metal oxide semiconductor type field effect transistor. In this specification, a MOSFET is used as a general term for an insulated gate type field effect transistor) is used as a basic element and is used in a central processing unit, a random access memory or the like. There are large scale logic integrated circuit devices that include multiple modules. In these large-scale logic integrated circuit devices and the like, characteristic evaluations of basic elements are performed during development and mass production, and based on the results, product performance confirmation, characteristic improvement, defect analysis, etc. are realized. In a conventional large-scale logic integrated circuit device or the like, a characteristic measuring unit T including a measuring element for characteristic evaluation
The EG is not in the effective area of the semiconductor substrate (chip) on which the large-scale logic integrated circuit device or the like is formed, but as shown in FIG. 4, for example, a cutting (dicing) area of the wafer WAF, that is, an empty area between the chips CHP. It is not used after cutting the chip.

【0003】[0003]

【発明が解決しようとする課題】ところが、半導体集積
回路の大規模化及び高性能化が進み、基本素子の特性評
価に必要な測定用素子の数及び種類が増えるにしたがっ
て、従来の大規模論理集積回路装置等には次のような問
題点が生じることが本願発明者等によって明らかとなっ
た。すなわち、従来の大規模論理集積回路装置等では、
前述のように、特性測定部TEGが半導体基板の有効領
域内ではなくウエハの切断領域に形成されるため、大規
模論理集積回路装置等を構成し半導体基板の有効領域に
配置される基本素子の特性とウエハの切断領域に配置さ
れる測定用素子の特性との間に差異が生じ、これによっ
て特性測定試験の信頼性が損なわれる。また、ウエハの
チップ間に設けられる切断領域は、周知のように、百数
十μm(マイクロメートル)程度の小さな幅しかないた
め、パッドを含む測定用素子を多数配置することができ
ず、これによって実施可能な特性測定試験の項目数が制
限される。さらに、特性測定部TEGがウエハの切断領
域に配置されチップ切断後は使用できないことで、例え
ば組み立て後において不良解析等のための特性測定試験
を実施できず、このことが大規模論理集積回路装置等の
効率的な開発の妨げとなる。
However, as the scale and performance of semiconductor integrated circuits have increased and the number and types of measuring elements required for characteristic evaluation of basic elements have increased, conventional large-scale logic has been adopted. It has been clarified by the inventors of the present application that the following problems occur in integrated circuit devices and the like. That is, in a conventional large-scale logic integrated circuit device,
As described above, since the characteristic measuring unit TEG is formed not in the effective area of the semiconductor substrate but in the cutting area of the wafer, it is possible to configure the large-scale logic integrated circuit device, etc. Differences occur between the characteristics and the characteristics of the measuring element arranged in the cut area of the wafer, which impairs the reliability of the characteristic measurement test. Further, as is well known, the cutting region provided between the chips of the wafer has a small width of about a hundred and several tens of micrometers (micrometers), so that a large number of measuring elements including pads cannot be arranged. Limits the number of characteristic measurement tests that can be performed. Furthermore, since the characteristic measuring unit TEG is arranged in the cutting region of the wafer and cannot be used after cutting the chip, the characteristic measuring test for failure analysis or the like cannot be carried out after assembling, which results in the large-scale logic integrated circuit device. It hinders efficient development.

【0004】この発明の目的は、大規模論理集積回路装
置等に、特性評価の対象となる基本素子とほぼ同一の特
性を有する多数の測定用素子を搭載し、そのチップ切断
後における特性測定試験を可能にすることにある。この
発明の他の目的は、大規模論理集積回路装置等の特性測
定試験の信頼性を高めつつその測定項目数に関する制限
を解き、大規模論理集積回路装置等の開発を効率化する
ことにある。
An object of the present invention is to mount a large number of measuring elements having substantially the same characteristics as the basic element to be evaluated in a large-scale logic integrated circuit device, etc., and perform a characteristic measurement test after cutting the chip. Is to enable. Another object of the present invention is to improve the reliability of the characteristic measurement test of a large-scale logic integrated circuit device or the like and solve the limitation on the number of measurement items thereof, thereby making the development of the large-scale logic integrated circuit device efficient. .

【0005】この発明の前記ならびにその他の目的と新
規な特徴は、この明細書の記述及び添付図面から明らか
になるであろう。
The above and other objects and novel features of the present invention will be apparent from the description of this specification and the accompanying drawings.

【0006】[0006]

【課題を解決するための手段】本願において開示される
発明のうち代表的なものの概要を簡単に説明すれば、次
の通りである。すなわち、その主たる機能を実現するた
めの所定の内部回路を備える大規模論理集積回路装置等
の半導体装置において、基本素子の特性評価に供される
測定用素子を含む特性測定部を、半導体基板の例えば4
隅を含む有効領域内に配置するとともに、特性測定部に
測定用電源を供給するためのパッドを、内部回路に動作
電源を供給するためのパッドとは別個に設ける。
The outline of the representative one of the inventions disclosed in the present application will be briefly described as follows. That is, in a semiconductor device such as a large-scale logic integrated circuit device having a predetermined internal circuit for realizing its main function, a characteristic measuring section including a measuring element used for characteristic evaluation of a basic element is provided in a semiconductor substrate. Eg 4
The pad for arranging in the effective region including the corner and supplying the measuring power supply to the characteristic measuring section is provided separately from the pad for supplying the operating power supply to the internal circuit.

