JPH0797672B2 - Laser optical axis adjustment device - Google Patents

Laser optical axis adjustment device

Info

Publication number
JPH0797672B2
JPH0797672B2 JP16780688A JP16780688A JPH0797672B2 JP H0797672 B2 JPH0797672 B2 JP H0797672B2 JP 16780688 A JP16780688 A JP 16780688A JP 16780688 A JP16780688 A JP 16780688A JP H0797672 B2 JPH0797672 B2 JP H0797672B2
Authority
JP
Japan
Prior art keywords
laser
optical axis
wavelength
amplifier
total reflection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP16780688A
Other languages
Japanese (ja)
Other versions
JPH0218977A (en
Inventor
主税 小長井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP16780688A priority Critical patent/JPH0797672B2/en
Publication of JPH0218977A publication Critical patent/JPH0218977A/en
Publication of JPH0797672B2 publication Critical patent/JPH0797672B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2366Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media comprising a gas as the active medium
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308Amplifier arrangements, e.g. MOPA

Description

【発明の詳細な説明】 〔発明の目的〕 (産業上の利用分野) 金属蒸気又はガスをレーザー媒質とするレーザー装置を
レーザー増幅器として複数台直列に並べて使用するレー
ザー増幅装置において、レーザー光軸を調整する装置に
関する。
DETAILED DESCRIPTION OF THE INVENTION (Industrial field of application) In a laser amplifying device in which a plurality of laser devices using metal vapor or gas as a laser medium are arranged in series as a laser amplifier and used, It relates to a device for adjusting.

(従来の技術) 複数台のレーザー装置を、1台をレーザー発振器とし
て、それ以外をレーザー増幅器として使用し全体で高い
レーザー出力を得るレーザー増幅装置は概略第2図の様
な構成をしている。
(Prior Art) A laser amplifying device which uses a plurality of laser devices, one as a laser oscillator and the other as a laser amplifier to obtain a high laser output as a whole, has a configuration as shown in FIG. .

レーザー発振器11は全反射鏡13a及び部分反射鏡13bから
成る共振器によりレーザービーム20を出射する。
The laser oscillator 11 emits a laser beam 20 by means of a resonator including a total reflection mirror 13a and a partial reflection mirror 13b.

レーザービーム20は2枚の全反射鏡14a,14bにより光軸
を調整されてレーザー増幅器12に入射し、同増幅器によ
りレーザー出力が高められたレーザービーム21となって
出射する。レーザー増幅器の台数が更に多い場合にも上
記のくり返しで構成される。
The laser beam 20 has its optical axis adjusted by the two total reflection mirrors 14a and 14b, enters the laser amplifier 12, and is emitted as a laser beam 21 whose laser output is increased by the amplifier. Even if the number of laser amplifiers is larger, the above configuration is repeated.

この様なレーザー増幅装置でレーザー出力を最大に維持
するためには、レーザービームの光軸がレーザー増幅器
の幾何学的な軸に正確に調整されていることが必要であ
る。
In order to maintain the maximum laser output in such a laser amplifying device, it is necessary that the optical axis of the laser beam is accurately adjusted to the geometrical axis of the laser amplifier.

ところが実際には振動、熱的原因などによりレーザー光
軸は初期設定した値からずれるケースが多く、このため
全反射鏡14a,14bを適宜再調整して光軸を正常な位置に
あわせる作業が必要となる。
However, in reality, the laser optical axis often deviates from the initial value due to vibration, thermal causes, etc.Therefore, it is necessary to readjust the total reflection mirrors 14a and 14b appropriately to align the optical axis with the normal position. Becomes

従来レーザー光軸の調整を自動的に行なう方法は第3図
に示す様な方法であった。
Conventionally, the method of automatically adjusting the laser optical axis has been as shown in FIG.

