JPH0785501A - Optical recording medium - Google Patents

Optical recording medium

Info

Publication number
JPH0785501A
JPH0785501A JP5227523A JP22752393A JPH0785501A JP H0785501 A JPH0785501 A JP H0785501A JP 5227523 A JP5227523 A JP 5227523A JP 22752393 A JP22752393 A JP 22752393A JP H0785501 A JPH0785501 A JP H0785501A
Authority
JP
Japan
Prior art keywords
substrate
protective layer
organic protective
optical recording
recording medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5227523A
Other languages
Japanese (ja)
Inventor
Toshifumi Kawano
敏史 川野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Priority to JP5227523A priority Critical patent/JPH0785501A/en
Publication of JPH0785501A publication Critical patent/JPH0785501A/en
Pending legal-status Critical Current

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  • Optical Record Carriers And Manufacture Thereof (AREA)

Abstract

PURPOSE:To allow an org. protective layer to adhere to a synthetic resin substrate and to enhance the durability of a medium by disposing a magnetic film and the org. protective layer coating the magnetic film on the substrate and heating a part of the substrate near the edge with ultrasonic waves. CONSTITUTION:An org. protective layer coating a magnetic film disposed on a substrate is melt-stuck to the substrate by heating the entire circumferential edge of the substrate with ultrasonic waves to obtain the objective optical recording medium. The adhesion of the protective layer to the substrate can be considerably enhanced and the penetration of moisture and gas can be prevented. The melt sticking is carried out by allowing a horn having about 0.1-1mm width and a shape corresponding to the circumference of the substrate to adhere to the protective layer and applying ultrasonic waves.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は光学的記録再生が可能な
光記録媒体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical recording medium capable of optical recording and reproduction.

【0002】[0002]

【従来の技術】光記録媒体は大容量の可搬性記録媒体と
して、コンピューター用の外部記憶装置等への利用が広
まりつつある。光記録媒体には大きく分けて、情報が基
板にピットとして書き込まれているROMタイプ、一回
だけユーザーが書き込み可能なライトワンスタイプ、ユ
ーザーが情報の記録消去を自由にできるリライタブルタ
イプの3種類に分けられる。
2. Description of the Related Art Optical recording media are widely used as external storage devices for computers as large-capacity portable recording media. Optical recording media can be broadly classified into three types: ROM type in which information is written as pits on the substrate, write-once type in which the user can write only once, and rewritable type in which the user can freely record and erase information. Be divided.

【0003】媒体の基板には通常射出成形されたポリカ
ーボネート樹脂が用いられ、この上にスパッタリング等
を用いて反射層、記録層等の薄膜を形成する。いずれの
タイプにおいても、媒体の信頼性確保が重要であり、特
に書き込み可能なタイプにおいては記録膜の腐食を防止
するのが大きな課題となる。このため、穴開け型のライ
トワンス媒体に用いられているエアーサンドイッチタイ
プを除いて、記録膜が紫外線、熱、温度等で硬化する硬
化性の樹脂等からなる有機物の保護層で覆われているの
が普通である。
An injection molded polycarbonate resin is usually used for the substrate of the medium, and thin films such as a reflective layer and a recording layer are formed on the polycarbonate resin by sputtering or the like. In any of the types, it is important to ensure the reliability of the medium, and particularly in the writable type, preventing the corrosion of the recording film is a major issue. For this reason, except for the air sandwich type used for the perforation type write-once medium, the recording film is covered with an organic protective layer made of a curable resin that is cured by ultraviolet rays, heat, temperature, etc. Is normal.

【0004】ここで記録膜とはスパッタリング等により
作製される無機薄膜の記録層、保護層、反射層等を全て
含めている。有機物保護層の塗布には、通常スピンコー
ト法が多く用いられる。保護層の膜厚は数μmであり、
塗布後、紫外線硬化、熱硬化、湿度硬化等により硬化さ
せる。
Here, the recording film includes all recording layers, protective layers, reflective layers, and the like, which are inorganic thin films formed by sputtering or the like. Spin coating is often used for coating the organic protective layer. The thickness of the protective layer is several μm,
After coating, it is cured by UV curing, heat curing, humidity curing, or the like.