【0007】[0007]

【作用】上記した手段によれば、大規模論理集積回路装
置等に、特性評価の対象となる基本素子とほぼ同一の特
性を有する測定用素子を多数搭載できるとともに、内部
回路の構成素子ならびにその動作に影響を与えることな
く種々の項目にわたって特性測定試験を実施することが
でき、チップ切断後における不良解析等のための特性測
定試験をも可能にすることができる。この結果、大規模
論理集積回路装置等の特性測定試験の信頼性を高めつつ
その測定項目数に関する制限を解き、大規模論理集積回
路装置等の開発を効率化することができる。
According to the above-mentioned means, a large number of measuring elements having almost the same characteristics as the basic element to be evaluated can be mounted on a large-scale logic integrated circuit device, etc. The characteristic measurement test can be carried out over various items without affecting the operation, and the characteristic measurement test for defect analysis etc. after chip cutting can be enabled. As a result, it is possible to improve the reliability of the characteristic measurement test of a large-scale logic integrated circuit device or the like and solve the limitation on the number of measurement items, and to efficiently develop the large-scale logic integrated circuit device or the like.

【0008】[0008]

【実施例】図1には、この発明が適用された大規模論理
集積回路装置LSIの一実施例のブロック図が示されて
いる。また、図2には、図1の大規模論理集積回路装置
LSIの一実施例の基板配置図が示され、図3には、図
2の大規模論理集積回路装置LSIに含まれる特性測定
部TEG1の一実施例の配置図が示されている。これら
の図をもとに、この実施例の大規模論理集積回路装置L
SIの構成及び配置ならびに特性測定試験の概要とその
特徴について説明する。なお、この実施例の大規模論理
集積回路装置LSIは、Pチャンネル及びNチャンネル
MOSFETが組み合わされてなるいわゆるCMOS
(相補MOS)回路を基本に構成され、単結晶シリコン
からなる1個のウエハ上に複数個ずつ形成される。ま
た、以下の説明では、図2及び図3の位置関係をもって
半導体基板上における上下左右を表す。さらに、特性測
定部TEG1〜TEG6に関する以下の説明は、特性測
定部TEG1を中心に進められるが、その他の特性測定
部TEG2〜TEG6についてはこれと同様な構成及び
配置とされるため、類推されたい。
1 is a block diagram of an embodiment of a large-scale logic integrated circuit device LSI to which the present invention is applied. 2 shows a board layout diagram of one embodiment of the large-scale logic integrated circuit device LSI of FIG. 1, and FIG. 3 shows a characteristic measuring unit included in the large-scale logic integrated circuit device LSI of FIG. A layout of one embodiment of TEG1 is shown. Based on these figures, the large-scale logic integrated circuit device L of this embodiment will be described.
The outline and characteristics of the SI configuration and arrangement, and the characteristic measurement test will be described. The large-scale logic integrated circuit device LSI of this embodiment is a so-called CMOS in which P-channel and N-channel MOSFETs are combined.
A plurality of (complementary MOS) circuits are formed on a single wafer made of single crystal silicon. Further, in the following description, the vertical and horizontal directions on the semiconductor substrate are represented by the positional relationship of FIGS. 2 and 3. Further, the following description regarding the characteristic measuring units TEG1 to TEG6 will be mainly performed on the characteristic measuring unit TEG1, but the other characteristic measuring units TEG2 to TEG6 have the same configuration and arrangement as those described above, and therefore should be analogized. .

【0009】図1において、この実施例の大規模論理集
積回路装置LSIは、特に制限されないが、中央処理装
置CPUを基本構成要素とし大規模論理集積回路装置L
SIの主たる機能を実現するための内部回路となる論理
部LCと、6個の特性測定部TEG1〜TEG6とを備
える。このうち、論理部LCを構成する中央処理装置C
PUには、内部バスを介して乗算器MULT,リードオ
ンリーメモリROM,ランダムアクセスメモリRAM,
インタフェース制御部IFCならびに入出力ポートIO
が結合される。以上のモジュールからなる論理部LCに
は、電源電圧供給端子つまり電源電圧供給パッドVCC
を介して高電位側動作電源たる例えば+5V(ボルト)
の電源電圧VCCが供給され、接地電位供給端子つまり
接地電位供給パッドVSSを介して低電位側動作電源た
る0Vの接地電位VSSが供給される。また、論理部L
Cを構成する入出力ポートIOには、データ入力端子つ
まりデータ入力パッドDI1〜DImを介してmビット
の入力データが供給され、そのnビットの出力データ
は、データ出力端子つまりデータ出力パッドDO1〜D
Onを介して大規模論理集積回路装置LSIの外部に送
出される。
In FIG. 1, the large-scale logic integrated circuit device LSI of this embodiment is not particularly limited, but the large-scale logic integrated circuit device L has a central processing unit CPU as a basic constituent element.
A logic unit LC which is an internal circuit for realizing the main function of SI and six characteristic measuring units TEG1 to TEG6 are provided. Of these, the central processing unit C that constitutes the logic unit LC
The PU has a multiplier MULT, a read only memory ROM, a random access memory RAM, and a PU via an internal bus.
Interface control unit IFC and input / output port IO
Are combined. The logic unit LC including the above modules includes a power supply voltage supply terminal, that is, a power supply voltage supply pad VCC.
High-potential side operating power supply via, for example + 5V (volt)
Is supplied with a power supply voltage VCC of 0 V, and a ground potential VSS of 0 V, which is a low-potential-side operation power supply, is supplied via a ground potential supply terminal, that is, a ground potential supply pad VSS. Also, the logical unit L
Input / output port IO constituting C is supplied with m-bit input data via data input terminals, that is, data input pads DI1 to DIm, and its n-bit output data is supplied to data output terminals, that is, data output pads DO1 to DI1. D
It is sent to the outside of the large-scale logic integrated circuit device LSI via On.

