JPH08117510A - Liquid property measuring apparatus - Google Patents

Liquid property measuring apparatus

Info

Publication number
JPH08117510A
JPH08117510A JP25586694A JP25586694A JPH08117510A JP H08117510 A JPH08117510 A JP H08117510A JP 25586694 A JP25586694 A JP 25586694A JP 25586694 A JP25586694 A JP 25586694A JP H08117510 A JPH08117510 A JP H08117510A
Authority
JP
Japan
Prior art keywords
cleaning
sensor
liquid
hot film
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25586694A
Other languages
Japanese (ja)
Inventor
Koki Shigemi
弘毅 重見
Toshio Totoki
敏雄 十時
Katsuo Yasukawa
克男 安川
Yoshinao Kishine
義尚 岸根
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kurita Water Industries Ltd
Original Assignee
Kurita Water Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kurita Water Industries Ltd filed Critical Kurita Water Industries Ltd
Priority to JP25586694A priority Critical patent/JPH08117510A/en
Publication of JPH08117510A publication Critical patent/JPH08117510A/en
Pending legal-status Critical Current

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  • Treatment Of Sludge (AREA)

Abstract

PURPOSE: To properly carry out surface cleaning of a hot film sensor element within a short time and improve the measurement precision. CONSTITUTION: A liquid property measuring apparatus is provided with a tubular detection part 33 having an inlet of raw water such as a dehydrated filtered liquid in one end and an outlet of the raw water in the other end, a hot film sensor 34 so installed in the detection part as to be brought into contact with the raw water, and a light-transmissive type cleaning evaluating sensor unit 35 installed slightly above the hot film sensor. Based on the output value of the cleaning evaluating sensor unit, a control computing unit 40 carries out cleaning evaluation of the hot film sensor and controls the liquid property measurement to be the optimum state.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、液性状の計測装置に関
し、特に粘性物質や繊維状懸濁物質を多量に含む汚泥等
の懸濁液や前記汚泥を脱水機等で脱水して得られる脱水
濾液等(以下、「懸濁液等」という。)を原水として送
液して、その性状を計測する液性状の計測装置に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid property measuring device, and in particular, it is obtained by dehydrating a suspension of sludge or the like containing a large amount of a viscous substance or a fibrous suspension substance or the sludge with a dehydrator. The present invention relates to a liquid property measuring device that measures the properties of a dehydrated filtrate or the like (hereinafter referred to as “suspension”) as raw water.

【0002】[0002]

【従来の技術】従来、この種の計測装置では、排水処理
用の凝集処理装置や汚泥脱水装置等の水処理装置に組み
込まれており、ポンプを利用して送液された懸濁液等の
液性状を計測しており、その計測値に基づいて上記水処
理装置への凝集剤の添加量を制御していた。このような
計測装置の具体例としては、例えば実願平2−4009
8号に示された凝集処理装置に用いられるものがある。
上記凝集処理装置では、図7に示すように、ポンプ12
を用いて原泥ピット11から汚泥を凝集槽13に送液
し、薬液貯槽14からの凝集剤を薬注ポンプ15によっ
て添加して凝集処理し、さらに脱水機16で脱水ケーキ
と脱水濾液とに分離している。上記装置では、濾液貯槽
17から分離された濾液をポンプ18によって送液し、
熱移動検出計19を用いてその液性状を検出し、検出し
た液性状に基づき制御演算器20によって最適薬注制御
を行っていた。なお、上記熱移動検出計は、例えばホッ
トフィルムセンサからなり、このホットフィルムセンサ
の検出値に応じて薬注量を制御しているが、上記ホット
フィルムセンサの素子表面は、計測を行う液の性状など
によって汚れやすいので、水による洗浄を行って計測精
度の劣化を防止していた。
2. Description of the Related Art Conventionally, a measuring device of this type has been incorporated in a water treatment device such as a coagulation treatment device for wastewater treatment and a sludge dewatering device, and has been used to measure a suspension or the like sent using a pump. The liquid property was measured, and the amount of the coagulant added to the water treatment device was controlled based on the measured value. As a specific example of such a measuring device, for example, Japanese Patent Application No. 2-4009.
There is one used in the aggregating apparatus shown in No. 8.
In the agglomeration processing device, as shown in FIG.
Sludge is fed from the raw mud pit 11 to the flocculation tank 13, the flocculating agent from the chemical liquid storage tank 14 is added by the chemical injection pump 15, and the flocculation treatment is performed. Separated. In the above device, the filtrate separated from the filtrate storage tank 17 is sent by the pump 18,
The liquid property was detected by using the heat transfer detector 19, and the control calculator 20 performed optimum chemical injection control based on the detected liquid property. The heat transfer detector is composed of, for example, a hot film sensor, and controls the chemical injection amount according to the detection value of the hot film sensor, but the element surface of the hot film sensor is a liquid for measurement. Since it is easy to get dirty due to its properties, it was washed with water to prevent deterioration of measurement accuracy.

【0003】[0003]

【発明が解決しようとする課題】ところが、上記装置で
は、粘性物質や懸濁物質等が多量に含まれる原水を測定
する場合、ホットフィルムセンサの素子表面には、スラ
イムやスケール等が付着し、水洗浄では、上記付着物を
十分に除去することが困難となり、ホットフィルムセン
サの経時劣化を早めるという問題点があった。また、こ
の場合には、洗浄に費やす時間が長くなるので、計測時
間を延長したり、洗浄間隔を短くする等の工程変更を行
う必要が生じ、計測サイクルが不安定になるという問題
点があった。
However, in the above device, when measuring raw water containing a large amount of viscous substances or suspended substances, slime or scale adheres to the element surface of the hot film sensor, With water washing, it becomes difficult to sufficiently remove the above-mentioned deposits, and there is a problem that the deterioration of the hot film sensor with time is accelerated. Further, in this case, since the time spent for cleaning becomes long, it is necessary to change the process such as extending the measurement time or shortening the cleaning interval, which causes a problem that the measurement cycle becomes unstable. It was

【0004】本発明は、上記問題点に鑑みなされたもの
で、ホットフィルムセンサの素子表面洗浄を短時間で的
確に行い、かつ測定精度を向上できる液性状の測定装置
を提供することを目的とする。
The present invention has been made in view of the above problems, and an object of the present invention is to provide a liquid property measuring apparatus capable of accurately cleaning the element surface of a hot film sensor in a short time and improving the measurement accuracy. To do.

【0005】[0005]

【課題を解決するための手段】上記目的を達成するた
め、本発明では、一端に原水の入り口、他端に該原水の
出口を有する管状の検出部と、前記検出部内に流れる原
水と接触するように、該検出部に設けられたホットフィ
ルムセンサからなる熱移動検出計と、前記検出部に連結
され、洗浄水及び洗浄空気を供給する管状の供給管とを
備えた液性状の計測装置が提供される。
In order to achieve the above object, in the present invention, a tubular detector having an inlet of raw water at one end and an outlet of the raw water at the other end is contacted with the raw water flowing in the detector. As described above, a liquid-state measuring device including a heat transfer detector including a hot film sensor provided in the detection unit and a tubular supply pipe connected to the detection unit and supplying wash water and wash air is provided. Provided.

【0006】請求項2の計測装置では、一端に原水の入
り口、他端に該原水の出口を有する管状の検出部と、前
記検出部内に流れる原水と接触するように、該検出部に
設けられたホットフィルムセンサからなる熱移動検出計
と、前記熱移動検出計を洗浄する洗浄手段と、前記熱移
動検出計の洗浄性を評価する透過光型からなる洗浄性評
価センサとを備えた。
In the measuring device according to the second aspect of the present invention, a tubular detector having an inlet for raw water at one end and an outlet for the raw water at the other end is provided in the detector so as to come into contact with the raw water flowing in the detector. And a cleaning unit for cleaning the heat transfer detector, and a transmitted light type cleaning property evaluation sensor for evaluating the cleaning property of the heat transfer detector.

