JPH078788U - Surface contamination wiper - Google Patents

Surface contamination wiper

Info

Publication number
JPH078788U
JPH078788U JP3832193U JP3832193U JPH078788U JP H078788 U JPH078788 U JP H078788U JP 3832193 U JP3832193 U JP 3832193U JP 3832193 U JP3832193 U JP 3832193U JP H078788 U JPH078788 U JP H078788U
Authority
JP
Japan
Prior art keywords
mounting base
pressure
head
cap
filter paper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3832193U
Other languages
Japanese (ja)
Inventor
清二 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP3832193U priority Critical patent/JPH078788U/en
Publication of JPH078788U publication Critical patent/JPH078788U/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】 【構成】 本考案の表面汚染拭取装置は、吸引ポンプ1
1で吸引されるホース10をヘッド4の押し棒7に接続
してろ紙1付きのキャップ2とヘッド4の凹字状部の間
の空間を負圧にし、ホース10に設けた圧力検出器12
によりキャップ2とマグネット3との間の隙間の発生を
検知したら取付台6の後退により押付力を減少させて隙
間をゼロに戻すようにし、隙間がゼロで最適の押付力が
加えられた状態での負圧が圧力検出器12で得られるよ
うに制御部13により取付台6の位置を取付台駆動機構
14を介して制御することを特徴とする。 【効果】 ろ紙付きキャップ2の脱落を防止できるとと
もに、最適な押付力をろ紙1に加えることができる。こ
れにより、精度の良い拭取りを行なうことができる。ま
た、脱落により発生していた回収,ろ紙付きキャップの
取付等の作業が無くなることで、作業員の放射線被曝低
減が可能になる。
(57) [Summary] [Constitution] The surface contamination wiping device of the present invention is a suction pump 1.
The hose 10 sucked at 1 is connected to the push rod 7 of the head 4 to make the space between the cap 2 with the filter paper 1 and the concave portion of the head 4 a negative pressure, and the pressure detector 12 provided on the hose 10
When the generation of the gap between the cap 2 and the magnet 3 is detected by the above, the pressing force is reduced by returning the mounting base 6 to return the gap to zero, and the optimum pressing force is applied when the gap is zero. The position of the mounting base 6 is controlled by the control unit 13 via the mounting base drive mechanism 14 so that the negative pressure is obtained by the pressure detector 12. [Effect] The cap 2 with filter paper can be prevented from falling off, and an optimum pressing force can be applied to the filter paper 1. Thereby, accurate wiping can be performed. Further, since the work such as the collection and the attachment of the cap with the filter paper, which have occurred due to the falling off, is eliminated, it is possible to reduce the radiation exposure of the worker.

Description

【考案の詳細な説明】[Detailed description of the device]

【0001】[0001]

【産業上の利用分野】[Industrial applications]

本考案は、放射性廃棄物を封入したドラム缶などの円筒容器の表面汚染を検査 するため表面を拭取る装置に関する。 The present invention relates to an apparatus for wiping the surface of a cylindrical container such as a drum can containing radioactive waste in order to inspect the surface for contamination.

【0002】[0002]

【従来の技術】[Prior art]

原子力発電所や再処理施設等の放射性物質取扱施設より生じる廃棄物は、ドラ ム缶等の円筒容器に封入固化され貯蔵保管される。 Wastes generated from radioactive material handling facilities such as nuclear power plants and reprocessing facilities are solidified and stored in cylindrical containers such as drums.

【0003】 この際の管理上から表面汚染の測定が必要であり、容器の表面をろ紙で拭取り 、付着した放射性物質を放射線検出器で測定する方法をスミヤ法という。The surface contamination must be measured in terms of management at this time, and the method of wiping the surface of the container with filter paper and measuring the attached radioactive substance with a radiation detector is called the smear method.