【0010】論理部LCの入出力ポートIOは、後述す
るように、4個の入出力ポートIO1〜IO4からな
り、大規模論理集積回路装置LSIの外部装置とその内
部バスつまりは中央処理装置CPU又はインタフェース
制御部IFC等との間のデータ授受を仲介する。一方、
中央処理装置CPUは、リードオンリーメモリROMに
格納された制御プログラムに従ってステップ動作し、所
定の論理演算処理を実行するとともに、論理部LCの各
部を制御・統轄する。また、乗算器MULTは、中央処
理装置CPUの論理演算処理の一部を肩代わりして実行
し、ランダムアクセスメモリRAMは、中央処理装置C
PU及び乗算器MULTの演算結果や外部装置との間で
授受されるデータ等を一時的に格納する。さらに、リー
ドオンリーメモリROMは、中央処理装置CPUのステ
ップ動作に必要な制御プログラムや固定データ等を格納
し、インタフェース制御部IFCは、外部装置と大規模
論理集積回路装置LSIの論理部LCの中央処理装置C
PU又はランダムアクセスメモリRAMとの間で行われ
る一連のデータ授受を制御する。
The input / output port IO of the logic unit LC is composed of four input / output ports IO1 to IO4 as will be described later. The external device of the large-scale logic integrated circuit device LSI and its internal bus, that is, the central processing unit CPU. Alternatively, mediation of data exchange with the interface control unit IFC or the like is performed. on the other hand,
The central processing unit CPU performs step operations according to a control program stored in the read-only memory ROM, executes predetermined logical operation processing, and controls / controls each unit of the logic unit LC. Further, the multiplier MULT executes a part of the logical operation processing of the central processing unit CPU, and the random access memory RAM is the central processing unit C.
The calculation result of the PU and the multiplier MULT, data exchanged with an external device, and the like are temporarily stored. Further, the read-only memory ROM stores control programs and fixed data necessary for the step operation of the central processing unit CPU, and the interface control unit IFC centrally controls the external device and the logic unit LC of the large-scale logic integrated circuit device LSI. Processor C
It controls a series of data transfer between the PU and the random access memory RAM.

【0011】一方、特性測定部TEG1〜TEG6は、
大規模論理集積回路装置LSIつまり論理部LCの基本
素子であるMOSFETの特性評価のための所定数の測
定用素子や、複数の測定用素子が組み合わされてなり大
規模論理集積回路装置LSIのAC(交流)特性を評価
するためのリングオシレータ等の試験回路をそれぞれ含
む。このうち、特性測定部TEG1には、測定用電源電
圧供給パッドTVC1を介して高電位側測定用電源たる
測定用電源電圧TVC1が供給され、測定用接地電位供
給パッドTVS1を介して低電位側測定用電源たる測定
用接地電位TVS1が供給される。また、測定用制御パ
ッドTC1を介して所定の測定制御信号TC1が供給さ
れるとともに、測定用入力パッドTI11〜TI12を
介して試験入力信号TI11〜TI12が供給され、そ
の試験出力信号TO11〜TO12は測定用出力パッド
TO11〜TO12を介して出力される。
On the other hand, the characteristic measuring units TEG1 to TEG6 are
AC of the large-scale logic integrated circuit device LSI, that is, a combination of a predetermined number of measurement devices for evaluating the characteristics of the MOSFET, which is a basic device of the logic unit LC, and a plurality of measurement devices. Each includes a test circuit such as a ring oscillator for evaluating the (alternating) characteristics. Of these, the characteristic measuring unit TEG1 is supplied with a measurement power supply voltage TVC1 which is a high-potential-side measurement power supply via a measurement power-supply voltage supply pad TVC1 and a low-potential side measurement via a measurement ground potential supply pad TVS1. A measurement ground potential TVS1 that is a power source for the power supply is supplied. Further, a predetermined measurement control signal TC1 is supplied via the measurement control pad TC1 and test input signals TI11 to TI12 are supplied via the measurement input pads TI11 to TI12, and the test output signals TO11 to TO12 are It is output via the measurement output pads TO11 to TO12.

【0012】同様に、特性測定部TEG2〜TEG6に
は、対応する測定用電源電圧供給パッドTVC2〜TV
C6を介して高電位側測定用電源たる測定用電源電圧T
VC2〜TVC6がそれぞれ供給され、対応する測定用
接地電位供給パッドTVS2〜TVS6を介して低電位
側測定用電源たる測定用接地電位TVS2〜TVS6が
それぞれ供給される。また、対応する測定用制御パッド
TC2〜TC6を介して所定の測定制御信号TC2〜T
C6がそれぞれ供給されるとともに、対応する測定用入
力パッドTI21〜TI22ないしTI61〜TI62
を介して試験入力信号TI21〜TI22ないしTI6
1〜TI62がそれぞれ供給され、その試験出力信号T
O21〜TO22ないしTO61〜TO62は測定用出
力パッドTO21〜TO22ないしTO61〜TO62
を介して出力される。
Similarly, the characteristic measuring units TEG2 to TEG6 have corresponding measuring power supply voltage supply pads TVC2 to TV.
Power supply voltage for measurement T which is a power supply for measurement on the high potential side via C6
VC2 to TVC6 are respectively supplied, and the measurement ground potentials TVS2 to TVS6, which are low-potential-side measurement power supplies, are supplied via the corresponding measurement ground potential supply pads TVS2 to TVS6. In addition, predetermined measurement control signals TC2 to T are transmitted via corresponding measurement control pads TC2 to TC6.
C6 are respectively supplied and corresponding measurement input pads TI21 to TI22 to TI61 to TI62.
Via test input signals TI21 to TI22 to TI6
1 to TI62 are respectively supplied, and the test output signal T
O21 to TO22 to TO61 to TO62 are measurement output pads TO21 to TO22 to TO61 to TO62.
Is output via.