【0007】[0007]

【作用】供給管から供給される洗浄水、空気混合液等に
よってホットフィルムセンサを洗浄するので、ホットフ
ィルムセンサの素子表面の洗浄精度を向上できる。請求
項2の計測装置では、透過光型の洗浄性評価センサを設
けて、ホットフィルムセンサの素子表面の洗浄性を評価
するので、感度良く洗浄性の評価を行うことができ、セ
ンサの洗浄、計測系の補正及びセンサの取り替え等を容
易に行うことができる。
Since the hot film sensor is cleaned with the cleaning water, the air mixed solution, etc. supplied from the supply pipe, the accuracy of cleaning the element surface of the hot film sensor can be improved. In the measuring device according to the second aspect, since the transmitted light type cleaning property evaluation sensor is provided to evaluate the cleaning property of the element surface of the hot film sensor, the cleaning property can be evaluated with high sensitivity. It is possible to easily correct the measurement system and replace the sensor.

【0008】[0008]

【実施例】本発明に係る計測装置を図1乃至図6の図面
に基づいて説明する。図1は、本発明に係る計測装置の
一例を示す構成図である。図において、計測装置は、図
7に示す従来例のピット11と、ポンプ12と、凝集槽
13と、薬液貯槽14と、薬注ポンプ15と、脱水機1
6及び撹拌用モータ10で構成される凝集処理装置に適
用され、配管21〜28と、受入槽30と、液位レベル
計32,37と、液性状の検出部33と、ホットフィル
ムセンサ34と、透過光型の洗浄性評価センサユニット
35と、計測補助槽36と、受水槽38と、排気ポンプ
39及び制御演算ユニット40等から構成されている。
なお、配管21〜28は、配管系路を構成する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS A measuring device according to the present invention will be described with reference to the drawings of FIGS. FIG. 1 is a configuration diagram showing an example of a measuring device according to the present invention. In the figure, the measuring device includes a pit 11, a pump 12, a coagulation tank 13, a chemical solution storage tank 14, a chemical injection pump 15, and a dehydrator 1 of the conventional example shown in FIG. 7.
6 and the agitation motor 10 are applied to the agglomeration processing apparatus, and the pipes 21 to 28, the receiving tank 30, the liquid level gauges 32 and 37, the liquid property detection unit 33, and the hot film sensor 34. It is composed of a transmitted light type cleaning property evaluation sensor unit 35, a measurement auxiliary tank 36, a water receiving tank 38, an exhaust pump 39, a control arithmetic unit 40 and the like.
The pipes 21 to 28 form a pipe system passage.

【0009】受入槽30は、その槽上部位置において、
配管21と連結されており、配管21を介して脱水機1
6から懸濁液等が流入されている。配管21の途中に
は、自動弁V0が配設されている。また、配管21は、
流量調整弁V10を介して貯槽42とも連絡されている。
受入槽30の容量は、ホットフィルムセンサ34が所定
時間連続して液性状の計測が可能なように、上記懸濁液
等を常に一定レベル状態で貯液できるように構成されて
いる。また、受入槽30は、その槽底最下位置におい
て、配管22を介して自動弁V1と連結されており、上
記懸濁液等を配管24に流出可能とされている。さら
に、受入槽30は、配管22を介して流量調整弁V9と
連結されており、上記懸濁液等を貯槽41に流出可能と
されている。またさらに、受入槽30は、オーバーフロ
ー用の開口(図示せず)と、オーバーフロータンク43
とを有しており、オーバーフロータンク43のタンク底
は、配管23を介して貯槽41と連絡されており、液の
オーバーフローが可能となっている。
The receiving tank 30 is located at the upper position of the tank.
The dehydrator 1 is connected to the pipe 21 and is connected via the pipe 21.
Suspension and the like are introduced from 6. An automatic valve V0 is arranged in the middle of the pipe 21. In addition, the pipe 21 is
It is also connected to the storage tank 42 via the flow rate adjusting valve V10.
The capacity of the receiving tank 30 is configured so that the above-mentioned suspension liquid or the like can always be stored at a constant level so that the hot film sensor 34 can continuously measure the liquid property for a predetermined time. Further, the receiving tank 30 is connected to the automatic valve V1 via the pipe 22 at the lowest position of the bottom of the receiving tank 30 so that the suspension or the like can flow out to the pipe 24. Further, the receiving tank 30 is connected to the flow rate adjusting valve V9 through the pipe 22 so that the suspension liquid or the like can flow into the storage tank 41. Furthermore, the receiving tank 30 has an overflow opening (not shown) and an overflow tank 43.
The tank bottom of the overflow tank 43 is connected to the storage tank 41 through the pipe 23, and the overflow of the liquid is possible.

【0010】メッシュスクリーン31は、受入槽30内
に流入する懸濁液等に含まれる粗大ゴミや繊維状物質等
を配管系路に混入させないためのもので、受入槽30に
内蔵されている。そのメッシュサイズは、対象とする液
種に応じて任意に設定する。液位レベル計32は、受入
槽30の上部に配置され、3本電極によって受入槽30
内の液位を2段階のレベルH1,M1(H1>M1)で検知
し、各レベルの検知信号を排気ポンプ39の駆動を制御
する制御演算ユニット40に出力している。なお、レベ
ルL1の電極はコモン電極である。
The mesh screen 31 is for preventing coarse dust, fibrous substances, etc. contained in the suspension flowing into the receiving tank 30 from being mixed into the pipe passage, and is incorporated in the receiving tank 30. The mesh size is arbitrarily set according to the target liquid type. The liquid level meter 32 is arranged above the receiving tank 30 and is provided with three electrodes.
The liquid level inside is detected by two levels of levels H1 and M1 (H1> M1), and the detection signal of each level is output to the control arithmetic unit 40 which controls the drive of the exhaust pump 39. The level L1 electrode is a common electrode.

【0011】計測補助槽36は、密閉構造の水槽で、そ
の槽下部のM2レベルの位置に接続されている配管26
を介して液性状の検出部33と連結されており、液性状
の検出部33から流入する懸濁液等を一定レベルH2で
貯液する。なお、受入槽30及び計測補助槽36の位置
関係は、受入槽30のH1レベルが計測補助槽36のH2
レベルより高くなるように配置されている。また、配管
26は、配管26の最高部位が受入槽30の液位レベル
H1に対してΔhだけ高く配置され、Δhの水頭差(ヘ
ッド差)が生じるように構成されている。このため、自
動弁V1,V2が開状態の時には、懸濁液等は配管26内
に止まり、計測補助槽36には流入しないので、計測補
助槽36の液位は、空の状態のままとなる。
The measurement auxiliary tank 36 is a water tank having a closed structure, and the pipe 26 connected to the M2 level position below the tank.
It is connected to the liquid state detection unit 33 via the liquid storage device and stores the suspension or the like flowing in from the liquid state detection unit 33 at a constant level H2. The positional relationship between the receiving tank 30 and the measurement auxiliary tank 36 is such that the H1 level of the receiving tank 30 is H2 of the measurement auxiliary tank 36.
It is arranged to be higher than the level. Further, the pipe 26 is arranged such that the highest portion of the pipe 26 is higher than the liquid level H1 of the receiving tank 30 by Δh, and a water head difference (head difference) of Δh is generated. For this reason, when the automatic valves V1 and V2 are in the open state, the suspension liquid and the like remain in the pipe 26 and do not flow into the measurement auxiliary tank 36. Therefore, the liquid level in the measurement auxiliary tank 36 remains empty. Become.

【0012】計測補助槽36は、その槽底最下位置にお
いて配管27、自動弁V3を介して受水槽38と連結さ
れており、自動弁V3が開の時に上記懸濁液等を受水槽
38に流出可能とされている。また、計測補助槽36
は、その槽上部位置において配管28を介して排気ポン
プ39と連結されている。配管28の途中には、自動弁
V8が設けられている。そして、自動弁V2が閉、自動弁
V8が開状態の時に、排気ポンプ39が駆動されると、
受入槽30内の懸濁液等は、配管22,24および26
を介して計測補助槽36内に流入する。さらに、計測補
助槽36は、H2レベルより僅かに高い位置に接続され
た配管29及び配管27を介して受水槽38と連結され
ており、計測補助槽36内の液位がH2レベル以上にな
らないように、液のオーバーフローが可能となってい
る。
The measurement auxiliary tank 36 is connected to the water receiving tank 38 via the pipe 27 and the automatic valve V3 at the bottommost position of the tank bottom, and when the automatic valve V3 is opened, the suspension or the like is received in the water receiving tank 38. It is supposed to be leaked to. In addition, the measurement auxiliary tank 36
Is connected to the exhaust pump 39 via the pipe 28 at the tank upper position. An automatic valve V8 is provided in the middle of the pipe 28. When the exhaust pump 39 is driven while the automatic valve V2 is closed and the automatic valve V8 is open,
The suspensions and the like in the receiving tank 30 are provided in the pipes 22, 24 and 26.
Through the measurement auxiliary tank 36. Further, the measurement auxiliary tank 36 is connected to the water receiving tank 38 via the pipe 29 and the pipe 27 connected to a position slightly higher than the H2 level, so that the liquid level in the measurement auxiliary tank 36 does not exceed the H2 level. As described above, the liquid can overflow.