反射鏡15bを部分反射鏡として、レーザービーム20の一
部分の光が透過する様にして2次元位置検出器16aに入
射させる。位置検出器16aは入射ビームの光軸が正常で
あるべき位置からずれた場合は変位を検出し、制御装置
17aを経由して反射鏡15aの角度を変化させレーザービー
ム20が位置検出器16の正常な位置に入射する様に調整す
る。同様に反射鏡15bは、レーザー増幅器12を出射し、
部分反射鏡15cを透過して位置検出器16bに入射したビー
ム位置のずれをもとに制御装置17bを経由して反射鏡15b
の角度を調整する。
The reflecting mirror 15b is used as a partial reflecting mirror so that a part of the laser beam 20 is transmitted and made incident on the two-dimensional position detector 16a. The position detector 16a detects the displacement when the optical axis of the incident beam deviates from the position where it should be normal, and the control device
The angle of the reflecting mirror 15a is changed via 17a so that the laser beam 20 is adjusted to enter the normal position of the position detector 16. Similarly, the reflecting mirror 15b emits the laser amplifier 12,
Based on the deviation of the beam position transmitted through the partial reflection mirror 15c and incident on the position detector 16b, the reflection mirror 15b is passed through the control device 17b.
Adjust the angle of.

(発明が解決しようとする課題) この様な従来構成では反射鏡15b,15cに100%反射鏡でな
く95%程度の反射率の鏡を使用するために調整個所が多
くなるにつれて出射レーザービームを損失するという問
題があった。
(Problems to be solved by the invention) In such a conventional configuration, since the reflecting mirrors 15b and 15c use mirrors having a reflectance of about 95% instead of 100% reflecting mirrors, the output laser beam is changed as the number of adjustment points increases There was a problem of loss.

〔発明の構成〕[Structure of Invention]

(課題を解決するための手段) 本発明は、レーザー発振器とレーザー増幅器と、前記発
振器から増幅器へのレーザー光軸調整用の全反射鏡を備
えた銅蒸気レーザー増幅装置において、当該銅蒸気レー
ザー波長と異なる波長のヘリウムネオン参照用レーザー
を前記レーザー光軸に平行に入射せしめ、前記レーザー
光軸調整用全反射鏡を銅蒸気レーザー波長を全反射し、
前記参照用レーザー波長が部分透過できる様にダイクロ
イックミラーを選択し、この部分透過した参照用レーザ
ーの位置を位置検出器で検出してビーム位置がずれた時
に前記レーザー光軸調整用全反射鏡の角度を調整する制
御装置を備えたことを特徴とするレーザー光軸調整装置
である。
(Means for Solving the Problems) The present invention relates to a copper vapor laser amplification device equipped with a laser oscillator, a laser amplifier, and a total reflection mirror for adjusting a laser optical axis from the oscillator to the amplifier. The helium neon reference laser having a different wavelength from is incident in parallel with the laser optical axis, the laser optical axis adjustment total reflection mirror to totally reflect the copper vapor laser wavelength,
A dichroic mirror is selected so that the reference laser wavelength can be partially transmitted, and the position of the reference laser that has been partially transmitted is detected by a position detector, and when the beam position shifts, the laser optical axis adjusting total reflection mirror A laser optical axis adjusting device comprising a control device for adjusting an angle.

(作用) 本発明によれば反射鏡2a,2b,2cがレーザービーム20,21
に対して全反射鏡で構成することが可能なためレーザー
増幅装置からのレーザー出力の損失が全くないという作
用を奏する。
(Operation) According to the present invention, the reflecting mirrors 2a, 2b, 2c are the laser beams 20, 21.
On the other hand, since it can be configured by a total reflection mirror, there is an effect that there is no loss of laser output from the laser amplification device.

(実 施 例) 第1図に本発明の一実施例を示す。(Example) FIG. 1 shows an example of the present invention.

レーザー発振器11からのレーザービーム20は反射鏡2a,2
bで反射した後レーザー増幅器12に入射し、同増幅器出
射ビーム21は反射鏡2cで反射する。
The laser beam 20 from the laser oscillator 11 is reflected by the reflecting mirrors 2a, 2
After being reflected by b, it is incident on the laser amplifier 12, and the amplifier output beam 21 is reflected by the reflecting mirror 2c.

レーザー発振器11の全反射ミラー13aの外側に参照用レ
ーザー1を設置し参照用レーザービーム3をレーザービ
ーム20の中心軸上に通す。
The reference laser 1 is installed outside the total reflection mirror 13a of the laser oscillator 11, and the reference laser beam 3 is passed on the central axis of the laser beam 20.

参照用レーザービーム3の波長をヘリウム−ネオンの62
9nmとしてレーザー発振器11のレーザービーム20の波長
(510nm,578nm)と異なる波長に選択することにより、
レーザービームに存在する鏡に以下の機能を付与するこ
とが可能となる。
The wavelength of the reference laser beam 3 is 62 for helium-neon.
By selecting a wavelength different from the wavelength (510 nm, 578 nm) of the laser beam 20 of the laser oscillator 11 as 9 nm,
It is possible to add the following functions to the mirror existing in the laser beam.