【0013】大規模論理集積回路装置LSIが特性測定
試験下にあるとき、特性測定部TEG1〜TEG6の測
定用電源電圧供給パッドTVC1〜TVC6,測定用接
地電位供給パッドTVS1〜TVS6,測定用入力パッ
ドTI11〜TI12ないしTI61〜TI62ならび
に測定用出力パッドTO11〜TO12ないしTO61
〜TO62は、所定のプローブカードを介して外部の試
験装置に結合される。このとき、特性測定部TEG1〜
TEG6を構成する各測定用素子は、外部の試験装置か
ら対応する測定用電源電圧供給パッドTVC1〜TVC
6ならびに測定用接地電位供給パッドTVS1〜TVS
6を介して供給される測定用電源電圧TVC1〜TVC
6ならびに測定用接地電位TVS1〜TVS6をその測
定用電源とし、外部の試験装置から対応する測定用制御
パッドTC1〜TC6を介して供給される測定制御信号
TC1〜TC6に従って選択的に有効状態又は動作状態
とされる。そして、外部の試験装置から測定用入力パッ
ドTI11〜TI12ないしTI61〜TI62を介し
て供給される試験入力信号TI11〜TI12ないしT
I61〜TI62をもとに所定の試験出力信号TO11
〜TO12ないしTO61〜TO62を選択的に形成
し、測定用出力パッドTO11〜TO12ないしTO6
1〜TO62を介して外部の試験装置に送出する。
When the large-scale logic integrated circuit device LSI is under the characteristic measurement test, the measurement power supply voltage supply pads TVC1 to TVC6 and the measurement ground potential supply pads TVS1 to TVS6 and the measurement input pad of the characteristic measurement units TEG1 to TEG6 are measured. TI11 to TI12 to TI61 to TI62 and measurement output pads TO11 to TO12 to TO61
~ TO62 is coupled to an external test device via a predetermined probe card. At this time, the characteristic measuring unit TEG1 to
Each of the measuring elements constituting the TEG6 is connected to a corresponding measuring power supply voltage supply pad TVC1 to TVC from an external test apparatus.
6 and ground potential supply pads TVS1 to TVS for measurement
Power supply voltage for measurement TVC1 to TVC supplied via 6
6 and the ground potentials TVS1 to TVS6 for measurement as the power source for the measurement, and selectively activated or operated in accordance with the measurement control signals TC1 to TC6 supplied from the external test equipment through the corresponding measurement control pads TC1 to TC6. To be in a state. Then, test input signals TI11 to TI12 to T supplied from an external test apparatus via the measurement input pads TI11 to TI12 to TI61 to TI62.
Predetermined test output signal TO11 based on I61 to TI62
To TO12 to TO61 to TO62 are selectively formed, and measurement output pads TO11 to TO12 to TO6 are formed.
1 to TO62 to send to an external test device.

【0014】ここで、論理部LCを構成する中央処理装
置CPUは、特に制限されないが、図2に示されるよう
に、大規模論理集積回路装置LSIが形成される半導体
基板SUBの中央部の大半を占めて配置される。中央処
理装置CPUの左下部には乗算器MULTが配置され、
その右下部にはインタフェース制御部IFCが配置され
る。また、中央処理装置CPUの左上部にはランダムア
クセスメモリRAMが配置され、その右上部にはリード
オンリーメモリROMが配置される。さらに、ランダム
アクセスメモリRAM及びリードオンリーメモリの上部
には、半導体基板SUBの上辺に沿って4分割された入
出力ポートIOの一部つまり入出力ポートIO1が配置
され、リードオンリーメモリROM及びインタフェース
制御部IFCの右部,乗算器MULT及びインタフェー
ス制御部IFCの下部ならびにランダムアクセスメモリ
RAM及び乗算器MULTの左部には、半導体基板SU
Bの右辺,下辺ならびに左辺に沿って4分割された入出
力ポートIOの他の一部つまり入出力ポートIO2,I
O3及びIO4がそれぞれ配置される。
The central processing unit CPU that constitutes the logic unit LC is not particularly limited, but as shown in FIG. 2, most of the central portion of the semiconductor substrate SUB on which the large-scale logic integrated circuit device LSI is formed. Will be occupied. A multiplier MULT is arranged in the lower left part of the central processing unit CPU,
An interface control unit IFC is arranged in the lower right part thereof. A random access memory RAM is arranged in the upper left part of the central processing unit CPU, and a read only memory ROM is arranged in the upper right part thereof. Further, a part of the input / output port IO divided into four, that is, the input / output port IO1 is arranged along the upper side of the semiconductor substrate SUB above the random access memory RAM and the read only memory, and the read only memory ROM and the interface control are provided. The semiconductor substrate SU is provided on the right side of the unit IFC, the lower part of the multiplier MULT and the interface control unit IFC, and the left part of the random access memory RAM and the multiplier MULT.
Another part of the input / output port IO divided into four along the right side, the lower side, and the left side of B, that is, the input / output ports IO2, I
O3 and IO4 are arranged respectively.

【0015】この実施例において、半導体基板SUBの
4隅には、入出力ポートIO1〜IO4がその4辺に沿
って配置されることにより空き領域が生じるが、これら
の空き領域には、特性測定部TEG1〜TEG4が対応
する複数のパッドとともにそれぞれ配置される。また、
ランダムアクセスメモリRAM及びリードオンリーメモ
リROMの間には、レイアウト設計上やむを得ず空き領
域が生じるが、この空き領域には、2個の特性測定部T
EG5及びTEG6が配置される。つまり、この実施例
の大規模論理集積回路装置LSIでは、その基本素子た
るMOSFETの特性評価のための測定用素子を含む特
性測定部TEG1〜TEG6が、本来論理部LCの各部
が配置されるべき半導体基板SUBの有効領域内に配置
される訳であり、これによって測定用素子の特性を基本
素子たるMOSFET等の特性に近づけ、特性測定試験
の信頼性を高めることができるものとなる。
In this embodiment, the input / output ports IO1 to IO4 are arranged at the four corners of the semiconductor substrate SUB along the four sides thereof to form empty areas. The portions TEG1 to TEG4 are arranged together with the corresponding pads. Also,
A space is inevitably created between the random access memory RAM and the read-only memory ROM due to the layout design. In this space, two characteristic measuring units T are used.
EG5 and TEG6 are arranged. That is, in the large-scale logic integrated circuit device LSI of this embodiment, the characteristic measuring sections TEG1 to TEG6 including the measuring elements for the characteristic evaluation of the MOSFET, which is the basic element, should be arranged with the respective parts of the logical section LC originally. Since it is arranged in the effective region of the semiconductor substrate SUB, the characteristics of the measuring element can be brought close to the characteristics of the basic element such as MOSFET, and the reliability of the characteristic measurement test can be improved.