【0005】有機物保護層による保護効果を充分に得る
ためには、保護層と記録膜(基板)との間に強い密着性
をもたせ、水分やガスが侵入しないことが重要である。
このため、基板の内周縁部と外周縁部を記録膜を設けて
いない領域とし、この部分において有機物保護層と基板
とが直接接するようになし、有機物保護層の成分により
基板を若干化学的に溶解すること等によって基板と有機
物保護層の密着性を確保していた。
In order to sufficiently obtain the protective effect of the organic protective layer, it is important that the protective layer and the recording film (substrate) have a strong adhesive property and that moisture and gas do not enter.
Therefore, the inner peripheral edge portion and the outer peripheral edge portion of the substrate are defined as regions where the recording film is not provided, and the organic protective layer and the substrate are directly contacted with each other at this portion, and the substrate is slightly chemically changed by the components of the organic protective layer. The adhesion between the substrate and the organic protective layer was ensured by dissolution or the like.

【0006】[0006]

【発明が解決しようとする課題】しかし、こういった化
学的な密着法では密着力が弱く、高温高湿下においてし
ばしば記録膜の腐食を生じていた。また、基板と有機物
保護層の密着性は各々の化学的な活性によって変化する
ため、基板表面の吸水状態、酸化状態あるいは保護層側
の化学的状態によって密着力が変化し、高信頼性の媒体
を安定して生産を行うには非常に厳密な管理を行う必要
があった。
However, in such a chemical adhesion method, the adhesion is weak and the recording film is often corroded under high temperature and high humidity. In addition, since the adhesion between the substrate and the organic protective layer changes depending on the chemical activity of each, the adhesive force changes depending on the water absorption state of the substrate surface, the oxidation state, or the chemical state of the protective layer side. It was necessary to carry out very strict control in order to carry out stable production.

【0007】さらに、近年ポリカーボネート基板の複屈
折が再生信号に与える影響が問題になっており、これを
解決するために非晶質ポリオレフィン系の基板が検討さ
れている。この場合、非晶質ポリオレフィンの本来の性
質である不活性であることが有機物保護層との密着性を
非常に弱くし、このため媒体の信頼性確保が困難であっ
た。
Further, in recent years, the influence of the birefringence of a polycarbonate substrate on a reproduced signal has become a problem, and in order to solve this problem, an amorphous polyolefin-based substrate has been studied. In this case, the innate nature of the amorphous polyolefin, which is inactive, makes the adhesion to the organic protective layer extremely weak, which makes it difficult to secure the reliability of the medium.

【0008】[0008]

【課題を解決するための手段】本発明は超音波加熱を用
いることにより、基板と有機保護層の密着性を向上し、
媒体の高い信頼性を得るものである。本発明の要旨は、
合成樹脂基板上に、記録膜及び記録膜を覆う有機物保護
層を設けてなり、基板の端部近傍を超音波加熱処理する
ことにより、基板と有機物保護層とを密着させたことを
特徴とする光記録媒体に存する。
The present invention improves the adhesion between a substrate and an organic protective layer by using ultrasonic heating,
High reliability of the medium is obtained. The gist of the present invention is
A recording film and an organic protective layer covering the recording film are provided on a synthetic resin substrate, and the substrate and the organic protective layer are brought into close contact with each other by subjecting the vicinity of the edge of the substrate to ultrasonic heat treatment. It exists in an optical recording medium.

【0009】以下、本発明をさらに詳しく説明する。本
発明に用いられる基板としては、従来から光記録媒体に
広く用いられているポリカーボネート樹脂、ポリメタク
リレート樹脂等を用いることが可能である。特に非晶質
ポリオレフィン樹脂に対して著しい効果を有する。非晶
質ポリオレフィン樹脂としては、ノルボルネン系、ジシ
クロペンタジエン系、水添ポリスチレン等が挙げられ、
例えばゼオネックス(商品名)(日本ゼオン(株)
製)、APO(商品名)(三井石油化学(株)製)、A
RTON(商品名)(日本合成ゴム(株)製)等が挙げ
られる。
The present invention will be described in more detail below. As the substrate used in the present invention, it is possible to use a polycarbonate resin, a polymethacrylate resin or the like which has been widely used in optical recording media. In particular, it has a remarkable effect on an amorphous polyolefin resin. Examples of the amorphous polyolefin resin include norbornene-based, dicyclopentadiene-based, hydrogenated polystyrene and the like,
For example, ZEONEX (trade name) (Nippon Zeon Co., Ltd.)
Made), APO (trade name) (Mitsui Petrochemical Co., Ltd.), A
RTON (trade name) (manufactured by Japan Synthetic Rubber Co., Ltd.) and the like can be mentioned.