【0004】 図2に従来の拭取装置を示す。図2において、ろ紙1は接着剤等でキャップ2 に貼付けられている。キャップ2は、ヘッド4の凹字状部に取付けられたリング 状のマグネット3の磁力により保持されている。拭取りは、取付台6の位置を変 化させる駆動機構と円筒容器8を回転させる機構により行なわれる。ろ紙1の押 付力は、取付台6と円筒容器8の距離とばね5の撓みにより生じ、拭取り面の凹 凸等に応じてばね5が伸縮する。押し棒7は、ヘッド4の支持軸に内嵌してその 先端面まで延在しており、キャップ2をヘッド4から取外す際に押し込んでキャ ップ2をマグネット3から離すようにする。FIG. 2 shows a conventional wiping device. In FIG. 2, the filter paper 1 is attached to the cap 2 with an adhesive or the like. The cap 2 is held by the magnetic force of a ring-shaped magnet 3 attached to the concave portion of the head 4. Wiping is performed by a drive mechanism that changes the position of the mounting base 6 and a mechanism that rotates the cylindrical container 8. The pressing force of the filter paper 1 is generated by the distance between the mounting base 6 and the cylindrical container 8 and the bending of the spring 5, and the spring 5 expands and contracts according to the concave and convex of the wiping surface. The push rod 7 is fitted into the support shaft of the head 4 and extends to the tip surface thereof, and is pushed when the cap 2 is detached from the head 4 to separate the cap 2 from the magnet 3.

【0005】[0005]

【考案が解決しようとする課題】[Problems to be solved by the device]

上述した従来技術の拭取装置では、取付台6と円筒容器8の距離は一定である ため、容器の表面に予想以上の凸起部等があると、ばね5の圧縮方向の変形(ば ねの撓みの増大)が大きくなり、過大な押付力が発生した。この過大な押付力は 、ろ紙1の拭取面の摩擦力を増大させるため、ろ紙1付きのキャップ2がヘッド 4のマグネット3から脱落する欠点があった。 In the above-described conventional wiping device, since the distance between the mounting base 6 and the cylindrical container 8 is constant, if the surface of the container has a protrusion more than expected, the spring 5 is deformed in the compression direction. The increase in the flexure of the) increased, and an excessive pressing force was generated. This excessive pressing force increases the frictional force of the wiping surface of the filter paper 1, so that the cap 2 with the filter paper 1 has a drawback of coming off from the magnet 3 of the head 4.

【0006】 そこで本考案は、ろ紙付きのキャップの脱落を解消できる表面汚染拭取装置を 提供することを目的とする。Therefore, an object of the present invention is to provide a surface-contamination wiping device that can prevent the cap with filter paper from falling off.

【0007】[0007]

【課題を解決するための手段】[Means for Solving the Problems]

本考案の表面汚染拭取装置は、中心貫通穴を有する押し棒の外方端に吸引ポン プにより吸引されるホースを接続してキャップとヘッドとの間の空間を負圧にし 、前記ホースに設けた圧力検出器により前記キャップとマグネットの間の隙間の 発生を検知したら取付台の後退により押付力を減少させて隙間をゼロに戻すよう にし、隙間がゼロで最適の押付力が加えられた状態での負圧が圧力検出器で得ら れるように制御部によって取付台の位置を取付台駆動機構を介して制御すること を特徴とする。 The surface contamination wiping device of the present invention connects a hose sucked by a suction pump to the outer end of a push rod having a central through hole to make a negative pressure in the space between the cap and the head, and When the pressure detector provided detects the occurrence of a gap between the cap and magnet, the mounting base is retracted to reduce the pressing force to return it to zero, and the optimum pressing force is applied when the gap is zero. It is characterized in that the position of the mount is controlled by the controller via the mount drive mechanism so that the negative pressure in the state can be obtained by the pressure detector.

【0008】[0008]

【作用】[Action]

本考案の表面汚染拭取装置においては、ろ紙付きのキャップが脱落しそうにな ったときにはキャップとマグネットの間に隙間が生じ、この隙間から空気が流入 して圧力が上がる。この上った圧力を圧力検出器で検出し制御部へ伝送する。制 御部は隙間発生と判断し、取付台後退信号を取付台駆動機構に送り、駆動機構が 取付台を後退させて押付力を減少させる。これにより、ろ紙に作用する過大な摩 擦力が消え、キャップはマグネットの磁力によりマグネットに密着し隙間が無く なる。この結果、空気の流入が止まり、圧力が下がって行く。この圧力低下で制 御部は隙間ゼロと判断し、前進信号を取付台駆動機構に送り取付台を前進させる 。次に制御部は、圧力検出器から送られて来る検出圧力がキャップとマグネット の隙間ゼロのときの基準圧力に復帰したら最適な押付力が加えられていると判断 し、移動停止信号を取付台駆動機構に送り、取付台を停止させる。 In the surface contamination wiping device of the present invention, when the cap with the filter paper is about to come off, a gap is created between the cap and the magnet, and air is introduced from this gap to increase the pressure. The rising pressure is detected by the pressure detector and transmitted to the control unit. The control unit determines that a gap has occurred, and sends a signal for retracting the mount to the mount drive mechanism, and the drive mechanism retracts the mount to reduce the pressing force. As a result, the excessive rubbing force acting on the filter paper disappears, and the cap comes into close contact with the magnet due to the magnetic force of the magnet to eliminate the gap. As a result, the inflow of air stops and the pressure drops. With this pressure drop, the control unit judges that the clearance is zero and sends a forward signal to the mounting base drive mechanism to move the mounting base forward. Next, if the detected pressure sent from the pressure detector returns to the reference pressure when the gap between the cap and magnet is zero, the control unit determines that the optimum pressing force is being applied, and sends a movement stop signal to the mounting base. Send to the drive mechanism and stop the mount.