【0013】液位レベル計37は、計測補助槽35の上
部に配置され、3本の電極によって計測補助槽36内の
液位を、2段階のレベルH2,M2(H2>M2)で検知
し、各レベルの検知信号を排気ポンプ39の駆動を制御
する制御演算ユニット40に出力している。なお、レベ
ルL2の電極はコモン電極である。また、本実施例で
は、液位レベル計32の液位レベルM1と、液位レベル
計37の液位レベルH2とは、同じ高さに設定されてい
る。
The liquid level meter 37 is arranged above the measurement auxiliary tank 35 and detects the liquid level in the measurement auxiliary tank 36 at two levels H2 and M2 (H2> M2) by three electrodes. , And outputs the detection signal of each level to the control arithmetic unit 40 that controls the drive of the exhaust pump 39. The level L2 electrode is a common electrode. Further, in this embodiment, the liquid level M1 of the liquid level meter 32 and the liquid level H2 of the liquid level meter 37 are set to the same height.

【0014】受水槽38は、配管27、自動弁V3を介
して計測補助槽36と連結されており、計測補助槽36
からの懸濁液等が流入可能となっている。また、受水槽
38は、自動弁V7を介して配管24と連結されてお
り、配管系路内の懸濁液等や洗浄排水が流入可能となっ
ている。排気ポンプ39は、制御演算ユニット40の駆
動制御によって始動して、密閉構造の計測補助槽36内
の排気を行う。
The water receiving tank 38 is connected to the measuring auxiliary tank 36 via the pipe 27 and the automatic valve V3, and the measuring auxiliary tank 36 is connected to the measuring auxiliary tank 36.
It is possible to inflow the suspension etc. Further, the water receiving tank 38 is connected to the pipe 24 via an automatic valve V7 so that the suspension and the like in the pipe system passage and the cleaning drainage can flow in. The exhaust pump 39 is started by the drive control of the control calculation unit 40, and exhausts the measurement auxiliary tank 36 having a closed structure.

【0015】液性状の検出部33は、図2に示すよう
に、管状の硬質ガラスからなり、液性状を検出するホッ
トフィルムセンサ34と、そのやや上方に透過光型の洗
浄性評価センサユニット35とが配設されている。検出
部33は、配管22、自動弁V1、配管24を介して受
入槽30と連結されており、受入槽30から懸濁液等が
流入可能とされている。また、配管24には、自動弁V
4を介して洗浄水供給管が連絡されている。洗浄水供給
管からの洗浄水は、ホットフィルムセンサ34の検出素
子34a及び洗浄性評価センサユニット35のフラット
硬質ガラス35a,35bを洗浄するものである。
As shown in FIG. 2, the liquid state detection unit 33 is made of a tubular hard glass and comprises a hot film sensor 34 for detecting the liquid state and a transmitted light type cleaning property evaluation sensor unit 35 slightly above it. And are provided. The detection unit 33 is connected to the receiving tank 30 via the pipe 22, the automatic valve V1, and the pipe 24, and the suspension or the like can flow from the receiving tank 30. Further, the pipe 24 has an automatic valve V
The wash water supply pipe is connected via 4. The cleaning water from the cleaning water supply pipe cleans the detection element 34a of the hot film sensor 34 and the flat hard glass 35a, 35b of the cleaning property evaluation sensor unit 35.

【0016】また、液性状の検出部33には、その略中
央付近に、洗浄水、あるいは洗浄空気の供給管33aが
ホットフィルムセンサ34の検出素子34aに臨んで設
けられている。供給管33aは、自動弁V5及び自動弁
V6と配管25を介して連結されており、自動弁V5を開
にすると、外部からの高圧の洗浄水を、自動弁V5とV6
を同時に開にすると、空気混合液を検出部33内にそれ
ぞれ流入可能とし、その高圧水流によって検出素子34
a及びフラット硬質ガラス35a,35bの強制洗浄を
行う。また、検出部33では、計測時に安定した層流を
得るとともに、気泡の発生を防止するために、図3に示
すように、入り口付近の内径を、液の流れ方向に対して
徐々に縮径したテーパ形状の絞り構造としている。
Further, in the liquid state detecting portion 33, a washing water or washing air supply pipe 33a is provided near the center thereof so as to face the detecting element 34a of the hot film sensor 34. The supply pipe 33a is connected to the automatic valve V5 and the automatic valve V6 via the pipe 25. When the automatic valve V5 is opened, high-pressure washing water from the outside is removed from the automatic valves V5 and V6.
When they are simultaneously opened, the air-mixed liquid can flow into each of the detection units 33, and the high-pressure water flow causes the detection elements 34 to flow.
A and the flat hard glass 35a, 35b are forcibly washed. In addition, in the detection unit 33, in order to obtain a stable laminar flow at the time of measurement and prevent the generation of bubbles, the inner diameter near the inlet is gradually reduced with respect to the liquid flow direction as shown in FIG. It has a tapered diaphragm structure.

【0017】ホットフィルムセンサ34の検出素子34
aは、図2に示すように、検出部33内を流れる液と接
触可能に設けられており、受入槽30から流入する懸濁
液等の液性状を所定時間(例えば3分間)連続して計測
し、その計測値を最適薬注制御を行う制御演算ユニット
40に出力している。透過光型の洗浄性評価センサユニ
ット35は、図2に示すように、ホットフィルムセンサ
34の上方の側壁に、それぞれ対向して設けられるフラ
ット硬質ガラス35a,35bと、検出部33内にレー
ザビームを出力する発光部35cと、レーザビームを受
光する受光部35dと、発光部35c及び受光部35d
の動作制御を行い、検出部33内を透過したレーザビー
ムの透過光量に応じた検知信号を、制御演算ユニット4
0に出力するコントローラ部35eとから構成されてい
る。洗浄性評価センサユニット35では、フラット硬質
ガラス35a,35bが、配管24を介して供給される
洗浄水、供給管33aを介して供給される高圧洗浄水又
は空気混合液等によって洗浄される。
Detection element 34 of hot film sensor 34
As shown in FIG. 2, a is provided so as to be in contact with the liquid flowing in the detection unit 33, and the liquid property of the suspension or the like flowing from the receiving tank 30 is continuously maintained for a predetermined time (for example, 3 minutes). The measurement is performed and the measured value is output to the control calculation unit 40 that performs the optimum chemical injection control. As shown in FIG. 2, the transmitted light type cleaning property evaluation sensor unit 35 includes flat hard glasses 35 a and 35 b provided on the upper side wall of the hot film sensor 34 so as to face each other, and a laser beam in the detection unit 33. , A light emitting section 35c for outputting a laser beam, a light receiving section 35d for receiving a laser beam, a light emitting section 35c and a light receiving section 35d
Of the laser beam transmitted through the detection unit 33, and the detection signal corresponding to the transmitted light amount of the laser beam is transmitted to the control arithmetic unit 4
It is composed of a controller unit 35e for outputting 0. In the cleaning property evaluation sensor unit 35, the flat hard glass 35a, 35b is cleaned with cleaning water supplied through the pipe 24, high-pressure cleaning water supplied through the supply pipe 33a, an air mixed liquid, or the like.

【0018】制御演算ユニット40は、自動弁V0〜V
8、撹拌用モータ10、薬注ポンプ15、液位レベル計
32,37、ホットフィルムセンサ34及び洗浄性評価
センサユニット35のコントローラ部35eに電気的に
接続されており、ホットフィルムセンサ34からの検出
信号に応じて薬注量を制御するとともに、予め設定され
た動作制御プログラム、液位レベル計32,37及びコ
ントローラ部35eからの検知信号によって、弁の開閉
動作及び排気ポンプ39の駆動制御を行う。すなわち、
本実施例の制御演算ユニット40は、レーザビームの透
過光量に応じたコントローラ部35eからの検知信号に
基づいて、ホットフィルムセンサ34の清浄度を演算
し、上記清浄度に応じて強制洗浄を実行するかどうか判
断する。
The control arithmetic unit 40 includes automatic valves V0 to V
8. The stirring motor 10, the chemical injection pump 15, the liquid level gauges 32 and 37, the hot film sensor 34, and the controller unit 35e of the cleaning property evaluation sensor unit 35 are electrically connected to each other. In addition to controlling the chemical injection amount according to the detection signal, the valve opening / closing operation and the drive control of the exhaust pump 39 are controlled by a preset operation control program, detection signals from the liquid level meters 32 and 37, and the controller unit 35e. To do. That is,
The control calculation unit 40 of the present embodiment calculates the cleanliness of the hot film sensor 34 based on the detection signal from the controller 35e according to the amount of transmitted light of the laser beam, and executes the forced cleaning according to the cleanliness. Decide whether to do it.