【0010】非晶質ポリオレフィン樹脂は、有機保護層
との密着性が小さく、このための記録膜の腐食が大きな
問題であったが、超音波融着によって、有機保護層との
密着性を大きく向上できる。さらに超音波融着の問題点
として、融着部分の周辺に歪を生じて光弾性効果により
複屈折が増大することが考えられるが、この点、非晶質
ポリオレフィン樹脂は、樹脂自体の固有複屈折が小さい
ため、光弾性係数が小さく、複屈折を生じ難い。
Amorphous polyolefin resins have low adhesion to the organic protective layer, and the corrosion of the recording film for this purpose has been a major problem. However, ultrasonic fusion causes great adhesion to the organic protective layer. Can be improved. Further, as a problem of ultrasonic fusion, it is considered that strain is generated around the fusion portion and birefringence is increased by the photoelastic effect. Since the refraction is small, the photoelastic coefficient is small and birefringence is unlikely to occur.

【0011】非晶質ポリオレフィン基板と超音波溶着の
組合せは、低複屈折、低吸水性、高信頼性の全てを満足
できるという点で非常に好ましい。しかし、もちろん非
晶質ポリオレフィン樹脂以外に用いても信頼性向上の効
果が得られる。基板は、樹脂をピット、溝等を含んだ型
(スタンパー)に対して射出成形することによって作製
することができる。射出成形以外の成形法を用いること
も可能である。
The combination of an amorphous polyolefin substrate and ultrasonic welding is very preferable in that it can satisfy all of low birefringence, low water absorption and high reliability. However, as a matter of course, the effect of improving the reliability can be obtained even when it is used other than the amorphous polyolefin resin. The substrate can be manufactured by injection molding a resin into a mold (stamper) including pits, grooves and the like. It is also possible to use molding methods other than injection molding.

【0012】基板上には、記録膜を設ける。記録膜は、
例えば光磁気記録媒体であれば誘電体による保護層、希
土類金属と遷移金属の合金からなる磁性層、誘電体によ
る断熱層、高反射率金属からなる反射層等を通常スパッ
タリング蒸着により設ける。層構成として、反射層を設
けないもの、磁性層を多層にしたもの等も用いられる
が、本発明の効果に違いはない。
A recording film is provided on the substrate. The recording film is
For example, in the case of a magneto-optical recording medium, a protective layer made of a dielectric material, a magnetic layer made of an alloy of a rare earth metal and a transition metal, a heat insulating layer made of a dielectric material, a reflective layer made of a metal having a high reflectance, and the like are usually provided by sputtering deposition. As the layer structure, a structure in which no reflective layer is provided, a structure in which a magnetic layer is formed in multiple layers, or the like may be used, but the effect of the present invention is not different.

【0013】記録膜の作製方法としてスパッタリングの
他に電子ビーム蒸着、CVD等も挙げられる。光磁気記
録媒体以外にも相変化媒体、有機色素媒体を用いること
もできる。また、基板のピットに情報が入った再生専用
の媒体であっても、反射層金属の保護のために本発明を
用いることが可能である。
As a method for producing the recording film, electron beam evaporation, CVD and the like can be cited in addition to sputtering. Besides the magneto-optical recording medium, a phase change medium or an organic dye medium may be used. Further, the present invention can be used to protect the metal of the reflective layer even in the case of a read-only medium in which the pits of the substrate contain information.