【0016】ところで、特性測定部TEG1〜TEG6
は、特に制限されないが、図3の特性測定部TEG1に
代表して示されるように、そのほぼ中央部に配置される
6個の測定用素子TE1〜TE6をそれぞれ含む。これ
らの測定用素子は、論理部LCの基本素子となるMOS
FETに対応して単体で形成されるMOSFETや例え
ば複数のCMOSインバータが組み合わされてなるリン
グオシレータ等の試験回路からなり、論理部LCの基本
素子たるMOSFETの特性や大規模論理集積回路装置
LSIのAC特性を評価するための特性測定試験に供さ
れる。測定用素子TE1〜TE6の上部には、測定用制
御パッドTC1ならびに測定用入力パッドTI11及び
TI12が配置される。また、その左部には、測定用出
力パッドTO11及び測定用電源電圧供給パッドTVC
1が配置され、その右部には、測定用出力パッドTO1
2及び測定用接地電位供給パッドTVS1が配置され
る。この結果、この実施例の大規模論理集積回路装置L
SIには、合計36個の測定用素子と合計42個の試験
パッドとが設けられる結果となり、これによって特性測
定試験の測定項目に関する制限を解くことができるもの
となる。
By the way, characteristic measuring units TEG1 to TEG6.
Although not particularly limited, each includes six measuring elements TE1 to TE6 arranged substantially in the center thereof, as represented by the characteristic measuring unit TEG1 in FIG. These measurement elements are MOSs that are basic elements of the logic unit LC.
It is composed of a test circuit such as a MOSFET that is formed as a single unit corresponding to the FET or a ring oscillator that is formed by combining a plurality of CMOS inverters. The characteristics of the MOSFET that is the basic element of the logic unit LC and the large-scale logic integrated circuit device LSI It is subjected to a characteristic measurement test for evaluating the AC characteristic. A measurement control pad TC1 and measurement input pads TI11 and TI12 are arranged above the measurement elements TE1 to TE6. Further, on the left side thereof, a measurement output pad TO11 and a measurement power supply voltage supply pad TVC are provided.
1 is arranged, and a measurement output pad TO1 is provided on the right side thereof.
2 and the ground potential supply pad TVS1 for measurement are arranged. As a result, the large-scale logic integrated circuit device L of this embodiment is
The SI is provided with a total of 36 measuring elements and a total of 42 test pads, which makes it possible to solve the limitation on the measurement items of the characteristic measurement test.

【0017】なお、この実施例の大規模論理集積回路装
置LSIでは、上記のように、特性測定部TEG1〜T
EG6に対応して、言い換えるならば論理部LCに動作
電源を供給するための電源電圧供給パッドVCC及び接
地電位供給パッドVSSとは独立して、個別の測定用電
源電圧供給パッドTVC1〜TVC6ならびに測定用接
地電位供給パッドTVS1〜TVS6が設けられる訳で
あり、これによって論理部LCと特性測定部TEG1〜
TEG6との間が電気的にかつ論理的に切り離される結
果となる。したがって、論理部LCの構成素子ならびに
その動作に影響を与えることなく、例えば測定用素子の
耐圧破壊に至るような高電圧を特性測定部TEG1〜T
EG6に印加することができるため、種々の項目にわた
って大規模論理集積回路装置LSIの特性測定試験を実
施できるものとなる。
In the large-scale logic integrated circuit device LSI of this embodiment, as described above, the characteristic measuring units TEG1 to TEG are used.
Corresponding to EG6, in other words, independently of the power supply voltage supply pad VCC and the ground potential supply pad VSS for supplying the operating power to the logic part LC, the individual power supply voltage supply pads for measurement TVC1 to TVC6 and the measurement are provided. Grounding potential supply pads TVS1 to TVS6 are provided, which allows the logic unit LC and the characteristic measuring units TEG1 to
As a result, the TEG 6 and the TEG 6 are electrically and logically separated from each other. Therefore, for example, a high voltage that causes breakdown of the measuring element without affecting the constituent elements of the logic section LC and the operation thereof can be applied to the characteristic measuring sections TEG1 to TEG.
Since the voltage can be applied to the EG6, the characteristic measurement test of the large-scale logic integrated circuit device LSI can be performed over various items.

【0018】一方、この実施例の大規模論理集積回路装
置LSIは、前述のように、1個のウエハ上に複数個ず
つ形成され、半導体基板間つまりチップ間に設けられた
切断領域をもって切断され個別のチップとなるが、特性
測定部TEG1〜TEG6が半導体基板SUBの有効領
域内に配置されることで、各特性測定部はチップ切断後
においても使用可能となる。このため、チップ切断前に
おけるウエハ状態での特性測定試験は無論のこと、チッ
プ切断が行われ大規模論理集積回路装置LSIが製品と
して組み立てられた後の段階でも、パッケージを部分的
に除去して不良解析等のための特性測定試験を実施で
き、これによって大規模論理集積回路装置LSIの開発
を効率化し、その開発期間を短縮できるものとなる。
On the other hand, as described above, the large-scale logic integrated circuit device LSI of this embodiment is formed on a single wafer by a plurality of chips, and is cut at a cutting region provided between semiconductor substrates, that is, between chips. Although they are individual chips, by disposing the characteristic measuring units TEG1 to TEG6 in the effective region of the semiconductor substrate SUB, each characteristic measuring unit can be used even after the chip is cut. Therefore, of course, the characteristic measurement test in the wafer state before chip cutting is performed. Even after the chip cutting is performed and the large-scale logic integrated circuit device LSI is assembled as a product, the package is partially removed. A characteristic measurement test for failure analysis or the like can be carried out, whereby the development of a large-scale logic integrated circuit device LSI can be made efficient and the development period thereof can be shortened.