【0019】次に、図1に示した液性状の計測装置の動
作を図4のフローチャートに基づいて説明する。なお、
凝集処理装置では、ピット11から懸濁液等が凝集槽1
3に供給されると、撹拌用モータ10及び薬注ポンプ1
5を制御して、凝集槽13に凝集剤を注入するととも
に、凝集処理し、さらに脱水機16で脱水ケーキと脱水
濾液とを分離し、上記懸濁液等を計測装置に給液してい
る。また、計測装置の初期状態では、受入槽30、計測
補助槽36、配管系路等は、通液及び計測が実行可能な
ように、空でクリーンな状態にある。また、自動弁V0
〜V8は、全て閉状態に制御されており、この状態にお
いて、脱水機16からの懸濁液等は、配管21、流量調
整弁V10を介して貯槽42に流出される。
Next, the operation of the liquid property measuring device shown in FIG. 1 will be described with reference to the flowchart of FIG. In addition,
In the flocculation processing device, the suspension or the like is fed from the pit 11 to the flocculation tank 1.
3, the stirring motor 10 and the chemical injection pump 1
5, the coagulant is injected into the coagulation tank 13, the coagulation process is performed, the dehydrated cake and the dehydrated filtrate are separated by the dehydrator 16, and the suspension and the like are supplied to the measuring device. . Further, in the initial state of the measuring device, the receiving tank 30, the auxiliary measurement tank 36, the piping system, and the like are empty and clean so that liquid passing and measurement can be performed. In addition, automatic valve V0
All of V8 to V8 are controlled to be in the closed state, and in this state, the suspension liquid or the like from the dehydrator 16 is discharged to the storage tank 42 via the pipe 21 and the flow rate adjusting valve V10.

【0020】まず、ステップ101の通液計測工程にお
いて、制御演算ユニット40は、閉状態の自動弁V0〜
V8のうち、自動弁V1,V2を開状態に制御し、さらに
自動弁V0を開けて、配管21から受入槽30及び配管
24に懸濁液等を供給する。次に、液位レベル計32か
ら受入槽30内の懸濁液等がH1のレベルに達したこと
を示す検知信号が入力されると、通液及び計測工程の排
気動作に移って、自動弁V2を閉じ、自動弁V8を開くと
ともに、排気ポンプ39の駆動制御を行い、排気ポンプ
39を始動させる。これにより、受入槽30内の懸濁液
等は、配管26とのヘッド差Δhを克服することとな
る。
First, in the liquid flow measuring step of step 101, the control arithmetic unit 40 controls the closed automatic valve V0.
Among V8, the automatic valves V1 and V2 are controlled to be in the open state, the automatic valve V0 is further opened, and the suspension or the like is supplied from the pipe 21 to the receiving tank 30 and the pipe 24. Next, when a detection signal indicating that the suspension or the like in the receiving tank 30 has reached the H1 level is input from the liquid level meter 32, the operation of the liquid passing and measuring process is started, and the automatic valve is operated. V2 is closed, the automatic valve V8 is opened, the exhaust pump 39 is driven and controlled, and the exhaust pump 39 is started. As a result, the suspension or the like in the receiving tank 30 overcomes the head difference Δh with the pipe 26.

【0021】一旦ヘッド差Δhを克服すると、吸引され
た懸濁液等が、以後サイフォン効果も加わって受入槽3
0から計測補助槽36内に流入し、計測補助槽36の液
位が上昇する。この際、配管29からも受水槽38内の
液が吸引されて多少上昇するが、上記ヘッド差Δhに比
べて、計測補助槽36と受水槽38間の距離を十分長く
とることによって、受水槽38内の液は、配管29内に
止まり、計測補助槽36への液の逆流は防止される。
Once the head difference Δh is overcome, the suctioned suspension liquid and the like are added to the receiving tank 3 with a siphon effect.
The liquid flows from 0 into the measurement auxiliary tank 36, and the liquid level in the measurement auxiliary tank 36 rises. At this time, the liquid in the water receiving tank 38 is also sucked from the pipe 29 and rises to some extent, but by setting the distance between the auxiliary measurement tank 36 and the water receiving tank 38 to be sufficiently longer than the head difference Δh, The liquid in 38 stops in the pipe 29, and the reverse flow of the liquid to the auxiliary measurement tank 36 is prevented.

【0022】そして、液位レベル計37から計測補助槽
36内の懸濁液等がH2レベルに達したことを示す検知
信号が入力されると、制御演算ユニット40は、計測動
作に移って、排気ポンプ39を停止させるとともに、自
動弁V3を開にし、ホットフィルムセンサ34の電源を
オンにして計測を開始する。なお、自動弁V0,V3の開
度は、受入槽30の液位が液位レベルH1に、計測補助
槽36の液位が液位レベルH2に保たれるように設定さ
れ、両槽30,36の液面差が一定に保持される。
Then, when a detection signal indicating that the suspension or the like in the measurement auxiliary tank 36 has reached the H 2 level is input from the liquid level meter 37, the control arithmetic unit 40 shifts to the measurement operation, The exhaust pump 39 is stopped, the automatic valve V3 is opened, the power of the hot film sensor 34 is turned on, and the measurement is started. The openings of the automatic valves V0 and V3 are set so that the liquid level of the receiving tank 30 is maintained at the liquid level H1 and the liquid level of the measurement auxiliary tank 36 is maintained at the liquid level H2. The liquid level difference of 36 is kept constant.

【0023】これにより、受入槽30内の懸濁液等は、
サイフォン効果によって、配管22,24及び26を介
して所定時間後に一定速度で計測補助槽36内に送液さ
れ、液流に脈動がなくなって安定した層流の状態で通液
され、ホットフィルムセンサ34による高精度の液性状
計測が可能となる。なお、本発明の計測装置では、レベ
ルH2で排気ポンプ39を停止し、自動弁V3を開にする
代わりに、上記H2に達しても排気ポンプ39を停止せ
ず、懸濁液等を配管29を介してオーバーフローさせる
ようにしても良い。この場合、サイフォン効果は、利用
しても、しなくても良い。この場合にも懸濁液等を計測
補助槽36に一旦溜めてから排液するので、排気ポンプ
39の脈動の影響がなくなり、安定した計測結果が得ら
れる。また、レベルM2で排気ポンプ39を停止し、サ
イフォン効果によって液を受入槽30から計測補助槽3
6に流入させるようにしても良い。この場合には、排気
ポンプ39の駆動時間が短縮されるので、電力消費を削
減することができる。
As a result, the suspension or the like in the receiving tank 30 is
Due to the siphon effect, the liquid is fed into the measurement auxiliary tank 36 at a constant speed after a predetermined time through the pipes 22, 24 and 26, and the liquid flow is pulsated to pass in a stable laminar flow state. It is possible to measure the liquid property with high accuracy by the 34. In the measuring device of the present invention, instead of stopping the exhaust pump 39 at the level H2 and opening the automatic valve V3, the exhaust pump 39 is not stopped even when the above H2 is reached, and the suspension or the like is piped 29. You may make it overflow through. In this case, the siphon effect may or may not be used. Also in this case, since the suspension or the like is temporarily stored in the measurement auxiliary tank 36 and then drained, the influence of the pulsation of the exhaust pump 39 is eliminated and a stable measurement result can be obtained. Further, the exhaust pump 39 is stopped at the level M2 and the liquid is received from the receiving tank 30 by the siphon effect and the measurement auxiliary tank 3 is used.
6 may be made to flow into. In this case, the driving time of the exhaust pump 39 is shortened, so that the power consumption can be reduced.