反射鏡13a,13bはダイクロイックミラ(2色鏡)を採用
してレーザービーム20に対してはそれぞれ全反射鏡、部
分反射鏡として機能するが、参照用レーザービーム3を
透過させる機能のものを選択した。
The dichroic mirrors (dichroic mirrors) are adopted for the reflecting mirrors 13a and 13b, and the reflecting mirrors 13a and 13b function as a total reflecting mirror and a partial reflecting mirror for the laser beam 20, respectively, but those having a function of transmitting the reference laser beam 3 are selected. did.

反射鏡2a,2b,2cも同じくダイクロイックミラーを用いレ
ーザービーム20,21に対しては全反射鏡として機能する
が、参照用レーザービーム3を部分透過させる機能のも
のを選択した。
The reflecting mirrors 2a, 2b and 2c also use dichroic mirrors and function as total reflecting mirrors for the laser beams 20 and 21, but those having a function of partially transmitting the reference laser beam 3 are selected.

これによりレーザー光軸調整は参照用レーザービーム3
に対して、第3図を元に従来例で説明した方法と同様な
方法で行なうことが可能となる。
As a result, the laser beam axis adjustment is performed by the reference laser beam 3
On the other hand, it is possible to perform the same method as the method described in the conventional example based on FIG.

反射鏡2a,2b,2cがレーザービーム20,21に対して全反射
鏡で構成することが可能なためレーザー増幅装置からの
レーザー出力の損失が全くないという特長を有する。
Since the reflecting mirrors 2a, 2b, 2c can be configured as total reflecting mirrors for the laser beams 20, 21, there is no loss of laser output from the laser amplification device.

レーザー発振器11、レーザー増幅器12が銅蒸気レーザー
(波長510nm)の場合には、参照用レーザー1としてHeN
aレーザー(波長629nm)を使用することにより、波長が
50nm以上離れているために銅蒸気レーザービームを全反
射させながら、HeNe参照用レーザービームを部分透過さ
せながら光軸調整に使用するということが可能となる。
When the laser oscillator 11 and the laser amplifier 12 are copper vapor lasers (wavelength 510 nm), HeN is used as the reference laser 1.
By using a laser (wavelength 629nm),
Since they are separated by 50 nm or more, it is possible to use them for optical axis adjustment while totally reflecting the copper vapor laser beam and partially transmitting the HeNe reference laser beam.

〔発明の効果〕〔The invention's effect〕

以上説明した通り、本発明では反射鏡2a,2b,2cがレーザ
ービーム20,21に対して全反射鏡で構成することが可能
なためレーザー増幅装置からのレーザー出力の損失が全
くないという効果を奏する。
As described above, in the present invention, since the reflecting mirrors 2a, 2b, 2c can be configured by total reflecting mirrors for the laser beams 20 and 21, the effect that there is no loss of laser output from the laser amplification device is obtained. Play.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の一実施例を示す構成図、第2図はレー
ザー増幅装置の原理を示す構成図、第3図は従来のレー
ザー光軸調整装置を示す構成図である。 1……参照用レーザー、2a,2b,2c……反射鏡 3……参照用レーザービーム 3′,3″……部分透過参照用レーザービーム 11……金属蒸気又はガスレーザー発振器 12……金属蒸気又はガスレーザー増幅器 13a,13b……金属蒸気又はガスレーザー用共振器鏡 14a,14b……反射鏡、15a……全反射鏡 15b,15c……部分反射鏡 16a,16b……2次元位置検出器 17a,17b……レーザービーム補正用制御装置
FIG. 1 is a block diagram showing an embodiment of the present invention, FIG. 2 is a block diagram showing the principle of a laser amplifier, and FIG. 3 is a block diagram showing a conventional laser optical axis adjusting device. 1 ... Reference laser, 2a, 2b, 2c ... Reflector 3 ... Reference laser beam 3 ', 3 "... Partial transmission reference laser beam 11 ... Metal vapor or gas laser oscillator 12 ... Metal vapor Or gas laser amplifier 13a, 13b …… Metal vapor or gas laser resonator mirror 14a, 14b …… Reflector, 15a …… Total reflector 15b, 15c …… Partial reflector 16a, 16b …… Two-dimensional position detector 17a, 17b ... Control device for laser beam correction