【0019】以上の本実施例により得られる作用効果は
次の通りである。すなわち、 (1)その主たる機能を実現するための内部回路を備え
る大規模論理集積回路装置等の半導体装置において、基
本素子の特性評価に供される測定用素子を含む特性測定
部を、半導体基板の例えば4隅を含む有効領域内に配置
することで、大規模論理集積回路装置等に、特性評価の
対象となる基本素子とほぼ同一の特性を有する測定用素
子を多数搭載できるという効果が得られる。 (2)上記(1)項により、チップ切断が行われ大規模
論理集積回路装置等が製品として組み立てられた後で
も、不良解析等のための特性測定試験を容易に実施する
ことができるという効果が得られる。
The operational effects obtained by the above embodiment are as follows. That is, (1) in a semiconductor device such as a large-scale logic integrated circuit device having an internal circuit for realizing its main function, a semiconductor substrate is provided with a characteristic measuring unit including a measuring element used for characteristic evaluation of a basic element. For example, by arranging it in an effective area including four corners, it is possible to provide a large-scale logic integrated circuit device or the like with a large number of measuring elements having substantially the same characteristics as the basic element to be evaluated. To be (2) According to the above item (1), it is possible to easily perform the characteristic measurement test for failure analysis even after the chip is cut and the large-scale logic integrated circuit device or the like is assembled as a product. Is obtained.

【0020】(3)上記(1)項及び(2)項におい
て、特性測定部に測定用電源を供給するためのパッド
を、内部回路に動作電源を供給するためのパッドとは別
個に設けることで、内部回路の構成素子ならびにその動
作に影響を与えることなく、例えば測定用素子の耐圧破
壊に至るような高電圧を印加することができるため、種
々の項目にわたって特性測定試験を実施できるという効
果が得られる。 (4)上記(1)項ないし(3)項により、大規模論理
集積回路装置等の特性測定試験の信頼性を高めつつその
測定項目数に関する制限を解き、大規模論理集積回路装
置等の開発を効率化できるという効果が得られる。
(3) In the above items (1) and (2), a pad for supplying a measuring power source to the characteristic measuring section is provided separately from a pad for supplying an operating power source to the internal circuit. Thus, it is possible to perform a characteristic measurement test over various items because a high voltage that can cause breakdown of the measuring element can be applied without affecting the constituent elements of the internal circuit and its operation. Is obtained. (4) According to the above items (1) to (3), the reliability of the characteristic measurement test of the large-scale logic integrated circuit device, etc. is improved, and the limitation on the number of measurement items is lifted to develop the large-scale logic integrated circuit device. The effect that the efficiency can be obtained is obtained.

【0021】以上、本発明者によってなされた発明を実
施例に基づき具体的に説明したが、この発明は、上記実
施例に限定されるものではなく、その要旨を逸脱しない
範囲で種々変更可能であることは言うまでもない。例え
ば、図1において、大規模論理集積回路装置LSIに設
けられる特性測定部の数や各特性測定部に対応して設け
られる測定用入力パッド及び測定用出力パッドの数は、
任意に設定できる。また、大規模論理集積回路装置LS
Iの主たる機能を実現する論理部LCは、任意のブロッ
ク構成を採りうるし、そのバス構成及びパッド構成も任
意である。図2において、論理部LCならびにその各部
の配置は、この実施例による制約を受けないし、特性測
定部TEG1〜TEG6の配置及び形状も任意である。
図3において、特性測定部TEG1〜TEG6は、それ
ぞれ任意数の測定用素子を含むことができるし、測定用
素子及びパッドの配置及び形状も任意である。
Although the invention made by the present inventor has been specifically described based on the embodiments, the invention is not limited to the above embodiments, and various modifications can be made without departing from the scope of the invention. Needless to say. For example, in FIG. 1, the number of characteristic measuring units provided in the large-scale logic integrated circuit device LSI and the number of measuring input pads and measuring output pads provided corresponding to each characteristic measuring unit are as follows.
It can be set arbitrarily. In addition, the large-scale logic integrated circuit device LS
The logic unit LC that realizes the main function of I can have an arbitrary block configuration, and its bus configuration and pad configuration are also arbitrary. In FIG. 2, the arrangement of the logic part LC and each part thereof is not restricted by this embodiment, and the arrangement and shape of the characteristic measuring parts TEG1 to TEG6 are also arbitrary.
In FIG. 3, the characteristic measuring units TEG1 to TEG6 can each include an arbitrary number of measuring elements, and the arrangement and shape of the measuring elements and pads are also arbitrary.

【0022】以上の説明では、主として本発明者によっ
てなされた発明をその背景となった利用分野である大規
模論理集積回路装置に適用した場合について説明した
が、それに限定されるものではなく、例えば、同様な測
定用素子あるいは特性測定部を備える各種のゲートアレ
イ集積回路やメモリ集積回路等にも適用できる。この発
明は、少なくとも基本素子の特性評価のための測定用素
子を必要とする半導体装置ならびにこのような半導体装
置を含むシステムに広く適用できる。
In the above description, the case where the invention made by the present inventor is mainly applied to a large-scale logic integrated circuit device which is a field of use as the background has been described, but the invention is not limited to this. The present invention can also be applied to various gate array integrated circuits, memory integrated circuits, etc., which are provided with similar measurement elements or characteristic measurement units. INDUSTRIAL APPLICABILITY The present invention can be widely applied to a semiconductor device that requires at least a measuring element for evaluating the characteristics of basic elements and a system including such a semiconductor device.