【0024】ホットフィルムセンサ34には、液位レベ
ル計32が液位レベルH1〜M1間の液位を検知し、液位
レベル計37が液位レベルがH2〜M2間を検知し、か
つ、自動弁V1が開の条件の時に、すなわち液性状の検
出部33に懸濁液等が流れている時にだけ、電源が供給
されてこの間に計測を行う。そして、受入槽30又は計
測補助槽36の液位が下がって、上述の電源オンの条件
が成立しなくなると、電源の供給を止めて、ホットフィ
ルムセンサ34を保護する。
In the hot film sensor 34, the liquid level meter 32 detects the liquid level between the liquid levels H1 and M1, the liquid level meter 37 detects the liquid level between H2 and M2, and Only when the automatic valve V1 is open, that is, when the suspension or the like is flowing through the liquid state detection unit 33, power is supplied and measurement is performed during this period. Then, when the liquid level of the receiving tank 30 or the measurement auxiliary tank 36 is lowered and the above-described power-on condition is no longer satisfied, the power supply is stopped and the hot film sensor 34 is protected.

【0025】ホットフィルムセンサ34に懸濁液等を流
すと、センサが汚れ、計測性能が劣化するので、計測時
間が所定時間に達する毎に排液、洗浄工程が実行され
る。まず、排液工程では、制御演算ユニット40は、自
動弁V1を閉状態に、自動弁V2,V3,V7を開状態に制
御して、計測補助槽36、配管系路等の懸濁液等を全て
受水槽38に排液する(ステップ102)。
When a suspension or the like is flown to the hot film sensor 34, the sensor is soiled and the measurement performance deteriorates. Therefore, the drainage and cleaning steps are executed every time the measurement time reaches a predetermined time. First, in the drainage process, the control arithmetic unit 40 controls the automatic valve V1 to be in the closed state and the automatic valves V2, V3, and V7 to be in the open state, so that the measurement auxiliary tank 36, the suspension of the piping system path, etc. Is drained to the water receiving tank 38 (step 102).

【0026】そして、制御演算ユニット40は、自装置
内に設けられたタイマ機能によって、上記自動弁の制御
から所定時間後、すなわち計測補助槽36、配管系路内
の懸濁液等が完全に排液された後に、洗浄工程に移っ
て、自動弁V3,V4のみを開状態に制御する。これによ
り、洗浄水は、配管24、検出部33、配管26、計測
補助槽36、配管27を通って受水槽38に排液され、
この間に配管24,26、ホットフィルムセンサ34の
検出素子34a表面及び洗浄性評価センサユニット35
のフラット硬質ガラス35a,35bが洗浄される(ス
テップ103)。引き続き自動弁V3を閉状態に制御す
ると、洗浄水は、計測補助槽36に溜まる。
Then, the control operation unit 40 has a timer function provided in its own device, and after a predetermined time has passed from the control of the automatic valve, that is, the measurement auxiliary tank 36, the suspension in the piping system passage, etc. are completely removed. After the liquid is drained, the cleaning process is started and only the automatic valves V3 and V4 are controlled to be in the open state. As a result, the wash water is drained to the water receiving tank 38 through the pipe 24, the detecting unit 33, the pipe 26, the measurement auxiliary tank 36, and the pipe 27.
In the meantime, the piping 24, 26, the surface of the detection element 34a of the hot film sensor 34, and the cleaning performance evaluation sensor unit 35
The flat hard glasses 35a and 35b are cleaned (step 103). When the automatic valve V3 is continuously controlled to be closed, the cleaning water is stored in the measurement auxiliary tank 36.

【0027】この時、自動弁V3を開く代わりに、洗浄
水を配管29にオーバーフローさせることによっても、
計測補助槽36、配管29を洗浄することができる。次
に、制御演算ユニット40は、洗浄水が計測補助槽36
のレベルH2に達した時に、排液工程に移って、自動弁
V4を閉じ、自動弁V2,V3,V7を開状態に制御して、
配管系路、検出部33、計測補助槽36内の洗浄水を一
気に、受水槽38に排液させる(ステップ104)。
At this time, instead of opening the automatic valve V3, by flushing the washing water into the pipe 29,
The measurement auxiliary tank 36 and the pipe 29 can be washed. Next, in the control calculation unit 40, the cleaning water is measured in the measurement auxiliary tank 36.
When reaching the level H2 of, the automatic drain valve V4 is closed and the automatic valves V2, V3 and V7 are controlled to be in the open state,
The cleaning water in the piping system, the detection unit 33, and the measurement auxiliary tank 36 is drained into the water receiving tank 38 at once (step 104).

【0028】また、受入槽30内を洗浄したい場合に
は、洗浄工程で、自動弁V1を開いて受入槽30内に洗
浄水を溜め、レベルH1に達した時に、排液工程に移っ
て、自動弁V7を開状態に制御して、受入槽30内の洗
浄水を一気に、受水槽38に排液させて、受入槽30を
洗浄する。次に、計測補助槽36内の洗浄水がレベルM
2に達すると、通水工程に移る。上記通水工程におい
て、制御演算ユニット40は、上記自動弁V1〜V3,V
7を閉状態に、自動弁V4を開状態に制御して、配管系路
への通水を行う(ステップ105)。これにより、上記
洗浄水は、配管24、検出部33、配管26を通って計
測補助槽36内に流入して、計測補助槽36の液位を上
昇させ、洗浄性評価センサユニット35によるホットフ
ィルムセンサ34の汚れ計測が可能となる。
When it is desired to wash the inside of the receiving tank 30, in the washing process, the automatic valve V1 is opened to store the washing water in the receiving tank 30, and when the level H1 is reached, the process goes to the draining process, The automatic valve V7 is controlled to be in the open state, and the cleaning water in the receiving tank 30 is immediately drained to the water receiving tank 38 to wash the receiving tank 30. Next, the cleaning water in the measurement auxiliary tank 36 has a level M.
When it reaches 2, move to the water flow process. In the water passing step, the control arithmetic unit 40 uses the automatic valves V1 to V3, V
By controlling 7 to be closed and the automatic valve V4 to be open, water is supplied to the piping system (step 105). As a result, the cleaning water flows into the measurement auxiliary tank 36 through the pipe 24, the detection unit 33, and the pipe 26, raises the liquid level in the measurement auxiliary tank 36, and the hot film by the cleaning property evaluation sensor unit 35. It is possible to measure the contamination of the sensor 34.

【0029】制御演算ユニット40は、水量確認工程を
行いながら(ステップ106)、ホットフィルムセンサ
34の汚れ計測を行う(ステップ107)。ステップ1
06の水量確認工程では、制御演算ユニット40は、計
測補助槽36内の水量確認を行っており、液位レベル計
37から計測補助槽36内の洗浄水がH2のレベルに達
したことを示す検知信号が入力すると、自動弁V3,V7
を開状態に、自動弁V4を閉状態に制御して、配管2
6、計測補助槽36内の洗浄水が受水槽38に排液され
る。なお、上記水量確認は、例えば自装置内に設けられ
たタイマ機能によって、通水時から所定時間後を検出し
て、この時を汚れ計測可能な一定の水量と認識しても良
いし、又は配管系路に流量計を配設して、上記流量計の
計測値によって一定の水量を認識することも可能であ
る。
The control calculation unit 40 measures the contamination of the hot film sensor 34 (step 107) while performing the water amount confirmation step (step 106). Step 1
In the water amount confirmation step of 06, the control operation unit 40 confirms the water amount in the measurement auxiliary tank 36, and indicates from the liquid level meter 37 that the cleaning water in the measurement auxiliary tank 36 has reached the H2 level. When the detection signal is input, automatic valves V3, V7
To the open state and the automatic valve V4 to the closed state to control the piping 2
6. The cleaning water in the measurement auxiliary tank 36 is drained to the water receiving tank 38. The above-mentioned amount of water may be confirmed, for example, by a timer function provided in the device itself, after a predetermined time has passed from the time of water passage, and this time may be recognized as a constant amount of water capable of measuring dirt, or It is also possible to dispose a flow meter in the piping system and recognize a constant amount of water by the measured value of the flow meter.