【0009】[0009]

【実施例】【Example】

以下、図面に示した実施例に基いて本考案を詳細に説明する。 Hereinafter, the present invention will be described in detail with reference to the embodiments shown in the drawings.

【0010】 図1に本考案一実施例の表面汚染拭取装置を示す。図1において、ろ紙1は接 着剤等でキャップ2に貼付けられている。キャップ2は、ヘッド4の凹字状部に 取着されたリング状のマグネット3の磁力により保持されている。ヘッド4は、 その支持軸を取付台6に摺動可能に保持され、ヘッドの凹字状部と取付台6の間 に介装されたばね5の撓みに応じた押付力を加えられる。FIG. 1 shows a surface contamination wiping device according to an embodiment of the present invention. In FIG. 1, the filter paper 1 is attached to the cap 2 with an adhesive or the like. The cap 2 is held by the magnetic force of a ring-shaped magnet 3 attached to the concave portion of the head 4. The support shaft of the head 4 is slidably held by the mounting base 6, and a pressing force corresponding to the bending of the spring 5 interposed between the concave portion of the head and the mounting base 6 is applied.

【0011】 取付台6は、取付台駆動機構14によりヘッド4の支持軸の軸線方向に前進・ 後退可能となっている。ヘッド4の支持軸の中心貫通穴には押し棒7が内嵌して その先端面まで延在しており、キャップ2をヘッド4から取外す際に押し込んで キャップ2をマグネット3から離すようにする。押し棒7にはその中心に貫通穴 7aが明けられている。The mounting base 6 can be moved forward and backward in the axial direction of the support shaft of the head 4 by the mounting base drive mechanism 14. A push rod 7 is fitted in the center through hole of the support shaft of the head 4 and extends to the tip surface thereof. When the cap 2 is detached from the head 4, the push rod 7 is pushed to separate the cap 2 from the magnet 3. . The push rod 7 has a through hole 7a at its center.

【0012】 吸引ポンプ11により吸引されるホース10が、継手9を介して押し棒7の外 方端で貫通穴7aに接続されており、キャップ2とヘッド4の凹字状部の間の空 間を負圧に保つ。このホース10には圧力検出器12が設けられており、その検 出圧力信号は制御部13に送られる。The hose 10 sucked by the suction pump 11 is connected to the through hole 7 a at the outer end of the push rod 7 via the joint 9, and the space between the cap 2 and the concave portion of the head 4 is closed. Keep a negative pressure in the space. The hose 10 is provided with a pressure detector 12, and the detected pressure signal is sent to the controller 13.

【0013】 制御部13は、キャップ2とマグネット3とが隙間ゼロで吸着していて最適な 押付力が加えられているときの圧力検出器12の検出圧力(負圧)を基準圧力と して記憶しており、過大押付力が発生すると、キャップ2とマグネット3の間に 隙間が生じ空気が流入して圧力が上がり、このときの圧力検出器12の検出圧力 を受けた制御部13は、基準圧力との比較から隙間発生と判断して取付台後退信 号を取付台駆動機構14に送る。The control unit 13 uses the detection pressure (negative pressure) of the pressure detector 12 when the cap 2 and the magnet 3 are adsorbed with a zero gap and an optimum pressing force is applied as a reference pressure. If the excessive pressing force is generated, a gap is created between the cap 2 and the magnet 3, air flows in, and the pressure rises. The control unit 13 that receives the pressure detected by the pressure detector 12 at this time is Based on the comparison with the reference pressure, it is determined that a gap has occurred, and a mount back signal is sent to the mount drive mechanism 14.