【0014】この場合、記録膜は反射層の金属を指す。
これらの中でも、磁性層が非常に腐食しやすい光磁気記
録媒体に用いて多大な効果を得ることが可能である。記
録膜の厚さは、通常10nm〜1000nm程度であ
る。記録膜が基板全体に縁部まで設けられている場合、
超音波加熱処理を行った際に記録膜は、基板の表面が溶
融するに従って島状に分断され、基板と有機保護層が直
接接した状態となるので保護効果は得られる。
In this case, the recording film means the metal of the reflective layer.
Among them, it is possible to obtain a great effect by using the magneto-optical recording medium in which the magnetic layer is very easily corroded. The thickness of the recording film is usually about 10 nm to 1000 nm. When the recording film is provided all over the substrate to the edge,
When the ultrasonic heat treatment is performed, the recording film is divided into islands as the surface of the substrate melts, and the substrate and the organic protective layer are in direct contact with each other, so that a protective effect is obtained.

【0015】このような構造でも良いが、島状に分断さ
れた記録膜伝いに腐食が生じる可能性があるので、記録
膜を設ける際に内周及び外周の両方あるいはいずれか一
方に記録膜が存在しない領域を形成し、この部分を超音
波加熱処理することが好ましい。特に、基板の内周及び
外周の両方に記録膜の存在しない領域があることが好ま
しい。
Although such a structure may be employed, since corrosion may occur along the recording film divided into islands, when the recording film is provided, the recording film may be formed on the inner circumference and / or the outer circumference. It is preferable to form a nonexistent region and subject this part to ultrasonic heat treatment. In particular, it is preferable that there is a region where the recording film does not exist on both the inner circumference and the outer circumference of the substrate.

【0016】記録膜の存在しない領域は、作製時に基板
にマスクをかぶせておくことにより得られる。記録膜の
作製後、記録膜を完全に覆う有機保護層を設ける。有機
保護層は、例えばエポキシ系、ウレタン系、アクリル系
等の樹脂からなり、通常スピンコーティングで塗布され
るが、その他の方法を用いて塗布してもかまわない。
The region where the recording film does not exist can be obtained by covering the substrate with a mask at the time of manufacturing. After the production of the recording film, an organic protective layer which completely covers the recording film is provided. The organic protective layer is made of, for example, an epoxy-based resin, a urethane-based resin, an acrylic resin, or the like and is usually applied by spin coating, but it may be applied by another method.

【0017】有機保護層は、例えば紫外線硬化樹脂、熱
硬化樹脂等であり、塗布後、硬化させることが好まし
い。有機保護層の膜厚が厚すぎる場合、基板に歪を生じ
たり、硬化が内部で不十分となる等の問題が生じるた
め、50μm以下とすることが好ましい。有機保護膜の
特に好ましい膜厚は、1μm以上20μm以下である。
The organic protective layer is, for example, an ultraviolet curable resin, a thermosetting resin or the like, and it is preferable to cure the organic protective layer after coating. If the film thickness of the organic protective layer is too large, problems such as distortion of the substrate and insufficient curing inside occur. Therefore, the thickness is preferably 50 μm or less. The particularly preferable film thickness of the organic protective film is 1 μm or more and 20 μm or less.

【0018】有機保護層と基板との間を超音波加熱処理
して融着させるが、超音波加熱処理は基板の縁部の全周
に渡って行う。これによって、有機保護層と基板の密着
性を飛躍的に向上することができ、水分やガスの侵入を
防ぐことが可能となる。超音波融着を行うには、例え
ば、幅0.1〜1mm程度の基板の円周に合った形状の
ホーンを有機保護層に密着させて超音波を印加すること
によって行えば良い。
The organic protective layer and the substrate are ultrasonically heat-treated and fused, and the ultrasonic heat-treatment is performed over the entire circumference of the edge portion of the substrate. This makes it possible to dramatically improve the adhesion between the organic protective layer and the substrate and prevent the ingress of water and gas. To perform ultrasonic fusion, for example, a horn having a width of about 0.1 to 1 mm and having a shape matching the circumference of the substrate may be brought into close contact with the organic protective layer and ultrasonic waves may be applied.