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】レーザー発振器とレーザー増幅器と、前記
発振器から増幅器へのレーザー光軸調整用の全反射鏡を
備えた銅蒸気レーザー増幅装置において、当該銅蒸気レ
ーザー波長と異なる波長のヘリウムネオン参照用レーザ
ーを前記レーザー光軸に平行に入射せしめ、前記レーザ
ー光軸調整用全反射鏡を銅蒸気レーザー波長を全反射
し、前記参照用レーザー波長が部分透過できる様にダイ
クロイックミラーを選択し、この部分透過した参照用レ
ーザーの位置を位置検出器で検出してビーム位置がずれ
た時に前記レーザー光軸調整用全反射鏡の角度を調整す
る制御装置を備えたことを特徴とするレーザー光軸調整
装置。
1. A copper vapor laser amplification apparatus comprising a laser oscillator, a laser amplifier, and a total reflection mirror for adjusting the laser optical axis from the oscillator to the amplifier, for helium neon reference having a wavelength different from the copper vapor laser wavelength. A laser is incident parallel to the laser optical axis, the laser optical axis adjusting total reflection mirror is totally reflected at the copper vapor laser wavelength, and the dichroic mirror is selected so that the reference laser wavelength can be partially transmitted. A laser optical axis adjusting device comprising a controller for detecting the position of the transmitted reference laser with a position detector and adjusting the angle of the laser light axis adjusting total reflection mirror when the beam position is deviated. .
JP16780688A 1988-07-07 1988-07-07 Laser optical axis adjustment device Expired - Fee Related JPH0797672B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16780688A JPH0797672B2 (en) 1988-07-07 1988-07-07 Laser optical axis adjustment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16780688A JPH0797672B2 (en) 1988-07-07 1988-07-07 Laser optical axis adjustment device

Publications (2)

Publication Number Publication Date
JPH0218977A JPH0218977A (en) 1990-01-23
JPH0797672B2 true JPH0797672B2 (en) 1995-10-18

Family

ID=15856454

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16780688A Expired - Fee Related JPH0797672B2 (en) 1988-07-07 1988-07-07 Laser optical axis adjustment device

Country Status (1)

Country Link
JP (1) JPH0797672B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017022351A (en) * 2015-07-15 2017-01-26 三菱重工業株式会社 Position detection system for reflection spot of laser light, laser optical axis alignment system and laser optical axis alignment method
US20190157828A1 (en) * 2017-11-21 2019-05-23 Taiwan Semiconductor Manufacturing Co., Ltd. Methods and Systems for Aligning Master Oscillator Power Amplifier Systems
US11973302B2 (en) 2023-02-20 2024-04-30 Taiwan Semiconductor Manufacturing Co., Ltd. Methods and systems for aligning master oscillator power amplifier systems

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0767895A (en) * 1993-06-25 1995-03-14 Sumitomo Electric Ind Ltd Antimicrobial artificial blood vessel and suture yarn for antimicrobial operation
JP2008258314A (en) * 2007-04-03 2008-10-23 Toshiba Corp Automatic correction apparatus for optical resonator, and automatic correction method for optical resonator
JP5110634B2 (en) * 2007-05-16 2012-12-26 ギガフォトン株式会社 Laser optical axis adjusting apparatus and laser optical axis adjusting method
JP5110633B2 (en) * 2007-05-16 2012-12-26 ギガフォトン株式会社 Laser optical axis adjusting apparatus and laser optical axis adjusting method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017022351A (en) * 2015-07-15 2017-01-26 三菱重工業株式会社 Position detection system for reflection spot of laser light, laser optical axis alignment system and laser optical axis alignment method
US20190157828A1 (en) * 2017-11-21 2019-05-23 Taiwan Semiconductor Manufacturing Co., Ltd. Methods and Systems for Aligning Master Oscillator Power Amplifier Systems
US11588293B2 (en) * 2017-11-21 2023-02-21 Taiwan Semiconductor Manufacturing Co., Ltd. Methods and systems for aligning master oscillator power amplifier systems
US11973302B2 (en) 2023-02-20 2024-04-30 Taiwan Semiconductor Manufacturing Co., Ltd. Methods and systems for aligning master oscillator power amplifier systems

Also Published As

Publication number Publication date
JPH0218977A (en) 1990-01-23

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