【0014】 取付台駆動機構14が取付台6を後退させて押付力を減少させると、ろ紙1に 作用する過大な摩擦力が消え、キャップ2は磁力によりマグネット3に密着し隙 間が無くなる。この結果、空気の流入が止まり圧力が下がって行く。この圧力の 変化状況を圧力検出器12から受けて制御部13は、隙間ゼロの正常状態に復帰 したと判断し、取付台前進信号を取付台駆動機構14に送って取付台を前進させ 、圧力検出器12から送られて来る検出圧力が記憶している基準圧力に復帰した ら移動停止信号を取付台駆動機構14に送り、取付台6を停止させる。When the mounting base driving mechanism 14 retracts the mounting base 6 to reduce the pressing force, the excessive frictional force acting on the filter paper 1 disappears, and the cap 2 comes into close contact with the magnet 3 due to the magnetic force, so that there is no space. As a result, the inflow of air is stopped and the pressure drops. Upon receiving this change in pressure from the pressure detector 12, the control unit 13 determines that the normal state with zero clearance has been restored, and sends a mount advance signal to the mount drive mechanism 14 to move the mount forward, When the detected pressure sent from the detector 12 returns to the stored reference pressure, a movement stop signal is sent to the mounting base drive mechanism 14 to stop the mounting base 6.

【0015】 上記のように構成された本考案一実施例の表面汚染拭取装置においては、回転 している円筒容器8に対しろ紙1が最適の押付力で押付けられ、ろ紙1が貼付け られているキャップ2が隙間無くヘッド4のマグネット3に吸着保持されている 正常状態では、圧力検出器12の検出圧力は、所定の基準圧力を示している。In the surface contamination wiping device of the embodiment of the present invention configured as described above, the filter paper 1 is pressed against the rotating cylindrical container 8 with the optimum pressing force, and the filter paper 1 is attached. In a normal state, the cap 2 present is adsorbed and held by the magnet 3 of the head 4 without a gap. In a normal state, the pressure detected by the pressure detector 12 indicates a predetermined reference pressure.

【0016】 いま、円筒容器8の凸起に乗り上げたために過大な押付力が発生し、ろ紙1の 拭取面の摩擦力の急増のためキャップ2とマグネット3の間に隙間が発生すると 、この隙間から空気が流入してキャップ2とヘッド4の凹字状部の間の空間の圧 力が上がる。この上った圧力は圧力検出器12で検出されこの圧力信号が制御部 13に送られる。Now, when the cylindrical container 8 rides on the protrusion, an excessive pressing force is generated, and a gap is generated between the cap 2 and the magnet 3 due to a rapid increase in the frictional force of the wiping surface of the filter paper 1. Air flows in through the gap to increase the pressure in the space between the cap 2 and the concave portion of the head 4. The rising pressure is detected by the pressure detector 12, and this pressure signal is sent to the control unit 13.

【0017】 制御部13は、基準圧力との比較から隙間発生と判断して取付台後退信号を取 付台駆動機構14に送る。取付台駆動機構14が取付台6を後退させて押付力を 減少させると、ろ紙1に作用する過大な摩擦力が消え、キャップ2は磁力により マグネット3に密着し隙間が無くなる。この結果、空気の流入が止まり圧力が下 がって行く。The control unit 13 determines from the comparison with the reference pressure that a gap has occurred, and sends a mounting base retreat signal to the mounting base drive mechanism 14. When the mounting base drive mechanism 14 retracts the mounting base 6 to reduce the pressing force, the excessive frictional force acting on the filter paper 1 disappears, and the cap 2 comes into close contact with the magnet 3 due to the magnetic force to eliminate the gap. As a result, the inflow of air stops and the pressure drops.

【0018】 この圧力の変化状況を圧力検出器12から受けて制御部13は、隙間ゼロの正 常状態に復帰したと判断し、取付台前進信号を取付台駆動機構14に送る。取付 台駆動機構14により取付台6が前進するに従って押付力が増し、キャップ2と マグネット3の接触が密になって行くため、空気のリークが減少し圧力が下がっ て基準圧力に復帰する。制御部13は、圧力検出器12から送られて来る圧力信 号が基準圧力に復帰したことにより最適な押付力が加えられていることを知り、 移動停止信号を取付台駆動機構14に送り、取付台6を停止させる。これで、ろ 紙1は最適な押付力で円筒容器8の表面の拭取りを続けることができる。Upon receiving the change in pressure from the pressure detector 12, the control unit 13 determines that the normal state with zero clearance has been restored, and sends a mount advance signal to the mount drive mechanism 14. As the mounting base 6 is moved forward by the mounting base drive mechanism 14, the pressing force increases, and the contact between the cap 2 and the magnet 3 becomes closer, so that the air leak decreases and the pressure lowers and returns to the reference pressure. The control unit 13 knows that the pressure signal sent from the pressure detector 12 has returned to the reference pressure and the optimum pressing force is applied, and sends a movement stop signal to the mounting base drive mechanism 14, Stop the mounting base 6. With this, the filter paper 1 can continue to wipe the surface of the cylindrical container 8 with an optimum pressing force.