【0019】この場合、有機保護層の膜厚が薄いため、
ほぼホーンの形状通り融着可能である。融着部分は多少
歪が生じるため、記録領域から0.1mm以上離れてい
ることが好ましい。また、有機保護層を完全に溶融して
破壊しないように超音波のパワーを調整することも肝要
である。
In this case, since the organic protective layer is thin,
It can be fused almost in the shape of a horn. Since the fused portion is somewhat distorted, it is preferable to be separated by 0.1 mm or more from the recording area. It is also important to adjust the power of ultrasonic waves so that the organic protective layer is not completely melted and destroyed.

【0020】超音波融着は基板側から超音波を印加する
ことも可能であるが、基板は通常1mm程度の厚さを持
つから、この場合は基板の融着箇所に超音波を集中する
ための幅0.1〜1mm程度のリムを形成しておくこと
が好ましい。この場合、使用するホーンの幅は若干広く
することが可能である。超音波融着は異質な物質であっ
てもある程度密着するが、当然同一の物質であれば互い
が混ざり合うことによってより密着が強くなる。
In ultrasonic fusing, it is possible to apply ultrasonic waves from the substrate side, but since the substrate usually has a thickness of about 1 mm, in this case the ultrasonic waves are concentrated at the fusing point of the substrate. It is preferable to form a rim having a width of about 0.1 to 1 mm. In this case, the width of the horn used can be made slightly wider. Ultrasonic fusion adheres to a certain extent even if they are different substances, but naturally, if they are the same substance, the adhesion becomes stronger by mixing with each other.

【0021】従って、融着の際に基板と同種の材質のシ
ートを有機保護層上に設け、シートの上から超音波を印
加することにより有機保護層もろともにシートを基板に
超音波融着することも好ましい形態である。シートの厚
さは10〜200μm程度が好ましい。従来より、基板
にハブを超音波融着する技術は知られている。この場
合、ハブと基板を直接融着するのであるが、有機保護層
をハブ融着部まで形成して、ハブの融着と内周の有機保
護膜の融着を同時に行うこともできる。
Therefore, at the time of fusion bonding, a sheet of the same material as the substrate is provided on the organic protective layer, and ultrasonic waves are applied from above the sheet to ultrasonically fuse the sheet together with the organic protective layer to the substrate. That is also a preferable form. The thickness of the sheet is preferably about 10 to 200 μm. Conventionally, a technique of ultrasonically welding a hub to a substrate is known. In this case, the hub and the substrate are directly fused, but it is also possible to form the organic protective layer up to the hub fusion portion and fuse the hub and the organic protective film on the inner periphery at the same time.

【0022】この際、ハブが傾くと記録再生に問題が生
じるため、有機保護層を均一な厚さに塗布することが肝
要である。有機保護層の超音加熱処理は内周、外周共に
行うことが好ましいが、どちらか片方だけを行うことも
可能である。また、超音加熱処理を行った光ディスクを
2枚対向させて貼合わせ、両面を使用する形態とするこ
とも可能である。
At this time, if the hub is tilted, a problem occurs in recording and reproduction, so it is important to apply the organic protective layer to a uniform thickness. The ultrasonic heat treatment of the organic protective layer is preferably performed on both the inner circumference and the outer circumference, but it is also possible to perform only one of them. Further, it is also possible to make two optical disks that have been subjected to ultrasonic heating face to face with each other and bond them, and use both sides.

【0023】[0023]

【実施例】以下、本発明を実施例を用いてより詳細に説
明する。 実施例1 基板として、ゼオネックス樹脂(商品名)(日本ゼオン
社製)よりなる厚さ1.2mm、直径86mmの円盤状
のものを用いた。記録トラックは半径22.6mmから
41mmまで設けられている。
EXAMPLES The present invention will be described in more detail below with reference to examples. Example 1 As a substrate, a disk-shaped substrate made of ZEONEX resin (trade name) (manufactured by Zeon Corporation) having a thickness of 1.2 mm and a diameter of 86 mm was used. The recording track has a radius of 22.6 mm to 41 mm.