【0030】ステップ107のセンサ汚れの計測による
洗浄性の評価検知では、例えば図5に示すように、検出
部33の洗浄を60秒行い、制御演算ユニット40は、
この間に予め定められた間隔でコントローラ部35eか
らの検知信号を取り込み、上記検知信号に基づいて、ホ
ットフィルムセンサ34の清浄度を演算する。そして、
上記60秒経過しても清浄度が50%を越えない場合に
は、制御演算ユニット40は、強制洗浄を実行する(ス
テップ108)。
In the cleaning performance evaluation detection by measuring the sensor contamination in step 107, for example, as shown in FIG. 5, the detection unit 33 is cleaned for 60 seconds, and the control calculation unit 40
During this time, the detection signal from the controller unit 35e is taken in at a predetermined interval, and the cleanliness of the hot film sensor 34 is calculated based on the detection signal. And
When the cleanliness does not exceed 50% even after the lapse of 60 seconds, the control calculation unit 40 executes the forced cleaning (step 108).

【0031】この強制洗浄工程は、例えば図4に示すよ
うに、高圧洗浄水をホットフィルムセンサ34に噴射し
て洗浄する場合と、洗浄水に空気を混合してホットフィ
ルムセンサ34を洗浄する場合等とが存在し、ステップ
103の洗浄工程と同様に、60秒間の強制洗浄をそれ
ぞれ行う。上記高圧洗浄水による洗浄の場合には、制御
演算ユニット40は、自動弁V5,V7を開状態に制御
し、高圧洗浄水を配管25を介して検出部33内に流入
させて、ホットフィルムセンサ34の検出素子34a及
び洗浄性評価センサユニット35のフラット硬質ガラス
35a,35bを洗浄する。また、空気混合液による洗
浄の場合には、制御演算ユニット40は、自動弁V5〜
V7を開状態に制御し、洗浄水と空気による空気混合液
を配管25を介して検出部33内に流入させて、検出素
子34a及びフラット硬質ガラス35a,35bを洗浄
する。そして、上記強制洗浄が終了すると、ステップ1
04に戻って、上記排液、通水、水量確認及びセンサ汚
れ計測等の各工程を繰り返す。
In this forced cleaning step, for example, as shown in FIG. 4, high-pressure cleaning water is sprayed on the hot film sensor 34 for cleaning, and cleaning water is mixed with air to clean the hot film sensor 34. And the like exist, and the forced cleaning is performed for 60 seconds, respectively, as in the cleaning process of step 103. In the case of cleaning with the above high pressure cleaning water, the control arithmetic unit 40 controls the automatic valves V5 and V7 to the open state and causes the high pressure cleaning water to flow into the detection unit 33 through the pipe 25, and the hot film sensor. The detection element 34a of 34 and the flat hard glass 35a, 35b of the cleaning property evaluation sensor unit 35 are cleaned. In the case of cleaning with the air mixed liquid, the control arithmetic unit 40 uses the automatic valve V5 ...
V7 is controlled to be in an open state, and an air mixed liquid of cleaning water and air is caused to flow into the detection unit 33 through the pipe 25 to clean the detection element 34a and the flat hard glasses 35a and 35b. When the forced cleaning is completed, step 1
Returning to 04, the above-mentioned steps of draining water, passing water, confirming the amount of water, measuring sensor contamination, etc. are repeated.

【0032】また、ステップ107において、洗浄性評
価センサユニット35からの検知信号に基づき、洗浄か
ら60秒経過後に、清浄度が50%を越えた場合には、
制御演算ユニット40は、排液工程に移って、自動弁V
2,V3,V7を開状態に制御して、洗浄水を受水槽38
に流出させる(ステップ109)。そして、上記排液か
ら所定時間後に、ステップ101に戻って上記通液及び
計測工程が実行され、懸濁液等の液性状の計測が再開さ
れる。
Further, in step 107, based on the detection signal from the cleaning property evaluation sensor unit 35, when the cleanliness exceeds 50% after 60 seconds from the cleaning,
The control calculation unit 40 shifts to the drainage process, and the automatic valve V
2, V3, V7 are controlled to open state, and wash water is received in the water tank 38
(Step 109). Then, after a lapse of a predetermined time from the drainage, the process returns to step 101, the liquid passing and measuring steps are executed, and the measurement of the liquid property of the suspension or the like is restarted.

【0033】なお、上記強制洗浄を行い、ステップ10
7のセンサ汚れの計測による洗浄性の評価で、洗浄性が
良好と評価されても、ステップ101における計測で、
ホットフィルムセンサ34の測定精度が最適状態に復帰
しない場合がある。この場合には、ホットフィルムセン
サ34の経時的劣化が生じたものとして、ホットフィル
ムセンサ34のベース値の補正(自動校正)を行った
り、オーバーホールしたり、又は新たなものに取り替え
る等の処置を施すことが可能となる。
The above-mentioned forced cleaning is performed, and step 10
Even if the cleaning property is evaluated to be good by the sensor dirt measurement of 7 and the cleaning property is evaluated as good,
The measurement accuracy of the hot film sensor 34 may not return to the optimum state. In this case, it is assumed that the hot film sensor 34 has deteriorated with time, and the base value of the hot film sensor 34 is corrected (automatic calibration), overhauled, or replaced with a new one. Can be applied.

【0034】また、本実施例におけるセンサ汚れの計測
では、所定間隔で検知信号を取り込んで洗浄評価を行っ
たが、本発明はこれに限らず、例えばセンサ34の清浄
度が所定値に達していない場合には、ステップ104〜
107をサイクリックに繰り返して、所定回数行っても
上記所定値に達していない時に、強制洗浄を行うように
設定しても良い。
Further, in the measurement of the sensor dirt in this embodiment, the detection signal is fetched at a predetermined interval to perform the cleaning evaluation. However, the present invention is not limited to this, and the cleanliness of the sensor 34 has reached a predetermined value, for example. If not, step 104-
It is also possible to cyclically repeat 107 and set to perform the forced cleaning when the predetermined value is not reached even after the predetermined number of times.

【0035】上記強制洗浄工程には、本実施例の他に、
例えば自動弁V4,V6を開いて洗浄水中でセンサに圧縮
空気を吹き付けて洗浄を行う場合や、洗浄用の薬品を用
いて薬品洗浄を行う場合や、空気混合液、高圧洗浄水又
は薬品洗浄等を組み合わせて洗浄を行う場合等が考えら
れる。また、上記強制洗浄を行わずに、例えばステップ
103の洗浄工程で、空気混合液洗浄、高圧洗浄水又は
薬品洗浄等を行い、清浄度が低い場合には、上記洗浄工
程をサイクリックに繰り返すように設定することも可能
である。
In the forced cleaning step, in addition to this embodiment,
For example, when the automatic valves V4 and V6 are opened and cleaning is performed by blowing compressed air to the sensor in cleaning water, when cleaning is performed using chemicals for cleaning, air mixed liquid, high pressure cleaning water or chemical cleaning, etc. It is conceivable that cleaning is performed by combining the above. Further, without performing the forced cleaning, for example, in the cleaning process of step 103, air mixture cleaning, high-pressure cleaning water or chemical cleaning is performed, and when the cleanliness is low, the cleaning process is cyclically repeated. It is also possible to set to.

【0036】従って、本実施例では、硬質ガラスの検出
部を使用して、水洗浄時の上記検出部の光透過度に応じ
て、ホットフィルムセンサの洗浄性の評価を行い、上記
洗浄性が悪い場合には、強制洗浄を行って洗浄性を高め
るので、ホットフィルムセンサの素子表面洗浄を短時間
で的確に行い、測定精度を向上できる。このため、本実
施例では、洗浄度が向上し、ホットフィルムセンサの高
温度化の防止及びセンサの経時的劣化度を軽減でき、ホ
ットフィルムセンサを最適状態に維持してシステム全体
の信頼性を向上できる。
Therefore, in this embodiment, a hard glass detector is used to evaluate the washability of the hot film sensor according to the light transmittance of the detector during water washing. If it is bad, the cleaning property is enhanced by performing forced cleaning, so that the element surface of the hot film sensor can be accurately cleaned in a short time, and the measurement accuracy can be improved. Therefore, in this embodiment, the cleaning degree is improved, the temperature of the hot film sensor can be prevented from being raised, and the deterioration degree of the sensor over time can be reduced, and the hot film sensor can be maintained in an optimum state to improve the reliability of the entire system. Can be improved.