【0023】[0023]

【発明の効果】本願において開示される発明のうち代表
的なものによって得られる効果を簡単に説明すれば、下
記の通りである。すなわち、その主たる機能を実現する
ための所定の内部回路を備える大規模論理集積回路装置
等の半導体装置において、基本素子の特性評価に供され
る測定用素子を含む特性測定部を、半導体基板の例えば
4隅を含む有効領域内に配置するとともに、特性測定部
に測定用電源を供給するための供給パッドを、内部回路
に動作電源を供給するための供給パッドとは別個に設け
ることで、大規模論理集積回路装置等に、特性評価の対
象となる基本素子とほぼ同一の特性を有する測定用素子
を多数搭載できるとともに、内部回路の構成素子ならび
にその動作に影響を与えることなく、種々の項目にわた
って特性測定試験を実施することができ、チップ切断後
における不良解析等のための特性測定試験をも可能にす
ることができる。この結果、大規模論理集積回路装置等
の特性測定試験の信頼性を高めつつその測定項目数に関
する制限を解き、大規模論理集積回路装置等の開発を効
率化して、その開発期間を短縮できる。
The effects obtained by the typical ones of the inventions disclosed in the present application will be briefly described as follows. That is, in a semiconductor device such as a large-scale logic integrated circuit device having a predetermined internal circuit for realizing its main function, a characteristic measuring section including a measuring element used for characteristic evaluation of a basic element is provided in a semiconductor substrate. For example, by arranging it in an effective area including four corners, and providing a supply pad for supplying a measurement power supply to the characteristic measuring section separately from a supply pad for supplying an operating power supply to an internal circuit, A large number of measuring elements having almost the same characteristics as the basic elements to be evaluated can be mounted on a scale logic integrated circuit device, etc., and various items can be implemented without affecting the internal circuit constituent elements and their operation. The characteristic measurement test can be performed over the entire range, and the characteristic measurement test for defect analysis and the like after cutting the chip can also be enabled. As a result, it is possible to improve the reliability of the characteristic measurement test of a large-scale logic integrated circuit device and solve the limitation on the number of measurement items, to improve the efficiency of development of a large-scale logic integrated circuit device and shorten the development period.

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明が適用された大規模論理集積回路装置
の一実施例を示すブロック構成図である。
FIG. 1 is a block diagram showing an embodiment of a large-scale logic integrated circuit device to which the present invention is applied.

【図2】図1の大規模論理集積回路装置の一実施例を示
す基板配置図である。
FIG. 2 is a board layout diagram showing an embodiment of the large-scale logic integrated circuit device of FIG.

【図3】図2の大規模論理集積回路装置に含まれる特性
測定部の一実施例を示す配置図である。
FIG. 3 is a layout diagram showing an embodiment of a characteristic measuring unit included in the large-scale logic integrated circuit device of FIG.

【図4】特性測定部を有する従来の大規模論理集積回路
装置のウエハ上における一例を示す配置図である。
FIG. 4 is a layout diagram showing an example on a wafer of a conventional large-scale logic integrated circuit device having a characteristic measuring unit.

【符号の説明】[Explanation of symbols]

LSI・・・大規模論理集積回路装置、LC・・・論理
部、CPU・・・中央処理装置、MULT・・・乗算
器、ROM・・・リードオンリーメモリ、RAM・・・
ランダムアクセスメモリ、IFC・・・インタフェース
制御部、IO・・・入出力ポート、DI1〜DIm・・
・データ入力パッド、DO1〜DOn・・・データ出力
パッド、VCC・・・論理部用電源電圧供給パッド、V
SS・・・論理部用接地電位供給パッド、TEG1〜T
EG6・・・特性測定部、TC1〜TC6・・・測定用
制御パッド、TI11〜TI12ないしTI61〜TI
62・・・測定用入力パッド、TO11〜TO12ない
しTO61〜TO62・・・測定用出力パッド、TVC
1〜TVC6・・・測定用電源電圧供給パッド、TVS
1〜TVS6・・・測定用接地電位供給パッド。SUB
・・・半導体基板、IO1〜IO4・・・入出力ポー
ト。TE1〜TE6・・・測定用素子。WAF・・・ウ
エハ、CHP・・・チップ、TEG・・・特性測定部。
LSI ... Large-scale logic integrated circuit device, LC ... Logic unit, CPU ... Central processing unit, MULT ... Multiplier, ROM ... Read-only memory, RAM ...
Random access memory, IFC ... Interface control unit, IO ... Input / output port, DI1 to DIm ...
Data input pads, DO1 to DOn ... Data output pads, VCC ... Logic part power supply voltage supply pads, V
SS ... Ground potential supply pads for logic part, TEG1 to T
EG6 ... Characteristic measuring section, TC1 to TC6 ... Measuring control pad, TI11 to TI12 to TI61 to TI
62 ... Measurement input pad, TO11 to TO12 to TO61 to TO62 ... Measurement output pad, TVC
1 to TVC6 ... Measuring power supply voltage supply pad, TVS
1-TVS6 ... Ground potential supply pad for measurement. SUB
... Semiconductor substrate, IO1 to IO4 ... Input / output ports. TE1 to TE6 ... Element for measurement. WAF ... wafer, CHP ... chip, TEG ... characteristic measuring unit.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 小野 健 東京都小平市上水本町5丁目22番1号 株 式会社日立マイコンシステム内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Ken Ono 5-22-1 Kamisuihonmachi, Kodaira-shi, Tokyo Inside Hitachi Microcomputer System Co., Ltd.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 特性評価のための測定用素子を含む特性
測定部が半導体基板の有効領域内に配置されることを特
徴とする半導体装置。
1. A semiconductor device, wherein a characteristic measuring section including a measuring element for characteristic evaluation is arranged in an effective region of a semiconductor substrate.
【請求項2】 上記半導体装置は、その主たる機能を実
現するために設けられる所定の内部回路を具備するもの
であって、上記特性測定部に測定用電源を供給するため
のパッドは、上記内部回路に動作電源を供給するための
パッドとは別個に設けられるものであることを特徴とす
る請求項1の半導体装置。
2. The semiconductor device is provided with a predetermined internal circuit provided to realize its main function, and the pad for supplying a measuring power source to the characteristic measuring section is the internal circuit. 2. The semiconductor device according to claim 1, wherein the semiconductor device is provided separately from a pad for supplying operating power to the circuit.
【請求項3】 上記半導体装置は、半導体基板の4辺に
沿って配置される入出力ポートを備える大規模論理集積
回路装置であって、上記有効領域は、上記入出力ポート
が配置されることによって半導体基板の4隅に生じる空
き領域を含むものであることを特徴とする請求項1又は
請求項2の半導体装置。
3. The semiconductor device is a large-scale logic integrated circuit device having input / output ports arranged along four sides of a semiconductor substrate, and the input / output ports are arranged in the effective area. 3. The semiconductor device according to claim 1, wherein the semiconductor device includes vacant areas generated at the four corners of the semiconductor substrate.
【請求項4】 上記特性測定部は、上記半導体装置が形
成されるウエハのチップ切断前及びチップ切断後におけ
る特性測定試験に供されるものであることを特徴とする
請求項1,請求項2又は請求項3の半導体装置。
4. The characteristic measuring section is used for a characteristic measurement test before and after chip cutting of a wafer on which the semiconductor device is formed. Alternatively, the semiconductor device according to claim 3.
JP6309432A 1994-11-21 1994-11-21 Semiconductor device Withdrawn JPH08146095A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6309432A JPH08146095A (en) 1994-11-21 1994-11-21 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6309432A JPH08146095A (en) 1994-11-21 1994-11-21 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH08146095A true JPH08146095A (en) 1996-06-07

