JPH076716A - X-ray measuring device - Google Patents
X-ray measuring deviceInfo
- Publication number
- JPH076716A JPH076716A JP14760893A JP14760893A JPH076716A JP H076716 A JPH076716 A JP H076716A JP 14760893 A JP14760893 A JP 14760893A JP 14760893 A JP14760893 A JP 14760893A JP H076716 A JPH076716 A JP H076716A
- Authority
- JP
- Japan
- Prior art keywords
- ray
- measured
- electron beam
- article
- point
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】この発明は電子線を陽極に照射し
てX線を発生させ、そのX線を絞るスリットを通して被
測定物に照射して、例えばそのX線反射率を測定するX
線測定装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention irradiates an anode with an electron beam to generate X-rays, irradiates an object to be measured through a slit for narrowing the X-rays, and measures X-ray reflectance, for example.
The present invention relates to a line measuring device.
【0002】[0002]
【従来の技術】X線を利用する測定装置において、X線
領域でも波長が長い軟X線領域の波長で用いる場合は、
X線の物質透過率が低く、減衰が大きいため、真空中で
測定を行う必要がある。従来のX線測定装置を図2に示
す、X線発生チャンバー11に電子線発生部12が連結
され、その電子線発生部12内の電子銃13から発生し
た電子線14がX線発生チャンバー11内の陽極15に
照射され、陽極15から陽極物質特有のX線16が発生
する。X線発生チャンバー11は連結管17を通じて測
定チャンバー18に連通されている。測定チャンバー1
8内に被測定物19が配されている。連結管17にゲー
トバルブ21が設けられ、X線発生チャンバー11と、
測定チャンバー18とをそれぞれ独立して、吸引口2
2,23からそれぞれ真空引きすることができるように
されている。2. Description of the Related Art In a measuring device using X-rays, when used in a soft X-ray region having a long wavelength even in the X-ray region,
Since the X-ray has a low material transmittance and a large attenuation, it is necessary to perform the measurement in vacuum. A conventional X-ray measuring apparatus is shown in FIG. 2. An electron beam generating unit 12 is connected to an X-ray generating chamber 11, and an electron beam 14 generated from an electron gun 13 in the electron beam generating unit 12 is an X-ray generating chamber 11. The anode 15 in the inside is irradiated, and X-rays 16 peculiar to the anode material are generated from the anode 15. The X-ray generation chamber 11 is connected to the measurement chamber 18 through a connecting pipe 17. Measuring chamber 1
An object to be measured 19 is arranged in the unit 8. A gate valve 21 is provided in the connecting pipe 17, and the X-ray generation chamber 11 and
Suction port 2 independent of measurement chamber 18
A vacuum can be drawn from each of 2, 23.
【0003】連結管17の途中にX線を絞るスリット2
4が設けられてあり、陽極15から発生したX線16の
うちスリット24を通過したものが被測定物19へ照射
される。つまり電子線14の陽極15に対する照射点と
スリット24とを結ぶ直線の延長線上の被測定物19と
の交点にX線16が入射することになる。被測定物19
に入射され、これにて反射されたX線16′がX線検出
器25で検出される。このようにして被測定物19のX
線反射率を測定することができる。このような測定は例
えばX線用の多層膜反射鏡の反射率の測定に利用され
る。反射率の測定以外において、X線を照射して同様の
測定が行われる。A slit 2 for narrowing X-rays in the middle of the connecting pipe 17.
4 is provided, and the X-rays 16 generated from the anode 15 that have passed through the slit 24 are irradiated to the object to be measured 19. That is, the X-ray 16 is incident on the intersection of the object to be measured 19 on the extension of the straight line connecting the slit 24 and the irradiation point of the electron beam 14 on the anode 15. DUT 19
The X-rays 16 ′ that have been incident on and are reflected thereby are detected by the X-ray detector 25. In this way, the X of the DUT 19 is measured.
The linear reflectance can be measured. Such a measurement is used, for example, for measuring the reflectance of a multilayer film reflecting mirror for X-rays. Other than the measurement of reflectance, the same measurement is performed by irradiating X-rays.
【0004】[0004]
【発明が解決しようとする課題】例えば120×120
mmというような比較的大きな反射鏡の反射率を測定す
る場合は、一点のみならず、その反射鏡の何点かの反射
率を測定する必要がある。その他の場合でも被測定物1
9の一点のみならず、何個所にX線を照射して測定する
場合があるか、このような場合従来においては被測定物
19の位置を移動して測定して行っており、その移動の
ために測定チャンバー18側の真空状態を解除した後、
被測定物19を移動し、その後、真空引きして、被測定
物19の別の個所にX線を照射していた。つまり、被測
定物19のX線照射点を変更するごとに、真空解除、被
測定物の移動、真空引きを行う必要があり、測定が厄介
であった。また、チャンバー18側の真空状態を解除せ
ず真空用モーターなどで被測定物を動かすこともできる
がこの場合装置が複雑かつ高価になってしまう。Problem to be Solved by the Invention For example, 120 × 120
When measuring the reflectance of a relatively large reflecting mirror such as mm, it is necessary to measure not only one point but the reflectance of several points of the reflecting mirror. DUT 1 in other cases
Not only one point but also the number of points where X-rays may be irradiated for measurement. In such a case, conventionally, the position of the object to be measured 19 is moved and measured. In order to release the vacuum on the measurement chamber 18 side,
The object to be measured 19 was moved, then evacuated, and another portion of the object to be measured 19 was irradiated with X-rays. That is, it is necessary to release the vacuum, move the object to be measured, and evacuate each time the X-ray irradiation point of the object to be measured 19 is changed, which makes the measurement difficult. Further, the object to be measured can be moved by a vacuum motor or the like without releasing the vacuum state on the chamber 18 side, but in this case the apparatus becomes complicated and expensive.