【0037】また、本実施例では、洗浄性の評価に透過
光型の洗浄性評価センサユニットを用いて、清浄度を検
知するので、感度良くホットフィルムセンサの洗浄性の
評価を行うことができる。このため、本実施例では、的
確にホットフィルムセンサの洗浄性を評価できるので、
センサの洗浄、計測系の補正及びセンサの取り替え等を
容易に行うことが可能となる。
Further, in this embodiment, since the cleanliness is detected by using the transmitted light type cleaning property evaluation sensor unit for the cleaning property evaluation, it is possible to evaluate the cleaning property of the hot film sensor with high sensitivity. . Therefore, in this embodiment, since the cleaning property of the hot film sensor can be accurately evaluated,
It is possible to easily clean the sensor, correct the measurement system, replace the sensor, and the like.

【0038】また、本実施例では、センサ洗浄のパター
ンを任意に変更できるので、汚れの難易度や被測定原水
の種類に応じて最適な洗浄のパターンを設定することが
可能となる。なお、上記実施例では、透過光型の洗浄性
評価センサユニットを用いてホットフィルムセンサの洗
浄性評価を行ったが、本発明はこれに限らず、上記洗浄
性評価センサユニットを用いずに洗浄性評価を行うこと
も可能である。この場合には、図4のステップ107に
示したセンサ汚れ計測では、流速を一定にした場合の洗
浄水の温度(以下、「センサ温度」という。)変化をホ
ットフィルムセンサ34によって検出し、上記検出した
温度変化に基づいて、制御演算ユニット40がホットフ
ィルムセンサ34の清浄度を演算するように設定する。
Further, in this embodiment, the sensor cleaning pattern can be arbitrarily changed, so that it is possible to set the optimum cleaning pattern according to the degree of difficulty of contamination and the type of raw water to be measured. In the above examples, the washability evaluation of the hot film sensor was performed using the transmitted light type washability evaluation sensor unit, but the present invention is not limited to this, and the washability evaluation sensor unit is not used for washing. It is also possible to perform sex evaluation. In this case, in the sensor dirt measurement shown in step 107 of FIG. 4, a change in the temperature of the wash water (hereinafter, referred to as “sensor temperature”) when the flow velocity is constant is detected by the hot film sensor 34, and The control calculation unit 40 is set to calculate the cleanliness of the hot film sensor 34 based on the detected temperature change.

【0039】すなわち、ホットフィルムセンサのセンサ
温度は、例えば以下の表1に示すように、上記センサの
検出部である素子表面を流れる洗浄水の流速によって変
化する場合と、上記流速が一定でも素子表面に汚れ皮膜
が形成されていると、その汚れ皮膜の厚さによっても変
化する。
That is, as shown in Table 1 below, for example, the sensor temperature of the hot film sensor changes depending on the flow rate of the washing water flowing on the surface of the element which is the detecting portion of the sensor, and when the flow rate is constant, the element temperature is constant. When a dirt film is formed on the surface, it also changes depending on the thickness of the dirt film.

【0040】[0040]

【表1】 ここで、水温は20°C、センサ表面積は16.1mm
2、定電流供給値は500mA、汚れ皮膜熱伝導率は1
0Kcal/Hv/°C/mとする。
[Table 1] Here, the water temperature is 20 ° C and the sensor surface area is 16.1 mm.
2 , constant current supply value is 500mA, dirt film thermal conductivity is 1
It is set to 0 Kcal / Hv / ° C / m.

【0041】本実施例は、後者の変化を利用したもの
で、洗浄水の液質及び流速を一定にした場合のセンサ温
度の変化をとらえることによって、センサの素子表面の
汚れを検知するものである。本実施例の制御演算ユニッ
トでは、図4の通水及び計測工程で、汚れの度合が、図
6に示す診断境界線B以下の場合には、センサのベース
値(ホットフィルムセンサの検出値と薬注量によるU字
特性のベース値)を校正し、また上記汚れの度合が、図
6に示す診断境界線Bを越える場合には、強制洗浄工程
に移行して、ホットフィルムセンサの強制洗浄を行う。
This embodiment utilizes the latter change, and detects stains on the element surface of the sensor by detecting the change in sensor temperature when the liquid quality and flow velocity of the wash water are constant. is there. In the water supply and measurement process of FIG. 4, in the control operation unit of the present embodiment, when the degree of contamination is less than or equal to the diagnostic boundary line B shown in FIG. 6, the base value of the sensor (the detected value of the hot film sensor and The base value of the U-shaped characteristic according to the chemical injection amount) is calibrated, and when the degree of contamination exceeds the diagnostic boundary line B shown in FIG. 6, the process moves to the forced cleaning step to force the hot film sensor to be cleaned. I do.

【0042】なお、センサ温度による汚れ計測値が極端
に悪い場合、例えば汚れ皮膜の厚みが0mmの時のセン
サ温度に対して、検出されたセンサ温度が約5°C高く
なる汚れ皮膜の厚みが0.6mm以上の場合には、ホッ
トフィルムセンサを目視で点検し、オーバーホールを行
うか、又はホットフィルムセンサを取り替える等の処置
を行う。
When the stain measurement value due to the sensor temperature is extremely bad, for example, the thickness of the stain film at which the detected sensor temperature is about 5 ° C. higher than the sensor temperature when the thickness of the stain film is 0 mm. In the case of 0.6 mm or more, the hot film sensor is visually inspected and overhauled, or the hot film sensor is replaced.

【0043】従って、本実施例でも、的確にホットフィ
ルムセンサの洗浄性を評価できるので、上記第1の実施
例と同様の効果が得られ、センサの洗浄、計測系の補正
及びセンサの取り替え等を容易に行うことが可能となる
とともに、洗浄性評価に用いる機器の部品点数を削減す
ることができて、製作コストを軽減できる。また、本実
施例は、必要な時にホットフィルムセンサ34の洗浄を
行うように設定することも可能である。この場合には、
例えば図4におけるステップ101の通液及び計測工程
で、ホットフィルムセンサ34の測定精度が最適状態か
どうか判断する。すなわち、この場合には、センサ34
の検出値に応じた凝集剤の最適薬注制御に伴い、凝集不
良や過剰添加が発生していないかどうかを検知すること
で、センサ34の測定精度を判断する。そして、この判
断において、センサ34の測定精度が最適状態の時に
は、通液及び計測工程を引き続き実行し、またセンサ3
4の測定精度が最適状態でない時には、ステップ102
に進んで、排液、ホットフィルムセンサ34の洗浄、セ
ンサ汚れ計測等の工程を実行するように動作させる。こ
れにより、上述した計測装置では、長時間の連続計測が
可能になるとともに、必要に応じてセンサ洗浄を行うこ
とができる。
Therefore, also in this embodiment, since the cleaning property of the hot film sensor can be evaluated accurately, the same effects as those of the first embodiment can be obtained, and the cleaning of the sensor, the correction of the measuring system, the replacement of the sensor, etc. Can be performed easily, and the number of parts of the equipment used for the cleaning property evaluation can be reduced, so that the manufacturing cost can be reduced. Further, in this embodiment, the hot film sensor 34 can be set to be washed when necessary. In this case,
For example, in the liquid passing and measuring process of step 101 in FIG. 4, it is determined whether the measurement accuracy of the hot film sensor 34 is in the optimum state. That is, in this case, the sensor 34
The measurement accuracy of the sensor 34 is judged by detecting whether or not aggregation failure or excessive addition occurs in accordance with the optimal chemical injection control of the aggregating agent according to the detection value of. Then, in this determination, when the measurement accuracy of the sensor 34 is in the optimum state, the liquid passing and measuring steps are continuously executed, and the sensor 3
When the measurement accuracy of 4 is not optimum, step 102
Then, the operation is performed so as to execute processes such as drainage, cleaning of the hot film sensor 34, and sensor dirt measurement. As a result, in the above-described measuring device, continuous measurement for a long time is possible, and sensor cleaning can be performed as necessary.