【0019】 本考案一実施例の表面汚染拭取装置によれば、ろ紙付きキャップの脱落を防止 できるとともに、最適な押付力をろ紙に加えることができる。これにより、精度 の良い拭取りを行なうことができる。また、脱落により発生していた回収,ろ紙 付きキャップの取付等の作業が無くなることで、作業員の放射線被曝低減が可能 となる。According to the surface contamination wiping device of the embodiment of the present invention, it is possible to prevent the cap with filter paper from coming off and to apply an optimum pressing force to the filter paper. As a result, accurate wiping can be performed. In addition, by eliminating the work such as the collection and the attachment of the cap with filter paper, which had occurred due to falling off, it is possible to reduce the radiation exposure of workers.

【0020】[0020]

【考案の効果】[Effect of device]

以上詳述したように本考案によれば、吸引ポンプで吸引されるホースをヘッド の押し棒に接続してろ紙付きのキャップとヘッドの凹字状部の間の空間を負圧に し、前記ホースに設けた圧力検出器により前記キャップとマグネットとの間の隙 間の発生を検知したら取付台の後退により押付力を減少させて隙間をゼロに戻す ようにし、隙間がゼロで最適の押付力が加えられた状態での負圧が圧力検出器で 得られるように制御部によって取付台の位置を取付台駆動機構を介して制御する ことを特徴とする表面汚染拭取装置を実現したことにより、ろ紙付きキャップの 脱落を防止できるとともに、最適な押付力をろ紙に加えることができる。これに より、精度の良い拭取りを行なうことができる。また、脱落により発生していた 回収,ろ紙付きキャップの取付等の作業が無くなることで、作業員の放射線被曝 低減が可能となる。 As described above in detail, according to the present invention, the hose sucked by the suction pump is connected to the push rod of the head to make the space between the cap with the filter paper and the concave portion of the head negative, and When the pressure detector installed on the hose detects the occurrence of the gap between the cap and magnet, the mounting base is retracted to reduce the pressing force and return the gap to zero. By realizing the surface contamination wiping device, the control unit controls the position of the mounting base via the mounting base drive mechanism so that the negative pressure under the applied pressure can be obtained by the pressure detector. , The cap with filter paper can be prevented from falling off, and the optimum pressing force can be applied to the filter paper. As a result, accurate wiping can be performed. In addition, by eliminating the work such as the collection and the attachment of the filter paper cap that were caused by the falling, it is possible to reduce the radiation exposure of workers.

【図面の簡単な説明】[Brief description of drawings]

【図1】図1は本考案一実施例の表面汚染拭取装置の構
成を示す概略図である。
FIG. 1 is a schematic view showing a configuration of a surface contamination wiping device according to an embodiment of the present invention.

【図2】図2は従来技術の表面汚染拭取装置の構成を示
す概略図である。
FIG. 2 is a schematic view showing a configuration of a conventional surface contamination wiping device.

【符号の説明】[Explanation of symbols]

1…ろ紙 2…キャップ 3…マグネット 4…ヘッド 5…ばね 6…取付台 7…押し棒 8…円筒容器 10…ホース 11…吸引ポンプ 12…圧力検出器 13…制御部 14…取付台駆動機構 1 ... Filter paper 2 ... Cap 3 ... Magnet 4 ... Head 5 ... Spring 6 ... Mounting base 7 ... Push rod 8 ... Cylindrical container 10 ... Hose 11 ... Suction pump 12 ... Pressure detector 13 ... Control part 14 ... Mounting base drive mechanism