【0024】この基板上にスパッタリングにより、酸化
Taよりなる80nmの保護層、TbFeCoよりなる
25nmの記録層、窒化Siよりなる30nmの保護
層、Alよりなる50nmの反射層を順次設けた。この
際、内周及び、外周にマスクを設け、半径41.5mm
より外側及び22mmより内側には記録膜が成膜されな
いようにした。
An 80 nm protective layer made of oxidized Ta, a 25 nm recording layer made of TbFeCo, a 30 nm protective layer made of Si nitride, and a 50 nm reflective layer made of Al were sequentially formed on this substrate by sputtering. At this time, a mask is provided on the inner and outer circumferences, and the radius is 41.5 mm.
No recording film was formed on the outer side and the inner side of 22 mm.

【0025】その後、スピンコートを用いて、有機保護
層としてアクリル系の紫外線硬化樹脂であるSD−17
(商品名)(大日本インキ製)を5μm塗布した。塗布
は半径20mmより外周の部分について行った。この
後、紫外線硬化装置に入れて硬化を行った。有機保護層
の上から半径21mmと半径42mmの幅0.2mmで
同心円状の2本の円周よりなるホーンを接触させ、周波
数20kHz、300Wの超音波を0.1秒発生するこ
とで有機保護層と基板の超音波融着を行った。
Thereafter, spin coating is used to form SD-17, which is an acrylic ultraviolet curing resin, as an organic protective layer.
(Trade name) (manufactured by Dainippon Ink and Chemicals, Inc.) was applied to 5 μm. The coating was performed on the outer peripheral portion with a radius of 20 mm. Then, it was put in an ultraviolet curing device and cured. Organic protection is performed by contacting a horn consisting of two concentric circles with a radius of 21 mm and a radius of 42 mm and a width of 0.2 mm from the top of the organic protective layer, and generating ultrasonic waves with a frequency of 20 kHz and 300 W for 0.1 seconds. Ultrasonic fusion of the layers and the substrate was performed.

【0026】得られた媒体を波長780nm、NA0.
55の評価機を用いて、線速5.7m/s、周波数3.
7MHzで記録領域の最内周、最外周のC/N比を測定
し、さらに温度85℃湿度85%RHの条件で2000
時間の加速試験を行い、その前後でのエラーレートの変
化を測定した。その結果を表1に示す。 実施例2 有機保護層までを実施例1と同様に作製し、その上に基
板と同一材料で内径20mm外径43mmの厚さ50μ
mのシートをのせ、実施例1同様に超音波融着を行っ
た。評価結果を表1に示す。
The obtained medium was measured at a wavelength of 780 nm, NA0.
55 evaluation machine, linear velocity 5.7 m / s, frequency 3.
Measure the innermost and outermost C / N ratios of the recording area at 7MHz, and then measure 2000 at 85 ° C and 85% RH.
A time acceleration test was performed, and the change in error rate before and after that was measured. The results are shown in Table 1. Example 2 Up to the organic protective layer was prepared in the same manner as in Example 1, and the same material as that of the substrate was formed thereon, and the inner diameter was 20 mm and the outer diameter was 43 mm.
The sheet of m was placed and ultrasonic fusion was performed in the same manner as in Example 1. The evaluation results are shown in Table 1.

【0027】実施例3 基板をポリカーボネートとして、後は実施例1と同様に
して作製した。評価結果を表1に示す。 実施例4 有機物保護層の塗布を半径9mmより外周とする以外は
実施例1と同様に作製し、ゼオネックス樹脂に金属を埋
め込んだハブを半径10mmの位置で有機物保護層と共
に超音波融着し、外周は実施例1と同様に超音波融着を
行った。評価結果を表1に示す。
Example 3 Polycarbonate was used as the substrate, and the same procedure as in Example 1 was followed. The evaluation results are shown in Table 1. Example 4 The same procedure as in Example 1 was carried out except that the outer periphery of the organic protective layer was applied from a radius of 9 mm, and a hub in which a metal was embedded in ZEONEX resin was ultrasonically fused with the organic protective layer at a radius of 10 mm, Ultrasonic welding was applied to the outer periphery in the same manner as in Example 1. The evaluation results are shown in Table 1.

【0028】比較例1 有機物保護層までを実施例1と同様に作製し、超音波融
着は行わなかった。評価結果を表1に示す。 比較例2 基板をポリカーボネートとして、後は比較例1と同様に
して作製した。評価結果を表1に示す。
Comparative Example 1 Up to the organic protective layer was prepared in the same manner as in Example 1, but ultrasonic fusion was not performed. The evaluation results are shown in Table 1. Comparative Example 2 A substrate was made of polycarbonate, and thereafter the same procedure as in Comparative Example 1 was performed. The evaluation results are shown in Table 1.