Family

ID=17992941

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6309432A Withdrawn JPH08146095A (en) 1994-11-21 1994-11-21 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH08146095A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19836614C2 (en) * 1998-01-13 2003-08-21 Mitsubishi Electric Corp Semiconductor chip with line on a corner part of the semiconductor chip
JP2007504654A (en) * 2003-08-25 2007-03-01 タウ−メトリックス インコーポレイテッド Techniques for evaluating semiconductor component and wafer manufacturing.
US7307441B2 (en) 2002-05-15 2007-12-11 Samsung Electronics Co., Ltd. Integrated circuit chips and wafers including on-chip test element group circuits, and methods of fabricating and testing same
JP2008263067A (en) * 2007-04-12 2008-10-30 Matsushita Electric Ind Co Ltd Semiconductor integrated circuit

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19836614C2 (en) * 1998-01-13 2003-08-21 Mitsubishi Electric Corp Semiconductor chip with line on a corner part of the semiconductor chip
US7307441B2 (en) 2002-05-15 2007-12-11 Samsung Electronics Co., Ltd. Integrated circuit chips and wafers including on-chip test element group circuits, and methods of fabricating and testing same
JP2007504654A (en) * 2003-08-25 2007-03-01 タウ−メトリックス インコーポレイテッド Techniques for evaluating semiconductor component and wafer manufacturing.
JP2011097099A (en) * 2003-08-25 2011-05-12 Tau-Metrix Inc Technique for evaluating fabrication of semiconductor component and wafer
JP2011097098A (en) * 2003-08-25 2011-05-12 Tau-Metrix Inc Technique for evaluating fabrication of semiconductor component and wafer
JP2008263067A (en) * 2007-04-12 2008-10-30 Matsushita Electric Ind Co Ltd Semiconductor integrated circuit

Similar Documents

Publication Publication Date Title
US6888395B2 (en) Semiconductor integrated circuit device
US6822330B2 (en) Semiconductor integrated circuit device with test element group circuit
US20050181539A1 (en) Semiconductor device and method of manufacturing same
EP0139427A1 (en) Semiconductor integrated circuit device
CN101022107B (en) Versatile semiconductor test structure array
JP3866111B2 (en) Semiconductor integrated circuit and burn-in method
KR100218843B1 (en) Semiconductor device capable of outputing multiple interface level
JPH03165061A (en) Semiconductor integrated circuit device
US7491986B2 (en) Semiconductor integrated circuit device
JP2594988B2 (en) Wiring design method for operating potential supply wiring of semiconductor integrated circuit device
EP0283046A2 (en) Complementary integrated circuit device equipped with latch-up preventing means
JPH08146095A (en) Semiconductor device
US4586242A (en) Operations on a semiconductor integrated circuit having two kinds of buffers
JP2010109115A (en) On-chip type monitor circuit and semiconductor device
KR960002999B1 (en) Semiconductor integrated circuit device
KR100226084B1 (en) Semiconductor device
JPH03225949A (en) Display driver integrated circuit
US5625631A (en) Pass through mode for multi-chip-module die
US7701041B2 (en) Chip-packaging with bonding options having a plurality of package substrates
JPH1012738A (en) Semiconductor integrated circuit device
JP3501880B2 (en) Method of manufacturing semiconductor integrated circuit device and semiconductor wafer
JP2978692B2 (en) Semiconductor integrated circuit
JP2740374B2 (en) Semiconductor integrated circuit device
US20050248028A1 (en) Chip-packaging with bonding options connected to a package substrate
JPH08340048A (en) Semiconductor device

Legal Events

Date Code Title Description
A300 Application deemed to be withdrawn because no request for examination was validly filed

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20020205