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】 支持軸を取付台に摺動可能に保持され支
持軸先端の凹字状部内にリング状のマグネットが取着さ
れたヘッドと、このヘッドの凹字状部と前記取付台の間
に介装され撓みに応じた押付力をヘッドに加えるばね
と、前記ヘッドのマグネットに背面を吸着されて保持さ
れた皿状のキャップと、このキャップの前面に貼付けら
れたろ紙と、前記ヘッドの支持軸の中心貫通穴に摺動可
能に内嵌され中心貫通穴を有する押し棒とを具備し、放
射性廃棄物を封入した円筒容器を回転させ前記ろ紙を容
器表面に押付けて表面汚染をろ紙で拭取る装置におい
て、前記取付台をヘッドの支持軸の軸線方向に前進・後
退させる取付台駆動機構と、一端を吸引ポンプに接続さ
れ他端が前記ヘッドの押し棒の外方端に接続されたホー
スと、このホースに接続して設けられホース内の負圧を
検出する圧力検出器と、この圧力検出器の検出圧力信号
を受け予め設定されている基準圧力すなわち前記キャッ
プとマグネットの間の隙間がゼロで最適の押付力が加え
られた状態での負圧と比較し検出圧力が基準圧力より上
っているとき前記隙間発生と判断し取付台後退信号を前
記取付台駆動機構に送って取付台を後退させ、次に検出
圧力が下降する状態に変ったことにより前記隙間がゼロ
に復帰したと判断し取付台前進信号を前記取付台駆動機
構に送って取付台を前進させ、検出圧力が前記基準圧力
に復帰したとき最適な押付力が加えられていると判断し
て停止信号を取付台駆動機構に送り取付台を停止させる
制御部とを具備したことを特徴とする表面汚染拭取装
置。
1. A head in which a support shaft is slidably held by a mounting base and a ring-shaped magnet is attached in a recessed portion at the tip of the support shaft, and the recessed portion of the head and the mounting base. A spring interposed between the head and a pressing force corresponding to the flexure, a dish-shaped cap whose back surface is attracted and held by a magnet of the head, a filter paper attached to the front surface of the cap, and the head. A push rod having a center through hole slidably fitted in the center through hole of the support shaft of the above, and rotating a cylindrical container containing radioactive waste to press the filter paper against the container surface to remove surface contamination. In the device for wiping with, a mounting base drive mechanism for advancing / retracting the mounting base in the axial direction of the support shaft of the head, one end connected to the suction pump, and the other end connected to the outer end of the push rod of the head. Connected to this hose The pressure detector that is installed to detect the negative pressure in the hose, and the reference pressure that is set in advance by receiving the pressure signal detected by this pressure detector, that is, the gap between the cap and the magnet is zero, and the optimum pressing force. When the detected pressure is higher than the reference pressure in comparison with the negative pressure, it is judged that the clearance has occurred and a mounting base retreat signal is sent to the mounting base drive mechanism to retract the mounting base, and then When it is determined that the clearance has returned to zero because the detected pressure has changed to a state where the detected pressure has dropped, and a mount advance signal is sent to the mount drive mechanism to advance the mount, and the detected pressure returns to the reference pressure. A surface contamination wiping device, comprising: a control unit that determines that an optimum pressing force is applied and sends a stop signal to a mounting base drive mechanism to stop the mounting base.
JP3832193U 1993-07-13 1993-07-13 Surface contamination wiper Pending JPH078788U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3832193U JPH078788U (en) 1993-07-13 1993-07-13 Surface contamination wiper

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3832193U JPH078788U (en) 1993-07-13 1993-07-13 Surface contamination wiper

Publications (1)

Publication Number Publication Date
JPH078788U true JPH078788U (en) 1995-02-07

Family

ID=12522027

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3832193U Pending JPH078788U (en) 1993-07-13 1993-07-13 Surface contamination wiper

Country Status (1)

Country Link
JP (1) JPH078788U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007051928A (en) * 2005-08-18 2007-03-01 Toshiba Corp Contamination wiping device, decontamination method, and contamination inspection method
JP2014014784A (en) * 2012-07-10 2014-01-30 Tokyo Electron Ltd Nozzle cleaning device, application processing device, nozzle cleaning method, application processing method, program, and computer storage medium

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007051928A (en) * 2005-08-18 2007-03-01 Toshiba Corp Contamination wiping device, decontamination method, and contamination inspection method
JP4643389B2 (en) * 2005-08-18 2011-03-02 株式会社東芝 Contamination wiper, decontamination method and contamination inspection method
JP2014014784A (en) * 2012-07-10 2014-01-30 Tokyo Electron Ltd Nozzle cleaning device, application processing device, nozzle cleaning method, application processing method, program, and computer storage medium

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