【0029】[0029]

【表1】 [Table 1]

【0030】C/N比はポリカーボネート基板で超音波
融着を行ったもの(実施例3)に対し、最外周で複屈折
の増加のため若干劣化したが、さほど大きなものではな
かった。他のものについては、超音波融着によるC/N
比の劣化は見られなかった。実施例では加速前後のエラ
ーレートの変化が殆ど見られなかったのに対し、比較例
ではエラーレートの増加があった。特に比較例1では劣
化が激しかった。
The C / N ratio was slightly deteriorated due to an increase in birefringence at the outermost circumference as compared with the case where ultrasonic welding was performed on a polycarbonate substrate (Example 3), but it was not so large. For others, C / N by ultrasonic welding
No deterioration of the ratio was observed. In the example, there was almost no change in the error rate before and after acceleration, whereas in the comparative example, the error rate increased. Particularly in Comparative Example 1, the deterioration was severe.

【0031】[0031]

【発明の効果】本発明を用いることにより、容易に基板
と保護膜の密着性を向上でき、媒体の耐久性を飛躍的に
高めることが可能である。
By using the present invention, the adhesion between the substrate and the protective film can be easily improved, and the durability of the medium can be dramatically improved.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 合成樹脂基板上に、記録膜及び記録膜を
覆う有機物保護層を設けてなり、基板の端部近傍を超音
波加熱処理することにより、基板と有機物保護層とを密
着させたことを特徴とする光記録媒体。
1. A synthetic resin substrate is provided with a recording film and an organic protective layer covering the recording film, and ultrasonic heat treatment is applied to the vicinity of the end of the substrate to bring the substrate and the organic protective layer into close contact with each other. An optical recording medium characterized by the above.
【請求項2】 超音波加熱処理により基板と有機物保護
層が密着した領域は、記録膜が存在せず、基板と有機物
保護層が直接接していることを特徴とする請求項1に記
載の光記録媒体。
2. The light according to claim 1, wherein a recording film does not exist in a region where the substrate and the organic protective layer are brought into close contact with each other by the ultrasonic heat treatment, and the substrate and the organic protective layer are in direct contact with each other. recoding media.
【請求項3】 基板が中央部に開孔を有する円盤状のも
のであり、内周縁部において、樹脂に金属が埋め込まれ
たハブが有機物保護層と共に基板に超音波加熱により融
着されていることを特徴とする請求項1または2に記載
の光記録媒体。
3. The substrate is a disc-shaped one having an opening in the center, and a hub in which a metal is embedded in a resin is fused to the substrate by ultrasonic heating at the inner peripheral edge together with the organic protective layer. The optical recording medium according to claim 1 or 2, characterized in that.
【請求項4】 有機物保護層上に基板と同種の材質から
なるシートを被せ、超音波加熱処理することにより一体
化したことを特徴とする請求項1ないし3のいずれかに
記載の光記録媒体。
4. The optical recording medium according to claim 1, wherein the organic protective layer is covered with a sheet made of the same material as that of the substrate and subjected to ultrasonic heat treatment for integration. .
【請求項5】 基板が非晶質ポリオレフィン樹脂からな
ることを特徴とする請求項1ないし3のいずれかに記載
の光記録媒体。
5. The optical recording medium according to claim 1, wherein the substrate is made of an amorphous polyolefin resin.
JP5227523A 1993-09-13 1993-09-13 Optical recording medium Pending JPH0785501A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5227523A JPH0785501A (en) 1993-09-13 1993-09-13 Optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5227523A JPH0785501A (en) 1993-09-13 1993-09-13 Optical recording medium

Publications (1)

Publication Number Publication Date
JPH0785501A true JPH0785501A (en) 1995-03-31

Family

ID=16862243

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5227523A Pending JPH0785501A (en) 1993-09-13 1993-09-13 Optical recording medium

Country Status (1)

Country Link
JP (1) JPH0785501A (en)

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