【0044】なお、上記実施例では、連続方式の計測装
置の場合について説明したが、本発明はこれに限らず、
バッチ方式の計測装置としても適用が可能である。この
バッチ計測の場合には、受入槽30の液位レベルがH1
に、計測補助槽36の液位レベルがオーバーフローレベ
ルH2に達したら、自動弁V0を閉じて、サイフォン効果
によって懸濁液等が受入槽30から計測補助槽36に流
れる間に液性状の計測が行われる。この場合には、受入
槽30と計測補助槽36の内径を同じにするか、又は受
入槽30から計測補助槽36までの液の落差に対して、
受入槽30の液位レベルH1〜M1間が小さければ、槽間
の液面差を略一定とみなすことができ、ホットフィルム
センサ34に流れる液の速度が一定となり、その間安定
した計測が可能となる。そして、この計測が終了する
と、懸濁液等の排液を行って、次の液性状計測のために
ホットフィルムセンサ34の洗浄、センサ汚れ計測、強
制洗浄等の工程を実行する。
In the above embodiment, the case of the continuous type measuring device has been described, but the present invention is not limited to this.
It can also be applied as a batch type measuring device. In the case of this batch measurement, the liquid level of the receiving tank 30 is H1.
When the liquid level of the measurement auxiliary tank 36 reaches the overflow level H2, the automatic valve V0 is closed and the liquid property is measured while the suspension or the like flows from the receiving tank 30 to the measurement auxiliary tank 36 by the siphon effect. Done. In this case, the receiving tank 30 and the measurement auxiliary tank 36 have the same inner diameter, or the liquid drop from the receiving tank 30 to the measurement auxiliary tank 36 is
If the liquid level level H1 to M1 of the receiving tank 30 is small, the liquid level difference between the tanks can be regarded as substantially constant, the speed of the liquid flowing to the hot film sensor 34 becomes constant, and stable measurement is possible during that time. Become. Then, when this measurement is completed, the suspension or the like is drained, and steps such as washing of the hot film sensor 34, measurement of sensor dirt, forced washing and the like are performed for the next liquid property measurement.

【0045】これにより、バッチ方式の計測装置の場合
には、一定量の液性状計測を行う度に、定期的にホット
フィルムセンサの洗浄性を評価できるので、ホットフィ
ルムセンサの高温度化の防止及びセンサの経時的劣化度
を軽減でき、ホットフィルムセンサを最適状態に維持し
てシステム全体の信頼性を向上できる。
Thus, in the case of the batch type measuring device, the cleaning property of the hot film sensor can be regularly evaluated every time a certain amount of liquid property is measured, so that the temperature of the hot film sensor is prevented from increasing. In addition, the degree of deterioration of the sensor over time can be reduced, the hot film sensor can be maintained in an optimum state, and the reliability of the entire system can be improved.

【0046】[0046]

【発明の効果】以上説明したように、本発明では、一端
に原水の入り口、他端に該原水の出口を有する検出部
と、前記検出部内に流れる原水と接触するように、該検
出部に設けられた熱移動検出計と、前記検出部に連結さ
れ、洗浄水及び洗浄空気を供給する供給管とを備えたの
で、ホットフィルムセンサの素子表面洗浄を短時間で的
確に行い、測定精度を向上できる。
As described above, according to the present invention, the detector having the inlet of raw water at one end and the outlet of the raw water at the other end and the detector so as to come into contact with the raw water flowing in the detector. Since the heat transfer detector provided and the supply pipe connected to the detection unit and supplying the cleaning water and the cleaning air are provided, the element surface of the hot film sensor is accurately cleaned in a short time, and the measurement accuracy is improved. Can be improved.

【0047】請求項2では、一端に原水の入り口、他端
に該原水の出口を有する検出部と、前記検出部内に流れ
る原水と接触するように、該検出部に設けられた熱移動
検出計と、前記検出部に連結され、洗浄水及び洗浄空気
を供給する供給管と、前記検出部に設けられ、前記熱移
動検出計の洗浄性を評価する洗浄性評価センサとを備え
たので、感度良く洗浄性の評価を行うことができ、セン
サの洗浄、計測系の補正及びセンサの取り替え等を容易
に行うことができる。
According to a second aspect of the present invention, the heat transfer detector provided in the detection unit so as to come into contact with the detection unit having the raw water inlet at one end and the raw water outlet at the other end and the raw water flowing in the detection unit. And a cleaning pipe connected to the detection unit for supplying cleaning water and cleaning air, and a cleaning property evaluation sensor provided in the detection unit for evaluating the cleaning property of the heat transfer detector. The cleaning property can be well evaluated, and cleaning of the sensor, correction of the measurement system, replacement of the sensor, and the like can be easily performed.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る計測装置の一例を示す構成図であ
る。
FIG. 1 is a configuration diagram showing an example of a measuring device according to the present invention.

【図2】図1に示した検出部の構成図である。FIG. 2 is a configuration diagram of a detection unit shown in FIG.

【図3】図2に示した検出部A部の部分断面図である。FIG. 3 is a partial cross-sectional view of a detection unit A portion shown in FIG.

【図4】図1に示した計測装置の動作を説明するための
フローチャートである。
4 is a flowchart for explaining the operation of the measuring device shown in FIG.

【図5】図1に示したホットフィルムセンサの素子表面
の洗浄特性を示す図である。
5 is a diagram showing cleaning characteristics of the element surface of the hot film sensor shown in FIG.

【図6】ホットフィルムセンサの素子表面汚れのセンサ
温度に対する影響を示す図である。
FIG. 6 is a diagram showing the influence of element surface contamination of the hot film sensor on the sensor temperature.

【図7】従来の計測装置の一例を示す構成図である。FIG. 7 is a configuration diagram showing an example of a conventional measuring device.

【符号の説明】[Explanation of symbols]

30 受入槽 32,37 液位レベル計 33 検出部 34 ホットフィルムセンサ 35 透過光型の洗浄性評価センサユニット 36 計測補助槽 38 受水槽 39 排気ポンプ 40 制御演算ユニット V0〜V8 自動弁 30 acceptance tank 32, 37 liquid level meter 33 detection unit 34 hot film sensor 35 transmitted light type cleaning property evaluation sensor unit 36 measurement auxiliary tank 38 water reception tank 39 exhaust pump 40 control calculation unit V0-V8 automatic valve

───────────────────────────────────────────────────── フロントページの続き (72)発明者 岸根 義尚 東京都新宿区西新宿3丁目4番7号 栗田 工業株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Yoshihisa Kishine 3-4-7 Nishishinjuku, Shinjuku-ku, Tokyo Kurita Industry Co., Ltd.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 一端に原水の入り口、他端に該原水の出
口を有する検出部と、 前記検出部内に流れる原水と接触するように、該検出部
に設けられた熱移動検出計と、 前記検出部に連結され、洗浄水及び洗浄空気を供給する
供給管とを備えたことを特徴とする液性状の計測装置。
1. A detector having an inlet of raw water at one end and an outlet of the raw water at the other end, and a heat transfer detector provided in the detector so as to come into contact with the raw water flowing in the detector, A liquid property measuring device, comprising: a supply pipe connected to a detection unit and supplying cleaning water and cleaning air.
【請求項2】 一端に原水の入り口、他端に該原水の出
口を有する検出部と、 前記検出部内に流れる原水と接触するように、該検出部
に設けられた熱移動検出計と、 前記熱移動検出計を洗浄する洗浄手段と、 前記熱移動検出計の洗浄性を評価する洗浄性評価センサ
とを備えたことを特徴とする液性状の計測装置。
2. A detection unit having an inlet of raw water at one end and an outlet of the raw water at the other end, and a heat transfer detector provided in the detection unit so as to come into contact with the raw water flowing in the detection unit, A liquid property measuring device comprising: a cleaning unit for cleaning the heat transfer detector; and a cleaning property evaluation sensor for evaluating the cleaning property of the heat transfer detector.
JP25586694A 1994-10-20 1994-10-20 Liquid property measuring apparatus Pending JPH08117510A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25586694A JPH08117510A (en) 1994-10-20 1994-10-20 Liquid property measuring apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25586694A JPH08117510A (en) 1994-10-20 1994-10-20 Liquid property measuring apparatus

Publications (1)

Publication Number Publication Date
JPH08117510A true JPH08117510A (en) 1996-05-14

Family

ID=17284673

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25586694A Pending JPH08117510A (en) 1994-10-20 1994-10-20 Liquid property measuring apparatus

Country Status (1)

Country Link
JP (1) JPH08117510A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007170993A (en) * 2005-12-22 2007-07-05 Mitsubishi Electric Corp Water quality measuring apparatus
CN110217966A (en) * 2019-06-03 2019-09-10 广东恒鑫智能装备股份有限公司 A kind of automatic cleaning type sludge extrusion die

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007170993A (en) * 2005-12-22 2007-07-05 Mitsubishi Electric Corp Water quality measuring apparatus
JP4744289B2 (en) * 2005-12-22 2011-08-10 三菱電機株式会社 Water quality measuring device
CN110217966A (en) * 2019-06-03 2019-09-10 广东恒鑫智能装备股份有限公司 A kind of automatic cleaning type sludge extrusion die

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