【0005】[0005]
【課題を解決するための手段】この発明によれば電子線
を偏向して陽極面上の照射位置を変更させることができ
る偏向手段が設けられる。According to the present invention, there is provided the deflection means capable of deflecting the electron beam to change the irradiation position on the anode surface.
【0006】[0006]
【実施例】図1にこの発明の実施例を示し、図2と対応
する部分に同一符号を付けて示す。この実施例において
は、電子線14を偏向する手段として静電偏向板31が
設けられる。つまり偏向板31は、電子銃13と陽極1
5との間に設けられる。この例では偏向板31と電子銃
13との間に電子線14を集束する集束手段32、この
例では静電レンズが用いられて電子線14の太さが陽極
15上で最も小となるようにされる。この集束手段32
により集束された電子線14が偏向板31で2次元的に
偏向され、陽極15に対する照射点を変更することがで
きる。1 shows an embodiment of the present invention, in which parts corresponding to those in FIG. 2 are designated by the same reference numerals. In this embodiment, an electrostatic deflection plate 31 is provided as a means for deflecting the electron beam 14. That is, the deflector plate 31 includes the electron gun 13 and the anode 1.
It is provided between 5 and. In this example, a focusing means 32 for focusing the electron beam 14 between the deflecting plate 31 and the electron gun 13, and in this example, an electrostatic lens is used so that the electron beam 14 has the smallest thickness on the anode 15. To be This focusing means 32
The electron beam 14 focused by is deflected two-dimensionally by the deflection plate 31, and the irradiation point on the anode 15 can be changed.
【0007】このように構成されているため、偏向板3
1に印加する電圧を制御することにより電子線14の陽
極15に対する照射点を、例えば、図2Aに示した位置
より、図1Aに示した位置に変更すると、この陽極15
に対する照射点とスリット24とを結ぶ線の延長線が被
測定物19と交差する点は、図2Aの場合と異なるもの
となる。つまり被測定物19に対するX線の照射点が変
更される。従って、被測定物19を移動することなく、
そのX線照射点を偏向板31の印加電圧を制御して行う
ことができる。Due to this structure, the deflection plate 3
When the irradiation point of the electron beam 14 with respect to the anode 15 is changed from the position shown in FIG. 2A to the position shown in FIG. 1A by controlling the voltage applied to the anode 15, the anode 15
2A is different from the case of FIG. 2A in that the extension line of the line connecting the irradiation point with respect to and the slit 24 intersects with the DUT 19. That is, the irradiation point of the X-ray on the object to be measured 19 is changed. Therefore, without moving the DUT 19,
The X-ray irradiation point can be performed by controlling the voltage applied to the deflection plate 31.
【0008】[0008]
【発明の効果】以上述べたようにこの発明によれば、電
子線を偏向して陽極への照射点を変更することにより、
X線の被測定物上への入射点を変えることができ、被測
定物を真空中で移動させたり、真空を解いて移動させた
りする必要がなく、頗る簡単に、X線の被測定物上への
入射位置を変更することができるAs described above, according to the present invention, by deflecting the electron beam and changing the irradiation point to the anode,
The point of incidence of X-rays on the DUT can be changed, and there is no need to move the DUT in a vacuum or release the vacuum to move it. The incident position on the top can be changed
【図1】Aはこの発明の実施例を示す平面図、Bはその
X線発生部を示す側面図である。FIG. 1A is a plan view showing an embodiment of the present invention, and B is a side view showing an X-ray generation section thereof.
【図2】Aは従来のX線測定装置を示す平面図、Bはそ
のX線発生部を示す側面図である。FIG. 2A is a plan view showing a conventional X-ray measuring apparatus, and B is a side view showing an X-ray generating unit thereof.
Claims (1)
線を発生させ、そのX線を絞るスリットを通して被測定
物に照射するX線測定装置において、 上記電子線を偏向して上記陽極面上の照射位置を変更さ
せることができる偏向手段が設けられていることを特徴
とするX線測定装置。1. An X-ray is produced by irradiating the anode with an electron beam emitted from the cathode.
In an X-ray measuring apparatus for generating an electron beam and irradiating an object to be measured through a slit for narrowing the X-ray, a deflection means capable of deflecting the electron beam to change the irradiation position on the anode surface is provided. An X-ray measuring device characterized in that
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14760893A JPH076716A (en) | 1993-06-18 | 1993-06-18 | X-ray measuring device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14760893A JPH076716A (en) | 1993-06-18 | 1993-06-18 | X-ray measuring device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH076716A true JPH076716A (en) | 1995-01-10 |
Family
ID=15434180
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14760893A Pending JPH076716A (en) | 1993-06-18 | 1993-06-18 | X-ray measuring device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH076716A (en) |
-
1993
- 1993-06-18 JP JP14760893A patent/JPH076716A/en active Pending
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 19980324 |